TWI743522B - Substrate processing method, substrate processing apparatus and substrate processing system - Google Patents

Abstract

The camera acquires photographic images by continuously photographing the nozzles moving in the processing section. The reference image registration unit registers the first reference image and the second reference image obtained by photographing nozzles located at the first end and the second end of the processing section. The positional deviation detection unit includes: an image determination unit, which determines whether the actual image obtained by the nozzle moving in the processing section with the camera is related to the first end and the second end according to a predetermined determination rule. Respectively corresponding images; and an image comparison unit that compares the first reference image and the second reference image with the actual image determined by the image determination unit to correspond to the first end and the second end, respectively Compare.

Description

Substrate processing method, substrate processing apparatus and substrate processing system Unify

The present invention relates to a technology for processing a substrate by ejecting a processing liquid from a nozzle that moves on the substrate, and particularly relates to a technology for detecting the positional deviation of the nozzle. The substrates to be processed include, for example, semiconductor substrates, liquid crystal display devices, and organic electroluminescence (Electroluminescence, EL) display devices, such as flat panel display (FPD) substrates, optical disk substrates, magnetic disk substrates, and magneto-optical disks. Use substrates, photomask substrates, ceramic substrates, solar cell substrates, printed substrates, etc.

In the manufacturing steps of semiconductor devices and the like, various processing liquids such as pure water, photoresist liquid, and etching liquid are supplied to the substrate to perform substrate processing such as cleaning processing or resist coating processing. As an apparatus for performing liquid processing using these processing liquids, there are cases in which a substrate processing apparatus is used that spouts the processing liquid from a nozzle toward the surface of the substrate while rotating the substrate.

Patent Document 1 discloses the following technology: When detecting whether one has been When the processing liquid is ejected from the nozzle arranged at the processing position, it is detected whether the nozzle is normally arranged at the processing position.

Specifically, the reference image when the nozzle is correctly positioned at the processing position is acquired in advance, and the image when the nozzle is moved to the processing position in each processing recipe (recipe) is compared with the reference image acquired in advance. It is stated that when the deviation of the nozzle from the processing position exceeds a predetermined threshold, it is judged as an abnormal position.

[Prior Art Literature]

[Patent Literature]

[Patent Document 1] Japanese Patent Laid-Open No. 2015-173148

However, in the case of the prior art, it is difficult to determine that the position of the moving nozzle is abnormal. In the case of the prior art, an abnormal position in a reference image and a processing position is detected. Sometimes, while spraying the treatment liquid from the nozzle, the nozzle is moved on the substrate, thereby performing liquid treatment on the surface of the substrate. At this time, a technique for detecting whether the nozzle is correctly moving within a predetermined processing interval is desired.

However, if a moving nozzle is photographed, the shape and size on the image will change every moment during the period of movement between the initial position and the final position. Therefore, when an image of a nozzle at a certain position is used as a reference image and matched with an image obtained by photographing a moving nozzle, the shape of the nozzle changes on the image, so the matching accuracy is reduced. Therefore, it is difficult to perform position abnormality determination with high accuracy.

The object of the present invention is to provide a nozzle that detects movement with high precision The position deviation technology.

In order to solve the problem, the first aspect is a substrate processing method for processing a substrate, including: (a) a step of moving a nozzle in a predetermined processing interval extending in a horizontal direction; (b) photographing by the Step (a) is the step of moving the nozzle in the treatment section; (c) In the step (b), the nozzle is located at the first end and the second end which are the two ends of the treatment section. The step of registering the photographic image obtained at the end as the first reference image and the second reference image; (d) the step of moving the nozzle in the processing interval; (e) the step of photographing by the Step (d) is the step of moving the nozzle in the processing interval; (f) For the multiple photographic images obtained by the step (e), determine whether the image is the same or not according to a predetermined determination rule The image determination step of the images corresponding to the first end and the second end respectively; and (g) comparing the first reference image and the second reference image with the steps ( f) It is determined that the first actual image and the second actual image respectively corresponding to the first end and the second end are compared, and the detection is respectively configured in the processing in the step (d) The step of deviating the positions of the nozzles at both ends of the interval.

The second aspect of the substrate processing method according to the first aspect further includes: (h) after the step (c) and before the step (d), the step of holding the substrate to be processed in the substrate holding portion.

The third aspect is the substrate processing method according to the first aspect or the second aspect, wherein the step (d) comprises: (d1) making the nozzle self-biased to the position of the first end The step of moving toward the second end, and the step (f) includes: (f1) determining whether it is different from the first end and the second end according to the difference between consecutive photographed images Corresponding image steps.

The fourth aspect is the substrate processing method according to any one of the first aspect to the third aspect, wherein the step (c) includes: (c1) registering the substrate by photographing in the processing section in the step (b) The step of obtaining an intermediate reference image obtained by the nozzle moving in the middle, and the step (g) includes: (g1) according to the intermediate reference image, and by photographing the intermediate reference image in the step (e) The comparison of the intermediate actual images obtained by the nozzles moving in the middle of the processing section is a step of detecting the positional deviation of the nozzles moving in the middle of the processing section in the step (d).

A fifth aspect is the substrate processing method according to the fourth aspect, wherein the step (g) includes: (g2) detecting the positional deviation of the nozzle in the vertical direction based on the intermediate reference image and the intermediate actual image A step of.

A sixth aspect is the substrate processing method according to the fourth aspect or the fifth aspect, further comprising: (i) generating a display in the processing section based on the plurality of intermediate reference images registered in the step (c1) And the step (g) includes: (g3) based on the intermediate actual image and the reference track information, detecting the nozzle in the vertical direction Steps to deviate from position.

The seventh aspect is the substrate processing method according to any one of the fourth aspect to the sixth aspect, wherein the step (c1) includes: (c11) photographing the substrate in the processing section in the step (b) The number of nozzles that move in the middle One of the photographic images is registered as the first intermediate reference image; and (c12) after the step (c11), the following photographic image is registered as the second intermediate reference image, so The photographed image is an image immediately following the first intermediate reference image among the plurality of photographed images, and the degree of coincidence with the first intermediate reference image becomes less than a predetermined threshold value Image.

The eighth aspect is the substrate processing method according to any one of the first aspect to the seventh aspect, wherein the step (a) includes: (a1) a control unit moves the nozzle from the first end to the second The step of sending the control signal up to the two ends to the nozzle moving part, and the step (b) includes: (b1) the step of photographing the nozzle corresponding to the sending of the control signal, and acquiring a plurality of photographic images.

The ninth aspect is the substrate processing method according to the eighth aspect, wherein the step (b) further comprises: (b2) comparing the control information indicated by the control signal with the control information obtained by shooting corresponding to the control signal The step of establishing correspondence between multiple photographic images and recording.

A tenth aspect is the substrate processing method according to the ninth aspect, wherein the step (c) includes: (c2) successively displaying a series of photographic images obtained by the step (b) on the display unit in the order of acquisition And the step (c2) includes: (c21) the step of specifying the control information; and (c22) displaying the photographic image corresponding to the control information specified by the step (c21) Steps in the display section.

The eleventh aspect is a substrate processing apparatus for processing substrates, including: a substrate holding portion holding the substrate in a horizontal position; The substrate held by the holding portion supplies the processing liquid; the nozzle moving portion moves the nozzle in a predetermined processing section extending in the horizontal direction; and the camera acquires a photographed image by photographing the nozzle moving in the processing section Image; a reference image registration unit that registers a first reference image and a second reference image obtained by the camera capturing the nozzles located at the first end and the second end of the two ends of the processing section; and The positional deviation detection unit detects the positional deviation of the nozzles at the first end and the second end; The actual image acquired by the nozzle moving in the processing interval is determined according to a predetermined determination rule whether it is an image corresponding to the first end and the second end, respectively; and an image comparison unit, The first reference image and the second reference image, and the first actual image and the first actual image determined by the image determining unit to correspond to the first end and the second end, respectively Two actual images are compared.

A twelfth aspect is the substrate processing apparatus according to the eleventh aspect, wherein the image determination unit includes: a feature vector calculation unit that extracts a plurality of feature vectors from each of the plurality of photographed images; and a classifier corresponding to The plurality of feature vectors classify each of the plurality of photographed images into levels corresponding to different positions of the nozzles; and the plurality of levels include the first end and the second end respectively The corresponding level.

A thirteenth aspect is a substrate processing system, including a substrate processing apparatus for processing a substrate, and a server for data communication with the substrate processing apparatus, the substrate processing apparatus including: a substrate holding portion that holds the substrate in a horizontal posture ； The nozzle supplies the processing liquid to the substrate held by the substrate holding section; the nozzle moving section moves the nozzle in a predetermined processing section extending in the horizontal direction; the camera moves in the processing section by shooting The nozzle to obtain a photographic image; a reference image registration unit that registers the first reference image obtained by the camera photographing the nozzles located at the first end and the second end of the two ends of the processing section And a second reference image; a positional deviation detection unit that detects the positional deviation of the nozzles at the first end and the second end; and a communication unit that performs data communication with the server; the positional deviation The detection unit includes: an image determination unit that determines whether the actual image acquired by the nozzle moving in the processing interval by using the camera to determine whether it is the same as the first end And the images corresponding to the second end respectively; and an image comparison unit that determines the first reference image and the second reference image, and the image determination unit to determine the The first actual image and the second actual image respectively corresponding to the first end and the second end are compared; and the image determination unit includes: a feature vector calculation unit that extracts multiple features from the photographic image Vector; and a classifier for classifying the plurality of photographic images into a plurality of classes corresponding to different positions of the nozzle based on the plurality of feature vectors; the plurality of classes include the first One end and the second end respectively correspond to the level of the image, the server includes a machine learning unit, and the machine learning unit uses the plurality of images that have been taught to any one of the plurality of levels The image is used as a teaching material for machine learning to generate the classifier, and the classifier is provided to the substrate processing apparatus from the server.

According to the substrate processing method of the first aspect, the deviation of the movement range of the nozzle in the processing section can be detected.

According to the substrate processing method of the second aspect, when the substrate is processed, the deviation of the movement range of the nozzle can be detected.

According to the substrate processing method of the third aspect, by obtaining the difference between consecutive photographed images, it can be detected that the nozzle stops at the first end and the second end of the processing section.

Thereby, the actual images corresponding to the first end and the second end of the processing interval can be easily determined.

According to the substrate processing method of the fourth aspect, the positional deviation of the nozzle moving in the middle of the processing section can be detected.

According to the substrate processing method of the fifth aspect, the positional deviation in the vertical direction can be detected.

According to the substrate processing method of the sixth aspect, the positional deviation of the nozzle in the vertical direction can be detected based on the reference track information.

According to the substrate processing method of the seventh aspect, the intermediate reference image can be automatically registered. Therefore, a plurality of reference images can be registered efficiently.

According to the substrate processing method of the eighth aspect, the nozzle is photographed in response to the control signal for moving the nozzle. Therefore, the reference image indicating the reference position of the moving nozzle can be automatically acquired.

According to the substrate processing method of the ninth aspect, the target photographic image can be easily found by specifying the control information.

According to the substrate processing method of the tenth aspect, when there are multiple control signals, In the case of a series of reference images corresponding to each control signal, the target photographic image can be displayed on the display unit by specifying the control information. This allows the operator to efficiently designate the reference image to be registered from among the multiple captured images.

According to the substrate processing apparatus of the eleventh aspect, the deviation of the movement range of the nozzle in the processing section can be detected.

According to the substrate processing apparatus of the twelfth aspect, the actual image corresponding to the first end and the second end of the processing section PS1 can be determined by the classifier.

According to the substrate processing system of the thirteenth aspect, the deviation of the movement range of the nozzle in the processing section can be detected. In addition, the actual image corresponding to the first end and the second end of the processing interval PS1 can be determined by the classifier provided by the server.

1: Cleaning processing unit

8: server

9, 9A: Control Department

10: Chamber

11: side wall

12: top wall

13: bottom wall

14: Fan filter unit

15: divider

18: Exhaust pipe

20: Rotating chuck

21: Rotating base

21a: Keep the face

22: Rotating motor

23: Covering member

24: Rotation axis

25: Flanged member

26: Chuck pin

28: Lower surface treatment liquid nozzle

30, 60, 65: nozzle

31: ejection head

32, 62, 67: nozzle arm

33, 63, 68: nozzle base

40: Treatment cup

41: inner cup

42: Middle Cup

43: Outer Cup

43a, 52a: lower end

43b, 47b, 52b: upper end

43c, 52c: Folding part

44: bottom

45: inner wall

46: Outer wall

47: The first guide

48: middle wall

49: Abandoned Slot

50: Inside recovery slot

51: Outer recovery slot

52: The second guide

53: Treatment liquid separation wall

70: Camera

71: Lighting Department

82: Machine Learning Department

90: Reference image registration department

91, 91A: Position deviation detection unit

92: Command sending department

94: Memory Department

95: Display

96: Input section

97: Ministry of Communications

100: Substrate processing device

102: Indexer

103: Main transport robot

332: Motor

910, 910A: Image judging section

912: Image Comparison Department

9102: Feature vector calculation section

AR34, AR64, AR69: Arrow

BT2: skip button

BT4: Registration decision button

C1~C4: Command (control information)

CX: axis of rotation

GP: Actual image

K2: classifier

NN1: Neural Network

PA: shooting area

PS1: Processing interval

RP: reference image

RP1: First reference image

RP2: Second reference image

RPM: Intermediate reference image

RPM1: The first intermediate reference image

RPM2: The second intermediate reference image

ST1: Reference track information

TE1: first end

TE2: second end

W: substrate

W1: Registration screen

WR2: Image display area

WR4: Nozzle/position selection area

WR6: Display control area

S11~S15, S21~S25: steps

FIG. 1 is a diagram showing the overall configuration of a substrate processing apparatus 100 according to the first embodiment.

Fig. 2 is a plan view of the cleaning treatment unit 1 of the first embodiment.

Fig. 3 is a longitudinal sectional view of the cleaning treatment unit 1 of the first embodiment.

FIG. 4 is a diagram showing the positional relationship between the camera 70 and the nozzle 30.

FIG. 5 is a block diagram of the camera 70 and the control unit 9.

FIG. 6 is a flowchart showing a procedure for preliminarily preparing for the detection process performed by the positional deviation detection unit 91.

FIG. 7 is a flowchart showing the procedure of the detection process performed by the positional deviation detection unit 91.

FIG. 8 is a diagram showing an example of an image obtained by the camera 70 capturing the imaging area PA including the tip of the nozzle 30 in the processing section PS1.

FIG. 9 is a diagram conceptually showing the registration process of the reference image RP.

FIG. 10 is a diagram conceptually showing how the actual image GP corresponding to the reference image RP is determined.

FIG. 11 is a diagram conceptually showing the reference track information ST1.

FIG. 12 is a timing chart showing a case where the nozzle 30 is continuously photographed.

FIG. 13 is a diagram showing a registration screen W1 for performing registration of the reference image RP.

FIG. 14 is a diagram showing the control unit 9A of the second embodiment.

Fig. 15 is a diagram conceptually showing the classifier K2.

Hereinafter, the embodiments of the present invention will be described with reference to the accompanying drawings. In addition, the constituent elements described in this embodiment are merely examples, and do not mean that the scope of the present invention is limited to only these constituent elements. In the drawings, for ease of understanding, the size or number of each part may be exaggerated or simplified as necessary.

As long as there is no special explanation in advance, the expressions that indicate the state of equality (such as "same", "equal", "homogeneous", etc.) not only quantitatively indicate the state of strict equality, but also indicate that there is a tolerance or a difference in the same degree of function status. In addition, as long as there is no special description in advance, "~above" includes the case where two elements are separated in addition to the case where two elements are in contact.

<1. The first embodiment>

FIG. 1 is a diagram showing the overall configuration of a substrate processing apparatus 100 according to the first embodiment. The substrate processing apparatus 100 is a blade-type processing apparatus that processes a substrate W as a processing target one by one. Here, the substrate processing apparatus 100 uses a rinse solution such as a chemical solution and pure water to clean a circular thin plate-shaped substrate W as a silicon substrate, and then perform a drying process. As the chemical solution, for example, SC1 (ammonia-hydrogen peroxide mixture: ammonia-hydrogen peroxide mixture), SC2 (hydrochloric hydrogen peroxide mixed water solution: hydrochloric hydrogen peroxide mixed water solution), dilute hydrofluoric acid solution can be used. (Diluted Hydrofluoric Acid solution, DHF solution) and so on. In the following description, the so-called treatment liquid is collectively referred to as the "treatment liquid" with the chemical liquid and the eluent. In addition, not only for cleaning, but also coating liquids such as photoresist liquids used for film formation processing, chemical liquids used to remove unnecessary films, chemical liquids used for etching, etc. are also included in the "treatment liquid" .

The substrate processing apparatus 100 includes a plurality of cleaning processing units 1, an indexer 102, and a main transport robot 103.

The indexer 102 transports the substrate W to be processed that has been received from outside the apparatus into the apparatus, and transports the processed substrate W whose cleaning process has been completed to the outside of the apparatus. The indexer 102 mounts a plurality of carriers (not shown), and includes a transfer robot (not shown). As the carrier, a Front Opening Unified Pod (FOUP) or Standard Mechanical InterFace (SMIF) box that stores the substrate W in a closed space may also be used, or the substrate W may be exposed to the outside air. Open Cassette (OC). The transfer robot is on the carrier and the main transfer robot The substrate W is transferred between 103.

The cleaning processing unit 1 performs liquid processing and drying processing on one substrate W. Twelve cleaning processing units 1 are arranged in the substrate processing apparatus 100. Specifically, the four towers each including the three washing treatment units 1 stacked in the vertical direction are arranged so as to surround the periphery of the main transport robot 103. In FIG. 1, one of the cleaning treatment units 1 overlapped in three stages is schematically shown. In addition, the number of cleaning processing units 1 of the substrate processing apparatus 100 is not limited to twelve, and can be changed as appropriate.

The main transport robot 103 is installed in the center of four towers formed by stacking the cleaning processing units 1. The main transport robot 103 transports the substrate W of the processing target received from the indexer 102 into each cleaning processing unit 1. In addition, the main transport robot 103 unloads the processed substrate W from each cleaning processing unit 1 and passes it to the indexer 102.

Hereinafter, one of the twelve cleaning processing units 1 mounted in the substrate processing apparatus 100 will be described. The other cleaning processing units 1 have the same configuration except for the different arrangement relationships of the nozzles 30, 60, and 65. . Fig. 2 is a plan view of the cleaning treatment unit 1 of the first embodiment. Fig. 3 is a longitudinal sectional view of the cleaning treatment unit 1 of the first embodiment. FIG. 2 shows a state where the substrate W is not held by the spin chuck 20, and FIG. 3 shows a state where the substrate W is held by the spin chuck 20.

The cleaning processing unit 1 in the chamber 10 includes: a rotating chuck 20 to hold the substrate W in a horizontal posture (posture where the normal to the surface of the substrate W is along the vertical direction); three nozzles 30, 60, 65 for Toward the substrate that has been held by the rotating chuck 20 The upper surface of W is supplied with processing liquid; the processing cup 40 surrounds the periphery of the rotating chuck 20; and the camera 70 photographs the space above the rotating chuck 20. In addition, a partition plate 15 that partitions the inner space of the chamber 10 up and down is provided around the processing cup 40 in the chamber 10.

The chamber 10 includes a side wall 11 that surrounds the periphery along the vertical direction, a top wall 12 that blocks the upper side of the side wall 11, and a bottom wall 13 that blocks the lower side of the side wall 11. The space enclosed by the side wall 11, the top wall 12, and the bottom wall 13 becomes a processing space of the substrate W. In addition, a part of the side wall 11 of the chamber 10 is provided with a loading/unloading port for the main transfer robot 103 to load/unload the substrate W into and out of the chamber 10, and a gate for opening and closing the loading/unloading port (all omitted from the figure). ).

A fan filter unit (FFU) 14 is installed on the top wall 12 of the chamber 10, and the fan filter unit 14 is used to further clean the air in the clean room where the substrate processing apparatus 100 is installed and supply it to the chamber. The processing space in the chamber 10. The FFU 14 includes a fan and a filter (for example, a High Efficiency Particulate Air (HEPA) filter) for taking in the air in the clean room and sending it out to the chamber 10. The FFU 14 forms a downflow of clean air in the processing space in the chamber 10. In order to uniformly disperse the clean air supplied from the FFU 14, a punching plate with a plurality of blowing holes may also be provided directly under the top wall 12.

The rotating chuck 20 includes a rotating base 21, a rotating motor 22, a covering member 23 and a rotating shaft 24. The rotating base 21 has a circular plate shape, and is fixed to the upper end of the rotating shaft 24 extending in the vertical direction in a horizontal posture. The rotating motor 22 is provided below the rotating base 21 and rotates the rotating shaft 24. The rotating motor 22 rotates The shaft 24 causes the rotating base 21 to rotate in a horizontal plane. The covering member 23 has a cylindrical shape surrounding the rotation motor 22 and the rotation shaft 24.

The outer diameter of the disk-shaped rotating base 21 is slightly larger than the diameter of the circular substrate W held by the rotating chuck 20. Therefore, the rotating base 21 has a holding surface 21a facing the entire surface of the lower surface of the substrate W to be held.

A plurality of (four in this embodiment) chuck pins 26 are erected on the peripheral edge of the holding surface 21 a of the rotating base 21. The plurality of chuck pins 26 are arranged at equal intervals along the circumference corresponding to the outer diameter of the outer circumference of the circular substrate W. In this embodiment, the four collet pins 26 are arranged at 90° intervals. A plurality of chuck pins 26 are driven in linkage by a link mechanism (not shown) that has been housed in the rotating base 21. The rotating chuck 20 makes each of the plurality of chuck pins 26 abut on the outer peripheral end of the substrate W to hold the substrate W, thereby holding the substrate W in a horizontal posture close to the holding surface 21a above the rotating base 21 (refer to FIG. 3). In addition, the rotating chuck 20 separates each of the plurality of chuck pins 26 from the outer peripheral end of the substrate W, thereby releasing the holding of the substrate W.

The lower end of the cover member 23 covering the rotating motor 22 is fixed to the bottom wall 13 of the chamber 10, and the upper end reaches just below the rotating base 21. A flange-like member 25 is provided at the upper end of the covering member 23, and the flange-like member 25 protrudes substantially horizontally outward from the covering member 23, and then bends and extends downward. In the state in which the rotary chuck 20 holds the substrate W by holding the plurality of chuck pins 26, the rotary motor 22 rotates the rotation shaft 24, thereby allowing the substrate W to wrap around the center of the substrate W. The rotation axis CX in the vertical direction rotates. In addition, the driving of the rotation motor 22 is controlled by the control unit 9.

The nozzle 30 is configured by attaching the ejection head 31 to the tip of the nozzle arm 32. The base end side of the nozzle arm 32 is fixed and connected to the nozzle base 33. The motor 332 (nozzle moving part) provided in the nozzle base 33 can be rotated around an axis along the vertical direction.

As the nozzle base 33 rotates, as shown by the arrow AR34 in FIG. 2, the nozzle 30 forms a circle in the horizontal direction between the position above the rotating chuck 20 and the standby position outside the processing cup 40 Move in an arc. Due to the rotation of the nozzle base 33, the nozzle 30 swings above the holding surface 21 a of the rotating base 21. In detail, it moves above the rotating base 21 in a predetermined processing section PS1 extending in the horizontal direction. In addition, moving the nozzle 30 in the processing section PS1 has the same meaning as moving the tip ejection head 31 in the processing section PS1.

The nozzle 30 is configured to be supplied with a plurality of processing liquids (including at least pure water), and a plurality of processing liquids can be ejected from the ejection head 31. Furthermore, a plurality of ejection heads 31 may be provided at the tip of the nozzle 30, and the same or different processing liquids may be ejected from each ejection head 31 individually. The nozzle 30 (specifically, the ejection head 31) ejects the processing liquid while moving in the processing section PS1 extending in the horizontal direction in an arc shape. The processing liquid that has been ejected from the nozzle 30 drops on the upper surface of the substrate W that has been held by the spin chuck 20.

In the cleaning processing unit 1 of this embodiment, in addition to the nozzle 30, two nozzles 60 and 65 are further provided. The nozzle 60 and the nozzle 65 of the present embodiment have the same configuration as the nozzle 30 described above. That is, the nozzle 60 is constructed by attaching the ejection head to the tip end of the nozzle arm 62, and the nozzle base is connected to the base end side of the nozzle arm 62. 63, as indicated by the arrow AR64, it moves in an arc shape between a processing position above the rotating chuck 20 and a standby position outside the processing cup 40. Similarly, the nozzle 65 is constructed by attaching an ejection head to the tip of the nozzle arm 67. The nozzle base 68 connected to the base end of the nozzle arm 67 is located above the rotating chuck 20 as indicated by the arrow AR69. The processing position and the waiting position outside the processing cup 40 move in an arc shape.

The nozzle 60 and the nozzle 65 are also configured to be supplied with a plurality of processing liquids containing at least pure water, and the processing liquid is sprayed toward the upper surface of the substrate W held by the spin chuck 20 at the processing position. Furthermore, at least one of the nozzle 60 and the nozzle 65 may also be a two-fluid nozzle that mixes a cleaning liquid such as pure water with a pressurized gas to generate liquid droplets, and combines the liquid droplets with the gas The mixed fluid is sprayed to the substrate W. In addition, the number of nozzles provided in the cleaning processing unit 1 is not limited to three, and it may be one or more.

There is no need to move the nozzle 30, the nozzle 60, and the nozzle 65 in an arc shape, respectively. For example, it is also possible to provide a straight drive section to move the nozzle linearly.

The lower surface treatment liquid nozzle 28 is provided along the vertical direction so as to penetrate the inner side of the rotating shaft 24. The upper end opening of the lower surface treatment liquid nozzle 28 is formed at a position facing the center of the lower surface of the substrate W held by the spin chuck 20. The lower surface treatment liquid nozzle 28 is also configured to be supplied with various treatment liquids. The treatment liquid droplets that have been ejected from the lower surface treatment liquid nozzle 28 land on the lower surface of the substrate W that has been held by the spin chuck 20.

The processing cup 40 surrounding the rotating chuck 20 includes a Inner cup 41, middle cup 42, and outer cup 43. The inner cup 41 surrounds the rotation chuck 20 and has a shape that becomes substantially rotationally symmetrical with respect to the rotation axis CX passing through the center of the substrate W that has been held by the rotation chuck 20. The inner cup 41 integrally includes: a bottom 44 that is annular in plan view; a cylindrical inner wall 45 that rises upward from the inner periphery of the bottom 44; and a cylindrical outer wall 46 that extends from the bottom 44 The outer peripheral edge rises upward; the first guide portion 47 rises from the inner wall portion 45 and the outer wall portion 46, and the upper end draws a smooth arc and faces the center side (close to the substrate W held by the rotating chuck 20). The direction of the rotation axis CX) extends obliquely upward; and the cylindrical middle wall portion 48 rises upward from between the first guide portion 47 and the outer wall portion 46.

The inner wall portion 45 is formed to have a length such that in a state where the inner cup 41 is the most elevated, it is accommodated between the covering member 23 and the flange-shaped member 25 while maintaining an appropriate gap. The middle wall portion 48 is formed to have a length such that when the inner cup 41 and the middle cup 42 are the closest to each other, it is accommodated between the second guide portion 52 and the processing liquid separation wall 53 of the middle cup 42 and the processing liquid separation wall 53 while maintaining an appropriate gap. .

The first guide portion 47 has an upper end portion 47b that draws a smooth arc and extends obliquely upward toward the center side (the direction close to the rotation axis CX of the substrate W). In addition, the space between the inner wall portion 45 and the first guide portion 47 is provided as a waste tank 49 for collecting and discarding the used treatment liquid. The space between the first guide portion 47 and the middle wall portion 48 is an annular inner recovery tank 50 for collecting and recovering the used treatment liquid. Furthermore, between the middle wall portion 48 and the outer wall portion 46 is an annular outer recovery tank 51 for collecting and recovering a processing liquid of a different kind from the inner recovery tank 50.

An exhaust/drain mechanism (not shown) is connected to the waste tank 49, and the drain The gas/liquid discharge mechanism is used to discharge the treatment liquid collected in the waste tank 49 and forcibly exhaust the inside of the waste tank 49. For example, four exhaust/drain mechanisms are provided at equal intervals along the circumferential direction of the waste groove 49. In addition, a recovery mechanism (both not shown) is connected to the inner recovery tank 50 and the outer recovery tank 51, and the recovery mechanism is used to recover the treated liquid collected in the inner recovery tank 50 and the outer recovery tank 51 to the installation. A recovery tank outside the substrate processing apparatus 100. Furthermore, the bottoms of the inner recovery tank 50 and the outer recovery tank 51 are inclined only a slight angle with respect to the horizontal direction, and a recovery mechanism is connected to the position where they become the lowest. Thereby, the processing liquid that has flowed into the inner recovery tank 50 and the outer recovery tank 51 is smoothly recovered.

The middle cup 42 surrounds the circumference of the rotating chuck 20 and has a shape that becomes substantially rotationally symmetrical with respect to the rotation axis CX passing through the center of the substrate W that has been held by the rotating chuck 20. The middle cup 42 has a second guide portion 52 and a cylindrical processing liquid separation wall 53 connected to the second guide portion 52.

The second guide portion 52 has, on the outside of the first guide portion 47 of the inner cup 41, a lower end portion 52a, which is coaxial with the lower end portion of the first guide portion 47 and is cylindrical; and an upper end portion 52b, which starts from the upper end of the lower end portion 52a A smooth arc is drawn and extends obliquely upward toward the center side (the direction close to the rotation axis CX of the substrate W); and the folded portion 52c is formed by folding the front end of the upper end 52b downward. The lower end portion 52a is received in the inner recovery groove 50 while maintaining an appropriate gap between the first guide portion 47 and the middle wall portion 48 when the inner cup 41 and the middle cup 42 are closest to each other. In addition, the upper end portion 52b is provided so as to overlap the upper end portion 47b of the first guide portion 47 of the inner cup 41 in the vertical direction. The upper end 47b keeps a very small interval to approach. In a state where the inner cup 41 and the middle cup 42 are closest to the folded portion 52c, the folded portion 52c overlaps with the front end of the upper end 47b of the first guide portion 47 in the horizontal direction.

The upper end portion 52b of the second guide portion 52 is formed such that the lower it is, the thicker the wall thickness becomes. The processing liquid separation wall 53 has a cylindrical shape provided so as to extend downward from the outer peripheral edge portion of the lower end of the upper end portion 52b. The processing liquid separation wall 53 is accommodated in the outer recovery tank 51 while maintaining an appropriate gap between the middle wall portion 48 and the outer cup 43 in a state where the inner cup 41 and the middle cup 42 are the closest to each other.

The outer cup 43 has a shape that becomes substantially rotationally symmetric with respect to the rotation axis CX passing through the center of the substrate W that has been held by the spin chuck 20. The outer cup 43 surrounds the rotating chuck 20 on the outside of the second guide portion 52 of the middle cup 42. This outer cup 43 has a function as a third guide part. The outer cup 43 has: a lower end portion 43a, which is coaxial with the lower end portion 52a of the second guide portion 52 and formed into a cylindrical shape; The direction of the W rotation axis CX) extends diagonally upward; and the folded portion 43c is formed by folding the front end of the upper end portion 43b downward.

In the state where the inner cup 41 and the outer cup 43 are closest, the lower end 43a is accommodated in the outer recovery tank 51 while maintaining an appropriate gap between the processing liquid separation wall 53 of the middle cup 42 and the outer wall portion 46 of the inner cup 41. The upper end 43b is provided so as to overlap with the second guide 52 of the middle cup 42 in the vertical direction. When the middle cup 42 and the outer cup 43 are closest to each other, the upper end 52b of the second guide 52 is kept extremely small. The interval comes close. In the state where the middle cup 42 and the outer cup 43 are closest, the folded portion 43c and The folded portion 52c of the second guide portion 52 overlaps in the horizontal direction.

The inner cup 41, the middle cup 42 and the outer cup 43 can be raised and lowered independently of each other. That is, the inner cup 41, the middle cup 42, and the outer cup 43 are respectively provided with a lifting mechanism (not shown), respectively, so that they can be raised and lowered individually and independently. As such an elevating mechanism, for example, various known mechanisms such as a ball screw mechanism and an air cylinder can be used.

The partition plate 15 is provided to partition the inner space of the chamber 10 up and down around the processing cup 40. The partition plate 15 may be a single plate-shaped member surrounding the processing cup 40, or may be formed by joining a plurality of plate-shaped members. In addition, the partition plate 15 may also be formed with a through hole or a notch penetrating in the thickness direction. In this embodiment, a through hole for passing a support shaft is formed for supporting the nozzle 30 , The nozzle 60, the nozzle base 33 of the nozzle 65, the nozzle base 63, and the nozzle base 68.

The outer peripheral end of the partition plate 15 is connected to the side wall 11 of the chamber 10. In addition, the edge portion of the partition plate 15 surrounding the processing cup 40 is formed so as to become a circular shape having a larger diameter than the outer diameter of the outer cup 43. Therefore, the partition plate 15 does not become an obstacle to the elevation of the outer cup 43.

In addition, an exhaust pipe 18 is provided in a part of the side wall 11 of the chamber 10 and in the vicinity of the bottom wall 13. The exhaust pipe 18 is connected to an exhaust mechanism (not shown) in communication. Among the clean air supplied from the FFU 14 and flowing downward in the chamber 10, the air that has passed between the processing cup 40 and the partition plate 15 is discharged from the exhaust pipe 18 to the outside of the device.

FIG. 4 is a diagram showing the positional relationship between the camera 70 and the nozzle 30. The camera 70 is in the chamber 10 and is arranged above the partition plate 15. The camera 70 includes: for example As one of the solid-state imaging elements, Charge Coupled Device (CCD), and optical systems such as electronic shutters and lenses. The nozzle 30 is driven by the nozzle base 33 in the processing section PS1 (the position of the dotted line in FIG. 4) above the substrate W held by the spin chuck 20 and the standby position outside the processing cup 40 (the actual position in FIG. 4). Line position) to move back and forth. The processing section PS1 is a section where the processing liquid is sprayed from the nozzle 30 to the upper surface of the substrate W held by the spin chuck 20 to perform cleaning processing. Here, the processing section PS1 extends in the horizontal direction from the first end TE1 near the edge of the substrate W held by the spin chuck 20 to the second end TE2 near the edge on the opposite side. Interval. The standby position is a position where the nozzle 30 stops the discharge of the processing liquid and stands by when the nozzle 30 is not performing cleaning processing. In the standby position, a standby box for accommodating the ejection head 31 of the nozzle 30 may also be provided.

The camera 70 is installed so as to include at least the tip of the nozzle 30 in the processing section PS1 in its imaging field of view, that is, installed at a position including the vicinity of the ejection head 31. In the present embodiment, as shown in FIG. 4, the camera 70 is installed at a position where the nozzle 30 in the processing section PS1 is photographed from above and above. Therefore, the camera 70 can image the imaging area including the tip of the nozzle 30 in the processing section PS1. Similarly, the camera 70 can image the imaging area including the nozzle 60 and the tip of the nozzle 65 in each processing section. Furthermore, when the camera 70 is installed at the position shown in FIGS. 2 and 4, the nozzle 30 and the nozzle 60 are moved in the horizontal direction within the shooting field of view of the camera 70, so that the vicinity of each processing section can be appropriately photographed. However, the nozzle 65 is moved in the depth direction within the imaging field of view of the camera 70, so there is a possibility that the movement amount in the vicinity of the processing section cannot be appropriately captured. In this case, it can also be set to be different from the camera 70 shooting Nozzle 65 camera.

As shown in FIG. 3, an illuminating part 71 is provided in the cavity 10 and above the partition plate 15. When the chamber 10 is a dark room, the control unit 9 may control the illumination unit 71 so that the illumination unit 71 irradiates the nozzle 30, the nozzle 60, and the nozzle 65 near the processing position with light when the camera 70 is photographing.

FIG. 5 is a block diagram of the camera 70 and the control unit 9. The configuration of the hardware as the control unit 9 provided in the substrate processing apparatus 100 is the same as that of a general computer. That is, the control unit 9 includes the following components: a central processing unit (CPU) that performs various arithmetic processing, and a read-only memory (Read Only Memory, ROM) that is a memory dedicated to reading basic programs. , Random Access Memory (RAM) as a readable and writable memory for storing various information, and magnetic disks for memory control software or data, etc. When the CPU of the control unit 9 executes a predetermined processing program, each operation mechanism of the substrate processing apparatus 100 is controlled by the control unit 9 to perform the processing of the substrate processing apparatus 100.

The reference image registration unit 90, the positional deviation detection unit 91, and the command transmission unit 92 shown in FIG. 5 are functional processing units implemented in the control unit 9 when the CPU of the control unit 9 executes a predetermined processing program.

The reference image registration unit 90 registers a photographed image obtained by photographing the nozzle 30 located at the correct position as the reference image RP. The positional deviation detection unit 91 detects the positional deviation of the nozzle 30 in the vertical direction or the horizontal direction at the determination position, which is the position of the determination target. The positional deviation detection unit 91 includes an image determination unit 910 and an image comparison unit 912. The image judging unit 910 according to the established judging rule It is determined whether the actual image GP obtained by shooting for the nozzle 30 of the judgment target is an image at the judgment position (for example, the first end TE1 and the second end TE2) where the positional deviation of the nozzle 30 is judged. The established determination rules will be described in detail later. The image comparison unit 912 performs pattern matching processing that compares the actual image GP determined to be located at the determination position by the image determination unit 910 with the reference image RP indicating the position of the correct nozzle 30. The pattern matching processing will also be described in detail later.

The command sending unit 92 outputs commands (control information) in accordance with a processing program in which various conditions for processing the substrate W are described, thereby operating each element of the cleaning processing unit 1. Specifically, the command sending unit 92 outputs commands to the nozzle 30, the nozzle 60, and the nozzle 65 to operate the driving source (motor) built in the nozzle base 33, the nozzle base 63, and the nozzle base 68. For example, if the command sending unit 92 sends a command to the nozzle 30 to move to the first end TE1 of the processing section PS1, the nozzle 30 moves from the standby position to the first end TE1. Furthermore, when the command sending unit 92 sends a command to the nozzle 30 to move to the second end TE2 of the processing section PS1, the nozzle 30 moves from the first end TE1 to the second end TE2. The ejection of the processing liquid from the nozzle 30 may also be performed in response to a command transmission from the command transmission unit 92.

The control unit 9 includes a storage unit 94 that includes the RAM or a magnetic disk, and stores data or input values of images captured by the camera 70. A display unit 95 and an input unit 96 are connected to the control unit 9. The display unit 95 displays various information corresponding to the image signal from the control unit 9. The input unit 96 includes input devices such as a keyboard and a mouse connected to the control unit 9 and accepts input operations performed by the operator on the control unit 9.

<Action description>

The normal processing of the substrate W of the substrate processing apparatus 100 sequentially includes: the main transport robot 103 carries the substrate W of the processing target received from the indexer 102 into each cleaning processing unit 1, and the cleaning processing unit 1 performs cleaning processing on the substrate W The step of the main transport robot 103 transports the processed substrate W from the cleaning processing unit 1 and returns it to the indexer 102. The outline of a typical cleaning processing procedure for the substrate W of each cleaning processing unit 1 is as follows: after a chemical solution is supplied to the surface of the substrate W to perform a predetermined chemical solution treatment, pure water is supplied to perform a pure water rinsing treatment, and thereafter The substrate W is rotated at a high speed to shake off the pure water, so that the substrate W is dried.

When the cleaning processing unit 1 processes the substrate W, the substrate W is held by the rotating chuck 20, and the processing cup 40 performs a lifting operation. When the cleaning processing unit 1 performs chemical treatment, for example, only the outer cup 43 rises, and an enclosure is formed between the upper end portion 43b of the outer cup 43 and the upper end portion 52b of the second guide portion 52 of the middle cup 42 by the rotating chuck 20 An opening around the substrate W to be held. In this state, the substrate W rotates together with the spin chuck 20, and the chemical liquid is supplied from the nozzle 30 and the lower surface treatment liquid nozzle 28 to the upper surface and the lower surface of the substrate W. The supplied chemical liquid flows along the upper surface and the lower surface of the substrate W due to the centrifugal force generated by the rotation of the substrate W, and then scatters laterally from the edge of the substrate W. Thereby, the chemical solution treatment of the substrate W is performed. The chemical liquid scattered from the end edge of the self-rotating substrate W is blocked by the upper end 43 b of the outer cup 43, flows downward along the inner surface of the outer cup 43, and is recovered to the outer recovery tank 51.

When the cleaning processing unit 1 performs the pure water rinsing process, for example, the inner cup 41, the middle cup 42, and the outer cup 43 all rise, and the substrate W held by the rotating chuck 20 The periphery is surrounded by the first guide portion 47 of the inner cup 41. In this state, the substrate W rotates together with the spin chuck 20, and pure water is supplied from the nozzle 30 and the lower surface treatment liquid nozzle 28 to the upper surface and the lower surface of the substrate W. The supplied pure water flows along the upper and lower surfaces of the substrate W due to the centrifugal force generated by the rotation of the substrate W, and then scatters laterally from the edge of the substrate W. Thereby, the pure water rinsing process of the substrate W is performed. The pure water scattered from the end edge of the self-rotating substrate W flows downward along the inner wall of the first guide portion 47 and is discharged from the waste tank 49. Furthermore, when the pure water is recovered through a path different from the chemical solution, the middle cup 42 and the outer cup 43 can also be raised. Between the upper end 47b of a guide part 47, an opening surrounding the periphery of the substrate W held by the spin chuck 20 is formed.

When the washing treatment unit 1 performs the spin-off drying process, the inner cup 41, the middle cup 42, and the outer cup 43 all descend, the upper end 47b of the first guide part 47 of the inner cup 41 and the second guide part 52 of the middle cup 42 The upper end 52b and the upper end 43b of the outer cup 43 are both located below the substrate W that has been held by the rotating chuck 20. In this state, the substrate W is rotated at a high speed together with the spin chuck 20, and the water droplets that have adhered to the substrate W are thrown off by centrifugal force, and the drying process is performed.

In the present embodiment, when the processing liquid is ejected from the nozzle 30 toward the upper surface of the substrate W, the camera 70 photographs the nozzle 30 moving in the processing section PS1. Then, the positional deviation detection unit 91 compares a series of photographed images obtained by shooting with a reference image acquired in advance, thereby detecting the positional deviation of the nozzle 30. Hereinafter, this technique will be described in detail. In addition, the technique for detecting the positional deviation of the nozzle 30 will be described below, but it can also be applied to other nozzles 60 and 65.

FIG. 6 is a flowchart showing a procedure for preliminarily preparing for the detection process performed by the positional deviation detection unit 91. FIG. 7 is a flowchart showing the procedure of the detection process performed by the positional deviation detection unit 91. FIG. 6 shows a pre-prepared procedure for the detection processing of the positional deviation, and FIG. 7 shows a procedure of the determination processing performed when the substrate W to be processed has been carried into the cleaning processing unit 1. The pre-preparation of the program shown in FIG. 6 is performed before the processing process of the actual substrate W to be processed, and may be performed, for example, when the substrate processing apparatus 100 is started up or during maintenance work.

First, when the nozzle 30 is taught, the nozzle 30 is moved to the teaching position (step S11). The teaching refers to a task of instructing the nozzle 30 in an appropriate operation, and correcting the stop position of the nozzle 30 in the processing section PS1 to an appropriate position (teaching position). Therefore, at the time of teaching, when the nozzle 30 has been moved to the teaching position, the nozzle 30 correctly moves within the appropriate processing interval PS1. In addition, the appropriate processing section PS1 refers to a section in which the processing liquid is ejected from the nozzle 30 in the processing section PS1, so that the required substrate processing can be performed.

The processing section PS1 is a region defined above the substrate W held by the spin chuck 20, and is a movement range of the nozzle 30 extending in the horizontal direction. The two ends of the processing interval PS1 are a first end TE1 and a second end TE2. With the control unit 9 controlling the nozzle base 33, the nozzle 30 moves from the first end TE1 to the second end TE2 in the processing section PS1.

When the nozzle 30 moves within the appropriate processing section PS1, the camera 70 continuously photographs the imaging area PA including the tip of the nozzle 30 (step S12). So-called continuous Shooting refers to continuously shooting the shooting area PA at a fixed interval. For example, the camera 70 performs continuous shooting at 33 millisecond intervals. In this way, 30 frames of photographic images are acquired every second. The camera 70 performs animation photography after the nozzle 30 reaches the first end TE1 of the processing section PS1 from the standby position until the nozzle 30 reaches the second end TE2.

FIG. 8 is a diagram showing an example of an image obtained by the camera 70 capturing the imaging area PA including the tip of the nozzle 30 in the processing section PS1. The imaging area PA includes the tip of the nozzle 30 located in the middle of the processing section PS1 above the substrate W held by the spin chuck 20. In the example shown in FIG. 8, the substrate W is included in the imaging area PA, but this is not necessary. For example, there is also a case where the substrate W is not held by the spin chuck 20 during maintenance. In this case, it is also possible to perform imaging in a state where the substrate W is not included in the imaging area PA. As shown in FIG. 8, the shape of the nozzle 30 on the photographed image of the nozzle 30 moving in the processing section PS1 is gradually changed by the camera 70 fixed at a fixed position. In the example shown in FIG. 8, the width of the nozzle 30 in the horizontal direction gradually increases from the first end TE1, and gradually decreases from the middle to the second end TE2. In addition, the shape change of the nozzle 30 of the photographed image is not limited to such a shape change.

Then, the registration of the reference image is performed from the plurality of captured images obtained in step S12 (step S13). In step S12, the nozzle 30 is correctly moved from the first end TE1 of the appropriate processing section PS1 to the second end TE2 by teaching. Therefore, the photographed image obtained by the camera 70 in step S12 becomes a reference image indicating the proper position of the nozzle 30. In step S13, the reference image registration unit 90 uses a part of the plurality of captured images as a basis for detecting the positional deviation of the nozzle 30. The quasi-image RP is registered in the storage unit 94.

As shown in FIG. 8, let the reference image RP be an image cut out from the photographed image so as to include the tip portion of the nozzle 30. The image can be cut out by the operator manually specifying the area, or it can also be cut out automatically. In the latter case, for example, a part (tip) of the nozzle 30 may be detected by image recognition, and the position may be used as a reference to cut out an area including the tip of the nozzle 30. The cut-out reference image RP is stored in the storage unit 94 together with the position information of the shooting area PA. Usually, the cutting out is performed manually in the chamber 10 initially set. Regarding other chambers 10 to be set later, if the structure of the chambers 10 is the same, the cutting out information of the chamber 10 set initially can be used directly for cutting out, or it may be adjusted appropriately for cutting out.

In this embodiment, the registered reference image RP includes: a first reference image RP1 when the nozzle 30 is located at the first end TE1, a second reference image RP2 when the nozzle 30 is located at the second end TE2, and processing The intermediate reference image RPM when moving in the middle of the interval PS1 (the area between the first end TE1 and the second end TE2).

FIG. 9 is a diagram conceptually showing the registration process of the reference image RP. The first registration process shown in FIG. 9 is a process in which the reference image registration section 90 automatically registers a plurality of reference images RP. In FIG. 9, the photographed image of the nozzle 30 shown on the upper side is an image obtained by continuously photographing the nozzle 30 moving from the first end TE1 to the second end TE2 of the processing section PS1. As illustrated in FIG. 8, in the photographed image obtained by continuous photographing, the shape of the nozzle 30 changes during the period when the nozzle 30 moves in the processing section PS1. In the registration process shown in FIG. 9, the reference image registration unit 90 registers the reference image RP in accordance with the change in the shape of the nozzle 30.

First, let the captured image of the nozzle 30 at the first end TE1 be the one registered as the first reference image RP1. In this state, the reference image registration unit 90 sequentially compares the first reference image RP1 with the photographed images following the first reference image RP1, thereby performing pattern matching processing for calculating the degree of coincidence. As described above, in the photographed image, the shape of the nozzle 30 gradually changes, so the degree of coincidence with the first reference image RP1 gradually decreases. The reference image registration unit 90 registers a photographed image whose degree of coincidence is equal to or less than a predetermined threshold value as a new reference image RP. Specifically, the reference image registration unit 90 obtains the difference between the first reference image RP1 and the photographed image to be compared, and when the difference exceeds a predetermined threshold, uses the photographed image as The new reference image RP is registered. The reference image RP registered based on the comparison with the first reference image RP1 is the first intermediate reference image RPM1 corresponding to the first intermediate reference image RPM.

Then, the reference image registration unit 90 compares the newly registered first intermediate reference image RPM1 with the photographed image immediately following the photographed image corresponding to the first intermediate reference image RPM1. Then, the reference image registration unit 90 registers the captured image whose degree of coincidence is equal to or less than the predetermined threshold value as the second intermediate reference image RPM2 corresponding to the second intermediate reference image RPM. The reference image registration unit 90 repeats such a registration process until the target of the pattern matching process becomes the captured image of the second end TE2, thereby registering a plurality of intermediate reference images RPM.

Returning to FIG. 6, when the registration of the plurality of reference images RP is completed, the operator sets the threshold value for the positional deviation determination (step S14). The threshold value set here is used for the determination processing of the positional deviation of the nozzle 30 described later (the step shown in FIG. 7 S25) parameters. This threshold value is the threshold value of the deviation of the position of the nozzle 30 in the photographed image obtained by photographing the nozzle 30 of the judgment target from the reference image RP registered in step S13. The lower the threshold value set in step S14, the stricter the judgment criterion becomes. That is, even if the amount of deviation from the correct position of the nozzle 30 to be determined is small, it is determined that a positional deviation has occurred. The threshold value set in step S14 is stored in the storage unit 94.

Preliminary preparations for the nozzle 30 are performed as described above. For the other nozzles 60 and 65, the same pre-preparation as the pre-preparation shown in step S11 to step S14 is performed (step S15). Furthermore, when nozzles other than the nozzle 30 are configured to eject the processing liquid on the substrate W while stopping at a fixed processing position, the nozzles may also be moved to the processing in step S11. Position, in step S12, the nozzle that has stopped at the processing position is photographed. Then, in step S13, the photographed image obtained in step S12 may be used as the reference image.

The pre-preparation shown in FIG. 6 is a preparation that only needs to be carried out in advance when the teaching is carried out, and if carried out once, it may not be carried out again until the teaching position is changed. In addition, for the fixed lower surface treatment liquid nozzle 28, the above-mentioned preliminary preparation processing may not be performed.

Next, referring to FIG. 7, the procedure of the detection processing of the positional deviation of the nozzle 30 will be described. The main transport robot 103 transports the substrate W to be processed into the cleaning processing unit 1 (step S21). The substrate W that has been carried in is held in a horizontal posture by the rotating chuck 20. At the same time, the cup 40 is processed to reach the regulations The lifting motion is carried out in the manner of the height position.

After the new substrate W to be processed has been held by the spin chuck 20, the nozzle 30 starts to move from the standby position toward the first end TE1 of the processing section PS1 (step S22). The movement of the nozzle 30 is performed by the control unit 9 controlling the nozzle base 33 in accordance with a processing program set in advance. In the processing program, the conditions of the processing to be performed on the object are described in a predetermined data format. Specifically, the processing program or processing content (processing time, temperature, pressure, or supply amount), etc. are described. After the nozzle 30 reaches the first end TE1 of the processing section PS1 and stops, the substrate W is rotated under the control of the control unit 9 and the processing liquid is started to be discharged from the nozzle 30. Then, while spraying the treatment liquid, the nozzle 30 starts to move from the first end TE1 of the treatment section PS1 toward the second end TE2, and then stops at the second end TE2.

In step S22, the positional deviation detection unit 91 causes the camera 70 to start imaging in accordance with the movement of the nozzle 30 (step S23). The camera 70 continuously photographs the photographing area PA at 33 millisecond intervals, for example. That is, the camera 70 starts continuous imaging from the time point when the spin chuck 20 holds the new substrate W as the processing target, and the nozzle 30 starts to move from the standby position toward the first end TE1 of the processing section PS1. point. The time point when the camera 70 starts continuous shooting is also the time point when the nozzle 30 starts to move from the standby position, so the nozzle 30 does not reach the shooting area PA.

After the camera 70 starts continuous shooting, the positional deviation detection unit 91 determines the actual image GP corresponding to the determined position (step S24). Specifically, the image determination unit 910 of the positional deviation detection unit 91 determines from among the plurality of actual images GP as the images obtained in step S23, and determines the value registered in step S13 (FIG. 6) of pre-preparation. The actual image GP corresponding to the determination position shown in each of the plurality of reference images RP.

FIG. 10 is a diagram conceptually showing how the actual image GP corresponding to the reference image RP is determined. In the example shown in FIG. 10, the reference image RP is compared with the actual image GP, thereby determining the actual image GP corresponding to the reference image RP. In this comparison, a well-known pattern matching method can also be applied.

For example, among many actual images GP, the actual image GP with the largest degree of coincidence (the smallest difference) with the first reference image RP1 corresponding to the first end TE1 by pattern matching is set as the nozzle 30 at the first end The first actual image at TE1. In addition, the actual image GP having the greatest degree of coincidence with the second reference image RP21 corresponding to the second end TE2 is set as the second actual image when the nozzle 30 is located at the second end TE2. The actual image GP with the greatest degree of coincidence with each of the plurality of intermediate reference images RPM is set as the following images, which are the respective intermediate reference images RPM (for example, , Including the images at each determination position corresponding to the first intermediate reference image RPM1 and the second intermediate reference image RPM2 shown in FIG. 9.

<Stop Judgment>

In the description of FIG. 10, as a determination rule, the degree of coincidence with the reference image RP is used as a reference, and it is determined whether each actual image GP is an image corresponding to each determination position. However, the judgment rule is not limited to this. For example, for the actual image GP corresponding to each position of the first end TE1 and the second end TE2 of the processing section PS1, it is also possible to determine that the nozzle 30 has stopped as a determination rule.

Specifically, the stop determination of the movement of the nozzle 30 may also calculate the difference between two consecutive actual images GP and GP, and determine whether the difference has become a predetermined value. Below the threshold. The so-called difference between two consecutive actual images GP and GP refers to a difference image representing the difference between a certain actual image GP and the actual image GP immediately following it. In addition, the calculation of the difference value refers to the sum of the absolute values of the grayscale values of all pixels in the difference image.

For example, after the nozzle 30 moves from the standby position to the first end TE1, it temporarily stops at the first end TE1. Between the continuous actual images GP and GP when the nozzle 30 is moving toward the first end TE1, the image of the nozzle 30 is likely to remain in the difference image of the actual images GP and GP. Therefore, the sum of the absolute values of the grayscale values of the difference image becomes a relatively large value. In contrast, between the continuous actual images GP and GP after the nozzle 30 stops at the first end TE1, the position of the nozzle 30 becomes the same. Therefore, the nozzle 30 is in the difference image between the actual images GP and GP. Is removed. Therefore, the sum of the absolute values of the grayscale values of the difference image becomes a relatively small value. According to this principle, by appropriately setting the threshold value, it is possible to easily and accurately detect that the nozzle 30 has stopped at the first end TE1. The image determination unit 910 may also detect the stop of the nozzle 30 at the second end TE2 based on the same principle as the stop of the nozzle 30 at the first end TE1.

Furthermore, in order to prevent false detection caused by noise or the like, for example, the image determination unit 910 may also calculate a difference between three or more consecutive actual images. Then, the image determination unit 910 may determine that the nozzle 30 has stopped when the obtained difference values are all equal to or less than the threshold value.

The steps from step S21 to step S24 are processes that are executed every time the substrate W to be processed is carried into the cleaning processing unit 1. That is, in the present embodiment, every time the rotating chuck 20 holds the processing target that has been carried into the cleaning processing unit 1 When the substrate W and the nozzle 30 move in the processing section PS1, the actual image corresponding to each of the plurality of reference images RP is determined.

After step S24, the image comparison unit 912 of the positional deviation detection unit 91 compares the plurality of reference images RP with the actual image corresponding to each reference image RP, and detects the positional deviation of the nozzle 30 at each determination position ( Step S25). The reference image RP is an image acquired by the camera 70 photographing the imaging area PA when the nozzle 30 is correctly positioned at each determination position of the processing section PS1 during the teaching. In addition, the actual image determined in step S24 is the actual image obtained by the camera 70 photographing the imaging area PA when the nozzle 30 moves in the processing section PS1 in the state that the spin chuck 20 has held the substrate W as the processing target. The image is a photographed image corresponding to each reference image RP (that is, having a high degree of coincidence). Therefore, by comparing each reference image RP with the corresponding actual image, it can be determined whether the nozzle 30 has moved at an appropriate position above the substrate W, and whether the nozzle 30 has stopped at an appropriate position.

Specifically, the image comparison unit 912 compares each of the plurality of reference images RP registered in step S13 with the corresponding actual image GP determined in step S24. Then, the difference (positional deviation) of the coordinates of the nozzle 30 of the two images is calculated. In this comparison, a well-known pattern matching method can also be applied. When the positional deviation of the nozzle 30 calculated by the pattern matching is greater than or equal to the threshold value set in step S14, the image comparison unit 912 determines that the actual position of the nozzle 30 at the determined position has a positional deviation. When the positional deviation of the nozzle 30 is detected, the control unit 9 may also perform a predetermined abnormality response process. As an exception handling process, for example, to issue a warning (display The display of a warning by the indicator 95, the lighting of a lamp not shown, the output of a warning sound from a speaker not shown, etc.), the operation of the cleaning processing unit 1 is stopped, and the like. When the calculated position deviation of the nozzle 30 is smaller than the threshold value set in step S14, it is determined that the actual position of the nozzle 30 does not deviate. In addition, in step S25, not only the determination of the positional deviation based on the threshold value is performed, but the specific positional deviation amount may be displayed on the display unit 95, for example.

Sometimes even if the shape of the nozzle 30 on the reference image RP is the same as the shape of the nozzle 30 on the actual image GP, the position of the nozzle 30 obtained from the position information of each image is also in the horizontal or vertical direction. Deviate. In this embodiment, when the position of the nozzle 30 is deviated in the horizontal direction on the actual image GP, it is determined that there is a possibility that the position of the nozzle 30 is deviated in the horizontal direction. In addition, when the nozzle 30 has a positional deviation in the vertical direction on the actual image GP, it is determined that there is a possibility that the nozzle 30 has a positional deviation in the vertical direction. The search of the nozzle 30 can use the method of "shape-based pattern matching". Specifically, the actual image GP is searched for an area consistent with the edge information of the nozzle 30 of the reference image RP that has been cut out, and the coordinate value of the found area is compared with the coordinate value of the reference image RP, This determines whether a positional deviation has occurred.

The above is the description of the detection processing for the positional deviation of the nozzle 30, but for nozzles 60 and 65 other than the nozzle 30, the positional deviation can be detected by the same procedure as the flow shown in FIG. 7. In addition, when nozzles other than the nozzle 30 are configured to eject the processing liquid in a state where they are stopped at a fixed processing position on the substrate W, as described above, step S13 is prepared in advance. Here, the image of the nozzle 30 in the state where it has stopped at the processing position correctly is registered as the reference image RP. Therefore, in step S24, by matching or stopping determination, the actual image GP corresponding to the processing position is determined as the image corresponding to the reference image RP, and in step S25, the actual image GP corresponding to the reference image The comparison between RP and the actual image GP determines the positional deviation of other nozzles.

<Effect>

As described above, in the substrate processing apparatus 100 of the present embodiment, it is possible to detect the positional deviation of the nozzle 30 that discharges the processing liquid while moving in the processing section PS1. In particular, the positional deviation of the nozzle 30 at the first end TE1 and the second end TE2 can be detected, so it can be checked whether the nozzle 30 is correctly moving between the two ends of the processing section PS1 to be moved. Thereby, the liquid treatment using the moving nozzle 30 can be appropriately performed.

It can be determined whether the nozzle 30 moved in the middle of the processing section PS1 is moving in the correct vertical direction and in the correct position. Therefore, it can be determined whether it is at an appropriate height from the substrate W and the processing liquid ejected from the nozzle 30 is supplied. Thereby, the liquid treatment using the moving nozzle 30 can be appropriately performed.

Based on the comparison between the reference image RP at each determination position and the actual image GP, the positional deviation of the nozzle 30 at each determination position is determined. Therefore, even if the shape of the nozzle 30 changes due to movement in the processing section PS1, the actual image GP can be determined with high accuracy corresponding to the shape of the nozzle 30 at each determination position. Therefore, the positional deviation of the nozzle 30 at each determination position can be detected with high accuracy.

<Position deviation detection using reference track information>

In the above description, the reference image RP is compared with the actual image GP by pattern matching, thereby detecting the positional deviation of the nozzle 30. However, it is also possible to use the information of the trajectory (path) of the nozzle 30 moving in the processing section PS1 to detect the positional deviation of the nozzle 30.

FIG. 11 is a diagram conceptually showing the reference track information ST1. The reference trajectory information ST1 is information indicating the path of the nozzle 30 when the nozzle 30 has correctly moved from the first end TE1 of the processing section PS1 to the second end TE2. The reference track information ST1 can be generated based on a plurality of reference images RP, for example.

The reference trajectory information ST1 may also be generated by the position deviation detection unit 91 determining the position of the nozzle 30 based on the reference image RP. Specifically, as shown in FIG. 11, the tip position of the nozzle 30 can also be determined based on the first reference image RP1, the second reference image RP2, and a plurality of intermediate reference images RPM, and the position of the tip of the nozzle 30 can be determined by a known interpolation process. The front ends are joined to each other, thereby generating reference track information ST1. The generation of the reference track information ST1 may also be performed at an appropriate time after step S13. Furthermore, not only based on the plurality of reference images RP registered in step S13, but also a series of photographed images obtained by continuous photographing in step S12, to generate reference trajectory information ST1. In this case, the reference trajectory information ST1 indicating the precise trajectory of the nozzle 30 can be generated.

In step S25, when the positional deviation detection unit 91 uses the reference track information ST1 to detect the positional deviation of the nozzle 30, the vertical position of the nozzle 30 is calculated based on the actual image GP determined in step S24, and is compared with the reference track information ST1. The vertical position obtained by the information ST1 is compared to detect the vertical position of the nozzle 30 Deviate.

<Other registration processing of reference image RP>

In FIG. 9, the reference image registration unit 90 automatically registers a plurality of reference images RP through the pattern matching process. However, the reference image registration unit 90 may also register a captured image designated by the operator as the reference image RP.

FIG. 12 is a timing chart showing a case where the nozzle 30 is continuously photographed. As described above, when the command transmission unit 92 outputs commands to the nozzle 30, the nozzle 60, and the nozzle 65, the nozzle base 33, the nozzle base 63, and the nozzle base 68 are operated. At this time, the camera 70 responds to the command transmission by the command transmission unit 92 to continuously photograph the imaging area PA.

In the command, information indicating any one of the nozzle 30, nozzle 60, and nozzle 65 and information indicating the position of the movement destination of the ejection head of each nozzle 30, nozzle 60, and nozzle 65 are recorded. As shown in FIG. 12, continuous shooting is performed corresponding to the transmission of the commands C1 to C4, thereby acquiring photographic images of the nozzle 30, nozzle 60, and nozzle 65 that are moving.

In step S11 shown in FIG. 6, by sending a command to the nozzle base 33, the nozzle 30 moves from the standby position to the first end TE1. Then, by further sending the command to the nozzle base 33, the nozzle 30 moves from the first end TE1 to the second end TE2. In addition, in response to these command transmissions, continuous shooting of the nozzle 30 in step S12 is performed.

A series of photographed images acquired by the continuous photographing executed corresponding to the instruction are stored in correspondence with the instruction that becomes the trigger of the continuous photographing. For example, a series of captured images acquired corresponding to the command C1 is associated with the command C1 and stored in the storage unit 94. Therefore, by specifying the command C1, a series of photographed images corresponding to the command C1 can be retrieved.

FIG. 13 is a diagram showing a registration screen W1 for performing registration of the reference image RP. The registration screen W1 is a screen displayed on the display unit 95 by the reference image registration unit 90. The registration screen W1 has an image display area WR2, a nozzle/position selection area WR4, a display control area WR6, and a registration decision button BT4.

The image display area WR2 is an area in which a series of captured images are continuously displayed in the order of acquisition. The nozzle/position selection area WR4 is an area that accepts the operation of selecting any one of the plurality of nozzles 30, 60, 65 and the operation of selecting the movement destination of the selected nozzle.

The display control area WR6 is an area that accepts an operation of controlling image display in the image display area WR2. In the display control area WR6, a skip button BT2 is prepared. The skip button BT2 accepts an operation to select a series of captured images displayed in the image display area WR2. Specifically, the operator further operates the skip button BT2 in a state where a specific nozzle and the movement destination of the nozzle are selected in the nozzle/position selection area WR4. Then, the reference image registration unit 90 displays the first image in the image display area WR2 among the series of captured images that are associated with the command corresponding to the selected nozzle and the moving destination. In this way, the operator combines the nozzle/position selection area WR4 with the skip button BT2 to find out the photographic image of the target nozzle from all photographic images taken in one processing program and display it on the image display Area WR2.

The registration decision button BT4 accepts an operation of registering the captured image displayed in the image display area WR2 as the reference image RP. The operator operates in the display control area WR6 to display a desired captured image in the image display area WR2, and operates the registration decision button BT4 in this state. Thereby, the captured image that has been displayed in the image display area WR2 is registered as the reference image RP.

According to the registration screen W1, the operator can designate the command sent by the command sending unit 92 by operating the nozzle/position selection area WR4. Thereby, a series of captured images corresponding to the command is selectively displayed in the image display area WR2. Therefore, the operator can efficiently display and confirm a series of captured images indicating the movement of the nozzle that is the registration target of the reference image RP. Therefore, the operator can efficiently register the reference image RP by operating the registration decision button BT4.

Furthermore, in this embodiment, the nozzle 30 includes one ejection head 31, but may also include a plurality of ejection heads 31. In this case, the command sending unit 92 sends the command to the nozzle base 33, whereby the target ejection head among the plurality of ejection heads moves to a predetermined position. The command may include not only information indicating the nozzle 30, but also information indicating any one of a plurality of ejection heads. In addition, in the nozzle/position selection area WR4, an operation to designate a specific ejection head may be accepted, thereby allowing a command to be designated.

<2. Second embodiment>

Next, the second embodiment will be described. In addition, in the following description, elements having the same functions as the elements already described are given the same reference numerals or Letters and symbols are added, and detailed descriptions are sometimes omitted.

FIG. 14 is a diagram showing the control unit 9A of the second embodiment. The control unit 9A of this embodiment is different from the control unit 9 in that it includes a positional deviation detection unit 91A. The positional deviation detection unit 91A includes the function of detecting the positional deviation of the nozzle 30 similarly to the positional deviation detection unit 91, but is different from the positional deviation detection unit 91 in that it includes the image determination unit 910A.

The image determination unit 910A includes a feature vector calculation unit 9102 and a classifier K2. The feature vector calculation unit 9102 calculates a feature vector that is an arrangement of a plurality of feature amounts based on each actual image GP acquired by the continuous shooting in step S23. The items of the feature amount are, for example, the sum of the pixel values in the gradation of each actual image GP, the sum of the brightness, the standard deviation of the pixel values, the standard deviation of the brightness, and the like. The classifier K2 classifies the actual image GP among the levels based on the feature vector calculated by the feature vector calculation unit 9102. Here, a plurality of levels corresponding to different positions of the nozzle 30 on the substrate W are defined.

In more detail, each determination position of the nozzle 30 corresponding to each reference image RP registered by the reference image registration unit 90 is defined in the form of a level. For example, two levels are defined respectively corresponding to the first end TE1 and the second end TE2. In addition, a plurality of levels respectively corresponding to different determination positions in the middle of the processing section PS1 are defined.

The image determination unit 910A performs image determination processing in step S24 shown in FIG. 7 in the same way as the image determination unit 910. Specifically, when a certain actual image GP is classified into a specific level by the classifier K2, the image determination unit 910A It is determined whether or not the actual image GP is an image at the determined position corresponding to the specific level. For example, when the classifier K2 classifies the actual image GP into a level corresponding to the first end TE1, the image determination unit 910A determines the actual image GP as an image when the nozzle 30 is located at the first end TE1.

As shown in FIG. 14, a communication unit 97 is connected to the control unit 9A. The communication unit 97 is provided for data communication between the control unit 9A and the server 8. The substrate processing apparatus 100, the communication unit 97, and the server 8 constitute a substrate processing system. The classifier K2 is generated by the server 8 through machine learning, and is provided from the server 8 to the control unit 9A.

The server 8 includes a machine learning unit 82. The machine learning unit 82 generates a classifier K2 through machine learning. As machine learning, well-known methods such as neural network, decision tree (decision tree), support vector machine (SVM), discriminant analysis, etc. can be used. In addition, the teaching materials for machine learning include: a feature vector of a photographed image obtained by photographing a nozzle 30 located at a specific determination position by the camera 70, and information indicating a level corresponding to the specific determination position The grade label. Teaching materials are prepared for each level corresponding to a plurality of determination positions.

The substrate processing apparatus 100 does not necessarily need to be connected to the server 8. For example, the substrate processing apparatus 100 may not include the machine learning unit 82. In this case, the classifier K2 can be generated in the substrate processing apparatus 100.

Furthermore, the actual image GP when the nozzle 30 is determined to be at the determination position is determined by the classifier K2, and similarly, the other nozzles 60 and 65 are also prepared A classifier that classifies between levels corresponding to different positions can also use the classifier to determine the actual image GP at the determined position.

Fig. 15 is a diagram conceptually showing the classifier K2. The classifier K2 shown in Fig. 15 is constructed by the neural network NN1. The neural network NN1 includes an input layer, an intermediate layer, and an output layer. In the input layer, various feature quantities of the image as the classification target (the actual image GP as the inspection target) are input. In addition, multiple levels are defined for different determination positions of the nozzle 30, and in the output layer, the actual image GP is classified into any one level. Furthermore, when the actual image GP is not classified into any level, the classifier K2 outputs that it cannot be classified. In FIG. 15, the classifier K2 includes an intermediate layer, but may also include multiple intermediate layers.

In the classifier K2 shown in FIG. 15, a feature vector is calculated from the overall image of the photographing area PA of the camera 70, and the classifier K2 performs classification based on the feature vector. However, an image obtained by cutting out a part of the entire image so as to include the tip portion of the nozzle 30 may be used as a teaching material, and the machine learning unit 82 may perform learning, thereby generating the classifier K2.

In this way, according to the present embodiment, by using the classification by the classifier K2 generated by machine learning, the actual image GP corresponding to the determination position can be specified with high accuracy. Therefore, by comparing the reference image RP with the actual image GP, the positional deviation of the nozzle 30 at the determination position can be appropriately detected.

Although this invention was demonstrated in detail, the said description is an illustration in all respects, and this invention is not limited to this. The countless modified examples not illustrated are interpreted as those that can be thought of without departing from the scope of the present invention. The various embodiments and modifications described above As long as the components described in the above do not contradict each other, they may be combined or omitted as appropriate.

S11~S15: steps

Claims (13)

A substrate processing method, which is a substrate processing method for processing a substrate, includes: (a) a step of moving a nozzle in a predetermined processing interval extending in a horizontal direction; (b) photographing by the step (a) And the step of moving the nozzle in the treatment section; (c) will be obtained when the nozzle is located at the first end and the second end as the two ends of the treatment section in the step (b) The step of registering the photographed image as the first reference image and the second reference image; (d) the step of moving the nozzle within the processing interval; (e) the step of photographing by the step (d) And the step of the nozzle moving in the processing interval; (f) for the plurality of photographic images obtained by the step (e), according to the determination rule, determine whether the first end and the The image determination step of the images corresponding to the second ends; The first actual image and the second actual image respectively corresponding to the first end and the second end are compared, and the step (d) is respectively configured at the two ends of the processing interval. The step of deviating the position of the nozzle; the determination rule in the step (f) is a determination rule based on the degree of coincidence with the first and second reference images, or the nozzle has stopped do It is the judgment rule. The substrate processing method described in the first item of the patent application further includes: (h) after the step (c) and before the step (d), holding the substrate to be processed in the substrate holding portion step. The substrate processing method according to item 1 or item 2 of the scope of patent application, wherein the step (d) comprises: (d1) moving the nozzle from a position biased toward the first end toward the second end And the step (f) includes: (f1) a step of determining whether it is an image corresponding to the first end and the second end, respectively, based on the difference between the consecutive photographed images. The substrate processing method described in item 1 or item 2 of the scope of patent application, wherein the step (c) includes: (c1) registration by moving in the middle of the processing section by shooting in the step (b) The step of obtaining an intermediate reference image obtained by the nozzle, and the step (g) includes: (g1) according to the intermediate reference image, and by photographing in the process in the step (e) The comparison of the intermediate actual images obtained by the nozzles moving in the middle of the interval is detected in the step of detecting the positional deviation of the nozzles moving in the middle of the processing interval in the step (d). The substrate processing method according to item 4 of the scope of patent application, wherein the step (g) comprises: (g2) A step of detecting the positional deviation of the nozzle in the vertical direction based on the intermediate reference image and the intermediate actual image. The substrate processing method described in claim 4 further includes: (i) based on the plurality of intermediate reference images registered in the step (c1), generating a movement in the processing interval The step of reference track information of the nozzle track, and the step (g) includes: (g3) detecting the position deviation of the nozzle in the vertical direction based on the intermediate actual image and the reference track information A step of. The substrate processing method according to claim 4, wherein the step (c1) includes: (c11) photographing the nozzle moving in the middle of the processing section in the step (b) The step of registering one of the obtained multiple photographic images as the first intermediate reference image; and (c12) after the step (c11), the following photographic image is used as the second intermediate reference image In the registration step, the photographed image is an image immediately following the first intermediate reference image among the plurality of photographed images, and the degree of coincidence with the first intermediate reference image becomes a predetermined The image below the threshold. The substrate processing method according to item 1 or item 2 of the scope of patent application, wherein the step (a) includes: (a1) the control unit moves the nozzle from the first end to the second end The control signal so far is sent to the nozzle moving part, and The step (b) includes: (b1) a step of photographing the nozzle corresponding to the transmission of the control signal, and acquiring a plurality of photographed images. The substrate processing method as described in item 8 of the scope of patent application, wherein the step (b) further comprises: (b2) combining the control information indicated by the control signal with the photographing method corresponding to the control signal A step of establishing correspondences between the acquired multiple photographic images and recording them. The substrate processing method according to the ninth patent application, wherein the step (c) includes: (c2) a series of photographic images obtained by the step (b) are successively displayed in the order of acquisition The step of displaying the part, and the step (c2) includes: (c21) the step of specifying the control information; and (c22) the photographed image corresponding to the control information specified by the step (c21) The step of displaying an image on the display unit. A substrate processing apparatus, which is a substrate processing apparatus for processing substrates, includes: a substrate holding portion that holds the substrate in a horizontal position; a nozzle that supplies a processing liquid to the substrate held by the substrate holding portion; and a nozzle moving portion that makes The nozzle moves in a predetermined processing interval extending in the horizontal direction; the camera acquires a photograph by photographing the nozzle moving in the processing interval A shadow image; a reference image registration unit that registers the first reference image and the second reference image obtained by the camera shooting the nozzles located at the first and second ends of the two ends of the processing section And a positional deviation detection unit that detects the positional deviation of the nozzle at the first end and the second end; and the positional deviation detection unit includes: an image determination unit for shooting by using the camera The actual image acquired by the nozzle moving in the processing interval is determined according to a determination rule whether it is an image corresponding to the first end and the second end, respectively; and an image comparison unit, The first reference image and the second reference image, and the first actual image and the first actual image determined by the image determining unit to correspond to the first end and the second end, respectively The two actual images are compared; the judgment rule in the image judgment unit is a judgment rule based on the degree of coincidence with the first and second reference images, or the nozzle has stopped As a judgment rule. The substrate processing apparatus according to claim 11, wherein the image determination unit includes: a feature vector calculation unit that extracts a plurality of feature vectors from each of the plurality of photographed images; and a classifier corresponding to The plurality of feature vectors classify each of the plurality of photographic images into levels corresponding to different positions of the nozzles; and The multiple levels include levels corresponding to the first end and the second end, respectively. A substrate processing system is a substrate processing system including a substrate processing device for processing substrates and a server for data communication with the substrate processing device, the substrate processing device includes: a substrate holding portion that is held in a horizontal posture The substrate; the nozzle, which supplies the processing liquid to the substrate held by the substrate holding section; the nozzle moving section, which moves the nozzle in a predetermined processing section extending in the horizontal direction; the camera, by photographing in the processing section The nozzle that moves inside to obtain a photographic image; a reference image registration unit that registers the first reference obtained by the camera photographing the nozzles located at the first end and the second end that are the two ends of the processing section An image and a second reference image; a position deviation detection unit that detects the position deviation of the nozzles at the first end and the second end; and a communication unit that performs data communication with the server; the The positional deviation detection unit includes: an image determination unit for determining whether the actual image acquired by the nozzle moving in the processing section by the camera is in line with the first end according to a determination rule And the images respectively corresponding to the second end; and The image comparison unit compares the first reference image and the second reference image with the first end and the second end determined by the image determination unit as corresponding to the first end and the second end, respectively. A real image and a second real image are compared; the judgment rule in the image judgment unit is a judgment rule based on the degree of agreement with the first and second reference images, or The nozzle has stopped as a determination rule, and the image determination unit includes: a feature vector calculation unit that extracts a variety of feature vectors from the photographic image; and a classifier, based on the multiple feature vectors, to The plurality of photographed images are classified into a plurality of levels corresponding to different positions of the nozzle; the plurality of levels include the levels of the images corresponding to the first end and the second end, respectively, the servo The machine includes a machine learning unit that generates the classifier by machine learning that uses the plurality of photographic images that have been taught to any one of the plurality of levels as teaching materials, and generates the classifier from the The server provides the classifier to the substrate processing apparatus.

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