TWI767129B - composite material - Google Patents
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- TWI767129B TWI767129B TW108123653A TW108123653A TWI767129B TW I767129 B TWI767129 B TW I767129B TW 108123653 A TW108123653 A TW 108123653A TW 108123653 A TW108123653 A TW 108123653A TW I767129 B TWI767129 B TW I767129B
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- 239000002131 composite material Substances 0.000 title claims abstract description 31
- 229910052751 metal Inorganic materials 0.000 claims abstract description 23
- 239000002184 metal Substances 0.000 claims abstract description 23
- 239000010949 copper Substances 0.000 claims abstract description 15
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims abstract description 14
- 229910052802 copper Inorganic materials 0.000 claims abstract description 14
- 239000010410 layer Substances 0.000 claims description 45
- 239000012790 adhesive layer Substances 0.000 claims description 29
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 13
- 229920001721 polyimide Polymers 0.000 claims description 11
- 239000011347 resin Substances 0.000 claims description 10
- 229920005989 resin Polymers 0.000 claims description 10
- -1 polyethylene terephthalate Polymers 0.000 claims description 8
- 239000004642 Polyimide Substances 0.000 claims description 7
- 239000011572 manganese Substances 0.000 claims description 7
- 239000000463 material Substances 0.000 claims description 7
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 claims description 6
- 229910052748 manganese Inorganic materials 0.000 claims description 6
- 229910052759 nickel Inorganic materials 0.000 claims description 6
- 239000000654 additive Substances 0.000 claims description 5
- 239000012745 toughening agent Substances 0.000 claims description 5
- 239000004698 Polyethylene Substances 0.000 claims description 4
- 239000004743 Polypropylene Substances 0.000 claims description 4
- 239000004793 Polystyrene Substances 0.000 claims description 4
- 239000004848 polyfunctional curative Substances 0.000 claims description 4
- 229920000915 polyvinyl chloride Polymers 0.000 claims description 4
- 239000004800 polyvinyl chloride Substances 0.000 claims description 4
- 229910000881 Cu alloy Inorganic materials 0.000 claims description 3
- 229920000106 Liquid crystal polymer Polymers 0.000 claims description 3
- 239000004977 Liquid-crystal polymers (LCPs) Substances 0.000 claims description 3
- 239000004677 Nylon Substances 0.000 claims description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 claims description 3
- 239000003822 epoxy resin Substances 0.000 claims description 3
- 229920001778 nylon Polymers 0.000 claims description 3
- 229920000647 polyepoxide Polymers 0.000 claims description 3
- 229920000728 polyester Polymers 0.000 claims description 3
- 229920000573 polyethylene Polymers 0.000 claims description 3
- 229920000139 polyethylene terephthalate Polymers 0.000 claims description 3
- 239000005020 polyethylene terephthalate Substances 0.000 claims description 3
- 229920001155 polypropylene Polymers 0.000 claims description 3
- 229920002223 polystyrene Polymers 0.000 claims description 3
- 239000004814 polyurethane Substances 0.000 claims description 3
- 239000004809 Teflon Substances 0.000 claims description 2
- 229920006362 Teflon® Polymers 0.000 claims description 2
- XECAHXYUAAWDEL-UHFFFAOYSA-N acrylonitrile butadiene styrene Chemical compound C=CC=C.C=CC#N.C=CC1=CC=CC=C1 XECAHXYUAAWDEL-UHFFFAOYSA-N 0.000 claims description 2
- 229920000122 acrylonitrile butadiene styrene Polymers 0.000 claims description 2
- 239000004676 acrylonitrile butadiene styrene Substances 0.000 claims description 2
- 229920001568 phenolic resin Polymers 0.000 claims description 2
- 239000005011 phenolic resin Substances 0.000 claims description 2
- 229920002312 polyamide-imide Polymers 0.000 claims description 2
- 229920001296 polysiloxane Polymers 0.000 claims description 2
- 229920002635 polyurethane Polymers 0.000 claims description 2
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 claims 1
- 239000004962 Polyamide-imide Substances 0.000 claims 1
- 239000000203 mixture Substances 0.000 abstract description 9
- 229910045601 alloy Inorganic materials 0.000 abstract description 5
- 239000000956 alloy Substances 0.000 abstract description 5
- 238000013461 design Methods 0.000 abstract description 4
- 239000000853 adhesive Substances 0.000 description 9
- 230000001070 adhesive effect Effects 0.000 description 9
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 6
- 239000003063 flame retardant Substances 0.000 description 6
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N nitrogen Substances N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 3
- 229910052698 phosphorus Inorganic materials 0.000 description 3
- 239000011574 phosphorus Substances 0.000 description 3
- 239000004925 Acrylic resin Substances 0.000 description 2
- 229920000178 Acrylic resin Polymers 0.000 description 2
- 229920000459 Nitrile rubber Polymers 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 230000000996 additive effect Effects 0.000 description 2
- NTXGQCSETZTARF-UHFFFAOYSA-N buta-1,3-diene;prop-2-enenitrile Chemical group C=CC=C.C=CC#N NTXGQCSETZTARF-UHFFFAOYSA-N 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- 239000011777 magnesium Substances 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 239000013034 phenoxy resin Substances 0.000 description 2
- 229920006287 phenoxy resin Polymers 0.000 description 2
- 229920000052 poly(p-xylylene) Polymers 0.000 description 2
- 239000009719 polyimide resin Substances 0.000 description 2
- 229920002379 silicone rubber Polymers 0.000 description 2
- 239000004945 silicone rubber Substances 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 238000010998 test method Methods 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- XQUPVDVFXZDTLT-UHFFFAOYSA-N 1-[4-[[4-(2,5-dioxopyrrol-1-yl)phenyl]methyl]phenyl]pyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C(C=C1)=CC=C1CC1=CC=C(N2C(C=CC2=O)=O)C=C1 XQUPVDVFXZDTLT-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical group [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 description 1
- 229910052790 beryllium Inorganic materials 0.000 description 1
- ATBAMAFKBVZNFJ-UHFFFAOYSA-N beryllium atom Chemical compound [Be] ATBAMAFKBVZNFJ-UHFFFAOYSA-N 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 150000004679 hydroxides Chemical class 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- VTHJTEIRLNZDEV-UHFFFAOYSA-L magnesium dihydroxide Chemical compound [OH-].[OH-].[Mg+2] VTHJTEIRLNZDEV-UHFFFAOYSA-L 0.000 description 1
- 239000000347 magnesium hydroxide Substances 0.000 description 1
- 229910001862 magnesium hydroxide Inorganic materials 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- 229920003192 poly(bis maleimide) Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920005749 polyurethane resin Polymers 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- JBQYATWDVHIOAR-UHFFFAOYSA-N tellanylidenegermanium Chemical compound [Te]=[Ge] JBQYATWDVHIOAR-UHFFFAOYSA-N 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B5/00—Non-insulated conductors or conductive bodies characterised by their form
- H01B5/14—Non-insulated conductors or conductive bodies characterised by their form comprising conductive layers or films on insulating-supports
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
- H01B1/02—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of metals or alloys
- H01B1/026—Alloys based on copper
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- Laminated Bodies (AREA)
- Glass Compositions (AREA)
Abstract
一種複合材料,係用於被動元件,該複合材料包含一金屬層,及一疊設於該金屬層上的絕緣層。該金屬層的電阻率為1×10-8 Ωm 至150×10-8 Ωm。該複合材料之金屬層的合金銅組成使該複合材料的整體厚度範圍落在66μm至325μm間,相較於習知複合疊層來說,厚度大幅減少,使得含有該複合材料的被動元件可進行微型化、緊湊化設計,以迎合市場趨勢。A composite material is used for passive components. The composite material includes a metal layer and an insulating layer stacked on the metal layer. The resistivity of the metal layer is 1×10 -8 Ωm to 150×10 -8 Ωm. The alloy copper composition of the metal layer of the composite material makes the overall thickness of the composite material range from 66 μm to 325 μm. Compared with the conventional composite laminate, the thickness is greatly reduced, so that the passive components containing the composite material can be Miniaturized and compact design to meet market trends.
Description
本發明是有關於一種複合材料,特別是指一種微型化的複合材料。The present invention relates to a composite material, especially a miniaturized composite material.
被動元件是一種與主動元件連接的電子元件,其僅消耗能源但不能產生能源,例如電阻、電容、電感等等。一般被動元件中的複合疊層由一銅層、一鋪設於該銅層的其中一側面上的黏合劑層,及一固定於該黏合劑層而疊置於該銅層上的陶瓷基板層形成。一般來說,受限於材料性質,該銅層的厚度約在150μm至300μm的範圍內,該黏合劑層的厚度約為50μm至100μm,該陶瓷基板層的厚度約為300μm,因此該複合疊層的總厚度約在500μm至700μm左右。然而,近年電腦產品、通信產品或消費性電子產品皆往元件微型化及緊湊配置的方向前進,前述被動元件的厚度將不利於微型化及緊湊配置的趨勢,因此需要一種較為進步的結構來將被動元件微型化,以減少被動元件的厚度。A passive component is an electronic component connected to an active component, which only consumes energy but cannot generate energy, such as resistance, capacitance, inductance, and so on. Generally, the composite stack in passive components is formed by a copper layer, an adhesive layer laid on one side of the copper layer, and a ceramic substrate layer fixed on the adhesive layer and stacked on the copper layer. . Generally speaking, limited by material properties, the thickness of the copper layer is about 150 μm to 300 μm, the thickness of the adhesive layer is about 50 μm to 100 μm, and the thickness of the ceramic substrate layer is about 300 μm. The total thickness of the layers is around 500 μm to 700 μm. However, in recent years, computer products, communication products or consumer electronic products are all moving towards the direction of component miniaturization and compact configuration. The thickness of the aforementioned passive components is not conducive to the trend of miniaturization and compact configuration. Therefore, a more advanced structure is required to Passive components are miniaturized to reduce the thickness of passive components.
因此,本發明之目的,即在提供一種適用於被動元件的複合材料。Therefore, the object of the present invention is to provide a composite material suitable for passive components.
於是,本發明複合材料,包含一金屬層,及一疊設於該金屬層上的絕緣層。該金屬層的電阻率為1×10-8 Ωm 至150×10-8 Ωm。Therefore, the composite material of the present invention includes a metal layer and an insulating layer stacked on the metal layer. The resistivity of the metal layer is 1×10 -8 Ωm to 150×10 -8 Ωm.
本發明之功效在於:該複合材料的金屬層之合金銅組成令該金屬層之電阻率為1×10-8 Ωm 至150×10-8 Ωm之間,不僅適合用於被動元件,更令該複合材料的整體厚度範圍落在66μm至325μm間,相較於習知複合疊層來說,厚度大幅減少,使得含有該複合材料的被動元件可進行微型化、緊湊化設計,以迎合市場趨勢。The effect of the present invention is: the composition of alloy copper of the metal layer of the composite material makes the resistivity of the metal layer between 1×10 -8 Ωm and 150×10 -8 Ωm, which is not only suitable for passive components, but also makes the metal layer suitable for passive components. The overall thickness of the composite material ranges from 66 μm to 325 μm. Compared with the conventional composite laminate, the thickness is greatly reduced, so that the passive components containing the composite material can be miniaturized and compact in design to meet the market trend.
在本發明被詳細描述之前,應當注意在以下的說明內容中,類似的元件是以相同的編號來表示。Before the present invention is described in detail, it should be noted that in the following description, similar elements are designated by the same reference numerals.
參閱圖1,為本發明複合材料1之一第一實施例,適用於一被動元件。該複合材料1包含一具有一第一膠黏面111及一相反該第一膠黏面111之第二膠黏面112的膠層11、一黏設於該膠層11之第一膠黏面111上的金屬層12,及一黏設於該膠層11之第二膠黏面112而疊設於該金屬層12上的絕緣層13。該膠層11的厚度在10μm至50μm之間,較佳為25μm或40μm。該膠層11含有樹脂材料,另外,該膠層11除了樹脂材料外,還可含有選自添加物(Filler)、增韌劑(Rubber)、硬化劑(Hardener)或上述混合物的族群。該樹脂材料選自環氧樹脂(Epoxy Resins)、苯氧基樹脂(Phenoxy Resin)、丙烯酸樹脂(Acrylic Resin)、胺基甲酸乙酯樹脂(Polyurethane Resin)、矽橡膠系(Silicone Rubber)樹脂、聚對環二甲苯系樹脂(Poly-para-xylylene ; Parylene)、雙馬來醯亞胺系樹脂(Bimaleimide Resin)、聚醯亞胺樹脂(Polyimide Resin),或上述混合物。該添加物選自氮系耐燃劑(Nitrogen flame retardant)、有機磷系耐燃劑(organophosphorus flame retardant)、無機磷系耐燃劑(phosphorus flame retardant)、氫氧化物(例如氫氧化鋁與氫氧化鎂)、二氧化矽,或其混合物。該增韌劑為末端丁二烯-丙烯腈共聚合物(Carboxyl-Terminated Butadiene-Acrylonitrile Copolymer,簡稱CTBN)。較佳地,該膠層11含有5~45wt%的樹脂材料、5~30wt%的添加物、20~60wt%的增韌劑,及0.5~5wt%的硬化劑,該膠層11是由上述成分溶解分散於溶劑系統中製成,耐熱性可高達350℃。Referring to FIG. 1 , it is a first embodiment of the
該金屬層12含有合金銅,且厚度範圍在6μm至150μm之間,較佳為75μm。電阻率為1×10-8
Ωm 至150×10-8
Ωm,較佳為5×10-8
Ωm 至50×10-8
Ωm(於室溫下測得)。該合金銅包含銅(Cu),並由鎳(Ni)、錳(Mn)、錫(Sn)、鉻(Cr)、鐵(Fe)、鋁(Al)、鈷(Co)、鎂(Mg)、銀(Ag)、鋅(Zn)、鈹(Be)、鉬(Mo)、磷(P)、矽(Si),及鈦(Ti)之至少一種金屬組成。在本第一實施例中,錳的含量為7.0wt%至20.0wt%,較佳為12.0wt%,鎳的含量為1.0wt%至5.0wt%,較佳為3.0wt%。The
該絕緣層13的厚度範圍為50μm至125μm,較佳為75μm。該絕緣層13的成分選自聚醯亞胺(Polyimide ,PI)、聚乙烯對苯二甲酸酯( Polyethylene Terephthalate , PET)、鐵氟龍(Teflon)、液晶高分子(Liquid Crystal Polymer ,LCP)、聚乙烯(Polyethylene ,PE)、聚丙烯(Polypropylene ',PP)、聚苯乙烯(Polystyrene,PS)、聚氯乙烯(Polyvinyl Chloride , PVC)、尼龍(Nylon or Polyamides)、壓克力(Acrylic)、丙烯腈-丁二烯-苯乙烯共聚物(Acrylonitrile-Butadiene-Styrene)、酚醛樹脂(Phenolic Resins)、環氧樹脂(Epoxy)、聚酯(Polyester)、矽膠(Silicone)、聚胺酯(Polyurethane , PU)、聚醯胺醯亞胺(polyamide-imide ,PAI),或上述任一組合所組成的族群。The thickness of the
實驗例一Experimental example 1
在上述內容中提到,該複合材料1之膠層11的組成為5~45wt%的樹脂材料、5~30wt%的添加物、20~60wt%的增韌劑,及0.5~5wt%的硬化劑,在本實驗例中取一個不符前述混合比例的比較組,及三個符合前述混合比例的實驗組來檢測其剝離強度,其組成如下表一所示,該比較組及該等實驗組的厚度皆為25μm,實驗方式是將該比較組及該等實驗組塗佈於3密耳(MIL)的黑色聚醯亞胺薄膜(PI)上,於攝氏160度下壓合在一起2分鐘,再與0.15mm的合金銅貼合,其中該合金銅所含的錳的含量為12.0wt%,鎳的含量為3.0wt%,其餘為銅。並以攝氏160度烘烤1.5個小時後,以IPC-TM-650 2.4.9測試方法進行量測,其測得的剝離強度如下表一所示。As mentioned above, the composition of the
表一
由上表一可明顯看出本第一實施例的膠層11配比可產生優異的剝離強度,從而實現較佳的接著能力,故該膠層11的厚度可大幅降低,以降低生產成本及生產效率。From the above table 1, it can be clearly seen that the ratio of the
實驗例二Experiment 2
本實驗例是要測試該膠層11對於不同厚度的金屬之接著能力,兩個實驗組各自取該膠層11約25μm塗佈在3密耳(MIL)的黑色聚醯亞胺薄膜(PI)上,於攝氏160度下壓合在一起2分鐘,再分別與0.15mm及0.3mm的合金銅貼合,並以攝氏160度烘烤1.5個小時後,最後以IPC-TM-650 2.4.9測試方法進行量測,其測得的剝離強度如下表二所示。This experimental example is to test the adhesion ability of the
表二
由上述實驗結果可知,該膠層11既使對厚度大於本實施例的合金銅,也能保有良好的剝離強度,可見其接著能力確實優異。It can be seen from the above experimental results that the
在本第一實施例中,該複合材料1之該金屬層12所含的錳的含量為12.0wt%,鎳的含量為3.0wt%,其餘為銅,可令電阻範圍在5×10-8
Ωm ~50×10-8
Ωm間,可確保該複合材料1適用於被動元件中。In the first embodiment, the content of manganese contained in the
參閱圖2,為本發明之該複合材料1之一第二實施例,該第二實施例大致上是與該第一實施例相同,不同之處在於:該第二實施例的絕緣層13採三明治或多層式設計,也就是該絕緣層13具有二子絕緣層131,及一位於該等子絕緣層131間以黏合該等子絕緣層131的黏合層132。在本第二實施例中,該等子絕緣層131為聚醯亞胺(Polyimide ,PI),該黏合層132的成分與該膠層11相同,除了如圖2中三明治結構的設計外,也可視需求將多個子絕緣層131及多個黏合層132交錯設置,每一黏合層132位於兩相鄰子絕緣層131之間,以形成多層式結構。本第二實施例提供該絕緣層13的另一種配置設計,以提高泛用性。Referring to FIG. 2 , it is a second embodiment of the
綜上所述,該複合材料1可控制於特定的電阻率範圍內,並透過該膠層11的高剝離強度來提升接著能力,以適用於被動元件,故確實能達成本發明之目的。To sum up, the
惟以上所述者,僅為本發明之實施例而已,當不能以此限定本發明實施之範圍,凡是依本發明申請專利範圍及專利說明書內容所作之簡單的等效變化與修飾,皆仍屬本發明專利涵蓋之範圍內。However, the above are only examples of the present invention, and should not limit the scope of the present invention. All simple equivalent changes and modifications made according to the scope of the application for patent of the present invention and the contents of the patent specification are still within the scope of the present invention. within the scope of the invention patent.
1:複合材料 11:膠層 111:第一膠黏面 112:第二膠黏面 12:金屬層 13:絕緣層 131:子絕緣層 132:黏合層1: Composite materials 11: Adhesive layer 111: The first adhesive side 112: Second adhesive side 12: Metal layer 13: Insulation layer 131: Sub insulating layer 132: Adhesive layer
本發明之其它的特徵及功效,將於參照圖式的實施方式中清楚地呈現,其中: 圖1是一示意圖,為本發明複合材料之一第一實施例;及 圖2是一示意圖,為本發明複合材料之一第二實施例。Other features and effects of the present invention will be clearly presented in the embodiments with reference to the drawings, wherein: Fig. 1 is a schematic diagram showing a first embodiment of the composite material of the present invention; and FIG. 2 is a schematic diagram showing a second embodiment of the composite material of the present invention.
1:複合材料 1: Composite materials
11:膠層 11: Adhesive layer
111:第一膠黏面 111: The first adhesive side
112:第二膠黏面 112: Second adhesive side
12:金屬層 12: Metal layer
13:絕緣層 13: Insulation layer
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| CN100409373C (en) * | 2001-04-06 | 2008-08-06 | 宝电通科技股份有限公司 | Composite structure material for positive temperature coefficient thermistor element and manufacturing method thereof |
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| DE102009041574A1 (en) * | 2008-10-29 | 2010-05-12 | Electrovac Ag | Composite material, method of making a composite, and adhesive or bonding material |
| TWI488549B (en) * | 2014-03-07 | 2015-06-11 | Azotek Co Ltd | Metal substrate and fabricating method thereof |
| WO2017042920A1 (en) * | 2015-09-09 | 2017-03-16 | 日産自動車株式会社 | Composite material production method, composite material production device, preform for composite material, and composite material |
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| CN1958666A (en) * | 2005-11-02 | 2007-05-09 | 长春人造树脂厂股份有限公司 | Halogen-free flame retardant epoxy resin composition |
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| TW202020894A (en) | 2020-06-01 |
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