[go: up one dir, main page]

TWI764989B - Hydrophilic structure and method for producing hydrophilic structure - Google Patents

Hydrophilic structure and method for producing hydrophilic structure Download PDF

Info

Publication number
TWI764989B
TWI764989B TW107106138A TW107106138A TWI764989B TW I764989 B TWI764989 B TW I764989B TW 107106138 A TW107106138 A TW 107106138A TW 107106138 A TW107106138 A TW 107106138A TW I764989 B TWI764989 B TW I764989B
Authority
TW
Taiwan
Prior art keywords
group
hydrophilic
carbon atoms
polymer
zwitterionic
Prior art date
Application number
TW107106138A
Other languages
Chinese (zh)
Other versions
TW201842098A (en
Inventor
山口征太郎
梅田明来子
宮田壮
Original Assignee
日商琳得科股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商琳得科股份有限公司 filed Critical 日商琳得科股份有限公司
Publication of TW201842098A publication Critical patent/TW201842098A/en
Application granted granted Critical
Publication of TWI764989B publication Critical patent/TWI764989B/en

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10Esters
    • C08F20/38Esters containing sulfur

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Laminated Bodies (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Paints Or Removers (AREA)

Abstract

本發明為具有基底、中間層和親水性層依序層壓所形成的層狀構造之親水性構造體,其中前述中間層為含有矽氧烷類高分子的膜層,前述親水性層為含有不具有矽原子的雙性離子高分子且不含有具有矽原子的雙性離子高分子之膜層,和其製造方法。根據本發明,提供了具有親水性、耐汙染性、附著性、及耐水性優良的親水性層之親水性構造體、和其製造方法。 The present invention is a hydrophilic structure having a layered structure formed by sequentially laminating a substrate, an intermediate layer and a hydrophilic layer, wherein the intermediate layer is a film layer containing a siloxane-based polymer, and the hydrophilic layer is a film layer containing A film layer of a zwitterionic polymer having no silicon atom and containing no zwitterionic polymer having a silicon atom, and a method for producing the same. According to the present invention, a hydrophilic structure having a hydrophilic layer excellent in hydrophilicity, stain resistance, adhesion, and water resistance, and a method for producing the same are provided.

Description

親水性構造體及親水性構造體的製造方法 Hydrophilic structure and method for producing hydrophilic structure

本發明係有關於具有親水性、耐汙染性、附著性、及耐水性優良的親水性層之親水性構造體、和其製造方法。 The present invention relates to a hydrophilic structure having a hydrophilic layer excellent in hydrophilicity, stain resistance, adhesion, and water resistance, and a method for producing the same.

傳統上已知含有具有由聚合性雙性離子化合物衍生的重複單元之聚合物的親水性塗佈劑。 A hydrophilic coating agent containing a polymer having a repeating unit derived from a polymerizable zwitterionic compound is conventionally known.

例如,專利文獻1記載了將包含含有甜菜鹼(betaine)單體及烷氧基矽烷(alkoxysilyl)基團的化合物之單體成分聚合而得到包含含有烷氧基矽烷基團的高分子之親水性塗佈劑、以及表面上具有使用此親水性塗佈劑所形成的防霧層之製造品。 For example, Patent Document 1 describes the hydrophilicity of polymerizing a monomer component containing a betaine monomer and a compound containing an alkoxysilyl group to obtain a polymer containing an alkoxysilyl group A coating agent and a manufactured product having an anti-fogging layer formed using the hydrophilic coating agent on the surface.

[先前技術文獻] [Prior Art Literature]

[專利文獻] [Patent Literature]

[專利文獻1] 國際公開公報WO2014/084219(US2015/0259570A1) [Patent Document 1] International Publication WO2014/084219 (US2015/0259570A1)

使用專利文獻1所記載的親水性塗佈劑在基材上形成親水性層時,基材表面上存在羥基等的反應性基團,則含有烷氧基矽烷基團的高分子化學性地固定於基材表面。因此,藉由使用此親水性塗佈劑,能夠有效地形成與表面具有反應性 基團的基材之附著性優良的親水性層。 When a hydrophilic layer is formed on a substrate using the hydrophilic coating agent described in Patent Document 1, if a reactive group such as a hydroxyl group exists on the surface of the substrate, a polymer containing an alkoxysilane group is chemically fixed. on the substrate surface. Therefore, by using this hydrophilic coating agent, a hydrophilic layer excellent in adhesion to a substrate having a reactive group on the surface can be effectively formed.

然而,在製造包含含有烷氧基矽烷基團的高分子之親水性塗佈劑(塗佈液)時,取決於所使用的單體的種類,在聚合反應時固體可能會沉澱,而出現無法獲得成分完全溶解或分散之塗佈液的情形。 However, in the production of a hydrophilic coating agent (coating liquid) containing a polymer containing an alkoxysilane group, depending on the type of monomer used, solids may be precipitated during the polymerization reaction, resulting in an inability to A case where a coating liquid in which the components are completely dissolved or dispersed is obtained.

為了穩定地製造具有親水性層的親水性構造體,本發明人嘗試了使用不含有具有矽原子的雙性離子高分子之塗佈液來形成親水性層。 In order to stably manufacture a hydrophilic structure having a hydrophilic layer, the present inventors tried to form a hydrophilic layer using a coating liquid that does not contain a zwitterionic polymer having a silicon atom.

然而,在使用此種塗佈液的情況下,難以形成與基材層的附著性優良之親水性層。 However, when such a coating liquid is used, it is difficult to form a hydrophilic layer excellent in adhesion to the base material layer.

再者,取決於塗佈液的成分,可能形成出耐水性和耐汙染性差的親水性層,或者可能有塗佈液無法均勻地塗佈於基材上的情形。 Furthermore, depending on the components of the coating liquid, a hydrophilic layer having poor water resistance and contamination resistance may be formed, or the coating liquid may not be uniformly coated on the substrate.

本發明係有鑑於上述情況而完成,其目的在於提供具有親水性、耐汙染性、附著性、及耐水性優良的親水性層之親水性構造體、及其製造方法。 The present invention has been made in view of the above circumstances, and an object thereof is to provide a hydrophilic structure having a hydrophilic layer excellent in hydrophilicity, stain resistance, adhesion, and water resistance, and a method for producing the same.

本發明人為解決上述問題而深入研究的結果發現,藉由在基底表面設置含有矽氧烷類高分子的膜層,並在此膜層上形成含有不具有矽原子的雙性離子高分子且不含有具有矽原子的雙性離子高分子之膜層作為親水性層,能夠穩定地製造得到具有親水性、耐汙染性、附著性、及耐水性優良的親水性層之親水性構造體,進而完成了本發明。 As a result of intensive research to solve the above-mentioned problems, the present inventors found that a film layer containing a siloxane-based polymer is provided on the surface of a substrate, and a zwitterionic polymer containing no silicon atoms is formed on the film layer. A membrane layer containing a zwitterionic polymer having silicon atoms as a hydrophilic layer can stably produce a hydrophilic structure having a hydrophilic layer excellent in hydrophilicity, contamination resistance, adhesion, and water resistance. the present invention.

因此,根據本發明,提供了以下[1]~[7]的親水性 構造體、及[8]的親水性構造體的製造方法。 Therefore, according to the present invention, there are provided the following hydrophilic structures of [1] to [7], and methods of producing the hydrophilic structures of [8].

[1]一種親水性構造體,其係具有基底、中間層及親水性層依序層壓所形成的層狀構造之親水性構造體,其中前述中間層為含有矽氧烷類高分子的膜層,前述親水性層為含有不具有矽原子的雙性離子高分子且不含有具有矽原子的雙性離子高分子之膜層。 [1] A hydrophilic structure having a layered structure in which a substrate, an intermediate layer and a hydrophilic layer are sequentially laminated, wherein the intermediate layer is a film containing a siloxane-based polymer layer, and the hydrophilic layer is a film layer containing a zwitterionic polymer having no silicon atom and not having a zwitterionic polymer having a silicon atom.

[2]如[1]所述之親水性構造體,其中前述基底為樹脂薄膜。 [2] The hydrophilic structure according to [1], wherein the substrate is a resin film.

[3]如[1]所述之親水性構造體,其中前述矽氧烷類高分子為可水解的有機矽化合物的水解縮聚物。 [3] The hydrophilic structure according to [1], wherein the siloxane-based polymer is a hydrolysis polycondensate of a hydrolyzable organosilicon compound.

[4]如[3]所述之親水性構造體,其中前述可水解的有機矽化合物為以下化學式(1)所示之矽化合物、或以下化學式(1)所示之矽化合物的水解縮聚物。 [4] The hydrophilic structure according to [3], wherein the hydrolyzable organosilicon compound is a silicon compound represented by the following chemical formula (1) or a hydrolyzed polycondensate of a silicon compound represented by the following chemical formula (1). .

[化學1]Si(Ra)q(Rb)4-q (1) [Chemistry 1] Si(R a ) q (R b ) 4-q (1)

(在化學式中,Ra表示氫原子或不可水解的的有機基團,Rb表示可水解的基團,q表示0~2的整數。) (In the chemical formula, R a represents a hydrogen atom or a non-hydrolyzable organic group, R b represents a hydrolyzable group, and q represents an integer from 0 to 2.)

[5]如[1]所述之親水性構造體,其中前述不具有矽原子的雙性離子高分子為具有以下化學式(2)所示之重複單元的聚合物。 [5] The hydrophilic structure according to [1], wherein the zwitterionic polymer having no silicon atom is a polymer having a repeating unit represented by the following chemical formula (2).

Figure 107106138-A0202-12-0003-2
Figure 107106138-A0202-12-0003-2

[在化學式中,R1表示氫原子或甲基,R2、R3分別獨立地表示氫原子、具有或不具有醚鍵之碳原子數為1~10的烷基、具有或不具有醚鍵之碳原子數為2~11的氰烷基、具有或不具有醚鍵之碳原子數為2~10的烯基、或是、具有或不具有取代基之碳原子數為6~20的芳香基。另外,R2及R3也可以彼此鍵結而形成環。A1表示以下化學式(3)~(5)的任一者所示之2價基團,

Figure 107106138-A0202-12-0004-3
[In the chemical formula, R 1 represents a hydrogen atom or a methyl group, and R 2 and R 3 each independently represent a hydrogen atom, an alkyl group having 1 to 10 carbon atoms with or without an ether bond, with or without an ether bond A cyanoalkyl group with 2 to 11 carbon atoms, an alkenyl group with a carbon number of 2 to 10 with or without an ether bond, or an aromatic group with or without a substituent with a carbon number of 6 to 20 base. In addition, R 2 and R 3 may be bonded to each other to form a ring. A 1 represents a divalent group represented by any one of the following chemical formulae (3) to (5),
Figure 107106138-A0202-12-0004-3

(在化學式中,A2及A3分別獨立地表示碳原子數為1~10的亞烷基,R4、R5及R6分別獨立地表示氫原子、碳原子數為1~6的烷基、或是、具有或不具有取代基之碳原子數為6~20的芳香基。n表示1~10的整數。*1表示與碳原子之共價鍵,*2表示與氮原子之共價鍵。)m表示2~5的整數。] (In the chemical formula, A 2 and A 3 each independently represent an alkylene group having 1 to 10 carbon atoms, and R 4 , R 5 and R 6 each independently represent a hydrogen atom and an alkane having 1 to 6 carbon atoms. group, or an aromatic group with or without substituents having 6 to 20 carbon atoms. n represents an integer of 1 to 10. *1 represents a covalent bond with a carbon atom, and *2 represents a covalent bond with a nitrogen atom Valence bond.) m represents an integer from 2 to 5. ]

[6]如[1]所述之親水性構造體,其中前述不具有矽原子的 雙性離子高分子係具有由雙性離子單體衍生的重複單元、以及具有羧基、磺基、或前述基與鹼反應所得到之基團的重複單元(但排除由雙性離子單體衍生的重複單元)的聚合物。 [6] The hydrophilic structure according to [1], wherein the zwitterionic polymer system having no silicon atom has a repeating unit derived from a zwitterionic monomer, and has a carboxyl group, a sulfo group, or the aforementioned groups A polymer of repeating units (but excluding repeating units derived from zwitterionic monomers) of groups obtained by reaction with bases.

[7]如[1]所述之親水性構造體,其中前述親水性層為還含有具有碳原子數為0~10之陽離子的離子性化合物的膜層。 [7] The hydrophilic structure according to [1], wherein the hydrophilic layer is a membrane layer further containing an ionic compound having a cation having 0 to 10 carbon atoms.

[8]一種親水性構造體的製造方法,包括以下步驟(1)~(3),以製造如[1]~[7]中任一項所述之親水性構造體,步驟(1):在基底上塗佈含有可水解的有機矽化合物的塗佈液,藉由將所得到的塗膜中的可水解的有機矽化合物水解縮聚,以形成含有矽氧烷類高分子的塗膜;步驟(2):在前述含有矽氧烷類高分子的塗膜完全乾燥的狀態下、或在溶劑殘留於前述塗膜中的狀態下,在前述塗膜上,塗佈含有不具有矽原子的雙性離子高分子且不含有具有矽原子的雙性離子高分子之塗佈液(A),以形成前述塗佈液(A)的塗膜;以及步驟(3):將具有在步驟(2)所得到的層壓構造之構造體中未乾燥狀態的塗膜乾燥。 [8] A method for producing a hydrophilic structure, comprising the following steps (1) to (3) to produce the hydrophilic structure described in any one of [1] to [7], step (1): Coating a coating liquid containing a hydrolyzable organosilicon compound on a substrate, by hydrolyzing and polycondensing the hydrolyzable organosilicon compound in the obtained coating film, to form a coating film containing a siloxane polymer; step (2): In a state where the coating film containing the siloxane-based polymer is completely dried, or in a state where the solvent remains in the coating film, on the coating film, a bismuth compound containing no silicon atom is applied. A coating solution (A) of a zwitterionic polymer that does not contain a zwitterionic polymer having silicon atoms, so as to form a coating film of the aforementioned coating solution (A); In the structure of the obtained laminated structure, the coating film in the undried state was dried.

根據本發明,提供了具有親水性、耐汙染性、附著性、及耐水性優良的親水性層之親水性構造體、及其製造方法。 According to the present invention, a hydrophilic structure having a hydrophilic layer excellent in hydrophilicity, stain resistance, adhesion, and water resistance, and a method for producing the same are provided.

本發明的親水性構造體,係具有基底、中間層及 親水性層依序層壓所形成的層狀構造之親水性構造體,其中前述中間層為含有矽氧烷類高分子的膜層,前述親水性層為含有不具有矽原子的雙性離子高分子且不含有具有矽原子的雙性離子高分子之膜層。 The hydrophilic structure of the present invention is a hydrophilic structure having a layered structure formed by sequentially laminating a substrate, an intermediate layer and a hydrophilic layer, wherein the intermediate layer is a film layer containing a siloxane-based polymer, The aforementioned hydrophilic layer is a film layer containing a zwitterionic polymer having no silicon atom and no zwitterionic polymer having a silicon atom.

[基底] [substrate]

構成本發明的親水性構造體的基底,只要是固體且能夠支撐中間層、親水性層等即可,其形狀、材料、尺寸等並沒有特別限定。 The substrate constituting the hydrophilic structure of the present invention is not particularly limited as long as it is solid and can support the intermediate layer, the hydrophilic layer, and the like.

基底的形狀並沒有特別限定,可以採用立方體、長方體、球形、紡錘形、板狀、薄膜狀、纖維狀等任何的形狀。 The shape of the base is not particularly limited, and any shape such as a cube, a rectangular parallelepiped, a spherical shape, a spindle shape, a plate shape, a film shape, and a fiber shape can be adopted.

也可以對基底進行表面處理。 The substrate can also be surface treated.

作為表面處理,可列舉出電暈(corona)處理、電漿處理、紫外線處理等的物理性表面處理;酸接觸等的化學性表面處理;等。 The surface treatment includes physical surface treatment such as corona treatment, plasma treatment, and ultraviolet treatment; chemical surface treatment such as acid contact; and the like.

作為基底的材料,可列舉出玻璃、陶器、瓷器、琺瑯、磚瓦(tile)、陶瓷(ceramic)等的無機物;鋁、不銹鋼、黃銅等的金屬;各種合成樹脂;棉、絲、羊毛等的纖維;等。 Examples of the base material include inorganic substances such as glass, pottery, porcelain, enamel, tiles, and ceramics; metals such as aluminum, stainless steel, and brass; various synthetic resins; cotton, silk, wool, and the like. fiber; etc.

在這些材料之中,以樹脂薄膜作為基底為佳。藉由使用樹脂薄膜作為基底,能夠獲得防霧性薄膜等的功能性薄膜。 Among these materials, a resin film is preferable as the substrate. By using a resin film as a base, a functional film such as an anti-fogging film can be obtained.

作為樹脂薄膜的原料,可列舉出聚乙烯、聚丙烯等的聚烯烴;聚對苯二甲酸乙二酯(polyethylene terephthalate)、聚對苯二甲酸丁二醇酯(polybutylene terephthalate)、聚萘二甲酸乙二醇酯(poly naphthalene terephthalate)等的聚酯等;聚氯乙烯;聚碳酸酯(polycarbonate);丙烯酸類樹脂;苯乙烯(styrene)類樹脂;等。 Examples of the raw material of the resin film include polyolefins such as polyethylene and polypropylene; polyethylene terephthalate, polybutylene terephthalate, and polyethylene naphthalate Polyesters such as ethylene glycol esters (poly naphthalene terephthalate), etc.; polyvinyl chloride; polycarbonates; acrylic resins; styrene resins;

樹脂薄膜也可以含有紫外線吸收劑、光穩定劑、抗氧化劑等的添加劑。 The resin film may contain additives such as ultraviolet absorbers, light stabilizers, and antioxidants.

樹脂薄膜的厚度,通常為20~1000微米(μm),以30~500μm為佳。 The thickness of the resin film is usually 20 to 1000 micrometers (μm), preferably 30 to 500 μm.

再者,樹脂薄膜可以是細長形的薄膜,也可以是短條形的薄膜。 Furthermore, the resin film may be an elongated film or a short-striped film.

此處,所為「細長形的薄膜」係指具有寬度的5倍以上的長度之薄膜。 Here, the "slender film" refers to a film having a length of 5 times or more of the width.

[中間層] [middle layer]

構成本發明的親水性構造體之中間層為含有矽氧烷類高分子的膜層。 The intermediate layer constituting the hydrophilic structure of the present invention is a film layer containing a siloxane-based polymer.

藉由設置含有矽氧烷類高分子的膜層作為中間層,即使不使用具有矽原子的雙性離子高分子,也能夠形成附著性優良的親水性層。可認為這是由於在中間層與親水性層之間的界面處,矽氧烷類高分子和不具有矽原子的雙性離子高分子互相纏結所造成的。 By providing a film layer containing a siloxane-based polymer as an intermediate layer, a hydrophilic layer excellent in adhesion can be formed without using a zwitterionic polymer having silicon atoms. This is considered to be caused by the entanglement of the siloxane-based polymer and the zwitterionic polymer having no silicon atoms at the interface between the intermediate layer and the hydrophilic layer.

再者,在形成親水性層時所使用的塗佈液為水性的情況下,可能有塗膜不能均勻地塗佈於基底表面的情況。 Furthermore, when the coating liquid used for forming the hydrophilic layer is aqueous, the coating film may not be uniformly coated on the surface of the base.

另一方面,只要是在此中間層的上方,即使在使用水性的塗佈液的情況下,也能夠有效地形成均勻的塗膜。 On the other hand, as long as it is above the intermediate layer, even when an aqueous coating liquid is used, a uniform coating film can be effectively formed.

包含於中間層內的矽氧烷類高分子為具有矽氧烷鍵(Si-O-Si)的高分子。矽氧烷類高分子通常能夠藉由將可水解的有機矽化合物水解縮聚而獲得。 The siloxane-based polymer contained in the intermediate layer is a polymer having a siloxane bond (Si-O-Si). Siloxane-based polymers can generally be obtained by hydrolyzing and polycondensing hydrolyzable organosilicon compounds.

另外,此矽氧烷類高分子實質上不具有水解縮聚反應性(亦即,為原料化合物之可水解的有機矽化合物的水解縮聚反 應已結束)。 In addition, the siloxane-based polymer has substantially no hydrolytic polycondensation reactivity (that is, the hydrolytic polycondensation reaction of the hydrolyzable organosilicon compound, which is the raw compound, has ended).

因此,此矽氧烷類高分子,就有無反應性而言,作為可水解的有機矽化合物來使用,且與「化學式(1)所示之矽化合物的局部水解縮聚物」有所區別。 Therefore, this siloxane-based polymer is used as a hydrolyzable organosilicon compound in terms of non-reactivity, and is different from the "partially hydrolyzed polycondensate of a silicon compound represented by the chemical formula (1)."

在本發明中,所謂「可水解」係指藉由與水的反應而形成矽烷醇(silanol)基的性質。 In the present invention, "hydrolyzable" refers to the property of forming a silanol group by reaction with water.

矽氧烷類高分子的聚合度並沒有特別限定。矽氧烷類高分子的聚合度通常大於100。 The degree of polymerization of the siloxane-based polymer is not particularly limited. The degree of polymerization of siloxane polymers is usually greater than 100.

可水解的有機矽化合物,係在分子內具有可水解的基團之有機矽化合物。作為可水解的有機矽化合物,可列舉出由以下化學式(1)所示的矽化合物、或由以下化學式(1)所示的矽化合物之水解縮聚物(也稱為「局部水解縮聚物」)。 A hydrolyzable organosilicon compound is an organosilicon compound having a hydrolyzable group in the molecule. Examples of the hydrolyzable organosilicon compound include a silicon compound represented by the following chemical formula (1), or a hydrolysis polycondensate (also referred to as a "partially hydrolyzed polycondensate") of a silicon compound represented by the following chemical formula (1). .

[化學4]Si(Ra)q(Rb)4-q (1) [Chemistry 4] Si(R a ) q (R b ) 4-q (1)

在化學式(1)中,Ra表示氫原子或不可水解的有機基團,Rb表示可水解的基團。q表示0~2的整數。 In the chemical formula (1), R a represents a hydrogen atom or a non-hydrolyzable organic group, and R b represents a hydrolyzable group. q represents an integer from 0 to 2.

作為Ra所表示之不可水解的有機基團,可列舉出甲基、乙基、正丙基、異丙基、正丁基、仲丁基、異丁基、叔丁基、叔戊基(1,1-二甲基丙基)、1,1-二甲基-3,3-二甲基丁基、庚基、辛基、壬基、癸基等碳原子數為1~10的烷基;環戊基、環己基等碳原子數為3~10的環烷基;乙烯基、丙烯基等碳原子數為2~10的烯基;亞乙基、亞丙基等碳原子數為2~10的亞烷基;苯基、萘基、蒽基等碳原子數為6~15的芳香族基;等。 Examples of the non-hydrolyzable organic group represented by R a include methyl, ethyl, n-propyl, isopropyl, n-butyl, sec-butyl, isobutyl, tert-butyl, tert-amyl ( 1,1-dimethylpropyl), 1,1-dimethyl-3,3-dimethylbutyl, heptyl, octyl, nonyl, decyl and other alkanes having 1 to 10 carbon atoms cycloalkyl groups with 3 to 10 carbon atoms such as cyclopentyl and cyclohexyl; alkenyl groups with 2 to 10 carbon atoms such as vinyl and propenyl; ethylene and propylene groups with carbon atoms of 2 to 10 2-10 alkylene groups; phenyl, naphthyl, anthracenyl and other aromatic groups with 6-15 carbon atoms; etc.

上述有機基團也可以具有取代基。作為取代基, 可列舉出(甲基)丙烯醯氧基、環氧基、氨基、巰(mercapto)基、羥基、鹵素原子、烷氧基、氟烷(fluoroalkyl)基等。 The above-mentioned organic group may have a substituent. As a substituent, a (meth)acryloyloxy group, an epoxy group, an amino group, a mercapto group, a hydroxyl group, a halogen atom, an alkoxy group, a fluoroalkyl group, etc. are mentioned.

作為Rb所表示之可水解的基團,可列舉出甲氧基、乙氧基、丙氧基等碳原子數為1~5的烷氧基;乙醯氧基、丙醯氧基等的醯氧基;氯原子、溴原子等的鹵素原子;等。 Examples of the hydrolyzable group represented by R b include alkoxy groups having 1 to 5 carbon atoms such as methoxy, ethoxy, and propoxy; Aloxy group; halogen atom such as chlorine atom, bromine atom, etc.; etc.

q表示0~2的整數,以0或1為佳,以0為較佳。 q represents an integer from 0 to 2, preferably 0 or 1, preferably 0.

作為化學式(1)所表示的矽化合物,可列舉出四甲氧基矽烷(tetramethoxysilane)、四乙氧基矽烷(tetraethoxysilane)、四-n-丙氧基矽烷(tetra-n-propoxysilane)、四異丙氧基矽烷(tetraisopropoxysilane)、四-n-丁氧基矽烷(tetra-n-butoxysilane)、四異丁氧基矽烷(tetraisobutoxysilane)、四-s-丁氧基矽烷(tetra-s-butoxysilane)、四-t-丁氧基矽烷(tetra-t-butoxysilane)等q為0的矽化合物;甲基三甲氧基矽烷(methyltrimethoxysilane)、甲基三乙氧基矽烷(methyltriethoxysilane)、甲基三丙氧基矽烷(methyltripropoxysilane)、甲基三異丙氧基矽烷(methyl triisopropoxy silane)、乙基三甲氧基矽烷(ethyl trimethoxysilane)、乙基三乙氧基矽烷(ethyltriethoxysilane)、丙基三甲氧基矽烷(propyl trimethoxysilane)、丙基三乙氧基矽烷(propyl triethoxysilane)、丁基三甲氧基矽烷(butyl trimethoxysilane)、丁基三乙氧基矽烷(butyl triethoxysilane)、苯基三甲氧基矽烷(phenyltrimethoxysilane)、苯基三乙氧基矽烷(phenyltriethoxysilane)、γ-(2,3-環氧丙氧基)丙基三甲氧基矽烷(γ-glycidoxypropyltrimethoxysilane)、γ-丙烯醯氧丙基三甲氧基矽烷(γ-acryloyloxypropyltrimethoxysilane)、γ-甲基丙烯醯氧丙 基三甲氧基矽烷(γ-methacryloyloxypropyltrimethoxysilane)、乙烯基三甲氧基矽烷(vinyltrimethoxysilane)、乙烯基三乙氧基矽烷(vinyltriethoxysilane)等q為1的矽化合物;二甲基二甲氧基矽烷(dimethyl dimethoxysilane)、二甲基二乙氧基矽烷(dimethyl diethoxysilane)、二甲基二甲氧基矽烷(diethyldimethoxysilane)、二甲基二乙氧基矽烷(diethyldiethoxysilane)、甲基苯基二甲氧基矽烷(methylphenyldimethoxysilane)、二乙烯基二甲氧基矽烷(divinyl dimethoxysilane)、二乙烯基二乙氧基矽烷(divinyldiethoxysilane)等q為2的矽化合物;等。 Examples of the silicon compound represented by the chemical formula (1) include tetramethoxysilane, tetraethoxysilane, tetra-n-propoxysilane, tetraiso- Propoxysilane (tetraisopropoxysilane), tetra-n-butoxysilane (tetra-n-butoxysilane), tetraisobutoxysilane (tetraisobutoxysilane), tetra-s-butoxysilane (tetra-s-butoxysilane), Silicon compounds whose q is 0, such as tetra-t-butoxysilane; methyltrimethoxysilane, methyltriethoxysilane, methyltripropoxysilane Silane (methyltripropoxysilane), methyl triisopropoxy silane (methyl triisopropoxy silane), ethyl trimethoxy silane (ethyl trimethoxysilane), ethyl triethoxy silane (ethyltriethoxysilane), propyl trimethoxy silane (propyl trimethoxysilane) ), propyl triethoxysilane, butyl trimethoxysilane, butyl triethoxysilane, phenyltrimethoxysilane, phenyl trimethoxysilane Ethoxysilane (phenyltriethoxysilane), γ- (2,3-glycidoxypropyltrimethoxysilane), γ-glycidoxypropyltrimethoxysilane (γ-acryloyloxypropyltrimethoxysilane), γ -methacryloyloxypropyltrimethoxysilane (γ-methacryloyloxypropyltrimethoxysilane), vinyltrimethoxysilane (vinyltrimethoxysilane), vinyltriethoxysilane (vinyltriethoxysilane) and other silicon compounds whose q is 1; dimethyl Dimethoxysilane (dimethyl dimethoxysilane), dimethyl diethoxysilane (dimethyl diethoxysilane), dimethyl dimethoxysilane (die thyldimethoxysilane), dimethyldiethoxysilane (diethyldiethoxysilane), methylphenyldimethoxysilane (methylphenyldimethoxysilane), divinyl dimethoxysilane (divinyl dimethoxysilane), divinyldiethoxysilane ( Divinyldiethoxysilane) and other silicon compounds where q is 2; etc.

上述矽化合物可以單獨使用1種、或是組合2種以上使用。 The above-mentioned silicon compounds may be used alone or in combination of two or more.

再者,在使用上述矽化合物的同時,也可以一併使用三甲基甲氧基矽烷(trimethylmethoxysilane)、三乙基甲氧基矽烷(triethylmethoxysilane)、三乙基甲氧基矽烷(triethylmethoxysilane)、三乙基乙氧基矽烷(triethyl ethoxysilane)、三乙烯基甲氧基矽烷(trivinylmethoxysilane)、三乙烯基乙氧基矽烷(trivinyl ethoxysilane)等q為3的矽化合物。 Furthermore, when using the above-mentioned silicon compounds, trimethylmethoxysilane, triethylmethoxysilane, triethylmethoxysilane, triethylmethoxysilane, and trimethylmethoxysilane can also be used together. Silicon compounds in which q is 3, such as triethyl ethoxysilane, trivinylmethoxysilane, and trivinyl ethoxysilane.

上述化學式(1)所示的矽化合物之水解縮聚物,例如,可以在乙醇溶劑等的有機溶劑中,存在特定量的水及縮合催化劑、或是存在特定量的水而不存在縮合催化劑,將化學式(1)所示的矽化合物水解縮聚而獲得。 The hydrolysis polycondensate of the silicon compound represented by the above chemical formula (1), for example, in an organic solvent such as an ethanol solvent, in the presence of a specific amount of water and a condensation catalyst, or in the presence of a specific amount of water without a condensation catalyst, the The silicon compound represented by the chemical formula (1) is obtained by hydrolysis and polycondensation.

作為可水解的有機矽化合物使用,上述化學式(1)所示的矽化合物之局部水解縮聚物的聚合度並沒有特別限定。此化合物的聚合度通常為100以下。 As a hydrolyzable organosilicon compound, the polymerization degree of the partially hydrolyzed polycondensate of the silicon compound represented by the above chemical formula (1) is not particularly limited. The degree of polymerization of this compound is usually 100 or less.

作為進行此反應而得到的反應液,可列舉出乙醇性矽溶膠(alcoholic silica sol)等已知的反應液。 As a reaction liquid obtained by performing this reaction, known reaction liquids, such as alcoholic silica sol (alcoholic silica sol), are mentioned.

進行此反應而得到的反應液,可以作為用於形成中間層的塗佈液而直接使用,也可以作為製造用於形成中間層的塗佈液之原料液來使用。 The reaction liquid obtained by performing this reaction may be used as it is as a coating liquid for forming an intermediate layer, or may be used as a raw material liquid for producing a coating liquid for forming an intermediate layer.

在本發明中,作為上述化學式(1)所示的矽化合物之局部水解縮聚物,可以使用矽酸甲酯51、矽酸甲酯53A、矽酸乙酯40、矽酸乙酯48、EMS-485、SS-101、HAS-1、HAS-6、HAS-10、SS-C1、COLCOAT PX、COLCOAT N-103X、PC-291(以上由Colcoat股份公司製造)等的市售產品。 In the present invention, methyl silicate 51, methyl silicate 53A, ethyl silicate 40, ethyl silicate 48, EMS- Commercially available products such as 485, SS-101, HAS-1, HAS-6, HAS-10, SS-C1, COLCOAT PX, COLCOAT N-103X, PC-291 (the above are manufactured by Colcoat Co., Ltd.).

中間層也可以含有除了矽氧烷類高分子以外的成分。作為除了矽氧烷類高分子以外的成分,可列舉出抗靜電劑、界面活性劑、除了矽氧烷類高分子以外的高分子化合物等。 The intermediate layer may contain components other than the siloxane-based polymer. Examples of components other than siloxane-based polymers include antistatic agents, surfactants, and polymer compounds other than siloxane-based polymers.

中間層中含有的矽氧烷類高分子的量,相對於中間層的整體,通常為50質量%以上,以60質量%以上為佳。 The amount of the siloxane-based polymer contained in the intermediate layer is usually 50% by mass or more, preferably 60% by mass or more, based on the entire intermediate layer.

中間層的厚度,通常為10~10,000奈米(nm),以30~5,000nm為佳,以50~500nm為較佳。 The thickness of the intermediate layer is usually 10-10,000 nanometers (nm), preferably 30-5,000 nm, and more preferably 50-500 nm.

如後續所述,中間層與親水性層之間的邊界可以是清楚的,也可以是不清楚的。藉由在中間層完全形成之後形成親水性層,能夠得到中間層與親水性層之間具有清晰邊界的親水性構造體。再者,藉由在中間層尚未完全形成的狀態下開始形成親水性層,能夠得到中間層與親水性層之間的邊界不明確的親水性構造體。 As described later, the boundary between the intermediate layer and the hydrophilic layer may or may not be clear. By forming the hydrophilic layer after the intermediate layer is completely formed, a hydrophilic structure having a clear boundary between the intermediate layer and the hydrophilic layer can be obtained. Furthermore, by starting the formation of the hydrophilic layer in a state where the intermediate layer has not been completely formed, a hydrophilic structure in which the boundary between the intermediate layer and the hydrophilic layer is not clear can be obtained.

中間層的形成方法並沒有特別限定。例如,可以根據後續 描述的方法來形成中間層。 The formation method of the intermediate layer is not particularly limited. For example, the intermediate layer may be formed according to a method described later.

[親水性層] [Hydrophilic layer]

構成本發明的親水性構造體的親水性層,係含有不具有矽原子的雙性離子高分子且不含有具有矽原子的雙性離子高分子之膜層。 The hydrophilic layer constituting the hydrophilic structure of the present invention is a film layer containing a zwitterionic polymer having no silicon atom and no zwitterionic polymer having a silicon atom.

此處,雙性離子高分子係具有由雙性離子單體衍生的重複單元的聚合物。再者,雙性離子單體係在分子內具有聚合性碳-碳雙鍵、和具有正‧負電荷的甜菜鹼構造之化合物。 Here, the zwitterionic polymer is a polymer having repeating units derived from a zwitterionic monomer. Furthermore, the zwitterionic single system has a polymerizable carbon-carbon double bond in the molecule and a compound having a betaine structure having positive and negative charges.

本發明的親水性構造體由於含有親水性層,因而具有優異的親水性。 Since the hydrophilic structure of the present invention contains a hydrophilic layer, it has excellent hydrophilicity.

如以上所述,構成本發明的親水性構造體的親水性層含有不具有矽原子的雙性離子高分子,而另一方面不含有具有矽原子的雙性離子高分子。 As described above, the hydrophilic layer constituting the hydrophilic structure of the present invention contains a zwitterionic polymer having no silicon atom, and on the other hand, does not contain a zwitterionic polymer having a silicon atom.

作為具有矽原子的雙性離子高分子,可列舉出具有烷氧基甲矽烷基等的含有矽原子的基團之雙性離子高分子。含有此種雙性離子高分子的親水性層具有與其他層的附著性優良的傾向。 Examples of the zwitterionic polymer having a silicon atom include zwitterionic polymers having a silicon atom-containing group such as an alkoxysilyl group. The hydrophilic layer containing such a zwitterionic polymer tends to be excellent in adhesion to other layers.

然而,使用羧基或磺基等和具有烷氧基甲矽烷基的雙性離子單體作為原料單體,在具有烷氧基甲矽烷基的雙性離子高分子的合成過程(單體的聚合反應)中可能會出現固體沉澱而無法製備出成分完全溶解或分散之用於形成親水性層的塗佈液的情形。 However, using a zwitterionic monomer having an alkoxysilyl group, such as a carboxyl group or a sulfo group, as a raw material monomer, in the synthesis process of a zwitterionic polymer having an alkoxysilyl group (polymerization reaction of the monomer) ) may occur in which solid precipitation fails to prepare a coating liquid for forming a hydrophilic layer in which the components are completely dissolved or dispersed.

另一方面,由於構成本發明的親水性構造體的親水性層為不含有具有矽原子的雙性離子高分子,因此在製造本發明的親水性構造體時並不會發生上述問題。 On the other hand, since the hydrophilic layer constituting the hydrophilic structure of the present invention is a zwitterionic polymer having no silicon atoms, the above-mentioned problems do not occur when the hydrophilic structure of the present invention is produced.

在構成本發明的親水性構造體的親水性層中,不具 有矽原子的雙性離子高分子(以下有時稱為「雙性離子高分子(α)」)含有由不具有矽原子的雙性離子單體(以下有時稱為「雙性離子單體(a)」)衍生的重複單元之1種或2種以上。 In the hydrophilic layer constituting the hydrophilic structure of the present invention, a zwitterionic polymer having no silicon atom (hereinafter sometimes referred to as "zwitterionic polymer ( α )") contains a zwitterionic polymer having no silicon atom. One type or two or more types of repeating units derived from a zwitterionic monomer (hereinafter sometimes referred to as "zwitterionic monomer (a)").

雙性離子單體(a)係在分子內具有聚合性碳-碳雙鍵、和具有正‧負電荷的甜菜鹼構造,而不具有矽原子的化合物。 The zwitterionic monomer (a) is a compound having a polymerizable carbon-carbon double bond and a betaine structure having positive and negative charges in the molecule, but not having a silicon atom.

雙性離子高分子(α)的質量平均分子量,通常為5萬~300萬,以10萬~至250萬為佳,以20萬至200萬為較佳。 The mass average molecular weight of the zwitterionic polymer ( α ) is usually 50,000 to 3 million, preferably 100,000 to 2.5 million, and more preferably 200,000 to 2 million.

雙性離子高分子(α)的質量平均分子量,可以根據實施例中所記載的方法進行測量。 The mass average molecular weight of the zwitterionic polymer (α) can be measured according to the method described in the Examples.

作為由雙性離子單體(a)衍生的重複單元,可列舉出具有以下化學式(20)所表示的重複單元之聚合物。 As a repeating unit derived from a zwitterionic monomer (a), the polymer which has a repeating unit represented by following chemical formula (20) is mentioned.

Figure 107106138-A0202-12-0013-4
Figure 107106138-A0202-12-0013-4

在化學式(20)中,R1表示氫原子或甲基,R2、R3分別獨立地表示氫原子、具有或不具有醚鍵之碳原子數為1~10的烷基、具有或不具有醚鍵之碳原子數為2~11的氰烷基、具有或不具有醚鍵之碳原子數為2~10的烯基、或是、具有或不具有取代基之碳原子數為6~20的芳香基。R2及R3也可以彼此鍵結而形成環。「-G-」表示-COO-或-SO3 -In chemical formula (20), R 1 represents a hydrogen atom or a methyl group, R 2 and R 3 each independently represent a hydrogen atom, an alkyl group having 1 to 10 carbon atoms with or without an ether bond, with or without A cyanoalkyl group with 2 to 11 carbon atoms in an ether bond, an alkenyl group with 2 to 10 carbon atoms with or without an ether bond, or a 6 to 20 carbon atom with or without a substituent the aromatic group. R 2 and R 3 may be bonded to each other to form a ring. "-G - " means -COO - or -SO 3 - .

R2、R3表示具有或不具有醚鍵之碳原子數為1~10的烷基時,碳原子數為1~10的烷基的碳原子數以1~8為佳,以1~5為較佳。 When R 2 and R 3 represent an alkyl group having 1 to 10 carbon atoms with or without an ether bond, the number of carbon atoms of the alkyl group having 1 to 10 carbon atoms is preferably 1 to 8, preferably 1 to 5 is better.

作為不具有醚鍵之烷基,可列舉出甲基、乙基、正丙基、正丁基、正戊基、正己基等。 As an alkyl group which does not have an ether bond, a methyl group, an ethyl group, n-propyl group, n-butyl group, n-pentyl group, n-hexyl group, etc. are mentioned.

作為具有醚鍵之烷基,可列舉出以下化學式(6)或(7)所表示的基團等。 As an alkyl group which has an ether bond, the group etc. which are represented by following chemical formula (6) or (7) are mentioned.

[化學6]R7-O-Z1-* (6) R8-O-Z2-O-Z3-* (7) [Chemistry 6] R 7 -OZ 1 -* (6) R 8 -OZ 2 -OZ 3 -* (7)

在化學式(6)中,R7表示碳原子數為1~8的烷基,Z1表示碳原子數為2~9的亞烷基,R7和Z1的碳原子數的總和為3~10。*表示共價鍵。 In chemical formula (6), R 7 represents an alkyl group having 1 to 8 carbon atoms, Z 1 represents an alkylene group having 2 to 9 carbon atoms, and the sum of the carbon atoms of R 7 and Z 1 is 3 to 3 10. * denotes a covalent bond.

在化學式(7)中,R8表示碳原子數為1~6的烷基,Z2表示碳原子數為2~7的亞烷基,Z3表示碳原子數為2~7的亞烷基,R8、Z2、Z3的碳原子數的總和為5~10。*表示共價鍵。 In chemical formula (7), R 8 represents an alkyl group having 1 to 6 carbon atoms, Z 2 represents an alkylene group having 2 to 7 carbon atoms, and Z 3 represents an alkylene group having 2 to 7 carbon atoms , and the total number of carbon atoms of R 8 , Z 2 , and Z 3 is 5-10. * denotes a covalent bond.

R2、R3表示具有或不具有醚鍵之碳原子數為2~11的氰烷基時,碳原子數為2~11的氰烷基的碳原子數以2~9為佳,以2~6為較佳。 When R 2 and R 3 represent a cyanoalkyl group with or without an ether bond and having 2 to 11 carbon atoms, the carbon number of the cyanoalkyl group with 2 to 11 carbon atoms is preferably 2 to 9, and 2 ~6 is preferred.

作為不具有醚鍵之氰烷基,可列舉出氰甲基、2-氰乙基、3-氰丙基、4-氰丁基、6-氰己基等。 As a cyanoalkyl group which does not have an ether bond, a cyanomethyl group, a 2-cyanoethyl group, a 3-cyanopropyl group, a 4-cyanobutyl group, a 6-cyanohexyl group, etc. are mentioned.

作為具有醚鍵之氰烷基,可列舉出以下化學式(8)或(9)所表示的基團等。 As a cyano group which has an ether bond, the group etc. which are represented by the following chemical formula (8) or (9) are mentioned.

[化學7] R9-O-Z4-* (8) R10-O-Z5-O-Z6-* (9) [Chemistry 7] R 9 -OZ 4 -* (8) R 10 -OZ 5 -OZ 6 -* (9)

在化學式(8)中,R9表示碳原子數為2~9的氰烷基,Z4表示碳原子數為2~9的亞烷基,R9和Z4的碳原子數的總和為4~11。*表示共價鍵。 In the chemical formula (8), R 9 represents a cyanoalkyl group having 2 to 9 carbon atoms, Z 4 represents an alkylene group having 2 to 9 carbon atoms, and the sum of the carbon atoms of R 9 and Z 4 is 4 ~11. * denotes a covalent bond.

在化學式(9)中,R10表示碳原子數為2~7的氰烷基,Z5表示碳原子數為2~7的亞烷基,Z6表示碳原子數為2~7的亞烷基,R10、Z5、Z6的碳原子數的總和為6~11。*表示共價鍵。 In chemical formula (9), R 10 represents a cyanoalkyl group having 2 to 7 carbon atoms, Z 5 represents an alkylene group having 2 to 7 carbon atoms, and Z 6 represents an alkylene group having 2 to 7 carbon atoms The total number of carbon atoms of R 10 , Z 5 , and Z 6 is 6-11. * denotes a covalent bond.

R2、R3表示具有或不具有醚鍵之碳原子數為2~10的烯基時,碳原子數為2~10的烯基的碳原子數以2~9為佳,以2~6為較佳。 When R 2 and R 3 represent an alkenyl group having 2 to 10 carbon atoms with or without an ether bond, the number of carbon atoms of the alkenyl group having 2 to 10 carbon atoms is preferably 2 to 9, preferably 2 to 6 is better.

作為不具有醚鍵之烯基,可列舉出乙烯基、丙烯基、1-丁烯基、2-丁烯基、1-戊烯基等。 As an alkenyl group which does not have an ether bond, a vinyl group, a propenyl group, a 1-butenyl group, a 2-butenyl group, a 1-pentenyl group, etc. are mentioned.

作為具有醚鍵之烯基,可列舉出以下化學式(10)或(11)所表示的基團等。 As an alkenyl group which has an ether bond, the group etc. which are represented by following chemical formula (10) or (11) are mentioned.

[化學8]R11-O-Z7-* (10) R12-O-Z8-O-Z9-* (11) [Chemistry 8] R 11 -OZ 7 -* (10) R 12 -OZ 8 -OZ 9 -* (11)

在化學式(10)中,R11表示碳原子數為2~8的烯基,Z7表示碳原子數為2~8的亞烷基,R11和Z7的碳原子數的總和為4~10。*表示共價鍵。 In chemical formula (10), R 11 represents an alkenyl group having 2 to 8 carbon atoms, Z 7 represents an alkylene group having 2 to 8 carbon atoms, and the sum of the carbon atoms of R 11 and Z 7 is 4 to 4 10. * denotes a covalent bond.

在化學式(11)中,R12表示碳原子數為2~6的烯基,Z8表示碳原子數為2~6的亞烷基,Z9表示碳原子數為2~6的亞烷基,R12、Z8、Z9的碳原子數的總和為6~10。*表示共價鍵。 In chemical formula (11), R 12 represents an alkenyl group having 2 to 6 carbon atoms, Z 8 represents an alkylene group having 2 to 6 carbon atoms, and Z 9 represents an alkylene group having 2 to 6 carbon atoms , and the total number of carbon atoms of R 12 , Z 8 and Z 9 is 6-10. * denotes a covalent bond.

R2、R3表示具有或不具有取代基之碳原子數為6~20的芳香基時,碳原子數為6~20的芳香基的碳原子數以6~10為佳。 When R 2 and R 3 represent an aryl group having 6 to 20 carbon atoms with or without a substituent, the aryl group having 6 to 20 carbon atoms preferably has 6 to 10 carbon atoms.

作為無取代的芳香基,可列舉出苯基、1-萘基、2-萘基等。 As an unsubstituted aryl group, a phenyl group, a 1-naphthyl group, a 2-naphthyl group, etc. are mentioned.

作為具有取代基的芳香基,可列舉出甲基、乙基等碳原子數為1~6的烷基;甲氧基、乙氧基等碳原子數為1~6的烷氧基;氟原子、氯原子等鹵素原子;等芳香基。 Examples of the substituted aromatic group include alkyl groups having 1 to 6 carbon atoms such as methyl and ethyl; alkoxy groups having 1 to 6 carbon atoms such as methoxy and ethoxy; and fluorine atoms. , chlorine atom and other halogen atoms; and other aromatic groups.

作為R2和R3鍵結所形成的環,可列舉出吡咯烷(pyrrolidine)環、哌啶(piperidine)環、嗎啉(morpholine)環等。 Examples of the ring formed by R 2 and R 3 bonding include a pyrrolidine ring, a piperidine ring, a morpholine ring, and the like.

在化學式(2)中,A1表示以下化學式(3)~(5)的任一者所示之2價基團。 In the chemical formula (2), A 1 represents a divalent group represented by any one of the following chemical formulae (3) to (5).

Figure 107106138-A0202-12-0016-5
Figure 107106138-A0202-12-0016-5

在化學式(3)~(5)中,A2及A3分別獨立地表示碳原子數為1~10的亞烷基,R4、R5及R6分別獨立地表示 氫原子、碳原子數為1~6的烷基、或是、具有或不具有取代基之碳原子數為6~20的芳香基。n表示1~10的整數。*1表示與碳原子的共價鍵,*2表示與氮原子的共價鍵。 In chemical formulae (3) to (5), A 2 and A 3 each independently represent an alkylene group having 1 to 10 carbon atoms, and R 4 , R 5 and R 6 each independently represent a hydrogen atom and a carbon number. It is an alkyl group of 1 to 6, or an aryl group of 6 to 20 carbon atoms with or without a substituent. n represents an integer from 1 to 10. *1 represents a covalent bond with a carbon atom, and *2 represents a covalent bond with a nitrogen atom.

A2、A3表示碳原子數為1~10的亞烷基時,其碳原子數以1~8為佳,以1~6為較佳。 When A 2 and A 3 represent an alkylene group having 1 to 10 carbon atoms, the number of carbon atoms is preferably 1 to 8, more preferably 1 to 6.

作為碳原子數為1~10的亞烷基,可列舉出亞甲基、亞乙基、三亞甲基、四亞甲基、五亞甲基等的直鏈狀亞烷基;丙烷-1,2-二基、丁烷-1,3-二基等的支鏈狀亞烷基。 Examples of the alkylene group having 1 to 10 carbon atoms include linear alkylene groups such as methylene, ethylene, trimethylene, tetramethylene, and pentamethylene; propane-1, Branched alkylene such as 2-diyl, butane-1,3-diyl and the like.

作為R4、R5及R6所表示之碳原子數為1~6的烷基,可列舉出甲基、乙基、正丙基、異丙基、正丁基、仲丁基、叔丁基、正戊基、正己基等。 Examples of the alkyl group having 1 to 6 carbon atoms represented by R 4 , R 5 and R 6 include methyl, ethyl, n-propyl, isopropyl, n-butyl, sec-butyl, and tert-butyl. base, n-pentyl, n-hexyl, etc.

R4、R5及R6表示具有或不具有取代基之碳原子數為6~20的芳香基時,碳原子數為6~20的芳香基的碳原子數以6~10為佳。 When R 4 , R 5 and R 6 represent an aryl group having 6 to 20 carbon atoms with or without a substituent, the number of carbon atoms of the aryl group having 6 to 20 carbon atoms is preferably 6 to 10.

作為無取代的芳香基,可列舉出苯基、1-萘基、2-萘基等。 As an unsubstituted aryl group, a phenyl group, a 1-naphthyl group, a 2-naphthyl group, etc. are mentioned.

作為具有取代基的芳香基,可列舉出甲基、乙基等碳原子數為1~6的烷基;甲氧基、乙氧基等碳原子數為1~6的烷氧基;氟原子、氯原子等鹵素原子;等芳香基。 Examples of the substituted aromatic group include alkyl groups having 1 to 6 carbon atoms such as methyl and ethyl; alkoxy groups having 1 to 6 carbon atoms such as methoxy and ethoxy; and fluorine atoms. , chlorine atom and other halogen atoms; and other aromatic groups.

n為1-10的整數,以1~5的整數為佳。 n is an integer of 1-10, preferably an integer of 1-5.

在化學式(2)中,m為2~5的整數,以3或4為佳。 In chemical formula (2), m is an integer of 2 to 5, preferably 3 or 4.

在本發明中,從取得的容易性等觀點來考量,以具有以下化學式(2)所示之重複單元的化合物作為雙性離子高分子(α)為佳。 In the present invention, a compound having a repeating unit represented by the following chemical formula (2) is preferably used as the zwitterionic polymer (α) from the viewpoint of easiness of acquisition.

[化學10]

Figure 107106138-A0202-12-0018-6
[Chemistry 10]
Figure 107106138-A0202-12-0018-6

[在化學式(2)中,R1、R2、R3、A1及m,分別表示與前述相同的定義。] [In chemical formula (2), R 1 , R 2 , R 3 , A 1 and m have the same definitions as described above, respectively. ]

用於合成雙性離子高分子(α)的雙性離子單體(a)可根據所需的雙性離子高分子適當地決定。 The zwitterionic monomer (a) used for synthesizing the zwitterionic polymer ( α ) can be appropriately determined according to the desired zwitterionic polymer.

例如,具有化學式(2)所示之重複單元的雙性離子高分子,可以藉由使用以下化學式(2A)所示之雙性離子單體來合成。 For example, a zwitterionic polymer having a repeating unit represented by the chemical formula (2) can be synthesized by using the zwitterionic monomer represented by the following chemical formula (2A).

Figure 107106138-A0202-12-0018-7
Figure 107106138-A0202-12-0018-7

在化學式(2A)中,R1、R2、R3、A1、m及「-G-」分別表示與前述相同的定義。 In the chemical formula (2A), R 1 , R 2 , R 3 , A 1 , m and " -G- " have the same definitions as above, respectively.

化學式(2A)所示之雙性離子單體的合成方法並沒有特別限定。 The synthesis method of the zwitterionic monomer represented by the chemical formula (2A) is not particularly limited.

在上述化學式(2A)中,「-G-」係表示-COO-的雙性離子單體,例如,能夠藉由將對應的胺化合物[以下化學式(2b)]、與分子式:hal-(CH2)m-COOH(hal表示鹵素原子,m表示與前述相同的定義。)所表示之鹵化羧酸進行反應的方 法等已知的羧基甜菜鹼(carboxybetaine)化合物之製備方法而得到(日本特開平第8-99945號公報、日本特開平第7-278071號公報、日本特開平第2006-143634號公報、日本特開平第2006-143635號公報等)。 In the above chemical formula (2A), " -G- " represents a zwitterionic monomer of -COO- , for example, it can be obtained by combining the corresponding amine compound [the following chemical formula (2b)] with the molecular formula: hal-(CH 2 ) m -COOH (hal represents a halogen atom, and m represents the same definition as above.) It is obtained by a known method for preparing a carboxybetaine compound such as a method for reacting a halogenated carboxylic acid represented by (Japanese Patent Laid-Open Hei 2) No. 8-99945, Japanese Patent Laid-Open No. 7-278071, Japanese Laid-Open No. 2006-143634, Japanese Laid-Open No. 2006-143635, etc.).

再者,在上述化學式(2A)中,「-G-」係表示-SO3 -的雙性離子單體[以下化學式(2a)所示之化合物],如以下反應式所示,能夠藉由將對應的胺化合物(2b)、與磺內酯(sulton)化合物(2c)進行反應而得到。 Furthermore, in the above chemical formula (2A), " -G- " represents a zwitterionic monomer of -SO3- [a compound represented by the following chemical formula (2a)], and as shown in the following reaction formula, it can be It can be obtained by reacting the corresponding amine compound (2b) with a sultone compound (2c).

Figure 107106138-A0202-12-0019-8
Figure 107106138-A0202-12-0019-8

在上述化學式中,R1~R3、A1及m表示與前述相同的定義,p為(m-2)。 In the above chemical formula, R 1 to R 3 , A 1 and m have the same definitions as above, and p is (m-2).

胺化合物(2b)能夠以已知的方式製備而取得。 The amine compound (2b) can be prepared and obtained in a known manner.

作為前述磺內酯化合物(2c)可列舉出1,2-乙烷磺內酯、1,3-丙烷磺內酯、1,4-丁烷磺內酯、2,4-丁烷磺內酯、1,5-戊烷磺內酯。 Examples of the sultone compound (2c) include 1,2-ethane sultone, 1,3-propane sultone, 1,4-butane sultone, and 2,4-butane sultone , 1,5-pentane sultone.

這些為已知的化合物,能夠以已知的方法製備而取得。再者,在本發明中,也可以使用市售產品作為這些磺內酯化合物。 These are known compounds and can be prepared and obtained by known methods. Furthermore, in the present invention, commercially available products can also be used as these sultone compounds.

在胺化合物(2b)與磺內酯化合物(2c)的反應中,磺內酯化合物(2c)的使用量,相對於胺化合物(2b), 以0.8~1.2當量為佳,以0.9~1.1當量為較佳。藉由將磺內酯化合物(2c)的使用量設為在上述範圍內,能夠省略去除未反應物的步驟,或縮短去除所需的時間。 In the reaction between the amine compound (2b) and the sultone compound (2c), the amount of the sultone compound (2c) used is preferably 0.8 to 1.2 equivalents, preferably 0.9 to 1.1 equivalents, relative to the amine compound (2b). is better. By making the usage-amount of a sultone compound (2c) into the said range, the process of removing an unreacted material can be abbreviate|omitted, or the time required for removal can be shortened.

胺化合物(2b)與磺內酯化合物(2c)的反應可以在無溶劑的情況下進行,也可以在惰性溶劑的存在下進行。 The reaction of the amine compound (2b) and the sultone compound (2c) may be carried out without a solvent or in the presence of an inert solvent.

作為所使用的惰性溶劑,可列舉出水;四氫呋喃(tetrahydrofuran)、二甘醇二甲醚(diglyme)等的醚溶劑;乙腈(acetonitrile)、丙腈(propionitrile)等的腈溶劑;丙酮、甲乙酮(methyl ethyl ketone)等的酮溶劑;甲苯(toluene)、二甲苯(xylene)等的芳族烴溶劑;氯仿等的鹵代烴類溶劑;等惰性溶劑。 Examples of the inert solvent to be used include water; ether solvents such as tetrahydrofuran and diglyme; nitrile solvents such as acetonitrile and propionitrile; acetone and methyl ethyl ketone (methyl ethyl ketone). ethyl ketone) and other ketone solvents; toluene, xylene and other aromatic hydrocarbon solvents; chloroform and other halogenated hydrocarbon solvents; and other inert solvents.

在使用惰性溶劑的情況下,其使用量並沒有特別限定,相對於胺化合物(2b)的1質量份,通常為0.1~100質量份,以1~100質量份為佳。 When an inert solvent is used, the usage amount thereof is not particularly limited, but is usually 0.1 to 100 parts by mass, preferably 1 to 100 parts by mass, relative to 1 part by mass of the amine compound (2b).

反應溫度並沒有特別限定,通常為0~200℃,以10~100℃為佳,以20~60℃的範圍為較佳。再者,可以在常壓(大氣壓力)下進行反應,也可以在加壓條件下進行反應。 The reaction temperature is not particularly limited, but is usually 0 to 200°C, preferably 10 to 100°C, and preferably in the range of 20 to 60°C. In addition, the reaction may be carried out under normal pressure (atmospheric pressure) or under pressurized conditions.

反應時間並沒有特別限定,通常為12~332小時,以24~168小時為佳。 The reaction time is not particularly limited, but is usually 12 to 332 hours, preferably 24 to 168 hours.

從防止由於氧氣而氧化、或由於空氣中的水分而將磺內酯化合物(2c)水解造成產率下降的觀點來考量,此反應以在氮氣氣體、氬氣氣體等的惰性氣體氣氛下進行為佳。 This reaction is carried out under an inert gas atmosphere such as nitrogen gas, argon gas, etc., from the viewpoint of preventing a decrease in yield due to oxidation by oxygen or hydrolysis of the sultone compound (2c) by moisture in the air. good.

此反應的進行能夠藉由氣相色譜法(gas chromatography)、高效液相色譜法、薄層色譜法、NMR(nuclear magnetic resonance)、 IR(infrared spectroscopy)等一般的分析方法來確認。 The progress of this reaction can be confirmed by general analytical methods such as gas chromatography, high performance liquid chromatography, thin layer chromatography, NMR (nuclear magnetic resonance), and IR (infrared spectroscopy).

在反應結束後,進行在有機合成化學中一般的後處理步驟,可以根據需求,藉由再結晶、柱色譜法(column chromatography)等已知的純化方法進行純化,以分離出所需的雙性離子單體。 After the reaction is completed, general post-processing steps in organic synthetic chemistry can be carried out. According to requirements, purification can be carried out by known purification methods such as recrystallization and column chromatography to separate the desired amphoteric ionic monomer.

在上述化學式(2A)所示之雙性離子單體之中,在本發明中,從取得的容易性等觀點來考量,以使用具有以下化學式(2a)所表示的磺基甜菜鹼(sulfobetaine)構造的化合物作為雙性離子單體為佳。 Among the zwitterionic monomers represented by the above-mentioned chemical formula (2A), in the present invention, sulfobetaine represented by the following chemical formula (2a) is used from the viewpoint of ease of acquisition and the like The structured compound is preferably used as a zwitterionic monomer.

Figure 107106138-A0202-12-0021-9
Figure 107106138-A0202-12-0021-9

[在化學式(2a)中,R1、R2、R3及m,分別表示與前述相同的定義。] [In chemical formula (2a), R 1 , R 2 , R 3 and m have the same definitions as described above, respectively. ]

再者,在本發明中,作為化學式(2A)所表示的雙性離子單體的市售產品,可以直接使用,也可以根據需求純化後使用。 In addition, in the present invention, as a commercial product of the zwitterionic monomer represented by the chemical formula (2A), it may be used as it is, or it may be used after purification as required.

雙性離子高分子(α),除了由雙性離子單體(a)衍生的重複單元以外,也可以具有由可能與其共聚合的單體衍生的重複單元。 The zwitterionic polymer (α) may have a repeating unit derived from a monomer which may be copolymerized therewith, in addition to the repeating unit derived from the zwitterionic monomer (a).

在雙性離子高分子(α)中,作為由可能與雙性離子單體(a)共聚合的單體衍生的重複單元,可列舉出由(甲基)丙烯酸衍生的重複單元、由馬來(maleic)酸衍生的重複 單元、由巴豆(crotonic)酸衍生的重複單元、由衣康(itaconic)酸衍生的重複單元等的具有羧基的重複單元;由(甲基)丙烯醯胺叔丁基磺((meth)acrylamide t-butylsulfonic)酸衍生的重複單元等的具有磺基的重複單元;由(甲基)丙烯酸甲酯、甲基丙烯酸乙酯等的(甲基)丙烯酸酯衍生的重複單元;由(甲基)丙烯醯胺衍生的重複單元等。此處,(甲基)丙烯酸意指丙烯酸或甲基丙烯酸(以下亦相同)。 In the zwitterionic polymer (α), repeating units derived from monomers which may be copolymerized with the zwitterionic monomer (a) include repeating units derived from (meth)acrylic acid, (maleic) acid-derived repeating unit, repeating unit derived from crotonic acid, repeating unit derived from itaconic acid, etc. repeating unit having a carboxyl group; (Meth)acrylamide t-butylsulfonic acid-derived repeating unit having a sulfo group; repeating unit derived from (meth)acrylate such as methyl (meth)acrylate, ethyl methacrylate, etc.; Repeating units derived from (meth)acrylamide, etc. Here, (meth)acrylic acid means acrylic acid or methacrylic acid (the same applies hereinafter).

在這些材料之中,作為由可能與雙性離子單體(a)共聚合的單體衍生的重複單元,以具有親水性基團為佳。由於雙性離子高分子(α)具有這些重複單元,因此塗佈液的保存穩定性具有進一步提升的傾向,而且也變得容易得到親水性更優良的親水性層。 Among these materials, it is preferable to have a hydrophilic group as a repeating unit derived from a monomer which may be copolymerized with the zwitterionic monomer (a). Since the zwitterionic polymer (α) has these repeating units, the storage stability of the coating liquid tends to be further improved, and it becomes easier to obtain a hydrophilic layer with better hydrophilicity.

作為親水性基團,可列舉出磺基(-SO3H)、羧基(-CO2H)、膦酸基(-PO3H2)、羥基(-OH)、上述基團與鹼基反應所形成的基團等陰離子類親水性基團;取代或未取代的氨基、取代或未取代的含氮雜環基、上述基團與酸反應所形成的基團等陽離子類親水性基團;等。 Examples of the hydrophilic group include a sulfo group (-SO 3 H), a carboxyl group (-CO 2 H), a phosphonic acid group (-PO 3 H 2 ), a hydroxyl group (-OH), and the above-mentioned groups react with bases Anionic hydrophilic groups such as formed groups; cationic hydrophilic groups such as substituted or unsubstituted amino groups, substituted or unsubstituted nitrogen-containing heterocyclic groups, and groups formed by the reaction of the above groups with acids; Wait.

在這些材料之中,作為親水性基團,以陰離子類親水性基團為佳,以-SO3H、-CO2H、-PO3H2、或上述基團與鹼基反應所形成的基團為較佳。 Among these materials, as the hydrophilic group, an anionic hydrophilic group is preferred, and -SO 3 H, -CO 2 H, -PO 3 H 2 , or a group formed by reacting the above-mentioned groups with a base group is preferred.

作為用於生成「上述基團與鹼基反應所形成的基團」的鹼基,可列舉出週期表第1族或第2族的金屬之氫氧化物、或胺化合物。因此,具有「上述基團與鹼基反應所形成的基團」的重複單元,通常具有週期表第1族或第2族的金屬之 離子或銨離子,作為雙性離子單體的整體而處於電中性的狀態 Examples of the base for forming "the group formed by the reaction between the above-mentioned group and the base" include hydroxides or amine compounds of metals of Group 1 or Group 2 of the periodic table. Therefore, the repeating unit having "a group formed by the reaction of the above-mentioned group with a base" usually has an ion or ammonium ion of a metal of Group 1 or Group 2 of the periodic table, and is located in the entire zwitterionic monomer. electrically neutral state

從得到本發明的更優良的效果之觀點來考量,包含於本發明的親水性樹脂組合物中的雙性離子高分子(α),係以在分子內具有由雙性離子單體(a)衍生的重複單元、和由可能與雙性離子單體(a)共聚合的單體衍生的重複單元之共聚物為佳。 From the viewpoint of obtaining more excellent effects of the present invention, the zwitterionic polymer (α) contained in the hydrophilic resin composition of the present invention has a molecule composed of the zwitterionic monomer (a) in the molecule. Preferred are copolymers of repeating units derived, and repeating units derived from monomers that may be copolymerized with the zwitterionic monomer (a).

在雙性離子高分子(α)中,由雙性離子單體(a)衍生的重複單元的量,基於雙性離子高分子(α)的整體,通常為50~100莫耳%,以60~99莫耳%為佳,以70~95莫耳%為較佳。在雙性離子高分子(α)中,當由雙性離子單體(a)衍生的重複單元的量為50莫耳%以上時,親水性提高。再者,為99莫耳%以下時,變得更容易引入交聯點,提高與被塗佈物的附著性。 In the zwitterionic polymer (α), the amount of repeating units derived from the zwitterionic monomer (a) is usually 50 to 100 mol % based on the entire zwitterionic polymer (α), with 60 mol % ~99 mol% is preferred, and 70-95 mol% is preferred. In the zwitterionic polymer (α), when the amount of the repeating unit derived from the zwitterionic monomer (a) is 50 mol % or more, the hydrophilicity increases. In addition, when it is 99 mol% or less, it becomes easier to introduce a crosslinking point, and the adhesion to a to-be-coated object is improved.

在雙性離子高分子(α)包含具有親水性基團的重複單元的情況下,這些重複單元的量,基於雙性離子高分子(α)的整體,通常為0~50莫耳%,以1~40莫耳%為佳,以5~30莫耳%為較佳。 When the zwitterionic polymer (α) contains repeating units having a hydrophilic group, the amount of these repeating units is usually 0 to 50 mol % based on the entire zwitterionic polymer (α), with 1 to 40 mol % is preferred, and 5 to 30 mol % is preferred.

雙性離子高分子(α)可以單獨使用1種、或是組合2種以上使用。 The zwitterionic polymer (α) may be used alone or in combination of two or more.

雙性離子高分子(α)的合成方法並沒有特別限定。例如,在自由基(radical)聚合引發劑的存在下,藉由進行雙性離子單體(a)、及包含可能與所需的雙性離子單體(a)共聚合的單體之單體(單體混合物)的聚合反應,能夠合成出雙性離子高分子(α)。 The synthesis method of the zwitterionic polymer (α) is not particularly limited. For example, by conducting a zwitterionic monomer (a), and a monomer comprising a monomer that may be copolymerized with the desired zwitterionic monomer (a) in the presence of a radical polymerization initiator The polymerization reaction of (monomer mixture) can synthesize a zwitterionic polymer (α).

作為自由基聚合引發劑,可列舉出有機過氧化物或偶氮(azo)類化合物等。 As a radical polymerization initiator, an organic peroxide, an azo (azo) type compound, etc. are mentioned.

作為有機過氧化物,可列舉出月桂醯過氧化物(lauroyl peroxide)、過氧化苯甲醯(benzoyl peroxide)等的二醯基過氧化物(diacyl peroxide)類;1,1-雙(叔丁基過氧)環己烷(1,1-bis(t-butylperoxy)cyclohexane)、1,1-雙(叔丁基過氧)3,3,5-三甲基環己烷(1,1-bis(t-butylperoxy)3,3,5-trimethylcyclohexane)等的過氧縮酮(peroxy ketal)類;過氧化二碳酸二異丙酯(diisopropyl peroxydicarbonate)、過氧化二碳酸二-2-乙基己酯(di-2-ethylhexyl peroxydicarbonate)等的過氧化二碳酸酯(peroxydicarbonate)類;叔丁基過氧-2-乙基己酸酯(t-butylperoxy-2-ethylhexanoate)、叔丁基過氧化異丁酸酯(t-butylperoxyisobutyrate)等的過氧酯(peroxyester)類;等。 The organic peroxides include diacyl peroxides such as lauroyl peroxide and benzoyl peroxide; 1,1-bis(tert-butyl) peroxy)cyclohexane (1,1-bis(t-butylperoxy)cyclohexane), 1,1-bis(t-butylperoxy)3,3,5-trimethylcyclohexane(1,1- Peroxy ketal (peroxy ketal) such as bis(t-butylperoxy)3,3,5-trimethylcyclohexane); diisopropyl peroxydicarbonate (diisopropyl peroxydicarbonate), di-2-ethylhexyl peroxydicarbonate Peroxydicarbonate (peroxydicarbonate) such as ester (di-2-ethylhexyl peroxydicarbonate); t-butylperoxy-2-ethylhexanoate, t-butylperoxy-2-ethylhexanoate peroxyesters such as t-butylperoxyisobutyrate; etc.

作為偶氮化合物,可列舉出偶氮二異丁腈(2,2'-azobisisobutyronitrile)、2,2'-偶氮雙(2-甲基丁腈)(2,2'-azobis(2-methylbutyronitrile))、1,1'-偶氮雙(環己烷-1-腈)(1,1'-azobis(cyclohexane 1-carbonitrile))、2,2'-偶氮雙(2,4-二甲基戊腈)(2,2'-azobis(2,4-dimethylvaleronitrile))、2,2'-偶氮二(2,4-二甲基-4-甲氧基戊腈)2,2'-azobis(2,4-dimethyl-4-methoxyvaleronitrile)、二甲基2,2'-偶氮雙(2-甲基丙酸酯)(dimethyl 2,2'-azobis(2-methylpropionate))、2,2'-偶氮雙(N-丁基-2-甲基丙醯胺)(2,2'-azobis(N-butyl-2-methylpropionamide))、二甲基1,1'-偶氮雙(1-環己烷羧酸酯)(dimethyl 1,1'-azobis(1-cyclohexanecarboxylate))等的 油溶性偶氮聚合引發劑;4,4'-偶氮雙(4-氰基戊酸)(4,4'-azobis(4-cyanovaleric acid))、2,2'-偶氮雙(2-羥甲基丙腈)、2,2'-偶氮雙[2-(2-咪唑啉-2-基)丙烷](2,2'-azobis[2-(2-imidazolin-2-yl)propane])、2,2'-偶氮二(2,4-二甲基-4-甲氧基戊腈)(2,2'-azobis(2-hydroxymethylpropionitrile))、2,2'-偶氮雙[2-(2-咪唑啉-2-基)丙烷]二鹽酸鹽(2,2'-azobis(2,4-dimethyl-4-methoxyvaleronitrile))、2,2'-偶氮雙[2-(2-咪唑啉-2-基)丙烷]二磺酸鹽二水合物(2,2'-azobis[2-(2-imidazolin-2-yl)propane]dihydrochloride)、2,2'-偶氮雙(2-甲基丙脒)二鹽酸鹽(2,2'-azobis(2-methylpropionamidine)dihydrochloride)、2,2'-偶氮雙[N-(2-羧乙基)-2-甲基丙脒]四水合物(2,2'-azobis[N-(2-carboxyethyl)-2-methylpropionamidine]tetrahydrate)、2,2'-偶氮雙[2-甲基-N-(2-羥乙基)丙醯胺](2,2'-azobis[2-methyl-N-(2-hydroxyethyl)propionamide])等的水溶性偶氮聚合引發劑;等。 As the azo compound, 2,2'-azobisisobutyronitrile (2,2'-azobisisobutyronitrile), 2,2'-azobis(2-methylbutyronitrile) (2,2'-azobis(2-methylbutyronitrile) )), 1,1'-azobis(cyclohexane-1-carbonitrile)(1,1'-azobis(cyclohexane 1-carbonitrile)), 2,2'-azobis(2,4-dimethylene) valeronitrile) (2,2'-azobis(2,4-dimethylvaleronitrile)), 2,2'-azobis(2,4-dimethyl-4-methoxyvaleronitrile) 2,2'- azobis(2,4-dimethyl-4-methoxyvaleronitrile), dimethyl 2,2'-azobis(2-methylpropionate) (dimethyl 2,2'-azobis(2-methylpropionate)), 2, 2'-azobis(N-butyl-2-methylpropionamide) (2,2'-azobis(N-butyl-2-methylpropionamide)), dimethyl 1,1'-azobis( Oil-soluble azo polymerization initiators such as 1-cyclohexanecarboxylate (dimethyl 1,1'-azobis(1-cyclohexanecarboxylate)); 4,4'-azobis(4-cyanovaleric acid) ( 4,4'-azobis(4-cyanovaleric acid)), 2,2'-azobis(2-hydroxymethylpropionitrile), 2,2'-azobis[2-(2-imidazoline-2 -yl)propane](2,2'-azobis[2-(2-imidazolin-2-yl)propane]), 2,2'-azobis(2,4-dimethyl-4-methoxy Valeronitrile) (2,2'-azobis(2-hydroxymethylpropionitrile)), 2,2'-azobis[2-(2-imidazolin-2-yl)propane]dihydrochloride (2,2'- azobis(2,4-dimethyl-4-methoxyvaleronitrile)), 2,2'-azobis[2-(2-imidazolin-2-yl)propane]disulfonate dihydrate (2,2'- azobis[2-(2-imidazolin-2-yl)propane]dihydrochloride), 2,2'-azobis(2-methylpropionamidine) dihydrochloride (2,2'-azobis(2-methylpropionamidine) dihydrochloride), 2,2'-azobis[N-(2-carboxyethyl)-2-methylpropionamidine]tetrahydrate (2,2'-azobis [N-(2-carboxyethyl)-2-methylpropionamidine]tetrahydrate), 2,2'-azobis[2-methyl-N-(2-hydroxyethyl)propionamidine](2,2'-azobis [2-methyl-N-(2-hydroxyethyl)propionamide]) and other water-soluble azo polymerization initiators; etc.

上述材料可以單獨使用1種、或是組合2種以上使用。 The above-mentioned materials may be used alone or in combination of two or more.

自由基聚合引發劑的使用量,相對於在聚合反應中使用的1莫耳單體(然而,在共聚物的情況下,則為單體的總莫耳數),通常為0.0001~0.1000莫耳,以0.0005~0.0050莫耳為佳。 The amount of the radical polymerization initiator to be used is usually 0.0001 to 0.1000 mol relative to 1 mol of the monomer used in the polymerization reaction (however, in the case of a copolymer, it is the total mol of the monomer) , preferably 0.0005~0.0050 mol.

自由基聚合反應的反應條件,只要可進行所需的聚合反應,並沒有特別限定。加熱溫度通常為40~150℃,反應時間可以適當地設定在1分鐘至24小時的範圍內。 The reaction conditions of the radical polymerization reaction are not particularly limited as long as the desired polymerization reaction can proceed. The heating temperature is usually 40 to 150° C., and the reaction time can be appropriately set in the range of 1 minute to 24 hours.

所得到的反應溶液,可以直接用於製備親水性組合物,也可以根據一般方法將雙性離子高分子分離並純化。 The obtained reaction solution can be directly used to prepare a hydrophilic composition, or the zwitterionic polymer can be separated and purified according to a general method.

親水性層也可以含有離子性化合物(但排除雙性離子高分子(α))。 The hydrophilic layer may contain an ionic compound (however, zwitterionic polymer (α) is excluded).

作為離子性化合物,以具有碳原子數為0~10的陽離子之離子性化合物為佳,以具有碳原子數為0的陽離子之離子性化合物為較佳。 As the ionic compound, an ionic compound having a cation having 0 to 10 carbon atoms is preferred, and an ionic compound having a cation having 0 carbon atoms is preferred.

作為具有碳原子數為0~10的陽離子之離子性化合物,可列舉出以下化學式(12)~(15)所表示的化合物。 Examples of the ionic compound having a cation having 0 to 10 carbon atoms include compounds represented by the following chemical formulae (12) to (15).

[化學14]MX (12) M’X2 (13) M2X’ (14) M’X’ (15) [Chemistry 14] MX (12) M'X 2 (13) M 2 X' (14) M'X' (15)

在化學式(12)~(15)中,M表示碳原子數為0~10之1價的陽離子,M’表示碳原子數為0~10之2價的陽離子,X表示1價的陰離子,X’表示2價的陰離子。 In the chemical formulae (12) to (15), M represents a monovalent cation having 0 to 10 carbon atoms, M' represents a divalent cation having 0 to 10 carbon atoms, X represents a monovalent anion, and X represents a monovalent cation. ' represents a divalent anion.

作為M,可列舉出鈉離子、鉀離子等的鹼金屬離子;銨離子(NH4 +);1級胺離子;2級胺離子;3級胺離子;4級胺離子;等。 Examples of M include alkali metal ions such as sodium ions and potassium ions; ammonium ions (NH 4 + ); primary amine ions; secondary amine ions; tertiary amine ions;

作為M’,可列舉出鈣離子等的鹼土金屬;鎂離子;等。 Examples of M' include alkaline earth metals such as calcium ions; magnesium ions; and the like.

作為X,可列舉出氯離子、溴離子等的鹵化物離子;碳酸氫離子;硝酸離子;等。 Examples of X include halide ions such as chloride ions and bromide ions; hydrogen carbonate ions; nitrate ions; and the like.

作為X’,可列舉出碳酸離子、硫酸離子等。 Examples of X' include carbonate ions, sulfate ions, and the like.

作為具有碳原子數為0的陽離子之離子性化合 物,可列舉出NaCl、Na2CO3、NaHCO3、Na2SO4、NaNO3、KCl、K2CO3、KHCO3、K2SO4、KNO3等的鹼金屬鹽;MgCl2、MgSO4等的鎂鹽;CaCl2等的鹼土金屬;NH4Cl等的銨鹽;等。 Examples of the ionic compound having a cation having 0 carbon atoms include NaCl, Na 2 CO 3 , NaHCO 3 , Na 2 SO 4 , NaNO 3 , KCl, K 2 CO 3 , KHCO 3 , K 2 SO 4 , Alkali metal salts such as KNO3 ; magnesium salts such as MgCl2 , MgSO4 ; alkaline earth metals such as CaCl2 ; ammonium salts such as NH4Cl ;

作為具有碳原子數為1~10的陽離子之離子性化合物,可列舉出[(CH3)NH3]Cl、[(CH3)2NH2]Cl、[(CH3)3NH]Cl、[(CH3)4N]Cl等。 Examples of the ionic compound having a cation having 1 to 10 carbon atoms include [(CH 3 )NH 3 ]Cl, [(CH 3 ) 2 NH 2 ]Cl, [(CH 3 ) 3 NH]Cl, [(CH 3 ) 4 N]Cl, etc.

離子化合物可以單獨使用1種、或是組合2種以上使用。 The ionic compound may be used alone or in combination of two or more.

親水性層中的離子性化合物的含量,基於親水性層的整體,通常為0~70質量%,以2~50質量%為佳,以5~20質量%為較佳。 The content of the ionic compound in the hydrophilic layer is usually 0 to 70% by mass, preferably 2 to 50% by mass, and more preferably 5 to 20% by mass, based on the entire hydrophilic layer.

親水性層也可以包含雙性離子高分子(α)以外的聚合物。 The hydrophilic layer may contain polymers other than the zwitterionic polymer (α).

作為雙性離子高分子(α)以外的聚合物,可列舉出聚酯(polyester)類聚合物、乙烯-乙烯醇(ethylene-vinyl alcohol)共聚物、乙烯醇單聚物、(甲基)丙烯((meth)acrylic)酸類聚合物、(甲基)丙烯酸酯類聚合物、聚氨酯(urethane)類聚合物、丙烯酸-聚氨酯類聚合物、聚醯胺(polyamide)樹脂、聚烯烴(polyolefin)樹脂、纖維素(cellulose)類樹脂等。 Examples of polymers other than the zwitterionic polymer (α) include polyester-based polymers, ethylene-vinyl alcohol copolymers, vinyl alcohol monomers, and (meth)propylene ((meth)acrylic) acid polymer, (meth)acrylate polymer, urethane polymer, acrylic-urethane polymer, polyamide resin, polyolefin resin, Cellulose (cellulose) resins, etc.

雙性離子高分子(α)以外的聚合物,可以單獨使用1種、或是組合2種以上使用。 Polymers other than the zwitterionic polymer (α) may be used alone or in combination of two or more.

在親水性層含有雙性離子高分子(α)以外的聚合物的情況下,其含量,基於親水性層的整體,通常為1~40質量%,以2~20質量%為佳。 When the hydrophilic layer contains a polymer other than the zwitterionic polymer (α), the content thereof is usually 1 to 40% by mass, preferably 2 to 20% by mass, based on the entire hydrophilic layer.

親水性層也可以形成交聯構造。在親水性層中的交聯構造,例如可以藉由使用交聯劑而有效地形成。 The hydrophilic layer may also form a cross-linked structure. The cross-linked structure in the hydrophilic layer can be effectively formed, for example, by using a cross-linking agent.

所謂交聯劑,係指與親水性層中的聚合物成分反應而形成交聯構造的化合物。具有交聯構造的親水性層有耐水性更優良的傾向。 The crosslinking agent refers to a compound that reacts with the polymer component in the hydrophilic layer to form a crosslinked structure. A hydrophilic layer having a crosslinked structure tends to be more excellent in water resistance.

作為交聯劑,可列舉出環氧類交聯劑、異氰酸酯(isocyanate)類交聯劑、胺類交聯劑、三聚氰胺(melamine)類交聯劑、氮丙啶(aziridine)類交聯劑、肼(hydrazine)類交聯劑、醛(aldehyde)類交聯劑、噁唑啉(oxazoline)類交聯劑、金屬醇鹽(alkoxide)類交聯劑、金屬螯合(chelate)類交聯劑、金屬鹽類交聯劑、銨(ammonium)鹽型交聯劑等。 Examples of the crosslinking agent include epoxy-based crosslinking agents, isocyanate-based crosslinking agents, amine-based crosslinking agents, melamine-based crosslinking agents, aziridine-based crosslinking agents, Hydrazine-type cross-linking agent, aldehyde-type cross-linking agent, oxazoline-type cross-linking agent, metal alkoxide-type cross-linking agent, metal chelate-type cross-linking agent , metal salt crosslinking agent, ammonium salt type crosslinking agent, etc.

在不損害本發明的效果之範圍內,親水性層也可以含有添加劑。 The hydrophilic layer may contain additives within a range that does not impair the effects of the present invention.

作為添加劑,可列舉出界面活性劑、保濕劑、黏度調整劑、染料等。 As an additive, a surfactant, a moisturizing agent, a viscosity modifier, a dye, etc. are mentioned.

親水性層的厚度通常為1~1000nm,以2~800nm為佳。 The thickness of the hydrophilic layer is usually 1 to 1000 nm, preferably 2 to 800 nm.

親水性層的形成方法並沒有特別限定。例如,可以根據後續描述的方法形成親水性層。 The method of forming the hydrophilic layer is not particularly limited. For example, the hydrophilic layer may be formed according to a method described later.

[親水性構造體] [Hydrophilic structure]

本發明的親水性構造體係具有前述基底、前述中間層及前述親水性層依序層壓所形成的層狀構造之親水性構造體。 The hydrophilic structure system of the present invention has a hydrophilic structure of a layered structure formed by sequentially laminating the aforementioned substrate, the aforementioned intermediate layer, and the aforementioned hydrophilic layer.

本發明的親水性構造體的親水性層具有優良的親水性。 The hydrophilic layer of the hydrophilic structure of the present invention has excellent hydrophilicity.

在本發明的親水性構造體的親水性層之親水性層上方,滴下2μL的離子交換水之後,使用接觸角測量裝置,測量滴下3秒後的水滴之水接觸角(清洗前的水接觸角),水接觸角通常為70°以下,以60°以下為佳,以50°以下為更佳。並沒有特定的下限值,但通常是3°以上。 On the hydrophilic layer of the hydrophilic structure of the present invention, after dropping 2 μL of ion-exchanged water, the contact angle of water droplets after dropping for 3 seconds (water before washing) was measured using a contact angle measuring device. Contact angle), the water contact angle is usually 70° or less, preferably 60° or less, more preferably 50° or less. There is no specific lower limit, but it is usually 3° or more.

本發明的親水性構造體的親水性層具有優良的耐汙染性。特別是,本發明的親水性構造體的親水性層難以被油性汙垢附著。 The hydrophilic layer of the hydrophilic structure of the present invention has excellent stain resistance. In particular, the hydrophilic layer of the hydrophilic structure of the present invention is difficult to adhere to oily dirt.

本發明的親水性構造體的親水性層與中間層的附著性優良。可認為這是由於在中間層與親水性層之間的界面處,矽氧烷類高分子和雙性離子高分子(α)互相纏結所造成的。 The hydrophilic structure of the present invention has excellent adhesion between the hydrophilic layer and the intermediate layer. This is considered to be due to the entanglement of the siloxane-based polymer and the zwitterionic polymer (α) at the interface between the intermediate layer and the hydrophilic layer.

本發明的親水性構造體的親水性層具有優良的耐水性。在本發明中,所謂耐水性意指,即使與水接觸之後也仍維持初始的親水性。 The hydrophilic layer of the hydrophilic structure of the present invention has excellent water resistance. In the present invention, the term "water resistance" means that the initial hydrophilicity is maintained even after contact with water.

特別是,在本發明的親水性構造體中,可能有由於與水接觸因而更加提高親水性層的親水性的情形。如前述,可認為此現象也是由於矽氧烷類高分子和雙性離子高分子(α)互相纏結所造成的。 In particular, in the hydrophilic structure of the present invention, the hydrophilicity of the hydrophilic layer may be further enhanced by contact with water. As described above, it is considered that this phenomenon is also caused by the entanglement of the siloxane-based polymer and the zwitterionic polymer (α).

亦即,可認為是由於與水接觸而將存在於親水性層的表面部分的幾乎未纏結之聚合鏈去除,因此矽氧烷類高分子和雙性離子高分子(α)強烈纏結的區域從表面露出。然後,可認為是由於此區域露出使得親水性層的親水性更加提高。 That is, it is considered that the siloxane-based polymer and the zwitterionic polymer (α) are strongly entangled because the polymer chains that are hardly entangled in the surface portion of the hydrophilic layer are removed by contact with water. The area is exposed from the surface. Then, it is considered that the hydrophilicity of the hydrophilic layer is further improved due to the exposure of this region.

本發明的親水性構造體的親水性層的表面,使用去離子水清洗並乾燥之後,利用與上述相同的方法測量水接觸角(清洗 前的水接觸角),水接觸角通常為40°以下,以30°以下為佳,以10°以下為更佳。並沒有特定的下限值,但通常是3°以上。 The surface of the hydrophilic layer of the hydrophilic structure of the present invention is washed with deionized water and dried, and then the water contact angle (water contact angle before washing) is measured by the same method as above. The water contact angle is usually 40° or less. , preferably below 30°, more preferably below 10°. There is no specific lower limit, but it is usually 3° or more.

作為本發明的親水性構造體,可列舉出防霧膜、防汙膜等功能性膜。 As the hydrophilic structure of the present invention, functional films such as antifogging films and antifouling films can be exemplified.

再者,本發明的親水性構造體並不限定於膜層狀產品。例如,本發明的親水性構造體,可以用於鏡子、顯示器、看板、導覽板、道路標誌、建築物的外壁、窗玻璃等的需要親水性的產品。 In addition, the hydrophilic structure of this invention is not limited to a film layer product. For example, the hydrophilic structure of the present invention can be used for products that require hydrophilicity, such as mirrors, displays, signboards, guide boards, road signs, outer walls of buildings, and window glass.

本發明的親水性構造體的製造方法並沒有特別限定。例如,本發明的親水性構造體可以藉由包括以下步驟(1)~(3)的方法來製造。 The manufacturing method of the hydrophilic structure of this invention is not specifically limited. For example, the hydrophilic structure of the present invention can be produced by a method including the following steps (1) to (3).

步驟(1):在基底上塗佈包含了可水解的有機矽化合物的塗佈液(含有可水解的有機矽化合物的塗佈液),藉由將所得到的塗膜中的可水解的有機矽化合物水解縮聚,以形成含有矽氧烷類高分子的塗膜;步驟(2):在前述含有矽氧烷類高分子的塗膜完全乾燥的狀態下、或在溶劑殘留於前述塗膜中的狀態下,在前述塗膜上,塗佈含有不具有矽原子的雙性離子高分子且不含有具有矽原子的雙性離子高分子之塗佈液(A),以形成前述塗佈液(A)的塗膜;步驟(3):將具有在步驟(2)所得到的層壓構造之構造體中未乾燥狀態的塗膜乾燥。 Step (1): Coating a coating solution containing a hydrolyzable organosilicon compound (a coating solution containing a hydrolyzable organosilicon compound) on a substrate, by applying the hydrolyzable organic The silicon compound is hydrolyzed and polycondensed to form a coating film containing siloxane-based polymers; step (2): in the state where the coating film containing the siloxane-based polymer is completely dried, or the solvent remains in the coating film In this state, on the aforementioned coating film, a coating solution (A) containing a zwitterionic polymer having no silicon atoms and a zwitterionic polymer having no silicon atoms is applied to form the aforementioned coating solution (A). The coating film of A); step (3): drying the coating film in the undried state in the structure having the laminated structure obtained in the step (2).

在步驟(1),在前述基底上,塗佈前述含有可水解的有機矽化合物的塗佈液,藉由將所得到的塗膜中的可水解的有機矽化合物水解縮聚,以形成含有矽氧烷類高分子的塗膜。 In step (1), the coating solution containing the hydrolyzable organosilicon compound is applied on the substrate, and the hydrolyzable organosilicon compound in the obtained coating film is hydrolyzed and polycondensed to form a hydrolyzable organosilicon compound. Alkane polymer coating.

此塗佈液中所含的溶劑,只要能夠溶解或分散可 水解的有機矽化合物等的成分即可,並沒有特別限定。 The solvent contained in the coating liquid is not particularly limited as long as it can dissolve or disperse components such as a hydrolyzable organosilicon compound.

作為溶劑,可列舉出水、與水混溶的有機溶劑等。 As a solvent, water, a water-miscible organic solvent, etc. are mentioned.

作為與水混溶的有機溶劑,可列舉出甲醇、乙醇、正丙醇及異丙醇等的醇類;丙酮、甲基乙基酮(methyl ethyl ketone)等的酮類;乙二醇、二甘醇、丙二醇等的聚亞烷基二醇(polyalkylene glycol)類;聚亞烷基二醇的烷基醚(alkyl ether)類;N-甲基-2-吡咯烷酮(N-methyl-2-pyrrolidone)等的內醯胺(lactam)類;等。 Examples of the water-miscible organic solvent include alcohols such as methanol, ethanol, n-propanol, and isopropanol; ketones such as acetone and methyl ethyl ketone; Polyalkylene glycols such as ethylene glycol and propylene glycol; alkyl ethers of polyalkylene glycols; N-methyl-2-pyrrolidone ) etc. of lactams; etc.

這些溶劑可以單獨使用1種,或是組合2種以上使用。 These solvents may be used alone or in combination of two or more.

在這些材料之中,以水和醇類的混合溶劑作為溶劑為佳。 Among these materials, a mixed solvent of water and alcohol is preferable as the solvent.

溶劑的含量,以將含有可水解的有機矽化合物的塗佈液之固體成分濃度調整為0.1~30.0質量%為佳,以0.5~10.0質量%為較佳。 The content of the solvent is preferably adjusted to the solid content concentration of the coating liquid containing the hydrolyzable organosilicon compound to be 0.1 to 30.0 mass %, more preferably 0.5 to 10.0 mass %.

前述塗佈液的塗佈方法並沒有特別限定。例如,能夠使用棒塗(bar coat)法、刮刀塗佈(knife coat)法、輥塗(roll coat)法、刮刀塗佈(blade coat)法、模具塗佈(die coat)法、凹版塗佈(gravure coat)法等,將塗佈液塗佈於基底上。 The coating method of the said coating liquid is not specifically limited. For example, bar coat method, knife coat method, roll coat method, blade coat method, die coat method, gravure coat method can be used (gravure coating) method, etc., the coating liquid is applied on the substrate.

將可水解的有機矽化合物水解縮聚的方法並沒有特別限定。根據需要能夠藉由使用催化劑或加熱,以促進水解縮聚反應。 The method of hydrolyzing and polycondensing the hydrolyzable organosilicon compound is not particularly limited. The hydrolysis polycondensation reaction can be accelerated by using a catalyst or heating as required.

在水解縮聚反應中,反應溫度通常為40~110℃,以50~100℃為佳。 In the hydrolysis polycondensation reaction, the reaction temperature is usually 40 to 110°C, preferably 50 to 100°C.

反應時間(加熱時間),通常為10秒~3分鐘,以30秒~2分鐘為佳。 The reaction time (heating time) is usually 10 seconds to 3 minutes, preferably 30 seconds to 2 minutes.

在加熱進行水解縮聚反應的情況下,通常藉由此熱處理也進行塗膜的乾燥。如後續所述,可以在塗膜完全乾燥之後,進行下一個步驟(2),也可以在塗膜尚未完全乾燥的狀態(溶劑殘留於塗膜中的狀態)下,進行下一個步驟(2)。藉由控制在進行步驟(2)時塗膜的乾燥狀態,能夠調整矽氧烷類高分子和雙性離子高分子(α)的纏結程度。 When the hydrolysis polycondensation reaction is carried out by heating, drying of the coating film is usually also performed by this heat treatment. As described later, the next step (2) may be performed after the coating film is completely dried, or the next step (2) may be performed in a state where the coating film is not completely dried (a state in which the solvent remains in the coating film). . The degree of entanglement between the siloxane-based polymer and the zwitterionic polymer ( α ) can be adjusted by controlling the drying state of the coating film during the step (2).

在步驟(2),在含有前述矽氧烷類高分子的塗膜完全乾燥的狀態下、或前述塗膜中殘留溶劑的狀態下,在前述塗膜上,塗佈含有不具有前述矽原子的雙性離子高分子且不含有具有矽原子的雙性離子高分子之塗佈液(A),以形成前述塗佈液(A)的塗膜。 In step (2), in a state in which the coating film containing the siloxane-based polymer is completely dried, or in a state in which the solvent remains in the coating film, on the coating film, a coating film containing no silicon atom is applied. The coating liquid (A) of the zwitterionic polymer which does not contain the zwitterionic polymer having a silicon atom is used to form the coating film of the aforementioned coating liquid (A).

藉由在含有矽氧烷類高分子的塗膜完全乾燥的狀態下塗覆塗佈液(A),能夠得到中間層與親水性層之間有明顯的邊界之親水性構造體(亦即,矽氧烷類高分子和雙性離子高分子(α)彼此纏結的區域很薄之親水性構造體)。 By applying the coating solution (A) in a state where the coating film containing the siloxane-based polymer is completely dried, a hydrophilic structure (that is, a silicon A hydrophilic structure in which the oxane-based polymer and the zwitterionic polymer ( α ) are entangled with each other in a thin region).

另一方面,在含有矽氧烷類高分子的塗膜中殘留溶劑的狀態下塗覆塗佈液(A),能夠得到中間層與親水性層之間無明顯的邊界之親水性構造體(亦即,矽氧烷類高分子和雙性離子高分子(α)彼此纏結的區域很厚之親水性構造體)。 On the other hand, by applying the coating solution (A) with the solvent remaining in the coating film containing the siloxane-based polymer, a hydrophilic structure (also known as a hydrophilic structure) having no clear boundary between the intermediate layer and the hydrophilic layer can be obtained. That is, the siloxane-based polymer and the zwitterionic polymer ( α ) are entangled with each other in a thick hydrophilic structure).

如以上所述,矽氧烷類高分子和雙性離子高分子(α)的纏結程度會影響親水性層的附著性和耐水性。 As described above, the degree of entanglement between the siloxane-based polymer and the zwitterionic polymer ( α ) affects the adhesion and water resistance of the hydrophilic layer.

因此,在開始進行步驟(2)時,藉由適當地控制含有矽氧烷類高分子的塗膜的乾燥狀態,能夠有效地形成具有所需的特性之親水性層。 Therefore, by appropriately controlling the drying state of the coating film containing the siloxane-based polymer at the beginning of the step (2), a hydrophilic layer having desired characteristics can be efficiently formed.

塗佈液(A)內所包含的溶劑,只要能夠溶解或分散不具有矽原子的雙性離子高分子等的成分即可,並沒有特別限定。 The solvent contained in the coating liquid (A) is not particularly limited as long as it can dissolve or disperse components such as a zwitterionic polymer having no silicon atom.

作為溶劑,可列舉出水、與水混溶的有機溶劑等。 As a solvent, water, a water-miscible organic solvent, etc. are mentioned.

作為與水混溶的有機溶劑,可列舉出甲醇、乙醇、正丙醇及異丙醇等的醇類;丙酮、甲基乙基酮等的酮類;乙二醇、二甘醇、丙二醇等的聚亞烷基二醇類;聚亞烷基二醇的烷基醚類;N-甲基-2-吡咯烷酮等的內醯胺類;等。 Examples of the water-miscible organic solvent include alcohols such as methanol, ethanol, n-propanol, and isopropanol; ketones such as acetone and methyl ethyl ketone; ethylene glycol, diethylene glycol, propylene glycol, and the like. polyalkylene glycols; alkyl ethers of polyalkylene glycols; lactamides such as N-methyl-2-pyrrolidone; etc.

這些溶劑可以單獨使用1種、或是組合2種以上使用。 These solvents may be used alone or in combination of two or more.

在這些材料之中,以水和醇類的混合溶劑作為溶劑為佳。 Among these materials, a mixed solvent of water and alcohol is preferable as the solvent.

溶劑的含量,以將塗佈液(A)之固體成分濃度調整為0.1~20質量%為佳,以0.5~10質量%為較佳。 The content of the solvent is preferably adjusted to 0.1 to 20 mass %, more preferably 0.5 to 10 mass %, by adjusting the solid content concentration of the coating liquid (A).

前述塗佈液的塗佈方法並沒有特別限定。例如,可以藉由相同於作為含有可水解的有機矽化合物的塗佈液所示之塗佈方法來塗覆塗佈液(A)。 The coating method of the said coating liquid is not specifically limited. For example, the coating liquid (A) can be applied by the same coating method shown as the coating liquid containing the hydrolyzable organosilicon compound.

在步驟(3)中,將在步驟(2)中所得到的具有層壓構造之構造體中未乾燥狀態的塗膜乾燥。 In the step (3), the coating film in the undried state in the structure having the laminated structure obtained in the step (2) is dried.

此處,所謂未乾燥狀態的塗膜,在含有矽氧烷類高分子的塗膜完全乾燥的狀態進行步驟(2)的情況下,稱為「由塗佈液(A)得到的塗膜」,而在含有矽氧烷類高分子的塗膜中殘留溶劑的狀態進行步驟(2)的情況下,則稱為「含有矽氧烷類高分子的塗膜」和「由塗佈液(A)得到的塗膜」。 Here, the coating film in the undried state is referred to as "the coating film obtained from the coating liquid (A)" when the step (2) is performed in a state where the coating film containing the siloxane-based polymer is completely dried. , and in the case of performing step (2) in a state where the solvent remains in the coating film containing the siloxane-based polymer, it is called "the coating film containing the siloxane-based polymer" and "the coating solution (A) ) obtained coating film”.

將塗膜乾燥的方法並沒有特別限定。例如,可以使用熱風乾燥、熱輥乾燥、紅外線照射等先前已知的乾燥方法。 The method of drying the coating film is not particularly limited. For example, previously known drying methods such as hot air drying, hot roll drying, and infrared irradiation can be used.

乾燥條件,可以根據中間層的狀態等適當地決定。 The drying conditions can be appropriately determined according to the state of the intermediate layer and the like.

乾燥溫度,通常為60~130℃,以70~120℃為佳。 The drying temperature is usually 60~130℃, preferably 70~120℃.

乾燥時間(加熱時間),通常為10秒至3分鐘,以30秒至2分鐘為佳。 The drying time (heating time) is usually 10 seconds to 3 minutes, preferably 30 seconds to 2 minutes.

[實施例] [Example]

以下,舉出實施例以更詳細地說明本發明。然而,本發明並不以任何方式限定於以下的實施例。 Hereinafter, the present invention will be described in more detail by way of examples. However, the present invention is not limited to the following examples in any way.

除非特別說明,否則每個範例中的份數及%,均以質量為基準。 Unless otherwise specified, the parts and % in each example are based on mass.

[質量平均分子量(Mw)] [Mass average molecular weight (Mw)]

雙性離子高分子的質量平均分子量(Mw),可在以下的條件之下採用凝膠滲透色譜法(Gel Permeation Chromatography,GPC)而求得。 The mass average molecular weight (Mw) of the zwitterionic polymer can be obtained by gel permeation chromatography (GPC) under the following conditions.

裝置:HLC-8320 GPC/UV-8320(Tosoh股份公司製造) Device: HLC-8320 GPC/UV-8320 (manufactured by Tosoh Co., Ltd.)

柱:TSKgel GMPWXL(Tosoh股份公司製造)×2 Column: TSKgel GMPW XL (manufactured by Tosoh Co., Ltd.) × 2

檢測器:HLC-8320 GPC內置RI檢測器/UV-8320(Tosoh股份公司製造) Detector: HLC-8320 GPC built-in RI detector/UV-8320 (made by Tosoh Co., Ltd.)

柱溫:40℃ Column temperature: 40℃

樣品濃度:1.0g/L(高分子成分濃度) Sample concentration: 1.0g/L (polymer component concentration)

注入量:100μL Injection volume: 100 μL

洗脫液:0.2M NaNO3水溶液 Eluent: 0.2M NaNO in water

流速:1.0mL/分鐘 Flow rate: 1.0mL/min

分子量標記:標準聚環氧乙烷、聚乙二醇 Molecular weight markers: standard polyethylene oxide, polyethylene glycol

[製造例1]雙性離子單體(1)的合成 [Production Example 1] Synthesis of Zwitterionic Monomer (1)

在附有攪拌裝置的反應容器內加入100份的N-[3-(二甲基氨基)丙基]丙烯醯胺、0.4份的二丁基羥基甲苯、383份的丙酮,並將內容物一邊攪拌一邊慢慢地滴入72份的丙烷磺內酯。之後,將內容物在25℃下攪拌24小時,藉由過濾收集沉澱的白色固體,並將其乾燥,以獲得雙性離子單體(1)(N-丙烯醯氨基丙基-N,N-二甲基銨丙基-α-亞磺醯甜菜鹼)。 100 parts of N-[3-(dimethylamino)propyl]acrylamide, 0.4 parts of dibutylhydroxytoluene, and 383 parts of acetone were added to a reaction vessel with a stirring device, and the contents were put aside. While stirring, 72 parts of propane sultone was gradually added dropwise. After that, the contents were stirred at 25° C. for 24 hours, and the precipitated white solid was collected by filtration and dried to obtain zwitterionic monomer (1) (N-acrylamidopropyl-N,N- Dimethylammoniumpropyl-α-sulfinylbetaine).

[製造例2]雙性離子單體(2)的合成 [Production Example 2] Synthesis of Zwitterionic Monomer (2)

在附有攪拌裝置的反應容器內加入100份的N-[3-(二甲基氨基)丙基]甲基丙烯醯胺、0.4份的二丁基羥基甲苯、383份的丙酮,並將內容物一邊攪拌一邊慢慢地滴入72份的丙烷磺內酯。之後,將內容物在25℃下攪拌24小時,藉由過濾收集沉澱的白色固體,並將其乾燥,以獲得雙性離子單體(2)(N-甲基丙烯醯氨基丙基-N,N-二甲基銨丙基-α-亞磺醯甜菜鹼)。 100 parts of N-[3-(dimethylamino)propyl]methacrylamide, 0.4 parts of dibutylhydroxytoluene, and 383 parts of acetone were added to a reaction vessel with a stirring device, and the contents were mixed. 72 parts of propane sultone was slowly dropped into the mixture while stirring. After that, the contents were stirred at 25° C. for 24 hours, and the precipitated white solid was collected by filtration and dried to obtain zwitterionic monomer (2) (N-methacrylamidopropyl-N, N-dimethylammoniumpropyl-α-sulfinylbetaine).

[製造例3]~[製造例8]雙性離子高分子的合成 [Production Example 3] to [Production Example 8] Synthesis of Zwitterionic Polymer

在附有攪拌裝置的反應容器內加入各個單體,使其具有如第1表所示之莫耳比,相對於各個單體的合計量為100份,聚合引發劑(和光純藥工業股份公司製造,產品名稱為「V-501」,4,4'-偶氮雙(4-氰基戊酸))為0.19份,加入第1表所示的稀釋溶劑,將氮氣引入反應容器內同時在25℃下攪拌30分鐘。之後,將反應系統升溫至80℃,並直接攪拌16小時以進行聚合反應,得到含有各個雙性離子高分子的固體成分濃度為30%之溶液。第1表標示出所得到的各個雙性離子高分子的質量平均分子量。第1表中的縮寫等如以下所示。 Each monomer was put into a reaction vessel equipped with a stirring device so as to have the molar ratio shown in Table 1, and the total amount of each monomer was 100 parts, and a polymerization initiator (Wako Pure Chemical Industries, Ltd. Manufacturing, product name is "V-501", 0.19 part of 4,4'-azobis(4-cyanovaleric acid)) was added, the diluting solvent shown in Table 1 was added, and nitrogen gas was introduced into the reaction vessel while the Stir at 25°C for 30 minutes. Then, the temperature of the reaction system was raised to 80° C., and the polymerization reaction was carried out by stirring for 16 hours, and a solution containing each zwitterionic polymer with a solid content concentration of 30% was obtained. Table 1 shows the mass average molecular weight of each zwitterionic polymer obtained. Abbreviations and the like in Table 1 are as follows.

另外,關於製造例7和製造例8的雙性離子高分子,由於在 聚合反應期間發生沉澱,因此省略了分子量的測量,如後續所述。 In addition, regarding the zwitterionic polymers of Production Example 7 and Production Example 8, since precipitation occurred during the polymerization reaction, the measurement of molecular weight was omitted, as described later.

<單體> <single body>

SBAAm:(N-丙烯醯氨丙基-N,N-二甲基銨丙基-α-亞磺醯甜菜鹼) SBAAm: (N-acrylamidopropyl-N,N-dimethylammoniumpropyl-α-sulfinylbetaine)

SBMAAm:(N-甲基丙烯醯氨基丙基-N,N-二甲基銨丙基-α-亞磺醯基甜菜鹼) SBMAAm: (N-methacrylamidopropyl-N,N-dimethylammoniumpropyl-α-sulfinylbetaine)

ATBS:丙烯醯胺叔丁基磺酸 ATBS: acrylamide tert-butylsulfonic acid

AAc:丙烯酸 AAc: Acrylic

VTMS:乙烯基三甲氧基矽烷 VTMS: Vinyltrimethoxysilane

<稀釋溶劑> <Dilution solvent>

水:蒸餾水 Water: Distilled water

TFE:三氟乙醇 TFE: trifluoroethanol

Figure 107106138-A0202-12-0036-10
Figure 107106138-A0202-12-0036-10

在以下的實施例及比較例中,除了製造例3~8中製備的雙性離子高分子溶液以外,還使用以下所示的原料製作 親水性構造體。 In the following Examples and Comparative Examples, in addition to the zwitterionic polymer solutions prepared in Production Examples 3 to 8, hydrophilic structures were produced using the raw materials shown below.

(基底) (base)

基底(1):東洋紡股份公司製造,產品名「COSMOSHINE A4100」,厚度為50μm。 Substrate (1): manufactured by Toyobo Co., Ltd., product name "COSMOSHINE A4100", thickness 50 μm .

基底(2):東麗股份公司製造,產品名「LUMIRROR 50T60」,厚度為50μm。 Substrate (2): manufactured by Toray Co., Ltd., product name "LUMIRROR 50T60", thickness 50 μm .

(乙醇性矽溶膠) (Alcoholic Silica Sol)

乙醇性矽溶膠(1):Colcoat股份公司製造,產品名「N-103X」,固體成分濃度為2.0%。 Ethanol-based silica sol (1): manufactured by Colcoat Co., Ltd., product name "N-103X", and solid content concentration of 2.0%.

乙醇性矽溶膠(2):Colcoat股份公司製造,產品名「PC-291」,固體成分濃度為2.5%。 Ethanol-based silica sol (2): manufactured by Colcoat Co., Ltd., product name "PC-291", and solid content concentration of 2.5%.

(含水聚酯樹脂) (Aqueous polyester resin)

含水聚酯樹脂(1):具有以下化學式(16)所表示的重複單元之含水聚酯樹脂。質量平均分子量(Mw)為16,000。 Aqueous polyester resin (1): an aqueous polyester resin having a repeating unit represented by the following chemical formula (16). The mass average molecular weight (Mw) was 16,000.

含水聚酯樹脂(2):具有以下化學式(16)所表示的重複單元、和由丙烯酸甲酯衍生的重複單元之共聚物所構成的含水聚酯樹脂。 Aqueous polyester resin (2): An aqueous polyester resin composed of a copolymer having a repeating unit represented by the following chemical formula (16) and a repeating unit derived from methyl acrylate.

Figure 107106138-A0202-12-0037-11
Figure 107106138-A0202-12-0037-11

[實施例1] [Example 1]

對100份(固體成分)的在製造例3中所製備的雙性離子 高分子溶液,加入5%氯化鈉水溶液,將氯化鈉的固體成分含量調整為第2表所記載的值,且混合蒸餾水,以得到固體成分濃度為3%的用於形成親水性層的塗佈液。 To 100 parts (solid content) of the zwitterionic polymer solution prepared in Production Example 3, a 5% sodium chloride aqueous solution was added to adjust the solid content of sodium chloride to the value described in Table 2, and Distilled water was mixed to obtain a coating liquid for forming a hydrophilic layer with a solid content concentration of 3%.

與上述分別進行,使用塗佈棒(wire bar)在基板(1)的易黏著面上將乙醇性矽溶膠(1)塗佈成乾燥後的厚度為100nm。將所得到的層壓體以80℃加熱1分鐘。在加熱後,層壓體中的塗膜未完全乾燥。 Separately from the above, the ethanolic silica sol (1) is coated on the easy-adhesion surface of the substrate (1) with a wire bar to a thickness of 100 nm after drying. The obtained laminate was heated at 80°C for 1 minute. After heating, the coating film in the laminate was not completely dried.

接著,將前述用於形成親水性層的塗佈液塗佈於其上,以得到具有層壓構造的構造體。接著,藉由以120℃將此構造體加熱1分鐘,將此構造體中的未乾燥狀態的塗膜乾燥,進而得到親水性構造體。 Next, the aforementioned coating liquid for forming a hydrophilic layer is applied thereon to obtain a structure having a laminated structure. Next, by heating this structure at 120 degreeC for 1 minute, the coating film in the undried state in this structure was dried, and a hydrophilic structure was obtained.

[實施例2~11] [Examples 2 to 11]

親水性構造體的製備除了採用第2表所記載的條件進行以外,其餘以相同於實施例1的方式得到親水性構造體。 The preparation of the hydrophilic structure was carried out in the same manner as in Example 1 except that the conditions described in Table 2 were used to obtain a hydrophilic structure.

[比較例1] [Comparative Example 1]

將100份(固體成分)的在製造例5中所製備的雙性離子高分子溶液,與500份的三氟乙醇(Trifluoroethanol,TFE)混合,以得到用於形成親水性層的塗佈液。 100 parts (solid content) of the zwitterionic polymer solution prepared in Production Example 5 was mixed with 500 parts of trifluoroethanol (TFE) to obtain a coating solution for forming a hydrophilic layer.

在基板(1)的易黏著面上,塗佈前述用於形成親水性層的塗佈液,以得到具有層壓構造的構造體。接著,藉由將此構造體以100℃加熱1分鐘,使前述塗膜乾燥,進而得到親水性構造體。 On the easy-adhesion surface of the substrate (1), the aforementioned coating liquid for forming a hydrophilic layer is applied to obtain a structure having a laminated structure. Next, by heating this structure at 100 degreeC for 1 minute, the said coating film was dried, and a hydrophilic structure was obtained.

[比較例2] [Comparative Example 2]

對100份(固體成分)的在製造例3中所製備的雙性離子 高分子溶液,加入5%氯化鈉水溶液,將氯化鈉的固體成分含量調整為第2表所記載的值,且混合蒸餾水,以得到固體成分濃度為3%的用於形成親水性層的塗佈液。 To 100 parts (solid content) of the zwitterionic polymer solution prepared in Production Example 3, a 5% sodium chloride aqueous solution was added to adjust the solid content of sodium chloride to the value described in Table 2, and Distilled water was mixed to obtain a coating liquid for forming a hydrophilic layer with a solid content concentration of 3%.

在基板(1)的易黏著面上塗佈前述用於形成親水性層的塗佈液時,塗佈液在基材(1)上受阻而無法塗佈。 When the aforementioned coating liquid for forming a hydrophilic layer is applied to the easy-adhesion surface of the substrate (1), the coating liquid is blocked on the substrate (1) and cannot be applied.

[比較例3] [Comparative Example 3]

使用塗佈棒在基板(1)的易黏著面上將乙醇性矽溶膠(1)塗佈成乾燥後的厚度為100nm。將所得到的層壓體以120℃加熱1分鐘,以得到親水性構造體。 The ethanolic silica sol (1) is coated on the easy-adhesion surface of the substrate (1) by using a coating rod to a thickness of 100 nm after drying. The resulting laminate was heated at 120° C. for 1 minute to obtain a hydrophilic structure.

[比較例4] [Comparative Example 4]

為了形成包含具有矽原子的雙性離子高分子的膜層之目的,藉由製造例7的方法,嘗試合成具有矽原子的雙性離子高分子。 For the purpose of forming a film layer containing a zwitterionic polymer having a silicon atom, by the method of Production Example 7, an attempt was made to synthesize a zwitterionic polymer having a silicon atom.

然而,在聚合反應期間發生沉澱,因而無法得到塗佈液。 However, precipitation occurred during the polymerization reaction, and thus a coating liquid could not be obtained.

[比較例5] [Comparative Example 5]

為了形成包含具有矽原子的雙性離子高分子的膜層之目的,藉由製造例8的方法,嘗試合成具有矽原子的雙性離子高分子。 For the purpose of forming a film layer containing a zwitterionic polymer having a silicon atom, by the method of Production Example 8, an attempt was made to synthesize a zwitterionic polymer having a silicon atom.

然而,在聚合反應期間發生沉澱,因而無法得到塗佈液。 However, precipitation occurred during the polymerization reaction, and thus a coating liquid could not be obtained.

[比較例6] [Comparative Example 6]

對100份(固體成分)的在製造例6中所製備的雙性離子高分子溶液,加入5%氯化鈉水溶液,將氯化鈉的固體成分含量調整為第2表所記載的值,並混合蒸餾水,以得到固體成分濃度為3%的用於形成親水性層的塗佈液。 To 100 parts (solid content) of the zwitterionic polymer solution prepared in Production Example 6, a 5% sodium chloride aqueous solution was added to adjust the solid content of sodium chloride to the value described in Table 2, and Distilled water was mixed to obtain a coating liquid for forming a hydrophilic layer with a solid content concentration of 3%.

與上述分別進行,在基板(1)的易黏著面上將含有含水聚酯樹脂(1)之塗佈液使用塗佈棒塗佈成乾燥後的厚度為100nm。將所得到的層壓體以80℃加熱1分鐘。在加熱後,層壓體中的塗膜未完全乾燥。 Separately from the above, the coating liquid containing the aqueous polyester resin (1) was applied on the easy-adhesion surface of the substrate (1) using a coating bar to a thickness of 100 nm after drying. The obtained laminate was heated at 80°C for 1 minute. After heating, the coating film in the laminate was not completely dried.

接著,將前述用於形成親水性層的塗佈液塗佈於其上,以得到具有層壓構造的構造體。接著,藉由以100℃將此構造體加熱1分鐘,將此構造體中的未乾燥狀態的塗膜乾燥,進而得到親水性構造體。 Next, the aforementioned coating liquid for forming a hydrophilic layer is applied thereon to obtain a structure having a laminated structure. Next, by heating the structure at 100° C. for 1 minute, the coating film in the undried state in the structure was dried to obtain a hydrophilic structure.

[比較例7] [Comparative Example 7]

除了使用含有含水聚酯樹脂(2)的塗佈液代替含有含水聚酯樹脂(1)的塗佈液以外,以相同於比較例6的方式得到親水性構造體。 A hydrophilic structure was obtained in the same manner as in Comparative Example 6, except that the coating liquid containing the hydrous polyester resin (2) was used instead of the coating liquid containing the hydrous polyester resin (1).

[水接觸角的測量] [Measurement of water contact angle]

在實施例及比較例中所得到的親水性構造體的親水性層上,滴下2μL的離子交換水。使用全自動接觸角測量裝置(協和界面科學股份公司製造,DM-701),測量滴下3秒後的水滴之水接觸角(清洗前的水接觸角)。 On the hydrophilic layer of the hydrophilic structures obtained in Examples and Comparative Examples, 2 μL of ion-exchanged water was dropped. Using an automatic contact angle measuring device (manufactured by Kyowa Interface Science Co., Ltd., DM-701), the water contact angle of the water droplet (water contact angle before washing) was measured 3 seconds after dropping.

[耐水性之評估] [Evaluation of water resistance]

將實施例及比較例中所得到的親水性構造體的親水性層之表面,用離子交換水清洗並乾燥後,藉由與上述相同的方法測定水接觸角(清洗後的水接觸角)且根據以下標準評估耐水性。 The surfaces of the hydrophilic layers of the hydrophilic structures obtained in the Examples and Comparative Examples were washed with ion-exchanged water and dried, and then the water contact angle (water contact angle after washing) was measured by the same method as above. Water resistance was evaluated according to the following criteria.

A:清洗後的水接觸角,等於或小於清洗前的水接觸角。 A: The water contact angle after cleaning is equal to or smaller than the water contact angle before cleaning.

B:清洗後的水接觸角,大於清洗前的水接觸角。 B: The water contact angle after cleaning is greater than the water contact angle before cleaning.

[親水性層的附著性之評估] [Evaluation of Adhesion of Hydrophilic Layer]

將NICHIBAN股份公司製造的Cellophane(註冊商標)黏貼於在實施例及比較例中所得到的親水性構造體的親水性層上,然後將其剝離。觀察剝離後的親水性構造體的表面,評估親水性層的附著性。評估標準如以下所示。 Cellophane (registered trademark) manufactured by NICHIBAN Co., Ltd. was stuck to the hydrophilic layer of the hydrophilic structure obtained in the Example and the comparative example, and it peeled off. The surface of the hydrophilic structure after peeling was observed, and the adhesion of the hydrophilic layer was evaluated. The evaluation criteria are as follows.

A:親水性層無剝離。 A: The hydrophilic layer was not peeled off.

B:親水性層局部性剝離。 B: The hydrophilic layer is partially peeled off.

C:親水性層完全剝離。 C: The hydrophilic layer was completely peeled off.

[親水性層的耐汙染性之評估] [Evaluation of contamination resistance of hydrophilic layer]

在實施例及比較例中所得到的親水性構造體的親水性層上,使用Zebra股份公司製造的油性筆(Mackie)著色,以將其作為實驗樣本。將此實驗樣本浸漬於蒸餾水中並振盪,然後使用不織布刮水器(wiper)(旭化成股份公司製造,商品名為「Bemcot」)擦拭掉蒸餾水。重複此操作2次之後,觀察表面狀態並評估耐汙染性。評估標準如以下所示。 The hydrophilic layers of the hydrophilic structures obtained in Examples and Comparative Examples were colored with an oil-based pen (Mackie) manufactured by Zebra Co., Ltd., and used as experimental samples. This experimental sample was immersed in distilled water and shaken, and then the distilled water was wiped off using a non-woven wiper (manufactured by Asahi Kasei Co., Ltd., trade name "Bemcot"). After repeating this operation 2 times, the surface state was observed and the stain resistance was evaluated. The evaluation criteria are as follows.

A:油性筆的墨水被完全清除。 A: The ink of the oil-based pen is completely removed.

B:油性筆的墨水被去除,但局部殘留。 B: The ink of the oil-based pen was removed but partially remained.

C:油性筆的墨水有一半以上未被去除。 C: More than half of the ink of the oil-based pen was not removed.

Figure 107106138-A0202-12-0042-12
Figure 107106138-A0202-12-0042-12

Figure 107106138-A0202-12-0043-13
Figure 107106138-A0202-12-0043-13

從第3表可以得知以下幾點。 The following points can be learned from Table 3.

實施例1~11的親水性構造體的親水性層具有優良的親水性、耐汙染性、附著性、及耐水性。 The hydrophilic layers of the hydrophilic structures of Examples 1 to 11 had excellent hydrophilicity, stain resistance, adhesion, and water resistance.

比較例1~2的親水性構造體為嘗試直接在基底上形成親水性層的親水性構造體。然而,在比較例1中,無法形成具有與實施例相同性能的親水性層。再者,在比較例2中,無法在基底上均勻地塗佈,因而不能形成親水性層。 The hydrophilic structures of Comparative Examples 1 to 2 are hydrophilic structures that attempt to form a hydrophilic layer directly on a substrate. However, in Comparative Example 1, a hydrophilic layer having the same performance as the Example could not be formed. Furthermore, in Comparative Example 2, the substrate could not be uniformly coated, and thus the hydrophilic layer could not be formed.

再者,比較例3的親水性構造體,在表面上具有本發明的中間層。此層的親水性不足。 In addition, the hydrophilic structure of Comparative Example 3 has the intermediate layer of the present invention on the surface. The hydrophilicity of this layer is insufficient.

在比較例4、5中,如以上所述,無法合成出雙性離子高分子。 In Comparative Examples 4 and 5, as described above, the zwitterionic polymer could not be synthesized.

在比較例6、7的親水性構造體中,形成含有含水聚酯樹脂的中間層,並在其上形成親水性層。然而,此親水性層的耐水性差。 In the hydrophilic structures of Comparative Examples 6 and 7, an intermediate layer containing a hydrous polyester resin was formed, and a hydrophilic layer was formed thereon. However, the water resistance of this hydrophilic layer is poor.

Figure 107106138-A0202-11-0002-1
Figure 107106138-A0202-11-0002-1

Claims (7)

一種親水性構造體,其係具有基底、中間層及親水性層依序層壓所形成的層狀構造之親水性構造體,其中前述中間層為含有矽氧烷類高分子的膜層,前述親水性層為含有不具有矽原子的雙性離子高分子且不含有具有矽原子的雙性離子高分子之膜層,其中前述不具有矽原子的雙性離子高分子為具有以下化學式(2)所示之重複單元的聚合物:
Figure 107106138-A0305-02-0047-1
在化學式中,R1表示氫原子或甲基,R2、R3分別獨立地表示氫原子、具有或不具有醚鍵之碳原子數為1~10的烷基、具有或不具有醚鍵之碳原子數為2~11的氰烷基、具有或不具有醚鍵之碳原子數為2~10的烯基、或是、具有或不具有取代基之碳原子數為6~20的芳香基,另外,R2及R3也可以彼此鍵結而形成環,A1表示以下化學式(3)~(5)的任一者所示之2價基團:
Figure 107106138-A0305-02-0048-2
Figure 107106138-A0305-02-0048-3
Figure 107106138-A0305-02-0048-4
(在化學式中,A2及A3分別獨立地表示碳原子數為1~10的亞烷基,R4、R5及R6分別獨立地表示氫原子、碳原子數為1~6的烷基、或是、具有或不具有取代基之碳原子數為6~20的芳香基,n表示1~10的整數,* 1表示與碳原子之共價鍵,* 2表示與氮原子之共價鍵)m表示2~5的整數。
A hydrophilic structure, which is a hydrophilic structure with a layered structure formed by sequentially laminating a substrate, an intermediate layer and a hydrophilic layer, wherein the intermediate layer is a film layer containing siloxane-based polymers, and the The hydrophilic layer is a film layer that contains a zwitterionic polymer without silicon atoms and does not contain a zwitterionic polymer with silicon atoms, wherein the aforementioned zwitterionic polymer without silicon atoms has the following chemical formula (2) Polymers of repeating units shown:
Figure 107106138-A0305-02-0047-1
In the chemical formula, R 1 represents a hydrogen atom or a methyl group, and R 2 and R 3 each independently represent a hydrogen atom, an alkyl group having 1 to 10 carbon atoms with or without an ether bond, and a group with or without an ether bond. A cyanoalkyl group with 2 to 11 carbon atoms, an alkenyl group with 2 to 10 carbon atoms with or without an ether bond, or an aryl group with 6 to 20 carbon atoms with or without a substituent , in addition, R 2 and R 3 can also be bonded to each other to form a ring, and A 1 represents a divalent group represented by any one of the following chemical formulas (3) to (5):
Figure 107106138-A0305-02-0048-2
Figure 107106138-A0305-02-0048-3
Figure 107106138-A0305-02-0048-4
(In the chemical formula, A 2 and A 3 each independently represent an alkylene group having 1 to 10 carbon atoms, and R 4 , R 5 and R 6 each independently represent a hydrogen atom and an alkane having 1 to 6 carbon atoms. base, or, with or without a substituent, an aromatic group with 6 to 20 carbon atoms, n represents an integer from 1 to 10, * 1 represents a covalent bond with a carbon atom, and * 2 represents a covalent bond with a nitrogen atom Valence bond) m represents an integer from 2 to 5.
如申請專利範圍第1項所述之親水性構造體,其中前述基底為樹脂薄膜。 The hydrophilic structure according to claim 1, wherein the substrate is a resin film. 如申請專利範圍第1項所述之親水性構造體,其中前述矽氧烷類高分子為可水解的有機矽化合物的水解縮聚物。 The hydrophilic structure according to claim 1, wherein the siloxane-based polymer is a hydrolyzable polycondensate of a hydrolyzable organosilicon compound. 如申請專利範圍第3項所述之親水性構造體,其中前述可水解的有機矽化合物為以下化學式(1)所示之矽化合物、或以下化學式(1)所示之矽化合物的水解縮聚物:Si(Ra)q(Rb)4-q (1)(在化學式中,Ra表示氫原子或不可水解的的有機基團, Rb表示可水解的基團,q表示0~2的整數。) The hydrophilic structure described in claim 3, wherein the hydrolyzable organosilicon compound is a silicon compound represented by the following chemical formula (1), or a hydrolyzed polycondensate of a silicon compound represented by the following chemical formula (1). : Si(R a ) q (R b ) 4-q (1) (In the chemical formula, R a represents a hydrogen atom or a non-hydrolyzable organic group, R b represents a hydrolyzable group, and q represents 0~2 integer.) 如申請專利範圍第1項所述之親水性構造體,其中前述不具有矽原子的雙性離子高分子係具有由雙性離子單體衍生的重複單元、以及具有羧基、磺基、或前述基與鹼反應所得到之基團的重複單元(但排除由雙性離子單體衍生的重複單元)的聚合物。 The hydrophilic structure according to claim 1, wherein the zwitterionic polymer having no silicon atom has repeating units derived from zwitterionic monomers, and has a carboxyl group, a sulfo group, or the aforementioned groups A polymer of repeating units (but excluding repeating units derived from zwitterionic monomers) of groups obtained by reaction with bases. 如申請專利範圍第1項所述之親水性構造體,其中前述親水性層為還含有具有碳原子數為0~10之陽離子的離子性化合物的膜層。 The hydrophilic structure according to claim 1, wherein the hydrophilic layer is a membrane layer further containing an ionic compound having a cation having 0 to 10 carbon atoms. 一種親水性構造體的製造方法,包括以下步驟(1)~(3),以製造如申請專利範圍第1至6項中任一項所述之親水性構造體:步驟(1):在基底上塗佈含有可水解的有機矽化合物的塗佈液,藉由將所得到的塗膜中的可水解的有機矽化合物水解縮聚,以形成含有矽氧烷類高分子的塗膜;步驟(2):在前述含有矽氧烷類高分子的塗膜完全乾燥的狀態下、或在溶劑殘留於前述塗膜中的狀態下,在前述塗膜上,塗佈含有不具有矽原子的雙性離子高分子且不含有具有矽原子的雙性離子高分子之塗佈液(A),以形成前述塗佈液(A)的塗膜;以及步驟(3):將具有在步驟(2)所得到的層壓構造之構造體中未乾燥狀態的塗膜乾燥。 A manufacturing method of a hydrophilic structure, comprising the following steps (1) to (3), to manufacture the hydrophilic structure as described in any one of items 1 to 6 of the patent application scope: step (1): on a substrate A coating solution containing a hydrolyzable organosilicon compound is applied on top, and a coating film containing a siloxane-based polymer is formed by hydrolyzing and polycondensing the hydrolyzable organosilicon compound in the obtained coating film; step (2) ): apply a zwitter ion containing no silicon atom on the coating film in a state where the coating film containing the siloxane-based polymer is completely dried, or in a state where the solvent remains in the coating film A coating solution (A) of polymer and no zwitterionic polymer having silicon atoms to form a coating film of the aforementioned coating solution (A); The coating film in the undried state in the structure of the laminated structure dries.
TW107106138A 2017-02-27 2018-02-23 Hydrophilic structure and method for producing hydrophilic structure TWI764989B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2017-034641 2017-02-27
JP2017034641 2017-02-27

Publications (2)

Publication Number Publication Date
TW201842098A TW201842098A (en) 2018-12-01
TWI764989B true TWI764989B (en) 2022-05-21

Family

ID=63253751

Family Applications (1)

Application Number Title Priority Date Filing Date
TW107106138A TWI764989B (en) 2017-02-27 2018-02-23 Hydrophilic structure and method for producing hydrophilic structure

Country Status (3)

Country Link
JP (1) JP6435440B1 (en)
TW (1) TWI764989B (en)
WO (1) WO2018155577A1 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6959877B2 (en) * 2018-01-29 2021-11-05 リンテック株式会社 Method for improving hydrophilicity of hydrophilic layer and method for manufacturing highly hydrophilic structure
CN109336790A (en) * 2018-10-31 2019-02-15 湖北吉和昌化工科技有限公司 The synthetic method of (3- (methacrylamido) propyl) dimethyl (3- sulfopropyl) ammonium hydroxide inner salt
CN113929903B (en) * 2020-06-29 2022-10-28 中国科学技术大学 Method for preparing terminal group high-fidelity polypeptide by NPCA polymerization initiated by protonated amino group

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2014084219A1 (en) * 2012-11-29 2014-06-05 大阪有機化学工業株式会社 Hydrophilic coating agent
TW201446816A (en) * 2013-04-12 2014-12-16 Mitsui Chemicals Inc Copolymer and hydrophilic material comprising same
CN105209557A (en) * 2013-05-03 2015-12-30 汉伯公司 New polysiloxane-based soil release coating

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9340683B2 (en) * 2009-12-17 2016-05-17 3M Innovative Properties Company Sulfonate-functional coatings and methods
JP6148494B2 (en) * 2013-02-22 2017-06-14 株式会社イノアック技術研究所 Hydrophilic rubber molding and method for producing the same
WO2017018146A1 (en) * 2015-07-29 2017-02-02 富士フイルム株式会社 Curable composition, coating, and laminate

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2014084219A1 (en) * 2012-11-29 2014-06-05 大阪有機化学工業株式会社 Hydrophilic coating agent
TW201446816A (en) * 2013-04-12 2014-12-16 Mitsui Chemicals Inc Copolymer and hydrophilic material comprising same
CN105102498A (en) * 2013-04-12 2015-11-25 三井化学株式会社 Copolymer and hydrophilic material comprising the same
CN105209557A (en) * 2013-05-03 2015-12-30 汉伯公司 New polysiloxane-based soil release coating

Also Published As

Publication number Publication date
JP6435440B1 (en) 2018-12-05
JPWO2018155577A1 (en) 2019-02-28
TW201842098A (en) 2018-12-01
WO2018155577A1 (en) 2018-08-30

Similar Documents

Publication Publication Date Title
JP6283718B2 (en) Copolymer and hydrophilic material comprising the same
TW201842094A (en) Hydrophilic composition and hydrophilic structure
JP6239086B2 (en) Film made of copolymer or composition
CN103889596B (en) The manufacture method of the substrate with tunicle
US20080248281A1 (en) Organic-Inorganic Composite Coating Film and Aqueous Coating Composition
JP6609382B2 (en) Film forming liquid composition and method for producing the same
TWI764989B (en) Hydrophilic structure and method for producing hydrophilic structure
CN103842401B (en) Compositions and the film formed by it
JP7153447B2 (en) Hydrophilic composition and hydrophilic sheet
JP2017226759A (en) Modified metal oxide sol and hydrophilic coating composition
JP2017101135A (en) Hydrophilic coated film, hydrophilic coated film forming article, coating liquid for forming hydrophilic coated film and manufacturing method of hydrophilic coated film forming article
JP6794151B2 (en) Coating film, method for producing coating film, and coating composition
JPWO2013051669A1 (en) Composition comprising fluorine-containing olefin / vinyl alcohol copolymer and alkoxysilane compound, cured product formed from the composition, and film comprising the cured product
JP2016085239A (en) Coating composition and method of manufacturing optical coating film
JP6959877B2 (en) Method for improving hydrophilicity of hydrophilic layer and method for manufacturing highly hydrophilic structure
JPS59179627A (en) Antifogging of transparent material
JP7177889B2 (en) Liquid composition for film formation
WO2008001665A1 (en) Antifouling film and method for producing the same
JP2025074479A (en) Coating composition and laminate