TWI639628B - Epoxy resin composition and cured article thereof - Google Patents
Epoxy resin composition and cured article thereof Download PDFInfo
- Publication number
- TWI639628B TWI639628B TW103125804A TW103125804A TWI639628B TW I639628 B TWI639628 B TW I639628B TW 103125804 A TW103125804 A TW 103125804A TW 103125804 A TW103125804 A TW 103125804A TW I639628 B TWI639628 B TW I639628B
- Authority
- TW
- Taiwan
- Prior art keywords
- epoxy resin
- group
- resin composition
- general formula
- halogen atom
- Prior art date
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- 239000003822 epoxy resin Substances 0.000 title claims abstract description 115
- 229920000647 polyepoxide Polymers 0.000 title claims abstract description 115
- 239000000203 mixture Substances 0.000 title claims abstract description 63
- 125000005843 halogen group Chemical group 0.000 claims abstract description 19
- 125000004432 carbon atom Chemical group C* 0.000 claims abstract description 14
- 125000001424 substituent group Chemical group 0.000 claims abstract description 10
- 125000001624 naphthyl group Chemical group 0.000 claims abstract description 8
- 238000001746 injection moulding Methods 0.000 claims abstract description 6
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 claims abstract description 6
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 claims abstract description 4
- 125000001183 hydrocarbyl group Chemical group 0.000 claims abstract 9
- -1 halogenated methyl compound Chemical class 0.000 claims description 43
- 150000001875 compounds Chemical class 0.000 claims description 36
- BRLQWZUYTZBJKN-UHFFFAOYSA-N Epichlorohydrin Chemical compound ClCC1CO1 BRLQWZUYTZBJKN-UHFFFAOYSA-N 0.000 claims description 33
- 239000000853 adhesive Substances 0.000 claims description 17
- 230000001070 adhesive effect Effects 0.000 claims description 17
- 239000004848 polyfunctional curative Substances 0.000 claims description 15
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 10
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 9
- 125000003700 epoxy group Chemical group 0.000 claims description 4
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 3
- 239000012778 molding material Substances 0.000 claims description 2
- 239000003566 sealing material Substances 0.000 claims description 2
- 239000003795 chemical substances by application Substances 0.000 abstract description 6
- 238000003475 lamination Methods 0.000 abstract description 4
- 238000000465 moulding Methods 0.000 abstract description 4
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 39
- 239000010410 layer Substances 0.000 description 39
- 238000006243 chemical reaction Methods 0.000 description 37
- 230000015572 biosynthetic process Effects 0.000 description 27
- 239000000463 material Substances 0.000 description 25
- 229920005989 resin Polymers 0.000 description 25
- 239000011347 resin Substances 0.000 description 25
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 24
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 24
- 238000000034 method Methods 0.000 description 21
- 238000003786 synthesis reaction Methods 0.000 description 20
- 238000003756 stirring Methods 0.000 description 19
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 18
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 14
- 239000004593 Epoxy Substances 0.000 description 14
- 229910052751 metal Inorganic materials 0.000 description 12
- 239000002184 metal Substances 0.000 description 12
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 12
- 239000002904 solvent Substances 0.000 description 11
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 10
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 9
- 239000011888 foil Substances 0.000 description 9
- 238000010438 heat treatment Methods 0.000 description 9
- 150000002989 phenols Chemical class 0.000 description 9
- 239000007787 solid Substances 0.000 description 9
- 150000002430 hydrocarbons Chemical group 0.000 description 8
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 8
- 150000003839 salts Chemical class 0.000 description 8
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 7
- 229910052783 alkali metal Inorganic materials 0.000 description 7
- 239000011521 glass Substances 0.000 description 7
- 229910052757 nitrogen Inorganic materials 0.000 description 7
- 229920003986 novolac Polymers 0.000 description 7
- 150000008044 alkali metal hydroxides Chemical class 0.000 description 6
- 239000007864 aqueous solution Substances 0.000 description 6
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 6
- 238000001816 cooling Methods 0.000 description 6
- 239000000835 fiber Substances 0.000 description 6
- 238000010992 reflux Methods 0.000 description 6
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 6
- 238000000926 separation method Methods 0.000 description 6
- 229930185605 Bisphenol Natural products 0.000 description 5
- 239000004744 fabric Substances 0.000 description 5
- 239000005011 phenolic resin Substances 0.000 description 5
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N 1,4-Benzenediol Natural products OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 4
- ZZHIDJWUJRKHGX-UHFFFAOYSA-N 1,4-bis(chloromethyl)benzene Chemical compound ClCC1=CC=C(CCl)C=C1 ZZHIDJWUJRKHGX-UHFFFAOYSA-N 0.000 description 4
- HSASKNPEYJOZHA-UHFFFAOYSA-N 2-[3-(carboxymethoxy)-5-(1-hydroxy-2-oxo-2-phenylethyl)phenoxy]acetic acid Chemical compound C(=O)(O)COC=1C=C(C(C(C2=CC=CC=C2)=O)O)C=C(C=1)OCC(=O)O HSASKNPEYJOZHA-UHFFFAOYSA-N 0.000 description 4
- 229920000049 Carbon (fiber) Polymers 0.000 description 4
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 4
- IMHDGJOMLMDPJN-UHFFFAOYSA-N biphenyl-2,2'-diol Chemical compound OC1=CC=CC=C1C1=CC=CC=C1O IMHDGJOMLMDPJN-UHFFFAOYSA-N 0.000 description 4
- 239000004917 carbon fiber Substances 0.000 description 4
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 4
- 238000005259 measurement Methods 0.000 description 4
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 4
- QWVGKYWNOKOFNN-UHFFFAOYSA-N o-cresol Chemical compound CC1=CC=CC=C1O QWVGKYWNOKOFNN-UHFFFAOYSA-N 0.000 description 4
- 229960003742 phenol Drugs 0.000 description 4
- 239000011342 resin composition Substances 0.000 description 4
- 239000002966 varnish Substances 0.000 description 4
- VPWNQTHUCYMVMZ-UHFFFAOYSA-N 4,4'-sulfonyldiphenol Chemical compound C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1 VPWNQTHUCYMVMZ-UHFFFAOYSA-N 0.000 description 3
- AZZWZMUXHALBCQ-UHFFFAOYSA-N 4-[(4-hydroxy-3,5-dimethylphenyl)methyl]-2,6-dimethylphenol Chemical compound CC1=C(O)C(C)=CC(CC=2C=C(C)C(O)=C(C)C=2)=C1 AZZWZMUXHALBCQ-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- LCGLNKUTAGEVQW-UHFFFAOYSA-N Dimethyl ether Chemical compound COC LCGLNKUTAGEVQW-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical group O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- 229910000831 Steel Inorganic materials 0.000 description 3
- 125000003118 aryl group Chemical group 0.000 description 3
- VCCBEIPGXKNHFW-UHFFFAOYSA-N biphenyl-4,4'-diol Chemical compound C1=CC(O)=CC=C1C1=CC=C(O)C=C1 VCCBEIPGXKNHFW-UHFFFAOYSA-N 0.000 description 3
- 239000002131 composite material Substances 0.000 description 3
- 239000004020 conductor Substances 0.000 description 3
- 150000002148 esters Chemical class 0.000 description 3
- 238000011156 evaluation Methods 0.000 description 3
- 239000012212 insulator Substances 0.000 description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 3
- 150000002924 oxiranes Chemical class 0.000 description 3
- 229920001721 polyimide Polymers 0.000 description 3
- 238000003825 pressing Methods 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- 239000010959 steel Substances 0.000 description 3
- 238000005406 washing Methods 0.000 description 3
- MYRTYDVEIRVNKP-UHFFFAOYSA-N 1,2-Divinylbenzene Chemical compound C=CC1=CC=CC=C1C=C MYRTYDVEIRVNKP-UHFFFAOYSA-N 0.000 description 2
- KJCVRFUGPWSIIH-UHFFFAOYSA-N 1-naphthol Chemical compound C1=CC=C2C(O)=CC=CC2=C1 KJCVRFUGPWSIIH-UHFFFAOYSA-N 0.000 description 2
- YBYIRNPNPLQARY-UHFFFAOYSA-N 1H-indene Chemical compound C1=CC=C2CC=CC2=C1 YBYIRNPNPLQARY-UHFFFAOYSA-N 0.000 description 2
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 2
- XMTQQYYKAHVGBJ-UHFFFAOYSA-N 3-(3,4-DICHLOROPHENYL)-1,1-DIMETHYLUREA Chemical compound CN(C)C(=O)NC1=CC=C(Cl)C(Cl)=C1 XMTQQYYKAHVGBJ-UHFFFAOYSA-N 0.000 description 2
- RXNYJUSEXLAVNQ-UHFFFAOYSA-N 4,4'-Dihydroxybenzophenone Chemical compound C1=CC(O)=CC=C1C(=O)C1=CC=C(O)C=C1 RXNYJUSEXLAVNQ-UHFFFAOYSA-N 0.000 description 2
- ULKLGIFJWFIQFF-UHFFFAOYSA-N 5K8XI641G3 Chemical compound CCC1=NC=C(C)N1 ULKLGIFJWFIQFF-UHFFFAOYSA-N 0.000 description 2
- 239000004925 Acrylic resin Substances 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 239000004677 Nylon Substances 0.000 description 2
- 239000004642 Polyimide Substances 0.000 description 2
- 239000004721 Polyphenylene oxide Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- ADCOVFLJGNWWNZ-UHFFFAOYSA-N antimony trioxide Chemical compound O=[Sb]O[Sb]=O ADCOVFLJGNWWNZ-UHFFFAOYSA-N 0.000 description 2
- HUMNYLRZRPPJDN-UHFFFAOYSA-N benzaldehyde Chemical compound O=CC1=CC=CC=C1 HUMNYLRZRPPJDN-UHFFFAOYSA-N 0.000 description 2
- 235000010290 biphenyl Nutrition 0.000 description 2
- 125000006267 biphenyl group Chemical group 0.000 description 2
- UORVGPXVDQYIDP-UHFFFAOYSA-N borane Chemical compound B UORVGPXVDQYIDP-UHFFFAOYSA-N 0.000 description 2
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 238000005266 casting Methods 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 230000006835 compression Effects 0.000 description 2
- 238000007906 compression Methods 0.000 description 2
- 238000009833 condensation Methods 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 2
- QGBSISYHAICWAH-UHFFFAOYSA-N dicyandiamide Chemical compound NC(N)=NC#N QGBSISYHAICWAH-UHFFFAOYSA-N 0.000 description 2
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000006735 epoxidation reaction Methods 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 239000000945 filler Substances 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 239000003063 flame retardant Substances 0.000 description 2
- NIHNNTQXNPWCJQ-UHFFFAOYSA-N fluorene Chemical compound C1=CC=C2CC3=CC=CC=C3C2=C1 NIHNNTQXNPWCJQ-UHFFFAOYSA-N 0.000 description 2
- 239000003365 glass fiber Substances 0.000 description 2
- 230000009477 glass transition Effects 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 239000011256 inorganic filler Substances 0.000 description 2
- 229910003475 inorganic filler Inorganic materials 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- LRKBXSXXYDMWHM-UHFFFAOYSA-N methane;phenol Chemical compound C.OC1=CC=CC=C1.OC1=CC=CC=C1.OC1=CC=CC=C1 LRKBXSXXYDMWHM-UHFFFAOYSA-N 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 150000004780 naphthols Chemical class 0.000 description 2
- 229920001778 nylon Polymers 0.000 description 2
- WWZKQHOCKIZLMA-UHFFFAOYSA-N octanoic acid Chemical compound CCCCCCCC(O)=O WWZKQHOCKIZLMA-UHFFFAOYSA-N 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 239000000049 pigment Substances 0.000 description 2
- 229920000728 polyester Polymers 0.000 description 2
- 229920000570 polyether Polymers 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- 229910000679 solder Inorganic materials 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 239000000454 talc Substances 0.000 description 2
- 229910052623 talc Inorganic materials 0.000 description 2
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 2
- 239000001993 wax Substances 0.000 description 2
- LTVUCOSIZFEASK-MPXCPUAZSA-N (3ar,4s,7r,7as)-3a-methyl-3a,4,7,7a-tetrahydro-4,7-methano-2-benzofuran-1,3-dione Chemical compound C([C@H]1C=C2)[C@H]2[C@H]2[C@]1(C)C(=O)OC2=O LTVUCOSIZFEASK-MPXCPUAZSA-N 0.000 description 1
- MUTGBJKUEZFXGO-OLQVQODUSA-N (3as,7ar)-3a,4,5,6,7,7a-hexahydro-2-benzofuran-1,3-dione Chemical compound C1CCC[C@@H]2C(=O)OC(=O)[C@@H]21 MUTGBJKUEZFXGO-OLQVQODUSA-N 0.000 description 1
- HCNHNBLSNVSJTJ-UHFFFAOYSA-N 1,1-Bis(4-hydroxyphenyl)ethane Chemical compound C=1C=C(O)C=CC=1C(C)C1=CC=C(O)C=C1 HCNHNBLSNVSJTJ-UHFFFAOYSA-N 0.000 description 1
- OWEYKIWAZBBXJK-UHFFFAOYSA-N 1,1-Dichloro-2,2-bis(4-hydroxyphenyl)ethylene Chemical compound C1=CC(O)=CC=C1C(=C(Cl)Cl)C1=CC=C(O)C=C1 OWEYKIWAZBBXJK-UHFFFAOYSA-N 0.000 description 1
- PMIHHEJEQAQZET-UHFFFAOYSA-N 1,4-bis(chloromethyl)naphthalene Chemical compound C1=CC=C2C(CCl)=CC=C(CCl)C2=C1 PMIHHEJEQAQZET-UHFFFAOYSA-N 0.000 description 1
- HJTAZXHBEBIQQX-UHFFFAOYSA-N 1,5-bis(chloromethyl)naphthalene Chemical compound C1=CC=C2C(CCl)=CC=CC2=C1CCl HJTAZXHBEBIQQX-UHFFFAOYSA-N 0.000 description 1
- INZDTEICWPZYJM-UHFFFAOYSA-N 1-(chloromethyl)-4-[4-(chloromethyl)phenyl]benzene Chemical group C1=CC(CCl)=CC=C1C1=CC=C(CCl)C=C1 INZDTEICWPZYJM-UHFFFAOYSA-N 0.000 description 1
- DNMIWTRPMLDNKJ-UHFFFAOYSA-N 1-(dichloromethyl)-2-phenylbenzene Chemical group ClC(Cl)C1=CC=CC=C1C1=CC=CC=C1 DNMIWTRPMLDNKJ-UHFFFAOYSA-N 0.000 description 1
- KPAPHODVWOVUJL-UHFFFAOYSA-N 1-benzofuran;1h-indene Chemical compound C1=CC=C2CC=CC2=C1.C1=CC=C2OC=CC2=C1 KPAPHODVWOVUJL-UHFFFAOYSA-N 0.000 description 1
- HECLRDQVFMWTQS-RGOKHQFPSA-N 1755-01-7 Chemical compound C1[C@H]2[C@@H]3CC=C[C@@H]3[C@@H]1C=C2 HECLRDQVFMWTQS-RGOKHQFPSA-N 0.000 description 1
- ZWZGXLKXKAPXMZ-UHFFFAOYSA-N 2,2'-dihydroxy-3,3'-dimethoxy-5,5'-dipropyldiphenylmethane Chemical compound COC1=CC(CCC)=CC(CC=2C(=C(OC)C=C(CCC)C=2)O)=C1O ZWZGXLKXKAPXMZ-UHFFFAOYSA-N 0.000 description 1
- GQHTUMJGOHRCHB-UHFFFAOYSA-N 2,3,4,6,7,8,9,10-octahydropyrimido[1,2-a]azepine Chemical compound C1CCCCN2CCCN=C21 GQHTUMJGOHRCHB-UHFFFAOYSA-N 0.000 description 1
- PQAMFDRRWURCFQ-UHFFFAOYSA-N 2-ethyl-1h-imidazole Chemical compound CCC1=NC=CN1 PQAMFDRRWURCFQ-UHFFFAOYSA-N 0.000 description 1
- 125000006179 2-methyl benzyl group Chemical group [H]C1=C([H])C(=C(C([H])=C1[H])C([H])([H])*)C([H])([H])[H] 0.000 description 1
- LXBGSDVWAMZHDD-UHFFFAOYSA-N 2-methyl-1h-imidazole Chemical compound CC1=NC=CN1 LXBGSDVWAMZHDD-UHFFFAOYSA-N 0.000 description 1
- 125000000094 2-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 1
- VEORPZCZECFIRK-UHFFFAOYSA-N 3,3',5,5'-tetrabromobisphenol A Chemical compound C=1C(Br)=C(O)C(Br)=CC=1C(C)(C)C1=CC(Br)=C(O)C(Br)=C1 VEORPZCZECFIRK-UHFFFAOYSA-N 0.000 description 1
- 125000006186 3,5-dimethyl benzyl group Chemical group [H]C1=C(C([H])=C(C([H])=C1C([H])([H])[H])C([H])([H])*)C([H])([H])[H] 0.000 description 1
- RNLHGQLZWXBQNY-UHFFFAOYSA-N 3-(aminomethyl)-3,5,5-trimethylcyclohexan-1-amine Chemical compound CC1(C)CC(N)CC(C)(CN)C1 RNLHGQLZWXBQNY-UHFFFAOYSA-N 0.000 description 1
- 125000006180 3-methyl benzyl group Chemical group [H]C1=C([H])C(=C([H])C(=C1[H])C([H])([H])[H])C([H])([H])* 0.000 description 1
- LSZVXYBAQNQHCW-UHFFFAOYSA-N 3a,4,5,6,7,7a-hexahydro-2-benzofuran-1,3-dione;2-benzofuran-1,3-dione Chemical compound C1CCCC2C(=O)OC(=O)C21.C1=CC=C2C(=O)OC(=O)C2=C1 LSZVXYBAQNQHCW-UHFFFAOYSA-N 0.000 description 1
- XSTITJMSUGCZDH-UHFFFAOYSA-N 4-(4-hydroxy-2,6-dimethylphenyl)-3,5-dimethylphenol Chemical group CC1=CC(O)=CC(C)=C1C1=C(C)C=C(O)C=C1C XSTITJMSUGCZDH-UHFFFAOYSA-N 0.000 description 1
- NZGQHKSLKRFZFL-UHFFFAOYSA-N 4-(4-hydroxyphenoxy)phenol Chemical compound C1=CC(O)=CC=C1OC1=CC=C(O)C=C1 NZGQHKSLKRFZFL-UHFFFAOYSA-N 0.000 description 1
- OTALYAAGAOFQCR-UHFFFAOYSA-N 4-[1-(4-hydroxy-3,5-dimethylphenyl)-9H-fluoren-2-yl]-2,6-dimethylphenol Chemical compound OC1=C(C=C(C=C1C)C1=C(C=2CC3=CC=CC=C3C=2C=C1)C1=CC(=C(C(=C1)C)O)C)C OTALYAAGAOFQCR-UHFFFAOYSA-N 0.000 description 1
- VESRBMGDECAMNH-UHFFFAOYSA-N 4-[2-(4-hydroxyphenyl)propan-2-yl]-2,3,5,6-tetramethylphenol Chemical compound CC1=C(C(=C(C(=C1O)C)C)C(C)(C)C1=CC=C(C=C1)O)C VESRBMGDECAMNH-UHFFFAOYSA-N 0.000 description 1
- 125000006181 4-methyl benzyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1C([H])([H])[H])C([H])([H])* 0.000 description 1
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- IKHGUXGNUITLKF-XPULMUKRSA-N acetaldehyde Chemical compound [14CH]([14CH3])=O IKHGUXGNUITLKF-XPULMUKRSA-N 0.000 description 1
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- 238000011161 development Methods 0.000 description 1
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- 125000004639 dihydroindenyl group Chemical group C1(CCC2=CC=CC=C12)* 0.000 description 1
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- 125000006222 dimethylaminomethyl group Chemical group [H]C([H])([H])N(C([H])([H])[H])C([H])([H])* 0.000 description 1
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- 125000000524 functional group Chemical group 0.000 description 1
- ANSXAPJVJOKRDJ-UHFFFAOYSA-N furo[3,4-f][2]benzofuran-1,3,5,7-tetrone Chemical compound C1=C2C(=O)OC(=O)C2=CC2=C1C(=O)OC2=O ANSXAPJVJOKRDJ-UHFFFAOYSA-N 0.000 description 1
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- 150000004820 halides Chemical class 0.000 description 1
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- 150000002367 halogens Chemical class 0.000 description 1
- 125000005842 heteroatom Chemical group 0.000 description 1
- MEPLNBPJJKOWLV-UHFFFAOYSA-N hexanedioic acid;hydrazine Chemical compound NN.OC(=O)CCCCC(O)=O MEPLNBPJJKOWLV-UHFFFAOYSA-N 0.000 description 1
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- 125000000687 hydroquinonyl group Chemical group C1(O)=C(C=C(O)C=C1)* 0.000 description 1
- 150000002440 hydroxy compounds Chemical class 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 150000002460 imidazoles Chemical class 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 239000012784 inorganic fiber Substances 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- NLYAJNPCOHFWQQ-UHFFFAOYSA-N kaolin Chemical compound O.O.O=[Al]O[Si](=O)O[Si](=O)O[Al]=O NLYAJNPCOHFWQQ-UHFFFAOYSA-N 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 239000004761 kevlar Substances 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- VTHJTEIRLNZDEV-UHFFFAOYSA-L magnesium dihydroxide Chemical compound [OH-].[OH-].[Mg+2] VTHJTEIRLNZDEV-UHFFFAOYSA-L 0.000 description 1
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- 229910001862 magnesium hydroxide Inorganic materials 0.000 description 1
- 150000002736 metal compounds Chemical class 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 description 1
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- NXPPAOGUKPJVDI-UHFFFAOYSA-N naphthalene-1,2-diol Chemical compound C1=CC=CC2=C(O)C(O)=CC=C21 NXPPAOGUKPJVDI-UHFFFAOYSA-N 0.000 description 1
- PCILLCXFKWDRMK-UHFFFAOYSA-N naphthalene-1,4-diol Chemical compound C1=CC=C2C(O)=CC=C(O)C2=C1 PCILLCXFKWDRMK-UHFFFAOYSA-N 0.000 description 1
- FZZQNEVOYIYFPF-UHFFFAOYSA-N naphthalene-1,6-diol Chemical compound OC1=CC=CC2=CC(O)=CC=C21 FZZQNEVOYIYFPF-UHFFFAOYSA-N 0.000 description 1
- MNZMMCVIXORAQL-UHFFFAOYSA-N naphthalene-2,6-diol Chemical compound C1=C(O)C=CC2=CC(O)=CC=C21 MNZMMCVIXORAQL-UHFFFAOYSA-N 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
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- 229960002446 octanoic acid Drugs 0.000 description 1
- 239000012766 organic filler Substances 0.000 description 1
- 239000004209 oxidized polyethylene wax Substances 0.000 description 1
- 235000013873 oxidized polyethylene wax Nutrition 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- QNGNSVIICDLXHT-UHFFFAOYSA-N para-ethylbenzaldehyde Natural products CCC1=CC=C(C=O)C=C1 QNGNSVIICDLXHT-UHFFFAOYSA-N 0.000 description 1
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- 238000003918 potentiometric titration Methods 0.000 description 1
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- KCTAWXVAICEBSD-UHFFFAOYSA-N prop-2-enoyloxy prop-2-eneperoxoate Chemical compound C=CC(=O)OOOC(=O)C=C KCTAWXVAICEBSD-UHFFFAOYSA-N 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
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- 239000010703 silicon Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
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- 239000002356 single layer Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
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- 238000001308 synthesis method Methods 0.000 description 1
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- 239000012209 synthetic fiber Substances 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 229920002725 thermoplastic elastomer Polymers 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- LLZRNZOLAXHGLL-UHFFFAOYSA-J titanic acid Chemical compound O[Ti](O)(O)O LLZRNZOLAXHGLL-UHFFFAOYSA-J 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- WLPUWLXVBWGYMZ-UHFFFAOYSA-N tricyclohexylphosphine Chemical compound C1CCCCC1P(C1CCCCC1)C1CCCCC1 WLPUWLXVBWGYMZ-UHFFFAOYSA-N 0.000 description 1
- MHNHYTDAOYJUEZ-UHFFFAOYSA-N triphenylphosphane Chemical class C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 MHNHYTDAOYJUEZ-UHFFFAOYSA-N 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 239000002759 woven fabric Substances 0.000 description 1
- 125000005023 xylyl group Chemical group 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/20—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
- C08G59/22—Di-epoxy compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/02—Polycondensates containing more than one epoxy group per molecule
- C08G59/04—Polycondensates containing more than one epoxy group per molecule of polyhydroxy compounds with epihalohydrins or precursors thereof
- C08G59/06—Polycondensates containing more than one epoxy group per molecule of polyhydroxy compounds with epihalohydrins or precursors thereof of polyhydric phenols
- C08G59/063—Polycondensates containing more than one epoxy group per molecule of polyhydroxy compounds with epihalohydrins or precursors thereof of polyhydric phenols with epihalohydrins
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/18—Manufacture of films or sheets
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/24—Impregnating materials with prepolymers which can be polymerised in situ, e.g. manufacture of prepregs
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J7/00—Adhesives in the form of films or foils
- C09J7/20—Adhesives in the form of films or foils characterised by their carriers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G2190/00—Compositions for sealing or packing joints
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L2201/00—Properties
- C08L2201/02—Flame or fire retardant/resistant
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Epoxy Resins (AREA)
- Reinforced Plastic Materials (AREA)
Abstract
本發明係提供一種環氧樹脂組成物及其硬化物,其係具有低介電性、高耐熱性優異之性能,且在積層、成型、注型、接著等用途上有效的環氧樹脂組成物及其硬化物。 The present invention provides an epoxy resin composition and a hardened product thereof. The epoxy resin composition has the properties of low dielectric properties and high heat resistance, and is an epoxy resin composition which is effective for lamination, molding, injection molding, and adhesion. And its hardened.
一種環氧樹脂組成物及其硬化物,其係含有由通式(1)所表示之環氧樹脂(A)及硬化劑(B)。 An epoxy resin composition and a cured product thereof include an epoxy resin (A) and a curing agent (B) represented by the general formula (1).
Description
本發明係有關一種環氧樹脂組成物及其硬化物,其係賦予低介電特性、高耐熱性、低吸濕性優異的硬化物者。 The present invention relates to an epoxy resin composition and a cured product thereof, which are those which provide a cured product excellent in low dielectric properties, high heat resistance, and low hygroscopicity.
近年來,手機等情報通信機器之訊號頻寬、電腦的CPU時脈時間(Clock time)達到GHz頻域,高頻化持續進行中。 In recent years, the signal bandwidth of information communication equipment such as mobile phones and the computer's CPU clock time have reached the GHz frequency range.
電氣訊號的介電損失係與形成迴路的絕緣體之比介電率的平方根、散逸因數以及所使用的訊號之頻率的乘積成比例。因此,所使用的訊號之頻率愈高散逸因數愈大。 The dielectric loss of an electrical signal is proportional to the product of the square root of the specific permittivity of the insulator forming the loop, the dissipation factor, and the frequency of the signal used. Therefore, the higher the frequency of the signal used, the larger the dissipation factor.
介電損失係會減弱訊號而有損訊號的可信度,故為抑制這點在絕緣體中,必定要選擇介電率、散逸因數較小之材料(專利文獻1)。 Dielectric loss weakens the signal and impairs the credibility of the signal. In order to suppress this, in the insulator, a material with a small dielectric constant and a small dissipation factor must be selected (Patent Document 1).
提供具有此一特性的熱硬化性樹脂組成物之材料,然後,已知一種將酚醛清漆(Novolac)樹脂中的酚性羥基進行芳基酯化,將所得到的活性酯化合物作為樹脂 用硬化劑來使用之技術,但其耐熱性卻不足夠(專利文獻2、3)。 It is known to provide a material of a thermosetting resin composition having such a characteristic, and then, it is known to aryl esterify a phenolic hydroxyl group in a novolac resin, and use the obtained active ester compound as a resin A technique using a hardening agent has insufficient heat resistance (Patent Documents 2 and 3).
[專利文獻1]日本特開2012-221968 [Patent Document 1] Japanese Patent Laid-Open No. 2012-221968
[專利文獻2]日本特開平11-130939號公報 [Patent Document 2] Japanese Patent Laid-Open No. 11-130939
[專利文獻3]日本特開平7-82348號公報 [Patent Document 3] Japanese Unexamined Patent Publication No. 7-82348
因此,本發明欲解決之課題係提供一種環氧樹脂組成物及其硬化物,其係具有低介電性、高耐熱性優異之性能,且在積層、成型、注型、接著等用途上有效的環氧樹脂組成物及其硬化物。 Therefore, the problem to be solved by the present invention is to provide an epoxy resin composition and a cured product thereof, which have the properties of low dielectric properties and high heat resistance, and are effective for applications such as lamination, molding, injection molding, and bonding. Epoxy resin composition and its cured product.
亦即,本發明係一種環氧樹脂組成物,其係含有由通式(1)所表示之環氧樹脂(A)及硬化劑(B)。 That is, this invention is an epoxy resin composition containing the epoxy resin (A) and hardening | curing agent (B) represented by General formula (1).
又,本發明之前述的環氧樹脂組成物中的環氧樹脂(A)係相對於由下述通式(3)所表示之二羥基化合物(a)1莫耳,使由下述通式(4)所表示之含鹵素化甲基化合物(b)以0.001至1.0莫耳反應得到二羥基化合物(c)後,其二羥基化合物(c)與表氯醇(Epichlorohydrin)反應,較佳為藉由將二羥基化合物(c)的羥基進行縮水甘油酯化所得到的環氧樹脂。 The epoxy resin (A) in the aforementioned epoxy resin composition of the present invention is based on 1 mole of the dihydroxy compound (a) represented by the following general formula (3). The halogenated methyl compound (b) represented by (4) is reacted at 0.001 to 1.0 mole to obtain a dihydroxy compound (c), and then the dihydroxy compound (c) is reacted with epichlorohydrin (Epichlorohydrin), preferably An epoxy resin obtained by glycidizing a hydroxyl group of a dihydroxy compound (c).
HO-Y-OH (3)(式中,Y係與前述的通式(1)同義。) HO-Y-OH (3) (In the formula, Y is synonymous with the aforementioned general formula (1).)
Z-CH 2 -X-CH 2 -Z (4)(式中,X係與前述的通式(1))之X同義,Z係表示鹵素原 子。) Z-CH 2 -X-CH 2 -Z (4) (wherein X is synonymous with X of the aforementioned general formula (1)), and Z represents a halogen atom. )
又,本發明之前述的環氧樹脂組成物係相對於前述的環氧樹脂(A)之環氧基1莫耳,前述的硬化劑(B)之活性氫基係較佳為0.4至1.2莫耳的範圍。 The epoxy resin composition of the present invention is preferably 0.4 to 1.2 moles of the active hydrogen group of the hardener (B) relative to 1 mole of the epoxy group of the epoxy resin (A). Ear range.
又,本發明係由前述的環氧樹脂組成物所得到的預浸材(Prepreg)、接著片、環氧樹脂積層板、環氧樹脂封止材或環氧樹脂注型材。又,本發明係硬化前述的環氧樹脂組成物所得之硬化物。 The present invention is a prepreg obtained from the epoxy resin composition described above, an adhesive sheet, an epoxy laminate, an epoxy sealing material, or an epoxy injection molding material. The present invention is a cured product obtained by curing the aforementioned epoxy resin composition.
本發明的環氧樹脂組成物係賦予低介電特性、高耐熱性優異的硬化物,且適合使用在積層、成型、注型、接著等用途上為可能。 The epoxy resin composition of the present invention provides a hardened product having low dielectric characteristics and high heat resistance, and is suitable for use in applications such as lamination, molding, injection molding, and adhesion.
本發明的環氧樹脂組成物係由通式(1)所表示之環氧樹脂(A)及硬化劑(B)作為必須成分。 The epoxy resin composition of the present invention includes the epoxy resin (A) and the hardener (B) represented by the general formula (1) as essential components.
由通式(1)所表示之環氧樹脂(A)中,m係重覆單元數,其平均值必要為0<m<10,較佳為0.01<m<8,更佳為0.05<m<5。當m為0時羥基量降低不充分且無低介 電特性效果,當m為10以上時有變高黏度之疑慮。又,n係重覆單元數,平均值無特別之規定,但更佳為0<n<5,進一步更佳為0<n<3。又,環氧當量無特別之規定,但2000g/eq以下為較佳,1000g/eq以下為更佳。當環氧當量比2000g/eq大時分子量亦變大,故有變高黏度之疑慮。在此,平均值係平均數。 In the epoxy resin (A) represented by the general formula (1), m is the number of repeated units, and the average value must be 0 <m <10, preferably 0.01 <m <8, and more preferably 0.05 <m. <5. When m is 0, the amount of hydroxyl groups is not sufficiently reduced without low intermediation The effect of electrical characteristics, when m is 10 or more, there is a concern of increasing the viscosity. In addition, n is the number of repeated units, and the average value is not particularly specified, but it is more preferably 0 <n <5, and still more preferably 0 <n <3. The epoxy equivalent is not particularly limited, but is preferably less than 2000 g / eq, and more preferably less than 1000 g / eq. When the epoxy equivalent is larger than 2000g / eq, the molecular weight also becomes large, so there is a concern that the viscosity becomes high. Here, the average value is an average number.
又,通式(1)的X、Y亦可具有取代基之選自由伸苯基、伸萘基或通式(2)所表示之基之至少一種,相同或相界皆可。具有取代基時,可作為取代基的有碳數1至10的烴基或鹵素原子,此等的烴基、鹵素原子之具體例可例舉有與後述通式(2)中的R1相同者。 In addition, X and Y in the general formula (1) may have at least one selected from the group consisting of a phenylene group, a naphthyl group, or a group represented by the general formula (2), and may have the same or phase boundary. When having a substituent, a hydrocarbon group having 1 to 10 carbon atoms or a halogen atom that can be used as a substituent, and specific examples of such a hydrocarbon group and a halogen atom may be the same as those of R 1 in the general formula (2) described later.
通式(2)中,R1係氫原子、碳數1至10的烴基或鹵素原子,彼此間其係可為相同或相異。碳數1至10的烴基之具體例可例舉有甲基、乙基、正丙基、異丙基、正丁基、異丁基、第二丁基、第三丁基、正戊基、正己基等碳數1至10的直鏈狀或支鏈狀烷基,或環己基等碳數4至10的環狀烷基,或亦可具有苯基、萘基、甲苯基、二甲苯基、二氫茚基等碳數6至10的取代基之芳基,或亦可具有苄基、苯乙基、2-甲苄基、3-甲苄基、4-甲苄基、2,6-二甲苄基、3,5-二甲苄基、α-甲苄基等碳數7至10的取代基之芳烷基等取代基,較佳的取代基係甲基、乙基、第三丁基、環己基、苯基、α-甲苄基。 In the general formula (2), R 1 is a hydrogen atom, a hydrocarbon group having 1 to 10 carbon atoms, or a halogen atom, and their systems may be the same or different from each other. Specific examples of the hydrocarbon group having 1 to 10 carbon atoms include methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, second butyl, third butyl, n-pentyl, Linear or branched alkyl groups having 1 to 10 carbons such as n-hexyl, or cyclic alkyl groups having 4 to 10 carbons such as cyclohexyl, or may have phenyl, naphthyl, tolyl, xylyl Aryl groups having 6 to 10 carbon substituents such as dihydroindenyl, or may have benzyl, phenethyl, 2-methylbenzyl, 3-methylbenzyl, 4-methylbenzyl, 2,6 -Substituents such as aralkyl having 7 to 10 carbon substituents such as dimethylbenzyl, 3,5-dimethylbenzyl, α-methylbenzyl, etc., preferred substituents are methyl, ethyl, Tributyl, cyclohexyl, phenyl, α-methylbenzyl.
R2係單鍵或二價基,亦可含有鹵素原子及硫元素、氮元素、氧元素等雜元素。二價基的具體例可例舉有-CH2-、 -C(CH3)2-、-CH(CH3)-、-C(CF3)2-、-CO-、-O-、-S-、-SO2-、亞苄基、α-甲基亞苄基、亞環己基、亞環戊基、9H-芴-9-亞基或環己烯基等,此等的基之芳香族主鏈中更亦可具有與R1同義的取代基。較佳的二價基係-CH2-、-C(CH3)2-、-CO-、-O-、-S-、-SO2-、9H-芴-9-亞基。 R 2 is a single bond or a divalent group, and may contain a halogen atom, a hetero element such as a sulfur element, a nitrogen element, and an oxygen element. Specific examples of the divalent group include -CH 2- , -C (CH 3 ) 2- , -CH (CH 3 )-, -C (CF 3 ) 2- , -CO-, -O-,- S-, -SO 2- , benzylidene, α-methylbenzylidene, cyclohexylene, cyclopentylene, 9H-fluorene-9-ylidene, or cyclohexenyl, etc., these groups are aromatic The family main chain may further have a substituent having the same meaning as R 1 . Preferred divalent groups are -CH 2- , -C (CH 3 ) 2- , -CO-, -O-, -S-, -SO 2- , 9H-fluorene-9-subunit.
又,通式(1)至(5)之中,相同的記號只要沒有特別的禁止,皆具有相同的意思。 In addition, in the general formulae (1) to (5), the same symbols have the same meaning unless otherwise specifically prohibited.
前述的環氧樹脂(A)係,首先將前述的二羥基化合物(a)與前述的含鹵素化甲基化合物(b)反應來得到前述的二羥基化合物(c)後,其二羥基化合物(c)與表氯醇反應藉由將羥基進行縮水甘油酯化所得來。又,將二羥基化合物(c)與表氯醇反應成環氧樹脂時,會有環氧基開環而少量生成聚合的構造之成分,但如此成分即使混入亦不影響。 In the aforementioned epoxy resin (A) system, the aforementioned dihydroxy compound (a) is first reacted with the aforementioned halogenated methyl compound (b) to obtain the aforementioned dihydroxy compound (c), and the dihydroxy compound ( c) Reaction with epichlorohydrin by glycidyl esterification of a hydroxyl group. In addition, when the dihydroxy compound (c) is reacted with epichlorohydrin to form an epoxy resin, there are components having a structure in which an epoxy group is ring-opened and a small amount is polymerized, but such components have no effect even if they are mixed.
以往,已知藉由將羥基鹼金屬鹽化與鹵化物反應來聚醚合成,為得到二羥基化合物(c),在二羥基化合物(a)與含鹵素化甲基化合物(b)反應中,可使用此聚醚合成法。又,通式(1)和(5)的m係同義,但m可由二羥基化合物(a)和含鹵素化甲基化合物(b)的莫耳比來大略計算。莫耳比愈接近1時m就愈大。然而,由兩末端有必要成為二羥基的觀點而言,(a)/(b)的值會比1大。 Conventionally, polyether synthesis has been known by reacting a salt of a hydroxy alkali metal with a halide to obtain a dihydroxy compound (c). In the reaction of a dihydroxy compound (a) with a halogenated methyl compound (b), This polyether synthesis method can be used. In addition, m in the general formulae (1) and (5) is synonymous, but m can be roughly calculated from the molar ratios of the dihydroxy compound (a) and the halogenated methyl compound (b). The closer the Morse ratio is to 1, the larger m is. However, from the viewpoint that both ends need to be dihydroxy groups, the value of (a) / (b) is larger than one.
若具體地舉例二羥基化合物(a),可例舉有對苯二酚、間苯二酚、鄰苯二酚等含伸苯基之二羥基化合物、1,4-二羥萘、1,6-二羥萘、2,6-二羥萘等萘二醇類、雙酚A、雙酚F、雙酚S、雙酚B、雙酚E、雙酚C、雙酚Z、 4,4’-氧基雙酚、4,4’-羰基雙酚、雙酚芴、4,4’-聯苯酚、2,2’-聯苯酚、雙酚苯乙酮等二價的酚類,進一步可例舉具有與上述通式(2)的R1同義且碳數1至10之烴基或鹵素原子作為取代基之此等的化合物等。較佳係可例舉有4-己間苯二酚、1,6-二羥萘、四甲基雙酚A、四甲基雙酚F、四甲基雙酚S、四甲基雙酚、4,4’-氧基雙酚、4,4’-羰基雙酚、雙酚芴、四溴雙酚A,更佳係可例舉有四甲基雙酚S、雙酚芴、四溴雙酚A。 Specific examples of the dihydroxy compound (a) include diphenyl compounds containing diphenyl groups such as hydroquinone, resorcinol, and catechol, 1,4-dihydroxynaphthalene, and 1,6 -Naphthyl glycols such as dihydroxynaphthalene, 2,6-dihydroxynaphthalene, bisphenol A, bisphenol F, bisphenol S, bisphenol B, bisphenol E, bisphenol C, bisphenol Z, 4,4 ' Divalent phenols such as -oxybisphenol, 4,4'-carbonylbisphenol, bisphenol hydrazone, 4,4'-biphenol, 2,2'-biphenol, bisphenolacetophenone, and the like are further exemplified Examples thereof include compounds having a hydrocarbon group or a halogen atom having 1 to 10 carbon atoms, which are synonymous with R 1 in the above-mentioned general formula (2), and the like. Preferred examples include 4-hexaresorcinol, 1,6-dihydroxynaphthalene, tetramethylbisphenol A, tetramethylbisphenol F, tetramethylbisphenol S, tetramethylbisphenol, 4,4'-oxybisphenol, 4,4'-carbonylbisphenol, bisphenol hydrazone, and tetrabromobisphenol A. More preferable examples include tetramethylbisphenol S, bisphenol hydrazone, and tetrabromobis. Phenol A.
若具體地舉例含鹵素化甲基化合物(b),可例舉有二氯甲苯、二氯甲萘、二氯甲基聯苯、二氯甲芴等,進一步可例舉具有與上述通式(2)的R1同義且碳數1至10之烴基或鹵素原子之此等的化合物等。 Specific examples of the halogenated methyl compound (b) include dichlorotoluene, dichloromethylene naphthalene, dichloromethylbiphenyl, dichloromethane, and the like. 2) R 1 is a synonym and a compound having a hydrocarbon group of 1 to 10 or a halogen atom or the like.
環氧樹脂(A)係將二羥基化合物(a)和含鹵素化甲基化合物(b)反應所得的二羥基化合物(c),進一步與環氧基開環反應藉由對二羥基化合物(c)的羥基進行縮水甘油酯化來得到的。此時,相對於二羥基化合物(a)1.0莫耳,使含鹵素化甲基化合物(b)以0.001至1.0莫耳的範圍反應為必要的,較佳範圍為0.01至0.9莫耳,更佳為0.05至0.8莫耳,進一步更佳範圍為0.1至0.7莫耳。含鹵素化甲基化合物(b)為1莫耳以上時,二羥基化合物(c)的末端基會成為鹵素,故無法得到由通式(1)所表示之環氧樹脂(A)。 The epoxy resin (A) is a dihydroxy compound (c) obtained by reacting a dihydroxy compound (a) with a halogenated methyl compound (b), and further reacts with an epoxy ring to open the ring by reacting the dihydroxy compound (c ) Is obtained by glycidylation of a hydroxyl group. At this time, it is necessary to react the halogenated methyl compound (b) in the range of 0.001 to 1.0 mol with respect to 1.0 mol of the dihydroxy compound (a), preferably in the range of 0.01 to 0.9 mol, more preferably It is 0.05 to 0.8 mol, and a still more preferable range is 0.1 to 0.7 mol. When the halogenated methyl compound (b) is 1 mole or more, the terminal group of the dihydroxy compound (c) becomes a halogen, and therefore the epoxy resin (A) represented by the general formula (1) cannot be obtained.
二羥基化合物(a)與含鹵素化甲基化合物(b)的反應係可在碳酸鉀、氫氧化鈉、氫氧化鉀等鹼金屬氫氧化物的存在下進行,鹼金屬氫氧化物的使用量係相對於二 羥基化合物(a)1.0莫耳以1.8至2.5莫耳為較佳,2.0至2.2莫耳為更佳。又,反應溫度為20至100℃,較佳為50至60℃,反應時間為1至10小時。在20℃以下則不進行反應,在100℃以上則有產生親電子取代反應之疑慮。 The reaction system of the dihydroxy compound (a) and the halogenated methyl compound (b) can be performed in the presence of alkali metal hydroxides such as potassium carbonate, sodium hydroxide, and potassium hydroxide. The amount of alkali metal hydroxide used Relative to two The hydroxy compound (a) is preferably 1.0 mol, preferably 1.8 to 2.5 mol, and more preferably 2.0 to 2.2 mol. The reaction temperature is 20 to 100 ° C, preferably 50 to 60 ° C, and the reaction time is 1 to 10 hours. When the temperature is lower than 20 ° C, the reaction does not proceed, and when the temperature is higher than 100 ° C, there is a concern that an electrophilic substitution reaction may occur.
藉由使前述的二羥基化合物(c)與表氯醇反應,可得到由通式(1)所表示之環氧樹脂(A)。可例舉如,將二羥基化合物(c)溶解於過量的表氯醇後,在氫氧化鈉、氫氧化鉀等鹼金屬氫氧化物的存在下,以20至150℃,較佳為30至80℃的範圍使反應1至10小時之方法。此時的鹼金屬氫氧化物之使用量係相對於二羥基化合物(c)的羥基1莫耳為0.8至2.5莫耳,較佳為0.85至2.0莫耳,更佳為0.9至1.5莫耳的範圍。作為更佳的方法係可例舉,合成二羥基化合物(c)後,經過中和步驟並將前述二羥基化合物(c)以不取出反應系統外的形式,直接與表氯醇反應之方法。此時,於二羥基化合物(c)的合成所殘存的鹼金屬氫氧化物亦加算到環氧化反應所使用的鹼金屬氫氧化物裡。又,表氯醇相對於二羥基化合物(c)中的羥基係被過剩使用,通常,相對於羥基1莫耳為1.5至15莫耳,較佳為2至10莫耳的範圍。環氧化反應結束後,蒸餾過剩的表氯醇,將殘留部分溶解於甲苯、甲基異丁基酮等溶劑,再過濾、水洗、除去無機鹽,接著藉由蒸餾溶劑可得到目標的環氧樹脂。又,通式(1)的n之平均值係可由環氧樹脂(A)的環氧當量來計算求出。 By reacting the dihydroxy compound (c) with epichlorohydrin, an epoxy resin (A) represented by the general formula (1) can be obtained. For example, after dissolving the dihydroxy compound (c) in an excessive amount of epichlorohydrin, in the presence of an alkali metal hydroxide such as sodium hydroxide or potassium hydroxide, the temperature is 20 to 150 ° C, preferably 30 to A method for reacting in the range of 80 ° C for 1 to 10 hours. The amount of the alkali metal hydroxide used at this time is 0.8 to 2.5 mol, preferably 0.85 to 2.0 mol, and more preferably 0.9 to 1.5 mol relative to 1 mol of the hydroxyl group of the dihydroxy compound (c). range. As a more preferable method, a method of directly reacting epichlorohydrin after synthesizing the dihydroxy compound (c) and subjecting the dihydroxy compound (c) to a form without taking it out of the reaction system can be mentioned. At this time, the alkali metal hydroxide remaining in the synthesis of the dihydroxy compound (c) is also added to the alkali metal hydroxide used in the epoxidation reaction. In addition, epichlorohydrin is used excessively with respect to the hydroxyl group in the dihydroxy compound (c), and it is usually 1.5 to 15 moles, preferably 2 to 10 moles, with respect to 1 mole of the hydroxyl group. After the epoxidation reaction is completed, the excess epichlorohydrin is distilled, and the remaining part is dissolved in solvents such as toluene and methyl isobutyl ketone, and then filtered, washed with water, and removed the inorganic salts. Then, the target epoxy resin can be obtained by distillation of the solvent . The average value of n in the general formula (1) is calculated from the epoxy equivalent of the epoxy resin (A).
作為本發明的環氧樹脂組成物所使用之硬 化劑(B),係可使用各種酚樹脂類或酸性氧化物類、胺類、醯肼類、活性酯類等一般所使用的環氧樹脂用硬化劑,此等的硬化劑係僅使用1種或使用2種以上皆可。若具體地舉例硬化劑的種類,作為酚樹脂類可例舉有三-(4-羥基苯)甲烷、1,1,2,2-肆(4-羥基苯)乙烷、酚醛清漆樹脂、鄰甲酚清漆(o-cresol novolac)樹脂、萘酚清漆(Naphthol novolac)樹脂、雙環戊二烯型酚樹脂、酚芳烷基樹脂等所代表之3價以上化合物,進一步藉由與酚類、萘酚類,或雙酚A、雙酚F、雙酚S、雙酚芴、4,4’-聯苯酚、2,2’-聯苯酚、對苯二酚、間苯二酚、鄰苯二酚、萘二醇等2價酚類和甲醛、乙醛、苯甲醛、p-鄰羥苯甲醛、p-鄰伸茬二醇、p-鄰伸茬二醇二甲醚、二乙烯苯、二異丙烯基苯、二甲氧基甲基聯苯類、二乙烯、二異丙烯基聯苯類等交聯劑的反應所合成的多價酚化合物、由酚類和二氯甲基聯苯等所得到的聯苯芳烷基型樹脂、由萘酚類和二氯化對二甲苯(p-Xylenedichloride)等所合成的萘酚芳烷基樹脂類等,作為酸性氧化物可例舉有甲基四氫鄰苯二甲酸酐、六氫鄰苯二甲酸酐、焦蜜石酸酐(Pyromellitic anhydride)、甲基纳迪克酸酐(Methylnadic Anhydride)等,作為胺類可例舉有二乙烯三胺、異佛爾酮二胺(Isophoronediamine)、二胺二苯甲烷、二胺二苯基碸(Diaminodiphenyl sulfone)、二氰二胺等,作為醯肼類可例舉有己二酸醯肼、癸二酸醯肼、異苯二甲醯肼等,作為活性酯類可例舉有EPICLON HPC-8000-65T(DIC股份有限公司製)。又,低誘電正接化中以硬化後的官能基濃度能變低 之硬化劑為較佳,高羥基當量酚樹脂或活性酯類為較佳。本發明的環氧樹脂組成物中,相對於環氧樹脂(A)的環氧基1莫耳,硬化劑(B)的活性氫基為0.4至1.2莫耳的範圍為較佳,0.5至1.1莫耳為更佳,0.7至1.0莫耳為進一步更佳。 Hardness used as the epoxy resin composition of the present invention Chemical agent (B) can be used for various epoxy resin hardeners such as phenol resins or acid oxides, amines, hydrazines, active esters, etc. These hardeners are only used 1 One type or two or more types may be used. Specific examples of the type of hardener include tris- (4-hydroxybenzene) methane, 1,1,2,2- (4-hydroxybenzene) ethane, novolac resin, and o-methylbenzene. The trivalent or higher compounds represented by o-cresol novolac resin, Naphthol novolac resin, dicyclopentadiene-type phenol resin, phenol aralkyl resin, etc., are further combined with phenols and naphthol Or bisphenol A, bisphenol F, bisphenol S, bisphenol hydrazone, 4,4'-biphenol, 2,2'-biphenol, hydroquinone, resorcinol, catechol, Divalent phenols such as naphthalene glycol, and formaldehyde, acetaldehyde, benzaldehyde, p-o-hydroxybenzaldehyde, p-o-diol, p-o-diol, dimethyl ether, divinylbenzene, diisopropene Polyvalent phenol compounds synthesized by the reaction of cross-linking agents such as phenylbenzene, dimethoxymethylbiphenyls, diethylene, diisopropenylbiphenyls, etc., obtained from phenols and dichloromethylbiphenyls Biphenylaralkyl resins, naphthol aralkyl resins synthesized from naphthols and p-Xylenedichloride, etc., and methyl tetrahydro is exemplified as the acidic oxide. Phthalic anhydride Hexahydrophthalic anhydride, Pyromellitic anhydride, Methylnadic Anhydride and the like can be exemplified by diethylenetriamine, Isophoronediamine, Diamine diphenylmethane, diaminodiphenyl sulfone, dicyandiamine, and the like. Examples of the hydrazine include hydrazine adipate, hydrazine sebacate, and isobenzoylhydrazine. Examples of the active esters include EPICLON HPC-8000-65T (manufactured by DIC Corporation). In addition, the functional group concentration after hardening can be lowered in the low electromotive forward connection. A hardener is preferred, and a high hydroxyl equivalent phenol resin or an active ester is preferred. In the epoxy resin composition of the present invention, the active hydrogen group of the hardener (B) is preferably in the range of 0.4 to 1.2 moles relative to 1 mole of the epoxy group in the epoxy resin (A), and 0.5 to 1.1. Morse is more preferable, and 0.7 to 1.0 mole is further more preferable.
本發明的環氧樹脂組成物中視需要可使用硬化促進劑。若具體地舉例可使用之硬化促進劑,可例舉有2-甲基咪唑、2-乙基咪唑、2-乙基-4-甲基咪唑等咪唑類、2-(二甲胺基甲基)苯酚、1,8-二氮雜二環(5,4,0)十一碳-7-烯等三級胺類、三苯基膦、三環己烷基膦、三苯膦三苯基甲硼烷等膦類、辛酸等金屬化合物。硬化促進劑係單獨使用或2種類以上併用皆可。硬化促進劑係相對於本發明的環氧樹脂組成物中的環氧樹脂(A)100質量份,視需要使用0.02至5.0質量份。藉由使用硬化促進劑可降低硬化溫度、縮短硬化時間。 A hardening accelerator can be used in the epoxy resin composition of this invention as needed. Specific examples of hardening accelerators that can be used include imidazoles such as 2-methylimidazole, 2-ethylimidazole, 2-ethyl-4-methylimidazole, and 2- (dimethylaminomethyl). ) Tertiary amines such as phenol, 1,8-diazabicyclo (5,4,0) undec-7-ene, triphenylphosphine, tricyclohexylphosphine, triphenylphosphine triphenyl Phosphines such as borane, and metal compounds such as caprylic acid. The hardening accelerator may be used alone or in combination of two or more kinds. The hardening accelerator is used in an amount of 0.02 to 5.0 parts by mass based on 100 parts by mass of the epoxy resin (A) in the epoxy resin composition of the present invention. The use of a hardening accelerator can reduce the hardening temperature and shorten the hardening time.
本發明的環氧樹脂組成物係由前述的通式(1)所表示之環氧樹脂(A)作為必須的環氧樹脂成分,但在不損及本發明的目的之範圍,亦可併用其他的環氧樹脂。 The epoxy resin composition of the present invention is composed of the epoxy resin (A) represented by the aforementioned general formula (1) as an essential epoxy resin component, but may be used in combination as long as the object of the present invention is not impaired. Epoxy.
若具體地舉例如此可併用之其他的環氧樹脂,可例舉有雙酚A、雙酚F、雙酚S、雙酚芴、4,4’-雙酚、3,3’,5,5’-四甲基-4,4’-二羥基聯苯、間苯二酚、萘二酚類等2價的酚類之環氧化物、三-(4-羥基苯)甲烷、1,1,2,2-四(4-羥基苯)、酚Novolak、o-甲酚Novolak等三價以上的酚類之環氧化物、由雙環戊二烯和酚類所得到的共縮合樹脂之環氧化物、由甲酚類和甲醛和烷氧基取代萘類所得到的共 縮合樹脂之環氧化物、由酚類和二氯化對二甲苯(p-Xylenedichloride)等所得到的酚芳烷基樹脂之環氧化物、由酚類和二氯甲基聯苯等所得到的聯苯芳烷基型酚樹脂之環氧化物、萘酚類和二氯化對二甲苯等所合成的萘酚芳烷基樹脂類之環氧化物等。此等的環氧樹脂係單獨使用或2種類以上併用皆可。此等的調合量係在不損及本發明的目的之範圍內即可,但相對於由通式(1)所表示之環氧樹脂(A)和其他的環氧樹脂之合計量,較佳為未滿50質量%,更佳為未滿40質量%,進一步更佳為未滿25質量%。 Specific examples of other epoxy resins that can be used in combination include bisphenol A, bisphenol F, bisphenol S, bisphenol hydrazone, 4,4'-bisphenol, 3,3 ', 5,5 '-Tetramethyl-4,4'-dihydroxybiphenyl, resorcinol, naphthalene and other divalent phenolic epoxides, tri- (4-hydroxybenzene) methane, 1,1, Epoxy of trivalent or higher phenols such as 2,2-tetrakis (4-hydroxybenzene), phenol Novolak, o-cresol Novolak, epoxide of co-condensation resin obtained from dicyclopentadiene and phenols , Co-polymers obtained from cresols and formaldehyde and alkoxy substituted naphthalenes Epoxides of condensation resins, epoxides of phenol aralkyl resins obtained from phenols and p-Xylenedichloride, etc., obtained from phenols and dichloromethyl biphenyls, etc. Epoxides of biphenylaralkyl phenol resins, naphthol aralkyl resins synthesized from naphthols and p-xylene dichloride, etc. These epoxy resins may be used alone or in combination of two or more kinds. These blending amounts may be within a range that does not impair the object of the present invention, but are preferably relative to the total amount of the epoxy resin (A) represented by the general formula (1) and other epoxy resins. It is less than 50% by mass, more preferably less than 40% by mass, and even more preferably less than 25% by mass.
本發明的環氧樹脂組成物中,亦可使用有機溶劑作為黏度調整用,若具體地舉例可使用的有機溶劑,可例舉有N,N-二甲基甲醯胺等胺類、乙二醇單甲醚等醚類、丙酮、丁酮等酮類、甲醇、乙醇等醇類、苯、甲苯等芳香族烴類。此等的溶劑係單獨使用或2種類以上混合使用皆可。 In the epoxy resin composition of the present invention, an organic solvent can also be used for viscosity adjustment. If specific examples of the organic solvent that can be used include amines such as N, N-dimethylformamide, and ethylene dioxane Ethers such as monomethyl ether, ketones such as acetone and methyl ethyl ketone, alcohols such as methanol and ethanol, and aromatic hydrocarbons such as benzene and toluene. These solvents may be used alone or in combination of two or more kinds.
本發明的環氧樹脂組成物在不損及其特性的範圍內,亦可調合環氧樹脂以外的硬化性樹脂或熱塑性樹脂。若具體地舉例,可例舉有酚樹脂、丙烯酸系樹脂(Acrylic resin)、石油樹脂、茚樹脂(Indene resin)、茚香豆酮樹脂(Indene-coumarone resins)、苯氧基樹脂(Phenoxyesin resin)、氰酸鹽樹脂(Cyanate resins)、環氧壓克力樹脂(Epoxy acrylate resin)、乙烯化合物、聚氨酯(Polyurethane)、聚酯(Polyester)、聚醯胺(Polyamide)、聚醯亞胺(Polyimide)、聚醯胺醯亞胺(Polyamideimide)、聚醚醯亞膠(Polyetherimide)、 B一三氮樹脂(Bismaleimide-triazine resin)、聚醚(Polyethersulfone)、聚碸(Polysulfone)、聚醚醚酮(Polyetheretherketone)、聚苯硫醚(Polyphenylenesulfide)、聚乙烯甲醛(Polyvinyl formal),但並不受此等所限定。 The epoxy resin composition of the present invention may be blended with a curable resin or a thermoplastic resin other than the epoxy resin within a range that does not impair its characteristics. Specific examples include phenol resins, acrylic resins, petroleum resins, indene resins, indene-coumarone resins, and phenoxyesin resins. , Cyanate resins, Epoxy acrylate resin, Vinyl compounds, Polyurethane, Polyester, Polyamide, Polyimide , Polyamideimide, Polyetherimide, B-triazine resin (Bismaleimide-triazine resin), Polyethersulfone, Polysulfone, Polyetheretherketone, Polyphenylenesulfide, Polyvinyl formal, but Not limited to these.
本發明的環氧樹脂組成物中視需要可使用填充劑(Filler)。具體而言可例舉有氫氧化鋁、氫氧化鎂、滑石、燒製滑石、黏土(Clay)、高嶺石(Kaolin)、氫氧化鈦、玻璃粉、矽利康球(Silica balloon)等無機填充劑,但亦可調合有機系或無機系的耐濕顏料、鱗片狀顏料等。使用一般的無機充填劑之理由有耐衝擊性的提升。又,可調合玻璃纖維、木漿纖維、合成纖維、陶瓷纖維等纖維質充填劑或微粒子橡膠、熱塑性彈性體等有機充填劑等。 A filler (Filler) can be used in the epoxy resin composition of this invention as needed. Specific examples include inorganic fillers such as aluminum hydroxide, magnesium hydroxide, talc, fired talc, clay, kaolin, titanium hydroxide, glass powder, and silica balloon. However, it is also possible to blend organic or inorganic moisture-resistant pigments, scaly pigments, and the like. The reason for using a general inorganic filler is to improve impact resistance. Fibrous fillers such as glass fibers, wood pulp fibers, synthetic fibers, and ceramic fibers, or organic fillers such as particulate rubber and thermoplastic elastomers can be blended.
又,本發明的環氧樹脂組成物中視需要亦可調合難燃劑、搖變性材料、流動性促進劑等添加劑。搖變性材料可例舉有矽系、蓖麻油系、脂肪族聚醯胺蠟(Amide wax)、氧化聚乙烯蠟、有機膨土系等。進一步視需要,本發明的樹脂組成物中可調合椰子蠟(Carnauba-wax)、OP蠟等離型劑、碳黑等著色劑、三氧化二銻等難燃劑、矽油等低應力化劑、硬脂酸鈣等潤滑劑。 Further, additives such as a flame retardant, a shading material, and a fluidity promoter may be blended in the epoxy resin composition of the present invention as necessary. Examples of the shake-modifying material include silicon-based, castor oil-based, aliphatic amide wax, oxidized polyethylene wax, and organic bentonite. Further, as needed, a release agent such as Carnauba-wax and OP wax, a coloring agent such as carbon black, a flame retardant such as antimony trioxide, a low stress agent such as silicone oil may be blended in the resin composition of the present invention, Lubricants such as calcium stearate.
接下來,對使用本發明的環氧樹脂組成物所得到的預浸材作說明。作為薄片狀基材可使用玻璃等無機纖維或聚酯等、多胺、聚丙烯酸酯、聚醯亞胺、克維拉(Kevlar)等有機質纖維的織布或不織布,但並不受此所限定。本發明的環氧樹脂組成物及由基材製造成預浸材之方 法中無特別之限定,如將前述的基材浸漬在將前述的環氧樹脂組成物用溶劑作黏度調整過後的樹脂清漆(Varnish),含浸後加熱乾燥再將樹脂成分半硬化(B-stage化)所得者,如可以100至200℃加熱乾燥1至40分鐘。在此,預浸材中的樹脂量係以樹脂成分30至80質量%為較佳。 Next, a prepreg obtained using the epoxy resin composition of the present invention will be described. As the sheet-like substrate, woven or non-woven fabrics of inorganic fibers such as glass or polyester, organic fibers such as polyamine, polyacrylate, polyimide, and Kevlar can be used, but it is not limited thereto. . Epoxy resin composition of the present invention and method for making prepreg from base material There is no particular limitation in the method. For example, the aforementioned substrate is immersed in a resin varnish (Varnish) whose viscosity is adjusted by using the solvent of the aforementioned epoxy resin composition, and the resin component is semi-hardened after being impregnated and dried. For example, the obtained product can be dried by heating at 100 to 200 ° C for 1 to 40 minutes. Here, the amount of the resin in the prepreg is preferably 30 to 80% by mass of the resin component.
接下來,對使用本發明的環氧樹脂組成物所得到的接著片作說明。製造接著片之方法中無特別之限定,但如未溶解於聚脂薄膜、聚醯亞胺薄膜等樹脂組成物的載體薄膜(Carrier film)上,用本發明的環氧樹脂組成物以較佳為5至100μm的厚度塗布後,以100至200℃加熱乾燥1至40分鐘而成型為薄片狀。以一般稱之為鑄造法(Casting)之方法來形成樹脂片者。若此時塗布環氧樹脂組成物的薄片預先以離型劑施以表面處理,成型的接著片就可以輕易地剝離。在此接著片的厚度係期望形成為5至80μm。如此方法所得到的接著片通常會是具有絕緣性的絕緣接著片,但藉由混合具有導電性的金屬或金屬塗膜(Coating)的微粒子在環氧樹脂組成物中,可得到導電性接著片。 Next, the adhesive sheet obtained using the epoxy resin composition of this invention is demonstrated. The method for manufacturing the adhesive sheet is not particularly limited, but if the carrier film is not dissolved in a resin film such as a polyester film or a polyimide film, the epoxy resin composition of the present invention is preferably used. After coating to a thickness of 5 to 100 μm, it is heated and dried at 100 to 200 ° C. for 1 to 40 minutes to form a sheet. A resin sheet is formed by a method generally called a casting method. If the sheet coated with the epoxy resin composition is surface-treated with a release agent beforehand, the formed adhesive sheet can be easily peeled off. Here, the thickness of the adhesive sheet is desirably formed to 5 to 80 μm. The adhesive sheet obtained in this way is usually an insulating adhesive sheet. However, by mixing fine particles of a conductive metal or metal coating in an epoxy resin composition, a conductive adhesive sheet can be obtained. .
接下來,對使用本發明的預浸材或絕緣接著片來製造積層板之方法作說明。使用預浸材來形成積層板時,將預浸材以一層或複數層來積層,在單側或兩側配置金屬箔構成積層物,此積層物經過加熱、加壓而積層一體化。在此的金屬箔可使用銅、鋁、黃銅、鎳等單獨、合金、複合的金屬箔。積層物的加熱加壓條件係以環氧樹脂 組成物有硬化為條件作適當調整再加熱加壓即可,但若加壓量過低,所得到的積層板之內部會殘留氣泡及電氣特性降低,故期望是以滿足成型性為條件來加壓。如可分別設定溫度在160至220℃、壓力在49.0至490.3N/cm2(5至50kgf/cm2)、加熱時間在40至240分鐘。進一步,經由如此的方法所得到的單層之積層板可作為內層材來製作多層板。此時,首先以加成法(Additive)或減去法(Subtractive)等在積層板施以線路形成,所形成的線路表面以酸溶液處理再施以黑化處理而得內層材。隨著在此內層材的單面或兩側的線路形成面上以預浸材或絕緣接著片來形成絕緣層,同時在絕緣層的表面形成導體層,由此而形成多層板者。以絕緣接著片來形成絕緣層時,在複數層的內層材之線路形成面配置絕緣接著片形成積層物。或在內層材的線路形成面和金屬箔之間配置絕緣接著片形成積層物。然後藉由對此積層物加熱加壓來一體成型,隨著將絕緣接著片的硬化物形成絕緣層,同時形成內層材的多層化。或將絕緣接著片的硬化物作為絕緣層來形成內層材和導體層的金屬箔者。在此,金屬箔可使用內層材所使用的積層板與相同者。又加熱加壓成形可與內層材的成型時相同的條件下進行。對積層板塗布環氧樹脂組成物來形成絕緣層時,將前述的環氧樹脂組成物以較佳為5至100μm的厚度對內層材的最外層之線路形成面塗布樹脂後,以100至200℃加熱乾燥1至90分鐘形成薄片狀。以一般稱之為鑄造法(Casting)之方法所形成者。乾燥後的厚度係形成5至80μ m為期望的。對如此方法所形成的多層積層板之表面,更可以加成法或減去法施以通孔(Via hole)形成或線路形成來形成印刷配線板。又進一步藉由將此印刷配線板作為內層材重覆前述的工法,更可形成多層的積層板者。又以預浸材形成絕緣體時,將積層後的預浸材一層或複數層配置在內層材的線路形成面,更且在其外側配置金屬箔來形成積層物。然後藉由對此積層物加熱加壓來一體成型,隨著將預浸材的硬化物作為絕緣層來形成,同時將外側的金屬箔作為導體層而形成者。在此,金屬箔亦可使用內層板所使用的積層板與相同者。又加熱加壓成形可與內層材的成型時相同的條件下進行。對如此方法所形成的多層積層板之表面,更可以加成法或減去法施以通孔(Via hole)形成或線路形成來形成印刷配線板。又進一步藉由將此印刷配線板作為內層材重覆前述的工法,更可形成多層的多層板者。 Next, a method for manufacturing a laminated board using the prepreg or insulating adhesive sheet of the present invention will be described. When a prepreg is used to form a laminate, the prepreg is laminated in one or more layers, and metal foils are arranged on one or both sides to form a laminate, and the laminate is laminated and integrated after heating and pressing. The metal foil used here may be a single, alloy, or composite metal foil such as copper, aluminum, brass, or nickel. The heating and pressing conditions of the laminate are appropriately adjusted under the condition that the epoxy resin composition is hardened, and then heating and pressing, but if the amount of pressure is too low, air bubbles remain inside the laminate and the electrical characteristics are reduced. Therefore, it is desirable to pressurize under the condition of satisfying moldability. For example, the temperature can be set to 160 to 220 ° C, the pressure can be set to 49.0 to 490.3 N / cm 2 (5 to 50 kgf / cm 2 ), and the heating time can be set to 40 to 240 minutes. Further, a single-layer laminated board obtained by such a method can be used as an inner layer material to produce a multilayer board. At this time, firstly, a circuit is formed on the laminated board by an additive method or a subtractive method, and the surface of the formed circuit is treated with an acid solution and then blackened to obtain an inner layer material. A multi-layer board is formed by forming an insulating layer with a prepreg material or an insulating adhesive sheet on one or both sides of the inner layer material, and a conductor layer is formed on the surface of the insulating layer. When forming an insulating layer with an insulating adhesive sheet, an insulating adhesive sheet is arranged on a line formation surface of a plurality of layers of inner layers to form a laminate. Alternatively, an insulating adhesive sheet is disposed between the circuit-forming surface of the inner layer material and the metal foil to form a laminate. Then, the laminated body is integrally molded by applying heat and pressure to the laminated body. As the hardened material of the insulating and bonding sheet is formed into an insulating layer, a multilayered inner layer material is formed. Alternatively, the hardened material of the insulating adhesive sheet is used as an insulating layer to form an inner layer material and a metal foil of a conductor layer. Here, the same can be used for the metal foil as the laminated board used for the inner layer material. The heating and press forming can be performed under the same conditions as in the case of forming the inner layer material. When the laminated board is coated with an epoxy resin composition to form an insulating layer, the aforementioned epoxy resin composition is coated with a resin at a thickness of preferably 5 to 100 μm to the outermost line forming surface of the inner layer material, and then 100 to 100 μm. Heated at 200 ° C for 1 to 90 minutes to form a flake. Formed by a method commonly known as Casting. A thickness of 5 to 80 μm after drying is desirable. On the surface of the multi-layer laminated board formed by such a method, a via hole formation or a circuit formation can be applied by addition or subtraction to form a printed wiring board. Furthermore, by using the printed wiring board as an inner layer material and repeating the aforementioned method, a multi-layer laminated board can be formed. In the case of forming an insulator with a prepreg, one or more layers of the prepreg after lamination are arranged on the circuit formation surface of the inner layer, and a metal foil is arranged on the outside to form a laminate. Then, the laminate is integrally formed by applying heat and pressure to the laminate, and forming the cured product of the prepreg as an insulating layer and the outer metal foil as a conductor layer. Here, the same can be used for the metal foil as the laminated board used for the inner layer board. The heating and press forming can be performed under the same conditions as in the case of forming the inner layer material. On the surface of the multi-layer laminated board formed by such a method, a via hole formation or a circuit formation can be applied by addition or subtraction to form a printed wiring board. Furthermore, by using the printed wiring board as an inner layer material and repeating the aforementioned method, a multi-layered multilayer board can be formed.
又,若使本發明的環氧樹脂組成物加熱硬化,即可以當作環氧樹脂硬化物,此硬化物係變成具有低介電特性、耐熱性、低吸濕性等優點之優異者。此硬化物係可藉由對環氧樹脂組成物注型、壓縮形成、轉移(Transfer)形成等方法再成型加工而得。此時的溫度通常為120至250℃的範圍。 In addition, if the epoxy resin composition of the present invention is heat-hardened, it can be regarded as an epoxy resin hardened material, and this hardened material system has excellent properties such as low dielectric properties, heat resistance, and low hygroscopicity. This hardened material can be obtained by remolding processing such as injection molding, compression forming, and transfer forming of the epoxy resin composition. The temperature at this time is usually in the range of 120 to 250 ° C.
本發明的環氧樹脂組成物和使用其組成物而得之預浸材、接著片、積層板、封止劑、注型物、硬化物係在優異的低介電特性、耐熱性、低吸濕性、接著性上展現優異之特性者。 The epoxy resin composition of the present invention and a prepreg, an adhesive sheet, a laminate, a sealant, a molding, and a hardened material obtained by using the composition have excellent low dielectric properties, heat resistance, and low absorption. Those who exhibit excellent wettability and adhesion.
以下,根據實施例更具體地說明本發明,但本發明並不受此所限定。只要沒有特別的禁止,實施例中「份」表示質量份,「%」表示質量%。 Hereinafter, the present invention will be described more specifically based on examples, but the present invention is not limited thereto. As long as there is no special prohibition, "part" in the examples means mass parts, and "%" means mass%.
(1)環氧當量的測定 (1) Determination of epoxy equivalent
依據JIS K 7236規格來測得。具體而言,使用電位差滴定裝置,使用丁銅作為溶劑,加入溴化四乙銨乙酸溶液,使用0.1mol/L過氯酸-乙酸溶液。 Measured in accordance with JIS K 7236. Specifically, a potentiometric titration device was used, copper butyl was used as a solvent, a tetraethylammonium bromide acetic acid solution was added, and a 0.1 mol / L perchloric acid-acetic acid solution was used.
(2)軟化點的測定 (2) Measurement of softening point
依據JIS K 7234規格、環球法來測得。具體而言,使用自動軟化點裝置(股份有限公司Meitec製,ASP-MG4)。 Measured in accordance with JIS K 7234 standard and ring and ball method. Specifically, an automatic softening point device (Meitec, Inc., ASP-MG4) was used.
(3)玻璃轉移溫度的測定 (3) Measurement of glass transition temperature
依據JIS K 7121、示差掃描量熱法來測得。藉由使用SII社製EXTER DSC6200從20℃以10℃/分的加熱速度來測定,求出第二次循環所得到的DSC圖表之外推玻璃轉移開始溫度(Tig)。 Measured in accordance with JIS K 7121 and differential scanning calorimetry. The glass transition start temperature (Tig) was extrapolated from the DSC chart obtained in the second cycle by measuring using a EXII DSC6200 manufactured by SII Corporation at a heating rate of 20 ° C / min from 20 ° C.
(4)比介電率及散逸因數的測定 (4) Determination of specific permittivity and dissipation factor
藉由孔腔共振法(Vector network analyzer(VNA)E8363B(Agilent Technologies製)、共振腔微擾法介電率測定裝置(關東電子應用開發製))測得1GHz之值。 The value of 1 GHz was measured by a cavity resonance method (Vector network analyzer (VNA) E8363B (manufactured by Agilent Technologies) and a resonance cavity perturbation method dielectric permittivity measuring device (manufactured by Kanto Electronics Application Development)).
(5)接著力的測定 (5) Measurement of adhesive force
依據JIS K 6854-1以島津製作所製自動測圖儀(Autograph),以25℃環境下、50mm/min來測得。 According to JIS K 6854-1, an autograph manufactured by Shimadzu Corporation was measured under a 25 ° C environment at 50 mm / min.
(6)耐水性的測定 (6) Measurement of water resistance
測得PCT後的銲料耐熱作為耐水性的指標,將依據JIS C 6481製作的測試片在121℃、0.2MPa的高壓釜(autoclave)中經3小時處理後,浸在260℃的銲料浴中20分鐘以上而不產生膨脹或脫落者評以○,10以內產生膨脹或脫落者評以×,除此之外評以△。 The heat resistance of the solder after PCT was measured as an index of water resistance. A test piece made in accordance with JIS C 6481 was treated in an autoclave at 121 ° C and 0.2 MPa for 3 hours, and then immersed in a solder bath at 260 ° C. 20 Those who did not swell or fall off for more than one minute were rated as ○, those who swelled or fell off within 10 were rated as ×, and others were rated as △.
(7)抗拉強度 (7) Tensile strength
依據JIS K 7113。 According to JIS K 7113.
合成例1(環氧樹脂(A1)的合成) Synthesis example 1 (synthesis of epoxy resin (A1))
對具有攪拌裝置、溫度計、冷卻管、氮氣導入裝置的4個開口之玻璃製可分離式燒瓶,加入甲醇806份和氫氧化鉀201.5份後攪拌,對此再加入作為二羥基化合物(a)的雙(4-羥基-3,5-二甲基苯基)碸(以下,TMBPS)550份,當作鹼金屬鹽。之後,加入作為含鹵素化甲基化合物(b)的4,4’-二氯甲基聯苯(以下,BCMB)4.5份和作為溶劑的雙(2-甲氧基)醚488份,再一邊攪拌一邊加熱至75℃反應2小時。 A glass separable flask with four openings including a stirring device, a thermometer, a cooling tube, and a nitrogen introduction device was charged with 806 parts of methanol and 201.5 parts of potassium hydroxide and stirred. To this was added the dihydroxy compound (a). 550 parts of bis (4-hydroxy-3,5-dimethylphenyl) fluorene (hereinafter, TMBPS) was used as an alkali metal salt. Thereafter, 4.5 parts of 4,4'-dichloromethylbiphenyl (hereinafter, BCMB) as a halogenated methyl compound (b) and 488 parts of bis (2-methoxy) ether as a solvent were added, and the other side Heat to 75 ° C with stirring for 2 hours.
反應結束後,在50mmHg的減壓下加熱至100℃,將全部甲醇蒸餾除去後,加入表氯醇1644份攪拌溶解。均勻地溶解後,維持在180mmHg的減壓下75℃,將48%氫氧化鈉水溶液148份以2小時滴落,將此滴落中的回流餾出液和表氯醇以分離層來分離使表氯醇返回反應容器中,水則除去系統外,以進行反應。滴落結束後,以相同條件再繼續反應1小時。反應結束後,將生成的鹽過濾除去,進一步將水洗後的表氯醇蒸餾除去,得到淡黃色固體狀的環氧樹脂600份。所得到的環氧樹脂之環氧當量為212/eq, 軟化點為60℃。 After completion of the reaction, the mixture was heated to 100 ° C. under a reduced pressure of 50 mmHg, and after all the methanol was distilled off, 1644 parts of epichlorohydrin was added thereto to stir and dissolve. After uniformly dissolving, maintaining a reduced pressure of 180 mmHg at 75 ° C, 148 parts of a 48% sodium hydroxide aqueous solution was dropped over 2 hours, and the refluxing distillate and epichlorohydrin in the dropping were separated by a separation layer to separate Epichlorohydrin is returned to the reaction vessel, and water is removed from the system for the reaction. After the dropping was completed, the reaction was continued for another hour under the same conditions. After the reaction was completed, the produced salt was removed by filtration, and the epichlorohydrin after washing with water was distilled off to obtain 600 parts of a pale yellow solid epoxy resin. The epoxy equivalent of the obtained epoxy resin was 212 / eq. The softening point was 60 ° C.
合成例2(環氧樹脂(A2)的合成) Synthesis example 2 (synthesis of epoxy resin (A2))
對具有攪拌裝置、溫度計、冷卻管、氮氣導入裝置的4個開口之玻璃製可分離式燒瓶,加入甲醇366份和氫氧化鉀91.6份後攪拌,對此再加入作為二羥基化合物(a)的TMBPS 250份,當作鹼金屬鹽。之後,加入作為含鹵素化甲基化合物(b)的BCMB61.5份和作為溶劑的雙(2-甲氧基)醚360份,再一邊攪拌一邊加熱至75℃反應2小時。 A glass separable flask with four openings, including a stirring device, a thermometer, a cooling tube, and a nitrogen introduction device, was added with 366 parts of methanol and 91.6 parts of potassium hydroxide, and the mixture was stirred. 250 parts of TMBPS as an alkali metal salt. Thereafter, 61.5 parts of BCMB as a halogenated methyl compound (b) and 360 parts of bis (2-methoxy) ether as a solvent were added, and the mixture was heated to 75 ° C. for 2 hours while stirring and reacted for 2 hours.
反應結束後,在50mmHg的減壓下加熱至100℃,將全部甲醇和雙(2-甲氧基)醚43份蒸餾後,加入表氯醇528份攪拌溶解。均勻地溶解後,維持在180mmHg的減壓下75℃,將48%氫氧化鈉水溶液48份以1小時滴落,將此滴落中的回流餾出液和表氯醇以分離層來分離使表氯醇返回反應容器中,水則除去系統外,以進行反應。滴落結束後,以相同條件再繼續反應1小時。反應結束後,將生成的鹽過濾除去,進一步水洗後將表氯醇蒸餾除去,得到淡黃色固體狀的環氧樹脂286份。所得到的環氧樹脂的當量為313g/eq,軟化點為94℃。 After completion of the reaction, it was heated to 100 ° C. under a reduced pressure of 50 mmHg, and 43 parts of all methanol and bis (2-methoxy) ether were distilled. Then, 528 parts of epichlorohydrin was added and dissolved by stirring. After uniformly dissolving, maintaining a reduced pressure of 180 mmHg at 75 ° C, 48 parts of a 48% sodium hydroxide aqueous solution was dropped for 1 hour, and the refluxing distillate and epichlorohydrin in the dropping were separated by a separation layer to separate Epichlorohydrin is returned to the reaction vessel, and water is removed from the system for the reaction. After the dropping was completed, the reaction was continued for another hour under the same conditions. After the reaction was completed, the produced salt was filtered off, and after further washing with water, epichlorohydrin was distilled off to obtain 286 parts of a pale yellow solid epoxy resin. The equivalent weight of the obtained epoxy resin was 313 g / eq, and the softening point was 94 ° C.
合成例3(環氧樹脂(A3)的合成) Synthesis example 3 (synthesis of epoxy resin (A3))
對具有攪拌裝置、溫度計、冷卻管、氮氣導入裝置的4個開口之玻璃製可分離式燒瓶,加入甲醇293份和氫氧化鉀73.3份後攪拌,對此再加入作為二羥基化合物(a)的TMBPS 200份,當作鹼金屬鹽。之後,加入作為含鹵素化甲基化合物(b)的BCMB 114.8份和作為溶劑的雙(2-甲氧基) 醚440份,再一邊攪拌一邊加熱至75℃反應2小時。 A detachable glass-made separable flask equipped with a stirring device, a thermometer, a cooling tube, and a nitrogen introduction device was charged with 293 parts of methanol and 73.3 parts of potassium hydroxide, and the mixture was stirred. Then, as a dihydroxy compound (a), 200 parts of TMBPS as an alkali metal salt. Thereafter, 114.8 parts of BCMB as a halogenated methyl compound (b) and bis (2-methoxy) as a solvent were added. 440 parts of ether was heated to 75 ° C. for 2 hours while stirring.
反應結束後,在50mmHg的減壓下加熱至100℃,將全部甲醇和雙(2-甲氧基)醚333份蒸餾後,加入表氯醇182份攪拌溶解。均勻地溶解後,維持在180mmHg的減壓下75℃,將48%氫氧化鈉水溶液10份以30分鐘滴落,將此滴落中的回流餾出液和表氯醇以分離層來分離使表氯醇返回反應容器中,水則除去系統外,以進行反應。滴落結束後,以相同條件再繼續反應90分鐘。反應結束後,將生成的鹽過濾除去,進一步蒸餾除去表氯醇,得到淡黃色固體狀的環氧樹脂247份。所得到的環氧樹脂的當量為776g/eq,軟化點為135℃。 After completion of the reaction, it was heated to 100 ° C. under a reduced pressure of 50 mmHg, and 333 parts of all methanol and bis (2-methoxy) ether were distilled. Then, 182 parts of epichlorohydrin was added and dissolved by stirring. After uniformly dissolving, maintaining at a reduced pressure of 180 mmHg at 75 ° C, 10 parts of a 48% sodium hydroxide aqueous solution was dropped for 30 minutes, and the refluxing distillate and epichlorohydrin in the dropping were separated by a separation layer to separate Epichlorohydrin is returned to the reaction vessel, and water is removed from the system for the reaction. After the dropping was completed, the reaction was continued for another 90 minutes under the same conditions. After completion of the reaction, the produced salt was removed by filtration, and epichlorohydrin was further distilled off to obtain 247 parts of a pale yellow solid epoxy resin. The equivalent weight of the obtained epoxy resin was 776 g / eq, and the softening point was 135 ° C.
合成例4(環氧樹脂(A4)的合成) Synthesis example 4 (synthesis of epoxy resin (A4))
對具有攪拌裝置、溫度計、冷卻管、氮氣導入裝置的4個開口之玻璃製可分離式燒瓶,加入甲醇366份和氫氧化鉀99份後攪拌,對此再加入作為二羥基化合物(a)的4,4’-亞甲基雙(2,6-二甲基酚)(以下,記為TMBPF)250份,當作鹼金屬鹽。之後,加入作為含鹵素化甲基化合物(b)的1,4-雙(氯甲基)苯(以下,記為PXDC)51.2份和作為溶劑的雙(2-甲氧基)醚265份,再一邊攪拌一邊加熱至75℃反應2小時。 A glass separable flask with four openings including a stirring device, a thermometer, a cooling tube, and a nitrogen introduction device was added with 366 parts of methanol and 99 parts of potassium hydroxide, and the mixture was stirred. Then, a dihydroxy compound (a) was added thereto. 250 parts of 4,4'-methylenebis (2,6-dimethylphenol) (hereinafter, referred to as TMBPF) was used as an alkali metal salt. Thereafter, 51.2 parts of 1,4-bis (chloromethyl) benzene (hereinafter, referred to as PXDC) as a halogenated methyl compound (b) and 265 parts of bis (2-methoxy) ether as a solvent were added. The mixture was heated to 75 ° C for 2 hours while stirring.
反應結束後,在50mmHg的減壓下加熱至100℃,將全部甲醇蒸餾除去後,加入表氯醇632份攪拌溶解。均勻地溶解後,維持在180mmHg的減壓下75℃,將48%氫氧化鈉水溶液27份以1小時滴落,將此滴落中的回流餾出液和表氯醇以分離層來分離使表氯醇返回反應容器中,水則 除去系統外,以進行反應。滴落結束後,以相同條件再繼續反應1小時。反應結束後,將生成的鹽過濾除去,進一步將水洗後的表氯醇蒸餾除去,得到淡黃色固體狀的環氧樹脂285份。所得到的環氧樹脂的當量為261g/eq,軟化點為62℃。 After completion of the reaction, the mixture was heated to 100 ° C. under a reduced pressure of 50 mmHg, and after all the methanol was distilled off, 632 parts of epichlorohydrin was added and dissolved by stirring. After uniformly dissolving, maintaining a reduced pressure of 180 mmHg at 75 ° C, 27 parts of a 48% sodium hydroxide aqueous solution was dropped for 1 hour, and the refluxing distillate and epichlorohydrin in the dropping were separated by a separation layer to separate Epichlorohydrin is returned to the reaction vessel, and water is Remove the system for reaction. After the dropping was completed, the reaction was continued for another hour under the same conditions. After the reaction was completed, the produced salt was filtered off, and the epichlorohydrin after water washing was distilled off to obtain 285 parts of a pale yellow solid epoxy resin. The equivalent weight of the obtained epoxy resin was 261 g / eq, and the softening point was 62 ° C.
合成例5(環氧樹脂(A5)的合成) Synthesis example 5 (synthesis of epoxy resin (A5))
對具有攪拌裝置、溫度計、冷卻管、氮氣導入裝置的4個開口之玻璃製可分離式燒瓶,加入甲醇256份和氫氧化鉀66份後攪拌,對此再加入作為二羥基化合物(a)的9,9’-雙(4-二羥苯)芴(以下,BPFL)200份,當作鹼金屬鹽。之後,加入作為含鹵素化甲基化合物(b)的BCMB71.7份和作為溶劑的雙(2-甲氧基)醚378份,再一邊攪拌一邊加熱至75℃反應2小時。 A glass separable flask with 4 openings including a stirring device, a thermometer, a cooling pipe, and a nitrogen introduction device was charged with 256 parts of methanol and 66 parts of potassium hydroxide and stirred. To this was added the dihydroxy compound (a). 200 parts of 9,9'-bis (4-dihydroxybenzene) fluorene (hereinafter, BPFL) was used as an alkali metal salt. Thereafter, 71.7 parts of BCMB as a halogenated methyl compound (b) and 378 parts of bis (2-methoxy) ether as a solvent were added, and the mixture was heated to 75 ° C. for 2 hours while stirring and reacted for 2 hours.
反應結束後,在50mmHg的減壓下加熱至100℃,將全部甲醇蒸餾除去後,加入表氯醇264份攪拌溶解。均勻地溶解後,維持在180mmHg的減壓下75℃,將48%氫氧化鈉水溶液27份以1小時滴落,將此滴落中的回流餾出液和表氯醇以分離層來分離使表氯醇返回反應容器中,水則除去系統外,以進行反應。滴落結束後,以相同條件再繼續反應1小時。反應結束後,將生成的鹽過濾除去,進一步蒸餾除去表氯醇,得到淡黃色固體狀的環氧樹脂226份。所得到的環氧樹脂的當量為497g/eq,軟化點為147℃。 After completion of the reaction, it was heated to 100 ° C. under a reduced pressure of 50 mmHg, and after all the methanol was distilled off, 264 parts of epichlorohydrin was added and dissolved by stirring. After uniformly dissolving, maintaining a reduced pressure of 180 mmHg at 75 ° C, 27 parts of a 48% sodium hydroxide aqueous solution was dropped for 1 hour, and the refluxing distillate and epichlorohydrin in the dropping were separated by a separation layer to separate Epichlorohydrin is returned to the reaction vessel, and water is removed from the system for the reaction. After the dropping was completed, the reaction was continued for another hour under the same conditions. After the reaction was completed, the produced salt was filtered off, and epichlorohydrin was further distilled off to obtain 226 parts of a pale yellow solid epoxy resin. The equivalent weight of the obtained epoxy resin was 497 g / eq, and the softening point was 147 ° C.
合成例6(環氧樹脂(A6)的合成) Synthesis example 6 (synthesis of epoxy resin (A6))
對具有攪拌裝置、溫度計、冷卻管、氮氣導入裝置的4個開口之玻璃製可分離式燒瓶,加入甲醇185份和氫氧化鉀62份後攪拌,對此再加入作為二羥基化合物(a)的TMBPF 125份,當作鹼金屬鹽。之後,加入作為含鹵素化甲基化合物(b)的BCMN(1,4-雙(氯甲基)萘和1,5-雙(氯甲基)萘之混合物)55份和作為溶劑的雙(2-甲氧基)醚220份,再一邊攪拌一邊加熱至75℃反應2小時。 A glass separable flask with a stirring device, thermometer, cooling tube, and nitrogen introduction device was added to 185 parts of methanol and 62 parts of potassium hydroxide, and the mixture was stirred. To this was added the dihydroxy compound (a). 125 parts of TMBPF, used as alkali metal salt. Thereafter, 55 parts of BCMN (a mixture of 1,4-bis (chloromethyl) naphthalene and 1,5-bis (chloromethyl) naphthalene) as a halogenated methyl compound (b) and bis ( 220 parts of 2-methoxy) ether was heated to 75 ° C while stirring for 2 hours to react.
反應結束後,在50mmHg的減壓下加熱至100℃,將全部甲醇和雙(2-甲氧基)醚180份蒸餾除去後,加入表氯醇310份攪拌溶解。均勻地溶解後,維持在180mmHg的減壓下75℃,將48%氫氧化鈉水溶液29份以1小時滴落,此滴落中的回流餾出液和表氯醇以分離層來分離使表氯醇返回反應容器中,水則除去系統外,以進行反應。滴落結束後,以相同條件再繼續反應1小時。反應結束後,將生成的鹽過濾除去,進一步蒸餾除去表氯醇,得到淡黃色固體狀的環氧樹脂115份。所得到的環氧樹脂的當量為396g/eq,軟化點為71℃。 After completion of the reaction, it was heated to 100 ° C. under a reduced pressure of 50 mmHg, and 180 parts of all methanol and bis (2-methoxy) ether were distilled off. Then 310 parts of epichlorohydrin was added and dissolved by stirring. After uniformly dissolving, maintaining a reduced pressure of 180 mmHg at 75 ° C, 29 parts of a 48% sodium hydroxide aqueous solution was dropped for 1 hour, and the refluxing distillate and epichlorohydrin in the dropping were separated by a separation layer to make the surface The chlorohydrin is returned to the reaction vessel, and water is removed from the system for the reaction. After the dropping was completed, the reaction was continued for another hour under the same conditions. After completion of the reaction, the produced salt was filtered off, and epichlorohydrin was further distilled off to obtain 115 parts of a pale yellow solid epoxy resin. The equivalent weight of the obtained epoxy resin was 396 g / eq, and the softening point was 71 ° C.
實施例及比較例使用的環氧樹脂、硬化劑、硬化促進劑如以下。 The epoxy resins, hardeners, and hardening accelerators used in the examples and comparative examples are as follows.
環氧樹脂(A) Epoxy resin (A)
(A1):合成例1的環氧樹脂 (A1): Epoxy resin of Synthesis Example 1
(A2):合成例2的環氧樹脂 (A2): Epoxy resin of Synthesis Example 2
(A3):合成例3的環氧樹脂 (A3): Epoxy resin of Synthesis Example 3
(A4):合成例4的環氧樹脂 (A4): Epoxy resin of Synthesis Example 4
(A5):合成例5的環氧樹脂 (A5): Epoxy resin of Synthesis Example 5
(A6):合成例6的環氧樹脂 (A6): Epoxy resin of Synthesis Example 6
(A7):TX-0902(新日鐵住金化學股份有限公司製,TMPBS型固態環氧樹脂,環氧當量=212g/eq,軟化點=56℃) (A7): TX-0902 (manufactured by Nippon Steel & Sumitomo Chemical Co., Ltd., TMPBS type solid epoxy resin, epoxy equivalent = 212g / eq, softening point = 56 ° C)
(A8):EpotohtoYD-011(新日鐵住金化學股份有限公司製,雙酚A型固態環氧樹脂,環氧當量=475g/eq,軟化點=68℃) (A8): EpotohtoYD-011 (manufactured by Nippon Steel & Sumitomo Chemical Co., Ltd., bisphenol A type solid epoxy resin, epoxy equivalent = 475g / eq, softening point = 68 ° C)
(A9):EpotohtoYD-903N(新日鐵住金化學股份有限公司製,雙酚A型固態環氧樹脂,環氧當量=812g/eq,軟化點=96℃) (A9): EpotohtoYD-903N (manufactured by Nippon Steel & Sumitomo Chemical Co., Ltd., bisphenol A type solid epoxy resin, epoxy equivalent = 812g / eq, softening point = 96 ° C)
硬化劑(B) Hardener (B)
(B1):ShonolBRG-557(昭和電工股份有限公司製,酚醛清漆,酚性羥基當量=105g/eq,軟化點=86℃) (B1): ShonolBRG-557 (manufactured by Showa Denko, novolac, phenolic hydroxyl equivalent = 105g / eq, softening point = 86 ° C)
(B2):雙氰胺(DICY,活性氫當量=21g/eq) (B2): Dicyandiamide (DICY, active hydrogen equivalent = 21g / eq)
(B3):RIKACIDMH-700(新日本理化股份有限公司製,4-甲基六氫鄰苯二甲酸酐和六氫鄰苯二甲酸酐之混合物,活性當量=164g/eq) (B3): RIKACIDMH-700 (manufactured by Shin Nippon Physico Chemical Co., Ltd., a mixture of 4-methylhexahydrophthalic anhydride and hexahydrophthalic anhydride, active equivalent = 164g / eq)
(B4):KayahardAA(日本化藥股份有限公司製,二乙基二胺聯苯基甲烷,活性氫當量=63g/eq,黏度=2500mPa.s) (B4): KayahardAA (manufactured by Nippon Kayaku Co., Ltd., diethyldiamine biphenylmethane, active hydrogen equivalent = 63g / eq, viscosity = 2500mPa · s)
硬化促進劑 Hardening accelerator
(C1):2E4MZ(四國化成股份有限公司製,2-乙基-4甲基咪唑) (C1): 2E4MZ (manufactured by Shikoku Chemical Co., Ltd., 2-ethyl-4methylimidazole)
(C2):DCMU(保土谷化學工業股份有限公司製,3,4-二氯苯基-1,1-二甲脲) (C2): DCMU (manufactured by Hodogaya Chemical Industry Co., Ltd., 3,4-dichlorophenyl-1,1-dimethylurea)
實施例1至5及比較例1至2 Examples 1 to 5 and Comparative Examples 1 to 2
調合由表1所表示的配方之環氧樹脂(A)、硬化劑(B)、硬化促進劑及溶劑,得到不揮發成分為50%的環氧樹脂組成物清漆。環氧樹脂(A)、硬化劑(B)及硬化促進劑係預先溶解於丁酮(MEK)再使用。使玻璃纖維布(日東紡股份有限公司製,IPC規格之2116)含浸於所得到的環氧樹脂組成物清漆後,將其含浸布在熱風循環烤箱中以150℃乾燥8分鐘,得到B-stage狀的預浸材。進一步,所得到的4層預浸材和銅箔(三井金屬鑛業股份有限公司製,3EC-III,厚35μm)疊層,以130℃×15分鐘+190℃×80分鐘的溫度條件進行2MPa的真空壓縮,得到厚0.5mm的積層板。所得到的積層板之評價結果表示於表1。 The epoxy resin (A), the hardener (B), the hardening accelerator, and the solvent having the formula shown in Table 1 were blended to obtain an epoxy resin composition varnish having a nonvolatile content of 50%. The epoxy resin (A), the hardener (B), and the hardening accelerator are dissolved in methyl ethyl ketone (MEK) before use. The glass fiber cloth (Nittobo Co., Ltd., IPC specification 2116) was impregnated with the obtained epoxy resin composition varnish, and the impregnated cloth was dried in a hot air circulation oven at 150 ° C. for 8 minutes to obtain a B-stage. Prepreg. Furthermore, the obtained 4 layers of prepreg and copper foil (manufactured by Mitsui Metals Mining Co., Ltd., 3EC-III, thickness: 35 μm) were laminated, and a vacuum of 2 MPa was performed at a temperature of 130 ° C. for 15 minutes + 190 ° C. for 80 minutes. Compression to obtain a laminated board having a thickness of 0.5 mm. The evaluation results of the obtained laminated board are shown in Table 1.
實施例6至8及比較例3至4 Examples 6 to 8 and Comparative Examples 3 to 4
調合由表2所表示的配方之環氧樹脂(A)、硬化劑(B)及硬化促進劑,加入加熱混練機中來加熱混合得到樹脂組成物。接著將高強度碳纖維(TORAY股份有限公司製,T700,抗拉強度4.8GPa,拉伸彈性模數235GPa)往單方向編織後,加熱熔融所得到的樹脂組成物,再加壓使含浸而得到樹脂含有率35%的單方向碳纖維預浸材。所得到的預浸材裁斷成長30cm、寬30cm且如同纖維方向進行17層積層來形成積層體,疊層離型布(release cloth)後,進一步疊 層吸膠布(bleeder cloth),以尼龍片(Nylon pack)包覆,形成形成用疊層(Stack)。將此形成用疊層在130℃、1小時的條件下的高壓釜中成形,得到纖維體積含有率60%的碳纖維複合材料。又,預浸材中樹脂含有率之測定法係依據JIS K 7071來測得,纖維體積含有率係依據JIS H 7401來測得。所得到的碳纖維複合材料之評價結果表示於表2。 The epoxy resin (A), the hardener (B), and the hardening accelerator with the formula shown in Table 2 were blended and added to a heating kneader to heat and mix to obtain a resin composition. Next, high-strength carbon fiber (T700, manufactured by TORAY Co., Ltd., tensile strength 4.8 GPa, tensile modulus 235 GPa) is woven in one direction, and the obtained resin composition is heated and melted, and then impregnated with pressure to obtain a resin. Unidirectional carbon fiber prepreg with a content of 35%. The obtained prepreg was cut to a length of 30 cm and a width of 30 cm, and was laminated 17 times in the direction of the fiber to form a laminate. After releasing the release cloth, the laminate was further laminated. A layered cloth (bleeder cloth) is covered with a nylon sheet (Nylon pack) to form a stack for formation. This laminate for forming was formed in an autoclave under conditions of 130 ° C and 1 hour to obtain a carbon fiber composite material having a fiber volume content of 60%. The method for measuring the resin content in the prepreg is measured in accordance with JIS K 7071, and the fiber volume content is measured in accordance with JIS H 7401. The evaluation results of the obtained carbon fiber composite material are shown in Table 2.
實施例9至12及比較例5至7 Examples 9 to 12 and Comparative Examples 5 to 7
調合由表3所表示的配方之環氧樹脂(A)、硬化劑(B)及硬化促進劑,一邊加熱至120℃一邊攪拌來均勻化而得到環氧樹脂組成物。將所得到的環氧樹脂組成物在減壓下脫泡後,往模具注型,在熱風循環烤箱中以150℃、2小時 來硬化,接著,以180℃、3小時來硬化而得到硬化物。所得到的注型硬化物之評價結果表示於表3。 The epoxy resin (A), the hardener (B), and the hardening accelerator having the formula shown in Table 3 were blended, and heated to 120 ° C. with stirring to homogenize to obtain an epoxy resin composition. The obtained epoxy resin composition was defoamed under reduced pressure, and then it was injection-molded into a mold, and was heated in a hot air circulation oven at 150 ° C for 2 hours. To harden, and then hardened at 180 ° C. for 3 hours to obtain a cured product. The evaluation results of the obtained cast-hardened materials are shown in Table 3.
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| TW201122014A (en) * | 2009-12-25 | 2011-07-01 | Nippon Steel Chemical Co | Epoxy resin, epoxy resin composition and cured article thereof |
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| JPH0782348A (en) | 1993-07-22 | 1995-03-28 | Hitachi Chem Co Ltd | Epoxy resin composition and cured product thereof |
| JPH11130939A (en) | 1997-10-29 | 1999-05-18 | Hitachi Chem Co Ltd | Epoxy resin composition and cured product thereof |
| JP4529234B2 (en) * | 2000-05-19 | 2010-08-25 | Dic株式会社 | Epoxy resin composition and cured product thereof |
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| JP5209556B2 (en) * | 2009-03-26 | 2013-06-12 | 新日鉄住金化学株式会社 | Epoxy resin composition and molded article |
| JP2011057908A (en) * | 2009-09-14 | 2011-03-24 | Hitachi Chem Co Ltd | Epoxy resin cured product |
| JP5734603B2 (en) * | 2010-08-30 | 2015-06-17 | 新日鉄住金化学株式会社 | Phenolic resin, epoxy resin, production method thereof, epoxy resin composition and cured product |
| JP6138607B2 (en) * | 2012-10-29 | 2017-05-31 | 新日鉄住金化学株式会社 | Epoxy resin and method for producing the epoxy resin |
| JP6043151B2 (en) * | 2012-10-29 | 2016-12-14 | 新日鉄住金化学株式会社 | Thermoplastic polyhydroxypolyether resin and insulating film molded therefrom |
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- 2014-07-18 JP JP2014147868A patent/JP6452335B2/en active Active
- 2014-07-29 TW TW103125804A patent/TWI639628B/en active
- 2014-08-05 KR KR1020140100371A patent/KR102168903B1/en active Active
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| US20020061941A1 (en) * | 2000-09-18 | 2002-05-23 | Asahi Denka Kogyo Kabushiki Kaisha | Aqueous resin composition |
| TW201122014A (en) * | 2009-12-25 | 2011-07-01 | Nippon Steel Chemical Co | Epoxy resin, epoxy resin composition and cured article thereof |
| JP2012221968A (en) * | 2011-04-04 | 2012-11-12 | Jsr Corp | Resin substrate for high frequency circuit board and high frequency circuit board |
| WO2013015344A1 (en) * | 2011-07-27 | 2013-01-31 | 日本化薬株式会社 | Epoxy resin mixture, epoxy resin composition, prepreg, and curing product of each |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2015057465A (en) | 2015-03-26 |
| KR20150018406A (en) | 2015-02-23 |
| CN104341581A (en) | 2015-02-11 |
| TW201509980A (en) | 2015-03-16 |
| CN104341581B (en) | 2018-01-09 |
| JP6452335B2 (en) | 2019-01-16 |
| KR102168903B1 (en) | 2020-10-22 |
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