以下，對本發明更詳細地說明。 本發明中，當指出某一構件位於另一構成「上」時，其不僅包括某一構件與另一構成接觸之情況，還包括兩構件之間存在其他構件之情況。 本發明中，當指出某一部分「包含」某一構成要素時，其意謂，只要沒有特別相反之記載，則可以進一步包含其他構成要素，而不是將其他構成要素排除。＜ 量子點分散體 ＞
本發明之一方式涉及量子點分散體。具體而言，本發明之一方式涉及以下量子點分散體，其包含量子點、含有磷酸酯系化合物之表面處理劑、及極性有機溶劑，相對於上述量子點固體成分整體100重量份，上述含有磷酸酯系化合物之表面處理劑之含量為1 ~ 250 重量份。 上述量子點可以指奈米大小之半導體物質。原子形成分子，分子構成所謂分子簇之小分子之集合體而形成奈米粒子，當此類奈米粒子帶有半導體特性時稱為量子點。若上述量子點自外部獲得能量而達到激發狀態，則上述量子點會自發釋放與相應能帶隙對應之能量。 由本發明之自發光感光性樹脂組合物製造之濾色器藉由包含上述量子點，能夠藉助光照射而發光(光致發光(photoluminescence))。 包含濾色器的通常的圖像顯示裝置中，白色光透過上述濾色器而呈現顏色，該過程中由於光之一部分會被濾色器吸收，因而光效率降低。然而，包含由本發明之自發光感光性樹脂組合物製造之濾色器的情況下，具有以下優點：濾色器藉助光源之光而自發光，因而能夠表現出更加優異的光效率，此外由於發出帶有顏色之光，因而顏色再現性更加優異，且因光致發光而向所有方向發光，因而能夠改善視角。 只要是能夠因光之刺激而自發光的量子點粒子就沒有特別限定。比如，可以選自由第II-VI族半導體化合物；第III-V族半導體化合物；第IV-VI族半導體化合物；第IV族元素或包含其之化合物；及其組合組成之群，其等可以單獨或將兩種以上混合使用。 具體而言，上述第II-VI族半導體化合物可以選自由以下化合物組成之群，但並不限定於此：選自由CdS、CdSe、CdTe、ZnS、ZnSe、ZnTe、ZnO、HgS、HgSe、HgTe及其混合物組成之群中的二元素化合物；選自由CdSeS、CdSeTe、CdSTe、ZnSeS、ZnSeTe、ZnSTe、HgSeS、HgSeTe、HgSTe、CdZnS、CdZnSe、CdZnTe、CdHgS、CdHgSe、CdHgTe、HgZnS、HgZnSe、HgZnTe及其混合物組成之群中的三元素化合物；及選自由CdZnSeS、CdZnSeTe、CdZnSTe、CdHgSeS、CdHgSeTe、CdHgSTe、HgZnSeS、HgZnSeTe、HgZnSTe及其混合物組成之群中的四元素化合物。 上述第III-V族半導體化合物可以選自由以下化合物組成之群：選自由GaN、GaP、GaAs、GaSb、AlN、AlP、AlAs、AlSb、InN、InP、InAs、InSb及其混合物組成之群中的二元素化合物；選自由GaNP、GaNAs、GaNSb、GaPAs、GaPSb、AlNP、AlNAs、AlNSb、AlPAs、AlPSb、InNP、InNAs、InNSb、InPAs、InPSb、GaAlNP及其混合物組成之群中的三元素化合物；及選自由GaAlNAs、GaAlNSb、GaAlPAs、GaAlPSb、GaInNP、GaInNAs、GaInNSb、GaInPAs、GaInPSb、InAlNP、InAlNAs、InAlNSb、InAlPAs、InAlPSb及其混合物組成之群中的四元素化合物。 上述第IV-VI族半導體化合物可以為選自由以下化合物組成之群中的一種以上，但並不限定於此：選自由SnS、SnSe、SnTe、PbS、PbSe、PbTe及其混合物組成之群中的二元素化合物；選自由SnSeS、SnSeTe、SnSTe、PbSeS、PbSeTe、PbSTe、SnPbS、SnPbSe、SnPbTe及其混合物組成之群中的三元素化合物；及選自由SnPbSSe、SnPbSeTe、SnPbSTe及其混合物組成之群中的四元素化合物。 上述第IV族元素或包含其之化合物可以選自由以下化合物組成之群，但並不限定於此：選自由Si、Ge及其混合物組成之群中的元素化合物；及選自由SiC、SiGe及其混合物組成之群中的二元素化合物。 本發明之一實施方式中，上述量子點可以包含選自由第III-V族半導體化合物及第IV-VI族半導體化合物組成之群中的一種以上。 上述量子點可以為均質的(homogeneous)單一結構；核-殼(core-shell)結構、梯度(gradient)結構等之類的雙重結構；或其混合結構。 具體而言，上述核-殼雙重結構中，分別形成核(core)及殼(shell)之物質可以由上述提及之彼此不同的半導體化合物形成。比如，上述核可以包含選自由CdSe、CdS、ZnS、ZnSe、CdTe、CdSeTe、CdZnS、PbSe、AgInZnS及ZnO組成之群中的一種以上物質，但並不限定於此。上述殼可以包含選自由CdSe、ZnSe、ZnS、ZnTe、CdTe、PbS、TiO、SrSe及HgSe組成之群中的一種以上物質，同樣亦並不限定於此。 上述量子點可以藉由濕式化學製程(wet chemical process)、有機金屬化學蒸鍍製程(MOCVD，metal organic chemical vapor deposition)或分子束外延製程(MBE，molecular beam epitaxy)來合成，但並不限定於此。 上述所謂濕式化學製程是在有機溶劑中加入前驅體物質而使粒子生長之方法。結晶生長時有機溶劑自然地配位於量子點結晶之表面而發揮分散劑之作用，調節結晶之生長，因而與有機金屬化學蒸鍍製程或分子束外延之類的氣相蒸鍍方法相比，能夠藉由更加容易且廉價的製程來控制奈米粒子之生長，因此較佳使用上述濕式化學製程來製造本發明之上述量子點。 相對於上述量子點分散體固體成分整體100重量份，上述量子點之含量可以為20 ~ 99 重量份，較佳為30 ~ 99 重量份，更佳為50 ~ 99 重量份。上述量子點之含量處於上述範圍內的情況下，能夠提供感光特性優異的自發光感光性樹脂組合物。上述量子點之含量低於上述範圍的情況下，感光特性可能會降低，含量超過上述範圍的情況下，存在與上述量子點相比後述之其他構成比如鹼溶性樹脂、光聚合性化合物之類的構成之含量會相對減少，因而濾色器之製造可能會變難之問題，因此較佳含量處於上述範圍內。 本發明之量子點分散體包含含有磷酸酯系化合物之表面處理劑。本發明之量子點分散體由於包含含有磷酸酯系化合物之表面處理劑，因此具有量子點與極性有機溶劑之分散性提高而量子效率優異之優點。一實施方式中，本發明之量子點分散體中，以往通常使用之氯仿、甲苯、正己烷、苯之類的非極性有機溶劑之含量可以為100ppm以下，具體為50ppm以下，更具體為10ppm以下。 本發明之另一實施方式中，上述非極性有機溶劑可以為選自由氯仿、苯、甲苯及己烷組成之群中的一種以上，本發明之量子點分散體中，上述非極性有機溶劑之含量可以為100ppm以下，具體為50ppm以下，更具體為10ppm以下。 本發明之量子點分散體由於包含含有磷酸酯系化合物之表面處理劑，因此與後述的構成自發光感光性樹脂組合物之其他構成之相容性優異，且由於對人體有害之非極性有機溶劑之含量為100ppm以下，具體而言為50ppm以下，更具體而言為10ppm以下，因此自製程態樣以及環境態樣考慮係較佳的。 本發明之另一實施方式中，上述表面處理劑可以包含酸值10以上之磷酸酯系化合物。 上述磷酸酯系化合物可以包含存在於磷酸酯((HO)2
PO(OR))或磷酸(H3
PO4
)之羥基或羥基之氫原子被其他官能基取代或非取代之形態。比如，上述磷酸酯系化合物可以由(H2
PO3
-)之形態表示，但並不限定於此。此外，本發明中，上述所謂「磷酸酯系」亦可以包含選自由亞磷酸衍生物、磷酸衍生物、膦酸衍生物及次膦酸衍生物組成之群中的一種以上。 上述表面處理劑包含上述磷酸酯系化合物的情況下，具有能夠抑制光效率降低及感光特性不良之優點。 上述磷酸酯系化合物在一個分子內可以進一步包含聚醚部分、聚酯部分及磷酸基中之一種以上。 本發明中所謂「聚-」可以指由大量的重複單元形成之化合物，上述「聚醚部分」、「聚酯部分」分別可以指由1 ~ 20個包含醚基或酯基之重複單元形成之部分。本發明中，較佳由5 ~ 20重複單元形成，更佳由10 ~ 20個形成，該情況下具有相容性優異之優點。 上述磷酸酯系化合物在一個分子內進一步包含聚醚部分的情況下，具有提高與後述的鹼溶性樹脂之相容性之優點，上述磷酸酯系化合物在一個分子內進一步包含聚酯部分的情況下，具有提高與鹼溶性樹脂之相容性及對於鹼顯影液之溶解特性之優點。上述磷酸酯系化合物在一個分子內進一步包含磷酸基的情況下，可以藉由吸附於量子點表面而發揮保護層作用，且具有使上述量子點解聚之優點。 較佳地，本發明之磷酸酯系化合物在一個分子內可以包含聚醚部分、聚酯部分及磷酸基，該情況下具有使量子點解聚而使分散粒度變小，且具有與鹼溶性樹脂之相容性及對於鹼顯影液之溶解特性而有利於圖案形成之優點，因此係最佳的。 本發明中，所謂「酸值」是中和丙烯酸系聚合物1 g所需的氫氧化鉀之量(mg)，可以藉由所測定之值來調節對於後述的自發光感光性樹脂組合物之溶解性。上述磷酸酯系化合物之酸值為10 (mg KOH/g)以上、具體而言為10 ~ 200 (mg KOH/g)的情況下，自包含上述表面處理劑之自發光感光性樹脂組合物之顯影速度態樣考慮係較佳的。上述酸值低於上述範圍的情況下，可能不易確保充分的顯影速度，超過上述範圍的情況下，與基板之密合性減小而易於發生圖案之短路，且整個組合物之保存穩定性降低而可能發生黏度增大之問題，因此較佳滿足上述範圍。 相對於上述量子點固體成分整體100重量份，上述表面處理劑之含量可以為1 ~ 250 重量份，較佳為3 ~ 200 重量份，更佳為5 ~ 100 重量份。上述表面處理劑之含量處於上述範圍內的情況下，上述量子點之解聚效果優異，能夠抑制由本發明之量子點分散體及包含該量子點分散體之自發光感光性樹脂組合物內之極性差異導致的析出現象，且在濾色器製造製程中能夠發揮量子點之保護層作用，因此較佳。 上述表面處理劑之含量低於上述範圍的情況下，上述量子點之解聚效果可能會降低，超過上述範圍的情況下，包含上述量子點分散體之自發光感光性樹脂組合物之顯影特性可能會降低，因此較佳含量處於上述範圍內。 上述溶劑可以包含選自由乙醇、NMP(N-甲基-2-吡咯啶酮)、MEK(甲基乙基酮)、1-(2-乙氧基乙基)-2-乙氧基乙烷、1-(2-乙氧基乙基)-2-甲氧基乙烷、1-丁氧基-2-乙氧基乙烷、1-甲基丙基乙酸酯、2,6-二甲基-4-庚酮、2-[2-(2-羥基乙氧基)乙氧基]乙醇、2-丁氧基乙醇、2-乙基己醇、2-乙基己基乙酸酯、2-甲基-1-丙醇、2-甲基丙基-2-甲基丙酸酯、2-甲基丙基乙酸酯、2-丙酮、3,5,5-三甲基-2-環己烯-1-酮、3-甲基丁基乙酸酯、3-甲基苯酚、3-戊酮、4-羥基-4-甲基戊烷-2-酮、4-甲基-2-戊酮、5-甲基-2-己酮、二乙基碳酸酯、二乙二醇二丁基醚、二乙二醇二乙基醚、二乙二醇二甲基醚、二乙二醇乙基醚、二乙二醇乙基甲基醚、二乙二醇己基醚、二乙二醇異丙基甲基醚、二乙二醇甲基醚、二乙二醇單-2-乙基己基醚、二乙二醇單苄基醚、二乙二醇單丁基醚、二乙二醇單丁基醚乙酸酯、二乙二醇單乙基醚、二乙二醇單乙基醚乙酸酯、二乙二醇單異丁基醚、二乙二醇單異丙基醚、二乙二醇單甲基醚、二乙二醇單苯基醚、二乙二醇正丁基醚、二乙二醇正丁基醚乙酸酯、二乙二醇苯基醚、二異丁基甲醇、二異丁基酮、二甲基己二酸酯、二丙二醇二甲基醚、二丙二醇甲基醚、二丙二醇單甲基醚乙酸酯、二丙二醇單丁基醚、二丙二醇單丙基醚、二丙二醇正丁基醚、二丙二醇正丙基醚、二丙二醇苯基醚、右旋檸檬烯、十二烷、乙二醇、乙硫醇、庚烷、乙二醇二乙酸酯、乙二醇己基醚、乙二醇單-2-乙基己基醚、乙二醇單烯丙基醚、乙二醇單苄基醚、乙二醇單丁基醚、乙二醇單丁基醚乙酸酯、乙二醇單己基醚、乙二醇單異丁基醚、乙二醇單異丙基醚、乙二醇單甲基醚、乙二醇單甲基醚乙酸酯、乙二醇單苯基醚、乙二醇正丁基醚、乙二醇正丁基醚乙酸酯、乙二醇苯基醚、乙二醇丙基醚、γ-丁內酯、己二醇、乙酸異戊酯、乙酸異丁酯、乙酸異丙酯、甲基-2-羥基苯甲酸酯、甲基異丁基甲醇、甲基異丁基酮、甲基油酸酯、甲基-3-甲氧基丙酸酯、甲基環己烯、乙酸正丁酯、丙酸正丁酯、正十二烷、乙酸正己酯、N-甲基吡咯啶酮、丙酸正戊酯、乙酸正丙酯、丙酸正丙酯、硬脂酸(octadecanoic acid)、聚乙二醇單甲基醚、丙二醇二乙酸酯、丙二醇單甲基醚乙酸酯、丙二醇甲基醚、丙二醇單丁基醚、丙二醇單甲基醚乙酸酯、丙二醇單苯基醚、丙二醇單丙基醚、丙二醇正丁基醚、丙二醇正丁基醚、丙二醇正丙基醚、丙二醇苯基醚、丙二醇丙基醚、四乙二醇二甲基醚、三乙二醇二甲基醚、三乙二醇乙基醚、三乙二醇甲基醚、三乙二醇正丁基醚、三丙二醇甲基醚、三丙二醇正丁基醚、3-乙氧基丙酸乙酯及水組成之群中的一種以上，但並不限定於此。但是，自後述的濾色器之製造容易性態樣考慮，較佳為PGMEA(丙二醇單甲基醚乙酸酯)或EEP(3-乙氧基丙酸乙酯)。 相對於上述量子點分散體整體100 重量份，上述極性有機溶劑之含量可以為40 ~ 95 重量份，更佳為60 ~ 90 重量份。上述極性有機溶劑超過上述含量範圍的情況下，對於分散性雖然有利但光學特性可能會降低，低於上述範圍的情況下，對於光學特性雖然有利但存在分散特性會降低之問題。因此，自量子點之分散性及光學特性態樣考慮，較佳上述極性有機溶劑滿足上述範圍。＜ 量子點分散體製造方法 ＞
本發明之另一方式涉及量子點分散體製造方法，其包括：準備包含量子點及非極性有機溶劑之量子點分散液之步驟；將表面處理劑添加於上述量子點分散液之步驟；自上述量子點分散液中將上述非極性有機溶劑移除之步驟；及在移除了上述非極性有機溶劑之上述量子點分散液中添加極性有機溶劑並使其分散而製造量子點分散體之步驟。 有關上述量子點、非極性有機溶劑、表面處理劑及極性有機溶劑之內容可以適用上述內容。 本發明之量子點分散體製造方法包括準備包含量子點及非極性有機溶劑之量子點分散液之步驟。 本發明中，上述「量子點分散體」係與「量子點分散液」不同之用語。上述所謂「量子點分散液」可以指通常市售之量子點溶液等，可以指不包含本發明之表面處理劑之狀態，亦即添加表面處理劑之前的狀態。 本發明中不限定上述量子點分散液中上述量子點及上述非極性有機溶劑之含量。本發明中，上述量子點分散液可以指以分散液中具體而言上述非極性有機溶劑中分散有量子點之形態市售的量子點、量子點溶液、量子點分散液、量子點分散體等，因此只要係上述分散液中分散有上述量子點之形態，其含量就沒有限制。 本發明之一實施方式中，上述量子點分散液可以進一步包含有機配位體。上述有機配位體能夠結合於上述量子點之表面而發揮使上述量子點穩定化之作用。上述有機配位體在本發明中沒有限定，比如可以包含吡啶(pyridine)、巰基醇(mercapto alcohol)、硫醇(thiol)、膦(phosphine)、氧化膦(phosphine oxide)等。 相對於上述量子點之總面積，上述有機配位體可以覆蓋5%以上之表面。 上述有機配位體可以包含在市售之形態的上述量子點分散液中，未包含在上述量子點分散液中的情況下，可以直接添加於上述量子點分散液中，將上述有機配位體直接添加於上述量子點分散液中的情況下，其含量相對於量子點1莫耳可以加入0.1 ~ 10莫耳。將上述有機配位體直接添加於上述量子點分散液中的情況下，在添加上述有機配位體後亦可以包括攪拌上述量子點分散液之步驟。 本發明之量子點分散體製造方法包括在量子點分散液中添加表面處理劑之步驟。 上述表面處理劑可以適用上述內容。具體而言，本發明之另一實施方式中，上述表面處理劑可以包含磷酸酯系化合物；或包含羧酸及不飽和雙鍵之化合物。 本發明之另一實施方式中，上述表面處理劑可以包含酸值 10以上的磷酸酯系化合物；或酸值10以上的包含不飽和雙鍵之化合物，本發明之另一實施方式中，上述磷酸酯系化合物在一個分子內可以進一步包含聚醚部分、聚酯部分及磷酸基中之一種以上。 本發明之量子點分散體製造方法藉由將表面處理劑添加於量子點分散液中從而能夠發揮可提高量子點與極性有機溶劑之分散性之作用。因為這樣，藉由本發明之量子點分散體製造方法製造之量子點分散體具有能夠防止製造過程中可能發生之量子效率之降低，因而能夠製造發光效率優異的濾色器之優點。 在將表面處理劑添加於上述量子點分散液後，亦可以包括攪拌上述量子點分散液之步驟，上述攪拌可以藉由此項技術通常使用之方法來實施。 本發明之量子點分散體製造方法包括自上述量子點分散液中將上述非極性有機溶劑移除之步驟。 本發明之另一實施方式中，上述將非極性有機溶劑移除之步驟可以利用常壓乾燥或減壓乾燥。比如，上述乾燥時壓力為減壓或常壓均可，通常在20Pa ~1012hPa之範圍進行，可以在常溫 ~ 100℃溫度、較佳40 ~ 100℃溫度、更佳在40 ~ 60℃ 溫度進行4 ~ 12小時，該情況下具有可容易地將溶劑移除之優點。 本發明之量子點分散體製造方法中，上述自量子點分散液中將上述非極性有機溶劑移除之步驟可以在將表面處理劑添加於上述量子點分散液中之步驟之後進行，亦可以在將表面處理劑添加於上述量子點分散液中之步驟之前進行。在將表面處理劑添加於上述量子點分散液後自上述量子點分散液中將上述非極性有機溶劑移除的情況下，具有抑制後述的非極性有機溶劑之移除過程中可能發生之量子點之氧化從而能夠獲得量子效率優異的量子點分散體之優點。 本發明之量子點分散體製造方法包括在移除了上述非極性有機溶劑之量子點分散液中添加極性有機溶劑並使其分散而製造量子點分散體之步驟。 上述分散之方法在本發明中沒有特別限制，可以利用此項技術通常使用之方法、設備來進行。 本發明之量子點分散體製造方法由於包括添加表面處理劑之步驟，尤其在將非極性有機溶劑移除之前包括添加表面處理劑之步驟，因此具有能夠抑制在藉由乾燥方法等而將非極性有機溶劑移除之過程中發生之量子點之氧化從而可製造發光特性優異的濾色器之優點。＜ 自 發 光感光性 樹 脂 組 合物 ＞
本發明之另一方式涉及自發光感光性樹脂組合物，其包含上述量子點分散體及選自由鹼溶性樹脂、光聚合性化合物、光聚合引發劑、溶劑及添加劑組成之群中的一種以上，且非極性有機溶劑之含量為100ppm以下。 本發明之自發光感光性樹脂組合物中，相對於上述自發光感光性樹脂組合物整體100 重量份，上述量子點分散體之含量可以為3 ~ 80 重量份，較佳為5 ~ 70 重量份，更佳為10 ~ 60 重量份。本發明之自發光感光性樹脂組合物中上述量子點分散體之含量處於上述範圍內的情況下，具有能夠製造發光特性優異的濾色器之優點。上述量子點分散體之含量低於上述範圍的情況下，發光特性可能會降低，上述量子點分散體之含量超過上述範圍的情況下，其他構成之含量相對減少，因而圖案之形成可能會變難，可靠性可能會降低，因此較佳包含在上述範圍內。 本發明之自發光感光性樹脂組合物可以包含鹼溶性樹脂。 上述鹼溶性樹脂可以發揮使由上述自發光感光性樹脂組合物製造之濾色器之非曝光部成為鹼溶性而能夠被移除，且使曝光區域殘留之作用。此外，上述自發光感光性樹脂組合物包含上述鹼溶性樹脂的情況下，上述量子點可以在組合物中均勻分散，且可以發揮在製程中保護上述量子點而維持亮度之作用。 本發明之上述鹼溶性樹脂可以選用具有50 ~ 200 (mg KOH/g)之酸值之鹼溶性樹脂。上述「酸值」係指中和丙烯酸系聚合物 1g所需的氫氧化鉀之量(mg)，藉由所測定之值來調節溶解性。上述鹼溶性樹脂之酸值低於上述範圍的情況下，可能不易確保充分之顯影速度，若超過上述範圍，則與基板之密合性減小而容易發生圖案之短路，且整個組合物之保存穩定性降低而可能發生黏度增大之問題。 此外，為了提高用作濾色器時之表面硬度，上述鹼溶性樹脂可以考慮限定分子量及分子量分佈(Mw/Mn)。較佳以重均分子量為3,000 ~ 32,000、較佳為5,000 ~ 32,000，分子量分佈具有1.5 ~ 6.0之範圍、較佳具有1.8 ~ 4.0之範圍的方式直接聚合或購買使用。具有上述範圍之分子量及分子量分佈之鹼溶性樹脂不僅可以提高已提到的硬度且具有高殘膜率，而且顯影液中之非曝光部之溶解性優異，能夠提高解析度。 上述鹼溶性樹脂包含選自由含羧基之不飽和單體之聚合物、該含羧基之不飽和單體及與其可共聚的具有不飽和鍵之單體的共聚物、及其組合組成之群中的一種以上。 此時，含羧基之不飽和單體可以為不飽和單羧酸、不飽和二羧酸、不飽和三羧酸等。具體而言，作為不飽和單羧酸，例如可以舉出丙烯酸、甲基丙烯酸、巴豆酸、α-氯丙烯酸、肉桂酸等。作為不飽和二羧酸，例如可以舉出馬來酸、富馬酸、衣康酸、檸康酸、中康酸等。不飽和多元羧酸亦可以為酸酐，具體而言，可以舉出馬來酸酐、衣康酸酐、檸康酸酐等。此外，不飽和多元羧酸亦可以為其單(2-甲基丙烯醯氧烷基)酯，例如可以舉出琥珀酸單(2-丙烯醯氧乙基)酯、琥珀酸單(2-甲基丙烯醯氧乙基)酯、鄰苯二甲酸單(2-丙烯醯氧乙基)酯、鄰苯二甲酸單(2-甲基丙烯醯氧乙基)酯等。不飽和多元羧酸亦可以為其兩末端二羧基聚合物之單(甲基)丙烯酸酯，例如可以舉出ω-羧基聚己內酯單丙烯酸酯、ω-羧基聚己內酯單甲基丙烯酸酯等。此等含羧基之單體各自可以單獨或將兩種以上組合使用。 此外，與含羧基之不飽和單體可共聚之單體可以為選自由芳族乙烯基化合物、不飽和羧酸酯化合物、不飽和羧酸胺基烷基酯化合物、不飽和羧酸縮水甘油基酯化合物、羧酸乙烯基酯化合物、不飽和醚類化合物、氰化乙烯基化合物、不飽和醯亞胺類化合物、脂族共軛二烯類化合物、分子鏈之末端具有單丙烯醯基或單甲基丙烯醯基之大單體、大體積單體及其組合組成之群中的一種。 更具體而言，上述可共聚之單體可以使用苯乙烯、α-甲基苯乙烯、鄰乙烯基甲苯、間乙烯基甲苯、對乙烯基甲苯、對氯苯乙烯、鄰甲氧基苯乙烯、間甲氧基苯乙烯、對甲氧基苯乙烯、鄰乙烯基苄基甲基醚、間乙烯基苄基甲基醚、對乙烯基苄基甲基醚、鄰乙烯基苄基縮水甘油基醚、間乙烯基苄基縮水甘油基醚、對乙烯基苄基縮水甘油基醚、茚等芳族乙烯基化合物；丙烯酸甲酯、甲基丙烯酸甲酯、丙烯酸乙酯、甲基丙烯酸乙酯、丙烯酸正丙酯、甲基丙烯酸正丙酯、丙烯酸異丙酯、甲基丙烯酸異丙酯、丙烯酸正丁酯、甲基丙烯酸正丁酯、丙烯酸異丁酯、甲基丙烯酸異丁酯、丙烯酸第二丁酯、甲基丙烯酸第二丁酯、丙烯酸第三丁酯、甲基丙烯酸第三丁酯、丙烯酸2-羥基乙酯、甲基丙烯酸2-羥基乙酯、丙烯酸2-羥基丙酯、甲基丙烯酸2-羥基丙酯、丙烯酸3-羥基丙酯、甲基丙烯酸3-羥基丙酯、丙烯酸2-羥基丁酯、甲基丙烯酸2-羥基丁酯、丙烯酸3-羥基丁酯、甲基丙烯酸3-羥基丁酯、丙烯酸4-羥基丁酯、甲基丙烯酸4-羥基丁酯、丙烯酸烯丙酯、甲基丙烯酸烯丙酯、丙烯酸苄酯、甲基丙烯酸苄酯、丙烯酸環己酯、甲基丙烯酸環己酯、丙烯酸苯酯、甲基丙烯酸苯酯、丙烯酸2-甲氧基乙酯、甲基丙烯酸2-甲氧基乙酯、丙烯酸2-苯氧基乙酯、甲基丙烯酸2-苯氧基乙酯、甲氧基二乙二醇丙烯酸酯、甲氧基二乙二醇甲基丙烯酸酯、甲氧基三乙二醇丙烯酸酯、甲氧基三乙二醇甲基丙烯酸酯、甲氧基丙二醇丙烯酸酯、甲氧基丙二醇甲基丙烯酸酯、甲氧基二丙二醇丙烯酸酯、甲氧基二丙二醇甲基丙烯酸酯、丙烯酸異冰片酯、甲基丙烯酸異冰片酯、丙烯酸二環戊二烯酯、甲基丙烯酸二環戊二烯酯、(甲基)丙烯酸金剛烷酯、(甲基)丙烯酸降冰片酯、丙烯酸2-羥基-3-苯氧基丙酯、甲基丙烯酸2-羥基-3-苯氧基丙酯、甘油單丙烯酸酯、甘油單甲基丙烯酸酯等不飽和羧酸酯；丙烯酸2-胺基乙酯、甲基丙烯酸2-胺基乙酯、丙烯酸2-二甲基胺基乙酯、甲基丙烯酸2-二甲基胺基乙酯、丙烯酸2-胺基丙酯、甲基丙烯酸2-胺基丙酯、丙烯酸2-二甲基胺基丙酯、甲基丙烯酸2-二甲基胺基丙酯、丙烯酸3-胺基丙酯、甲基丙烯酸3-胺基丙酯、丙烯酸3-二甲基胺基丙酯、甲基丙烯酸3-二甲基胺基丙酯等不飽和羧酸胺基烷基酯化合物；丙烯酸縮水甘油酯、甲基丙烯酸縮水甘油酯等不飽和羧酸縮水甘油基酯化合物；乙酸乙烯酯、丙酸乙烯酯、丁酸乙烯酯、苯甲酸乙烯酯等羧酸乙烯基酯化合物；乙烯基甲基醚、乙烯基乙基醚、烯丙基縮水甘油基醚等不飽和醚化合物；丙烯腈、甲基丙烯腈、α-氯丙烯腈、亞乙烯基二氰等氰化乙烯基化合物；丙烯醯胺、甲基丙烯醯胺、α-氯丙烯醯胺、N-2-羥乙基丙烯醯胺、N-2-羥乙基甲基丙烯醯胺等不飽和醯胺類；馬來醯亞胺、苄基馬來醯亞胺、N-苯基馬來醯亞胺、N-環己基馬來醯亞胺等不飽和醯亞胺化合物；1,3-丁二烯、異戊二烯、氯丁二烯等脂族共軛二烯類；及聚苯乙烯、聚丙烯酸甲酯、聚甲基丙烯酸甲酯、聚丙烯酸正丁酯、聚甲基丙烯酸正丁酯、在聚矽氧烷之聚合物分子鏈之末端具有單丙烯醯基或單甲基丙烯醯基之大單體類；可降低相對介電常數之具有降冰片基骨架之單體、具有金剛烷骨架之單體、具有松香骨架之單體等大體積單體。 相對於上述自發光感光性樹脂組合物之固體成分整體100 重量份，上述鹼溶性樹脂之含量可以為10 ~ 80 重量份，具體為15 ~ 70 重量份，更具體為20 ~ 45 重量份。 上述鹼溶性樹脂之含量處於上述範圍內的情況下，顯影液中之溶解性充分而容易形成圖案，防止顯影時曝光部之像素部分之膜減少而非像素部分之脫落性變佳，因此較佳。上述鹼溶性樹脂之含量低於上述範圍的情況下，非像素部分可能僅會稍微脫落，上述鹼溶性樹脂之含量超過上述範圍的情況下，顯影液中之溶解性降低而圖案形成可能困難。 本發明之自發光感光性樹脂組合物中所含有之光聚合性化合物係能夠因光及後述的光聚合引發劑之作用而聚合之化合物，可以舉出單官能單體、二官能單體、以及多官能單體等。 上述單官能單體之種類沒有特別限定，例如可以舉出丙烯酸壬基苯基卡必醇酯、丙烯酸2-羥基-3-苯氧基丙酯、丙烯酸2-乙基己基卡必醇酯、丙烯酸2-羥基乙酯、N-乙烯基吡咯啶酮等。 上述二官能單體之種類沒有特別限定，例如可以舉出1,6-己二醇二(甲基)丙烯酸酯、乙二醇二(甲基)丙烯酸酯、新戊二醇二(甲基)丙烯酸酯、三乙二醇二(甲基)丙烯酸酯、雙酚A之雙(丙烯醯氧乙基)醚、3-甲基戊二醇二(甲基)丙烯酸酯等。 上述多官能單體之種類沒有特別限定，例如可以舉出三羥甲基丙烷三(甲基)丙烯酸酯、乙氧基化三羥甲基丙烷三(甲基)丙烯酸酯、丙氧基化三羥甲基丙烷三(甲基)丙烯酸酯、異戊四醇三(甲基)丙烯酸酯、異戊四醇四(甲基)丙烯酸酯、二異戊四醇三(甲基)丙烯酸酯、二異戊四醇五(甲基)丙烯酸酯、乙氧基化二異戊四醇六(甲基)丙烯酸酯、丙氧基化二異戊四醇六(甲基)丙烯酸酯、二異戊四醇六(甲基)丙烯酸酯等。其中較佳使用二官能以上之多官能單體。 作為上述光聚合性化合物之市售品之例子，有新中村公司之A9550等，但並不限定於此。 相對於上述自發光感光性樹脂組合物固體成分整體100 重量份，上述光聚合性化合物之含量可以為5 ~ 50 重量份，具體為15 ~ 45 重量份，更具體為20 ~ 37 重量份。上述光聚合性化合物之含量處於上述範圍內的情況下，在像素部之強度或平滑性方面具有優點。 上述光聚合性化合物之含量低於上述範圍的情況下，像素部之強度可能會降低，上述光聚合性化合物之含量超過上述範圍的情況下，平滑性可能會降低，因此較佳包含在上述範圍內。 本發明之自發光感光性樹脂組合物可以包含光聚合引發劑，上述光聚合引發劑只要能夠使上述光聚合性化合物聚合其種類就沒有特別限制。尤其自聚合特性、引發效率、吸收波長、獲取性、價格等觀點出發，上述光聚合引發劑較佳使用選自由苯乙酮系化合物、二苯甲酮系化合物、三嗪系化合物、聯咪唑系化合物、肟系化合物及噻噸酮系化合物組成之群中的一種以上化合物。 作為上述苯乙酮系化合物之具體例，可以舉出二乙氧基苯乙酮、2-羥基-2-甲基-1-苯基丙烷-1-酮、苯偶醯二甲基縮酮、2-羥基-1-［4-(2-羥基乙氧基)苯基］-2-甲基丙烷-1-酮、1-羥基環己基苯基酮、2-甲基-1-(4-甲基苯硫基)-2-嗎啉代丙烷-1-酮、2-苄基-2-二甲基胺基-1-(4-嗎啉代苯基)丁烷-1-酮、2-羥基-2-甲基-1-［4-(1-甲基乙烯基)苯基］丙烷-1-酮、2-(4-甲基苄基)-2-(二甲基胺基)-1-(4-嗎啉代苯基)丁烷-1-酮等。 作為上述二苯甲酮系化合物，例如有二苯甲酮、鄰苯甲醯基苯甲酸甲酯、4-苯基二苯甲酮、4-苯甲醯基-4'-甲基二苯硫醚、3,3',4,4'-四(第三丁基過氧化羰基)二苯甲酮、2,4,6-三甲基二苯甲酮等。 作為上述三嗪系化合物之具體例，可以舉出2,4-雙(三氯甲基)-6-(4-甲氧基苯基)-1,3,5-三嗪、2,4-雙(三氯甲基)-6-(4-甲氧基萘基)-1,3,5-三嗪、2,4-雙(三氯甲基)-6-胡椒基-1,3,5-三嗪、2,4-雙(三氯甲基)-6-(4-甲氧基苯乙烯基)-1,3,5-三嗪、2,4-雙(三氯甲基)-6-［2-(5-甲基呋喃-2-基)乙烯基］-1,3,5-三嗪、2,4-雙(三氯甲基)-6-［2-(呋喃-2-基)乙烯基］-1,3,5-三嗪、2,4-雙(三氯甲基)-6-［2-(4-二乙基胺基-2-甲基苯基)乙烯基］-1,3,5-三嗪、2,4-雙(三氯甲基)-6-［2-(3,4-二甲氧基苯基)乙烯基］-1,3,5-三嗪等。 作為上述聯咪唑系化合物之具體例，可以舉出2,2'-雙(2-氯苯基)-4,4',5,5'-四苯基聯咪唑、2,2'-雙(2,3-二氯苯基)-4,4',5,5'-四苯基聯咪唑、2,2'-雙(2-氯苯基)-4,4',5,5'-四(烷氧基苯基)聯咪唑、2,2'-雙(2-氯苯基)-4,4',5,5'-四(三烷氧基苯基)聯咪唑、2,2-雙(2,6-二氯苯基)-4,4',5,5'-四苯基-1,2'-聯咪唑或4,4',5,5'位置之苯基經烷氧羰醯基取代之咪唑化合物等。其中，較佳使用2,2'-雙(2-氯苯基)-4,4',5,5'-四苯基聯咪唑、2,2'-雙(2,3-二氯苯基)-4,4',5,5'-四苯基聯咪唑、2,2-雙(2,6-二氯苯基)-4,4',5,5'-四苯基-1,2'-聯咪唑。 作為上述肟系化合物之具體例，可以舉出鄰乙氧基羰基-α-氧亞胺基-1-苯基丙烷-1-酮等，作為市售品，代表性的有巴斯夫公司之Irgacure OXE 01、OXE 02。 作為上述噻噸酮系化合物，例如有2-異丙基噻噸酮、2,4-二乙基噻噸酮、2,4-二氯噻噸酮、1-氯-4-丙氧基噻噸酮等。 相對於上述自發光感光性樹脂組合物固體成分整體 100 重量份，上述光聚合引發劑之含量可以為0.1 ~ 10 重量份，較佳為1 ~ 9.5 重量份，更佳為 5 ~ 9.5 重量份。 上述光聚合引發劑之含量處於上述範圍內的情況下，上述自發光感光性樹脂組合物高靈敏度化而曝光時間縮短，因而能夠提高生產率，維持高解析度，因此較佳。此外，具有使用本發明之自發光感光性樹脂組合物形成的像素部之強度及上述像素部之表面之平滑性變佳的優點。 為了提高本發明之自發光感光性樹脂組合物之靈敏度，上述光聚合引發劑可以進一步包含光聚合引發助劑。包含上述光聚合引發助劑的情況下，具有靈敏度進一步增大而提高生產率之優點。 上述光聚合引發助劑較佳可以使用比如選自由胺化合物、羧酸化合物、具有硫醇基之有機硫化合物組成之群中的一種以上化合物，但並不限定於此。 作為上述胺化合物，較佳使用芳族胺化合物，具體可以使用三乙醇胺、甲基二乙醇胺、三異丙醇胺等脂族胺化合物、4-二甲基胺基苯甲酸甲酯、4-二甲基胺基苯甲酸乙酯、4-二甲基胺基苯甲酸異戊酯、4-二甲基胺基苯甲酸2-乙基己酯、苯甲酸2-二甲基胺基乙酯、N,N-二甲基對甲苯胺、4,4'-雙(二甲基胺基)二苯甲酮(通稱：米蚩酮)、4,4'-雙(二乙基胺基)二苯甲酮等。 上述羧酸化合物較佳為芳族雜乙酸類，具體可以舉出苯基硫代乙酸、甲基苯基硫代乙酸、乙基苯基硫代乙酸、甲基乙基苯基硫代乙酸、二甲基苯基硫代乙酸、甲氧基苯基硫代乙酸、二甲氧基苯基硫代乙酸、氯苯基硫代乙酸、二氯苯基硫代乙酸、N-苯基甘胺酸、苯氧基乙酸、萘基硫代乙酸、N-萘基甘胺酸、萘氧基乙酸等。 作為上述具有硫醇基之有機硫化合物之具體例，可以舉出2-巰基苯并噻唑、1,4-雙(3-巰基丁醯氧基)丁烷、1,3,5-三(3-巰基丁氧基乙基)-1,3,5-三嗪-2,4,6(1H,3H,5H)-三酮、三羥甲基丙烷三(3-巰基丙酸酯)、異戊四醇四(3-巰基丁酸酯)、異戊四醇四(3-巰基丙酸酯)、二異戊四醇六(3-巰基丙酸酯)、四乙二醇雙(3-巰基丙酸酯)等。 上述光聚合引發助劑可以在不損害本發明之效果的範圍內適當追加而使用。 本發明之自發光感光性樹脂組合物中所包含之溶劑沒有特別限定，可以包含此項技術通常使用之有機溶劑。 上述溶劑具體可以舉出乙二醇單甲醚、乙二醇單乙基醚、乙二醇單丙基醚、乙二醇單丁基醚等乙二醇單烷基醚類；二乙二醇二甲基醚、二乙二醇二乙基醚、二乙二醇二丙基醚、二乙二醇二丁基醚等二乙二醇二烷基醚類；甲基溶纖劑乙酸酯、乙基溶纖劑乙酸酯等乙二醇烷基醚乙酸酯類；丙二醇單甲基醚乙酸酯、丙二醇單乙基醚乙酸酯、丙二醇單丙基醚乙酸酯等亞烷基二醇烷基醚乙酸酯類；甲氧基丁基乙酸酯、甲氧基戊基乙酸酯等烷氧基烷基乙酸酯類；苯、甲苯、二甲苯、均三甲苯等芳族烴類；甲基乙基酮、丙酮、甲基戊基酮、甲基異丁基酮、環己酮等酮類；乙醇、丙醇、丁醇、己醇、環己醇、乙二醇、甘油等醇類；3-乙氧基丙酸乙酯、3-甲氧基丙酸甲酯等酯類、γ-丁內酯等環狀酯類等。 關於上述溶劑，自塗佈性及乾燥性方面考慮，上述溶劑中較佳可以舉出沸點為100~200℃之有機溶劑，更佳可以舉出亞烷基二醇烷基醚乙酸酯類、酮類、3-乙氧基丙酸乙酯或3-甲氧基丙酸甲酯等酯類，進一步較佳可以舉出丙二醇單甲基醚乙酸酯、丙二醇單乙基醚乙酸酯、3-乙氧基丙酸乙酯、3-甲氧基丙酸甲酯等。此等溶劑可以各自單獨或將兩種以上混合使用。 相對於上述自發光感光性樹脂組合物整體100 重量份，上述溶劑之含量可以為25 ~ 90 重量份，具體可以為30 ~ 80 重量份，但並不限定於此。 但是，上述溶劑之含量處於上述範圍內的情況下，在利用輥塗機、旋塗機、狹縫式旋塗機、狹縫塗佈機(有時亦稱為模塗機)、噴墨印表機等塗佈裝置進行塗佈時，塗佈性會變佳，因此較佳。上述的溶劑之含量低於上述範圍的情況下，可能會因塗佈性降低而導致製程變難，超過上述範圍的情況下，可能發生由上述自發光感光性樹脂組合物形成的濾色器之效能或許降低之問題。 上述溶劑可以使用與上述量子點分散體中所包含之極性有機溶劑相同之溶劑，亦可以使用不同之溶劑，但並不限定於此。 為了增大塗佈性或密合性，本發明之自發光感光性樹脂組合物可以進一步包含密合促進劑、界面活性劑之類的添加劑。 上述密合促進劑可以為了提高與基板之密合性而添加，可以包含具有選自由羧基、甲基丙烯醯基、異氰酸酯基、環氧基及其組合組成之群中的反應性取代基之矽烷偶聯劑，但並不限定於此。比如，上述矽烷偶聯劑可以舉出三甲氧基甲矽烷基苯甲酸、γ-甲基丙烯醯氧丙基三甲氧基矽烷、乙烯基三乙醯氧基矽烷、乙烯基三甲氧基矽烷、γ-異氰酸酯丙基三乙氧基矽烷、γ-環氧丙氧丙基三甲氧基矽烷、β-(3,4-環氧基環己基)乙基三甲氧基矽烷等，其等可以單獨或將兩種以上組合使用。 本發明之自發光感光性樹脂組合物包含上述界面活性劑的情況下，具有可以提高塗佈性之優點。比如，上述界面活性劑可以使用BM-1000、BM-1100(BM Chemie公司)、Fluorad FC-135/FC-170C/FC-430(住友3M(株))、SH-28PA/-190/SZ-6032(東麗有機矽(株))等氟系界面活性劑，但並不限定於此。 除此以外，在不損害本發明之效果的範圍內，本發明之自發光感光性樹脂組合物亦可以進一步包含抗氧化劑、紫外線吸收劑、防凝劑之類的添加劑，上述添加劑同樣在不損害本發明之效果的範圍內可以被熟習此項技術者適當追加而使用。比如，以上述自發光感光性樹脂組合物整體重量為基準，上述添加劑可以以0.05 ~ 10 重量份、具體以0.1 ~ 10 重量份、更具體以0.1 ~ 5 重量份使用，但並不限定於此。 本發明之另一實施方式中，上述自發光感光性樹脂組合物中，非極性有機溶劑之含量可以為100ppm以下，具體為50ppm以下，更具體為10ppm以下。因此在製程方面以及環境方面具有優點。＜ 濾 色器 ＞
本發明之另一方式提供利用上述自發光感光性樹脂組合物製造之濾色器。 本發明之濾色器包含含有藉由本發明量子點分散體製造方法製造之量子點分散體的自發光感光性樹脂組合物之固化物，因此具有量子點粒子均勻分散而光效率優異、且像素像點之品質優異的優點。 上述濾色器包含基板及形成於上述基板之上部的圖案層。 就上述基板而言，上述濾色器本身可以為基板，或者亦可以為顯示裝置等中濾色器所處之部位，沒有特別限制。上述基板可以為玻璃、矽(Si)、矽氧化物(SiOx)或高分子基板，上述高分子基板可以為聚醚碸(polyethersulfone，PES)或聚碳酸酯(polycarbonate，PC)等。 上述圖案層作為包含本發明之自發光感光性樹脂組合物之層，可以為藉由塗佈上述自發光感光性樹脂組合物且以預定的圖案進行曝光、顯影及熱固化而形成之層。上述圖案層可以藉由此項技術通常已知之方法來形成。 包含上述基板及圖案層之濾色器可以進一步包含形成於各圖案之間的隔壁，亦可以進一步包含黑矩陣，但並不限定於此。 此外，亦可以進一步包含形成於上述濾色器之圖案層上部的保護膜。 上述濾色器可以包含選自由紅色圖案層、綠色圖案層及藍色圖案層組成之群中的一層以上。具體而言，上述濾色器可以包含選自由本發明的包含紅色量子點之紅色圖案層、包含綠色量子點之綠色圖案層及包含藍色量子點之藍色圖案層組成之群中的一層以上。上述紅色圖案層、綠色圖案層、藍色圖案層各自在光照射時可以發出紅色光、綠色光、藍色光，此時，上述光源之發出光沒有特別限定，但自更加優異的顏色再現性方面考慮，可以使用發出藍色光之光源。 上述濾色器亦可以僅具備紅色圖案層、綠色圖案層及藍色圖案層中之兩種顏色之圖案層，但並不限定於此。但是，上述濾色器僅具備兩種顏色之圖案層的情況下，上述圖案層可以進一步具備不含有上述量子點粒子之透明圖案層。 上述濾色器僅具備上述兩種顏色之圖案層的情況下，可以使用發出呈現除了上述兩種顏色以外的顏色之波長之光的光源。比如，上述濾色器包含紅色圖案層及綠色圖案層的情況下，可以使用發出藍色光之光源，該情況下紅色量子點發出紅色光，綠色量子點發出綠色光，上述透明圖案層使上述光源所發出之藍色光直接透過而顯示藍色。＜ 圖 像 顯 示裝置 ＞
此外，本發明之另一方式涉及包含上述濾色器之圖像顯示裝置。 本發明之濾色器不僅可以應用於通常的液晶顯示裝置，還可以應用於電致發光顯示裝置、電漿顯示裝置、場發射顯示裝置等各種圖像顯示裝置。 本發明之圖像顯示裝置具有以下優點：由於添加特定表面處理劑，因而藉由利用沒有量子效率降低之量子點分散體而光效率優異且表現出高亮度，顏色再現性優異，具有寬視角。 上述圖像顯示裝置可以進一步包含發出藍色光之光源及透明圖案層，上述發出藍色光之光源、上述透明圖案層可以適用上述內容。 以下，為了具體說明本說明書，例舉實施例進行詳細說明。但是，本說明書之實施例可以變形為各種各樣的其他形態，不應解釋成本說明書之範疇受到以下詳細描述之實施例之限定。本說明書之實施例係為了向熟習此項技術者更加完整地說明本說明書而提供的。此外，只要沒有特別提及，以下表示含量之「%」及「份」為重量基準。合成例 : 鹼 溶性 樹 脂之 合成
準備具備攪拌機、溫度計、回流冷凝管、滴液漏斗及氮氣導入管之燒瓶，另一態樣，投入N-苄基馬來醯亞胺 45重量份、甲基丙烯酸 45重量份、甲基丙烯酸三環癸酯 10重量份、過氧化-2-乙基己酸第三丁酯 4重量份、丙二醇單甲基醚乙酸酯(以下，稱為PGMEA) 40重量份後，攪拌混合而準備單體滴液漏斗，加入正十二烷硫醇 6重量份、PGMEA 24重量份，攪拌混合而準備鏈轉移劑滴液漏斗。之後，在燒瓶中導入PGMEA 395重量份，將燒瓶中之氛圍自空氣置換成氮氣後，一邊攪拌一邊將燒瓶之溫度升至90℃。接著，將單體及鏈轉移劑開始自滴液漏斗滴下。滴液時維持90℃，並且分別進行2小時，1小時後升溫至110℃而維持3小時，然後導入氣體導入管，開始氧氣/氮氣=5/95(v/v)混合氣體之鼓泡。接著，將甲基丙烯酸縮水甘油酯 10重量份、2,2'-亞甲基雙(4-甲基-6-第三丁基苯酚) 0.4重量份、三乙胺 0.8重量份投入燒瓶中，在110℃繼續反應8小時，之後，冷卻至室溫，獲得固體成分 29.1重量%、重均分子量 32,000、酸值114mgKOH/g之鹼溶性樹脂。製造例 2-1 ~ 2-7: 量子點分散體之製造
在市售之量子點分散液中添加表面處理劑，藉由磁力棒攪拌後，藉由可真空減壓處理之熱風烘箱將氯仿之類的非極性有機溶劑移除。接著，添加極性有機溶劑後，藉由油漆攪拌器實施分散，製造了製造例 2-1 ~ 2-7之量子點分散體，此時，量子點、表面處理劑、溶劑及乾燥條件如下述表1所示。 [表1] 製造例 2-8 ~ 2-14: 量子點分散體之製造
在市售之量子點分散液中添加表面處理劑，藉由磁力棒攪拌後，藉由可真空減壓處理之熱風烘箱將氯仿之類的非極性有機溶劑移除。接著，添加極性有機溶劑後，藉由油漆攪拌器實施分散，製造了製造例 2-8 ~ 2-14之量子點分散體。此時，量子點、表面處理劑、溶劑及乾燥條件如下述表2所示。 [表2] 製造例 2-15 ~ 2-21: 量子點分散體之製造
將市售之量子點分散液藉由可真空減壓處理之熱風烘箱將氯仿之類的非極性有機溶劑移除。之後，添加表面處理劑，接著添加極性有機溶劑後，藉由油漆攪拌器實施分散，製造了製造例2-15 ~ 2-21之量子點分散體。此時，量子點、表面處理劑、溶劑及乾燥條件如下述表3所示。 [表3] 實 施例及 比 較 例： 自 發 光感光性 樹 脂 組 合物之 製造
利用下述表4及5之組成製造實施例及比較例之自發光感光性樹脂組合物。 [表4]
[表5] 實驗 例
(1) 量子點分散體及感光性樹脂組合物之分散粒度測定 利用ELSZ-2000ZS(大塚公司製)測定分散粒度並示於下述表6中。通常若量子點粒子凝集，則分散粒度變大，由此引起發光特性降低之問題。 (2) 量子點分散體氯仿(Chloroform)含量分析 關於殘留在製造例中製造之量子點分散體中之氯仿(chloroform)之定量分析，利用安捷倫(Agilent)公司GC-MS實施分析，將結果示於下述表6中。 通常常壓下乾燥溫度越高，減壓時壓力越低，氯仿之含量越低。氯仿含量高的情況下，會對作業者之健康造成不良影響。 (3) 自發光感光性樹脂組合物之顯影類型測定 利用旋塗法將實施例 1 ~ 13及比較例 1 ~ 8之自發光感光性樹脂組合物塗佈在玻璃基板上，然後置放在加熱板上，在100℃之溫度維持3分鐘而形成薄膜後，使其浸漬於pH 10.5之KOH 水溶液顯影溶液(0.04% KOH，26℃)中，確認所塗佈之自發光感光性樹脂組合物層在顯影時之形態係溶解形態抑或剝離形態，並記載在下述表6中。 溶解形態的情況下，像素圖案之形成良好，但剝離形態的情況下，具有像素圖案之形成困難而無法使用之特徵。 (4) 發光強度(Intensity)測定 對於形成了自發光像素之濾色器中以20mm × 20mm正四邊形之圖案形成的圖案部，藉由365nm型4W UV照射器(VL-4LC，VILBER LOURMAT)測定光轉化之區域，利用Spectrum meter USB2000+(海洋光學(Ocean Optics)公司製)測定光轉化之發光強度，並示於下述表6中。 可以判斷所測定之光強度越高，越發揮優異的自發光特性。 [表 6]
自上述表6可以確認到，藉由在製造量子點分散體時添加磷酸酯系表面處理劑，從而能夠提供沒有量子效率之降低且分散性十分優異的量子點分散體，但比較例之丙烯酸系表面處理劑及胺基甲酸酯系表面處理劑的情況下，分散性不良。 此外，分析使用了本發明之量子點分散體之自發光感光性樹脂組合物中的氯仿含量，結果確認到藉由減壓-熱處理之移除製程對殘留非極性溶劑之移除是有效的。Hereinafter, the present invention will be described in more detail. In the present invention, when it is indicated that a certain component is located "on" another component, it includes not only the case where a certain component is in contact with another component, but also the situation where other components exist between the two components. In the present invention, when it is indicated that a certain part "includes" a certain element, it means that other elements may be further included, but not excluded, unless otherwise stated.< Quantum dot dispersion >
One aspect of the present invention relates to quantum dot dispersions. Specifically, one aspect of the present invention relates to a quantum dot dispersion comprising quantum dots, a surface treatment agent containing a phosphate-based compound, and a polar organic solvent, and the above-mentioned quantum dots containing 100 parts by weight of solid content as a whole The content of the surface treatment agent of the phosphate compound is 1 to 250 parts by weight. The above quantum dots may refer to nanometer-sized semiconductor substances. Atoms form molecules, and molecules form aggregates of small molecules called molecular clusters to form nanoparticles. When such nanoparticles have semiconductor properties, they are called quantum dots. If the quantum dot obtains energy from the outside and reaches an excited state, the quantum dot will spontaneously release the energy corresponding to the corresponding energy band gap. The color filter produced from the self-luminous photosensitive resin composition of the present invention can emit light (photoluminescence) by light irradiation by including the above-mentioned quantum dots. In a general image display device including a color filter, white light is transmitted through the color filter to express a color, and a part of the light is absorbed by the color filter in this process, so that the light efficiency decreases. However, when the color filter produced from the self-luminous photosensitive resin composition of the present invention is included, there is an advantage in that the color filter self-luminesces by the light of the light source, so that it can exhibit more excellent light efficiency, and furthermore, it emits light. With colored light, the color reproducibility is more excellent, and it emits light in all directions due to photoluminescence, so the viewing angle can be improved. There is no particular limitation as long as it is a quantum dot particle capable of self-luminescence upon stimulation of light. For example, it can be selected from the group consisting of Group II-VI semiconductor compounds; Group III-V semiconductor compounds; Group IV-VI semiconductor compounds; Group IV elements or compounds containing them; Or a combination of two or more. Specifically, the above-mentioned Group II-VI semiconductor compound may be selected from the group consisting of, but is not limited to, the group consisting of CdS, CdSe, CdTe, ZnS, ZnSe, ZnTe, ZnO, HgS, HgSe, HgTe and A two-element compound in the group consisting of its mixture; selected from CdSeS, CdSeTe, CdSTe, ZnSeS, ZnSeTe, ZnSTe, HgSeS, HgSeTe, HgSTe, CdZnS, CdZnSe, CdZnTe, CdHgS, CdHgSe, CdHgTe, HgZnS, HgZnSe, HgZnTe and their A three-element compound in the group consisting of mixtures; and a four-element compound selected from the group consisting of CdZnSeS, CdZnSeTe, CdZnSTe, CdHgSeS, CdHgSeTe, CdHgSTe, HgZnSeS, HgZnSeTe, HgZnSTe, and mixtures thereof. The above-mentioned Group III-V semiconductor compound may be selected from the group consisting of: GaN, GaP, GaAs, GaSb, AlN, AlP, AlAs, AlSb, InN, InP, InAs, InSb and mixtures thereof. Di-elemental compounds; tri-elemental compounds selected from the group consisting of GaNP, GaNAs, GaNSb, GaPAs, GaPSb, AlNP, AlNAs, AlNSb, AlPAs, AlPSb, InNP, InNAs, InNSb, InPAs, InPSb, GaAlNP and mixtures thereof; and A tetra-elemental compound selected from the group consisting of GaAlNAs, GaAlNSb, GaAlPAs, GaAlPSb, GaInNP, GaInNAs, GaInNSb, GaInPAs, GaInPSb, InAlNP, InAlNAs, InAlNSb, InAlPAs, InAlPSb and mixtures thereof. The above-mentioned Group IV-VI semiconductor compound may be one or more selected from the group consisting of the following compounds, but is not limited thereto: a compound selected from the group consisting of SnS, SnSe, SnTe, PbS, PbSe, PbTe and mixtures thereof Two-element compounds; three-element compounds selected from the group consisting of SnSeS, SnSeTe, SnSTe, PbSeS, PbSeTe, PbSTe, SnPbS, SnPbSe, SnPbTe and mixtures thereof; and selected from the group consisting of SnPbSSe, SnPbSeTe, SnPbSTe and mixtures thereof four-element compound. The above-mentioned Group IV elements or compounds containing them may be selected from the group consisting of the following compounds, but are not limited thereto: compounds of elements selected from the group consisting of Si, Ge and mixtures thereof; and selected from SiC, SiGe and their mixtures A two-element compound in a group of mixtures. In one embodiment of the present invention, the quantum dots may include at least one selected from the group consisting of Group III-V semiconductor compounds and Group IV-VI semiconductor compounds. The above quantum dots may be a homogeneous single structure; a dual structure such as a core-shell structure, a gradient structure, or the like; or a mixed structure thereof. Specifically, in the above-mentioned core-shell dual structure, the substances forming the core and the shell, respectively, may be formed of the above-mentioned semiconductor compounds different from each other. For example, the core may contain one or more substances selected from the group consisting of CdSe, CdS, ZnS, ZnSe, CdTe, CdSeTe, CdZnS, PbSe, AgInZnS, and ZnO, but is not limited thereto. The shell may contain one or more substances selected from the group consisting of CdSe, ZnSe, ZnS, ZnTe, CdTe, PbS, TiO, SrSe, and HgSe, and is not limited thereto. The above quantum dots can be synthesized by wet chemical process (wet chemical process), metal organic chemical vapor deposition (MOCVD, metal organic chemical vapor deposition) or molecular beam epitaxy (MBE, molecular beam epitaxy) process, but not limited to here. The above-mentioned so-called wet chemical process is a method in which a precursor substance is added to an organic solvent to grow particles. When the crystal grows, the organic solvent is naturally coordinated on the surface of the quantum dot crystal and plays the role of a dispersant to regulate the growth of the crystal. Therefore, compared with the organic metal chemical vapor deposition process or the vapor deposition method such as molecular beam epitaxy, it can be The growth of nanoparticles is controlled by an easier and less expensive process, so the above wet chemical process is preferably used to manufacture the above quantum dots of the present invention. The content of the quantum dots may be 20-99 parts by weight, preferably 30-99 parts by weight, more preferably 50-99 parts by weight, relative to 100 parts by weight of the solid content of the quantum dot dispersion as a whole. When content of the said quantum dot is in the said range, the self-luminous photosensitive resin composition which is excellent in photosensitivity characteristic can be provided. When the content of the above quantum dots is less than the above range, the photosensitive properties may be reduced, and when the content exceeds the above range, there are other components such as alkali-soluble resins, photopolymerizable compounds, etc., which will be described later than the above quantum dots. Since the content of the constituents is relatively reduced, the manufacturing of the color filter may become difficult, so the preferable content is within the above-mentioned range. The quantum dot dispersion of the present invention contains a surface treatment agent containing a phosphate-based compound. Since the quantum dot dispersion of the present invention contains a surface treatment agent containing a phosphoric acid ester compound, it has the advantages of improved dispersibility of quantum dots and polar organic solvents and excellent quantum efficiency. In one embodiment, in the quantum dot dispersion of the present invention, the content of conventionally used non-polar organic solvents such as chloroform, toluene, n-hexane, and benzene may be 100 ppm or less, specifically 50 ppm or less, more specifically 10 ppm or less . In another embodiment of the present invention, the non-polar organic solvent may be one or more selected from the group consisting of chloroform, benzene, toluene and hexane. In the quantum dot dispersion of the present invention, the content of the non-polar organic solvent It may be 100 ppm or less, specifically 50 ppm or less, and more specifically 10 ppm or less. Since the quantum dot dispersion of the present invention contains a surface treatment agent containing a phosphoric acid ester compound, it has excellent compatibility with other components constituting the self-luminous photosensitive resin composition to be described later, and is a non-polar organic solvent that is harmful to the human body. The content is 100 ppm or less, specifically, 50 ppm or less, and more specifically, 10 ppm or less, so it is preferable to consider the self-made aspect and the environmental aspect. In another embodiment of the present invention, the surface treatment agent may contain a phosphate-based compound having an acid value of 10 or more. The above-mentioned phosphoric acid ester-based compound may contain a phosphoric acid ester ((HO)2
PO(OR)) or phosphoric acid (H3
PO4
) or the hydrogen atom of the hydroxyl group is substituted or unsubstituted by other functional groups. For example, the above-mentioned phosphate-based compound may be composed of (H2
PO3
-), but not limited to this. In addition, in the present invention, the above-mentioned "phosphate ester type" may include at least one selected from the group consisting of phosphorous acid derivatives, phosphoric acid derivatives, phosphonic acid derivatives, and phosphinic acid derivatives. When the said surface-treating agent contains the said phosphate ester type compound, there exists an advantage of being able to suppress the fall of light efficiency and the poor photosensitivity characteristic. The above-mentioned phosphate-based compound may further contain one or more of a polyether moiety, a polyester moiety, and a phosphoric acid group in one molecule. In the present invention, the term "poly-" may refer to a compound formed by a large number of repeating units, and the above-mentioned "polyether moiety" and "polyester moiety" may respectively refer to a compound formed by 1 to 20 recurring units containing ether groups or ester groups. part. In the present invention, it is preferably formed of 5 to 20 repeating units, more preferably 10 to 20 repeating units, and in this case, there is an advantage of excellent compatibility. When the above-mentioned phosphate-based compound further contains a polyether moiety in one molecule, there is an advantage of improving compatibility with an alkali-soluble resin described later, and when the above-mentioned phosphate-based compound further contains a polyester moiety in one molecule , has the advantages of improving the compatibility with alkali-soluble resins and the solubility of alkali developing solution. When the above-mentioned phosphate-based compound further includes a phosphoric acid group in one molecule, it can function as a protective layer by being adsorbed on the surface of the quantum dots, and has the advantage of depolymerizing the above-mentioned quantum dots. Preferably, the phosphoric acid ester compound of the present invention may contain a polyether moiety, a polyester moiety and a phosphoric acid group in one molecule, and in this case, it has the ability to depolymerize the quantum dots to reduce the dispersed particle size, and has the ability to be compatible with alkali-soluble resins. Compatibility and solubility in alkaline developing solution are favorable for pattern formation, so it is the best. In the present invention, the term "acid value" refers to the amount (mg) of potassium hydroxide required to neutralize 1 g of the acrylic polymer, and the value for the self-luminous photosensitive resin composition described later can be adjusted by the measured value. Solubility. When the acid value of the above-mentioned phosphate-based compound is 10 (mg KOH/g) or more, specifically, 10 to 200 (mg KOH/g), from the self-luminous photosensitive resin composition containing the above-mentioned surface treatment agent. The development speed aspect is considered preferable. When the acid value is lower than the above range, it may be difficult to ensure a sufficient development speed. When the acid value exceeds the above range, the adhesion to the substrate is reduced, short-circuiting of the pattern is likely to occur, and the storage stability of the entire composition is reduced. However, there may be a problem that the viscosity increases, so it is preferable to satisfy the above-mentioned range. The content of the surface treatment agent may be 1-250 parts by weight, preferably 3-200 parts by weight, more preferably 5-100 parts by weight, relative to 100 parts by weight of the solid content of the quantum dots as a whole. When the content of the surface treatment agent is within the above range, the depolymerization effect of the quantum dots is excellent, and the polarity in the quantum dot dispersion of the present invention and the self-luminous photosensitive resin composition containing the quantum dot dispersion can be suppressed. The precipitation phenomenon caused by the difference is better, and it can play the role of the protective layer of the quantum dots in the color filter manufacturing process. When the content of the above-mentioned surface treating agent is less than the above-mentioned range, the depolymerization effect of the above-mentioned quantum dots may be reduced, and when the content of the above-mentioned surface treatment agent exceeds the above-mentioned range, the developing characteristics of the self-luminous photosensitive resin composition containing the above-mentioned quantum dot dispersion may be reduced. will decrease, so the preferred content is within the above range. The above solvent may contain selected from ethanol, NMP (N-methyl-2-pyrrolidone), MEK (methyl ethyl ketone), 1-(2-ethoxyethyl)-2-ethoxyethane , 1-(2-ethoxyethyl)-2-methoxyethane, 1-butoxy-2-ethoxyethane, 1-methylpropyl acetate, 2,6-bis Methyl-4-heptanone, 2-[2-(2-hydroxyethoxy)ethoxy]ethanol, 2-butoxyethanol, 2-ethylhexanol, 2-ethylhexyl acetate, 2-Methyl-1-propanol, 2-methylpropyl-2-methylpropionate, 2-methylpropylacetate, 2-propanone, 3,5,5-trimethyl-2 -Cyclohexen-1-one, 3-methylbutyl acetate, 3-methylphenol, 3-pentanone, 4-hydroxy-4-methylpentan-2-one, 4-methyl- 2-pentanone, 5-methyl-2-hexanone, diethyl carbonate, diethylene glycol dibutyl ether, diethylene glycol diethyl ether, diethylene glycol dimethyl ether, diethyl ether Glycol ethyl ether, diethylene glycol ethyl methyl ether, diethylene glycol hexyl ether, diethylene glycol isopropyl methyl ether, diethylene glycol methyl ether, diethylene glycol mono-2- Ethylhexyl ether, diethylene glycol monobenzyl ether, diethylene glycol monobutyl ether, diethylene glycol monobutyl ether acetate, diethylene glycol monoethyl ether, diethylene glycol monoethyl ether Ethyl ether acetate, diethylene glycol monoisobutyl ether, diethylene glycol monoisopropyl ether, diethylene glycol monomethyl ether, diethylene glycol monophenyl ether, diethylene glycol n-butyl ether ether, diethylene glycol n-butyl ether acetate, diethylene glycol phenyl ether, diisobutyl methanol, diisobutyl ketone, dimethyl adipate, dipropylene glycol dimethyl ether, dipropylene glycol Methyl ether, dipropylene glycol monomethyl ether acetate, dipropylene glycol monobutyl ether, dipropylene glycol monopropyl ether, dipropylene glycol n-butyl ether, dipropylene glycol n-propyl ether, dipropylene glycol phenyl ether, dextrorotatory Limonene, dodecane, ethylene glycol, ethanethiol, heptane, ethylene glycol diacetate, ethylene glycol hexyl ether, ethylene glycol mono-2-ethylhexyl ether, ethylene glycol monoallyl ether, ethylene glycol monobenzyl ether, ethylene glycol monobutyl ether, ethylene glycol monobutyl ether acetate, ethylene glycol monohexyl ether, ethylene glycol monoisobutyl ether, ethylene glycol monoiso propyl ether, ethylene glycol monomethyl ether, ethylene glycol monomethyl ether acetate, ethylene glycol monophenyl ether, ethylene glycol n-butyl ether, ethylene glycol n-butyl ether acetate, ethylene glycol Alcohol phenyl ether, ethylene glycol propyl ether, gamma-butyrolactone, hexanediol, isoamyl acetate, isobutyl acetate, isopropyl acetate, methyl-2-hydroxybenzoate, methyl Isobutyl methanol, methyl isobutyl ketone, methyl oleate, methyl-3-methoxypropionate, methylcyclohexene, n-butyl acetate, n-butyl propionate, n-dodecyl Alkane, n-hexyl acetate, N-methylpyrrolidone, n-amyl propionate, n-propyl acetate, n-propyl propionate, stearic acid (octadecanoic acid), polyethylene glycol monomethyl ether, propylene glycol dimethacrylate Acetate, propylene glycol monomethyl ether acetate, propylene glycol methyl ether, propylene glycol monobutyl ether, propylene glycol monomethyl ether acetate, propylene glycol monophenyl ether, propylene glycol monopropyl ether, propylene glycol n-butyl ether , propylene glycol n-butyl ether, propylene glycol n-propyl ether, propylene glycol phenyl ether, propylene glycol propyl ether, tetraethylene glycol dimethyl ether, triethylene glycol dimethyl ether, triethylene glycol ethyl ether, triethylene glycol methyl ether, triethylene glycol One or more of the group consisting of ethylene glycol n-butyl ether, tripropylene glycol methyl ether, tripropylene glycol n-butyl ether, 3-ethoxy ethyl propionate, and water, but not limited thereto. However, PGMEA (propylene glycol monomethyl ether acetate) or EEP (3-ethoxy ethyl propionate) is preferable in view of the easiness of manufacture of the color filter mentioned later. The content of the polar organic solvent may be 40-95 parts by weight, more preferably 60-90 parts by weight, relative to 100 parts by weight of the quantum dot dispersion as a whole. When the above-mentioned polar organic solvent exceeds the above-mentioned content range, it is advantageous for dispersibility, but the optical properties may be deteriorated, and when it is less than the above-mentioned range, it is advantageous for the optical properties, but there is a problem that the dispersion properties are deteriorated. Therefore, it is preferable that the above-mentioned polar organic solvent satisfies the above-mentioned range in view of the dispersibility and optical properties of the quantum dots.< Quantum dot dispersion manufacturing method >
Another aspect of the present invention relates to a method for producing a quantum dot dispersion, comprising: a step of preparing a quantum dot dispersion containing quantum dots and a non-polar organic solvent; a step of adding a surface treatment agent to the quantum dot dispersion; The step of removing the non-polar organic solvent from the quantum dot dispersion; and the step of adding a polar organic solvent to the quantum dot dispersion from which the non-polar organic solvent has been removed, and dispersing it to produce a quantum dot dispersion. The above content can be applied to the content of the above quantum dots, non-polar organic solvent, surface treatment agent and polar organic solvent. The method for producing a quantum dot dispersion of the present invention includes a step of preparing a quantum dot dispersion liquid containing quantum dots and a non-polar organic solvent. In the present invention, the above-mentioned "quantum dot dispersion" is a term different from "quantum dot dispersion". The above-mentioned "quantum dot dispersion" may refer to a generally commercially available quantum dot solution or the like, and may refer to a state not containing the surface treatment agent of the present invention, that is, a state before adding the surface treatment agent. In the present invention, the content of the quantum dots and the non-polar organic solvent in the quantum dot dispersion liquid is not limited. In the present invention, the above-mentioned quantum dot dispersion may refer to commercially available quantum dots, quantum dot solutions, quantum dot dispersions, quantum dot dispersions, etc., in the form of dispersions, specifically, the non-polar organic solvent in which quantum dots are dispersed. Therefore, as long as the above-mentioned quantum dots are dispersed in the above-mentioned dispersion liquid, the content thereof is not limited. In one embodiment of the present invention, the quantum dot dispersion may further contain an organic ligand. The above-mentioned organic ligand can bind to the surface of the above-mentioned quantum dots and can play a role of stabilizing the above-mentioned quantum dots. The above-mentioned organic ligands are not limited in the present invention, and may include, for example, pyridine, mercapto alcohol, thiol, phosphine, phosphine oxide, and the like. With respect to the total area of the quantum dots, the organic ligands can cover more than 5% of the surface. The above-mentioned organic ligand may be contained in the above-mentioned quantum dot dispersion liquid in a commercially available form, and if it is not contained in the above-mentioned quantum dot dispersion liquid, it may be directly added to the above-mentioned quantum dot dispersion liquid, and the above-mentioned organic ligand is added. When directly added to the above quantum dot dispersion liquid, its content can be added in 0.1 to 10 mol relative to 1 mol of quantum dots. In the case of directly adding the above-mentioned organic ligand to the above-mentioned quantum dot dispersion liquid, the step of stirring the above-mentioned quantum dot dispersion liquid may also be included after adding the above-mentioned organic ligand. The quantum dot dispersion manufacturing method of the present invention includes the step of adding a surface treatment agent to the quantum dot dispersion. The above-mentioned contents can be applied to the above-mentioned surface treatment agent. Specifically, in another embodiment of the present invention, the surface treatment agent may contain a phosphate-based compound; or a compound containing a carboxylic acid and an unsaturated double bond. In another embodiment of the present invention, the surface treatment agent may contain a phosphoric acid ester compound with an acid value of 10 or more; or a compound containing an unsaturated double bond with an acid value of 10 or more. In another embodiment of the present invention, the phosphoric acid The ester-based compound may further contain one or more of a polyether moiety, a polyester moiety, and a phosphoric acid group in one molecule. The method for producing a quantum dot dispersion of the present invention can exert the effect of improving the dispersibility of the quantum dots and a polar organic solvent by adding a surface treatment agent to the quantum dot dispersion liquid. Because of this, the quantum dot dispersion produced by the quantum dot dispersion production method of the present invention has the advantage of being able to prevent a reduction in quantum efficiency that may occur during the production process, thereby enabling the production of a color filter excellent in luminous efficiency. After the surface treatment agent is added to the quantum dot dispersion, the step of stirring the quantum dot dispersion may also be included, and the stirring may be performed by a method commonly used in this technology. The method for producing a quantum dot dispersion of the present invention includes the step of removing the above-mentioned non-polar organic solvent from the above-mentioned quantum dot dispersion liquid. In another embodiment of the present invention, the above-mentioned step of removing the non-polar organic solvent can be dried under normal pressure or under reduced pressure. For example, the pressure during the above drying can be reduced or normal pressure, usually in the range of 20Pa ~ 1012hPa, it can be carried out at the temperature of room temperature ~ 100 ℃, preferably 40 ~ 100 ℃ temperature, more preferably 40 ~ 60 ℃ temperature. ~ 12 hours, which has the advantage that the solvent can be easily removed. In the quantum dot dispersion manufacturing method of the present invention, the step of removing the non-polar organic solvent from the quantum dot dispersion liquid may be performed after the step of adding the surface treatment agent to the quantum dot dispersion liquid, or may be performed in This is performed before the step of adding the surface treatment agent to the above quantum dot dispersion. In the case where the above-mentioned non-polar organic solvent is removed from the above-mentioned quantum dot dispersion liquid after adding a surface treatment agent to the above-mentioned quantum dot dispersion liquid, there is a possibility of suppressing the occurrence of quantum dots in the process of removing the non-polar organic solvent described later. The advantages of quantum dot dispersion with excellent quantum efficiency can be obtained by oxidation. The method for producing a quantum dot dispersion of the present invention includes a step of adding a polar organic solvent to the quantum dot dispersion liquid from which the above-mentioned non-polar organic solvent has been removed, and dispersing it to produce a quantum dot dispersion. The above-mentioned dispersion method is not particularly limited in the present invention, and can be carried out by using methods and equipment commonly used in this technology. Since the method for producing a quantum dot dispersion of the present invention includes the step of adding a surface treatment agent, especially the step of adding a surface treatment agent before removing the non-polar organic solvent, it has the advantage of being able to prevent the non-polar The oxidation of the quantum dots that occurs during the removal of the organic solvent has the advantage that a color filter with excellent luminescent properties can be produced.< since send photosensitivity Tree fat Group compound > Another aspect of the present invention relates to a self-luminous photosensitive resin composition comprising the quantum dot dispersion and at least one selected from the group consisting of an alkali-soluble resin, a photopolymerizable compound, a photopolymerization initiator, a solvent, and an additive, And the content of the non-polar organic solvent is 100 ppm or less. In the self-luminous photosensitive resin composition of the present invention, the content of the quantum dot dispersion may be 3-80 parts by weight, preferably 5-70 parts by weight, relative to 100 parts by weight of the whole self-luminous photosensitive resin composition , more preferably 10 to 60 parts by weight. When the content of the quantum dot dispersion in the self-luminous photosensitive resin composition of the present invention is within the above range, there is an advantage that a color filter excellent in light emission characteristics can be produced. When the content of the above quantum dot dispersion is less than the above range, the luminescence characteristics may be reduced, and when the content of the above quantum dot dispersion exceeds the above range, the content of other components is relatively reduced, so that the formation of patterns may become difficult. , the reliability may be reduced, so it is preferably included in the above range. The self-luminous photosensitive resin composition of the present invention may contain an alkali-soluble resin. The said alkali-soluble resin can make the non-exposed part of the color filter manufactured from the said self-luminous photosensitive resin composition become alkali-soluble, can be removed, and can make an exposure area remain|survive. In addition, when the self-luminous photosensitive resin composition contains the alkali-soluble resin, the quantum dots can be uniformly dispersed in the composition, and the quantum dots can be protected during the process to maintain brightness. The above-mentioned alkali-soluble resin of the present invention can be selected from an alkali-soluble resin having an acid value of 50-200 (mg KOH/g). The above-mentioned "acid value" refers to the amount (mg) of potassium hydroxide required to neutralize 1 g of the acrylic polymer, and the solubility is adjusted by the measured value. When the acid value of the above-mentioned alkali-soluble resin is lower than the above-mentioned range, it may be difficult to ensure a sufficient development speed. If the acid value exceeds the above-mentioned range, the adhesion to the substrate is reduced, and short-circuiting of the pattern is likely to occur. Stability decreases and viscosity increases may occur. In addition, in order to improve the surface hardness when used as a color filter, the molecular weight and molecular weight distribution (Mw/Mn) of the above-mentioned alkali-soluble resin may be limited in consideration. Preferably, the weight average molecular weight is 3,000-32,000, preferably 5,000-32,000, and the molecular weight distribution is in the range of 1.5-6.0, preferably in the range of 1.8-4.0, directly polymerized or purchased for use. The alkali-soluble resin having the molecular weight and molecular weight distribution in the above-mentioned ranges can not only improve the hardness as mentioned above and have a high residual film rate, but also have excellent solubility in the non-exposed part in the developing solution and can improve the resolution. The above-mentioned alkali-soluble resin comprises a polymer selected from the group consisting of a polymer of a carboxyl-containing unsaturated monomer, a copolymer of the carboxyl-containing unsaturated monomer and a monomer having an unsaturated bond copolymerizable with it, and a combination thereof. more than one. In this case, the carboxyl group-containing unsaturated monomer may be unsaturated monocarboxylic acid, unsaturated dicarboxylic acid, unsaturated tricarboxylic acid, or the like. Specifically, as unsaturated monocarboxylic acid, acrylic acid, methacrylic acid, crotonic acid, (alpha)-chloroacrylic acid, cinnamic acid etc. are mentioned, for example. As an unsaturated dicarboxylic acid, maleic acid, fumaric acid, itaconic acid, citraconic acid, mesaconic acid, etc. are mentioned, for example. An unsaturated polyhydric carboxylic acid may be an acid anhydride, and maleic anhydride, itaconic anhydride, a citraconic anhydride, etc. are mentioned specifically,. In addition, the unsaturated polyhydric carboxylic acid may also be a mono(2-methacryloyloxyalkyl) ester, for example, mono(2-acryloyloxyethyl) succinate, mono(2-methyl succinate) Acryloyloxyethyl) ester, mono(2-acryloyloxyethyl) phthalate, mono(2-methacryloyloxyethyl) phthalate, and the like. The unsaturated polycarboxylic acid may also be the mono(meth)acrylate of the dicarboxylate polymer at both ends, for example, ω-carboxypolycaprolactone monoacrylate, ω-carboxypolycaprolactone monomethacrylic acid can be mentioned. esters, etc. Each of these carboxyl group-containing monomers may be used alone or in combination of two or more. In addition, the monomer copolymerizable with the carboxyl group-containing unsaturated monomer may be selected from the group consisting of aromatic vinyl compounds, unsaturated carboxylic acid ester compounds, unsaturated carboxylic acid aminoalkyl ester compounds, unsaturated carboxylic acid glycidyl groups Ester compound, vinyl carboxylate compound, unsaturated ether compound, vinyl cyanide compound, unsaturated imide compound, aliphatic conjugated diene compound, the end of the molecular chain has a monoacryloyl or mono One of the group consisting of methacryloyl-based macromonomers, macromonomers and their combinations. More specifically, as the above-mentioned copolymerizable monomer, styrene, α-methylstyrene, o-vinyltoluene, m-vinyltoluene, p-vinyltoluene, p-chlorostyrene, o-methoxystyrene, m-methoxystyrene, p-methoxystyrene, o-vinylbenzyl methyl ether, m-vinylbenzyl methyl ether, p-vinylbenzyl methyl ether, o-vinylbenzyl glycidyl ether , m-vinylbenzyl glycidyl ether, p-vinylbenzyl glycidyl ether, indene and other aromatic vinyl compounds; methyl acrylate, methyl methacrylate, ethyl acrylate, ethyl methacrylate, acrylic acid n-propyl, n-propyl methacrylate, isopropyl acrylate, isopropyl methacrylate, n-butyl acrylate, n-butyl methacrylate, isobutyl acrylate, isobutyl methacrylate, second acrylate Butyl, 2-butyl methacrylate, 3-butyl acrylate, 3-butyl methacrylate, 2-hydroxyethyl acrylate, 2-hydroxyethyl methacrylate, 2-hydroxypropyl acrylate, methyl methacrylate 2-hydroxypropyl acrylate, 3-hydroxypropyl acrylate, 3-hydroxypropyl methacrylate, 2-hydroxybutyl acrylate, 2-hydroxybutyl methacrylate, 3-hydroxybutyl acrylate, 3-hydroxybutyl methacrylate -Hydroxybutyl, 4-hydroxybutyl acrylate, 4-hydroxybutyl methacrylate, allyl acrylate, allyl methacrylate, benzyl acrylate, benzyl methacrylate, cyclohexyl acrylate, methyl methacrylate Cyclohexyl acrylate, phenyl acrylate, phenyl methacrylate, 2-methoxyethyl acrylate, 2-methoxyethyl methacrylate, 2-phenoxyethyl acrylate, 2-benzene methacrylate methoxyethyl ester, methoxydiethylene glycol acrylate, methoxydiethylene glycol methacrylate, methoxytriethylene glycol acrylate, methoxytriethylene glycol methacrylate, methyl Oxypropylene glycol acrylate, methoxypropylene glycol methacrylate, methoxydipropylene glycol acrylate, methoxydipropylene glycol methacrylate, isobornyl acrylate, isobornyl methacrylate, dicyclopentane acrylate Alkenyl ester, dicyclopentadienyl methacrylate, adamantyl (meth)acrylate, norbornyl (meth)acrylate, 2-hydroxy-3-phenoxypropyl acrylate, 2-hydroxy methacrylate -Unsaturated carboxylic acid esters such as 3-phenoxypropyl ester, glycerol monoacrylate, glycerol monomethacrylate; 2-aminoethyl acrylate, 2-aminoethyl methacrylate, 2-dimethyl acrylate Aminoethyl, 2-dimethylaminoethyl methacrylate, 2-aminopropyl acrylate, 2-aminopropyl methacrylate, 2-dimethylaminopropyl acrylate, methyl 2-dimethylaminopropyl acrylate, 3-aminopropyl acrylate, 3-aminopropyl methacrylate, 3-dimethylaminopropyl acrylate, 3-dimethylamino methacrylate Unsaturated carboxylic acid amino alkyl ester compounds such as propyl ester; unsaturated carboxylic acid glycidyl ester compounds such as glycidyl acrylate and glycidyl methacrylate; vinyl acetate, vinyl propionate, vinyl butyrate, Vinyl carboxylate compounds such as vinyl benzoate; vinyl methyl ether, vinyl ethyl Unsaturated ether compounds such as ether and allyl glycidyl ether; vinyl cyanide compounds such as acrylonitrile, methacrylonitrile, α-chloroacrylonitrile, vinylidene dicyanide; acrylamide, methacrylamide , α-chloroacrylamide, N-2-hydroxyethyl acrylamide, N-2-hydroxyethyl methyl acrylamide and other unsaturated amides; maleimide, benzylmaleimide Amines, N-phenylmaleimide, N-cyclohexylmaleimide and other unsaturated imine compounds; 1,3-butadiene, isoprene, chloroprene and other aliphatic co-polymers Conjugated dienes; and polystyrene, polymethyl acrylate, polymethyl methacrylate, poly-n-butyl acrylate, poly-n-butyl methacrylate, polysiloxane polymer molecular chains with mono Acryloyl or monomethacryloyl macromonomers; monomers with norbornyl skeleton, monomers with adamantane skeleton, monomers with rosin skeleton and other bulky monomers that can reduce the relative dielectric constant body. The content of the alkali-soluble resin can be 10-80 parts by weight, specifically 15-70 parts by weight, more specifically 20-45 parts by weight, relative to 100 parts by weight of the total solid content of the self-luminous photosensitive resin composition. When the content of the above-mentioned alkali-soluble resin is in the above-mentioned range, the solubility in the developing solution is sufficient and the pattern is easily formed, and the film of the pixel part of the exposed part is prevented from being reduced during development, but the peeling property of the pixel part is improved, so it is preferable. . When the content of the alkali-soluble resin is less than the above-mentioned range, the non-pixel part may only be slightly peeled off, and when the content of the alkali-soluble resin exceeds the above-mentioned range, the solubility in the developing solution may decrease and pattern formation may be difficult. The photopolymerizable compound contained in the self-luminous photosensitive resin composition of the present invention is a compound that can be polymerized by the action of light and a photopolymerization initiator described later, and examples thereof include monofunctional monomers, difunctional monomers, and Multifunctional monomers, etc. The type of the above-mentioned monofunctional monomer is not particularly limited, and examples thereof include nonylphenyl carbitol acrylate, 2-hydroxy-3-phenoxypropyl acrylate, 2-ethylhexyl carbitol acrylate, acrylic acid 2-hydroxyethyl ester, N-vinylpyrrolidone, etc. The type of the above-mentioned difunctional monomer is not particularly limited, and examples thereof include 1,6-hexanediol di(meth)acrylate, ethylene glycol di(meth)acrylate, and neopentyl glycol di(meth)acrylate. Acrylate, triethylene glycol di(meth)acrylate, bis(acrylooxyethyl) ether of bisphenol A, 3-methylpentanediol di(meth)acrylate, etc. The kind of the above-mentioned polyfunctional monomer is not particularly limited, for example, trimethylolpropane tri(meth)acrylate, ethoxylated trimethylolpropane tri(meth)acrylate, propoxylated tri(meth)acrylate, Methylol propane tri(meth)acrylate, Isopentaerythritol tri(meth)acrylate, Isopentaerythritol tetra(meth)acrylate, Diisopentaerythritol tri(meth)acrylate, Diisopentaerythritol tri(meth)acrylate Isopentaerythritol Penta(meth)acrylate, Ethoxylated Diisopentaerythritol Hex(meth)acrylate, Propoxylated Diisopentaerythritol Hex(meth)acrylate, Diisopentaerythritol Alcohol hexa(meth)acrylate, etc. Among them, it is preferable to use a polyfunctional monomer of difunctional or higher. As an example of the commercial item of the said photopolymerizable compound, there exist A9550 of Shin-Nakamura Corporation, etc., but it is not limited to this. The content of the photopolymerizable compound may be 5 to 50 parts by weight, specifically 15 to 45 parts by weight, more specifically 20 to 37 parts by weight, relative to 100 parts by weight of the total solid content of the self-luminous photosensitive resin composition. When content of the said photopolymerizable compound exists in the said range, there exists an advantage in the intensity|strength and smoothness of a pixel part. When the content of the above-mentioned photopolymerizable compound is less than the above-mentioned range, the intensity of the pixel portion may be reduced, and when the content of the above-mentioned photopolymerizable compound exceeds the above-mentioned range, the smoothness may be reduced, so it is preferably included in the above-mentioned range. Inside. The self-luminous photosensitive resin composition of the present invention may contain a photopolymerization initiator, and the type of the photopolymerization initiator is not particularly limited as long as the photopolymerizable compound can be polymerized. In particular, from the viewpoints of polymerization characteristics, initiation efficiency, absorption wavelength, availability, and price, the above-mentioned photopolymerization initiator is preferably selected from the group consisting of acetophenone-based compounds, benzophenone-based compounds, triazine-based compounds, and biimidazole-based compounds. One or more compounds in the group consisting of compounds, oxime-based compounds and thioxanthone-based compounds. Specific examples of the above-mentioned acetophenone-based compound include diethoxyacetophenone, 2-hydroxy-2-methyl-1-phenylpropan-1-one, benzil dimethyl ketal, 2-Hydroxy-1-[4-(2-hydroxyethoxy)phenyl]-2-methylpropan-1-one, 1-hydroxycyclohexyl phenyl ketone, 2-methyl-1-(4- Methylphenylthio)-2-morpholinopropan-1-one, 2-benzyl-2-dimethylamino-1-(4-morpholinophenyl)butan-1-one, 2 -Hydroxy-2-methyl-1-[4-(1-methylvinyl)phenyl]propan-1-one, 2-(4-methylbenzyl)-2-(dimethylamino) -1-(4-morpholinophenyl)butan-1-one, etc. Examples of the benzophenone-based compound include benzophenone, methyl o-benzoylbenzoate, 4-phenylbenzophenone, and 4-benzoyl-4'-methyldiphenylsulfide Ether, 3,3',4,4'-tetra(tert-butylperoxycarbonyl)benzophenone, 2,4,6-trimethylbenzophenone, etc. Specific examples of the triazine-based compound include 2,4-bis(trichloromethyl)-6-(4-methoxyphenyl)-1,3,5-triazine, 2,4- Bis(trichloromethyl)-6-(4-methoxynaphthyl)-1,3,5-triazine, 2,4-bis(trichloromethyl)-6-piperonyl-1,3, 5-triazine, 2,4-bis(trichloromethyl)-6-(4-methoxystyryl)-1,3,5-triazine, 2,4-bis(trichloromethyl) -6-[2-(5-Methylfuran-2-yl)ethenyl]-1,3,5-triazine, 2,4-bis(trichloromethyl)-6-[2-(furan- 2-yl)vinyl]-1,3,5-triazine, 2,4-bis(trichloromethyl)-6-[2-(4-diethylamino-2-methylphenyl) vinyl]-1,3,5-triazine, 2,4-bis(trichloromethyl)-6-[2-(3,4-dimethoxyphenyl)vinyl]-1,3, 5-triazine, etc. Specific examples of the above-mentioned biimidazole-based compound include 2,2'-bis(2-chlorophenyl)-4,4',5,5'-tetraphenylbiimidazole, 2,2'-bis( 2,3-Dichlorophenyl)-4,4',5,5'-tetraphenylbiimidazole, 2,2'-bis(2-chlorophenyl)-4,4',5,5'- Tetrakis(alkoxyphenyl)biimidazole, 2,2'-bis(2-chlorophenyl)-4,4',5,5'-tetrakis(trialkoxyphenyl)biimidazole, 2,2 -Bis(2,6-dichlorophenyl)-4,4',5,5'-tetraphenyl-1,2'-biimidazole or phenyl at 4,4',5,5' position through alkane Oxycarbonyl substituted imidazole compounds, etc. Among them, 2,2'-bis(2-chlorophenyl)-4,4',5,5'-tetraphenylbiimidazole, 2,2'-bis(2,3-dichlorophenyl) )-4,4',5,5'-tetraphenylbiimidazole, 2,2-bis(2,6-dichlorophenyl)-4,4',5,5'-tetraphenyl-1, 2'-biimidazole. Specific examples of the above-mentioned oxime-based compounds include o-ethoxycarbonyl-α-oxyimino-1-phenylpropan-1-one, and the like, and a typical commercial product is Irgacure OXE from BASF. 01. OXE 02. Examples of the above-mentioned thioxanthone-based compound include 2-isopropylthioxanthone, 2,4-diethylthioxanthone, 2,4-dichlorothioxanthone, and 1-chloro-4-propoxythioxanthone Tonone, etc. The content of the photopolymerization initiator may be 0.1 to 10 parts by weight, preferably 1 to 9.5 parts by weight, and more preferably 5 to 9.5 parts by weight relative to 100 parts by weight of the total solid content of the self-luminous photosensitive resin composition. When content of the said photoinitiator is in the said range, since the said self-luminescent photosensitive resin composition becomes highly sensitive and exposure time is shortened, it is possible to improve productivity and maintain high resolution, which is preferable. Moreover, there exists an advantage that the intensity|strength of the pixel part formed using the self-luminous photosensitive resin composition of this invention, and the smoothness of the surface of the said pixel part become favorable. In order to improve the sensitivity of the self-luminous photosensitive resin composition of the present invention, the above-mentioned photopolymerization initiator may further contain a photopolymerization initiation assistant. When the above-mentioned photopolymerization initiation adjuvant is contained, there is an advantage that the sensitivity is further increased and the productivity is improved. As the above-mentioned photopolymerization initiation adjuvant, for example, one or more compounds selected from the group consisting of amine compounds, carboxylic acid compounds, and organosulfur compounds having a thiol group can be preferably used, but it is not limited thereto. As the above-mentioned amine compound, an aromatic amine compound is preferably used, and specifically, aliphatic amine compounds such as triethanolamine, methyldiethanolamine, and triisopropanolamine, methyl 4-dimethylaminobenzoate, 4-diethanolamine and the like can be used. Ethyl methylaminobenzoate, isoamyl 4-dimethylaminobenzoate, 2-ethylhexyl 4-dimethylaminobenzoate, 2-dimethylaminoethyl benzoate, N,N-Dimethyl-p-toluidine, 4,4'-bis(dimethylamino)benzophenone (common name: Michler's ketone), 4,4'-bis(diethylamino)bis Benzophenone, etc. The above-mentioned carboxylic acid compound is preferably an aromatic heteroacetic acid, and specific examples thereof include phenylthioacetic acid, methylphenylthioacetic acid, ethylphenylthioacetic acid, methylethylphenylthioacetic acid, and diethylphenylthioacetic acid. Methylphenylthioacetic acid, Methoxyphenylthioacetic acid, Dimethoxyphenylthioacetic acid, Chlorophenylthioacetic acid, Dichlorophenylthioacetic acid, N-phenylglycine, Phenoxyacetic acid, naphthylthioacetic acid, N-naphthylglycine, naphthoxyacetic acid, etc. Specific examples of the above-mentioned organosulfur compound having a thiol group include 2-mercaptobenzothiazole, 1,4-bis(3-mercaptobutanoyloxy)butane, 1,3,5-tris(3 -Mercaptobutoxyethyl)-1,3,5-triazine-2,4,6(1H,3H,5H)-trione, trimethylolpropane tris(3-mercaptopropionate), iso Pentaerythritol tetrakis(3-mercaptobutyrate), Isopentaerythritol tetrakis(3-mercaptopropionate), Diisopentaerythritol hexa(3-mercaptopropionate), Tetraethylene glycol bis(3-mercaptopropionate) mercaptopropionate) etc. The above-mentioned photopolymerization initiation adjuvant can be appropriately added and used within a range not impairing the effects of the present invention. The solvent contained in the self-luminous photosensitive resin composition of the present invention is not particularly limited, and an organic solvent commonly used in the art may be contained. Specific examples of the above-mentioned solvent include ethylene glycol monoalkyl ethers such as ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monopropyl ether, and ethylene glycol monobutyl ether; diethylene glycol Diethylene glycol dialkyl ethers such as dimethyl ether, diethylene glycol diethyl ether, diethylene glycol dipropyl ether, and diethylene glycol dibutyl ether; methyl cellosolve acetate , Ethylene glycol alkyl ether acetates such as ethyl cellosolve acetate; propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, propylene glycol monopropyl ether acetate and other alkylenes Glycol alkyl ether acetates; alkoxyalkyl acetates such as methoxybutyl acetate and methoxypentyl acetate; aromatic hydrocarbons such as benzene, toluene, xylene, and mesitylene ketones; methyl ethyl ketone, acetone, methyl amyl ketone, methyl isobutyl ketone, cyclohexanone and other ketones; ethanol, propanol, butanol, hexanol, cyclohexanol, ethylene glycol, glycerin Alcohols such as ethyl 3-ethoxypropionate, esters such as methyl 3-methoxypropionate, cyclic esters such as γ-butyrolactone, etc. Regarding the above-mentioned solvent, from the viewpoint of coatability and drying properties, among the above-mentioned solvents, preferably, an organic solvent having a boiling point of 100 to 200° C. is used, and more preferably, alkylene glycol alkyl ether acetates, ketones are used. esters such as ethyl 3-ethoxypropionate or methyl 3-methoxypropionate, more preferably propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, 3 - Ethoxypropionate, methyl 3-methoxypropionate, etc. These solvents may be used alone or in combination of two or more. With respect to 100 parts by weight of the whole self-luminous photosensitive resin composition, the content of the solvent may be 25 to 90 parts by weight, specifically 30 to 80 parts by weight, but not limited thereto. However, when the content of the above-mentioned solvent is within the above-mentioned range, a roll coater, a spin coater, a slit spin coater, a slit coater (sometimes also referred to as a die coater), an ink jet printing When coating is performed by a coating device such as a table machine, the coating property becomes better, so it is preferable. When the content of the above-mentioned solvent is less than the above-mentioned range, the process may become difficult due to a decrease in coatability. Performance may be reduced. The same solvent as the polar organic solvent contained in the quantum dot dispersion can be used as the above-mentioned solvent, or a different solvent can be used, but it is not limited thereto. In order to increase coatability or adhesiveness, the self-luminous photosensitive resin composition of the present invention may further contain additives such as an adhesion promoter and a surfactant. The above-mentioned adhesion promoter may be added in order to improve adhesion with the substrate, and may contain a silane having a reactive substituent selected from the group consisting of a carboxyl group, a methacryloyl group, an isocyanate group, an epoxy group, and a combination thereof. coupling agent, but not limited to this. For example, the above-mentioned silane coupling agent includes trimethoxysilylbenzoic acid, γ-methacryloyloxypropyltrimethoxysilane, vinyltriacetoxysilane, vinyltrimethoxysilane, γ-methacryloyloxypropyltrimethoxysilane, -Isocyanatepropyltriethoxysilane, γ-glycidoxypropyltrimethoxysilane, β-(3,4-epoxycyclohexyl)ethyltrimethoxysilane, etc., which can be used alone or in combination Use in combination of two or more. When the self-luminous photosensitive resin composition of the present invention contains the above-mentioned surfactant, there is an advantage that coatability can be improved. For example, BM-1000, BM-1100 (BM Chemie Co., Ltd.), Fluorad FC-135/FC-170C/FC-430 (Sumitomo 3M Co., Ltd.), SH-28PA/-190/SZ- Fluorine-based surfactants such as 6032 (Toray Silicone Co., Ltd.) are not limited to these. In addition to this, within the scope of not impairing the effects of the present invention, the self-luminous photosensitive resin composition of the present invention may further contain additives such as antioxidants, ultraviolet absorbers, and anticoagulants. Within the scope of the effects of the present invention, those skilled in the art can appropriately add and use them. For example, based on the total weight of the self-luminous photosensitive resin composition, the additives can be used in an amount of 0.05 to 10 parts by weight, specifically 0.1 to 10 parts by weight, more specifically 0.1 to 5 parts by weight, but not limited to this . In another embodiment of the present invention, in the self-luminous photosensitive resin composition, the content of the non-polar organic solvent may be 100 ppm or less, specifically 50 ppm or less, and more specifically 10 ppm or less. Therefore, it has advantages in terms of process and environment.< filter shader >
Another aspect of this invention provides the color filter manufactured using the said self-luminous photosensitive resin composition. The color filter of the present invention includes a cured product of a self-luminous photosensitive resin composition containing the quantum dot dispersion produced by the quantum dot dispersion production method of the present invention, and therefore has uniform dispersion of quantum dot particles, excellent light efficiency, and pixel image Point of the advantages of excellent quality. The color filter includes a substrate and a pattern layer formed on the upper portion of the substrate. Regarding the above-mentioned substrate, the above-mentioned color filter itself may be a substrate, or may be a portion where the color filter is located in a display device or the like, and is not particularly limited. The substrate may be glass, silicon (Si), silicon oxide (SiOx) or a polymer substrate, and the polymer substrate may be polyethersulfone (PES) or polycarbonate (PC). As a layer containing the self-luminous photosensitive resin composition of the present invention, the pattern layer may be a layer formed by applying the self-luminous photosensitive resin composition and exposing, developing, and thermally curing it in a predetermined pattern. The above-mentioned pattern layer can be formed by a method generally known in the art. The color filter including the above-mentioned substrate and pattern layer may further include partition walls formed between the patterns, and may further include a black matrix, but is not limited thereto. Moreover, the protective film formed in the upper part of the pattern layer of the said color filter may further be included. The color filter may include one or more layers selected from the group consisting of a red pattern layer, a green pattern layer, and a blue pattern layer. Specifically, the color filter may include one or more layers selected from the group consisting of a red pattern layer including red quantum dots, a green pattern layer including green quantum dots, and a blue pattern layer including blue quantum dots of the present invention . The red pattern layer, the green pattern layer, and the blue pattern layer can each emit red light, green light, and blue light when irradiated with light. In this case, the light emitted from the light source is not particularly limited, but is more excellent in color reproducibility. Consider that a light source that emits blue light can be used. The above-mentioned color filter may only have pattern layers of two colors among the red pattern layer, the green pattern layer, and the blue pattern layer, but it is not limited thereto. However, in the case where the color filter includes only pattern layers of two colors, the pattern layer may further include a transparent pattern layer that does not contain the quantum dot particles. In the case where the above-mentioned color filter includes only the pattern layers of the above-mentioned two colors, a light source that emits light having a wavelength other than the above-mentioned two colors may be used. For example, when the color filter includes a red pattern layer and a green pattern layer, a light source that emits blue light can be used. In this case, red quantum dots emit red light, green quantum dots emit green light, and the transparent pattern layer enables the light source to emit light. The emitted blue light is directly transmitted through to display blue.< picture picture show display device >
Furthermore, another aspect of the present invention relates to an image display device including the above-described color filter. The color filter of the present invention can be applied not only to ordinary liquid crystal display devices, but also to various image display devices such as electroluminescence display devices, plasma display devices, and field emission display devices. The image display device of the present invention has the following advantages: due to the addition of a specific surface treatment agent, it is excellent in light efficiency and exhibits high brightness, excellent in color reproducibility, and has a wide viewing angle by using a quantum dot dispersion without a reduction in quantum efficiency. The above-mentioned image display device may further include a light source emitting blue light and a transparent pattern layer, and the above-mentioned content may be applied to the above-mentioned light source emitting blue light and the above-mentioned transparent pattern layer. Hereinafter, in order to demonstrate this specification concretely, an Example is given and it demonstrates in detail. However, the embodiments of this specification can be modified into various other forms, and it should not be construed that the scope of this specification is limited by the embodiments described in detail below. The embodiments of the present specification are provided to more completely explain the present specification to those skilled in the art. In addition, unless otherwise specified, the following "%" and "part" indicating the content are based on weight.Synthesis example : base soluble Tree Fatty synthesis
Prepare a flask equipped with a stirrer, a thermometer, a reflux condenser, a dropping funnel, and a nitrogen introduction tube, and in another form, put 45 parts by weight of N-benzylmaleimide, 45 parts by weight of methacrylic acid, and 3 parts by weight of methacrylic acid. 10 parts by weight of cyclodecyl ester, 4 parts by weight of tert-butyl peroxy-2-ethylhexanoate, and 40 parts by weight of propylene glycol monomethyl ether acetate (hereinafter referred to as PGMEA), followed by stirring and mixing to prepare monomers To the dropping funnel, 6 parts by weight of n-dodecanethiol and 24 parts by weight of PGMEA were added, and the mixture was stirred and mixed to prepare a chain transfer agent dropping funnel. Then, 395 parts by weight of PGMEA was introduced into the flask, and the atmosphere in the flask was replaced with nitrogen from air, and then the temperature of the flask was raised to 90°C while stirring. Next, the monomer and the chain transfer agent were started to be dripped from the dropping funnel. The dripping was maintained at 90°C for 2 hours. After 1 hour, the temperature was raised to 110°C and maintained for 3 hours. Then, the gas inlet pipe was introduced to start bubbling of a mixed gas of oxygen/nitrogen=5/95 (v/v). Next, 10 parts by weight of glycidyl methacrylate, 0.4 parts by weight of 2,2'-methylenebis(4-methyl-6-tert-butylphenol), and 0.8 parts by weight of triethylamine were put into the flask, The reaction was continued at 110° C. for 8 hours, and then cooled to room temperature to obtain an alkali-soluble resin having a solid content of 29.1% by weight, a weight average molecular weight of 32,000, and an acid value of 114 mgKOH/g.Manufacturing example 2-1 ~ 2-7: Fabrication of quantum dot dispersions
A surface treatment agent is added to the commercially available quantum dot dispersion liquid, and after stirring with a magnetic bar, non-polar organic solvents such as chloroform are removed by a hot air oven capable of vacuum decompression treatment. Next, after adding a polar organic solvent, dispersion was carried out by a paint stirrer, and the quantum dot dispersions of Production Examples 2-1 to 2-7 were produced. At this time, the quantum dots, surface treatment agent, solvent and drying conditions were as shown in the following table 1 shown. [Table 1] Manufacturing example 2-8 ~ 2-14: Fabrication of quantum dot dispersions
A surface treatment agent is added to the commercially available quantum dot dispersion liquid, and after stirring with a magnetic bar, non-polar organic solvents such as chloroform are removed by a hot air oven capable of vacuum decompression treatment. Next, after adding a polar organic solvent, dispersion was carried out by a paint stirrer, and the quantum dot dispersions of Production Examples 2-8 to 2-14 were produced. At this time, the quantum dots, the surface treatment agent, the solvent, and the drying conditions are shown in Table 2 below. [Table 2] Manufacturing example 2-15 ~ 2-21: Fabrication of quantum dot dispersions
Non-polar organic solvents such as chloroform are removed from the commercially available quantum dot dispersion in a hot air oven that can be treated under reduced pressure. Then, after adding a surface treatment agent, and then adding a polar organic solvent, dispersion was performed by a paint stirrer, and the quantum dot dispersions of Production Examples 2-15 to 2-21 were produced. At this time, the quantum dots, the surface treatment agent, the solvent, and the drying conditions are shown in Table 3 below. [table 3] Reality Examples and Compare Compare example: since send photosensitivity Tree fat Group compound manufacture
Using the compositions of the following Tables 4 and 5, the self-luminous photosensitive resin compositions of Examples and Comparative Examples were produced. [Table 4]
[table 5] experiment example
(1) Measurement of dispersion particle size of quantum dot dispersion and photosensitive resin composition The dispersion particle size was measured by ELSZ-2000ZS (manufactured by Otsuka Corporation) and shown in Table 6 below. Generally, when the quantum dot particles are aggregated, the dispersed particle size becomes large, which causes a problem that the light-emitting characteristic decreases. (2) Analysis of Chloroform Content of Quantum Dot Dispersion Regarding the quantitative analysis of chloroform (chloroform) remaining in the quantum dot dispersion produced in the production example, the analysis was carried out by Agilent GC-MS, and the results are shown in in Table 6 below. Usually, the higher the drying temperature under normal pressure and the lower the pressure under reduced pressure, the lower the chloroform content. If the chloroform content is high, it will adversely affect the health of the operator. (3) Determination of the development type of the self-luminous photosensitive resin composition The self-luminous photosensitive resin compositions of Examples 1 to 13 and Comparative Examples 1 to 8 were coated on a glass substrate by spin coating, and then placed under heating After the plate was maintained at 100°C for 3 minutes to form a thin film, it was immersed in a KOH aqueous solution of pH 10.5 (0.04% KOH, 26°C) to confirm the applied self-luminous photosensitive resin composition layer. The form at the time of development is either a dissolved form or a peeled form, and is described in Table 6 below. In the case of the dissolved form, the formation of the pixel pattern was favorable, but in the case of the peeled form, the formation of the pixel pattern was difficult and the characteristic was that it could not be used. (4) Measurement of luminous intensity (Intensity) Measurement of the pattern portion formed with a 20 mm × 20 mm regular quadrilateral pattern in the color filter in which the self-luminous pixel was formed was measured by a 365 nm type 4W UV irradiator (VL-4LC, VILBER LOURMAT) In the area of photoconversion, the luminous intensity of photoconversion was measured using a Spectrum meter USB2000+ (manufactured by Ocean Optics), and is shown in Table 6 below. It can be judged that the higher the measured light intensity, the more excellent self-luminous properties are exhibited. [Table 6]
From the above Table 6, it was confirmed that by adding a phosphate-based surface treatment agent during the production of the quantum dot dispersion, a quantum dot dispersion having no reduction in quantum efficiency and excellent dispersibility could be provided. In the case of a surface treatment agent and a urethane-based surface treatment agent, the dispersibility is poor. In addition, the chloroform content in the self-luminous photosensitive resin composition using the quantum dot dispersion of the present invention was analyzed, and as a result, it was confirmed that the removal process of the decompression-heat treatment was effective in removing the residual non-polar solvent.