TWI763424B - Power supply system for vertical continuous electroplating frame - Google Patents

Abstract

The present invention relates to a power supply system for a vertical continuous electroplating frame, which includes: a power supply rail arranged on the vertical continuous electroplating equipment; and an electrode box, a box body is arranged on the top of the electroplating frame, and the box body is opposite to the power supply The rail is provided with an electrode sheet, the bottom of the electrode sheet is provided with an elastic member, and the top surface of the box body has a positioning slot relative to the electrode sheet. When the electrode sheet is in electrical contact with the power supply rail, the electroplating current is provided through the electroplating frame. to the plated material. Thereby, it is used to solve the problem of unstable electroplating current provided to the object to be plated in the prior art, and has the effect of providing a stable electroplating current to the object to be plated.

Description

Power supply system for vertical continuous electroplating frame

The present invention relates to a power supply system for a vertical continuous electroplating frame, especially to a designer for providing stable electroplating current to objects to be plated.

Press, the vertical continuous plating (Vertical Continuous Plating) equipment can vertically position the object to be plated (such as a printed circuit board) on the plating frame, and use the conveying device to continuously move the object to be plated in the plating tank along with the plating frame, and supply power at the same time To the electroplating frame, the object to be plated is electroplated; furthermore, the conventional electroplating frame power supply method is to set a power supply track on a vertical continuous electroplating equipment, and make the electroplating frame form a conductive groove relative to the power supply track, and let the electroplating frame use the conductive The electrical contact between the tank and the power supply track provides the electroplating current to the object to be plated, so as to electroplate the object to be plated; however, the electroplating frame is usually not very smooth throughout the transfer process of the electroplating, resulting in the conductive tank and the power supply. The electrical contact of the track may sometimes only be a point contact, or even an open circuit, resulting in unstable plating current supplied to the object to be plated, thereby affecting the plating quality of the object to be plated.

The main purpose of the present invention is to solve the problem that the electroplating current provided to the object to be plated is unstable in the prior art, and has the effect of providing a stable electroplating current to the object to be plated.

In order to achieve the above effect, one of the technical means of the present invention includes: a power supply rail, which is arranged on the vertical continuous electroplating equipment; and an electrode box, a box body is arranged on the top of the electroplating frame, and the box body is opposite to the power supply rail. An electrode sheet is provided, the bottom of the electrode sheet is provided with an elastic member, and the top surface of the box body has a positioning slot relative to the electrode sheet. When the electrode sheet is in electrical contact with the power supply rail, the electroplating current is provided through the electroplating frame to the plated. Wherein, the electrode sheet is arranged laterally relative to the direction of the power supply rail; the power supply rail is arranged on the top and bottom edge of a C-shaped structure body, and the inner height of the C-shaped structure body matches the setting height of the electrode box, and is in the C-shaped structure body. The bottom top edge of the C-shaped structure is provided with a wear-resistant rail; the power supply rail sets a fixed rail on the top bottom edge of the C-shaped structure, and a lower pressure rail is set relative to the fixed rail, and the fixed rail and the lower An elastic piece is arranged between the pressure rails, and the lower pressure rail is in electrical contact with the electrode sheet.

The second technical means of the present invention includes: a power supply rail, a fixed rail is arranged on the vertical continuous electroplating equipment, a lower pressure rail is arranged relative to the fixed rail, and a lower pressure rail is arranged between the fixed rail and the lower pressure rail an elastic member; and an electrode box, a box body is arranged on the top of the electroplating frame, an electrode piece is arranged in the box body relative to the lower pressure rail of the power supply rail, and the top surface of the box body has a positioning slot relative to the electrode piece, When the electrode sheet is in electrical contact with the lower voltage rail, the electroplating current is supplied to the object to be plated through the electroplating frame. Wherein, the electrode sheet is arranged laterally relative to the direction of the power supply rail; the fixed rail of the power supply rail is arranged on the top and bottom edge of a C-shaped structure body, and the inner height of the C-shaped structure body matches the setting height of the electrode box, and A wear-resistant rail is provided on the top edge of the bottom of the C-shaped structure.

Thereby, the bottom of the electrode sheet is provided with an elastic piece or/and the power supply rail includes a fixed rail and a lower pressure rail, and an elastic piece is arranged between the fixed rail and the lower pressure rail, so that the electroplating frame is transferred during the electroplating process. Even if it is not smooth, the electrical contact between the electrode pads and the power supply rail/lower voltage rail can still keep in close contact.

First, please refer to [FIG. 1] to [FIG. 4], the first embodiment of the present invention includes: a power supply rail 10, which is arranged on the vertical continuous electroplating equipment; and an electrode box 20, which is provided with a box body 21. On the top of the electroplating frame 30, an electrode sheet 22 is arranged in the box body 21 relative to the power supply rail 10, and the electrode sheet 22 is arranged laterally relative to the direction of the power supply rail 10. The bottom of the electrode sheet 22 is provided with an elastic member 23, the The top surface of the box body 21 has a positioning slot 24 opposite to the electrode sheet 22 . When the electrode sheet 22 is in electrical contact with the power supply rail 10 , a plating current is supplied to the object 31 to be plated through the plating frame 30 .

Next, the second embodiment of the present invention includes: a power supply rail 10, a fixed rail 11 is arranged on the vertical continuous electroplating equipment, and a lower pressure rail 12 is arranged relative to the fixed rail 11, and the fixed rail 11 and the lower pressure rail 12 are arranged. An elastic member 13 is arranged between the pressure rails 12 ; and an electrode box 20 , a box body 21 is arranged on the top of the electroplating frame 30 , and an electrode sheet 22 is arranged in the box body 11 relative to the lower pressure rail 12 of the power supply rail 10 , the electrode sheet 22 is arranged laterally relative to the direction of the power supply rail 10, and the top surface of the box body 21 has a positioning slot 24 relative to the electrode sheet 22. When the electrode sheet 22 is in electrical contact with the lower pressure rail 12, Thus, the plating current is supplied to the object to be plated 31 through the plating frame 30 .

Furthermore, the third embodiment of the present invention includes: a power supply rail 10, a fixed rail 11 is arranged on the vertical continuous electroplating equipment, and a lower pressure rail 12 is arranged relative to the fixed rail 11, and the fixed rail 11 and the An elastic member 13 is arranged between the lower pressure rails 12; and an electrode box 20, a box body 21 is arranged on the top of the electroplating frame 30, and an electrode sheet 22 is arranged in the box body 21 relative to the power supply rail 10. The electrode sheet 22 is arranged laterally relative to the direction of the power supply rail 10, the bottom of the electrode sheet 22 is provided with an elastic member 23, and the top surface of the box body 21 has a positioning slot 24 relative to the electrode sheet 22. When the rails 12 are in electrical contact, the plating current is supplied to the object to be plated 31 through the plating frame 30 .

In addition, in the above-mentioned second and third embodiments, the power supply rail 10 can also be arranged on the top and bottom edge of a C-shaped structure 40 on the vertical continuous electroplating equipment. The inner height of the C-shaped structure 40 According to the setting height of the electrode box 20 , a wear-resistant rail 41 is provided on the top edge of the bottom of the C-shaped structure 40 .

Based on such a configuration, the present invention can make the bottom of the electrode sheet 22 provided with the elastic member 23 as in the first embodiment; or make the power supply rail 10 include the fixed rail 11 and the lower pressure rail 12 as in the second embodiment, and the fixed rail 11 and An elastic member 13 is provided between the lower pressure rails 12; or as in the third embodiment, the bottom of the electrode sheet 22 is provided with an elastic member 23, and the power supply rail 10 includes the fixed rail 11 and the lower pressure rail 12, and the fixed rail 11 The elastic member 13 is arranged between the lower pressure rail 12 ; thereby, even if the electroplating frame 30 is not smooth during the electroplating transfer process, the electrical contact between the electrode sheet 22 and the power supply rail 10 / the lower pressure rail 12 can still be continued. In close contact, it has the effect of providing stable plating current to the object to be plated.

To sum up, the technical means disclosed in the present invention do meet the requirements for invention patents such as "novelty", "progressiveness" and "availability for industrial use". Moral sense.

However, the drawings and descriptions disclosed above are only preferred embodiments of the present invention, and modifications or equivalent changes made by those skilled in the art within the scope of the spirit of this case should still be included in the scope of the patent application of this case.

10: Power rail 11: Fixed rail 12: Lower pressure rail 13: Elastic parts 20: Electrode Box 21: Box 22: Electrode 23: Elastic 24: Positioning through the groove 30: Plating frame 31: Plating 40: C-type structure 41: Wear rails

[FIG. 1] is an explanatory diagram of the overall structure of the present invention. [Fig. 2] is an enlarged view of the place marked 2 in [Fig. 1]. [FIG. 3] is an external view of the structure of the electrode box of the present invention. [FIG. 4] is a cross-sectional view of the electrode box structure of the present invention.

11: Fixed rail

12: Lower pressure rail

13: Elastic parts

21: Box

22: Electrode

30: Plating frame

31: Plating

40: C-type structure

41: Wear rails

Claims (7)

A power supply system for a vertical continuous electroplating frame, comprising: a power supply rail, arranged on the top and bottom edge of a C-shaped structure body, the C-shaped structure body is set on the vertical continuous electroplating equipment; and an electrode box, a box body It is arranged on the top of the electroplating frame, and the inner height of the C-shaped structure is matched with the setting height of the electrode box. An electrode sheet is arranged in the box relative to the power supply rail, and an elastic member is arranged at the bottom of the electrode sheet. The surface opposite to the electrode sheet has a positioning through slot, and when the electrode sheet is in electrical contact with the power supply rail, the electroplating current is supplied to the object to be plated through the electroplating frame. The power supply system for a vertical continuous electroplating frame as claimed in claim 1, wherein the electrode pads are arranged laterally relative to the direction of the power supply rail. The power supply system for a vertical continuous electroplating frame as claimed in claim 2, wherein the top edge of the bottom of the C-shaped structure is provided with wear-resistant rails. The power supply system of the vertical continuous electroplating frame according to claim 3, wherein the power supply rail sets a fixed rail on the top and bottom edge of the C-shaped structure, and sets a lower pressure rail relative to the fixed rail, and the fixed rail is arranged on the fixed rail. An elastic element is arranged between the rail and the lower pressure rail, and the lower pressure rail is in electrical contact with the electrode sheet. A power supply system for a vertical continuous electroplating frame, comprising: a power supply rail, a fixed rail is arranged on the top bottom edge of a C-shaped structure body, the C-shaped structure body is arranged on the vertical continuous electroplating equipment, and is opposite to the fixed rail A lower pressure rail is arranged, and an elastic member is arranged between the fixed rail and the lower pressure rail; and an electrode box, a box body is arranged on the top of the electroplating frame, and the inner part of the C-shaped structure is made The height matches the setting height of the electrode box, an electrode piece is arranged in the box relative to the lower pressure rail of the power supply rail, and the top surface of the box body has a positioning slot relative to the electrode piece. During the sexual contact, the electroplating current is supplied to the object to be plated through the electroplating frame. The power supply system for a vertical continuous electroplating frame as claimed in claim 5, wherein the electrode pads are arranged laterally relative to the direction of the power supply rail. The power supply system for a vertical continuous electroplating frame as claimed in claim 6, wherein the bottom top edge of the C-shaped structure is provided with wear-resistant rails.

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