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TWI746765B - 光學積層體 - Google Patents

光學積層體 Download PDF

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Publication number
TWI746765B
TWI746765B TW107101267A TW107101267A TWI746765B TW I746765 B TWI746765 B TW I746765B TW 107101267 A TW107101267 A TW 107101267A TW 107101267 A TW107101267 A TW 107101267A TW I746765 B TWI746765 B TW I746765B
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TW
Taiwan
Prior art keywords
light
substrate
layer
transparent electrode
film
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Application number
TW107101267A
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English (en)
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TW201831968A (zh
Inventor
藤野望
平井真理子
大塚雅德
米澤秀行
Original Assignee
日商日東電工股份有限公司
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Priority claimed from JP2018002118A external-priority patent/JP2018116273A/ja
Application filed by 日商日東電工股份有限公司 filed Critical 日商日東電工股份有限公司
Publication of TW201831968A publication Critical patent/TW201831968A/zh
Application granted granted Critical
Publication of TWI746765B publication Critical patent/TWI746765B/zh

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    • G02B5/0236—Diffusing elements; Afocal elements characterised by the diffusing properties the diffusion taking place within the volume of the element
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  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Structural Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Nonlinear Science (AREA)
  • Liquid Crystal (AREA)
  • Civil Engineering (AREA)
  • Architecture (AREA)
  • Dispersion Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Non-Portable Lighting Devices Or Systems Thereof (AREA)
  • Laminated Bodies (AREA)

Abstract

本發明提供一種於透過模式下具有較高之透光率之調光器件。 本發明之調光膜依序具備：第1基板，其具備第1透明電極層；調光層，其根據有無施加電壓而改變透過光之散射狀態；及第2基板，其具備第2透明電極層；且該調光膜構成為能夠根據該透過光之散射狀態而切換成非散射模式與散射模式，散射模式下之該調光膜之霧度值相對於非散射模式下之該調光膜之霧度值的比(散射模式下之霧度值/非散射模式下之霧度值)為8.0以上，該調光膜之非散射模式下之透光率為80%以上。

Description

光學積層體
本發明係關於一種光學積層體。
先前，不斷開發利用聚合物與液晶材料之複合體之光散射效果的調光器件。於此種複合體中，採用在聚合物基質內液晶材料發生相分離或分散之結構，因此藉由對聚合物與液晶材料之折射率進行匹配、及對該複合體施加電壓而改變液晶材料之配向，可對使光透過之透過(非散射)模式與使光散射之散射模式進行控制。此種調光器件主要以窗玻璃等為首而組裝至玻璃中使用之機會較多，因此尤其要求透過模式下之透光率較高。 先前技術文獻 專利文獻 專利文獻1：日本專利特開平2-208627號公報
[發明所欲解決之問題] 本發明係為了解決上述先前之問題而成者，其目的在於提供一種於透過模式下具有較高之透光率之調光器件。 [解決問題之技術手段] 本發明之調光膜依序具備：第1基板，其具備第1透明電極層；調光層，其根據有無施加電壓而改變透過光之散射狀態；及第2基板，其具備第2透明電極層；且該調光膜構成為能夠根據該透過光之散射狀態而切換成非散射模式與散射模式，散射模式下之該調光膜之霧度值相對於非散射模式下之該調光膜之霧度值的比(散射模式下之霧度值/非散射模式下之霧度值)為8.0以上，該調光膜之非散射模式下之透光率為80%以上。 於一實施形態中，上述調光膜中，上述第1基板具備第1基材及上述第1透明電極層，上述第2基板具備第2基材及上述第2透明電極層，以該第1透明電極層與該第2透明電極層對向之方式配置，該調光層以與該第1基板及該第2基板接觸之方式設置。 於一實施形態中，上述第1基板及/或第2基板之透過率為85%以上。 於一實施形態中，上述第1透明電極層及/或上述第2透明電極層包含銦錫氧化物。 於一實施形態中，上述第1基材及/或第2基材包含聚對苯二甲酸乙二酯。 於一實施形態中，上述調光層為高分子分散型液晶層。 根據本發明之另一態樣，而提供一種調光玻璃。該調光玻璃具備上述調光膜。 [發明之效果] 根據本發明，可提供一種於透過模式下具有較高之透光率之調光器件。
以下，參照圖式對本發明之實施形態進行說明，但本發明並不限於該等實施形態。 A.調光膜之整體構成 圖1係本發明之一實施形態之調光膜之概略剖視圖。調光膜100依序具備第1基板10、調光層30、及第2基板20。第1基板10具備第1透明電極層12。於一實施形態中，第1基板10進而具備第1基材11。第2基板20具備第2透明電極層22。於一實施形態中，第2基板20進而具備第2基材21。第1透明電極層12與第2透明電極層22可以夾持調光層30之方式對向配置。又，於一實施形態中，調光層30以與第1基板10及第2基板20接觸之方式設置。雖未圖示，但上述調光膜亦可進而包含其他層。作為其他層，例如可列舉：硬塗層、黏著劑層、保護層等。該等可配置於基板之任一者、或兩者之外側(未設置透明電極層之側)。 於本說明書中，有時亦將第1基材及第2基材統稱為基材，及將第1透明電極層及第2透明電極層統稱為透明電極層。又，有時亦將第1基板及第2基板統稱為基板。 調光層係根據有無施加電壓而改變透過光之散射狀態之層。本發明之調光膜藉由具備調光層，可切換成光散射得到抑制之狀態之非散射模式與光處於散射狀態之散射模式。於本發明中，藉由將基板之透光率、基板所具備之基材之構成、透明電極層之構成最佳化，可獲得非散射模式下之透過率較高之調光膜。又，可獲得非散射模式下之霧度較低之調光膜。於一實施形態中，本發明之調光膜用於調光玻璃。該調光玻璃係玻璃與調光膜之積層體，例如可用作窗玻璃。該調光玻璃藉由將調光膜設為散射模式，而發揮遮蔽視野之掩蔽功能，另一方面，非散射模式時之透明性優異。 本發明之調光膜之非散射模式下之透光率較佳為80%以上，更佳為85%以上，進而較佳為90%以上。該透光率越高越佳，其上限例如為99%。再者，本申請案中之所謂透光率係指全光線透過率，其數值依據JIS K 7105而測定。 本發明之調光膜之散射模式下之透光率例如為70%以上，較佳為80%以上，更佳為85%以上。該透光率之上限例如進而較佳為95%。 本發明之調光膜之非散射模式下之霧度值較佳為10%以下，更佳為8%以下，進而較佳為6%以下。若為此種範圍，則於將本發明之調光膜應用於掩蔽膜等用途時，在無需遮蔽視野之情形時，可實現良好之視認性。非散射模式下之霧度值之下限例如為0.5%。 本發明之調光膜之散射模式下之霧度值較佳為80%以上，更佳為85%以上，進而較佳為90%以上。若為此種範圍，則可製成具有適於掩蔽膜等用途之光散射性之調光膜。於一實施形態中，調光膜之散射模式下之霧度值為80%～94%。 本發明之調光膜係散射模式下之霧度值相對於非散射模式下之霧度值的比(散射模式/非散射模式)為8.0以上，較佳為10.0以上，更佳為15.0以上。若為此種範圍，則可獲得非散射模式下之良好視認性與散射模式下之低視認性的平衡性優異之調光膜。 B.基板(第1基板、第2基板) 如上所述，基板具備透明電極層，較佳為進而具備基材。於一實施形態中，在透明電極層之調光層側(與基材相反側)配置配向膜。配向膜於如後所述般形成反向模式之高分子分散型液晶層作為調光層時可較佳地使用。配向膜例如可藉由如下方式而形成，即利用嫘縈等布料對聚醯亞胺、聚乙烯醇等塗佈膜實施摩擦處理。 基板之透光率較佳為85%以上，更佳為87%以上，進而較佳為90%以上。於本發明中，藉由使用具有此種範圍之透光率之基板，而於非散射模式下具有較高之透光率。該透光率越高越佳，其上限例如為99%。 B-1.基材(第1基材、第2基材) 上述基材之厚度較佳為20 μm以上，更佳為50 μm以上，進而較佳為70 μm以上。基材之厚度之上限例如為400 μm，較佳為180 μm。 基材之透光率較佳為85%以上，更佳為87%以上，進而較佳為90%以上。該透光率越高越佳，其上限例如為99%。 上述基材亦可為實質上具有光學各向同性之基材。於本說明書中，所謂「實質上具有光學各向同性」意指面內相位差Re為20 nm以下(較佳為10 nm以下)。再者，面內相位差Re係指利用23℃下之波長590 nm之光而測得之面內之相位差值。面內相位差Re由Re＝(nx－ny)×d所表示。此處，nx係於基材之面內折射率成為最大之方向(即，遲相軸方向)之折射率，ny係於該面內垂直於遲相軸之方向(即，進相軸方向)之折射率，d為光學構件之厚度(nm)。 關於上述基材，只要可獲得本發明之效果，則可由任意之適當之材料所構成。上述基材可為樹脂基材，亦可為玻璃基材。基材較佳為樹脂基材。作為樹脂基材之形成材料，可較佳地使用聚酯系樹脂、(甲基)丙烯酸系樹脂、烯烴系樹脂、環狀烯烴系樹脂、聚碳酸酯系樹脂、聚胺基甲酸酯系樹脂、纖維素系樹脂、苯乙烯系樹脂等。作為聚酯系樹脂之具體例，可列舉：聚對苯二甲酸乙二酯(PET)、聚對苯二甲酸丁二酯(PBT)、含有間苯二甲酸、包含環己烷環等之脂環式二羧酸或脂環式二醇等之共聚PET(PET-G)、其他聚酯、及該等之共聚物或摻合物等。其中，就透明性之觀點而言，可較佳地使用PET或環狀烯烴系樹脂，更佳為使用PET。該等材料可單獨使用或將兩種以上組合使用。 上述基材可於至少一主表面上具有功能層，較佳為具有功能層。功能層之材料可列舉：樹脂、無機物、及該等之混合物。較佳為功能層含有樹脂。藉由於功能層含有樹脂，可使基材之表面粗糙度變小，可使透明電極層(後述)之粗糙度變小。作為功能層，可列舉：易接著層、底塗層、硬塗層、防低聚物層等。易接著層係用以使上述基材與透明電極層(後述)之密接性提高而設置之層。底塗層係用以對附透明電極層之基材之反射率或光學色相進行調整而設置之層。硬塗層係用以提高附透明電極層之基材之耐擦傷性而設置之層。防低聚物層係用以抑制自上述基材析出之低聚物之層。該等功能層可為單獨一種，亦可併用兩種以上。 B-2.透明電極層(第1透明電極層、第2透明電極層) 透明電極層例如可使用銦錫氧化物(ITO)、氧化鋅(ZnO)、氧化錫(SnO2 )等金屬氧化物而形成。較佳為形成包含ITO之透明電極層。包含ITO之透明電極層之透明性優異。透明電極層可根據目的圖案化成所需之形狀。 透明電極層之透光率較佳為85%以上，更佳為87%以上，進而較佳為90%以上。於本發明中，藉由使用具有此種範圍之透光率之透明電極層，而於非散射模式下具有較高之透光率。該透光率越高越佳，其上限例如為99%。 較佳為上述透明電極層含有晶粒。藉由含有晶粒，可提高上述基板之透光率。晶粒之形成方法並無限定，例如可藉由於大氣下進行加熱而較佳地形成晶粒。透明電極層中之晶粒之面積佔有率例如為30%以上，較佳為50%以上，更佳為80%以上。該面積佔有率之上限例如為100%。若晶粒之面積佔有率為上述範圍，則可提高透光率。再者，晶粒之面積佔有率可利用穿透式電子顯微鏡(TEM)觀察透明電極層之表面，根據晶粒區域與非晶區域之面積比而算出。 上述透明電極層之表面粗糙度Ra例如為0.1 nm以上。於上述透明電極層之表面粗糙度Ra未達0.1 nm之情形時，有與基材之密接性惡化之虞。透明電極層之表面粗糙度Ra之上限較佳為未達1.2 nm，更佳為1.0 nm以下，進而較佳為未達1.0 nm，尤佳為0.8 nm以下。於上述透明電極層之表面粗糙度Ra過大之情形時，有變得難以較佳地形成晶粒之虞。再者，本說明書中之所謂表面粗糙度Ra意指由AFM(Atomic Force Microscope：原子力顯微鏡)測定之算術平均粗糙度Ra。 上述透明電極層之厚度例如為10 nm以上，較佳為15 nm以上。於透明電極層之厚度未達10 nm之情形時，若未達上述下限，則有晶粒之面積佔有率降低之虞。上述透明電極層之厚度之上限例如為50 nm以下，較佳為35 nm以下，更佳為未達30 nm，進而較佳為27 nm以下。於透明電極層之厚度超過50 nm之情形時，有透過率惡化之虞，且有透明電極層之表面粗糙度變大之虞。 C.調光層 調光層係根據有無施加電壓而光之散射狀態發生變化之層。作為調光層，例如可列舉：根據有無施加電壓而分子之配向狀態發生變化之液晶層、根據有無施加電壓而光之吸收狀態發生變化之電致變色層等。 於一實施形態中，形成高分子分散型液晶層作為液晶層。高分子分散型液晶層係於樹脂基質中使液晶化合物分散而構成。於高分子分散型液晶層中，可根據有無施加電壓而改變液晶化合物之配向度，切換非散射模式與散射模式。於一實施形態中，在施加有電壓之狀態下成為非散射模式，在未施加有電壓之狀態下成為散射模式(普通模式)。於該實施形態中，在未施加電壓時液晶化合物未配向而成為散射模式，在施加電壓時液晶化合物配向而成為非散射模式。於另一實施形態中，在施加有電壓之狀態下成為散射模式，在未施加有電壓之狀態下成為非散射模式(反向模式)。於該實施形態中，在未施加電壓時液晶化合物配向，配向狀態之液晶化合物顯示與樹脂基質大致相同之折射率，而成為非散射模式。另一方面，藉由施加電壓而該液晶化合物之配向發生混亂，而成為散射模式。 作為液晶化合物，可使用非聚合型之任意之適當之液晶化合物。例如可列舉：向列型、層列型、膽固醇型液晶化合物。就可於非散射模式下實現優異之透明性之方面而言，較佳為使用向列型液晶化合物。作為上述向列型液晶化合物，可列舉：聯苯系化合物、苯甲酸苯酯系化合物、環己基苯系化合物、氧偶氮苯系化合物、偶氮苯系化合物、甲亞胺系化合物、聯三苯系化合物、苯甲酸聯苯酯系化合物、環己基聯苯系化合物、苯基吡啶系化合物、環己基嘧啶系化合物、膽固醇系化合物等。 調光層(高分子分散型液晶層)中之液晶化合物之含量例如為80重量%以上，較佳為90重量%～99重量%，更佳為92重量%～98重量%。 作為形成構成調光層(高分子分散型液晶層)之樹脂基質之樹脂，可根據透光率、上述液晶化合物之折射率等適當地選擇。該樹脂之代表為活性能量線硬化型樹脂，可較佳地使用液晶聚合物、(甲基)丙烯酸系樹脂、聚矽氧系樹脂、環氧系樹脂、氟系樹脂、聚酯系樹脂、聚醯亞胺樹脂等。 調光層(高分子分散型液晶層)中之樹脂基質之含量為20重量%以下，較佳為1重量%～10重量%，更佳為2重量%～8重量%。若樹脂基質之含量未達1重量%，則可能產生與基板之密接性變低等問題。另一方面，若第1聚合物之含量超過20重量%，則可能產生驅動電壓變高，調光功能降低等問題。 上述高分子分散型液晶層可藉由任意之適當之方法而形成。上述高分子分散型液晶層例如可藉由如下方式而獲得，即於一基板之透明電極層側塗佈調光層(高分子分散型液晶層)形成用組合物而形成塗佈層，於該塗佈層上將另一基板以透明電極層對向之方式進行積層而形成積層體a，並使塗佈層硬化。此時，調光層形成用組合物例如包含用以形成樹脂基質之單體(較佳為活性能量線硬化型單體)及液晶化合物。 [實施例] 以下，藉由實施例具體地說明本發明，但本發明並不限於該等實施例。只要無特別記載，則實施例中之「份」及「%」為重量基準。再者，關於厚度之測定，底塗層及ITO層之厚度係藉由穿透式電子顯微鏡(日立公司製造，HF-2000)進行剖面觀察而測定。又，基材之厚度係使用膜厚計(Peacock公司製造之數位針盤量規DG-205)而測定。 [實施例1] 於第1PET膜(厚度：23 μm)之第1主表面上形成包含以重量比2：2：1包含三聚氰胺樹脂：醇酸樹脂：有機矽烷縮合物之熱硬化型樹脂的底塗層(厚度：35 nm)，而獲得具備底塗層之第1PET基材。其次，於底塗層上形成ITO層。繼而，於第1PET膜之第2主表面(與形成有底塗層及ITO層之側相反之面)貼合具備黏著層(厚度：23 μm)之第2PET基材(厚度：50 μm)而形成積層體，對該積層體實施加熱處理(利用熱風烘箱於140℃下加熱30分鐘)。將藉由此種方式而獲得之積層體設為第1基板(透過率：90.2%)及第2基板(透過率：90.2%)。 將第1基板與第2基板經由包含向列型液晶分子及樹脂之調光層(高分子分散型液晶層)形成用組合物以ITO層對向之方式進行貼合後，使高分子分散型液晶層形成用組合物硬化，而獲得調光膜。 [比較例1] 使用厚度為190 μm之PET膜作為第1PET膜，將ITO層之厚度設為65 nm，且未實施加熱處理，除此以外，藉由與實施例1相同之方式獲得調光膜。第1基板及第2基板之透過率為79.0%。 ＜評價＞ 將實施例及比較例中所獲得之調光膜供於以下評價。將結果示於表1。 (1)透過率 對實施例及比較例中所獲得之調光膜施加電壓(100 V)，使用Hitachi High-Tech Science公司製造之商品名「U4100」測定施加電壓時之透光率及霧度值(非散射模式下之透光率及霧度值)、及未施加電壓時之透光率及霧度值(散射模式下之透光率及霧度值)。將結果示於表1。 (2)表面粗糙度Ra 針對ITO層之表面，使用掃描式探針顯微鏡(Seiko Instruments公司製造，裝置名「Scanning Probe Microscope SPI3800」)於接觸模式、Si3 N4 製短針(彈簧常數0.09 N/m)、掃描尺寸1 μm見方之條件下進行測定。 (3)ITO層中之晶粒之面積佔有率 使用穿透式電子顯微鏡(日立公司製造，「H-7650」)對ITO層進行俯視觀察，而獲得倍率：100,000倍之俯視圖像。其次，測定晶粒(結晶化之部位)之面積相對於整個ITO層之面積的比率。 [表1]
Figure 107101267-A0304-0001
10‧‧‧第1基板11‧‧‧第1基材12‧‧‧第1透明電極層20‧‧‧第2基板21‧‧‧第2基材22‧‧‧第2透明電極層30‧‧‧調光層100‧‧‧調光膜
圖1係本發明之一實施形態之調光膜之概略剖視圖。
10‧‧‧第1基板
11‧‧‧第1基材
12‧‧‧第1透明電極層
20‧‧‧第2基板
21‧‧‧第2基材
22‧‧‧第2透明電極層
30‧‧‧調光層
100‧‧‧調光膜

Claims (12)

  1. 一種調光膜，其依序具備：第1基板，其具備第1透明電極層；調光層，其根據有無施加電壓而改變透過光之散射狀態；及第2基板，其具備第2透明電極層；且該調光膜構成為能夠根據該透過光之散射狀態而切換成非散射模式與散射模式，散射模式下之該調光膜之霧度值相對於非散射模式下之該調光膜之霧度值的比(散射模式下之霧度值/非散射模式下之霧度值)為8.0以上，該調光膜之非散射模式下之透光率為80%以上，上述第1透明電極層及上述第2透明電極層含有晶粒，且晶粒之面積佔有率為30%以上。
  2. 如請求項1之調光膜，其中上述第1基板具備第1基材及上述第1透明電極層，上述第2基板具備第2基材及上述第2透明電極層，以該第1透明電極層與該第2透明電極層對向之方式配置，該調光層以與該第1基板及該第2基板接觸之方式設置。
  3. 如請求項1之調光膜，其中上述第1基板及/或第2基板之透過率為85%以上。
  4. 如請求項2之調光膜，其中上述第1基板及/或第2基板之透過率為85%以上。
  5. 如請求項1至4中任一項之調光膜，其中上述第1透明電極層及/或上述第2透明電極層包含銦錫氧化物。
  6. 如請求項1至4中任一項之調光膜，其中上述第1基材及/或第2基材包含聚對苯二甲酸乙二酯。
  7. 如請求項5之調光膜，其中上述第1基材及/或第2基材包含聚對苯二甲酸乙二酯。
  8. 如請求項1至4中任一項之調光膜，其中上述調光層為高分子分散型液晶層。
  9. 如請求項5之調光膜，其中上述調光層為高分子分散型液晶層。
  10. 如請求項6之調光膜，其中上述調光層為高分子分散型液晶層。
  11. 如請求項7之調光膜，其中上述調光層為高分子分散型液晶層。
  12. 一種調光玻璃，其具備如請求項1至11中任一項之調光膜。
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