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TWI639054B - Black photosensitive resin composition and uses thereof - Google Patents

Black photosensitive resin composition and uses thereof Download PDF

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Publication number
TWI639054B
TWI639054B TW104144316A TW104144316A TWI639054B TW I639054 B TWI639054 B TW I639054B TW 104144316 A TW104144316 A TW 104144316A TW 104144316 A TW104144316 A TW 104144316A TW I639054 B TWI639054 B TW I639054B
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alkyl
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phenyl
substituted
weight
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TW104144316A
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TW201723658A (en
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吳鎮宇
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奇美實業股份有限公司
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Priority to CN201611204339.9A priority patent/CN106933032B/en
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • General Physics & Mathematics (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)

Abstract

本發明係有關一種黑色感光性樹脂組成物，及使用該黑色感光性樹脂組成物所形成之黑色圖案以製造彩色濾光片及液晶顯示元件。上述感光性樹脂組成物包含鹼可溶性樹脂(A)、具有乙烯性不飽和基之化合物(B)、光起始劑(C)、溶劑(D)及黑色顏料(E)。根據本發明之黑色感光性樹脂組成物所形成之黑色圖案具有低介電常數和高精細度圖案的直線性佳之優點。 The present invention relates to a black photosensitive resin composition and a black pattern formed using the black photosensitive resin composition to produce a color filter and a liquid crystal display element. The photosensitive resin composition includes an alkali-soluble resin (A), a compound (B) having an ethylenically unsaturated group, a photoinitiator (C), a solvent (D), and a black pigment (E). The black pattern formed by the black photosensitive resin composition according to the present invention has the advantages of low dielectric constant and high linearity of the pattern.

Description

黑色感光性樹脂組成物及其應用 Black photosensitive resin composition and application thereof

本發明係有關一種黑色感光性樹脂組成物，及使用該黑色感光性樹脂組成物所形成之黑色圖案以製造彩色濾光片及液晶顯示元件；特別是提供一種黑色感光性樹脂組成物及其應用，該黑色感光性樹脂組成物所形成之黑色圖案具有低介電常數和高精細度圖案的直線性佳之優點。 The invention relates to a black photosensitive resin composition and a black pattern formed by using the black photosensitive resin composition to manufacture a color filter and a liquid crystal display element; in particular, to provide a black photosensitive resin composition and application thereof The black pattern formed by the black photosensitive resin composition has the advantages of low dielectric constant and high linearity of the pattern.

近年來，隨著液晶顯示器之各種技術的蓬勃發展，且為了提高液晶顯示器的對比度及顯示品質，通常會於液晶顯示器中之彩色濾光片的條紋(stripe)及點(dot)之間隙間設置黑色矩陣(black matrix)。該黑色矩陣可防止畫素間之漏光(light leakage)引起的對比度(contrast ratio)下降及色純度(color purity)下降等缺陷。此外，為確保兩基板(例如彩色濾光片和TFT基板)間保有一定的間隔(晶胞間隙；cell gap)，在液晶顯示裝置、有機EL顯示裝置等顯示裝置中亦會使用間隙體(spacer)。 In recent years, with the vigorous development of various technologies of liquid crystal displays, and in order to improve the contrast and display quality of liquid crystal displays, they are usually set between the stripes and dots of color filters in liquid crystal displays. Black matrix. The black matrix can prevent defects such as a decrease in contrast ratio and a decrease in color purity caused by light leakage between pixels. In addition, in order to ensure a certain distance (cell gap; cell gap) between two substrates (such as a color filter and a TFT substrate), a spacer is also used in display devices such as liquid crystal display devices and organic EL display devices. ).

近期，為因應彩色液晶顯示裝置之進一步高清晰、高亮度化，業界提出主動矩陣型之液晶顯示裝置，此液晶顯示裝置之設置方式包括：(1)整合式彩色濾光片方式(Color filter on array；COA)，其係將包含黑色矩陣及像素層之彩色濾光片設置於TFT元件 基板側；(2)整合式黑色矩陣方式(black matrix on array；BOA)，其係僅將黑色矩陣設置於TFT元件基板側(參照特日本專利開平10-206888號公報、日本專利特開2002-277899號公報等)。上述方式不必取得與元件對準位置之邊緣，因此，與於TFT元件基板之相反側基板上形成黑色矩陣及像素層的一般方式相比，可提高開口率並具有高亮度。 Recently, in order to respond to the further high-definition and high-brightness of color liquid crystal display devices, the industry has proposed an active matrix type liquid crystal display device. The setting methods of this liquid crystal display device include: (1) an integrated color filter method (Color filter on array; COA), which is a color filter including a black matrix and a pixel layer provided on a TFT element Substrate side; (2) Integrated black matrix on array (BOA) method, which only sets the black matrix on the TFT element substrate side (see Japanese Patent Laid-Open No. 10-206888, Japanese Patent Laid-Open No. 2002- No. 277899, etc.). In the above method, it is not necessary to obtain an edge aligned with the element. Therefore, compared with the general method of forming a black matrix and a pixel layer on the substrate on the opposite side of the TFT element substrate, the aperture ratio can be improved and the brightness can be increased.

為對應此發展，日本專利特開平10-114873號公報、日本專利特開2002-311232號公報提出一種樹脂黑色矩陣，此樹脂黑色矩陣即使直接裝載於TFT元件基板上，亦不會引起電路短路，且可賦予一定之體積電阻率。該等專利所提出之樹脂黑色矩陣係以碳黑用作遮光性成分。碳黑於廣泛區域內具有吸收，遮光性非常高，因此幾乎所有樹脂黑色矩陣均使用碳黑作為遮光性成分，然而用以形成此樹脂黑色矩陣之感光性樹脂組成物卻具有介電常數和高精細度圖案的直線性不佳之缺陷，而降低所形成之黑色矩陣的效能。 To cope with this development, Japanese Patent Laid-Open No. 10-114873 and Japanese Patent Laid-Open No. 2002-311232 propose a resin black matrix. Even if the resin black matrix is directly mounted on a TFT element substrate, it will not cause a short circuit. And can give a certain volume resistivity. The resin black matrix proposed in these patents uses carbon black as a light-shielding component. Carbon black has absorption in a wide area and has very high light-shielding properties. Therefore, almost all resin black matrices use carbon black as a light-shielding component. However, the photosensitive resin composition used to form this resin black matrix has a dielectric constant and high The defect of poor linearity of the fineness pattern reduces the efficiency of the formed black matrix.

另一方面，日本特開2011-170075號申請案提出可將碳黑(carbon black)等遮光劑加入間隙體中，以製得具有遮光性之黑色間隙體。 On the other hand, Japanese Patent Application Laid-Open No. 2011-170075 proposes that a light-shielding agent such as carbon black can be added to the interstitial body to obtain a black interstitial body having light-shielding properties.

具有元件形成於其上之基板，例如TFT基板，常應用於液晶顯示裝置等顯示裝置上。就TFT基板而言，必須將黑色條狀間隙體形成於所對應基板的元件上，或是相對上述基板的另一基板之元件上。為考慮元件的高度，在元件形成的部分或是其他部分，需改變黑色條狀間隙體的高度，可藉由改變形成黑色條狀間隙體之曝光量，以一次形成不同高度的黑色條狀間隙體。較佳地，上述方法係以半色調光罩(half-tone mask)進行。 A substrate having elements formed thereon, such as a TFT substrate, is often applied to a display device such as a liquid crystal display device. In the case of a TFT substrate, a black stripe-shaped gap body must be formed on an element of the corresponding substrate, or on an element of another substrate opposite to the above substrate. In order to consider the height of the element, the height of the black stripe gap body needs to be changed in the part where the element is formed or other parts. The black stripe gap body with different height can be formed at one time by changing the exposure of the black stripe gap body body. Preferably, the above method is performed with a half-tone mask.

然而，前述感光性樹脂組成物所製得之黑色間隙體的介電常數不佳，且高精細度圖案的直線性較差。 However, the dielectric constant of the black gap body produced by the photosensitive resin composition is not good, and the linearity of the high-definition pattern is poor.

綜合所述，如何使黑色感光性樹脂組成物所製得之黑 色圖案，包括黑色矩陣與黑色間隙體，具有良好的介電常數及高精細度圖案的直線性，以達到目前業界的要求，為本發明所屬技術領域中努力研究之目標。 In summary, how to make black made of black photosensitive resin composition Color patterns, including black matrices and black gaps, have good dielectric constants and linearity of high-definition patterns to meet current industry requirements, and are the goal of hard research in the technical field to which this invention belongs.

本發明利用提供含有特殊光起始劑及黑色顏料之黑色感光性樹脂組成物，而得到由此黑色感光性樹脂組成物所形成之低介電常數及高精細度圖案的直線性佳之黑色圖案。 The present invention uses a black photosensitive resin composition containing a special photoinitiator and a black pigment to obtain a black pattern with excellent linearity of a low dielectric constant and high-definition pattern formed from the black photosensitive resin composition.

因此，本發明提供一種黑色感光性樹脂，其包含：鹼可溶性樹脂(A)；具有乙烯性不飽和基之化合物(B)；光起始劑(C)；溶劑(D)；及黑色顏料(E)，其中：該光起始劑(C)包含一具有式(C-I)所示結構之第一光起始劑(C-1)： 於式(C-I)中，R1、R2、R3、R4、R5、R6、R7及R8彼此獨立地為氫、C1-C20烷基、、COR16、OR17、鹵 素、NO2或 或R1及R2、R2及R3、R3及R4、R5及R6、R6及R7或R7及R8彼此獨立地為經取代之C2-C10烯基；或R1及R2、R2及R3、R3及R4、R5及R6、R6及R7或R7及R8彼此獨立地共同為-(CH2)p-Y-(CH2)q-；或R1及R2、R2及R3、R3及R4、R5及R6、R6及R7或R7及R8 彼此獨立地共同為但條件為R1及R2、R2及R3、R3及R4、R5及R6、R6及R7或 R7及R8中之至少一對係，R9、R10、R11及R12彼此獨立地為氫、C1-C20烷基，該C1-C20烷基係未經取代或經一或多個以下基團取代：鹵素、苯基、CN、OH、SH、C1-C4-烷氧基、(CO)OH或(CO)O(C1-C4烷基)；或R9、R10、R11及R12彼此獨立地為未經取代之苯基或經一或多個以下基團取代之苯基：C1-C6烷基、鹵素、CN、OR17、SR18或NR19R20；或R9、R10、R11及R12彼此獨立地為鹵素、CN、OR17、SR18、SOR18、SO2R18或NR19R20，其中該等取代基OR17、SR18或NR19R20視情況經由該等基團R17、R18、R19及/或R20與萘基環中一個碳原子形成5員或6員環； 或R9、R10、R11及R12彼此獨立地為、COR16或NO2；Y係O、S、NR26或直接鍵；p係整數0、1、2或3；q係整數1、2或3； X係CO或直接鍵；R13係C1-C20烷基，其係未經取代或經一或多個以下基團取代：鹵素、R17、COOR17、OR17、SR18、CONR19R20、NR19R20、PO(OCkH2k+1)2或或R13係C2-C20烷基，其間雜有一或多個O、S、SO、SO2、NR26或CO，或係C2-C12烯基，其係未經間雜或間雜有一或多個O、CO或NR26，其中該經間雜之C2-C20烷基及該未經間雜或經間雜之C2-C12烯基係未經取代或經一或多個鹵素取代；或R13係C4-C8環烯基、C2-C12炔基或未經間雜或間雜有一或多個O、S、CO或NR26之C3-C10環烷基；或R13係苯基或萘基，其各為未經取代或經一或多個以下基團取代：OR17、SR18、NR19R20、COR16、CN、NO2、鹵素、C1-C20烷基、C1-C4鹵代烷基、間雜有一或多個O、S、CO或NR26之C2-C20烷基；或其各經C3-C10環烷基或間雜有一或多個O、S、CO或NR26之C3-C10環烷基取代；k係整數1至10；R14係氫、C3-C8環烷基、C2-C5烯基、C1-C20烷氧基或C1-C20烷基，其係未經取代或經一或多個以下基團取代：鹵素、苯基、C1-C20烷基苯基或CN；或R14係苯基或萘基，其各未經取代或經一或多個以下基團取代：C1-C6烷基、C1-C4鹵代烷基、鹵素、CN、OR17、SR18及/或NR19R20； 或R14係C3-C20雜芳基、C1-C8烷氧基、苄氧基或苯氧基，該苄氧基及苯氧基係未經取代或經一或多個以下基團取代：C1-C6烷基、C1-C4鹵代烷基及/或鹵素；R15係C6-C20芳基或C3-C20雜芳基，其各係未經取代或經一或多個以下基團取代：苯基、鹵素、C1-C4鹵代烷基、CN、NO2、OR17、SR18、NR19R20、PO(OCkH2k+1)2、SO-C1-C10烷基、SO2-C1-C10烷基、間雜有一或多個O、S或NR26之C2-C20烷基；或其各經C1-C20烷基取代，該C1-C20烷基係未經取代或經一或多個以下基團取代：鹵素、COOR17、CONR19R20、苯基、C3-C8環烷基、C3-C20雜芳基、C6-C20芳氧基羰基、C3-C20雜芳氧基羰基、OR17、SR18或NR19R20；或R15係氫、C2-C12烯基、未經間雜或間雜有一或多個O、CO或NR26之C3-C8環烷基；或R15係C1-C20烷基，其係未經取代或經一或多個以下基團取代：鹵素、OR17、SR18、C3-C8環烷基、C3-C20雜芳基、C6-C20芳氧基羰基、C3-C20雜芳氧基羰基、NR19R20、COOR17、CONR19R20、PO(OCkH2k+1)2、 、苯基；或該C1-C20烷基係經苯基取代，該苯基係經鹵素、C1-C20烷基、C1-C4鹵代烷基、OR17、SR18或NR19R20取代；或R15係C2-C20烷基，其間雜有一或多個O、SO或SO2，且該經間雜之C2-C20烷基係未經取代或經一或多個以下基團取代：鹵素、OR17、COOR17、CONR19R20、苯基或經OR17、SR18或NR19R20取代之苯基； 或R15係C2-C20烷醯基或苯甲醯基，其係未經取代或經一或多個以下基團取代：C1-C6烷基、鹵素、苯基、OR17、SR18或NR19R20；或R15係未經取代或經一或多個OR17取代之萘甲醯基或係C3-C14雜芳基羰基；或R15係C2-C12烷氧基羰基，其係未經間雜或間雜有一或多個O且該經間雜或未經間雜之C2-C12烷氧基羰基係未經取代或經一或多個羥基取代；或R15係苯氧基羰基，其係未經取代或經一或多個以下基團取代：C1-C6烷基、鹵素、C1-C4鹵代烷基、苯基、OR17、SR18或NR19R20；或R15係CN、CONR19R20、NO2、C1-C4鹵代烷基、S(O)m-C1-C6烷基、未經取代或經C1-C12烷基或SO2-C1-C6烷基取代之S(O)m-苯基；或R15係SO2O-苯基，其係未經取代或經C1-C12烷基取代；或係二苯基膦醯基或二(C1-C4烷氧基)-膦醯基；m係1或2；R'14具有針對R14所給出含義中之一者；R'15具有針對R15所給出含義中之一者；X1係O、S、SO或SO2；X2係O、CO、S或直接鍵；R16係C6-C20芳基或C3-C20雜芳基，其各係未經取代或經一或多個以下基團取代：苯基、鹵素、C1-C4鹵代烷基、CN、NO2、OR17、SR18、NR19R20或間雜有一或多個O、S或NR26之C1-C20烷基；或其各經一或多個C1-C20烷基取代，該C1-C20烷基係未經取代或經一或多個以下基團取代：鹵 素、COOR17、CONR19R20、苯基、C3-C8環烷基、C3-C20雜芳基、C6-C20芳氧基羰基、C3-C20雜芳氧基羰基、OR17、SR18或NR19R20；或R16係氫、C1-C20烷基，該C1-C20烷基係未經取代或經一或多個以下基團取代：鹵素、苯基、OH、SH、CN、C3-C6烯氧基、OCH2CH2CN、OCH2CH2(CO)O(C1-C4烷基)、O(CO)-(C1-C4烷基)、O(CO)-苯基、(CO)OH或(CO)O(C1-C4烷基)；或R16係C2-C12烷基，其間雜有一或多個O、S或NR26；或R16係(CH2CH2O)n+1H、(CH2CH2O)n(CO)-(C1-C8烷基)、C2-C12烯基或C3-C8環烷基；或R16係經SR18取代之苯基，其中該基團R18表示鍵結至該COR16基團所附接之該咔唑部分之該苯基或萘基環的直接鍵；n係1至20；R17係氫、苯基-C1-C3烷基、C1-C20烷基，其係未經取代或經一或多個以下基團取代：鹵素、OH、SH、CN、C3-C6烯氧基、OCH2CH2CN、OCH2CH2(CO)O(C1-C4烷基)、O(CO)-(C1-C4烷基)、O(CO)-(C2-C4)烯基、O(CO)-苯基、(CO)OH、(CO)O(C1-C4烷基)、C3-C20環烷基、SO2-(C1-C4鹵代烷基)、O(C1-C4鹵代烷基)或間雜有一或多個O之C3-C20環烷基；或R17係C2-C20烷基，其間雜有一或多個O、S或NR26；或R17係(CH2CH2O)n+1H、(CH2CH2O)n(CO)-(C1-C8烷基)、C1-C8烷醯基、C2-C12烯基、C3-C6烯醯基或未經間雜或間雜有一或多個O、S、CO或NR26之C3-C20環烷基； 或R17係C1-C8烷基-C3-C10環烷基，其係未經間雜或間雜有一或多個O；或R17係苯甲醯基，其係未經取代或經一或多個C1-C6烷基、鹵素、OH或C1-C3烷氧基取代；或R17係苯基、萘基或C3-C20雜芳基，其各係未經取代或經一或多個以下基團取代：鹵素、OH、C1-C12烷基、C1-C12烷氧基、CN、NO2、苯基-C1-C3烷氧基、苯氧基、C1-C12烷基硫基、苯基硫基、N(C1-C12烷基)2、二苯基-胺基或 或R17形成鍵結至該基團或所處之苯基或萘基環之其中一個碳原子的直接鍵；R18係氫、C2-C12烯基、C3-C20環烷基或苯基-C1-C3烷基，其中該C2-C12烯基、C3-C20環烷基或苯基-C1-C3烷基係未經間雜或間雜有一或多個O、S、CO、NR26或COOR17；或R18係C1-C20烷基，其係未經取代或經一或多個以下基團取代：OH、SH、CN、C3-C6烯氧基、OCH2CH2CN、OCH2CH2(CO)O(C1-C4烷基)、O(CO)-(C2-C4)烯基、O(CO)-(C1-C4烷基)、O(CO)-苯基或(CO)OR17；或R18係C2-C20烷基，其間雜有一或多個O、S、CO、NR26或COOR17；或R18係(CH2CH2O)nH、(CH2CH2O)n(CO)-(C1-C8烷基)、C2-C8烷醯基或C3-C6烯醯基；或R18係苯甲醯基，其係未經取代或經一或多個以下基團取代：C1-C6烷基、鹵素、OH、C1-C4烷氧基或C1-C4烷基硫 基；或R18係苯基、萘基或C3-C20雜芳基，其各係未經取代或經一或多個以下基團取代：鹵素、C1-C12烷基、C1-C4鹵代烷基、C1-C12烷氧基、CN、NO2、苯基-C1-C3烷氧基、苯氧基、C1-C12烷基硫基、苯基硫基、N(C1-C12烷基)2、二苯基胺基、(CO)O(C1-C8烷基)、(CO)-C1-C8烷基、(CO)N(C1- C8烷基)2或R19及R20彼此獨立地為氫、C1-C20烷基、C2-C4羥基烷基、C2-C10烷氧基烷基、C2-C5烯基、C3-C20環烷基、苯基-C1-C3烷基、C1-C8烷醯基、C1-C8烷醯基氧基、C3-C12烯醯基、SO2-(C1-C4鹵代烷基)或苯甲醯基；或R19及R20係苯基、萘基或C3-C20雜芳基，其各係未經取代或經一或多個以下基團取代：鹵素、C1-C4鹵代烷基、C1-C20烷氧基、C1-C12烷基、苯甲醯基或C1-C12烷氧基；或R19及R20與其所附接之N原子一起形成未經間雜或間雜有O、S或NR17之5員或6員飽和或不飽和環，且該5員或6員飽和或不飽和環係未經取代或經一或多個以下基團取代：C1-C20烷基、C1-C20烷氧基、=O、OR17、SR18、NR21R22、(CO)R23、NO2、鹵素、C1-C4-鹵代烷基、CN、苯基、 或未經間雜或間雜有一或多個O、S、CO或NR17之C3-C20環烷基；或R19及R20與其所附接之N原子一起形成雜芳香族環系統，該環系統係未經取代或經一或多個以下基團取代：C1-C20烷基、C1-C4鹵代烷基、C1-C20烷氧基、=O、OR17、SR18、 NR21R22、(CO)R23、、鹵素、NO2、CN、苯基或未經間雜或間雜有一或多個O、S、CO或NR17之C3-C20環烷基；R21及R22彼此獨立地為氫、C1-C20烷基、C1-C4鹵代烷基、C3-C10環烷基或苯基；或R21及R22與其所附接之N原子一起形成未經間雜或間雜有O、S或NR26之5員或6員飽和或不飽和環，且該5員或6員飽和或不飽和環係未稠合或該5員或6員飽和或不飽和環與苯環稠合；R23係氫、OH、C1-C20烷基、C1-C4鹵代烷基、間雜有一或多個O、CO或NR26之C2-C20烷基、未經間雜或間雜有O、S、CO或NR26之C3-C20環烷基，或R23係苯基、萘基、苯基-C1-C4烷基、OR17、SR18或NR21R22；R24係(CO)OR17、CONR19R20、(CO)R17；或R24具有針對R19及R20所給出含義中之一者；R25係COOR17、CONR19R20、(CO)R17；或R25具有針對R17所給出含義中之一者；R26係氫、C1-C20烷基、C1-C4鹵代烷基、C2-C20烷基，其間雜有一或多個O或CO；或係苯基-C1-C4烷基、C3-C8環烷基，其係未經間雜或間雜有一或多個O或CO；或係(CO)R19；或係苯基，其係未經取代或經一或多個以下基團取代：C1-C20烷基、鹵素、C1-C4鹵代烷基、OR17、SR18、NR19R20或 但條件為在該分子中存在至少一個基團或 該黑色顏料(E)包含一第一黑色顏料(E-1)，其中該第一黑色顏料(E-1)包含一具有式(E-I)所示之化合物、其幾何異構物、其鹽、或其幾何異構物之鹽： 於式(E-I)中，R1e及R6e相互獨立為氫原子、CH3、CF3、氟原子或氯原子；R2e、R3e、R4e、R5e、R7e、R8e、R9e及R10e係和其他全部相互獨立為氫原子、鹵素原子、R11e、COOH、COOR11e、COO-、CONH2、CONHR11e、CONR11eR12e、CN、OH、OR11e、COCR11e、OOCNH2、OOCNHR11e、OOCNR11eR12e、NO2、NH2、NHR11e、NR11eR12e、NHCOR12e、NR11eCOR12e、N=CH2、N=CHR11e、N=CR11eR12e、SH、SR11e、SOR11e、SO2R11e、SO3R11e、SO3H、SO3-、SO2NH2、SO2NHR11e或SO2NR11eR12e；且選自由R2e與R3e、R3e與R4e、R4e與R5e、R7e與R8e、R8e與R9e、及R9e與R10e所組成之群組中之至少1個組合，係為相互直接鍵結，或者藉由氧原子、硫原子、NH或NR11e橋接而相互鍵結；R11e及R12e相互獨立為碳數1至12之烷基、碳數3至12之環烷基、碳數2至12之烯基、碳數3至12之環烯基或碳數2至12之炔基。 Therefore, the present invention provides a black photosensitive resin comprising: an alkali-soluble resin (A); a compound (B) having an ethylenically unsaturated group; a photoinitiator (C); a solvent (D); and a black pigment ( E), wherein the photoinitiator (C) includes a first photoinitiator (C-1) having a structure represented by formula (CI): In formula (CI), R 1 , R 2 , R 3 , R 4 , R 5 , R 6 , R 7 and R 8 are independently hydrogen, C 1 -C 20 alkyl, , COR 16 , OR 17 , halogen, NO 2 or Or R 1 and R 2 , R 2 and R 3 , R 3 and R 4 , R 5 and R 6 , R 6 and R 7 or R 7 and R 8 are independent of each other. Substituted C 2 -C 10 alkenyl; or R 1 and R 2 , R 2 and R 3 , R 3 and R 4 , R 5 and R 6 , R 6 and R 7, or R 7 and R 8 are independently common with each other Is-(CH 2 ) p -Y- (CH 2 ) q- ; or R 1 and R 2 , R 2 and R 3 , R 3 and R 4 , R 5 and R 6 , R 6 and R 7 or R 7 And R 8 independently of each other are Provided that at least one of R 1 and R 2 , R 2 and R 3 , R 3 and R 4 , R 5 and R 6 , R 6 and R 7 or R 7 and R 8 , R 9 , R 10 , R 11 and R 12 are independently of each other hydrogen, C 1 -C 20 alkyl, the C 1 -C 20 alkyl is unsubstituted or substituted with one or more of the following groups: halogen , Phenyl, CN, OH, SH, C 1 -C 4 -alkoxy, (CO) OH or (CO) O (C 1 -C 4 alkyl); or R 9 , R 10 , R 11 and R 12 is independently unsubstituted phenyl or phenyl substituted with one or more of the following: C 1 -C 6 alkyl, halogen, CN, OR 17 , SR 18 or NR 19 R 20 ; or R 9 , R 10 , R 11 and R 12 are independently of each other halogen, CN, OR 17 , SR 18 , SOR 18 , SO 2 R 18 or NR 19 R 20 , wherein the substituents OR 17 , SR 18 or NR 19 R 20 optionally forms a 5- or 6-membered ring with one carbon atom in the naphthyl ring via these groups R 17 , R 18 , R 19 and / or R 20 ; or R 9 , R 10 , R 11 and R 12 Independent of each other , COR 16 or NO 2 ; Y is O, S, NR 26 or direct bond; p is integer 0, 1, 2 or 3; q is integer 1, 2 or 3; X is CO or direct bond; R 13 is C 1- C 20 alkyl, which is unsubstituted or substituted with one or more of the following groups: halogen, R 17 , COOR 17 , OR 17 , SR 18 , CONR 19 R 20 , NR 19 R 20 , PO (OC k H 2k + 1 ) 2 or R 13 or C 2 -C 20 alkyl-based, have therebetween one or more heteroatoms O, S, SO, SO 2 , NR 26 or CO.'S, or based C 2 -C 12 alkenyl which is interrupted by system or a non-interrupted Or more O, CO or NR 26 , wherein the interspersed C 2 -C 20 alkyl and the unsaturated or interspersed C 2 -C 12 alkenyl are unsubstituted or substituted with one or more halogens ; Or R 13 is C 4 -C 8 cycloalkenyl, C 2 -C 12 alkynyl or C 3 -C 10 cycloalkyl without one or more O, S, CO or NR 26 ; or R 13 is phenyl or naphthyl, each of which is unsubstituted or substituted with one or more of the following groups: OR 17 , SR 18 , NR 19 R 20 , COR 16, CN, NO 2, halogen, C 1 -C 20 alkyl, C 1 -C 4 haloalkyl, interrupted by one or more O, S, CO or NR C 26 of 2 -C 20 alkyl; or Each is substituted with a C 3 -C 10 cycloalkyl or a C 3 -C 10 cycloalkyl substituted with one or more O, S, CO or NR 26 ; k is an integer from 1 to 10; R 14 is hydrogen, C 3- C 8 cycloalkyl, C 2 -C 5 alkenyl, C 1 -C 20 alkoxy or C 1 -C 20 alkyl, which are unsubstituted or substituted with one or more of the following groups: halogen, benzene , C 1 -C 20 alkylphenyl or CN; or R 14 phenyl or naphthyl, each of which is unsubstituted or substituted with one or more of the following groups: C 1 -C 6 alkyl, C 1 -C 4 haloalkyl, halogen, CN, OR 17 , SR 18 and / or NR 19 R 20 ; or R 14 is C 3 -C 20 heteroaryl, C 1 -C 8 alkoxy, benzyloxy or benzene Benzyloxy and phenoxy are unsubstituted or substituted with one or more of the following groups: C 1 -C 6 alkyl, C 1 -C 4 haloalkyl and / or halogen; R 15 is C 6- C 20 aryl or C 3 -C 20 heteroaryl, each of which is unsubstituted or substituted with one or more of the following groups: phenyl, halogen, C 1 -C 4 haloalkyl, CN, NO 2 , OR 17 , SR 18 , NR 19 R 20 , PO (OC k H 2k + 1 ) 2 , SO-C 1 -C 10 alkyl, SO 2 -C 1 -C 10 alkyl, interspersed with one or more O, S or NR 26 C 2 -C 20 alkyl; or each substituted by C 1 -C 20 alkyl, the C 1 -C 20 alkyl is unsubstituted or substituted with one or more of the following groups: halogen, COOR 17 , CONR 19 R 20 , phenyl, C 3 -C 8 cycloalkyl, C 3 -C 20 heteroaryl, C 6 -C 20 aryloxycarbonyl, C 3 -C 20 heteroaryloxycarbonyl, OR 17 , SR 18 or NR 19 R 20 ; or R 15 is hydrogen, C 2 -C 12 alkenyl, C 3 -C 8 cycloalkyl without one or more O, CO or NR 26 ; or R 15 Is a C 1 -C 20 alkyl group, which is unsubstituted or substituted with one or more of the following groups: halogen, OR 17 , SR 18 , C 3 -C 8 cycloalkyl, C 3 -C 20 heteroaryl , C 6 -C 20 aryloxycarbonyl, C 3 -C 20 heteroaryloxycarbonyl, NR 19 R 20 , COOR 17 , CONR 19 R 20 , PO (OC k H 2k + 1 ) 2 , , Phenyl; or the C 1 -C 20 alkyl is substituted with phenyl, the phenyl is substituted with halogen, C 1 -C 20 alkyl, C 1 -C 4 haloalkyl, OR 17 , SR 18 or NR 19 R 20 is substituted; or R 15 is a C 2 -C 20 alkyl group with one or more O, SO or SO 2 interspersed therebetween, and the interspersed C 2 -C 20 alkyl group is unsubstituted or one or more Substituted with the following groups: halogen, OR 17 , COOR 17 , CONR 19 R 20 , phenyl or phenyl substituted with OR 17 , SR 18 or NR 19 R 20 ; or R 15 is a C 2 -C 20 alkylfluorenyl Or benzamidine, which is unsubstituted or substituted with one or more of the following groups: C 1 -C 6 alkyl, halogen, phenyl, OR 17 , SR 18 or NR 19 R 20 ; or R 15 Unsubstituted or substituted with one or more OR 17 or naphthylmethyl or C 3 -C 14 heteroarylcarbonyl; or R 15 is C 2 -C 12 alkoxycarbonyl, which is unsubstituted or unsubstituted One or more O and the interspersed or unsaturated C 2 -C 12 alkoxycarbonyl group is unsubstituted or substituted with one or more hydroxyl groups; or R 15 is phenoxycarbonyl group, which is unsubstituted or by one or more of the following groups: C 1 -C 6 alkyl, halogen, C 1 -C 4 haloalkyl, Phenyl, OR 17, SR 18 or NR 19 R 20; or R 15 based CN, CONR 19 R 20, NO 2, C 1 -C 4 haloalkyl, S (O) m -C 1 -C 6 alkyl, unsubstituted or C 1 -C 12 alkyl or SO 2 -C 1 -C 6 alkyl group substituted with the S (O) m - group; or R 15 SO 2 O- based phenyl, which is unsubstituted Department or by C 1 -C 12 substituted alkyl; or based diphenylphosphino acyl or di (C 1 -C 4 alkoxy) - phosphino acyl; m lines 1 or 2; R '14 R 14 having the targeted Give one of the meanings; R '15 has one of the meanings given for R 15 ; X 1 is O, S, SO, or SO 2 ; X 2 is O, CO, S, or a direct bond; R 16 C 6 -C 20 aryl or C 3 -C 20 heteroaryl, each of which is unsubstituted or substituted with one or more of the following groups: phenyl, halogen, C 1 -C 4 haloalkyl, CN, NO 2 , OR 17 , SR 18 , NR 19 R 20 or a C 1 -C 20 alkyl group with one or more O, S or NR 26 interspersed; or each of them substituted with one or more C 1 -C 20 alkyl The C 1 -C 20 alkyl is unsubstituted or substituted with one or more of the following groups: halogen, COOR 17 , CONR 19 R 20 , phenyl, C 3 -C 8 cycloalkyl, C 3 -C 20 heteroaryl, C 6 -C 20 aryloxycarbonyl, C 3 -C 20 heteroaryloxycarbonyl, OR 17 , SR 18 or NR 19 R 20 ; or R 16 is hydrogen, C 1 -C 20 alkyl, the C 1 -C 20 alkyl is unsubstituted or Multiple substitutions of: halogen, phenyl, OH, SH, CN, C 3 -C 6 alkenyloxy, OCH 2 CH 2 CN, OCH 2 CH 2 (CO) O (C 1 -C 4 alkyl) , O (CO)-(C 1 -C 4 alkyl), O (CO) -phenyl, (CO) OH or (CO) O (C 1 -C 4 alkyl); or R 16 is C 2- C 12 alkyl, with one or more O, S or NR 26 interspersed between them; or R 16 series (CH 2 CH 2 O) n + 1 H, (CH 2 CH 2 O) n (CO)-(C 1- C 8 alkyl), C 2 -C 12 alkenyl or C 3 -C 8 cycloalkyl; or R 16 is a phenyl substituted with SR 18 , wherein the group R 18 represents a bond to the COR 16 group A direct bond of the phenyl or naphthyl ring of the carbazole moiety attached; n is 1 to 20; R 17 is hydrogen, phenyl-C 1 -C 3 alkyl, C 1 -C 20 alkyl, It is unsubstituted or substituted with one or more of the following groups: halogen, OH, SH, CN, C 3 -C 6 alkenyloxy, OCH 2 CH 2 CN, OCH 2 CH 2 (CO) O (C 1 -C 4 alkyl), O (CO)-(C 1 -C 4 alkyl), O (CO)-(C 2 -C 4 ) alkenyl, O (CO) -phenyl, (CO) OH, (CO) O (C 1 -C 4 alkyl), C 3 -C 20 Alkyl, SO 2 - (C 1 -C 4 haloalkyl), O (C 1 -C 4 haloalkyl) or interrupted by one or more O of C 3 -C 20 cycloalkyl; or R 17 based C 2 - C 20 alkyl with one or more O, S or NR 26 interspersed between them; or R 17 based on (CH 2 CH 2 O) n + 1 H, (CH 2 CH 2 O) n (CO)-(C 1- (C 8 alkyl), C 1 -C 8 alkyl, C 2 -C 12 alkenyl, C 3 -C 6 alkenyl or one or more O, S, CO or NR 26 C 3 -C 20 cycloalkyl; or R 17 is C 1 -C 8 alkyl-C 3 -C 10 cycloalkyl, which is one or more O without interspersed or interspersed; or R 17 is benzamidine Group, which is unsubstituted or substituted with one or more C 1 -C 6 alkyl, halogen, OH or C 1 -C 3 alkoxy; or R 17 is phenyl, naphthyl or C 3 -C 20 Heteroaryl, each of which is unsubstituted or substituted with one or more of the following groups: halogen, OH, C 1 -C 12 alkyl, C 1 -C 12 alkoxy, CN, NO 2 , phenyl- C 1 -C 3 alkoxy, phenoxy, C 1 -C 12 alkylthio, phenylthio, N (C 1 -C 12 alkyl) 2 , diphenyl-amino or Or R 17 forms a bond to the group or Direct bond to one of the carbon atoms of the phenyl or naphthyl ring; R 18 is hydrogen, C 2 -C 12 alkenyl, C 3 -C 20 cycloalkyl or phenyl-C 1 -C 3 alkyl , Wherein the C 2 -C 12 alkenyl, C 3 -C 20 cycloalkyl or phenyl-C 1 -C 3 alkyl is one or more O, S, CO, NR 26 or COOR 17 ; or R 18 is a C 1 -C 20 alkyl group, which is unsubstituted or substituted with one or more of the following groups: OH, SH, CN, C 3 -C 6 alkenyloxy, OCH 2 CH 2 CN , OCH 2 CH 2 (CO) O (C 1 -C 4 alkyl), O (CO)-(C 2 -C 4 ) alkenyl, O (CO)-(C 1 -C 4 alkyl), O (CO) -phenyl or (CO) OR 17 ; or R 18 is a C 2 -C 20 alkyl group, which is interspersed with one or more O, S, CO, NR 26 or COOR 17 ; or R 18 is (CH 2 CH 2 O) n H, (CH 2 CH 2 O) n (CO)-(C 1 -C 8 alkyl), C 2 -C 8 alkyl or C 3 -C 6 alkenyl; or R 18 Is benzamidine, which is unsubstituted or substituted with one or more of the following groups: C 1 -C 6 alkyl, halogen, OH, C 1 -C 4 alkoxy, or C 1 -C 4 alkyl Thio; or R 18- based phenyl, naphthyl or C 3 -C 20 heteroaryl, each of which is unsubstituted or substituted with one or more of the following groups: halogen, C 1 -C 12 alkyl, C 1 -C 4 haloalkyl, C 1 -C 12 alkoxy, CN, NO 2 , phenyl-C 1 -C 3 alkoxy, phenoxy, C 1 -C 12 alkylthio, phenylthio, N (C 1 -C 12 alkyl) 2 , diphenylamino, (CO) O (C 1 -C 8 alkyl), (CO) -C 1- C 8 alkyl, (CO) N (C 1 -C 8 alkyl) 2 or R 19 and R 20 are each independently hydrogen, C 1 -C 20 alkyl, C 2 -C 4 hydroxyalkyl, C 2 -C 10 alkoxyalkyl, C 2 -C 5 alkenyl, C 3- C 20 cycloalkyl, phenyl-C 1 -C 3 alkyl, C 1 -C 8 alkylfluorenyl, C 1 -C 8 alkylfluorenyloxy, C 3 -C 12 alkenyl, SO 2- ( C 1 -C 4 haloalkyl) or benzamidine; or R 19 and R 20 are phenyl, naphthyl or C 3 -C 20 heteroaryl, each of which is unsubstituted or substituted with one or more of the following Group substitution: halogen, C 1 -C 4 haloalkyl, C 1 -C 20 alkoxy, C 1 -C 12 alkyl, benzamidine or C 1 -C 12 alkoxy; or R 19 and R 20 With its attached N atom to form a 5- or 6-membered saturated or unsaturated ring which is not interspersed or interspersed with O, S or NR 17 , and the 5- or 6-membered saturated or unsaturated ring system is unsubstituted or Substituted by one or more of the following groups: C 1 -C 20 alkyl, C 1 -C 20 alkoxy, = O, OR 17 , SR 18 , NR 21 R 22 , (CO) R 23 , NO 2 , Halogen, C 1 -C 4 -haloalkyl, CN, phenyl, Or C 3 -C 20 cycloalkyl without one or more O, S, CO or NR 17 ; or R 19 and R 20 together with the N atom to which they are attached form a heteroaromatic ring system, the The ring system is unsubstituted or substituted with one or more of the following groups: C 1 -C 20 alkyl, C 1 -C 4 haloalkyl, C 1 -C 20 alkoxy, = O, OR 17 , SR 18 , NR 21 R 22 , (CO) R 23 , , Halogen, NO 2 , CN, phenyl or C 3 -C 20 cycloalkyl without one or more O, S, CO or NR 17 ; R 21 and R 22 are independently hydrogen, C 1- C 20 alkyl, C 1 -C 4 haloalkyl, C 3 -C 10 cycloalkyl, or phenyl; or R 21 and R 22 together with the N atom to which they are attached are uninterspersed or interspersed with O, 5 or 6 membered saturated or unsaturated rings of S or NR 26 , and the 5 or 6 membered saturated or unsaturated ring system is not fused or the 5 or 6 membered saturated or unsaturated ring is fused with a benzene ring; R 23 is hydrogen, OH, C 1 -C 20 alkyl, C 1 -C 4 haloalkyl, C 2 -C 20 alkyl interspersed with one or more O, CO or NR 26 , unsaturated or interspersed O C 3 -C 20 cycloalkyl, S, CO, or NR 26 , or R 23 is phenyl, naphthyl, phenyl-C 1 -C 4 alkyl, OR 17 , SR 18 or NR 21 R 22 ; R 24 series (CO) OR 17 , CONR 19 R 20 , (CO) R 17 ; or R 24 has one of the meanings given for R 19 and R 20 ; R 25 series COOR 17 , CONR 19 R 20 , ( CO) R 17 ; or R 25 has one of the meanings given for R 17 ; R 26 is hydrogen, C 1 -C 20 alkyl, C 1 -C 4 haloalkyl, C 2 -C 20 alkyl, In the meantime One or more O or CO; or a phenyl-based -C 1 -C 4 alkyl, C 3 -C 8 cycloalkyl, which is based not interrupted or is interrupted by one or more O or CO; or tie (CO) R 19 ; or is phenyl, which is unsubstituted or substituted with one or more of the following groups: C 1 -C 20 alkyl, halogen, C 1 -C 4 haloalkyl, OR 17 , SR 18 , NR 19 R 20 or Provided that at least one group is present in the molecule or The black pigment (E) includes a first black pigment (E-1), wherein the first black pigment (E-1) includes a compound having a formula (EI), a geometric isomer thereof, a salt thereof, Or its geometric isomer salt: In formula (EI), R 1e and R 6e are each independently a hydrogen atom, CH 3 , CF 3 , fluorine atom or chlorine atom; R 2e , R 3e , R 4e , R 5e , R 7e , R 8e , R 9e And R 10e series and all others are hydrogen atom, halogen atom, R 11e , COOH, COOR 11e , COO-, CONH 2 , CONHR 11e , CONR 11e R 12e , CN, OH, OR 11e , COCR 11e , OOCNH 2 , OOCNHR 11e , OOCNR 11e R 12e , NO 2 , NH 2 , NHR 11e , NR 11e R 12e , NHCOR 12e , NR 11e COR 12e , N = CH 2 , N = CHR 11e , N = CR 11e R 12e , SH, SR 11e , SOR 11e , SO 2 R 11e , SO 3 R 11e , SO 3 H, SO 3- , SO 2 NH 2 , SO 2 NHR 11e, or SO 2 NR 11e R 12e ; and selected from R 2e and R 3e , At least one combination of the group consisting of R 3e and R 4e , R 4e and R 5e , R 7e and R 8e , R 8e and R 9e , and R 9e and R 10e , is directly bonded to each other, or Bonded to each other by bridging with oxygen atom, sulfur atom, NH or NR 11e ; R 11e and R 12e are independently of each other alkyl groups having 1 to 12 carbon atoms, cycloalkyl groups having 3 to 12 carbon atoms, and 2 to 12 carbon atoms Alkenyl, cycloalkenyl having 3 to 12 carbons, or alkynyl having 2 to 12 carbons.

本發明亦提供一種黑色圖案，其係藉由前述之黑色感光性樹脂組成物經一預烤處理、一曝光處理、一顯影處理及一後烤處理所形成。 The present invention also provides a black pattern formed by the aforementioned black photosensitive resin composition through a pre-baking process, an exposure process, a developing process, and a post-baking process.

本發明再提供一種液晶顯示元件，係包含前述之黑色圖案。 The present invention further provides a liquid crystal display device, which includes the aforementioned black pattern.

本發明提供一種黑色感光性樹脂，其包含：鹼可溶性樹脂(A)；具有乙烯性不飽和基之化合物(B)；光起始劑(C)；溶劑(D)；及黑色顏料(E)，其中：該光起始劑(C)包含一具有式(C-I)所示結構之第一光起始劑(C-1)： 於式(C-I)中，R1、R2、R3、R4、R5、R6、R7及R8彼此獨立地為氫、C1-C20烷基、、COR16、OR17、鹵 素、NO2或或R1及R2、R2及R3、R3及R4、R5及R6、R6及R7或R7及R8彼此獨立地為經取代之C2-C10烯基；或R1及R2、R2及R3、R3及R4、R5及R6、R6及R7或R7及R8彼此獨立地共同為-(CH2)p-Y-(CH2)q-；或R1及R2、R2及R3、R3及R4、R5及R6、R6及R7或R7及R8彼此獨立地共同為但條件為R1及R2、R2及R3、R3及R4、R5及R6、R6及R7或 R7及R8中之至少一對係，R9、R10、R11及R12彼此獨立地為氫、C1-C20烷基，該C1-C20烷基係未經取代或經一或多個以下基團取代：鹵素、苯基、CN、OH、SH、C1-C4-烷氧基、(CO)OH或(CO)O(C1-C4烷基)；或R9、R10、R11及R12彼此獨立地為未經取代之苯基或經一或多個以下基團取代之苯基：C1-C6烷基、鹵素、CN、OR17、SR18或NR19R20；或R9、R10、R11及R12彼此獨立地為鹵素、CN、OR17、SR18、SOR18、SO2R18或NR19R20，其中該等取代基OR17、SR18或NR19R20視情況經由該等基團R17、R18、R19及/或R20與萘基環中一個碳原子形成5員或6員環；或R9、R10、R11及R12彼此獨立地為、COR16或NO2； Y係O、S、NR26或直接鍵；p係整數0、1、2或3；q係整數1、2或3；X係CO或直接鍵；R13係C1-C20烷基，其係未經取代或經一或多個以下基團取代：鹵素、R17、COOR17、OR17、SR18、CONR19R20、NR19R20、PO(OCkH2k+1)2或或R13係C2-C20烷基，其間雜有一或多個O、S、SO、SO2、NR26或CO，或係C2-C12烯基，其係未經間雜或間雜有一或多個O、CO或NR26，其中該經間雜之C2-C20烷基及該未經間雜或經間雜之C2-C12烯基係未經取代或經一或多個鹵素取代；或R13係C4-C8環烯基、C2-C12炔基或未經間雜或間雜有一或多個O、S、CO或NR26之C3-C10環烷基；或R13係苯基或萘基，其各為未經取代或經一或多個以下基團取代：OR17、SR18、NR19R20、COR16、CN、NO2、鹵素、C1-C20烷基、C1-C4鹵代烷基、間雜有一或多個O、S、CO或NR26之C2-C20烷基；或其各經C3-C10環烷基或間雜有一或多個O、S、CO或NR26之C3-C10環烷基取代；k係整數1至10；R14係氫、C3-C8環烷基、C2-C5烯基、C1-C20烷氧基或C1-C20烷基，其係未經取代或經一或多個以下基團取代：鹵素、苯基、C1-C20烷基苯基或CN； 或R14係苯基或萘基，其各未經取代或經一或多個以下基團取代：C1-C6烷基、C1-C4鹵代烷基、鹵素、CN、OR17、SR18及/或NR19R20；或R14係C3-C20雜芳基、C1-C8烷氧基、苄氧基或苯氧基，該苄氧基及苯氧基係未經取代或經一或多個以下基團取代：C1-C6烷基、C1-C4鹵代烷基及/或鹵素；R15係C6-C20芳基或C3-C20雜芳基，其各係未經取代或經一或多個以下基團取代：苯基、鹵素、C1-C4鹵代烷基、CN、NO2、OR17、SR18、NR19R20、PO(OCkH2k+1)2、SO-C1-C10烷基、SO2-C1-C10烷基、間雜有一或多個O、S或NR26之C2-C20烷基；或其各經C1-C20烷基取代，該C1-C20烷基係未經取代或經一或多個以下基團取代：鹵素、COOR17、CONR19R20、苯基、C3-C8環烷基、C3-C20雜芳基、C6-C20芳氧基羰基、C3-C20雜芳氧基羰基、OR17、SR18或NR19R20；或R15係氫、C2-C12烯基、未經間雜或間雜有一或多個O、CO或NR26之C3-C8環烷基；或R15係C1-C20烷基，其係未經取代或經一或多個以下基團取代：鹵素、OR17、SR18、C3-C8環烷基、C3-C20雜芳基、C6-C20芳氧基羰基、C3-C20雜芳氧基羰基、NR19R20、 COOR17、CONR19R20、PO(OCkH2k+1)2、 、苯基；或該C1-C20烷基係經苯基取代，該苯基係經鹵素、C1-C20烷基、C1-C4鹵代烷基、OR17、SR18或NR19R20取代；或R15係C2-C20烷基，其間雜有一或多個O、SO或SO2，且 該經間雜之C2-C20烷基係未經取代或經一或多個以下基團取代：鹵素、OR17、COOR17、CONR19R20、苯基或經OR17、SR18或NR19R20取代之苯基；或R15係C2-C20烷醯基或苯甲醯基，其係未經取代或經一或多個以下基團取代：C1-C6烷基、鹵素、苯基、OR17、SR18或NR19R20；或R15係未經取代或經一或多個OR17取代之萘甲醯基或係C3-C14雜芳基羰基；或R15係C2-C12烷氧基羰基，其係未經間雜或間雜有一或多個O且該經間雜或未經間雜之C2-C12烷氧基羰基係未經取代或經一或多個羥基取代；或R15係苯氧基羰基，其係未經取代或經一或多個以下基團取代：C1-C6烷基、鹵素、C1-C4鹵代烷基、苯基、OR17、SR18或NR19R20；或R15係CN、CONR19R20、NO2、C1-C4鹵代烷基、S(O)m-C1-C6烷基、未經取代或經C1-C12烷基或SO2-C1-C6烷基取代之S(O)m-苯基；或R15係SO2O-苯基，其係未經取代或經C1-C12烷基取代；或係二苯基膦醯基或二(C1-C4烷氧基)-膦醯基；m係1或2；R'14具有針對R14所給出含義中之一者；R'15具有針對R15所給出含義中之一者；X1係O、S、SO或SO2；X2係O、CO、S或直接鍵；R16係C6-C20芳基或C3-C20雜芳基，其各係未經取代或經一或多個以下基團取代：苯基、鹵素、C1-C4鹵代烷基、 CN、NO2、OR17、SR18、NR19R20或間雜有一或多個O、S或NR26之C1-C20烷基；或其各經一或多個C1-C20烷基取代，該C1-C20烷基係未經取代或經一或多個以下基團取代：鹵素、COOR17、CONR19R20、苯基、C3-C8環烷基、C3-C20雜芳基、C6-C20芳氧基羰基、C3-C20雜芳氧基羰基、OR17、SR18或NR19R20；或R16係氫、C1-C20烷基，該C1-C20烷基係未經取代或經一或多個以下基團取代：鹵素、苯基、OH、SH、CN、C3-C6烯氧基、OCH2CH2CN、OCH2CH2(CO)O(C1-C4烷基)、O(CO)-(C1-C4烷基)、O(CO)-苯基、(CO)OH或(CO)O(C1-C4烷基)；或R16係C2-C12烷基，其間雜有一或多個O、S或NR26；或R16係(CH2CH2O)n+1H、(CH2CH2O)n(CO)-(C1-C8烷基)、C2-C12烯基或C3-C8環烷基；或R16係經SR18取代之苯基，其中該基團R18表示鍵結至該COR16基團所附接之該咔唑部分之該苯基或萘基環的直接鍵；n係1至20；R17係氫、苯基-C1-C3烷基、C1-C20烷基，其係未經取代或經一或多個以下基團取代：鹵素、OH、SH、CN、C3-C6烯氧基、OCH2CH2CN、OCH2CH2(CO)O(C1-C4烷基)、O(CO)-(C1-C4烷基)、O(CO)-(C2-C4)烯基、O(CO)-苯基、(CO)OH、(CO)O(C1-C4烷基)、C3-C20環烷基、SO2-(C1-C4鹵代烷基)、O(C1-C4鹵代烷基)或間雜有一或多個O之C3-C20環烷基；或R17係C2-C20烷基，其間雜有一或多個O、S或NR26； 或R17係(CH2CH2O)n+1H、(CH2CH2O)n(CO)-(C1-C8烷基)、C1-C8烷醯基、C2-C12烯基、C3-C6烯醯基或未經間雜或間雜有一或多個O、S、CO或NR26之C3-C20環烷基；或R17係C1-C8烷基-C3-C10環烷基，其係未經間雜或間雜有一或多個O；或R17係苯甲醯基，其係未經取代或經一或多個C1-C6烷基、鹵素、OH或C1-C3烷氧基取代；或R17係苯基、萘基或C3-C20雜芳基，其各係未經取代或經一或多個以下基團取代：鹵素、OH、C1-C12烷基、C1-C12烷氧基、CN、NO2、苯基-C1-C3烷氧基、苯氧基、C1-C12烷基硫基、苯基硫基、N(C1-C12烷基)2、二苯基-胺基或 或R17形成鍵結至該基團或所處之苯基或萘基環之其中一個碳原子的直接鍵；R18係氫、C2-C12烯基、C3-C20環烷基或苯基-C1-C3烷基，其中該C2-C12烯基、C3-C20環烷基或苯基-C1-C3烷基係未經間雜或間雜有一或多個O、S、CO、NR26或COOR17；或R18係C1-C20烷基，其係未經取代或經一或多個以下基團取代：OH、SH、CN、C3-C6烯氧基、OCH2CH2CN、OCH2CH2(CO)O(C1-C4烷基)、O(CO)-(C2-C4)烯基、O(CO)-(C1-C4烷基)、O(CO)-苯基或(CO)OR17；或R18係C2-C20烷基，其間雜有一或多個O、S、CO、NR26或COOR17；或R18係(CH2CH2O)nH、(CH2CH2O)n(CO)-(C1-C8烷基)、 C2-C8烷醯基或C3-C6烯醯基；或R18係苯甲醯基，其係未經取代或經一或多個以下基團取代：C1-C6烷基、鹵素、OH、C1-C4烷氧基或C1-C4烷基硫基；或R18係苯基、萘基或C3-C20雜芳基，其各係未經取代或經一或多個以下基團取代：鹵素、C1-C12烷基、C1-C4鹵代烷基、C1-C12烷氧基、CN、NO2、苯基-C1-C3烷氧基、苯氧基、C1-C12烷基硫基、苯基硫基、N(C1-C12烷基)2、二苯基胺基、(CO)O(C1-C8烷基)、(CO)-C1-C8烷基、(CO)N(C1- C8烷基)2或R19及R20彼此獨立地為氫、C1-C20烷基、C2-C4羥基烷基、C2-C10烷氧基烷基、C2-C5烯基、C3-C20環烷基、苯基-C1-C3烷基、C1-C8烷醯基、C1-C8烷醯基氧基、C3-C12烯醯基、SO2-(C1-C4鹵代烷基)或苯甲醯基；或R19及R20係苯基、萘基或C3-C20雜芳基，其各係未經取代或經一或多個以下基團取代：鹵素、C1-C4鹵代烷基、C1-C20烷氧基、C1-C12烷基、苯甲醯基或C1-C12烷氧基；或R19及R20與其所附接之N原子一起形成未經間雜或間雜有O、S或NR17之5員或6員飽和或不飽和環，且該5員或6員飽和或不飽和環係未經取代或經一或多個以下基團取代：C1-C20烷基、C1-C20烷氧基、=O、OR17、SR18、NR21R22、(CO)R23、NO2、鹵素、C1-C4-鹵代烷基、CN、苯基、 或未經間雜或間雜有一或多個O、S、CO或NR17之C3-C20環烷基； 或R19及R20與其所附接之N原子一起形成雜芳香族環系統，該環系統係未經取代或經一或多個以下基團取代：C1-C20烷基、C1-C4鹵代烷基、C1-C20烷氧基、=O、OR17、SR18、NR21R22、(CO)R23、、鹵素、NO2、CN、苯基或未經間雜或間雜有一或多個O、S、CO或NR17之C3-C20環烷基；R21及R22彼此獨立地為氫、C1-C20烷基、C1-C4鹵代烷基、C3-C10環烷基或苯基；或R21及R22與其所附接之N原子一起形成未經間雜或間雜有O、S或NR26之5員或6員飽和或不飽和環，且該5員或6員飽和或不飽和環係未稠合或該5員或6員飽和或不飽和環與苯環稠合；R23係氫、OH、C1-C20烷基、C1-C4鹵代烷基、間雜有一或多個O、CO或NR26之C2-C20烷基、未經間雜或間雜有O、S、CO或NR26之C3-C20環烷基，或R23係苯基、萘基、苯基-C1-C4烷基、OR17、SR18或NR21R22；R24係(CO)OR17、CONR19R20、(CO)R17；或R24具有針對R19及R20所給出含義中之一者；R25係COOR17、CONR19R20、(CO)R17；或R25具有針對R17所給出含義中之一者；R26係氫、C1-C20烷基、C1-C4鹵代烷基、C2-C20烷基，其間雜有一或多個O或CO；或係苯基-C1-C4烷基、C3-C8環烷基，其係未經間雜或間雜有一或多個O或CO；或係(CO)R19；或係苯基，其係未經取代或經一或多個以下基團取代：C1-C20烷基、鹵素、C1-C4鹵代烷基、OR17、 SR18、NR19R20或 但條件為在該分子中存在至少一個基團或 該黑色顏料(E)包含一第一黑色顏料(E-1)，其中該第一黑色顏料(E-1)包含一具有式(E-I)所示之化合物、其幾何異構物、其鹽、或其幾何異構物之鹽： 於式(E-I)中，R1e及R6e相互獨立為氫原子、CH3、CF3、氟原子或氯原子；R2e、R3e、R4e、R5e、R7e、R8e、R9e及R10e係和其他全部相互獨立為氫原子、鹵素原子、R11e、COOH、COOR11e、COO-、CONH2、CONHR11e、CONR11eR12e、CN、OH、OR11e、COCR11e、OOCNH2、OOCNHR11e、OOCNR11eR12e、NO2、NH2、NHR11e、NR11eR12e、NHCOR12e、NR11eCOR12e、N=CH2、N=CHR11e、N=CR11eR12e、SH、SR11e、SOR11e、SO2R11e、SO3R11e、SO3H、SO3-、SO2NH2、SO2NHR11e或SO2NR11eR12e；且選自由R2e與R3e、R3e與R4e、R4e與R5e、R7e與R8e、R8e與R9e、及R9e與R10e所組成之群組中之至少1個組合，係為相互直接鍵 結，或者藉由氧原子、硫原子、NH或NR11e橋接而相互鍵結；R11e及R12e相互獨立為碳數1至12之烷基、碳數3至12之環烷基、碳數2至12之烯基、碳數3至12之環烯基或碳數2至12之炔基。 The present invention provides a black photosensitive resin comprising: an alkali-soluble resin (A); a compound (B) having an ethylenically unsaturated group; a photoinitiator (C); a solvent (D); and a black pigment (E) , Wherein: the photoinitiator (C) includes a first photoinitiator (C-1) having a structure represented by formula (CI): In formula (CI), R 1 , R 2 , R 3 , R 4 , R 5 , R 6 , R 7 and R 8 are independently hydrogen, C 1 -C 20 alkyl, , COR 16 , OR 17 , halogen, NO 2 or Or R 1 and R 2 , R 2 and R 3 , R 3 and R 4 , R 5 and R 6 , R 6 and R 7 or R 7 and R 8 are independent of each other. Substituted C 2 -C 10 alkenyl; or R 1 and R 2 , R 2 and R 3 , R 3 and R 4 , R 5 and R 6 , R 6 and R 7, or R 7 and R 8 are independently common with each other Is-(CH 2 ) p -Y- (CH 2 ) q- ; or R 1 and R 2 , R 2 and R 3 , R 3 and R 4 , R 5 and R 6 , R 6 and R 7 or R 7 And R 8 independently of each other are Provided that at least one of R 1 and R 2 , R 2 and R 3 , R 3 and R 4 , R 5 and R 6 , R 6 and R 7 or R 7 and R 8 , R 9 , R 10 , R 11 and R 12 are independently of each other hydrogen, C 1 -C 20 alkyl, the C 1 -C 20 alkyl is unsubstituted or substituted with one or more of the following groups: halogen , Phenyl, CN, OH, SH, C 1 -C 4 -alkoxy, (CO) OH or (CO) O (C 1 -C 4 alkyl); or R 9 , R 10 , R 11 and R 12 is independently unsubstituted phenyl or phenyl substituted with one or more of the following: C 1 -C 6 alkyl, halogen, CN, OR 17 , SR 18 or NR 19 R 20 ; or R 9 , R 10 , R 11 and R 12 are independently of each other halogen, CN, OR 17 , SR 18 , SOR 18 , SO 2 R 18 or NR 19 R 20 , wherein the substituents OR 17 , SR 18 or NR 19 R 20 optionally forms a 5- or 6-membered ring with one carbon atom in the naphthyl ring via these groups R 17 , R 18 , R 19 and / or R 20 ; or R 9 , R 10 , R 11 and R 12 Independent of each other , COR 16 or NO 2 ; Y is O, S, NR 26 or direct bond; p is integer 0, 1, 2 or 3; q is integer 1, 2 or 3; X is CO or direct bond; R 13 is C 1- C 20 alkyl, which is unsubstituted or substituted with one or more of the following groups: halogen, R 17 , COOR 17 , OR 17 , SR 18 , CONR 19 R 20 , NR 19 R 20 , PO (OC k H 2k + 1 ) 2 or R 13 or C 2 -C 20 alkyl-based, have therebetween one or more heteroatoms O, S, SO, SO 2 , NR 26 or CO.'S, or based C 2 -C 12 alkenyl which is interrupted by system or a non-interrupted Or more O, CO or NR 26 , wherein the interspersed C 2 -C 20 alkyl and the unsaturated or interspersed C 2 -C 12 alkenyl are unsubstituted or substituted with one or more halogens ; Or R 13 is C 4 -C 8 cycloalkenyl, C 2 -C 12 alkynyl or C 3 -C 10 cycloalkyl without one or more O, S, CO or NR 26 ; or R 13 is phenyl or naphthyl, each of which is unsubstituted or substituted with one or more of the following groups: OR 17 , SR 18 , NR 19 R 20 , COR 16, CN, NO 2, halogen, C 1 -C 20 alkyl, C 1 -C 4 haloalkyl, interrupted by one or more O, S, CO or NR C 26 of 2 -C 20 alkyl; or Each is substituted with a C 3 -C 10 cycloalkyl or a C 3 -C 10 cycloalkyl substituted with one or more O, S, CO or NR 26 ; k is an integer from 1 to 10; R 14 is hydrogen, C 3- C 8 cycloalkyl, C 2 -C 5 alkenyl, C 1 -C 20 alkoxy or C 1 -C 20 alkyl, which are unsubstituted or substituted with one or more of the following groups: halogen, benzene , C 1 -C 20 alkylphenyl or CN; or R 14 is phenyl or naphthyl, each of which is unsubstituted or substituted with one or more of the following groups: C 1 -C 6 alkyl, C 1 -C 4 haloalkyl, halogen, CN, OR 17 , SR 18 and / or NR 19 R 20 ; or R 14 is a C 3 -C 20 heteroaryl, C 1 -C 8 alkoxy, benzyloxy or benzene Benzyloxy and phenoxy are unsubstituted or substituted with one or more of the following groups: C 1 -C 6 alkyl, C 1 -C 4 haloalkyl and / or halogen; R 15 is C 6- C 20 aryl or C 3 -C 20 heteroaryl, each of which is unsubstituted or substituted with one or more of the following groups: phenyl, halogen, C 1 -C 4 haloalkyl, CN, NO 2 , OR 17 , SR 18 , NR 19 R 20 , PO (OC k H 2k + 1 ) 2 , SO-C 1 -C 10 alkyl, SO 2 -C 1 -C 10 alkyl, interspersed with one or more O, S or NR 26 C 2 -C 20 alkyl; or each substituted by C 1 -C 20 alkyl, the C 1 -C 20 alkyl is unsubstituted or substituted with one or more of the following groups: halogen, COOR 17 , CONR 19 R 20 , phenyl, C 3 -C 8 cycloalkyl, C 3 -C 20 heteroaryl, C 6 -C 20 aryloxycarbonyl, C 3 -C 20 heteroaryloxycarbonyl, OR 17 , SR 18 or NR 19 R 20 ; or R 15 is hydrogen, C 2 -C 12 alkenyl, C 3 -C 8 cycloalkyl without one or more O, CO or NR 26 ; or R 15 Is a C 1 -C 20 alkyl group, which is unsubstituted or substituted with one or more of the following groups: halogen, OR 17 , SR 18 , C 3 -C 8 cycloalkyl, C 3 -C 20 heteroaryl , C 6 -C 20 aryloxycarbonyl, C 3 -C 20 heteroaryloxycarbonyl, NR 19 R 20 , COOR 17 , CONR 19 R 20 , PO (OC k H 2k + 1 ) 2 , , Phenyl; or the C 1 -C 20 alkyl is substituted with phenyl, the phenyl is substituted with halogen, C 1 -C 20 alkyl, C 1 -C 4 haloalkyl, OR 17 , SR 18 or NR 19 R 20 is substituted; or R 15 is a C 2 -C 20 alkyl group with one or more O, SO or SO 2 interspersed therebetween, and the interspersed C 2 -C 20 alkyl group is unsubstituted or one or more Substitution of: halogen, OR 17 , COOR 17 , CONR 19 R 20 , phenyl or phenyl substituted with OR 17 , SR 18 or NR 19 R 20 ; or R 15 is a C 2 -C 20 alkylfluorenyl Or benzamidine, which is unsubstituted or substituted with one or more of the following groups: C 1 -C 6 alkyl, halogen, phenyl, OR 17 , SR 18 or NR 19 R 20 ; or R 15 Unsubstituted or substituted with one or more OR 17 or naphthylmethyl or C 3 -C 14 heteroarylcarbonyl; or R 15 is C 2 -C 12 alkoxycarbonyl, which is unsubstituted or unsubstituted One or more O and the interspersed or unsaturated C 2 -C 12 alkoxycarbonyl group is unsubstituted or substituted with one or more hydroxyl groups; or R 15 is phenoxycarbonyl group, which is unsubstituted Or substituted with one or more of the following groups: C 1 -C 6 alkyl, halogen, C 1 -C 4 haloalkyl, Phenyl, OR 17 , SR 18 or NR 19 R 20 ; or R 15 is CN, CONR 19 R 20 , NO 2 , C 1 -C 4 haloalkyl, S (O) m -C 1 -C 6 alkyl, unsubstituted or C 1 -C 12 alkyl or SO 2 -C 1 -C 6 alkyl group substituted with the S (O) m - group; or R 15 SO 2 O- based phenyl, which is unsubstituted Department or by C 1 -C 12 substituted alkyl; or based diphenylphosphino acyl or di (C 1 -C 4 alkoxy) - phosphino acyl; m lines 1 or 2; R '14 R 14 having the targeted Give one of the meanings; R '15 has one of the meanings given for R 15 ; X 1 is O, S, SO, or SO 2 ; X 2 is O, CO, S, or a direct bond; R 16 C 6 -C 20 aryl or C 3 -C 20 heteroaryl, each of which is unsubstituted or substituted with one or more of the following groups: phenyl, halogen, C 1 -C 4 haloalkyl, CN, NO 2 , OR 17 , SR 18 , NR 19 R 20 or C 1 -C 20 alkyl groups with one or more O, S or NR 26 interspersed; or each of them is substituted with one or more C 1 -C 20 alkyl groups The C 1 -C 20 alkyl is unsubstituted or substituted with one or more of the following groups: halogen, COOR 17 , CONR 19 R 20 , phenyl, C 3 -C 8 cycloalkyl, C 3 -C 20 heteroaryl, C 6 -C 20 aryloxycarbonyl, C 3 -C 20 heteroaryloxycarbonyl, OR 17 , SR 18 or NR 19 R 20 ; or R 16 is hydrogen, C 1 -C 20 alkyl, the C 1 -C 20 alkyl is unsubstituted or Multiple substitutions of: halogen, phenyl, OH, SH, CN, C 3 -C 6 alkenyloxy, OCH 2 CH 2 CN, OCH 2 CH 2 (CO) O (C 1 -C 4 alkyl) , O (CO)-(C 1 -C 4 alkyl), O (CO) -phenyl, (CO) OH or (CO) O (C 1 -C 4 alkyl); or R 16 is C 2- C 12 alkyl, with one or more O, S or NR 26 interspersed between them; or R 16 series (CH 2 CH 2 O) n + 1 H, (CH 2 CH 2 O) n (CO)-(C 1- C 8 alkyl), C 2 -C 12 alkenyl or C 3 -C 8 cycloalkyl; or R 16 is a phenyl substituted with SR 18 , wherein the group R 18 represents a bond to the COR 16 group A direct bond of the phenyl or naphthyl ring of the carbazole moiety attached; n is 1 to 20; R 17 is hydrogen, phenyl-C 1 -C 3 alkyl, C 1 -C 20 alkyl, It is unsubstituted or substituted with one or more of the following groups: halogen, OH, SH, CN, C 3 -C 6 alkenyloxy, OCH 2 CH 2 CN, OCH 2 CH 2 (CO) O (C 1 -C 4 alkyl), O (CO)-(C 1 -C 4 alkyl), O (CO)-(C 2 -C 4 ) alkenyl, O (CO) -phenyl, (CO) OH, (CO) O (C 1 -C 4 alkyl), C 3 -C 20 Alkyl, SO 2 - (C 1 -C 4 haloalkyl), O (C 1 -C 4 haloalkyl) or interrupted by one or more O of C 3 -C 20 cycloalkyl; or R 17 based C 2 - C 20 alkyl with one or more O, S or NR 26 interspersed between them; or R 17 series (CH 2 CH 2 O) n + 1 H, (CH 2 CH 2 O) n (CO)-(C 1- (C 8 alkyl), C 1 -C 8 alkyl, C 2 -C 12 alkenyl, C 3 -C 6 alkenyl or one or more O, S, CO or NR 26 C 3 -C 20 cycloalkyl; or R 17 is C 1 -C 8 alkyl-C 3 -C 10 cycloalkyl, which is one or more O without interspersed or interspersed; or R 17 is benzamidine Group, which is unsubstituted or substituted with one or more C 1 -C 6 alkyl, halogen, OH or C 1 -C 3 alkoxy; or R 17 is phenyl, naphthyl or C 3 -C 20 Heteroaryl, each of which is unsubstituted or substituted with one or more of the following groups: halogen, OH, C 1 -C 12 alkyl, C 1 -C 12 alkoxy, CN, NO 2 , phenyl- C 1 -C 3 alkoxy, phenoxy, C 1 -C 12 alkylthio, phenylthio, N (C 1 -C 12 alkyl) 2 , diphenyl-amino or Or R 17 forms a bond to the group or Direct bond to one of the carbon atoms of the phenyl or naphthyl ring; R 18 is hydrogen, C 2 -C 12 alkenyl, C 3 -C 20 cycloalkyl or phenyl-C 1 -C 3 alkyl , Wherein the C 2 -C 12 alkenyl, C 3 -C 20 cycloalkyl or phenyl-C 1 -C 3 alkyl is one or more O, S, CO, NR 26 or COOR 17 ; or R 18 is a C 1 -C 20 alkyl group, which is unsubstituted or substituted with one or more of the following groups: OH, SH, CN, C 3 -C 6 alkenyloxy, OCH 2 CH 2 CN , OCH 2 CH 2 (CO) O (C 1 -C 4 alkyl), O (CO)-(C 2 -C 4 ) alkenyl, O (CO)-(C 1 -C 4 alkyl), O (CO) -phenyl or (CO) OR 17 ; or R 18 is a C 2 -C 20 alkyl group, which is interspersed with one or more O, S, CO, NR 26 or COOR 17 ; or R 18 is (CH 2 CH 2 O) n H, (CH 2 CH 2 O) n (CO)-(C 1 -C 8 alkyl), C 2 -C 8 alkyl or C 3 -C 6 alkenyl; or R 18 Is benzamidine, which is unsubstituted or substituted with one or more of the following groups: C 1 -C 6 alkyl, halogen, OH, C 1 -C 4 alkoxy, or C 1 -C 4 alkyl group; or R 18 lines phenyl, naphthyl or C 3 -C 20 heteroaryl, which is unsubstituted or departments with one or more of the following radicals: halogen C 1 -C 12 alkyl, C 1 -C. 4 haloalkyl, C 1 -C 12 alkoxy, CN, NO 2, phenyl -C 1 -C 3 alkoxy, phenoxy, C 1 -C 12 alkylthio, phenylthio, N (C 1 -C 12 alkyl) 2 , diphenylamino, (CO) O (C 1 -C 8 alkyl), (CO) -C 1- C 8 alkyl, (CO) N (C 1 -C 8 alkyl) 2 or R 19 and R 20 are each independently hydrogen, C 1 -C 20 alkyl, C 2 -C 4 hydroxyalkyl, C 2 -C 10 alkoxyalkyl, C 2 -C 5 alkenyl, C 3- C 20 cycloalkyl, phenyl-C 1 -C 3 alkyl, C 1 -C 8 alkylfluorenyl, C 1 -C 8 alkylfluorenyloxy, C 3 -C 12 alkenyl, SO 2- ( C 1 -C 4 haloalkyl) or benzamidine; or R 19 and R 20 are phenyl, naphthyl or C 3 -C 20 heteroaryl, each of which is unsubstituted or substituted with one or more of the following Group substitution: halogen, C 1 -C 4 haloalkyl, C 1 -C 20 alkoxy, C 1 -C 12 alkyl, benzamidine or C 1 -C 12 alkoxy; or R 19 and R 20 With its attached N atom to form a 5- or 6-membered saturated or unsaturated ring which is not interspersed or interspersed with O, S or NR 17 , and the 5- or 6-membered saturated or unsaturated ring system is unsubstituted or Substituted by one or more of the following groups: C 1 -C 20 alkyl, C 1 -C 20 alkoxy, = O, OR 17 , SR 18 , NR 21 R 22 , (CO) R 23 , NO 2 , Halogen, C 1 -C 4 -haloalkyl, CN, phenyl, Or without hetero or hetero, one or more C 3 -C 20 cycloalkyl groups of O, S, CO or NR 17 ; or R 19 and R 20 together with the N atom to which they are attached form a heteroaromatic ring system, the The ring system is unsubstituted or substituted with one or more of the following groups: C 1 -C 20 alkyl, C 1 -C 4 haloalkyl, C 1 -C 20 alkoxy, = O, OR 17 , SR 18 , NR 21 R 22 , (CO) R 23 , , Halogen, NO 2 , CN, phenyl or C 3 -C 20 cycloalkyl without one or more O, S, CO or NR 17 ; R 21 and R 22 are independently hydrogen, C 1- C 20 alkyl, C 1 -C 4 haloalkyl, C 3 -C 10 cycloalkyl, or phenyl; or R 21 and R 22 together with the N atom to which they are attached are uninterspersed or interspersed with O, 5 or 6 membered saturated or unsaturated rings of S or NR 26 , and the 5 or 6 membered saturated or unsaturated ring system is not fused or the 5 or 6 membered saturated or unsaturated ring is fused with a benzene ring; R 23 is hydrogen, OH, C 1 -C 20 alkyl, C 1 -C 4 haloalkyl, C 2 -C 20 alkyl interspersed with one or more O, CO or NR 26 , unsaturated or interspersed O C 3 -C 20 cycloalkyl, S, CO, or NR 26 , or R 23 is phenyl, naphthyl, phenyl-C 1 -C 4 alkyl, OR 17 , SR 18 or NR 21 R 22 ; R 24 series (CO) OR 17 , CONR 19 R 20 , (CO) R 17 ; or R 24 has one of the meanings given for R 19 and R 20 ; R 25 series COOR 17 , CONR 19 R 20 , ( CO) R 17 ; or R 25 has one of the meanings given for R 17 ; R 26 is hydrogen, C 1 -C 20 alkyl, C 1 -C 4 haloalkyl, C 2 -C 20 alkyl, In the meantime One or more O or CO; or a phenyl-based -C 1 -C 4 alkyl, C 3 -C 8 cycloalkyl, which is based not interrupted or is interrupted by one or more O or CO; or tie (CO) R 19 ; or phenyl, which is unsubstituted or substituted with one or more of the following groups: C 1 -C 20 alkyl, halogen, C 1 -C 4 haloalkyl, OR 17 , SR 18 , NR 19 R 20 or Provided that at least one group is present in the molecule or The black pigment (E) includes a first black pigment (E-1), wherein the first black pigment (E-1) includes a compound having a formula (EI), a geometric isomer thereof, a salt thereof, Or its geometric isomer salt: In formula (EI), R 1e and R 6e are each independently a hydrogen atom, CH 3 , CF 3 , fluorine atom or chlorine atom; R 2e , R 3e , R 4e , R 5e , R 7e , R 8e , R 9e And R 10e series and all others are hydrogen atom, halogen atom, R 11e , COOH, COOR 11e , COO-, CONH 2 , CONHR 11e , CONR 11e R 12e , CN, OH, OR 11e , COCR 11e , OOCNH 2 , OOCNHR 11e , OOCNR 11e R 12e , NO 2 , NH 2 , NHR 11e , NR 11e R 12e , NHCOR 12e , NR 11e COR 12e , N = CH 2 , N = CHR 11e , N = CR 11e R 12e , SH, SR 11e , SOR 11e , SO 2 R 11e , SO 3 R 11e , SO 3 H, SO 3- , SO 2 NH 2 , SO 2 NHR 11e, or SO 2 NR 11e R 12e ; and selected from R 2e and R 3e , At least one combination of the group consisting of R 3e and R 4e , R 4e and R 5e , R 7e and R 8e , R 8e and R 9e , and R 9e and R 10e , is directly bonded to each other, or Bonded to each other by bridging with oxygen atom, sulfur atom, NH or NR 11e ; R 11e and R 12e are independently of each other alkyl groups having 1 to 12 carbon atoms, cycloalkyl groups having 3 to 12 carbon atoms, and 2 to 12 carbon atoms Alkenyl, cycloalkenyl having 3 to 12 carbons, or alkynyl having 2 to 12 carbons.

根據本發明之鹼可溶性樹脂(A)可包含具有不飽和基之樹脂(A-1)。其次，該鹼可溶性樹脂(A)可選擇性地包含其他鹼可溶性樹脂(A-2)。 The alkali-soluble resin (A) according to the present invention may include a resin (A-1) having an unsaturated group. Second, the alkali-soluble resin (A) may optionally include other alkali-soluble resins (A-2).

該具有不飽和基之樹脂(A-1)係由一混合物聚合形成。該混合物可包含具有至少二個環氧基之環氧化合物(a-1-1)及具有至少一個羧酸基與至少一個乙烯性不飽和基之化合物(a-1-2)。再者，該混合物可選擇性地包含羧酸酐化合物(a-1-3)及具有環氧基之化合物(a-1-4)。 The unsaturated resin (A-1) is formed by polymerizing a mixture. The mixture may include an epoxy compound (a-1-1) having at least two epoxy groups and a compound (a-1-2) having at least one carboxylic acid group and at least one ethylenically unsaturated group. Furthermore, the mixture may optionally include a carboxylic anhydride compound (a-1-3) and a compound (a-1-4) having an epoxy group.

該具有至少二個環氧基之環氧化合物(a-1-1)包含具有如下式(I)所示之結構的化合物、具有如下式(II)所示之結構的化合物及上述化合物之組合： 於式(I)中，R1a至R4a分別獨立地代表氫原子、鹵素原子、碳數為1至5之烷基、碳數為1至5之烷氧基、碳數為6至12之芳香基或碳數為6至12之芳烷基。 The epoxy compound (a-1-1) having at least two epoxy groups includes a compound having a structure represented by the following formula (I), a compound having a structure represented by the following formula (II), and a combination of the foregoing compounds : In formula (I), R 1a to R 4a each independently represent a hydrogen atom, a halogen atom, an alkyl group having 1 to 5 carbon atoms, an alkoxy group having 1 to 5 carbon atoms, and 6 to 12 carbon atoms Aryl or aralkyl having 6 to 12 carbons.

該具有如式(I)所示之結構的化合物可包含具有環氧基之雙酚茀型化合物，其中該具有環氧基之雙酚茀型化合物可由雙酚茀 型化合物(bisphenol fluorene)與鹵化環氧丙烷(epihalohydrin)反應而得。 The compound having a structure represented by formula (I) may include a bisphenol amidine type compound having an epoxy group, wherein the bisphenol amidine type compound having an epoxy group may be a bisphenol amidine It is obtained by reacting bisphenol fluorene with epihalohydrin.

前述之雙酚茀型化合物之具體例可包含9,9-雙(4-羥基苯基)茀[9,9-bis(4-hydroxyphenyl)fluorene]、9,9-雙(4-羥基-3-甲基苯基)茀[9,9-bis(4-hydroxy-3-methylphenyl)fluorene]、9,9-雙(4-羥基-3-氯苯基)茀[9,9-bis(4-hydroxy-3-chlorophenyl)fluorene]、9,9-雙(4-羥基-3-溴苯基)茀[9,9-bis(4-hydroxy-3-bromophenyl)fluorene]、9,9-雙(4-羥基-3-氟苯基)茀[9,9-bis(4-hydroxy-3-fluorophenyl)fluorene]、9,9-雙(4-羥基-3-甲氧基苯基)茀[9,9-bis(4-hydroxy-3-methoxyphenyl)fluorene]、9,9-雙(4-羥基-3,5-二甲基苯基)茀[9,9-bis(4-hydroxy-3,5-dimethylphenyl)fluorene]、9,9-雙(4-羥基-3,5-二氯苯基)茀[9,9-bis(4-hydroxy-3,5-dichlorophenyl)fluorene]、9,9-雙(4-羥基-3,5-二溴苯基)茀[9,9-bis(4-hydroxy-3,5-dibromophenyl)fluorene]、雙酚茀型化合物之類似化合物，或者上述化合物之任意組合。 Specific examples of the aforementioned bisphenol fluorene type compound may include 9,9-bis (4-hydroxyphenyl) fluorene [9,9-bis (4-hydroxyphenyl) fluorene], 9,9-bis (4-hydroxy-3) -Methylphenyl) fluorene [9,9-bis (4-hydroxy-3-methylphenyl) fluorene], 9,9-bis (4-hydroxy-3-chlorophenyl) fluorene [9,9-bis (4 -hydroxy-3-chlorophenyl) fluorene], 9,9-bis (4-hydroxy-3-bromophenyl) fluorene [9,9-bis (4-hydroxy-3-bromophenyl) fluorene], 9,9-bis (4-hydroxy-3-fluorophenyl) fluorene [9,9-bis (4-hydroxy-3-fluorophenyl) fluorene], 9,9-bis (4-hydroxy-3-methoxyphenyl) fluorene [ 9,9-bis (4-hydroxy-3-methoxyphenyl) fluorene], 9,9-bis (4-hydroxy-3,5-dimethylphenyl) fluorene [9,9-bis (4-hydroxy-3 , 5-dimethylphenyl) fluorene], 9,9-bis (4-hydroxy-3,5-dichlorophenyl) fluorene [9,9-bis (4-hydroxy-3,5-dichlorophenyl) fluorene], 9, 9-bis (4-hydroxy-3,5-dibromophenyl) fluorene [9,9-bis (4-hydroxy-3,5-dibromophenyl) fluorene], analogous compounds of bisphenol hydrazone compounds, or the above compounds Any combination.

前述鹵化環氧丙烷(epihalohydrin)之具體例可包含3-氯-1,2-環氧丙烷(epichlorohydrin)、3-溴-1,2-環氧丙烷(epibromohydrin)、鹵化環氧丙烷之類似化合物，或者上述化合物之任意組合。 Specific examples of the aforementioned halogenated propylene oxide (epihalohydrin) may include similar compounds such as 3-chloro-1,2-propylene oxide (epichlorohydrin), 3-bromo-1,2-propylene oxide (epibromohydrin), and halogenated propylene oxide Or any combination of the above compounds.

該具有環氧基之雙酚茀型化合物的具體例可包含(1)新日鐵化學製造之商品，例如：型號為ESF-300之產品或類似產品；(2)大阪瓦斯製造之商品，例如：型號為PG-100或EG-210之產品，或者類似產品；(3)S.M.S Technology Co.製造之商品，例如：型號為SMS-F9PhPG、SMS-F9CrG或SMS-F914PG之產品，或者類似產品。 Specific examples of the bisphenol amidine compound having an epoxy group may include (1) a product manufactured by Nippon Steel Chemical, such as a product of model ESF-300 or a similar product; (2) a product manufactured by Osaka Gas, such as : Products of model PG-100 or EG-210, or similar products; (3) Products manufactured by SMS Technology Co., for example: products of model SMS-F9PhPG, SMS-F9CrG or SMS-F914PG, or similar products.

於式(II)中，R5a至R18a分別獨立地代表氫原子、鹵素原子、碳數為1至8之烷基或碳數為6至15之芳香基；且a代表0至10之整數。 In formula (II), R 5a to R 18a each independently represent a hydrogen atom, a halogen atom, an alkyl group having 1 to 8 carbon atoms or an aromatic group having 6 to 15 carbon atoms; and a represents an integer of 0 to 10 .

具有如式(II)所示之結構的化合物可在鹼金屬氫氧化物的存在下，使具有如下式(II-1)所示之結構的化合物與鹵化環氧丙烷進行反應而得： The compound having the structure represented by the formula (II) can be obtained by reacting a compound having the structure represented by the following formula (II-1) with a halogenated propylene oxide in the presence of an alkali metal hydroxide:

於式(II-1)中，R5a至R18a及a之定義如前所述，在此不另贅述。 In formula (II-1), the definitions of R 5a to R 18a and a are as described above, and will not be repeated here.

具有如式(II)所示之結構的化合物之合成方法係先在酸觸媒存在下，對具有如下式(II-1-1)所示之結構的化合物及酚(phenol)類化合物進行縮合反應，以形成具有如式(II-1)所示之結構的化合物： 於式(II-1-1)中，R19a及R20a分別獨立地代表氫原子、鹵素原子、碳數為1至8的烷基或碳數為6至15的芳香基；A1及A2分別獨立地代表鹵素原子、碳數為1至6的烷基或碳數為1至6的烷氧基。上述之烷基較佳為甲基、乙基或第三丁基，且烷氧基較佳為甲氧基或乙氧基。 A method for synthesizing a compound having a structure represented by the formula (II) is to first condense a compound having a structure represented by the following formula (II-1-1) and a phenol compound in the presence of an acid catalyst. React to form a compound having a structure represented by formula (II-1): In formula (II-1-1), R 19a and R 20a each independently represent a hydrogen atom, a halogen atom, an alkyl group having 1 to 8 carbon atoms, or an aromatic group having 6 to 15 carbon atoms; A 1 and A 2 each independently represents a halogen atom, an alkyl group having 1 to 6 carbon atoms, or an alkoxy group having 1 to 6 carbon atoms. The aforementioned alkyl group is preferably a methyl group, an ethyl group, or a third butyl group, and the alkoxy group is preferably a methoxy group or an ethoxy group.

前述酚類化合物之具體例可包含酚(phenol)、甲酚(cresol)、乙酚(ethylphenol)、n-丙酚(n-propylphenol)、異丁酚(isobutylphenol)、t-丁酚(t-butylphenol)、辛酚(octylphenol)、壬基苯酚(nonylphenol)、茬酚(xylenol)、甲基丁基苯酚(methylbutylphenol)、二第三丁基酚(di-t-butylphenol)、乙烯苯酚(vinylphenol)、丙烯苯酚(propenylphenol)、乙炔苯酚(ethinylphenol)、環戊苯酚(cyclopentylphenol)、環己基酚(cyclohexylphenol)、環己基甲酚(cyclohexylcresol)或酚類化合物之類似化合物。該酚類化合物可單獨一種或混合複數種使用。 Specific examples of the phenolic compound may include phenol, cresol, ethylphenol, n-propylphenol, isobutylphenol, and t-butylphenol (t- butylphenol), octylphenol, nonylphenol, xylenol, methylbutylphenol, di-t-butylphenol, vinylphenol , Propenylphenol, ethinylphenol, cyclopentylphenol, cyclohexylphenol, cyclohexylcresol or similar compounds of phenolic compounds. These phenolic compounds may be used alone or in combination.

基於前述具有如式(II-1-1)所示之結構的化合物之使用量為1莫耳，該酚類化合物之使用量為0.5莫耳至20莫耳，且較佳為2莫耳至15莫耳。 The used amount of the compound having the structure represented by the formula (II-1-1) is 1 mole, and the used amount of the phenolic compound is 0.5 to 20 moles, and preferably 2 to 15 moles.

上述酸觸媒之具體例可包含鹽酸、硫酸、對甲苯磺酸(p-toluenesulfonic acid)、草酸(oxalic acid)、三氟化硼(boron trifluoride)、無水氯化鋁(aluminium chloride anhydrous)、氯化鋅(zinc chloride)或酸觸媒之類似物。該酸觸媒可單獨一種或混合複數種使用。 Specific examples of the acid catalyst may include hydrochloric acid, sulfuric acid, p-toluenesulfonic acid, oxalic acid, boron trifluoride, aluminum chloride anhydrous, chlorine Zinc chloride or an analogue of an acid catalyst. The acid catalyst may be used alone or in combination.

該酸觸媒較佳可為對甲苯磺酸、硫酸、鹽酸或上述化合物之任意組合。 The acid catalyst may preferably be p-toluenesulfonic acid, sulfuric acid, hydrochloric acid, or any combination thereof.

該酸觸媒之使用量並無特別之限制。基於前述具有如式(IV-1-1)所示之結構的化合物之使用量為100重量份，該酸觸媒之使 用量為0.1重量份至30重量份。 The amount of the acid catalyst used is not particularly limited. Based on the use amount of the aforementioned compound having a structure represented by the formula (IV-1-1) is 100 parts by weight, the acid catalyst is used The amount is 0.1 to 30 parts by weight.

前述之縮合反應可在無溶劑或有機溶劑之存在下進行，其中該有機溶劑之具體例可為甲苯(toluene)、二甲苯(xylene)、甲基異丁基酮(methyl isobutyl ketone)或其類似物。該有機溶劑可為單獨一種或混合複數種使用。 The aforementioned condensation reaction can be performed in the absence of a solvent or an organic solvent. Specific examples of the organic solvent can be toluene, xylene, methyl isobutyl ketone, or the like. Thing. The organic solvents may be used alone or in combination.

基於前述具有如式(II-1-1)所示之結構的化合物及酚類化合物之總使用量為100重量份，該有機溶劑之使用量為50重量份至300重量份，較佳為100重量份至250重量份。 Based on the total amount of the compound having the structure shown by the formula (II-1-1) and the phenolic compound is 100 parts by weight, and the amount of the organic solvent is 50 to 300 parts by weight, preferably 100. Part by weight to 250 parts by weight.

該縮合反應之反應溫度可為40℃至180℃，且反應時間可為1小時至8小時。 The reaction temperature of the condensation reaction may be 40 ° C to 180 ° C, and the reaction time may be 1 hour to 8 hours.

在完成該縮合反應後，可選擇性地進行中和處理或水洗處理。 After completion of the condensation reaction, a neutralization treatment or a water washing treatment may be optionally performed.

上述之中和處理係將反應後之溶液的pH值調整為3至7，較佳為5至7。 The neutralization treatment mentioned above adjusts the pH value of the solution after the reaction to 3 to 7, preferably 5 to 7.

上述之水洗處理可利用中和劑來進行。該中和劑可為鹼性物質，且中和劑之具體例可包含氨(ammonia)、磷酸二氫鈉(sodium dihydrogen phosphate)；氫氧化鈉(sodium hydroxide)或氫氧化鉀(potassium hydroxide)等之鹼金屬氫氧化物；氫氧化鈣(calcium hydroxide)或氫氧化鎂(magnesium hydroxide)等之鹼土類金屬氫氧化物；二伸乙三胺(diethylene triamine)、三伸乙四胺(triethylenetetramine)、苯胺(aniline)或苯二胺(phenylene diamine)等之有機胺或上述化合物之任意組合。該中和劑可單獨一種或混合複數種使用。 The above-mentioned water washing treatment can be performed using a neutralizing agent. The neutralizing agent may be an alkaline substance, and specific examples of the neutralizing agent may include ammonia (ammonia), sodium dihydrogen phosphate (sodium dihydrogen phosphate); sodium hydroxide (potassium hydroxide), and the like. Alkali metal hydroxides; calcium hydroxide or magnesium hydroxide; alkaline earth metal hydroxides; diethylene triamine, triethylenetetramine, triethylenetetramine, Organic amines such as aniline or phenylene diamine, or any combination of the above compounds. These neutralizing agents can be used individually or in mixture of multiple types.

該水洗處理可採用習知之方法進行。例如：將含有中和劑之水溶液加至反應後之溶液中，並反覆進行萃取。經中和處理或水洗處理後，溶液中未反應之酚類化合物及溶劑可藉由減壓加熱處理 去除，並進行濃縮，以獲得具有如式(II-1)所示之結構的化合物。 This water washing treatment can be performed by a conventional method. For example, an aqueous solution containing a neutralizing agent is added to the solution after the reaction, and extraction is performed repeatedly. After neutralization treatment or water washing treatment, unreacted phenolic compounds and solvents in the solution can be heated under reduced pressure It is removed and concentrated to obtain a compound having a structure represented by formula (II-1).

當縮合反應完成後，加入過量之鹵化環氧丙烷，以使鹵化環氧丙烷與具有如式(II-1)所示之結構的化合物進行脫鹵化氫反應(dehydrohalogenation)，而可製得具有如式(II)所示之結構的化合物。 After the condensation reaction is completed, an excess of halogenated propylene oxide is added to cause the halogenated propylene oxide to undergo a dehydrohalogenation reaction with a compound having a structure represented by the formula (II-1), and can be prepared as A compound having a structure represented by formula (II).

前述鹵化環氧丙烷之具體例可包含3-氯-1,2-環氧丙烷、3-溴-1,2-環氧丙烷或上述化合物之組合。 Specific examples of the halogenated propylene oxide may include 3-chloro-1,2-propylene oxide, 3-bromo-1,2-propylene oxide, or a combination thereof.

當進行前述之脫鹵化氫反應前，氫氧化鈉或氫氧化鉀等之鹼金屬氫氧化合物可預先添加或於反應過程中加至反應溶液中。該脫鹵化氫反應之反應溫度可為20℃至120℃，且反應時間可為1小時至10小時。 Before the aforementioned dehydrohalogenation reaction is performed, an alkali metal hydroxide such as sodium hydroxide or potassium hydroxide may be added in advance or added to the reaction solution during the reaction. The reaction temperature of the dehydrohalogenation reaction may be 20 ° C to 120 ° C, and the reaction time may be 1 hour to 10 hours.

在一實施例中，前述之鹼金屬氫氧化合物可為水溶液。在此實施例中，當鹼金屬氫氧化合物水溶液連續加至脫鹵化氫反應之反應系統中，同時可於減壓或常壓下，連續蒸餾出水及鹵化環氧丙烷，以分離並去除水，且鹵化環氧丙烷可連續地回流至反應系統中。 In one embodiment, the aforementioned alkali metal hydroxide may be an aqueous solution. In this embodiment, when the aqueous alkali metal hydroxide solution is continuously added to the reaction system for the dehydrohalogenation reaction, at the same time, water and halogenated propylene oxide can be continuously distilled under reduced pressure or normal pressure to separate and remove water. And the halogenated propylene oxide can be continuously refluxed into the reaction system.

當進行脫鹵化氫反應前，氯化四甲銨(tetramethyl ammonium chloride)、溴化四甲銨(tetramethyl ammonium bromide)、三甲基苄基氯化銨(trimethyl benzyl ammonium chloride)等之四級銨鹽可添加至反應系統中，以作為觸媒，並在50℃至150℃反應1小時至5小時後，將鹼金屬氫氧化物或其水溶液加至反應系統中。然後，於20℃至120℃反應1小時至10小時，以進行脫鹵化氫反應。 Before the dehydrohalogenation reaction, quaternary ammonium salts such as tetramethyl ammonium chloride, tetramethyl ammonium bromide, trimethyl benzyl ammonium chloride, etc. It can be added to the reaction system as a catalyst, and after reacting at 50 ° C to 150 ° C for 1 hour to 5 hours, an alkali metal hydroxide or an aqueous solution thereof is added to the reaction system. Then, a reaction is performed at 20 ° C to 120 ° C for 1 hour to 10 hours to perform a dehydrohalogenation reaction.

基於前述具有如式(II-1)所示之結構的化合物中之羥基總當量數為1當量，該鹵化環氧丙烷之使用量為1當量至20當量，且較佳為2當量至10當量。基於前述具有如式(II-1)所示之結構的化合物中之羥基總當量數為1當量，脫鹵化氫反應中之鹼金屬氫氧化物的使用 量為0.5當量至15當量，且較佳為0.9當量至11當量。 Based on the foregoing, the total number of hydroxyl equivalents in the compound having the structure represented by formula (II-1) is 1 equivalent, and the amount of the halogenated propylene oxide used is 1 to 20 equivalents, and preferably 2 to 10 equivalents. . Based on the total number of hydroxyl equivalents in the compound having the structure represented by the formula (II-1) is 1 equivalent, and the use of an alkali metal hydroxide in a dehydrohalogenation reaction The amount is from 0.5 to 15 equivalents, and preferably from 0.9 to 11 equivalents.

為了使上述脫鹵化氫反應順利進行，甲醇或乙醇等之醇類化合物可添加至反應系統中。此外，二甲碸(dimethyl sulfone)或二甲亞碸(dimethyl sulfoxide)等之非質子性(aprotic)的極性溶媒亦可加至反應系統中。 In order to make the dehydrohalogenation reaction proceed smoothly, alcohol compounds such as methanol or ethanol may be added to the reaction system. In addition, aprotic polar solvents such as dimethyl sulfone or dimethyl sulfoxide can also be added to the reaction system.

當使用醇類化合物時，基於上述的鹵化環氧丙烷的總使用量為100重量份，醇類化合物之使用量為2重量份至20重量份，且較佳為4重量份至15重量份。當使用非質子性的極性溶媒時，基於鹵化環氧丙烷的總使用量為100重量份，非質子性的極性溶媒的使用量為5重量份至100重量份，且較佳為10重量份至90重量份。 When the alcohol compound is used, the total amount of the halogenated propylene oxide used is 100 parts by weight, and the amount of the alcohol compound is 2 to 20 parts by weight, and preferably 4 to 15 parts by weight. When an aprotic polar solvent is used, the total amount of use based on the halogenated propylene oxide is 100 parts by weight, and the amount of the aprotic polar solvent is 5 parts by weight to 100 parts by weight, and preferably 10 parts by weight to 90 parts by weight.

當前述之脫鹵化氫反應後，反應系統可選擇性地進行水洗處理。然後，於溫度為110℃至250℃且壓力為1.3kPa(10mmHg)以下之環境中，去除鹵化環氧丙烷、醇類化合物及非質子性的極性溶媒。 After the aforementioned dehalogenation reaction, the reaction system may be optionally subjected to a water washing treatment. Then, the halogenated propylene oxide, alcohol compounds, and aprotic polar solvent are removed in an environment at a temperature of 110 ° C to 250 ° C and a pressure of 1.3 kPa (10 mmHg) or less.

為了避免所形成之環氧樹脂具有加水分解性之鹵素，進行脫鹵化氫反應後之溶液可加入甲苯、甲基異丁基酮(methyl isobutyl ketone)等之溶劑及氫氧化鈉或氫氧化鉀等之鹼金屬氫氧化物水溶液，並再次進行脫鹵化氫反應。在前述之脫鹵化氫反應中，基於前述具有如式(II-1)所示之結構的化合物中之羥基總當量數為1當量，鹼金屬氫氧化合物之使用量為0.01當量至0.3當量，且較佳為0.05當量至0.2當量。此外，該脫鹵化氫反應之反應溫度可為50℃至120℃，且反應時間可為0.5小時至2小時。 In order to avoid the hydrolyzable halogen of the formed epoxy resin, solvents such as toluene, methyl isobutyl ketone and sodium hydroxide or potassium hydroxide can be added to the solution after the dehydrohalogenation reaction. The alkali metal hydroxide aqueous solution, and perform the dehydrohalogenation reaction again. In the aforementioned dehydrohalogenation reaction, based on the total number of hydroxyl equivalents in the compound having the structure represented by the formula (II-1) is 1 equivalent, and the amount of the alkali metal hydroxide used is 0.01 to 0.3 equivalents. And it is preferably 0.05 equivalent to 0.2 equivalent. In addition, the reaction temperature of the dehydrohalogenation reaction may be 50 ° C to 120 ° C, and the reaction time may be 0.5 hours to 2 hours.

當脫鹵化氫反應完成後，反應溶液中之鹽類可藉由過濾及水洗等步驟去除，且甲苯、甲基異丁基酮等之溶劑可藉由加熱減壓之方式餾除，以形成具有如式(II)所示之結構的化合物。該具有如式(II)所示之結構的化合物之具體例可包含日本化藥製造之商品，其 型號為NC-3000、NC-3000H、NC-3000S及NC-3000P等。 When the dehydrohalogenation reaction is completed, the salts in the reaction solution can be removed by steps such as filtration and water washing, and the solvents such as toluene, methyl isobutyl ketone can be distilled off by heating and reducing pressure to form A compound having a structure represented by formula (II). Specific examples of the compound having a structure represented by the formula (II) may include products manufactured by Nippon Kayaku, Models are NC-3000, NC-3000H, NC-3000S and NC-3000P.

該具有至少一個羧酸基與至少一個乙烯性不飽和基之化合物(a-1-2)可選自於由下述(1)至(3)所組成之一族群：(1)丙烯酸、甲基丙烯酸、2-甲基丙烯醯氧乙基丁二酸(2-methacryloyloxyethylbutanedioic acid)、2-甲基丙烯醯氧丁基丁二酸、2-甲基丙烯醯氧乙基己二酸、2-甲基丙烯醯氧丁基己二酸、2-甲基丙烯醯氧乙基六氫鄰苯二甲酸、2-甲基丙烯醯氧乙基馬來酸、2-甲基丙烯醯氧丙基馬來酸、2-甲基丙烯醯氧丁基馬來酸、2-甲基丙烯醯氧丙基丁二酸、2-甲基丙烯醯氧丙基己二酸、2-甲基丙烯醯氧丙基四氫鄰苯二甲酸、2-甲基丙烯醯氧丙基鄰苯二甲酸、2-甲基丙烯醯氧丁基鄰苯二甲酸或2-甲基丙烯醯氧丁基氫鄰苯二甲酸等之化合物；(2)由具有羥基之(甲基)丙烯酸酯與二元羧酸化合物反應而得的化合物，其中該二元羧酸化合物之具體例可包含己二酸、丁二酸、馬來酸或鄰苯二甲酸等之化合物；(3)由具有羥基之(甲基)丙烯酸酯與下述之羧酸酐化合物(a-1-3；請參照後述內容，在此不另贅述)反應而得的半酯化合物，其中該具有羥基的(甲基)丙烯酸酯之具體例可包含2-羥基乙基丙烯酸酯[(2-hydroxyethyl)acrylate]、2-羥基乙基甲基丙烯酸酯[(2-hydroxyethyl)methacrylate]、2-羥基丙基丙烯酸酯[(2-hydroxypropyl)acrylate]、2-羥基丙基甲基丙烯酸酯[(2-hydroxypropyl)methacrylate]、4-羥基丁基丙烯酸酯[(4-hydroxybutyl)acrylate]、4-羥基丁基甲基丙烯酸酯[(4-hydroxybutyl)methacrylate]或季戊四醇三甲基丙烯酸酯等之化合物。 The compound (a-1-2) having at least one carboxylic acid group and at least one ethylenically unsaturated group may be selected from the group consisting of (1) to (3): (1) acrylic acid, Acrylic acid, 2-methacryloyloxyethylbutanedioic acid, 2-methacryloyloxyethylbutanedioic acid, 2-methacryloyloxyethylbutanedioic acid, 2-methacryloyloxyethylbutanedioic acid Methacrylic acid oxybutyl adipate, 2-methacrylic acid oxyethyl hexahydrophthalic acid, 2-methacrylic acid oxyethyl maleic acid, 2-methacrylic acid oxypropyl maleate Maleic acid, 2-methacrylic acid, oxybutyl maleic acid, 2-methacrylic acid, oxypropyl succinic acid, 2-methacrylic acid, oxypropyl adipic acid, 2-methacrylic acid, oxypropylene Tetrahydrophthalic acid, 2-methacrylic acid oxypropyl phthalic acid, 2-methacrylic acid oxybutyl phthalic acid, or 2-methacrylic acid oxybutyl phthalic acid (2) A compound obtained by reacting a (meth) acrylate having a hydroxyl group with a dicarboxylic acid compound. Specific examples of the dicarboxylic acid compound may include adipic acid, succinic acid, and horse Lactic acid or phthalic acid (3) a half-ester compound obtained by reacting a (meth) acrylic acid ester having a hydroxyl group with the following carboxylic anhydride compound (a-1-3; please refer to the following content, which will not be repeated here), of which Specific examples of the (meth) acrylate having a hydroxyl group may include 2-hydroxyethyl acrylate [(2-hydroxyethyl) acrylate], 2-hydroxyethyl methacrylate [(2-hydroxyethyl) methacrylate], 2 -(2-hydroxypropyl) acrylate, (2-hydroxypropyl) methacrylate, ((2-hydroxypropyl) methacrylate), (4-hydroxybutyl) acrylate, 4 -Compounds such as (4-hydroxybutyl) methacrylate or pentaerythritol trimethacrylate.

該羧酸酐化合物(a-1-3)可選自於二元羧酸酐化合物、四元羧酸酐化合物或上述化合物之任意組合。 The carboxylic acid anhydride compound (a-1-3) may be selected from a dicarboxylic acid anhydride compound, a tetracarboxylic acid anhydride compound, or any combination thereof.

前述之二元羧酸酐化合物可包含但不限於丁二酸酐 (butanedioic anhydride)、順丁烯二酸酐(maleic anhydride)、衣康酸酐(itaconic anhydride)、鄰苯二甲酸酐(phthalic anhydride)、四氫鄰苯二甲酸酐(tetrahydrophthalic anhydride)、六氫鄰苯二甲酸酐(hexahydrophthalic anhydride)、甲基四氫鄰苯二甲酸酐、甲基六氫鄰苯二甲酸酐、甲基橋亞甲基四氫鄰苯二甲酸酐(methyl endo-methylene tetrahydro phthalic anhydride)、氯茵酸酐(chlorendic anhydride)、戊二酸酐或偏三苯甲酸酐(1,3-dioxoisobenzofuran-5-carboxylic anhydride)等之二元羧酸酐化合物。 The aforementioned dicarboxylic anhydride compound may include, but is not limited to, succinic anhydride (butanedioic anhydride), maleic anhydride, itaconic anhydride, phthalic anhydride, tetrahydrophthalic anhydride, hexahydrophthalic anhydride Formic anhydride (hexahydrophthalic anhydride), methyltetrahydrophthalic anhydride, methylhexahydrophthalic anhydride, methylendo-methylene tetrahydrophthalphthalic anhydride, Dicarboxylic acid anhydride compounds such as chlorendic anhydride, glutaric anhydride, or 1,3-dioxoisobenzofuran-5-carboxylic anhydride.

前述之四元羧酸酐化合物可包含但不限於二苯甲酮四甲酸二酐(benzophenone tetracarboxylic dianhydride；BTDA)、雙苯四甲酸二酐或雙苯醚四甲酸二酐等之四元羧酸酐化合物。 The aforementioned quaternary carboxylic acid anhydride compound may include, but is not limited to, benzophenone tetracarboxylic dianhydride (BTDA), bisphenol tetracarboxylic dianhydride, bisphenyl ether tetracarboxylic dianhydride and the like.

該具有環氧基之化合物(a-1-4)之具體例可包含甲基丙烯酸環氧丙酯、3,4-環氧基環己基甲基丙烯酸酯、具有不飽和基的縮水甘油醚化合物、具有環氧基的不飽和化合物或上述化合物的組合。 Specific examples of the compound (a-1-4) having an epoxy group may include glycidyl methacrylate, 3,4-epoxy cyclohexyl methacrylate, and a glycidyl ether compound having an unsaturated group. , An unsaturated compound having an epoxy group, or a combination thereof.

前述具有不飽和基的縮水甘油醚化合物之具體例包含長瀨化成工業股份有限公司製造之商品，其型號為Denacol EX-111、Denacol EX-121、Denacol EX-141、Denacol EX-145、Denacol EX-146、Denacol EX-171及Denaco1 EX-192。 Specific examples of the glycidyl ether compound having an unsaturated group include products manufactured by Nagase Chemical Industry Co., Ltd., and the models are Denac EX-111, Denacol EX-121, Denacol EX-141, Denacol EX-145, and Denacol EX. -146, Denacol EX-171 and Denaco1 EX-192.

該具有不飽和基之樹脂(A-1)可由具有如式(I)所示之結構的具有至少二個環氧基之環氧化合物(a-1-1)及具有至少一個羧酸基與至少一個乙烯性不飽和基之化合物(a-1-2)進行反應，以形成具有羥基的反應產物。然後，將所製得之反應產物與羧酸酐化合物(a-1-3)進行反應，以製得本發明具有不飽和基之樹脂(A-1)。基於前述具有羥基之反應產物的羥基總當量數為1當量，該羧酸酐化合物(a-1-3)之酸酐基的當量數為0.4當量至1當量，且較佳為0.75當量至1當量。當使用多個羧酸酐化合物(a-1-3)時，此些羧酸酐化合物(a-1-3)可依序添加或 同時添加至反應中。當羧酸酐化合物(a-1-3)包含二元羧酸酐化合物及四元羧酸酐化合物時，二元羧酸酐化合物及四元羧酸酐化合物之當量比例為1/99至90/10，較佳為5/95至80/20。上述反應的操作溫度範圍為50℃至130℃。 The resin (A-1) having an unsaturated group may be an epoxy compound (a-1-1) having at least two epoxy groups having a structure as shown in formula (I), and having at least one carboxylic acid group and At least one ethylenically unsaturated compound (a-1-2) is reacted to form a reaction product having a hydroxyl group. Then, the prepared reaction product is reacted with a carboxylic anhydride compound (a-1-3) to obtain a resin (A-1) having an unsaturated group according to the present invention. The total number of hydroxyl equivalents based on the aforementioned reaction product having a hydroxyl group is 1 equivalent, and the number of equivalents of the acid anhydride group of the carboxylic anhydride compound (a-1-3) is 0.4 equivalent to 1 equivalent, and preferably 0.75 equivalent to 1 equivalent. When a plurality of carboxylic anhydride compounds (a-1-3) are used, these carboxylic anhydride compounds (a-1-3) may be sequentially added or Simultaneously added to the reaction. When the carboxylic acid anhydride compound (a-1-3) contains a dicarboxylic acid anhydride compound and a tetracarboxylic acid anhydride compound, the equivalent ratio of the dicarboxylic acid anhydride compound and the tetracarboxylic acid anhydride compound is 1/99 to 90/10, preferably It is 5/95 to 80/20. The operating temperature of the above reaction ranges from 50 ° C to 130 ° C.

該具有不飽和基之樹脂(A-1)可由具有如式(II)所示之結構的具有至少二個環氧基之環氧化合物(a-1-1)及具有至少一個羧酸基與至少一個乙烯性不飽和基之化合物(a-1-2)進行反應，以形成具有羥基的反應產物。然後，將所製得之反應產物與羧酸酐化合物(a-1-3)及/或具有環氧基之化合物(a-1-4)進行反應，以製得本發明具有不飽和基之樹脂(A-1)。基於具有如式(II)所示之結構的具有至少二個環氧基之環氧化合物(a-1-1)中的環氧基之總當量數為1當量，該具有至少一個羧酸基及至少一個乙烯性不飽和基之化合物(a-1-2)的酸價當量數為0.8當量至1.5當量，且較佳為0.9當量至1.1當量。基於前述具有羥基之反應產物的羥基總量為100莫耳百分比，該羧酸酐化合物(a-1-3)之使用量為10莫耳百分比至100莫耳百分比，較佳為20莫耳百分比至100莫耳百分比，且更佳為30莫耳百分比至100莫耳百分比。 The resin (A-1) having an unsaturated group may be an epoxy compound (a-1-1) having at least two epoxy groups having a structure as shown in formula (II) and having at least one carboxylic acid group and At least one ethylenically unsaturated compound (a-1-2) is reacted to form a reaction product having a hydroxyl group. Then, the prepared reaction product is reacted with a carboxylic anhydride compound (a-1-3) and / or an epoxy group-containing compound (a-1-4) to obtain a resin having an unsaturated group according to the present invention. (A-1). Based on the total number of equivalents of the epoxy groups in the epoxy compound (a-1-1) having at least two epoxy groups having a structure represented by the formula (II) is 1 equivalent, the compound having at least one carboxylic acid group The number of acid equivalents of the compound (a-1-2) having at least one ethylenically unsaturated group is from 0.8 to 1.5 equivalents, and preferably from 0.9 to 1.1 equivalents. The total amount of hydroxyl groups based on the aforementioned reaction product having hydroxyl groups is 100 mole percent, and the amount of the carboxylic anhydride compound (a-1-3) used is 10 mole percent to 100 mole percent, preferably 20 mole percent to 100 mole percent, and more preferably 30 mole percent to 100 mole percent.

當製備前述具有不飽和基之樹脂(A-1)時，為了加速反應速率，鹼性化合物一般會添加至反應溶液中，以作為反應觸媒。該反應觸媒之具體例可包含但不限於三苯基膦(triphenyl phosphine)、三苯基銻(triphenyl stibine)、三乙胺(triethylamine)、三乙醇胺(triethanolamine)、氯化四甲基銨(tetramethylammonium chloride)或氯化苄基三乙基銨(benzyltriethylammonium chloride)等之化合物。前述之反應觸媒可單獨一種或混合複數種使用。 When the aforementioned resin (A-1) having an unsaturated group is prepared, in order to accelerate the reaction rate, a basic compound is generally added to the reaction solution as a reaction catalyst. Specific examples of the reaction catalyst may include, but are not limited to, triphenyl phosphine, triphenyl stibine, triethylamine, triethanolamine, and tetramethylammonium chloride ( tetramethylammonium chloride) or benzyltriethylammonium chloride. The aforementioned reaction catalysts can be used singly or in combination.

基於前述具有至少二個環氧基之環氧化合物(a-1-1)及具有至少一個羧酸基與至少一個乙烯性不飽和基之化合物(a-1-2)的總使用量為100重量份，該反應觸媒之使用量為0.01重量份至10重量份， 且較佳為0.3重量份至5重量份。 Based on the total amount of the aforementioned epoxy compound (a-1-1) having at least two epoxy groups and the compound (a-1-2) having at least one carboxylic acid group and at least one ethylenically unsaturated group, 100 The weight of the reaction catalyst is 0.01 to 10 parts by weight. And it is preferably 0.3 parts by weight to 5 parts by weight.

其次，為了控制前述具有不飽和基之樹脂(A-1)的聚合度，阻聚劑(inhibitor)可加至反應溶液中。該阻聚劑之具體例可包含但不限於甲氧基酚(methoxyphenol)、甲基氫醌(methylhydroquinone)、氫醌(hydroquinone)、2,6-二第三丁基對甲酚(2,6-di-t-butyl-p-cresol)或吩噻嗪(phenothiazine)等之化合物。該阻聚劑可單獨一種或混合複數種使用。 Secondly, in order to control the polymerization degree of the resin (A-1) having an unsaturated group, an inhibitor may be added to the reaction solution. Specific examples of the polymerization inhibitor may include, but are not limited to, methoxyphenol, methylhydroquinone, hydroquinone, and 2,6-di-tert-butyl-p-cresol (2,6 -di-t-butyl-p-cresol) or phenothiazine. These polymerization inhibitors can be used singly or in combination.

基於前述具有至少二個環氧基之環氧化合物(a-1-1)及具有至少一個羧酸基與至少一個乙烯性不飽和基之化合物(a-1-2)的總使用量為100重量份，該阻聚劑之使用量為0.01重量份至10重量份，且較佳為0.1重量份至5重量份。 Based on the total amount of the aforementioned epoxy compound (a-1-1) having at least two epoxy groups and the compound (a-1-2) having at least one carboxylic acid group and at least one ethylenically unsaturated group, 100 The amount of the polymerization inhibitor used is 0.01 to 10 parts by weight, and preferably 0.1 to 5 parts by weight.

此外，當製備前述具有不飽和基之樹脂(A-1)時，聚合反應溶劑可加至反應溶液中。該聚合反應溶劑之具體例可包含但不限於乙醇、丙醇、異丙醇、丁醇、異丁醇、2-丁醇、己醇或乙二醇等之醇類化合物；甲乙酮或環己酮等之酮類化合物；甲苯或二甲苯等之芳香族烴類化合物；賽珞素或丁基賽珞素(butyl cellosolve)等之賽珞素(cellosolve)化合物；卡必妥或丁基卡必妥等之卡必妥化合物；丙二醇單甲醚等之丙二醇烷基醚類化合物；二丙二醇單甲醚[di(propylene glycol)methyl ether]等之多丙二醇烷基醚[poly(propylene glycol)alkyl ether]化合物；醋酸乙酯、醋酸丁酯、乙二醇乙醚醋酸酯(ethylene glycol monoethyl ether acetate)或丙二醇甲醚醋酸酯(propylene glycol methyl ether acetate)等之醋酸酯化合物；乳酸乙酯(ethyl lactate)或乳酸丁酯(butyl lactate)等之乳酸烷酯(alkyl lactate)化合物；或者二烷基二醇醚化合物。該聚合反應溶劑可單獨一種或混合複數種使用。 In addition, when the aforementioned resin (A-1) having an unsaturated group is prepared, a polymerization reaction solvent may be added to the reaction solution. Specific examples of the polymerization reaction solvent may include, but are not limited to, alcohol compounds such as ethanol, propanol, isopropanol, butanol, isobutanol, 2-butanol, hexanol, or ethylene glycol; methyl ethyl ketone or cyclohexanone Ketone compounds such as toluene; aromatic hydrocarbon compounds such as toluene or xylene; cellosolve compounds such as cystein or butyl cellosolve; carbitol or butyl carbitol Carbitol compounds such as propylene glycol; propylene glycol alkyl ether compounds such as propylene glycol monomethyl ether; poly (propylene glycol) alkyl ether] such as dipropylene glycol monomethyl ether [di (propylene glycol) methyl ether] Compounds; acetate compounds such as ethyl acetate, butyl acetate, ethylene glycol monoethyl ether acetate or propylene glycol methyl ether acetate; ethyl lactate or Alkyl lactate compounds such as butyl lactate; or dialkyl glycol ether compounds. This polymerization reaction solvent can be used individually or in mixture of multiple types.

本發明所製得具有不飽和基之樹脂(A-1)的酸價為50mgKOH/g至150mgKOH/g。 The acid value of the resin (A-1) having an unsaturated group prepared by the present invention is 50 mgKOH / g to 150 mgKOH / g.

本發明的具有不飽和基之樹脂(A-1)的重量平均分子量一般為600至10,000，較佳為800至8,000，更佳為1,000至6,000。具有不飽和基之樹脂(A-1)可為單一樹脂，也可使用兩種或兩種以上不同分子量的樹脂並用來達成。 The resin (A-1) having an unsaturated group according to the present invention generally has a weight average molecular weight of 600 to 10,000, preferably 800 to 8,000, and more preferably 1,000 to 6,000. The resin (A-1) having an unsaturated group may be a single resin, or two or more resins having different molecular weights may be used for the purpose.

基於鹼可溶性樹脂(A)之使用量為100重量份，該具有不飽和基之樹脂(A-1)之使用量為30重量份至100重量份，較佳為40重量份至100重量份，且更佳為50重量份至100重量份。 Based on the use amount of the alkali-soluble resin (A) being 100 parts by weight, the use amount of the unsaturated resin (A-1) is 30 to 100 parts by weight, preferably 40 to 100 parts by weight, And more preferably 50 to 100 parts by weight.

當本發明之鹼可溶性樹脂(A)包含該具有不飽和基之樹脂(A-1)時，則由此黑色感光性樹脂組成物所製得之黑色圖案其高精細度圖案的直線性更佳。 When the alkali-soluble resin (A) of the present invention contains the resin (A-1) having an unsaturated group, the black pattern produced from the black photosensitive resin composition has better linearity of the high-definition pattern. .

前述之其他鹼可溶性樹脂(A-2)可包含但不限於具有羧酸基或羥基之樹脂。該其他鹼可溶性樹脂(A-2)之具體例可為前述具有不飽和基之樹脂(A-1)以外的丙烯酸樹脂、胺基甲酸酯(urethane)樹脂、酚醛清漆樹脂等之鹼可溶性樹脂。 The aforementioned other alkali-soluble resin (A-2) may include, but is not limited to, a resin having a carboxylic acid group or a hydroxyl group. Specific examples of the other alkali-soluble resin (A-2) may be alkali-soluble resins such as acrylic resins, urethane resins, and novolac resins other than the resin (A-1) having an unsaturated group. .

基於鹼可溶性樹脂(A)之使用量為100重量份，該其他鹼可溶性樹脂(A-2)之使用量為0重量份至70重量份，較佳為0重量份至60重量份，且更佳為0重量份至50重量份。 Based on the use amount of the alkali-soluble resin (A) being 100 parts by weight, the use amount of the other alkali-soluble resin (A-2) is 0 to 70 parts by weight, preferably 0 to 60 parts by weight, and more It is preferably from 0 to 50 parts by weight.

根據本發明之具有乙烯性不飽和基之化合物(B)包含一具有乙烯性不飽和基之第一化合物(B-1)，該具有乙烯性不飽和基之第一化合物(B-1)包含式(B-I)所示之化合物： 於式(B-I)中，R1b為氫原子或甲基，R2b為氫原子、丙烯醯基或甲基丙烯醯基，及b為2至3之整數。 The compound (B) having an ethylenically unsaturated group according to the present invention contains a first compound (B-1) having an ethylenically unsaturated group, and the first compound (B-1) having an ethylenically unsaturated group includes Compound represented by formula (BI): In the formula (BI), R 1b is a hydrogen atom or a methyl group, R 2b is a hydrogen atom, an acrylfluorenyl group or a methacrylfluorenyl group, and b is an integer of 2 to 3.

於本發明之具體例中，該具有乙烯性不飽和基之第一化合物(B-1)包含但不限於三季戊四醇八(甲基)丙烯酸酯、三季戊四醇七(甲基)丙烯酸酯、四季戊四醇九(甲基)丙烯酸酯或四季戊四醇十(甲基)丙烯酸酯或上述化合物之任意組合。 In a specific example of the present invention, the first compound (B-1) having an ethylenically unsaturated group includes, but is not limited to, tripentaerythritol octa (meth) acrylate, tripentaerythritol hepta (meth) acrylate, tetrapentaerythritol Nine (meth) acrylate or tetrapentaerythritol deca (meth) acrylate or any combination of the above.

基於鹼可溶性樹脂(A)之使用量為100重量份，該具有乙烯性不飽和基之第一化合物(B-1)之使用量為30重量份至300重量份，較佳為40重量份至250重量份，且更佳為50重量份至200重量份。 The use amount of the alkali-soluble resin (A) is 100 parts by weight, and the use amount of the first compound (B-1) having an ethylenically unsaturated group is 30 parts by weight to 300 parts by weight, preferably 40 parts by weight to 250 parts by weight, and more preferably 50 to 200 parts by weight.

若使用該具有乙烯性不飽和基之第一化合物(B-1)，則由此黑色感光性樹脂組成物所製得之黑色圖案其高精細度的圖案直線性較佳。 When the first compound (B-1) having an ethylenically unsaturated group is used, the black pattern produced from the black photosensitive resin composition has a high-definition pattern linearity.

於本發明之另一具體例中，該具有乙烯性不飽和基之化合物(B)可進一步地包含一具有乙烯性不飽和基之第二化合物(B-2)，該具有乙烯性不飽和基之第二化合物(B-2)係選自於具有一個乙烯性不飽和基的化合物或具有兩個以上(含兩個)乙烯性不飽和基的化合物。 In another specific example of the present invention, the compound (B) having an ethylenically unsaturated group may further include a second compound (B-2) having an ethylenically unsaturated group, which has an ethylenically unsaturated group. The second compound (B-2) is selected from a compound having one ethylenically unsaturated group or a compound having two or more (including two) ethylenically unsaturated groups.

該具有一個乙烯性不飽和基之化合物的具體例可包含但不限於(甲基)丙烯醯胺[(meth)acrylamide]、(甲基)丙烯醯嗎啉、(甲 基)丙烯酸-7-胺基-3,7-二甲基辛酯、異丁氧基甲基(甲基)丙烯醯胺、(甲基)丙烯酸異冰片基氧乙酯、(甲基)丙烯酸異冰片酯、(甲基)丙烯酸-2-乙基己酯、乙基二乙二醇(甲基)丙烯酸酯、第三辛基(甲基)丙烯醯胺、二丙酮(甲基)丙烯醯胺、(甲基)丙烯酸二甲基胺基乙酯、(甲基)丙烯酸十二烷基酯、(甲基)丙烯酸二環戊烯氧基乙酯、(甲基)丙烯酸二環戊烯酯、N,N-二甲基(甲基)丙烯醯胺、(甲基)丙烯酸四氯苯酯、(甲基)丙烯酸-2-四氯苯氧基乙酯、(甲基)丙烯酸四氫糠酯[tetrahydrofurfuryl(meth)acrylate]、(甲基)丙烯酸四溴苯酯、(甲基)丙烯酸-2-四溴苯氧基乙酯、(甲基)丙烯酸-2-三氯苯氧基乙酯、(甲基)丙烯酸三溴苯酯、(甲基)丙烯酸-2-三溴苯氧基乙酯、2-羥基-(甲基)丙烯酸乙酯、2-羥基-(甲基)丙烯酸丙酯、乙烯基己內醯胺、氮-乙烯基吡咯烷酮、(甲基)丙烯酸苯氧基乙酯、(甲基)丙烯酸五氯苯酯、(甲基)丙烯酸五溴苯酯、聚單(甲基)丙烯酸乙二酯、聚單(甲基)丙烯酸丙二酯或(甲基)丙烯酸冰片酯等之化合物。該具有一個乙烯性不飽和基之化合物)可單獨一種或混合複數種使用。 Specific examples of the compound having one ethylenically unsaturated group may include, but are not limited to, (meth) acrylamide, (meth) acrylmorpholine, (formyl) (Meth) acrylic acid-7-amino-3,7-dimethyloctyl, isobutoxymethyl (meth) acrylamide, isobornyloxyethyl (meth) acrylate, (meth) acrylic acid Isobornyl ester, 2-ethylhexyl (meth) acrylate, ethyl diethylene glycol (meth) acrylate, third octyl (meth) acrylamide, diacetone (meth) acryl Amine, dimethylaminoethyl (meth) acrylate, dodecyl (meth) acrylate, dicyclopentenyloxy (meth) acrylate, dicyclopentenyl (meth) acrylate , N, N-dimethyl (meth) acrylamide, tetrachlorophenyl (meth) acrylate, 2-tetrachlorophenoxyethyl (meth) acrylate, tetrahydrofurfur (meth) acrylate [Tetrahydrofurfuryl (meth) acrylate], tetrabromophenyl (meth) acrylate, 2-tetrabromophenoxyethyl (meth) acrylate, 2-trichlorophenoxyethyl (meth) acrylate , Tribromophenyl (meth) acrylate, 2-tribromophenoxyethyl (meth) acrylate, ethyl 2-hydroxy- (meth) acrylate, propyl 2-hydroxy- (meth) acrylate , Vinylcaprolactam, nitrogen-vinylpyrrolidone, phenoxyethyl (meth) acrylate, (meth) propyl Acid pentachlorophenyl ester, (meth) acrylate, pentabromophenyl acrylate, polyethylene mono (meth) acrylate, polyethylene terephthalate, polypropylene, etc. compound bornyl acrylate mono (meth) acrylate or propylene glycol (meth) acrylate. The compound having one ethylenically unsaturated group) may be used alone or in combination.

該具有二個以上(包含二個)之乙烯性不飽和基的化合物之具體例可包含但不限於乙二醇二(甲基)丙烯酸酯、二(甲基)丙烯酸二環戊烯酯、三乙二醇二(甲基)丙烯酸酯、四乙二醇二(甲基)丙烯酸酯、三(2-羥基乙基)異氰酸二(甲基)丙烯酸酯、三(2-羥基乙基)異氰酸三(甲基)丙烯酸酯、己內酯改質的三(2-羥基乙基)異氰酸三(甲基)丙烯酸酯、三(甲基)丙烯酸三羥甲基丙酯、環氧乙烷(ethylene oxide；EO)改質的三(甲基)丙烯酸三羥甲基丙酯、環氧丙烷(propylene oxide；PO)改質的三(甲基)丙烯酸三羥甲基丙酯、三丙二醇二(甲基)丙烯酸酯、新戊二醇二(甲基)丙烯酸酯、1,4-丁二醇二(甲基)丙烯酸酯、1,6-己二醇二(甲基)丙烯酸酯、季戊四醇三(甲基)丙烯酸酯、季戊四醇四(甲基)丙烯酸酯、聚酯二(甲基)丙烯酸酯、聚乙二醇二(甲基)丙烯酸 酯、二季戊四醇六(甲基)丙烯酸酯、二季戊四醇五(甲基)丙烯酸酯、二季戊四醇四(甲基)丙烯酸酯、己內酯改質的二季戊四醇六(甲基)丙烯酸酯、己內酯改質的二季戊四醇五(甲基)丙烯酸酯、四(甲基)丙烯酸二三羥甲基丙酯[di(trimethylolpropane)tetra(meth)acrylate]、經環氧乙烷改質的雙酚A二(甲基)丙烯酸酯、經環氧丙烷改質的雙酚A二(甲基)丙烯酸酯、經環氧乙烷改質的氫化雙酚A二(甲基)丙烯酸酯、經環氧丙烷改質的氫化雙酚A二(甲基)丙烯酸酯、經環氧丙烷改質的甘油三(甲基)丙烯酸酯、經環氧乙烷改質的雙酚F二(甲基)丙烯酸酯、酚醛清漆聚縮水甘油醚(甲基)丙烯酸酯或上述化合物之任意組合。該具有二個以上(包含二個)之乙烯性不飽和基的化合物可單獨一種或混合複數種使用。 Specific examples of the compound having two or more (including two) ethylenically unsaturated groups may include, but are not limited to, ethylene glycol di (meth) acrylate, dicyclomethene di (meth) acrylate, and three Ethylene glycol di (meth) acrylate, tetraethylene glycol di (meth) acrylate, tris (2-hydroxyethyl) isocyanate di (meth) acrylate, tris (2-hydroxyethyl) Tris (meth) acrylate isocyanate, caprolactone modified tris (2-hydroxyethyl) isocyanate tris (meth) acrylate, tris (methyl) acrylate trimethylolpropyl, cyclic Ethylene oxide (EO) modified trimethylol propyl tri (meth) acrylate, propylene oxide (PO) modified trimethylol propyl tri (meth) acrylate, Tripropylene glycol di (meth) acrylate, neopentyl glycol di (meth) acrylate, 1,4-butanediol di (meth) acrylate, 1,6-hexanediol di (meth) acrylic acid Ester, pentaerythritol tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, polyester di (meth) acrylate, polyethylene glycol di (meth) acrylate Ester, dipentaerythritol hexa (meth) acrylate, dipentaerythritol penta (meth) acrylate, dipentaerythritol tetra (meth) acrylate, caprolactone modified dipentaerythritol hexa (meth) acrylate, caprolactone Ester modified pentaerythritol penta (meth) acrylate, di (trimethylolpropane) tetra (meth) acrylate, ethylene oxide modified bisphenol A Di (meth) acrylate, bisphenol A di (meth) acrylate modified by propylene oxide, hydrogenated bisphenol A di (meth) acrylate modified by ethylene oxide, propylene oxide Modified hydrogenated bisphenol A di (meth) acrylate, glycerol tri (meth) acrylate modified by propylene oxide, bisphenol F di (meth) acrylate modified by ethylene oxide, Novolak polyglycidyl ether (meth) acrylate or any combination thereof. The compound having two or more ethylenically unsaturated groups may be used alone or in combination.

該具有乙烯性不飽和基之第二化合物(B-2)較佳可為三丙烯酸三羥甲基丙酯、二季戊四醇四丙烯酸酯、二季戊四醇六丙烯酸酯或上述化合物之任意組合。 The second compound (B-2) having an ethylenically unsaturated group may preferably be trimethylolpropyl triacrylate, dipentaerythritol tetraacrylate, dipentaerythritol hexaacrylate, or any combination thereof.

基於鹼可溶性樹脂(A)之使用量為100重量份，該具有乙烯性不飽和基之化合物(B)之使用量為30重量份至300重量份，較佳為40重量份至250重量份，且更佳為50重量份至200重量份。 Based on the use amount of the alkali-soluble resin (A) being 100 parts by weight, the use amount of the compound (B) having an ethylenically unsaturated group is 30 to 300 parts by weight, preferably 40 to 250 parts by weight, And more preferably, it is 50 to 200 parts by weight.

本發明之光起始劑(C)可為藉由照光產生自由基的物質，且前述具有自由基之物質可引發聚合物與聚合物之間、聚合物與寡聚合物之間或聚合物與單體之間的交聯反應，而可形成具有良好機械強度之圖案(例如：黑色矩陣或黑色間隙體)。 The photoinitiator (C) of the present invention may be a substance that generates free radicals by irradiating light, and the aforementioned substance having a free radical may trigger a polymer to a polymer, a polymer to an oligomer, or a polymer to The cross-linking reaction between monomers can form a pattern with good mechanical strength (for example: black matrix or black interstitial body).

根據本發明之光起始劑(C)包含一具有式(C-I)所示結構之第一光起始劑(C-1)，其次，該光起始劑(C)可選擇性地包含如式(C-II)所示結構之第二光起始劑(C-2)，另可選擇性包含其他光起始劑(C-3)，以下分述之。 The photoinitiator (C) according to the present invention includes a first photoinitiator (C-1) having a structure represented by formula (CI). Second, the photoinitiator (C) may optionally include The second photoinitiator (C-2) of the structure represented by the formula (C-II) may optionally include other photoinitiators (C-3), which will be described below.

根據本發明之光起始劑(C)包含一具有式(C-I)所示結構 之光起始劑(C-1)： 其中，R1、R2、R3、R4、R5、R6、R7及R8彼此獨立地為氫、C1-C20烷基、、COR16、OR17、鹵素、NO2 或，或R1及R2、R2及R3、R3及R4、R5及R6、 R6及R7或R7及R8彼此獨立地為經取代之C2-C10烯基或R1及R2、R2及R3、R3及R4、R5及R6、R6及R7或R7及R8彼此獨立地共同為-(CH2)P-Y-(CH2)q-；或R1及R2、R2及R3、R3及R4、R5及R6、R6及R7或R7及R8彼此獨立地共同為但條件為R1及R2、R2及R3、R3及R4、R5及R6、R6及R7或R7及R8中至少一對係R9、R10、R11及R12彼此獨立地為氫、C1-C20烷基，該C1-C20烷基未經取代或經一或多個以下基團取代：鹵素、苯基、CN、OH、SH、C1-C4-烷氧基、(CO)OH或(CO)O(C1-C4烷基)；或R9、R10、R11及R12彼此獨立地為未經取代之苯基或經一或多個以下基團取代之苯基：C1-C6烷基、鹵素、CN、OR17、SR18或NR19R20；或R9、R10、R11及R12彼此獨立地為鹵素、CN、OR17、SR18、SOR18、SO2R18或NR19R20，其中該等取代基 OR17、SR18或NR19R20視情況經由基團R17、R18、R19及/或R20與萘基環中一個碳原子形成5員或6員環；或R9、R10、R11及R12彼此獨立地為、COR16或NO2；Y係O、S、NR26或直接鍵；p係整數0、1、2或3；q係整數1、2或3；X係CO或直接鍵；R13係C1-C20烷基，其未經取代或經一或多個以下基團取代：鹵素、R17、COOR17、OR17、SR18、CONR19R20、NR19R20、PO(OCkH2k+1)2或或R13係C2-C20烷基，其間雜有一或多個O、S、SO、SO2、NR26或CO，或係C2-C12烯基，其未經間雜或間雜有一或多個O、CO或NR26，其中經間雜之C2-C20烷基及未經間雜或經間雜之C2-C12烯基未經取代或經一或多個鹵素取代；或R13係C4-C8環烯基、C2-C12炔基或未經間雜或間雜有一或多個O、S、CO或NR26之C3-C10環烷基；或R13係苯基或萘基，其各未經取代或經一或多個以下基團取代：OR17、SR18、NR19R20、、COR16、CN、NO2、鹵素、C1-C20烷基、C1-C4鹵代烷基、間雜有一或多個O、S、CO或NR26之C2-C20烷基；或其各經C3-C10環烷基或間雜有一或多個O、S、CO或NR26之C3-C10環烷基取代；k係整數1至10； R14係氫、C3-C8環烷基、C2-C5烯基、C1-C20烷氧基或C1-C20烷基，其未經取代或經一或多個鹵素、苯基、C1-C20烷基苯基或CN取代；或R14係苯基或萘基，其各未經取代或經一或多個以下基團取代：C1-C6烷基、C1-C4鹵代烷基、鹵素、CN、OR17、SR18及/或NR19R20；或R14係C3-C20雜芳基、C1-C8烷氧基、苄氧基或苯氧基，該苄氧基及苯氧基未經取代或經一或多個C1-C6烷基、C1-C4鹵代烷基及/或鹵素取代；R15係C6-C20芳基或C3-C20雜芳基，其各未經取代或經一或多個以下基團取代：苯基、鹵素、C1-C4鹵代烷基、CN、NO2、OR17、SR18、NR19R20、PO(OCkH2k+1)2、SO-C1-C10烷基、SO2-C1-C10烷基、間雜有一或多個O、S或NR26之C2-C20烷基；或其各經C1-C20烷基取代，該C1-C20烷基未經取代或經一或多個以下基團取代：鹵素、COOR17、CONR19R20、苯基、C3-C8環烷基、C3-C20雜芳基、C6-C20芳氧基羰基、C3-C20雜芳氧基羰基、OR17、SR18或NR19R20；或R15係氫、C2-C12烯基、未經間雜或間雜有一或多個O、CO或NR26之C3-C8環烷基；或R15係C1-C20烷基，其未經取代或經一或多個以下基團取代：鹵素、OR17、SR18、C3-C8環烷基、C3-C20雜芳基、C6-C20芳氧基羰基、C3-C20雜芳氧基羰基、NR19R20、COOR17、CONR19R20、PO(OCkH2k+1)2、 、苯基；或該C1-C20烷基經苯基取代，該苯 基經鹵素、C1-C20烷基、C1-C4鹵代烷基、OR17、SR18或NR19R20取代；或R15係C2-C20烷基，其間雜有一或多個O、SO或SO2，且該經間雜之C2-C20烷基未經取代或經一或多個以下基團取代：鹵素、OR17、COOR17、CONR19R20、苯基或經OR17、SR18或NR19R20取代之苯基；或R15係C2-C20烷醯基或苯甲醯基，其未經取代或經一或多個以下基團取代：C1-C6烷基、鹵素、苯基、OR17、SR18或NR19R20；或R15係未經取代或經一或多個OR17取代之萘甲醯基或係C3-C14雜芳基羰基；或R15係C2-C12烷氧基羰基，其未經間雜或間雜有一或多個O且該經間雜或未經間雜之C2-C12烷氧基羰基未經取代或經一或多個羥基取代；或R15係苯氧基羰基，其未經取代或經一或多個以下基團取代：C1-C6烷基、鹵素、C1-C4鹵代烷基、苯基、OR17、SR18或NR19R20；或R15係CN、CONR19R20、NO2、C1-C4鹵代烷基、S(O)m-C1-C6烷基、未經取代或經C1-C12烷基或SO2-C1-C6烷基取代之S(O)m-苯基；或R15係SO2O-苯基，其未經取代或經C1-C12烷基取代；或係二苯基膦醯基或二(C1-C4烷氧基)-膦醯基；m係1或2；R'14具有針對R14所給出含義中之一者；R'15具有針對R15所給出含義中之一者；X1係O、S、SO或SO2； X2係O、CO、S或直接鍵；R16係C6-C20芳基或C3-C20雜芳基，其各未經取代或經一或多個以下基團取代：苯基、鹵素、C1-C4鹵代烷基、CN、NO2、OR17、SR18、NR19R20或間雜有一或多個O、S或NR26之C1-C20烷基；或其各經一或多個C1-C20烷基取代，該C1-C20烷基未經取代或經一或多個以下基團取代：鹵素、COOR17、CONR19R20、苯基、C3-C8環烷基、C3-C20雜芳基、C6-C20芳氧基羰基、C3-C20雜芳氧基羰基、OR17、SR18或NR19R20；或R16係氫、C1-C20烷基，該C1-C20烷基未經取代或經一或多個以下基團取代：鹵素、苯基、OH、SH、CN、C3-C6烯氧基、OCH2CH2CN、OCH2CH2(CO)O(C1-C4烷基)、O(CO)-(C1-C4烷基)、O(CO)-苯基、(CO)OH或(CO)O(C1-C4烷基)；或R16係C2-C12烷基，其間雜有一或多個O、S或NR26；或R16係(CH2CH2O)n+1H、(CH2CH2O)n(CO)-(C1-C8烷基)、C2-C12烯基或C3-C8環烷基；或R16係經SR18取代之苯基，其中基團R18表示鍵結至其中附接有COR16之咔唑部分之苯基或萘基環的直接鍵；n係1至20；R17係氫、苯基-C1-C3烷基、C1-C20烷基，其未經取代或經一或多個以下基團取代：鹵素、OH、SH、CN、C3-C6烯氧基、OCH2CH2CN、OCH2CH2(CO)O(C1-C4烷基)、O(CO)-(C1-C4烷基)、OCO)-(C2-C4)烯基、O(CO)-苯基、(CO)OH、(CO)O(C1-C4烷基)、C3-C20環烷基、SO2-(C1-C4鹵代烷基)、O(C1-C4鹵代烷基)或間雜有一或多個O之C3- C20環烷基；或R17係C2-C20烷基，其間雜有一或多個O、S或NR26；或R17係(CH2CH2O)n+1H、(CH2CH2O)n(CO)-(C1-C8烷基)、C1-C8烷醯基、C2-C12烯基、C3-C6烯醯基或未經間雜或間雜有一或多個O、S、CO或NR26之C3-C20環烷基；或R17係C1-C8烷基-C3-C10環烷基，其未經間雜或間雜有一或多個O；或R17係苯甲醯基，其未經取代或經一或多個C1-C6烷基、鹵素、OH或C1-C3烷氧基取代；或R17係苯基、萘基或C3-C20雜芳基，其各未經取代或經一或多個以下基團取代：鹵素、OH、C1-C12烷基、C1-C12烷氧基、CN、NO2、苯基-C1-C3烷氧基、苯氧基、C1-C12烷基硫基、苯基硫基、N(C1-C12烷基)2、二苯基-胺基或 或R17形成鍵結至其上具有基團或之苯基或萘基環之一個碳原子之直接鍵；R18係氫、C2-C12烯基、C3-C20環烷基或苯基-C1-C3烷基，其中C2-C12烯基、C3-C20環烷基或苯基-C1-C3烷基未經間雜或間雜有一或多個O、S、CO、NR26或COOR17；或R18係C1-C20烷基，其未經取代或經一或多個以下基團取代：OH、SH、CN、C3-C6烯氧基、OCH2CH2CN、OCH2CH2(CO)O(C1-C4烷基)、O(CO)-(C2-C4)烯基、O(CO)-(C1-C4烷基)、O(CO)-苯基或(CO)OR17；或R18係C2-C20烷基，其間雜有一或多個O、S、CO、NR26或COOR17； 或R18係(CH2CH2O)nH、(CH2CH2O)n(CO)-(C1-C8烷基)、C2-C8烷醯基或C3-C6烯醯基；或R18係苯甲醯基，其未經取代或經一或多個以下基團取代：C1-C6烷基、鹵素、OH、C1-C4烷氧基或C1-C4烷基硫基；或R18係苯基、萘基或C3-C20雜芳基，其各未經取代或經一或多個以下基團取代：鹵素、C1-C12烷基、C1-C4鹵代烷基、C1-C12烷氧基、CN、NO2、苯基-C1-C3烷氧基、苯氧基、C1-C12烷基硫基、苯基硫基、N(C1-C12烷基)2、二苯基胺基、(CO)O(C1-C8烷基)、(CO)-C1-C8烷基、(CO)N(C1-C8烷基)2或R19及R20彼此獨立地為氫、C1-C20烷基、C2-C4羥基烷基、C2-C10烷氧基烷基、C2-C5烯基、C3-C20環烷基、苯基-C1-C3烷基、C1-C8烷醯基、C1-C8烷醯基氧基、C3-C12烯醯基、SO2-(C1-C4鹵代烷基)或苯甲醯基；或R19及R20係苯基、萘基或C3-C20雜芳基，其各未經取代或經一或多個以下基團取代：鹵素、C1-C4鹵代烷基、C1-C20烷氧基、C1-C12烷基、苯甲醯基或C1-C12烷氧基；或R19及R20與其所附接之N原子一起形成未經間雜或間雜有O、S或NR17之5員或6員飽和或不飽和環，且該5員或6員飽和或不飽和環未經取代或經一或多個以下基團取代：C1-C20烷基、C1-C20烷氧基、=O、OR17、SR18、NR21R22、(CO)R23、NO2、鹵素、C1-C4-鹵代烷基、CN、苯基、或C3-C20環烷基，該C3-C20環烷基未經間雜或間雜有一或多個O、S、CO或NR17； 或R19及R20與其所附接之N原子一起形成雜芳香族環系統，該環系統未經取代或經一或多個以下基團取代：C1-C20烷基、C1-C4鹵代烷基、C1-C20烷氧基、=O、OR17、SR18、NR21R22、(CO)R23、、鹵素、NO2、CN、苯基或C3-C20環烷基，該C3-C20環烷基未經間雜或間雜有一或多個O、S、CO或NR17；R21及R22彼此獨立地為氫、C1-C20烷基、C1-C4鹵代烷基、C3-C10環烷基或苯基；或R21及R22與其所附接之N原子一起形成未經間雜或間雜有O、S或NR26之5員或6員飽和或不飽和環，且該5員或6員飽和或不飽和環未稠合或該5員或6員飽和或不飽和環係與苯環稠合；R23係氫、OH、C1-C20烷基、C1-C4鹵代烷基、間雜有一或多個O、CO或NR26之C2-C20烷基、未經間雜或間雜有O、S、CO或NR26之C3-C20環烷基，或R23係苯基、萘基、苯基-C1-C4烷基、OR17、SR18或NR21R22；R24係(CO)OR17、CONR19R20、(CO)R17；或R24具有針對R19及R20所給出含義中之一者；R25係COOR17、CONR19R20、(CO)R17；或R25具有針對R17所給出含義中之一者；R26係氫、C1-C20烷基、C1-C4鹵代烷基、間雜有一或多個O或CO之C2-C20烷基；或係苯基-C1-C4烷基、未經間雜或間雜有一或多個O或CO之C3-C8環烷基；或係(CO)R19；或係苯基，其未經取代或經一或多個以下基團取代：C1-C20烷基、鹵素、C1-C4鹵代烷基、OR17、SR18、NR19R20或 但條件為在該分子中存在至少一個基團或 The photoinitiator (C) according to the present invention includes a photoinitiator (C-1) having a structure represented by the formula (CI): Among them, R 1 , R 2 , R 3 , R 4 , R 5 , R 6 , R 7 and R 8 are each independently hydrogen, C 1 -C 20 alkyl, , COR 16 , OR 17 , halogen, NO 2 or , Or R 1 and R 2 , R 2 and R 3 , R 3 and R 4 , R 5 and R 6 , R 6 and R 7 or R 7 and R 8 are independent of each other. Substituted C 2 -C 10 alkenyl or R 1 and R 2 , R 2 and R 3 , R 3 and R 4 , R 5 and R 6 , R 6 and R 7 or R 7 and R 8 independently of one another are -(CH 2 ) P -Y- (CH 2 ) q- ; or R 1 and R 2 , R 2 and R 3 , R 3 and R 4 , R 5 and R 6 , R 6 and R 7 or R 7 and R 8 independently of each other is Provided that at least one of R 1 and R 2 , R 2 and R 3 , R 3 and R 4 , R 5 and R 6 , R 6 and R 7 or R 7 and R 8 R 9 , R 10 , R 11 and R 12 are independently of each other hydrogen, C 1 -C 20 alkyl, the C 1 -C 20 alkyl is unsubstituted or substituted with one or more of the following groups: halogen, benzene Group, CN, OH, SH, C 1 -C 4 -alkoxy, (CO) OH or (CO) O (C 1 -C 4 alkyl); or R 9 , R 10 , R 11 and R 12 each other Independently unsubstituted phenyl or phenyl substituted with one or more of the following: C 1 -C 6 alkyl, halogen, CN, OR 17 , SR 18 or NR 19 R 20 ; or R 9 , R 10 , R 11 and R 12 are independently of each other halogen, CN, OR 17 , SR 18 , SOR 18 , SO 2 R 18 or NR 19 R 20 , wherein the substituents OR 17 , SR 18 or NR 19 R 20 Optionally a 5- or 6-membered ring with a carbon atom in the naphthyl ring via the groups R 17 , R 18 , R 19 and / or R 20 ; or R 9 , R 10 , R 11 and R 12 are independently of one another , COR 16 or NO 2 ; Y is O, S, NR 26 or direct bond; p is integer 0, 1, 2 or 3; q is integer 1, 2 or 3; X is CO or direct bond; R 13 is C 1- C 20 alkyl, which is unsubstituted or substituted with one or more of the following groups: halogen, R 17 , COOR 17 , OR 17 , SR 18 , CONR 19 R 20 , NR 19 R 20 , PO (OC k H 2k + 1 ) 2 or Or R 13 is a C 2 -C 20 alkyl group, which is interspersed with one or more O, S, SO, SO 2 , NR 26 or CO, or a C 2 -C 12 alkenyl group, which is not interspersed with or A plurality of O, CO or NR 26 in which an interspersed C 2 -C 20 alkyl group and an unsaturated or interspersed C 2 -C 12 alkenyl group are unsubstituted or substituted with one or more halogens; or R 13 Is C 4 -C 8 cycloalkenyl, C 2 -C 12 alkynyl or C 3 -C 10 cycloalkyl without one or more O, S, CO or NR 26 ; or R 13 is benzene Or naphthyl, each unsubstituted or substituted with one or more of the following groups: OR 17 , SR 18 , NR 19 R 20 , , COR 16, CN, NO 2 , halogen, C 1 -C 20 alkyl, C 1 -C 4 haloalkyl, interrupted by one or more O, S, CO or NR C 26 of 2 -C 20 alkyl group; or via their respective C 3 -C 10 cycloalkyl, or interrupted by one or more O, S, CO or NR 26 of the C 3 -C 10 cycloalkyl; based integer k 1 to 10; R 14 type hydrogen, C 3 -C 8 cycloalkyl, C 2 -C 5 alkenyl, C 1 -C 20 alkoxy, or C 1 -C 20 alkyl, which are unsubstituted or substituted by one or more halogen, phenyl, C 1- C 20 alkylphenyl or CN substituted; or R 14 is phenyl or naphthyl, each of which is unsubstituted or substituted with one or more of the following: C 1 -C 6 alkyl, C 1 -C 4 haloalkane Group, halogen, CN, OR 17 , SR 18 and / or NR 19 R 20 ; or R 14 is a C 3 -C 20 heteroaryl group, C 1 -C 8 alkoxy group, benzyloxy group or phenoxy group, the Benzyloxy and phenoxy are unsubstituted or substituted with one or more C 1 -C 6 alkyl, C 1 -C 4 haloalkyl and / or halogen; R 15 is C 6 -C 20 aryl or C 3 -C 20 heteroaryl, each unsubstituted or substituted with one or more of the following groups: phenyl, halogen, C 1 -C 4 haloalkyl, CN, NO 2 , OR 17 , SR 18 , NR 19 R 20 、 PO (OC k H 2k + 1 ) 2 , SO-C 1 -C 10 alkyl, SO 2 -C 1 -C 10 alkyl, C 2 -C 20 alkyl interspersed with one or more O, S or NR 26 ; or each C 1- C 20 alkyl substitution, the C 1 -C 20 alkyl group is unsubstituted or substituted with one or more of the following groups: halogen, COOR 17 , CONR 19 R 20 , phenyl, C 3 -C 8 cycloalkyl, C 3 -C 20 heteroaryl, C 6 -C 20 aryloxycarbonyl, C 3 -C 20 heteroaryloxycarbonyl, OR 17 , SR 18 or NR 19 R 20 ; or R 15 is hydrogen, C 2- C 12 alkenyl, C 3 -C 8 cycloalkyl without one or more O, CO or NR 26 ; or R 15 is C 1 -C 20 alkyl, which is unsubstituted or Multiple substitutions of the following groups: halogen, OR 17 , SR 18 , C 3 -C 8 cycloalkyl, C 3 -C 20 heteroaryl, C 6 -C 20 aryloxycarbonyl, C 3 -C 20 heteroaryl Oxycarbonyl, NR 19 R 20 , COOR 17 , CONR 19 R 20 , PO (OC k H 2k + 1 ) 2 , , Phenyl; or the C 1 -C 20 alkyl group is substituted with a phenyl group, the phenyl group is halogen, C 1 -C 20 alkyl group, C 1 -C 4 haloalkyl group, OR 17 , SR 18 or NR 19 R 20 Substituted; or R 15 is a C 2 -C 20 alkyl group, in which one or more O, SO, or SO 2 is interspersed, and the interspersed C 2 -C 20 alkyl group is unsubstituted or substituted by one or more of the following groups Group substitution: halogen, OR 17 , COOR 17 , CONR 19 R 20 , phenyl or phenyl substituted with OR 17 , SR 18 or NR 19 R 20 ; or R 15 is a C 2 -C 20 alkylfluorenyl or benzyl Fluorenyl, which is unsubstituted or substituted with one or more of the following: C 1 -C 6 alkyl, halogen, phenyl, OR 17 , SR 18 or NR 19 R 20 ; or R 15 is unsubstituted or A naphthylmethyl group substituted with one or more OR 17 or a C 3 -C 14 heteroarylcarbonyl group; or R 15 is a C 2 -C 12 alkoxycarbonyl group, which is not interspersed or has one or more O And the C 2 -C 12 alkoxycarbonyl group is unsubstituted or substituted with one or more hydroxyl groups; or R 15 is a phenoxycarbonyl group which is unsubstituted or substituted with one or more Group substitution: C 1 -C 6 alkyl, halogen, C 1 -C 4 haloalkyl, phenyl, OR 17 , SR 18 or NR 19 R 20 ; or R 15 is CN, CONR 19 R 20 , NO 2 , C 1 -C 4 haloalkyl, S (O) m -C 1 -C 6 alkyl, unsubstituted or C 1 -C 12 alkyl or SO 2 -C 1 -C 6 alkyl substituted S (O) m -phenyl; or R 15 is SO 2 O-phenyl, which is unsubstituted or substituted by C 1 -C 12 Group substitution; or diphenylphosphinofluorenyl or bis (C 1 -C 4 alkoxy) -phosphinofluorenyl; m is 1 or 2; R '14 has one of the meanings given for R 14 ; R '15 has one of the meanings given for R 15 ; X 1 is O, S, SO, or SO 2 ; X 2 is O, CO, S, or a direct bond; R 16 is C 6 -C 20 aryl Or C 3 -C 20 heteroaryl, each of which is unsubstituted or substituted with one or more of the following groups: phenyl, halogen, C 1 -C 4 haloalkyl, CN, NO 2 , OR 17 , SR 18 , NR 19 R 20 or one or more C 1 -C 20 alkyl groups with one or more O, S or NR 26 ; or each substituted with one or more C 1 -C 20 alkyl groups, the C 1 -C 20 alkyl group Unsubstituted or substituted with one or more of the following groups: halogen, COOR 17 , CONR 19 R 20 , phenyl, C 3 -C 8 cycloalkyl, C 3 -C 20 heteroaryl, C 6 -C 20 Aryloxycarbonyl, C 3 -C 20 heteroaryloxycarbonyl, OR 17 , SR 18 or NR 19 R 20 ; or R 16 is hydrogen, C 1 -C 20 alkyl, the C 1 -C 20 alkyl is unsubstituted or substituted with one or more of the following groups: halogen, phenyl , OH, SH, CN, C 3 -C 6 alkenyloxy, OCH 2 CH 2 CN, OCH 2 CH 2 (CO) O (C 1 -C 4 alkyl), O (CO)-(C 1 -C 4 alkyl), O (CO) -phenyl, (CO) OH or (CO) O (C 1 -C 4 alkyl); or R 16 is C 2 -C 12 alkyl, with one or more intervening in between O, S or NR 26 ; or R 16 series (CH 2 CH 2 O) n + 1 H, (CH 2 CH 2 O) n (CO)-(C 1 -C 8 alkyl), C 2 -C 12 Alkenyl or C 3 -C 8 cycloalkyl; or R 16 is a phenyl substituted with SR 18 , where the group R 18 represents a phenyl or naphthyl ring bonded to the carbazole moiety to which COR 16 is attached N is 1 to 20; R 17 is hydrogen, phenyl-C 1 -C 3 alkyl, C 1 -C 20 alkyl, which is unsubstituted or substituted with one or more of the following groups: halogen , OH, SH, CN, C 3 -C 6 alkenyloxy, OCH 2 CH 2 CN, OCH 2 CH 2 (CO) O (C 1 -C 4 alkyl), O (CO)-(C 1 -C 4 alkyl), OCO)-(C 2 -C 4 ) alkenyl, O (CO) -phenyl, (CO) OH, (CO) O (C 1 -C 4 alkyl), C 3 -C 20 Cycloalkyl, SO 2- (C 1 -C 4 haloalkyl), O (C 1- C 4 haloalkyl) or C 3 -C 20 cycloalkyl with one or more O in between; or R 17 is a C 2 -C 20 alkyl with one or more O, S or NR 26 in between ; or R 17 (CH 2 CH 2 O) n + 1 H, (CH 2 CH 2 O) n (CO)-(C 1 -C 8 alkyl), C 1 -C 8 alkyl, C 2 -C 12 ene C 3 -C 6 alkenyl or C 3 -C 20 cycloalkyl without one or more O, S, CO or NR 26 ; or R 17 is C 1 -C 8 alkyl- C 3 -C 10 cycloalkyl, which has one or more O unsaturated or interspersed; or R 17 is benzamidine, which is unsubstituted or has one or more C 1 -C 6 alkyl, halogen, OH or C 1 -C 3 alkoxy substituted; or R 17 is phenyl, naphthyl or C 3 -C 20 heteroaryl, each unsubstituted or substituted with one or more of the following groups: halogen, OH , C 1 -C 12 alkyl, C 1 -C 12 alkoxy, CN, NO 2 , phenyl-C 1 -C 3 alkoxy, phenoxy, C 1 -C 12 alkylthio, benzene Alkylthio, N (C 1 -C 12 alkyl) 2 , diphenyl-amino or Or R 17 forms a bond to or Direct bond of one carbon atom of phenyl or naphthyl ring; R 18 is hydrogen, C 2 -C 12 alkenyl, C 3 -C 20 cycloalkyl or phenyl-C 1 -C 3 alkyl, where C 2- C 12 alkenyl, C 3 -C 20 cycloalkyl or phenyl-C 1 -C 3 alkyl without one or more O, S, CO, NR 26 or COOR 17 ; or R 18 Is a C 1 -C 20 alkyl group, which is unsubstituted or substituted with one or more of the following groups: OH, SH, CN, C 3 -C 6 alkenyloxy, OCH 2 CH 2 CN, OCH 2 CH 2 ( CO) O (C 1 -C 4 alkyl), O (CO)-(C 2 -C 4 ) alkenyl, O (CO)-(C 1 -C 4 alkyl), O (CO) -phenyl Or (CO) OR 17 ; or R 18 is a C 2 -C 20 alkyl group with one or more O, S, CO, NR 26 or COOR 17 interposed therebetween; or R 18 (CH 2 CH 2 O) n H , (CH 2 CH 2 O) n (CO)-(C 1 -C 8 alkyl), C 2 -C 8 alkylfluorenyl or C 3 -C 6 alkenyl; or R 18 benzamyl, It is unsubstituted or substituted with one or more of the following groups: C 1 -C 6 alkyl, halogen, OH, C 1 -C 4 alkoxy, or C 1 -C 4 alkylthio; or R 18 series Phenyl, naphthyl or C 3 -C 20 heteroaryl, each unsubstituted or substituted with one or more of the following groups: halogen, C 1 -C 12 alkyl, C 1 -C 4 Haloalkyl, C 1 -C 12 alkoxy, CN, NO 2 , phenyl-C 1 -C 3 alkoxy, phenoxy, C 1 -C 12 alkylthio, phenylthio, N ( C 1 -C 12 alkyl) 2 , diphenylamino, (CO) O (C 1 -C 8 alkyl), (CO) -C 1 -C 8 alkyl, (CO) N (C 1- C 8 alkyl) 2 or R 19 and R 20 are each independently hydrogen, C 1 -C 20 alkyl, C 2 -C 4 hydroxyalkyl, C 2 -C 10 alkoxyalkyl, C 2 -C 5 alkenyl, C 3- C 20 cycloalkyl, phenyl-C 1 -C 3 alkyl, C 1 -C 8 alkylfluorenyl, C 1 -C 8 alkylfluorenyloxy, C 3 -C 12 alkenyl, SO 2- ( C 1 -C 4 haloalkyl) or benzamidine; or R 19 and R 20 are phenyl, naphthyl or C 3 -C 20 heteroaryl, each of which is unsubstituted or substituted by one or more of the following groups Substitution: halogen, C 1 -C 4 haloalkyl, C 1 -C 20 alkoxy, C 1 -C 12 alkyl, benzamyl or C 1 -C 12 alkoxy; or R 19 and R 20 with The attached N atoms together form a 5- or 6-membered saturated or unsaturated ring that is not interspersed or interspersed with O, S, or NR 17 , and the 5- or 6-membered saturated or unsaturated ring is unsubstituted or Or more of the following groups substituted: C 1 -C 20 alkyl, C 1 -C 20 alkoxy, = O, OR 17 , SR 18 , NR 21 R 22 , (CO) R 23 , NO 2 , halogen, C 1 -C 4 -haloalkyl, CN, phenyl, Or C 3 -C 20 cycloalkyl, the C 3 -C 20 cycloalkyl has one or more O, S, CO, or NR 17 without interspersed or interspersed; or R 19 and R 20 with the N atom to which they are attached Together form a heteroaromatic ring system that is unsubstituted or substituted with one or more of the following groups: C 1 -C 20 alkyl, C 1 -C 4 haloalkyl, C 1 -C 20 alkoxy, = O, OR 17 , SR 18 , NR 21 R 22 , (CO) R 23 , , Halogen, NO 2 , CN, phenyl, or C 3 -C 20 cycloalkyl, the C 3 -C 20 cycloalkyl has one or more O, S, CO, or NR 17 uninterspersed or interspersed; R 21 and R 22 is independently of each other hydrogen, C 1 -C 20 alkyl, C 1 -C 4 haloalkyl, C 3 -C 10 cycloalkyl or phenyl; or R 21 and R 22 together with the N atom to which they are attached Forms a 5- or 6-membered saturated or unsaturated ring without interspersed or interspersed O, S, or NR 26 , and the 5- or 6-membered saturated or unsaturated ring is not fused or the 5- or 6-membered saturated or unsaturated ring saturated ring system is fused with a benzene ring; R 23 type hydrogen, OH, C 1 -C 20 alkyl, C 1 -C 4 haloalkyl, interrupted by one or more O, cO or NR C 26 alkoxy of 2 -C 20 , C 3 -C 20 cycloalkyl without meta or hetero, O, S, CO or NR 26 , or R 23 phenyl, naphthyl, phenyl-C 1 -C 4 alkyl, OR 17 , SR 18 or NR 21 R 22 ; R 24 is (CO) OR 17 , CONR 19 R 20 , (CO) R 17 ; or R 24 has one of the meanings given for R 19 and R 20 ; R 25 is COOR 17 , CONR 19 R 20 , (CO) R 17 ; or R 25 has one of the meanings given for R 17 ; R 26 is hydrogen, C 1 -C 20 alkyl, C 1 -C 4 haloalkyl ,between C 2 -C 20 alkyl with one or more O or CO; or phenyl-C 1 -C 4 alkyl, C 3 -C 8 cycloalkane without one or more O or CO Or (CO) R 19 ; or phenyl, which is unsubstituted or substituted with one or more of the following groups: C 1 -C 20 alkyl, halogen, C 1 -C 4 haloalkyl, OR 17 , SR 18 , NR 19 R 20 or Provided that at least one group is present in the molecule or

該具有式(C-I)所示結構之光起始劑(C-1)之特徵在於其在咔唑部分上包含一或多個成環(annelated)不飽和環。換言之，R1及R2、R2及R3、R3及R4、R5及R6、R6及R7或R7及R8中至少一對係 The photoinitiator (C-1) having a structure represented by the formula (CI) is characterized in that it contains one or more annelated unsaturated rings on a carbazole moiety. In other words, at least one of R 1 and R 2 , R 2 and R 3 , R 3 and R 4 , R 5 and R 6 , R 6 and R 7, or R 7 and R 8

在一實施例中，該具有式(C-I)所示結構之光起始劑(C-1)，該C1-C20烷基係直鏈或支鏈且係(例如)C1-C18-、C1-C4-、C1-C12-、C1-C8-、C1-C8-或C1-C4烷基或C4-C12-或C4-C8烷基。實例係甲基、乙基、丙基、異丙基、正丁基、第二丁基、異丁基、第三丁基、戊基、己基、庚基、2,4,4-三甲基戊基、2-乙基己基、辛基、壬基、癸基、十二基、十四基、十五基、十六基、十八基及二十基。C1-C6烷基具有與上文針對C1-C20烷基所給出相同之含義且具有最高相應C原子數。 In one embodiment, the photo-initiator (C-1) having a structure represented by formula (CI), the C 1 -C 20 alkyl is linear or branched and is, for example, C 1 -C 18 -, C 1 -C 4- , C 1 -C 12- , C 1 -C 8- , C 1 -C 8 -or C 1 -C 4 alkyl or C 4 -C 12 -or C 4 -C 8 alkyl. Examples are methyl, ethyl, propyl, isopropyl, n-butyl, second butyl, isobutyl, third butyl, pentyl, hexyl, heptyl, 2,4,4-trimethyl Amyl, 2-ethylhexyl, octyl, nonyl, decyl, dodecyl, tetradecyl, pentadecyl, hexadecyl, octadecyl and icosyl. C 1 -C 6 alkyl has the same meaning as given above for C 1 -C 20 alkyl and has the highest corresponding number of C atoms.

該含有一或多個C-C多重鍵之未經取代或經取代之C1-C20烷基係指如下文所解釋之烯基。 Which contain one or more CC multiple bonds of a substituted or non-substituted alkyl group of C 1 -C 20 alkenyl group refers to the message as explained below.

該C1-C4鹵代烷基係如下文所定義經鹵素取代之如上文所定義C1-C4烷基。烷基基團係(例如)單-或多鹵化，直至所有H-原子替換為鹵素。其係(例如)CnHxHaly，其中x+y=2n+1且Hal係鹵素，較佳為F。具體實例係氯甲基、三氯甲基、三氟甲基或2-溴丙基，尤其為三氟甲基或三氯甲基。C2-C4羥基烷基意指經一或兩個O原子取代之C2-C4烷基。烷基基團係直鏈或支鏈。實例係2-羥基乙基、1-羥基乙基、1-羥基丙基、2-羥基丙基、3-羥基丙基、1-羥基丁基、4-羥基丁基、2-羥基丁基、3-羥基丁基、2,3-二羥基丙基或2,4-二羥基丁基。C2-C10烷氧基烷基係間雜有一個O原子之C2-C10烷基。C2-C10烷基具 有與上文針對C1-C20烷基所給出相同之含義且具有最高相應C原子數。實例係甲氧基甲基、甲氧基乙基、甲氧基丙基、乙氧基甲基、乙氧基乙基、乙氧基丙基、丙氧基甲基、丙氧基乙基、丙氧基丙基。 The C 1 -C 4 haloalkyl group as defined below, based substituted with halogen or as hereinbefore defined C 1 -C 4 alkyl. Alkyl groups are, for example, mono- or polyhalogenated until all H-atoms are replaced with halogen. It is, for example, C n H x Hal y , where x + y = 2n + 1 and Hal is halogen, preferably F. Specific examples are chloromethyl, trichloromethyl, trifluoromethyl or 2-bromopropyl, especially trifluoromethyl or trichloromethyl. C 2 -C 4 hydroxyalkyl means C 2 -C 4 alkyl substituted with one or two O atoms. Alkyl groups are straight or branched. Examples are 2-hydroxyethyl, 1-hydroxyethyl, 1-hydroxypropyl, 2-hydroxypropyl, 3-hydroxypropyl, 1-hydroxybutyl, 4-hydroxybutyl, 2-hydroxybutyl, 3-hydroxybutyl, 2,3-dihydroxypropyl or 2,4-dihydroxybutyl. C 2 -C 10 alkoxyalkyl lines interrupted by O atoms of a C 2 -C 10 alkyl. C 2 -C 10 alkyl has the same meaning as given above for C 1 -C 20 alkyl and has the highest corresponding number of C atoms. Examples are methoxymethyl, methoxyethyl, methoxypropyl, ethoxymethyl, ethoxyethyl, ethoxypropyl, propoxymethyl, propoxyethyl, Propoxypropyl.

該間雜有一或多個O、S、NR26或CO之C2-C20烷基經O、S、NR26或CO間雜(例如)1至9次、1至5次、1至3次或1次或2次。若存在一個以上間雜基團，則其為相同種類或不同。該兩個O原子由至少一個亞甲基、較佳至少兩個亞甲基(即伸乙基)隔開。該等烷基係直鏈或支鏈。舉例而言，將存在以下結構單元：-CH2-CH2-O-CH2CH3、-[CH2CH2O]y-CH3(其中y=1至9)、-(CH2-CH2O)7-CH2CH3、-CH2-CH(CH3)-O-CH2-CH2CH3、-CH2-CH(CH3)-O-CH2-CH3、-CH2-CH2-S-CH2CH3、-CH2-CH(CH3)-NR26-CH2-CH3、-CH2-CH2-COO-CH2CH3或-CH2-CH(CH3)-OCO-CH2-CH2CH3。 The interrupted by one or more O, S, NR 26 or CO of C 2 -C 20 alkyl is O, S, NR 26 or CO interrupted (e.g.) 1-9 times, 1-5 times, 1-3 times or 1 or 2 times. If more than one meta group is present, they are the same kind or different. The two O atoms are separated by at least one methylene group, preferably at least two methylene groups (ie, ethylidene). These alkyl groups are straight or branched. For example, the following structural units will exist: -CH 2 -CH 2 -O-CH 2 CH 3 ,-[CH 2 CH 2 O] y -CH 3 (where y = 1 to 9),-(CH 2- CH 2 O) 7 -CH 2 CH 3 , -CH 2 -CH (CH 3 ) -O-CH 2 -CH 2 CH 3 , -CH 2 -CH (CH 3 ) -O-CH 2 -CH 3 ,- CH 2 -CH 2 -S-CH 2 CH 3 , -CH 2 -CH (CH 3 ) -NR 26 -CH 2 -CH 3 , -CH 2 -CH 2 -COO-CH 2 CH 3 or -CH 2- CH (CH 3 ) -OCO-CH 2 -CH 2 CH 3 .

該C3-C10環烷基、C3-C10環烷基及C3-C8環烷基在本申請案上下文中應理解為至少包含一個環之烷基。其係(例如)環丙基、環丁基、環戊基、環己基、環辛基、戊基環戊基及環己基。C3-C10環烷基在本發明上下文中亦意欲涵蓋二環，換言之，橋聯環，例如及相應環。其他實例係諸如 (例如)或等結構、以及橋聯 或稠合環系統，舉例而言，該術語亦意欲涵蓋等。 The C 3 -C 10 cycloalkyl, C 3 -C 10 cycloalkyl and C 3 -C 8 cycloalkyl are to be understood in the context of this application as alkyl groups containing at least one ring. It is, for example, cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl, cyclooctyl, pentylcyclopentyl and cyclohexyl. C 3 -C 10 cycloalkyl is also intended to encompass bicyclics in the context of the present invention, in other words, bridged rings such as And the corresponding ring. Other examples are such as (E.g )or Isostructure, and bridged or fused ring systems, the term is also intended to cover, for example Wait.

該間雜有O、S、CO、NR26之C3-C20環烷基具有上文給出之含義，其中烷基中至少一個CH2-基團替換為O、S、CO或NR26。實例係諸如(例如 )、 或等結構。 The C 3 -C 20 cycloalkyl group interspersed with O, S, CO, and NR 26 has the meaning given above, wherein at least one CH 2 -group in the alkyl group is replaced with O, S, CO, or NR 26 . Examples are such as (E.g ), or And other structures.

該C1-C8烷基-C3-C10環烷基係經一或多個具有最多8個碳原子之烷基取代的如上文所定義之C3-C10環烷基。實例係等。 The C 1 -C 8 alkyl-C 3 -C 10 cycloalkyl is a C 3 -C 10 cycloalkyl group, as defined above, substituted with one or more alkyl groups having up to 8 carbon atoms. Instance system Wait.

該間雜有一或多個O之C1-C8烷基-C3-C10環烷基係經一或多個具有最多8個碳原子之烷基取代的如上文所定義之O間雜C3-C10環烷基。實例係等。 The C 1 -C 8 alkyl-C 3 -C 10 cycloalkyl having one or more O heterocycles is substituted with one or more alkyl groups having up to 8 carbon atoms, and the O O hetero C 3 is as defined above. -C 10 cycloalkyl. Instance system Wait.

該C1-C12烷氧基係經一個O原子取代之C1-C12烷基。C1-C12烷基具有與上文針對C1-C20烷基所給出相同之含義且具有最高相應C原子數。該C1-C4烷氧基係直鏈或支鏈，例如甲氧基、乙氧基、丙氧基、異丙氧基、正丁氧基、第二丁氧基、異丁氧基或第三丁氧基。C1-C8烷氧基及C1-C4-烷氧基具有與上文所述相同之含義且具有最高相應C原子數。 The C 1 -C 12 alkoxy substituted with the system via a O atom C 1 -C 12 alkyl. C 1 -C 12 alkyl has the same meaning as given above for C 1 -C 20 alkyl and has the highest corresponding number of C atoms. The C 1 -C 4 alkoxy is linear or branched, such as methoxy, ethoxy, propoxy, isopropoxy, n-butoxy, second butoxy, isobutoxy or Third butoxy. C 1 -C 8 alkoxy and C 1 -C 4 -alkoxy have the same meaning as described above and have the highest corresponding number of C atoms.

該C1-C12烷基硫基係經一個S原子取代之C1-C12烷基。C1-C20烷基具有與上文針對C1-C20烷基所給出相同之含義且具有最高相應C原子數。該C1-C4烷基硫基係直鏈或支鏈，例如甲基硫基、乙基硫基、丙基硫基、異丙基硫基、正丁基硫基、第二丁基硫基、異丁基硫基、第三丁基硫基。 The C 1 -C 12 substituted alkylthio system S atom of a C 1 -C 12 alkyl. C 1 -C 20 alkyl has the same meaning as given above for C 1 -C 20 alkyl and has the highest corresponding number of C atoms. The C 1 -C 4 alkylthio group is linear or branched, such as methylthio, ethylthio, propylthio, isopropylthio, n-butylthio, and second butylthio. Group, isobutylthio group, third butylthio group.

該苯基-C1-C3烷基係(例如)苄基、苯基乙基、α-甲基苄基或α,α-二甲基-苄基，尤其為苄基。 The phenyl-C 1 -C 3 alkyl system is, for example, benzyl, phenylethyl, α-methylbenzyl or α, α-dimethyl-benzyl, especially benzyl.

該苯基-C1-C3烷氧基係(例如)苄氧基、苯基乙氧基、α-甲基苄氧基或α,α-二甲基苄氧基，尤其為苄氧基。 The phenyl-C 1 -C 3 alkoxy group is, for example, benzyloxy, phenylethoxy, α-methylbenzyloxy or α, α-dimethylbenzyloxy, especially benzyloxy .

該C2-C12烯基係單-或多不飽和且係(例如)C2-C10-、C2-C8-、C2-C5-烯基，例如乙烯基、烯丙基、甲基烯丙基、1,1-二甲基烯丙基、1-丁烯基、3-丁烯基、2-丁烯基、1,3-戊二烯基、5-己烯基、7-辛烯基或十二烯基，尤其為烯丙基。C2-C5烯基具有與上文針對C2-C12烯基所給出相同之含義且具有最高相應C原子數。 The C 2 -C 12 alkenyl is mono- or polyunsaturated and is, for example, C 2 -C 10- , C 2 -C 8- , C 2 -C 5 -alkenyl, such as vinyl, allyl , Methylallyl, 1,1-dimethylallyl, 1-butenyl, 3-butenyl, 2-butenyl, 1,3-pentadienyl, 5-hexenyl , 7-octenyl or dodecenyl, especially allyl. C 2 -C 5 alkenyl has the same meaning as given above for C 2 -C 12 alkenyl and has the highest corresponding number of C atoms.

該間雜有一或多個O、CO或NR26之C2-C12烯基經O、S、NR26或CO間雜(例如)1至9次、1至5次、1至3次或1次或2次。若存在一個以上間雜基團，則其為相同種類或不同。該兩個O原子由至少一個亞甲基、較佳至少兩個亞甲基(即伸乙基)隔開。該烯基係直鏈或支鏈且如上文所定義。舉例而言，可形成以下結構單元：-CH=CH-O-CH2CH3、-CH=CH-O-CH=CH2等。 The interspersed one or more C 2 -C 12 alkenyl groups of O, CO or NR 26 are interspersed with O, S, NR 26 or CO (for example) 1 to 9 times, 1 to 5 times, 1 to 3 times or 1 time. Or 2 times. If more than one meta group is present, they are the same kind or different. The two O atoms are separated by at least one methylene group, preferably at least two methylene groups (ie, ethylidene). The alkenyl is straight or branched and is as defined above. For example, the following structural units may be formed: -CH = CH-O-CH 2 CH 3 , -CH = CH-O-CH = CH 2 and the like.

該C4-C8環烯基具有一或多個雙鍵且係(例如)C4-C6-環烯基或C6-C8-環烯基。實例係環丁烯基、環戊烯基、環己烯基或環辛烯基，尤其為環戊烯基及環己烯基，較佳為環己烯基。 The C 4 -C 8 cycloalkenyl group having one or more double bonds and lines (e.g.) C 4 -C 6 - cycloalkenyl or C 6 -C 8 - cycloalkenyl. Examples are cyclobutenyl, cyclopentenyl, cyclohexenyl or cyclooctenyl, especially cyclopentenyl and cyclohexenyl, and preferably cyclohexenyl.

該C3-C6烯氧基係單或多不飽和且具有上文針對烯基所給出含義中之一者，且附接氧基具有最高相應C原子數。實例係烯丙氧基、甲基烯丙氧基、丁烯氧基、戊烯氧基、1,3-戊二烯氧基、5-己烯氧基。 The C 3 -C 6 alkenyloxy is mono- or polyunsaturated and has one of the meanings given above for alkenyl, and the attached oxygen has the highest corresponding number of C atoms. Examples are allyloxy, methallyloxy, butenyloxy, pentenyloxy, 1,3-pentadienyloxy, 5-hexenyloxy.

該C2-C12炔基係單或多不飽和直鏈或支鏈且係(例如)C2-C8-、C2-C6-或C2-C4炔基。實例係乙炔基、丙炔基、丁炔基、1-丁炔基、3-丁炔基、2-丁炔基、戊炔基己炔基、2-己炔基、5-己炔基、辛炔基等。 The C 2 -C 12 alkynyl is a mono- or polyunsaturated straight or branched chain and is, for example, a C 2 -C 8- , C 2 -C 6 -or C 2 -C 4 alkynyl. Examples are ethynyl, propynyl, butynyl, 1-butynyl, 3-butynyl, 2-butynyl, pentynylhexynyl, 2-hexynyl, 5-hexynyl, Octynyl and others.

該C2-C20烷醯基係直鏈或支鏈且係(例如)C2-C18-、C2-C14-、C2-C12-、C2-C8-、C2-C6-或C2-C4烷醯基或C4-C12-或C4-C8烷醯基。實例係乙醯基、丙醯基、丁醯基、異丁醯基、戊醯基、己醯基、庚醯基、辛醯基、壬醯基、癸醯基、十二醯基、十四醯基、 十五醯基、十六醯基、十八醯基、二十醯基，較佳為乙醯基。C1-C8烷醯基具有與上文針對C2-C20烷醯基所給出相同之含義且具有最高相應C原子數。 The C 2 -C 20 alkylfluorenyl is linear or branched and is, for example, C 2 -C 18- , C 2 -C 14- , C 2 -C 12- , C 2 -C 8- , C 2 -C 6 -or C 2 -C 4 alkylfluorenyl or C 4 -C 12 -or C 4 -C 8 alkylfluorenyl. Examples are ethenyl, propionyl, butyryl, isobutyryl, pentyl, hexyl, heptyl, octyl, nonyl, decyl, dodecyl, tetradecyl, pentadecyl Base, hexadecyl, octadecyl, and icosyl, preferably ethenyl. C 1 -C 8 alkylfluorenyl has the same meaning as given above for C 2 -C 20 alkylfluorenyl and has the highest corresponding number of C atoms.

該C2-C12烷氧基羰基係直鏈或支鏈且係(例如)甲氧基羰基、乙氧基羰基、丙氧基羰基、正丁氧基羰基、異丁氧基羰基、1,1-二甲基丙氧基羰基、戊氧基羰基、己氧基羰基、庚氧基羰基、辛氧基羰基、壬氧基羰基、癸氧基羰基或十二氧基羰基，尤其為甲氧基羰基、乙氧基羰基、丙氧基羰基、正丁氧基羰基或異丁氧基羰基，較佳為甲氧基羰基。 The C 2 -C 12 alkoxycarbonyl is linear or branched and is, for example, a methoxycarbonyl, ethoxycarbonyl, propoxycarbonyl, n-butoxycarbonyl, isobutoxycarbonyl, 1, 1-dimethylpropoxycarbonyl, pentoxycarbonyl, hexyloxycarbonyl, heptyloxycarbonyl, octyloxycarbonyl, nonoxycarbonyl, decoxycarbonyl or dodecyloxycarbonyl, especially methoxy A carbonyl group, an ethoxycarbonyl group, a propoxycarbonyl group, an n-butoxycarbonyl group, or an isobutoxycarbonyl group is preferred, and a methoxycarbonyl group is preferred.

該間雜有一或多個O之C2-C12烷氧基羰基係直鏈或支鏈。兩個O原子由至少兩個亞甲基(即伸乙基)隔開。該經間雜之烷氧基羰基未經取代或經一或多個羥基取代。該C6-C20芳氧基羰基係(例如)苯基氧基羰基[=苯基-O-(CO)-]、萘氧基羰基、蒽氧基羰基等。C5-C20雜芳氧基羰基係C5-C20雜芳基-O-CO-。 The C 2 -C 12 alkoxycarbonyl group having one or more O atoms is linear or branched. The two O atoms are separated by at least two methylene (ie, ethylene). The meta heteroalkoxycarbonyl group is unsubstituted or substituted with one or more hydroxyl groups. The C 6 -C 20 aryloxycarbonyl group is, for example, a phenyloxycarbonyl group [= phenyl-O- (CO)-], a naphthyloxycarbonyl group, an anthryloxycarbonyl group, and the like. C 5 -C 20 heteroaryloxycarbonyl is C 5 -C 20 heteroaryl-O-CO-.

該C3-C10環烷基羰基係C3-C10環烷基-CO-，其中環烷基具有上文所示含義中之一者且具有最高相應C原子數。該間雜有一或多個O、S、CO、NR26之C3-C10環烷基羰基係指經間雜環烷基-CO-，其中經間雜環烷基係如上文所述所定義。 The C 3 -C 10 cycloalkylcarbonyl group is C 3 -C 10 cycloalkyl-CO-, wherein the cycloalkyl group has one of the meanings shown above and has the highest corresponding number of C atoms. The C 3 -C 10 cycloalkylcarbonyl group having one or more O, S, CO, and NR 26 is a metacycloalkyl-CO- group, wherein the metacycloalkyl group is as defined above.

該C3-C10環烷氧基羰基係C3-C10環烷基-O-(CO)-，其中環烷基具有上文所示含義中之一者且具有最高相應C原子數。間雜有一或多個O、S、CO、NR26之C3-C10環烷氧基羰基係指經間雜環烷基-O-(CO)-，其中經間雜環烷基係如上文所述所定義。 The C 3 -C 10 cycloalkoxycarbonyl group is C 3 -C 10 cycloalkyl-O- (CO)-, wherein the cycloalkyl group has one of the meanings shown above and has the highest corresponding number of C atoms. The C 3 -C 10 cycloalkoxycarbonyl group interspersed with one or more O, S, CO, NR 26 refers to metacycloalkyl-O- (CO)-, wherein the metacycloalkyl group is as described above As defined.

該C1-C20烷基苯基係指經一或多個烷基取代之苯基，其中C原子之總和最多為20。 The C 1 -C 20 alkylphenyl group refers to a phenyl group substituted with one or more alkyl groups, wherein the total of C atoms is at most 20.

該C6-C20芳基係(例如)苯基、萘基、蒽基、菲基、芘基、基、并四苯基、聯伸三苯基等，尤其為苯基或萘基，較佳為 苯基。萘基係1-萘基或2-萘基。 The C 6 -C 20 aryl system is, for example, phenyl, naphthyl, anthracenyl, phenanthryl, fluorenyl, Phenyl, tetracrylphenyl, triphenylene, etc., especially phenyl or naphthyl, preferably phenyl. Naphthyl is 1-naphthyl or 2-naphthyl.

在本發明上下文中，該C3-C20雜芳基意欲包含單環或多環系統，例如稠合環系統。實例係噻吩基、苯并[b]噻吩基、萘并[2,3-b]噻吩基、噻蒽基、呋喃基、二苯并呋喃基、唏基、呫噸基、噻噸基、啡噁噻基、吡咯基、咪唑基、吡唑基、吡嗪基、嘧啶基、噠嗪基、中氮茚基、異吲哚基、吲哚基、吲唑基、嘌呤基、喹嗪基、異喹啉基、喹啉基、酞嗪基、萘啶基、喹噁啉基、喹唑啉基、啉基、喋啶基、咔唑基、β-哢啉基、菲啶基、吖啶基、萘嵌間二氮苯基、菲咯啉基、吩嗪基、異噻唑基、吩噻嗪基、異噁唑基、呋呫基、吩噁基、7-菲基、蒽醌-2-基(=9,10-二側氧基-9,10-二氫蒽-2-基)、3-苯并[b]噻吩基、5-苯并[b]噻吩基、2-苯并[b]噻吩基、4-二苯并呋喃基、4,7-二苯并呋喃基、4-甲基-7-二苯并呋喃基、2-呫噸基、8-甲基-2-呫噸基、3-呫噸基、2-啡噁噻基、2,7-啡噁噻基、2-吡咯基、3-吡咯基、5-甲基-3-吡咯基、2-咪唑基、4-咪唑基、5-咪唑基、2-甲基-4-咪唑基、2-乙基-4-咪唑基、2-乙基-5-咪唑基、1H-四唑-5-基、3-吡唑基、1-甲基-3-吡唑基、1-丙基-4-吡唑基、2-吡嗪基、5,6-二甲基-2-吡嗪基、2-中氮茚基、2-甲基-3-異吲哚基、2-甲基-1-異吲哚基、1-甲基-2-吲哚基、1-甲基-3-吲哚基、1,5-二甲基-2-吲哚基、1-甲基-3-吲唑基、2,7-二甲基-8-嘌呤基、2-甲氧基-7-甲基-8-嘌呤基、2-喹嗪基、3-異喹啉基、6-異喹啉基、7-異喹啉基、3-甲氧基-6-異喹啉基、2-喹啉基、6-喹啉基、7-喹啉基、2-甲氧基-3-喹啉基、2-甲氧基-6-喹啉基、6-酞嗪基、7-酞嗪基、1-甲氧基-6-酞嗪基、1,4-二甲氧基-6-酞嗪基、1,8-萘啶-2-基、2-喹噁啉基、6-喹噁啉基、2,3-二甲基-6-喹噁啉基、2,3-二甲氧基-6-喹噁啉基、2-喹唑啉基、7-喹唑啉基、2-二甲基胺基-6-喹唑啉基、3-啉基、6-啉基、7-啉基、3-甲氧基-7-啉基、2-喋啶基、6-喋啶基、7-喋啶基、6,7-二甲氧基-2-喋啶基、2-咔唑基、 3-咔唑基、9-甲基-2-咔唑基、9-甲基-3-咔唑基、β-哢啉-3-基、1-甲基-β-哢啉-3-基、1-甲基-β-哢啉-6-基、3-菲啶基、2-吖啶基、3-吖啶基、2-萘嵌間二氮苯基、1-甲基-5-萘嵌間二氮苯基、5-菲咯啉基、6-菲咯啉基、1-吩嗪基、2-吩嗪基、3-異噻唑基、4-異噻唑基、5-異噻唑基、2-吩噻嗪基、3-吩噻嗪基、10-甲基-3-吩噻嗪基、3-異噁唑基、4-異噁唑基、5-異噁唑基、4-甲基-3-呋呫基、2-吩噁基、10-甲基-2-吩噁基等。 In the context of the present invention, the C 3 -C 20 heteroaryl is intended to include a monocyclic or polycyclic system, such as a fused ring system. Examples are thienyl, benzo [b] thienyl, naphtho [2,3-b] thienyl, thienyl, furanyl, dibenzofuranyl, Fluorenyl, xanthenyl, thioxanthenyl, phenoxathiol, pyrrolyl, imidazolyl, pyrazolyl, pyrazinyl, pyrimidinyl, pyridazinyl, midindenyl, isoindolyl, indolyl , Indazolyl, purinyl, quinazinyl, isoquinolinyl, quinolinyl, phthalazinyl, naphthyridinyl, quinoxalinyl, quinazolinyl, Porphyrinyl, pyridinyl, carbazolyl, β-pyridinyl, phenanthridyl, acridinyl, naphthylazine, phenanthroline, phenazinyl, isothiazolyl, phenothiazinyl , Isoxazolyl, furfuryl, phenoxal, 7-phenanthryl, anthraquinone-2-yl (= 9,10-dioxo-9,10-dihydroanthracen-2-yl), 3 -Benzo [b] thienyl, 5-benzo [b] thienyl, 2-benzo [b] thienyl, 4-dibenzofuryl, 4,7-dibenzofuryl, 4-methyl -7-dibenzofuranyl, 2-xanthenyl, 8-methyl-2-xanthenyl, 3-xanthenyl, 2-phenoxanthenyl, 2,7-phenoxanthenyl, 2 -Pyrrolyl, 3-pyrrolyl, 5-methyl-3-pyrrolyl, 2-imidazolyl, 4-imidazolyl, 5-imidazolyl, 2-methyl-4-imidazolyl, 2-ethyl-4 -Imidazolyl, 2-ethyl-5-imidazolyl, 1H-tetrazol-5-yl, 3-pyrazolyl, 1-methyl-3-pyrazolyl, 1-propyl-4-pyrazolyl , 2-pyrazinyl, 5,6-dimethyl-2-pyrazinyl, 2-indolizinyl, 2-methyl-3-isoindolyl, 2-methyl-1-isoindole , 1-methyl-2-indolyl, 1-methyl-3-indolyl, 1,5-dimethyl-2-indolyl, 1-methyl-3-indazolyl, 2 , 7-dimethyl-8-purinyl, 2-methoxy-7-methyl-8-purine , 2-quinazinyl, 3-isoquinolinyl, 6-isoquinolinyl, 7-isoquinolinyl, 3-methoxy-6-isoquinolinyl, 2-quinolinyl, 6- Quinolinyl, 7-quinolinyl, 2-methoxy-3-quinolinyl, 2-methoxy-6-quinolinyl, 6-phthalazinyl, 7-phthalazinyl, 1-methoxy -6-phthalazinyl, 1,4-dimethoxy-6-phthalazinyl, 1,8-naphthyridin-2-yl, 2-quinoxalinyl, 6-quinoxalinyl, 2, 3-dimethyl-6-quinoxaline group, 2,3-dimethoxy-6-quinoxaline group, 2-quinazolinyl group, 7-quinazolinyl group, 2-dimethylamino group -6-quinazolinyl, 3- Phenyl, 6- Phenyl, 7- Phenyl, 3-methoxy-7- Phenyl, 2-pyridinyl, 6-pyridinyl, 7-pyridinyl, 6,7-dimethoxy-2-pyridinyl, 2-carbazolyl, 3-carbazolyl, 9- Methyl-2-carbazolyl, 9-methyl-3-carbazolyl, β-fluorin-3-yl, 1-methyl-β-fluorin-3-yl, 1-methyl-β- Perylene-6-yl, 3-phenanthridyl, 2-acridyl, 3-acridyl, 2-naphthylazine, 1-methyl-5-naphthylazine, 5-phenanthroline, 6-phenanthroline, 1-phenazinyl, 2-phenazinyl, 3-isothiazolyl, 4-isothiazolyl, 5-isothiazolyl, 2-phenthiazinyl , 3-phenothiazinyl, 10-methyl-3-phenothiazinyl, 3-isooxazolyl, 4-isooxazolyl, 5-isooxazolyl, 4-methyl-3-furanyl Group, 2-phenoxa group, 10-methyl-2-phenoxa group and the like.

該C3-C20雜芳基尤其為噻吩基、苯并[b]噻吩基、噻蒽基、噻噸基、1-甲基-2-吲哚基或1-甲基-3-吲哚基；尤其為噻吩基。 The C 3 -C 20 heteroaryl group is especially thienyl, benzo [b] thienyl, thiathranyl, thioxanthenyl, 1-methyl-2-indolyl or 1-methyl-3-indole Radical; especially thienyl.

該C4-C20雜芳基羰基係經由CO基團連接至分子其餘部分之如上文所定義C3-C20雜芳基。 The C 4 -C 20 heteroarylcarbonyl group is a C 3 -C 20 heteroaryl group, as defined above, attached to the rest of the molecule via a CO group.

該經取代之芳基(苯基、萘基、C6-C20芳基或C5-C20雜芳基)係分別經1至7次、1至6次或1至4次、尤其1次、2次或3次取代。顯而易見，所定義芳基不能具有比芳基環處之自由位置為多之取代基。 The substituted aryl (phenyl, naphthyl, C 6 -C 20 aryl or C 5 -C 20 heteroaryl) is 1 to 7 times, 1 to 6 times or 1 to 4 times, especially 1 Substitutions, 2 or 3 substitutions. Obviously, the defined aryl group cannot have more substituents than there are free positions at the aryl ring.

該苯基環上之取代基較佳在苯基環上之位置4中或呈3,4-、3,4,5-、2,6-、2,4-或2,4,6-組態。 The substituent on the phenyl ring is preferably in position 4 on the phenyl ring or in the 3,4-, 3,4,5-, 2,6-, 2,4-, or 2,4,6-group. state.

該間雜1次或多次之經間雜基團間雜(例如)1至19次、1至15次、1至12次、1至9次、1至7次、1至5次、1至4次、1至3次或1次或2次(顯而易見，間雜原子數取決於擬間雜之C原子數)。經1次或多次取代之經取代基團具有(例如)1至7個、1至5個、1至4個、1至3個或1個或2個相同或不同取代基。 This interstitial is interspersed one or more times with interstitial groups (for example) 1 to 19 times, 1 to 15 times, 1 to 12 times, 1 to 9 times, 1 to 7 times, 1 to 5 times, 1 to 4 times , 1 to 3 times or 1 or 2 times (obviously, the number of inter-hetero atoms depends on the number of C atoms to be inter-hetero-hetero). A substituted group substituted one or more times has, for example, 1 to 7, 1 to 5, 1 to 4, 1 or 3, or 1 or 2 of the same or different substituents.

該經一或多個所定義取代基取代之基團意欲具有一個取代基或多個如所給出相同或不同定義之取代基。鹵素係氟、氯、溴及碘，尤其為氟、氯及溴，較佳為氟及氯。若R1及R2、R2及R3、R3 及R4或R5及R6、R6及R7、R7及R8彼此獨立地共同為；則形成(例如)以下結構(Ia)-I(i)：亦或(例如)諸如(Id)-(Ih)等結構： The group substituted with one or more defined substituents is intended to have one substituent or multiple substituents with the same or different definitions as given. Halogen is fluorine, chlorine, bromine and iodine, especially fluorine, chlorine and bromine, and fluorine and chlorine are preferred. If R 1 and R 2 , R 2 and R 3 , R 3 and R 4 or R 5 and R 6 , R 6 and R 7 , R 7 and R 8 are independently common to each other as ; Then, for example, the following structures (Ia) -I (i) are formed: Or, for example, structures such as (Id)-(Ih):

較佳者係結構(Ia)。 The better one is structure (Ia).

該具有式(C-I)所示結構之光起始劑(C-1)之特徵在於至少一個苯基環與咔唑部分稠合以形成「萘基」環。亦即上述結構中之一者係以式(C-I)所示結構給出。 The photoinitiator (C-1) having a structure represented by the formula (C-I) is characterized in that at least one phenyl ring is fused with a carbazole moiety to form a "naphthyl" ring. That is, one of the above structures is given by the structure shown by formula (C-I).

若R1及R2、R2及R3、R3及R4、R5及R6、R6及R7或R7及R8彼此獨立地共同為-(CH2)P-Y-(CH2)q-，則形成(例如)諸如 等結構。 If R 1 and R 2 , R 2 and R 3 , R 3 and R 4 , R 5 and R 6 , R 6 and R 7, or R 7 and R 8 independently of each other are-(CH 2 ) P -Y- (CH 2 ) q- , then forming (for example) such as And other structures.

若苯基或萘基環上之取代基OR17、SR18、SOR18、SO2R18或NR19R20經由基團R17、R18、R19及/或R20與萘基環之一個碳原子形成5員或6員環，則獲得包含3個或更多個環(包括萘基環)之結構。 If the substituents OR 17 , SR 18 , SOR 18 , SO 2 R 18 or NR 19 R 20 on the phenyl or naphthyl ring are via the groups R 17 , R 18 , R 19 and / or R 20 and the naphthyl ring When a carbon atom forms a 5-membered or 6-membered ring, a structure including 3 or more rings (including a naphthyl ring) is obtained.

實例係 等。 Instance system Wait.

若R17形成鍵結至其上具有基團或 之苯基或萘基環之一個碳原子之直接鍵，則形成(例如) 諸如等結構。 If R 17 forms a bond to a group or A direct bond to a carbon atom of a phenyl or naphthyl ring forms, for example, such as And other structures.

若R16係經SR18取代之苯基，其中基團R19表示鍵結至其中附接有COR16基團之咔唑部分之苯基或萘基環的直接鍵，則形成(例如)諸如等結構。亦即，若R16係經SR18取代之苯基，其中基團R18表示鍵結至其中附接有COR16基團之咔唑部分之苯基或萘基環的直接鍵，則噻噸基部分與咔唑部分之一個苯基或萘基環一起形成。 If R 16 is a phenyl substituted with SR 18 , where the group R 19 represents a direct bond to a phenyl or naphthyl ring bonded to the carbazole moiety to which the COR 16 group is attached, then, for example, such as And other structures. That is, if R 16 is a phenyl substituted with SR 18 , where the group R 18 represents a direct bond to a phenyl or naphthyl ring bonded to a carbazole moiety having a COR 16 group attached thereto, then thioxanthene The base moiety is formed with a phenyl or naphthyl ring of the carbazole moiety.

若R19及R20與其所附接之N原子一起形成視情況間雜有O、S或NR17之5員或6員飽和或不飽和環，則形成飽和或不飽和環，例如氮丙啶、吡咯、噻唑、吡咯啶、噁唑、吡啶、1,3-二嗪、1,2-二嗪、六氫吡啶或嗎啉。較佳地，若R19及R20與其所附接之N原子一起形成視情況間雜有O、S或NR17之5員或6員飽和或不飽和環，則形成未經間雜或間雜有O或NR17、尤其O之5員或6員飽和環。 If R 19 and R 20 together with the N atom to which they are attached form a 5- or 6-membered saturated or unsaturated ring optionally mixed with O, S or NR 17 , then a saturated or unsaturated ring is formed, such as aziridine, Pyrrole, thiazole, pyrrolidine, oxazole, pyridine, 1,3-diazine, 1,2-diazine, hexahydropyridine or morpholine. Preferably, R 19 and R 20 when appended thereto together with the N atom to which optionally is interrupted by O, S or NR 5, or 6 of 17 membered saturated or unsaturated ring, is formed without interrupted or is interrupted by O Or NR 17 , especially O's 5 or 6 member saturated ring.

若R21及R22與其所附接之N原子一起形成視情況間雜有O、S或NR26之5員或6員飽和或不飽和環，且苯環視情況與該飽和或不飽和環稠合，則形成飽和或不飽和環，例如氮丙啶、吡咯、噻唑、吡咯啶、噁唑、吡啶、1,3-二嗪、1,2-二嗪、六氫吡啶或嗎啉或 相應成環環(例如)等。 If R 21 and R 22 together with the attached N atom form a 5- or 6-membered saturated or unsaturated ring optionally mixed with O, S or NR 26 , and the benzene ring is fused with the saturated or unsaturated ring as appropriate , Then form a saturated or unsaturated ring, such as aziridine, pyrrole, thiazole, pyrrolidine, oxazole, pyridine, 1,3-diazine, 1,2-diazine, hexahydropyridine or morpholine or the corresponding ring Ring (e.g. )Wait.

若R19及R20與其所附接之N原子一起形成雜芳香族環系統，則該環系統意欲包含一個以上環(例如2個或3個環)以及來自相同種類或不同種類之一個或一個以上雜原子。適宜雜原子係(例如)N、S、O或P、尤其N、S或O。實例係咔唑、吲哚、異吲哚、吲唑、嘌呤、異喹啉、喹啉、哢啉、吩噻嗪等。 If R 19 and R 20 together with the N atom to which they are attached form a heteroaromatic ring system, the ring system is intended to include more than one ring (e.g., 2 or 3 rings) and one or one from the same species or different species Above heteroatoms. Suitable heteroatom systems are, for example, N, S, O or P, especially N, S or O. Examples are carbazole, indole, isoindole, indazole, purine, isoquinoline, quinoline, oxoline, phenothiazine, and the like.

術語「及/或」或「或/及」在本發明上下文中意欲表達不僅可存在所定義替代物(取代基)中之一者，而且可存在總共若干所定義替代物(取代基)，即不同替代物(取代基)之混合物。 The term "and / or" or "or / and" in the context of the present invention is intended to express that not only one of the defined substitutions (substituents) may exist, but also a total of several defined substitutions (substituents), that Mixture of different substitutes (substituents).

術語「至少」意欲定義一者或一者以上，例如一者或兩者或三者、較佳一者或兩者。 The term "at least" is intended to define one or more, such as one or both or three, preferably one or both.

術語「視情況經取代」意指其提及之基團未經取代或經取代。 The term "optionally substituted" means that the group to which it refers is unsubstituted or substituted.

術語「視情況經間雜」意指其提及之基團未經雜或經間雜。 The term "as the case may be" means that the group to which it refers is not or is not.

在整個本說明書及下文之申請專利範圍中，除非上下文另有要求，否則詞語「包含(comprise)」或變體(例如，「comprises」或「comprising」)應理解為暗指包括所述整數或步驟或整數群組或步驟群組，但並不排除任一其他整數或步驟或整數群組或步驟群組。術語「(甲基)丙烯酸酯」在本申請案上下文中意欲指丙烯酸酯以及相應甲基丙烯酸酯。 Throughout this specification and the scope of patent applications below, unless the context requires otherwise, the word "comprise" or variations (e.g., "comprises" or "comprising") shall be understood to imply the inclusion of the stated integer or Step or integer group or step group, but does not exclude any other integer or step or integer group or step group. The term "(meth) acrylate" in the context of this application is intended to refer to acrylates and corresponding methacrylates.

本發明上下文中用於本發明化合物之文字中所示較佳者意欲指所有申請專利範圍類別，亦即亦指針對組合物、用途、方法、彩色濾光片等之申請專利範圍。 The preferred ones shown in the text used for the compounds of the present invention in the context of the present invention are intended to refer to all categories of patent application scope, that is, to the patent application scope of compositions, uses, methods, color filters, and the like.

該具有式(C-I)所示結構之肟酯係藉由文獻中所述方法 來製備，例如藉由在以下條件下使相應肟與醯鹵、尤其氯化物或酸酐反應：在惰性溶劑(例如第三丁基甲基醚、四氫呋喃(THF)或二甲基甲醯胺)中，在鹼(例如三乙胺或吡啶)存在時，或在鹼性溶劑(例如吡啶)中。在下文中作為實例，闡述式Ia化合物之製備，其中R7係肟酯基團且X係直接鍵係[自適當肟開始實施化合物(Ib)-(Ih)之反應]： The oxime ester having a structure represented by the formula (CI) is prepared by a method described in the literature, for example, by reacting a corresponding oxime with a halogen, especially a chloride or an acid anhydride under the following conditions: Tributylmethyl ether, tetrahydrofuran (THF) or dimethylformamide), in the presence of a base (such as triethylamine or pyridine), or in a basic solvent (such as pyridine). In the following, as an example, the preparation of a compound of formula Ia is illustrated, in which R 7 is an oxime ester group and X is a direct bond system [the reaction of compounds (Ib)-(Ih) is carried out starting from an appropriate oxime]:

R1、R2、R5、R6、R8、R13、R14及R15係如上文所定義，Hal意指鹵素原子、尤其Cl。 R 1 , R 2 , R 5 , R 6 , R 8 , R 13 , R 14 and R 15 are as defined above, and Hal means a halogen atom, especially Cl.

R14較佳為甲基。 R 14 is preferably methyl.

此等反應為彼等熟習此項技術者所熟知，且通常在-15℃至+50℃、較佳0至25℃之溫度下實施。 These reactions are well known to those skilled in the art and are usually carried out at a temperature of -15 ° C to + 50 ° C, preferably 0 to 25 ° C.

當X係CO時，相應肟係藉由用亞硝酸烷基酯(例如亞硝酸甲酯、亞硝酸乙酯、亞硝酸丙酯、亞硝酸丁酯或亞硝酸異戊酯)將亞甲基亞硝化來合成。然後，酯化係在與上文所述相同之條件下實施： When X is CO, the corresponding oxime is obtained by dividing the methylene methylene group with Nitrification to synthesize. The esterification is then carried out under the same conditions as described above:

因此，本發明之標的亦係藉由在鹼或鹼之混合物存在下使相應肟化合物與式(a)之醯鹵或式(b)之酸酐反應來製備如上文所定義該具有式(C-I)所示結構之光起始劑(C-1)之方法。 Therefore, the object of the present invention is also to prepare the formula (CI) having the formula (CI) as defined above by reacting the corresponding oxime compound with a halogen halide of formula (a) or an acid anhydride of formula (b) in the presence of a base or a mixture of bases. Method of photoinitiator (C-1) of the structure shown.

其中Hal係鹵素、尤其Cl，且R14係如上文所定義。 Wherein Hal is halogen, especially Cl, and R 14 is as defined above.

所需作為起始材料之肟可藉由標準化學教材(例如J.March,Advanced Organic Chemistry，第4版，Wiley Interscience，1992)或專著(例如S.R.Sandler & W.Karo,Organic functional group preparations，第3卷，Academic Press)中所述多種方法來獲得。 The oxime required as a starting material can be obtained through standard chemistry textbooks (such as J. March, Advanced Organic Chemistry, 4th Edition, Wiley Interscience, 1992) or monographs (such as SRSandler & W. Karo, Organic functional group preparations, Section 3, Academic Press).

最便利的一種方法係(例如)在極性溶劑(例如二甲基乙醯胺(DMA)、DMA水溶液、乙醇或乙醇水溶液)中使醛或酮與羥胺或其鹽反應。在此情形下，添加諸如乙酸鈉或吡啶等鹼來控制反應混合物之pH。眾所周知，反應速度具有pH依賴性，且可在開始時或在反應期間連續地添加鹼。亦可使用諸如吡啶等鹼性溶劑作為鹼及/或溶劑或共溶劑。反應溫度通常為室溫至混合物之回流溫度，一般為約20℃至120℃。 One of the most convenient methods is, for example, reacting an aldehyde or ketone with hydroxylamine or a salt thereof in a polar solvent such as dimethylacetamide (DMA), aqueous DMA, ethanol or aqueous ethanol. In this case, a base such as sodium acetate or pyridine is added to control the pH of the reaction mixture. It is well known that the reaction rate is pH-dependent, and the base can be added continuously at the beginning or during the reaction. It is also possible to use a basic solvent such as pyridine as the base and / or solvent or co-solvent. The reaction temperature is usually from room temperature to the reflux temperature of the mixture, and is generally about 20 ° C to 120 ° C.

相應酮中間體係(例如)藉由文獻(例如標準化學教材，例如J.March,Advanced Organic Chemistry，第4版，Wiley Interscience，1992)中所述方法來製備。另外，連續弗裏德-克拉夫茨反應(Friedel-Crafts reaction)可有效用於合成中間體。此等反應為彼等熟習此項技術者所熟知。 The corresponding ketone intermediates are prepared, for example, by methods described in the literature (e.g. standard chemistry textbooks, e.g. J. March, Advanced Organic Chemistry, 4th edition, Wiley Interscience, 1992). In addition, the continuous Friedel-Crafts reaction can be effectively used for the synthesis of intermediates. These reactions are well known to those skilled in the art.

肟之另一便利合成係用亞硝酸或亞硝酸烷基酯將「活性」亞甲基亞硝化。鹼性條件(如Organic Syntheses coll.第VI卷(J.Wiley & Sons,New York,1988)，第199頁及第840頁中所述)與酸性條件(如Organic Synthesis coll.第V卷，第32頁及第373頁，coll.第III卷，第191頁及第513頁，coll.第II卷，第202頁、第204頁及第363頁中所述)二者適於製備在本發明中用作起始材料之肟。一般自亞硝酸鈉產 生亞硝酸。亞硝酸烷基酯可為(例如)亞硝酸甲酯、亞硝酸乙酯、亞硝酸丙酯、亞硝酸丁酯或亞硝酸異戊酯。 Another convenient synthesis of oximes is the use of nitrous acid or alkyl nitrite to "active" methylene nitrite. Basic conditions (as described in Organic Syntheses coll. Vol. VI (J. Wiley & Sons, New York, 1988), pages 199 and 840) and acidic conditions (as in Organic Synthesis coll. Vol. V, p. 32 and 373, coll. Vol. III, 191 and 513, coll. Vol. II, 202, 204, and 363) Both are suitable for preparation in the present invention Oxime used as starting material. Generally produced from sodium nitrite Health of nitrous acid. The alkyl nitrite may be, for example, methyl nitrite, ethyl nitrite, propyl nitrite, butyl nitrite, or isoamyl nitrite.

本發明另一實施例係具有游離式(IA)所示結構之光起始劑(C-1)： 其中，R1、R2、R3、R4、R5、R6、R7及R8彼此獨立地為氫、C1-C20烷基、、COR16、OR17、鹵素、NO2 或或R1及R2、R2及R3、R3及R4、R5及R6、R6及R7或R7及R8彼此獨立地為經取代之C2-C10烯基；或R1及R2、R2及R3、R3及R4、R5及R6、R6及R7或R7及R8彼此獨立地共同為-(CH2)P-Y-(CH2)q-；或R1及R2、R2及R3、R3及R4、R5及R6、R6及R7或R7及R8 彼此獨立地共同為但條件為R1及R2、R2及R3、R3及R4、R5及R6、R6及R7或R7及R8中至少一對係，R9、R10、R11及R12彼此獨立地為氫、C1-C20烷基，該C1-C20烷基未經取代或經一或多個以下基團取代：鹵素、苯基、CN、OH、SH、C1-C4-烷氧基、(CO)OH或(CO)O(C1-C4烷基)；或R9、R10、R11及R12彼此獨立地為未經取代之苯基或經一或多個以下基團取代之苯基：C1-C6烷基、鹵素、CN、 OR17、SR18或NR19R20；或R9、R10、R11及R12彼此獨立地為鹵素、CN、OR17、SR18、SOR18、SO2R18或NR19R20，其中該等取代基OR17、SR18或NR19R20視情況經由基團R17、R18、R19及/或R20與萘基環中一個碳原子形成5員或6員環；或R9、R10、R11及R12彼此獨立地為、COR16或NO2；Y係O、S、NR26或直接鍵；p係整數0、1、2或3；q係整數1、2或3；X係CO或直接鍵；R13係C1-C20烷基，其未經取代或經一或多個以下基團取代：鹵素、R17、COOR17、OR17、SR18、CONR19R20、NR19R20、PO(OCkH2k+1)2或或R13係C2-C20烷基，其間雜有一或多個O、S、SO、SO2、NR26或CO，或係C2-C12烯基，其未經間雜或間雜有一或多個O、CO或NR26，其中經間雜之C2-C20烷基及未經間雜或經間雜之C2-C12烯基未經取代或經一或多個鹵素取代；或R13係C4-C8環烯基、C2-C12炔基或C3-C10環烷基，其未經間雜或間雜有一或多個O、S、CO或NR26；或R13係苯基或萘基，其各未經取代或經一或多個以下基團取代：OR17、SR18、NR19R20、、COR16、CN、NO2、鹵素、C1-C20烷基、C1-C4鹵代烷基、C2-C20烷基，其間雜有一或多個O、S、CO或NR26；或其各經C3-C10環 烷基或間雜有一或多個O、S、CO或NR26之C3-C10環烷基取代；k係整數1至10；R15係C6-C20芳基或C3-C20雜芳基，其各未經取代或經一或多個以下基團取代：苯基、鹵素、C1-C4鹵代烷基、CN、NO2、OR17、SR18、NR19R20、PO(OCkH2k+1)2、SO-C1-C10烷基、SO2-C1-C10烷基、間雜有一或多個O、S或NR26之C2-C20烷基；或其各經C1-C20烷基取代，該C1-C20烷基未經取代或經一或多個以下基團取代：鹵素、COOR17、CONR19R20、苯基、C3-C8環烷基、C3-C20雜芳基、C6-C20芳氧基羰基、C3-C20雜芳氧基羰基、OR17、SR18或NR19R20；或R15係氫、C2-C12烯基、C3-C8環烷基，其未經間雜或間雜有一或多個O、CO或NR26；或R15係C1-C20烷基，其未經取代或經一或多個以下基團取代：鹵素、OR17、SR18、C3-C8環烷基、C3-C20雜芳基、C6-C20芳氧基羰基、C3-C20雜芳氧基羰基、NR19R20、COOR17、CONR19R20、PO(OCkH2k+1)2、 、苯基；或該C1-C20烷基經苯基取代，該苯基經鹵素、C1-C20烷基、C1-C4鹵代烷基、OR17、SR18或NR19R20取代；或R15係C2-C20烷基，其間雜有一或多個O、SO或SO2，且該經間雜之C2-C20烷基未經取代或經一或多個以下基團取代：鹵素、OR17、COOR17、CONR19R20、苯基或經OR17、SR18或NR19R20取代之苯基；或R15係C2-C20烷醯基或苯甲醯基，其未經取代或經一或多 個以下基團取代：C1-C6烷基、鹵素、苯基、OR17、SR18或NR19R20；或R15係未經取代或經一或多個OR17取代之萘甲醯基或係C3-C14雜芳基羰基；或R15係C2-C12烷氧基羰基，其未經間雜或間雜有一或多個O且該經間雜或未經間雜之C2-C12烷氧基羰基未經取代或經一或多個羥基取代；或R15係苯氧基羰基，其未經取代或經一或多個以下基團取代：C1-C6烷基、鹵素、C1-C4鹵代烷基、苯基、OR17、SR18或NR19R20；或R15係CN、CONR19R20、NO2、C1-C4鹵代烷基、S(O)m-C1-C6烷基、未經取代或經C1-C12烷基或SO2-C1-C6烷基取代之S(O)m-苯基；或R15係SO2O-苯基，其未經取代或經C1-C12烷基取代；或係二苯基膦醯基或二(C1-C4烷氧基)-膦醯基；m係1或2；R'15具有針對R15所給出含義中之一者；X1係O、S、SO或SO2；X2係O、CO、S或直接鍵；R16係C6-C20芳基或C3-C20雜芳基，其每一者未經取代或經一或多個以下基團取代：苯基、鹵素、C1-C4鹵代烷基、CN、NO2、OR17、SR18、NR19R20或間雜有一或多個O、S或NR26之C1-C20烷基；或其每一者經一或多個C1-C20烷基取代，該C1-C20烷基未經取代或經一或多個以下基團取代：鹵素、COOR17、CONR19R20、苯基、C3-C8環烷基、C3-C20雜芳基、C6-C20芳氧基羰基、C3-C20雜芳氧基羰基、OR17、SR18或NR19R20；或R16係氫、未經取代或經一或多個 以下基團取代之C1-C20烷基：鹵素、苯基、OH、SH、CN、C3-C6烯氧基、OCH2CH2CN、OCH2CH2(CO)O(C1-C4烷基)、O(CO)-(C1-C4烷基)、O(CO)-苯基、(CO)OH或(CO)O(C1-C4烷基)；或R16係間雜有一或多個O、S或NR26之C2-C12烷基；或R16係(CH2CH2O)n+1H、(CH2CH2O)n(CO)-(C1-C8烷基)、C2-C12烯基或C3-C8環烷基；或R16係經SR18取代之苯基，其中基團R18表示鍵結至其中附接有COR16基團之咔唑部分之苯基或萘基環的直接鍵；n係1至20；R17係氫、苯基-C1-C3烷基、C1-C20烷基，其未經取代或經一或多個以下基團取代：鹵素、OH、SH、CN、C3-C6烯氧基、OCH2CH2CN、OCH2CH2(CO)O(C1-C4烷基)、O(CO)-(C1-C4烷基)、O(CO)-(C2-C4)烯基、O(CO)-苯基、(CO)OH、(CO)O(C1-C4烷基)、SO2-(C1-C4鹵代烷基)、O(C1-C4鹵代烷基)、C3-C20環烷基或間雜有一或多個O之C3-C20環烷基；或R17係C2-C20烷基，其間雜有一或多個O、S或NR26；或R17係(CH2CH2O)n+1H、(CH2CH2O)n(CO)-(C1-C8烷基)、C1-C8烷醯基、C2-C12烯基、C3-C6烯醯基或C3-C20環烷基，其未經間雜或間雜有一或多個O、S、CO或NR26；或R17係C1-C8烷基-C3-C10環烷基，其未經間雜或間雜有一或多個O；或R17係苯甲醯基，其未經取代或經一或多個C1-C6烷基、鹵素、OH或C1-C3烷氧基取代；或R17係苯基、萘基或C3-C20雜芳基，其各未經取代或經一 或多個以下基團取代：鹵素、OH、C1-C12烷基、C1-C12烷氧基、CN、NO2、苯基-C1-C3烷氧基、苯氧基、C1-C12烷基硫基、苯基硫基、N(C1-C12烷基)2、二苯基-胺基或 或R17形成鍵結至其上具有基團或之苯基或萘基環之一個碳原子之直接鍵；R18係氫、C2-C12烯基、C3-C20環烷基或苯基-C1-C3烷基，其中C2-C12烯基、C3-C20環烷基或苯基-C1-C3烷基未經間雜或間雜有一或多個O、S、CO、NR26或COOR17；或R18係C1-C20烷基，其未經取代或經一或多個以下基團取代：OH、SH、CN、C3-C6烯氧基、OCH2CH2CN、OCH2CH2(CO)O(C1-C4烷基)、O(CO)-(C2-C4)烯基、O(CO)-(C1-C4烷基)、O(CO)-苯基或(CO)OR17；或R18係C2-C20烷基，其間雜有一或多個O、S、CO、NR26或COOR17；或R18係(CH2CH2O)nH、(CH2CH2O)n(CO)-(C1-C8烷基)、C2-C8烷醯基或C3-C6烯醯基；或R18係苯甲醯基，其未經取代或經一或多個以下基團取代：C1-C6烷基、鹵素、OH、C1-C4烷氧基或C1-C4烷基硫基；或R18係苯基、萘基或C3-C20雜芳基，其各未經取代或經一或多個以下基團取代：鹵素、C1-C12烷基、C1-C4鹵代烷基、C1-C12烷氧基、CN、NO2、苯基-C1-C3烷氧基、苯氧基、C1-C12烷基硫基、苯基硫基、N(C1-C12烷基)2、二苯基胺基、(CO)O(C1-C8烷基)、(CO)-C1-C8烷基、(CO)N(C1- C8烷基)2或R19及R20彼此獨立地為氫、C1-C20烷基、C2-C4羥基烷基、 C2-C10烷氧基烷基、C2-C5烯基、C3-C20環烷基、苯基-C1-C3烷基、SO2-(C1-C4鹵代烷基)、C1-C8烷醯基、C1-C8烷醯基氧基、C3-C12烯醯基或苯甲醯基；或R19及R20係苯基、萘基或C3-C20雜芳基，其各未經取代或經一或多個以下基團取代：鹵素、C1-C4鹵代烷基、C1-C20烷氧基、C1-C12烷基、苯甲醯基或C1-C12烷氧基；或R19及R20與其所附接之N原子一起形成未經間雜或間雜有O、S或NR17之5員或6員飽和或不飽和環，且該5員或6員飽和或不飽和環未經取代或經一或多個以下基團取代：C1-C20烷基、C1-C20烷氧基、=O、OR17、SR18、NR21R22、(CO)R23、NO2、鹵素、C1-C4-鹵代烷基、CN、苯基、 或C3-C20環烷基，該C3-C20環烷基未經間雜或間雜有一或多個O、S、CO或NR17；或R19及R20與其所附接之N原子一起形成雜芳香族環系統，該環系統未經取代或經一或多個以下基團取代：C1-C20烷基、C1-C4鹵代烷基、C1-C20烷氧基、=O、OR17、SR18、NR21R22、(CO)R23、 、鹵素、NO2、CN、苯基或C3-C20環烷基，該C3-C20環烷基未經間雜或間雜有一或多個O、S、CO或NR17；R21及R22彼此獨立地為氫、C1-C20烷基、C1-C4鹵代烷基、C3-C10環烷基或苯基；或R21及R22與其所附接之N原子一起形成未經間雜或間雜有O、S或NR26之5員或6員飽和或不飽和環，且該5員或6員飽和或不飽和環未稠合或該5員或6員飽和或不飽和環係與苯環稠合；R23係氫、OH、C1-C20烷基、C1-C4鹵代烷基、間雜有一或 多個O、CO或NR26之C2-C20烷基、未經間雜或間雜有O、S、CO或NR26之C3-C20環烷基，或R23係苯基、萘基、苯基-C1-C4烷基、OR17、SR18或NR21R22；R24係(CO)OR17、CONR19R20、(CO)R17；或R24具有針對R19及R20所給出含義中之一者；R25係COOR17、CONR19R20、(CO)R17；或R25具有針對R17所給出含義中之一者；R26係氫、C1-C20烷基、C1-C4鹵代烷基、C2-C20烷基，其間雜有一或多個O或CO；或係苯基-C1-C4烷基、C3-C8環烷基，其未經間雜或間雜有一或多個O或CO；或係(CO)R19；或係苯基，其未經取代或經一或多個以下基團取代：C1-C20烷基、鹵素、C1-C4鹵代烷基、 OR17、SR18、NR19R20或 但條件為在該分子中存在至少一個基團或 Another embodiment of the present invention is a light initiator (C-1) having a structure represented by the free formula (IA): Among them, R 1 , R 2 , R 3 , R 4 , R 5 , R 6 , R 7 and R 8 are each independently hydrogen, C 1 -C 20 alkyl, , COR 16 , OR 17 , halogen, NO 2 or Or R 1 and R 2 , R 2 and R 3 , R 3 and R 4 , R 5 and R 6 , R 6 and R 7 or R 7 and R 8 are independent of each other. Substituted C 2 -C 10 alkenyl; or R 1 and R 2 , R 2 and R 3 , R 3 and R 4 , R 5 and R 6 , R 6 and R 7, or R 7 and R 8 are independently common with each other Is-(CH 2 ) P -Y- (CH 2 ) q- ; or R 1 and R 2 , R 2 and R 3 , R 3 and R 4 , R 5 and R 6 , R 6 and R 7 or R 7 And R 8 independently of each other are Provided that at least one of R 1 and R 2 , R 2 and R 3 , R 3 and R 4 , R 5 and R 6 , R 6 and R 7 or R 7 and R 8 , R 9 , R 10 , R 11 and R 12 are independently of each other hydrogen, C 1 -C 20 alkyl, the C 1 -C 20 alkyl is unsubstituted or substituted with one or more of the following groups: halogen, Phenyl, CN, OH, SH, C 1 -C 4 -alkoxy, (CO) OH or (CO) O (C 1 -C 4 alkyl); or R 9 , R 10 , R 11 and R 12 Independently of each other are unsubstituted phenyl or phenyl substituted with one or more of the following: C 1 -C 6 alkyl, halogen, CN, OR 17 , SR 18 or NR 19 R 20 ; or R 9 , R 10 , R 11 and R 12 are each independently halogen, CN, OR 17 , SR 18 , SOR 18 , SO 2 R 18 or NR 19 R 20 , wherein the substituents OR 17 , SR 18 or NR 19 R 20 optionally forms a 5- or 6-membered ring with one carbon atom in the naphthyl ring via the groups R 17 , R 18 , R 19 and / or R 20 ; or R 9 , R 10 , R 11 and R 12 are independent of each other for , COR 16 or NO 2 ; Y is O, S, NR 26 or direct bond; p is integer 0, 1, 2 or 3; q is integer 1, 2 or 3; X is CO or direct bond; R 13 is C 1- C 20 alkyl, which is unsubstituted or substituted with one or more of the following groups: halogen, R 17 , COOR 17 , OR 17 , SR 18 , CONR 19 R 20 , NR 19 R 20 , PO (OC k H 2k + 1 ) 2 or Or R 13 is a C 2 -C 20 alkyl group, which is interspersed with one or more O, S, SO, SO 2 , NR 26 or CO, or is a C 2 -C 12 alkenyl group, which is not interspersed or interspersed with one or A plurality of O, CO or NR 26 in which an interspersed C 2 -C 20 alkyl group and an unsaturated or interspersed C 2 -C 12 alkenyl group are unsubstituted or substituted with one or more halogens; or R 13 Is a C 4 -C 8 cycloalkenyl, C 2 -C 12 alkynyl, or C 3 -C 10 cycloalkyl group, which is unsaturated or interspersed with one or more O, S, CO or NR 26 ; or R 13 Phenyl or naphthyl, each unsubstituted or substituted with one or more of the following groups: OR 17 , SR 18 , NR 19 R 20 , COR 16 , CN, NO 2 , halogen, C 1 -C 20 alkyl, C 1 -C 4 haloalkyl, C 2 -C 20 alkyl, interposed with one or more O, S, CO or NR 26 ; each warp or C 3 -C 10 cycloalkyl, or interrupted by one or more O, S, CO or NR 26 of the C 3 -C 10 cycloalkyl; K-based integer from 1 to 10; R 15 lines C 6 - C 20 aryl or C 3 -C 20 heteroaryl, each unsubstituted or substituted with one or more of the following groups: phenyl, halogen, C 1 -C 4 haloalkyl, CN, NO 2 , OR 17 , SR 18 , NR 19 R 20 , PO (OC k H 2k + 1 ) 2 , SO-C 1 -C 10 alkyl, SO 2 -C 1 -C 10 alkyl, interspersed with one or more O, S or C 2 -C 20 alkyl group of NR 26 ; or each C 1 -C 20 alkyl group substituted, the C 1 -C 20 alkyl group is unsubstituted or substituted with one or more of the following groups: halogen, COOR 17 , CONR 19 R 20 , phenyl, C 3 -C 8 cycloalkyl, C 3 -C 20 heteroaryl, C 6 -C 20 aryloxycarbonyl, C 3 -C 20 heteroaryloxycarbonyl, OR 17 , SR 18 or NR 19 R 20 ; or R 15 is hydrogen, C 2 -C 12 alkenyl, C 3 -C 8 cycloalkyl, which is not interspersed or interspersed with one or more O, CO or NR 26 ; or R 15 C 1 -C 20 alkyl-based, which was used without A substituted or by one or more of the following groups: halo, OR 17, SR 18, C 3 -C 8 cycloalkyl, C 3 -C 20 heteroaryl, C 6 -C 20 aryloxycarbonyl group, C 3 -C 20 heteroaryloxycarbonyl, NR 19 R 20 , COOR 17 , CONR 19 R 20 , PO (OC k H 2k + 1 ) 2 , , Phenyl; or the C 1 -C 20 alkyl group is substituted with a phenyl group, the phenyl group is halogen, C 1 -C 20 alkyl group, C 1 -C 4 haloalkyl group, OR 17 , SR 18 or NR 19 R 20 Substituted; or R 15 is a C 2 -C 20 alkyl group, in which one or more O, SO, or SO 2 is interspersed, and the interspersed C 2 -C 20 alkyl group is unsubstituted or substituted by one or more of the following groups Group substitution: halogen, OR 17 , COOR 17 , CONR 19 R 20 , phenyl or phenyl substituted with OR 17 , SR 18 or NR 19 R 20 ; or R 15 is a C 2 -C 20 alkylfluorenyl or benzyl Fluorenyl, which is unsubstituted or substituted with one or more of the following: C 1 -C 6 alkyl, halogen, phenyl, OR 17 , SR 18 or NR 19 R 20 ; or R 15 is unsubstituted or A naphthylmethyl group substituted with one or more OR 17 or a C 3 -C 14 heteroarylcarbonyl group; or R 15 is a C 2 -C 12 alkoxycarbonyl group, which is not interspersed or has one or more O And the C 2 -C 12 alkoxycarbonyl group is unsubstituted or substituted with one or more hydroxyl groups; or R 15 is a phenoxycarbonyl group which is unsubstituted or substituted with one or more Group substitution: C 1 -C 6 alkyl, halogen, C 1 -C 4 haloalkyl, phenyl, OR 17 , SR 18 or NR 19 R 20 ; or R 15 is CN, CONR 19 R 20 , NO 2 , C 1 -C 4 haloalkyl, S (O) m -C 1 -C 6 alkyl, unsubstituted or C 1 -C 12 alkyl or SO 2 -C 1 -C 6 alkyl substituted S (O) m -phenyl; or R 15 is SO 2 O-phenyl, which is unsubstituted or substituted by C 1 -C 12 Group substitution; or is diphenylphosphinofluorenyl or bis (C 1 -C 4 alkoxy) -phosphinofluorenyl; m is 1 or 2; R '15 has one of the meanings given for R 15 ; X 1 is O, S, SO or SO 2 ; X 2 is O, CO, S or a direct bond; R 16 is C 6 -C 20 aryl or C 3 -C 20 heteroaryl, each of which is not Substituted or substituted with one or more of the following groups: phenyl, halogen, C 1 -C 4 haloalkyl, CN, NO 2 , OR 17 , SR 18 , NR 19 R 20 or interspersed with one or more O, S or C 1 -C 20 alkyl of NR 26 ; or each of them is substituted by one or more C 1 -C 20 alkyl, the C 1 -C 20 alkyl is unsubstituted or substituted by one or more of the following Substitution: halogen, COOR 17 , CONR 19 R 20 , phenyl, C 3 -C 8 cycloalkyl, C 3 -C 20 heteroaryl, C 6 -C 20 aryloxycarbonyl, C 3 -C 20 heteroaryl butoxycarbonyl, oR 17, SR 18 or NR 19 R 20; or R 16 lines , Unsubstituted or substituted with one or more of the following radicals C 1 -C 20 alkyl group: halogen, phenyl, OH, SH, CN, C 3 -C 6 alkenyloxy, OCH 2 CH 2 CN, OCH 2 CH 2 (CO) O (C 1 -C 4 alkyl), O (CO)-(C 1 -C 4 alkyl), O (CO) -phenyl, (CO) OH or (CO) O ( (C 1 -C 4 alkyl); or R 16 is a C 2 -C 12 alkyl mixed with one or more O, S or NR 26 ; or R 16 is (CH 2 CH 2 O) n + 1 H, ( CH 2 CH 2 O) n (CO)-(C 1 -C 8 alkyl), C 2 -C 12 alkenyl or C 3 -C 8 cycloalkyl; or R 16 is phenyl substituted with SR 18 , Where the group R 18 represents a direct bond to a phenyl or naphthyl ring bonded to the carbazole moiety to which the COR 16 group is attached; n is 1 to 20; R 17 is hydrogen, phenyl-C 1 -C 3 alkyl, C 1 -C 20 alkyl, unsubstituted or substituted with one or more of the following groups: halogen, OH, SH, CN, C 3 -C 6 alkenyloxy, OCH 2 CH 2 CN, OCH 2 CH 2 (CO) O (C 1 -C 4 alkyl), O (CO)-(C 1 -C 4 alkyl), O (CO)-(C 2 -C 4 ) alkenyl, O ( CO) -phenyl, (CO) OH, (CO) O (C 1 -C 4 alkyl), SO 2- (C 1 -C 4 haloalkyl), O (C 1 -C 4 haloalkyl), C or 3 -C 20 cycloalkyl interrupted by one or more of C 3 -C 20 O Alkyl group; R 17, or C 2 -C 20 alkyl-based, have therebetween one or more heteroatoms O, S or NR 26; or R 17 lines (CH 2 CH 2 O) n + 1 H, (CH 2 CH 2 O ) n (CO)-(C 1 -C 8 alkyl), C 1 -C 8 alkyl, C 2 -C 12 alkenyl, C 3 -C 6 alkenyl or C 3 -C 20 cycloalkyl , Which is not interspersed or interspersed with one or more O, S, CO or NR 26 ; or R 17 is a C 1 -C 8 alkyl-C 3 -C 10 cycloalkyl group, which is unstrained or interspersed with one or more O; or R 17 is benzamyl, which is unsubstituted or substituted with one or more C 1 -C 6 alkyl, halogen, OH or C 1 -C 3 alkoxy; or R 17 is phenyl , Naphthyl or C 3 -C 20 heteroaryl, each unsubstituted or substituted with one or more of the following groups: halogen, OH, C 1 -C 12 alkyl, C 1 -C 12 alkoxy, CN, NO 2 , phenyl-C 1 -C 3 alkoxy, phenoxy, C 1 -C 12 alkylthio, phenylthio, N (C 1 -C 12 alkyl) 2 , diphenyl Amino-amino Or R 17 forms a bond to or Direct bond of one carbon atom of phenyl or naphthyl ring; R 18 is hydrogen, C 2 -C 12 alkenyl, C 3 -C 20 cycloalkyl or phenyl-C 1 -C 3 alkyl, where C 2- C 12 alkenyl, C 3 -C 20 cycloalkyl or phenyl-C 1 -C 3 alkyl without one or more O, S, CO, NR 26 or COOR 17 ; or R 18 Is a C 1 -C 20 alkyl group, which is unsubstituted or substituted with one or more of the following groups: OH, SH, CN, C 3 -C 6 alkenyloxy, OCH 2 CH 2 CN, OCH 2 CH 2 ( CO) O (C 1 -C 4 alkyl), O (CO)-(C 2 -C 4 ) alkenyl, O (CO)-(C 1 -C 4 alkyl), O (CO) -phenyl Or (CO) OR 17 ; or R 18 is a C 2 -C 20 alkyl group, which is interspersed with one or more O, S, CO, NR 26 or COOR 17 ; or R 18 (CH 2 CH 2 O) n H , (CH 2 CH 2 O) n (CO)-(C 1 -C 8 alkyl), C 2 -C 8 alkylfluorenyl or C 3 -C 6 alkenyl; or R 18 benzamyl, It is unsubstituted or substituted with one or more of the following groups: C 1 -C 6 alkyl, halogen, OH, C 1 -C 4 alkoxy, or C 1 -C 4 alkylthio; or R 18 series phenyl, naphthyl or C 3 -C 20 heteroaryl, each of which is unsubstituted or substituted with one or more of the following radicals: halogen, C 1 -C 12 alkyl, C 1 -C 4 Substituted alkyl, C 1 -C 12 alkoxy, CN, NO 2, phenyl -C 1 -C 3 alkoxy, phenoxy, C 1 -C 12 alkylthio, phenylthio, N (C 1 -C 12 alkyl) 2 , diphenylamino, (CO) O (C 1 -C 8 alkyl), (CO) -C 1 -C 8 alkyl, (CO) N (C 1 -C 8 alkyl) 2 or R 19 and R 20 are each independently hydrogen, C 1 -C 20 alkyl, C 2 -C 4 hydroxyalkyl, C 2 -C 10 alkoxyalkyl, C 2 -C 5 alkenyl, C 3- C 20 cycloalkyl, phenyl-C 1 -C 3 alkyl, SO 2- (C 1 -C 4 haloalkyl), C 1 -C 8 alkylfluorenyl, C 1 -C 8 alkylfluorenyloxy, C 3 -C 12 alkenyl or benzamidine; or R 19 and R 20 are phenyl, naphthyl, or C 3 -C 20 heteroaryl, each of which is unsubstituted or has one or more of the following groups Substitution: halogen, C 1 -C 4 haloalkyl, C 1 -C 20 alkoxy, C 1 -C 12 alkyl, benzamidine or C 1 -C 12 alkoxy; or R 19 and R 20 with The attached N atoms together form a 5- or 6-membered saturated or unsaturated ring that is not interspersed or interspersed with O, S, or NR 17 , and the 5- or 6-membered saturated or unsaturated ring is unsubstituted or Or more of the following groups substituted: C 1 -C 20 alkyl, C 1 -C 20 alkoxy, = O, OR 17 , SR 18 , NR 21 R 22 , (CO) R 23 , NO 2 , halogen, C 1 -C 4 -haloalkyl, CN, phenyl, Or C 3 -C 20 cycloalkyl, the C 3 -C 20 cycloalkyl has one or more O, S, CO, or NR 17 without interspersed or interspersed; or R 19 and R 20 with the N atom to which it is attached Together form a heteroaromatic ring system that is unsubstituted or substituted with one or more of the following groups: C 1 -C 20 alkyl, C 1 -C 4 haloalkyl, C 1 -C 20 alkoxy, = O, OR 17 , SR 18 , NR 21 R 22 , (CO) R 23 , , Halogen, NO 2 , CN, phenyl, or C 3 -C 20 cycloalkyl, the C 3 -C 20 cycloalkyl has one or more O, S, CO, or NR 17 uninterspersed or interspersed; R 21 and R 22 is independently of each other hydrogen, C 1 -C 20 alkyl, C 1 -C 4 haloalkyl, C 3 -C 10 cycloalkyl or phenyl; or R 21 and R 22 together with the N atom to which they are attached Forms a 5- or 6-membered saturated or unsaturated ring without interspersed or interspersed O, S or NR 26 , and the 5- or 6-membered saturated or unsaturated ring is not fused or the 5- or 6-membered saturated or unsaturated saturated ring system is fused with a benzene ring; R 23 type hydrogen, OH, C 1 -C 20 alkyl, C 1 -C 4 haloalkyl, interrupted by one or more O, cO or NR C 26 alkoxy of 2 -C 20 , C 3 -C 20 cycloalkyl without meta or hetero, O, S, CO or NR 26 , or R 23 phenyl, naphthyl, phenyl-C 1 -C 4 alkyl, OR 17 , SR 18 or NR 21 R 22 ; R 24 is (CO) OR 17 , CONR 19 R 20 , (CO) R 17 ; or R 24 has one of the meanings given for R 19 and R 20 ; R 25 is COOR 17 , CONR 19 R 20 , (CO) R 17 ; or R 25 has one of the meanings given for R 17 ; R 26 is hydrogen, C 1 -C 20 alkyl, C 1 -C 4 haloalkyl , C 2 -C 20 alkyl, with one or more O or CO interspersed between them; or phenyl-C 1 -C 4 alkyl, C 3 -C 8 cycloalkyl, without one or more O or interspersed between CO; or (CO) R 19 ; or phenyl, which is unsubstituted or substituted with one or more of the following groups: C 1 -C 20 alkyl, halogen, C 1 -C 4 haloalkyl, OR 17 , SR 18 , NR 19 R 20 or Provided that at least one group is present in the molecule or

針對式(IA)所示結構之光起始劑(C-1)所定義基團之較佳者對應於如針對如下文所給出式(C-I)所示結構之光起始劑(C-1)給 出者，只是每一所定義肟酯基團(例如)皆替換為相應游離 肟基團 The preferred group defined for the photoinitiator (C-1) of the structure represented by formula (IA) corresponds to the photoinitiator (C- 1) given, just for each defined oxime ester group (e.g. ) Are replaced by the corresponding free oxime group

每一肟酯基團可以兩種構型(Z)或(E)存在。可藉由習用方法來分離異構體，但亦可使用異構體混合物作為(例如)光起始物質。因此，本發明亦係關於式(C-I)所示結構之光起始劑(C-1)之構型異構體之混合物。 Each oxime ester group can exist in two configurations (Z) or (E). Isomers can be separated by conventional methods, but it is also possible to use a mixture of isomers as, for example, a photoinitiator. Therefore, the present invention also relates to a mixture of configurational isomers of the photoinitiator (C-1) of the structure represented by the formula (C-I).

較佳者係如上文所定義之式(C-I)所示結構之光起始劑(C-1)，其中，R1、R2、R3、R4、R5、R6、R7及R8彼此獨立地為 氫、C1-C20烷基、、COR16或NO2，或R1及R2、R2及R3、R3及R4、R5及R6、R6及R7或R7及R8彼此獨立地共同為 但條件為R1及R2、R2及R3、R3及R4、R5及R6、R6及R7或R7及R8中至少一對係X係CO或直接鍵；R13係C1-C20烷基，其未經取代或經一或多個以下基團取代：鹵素、OR17、SR18、COOR17、CONR19R20或PO(OCkH2k+1)2；或R13係C2-C20烷基，其間雜有一或多個O、S、NR26或CO；或R13係苯基或萘基，此二者未經取代或經一或多個或COR16取代；R14係C1-C20烷基、苯基或C1-C8烷氧基；R15係苯基、萘基、C3-C20雜芳基，其各未經取代或經一或多個以下基團取代：苯基、鹵素、C1-C4鹵代烷基、OR17、SR18或C2-C20烷基，其間雜有一或多個O或S；或其各經一或多個C1-C20烷基取代，該C1-C20烷基未經取代或經一或多個以下基團取代：鹵素、COOR17、CONR19R20、苯基、C3-C8環烷基、C3-C20雜芳基、C6-C20芳氧基羰基、C4-C20雜芳氧基羰基、OR17、SR18、NR19R20或PO(OCkH2k+1)2；或R15係C1-C20烷基，其未經取代或經一或多個以下基團取代：OR17、SR18、C3-C8環烷基、C3-C20雜芳基、NR19R20、COOR17、CONR19R20或PO(OCkH2k+1)2；R'14具有針對R14所給出含義中之一者； R'15具有針對R15所給出含義中之一者；R16係苯基，其未經取代或經一或多個以下基團取代：OR17、SR18、NR19R20或間雜有一或多個O、S或NR26之C2-C20烷基，或R16係苯基，其經一或多個C1-C20烷基取代，該C1-C20烷基未經取代或經一或多個以下基團取代：鹵素、COOR17、CONR19R20、苯基、C3-C8環烷基、C3-C20雜芳基、C6-C20芳氧基羰基、C4-C20雜芳氧基羰基、OR17、SR18或NR19R20；或R16係C1-C20烷基，其未經取代或經以下基團取代：鹵素、苯基、OH、SH、CN、C3-C6烯氧基、OCH2CH2(CO)O(C1-C4烷基)、O(CO)-(C1-C4烷基)或(CO)O(C1-C4烷基)；R17係C1-C20烷基，其未經取代或經一或多個以下基團取代：鹵素、OCH2CH2(CO)O(C1-C4烷基)、O(C1-C4烷基)、(CO)O(C1-C4烷基)、C3-C20環烷基或間雜有一或多個O之C3-C20環烷基；或R17係C2-C20烷基，其間雜有一或多個O；R18係經(CO)OR17取代之甲基；R19及R20彼此獨立地為氫、苯基、C1-C20烷基、C1-C8烷醯基或C1-C8烷醯基氧基；或R19及R20與其所附接之N原子一起形成雜芳香族環系統，該環系統未經取代或經取代；但條件為在該分子中存在至少一個基團或 The preferred one is the photoinitiator (C-1) of the structure shown by the formula (CI) as defined above, wherein R 1 , R 2 , R 3 , R 4 , R 5 , R 6 , R 7 and R 8 is independently hydrogen, C 1 -C 20 alkyl, , COR 16 or NO 2 , or R 1 and R 2 , R 2 and R 3 , R 3 and R 4 , R 5 and R 6 , R 6 and R 7 or R 7 and R 8 independently of one another are Provided that at least one of R 1 and R 2 , R 2 and R 3 , R 3 and R 4 , R 5 and R 6 , R 6 and R 7 or R 7 and R 8 X is CO or a direct bond; R 13 is C 1 -C 20 alkyl, which is unsubstituted or substituted with one or more of the following groups: halogen, OR 17 , SR 18 , COOR 17 , CONR 19 R 20 or PO (OC k H 2k + 1 ) 2 ; or R 13 is a C 2 -C 20 alkyl group with one or more O, S, NR 26 or CO interposed therebetween; or R 13 is phenyl or naphthyl, both Unsubstituted or one or more Or COR 16 substitution; R 14 is C 1 -C 20 alkyl, phenyl or C 1 -C 8 alkoxy; R 15 is phenyl, naphthyl, C 3 -C 20 heteroaryl, each without Substituted or substituted with one or more of the following groups: phenyl, halogen, C 1 -C 4 haloalkyl, OR 17 , SR 18 or C 2 -C 20 alkyl with one or more O or S interposed therebetween; or They are each substituted with one or more C 1 -C 20 alkyl groups, the C 1 -C 20 alkyl group being unsubstituted or substituted with one or more of the following groups: halogen, COOR 17 , CONR 19 R 20 , phenyl , C 3 -C 8 cycloalkyl, C 3 -C 20 heteroaryl, C 6 -C 20 aryloxycarbonyl, C 4 -C 20 heteroaryloxycarbonyl, OR 17 , SR 18 , NR 19 R 20 Or PO (OC k H 2k + 1 ) 2 ; or R 15 is a C 1 -C 20 alkyl group, which is unsubstituted or substituted with one or more of the following groups: OR 17 , SR 18 , C 3 -C 8 Cycloalkyl, C 3 -C 20 heteroaryl, NR 19 R 20 , COOR 17 , CONR 19 R 20 or PO (OC k H 2k + 1 ) 2 ; R '14 has one of the meanings given for R 14 One; R '15 has one of the meanings given for R 15 ; R 16 is phenyl, which is unsubstituted or substituted with one or more of the following groups: OR 17 , SR 18 , NR 19 R 20 Or interspersed with one or more O, S or NR 26 C 2 -C 20 alkyl, or R 16 is phenyl, which is substituted with one or more C 1 -C 20 alkyl, the C 1 -C 20 alkyl Is unsubstituted or substituted with one or more of the following groups: halogen, COOR 17 , CONR 19 R 20 , phenyl, C 3 -C 8 cycloalkyl, C 3 -C 20 heteroaryl, C 6 -C 20 aryloxycarbonyl, C 4 -C 20 heteroaryloxycarbonyl, OR 17 , SR 18 or NR 19 R 20 ; or R 16 is C 1 -C 20 alkyl, which is unsubstituted or substituted with : Halogen, phenyl, OH, SH, CN, C 3 -C 6 alkenyloxy, OCH 2 CH 2 (CO) O (C 1 -C 4 alkyl), O (CO)-(C 1 -C 4 Alkyl) or (CO) O (C 1 -C 4 alkyl); R 17 is C 1 -C 20 alkyl, which is unsubstituted or substituted with one or more of the following groups: halogen, OCH 2 CH 2 (CO) O (C 1 -C 4 alkyl), O (C 1 -C 4 alkyl), (CO) O (C 1 -C 4 alkyl), C 3 -C 20 cycloalkyl or interspersed Or a C 3 -C 20 cycloalkyl group of O; or R 17 is a C 2 -C 20 alkyl group with one or more O interposed therebetween; R 18 is a methyl group substituted with (CO) OR 17 ; R 19 and R 20 independently of one another hydrogen, phenyl, C 1 -C 20 alkyl, C 1 -C 8 alkanoyl group or a C 1 -C 8 alkanoyl-yloxy ; Or R 19 and R 20 appended thereto the N atom to form a heteroaromatic ring system with the ring system is unsubstituted or Substitution; provided that at least one group is present in the molecule or

必須重視如上文所定義之式(C-I)所示結構之光起始劑 (C-1)，其中R1、R2、R5、R6、R7及R8彼此獨立地為氫、 COR16或NO2，R3及R4一起為R9、R10、R11及R12係氫；X係直接鍵；R13係C1-C20烷基；R14係C1-C20烷基；R15係C1-C20烷基或苯基，其經一或多個OR17或C1-C20烷基取代；R16係苯基，其經一或多個C1-C20烷基或OR17取代；且R17係未經取代或經一或多個鹵素取代之C1-C20烷基或係間雜有一或多個O之C2-C20烷基；但條件為在該分子中存在至少一個基團 Attention must be paid to the photoinitiator (C-1) of the structure shown in the formula (CI) as defined above, wherein R 1 , R 2 , R 5 , R 6 , R 7 and R 8 are independently hydrogen, COR 16 or NO 2 , R 3 and R 4 together are R 9 , R 10 , R 11 and R 12 are hydrogen; X is a direct bond; R 13 is C 1 -C 20 alkyl; R 14 is C 1 -C 20 alkyl; R 15 is C 1 -C 20 alkyl Or phenyl, which is substituted with one or more OR 17 or C 1 -C 20 alkyl; R 16 is phenyl, which is substituted with one or more C 1 -C 20 alkyl or OR 17 ; and R 17 based unsubstituted or substituted with one or more of halogen or C 1 -C 20 alkyl interrupted by one or more lines of C 2 -C 20 O-alkyl; with the proviso that there is in the molecule at least one group

本發明之標的進一步係如上文所定義之式(C-I)所示結構之光起始劑(C-1)，其中，R1、R2、R3、R4、R5、R6、R7及R8彼此獨立地為氫，或R1及R2、R3及R4或R5及R6彼此獨立地共同為 但條件為R1及R2、R3及R4或R5及R6中至少一對為 或R2係、COR16、NO2或 或R7係或COR16； R9、R11及R12係氫；R10係氫、OR17或COR16；X係CO或直接鍵；R13係C1-C20烷基，其未經取代或經一或多個以下基團取代：鹵素、R17、OR17、SR18或PO(OCkH2k+1)2；或R13係C2-C20烷基，其間雜有一或多個O；或R13係苯基；k係整數2；R14係C1-C20烷基或噻吩基；R15係苯基或萘基，其各未經取代或經一或多個OR17或C1-C20烷基取代；或R15係噻吩基、氫、C1-C20烷基，該C1-C20烷基未經取代或經一或多個以下基團取代：OR17、SR18、C3-C8環烷基、NR19R20或COOR17；或R15係C2-C20烷基，其間雜有SO2；R16係苯基或萘基，其各未經取代或經一或多個以下基團取代：OR17、SR18、NR19R20或C1-C20烷基；或R16係噻吩基；R17係氫、C1-C8烷醯基、C1-C20烷基，其未經取代或經一或多個以下基團：鹵素、O(CO)-(C1-C4烷基)、O(CO)-(C2-C4)烯基或間雜有一或多個O之C3-C20環烷基；或R17係C2-C20烷基，其間雜有一或多個O；R18係C3-C20環烷基、C1-C20烷基，其未經取代或經一或多個OH、O(CO)-(C2-C4)烯基或(CO)OR17取代；或R18係苯基，其未經取代或經一或多個鹵素取代；R19及R20彼此獨立地為C1-C8烷醯基或C1-C8烷醯基氧基；或R19及R20與其所附接之N原子一起形成間雜有O之5員或6 員飽和環；但條件為在該分子中存在至少一個基團 The subject matter of the present invention is further a photoinitiator (C-1) having a structure shown by the formula (CI) as defined above, wherein R 1 , R 2 , R 3 , R 4 , R 5 , R 6 , R 7 and R 8 are each independently hydrogen, or R 1 and R 2 , R 3 and R 4 or R 5 and R 6 are independently common to each other as Provided that at least one of R 1 and R 2 , R 3 and R 4 or R 5 and R 6 is Or R 2 series , COR 16 , NO 2 or Or R 7 series Or COR 16 ; R 9 , R 11 and R 12 are hydrogen; R 10 is hydrogen, OR 17 or COR 16 ; X is CO or a direct bond; R 13 is C 1 -C 20 alkyl, which is unsubstituted or One or more of the following groups are substituted: halogen, R 17 , OR 17 , SR 18 or PO (OC k H 2k + 1 ) 2 ; or R 13 is a C 2 -C 20 alkyl group with one or more O interposed therebetween Or R 13 is phenyl; k is an integer 2; R 14 is C 1 -C 20 alkyl or thienyl; R 15 is phenyl or naphthyl, each of which is unsubstituted or via one or more OR 17 or C 1 -C 20 alkyl substitution; or R 15 is thienyl, hydrogen, C 1 -C 20 alkyl, the C 1 -C 20 alkyl is unsubstituted or substituted with one or more of the following groups: OR 17 , SR 18 , C 3 -C 8 cycloalkyl, NR 19 R 20 or COOR 17 ; or R 15 is a C 2 -C 20 alkyl with SO 2 interposed therebetween; R 16 is phenyl or naphthyl, each Unsubstituted or substituted with one or more of the following groups: OR 17 , SR 18 , NR 19 R 20 or C 1 -C 20 alkyl; or R 16 is thienyl; R 17 is hydrogen, C 1 -C 8 Alkyl, C 1 -C 20 alkyl, unsubstituted or via one or more of the following groups: halogen, O (CO)-(C 1 -C 4 alkyl), O (CO)-(C 2 -C 4) alkenyl group or interrupted by one or O of a C 3 -C 20 cycloalkyl; R 17, or C 2 -C 20 alkyl-based, have therebetween one or more heteroatoms O; R 18 lines C 3 -C 20 cycloalkyl, C 1 -C 20 alkyl Group, which is unsubstituted or substituted with one or more OH, O (CO)-(C 2 -C 4 ) alkenyl or (CO) OR 17 ; or R 18 is phenyl, which is unsubstituted or substituted Or more than one halogen substitution; R 19 and R 20 are independently C 1 -C 8 alkylfluorenyl or C 1 -C 8 alkylfluorenyloxy; or R 19 and R 20 are formed together with the N atom to which they are attached 5- or 6-membered saturated ring mixed with O; provided that at least one group is present in the molecule

本發明化合物之實例係如上文所定義之式(Ia)-(Ig)化合物。式(Ia)、(Ib)、(Ic)、尤其式(Ia)或(Ic)、或式(Ia)、(Ic)或(Id)、尤其式(Ia)之化合物令人關注。 Examples of compounds of the invention are compounds of formula (Ia)-(Ig) as defined above. Compounds of formula (Ia), (Ib), (Ic), especially formula (Ia) or (Ic), or formula (Ia), (Ic) or (Id), especially formula (Ia) are of interest.

舉例而言，R1、R2、R3、R4、R5、R6、R7及R8彼此獨立地為氫、或COR16，或R1及R2、R2及R3、R3及R4或 R5及R6、R6及R7、R7及R8彼此獨立地共同為 For example, R 1 , R 2 , R 3 , R 4 , R 5 , R 6 , R 7 and R 8 are independently hydrogen, Or COR 16 or R 1 and R 2 , R 2 and R 3 , R 3 and R 4 or R 5 and R 6 , R 6 and R 7 , R 7 and R 8 independently of one another are

舉例而言，R3及R4或R1及R2共同為或R3 及R4及R5及R6共同為；R3及R4尤其共同為 For example, R 3 and R 4 or R 1 and R 2 together are Or R 3 and R 4 and R 5 and R 6 together are ; R 3 and R 4 are particularly common

舉例而言，R1、R5、R6及R8係氫。 For example, R 1 , R 5 , R 6 and R 8 are hydrogen.

R7尤其為氫、或COR16。或R7係 或COR16、尤其為 R 7 is especially hydrogen, Or COR 16 . Or R 7 series Or COR 16 , especially

R2尤其為，COR16或或R2與R1 一起為。R2尤其為COR16。 R 2 is especially , COR 16 or Or R 2 together with R 1 is . R 2 is especially COR 16 .

X較佳為直接鍵。 X is preferably a direct bond.

舉例而言，R9、R10、R11及R12彼此獨立地為氫、C1-C20烷基、未經取代之苯基或經一或多個以下基團取代之苯基：C1-C6烷基、鹵素、OR17或SR18；或R9、R10、R11及R12彼此獨立地為鹵素、OR17、SR18或NR19R20，其中取代基OR17、SR18或NR19R20視情況經由基團R17、R18、R19及/或R20與萘基環之一個碳原子形成5員或6員環；或R9、R10、R11及R12彼此獨立地為或 COR16。 For example, R 9 , R 10 , R 11, and R 12 are each independently hydrogen, C 1 -C 20 alkyl, unsubstituted phenyl, or phenyl substituted with one or more of the following groups: C 1- C 6 alkyl, halogen, OR 17 or SR 18 ; or R 9 , R 10 , R 11 and R 12 are independently of each other halogen, OR 17 , SR 18 or NR 19 R 20 , wherein the substituents OR 17 , SR 18 or NR 19 R 20 optionally forms a 5- or 6-membered ring with one carbon atom of the naphthyl ring via the groups R 17 , R 18 , R 19 and / or R 20 ; or R 9 , R 10 , R 11 And R 12 are independent of each other Or COR 16 .

具體而言，舉例而言，R9、R10、R11及R12彼此獨立地為氫、C1-C20烷基、未經取代之苯基或經一或多個以下基團取代之苯基：C1-C6烷基、鹵素、OR17或SR18；或R9、R10、R11及R12彼此獨立地為鹵素、OR17、SR18或NR19R20；或R9、R10、R11及R12彼此獨立地為或COR16。 Specifically, for example, R 9 , R 10 , R 11, and R 12 are each independently hydrogen, C 1 -C 20 alkyl, unsubstituted phenyl, or one substituted with one or more of the following groups Phenyl: C 1 -C 6 alkyl, halogen, OR 17 or SR 18 ; or R 9 , R 10 , R 11 and R 12 are each independently halogen, OR 17 , SR 18 or NR 19 R 20 ; or R 9 , R 10 , R 11 and R 12 are independently of each other Or COR 16 .

舉例而言，R9、R10、R11及R12彼此獨立地為氫、C1-C20烷基、未經取代之苯基或經一或多個C1-C6烷基取代之苯基；或R9、R10、R11及R12彼此獨立地為或COR16。 For example, R 9 , R 10 , R 11, and R 12 are each independently hydrogen, C 1 -C 20 alkyl, unsubstituted phenyl, or one substituted with one or more C 1 -C 6 alkyl. Phenyl; or R 9 , R 10 , R 11 and R 12 are each independently Or COR 16 .

在另一實施例中，舉例而言，R9、R10、R11及R12彼此獨立地為氫、C1-C20烷基、未經取代之苯基或經一或多個以下基團取代之苯基：C1-C6烷基、鹵素、OR17或SR18；或R9、R10、R11及R12彼此獨立地為鹵素、OR17、SR18或NR19R20，其中取代基OR17、SR18或NR19R20視情況經由基團R17、R18、R19及/或R20與萘基環之一個碳原子形成5員或6員環。 In another embodiment, for example, R 9 , R 10 , R 11, and R 12 are independently of each other hydrogen, C 1 -C 20 alkyl, unsubstituted phenyl, or via one or more of the following groups Group substituted phenyl: C 1 -C 6 alkyl, halogen, OR 17 or SR 18 ; or R 9 , R 10 , R 11 and R 12 are independently halogen, OR 17 , SR 18 or NR 19 R 20 Wherein the substituents OR 17 , SR 18 or NR 19 R 20 optionally form a 5- or 6-membered ring with one carbon atom of the naphthyl ring via the groups R 17 , R 18 , R 19 and / or R 20 .

此外，舉例而言，R9、R10、R11及R12彼此獨立地為氫、C1-C20烷基、未經取代之苯基或經一或多個以下基團取代之苯基：C1-C6烷基、鹵素、OR17或SR18，或R9、R10、R11及R12彼此獨立地為鹵素、OR17、SR18、NR19R20或COR16。 In addition, for example, R 9 , R 10 , R 11, and R 12 are each independently hydrogen, C 1 -C 20 alkyl, unsubstituted phenyl, or phenyl substituted with one or more of the following groups : C 1 -C 6 alkyl, halogen, OR 17 or SR 18 , or R 9 , R 10 , R 11 and R 12 are each independently halogen, OR 17 , SR 18 , NR 19 R 20 or COR 16 .

或舉例而言，R9、R10、R11及R12彼此獨立地為氫、C1-C20烷基、未經取代之苯基或經一或多個以下基團取代之苯基：C1-C6烷基、鹵素、OR17或SR18，或R9、R10、R11及R12彼此獨立地為鹵素、OR17、COR16或NR19R20。 Or, for example, R 9 , R 10 , R 11 and R 12 are independently of each other hydrogen, C 1 -C 20 alkyl, unsubstituted phenyl, or phenyl substituted with one or more of the following groups: C 1 -C 6 alkyl, halogen, OR 17 or SR 18 , or R 9 , R 10 , R 11 and R 12 are each independently halogen, OR 17 , COR 16 or NR 19 R 20 .

較佳地，R9、R11及R12係氫且R10係氫、OR17或COR16。 Preferably, R 9 , R 11 and R 12 are hydrogen and R 10 is hydrogen, OR 17 or COR 16 .

R13係(例如)C1-C20烷基，其未經取代或經一或多個以下基團取代：鹵素、COOR17或CONR19R20；或R13係C2-C20烷基，其間雜有一或多個O、S、SO、SO2、NR26或CO，或係C2-C12烯基，其視情況間雜有一或多個O、CO或NR26，或R13係C3-C10環烷基，其視情況間雜有一或多個O、S、CO、NR26，或R13係苯基或萘基，此二者未經取代或經一或多個以下基團取代：OR17、SR18、NR19R20、、COR16、NO2、鹵素、C1-C20烷基、C1-C4鹵代烷基、C2-C20烷基，其間雜有一或多個O；或係C1-C20烷基，其未經取代或經一或多個以下基團取代：鹵素、R17、COOR17、OR17、SR18、CONR19R20或PO(OCkH2k+1)2；或係C2-C20烷基，其間雜有一或多個O。 R 13 is, for example, a C 1 -C 20 alkyl group, which is unsubstituted or substituted with one or more of the following groups: halogen, COOR 17 or CONR 19 R 20 ; or R 13 is a C 2 -C 20 alkyl group , Interspersed with one or more O, S, SO, SO 2 , NR 26 or CO, or C 2 -C 12 alkenyl, interspersed with one or more O, CO or NR 26 , or R 13 C 3 -C 10 cycloalkyl, optionally mixed with one or more O, S, CO, NR 26 , or R 13 phenyl or naphthyl, both of which are unsubstituted or have one or more of the following groups Group substitution: OR 17 , SR 18 , NR 19 R 20 , , COR 16 , NO 2 , halogen, C 1 -C 20 alkyl, C 1 -C 4 haloalkyl, C 2 -C 20 alkyl with one or more O interposed therebetween; or C 1 -C 20 alkyl , Which is unsubstituted or substituted with one or more of the following groups: halogen, R 17 , COOR 17 , OR 17 , SR 18 , CONR 19 R 20 or PO (OC k H 2k + 1 ) 2 ; or C 2 -C 20 alkyl with one or more O interposed therebetween.

此外，R13係(例如)C1-C20烷基，其未經取代或經一或多個以下基團取代：鹵素、R17、COOR17、OR17、SR18、CONR19R20或PO(OCkH2k+1)2；或係C2-C20烷基，其間雜有一或多個O；或係C2-C12烯基、C3-C10環烷基；或R13係苯基或萘基，此二者未經取代或經一或多個以下基團取代：OR17、SR18、NR19R20、、COR16、NO2、鹵素、C1-C20烷基、C1-C4鹵代烷基、C2-C20烷基，其間雜有一或多個O。 In addition, R 13 is, for example, a C 1 -C 20 alkyl group, which is unsubstituted or substituted with one or more of the following groups: halogen, R 17 , COOR 17 , OR 17 , SR 18 , CONR 19 R 20 or PO (OC k H 2k + 1 ) 2 ; or a C 2 -C 20 alkyl group with one or more O interposed therebetween; or a C 2 -C 12 alkenyl group, a C 3 -C 10 cycloalkyl group; or R 13 based phenyl or naphthyl, both of which unsubstituted or substituted with one or more of the following groups: oR 17, SR 18, NR 19 R 20, , COR 16 , NO 2 , halogen, C 1 -C 20 alkyl, C 1 -C 4 haloalkyl, C 2 -C 20 alkyl, with one or more O interposed therebetween.

在另一實施例中，R13係(例如)C1-C20烷基，其未經取代或經一或多個以下基團取代：鹵素、R17、OR17、SR18或PO(OCkH2k+1)2；或係C2-C20烷基，其間雜有一或多個O；或係C2-C12烯基、C3-C10環烷基、苯基或萘基。 In another embodiment, R 13 is, for example, a C 1 -C 20 alkyl group, which is unsubstituted or substituted with one or more of the following groups: halogen, R 17 , OR 17 , SR 18, or PO (OC k H 2k + 1 ) 2 ; or C 2 -C 20 alkyl with one or more O interposed therebetween; or C 2 -C 12 alkenyl, C 3 -C 10 cycloalkyl, phenyl or naphthyl .

或R13係(例如)C1-C20烷基，其未經取代或經一或多個以下基團取代：鹵素、R17、OR17、SR18或PO(OCkH2k+1)2；或係C2-C20烷基，其間雜有一或多個O；或係苯基、C2-C12烯基或C3-C10 環烷基。 Or R 13 is, for example, a C 1 -C 20 alkyl group, which is unsubstituted or substituted with one or more of the following groups: halogen, R 17 , OR 17 , SR 18, or PO (OC k H2 k + 1 ) 2 ; or a C 2 -C 20 alkyl group with one or more O interposed therebetween; or a phenyl group, a C 2 -C 12 alkenyl group or a C 3 -C 10 cycloalkyl group.

或R13係(例如)C1-C20烷基、苯基、C2-C12烯基或C3-C10環烷基。 Or R 13 is, for example, C 1 -C 20 alkyl, phenyl, C 2 -C 12 alkenyl or C 3 -C 10 cycloalkyl.

或R13係(例如)C1-C20烷基、C2-C12烯基或C3-C10環烷基。 Or R 13 is, for example, C 1 -C 20 alkyl, C 2 -C 12 alkenyl, or C 3 -C 10 cycloalkyl.

較佳地，R13係C1-C20烷基，尤其為C1-C8烷基，例如2-乙基己基。 Preferably, R 13 is a C 1 -C 20 alkyl group, especially a C 1 -C 8 alkyl group, such as 2-ethylhexyl.

R14係(例如)氫、C3-C8環烷基、C2-C5烯基、C1-C20烷氧基或C1-C20烷基，其未經取代或經一或多個鹵素或苯基取代；或R14係苯基或萘基，此二者未經取代或經一或多個以下基團取代：C1-C6烷基、C1-C4鹵代烷基、鹵素、OR17、SR18及/或NR19R20；或R14係C3-C5雜芳基，例如噻吩基，或係C1-C8烷氧基、苄氧基或苯氧基。 R 14 is, for example, hydrogen, C 3 -C 8 cycloalkyl, C 2 -C 5 alkenyl, C 1 -C 20 alkoxy, or C 1 -C 20 alkyl, which are unsubstituted or Multiple halogen or phenyl substitution; or R 14 is phenyl or naphthyl, both of which are unsubstituted or substituted with one or more of the following groups: C 1 -C 6 alkyl, C 1 -C 4 haloalkyl , Halogen, OR 17 , SR 18 and / or NR 19 R 20 ; or R 14 is a C 3 -C 5 heteroaryl group, such as thienyl, or C 1 -C 8 alkoxy, benzyloxy or phenoxy base.

或R14係(例如)C1-C20烷基，其未經取代或經一或多個鹵素或苯基取代；或R14係C3-C5雜芳基(例如噻吩基)或係未經取代或經取代一或多個以下基團取代之苯基：C1-C6烷基、C1-C4鹵代烷基、鹵素、OR17、SR18及/或NR19R20；或R14係C1-C8烷氧基、苄氧基或苯氧基。 Or R 14 is, for example, a C 1 -C 20 alkyl group, which is unsubstituted or substituted with one or more halogen or phenyl groups; or R 14 is a C 3 -C 5 heteroaryl group (for example, thienyl) or Phenyl, unsubstituted or substituted with one or more of the following: C 1 -C 6 alkyl, C 1 -C 4 haloalkyl, halogen, OR 17 , SR 18 and / or NR 19 R 20 ; or R 14 is C 1 -C 8 alkoxy, benzyloxy or phenoxy.

在另一實施例中，R14表示C1-C20烷基，其未經取代或經苯基取代；或R14係苯基，其未經取代或經一或多個C1-C6烷基取代。 In another embodiment, R 14 represents C 1 -C 20 alkyl, which is unsubstituted or substituted with phenyl; or R 14 is phenyl, which is unsubstituted or substituted with one or more C 1 -C 6 Alkyl substituted.

較佳地，R14係C1-C20烷基、C3-C5雜芳基(例如噻吩基)，或係苯基，尤其為C1-C20烷基或噻吩基，尤其為C1-C8烷基。 Preferably, R 14 is C 1 -C 20 alkyl, C 3 -C 5 heteroaryl (such as thienyl), or is phenyl, especially C 1 -C 20 alkyl or thienyl, especially C 1- C 8 alkyl.

R15係(例如)C6-C20芳基或C5-C20雜芳基，其各未經取代或經一或多個以下基團取代：苯基、鹵素、C1-C4鹵代烷基、CN、NO2、OR17、SR18、NR19R20、C1-C20烷基；或R15係氫、C3- C8環烷基，該C3-C8環烷基視情況間雜有一或多個O、CO或NR26；或R15係C1-C20烷基，其未經取代或經一或多個以下基團取代：鹵素、OR17、C3-C8環烷基、C5-C20雜芳基、C8-C20苯氧基羰基、C5-C20雜芳氧基-羰基、NR19R20、COOR17、CONR19R20、PO(OCkH2k+1)2、、苯基或經以下基團取代之苯基：鹵素、C1-C20烷基、C1-C4鹵代烷基、OR17或NR19R20；或R15係C2-C20烷基，其間雜有一或多個O、S或SO2，或R15係C2-C20烷醯基、苯甲醯基、C2-C12烷氧基羰基、苯氧基羰基、CONR19R20、NO2或C1-C4鹵代烷基。 R 15 is, for example, a C 6 -C 20 aryl group or a C 5 -C 20 heteroaryl group, each of which is unsubstituted or substituted with one or more of the following groups: phenyl, halogen, C 1 -C 4 haloalkane group, CN, NO 2, oR 17 , SR 18, NR 19 R 20, C 1 -C 20 alkyl group; R 15 or hydrogen-based, C 3 - C 8 cycloalkyl group, the C 3 -C 8 cycloalkyl, Optionally mixed with one or more O, CO or NR 26 ; or R 15 is a C 1 -C 20 alkyl group, which is unsubstituted or substituted with one or more of the following groups: halogen, OR 17 , C 3 -C 8 -cycloalkyl, C 5 -C 20 heteroaryl, C 8 -C 20 phenoxycarbonyl, C 5 -C 20 heteroaryloxy-carbonyl, NR 19 R 20 , COOR 17 , CONR 19 R 20 , PO (OC k H 2k + 1 ) 2 , , Phenyl or phenyl substituted by: halogen, C 1 -C 20 alkyl, C 1 -C 4 haloalkyl, OR 17 or NR 19 R 20 ; or R 15 is C 2 -C 20 alkyl , Interspersed with one or more O, S or SO 2 , or R 15 is C 2 -C 20 alkylfluorenyl, benzamidine, C 2 -C 12 alkoxycarbonyl, phenoxycarbonyl, CONR 19 R 20 , NO 2 or C 1 -C 4 haloalkyl.

此外，R15係(例如)氫、C6-C20芳基，尤其為苯基或萘基，其各未經取代或經C1-C12烷基取代；或係C3-C5雜芳基，例如噻吩基；或係C3-C8環烷基、C1-C20烷基，其未經取代或經一或多個以下基團取代：OR17、SR17、C3-C8-環烷基、NR19R20或COOR17；或R15係C2-C20烷基，其間雜有一或多個O或SO2。 In addition, R 15 is, for example, hydrogen, C 6 -C 20 aryl, especially phenyl or naphthyl, each of which is unsubstituted or substituted with C 1 -C 12 alkyl; or is C 3 -C 5 hetero Aryl, such as thienyl; or C 3 -C 8 cycloalkyl, C 1 -C 20 alkyl, which are unsubstituted or substituted with one or more of the following groups: OR 17 , SR 17 , C 3- C 8 - cycloalkyl, NR 19 R 20 or COOR 17; R 15, or C 2 -C 20 alkyl-based, have therebetween one or more heteroatoms O or SO 2.

該具有式(C-I)所示結構之光起始劑(C-1)令人關注，其中R15係(例如)氫、苯基、萘基，其各未經取代或經C1-C8烷基取代；或R15係噻吩基、C1-C20烷基，其未經取代或經一或多個以下基團取代：OR17、SR17、C3-C8-環烷基、NR19R20或COOR17；或R15係C2-C20烷基，其間雜有一或多個O或SO2。 The photoinitiator (C-1) having a structure represented by formula (CI) is of interest, in which R 15 is (for example) hydrogen, phenyl, or naphthyl, each of which is unsubstituted or is C 1 -C 8 Alkyl substitution; or R 15 is thienyl, C 1 -C 20 alkyl, which is unsubstituted or substituted with one or more of the following groups: OR 17 , SR 17 , C 3 -C 8 -cycloalkyl, NR 19 R 20 or COOR 17; R 15, or C 2 -C 20 alkyl-based, have therebetween one or more heteroatoms O or SO 2.

R15尤其為(例如)C3-C8環烷基或C1-C20烷基，尤其為C1-C20烷基，尤其為C1-C12烷基。 R 15 is, for example, a C 3 -C 8 cycloalkyl group or a C 1 -C 20 alkyl group, especially a C 1 -C 20 alkyl group, especially a C 1 -C 12 alkyl group.

R'14及R'15之較佳者分別係如上文針對R14及R15所給出者。 R '14 and R' 15 are the preferred lines are as described above for R 14 and R 15 are given.

X1係(例如)O、S或SO，例如O或S，尤其為O。 X 1 is, for example, O, S or SO, such as O or S, especially O.

R16係(例如)C6-C20芳基(尤其苯基或萘基、尤其苯基) 或C5-C20雜芳基(尤其噻吩基)，其各未經取代或經一或多個以下基團取代：苯基、鹵素、C1-G4鹵代烷基、CN、NO2、OR17、SR18、NR19R20或間雜有一或多個O之C1-C20烷基；或其各經一或多個C1-C20烷基取代，該C1-C20烷基未經取代或經一或多個以下基團取代：鹵素、COOR17、CONR19R20、苯基、C3-C8環烷基、C5-C20雜芳基、C6-C20芳氧基羰基、C5-C20雜芳氧基羰基、OR17、SR18或NR19R20；或R16係氫、C1-C20烷基，該C1-C20烷基未經取代或經一或多個以下基團取代：鹵素、苯基、OH、SH、C3-C6烯氧基、OCH2CH2(CO)O(C1-C4烷基)、O(CO)-(C1-C4烷基)、O(CO)-苯基、(CO)OH或(CO)O(C1-C4烷基)；或R16係C2-C12烷基，其間雜有一或多個O；或係(CH2CH2O)n+1H、(CH2CH2O)n(CO)-(C1-C8烷基)、C2-C12烯基或C3-C8環烷基，且n係1至20，例如1至12或1至8，尤其為1或2。 R 16 is, for example, a C 6 -C 20 aryl group (especially phenyl or naphthyl group, especially phenyl group) or a C 5 -C 20 heteroaryl group (especially thienyl group), each of which is unsubstituted or substituted by one or more Substituted with the following groups: phenyl, halogen, C 1 -G 4 haloalkyl, CN, NO 2 , OR 17 , SR 18 , NR 19 R 20 or C 1 -C 20 alkyl interspersed with one or more O; Or each of them is substituted with one or more C 1 -C 20 alkyl groups, the C 1 -C 20 alkyl group is unsubstituted or substituted with one or more of the following groups: halogen, COOR 17 , CONR 19 R 20 , benzene Group, C 3 -C 8 cycloalkyl, C 5 -C 20 heteroaryl, C 6 -C 20 aryloxycarbonyl, C 5 -C 20 heteroaryloxycarbonyl, OR 17 , SR 18 or NR 19 R 20 ; or R 16 is hydrogen, C 1 -C 20 alkyl, the C 1 -C 20 alkyl is unsubstituted or substituted with one or more of the following groups: halogen, phenyl, OH, SH, C 3- C 6 alkenyloxy, OCH 2 CH 2 (CO) O (C 1 -C 4 alkyl), O (CO)-(C 1 -C 4 alkyl), O (CO) -phenyl, (CO) OH or (CO) O (C 1 -C 4 alkyl); or R 16 is a C 2 -C 12 alkyl group with one or more O interposed therebetween; or (CH 2 CH 2 O) n + 1 H, (CH 2 CH 2 O) n (CO) - (C 1 -C 8 alkyl), C 2 -C 12 alkenyl or C 3 -C 8 cycloalkyl Group, and n lines 1 to 20, e.g. 1-12 or 1-8, in particular 1 or 2.

此外，R16係(例如)苯基或萘基，尤其為苯基、噻吩基或咔唑，其各未經取代或經一或多個以下基團取代：苯基、鹵素、C1-C4鹵代烷基、OR17、SR18、NR19R20或C1-C20烷基；或R16係C1-C20烷基，其未經取代或經一或多個以下基團取代：鹵素、苯基、OH、SH、C3-C6烯氧基、OCH2CH2(CO)O(C1-C4烷基)、O(CO)-(C1-C4烷基)、O(CO)-苯基、(CO)OH或(CO)O(C1-C4烷基)；或R16係C2-C12烷基，其間雜有一或多個O；或係(CH2CH2O)n+1H、(CH2CH2O)n(CO)-(C1-C8烷基)、C2-C12烯基或C3-C8環烷基，且n係1至20，例如1至12或1至8，尤其為1或2。 In addition, R 16 is, for example, phenyl or naphthyl, especially phenyl, thienyl, or carbazole, each of which is unsubstituted or substituted with one or more of the following groups: phenyl, halogen, C 1 -C 4- haloalkyl, OR 17 , SR 18 , NR 19 R 20 or C 1 -C 20 alkyl; or R 16 is C 1 -C 20 alkyl, which is unsubstituted or substituted with one or more of the following groups: Halogen, phenyl, OH, SH, C 3 -C 6 alkenyloxy, OCH 2 CH 2 (CO) O (C 1 -C 4 alkyl), O (CO)-(C 1 -C 4 alkyl) , O (CO) -phenyl, (CO) OH or (CO) O (C 1 -C 4 alkyl); or R 16 is a C 2 -C 12 alkyl group with one or more O interposed therebetween; or (CH 2 CH 2 O) n + 1 H, (CH 2 CH 2 O) n (CO)-(C 1 -C 8 alkyl), C 2 -C 12 alkenyl or C 3 -C 8 cycloalkyl And n is 1 to 20, such as 1 to 12 or 1 to 8, especially 1 or 2.

此外，R16係(例如)苯基或萘基，尤其為苯基，其各未經取代或經一或多個以下基團取代：苯基、鹵素、C1-C4鹵代烷基、OR17、SR18、NR19R20或C1-C20烷基；或R16係C3-C5雜芳基，尤其為噻吩基。 In addition, R 16 is, for example, phenyl or naphthyl, especially phenyl, each of which is unsubstituted or substituted with one or more of the following groups: phenyl, halogen, C 1 -C 4 haloalkyl, OR 17 , SR 18 , NR 19 R 20 or C 1 -C 20 alkyl; or R 16 is C 3 -C 5 heteroaryl, especially thienyl.

R16尤其為(例如)苯基，其未經取代或經一或多個以下基團取代：OR17、SR18、NR19R20或C1-C20烷基，或R16係噻吩基。 R 16 is, for example, phenyl, which is unsubstituted or substituted with one or more of the following groups: OR 17 , SR 18 , NR 19 R 20 or C 1 -C 20 alkyl, or R 16 is thienyl .

較佳地，R16係(例如)苯基或萘基，其各未經取代或經一或多個C1-C20烷基取代。 Preferably, R 16 is, for example, phenyl or naphthyl, each of which is unsubstituted or substituted with one or more C 1 -C 20 alkyl.

R16尤其為苯基，其經一或多個C1-C20烷基取代。 R 16 is especially phenyl, which is substituted with one or more C 1 -C 20 alkyl.

R17係(例如)氫、苯基-C1-C3烷基、C1-C20烷基，其未經取代或經一或多個以下基團取代：鹵素、OH、OCH2CH2(CO)O(C1-C4烷基)、O(CO)-(C1-C4烷基)、O(CO)-(C2-C4)烯基、O(CO)-苯基、(CO)OH、(CO)O(C1-C4烷基)、C3-C20環烷基或間雜有一或多個O之C3-C20環烷基；或R17係C2-C20烷基，其間雜有一或多個O；係(CH2CH2O)n+1H、(GH2CH2O)n(CO)-(C1-C8烷基)、C1-C8烷醯基、C2-C12烯基、C3-C6烯醯基或C3-C20環烷基，其視情況間雜有一或多個O；或R17係苯甲醯基，其未經取代或經一或多個C1-C6烷基、鹵素、OH或C1-C3烷氧基取代；或R17係苯基、萘基或C5-C20雜芳基，其各未經取代或經一或多個以下基團取代：鹵素、OH、C1-C12烷基、C1-C12烷氧基、CN、NO2、苯基-C1-C3烷氧基、苯氧基、C1-C12烷基硫基、苯基硫基、N(C1-C12烷基)2、二苯基-胺基或 R 17 is, for example, hydrogen, phenyl-C 1 -C 3 alkyl, C 1 -C 20 alkyl, which is unsubstituted or substituted with one or more of the following groups: halogen, OH, OCH 2 CH 2 (CO) O (C 1 -C 4 alkyl), O (CO)-(C 1 -C 4 alkyl), O (CO)-(C 2 -C 4 ) alkenyl, O (CO) -benzene group, (CO) OH, (CO ) O (C 1 -C 4 alkyl), C 3 -C 20 cycloalkyl interrupted by one or more O or of C 3 -C 20 cycloalkyl; or R 17 lines C 2 -C 20 alkyl, with one or more O interposed therebetween; (CH 2 CH 2 O) n + 1 H, (GH 2 CH 2 O) n (CO)-(C 1 -C 8 alkyl) , C 1 -C 8 alkyl, C 2 -C 12 alkenyl, C 3 -C 6 alkenyl, or C 3 -C 20 cycloalkyl, optionally mixed with one or more O; or R 17 series Benzamidine, which is unsubstituted or substituted with one or more C 1 -C 6 alkyl, halogen, OH or C 1 -C 3 alkoxy; or R 17 is phenyl, naphthyl or C5-C 20 heteroaryl groups, each unsubstituted or substituted with one or more of the following groups: halogen, OH, C 1 -C 12 alkyl, C 1 -C 12 alkoxy, CN, NO 2 , phenyl- C 1 -C 3 alkoxy, phenoxy, C 1 -C 12 alkylthio, phenylthio, N (C 1 -C 12 alkyl) 2 , diphenyl-amino or

在另一實施例中，R17係(例如)氫、苯基-C1-C3烷基、C1-C20烷基，其未經取代或經一或多個以下基團取代：鹵素、O(CO)-(C1-C4烷基)、O(CO)-(C2-C4烯基)或間雜有一或多個O之C2-C20烷基；或係C1-C8烷醯基、C2-C12烯基、C3-C6烯醯基、間雜有一或多個O之C2-C20烷基、視情況間雜有一或多個O之C3-C20環烷基；或係苯甲醯基，其未經取代或經一或多個以下基團取代：C1-C6烷基、鹵素、OH或C1-C3烷氧基；或係苯基或萘基，其各未經取代或經 一或多個以下基團取代：鹵素、C1-C12烷基或C1-C12烷氧基。 In another embodiment, R 17 is, for example, hydrogen, phenyl-C 1 -C 3 alkyl, C 1 -C 20 alkyl, which is unsubstituted or substituted with one or more of the following groups: halogen , O (CO)-(C 1 -C 4 alkyl), O (CO)-(C 2 -C 4 alkenyl), or C 2 -C 20 alkyl interspersed with one or more O; or C 1 -C 8 alkyl, C 2 -C 12 alkenyl, C 3 -C 6 alkenyl, C 2 -C 20 alkyl interspersed with one or more O, optionally C 3 interspersed with one or more O -C 20 cycloalkyl; or a benzoyl group based, which is unsubstituted or substituted with one or more of the following groups: C 1 -C 6 alkyl, halogen, OH or C 1 -C 3 alkoxy; Or is phenyl or naphthyl, each of which is unsubstituted or substituted with one or more of the following groups: halogen, C 1 -C 12 alkyl, or C 1 -C 12 alkoxy.

R17亦為(例如)氫、苯基-C1-C3烷基、C1-C8烷醯基、C1-C20烷基，其未經取代或經一或多個以下基團取代：鹵素、C3-C20環烷基、O(CO)-(C1-C4烷基)、O(CO)-(C2-C4烯基)或間雜有一或多個O之C2-C20烷基，或R17係C2-C20烷基，其間雜有一或多個O。 R 17 is also, for example, hydrogen, phenyl-C 1 -C 3 alkyl, C 1 -C 8 alkyl, C 1 -C 20 alkyl, which is unsubstituted or via one or more of the following groups Substitution: halogen, C 3 -C 20 cycloalkyl, O (CO)-(C 1 -C 4 alkyl), O (CO)-(C 2 -C 4 alkenyl) or one or more O C 2 -C 20 alkyl, or R 17 is C 2 -C 20 alkyl, with one or more O interposed therebetween.

R17尤其為氫、C1-C8烷醯基、C1-C20烷基，其未經取代或經一或多個以下基團取代：O(CO)-(C1-C4烷基)、O(CO)-(C2-C4烯基)或間雜有一或多個O之C2-C20烷基，或R17係C2-C20烷基，其間雜有一或多個O。 R 17 is especially hydrogen, C 1 -C 8 alkyl, C 1 -C 20 alkyl, which are unsubstituted or substituted with one or more of the following groups: O (CO)-(C 1 -C 4 alkyl ), O (CO)-(C 2 -C 4 alkenyl), or C 2 -C 20 alkyl with one or more O interspersed, or R 17 C 2 -C 20 alkyl with one or more interspersed between A O.

R18係(例如)C3-C20環烷基，其未經間雜或間雜有一或多個O；或R18係C1-C20烷基，其未經取代或經一或多個以下基團取代：OH、O(CO)-(C2-C4)烯基、O(CO)-(C1-C4烷基)或(CO)OR17；或R18係C2-C20烷基，其間雜有一或多個O、S、CO、NR26或COOR17；或R18係C2-C8烷醯基或C3-C6烯醯基、苯甲醯基；或R18係苯基、萘基或C3-C20雜芳基，其各未經取代或經一或多個以下基團取代：鹵素、C1-C12烷基、C1-C4鹵代烷基、C1-C12烷氧基或NO2。 R 18 is, for example, a C 3 -C 20 cycloalkyl group, which is unsaturated or has one or more O; or R 18 is a C 1 -C 20 alkyl group, which is unsubstituted or after one or more Group substitution: OH, O (CO)-(C 2 -C 4 ) alkenyl, O (CO)-(C 1 -C 4 alkyl) or (CO) OR 17 ; or R 18 is C 2 -C 20 alkyl with one or more O, S, CO, NR 26 or COOR 17 interposed therebetween; or R 18 is a C 2 -C 8 alkylfluorenyl or C 3 -C 6 alkenyl, benzamidine; or R 18 is phenyl, naphthyl or C 3 -C 20 heteroaryl, each unsubstituted or substituted with one or more of the following groups: halogen, C 1 -C 12 alkyl, C 1 -C 4 haloalkane Radical, C 1 -C 12 alkoxy or NO 2 .

在另一實施例中，R18係(例如)C3-C20環烷基、C1-C20烷基，其未經取代或經一或多個以下基團取代：OH、O(CO)-(C2-C4)烯基、O(CO)-(C1-C4烷基)或(CO)OR17；或R18係苯基或萘基，其各未經取代或經一或多個鹵素或C1-C12烷基、尤其鹵素取代。 In another embodiment, R 18 is, for example, a C 3 -C 20 cycloalkyl group, a C 1 -C 20 alkyl group, which is unsubstituted or substituted with one or more of the following groups: OH, O (CO )-(C 2 -C 4 ) alkenyl, O (CO)-(C 1 -C 4 alkyl) or (CO) OR 17 ; or R 18 is phenyl or naphthyl, each of which is unsubstituted or One or more halogen or C 1 -C 12 alkyl, especially halogen substitution.

R18係(例如)C1-C20烷基、C2-C12烯基、C3-C20環烷基、苯基-C1-C3烷基、C2-C8烷醯基、苯甲醯基、苯基或萘基。 R 18- based (for example) C 1 -C 20 alkyl, C 2 -C 12 alkenyl, C 3 -C 20 cycloalkyl, phenyl-C 1 -C 3 alkyl, C 2 -C 8 alkyl , Benzamidine, phenyl or naphthyl.

舉例而言，R18係C1-C20烷基，其經一或多個以下基團取代：OH、O(CO)-(C2-C4)烯基、O(CO)-(C1-C4烷基)或(CO)OR17，或R18係苯基，其經一或多個鹵素取代。 For example, R 18 is a C 1 -C 20 alkyl group, which is substituted with one or more of the following groups: OH, O (CO)-(C 2 -C 4 ) alkenyl, O (CO)-(C 1- C 4 alkyl) or (CO) OR 17 , or R 18 is phenyl, which is substituted with one or more halogens.

較佳地，R18係C1-C8烷基，其如上文所定義經取代。 Preferably, R 18 is C 1 -C 8 alkyl, which is substituted as defined above.

舉例而言，R19及R20彼此獨立地為氫、C1-C20烷基、C2-C4羥基烷基、C3-C20環烷基、苯基-C1-C3烷基、苯基或萘基、C1-C8烷醯基、C1-C8烷醯基氧基、C3-C12烯醯基或苯甲醯基；或R19及R20與其所附接之N原子一起形成視情況間雜有O、S或NR17之5員或6員飽和或不飽和環；或R19及R20與其所附接之N原子一起形成雜芳香族環系統，該環系統未經取代或經一或多個以下基團取代：C1-C20烷基、C1-C4鹵代烷基、或 For example, R 19 and R 20 are independently of each other hydrogen, C 1 -C 20 alkyl, C 2 -C 4 hydroxyalkyl, C 3 -C 20 cycloalkyl, phenyl-C 1 -C 3 alkyl Phenyl, or naphthyl, C 1 -C 8 alkylfluorenyl, C 1 -C 8 alkylfluorenyloxy, C 3 -C 12 alkenyl or benzamyl; or R 19 and R 20 the attached N atom form together optionally interrupted with O, S or NR 5, or 6 of 17 membered saturated or unsaturated ring; or R 19 and R 20 appended thereto the N atom to form a heteroaromatic ring system together, The ring system is unsubstituted or substituted with one or more of the following: C 1 -C 20 alkyl, C 1 -C 4 haloalkyl, or

此外，舉例而言，R19及R20彼此獨立地為氫、C1-C20烷基、C2-C4羥基烷基、C3-C20環烷基、苯基-C1-C3烷基、C1-C8烷醯基、C1-C8烷醯基氧基、C3-C12烯醯基或苯甲醯基；或R19及R20與其所附接之N原子一起形成視情況間雜有O或NR17之5員或6員飽和環；或R19及R20與其所附接之N原子一起形成咔唑環。 In addition, for example, R 19 and R 20 are independently of each other hydrogen, C 1 -C 20 alkyl, C 2 -C 4 hydroxyalkyl, C 3 -C 20 cycloalkyl, phenyl-C 1 -C 3 alkyl, C 1 -C 8 alkylfluorenyl, C 1 -C 8 alkylfluorenyloxy, C 3 -C 12 alkenyl or benzamyl; or R 19 and R 20 with the N to which it is attached Atoms together form a 5- or 6-membered saturated ring optionally mixed with O or NR 17 ; or R 19 and R 20 together with the N atom to which they are attached form a carbazole ring.

舉例而言，R19及R20彼此獨立地為氫、C1-C20烷基、C2-C4羥基烷基、C3-C20環烷基、苯基-C1-C3烷基、C1-C8烷醯基、C1-C8烷醯基氧基、C3-C12烯醯基或苯甲醯基；或R19及R20與其所附接之N原子一起形成視情況間雜有O或NR17之5員或6員飽和環。 For example, R 19 and R 20 are independently of each other hydrogen, C 1 -C 20 alkyl, C 2 -C 4 hydroxyalkyl, C 3 -C 20 cycloalkyl, phenyl-C 1 -C 3 alkyl , C 1 -C 8 alkylfluorenyl, C 1 -C 8 alkylfluorenyloxy, C 3 -C 12 alkenyl or benzamyl; or R 19 and R 20 together with the N atom to which they are attached A 5 or 6 member saturated ring with O or NR 17 interspersed as appropriate.

較佳地，R19及R20彼此獨立地為C1-C8烷醯基、C1-C8烷醯基氧基；或R19及R20與其所附接之N原子一起形成嗎啉環。 Preferably, R 19 and R 20 are independently of each other C 1 -C 8 alkylfluorenyl, C 1 -C 8 alkylfluorenyloxy; or R 19 and R 20 together with the N atom to which they are attached form a morpholine ring.

舉例而言，R21及R22彼此獨立地為氫、C1-C20烷基、C1-C4鹵代烷基、C3-C10環烷基或苯基；或R21及R22與其所附接之N原子一起形成嗎啉環。R21及R22尤其彼此獨立地為氫或C1-C20烷基。 For example, R 21 and R 22 are independently of each other hydrogen, C 1 -C 20 alkyl, C 1 -C 4 haloalkyl, C 3 -C 10 cycloalkyl or phenyl; or R 21 and R 22 and The attached N atoms together form a morpholine ring. R 21 and R 22 are, independently of one another, hydrogen or C 1 -C 20 alkyl.

R23係(例如)氫、OH、苯基或C1-C20烷基。R23尤其為氫、OH或C1-C4烷基。 R 23 is, for example, hydrogen, OH, phenyl or C 1 -C 20 alkyl. R 23 is especially hydrogen, OH or C 1 -C 4 alkyl.

R24之較佳者係如針對R19及R20所給出。R25之較佳者係如針對R17所給出。 The better of R 24 is as given for R 19 and R 20 . The better of R 25 is as given for R 17 .

R26係(例如)氫、C1-C20烷基、C1-C4鹵代烷基、C2-C20烷基，其間雜有一或多個O或CO；或係苯基-C1-C4烷基、C3-C8環烷基，其視情況間雜有一或多個O或CO；或係(CO)R19或苯基，其未經取代或經一或多個以下基團取代：C1-C20烷基、鹵素、C1-C4鹵代烷基、OR17、SR18、NR19R20。 R 26 is, for example, hydrogen, C 1 -C 20 alkyl, C 1 -C 4 haloalkyl, C 2 -C 20 alkyl, interposed with one or more O or CO; or phenyl-C 1- C 4 alkyl, C 3 -C 8 cycloalkyl, optionally mixed with one or more O or CO; or (CO) R 19 or phenyl, unsubstituted or through one or more of the following groups Substitution: C 1 -C 20 alkyl, halogen, C 1 -C 4 haloalkyl, OR 17 , SR 18 , NR 19 R 20 .

或R26表示(例如)氫、C1-C20烷基、C1-C4鹵代烷基；係苯基-C1-C4烷基、C3-C8環烷基、(CO)R19或苯基，其未經取代或經一或多個C1-C20烷基取代。此外，R26係(例如)氫或C1-C20烷基、尤其為C1-C4烷基。 Or R 26 is (e.g.) hydrogen, C 1 -C 20 alkyl, C 1 -C 4 haloalkyl; phenyl-based -C 1 -C 4 alkyl, C 3 -C 8 cycloalkyl, (CO) R 19 or phenyl, which is unsubstituted or substituted with one or more C 1 -C 20 alkyl. Furthermore, R 26 is, for example, hydrogen or C 1 -C 20 alkyl, especially C 1 -C 4 alkyl.

本發明該具有式(C-I)所示結構之光起始劑(C-1)之實例如下式(I-1)至式(I-86)所示。 Examples of the photoinitiator (C-1) having the structure represented by the formula (C-I) in the present invention are represented by the following formulae (I-1) to (I-86).

該具有式(C-I)所示結構之光起始劑(C-1)用於使包含至少一種烯系不飽和光可聚合化合物之組合物光聚合之用途。 The use of the photoinitiator (C-1) having a structure represented by the formula (C-I) for photopolymerizing a composition containing at least one ethylenically unsaturated photopolymerizable compound.

基於該鹼可溶性樹脂(A)之使用量為100重量份，該第 一光起始劑(C-1)之使用量為0.3重量份至30重量份，較佳為0.4重量份至20重量份，更佳為0.5重量份至10重量份。 Based on the used amount of the alkali-soluble resin (A) being 100 parts by weight, the first The use amount of the one-light starter (C-1) is 0.3 to 30 parts by weight, preferably 0.4 to 20 parts by weight, and more preferably 0.5 to 10 parts by weight.

當該具有式(C-I)所示結構之光起始劑(C-1)之使用量介於上述範圍時，則由此黑色感光性樹脂組成物所製得之黑色圖案其介電常數和高精細度圖案的直線性較佳。 When the amount of the photo-initiator (C-1) having the structure represented by the formula (CI) is within the above range, the black pattern prepared from the black photosensitive resin composition has a high dielectric constant and The fineness pattern has better linearity.

若本發明之黑色感光性樹脂組成物不包含該第一光起始劑(C-1)，則由此黑色感光性樹脂組成物所製得之黑色圖案具有介電常數和高精細度圖案的直線性不佳之缺陷。 If the black photosensitive resin composition of the present invention does not contain the first photoinitiator (C-1), the black pattern produced from the black photosensitive resin composition has a dielectric constant and a high-definition pattern. Defects with poor linearity.

本發明之黑色感光性樹脂組成物可選擇性添加第二光起始劑(C-2)。本發明之第二光起始劑(C-2)具有如下式(C-II)所示之結構： 於式(C-II)中，E27係獨立地選自於氫原子、碳數為1至12的烷基、碳數為1至12的烷氧基或鹵素原子。 In the black photosensitive resin composition of the present invention, a second photoinitiator (C-2) can be optionally added. The second photoinitiator (C-2) of the present invention has a structure represented by the following formula (C-II): In the formula (C-II), E 27 is independently selected from a hydrogen atom, an alkyl group having 1 to 12 carbon atoms, an alkoxy group having 1 to 12 carbon atoms, or a halogen atom.

較佳地，第二光起始劑(C-2)可為1-氯-4-丙氧基噻噸酮(1-chloro-4-proxythioxanthone；CPTX)或異丙基噻噸酮(Isopropylthioxanthone；ITX)。 Preferably, the second photoinitiator (C-2) may be 1-chloro-4-propoxythioxanthone (CPTX) or isopropylthioxanthone; ITX).

異丙基噻噸酮為相對較便宜的光起始劑。而其他適用於本發明之黑色感光性樹脂組成物的第二光起始劑(C-2)可包含但不限於噻噸酮、2,4-二乙基噻噸酮(或稱2,4-二乙基-9H-噻唑-9-酮)、2-第 三丁基噻噸酮、2-氯噻噸酮或2-丙氧基噻噸酮等。 Isopropylthioxanthone is a relatively cheap photoinitiator. The other second photoinitiator (C-2) suitable for the black photosensitive resin composition of the present invention may include, but is not limited to, thioxanthone, 2,4-diethylthioxanthone (or 2,4 -Diethyl-9H-thiazole-9-one), Tributylthioxanthone, 2-chlorothioxanthone or 2-propoxythioxanthone, etc.

基於鹼可溶性樹脂(A)之使用量為100重量份，該第二光起始劑(C-2)之使用量為0.2重量份至2重量份，較佳為0.25重量份至1.5重量份，且更佳為0.3重量份至1重量份。 Based on the used amount of the alkali-soluble resin (A) being 100 parts by weight, the used amount of the second photoinitiator (C-2) is 0.2 to 2 parts by weight, preferably 0.25 to 1.5 parts by weight, And more preferably 0.3 to 1 part by weight.

當本發明之黑色感光性樹脂組成物含有該第二光起始劑(C-2)時，則由此黑色感光性樹脂組成物所製得之黑色圖案其高精細度圖案的直線性更佳。 When the black photosensitive resin composition of the present invention contains the second photoinitiator (C-2), the black pattern produced from the black photosensitive resin composition has better linearity of the high-definition pattern. .

本發明之黑色感光性樹脂組成物另可選擇性添加其他光起始劑(C-3)。 The black photosensitive resin composition of the present invention may optionally include other photoinitiators (C-3).

該其他光起始劑(C-3)之具體例可包含第一光起始劑(C-1)以外之O-醯基肟化合物、三氮雜苯化合物、苯乙烷酮化合物、二咪唑化合物、二苯甲酮化合物、α-二酮化合物、酮醇化合物、酮醇醚化合物、醯膦氧化物、酮類化合物、含鹵素化合物、過氧化物或上述化合物之任意組合。 Specific examples of the other photoinitiator (C-3) may include O-fluorenyl oxime compounds, triazabenzene compounds, acetophenone compounds, and diimidazoles other than the first photoinitiator (C-1). A compound, a benzophenone compound, an α -diketone compound, a keto alcohol compound, a ketol ether compound, a phosphonium oxide, a ketone compound, a halogen-containing compound, a peroxide, or any combination thereof.

上述第一光起始劑(C-1)以外之O-醯基肟化合物之具體例可包含1-[4-(苯基硫代)苯基]-庚烷-1,2-二酮2-(O-苯醯基肟)、1-[4-(苯基硫代)苯基]-辛烷-1,2-二酮-2-(O-苯醯基肟)、1-[4-(苯醯基)苯基]-庚烷-1,2-二酮-2-(O-苯醯基肟)、1-[9-乙基-6-(2-甲基苯甲醯基)-9H-咔唑-3-取代基]-乙烷酮-1-(O-乙醯基肟)、1-[9-乙基-6-(3-甲基苯醯基)-9H-咔唑-3-取代基]-乙烷酮-1-(O-乙醯基肟)、1-(9-乙基-6-苯醯基-9H-咔唑-3-取代基)-乙烷酮-1-(O-乙醯基肟)、乙烷酮-1-[9-乙基-6-(2-甲基-4-四氫呋喃基苯醯基)-9H-咔唑-3-取代基]-1-(O-乙醯基肟)、乙烷酮-1-[9-乙基-6-(2-甲基-5-四氫吡喃基苯醯基)-9H-咔唑-3-取代基]-1-(O-乙醯基肟)、乙烷酮-1-[9-乙基-6-(2-甲基-5-四氫呋喃基苯醯基)-9H-咔唑-3-取代基]-1-(O-乙醯基肟)、乙烷酮-1-[9-乙基-6-(2-甲基-5-四氫吡喃基苯醯基)-9H-咔唑-3-取代基]-1-(O-乙醯基肟)、乙烷酮-1-[9-乙基-6- (2-甲基-4-四氫呋喃基甲氧基苯醯基)-9H-咔唑-3-取代基]-1-(O-乙醯基肟)、乙烷酮-1-[9-乙基-6-(2-甲基-4-四氫吡喃基甲氧基苯醯基)-9H-咔唑-3-取代基]-1-(O-乙醯基肟)、乙烷酮-1-[9-乙基-6-(2-甲基-5-四氫呋喃基甲氧基苯醯基)-9H-咔唑-3-取代基]-1-(O-乙醯基肟)、乙烷酮-1-[9-乙基-6-(2-甲基-5-四氫吡喃基甲氧基苯醯基)-9H-咔唑-3-取代基]-1-(O-乙醯基肟)、乙烷酮-1-{9-乙基-6-[2-甲基-4-(2,2-二甲基-1,3-二氧雜戊環基)苯醯基]-9H-咔唑-3-取代基}-1-(O-乙醯基肟)、乙烷酮-1-{9-乙基-6-[2-甲基-4-(2,2-二甲基-1,3-二氧雜戊環基)甲氧基苯醯基]-9H-咔唑-3-取代基}-1-(O-乙醯基肟)等之化合物，或者上述化合物之任意組合。 Specific examples of the O-fluorenyl oxime compound other than the first photoinitiator (C-1) may include 1- [4- (phenylthio) phenyl] -heptane-1,2-dione 2 -(O-phenylphosphonium oxime), 1- [4- (phenylthio) phenyl] -octane-1,2-dione-2- (O-phenylphosphonium oxime), 1- [4 -(Phenylbenzyl) phenyl] -heptane-1,2-dione-2- (O-phenylfluorenyloxime), 1- [9-ethyl-6- (2-methylbenzylfluorenyl) ) -9H-carbazole-3-substituent] -ethanone-1- (O-acetamidooxime), 1- [9-ethyl-6- (3-methylphenylfluorenyl) -9H- Carbazole-3-substituent] -ethanone-1- (O-ethylamidoxime), 1- (9-ethyl-6-phenylamidino-9H-carbazole-3-substituent) -ethyl Alkanone-1- (O-acetamidooxime), ethylone-1- [9-ethyl-6- (2-methyl-4-tetrahydrofurylphenylfluorenyl) -9H-carbazole-3- Substituents] -1- (O-ethylamidoxime), acetone-1- [9-ethyl-6- (2-methyl-5-tetrahydropyranylphenylfluorenyl) -9H-carb Azole-3-substituent] -1- (O-ethylamidoxime), acetone-1- [9-ethyl-6- (2-methyl-5-tetrahydrofurylphenylfluorenyl) -9H- Carbazole-3-substituent] -1- (O-ethylammonium oxime), acetone-1- [9-ethyl-6- (2-methyl-5-tetrahydropyranylphenylfluorenyl) ) -9H-carbazole-3-substituent] -1- (O-acetylamoxime), acetone-1- [9-ethyl-6- (2-methyl-4-tetrahydrofurylmethoxyphenylfluorenyl) -9H-carbazole-3-substituent] -1- (O-ethylfluorenyloxime), acetone-1- [9-ethyl -6- (2-methyl-4-tetrahydropyranylmethoxyphenylfluorenyl) -9H-carbazole-3-substituent] -1- (O-ethylfluorenyloxime), acetone -1- [9-ethyl-6- (2-methyl-5-tetrahydrofurylmethoxyphenylfluorenyl) -9H-carbazole-3-substituent] -1- (O-ethanyloxime) , Acetone-1- [9-ethyl-6- (2-methyl-5-tetrahydropyranylmethoxyphenylfluorenyl) -9H-carbazole-3-substituent] -1- ( O-acetylamoxime), acetone-1- {9-ethyl-6- [2-methyl-4- (2,2-dimethyl-1,3-dioxolane) Phenylfluorenyl] -9H-carbazole-3-substituent} -1- (O-ethylfluorenyloxime), acetone-1- {9-ethyl-6- [2-methyl-4- ( 2,2-dimethyl-1,3-dioxapentyl) methoxyphenylfluorenyl] -9H-carbazole-3-substituent} -1- (O-ethylfluorenyl oxime) and the like Compound, or any combination of the above.

較佳地，該第一光起始劑(C-1)以外之O-醯基肟化合物可為1-[4-(苯基硫代)苯基]-辛烷-1,2-二酮-2-(O-苯醯基肟)，其可為汽巴精化有限公司製造之商品，且型號為OXE-01；1-[9-乙基-6-(2-甲基苯甲醯基)-9H-咔唑-3-取代基]-乙烷酮-1-(O-乙醯基肟)，其可為汽巴精化有限公司製造之商品，且型號為OXE-02；乙烷酮-1-[9-乙基-6-(2-甲基-4-四氫呋喃甲氧基苯醯基)-9H-咔唑-3-取代基]-1-(O-乙醯基肟)；乙烷酮-1-{9-乙基-6-[2-甲基-4-(2,2-二甲基-1,3-二氧雜戊環基)甲氧基苯醯基]-9H-咔唑-3-取代基}-1-(O-乙醯基肟)或上述化合物之任意組合。該O-醯基肟化合物可單獨一種或混合複數種使用。 Preferably, the O-fluorenyl oxime compound other than the first photoinitiator (C-1) may be 1- [4- (phenylthio) phenyl] -octane-1,2-dione -2- (O-Benzamyl oxime), which can be a product manufactured by Ciba Refining Co., Ltd., and the model is OXE-01; 1- [9-ethyl-6- (2-methylbenzidine ) -9H-carbazole-3-substituent] -ethanone-1- (O-acetylamoxime), which can be a product manufactured by Ciba Refining Co., Ltd., and the model number is OXE-02; Alkanone-1- [9-ethyl-6- (2-methyl-4-tetrahydrofuranmethoxyphenylfluorenyl) -9H-carbazole-3-substituent] -1- (O-ethanyloxime ); Ethyl ketone-1- {9-ethyl-6- [2-methyl-4- (2,2-dimethyl-1,3-dioxapentyl) methoxyphenylfluorenyl ] -9H-carbazole-3-substituent} -1- (O-acetamidooxime) or any combination thereof. These O-fluorenyl oxime compounds may be used alone or in combination.

上述三氮雜苯化合物之具體例可包含但不限於乙烯基-鹵代甲基-s-三氮雜苯化合物、2-(萘并-1-取代基)-4,6-雙-鹵代甲基-s-三氮雜苯化合物、4-(對-胺基苯基)-2,6-二-鹵代甲基-s-三氮雜苯化合物等之化合物，或者上述化合物之任意組合。 Specific examples of the above-mentioned triazabenzene compound may include, but are not limited to, vinyl-halomethyl-s-triazabenzene compound, 2- (naphtho-1-substituted) -4,6-bis-halo Methyl-s-triazabenzene compound, 4- (p-aminophenyl) -2,6-di-halomethyl-s-triazabenzene compound, etc., or any combination thereof .

前述乙烯基-鹵代甲基-s-三氮雜苯化合物之具體例可包含2,4-雙(三氯甲基)-6-對-甲氧基苯乙烯基-s-三氮雜苯、2,4-雙(三氯甲基)-3-(1-對-二甲基胺基苯基-1,3-丁二烯基)-s-三氮雜苯或2-三氯甲基- 3-胺基-6-對-甲氧基苯乙烯基-s-三氮雜苯等之化合物，或者上述化合物之任意組合。 Specific examples of the vinyl-halomethyl-s-triazabenzene compound may include 2,4-bis (trichloromethyl) -6-p-methoxystyryl-s-triazabenzene , 2,4-bis (trichloromethyl) -3- (1-p-dimethylaminophenyl-1,3-butadienyl) -s-triazabenzene or 2-trichloromethyl base- Compounds such as 3-amino-6-p-methoxystyryl-s-triazabenzene, or any combination thereof.

前述2-(萘并-1-取代基)-4,6-雙-鹵代甲基-s-三氮雜苯化合物之具體例可包含2-(萘并-1-取代基)-4,6-雙-三氯甲基-s-三氮雜苯、2-(4-甲氧基-萘并-1-取代基)-4,6-雙-三氯甲基-s-三氮雜苯、2-(4-乙氧基-萘并-1-取代基)-4,6-雙-三氯甲基-s-三氮雜苯、2-(4-丁氧基-萘并-1-取代基)-4,6-雙-三氯甲基-s-三氮雜苯、2-[4-(2-甲氧基乙基)-萘并-1-取代基]-4,6-雙-三氯甲基-s-三氮雜苯、2-[4-(2-乙氧基乙基)-萘并-1-取代基]-4,6-雙-三氯甲基-s-三氮雜苯、2-[4-(2-丁氧基乙基)-萘并-1-取代基]-4,6-雙-三氯甲基-s-三氮雜苯、2-(2-甲氧基-萘并-1-取代基)-4,6-雙-三氯甲基-s-三氮雜苯、2-(6-甲氧基-5-甲基-萘并-2-取代基)-4,6-雙-三氯甲基-s-三氮雜苯、2-(6-甲氧基-萘并-2-取代基)-4,6-雙-三氯甲基-s-三氮雜苯、2-(5-甲氧基-萘并-1-取代基)-4,6-雙-三氯甲基-s-三氮雜苯、2-(4,7-二甲氧基-萘并-1-取代基)-4,6-雙-三氯甲基-s-三氮雜苯、2-(6-乙氧基-萘并-2-取代基)-4,6-雙-三氯甲基-s-三氮雜苯或2-(4,5-二甲氧基-萘并-1-取代基)-4,6-雙-三氯甲基-s-三氮雜苯等之化合物，或者上述化合物之任意組合。 Specific examples of the aforementioned 2- (naphtho-1-substituted) -4,6-bis-halomethyl-s-triazabenzene compound may include 2- (naphtho-1-substituted) -4, 6-bis-trichloromethyl-s-triazabenzene, 2- (4-methoxy-naphtho-1-substituted) -4,6-bis-trichloromethyl-s-triaza Benzene, 2- (4-ethoxy-naphtho-1-substituted) -4,6-bis-trichloromethyl-s-triazabenzene, 2- (4-butoxy-naphtho- 1-substituent) -4,6-bis-trichloromethyl-s-triazabenzene, 2- [4- (2-methoxyethyl) -naphtho-1-substituent] -4, 6-bis-trichloromethyl-s-triazabenzene, 2- [4- (2-ethoxyethyl) -naphtho-1-substituent] -4,6-bis-trichloromethyl -s-triazabenzene, 2- [4- (2-butoxyethyl) -naphtho-1-substituent] -4,6-bis-trichloromethyl-s-triazabenzene, 2- (2-methoxy-naphtho-1-substituted) -4,6-bis-trichloromethyl-s-triazabenzene, 2- (6-methoxy-5-methyl- Naphtho-2-substituted) -4,6-bis-trichloromethyl-s-triazabenzene, 2- (6-methoxy-naphtho-2-substituted) -4,6-bis -Trichloromethyl-s-triazabenzene, 2- (5-methoxy-naphtho-1-substituted) -4,6-bis-trichloromethyl-s-triazabenzene, 2 -(4,7-dimethoxy-naphtho-1-substituted) -4,6-bis-trichloromethyl-s-triazabenzene 2- (6-ethoxy-naphtho-2-substituted) -4,6-bis-trichloromethyl-s-triazabenzene or 2- (4,5-dimethoxy-naphtho -1-Substituent) -4,6-bis-trichloromethyl-s-triazabenzene, or any combination thereof.

前述4-(對-胺基苯基)-2,6-二-鹵代甲基-s-三氮雜苯化合物之具體例可包含4-[對-N,N-二(乙氧基羰基甲基)胺基苯基]-2,6-二(三氯甲基)-s-三氮雜苯、4-[鄰-甲基-對-N,N-二(乙氧基羰基甲基)胺基苯基]-2,6-二(三氯甲基)-s-三氮雜苯、4-[對-N,N-二(氯乙基)胺基苯基]-2,6-二(三氯甲基)-s-三氮雜苯、4-[鄰-甲基-對-N,N-二(氯乙基)胺基苯基]-2,6-二(三氯甲基)-s-三氮雜苯、4-(對-N-氯乙基胺基苯基)-2,6-二(三氯甲基)-s-三氮雜苯、4-(對-N-乙氧基羰基甲基胺基苯基)-2,6-二(三氯甲基)-s-三氮雜苯、4-[對-N,N-二(苯基)胺基苯基]-2,6-二(三氯甲基)-s-三氮雜苯、4-(對-N-氯乙基羰基胺基苯基)-2,6-二(三氯甲基)-s- 三氮雜苯、4-[對-N-(對-甲氧基苯基)羰基胺基苯基]-2,6-二(三氯甲基)-s-三氮雜苯、4-[間-N,N-二(乙氧基羰基甲基)胺基苯基]-2,6-二(三氯甲基)-s-三氮雜苯、4-[間-溴-對-N,N-二(乙氧基羰基甲基)胺基苯基]-2,6-二(三氯甲基)-s-三氮雜苯、4-[間-氯-對-N,N-二(乙氧基羰基甲基)胺基苯基]-2,6-二(三氯甲基)-s-三氮雜苯、4-[間-氟-對-N,N-二(乙氧基羰基甲基)胺基苯基]-2,6-二(三氯甲基)-s-三氮雜苯、4-[鄰-溴-對-N,N-二(乙氧基羰基甲基)胺基苯基]-2,6-二(三氯甲基)-s-三氮雜苯、4-[鄰-氯-對-N,N-二(乙氧基羰基甲基)胺基苯基]-2,6-二(三氯甲基)-s-三氮雜苯、4-[鄰-氟-對-N,N-二(乙氧基羰基甲基)胺基苯基]-2,6-二(三氯甲基)-s-三氮雜苯、4-[鄰-溴-對-N,N-二(氯乙基)胺基苯基]-2,6-二(三氯甲基)-s-三氮雜苯、4-[鄰-氯-對-N,N-二(氯乙基)胺基苯基]-2,6-二(三氯甲基)-s-三氮雜苯、4-[鄰-氟-對-N,N-二(氯乙基)胺基苯基]-2,6-二(三氯甲基)-s-三氮雜苯、4-[間-溴-對-N,N-二(氯乙基)胺基苯基]-2,6-二(三氯甲基)-s-三氮雜苯、4-[間-氯-對-N,N-二(氯乙基)胺基苯基]-2,6-二(三氯甲基)-s-三氮雜苯、4-[間-氟-對-N,N-二(氯乙基)胺基苯基]-2,6-二(三氯甲基)-s-三氮雜苯、4-(間-溴-對-N-乙氧基羰基甲基胺基苯基)-2,6-二(三氯甲基)-s-三氮雜苯、4-(間-氯-對-N-乙氧基羰基甲基胺基苯基)-2,6-二(三氯甲基)-s-三氮雜苯、4-(間-氟-對-N-乙氧基羰基甲基胺基苯基)-2,6-二(三氯甲基)-s-三氮雜苯、4-(鄰-溴-對-N-乙氧基羰基甲基胺基苯基)-2,6-二(三氯甲基)-s-三氮雜苯、4-(鄰-氯-對-N-乙氧基羰基甲基胺基苯基)-2,6-二(三氯甲基)-s-三氮雜苯、4-(鄰-氟-對-N-乙氧基羰基甲基胺基苯基)-2,6-二(三氯甲基)-s-三氮雜苯、4-(間-溴-對-N-氯乙基胺基苯基)-2,6-二(三氯甲基)-s-三氮雜苯、4-(間-氯-對-N-氯乙基胺基苯基)-2,6-二(三氯甲基)-s-三氮雜苯、4-(間-氟-對-N-氯乙基胺基苯基)-2,6-二(三氯甲基)-s-三氮雜苯、4-(鄰-溴-對-N-氯乙基胺基苯基)-2,6-二(三氯甲基)-s-三氮雜苯、4-(鄰-氯-對-N-氯乙基胺基 苯基)-2,6-二(三氯甲基)-s-三氮雜苯、4-(鄰-氟-對-N-氯乙基胺基苯基)-2,6-二(三氯甲基)-s-三氮雜苯或2,4-雙(三氯甲基)-6-{3-溴-4-[N,N-雙(乙氧基羰基甲基)胺基]苯基}-1,3,5-三氮雜苯等之化合物，或者上述化合物之任意組合。 Specific examples of the aforementioned 4- (p-aminophenyl) -2,6-di-halomethyl-s-triazabenzene compound may include 4- [p-N, N-bis (ethoxycarbonyl) (Methyl) aminophenyl] -2,6-bis (trichloromethyl) -s-triazabenzene, 4- [o-methyl-p-N, N-bis (ethoxycarbonylmethyl) ) Aminophenyl] -2,6-bis (trichloromethyl) -s-triazabenzene, 4- [p-N, N-bis (chloroethyl) aminophenyl] -2,6 -Bis (trichloromethyl) -s-triazabenzene, 4- [o-methyl-p-N, N-bis (chloroethyl) aminophenyl] -2,6-bis (trichloro (Methyl) -s-triazabenzene, 4- (p-N-chloroethylaminophenyl) -2,6-bis (trichloromethyl) -s-triazabenzene, 4- (p- -N-ethoxycarbonylmethylaminophenyl) -2,6-bis (trichloromethyl) -s-triazabenzene, 4- [p-N, N-bis (phenyl) amino Phenyl] -2,6-bis (trichloromethyl) -s-triazabenzene, 4- (p-N-chloroethylcarbonylaminophenyl) -2,6-bis (trichloromethyl) ) -s- Triazabenzene, 4- [p-N- (p-methoxyphenyl) carbonylaminophenyl] -2,6-bis (trichloromethyl) -s-triazabenzene, 4- [ M-N, N-bis (ethoxycarbonylmethyl) aminophenyl] -2,6-bis (trichloromethyl) -s-triazabenzene, 4- [m-bromo-p-N , N-bis (ethoxycarbonylmethyl) aminophenyl] -2,6-bis (trichloromethyl) -s-triazabenzene, 4- [m-chloro-p-N, N- Bis (ethoxycarbonylmethyl) aminophenyl] -2,6-bis (trichloromethyl) -s-triazabenzene, 4- [m-fluoro-p-N, N-bis (ethyl Oxycarbonylmethyl) aminophenyl] -2,6-bis (trichloromethyl) -s-triazabenzene, 4- [o-bromo-p-N, N-bis (ethoxycarbonyl) (Methyl) aminophenyl] -2,6-bis (trichloromethyl) -s-triazabenzene, 4- [o-chloro-p-N, N-bis (ethoxycarbonylmethyl) Aminophenyl] -2,6-bis (trichloromethyl) -s-triazabenzene, 4- [o-fluoro-p-N, N-bis (ethoxycarbonylmethyl) aminobenzene Group] -2,6-bis (trichloromethyl) -s-triazabenzene, 4- [o-bromo-p-N, N-bis (chloroethyl) aminophenyl] -2,6 -Bis (trichloromethyl) -s-triazabenzene, 4- [o-chloro-p-N, N-bis (chloroethyl) aminophenyl] -2,6-bis (trichloromethyl) ) -S-triazabenzene, 4- [o-fluoro-p-N, N-bis (chloroethyl) aminophenyl] -2,6-bis (trichloromethyl) -s-triazabenzene, 4- [m-bromo-p-N, N-bis (chloroethyl) aminophenyl] -2,6-di (Trichloromethyl) -s-triazabenzene, 4- [m-chloro-p-N, N-bis (chloroethyl) aminophenyl] -2,6-bis (trichloromethyl) -s-triazabenzene, 4- [m-fluoro-p-N, N-bis (chloroethyl) aminophenyl] -2,6-bis (trichloromethyl) -s-triaza Benzene, 4- (m-bromo-p-N-ethoxycarbonylmethylaminophenyl) -2,6-bis (trichloromethyl) -s-triazabenzene, 4- (m-chloro -P-N-ethoxycarbonylmethylaminophenyl) -2,6-bis (trichloromethyl) -s-triazabenzene, 4- (m-fluoro-p-N-ethoxy (Carbonylmethylaminophenyl) -2,6-bis (trichloromethyl) -s-triazabenzene, 4- (o-bromo-p-N-ethoxycarbonylmethylaminophenyl) -2,6-bis (trichloromethyl) -s-triazabenzene, 4- (o-chloro-p-N-ethoxycarbonylmethylaminophenyl) -2,6-bis (tri (Chloromethyl) -s-triazabenzene, 4- (o-fluoro-p-N-ethoxycarbonylmethylaminophenyl) -2,6-bis (trichloromethyl) -s-tri Azabenzene, 4- (m-bromo-p-N-chloroethylaminophenyl) -2,6-bis (trichloromethyl) -s-triazabenzene, 4- (m-chloro- P-N-chloroethylaminophenyl) -2,6-bis (trichloromethyl) -s-triazabenzene 4- (m-fluoro-p-N-chloroethylaminophenyl) -2,6-bis (trichloromethyl) -s-triazabenzene, 4- (o-bromo-p-N- (Chloroethylaminophenyl) -2,6-bis (trichloromethyl) -s-triazabenzene, 4- (o-chloro-p-N-chloroethylamino) Phenyl) -2,6-bis (trichloromethyl) -s-triazabenzene, 4- (o-fluoro-p-N-chloroethylaminophenyl) -2,6-bis (tri (Chloromethyl) -s-triazabenzene or 2,4-bis (trichloromethyl) -6- {3-bromo-4- [N, N-bis (ethoxycarbonylmethyl) amino] Phenyl} -1,3,5-triazabenzene and the like, or any combination thereof.

上述三氮雜苯化合物較佳可為4-[間-溴-對-N,N-二(乙氧基羰基甲基)胺基苯基]-2,6-二(三氯甲基)-s-三氮雜苯、2,4-雙(三氯甲基)-6-對-甲氧基苯乙烯基-s-三氮雜苯或上述化合物之組合。該三氮雜苯化合物可單獨一種或混合複數種使用。 The above triazabenzene compound is preferably 4- [m-bromo-p-N, N-bis (ethoxycarbonylmethyl) aminophenyl] -2,6-bis (trichloromethyl)- s-triazabenzene, 2,4-bis (trichloromethyl) -6-p-methoxystyryl-s-triazabenzene or a combination thereof. These triazabenzene compounds may be used alone or in combination.

上述苯乙烷酮化合物之具體例可包含對二甲胺苯乙烷酮、α,α’-二甲氧基氧化偶氮苯乙烷酮、2,2’-二甲基-2-苯基苯乙烷酮、對-甲氧基苯乙烷酮、2-苄基-2-N,N-二甲胺-1-(4-嗎啉代苯基)-1-丁酮或2-甲基-1-[4-(甲硫基)苯基]-2-(4-嗎啉代)-1-丙酮等之化合物，或者上述化合物之任意組合。該苯乙烷酮化合物較佳可為2-甲基-1-[4-(甲硫基)苯基]-2-(4-嗎啉代)-1-丙酮、2-苄基-2-N,N-二甲胺-1-(4-嗎啉代苯基)-1-丁酮。上述之苯乙烷酮化合物可單獨一種或混合複數種使用。 Specific examples of the acetophenone compound may include p-dimethylamine acetophenone, α , α' -dimethoxyoxy azoacetophenone, 2,2'-dimethyl-2-phenyl Acetophenone, p-methoxyacetophenone, 2-benzyl-2-N, N-dimethylamine-1- (4-morpholinophenyl) -1-butanone or 2-methyl Compounds such as -1- [4- (methylthio) phenyl] -2- (4-morpholino) -1-acetone, or any combination thereof. The acetophenone compound may preferably be 2-methyl-1- [4- (methylthio) phenyl] -2- (4-morpholino) -1-acetone, 2-benzyl-2- N, N-dimethylamine-1- (4-morpholinophenyl) -1-butanone. These acetophenone compounds may be used alone or in combination.

上述二咪唑化合物之具體例可包含2,2’-雙(鄰-氯苯基)-4,4’,5,5’-四苯基二咪唑、2,2’-雙(鄰-氟苯基)-4,4’,5,5’-四苯基二咪唑、2,2’-雙(鄰-甲基苯基)-4,4’,5,5’-四苯基二咪唑、2,2’-雙(鄰-甲氧基苯基)-4,4’,5,5’-四苯基二咪唑、2,2’-雙(鄰-乙基苯基)-4,4’,5,5’-四苯基二咪唑、2,2’-雙(對-甲氧基苯基)-4,4’,5,5’-四苯基二咪唑、2,2’-雙(2,2’,4,4’-四甲氧基苯基)-4,4’,5,5’-四苯基二咪唑、2,2’-雙(2-氯苯基)-4,4’,5,5’-四苯基二咪唑或2,2’-雙(2,4-二氯苯基)-4,4’,5,5’-四苯基二咪唑等之化合物，或者上述化合物之任意組合。上述二咪唑化合物可單獨一種或混合複數種使用。該二咪唑化合物較佳可為2,2’-雙(2,4-二氯苯基)-4,4’,5,5’-四苯基二咪唑。 Specific examples of the above diimidazole compound may include 2,2'-bis (o-chlorophenyl) -4,4 ', 5,5'-tetraphenyldiimidazole, 2,2'-bis (o-fluorobenzene) ) -4,4 ', 5,5'-tetraphenyldiimidazole, 2,2'-bis (o-methylphenyl) -4,4', 5,5'-tetraphenyldiimidazole, 2,2'-bis (o-methoxyphenyl) -4,4 ', 5,5'-tetraphenyldiimidazole, 2,2'-bis (o-ethylphenyl) -4,4 ', 5,5'-Tetraphenyldiimidazole, 2,2'-bis (p-methoxyphenyl) -4,4', 5,5'-tetraphenyldiimidazole, 2,2'- Bis (2,2 ', 4,4'-tetramethoxyphenyl) -4,4', 5,5'-tetraphenyldiimidazole, 2,2'-bis (2-chlorophenyl)- 4,4 ', 5,5'-tetraphenyldiimidazole or 2,2'-bis (2,4-dichlorophenyl) -4,4', 5,5'-tetraphenyldiimidazole, etc. Compound, or any combination of the above. These diimidazole compounds may be used alone or in combination. The diimidazole compound may preferably be 2,2'-bis (2,4-dichlorophenyl) -4,4 ', 5,5'-tetraphenyldiimidazole.

上述二苯甲酮化合物之具體例可包含二苯甲酮、4,4’-雙(二甲胺)二苯甲酮或4,4’-雙(二乙胺)二苯甲酮等之化合物，或者上述化合物之任意組合。該二苯甲酮化合物可單獨一種或混合複數種使用。該二苯甲酮化合物較佳可為4,4’-雙(二乙胺)二苯甲酮。 Specific examples of the benzophenone compound may include compounds such as benzophenone, 4,4'-bis (dimethylamine) benzophenone or 4,4'-bis (diethylamine) benzophenone. Or any combination of the above compounds. These benzophenone compounds may be used alone or in combination. The benzophenone compound is preferably 4,4'-bis (diethylamine) benzophenone.

上述α-二酮化合物之具體例可包含苯偶醯或乙醯基等。 Specific examples of the α -diketone compound may include benzodiazone, acetamido, and the like.

上述酮醇化合物之具體例可包含二苯乙醇酮。 Specific examples of the keto alcohol compound may include benzophenone.

上述酮醇醚化合物之具體例可包含二苯乙醇酮甲醚、二苯乙醇酮乙醚或二苯乙醇酮異丙醚等之化合物，或者上述化合物之任意組合。 Specific examples of the ketol ether compound may include compounds such as bisphenethyl ketone methyl ether, benzophenone diethyl ether, benzophenone isopropyl ether, or any combination thereof.

上述醯膦氧化物之具體例可包含2,4,6-三甲基苯醯二苯基膦氧化物或雙-(2,6-二甲氧基苯醯)-2,4,4-三甲基苯基膦氧化物等之化合物，或者上述化合物之任意組合。 Specific examples of the above phosphonium oxide may include 2,4,6-trimethylphenylphosphonium diphenylphosphine oxide or bis- (2,6-dimethoxyphenylphosphonium) -2,4,4-tri A compound such as methylphenylphosphine oxide, or any combination thereof.

上述醌類化合物之具體例可包含蒽醌或1,4-萘醌等之化合物，或者上述化合物之任意組合。 Specific examples of the quinone compound may include compounds such as anthraquinone, 1,4-naphthoquinone, and the like, or any combination thereof.

上述含鹵素類化合物之具體例可包含苯醯甲基氯、三溴甲基苯碸或三(三氯甲基)-s-三氮雜苯等之化合物，或者上述化合物之任意組合。 Specific examples of the halogen-containing compound may include compounds such as benzamidine chloride, tribromomethyl benzamidine, and tris (trichloromethyl) -s-triazabenzene, or any combination of the foregoing compounds.

上述過氧化物之具體例可包含二-第三丁基過氧化物等之化合物。 Specific examples of the peroxide may include compounds such as di-third butyl peroxide.

較佳地，其他光起始劑(C-3)可為1-[9-乙基-6-(2-甲基苯甲醯基)-9H-咔唑-3-取代基]-乙烷酮-1-(O-乙醯基肟)，其可為汽巴精化有限公司製造之商品，且型號為OXE-02；1-[4-(苯基硫代)苯基]-辛烷-1,2-二酮-2-(O-苯醯基肟)，其可為汽巴精化有限公司製造之商品，且型號為OXE-01；2-甲基-1-(4-甲基硫代苯基)-2-嗎啉代-1-丙酮，其可為汽巴精化有限公司製造之商品，且型號為IRGACURE 907或上述 化合物之任意組合。 Preferably, the other photoinitiator (C-3) may be 1- [9-ethyl-6- (2-methylbenzylidene) -9H-carbazole-3-substituent] -ethane Keto-1- (O-acetylamoxime), which can be a product manufactured by Ciba Refining Co., Ltd., and the model number is OXE-02; 1- [4- (phenylthio) phenyl] -octane -1,2-dione-2- (O-phenylhydrazine oxime), which can be a product manufactured by Ciba Refining Co., Ltd., and the model is OXE-01; 2-methyl-1- (4-methyl Thiophenyl) -2-morpholino-1-acetone, which can be a product manufactured by Ciba Refining Co., Ltd., and the model number is IRGACURE 907 or above Any combination of compounds.

基於鹼可溶性樹脂(A)之使用量為100重量份，該光起始劑(C)之使用量為0.4重量份至40重量份，較佳為0.5重量份至30重量份，且更佳為0.6重量份至20重量份。 Based on the use amount of the alkali-soluble resin (A) being 100 parts by weight, the use amount of the photoinitiator (C) is 0.4 to 40 parts by weight, preferably 0.5 to 30 parts by weight, and more preferably 0.6 to 20 parts by weight.

本發明之溶劑(D)可溶解前述之鹼可溶性樹脂(A)、具有乙烯性不飽和基之化合物(B)及光起始劑(C)及視需要之環氧基的矽烷化合物(F)，但又不與後述之黑色顏料(E)產生反應，且較佳具有適當之揮發性。 The solvent (D) of the present invention can dissolve the aforementioned alkali-soluble resin (A), the compound (B) having an ethylenically unsaturated group, a photoinitiator (C), and an epoxy-based silane compound (F), if necessary. , But does not react with the black pigment (E) described later, and preferably has appropriate volatility.

該溶劑(D)之具體例可包含烷基二醇單烷醚化合物、烷基二醇單烷醚醋酸酯化合物、二乙二醇烷基醚、其他醚類化合物、酮類化合物、乳酸烷酯化合物、其他酯類化合物、芳香族烴類化合物、羧酸胺化合物或上述化合物之任意組合。上述之溶劑(D)可單獨一種或混合複數種使用。 Specific examples of the solvent (D) may include alkyl glycol monoalkyl ether compounds, alkyl glycol monoalkyl ether acetate compounds, diethylene glycol alkyl ethers, other ether compounds, ketone compounds, and alkyl lactate Compounds, other ester compounds, aromatic hydrocarbon compounds, carboxylic acid amine compounds, or any combination thereof. The above-mentioned solvents (D) can be used singly or in combination.

前述烷基二醇單烷醚化合物之具體例可包含乙二醇單甲醚、乙二醇單乙醚、二乙二醇單乙醚、二乙二醇單正丙醚、二乙二醇單正丁醚、三乙二醇單甲醚、三乙二醇單乙醚、丙二醇單甲醚、丙二醇單乙醚、二丙二醇單甲醚、二丙二醇單乙醚、二丙二醇單正丙醚、二丙二醇單正丁醚、三丙二醇單甲醚或三丙二醇單乙醚等之化合物，或者上述化合物之任意組合。 Specific examples of the alkyl glycol monoalkyl ether compound may include ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, diethylene glycol monoethyl ether, diethylene glycol mono-n-propyl ether, and diethylene glycol mono-n-butyl ether. Ether, triethylene glycol monomethyl ether, triethylene glycol monoethyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, dipropylene glycol monomethyl ether, dipropylene glycol monoethyl ether, dipropylene glycol mono-n-propyl ether, dipropylene glycol mono-n-butyl ether , Tripropylene glycol monomethyl ether or tripropylene glycol monoethyl ether, or any combination thereof.

前述烷基二醇單烷醚醋酸酯化合物之具體例可包含乙二醇甲醚醋酸酯、乙二醇乙醚醋酸酯、丙二醇甲醚醋酸酯或丙二醇乙醚醋酸酯等之化合物，或者上述化合物之任意組合。 Specific examples of the alkyl glycol monoalkyl ether acetate compound may include compounds such as ethylene glycol methyl ether acetate, ethylene glycol ethyl ether acetate, propylene glycol methyl ether acetate, or propylene glycol ethyl ether acetate, or any of the above compounds. combination.

前述二乙二醇烷基醚之具體例可包含二乙二醇二甲醚、二乙二醇甲乙醚或二乙二醇二乙醚等之化合物，或者上述化合物之任意組合。 Specific examples of the diethylene glycol alkyl ether may include compounds such as diethylene glycol dimethyl ether, diethylene glycol methyl ether, or diethylene glycol diethyl ether, or any combination of the foregoing compounds.

前述其他醚類化合物之具體例可包含四氫呋喃等之化 合物。 Specific examples of the aforementioned other ether compounds may include tetrahydrofuran and the like 组合。 The compound.

前述酮類化合物之具體例可包含甲乙酮、環己酮、2-庚酮、3-庚酮或二丙酮醇等之化合物，或者上述化合物之任意組合。 Specific examples of the aforementioned ketone compounds may include compounds such as methyl ethyl ketone, cyclohexanone, 2-heptanone, 3-heptanone, and diacetone alcohol, or any combination of the foregoing compounds.

前述乳酸烷酯化合物之具體例可包含乳酸甲酯或乳酸乙酯等之化合物，或者上述化合物之任意組合。 Specific examples of the alkyl lactate compound may include compounds such as methyl lactate or ethyl lactate, or any combination of the aforementioned compounds.

前述其他酯類化合物之具體例可包含2-羥基-2-甲基丙酸甲酯、2-羥基-2-甲基丙酸乙酯、3-甲氧基丙酸甲酯、3-甲氧基丙酸乙酯、3-乙氧基丙酸甲酯、3-乙氧基丙酸乙酯、乙氧基醋酸乙酯、羥基醋酸乙酯、2-羥基-3-甲基丁酸甲酯、3-甲基-3-甲氧基丁基醋酸酯、3-甲基-3-甲氧基丁基丙酸酯、醋酸乙酯、醋酸正丙酯、醋酸異丙酯、醋酸正丁酯、醋酸異丁酯、醋酸正戊酯、醋酸異戊酯、丙酸正丁酯、丁酸乙酯、丁酸正丙酯、丁酸異丙酯、丁酸正丁酯、丙酮酸甲酯、丙酮酸乙酯、丙酮酸正丙酯、乙醯醋酸甲酯、乙醯醋酸乙酯或2-氧基丁酸乙酯等之化合物，或者上述化合物之任意組合。 Specific examples of the other ester compounds may include methyl 2-hydroxy-2-methylpropionate, ethyl 2-hydroxy-2-methylpropionate, methyl 3-methoxypropionate, and 3-methoxy Ethyl propionate, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, ethyl ethoxyacetate, ethyl glycolate, 2-hydroxy-3-methylbutyrate , 3-methyl-3-methoxybutyl acetate, 3-methyl-3-methoxybutyl propionate, ethyl acetate, n-propyl acetate, isopropyl acetate, n-butyl acetate , Isobutyl acetate, n-amyl acetate, isoamyl acetate, n-butyl propionate, ethyl butyrate, n-propyl butyrate, isopropyl butyrate, n-butyl butyrate, methyl pyruvate, Compounds such as ethyl pyruvate, n-propyl pyruvate, methyl ethyl acetate, ethyl ethyl acetate, or ethyl 2-oxybutyrate, or any combination thereof.

前述芳香族烴類化合物之具體例可包含甲苯或二甲苯等之化合物，或者上述化合物之任意組合。 Specific examples of the aromatic hydrocarbon compound may include a compound such as toluene, xylene, or any combination thereof.

前述羧酸胺化合物之具體例可為N-甲基吡咯烷酮、N,N-二甲基甲醯胺或N,N-二甲基乙醯胺等之化合物，或上述化合物之任意組合。 Specific examples of the carboxylic acid amine compound may be compounds such as N-methylpyrrolidone, N, N-dimethylformamide, N, N-dimethylacetamide, or any combination thereof.

較佳地，該溶劑(D)可為丙二醇甲醚醋酸酯或3-乙氧基丙酸乙酯。 Preferably, the solvent (D) may be propylene glycol methyl ether acetate or ethyl 3-ethoxypropionate.

基於鹼可溶性樹脂(A)之使用量為100重量份，該溶劑(D)之使用量為300重量份至3000重量份，較佳為400重量份至2000重量份，且更佳為500重量份至1500重量份。 Based on the use amount of the alkali-soluble resin (A) being 100 parts by weight, the use amount of the solvent (D) is 300 parts by weight to 3000 parts by weight, preferably 400 parts by weight to 2000 parts by weight, and more preferably 500 parts by weight To 1500 parts by weight.

根據本發明之黑色顏料(E)包含第一黑色顏料(E-1)，並可選擇性地包含第二黑色顏料組分(E-2)，以下分述之。 The black pigment (E) according to the present invention contains a first black pigment (E-1) and may optionally contain a second black pigment component (E-2), which will be described below.

該第一黑色顏料(E-1)為下述式(E-I)所表示之化合物、其幾何異構物、其鹽、或其幾何異構物之鹽。 The first black pigment (E-1) is a compound represented by the following formula (E-I), a geometric isomer thereof, a salt thereof, or a salt of a geometric isomer thereof.

於式(E-I)中，R1e及R6e相互獨立為氫原子、CH3、CF3、氟原子或氯原子；R2e、R3e、R4e、R5e、R7e、R8e、R9e及R10e係和其他全部相互獨立為氫原子、鹵素原子、R11e、COOH、COOR11e、COO-、CONH2、CONHR11e、CONR11eR12e、CN、OH、OR11e、COCR11e、OOCNH2、OOCNHR11e、OOCNR11eR12e、NO2、NH2、NHR11e、NR11eR12e、NHCOR12e、NR11eCOR12e、N=CH2、N=CHR11e、N=CR11eR12e、SH、SR11e、SOR11e、SO2R11e、SO3R11e、SO3H、SO3-、SO2NH2、SO2NHR11e或SO2NR11eR12e；且選自由R2e與R3e、R3e與R4e、R4e與R5e、R7e與R8e、R8e與R9e、及R9e與R10e所組成之群組中之至少1個組合，係為相互直接鍵結，或者藉由氧原子、硫原子、NH或NR11e橋接而相互鍵結；R11e及R12e相互獨立為碳數1至12之烷基、碳數3至12之環烷基、碳數2至12之烯基、碳數3至12之環烯基或碳數2至12之炔基。 In formula (EI), R 1e and R 6e are each independently a hydrogen atom, CH 3 , CF 3 , fluorine atom or chlorine atom; R 2e , R 3e , R 4e , R 5e , R 7e , R 8e , R 9e And R 10e series and all others are hydrogen atom, halogen atom, R 11e , COOH, COOR 11e , COO-, CONH 2 , CONHR 11e , CONR 11e R 12e , CN, OH, OR 11e , COCR 11e , OOCNH 2 , OOCNHR 11e , OOCNR 11e R 12e , NO 2 , NH 2 , NHR 11e , NR 11e R 12e , NHCOR 12e , NR 11e COR 12e , N = CH 2 , N = CHR 11e , N = CR 11e R 12e , SH, SR 11e , SOR 11e , SO 2 R 11e , SO 3 R 11e , SO 3 H, SO 3- , SO 2 NH 2 , SO 2 NHR 11e, or SO 2 NR 11e R 12e ; and selected from R 2e and R 3e , At least one combination of the group consisting of R 3e and R 4e , R 4e and R 5e , R 7e and R 8e , R 8e and R 9e , and R 9e and R 10e , is directly bonded to each other, or Bonded to each other by bridging with oxygen atom, sulfur atom, NH or NR 11e ; R 11e and R 12e are independently of each other alkyl groups having 1 to 12 carbon atoms, cycloalkyl groups having 3 to 12 carbon atoms, and 2 to 12 carbon atoms Alkenyl, cycloalkenyl having 3 to 12 carbons, or alkynyl having 2 to 12 carbons.

上述式(E-I)所表示之化合物之幾何異構物具有以下之核心構造(但，構造式中之取代基省略)，且反-反異構物可能最為穩定。 The geometric isomer of the compound represented by the above formula (E-I) has the following core structure (but the substituents in the structural formula are omitted), and the trans-trans isomer may be the most stable.

於上述式(E-I)所表示之化合物為陰離子性之情況時，較佳為藉由任意公知之適當之陽離子，例如金屬、有機、無機或金屬有機陽離子，具體而言，鹼金屬、鹼土類金屬、過渡金屬、一級銨、二級銨、三烷基銨等三級銨、四烷基銨等四級銨或有機金屬錯合物補償其電荷而成之鹽。又，於上述式(E-I)所表示之化合物之幾何異構物為陰離子性之情況時，較佳為相同之鹽。 In the case where the compound represented by the above formula (EI) is anionic, it is preferred to use any known appropriate cation, such as a metal, organic, inorganic, or metal organic cation, specifically, an alkali metal, an alkaline earth metal , Transition metal, primary ammonium, secondary ammonium, trialkylammonium and other tertiary ammonium, tetraalkylammonium and other quaternary ammonium or organometallic complexes to compensate their charges. When the geometric isomer of the compound represented by the formula (E-I) is anionic, the same salt is preferred.

上述式(E-I)之取代基及該等之定義中，就有遮蔽率變高之傾向之方面而言，較佳為以下。其原因在於：可認為以下之取代基不具有吸收，而不會對顏料之色相產生影響。R2e、R4e、R5e、R7e、R9e及R10e相互獨立，較佳為氫原子、氟原子、或氯原子，更佳為氫原子。R3e及R8e相互獨立，較佳為氫原子、NO2、OCH3、OC2H5、溴原子、氯原子、CH3、C2H5、N(CH3)2、N(CH3)(C2H5)、N(C2H5)2、α-萘基、β-萘基、SO3H或SO3-，更佳為氫原子或SO3H。 Among the substituents of the above formula (EI) and the definitions of these, the following are preferred in terms of the tendency of the shielding ratio to increase. The reason for this is that the following substituents are considered to have no absorption and do not affect the hue of the pigment. R 2e , R 4e , R 5e , R 7e , R 9e, and R 10e are independent of each other, preferably a hydrogen atom, a fluorine atom, or a chlorine atom, and more preferably a hydrogen atom. R 3e and R 8e are independent of each other, preferably hydrogen atom, NO 2 , OCH 3 , OC 2 H 5 , bromine atom, chlorine atom, CH 3 , C 2 H 5 , N (CH 3 ) 2 , N (CH 3 ) (C 2 H 5 ), N (C 2 H 5 ) 2 , α-naphthyl, β-naphthyl, SO 3 H or SO 3- , more preferably a hydrogen atom or SO 3 H.

R1e及R6e相互獨立，較佳為氫原子、CH3或CF3，更佳為氫原子。較佳為選自由R1e與R6e、R2e與R7e、R3e與R8e、R4e與R9e、及R5e與R10e所組成之群組中之至少1個組合相同，更佳為R1e與R6e相同，R2e與R7e相同，R3e與R8e相同，R4e與R9e相同，且R5e與R10e相同。 R 1e and R 6e are independent of each other, preferably a hydrogen atom, CH 3 or CF 3 , and more preferably a hydrogen atom. Preferably, at least one combination selected from the group consisting of R 1e and R 6e , R 2e and R 7e , R 3e and R 8e , R 4e and R 9e , and R 5e and R 10e is the same, more preferably R 1e is the same as R 6e , R 2e is the same as R 7e , R 3e is the same as R 8e , R 4e is the same as R 9e , and R 5e is the same as R 10e .

該碳數1至12之烷基例如為甲基、乙基、正丙基、異丙基、正丁基、第二丁基、異丁基、第三丁基、2-甲基丁基、正戊基、2-戊基、3-戊基、2,2-二甲基丙基、正己基、庚基、正辛基、1,1,3,3-四甲基丁基、2-乙基己基、壬基、癸基、十一烷基或十二烷基。 Examples of the alkyl group having 1 to 12 carbon atoms are methyl, ethyl, n-propyl, isopropyl, n-butyl, second butyl, isobutyl, third butyl, 2-methylbutyl, N-pentyl, 2-pentyl, 3-pentyl, 2,2-dimethylpropyl, n-hexyl, heptyl, n-octyl, 1,1,3,3-tetramethylbutyl, 2- Ethylhexyl, nonyl, decyl, undecyl or dodecyl.

該碳數3至12之環烷基例如為環丙基、環丙基甲基、環丁基、環戊基、環己基、環己基甲基、三甲基環己基、側柏基、降基、基、降蒈基(norcaryl)、蒈基(caryl)、基、降蒎基(norpinyl)、蒎基(pinyl)、1-金剛烷基或2-金剛烷基。 The cycloalkyl group having 3 to 12 carbon atoms is, for example, cyclopropyl, cyclopropylmethyl, cyclobutyl, cyclopentyl, cyclohexyl, cyclohexylmethyl, trimethylcyclohexyl, thujyl, norbornel base, , Norcaryl, caryl, Group, norpinyl, pinyl, 1-adamantyl or 2-adamantyl.

該碳數2至12之烯基例如為乙烯基、烯丙基、2-丙烯-2-基、2-丁烯-1-基、3-丁烯-1-基、1,3-丁二烯-2-基、2-戊烯-1-基、3-戊烯-2-基、2-基-1-丁烯-3-基、2-甲基-3-丁烯-2-基、3-甲基-2-丁烯-1-基、1,4-戊二烯-3-基、己烯基、辛烯基、壬烯基、癸烯基或十二烯基。 The alkenyl group having 2 to 12 carbon atoms is, for example, vinyl, allyl, 2-propen-2-yl, 2-buten-1-yl, 3-buten-1-yl, 1,3-butane Alken-2-yl, 2-penten-1-yl, 3-penten-2-yl, 2- 1-butene-3-yl, 2-methyl-3-buten-2-yl, 3-methyl-2-buten-1-yl, 1,4-pentadien-3-yl , Hexenyl, octenyl, nonenyl, decenyl or dodecenyl.

該碳數3至12之環烯基例如為2-環丁烯-1-基、2-環戊烯-1-基、2-環己烯-1-基、3-環己烯-1-基、2,4-環己二烯-1-基、1-對烯-8-基、4(10)-側柏烯-10-基、2-降烯-1-基、2,5-降二烯-1-基、7,7-二甲基-2,4-降蒈二烯-3-基或莰烯基(camphenyl)。 The cycloalkenyl group having 3 to 12 carbon atoms is, for example, 2-cyclobuten-1-yl, 2-cyclopenten-1-yl, 2-cyclohexen-1-yl, 3-cyclohexene-1- Radical, 2,4-cyclohexadien-1-yl, 1-pair Ene-8-yl, 4 (10) -thuberene-10-yl, 2-nor En-1-yl, 2,5-nor Dien-1-yl, 7,7-dimethyl-2,4-norbornadien-3-yl or camphenyl.

該碳數2至12之炔基例如為1-丙炔-3-基、1-丁炔-4-基、1-戊炔-5-基、2-甲基-3-丁炔-2-基、1,4-戊二炔-3-基、1,3-戊二炔-5-基、1-己炔-6-基、順-3-甲基-2-戊烯-4-炔-1-基、反-3-甲基-2-戊烯-4-炔-1-基、1,3-己二炔-5-基、1-辛炔-8-基、1-壬炔-9-基、1-癸炔-10-基或1-十二炔-12-基。 Examples of the alkynyl group having 2 to 12 carbon atoms are 1-propyn-3-yl, 1-butyn-4-yl, 1-pentyn-5-yl, and 2-methyl-3-butyn-2- , 1,4-pentadiyn-3-yl, 1,3-pentadiyn-5-yl, 1-hexyne-6-yl, cis-3-methyl-2-pentene-4-yne -1-yl, trans-3-methyl-2-pentene-4-yn-1-yl, 1,3-hexadiyn-5-yl, 1-octyne-8-yl, 1-nonyne -9-yl, 1-decyne-10-yl or 1-dodecyne-12-yl.

該鹵素原子例如為氟原子、氯原子、溴原子或碘原子。 The halogen atom is, for example, a fluorine atom, a chlorine atom, a bromine atom, or an iodine atom.

於本發明之一較佳具體例中，式(E-I)之R2e、R4e、R5e、R7e、R9e及R10e相互獨立為氫原子、氟原子或氯原子，R3e及R8e相互獨立為氫原子、NO2、OCH3、OC2H5、溴原子、氯原子、CH3、C2H5、N(CH3)2、N(CH3)(C2H5)、N(C2H5)2、α-萘基、β-萘基、SO3H或SO3-，R1e與R6e相同，R2e與R7e相同，R3e與R8e相同，R4e與R9e相同，R5e與R10e相同。 In a preferred embodiment of the present invention, R 2e , R 4e , R 5e , R 7e , R 9e, and R 10e of formula (EI) are each independently a hydrogen atom, a fluorine atom, or a chlorine atom, and R 3e and R 8e Independent of each other are hydrogen atom, NO 2 , OCH 3 , OC 2 H 5 , bromine atom, chlorine atom, CH 3 , C 2 H 5 , N (CH 3 ) 2 , N (CH 3 ) (C 2 H 5 ), N (C 2 H 5 ) 2 , α-naphthyl, β-naphthyl, SO 3 H or SO 3- , R 1e is the same as R 6e , R 2e is the same as R 7e , R 3e is the same as R 8e , and R 4e the same as R 9e, R 5e and R 10e identical.

該第一黑色顏料(E-1)較佳為下述式(E-I-1)所表示之化合物。 The first black pigment (E-1) is preferably a compound represented by the following formula (E-I-1).

基於鹼可溶性樹脂(A)之使用量為100重量份，該第一黑色顏料(E-1)之使用量為15重量份至150重量份，較佳為20重量份至130重量份，且更佳為25重量份至100重量份。 Based on the use amount of the alkali-soluble resin (A) being 100 parts by weight, the use amount of the first black pigment (E-1) is 15 parts by weight to 150 parts by weight, preferably 20 parts by weight to 130 parts by weight, and more It is preferably 25 parts by weight to 100 parts by weight.

當該第一黑色顏料(E-1)之使用量介於上述範圍時，則由此黑色感光性樹脂組成物所製得之黑色圖案其介電常數更佳。 When the usage amount of the first black pigment (E-1) is within the above range, the black pattern produced from the black photosensitive resin composition has a better dielectric constant.

當本發明之黑色顏料(E)不包含該第一黑色顏料(E-1)時，則由此黑色感光性樹脂組成物所製得之黑色圖案具有介電常數不佳之缺陷。 When the black pigment (E) of the present invention does not include the first black pigment (E-1), the black pattern produced from the black photosensitive resin composition has a defect of poor dielectric constant.

該第二黑色顏料(E-2)包含但不限於(1)黑色有機顏料：二萘嵌苯黑(perylene black)、花青黑(cyanine black)、苯胺黑(aniline black)等；(2)由紅、藍、綠、紫、黃色、花青(cyanine)、洋紅(magenta)等顏料中，選擇兩種或兩種以上的顏料進行混合，使其成近黑色化之混色有機顏料；(3)遮光材：碳黑(carbon black)、氧化鉻、氧化鐵、鈦黑(titanium black)、石墨等。 The second black pigment (E-2) includes but is not limited to (1) black organic pigments: perylene black, cyanine black, aniline black, and the like; (2) From red, blue, green, purple, yellow, cyanine, magenta and other pigments, select two or more pigments to mix to make it a black-colored mixed color organic pigment; (3 ) Shading materials: carbon black, chromium oxide, iron oxide, titanium black, graphite, etc.

上述碳黑之具體例包含但不限於C.I.Pigment black 7，或者三菱化學公司所製造之商品，其型號為MA100、MA220、MA230、MA8、#970、#1000、#2350或#2650。該黑色顏料(E)可單獨一種或混合複數種使用。 Specific examples of the above carbon black include, but are not limited to, C.I. Pigment black 7, or a product manufactured by Mitsubishi Chemical Corporation, the model of which is MA100, MA220, MA230, MA8, # 970, # 1000, # 2350, or # 2650. The black pigment (E) may be used alone or in combination.

較佳地，該第二黑色顏料(E-2)可為碳黑，或者前述型號為MA100或MA230之商品。 Preferably, the second black pigment (E-2) may be carbon black, or the aforementioned product is MA100 or MA230.

基於鹼可溶性樹脂(A)之使用量為100重量份，該黑色顏料(E)之使用量為15重量份至150重量份，較佳為20重量份至130重量份，且更佳為25重量份至100重量份。 Based on the use amount of the alkali-soluble resin (A) being 100 parts by weight, the use amount of the black pigment (E) is 15 parts by weight to 150 parts by weight, preferably 20 parts by weight to 130 parts by weight, and more preferably 25 parts by weight Parts to 100 parts by weight.

根據本發明黑色感光性樹脂組成物，較佳係進一步包括含環氧基之矽烷化合物(F)。該含環氧基的矽烷化合物(F)所具有的含環氧基的基團例如是縮水甘油基(glycidyl group)、縮水甘油醚基(glycidyloxy group)、環氧環己基(epoxycyclohexyl group)或環氧丙烷基(oxetanyl group)。 The black photosensitive resin composition according to the present invention preferably further includes an epoxy group-containing silane compound (F). The epoxy group-containing silane compound (F) has an epoxy group-containing group such as a glycidyl group, a glycidyloxy group, an epoxycyclohexyl group, or a cyclic group. Oxetanyl group.

具體而言，該含環氧基的基團可包括由式(F-I)表示的基、由式(F-II)表示的基以及由式(F-III)表示的基中的至少一者； 式(F-I)中，L表示氧原子或單鍵；f表示1至3的整數；i表示0至6的整數，其中當i表示0時，L為單鍵； 式(F-II)中，j表示0至6的整數； 式(F-III)中，B表示碳數為2至6的伸烷基；D表示氫原子或碳數為1至6的烷基。 Specifically, the epoxy group-containing group may include at least one of a group represented by formula (FI), a group represented by formula (F-II), and a group represented by formula (F-III); In formula (FI), L represents an oxygen atom or a single bond; f represents an integer from 1 to 3; i represents an integer from 0 to 6, wherein when i represents 0, L is a single bond; In formula (F-II), j represents an integer of 0 to 6; In the formula (F-III), B represents an alkylene group having 2 to 6 carbon atoms; D represents a hydrogen atom or an alkyl group having 1 to 6 carbon atoms.

含環氧基的基團較佳為包括由式(1-1)表示的基、由式(2-1)表示的基以及由式(3-1)表示的基中的至少一者。 The epoxy group-containing group preferably includes at least one of a group represented by the formula (1-1), a group represented by the formula (2-1), and a group represented by the formula (3-1).

該含環氧基的矽烷化合物(F)的具體例包括3-(N,N-二縮水甘油基)胺基丙基三甲氧基矽烷、3-(N-烯丙基-N-縮水甘油基)胺基丙基三甲氧基矽烷、3-縮水甘油醚基丙基三甲氧基矽烷、3-縮水甘油醚基丙基三乙氧基矽烷、3-縮水甘油醚基丙基甲基二甲氧基矽烷、3-縮水甘油醚基丙基甲基二乙氧基矽烷、3-縮水甘油醚基丙基二甲基甲氧基矽烷、3-縮水甘油醚基丙基二甲基乙氧基矽烷、2-縮水甘油醚基乙基三甲氧基矽烷、2-縮水甘油醚基乙基三乙氧基矽烷、2-縮水甘油醚基乙基甲基二甲氧基矽烷、2-縮水甘油醚基乙基甲基二乙氧基矽烷、2-縮水甘油醚基乙基二甲基甲氧基矽烷、2-縮水甘油醚基乙基二甲基乙氧基矽烷、4-縮水甘油醚基丁基三甲氧基矽烷、4-縮水甘油醚基丁基三乙氧基矽烷、4-縮水甘油醚基丁基甲基二甲氧基矽烷、4-縮水甘油醚基丁基甲基二乙氧基矽烷、4-縮水甘油醚基丁基二甲基甲氧基矽烷、4-縮水甘油醚基丁基二甲基乙氧基矽烷、2-(3,4-環氧環己基)乙基三甲氧基矽烷、2-(3,4-環氧環己基)乙基三乙氧基矽烷、3-)3,4-環氧環己基)丙基三甲氧基矽烷、3-(3,4-環氧環己基)丙基三乙氧基矽 烷、((3-乙基-3-環氧丙烷基)甲氧基)丙基三甲氧基矽烷、((3-乙基-3-環氧丙烷基)甲氧基)丙基三乙氧基矽烷、((3-乙基-3-環氧丙烷基)甲氧基)丙基甲基二甲氧基矽烷或((3-乙基-3-環氧丙烷基)甲氧基)丙烷二甲基甲氧基矽烷，或上述化合物的組合。 Specific examples of the epoxy-containing silane compound (F) include 3- (N, N-diglycidyl) aminopropyltrimethoxysilane, and 3- (N-allyl-N-glycidyl ) Aminopropyltrimethoxysilane, 3-glycidyletherpropyltrimethoxysilane, 3-glycidyletherpropyltriethoxysilane, 3-glycidyletherpropylmethyldimethoxy Silyl, 3-glycidyl ether propylmethyldiethoxysilane, 3-glycidyl ether propyldimethylmethoxysilane, 3-glycidyl ether propyldimethylethoxysilane , 2-glycidyl ether ethyltrimethoxysilane, 2-glycidyl ether ethyltriethoxysilane, 2-glycidyl ether ethylmethyldimethoxysilane, 2-glycidyl ether Ethylmethyldiethoxysilane, 2-glycidyletherethyldimethylmethoxysilane, 2-glycidyletherethyldimethylethoxysilane, 4-glycidyletherbutyl Trimethoxysilane, 4-glycidyl ether butyl triethoxysilane, 4-glycidyl ether butyl methyl dimethoxysilane, 4-glycidyl ether butyl methyl diethoxysilane, 4-glycidyl Oleyl butyl dimethyl methoxysilane, 4-glycidyl butyl dimethyl ethoxy silane, 2- (3,4-epoxycyclohexyl) ethyl trimethoxy silane, 2- (3,4-epoxycyclohexyl) ethyltriethoxysilane, 3-) 3,4-epoxycyclohexyl) propyltrimethoxysilane, 3- (3,4-epoxycyclohexyl) propane Triethoxysilane Alkane, ((3-ethyl-3-glycidyloxy) methoxy) propyltrimethoxysilane, ((3-ethyl-3-glycidyl) methoxy) propyltriethoxy Silane, ((3-ethyl-3-glycidyloxy) methoxy) propylmethyldimethoxysilane, or ((3-ethyl-3-glycidyl) methoxy) propane Dimethylmethoxysilane, or a combination thereof.

該含環氧基的矽烷化合物(F)的具體例較佳為包括3-縮水甘油醚基丙基三甲氧基矽烷、2-縮水甘油醚基乙基三甲氧基矽烷、4-縮水甘油醚基丁基三甲氧基矽烷、2-(3,4-環氧環己基)乙基三甲氧基矽烷、2-(3,4-環氧環己基))乙基三乙氧基矽烷、((3-乙基-3-環氧丙烷基)甲氧基)丙基三甲氧基矽烷、((3-乙基-3-環氧丙烷基)甲氧基)丙基三乙氧基矽烷或上述化合物的組合。 Specific examples of the epoxy-containing silane compound (F) include 3-glycidyl ether propyltrimethoxysilane, 2-glycidyl ether ethyltrimethoxysilane, and 4-glycidyl ether group. Butyltrimethoxysilane, 2- (3,4-epoxycyclohexyl) ethyltrimethoxysilane, 2- (3,4-epoxycyclohexyl)) ethyltriethoxysilane, ((3 -Ethyl-3-glycidyl) methoxy) propyltrimethoxysilane, ((3-ethyl-3-glycidyl) methoxy) propyltriethoxysilane or the above compound The combination.

基於鹼可溶性樹脂(A)之使用量為100重量份，該環氧基的矽烷化合物(F)之使用量為0.5重量份至5重量份，較佳為0.6重量份至4重量份，且更佳為0.7重量份至3重量份。 Based on 100 parts by weight of the alkali-soluble resin (A), the epoxy-based silane compound (F) is used in an amount of 0.5 to 5 parts by weight, preferably 0.6 to 4 parts by weight, and more Preferably, it is 0.7 to 3 parts by weight.

當本發明之鹼可溶性樹脂(A)包含該環氧基的矽烷化合物(F)時，則由此黑色感光性樹脂組成物所製得之黑色圖案其介電常數更佳。 When the alkali-soluble resin (A) of the present invention contains the epoxy-based silane compound (F), the black pattern produced from the black photosensitive resin composition has a better dielectric constant.

在不影響本發明功效之前提下，本發明的黑色感光性樹脂組成物可進一步選擇性地添加添加劑(G)。該添加劑(G)之具體例可包含界面活性劑、填充劑、密著促進劑、抗氧化劑、防凝集劑或前述鹼可溶性樹脂(A)以外之其他能增加各種性質(例如機械性質)的聚合物。 Before the effect of the present invention is not affected, the black photosensitive resin composition of the present invention may be further optionally added with an additive (G). Specific examples of the additive (G) may include a surfactant, a filler, an adhesion promoter, an antioxidant, an anti-aggregation agent, or a polymerization agent that can increase various properties (for example, mechanical properties) other than the alkali-soluble resin (A). Thing.

前述界面活性劑之具體例可包含陽離子型界面活性劑、陰離子型界面活性劑、非離子型界面活性劑、兩性界面活性劑、聚矽氧烷界面活性劑、氟素界面活性劑或上述界面活性劑之任意組合。 Specific examples of the aforementioned surfactant may include a cationic surfactant, an anionic surfactant, a nonionic surfactant, an amphoteric surfactant, a polysiloxane surfactant, a fluorine surfactant, or the above-mentioned surfactant. Any combination of agents.

該界面活性劑之具體例可包含但不限於聚乙氧基十二 烷基醚、聚乙氧基硬酯醯醚或聚乙氧基油醚等之聚乙氧基烷基醚類；聚乙氧基辛基苯基醚或聚乙氧基壬基苯基醚等之聚乙氧基烷基苯基醚類；聚乙二醇二月桂酸酯或聚乙二醇二硬酸酯等之聚乙二醇二酯類；山梨糖醇酐脂肪酸酯化合物；脂肪酸改質的聚酯化合物；三級胺改質的聚胺基甲酸酯化合物；或者市售之商品。其中，該市售商品可為信越化學工業公司製造之產品，且其型號為KP；道康寧東麗股份有限公司(Dow Corning Toray Co.,Ltd.)製造之產品，且其型號為SF-8427；共榮社油脂化學工業製造之產品，且其型號為Polyflow；得克姆股份有限公司(Tochem Products Co.,Ltd.)製造之產品，且其型號為F-Top；大日本印墨化學工業製造之產品，且其型號為Megafac；住友3M製造之產品，且其型號為Fluorade；或者旭硝子公司製造之產品，且其型號為Asahi Guard或Surflon。該界面活性劑可單獨一種或混合複數種使用。 Specific examples of the surfactant may include, but are not limited to, polyethoxy dodecyl Polyethoxyalkyl ethers such as alkyl ethers, polyethoxystearyl ethers or polyethoxy oleyl ethers; polyethoxyoctylphenyl ethers or polyethoxynonylphenyl ethers, etc. Polyethoxyalkylphenyl ethers; Polyethylene glycol diesters such as polyethylene glycol dilaurate or polyethylene distearate; sorbitan fatty acid ester compounds; fatty acid modification Polyester compounds; tertiary amine modified polyurethane compounds; or commercially available products. Among them, the commercial product can be a product manufactured by Shin-Etsu Chemical Industry Co., Ltd. and its model is KP; a product manufactured by Dow Corning Toray Co., Ltd. and its model is SF-8427; Products manufactured by Kyoeisha Oil Chemical Industry, and its model is Polyflow; products manufactured by Tochem Products Co., Ltd., and its model is F-Top; manufactured by Dainippon Ink Chemical Industry Products manufactured by Megafac; Sumitomo 3M products manufactured by Fluorade; or Asahi Glass Company manufactured by Asahi Guard or Surflon. These surfactants can be used singly or in combination.

前述填充劑之具體例可包含玻璃或鋁等。 Specific examples of the filler may include glass, aluminum, and the like.

前述密著促進劑之具體例可包含乙烯基三甲氧基矽烷、乙烯基三乙氧基矽烷、乙烯基三(2-甲氧基乙氧基)矽烷、N-(2-胺基乙基)-3-胺基丙基甲基二甲氧基矽烷、N-(2-胺基乙基)-3-胺基丙基三甲氧基矽烷、3-胺丙基三乙氧基矽烷、3-環氧丙氧基丙基三甲氧基矽烷(信越化學製造之商品，且其型號為KBM-403)、EPPN501H(日本化藥公司製)、EPIKOTE 152(殼牌化學公司製造)、3-環氧丙氧基丙基甲基二乙氧基矽烷、2-(3,4-環氧環己基)乙基三甲氧基矽烷、3-氯丙基甲基二甲氧基矽烷、3-氯丙基三甲氧基矽烷、3-甲基丙醯氧基丙基三甲氧基矽烷或3-巰丙基三甲氧基矽烷等之化合物，或者上述化合物之任意組合。 Specific examples of the adhesion promoter may include vinyltrimethoxysilane, vinyltriethoxysilane, vinyltri (2-methoxyethoxy) silane, and N- (2-aminoethyl) -3-aminopropylmethyldimethoxysilane, N- (2-aminoethyl) -3-aminopropyltrimethoxysilane, 3-aminopropyltriethoxysilane, 3- Glycidoxypropyltrimethoxysilane (a product manufactured by Shin-Etsu Chemical Co., Ltd. and its model number is KBM-403), EPPN501H (manufactured by Nippon Kayaku Co., Ltd.), EPIKOTE 152 (manufactured by Shell Chemical Co., Ltd.), 3-epoxypropylene Oxypropylmethyldiethoxysilane, 2- (3,4-epoxycyclohexyl) ethyltrimethoxysilane, 3-chloropropylmethyldimethoxysilane, 3-chloropropyltrimethyl Compounds such as oxysilane, 3-methylpropionyloxypropyltrimethoxysilane, and 3-mercaptopropyltrimethoxysilane, or any combination thereof.

前述抗氧化劑之具體例可包含2,2-硫代雙(4-甲基-6-第三丁基苯酚)、2,6-二-第三丁基苯酚或上述化合物之任意組合。 Specific examples of the antioxidant may include 2,2-thiobis (4-methyl-6-tert-butylphenol), 2,6-di-tert-butylphenol, or any combination thereof.

前述防凝集劑之具體例可包含聚丙烯酸鈉等之化合物。 Specific examples of the anti-coagulation agent may include compounds such as sodium polyacrylate.

基於該鹼可溶性樹脂(A)之使用量為100重量份，添加劑(G)中之填充劑、密著促進劑、抗氧化劑、防凝集劑或鹼可溶性樹脂(A)以外之聚合物的使用量係不超過10重量份，且較佳係不超過6重量份。 Based on 100 parts by weight of the alkali-soluble resin (A), the amount of fillers, adhesion promoters, antioxidants, anti-coagulants, or polymers other than the alkali-soluble resin (A) in the additive (G) is used. It is not more than 10 parts by weight, and preferably not more than 6 parts by weight.

<黑色感光性樹脂組成物之製備> <Preparation of black photosensitive resin composition>

黑色感光性樹脂組成物的製備係將前述之鹼可溶性樹脂(A)、具有乙烯性不飽和基之化合物(B)、光起始劑(C)、溶劑(D)及黑色顏料(E)放置於攪拌器中攪拌，使其均勻混合成溶液狀態，必要時亦可添加環氧基的矽烷化合物(F)及/或添加劑(G)，予以均勻混合後，即可獲得溶液狀態之黑色感光性樹脂組成物。 The black photosensitive resin composition is prepared by placing the aforementioned alkali-soluble resin (A), the compound (B) having an ethylenically unsaturated group, the photoinitiator (C), the solvent (D), and the black pigment (E). Stir in a stirrer to uniformly mix into a solution state. If necessary, epoxy-based silane compounds (F) and / or additives (G) can also be added. After uniform mixing, the black state of the solution can be obtained. Resin composition.

其次，黑色感光性樹脂組成物的製備方法並沒有特別之限制。黑色顏料(E)可直接加至由鹼可溶性樹脂(A)、具有乙烯性不飽和基之化合物(B)、光起始劑(C)和溶劑(D)所組成的混合物中，而可分散形成前述溶液狀態之感光性樹脂組成物。或者，先將部份之黑色顏料(E)加至由部份鹼可溶性樹脂(A)及部份之溶劑(D)所組成之混合物中，以形成顏料分散液。然後，將其餘之鹼可溶性樹脂(A)、具有乙烯性不飽和基之化合物(B)、光起始劑(C)、其餘之溶劑(D)和剩餘之黑色顏料(E)加至前述之顏料分散液中，以製得溶液狀態之感光性樹脂組成物。 Second, the method for preparing the black photosensitive resin composition is not particularly limited. The black pigment (E) can be directly added to a mixture composed of an alkali-soluble resin (A), an ethylenically unsaturated compound (B), a photoinitiator (C), and a solvent (D), and can be dispersed. The photosensitive resin composition in the solution state is formed. Alternatively, a part of the black pigment (E) is first added to a mixture consisting of a part of the alkali-soluble resin (A) and a part of the solvent (D) to form a pigment dispersion. Then, the remaining alkali-soluble resin (A), the ethylenically unsaturated compound (B), the photoinitiator (C), the remaining solvent (D), and the remaining black pigment (E) are added to the foregoing. In the pigment dispersion, a photosensitive resin composition in a solution state is obtained.

上述黑色顏料(E)的分散步驟可藉由珠磨機(beads mill)或輥磨機(roll mill)等之混合器來進行。 The dispersing step of the black pigment (E) can be performed by a mixer such as a beads mill or a roll mill.

<黑色矩陣/黑色間隙體之製備> <Preparation of Black Matrix / Black Interstitial Body>

黑色矩陣係將上述的黑色感光性樹脂組成物塗佈在薄膜電晶體(thin film transistor；TFT)基板或透明基板上，並依序進行 預烤處理、曝光處理、顯影處理及後烤處理後即可製得，其方式可為(1)整合式彩色濾光片方式，其係將包含黑色矩陣及像素層之彩色濾光片設置於TFT元件基板側；或(2)整合式黑色矩陣方式，其係僅將黑色矩陣設置於TFT元件基板側，上述方式並沒有特別限制。當所製得之黑色矩陣的膜厚為2μm時，光學密度範圍可為3.0以上，較佳為3.2至5.5，且更佳為3.5至5.5。 The black matrix is formed by coating the above-mentioned black photosensitive resin composition on a thin film transistor (TFT) substrate or a transparent substrate in order. It can be prepared after pre-baking treatment, exposure treatment, development treatment and post-baking treatment. The method can be (1) integrated color filter method, which is a color filter including a black matrix and a pixel layer. The TFT element substrate side; or (2) the integrated black matrix method, in which the black matrix is provided only on the TFT element substrate side, and the above method is not particularly limited. When the film thickness of the obtained black matrix is 2 μm, the optical density range may be 3.0 or more, preferably 3.2 to 5.5, and more preferably 3.5 to 5.5.

另外，本發明之黑色矩陣係形成於TFT基板上，其方式可為(1)整合式彩色濾光片方式，其係將包含黑色矩陣及像素層之彩色濾光片設置於TFT元件基板側；或(2)整合式黑色矩陣方式，其係僅將黑色矩陣設置於TFT元件基板側，上述方式並沒有特別限制。 In addition, the black matrix of the present invention is formed on a TFT substrate, and the method thereof may be (1) an integrated color filter method in which a color filter including a black matrix and a pixel layer is disposed on a TFT element substrate side; Or (2) the integrated black matrix method, in which the black matrix is provided only on the TFT element substrate side, and the above method is not particularly limited.

若將上述之黑色感光性樹脂組成物用以製造黑色間隙體，則以上述相同方法形成，且黑色間隙體之厚度為3μm。以下詳述本發明之黑色矩陣/黑色間隙體的製備方法。 When the black photosensitive resin composition described above is used to produce a black gap body, it is formed in the same manner as described above, and the thickness of the black gap body is 3 μm. The method for preparing the black matrix / black gap body of the present invention is described in detail below.

首先，藉由旋轉塗佈(spin coating)或流延塗佈(cast coating)等之塗佈方式，將溶液狀態的黑色感光性樹脂組成物均勻地塗佈在基板上，以形成塗膜。上述基板之具體例可包含用於液晶顯示裝置等之薄膜電晶體(thin film transistor；TFT)基板或透明基板：無鹼玻璃、鈉鈣玻璃、硬質玻璃(派勒斯玻璃)、石英玻璃及於前述之玻璃上附著透明導電膜者；或者用於固體攝影裝置等之光電變換裝置基板(例如：矽基板)等。 First, a black photosensitive resin composition in a solution state is uniformly coated on a substrate by a coating method such as spin coating or cast coating to form a coating film. Specific examples of the above substrates may include thin film transistor (TFT) substrates or transparent substrates for liquid crystal display devices and the like: alkali-free glass, soda lime glass, hard glass (Pales glass), quartz glass, and A transparent conductive film is adhered to the aforementioned glass; or a substrate (for example, a silicon substrate) of a photoelectric conversion device used for a solid-state imaging device or the like.

形成塗膜之後，以減壓乾燥之方式去除大部份之溶劑。然後，以預烤(pre-bake)之方式去除剩餘之溶劑，以形成預烤塗膜。根據各成分之種類及比例的不同，前述之減壓乾燥及預烤的條件係隨之改變。減壓乾燥一般係在小於200mmHg之壓力下進行1秒至20秒，且預烤係在70℃至110℃對塗膜加熱處理1分鐘至15分鐘。 After the coating film is formed, most of the solvent is removed by drying under reduced pressure. Then, the remaining solvent is removed in a pre-bake manner to form a pre-bake coating film. According to the different types and proportions of the ingredients, the aforementioned conditions for reduced-pressure drying and pre-baking change accordingly. Drying under reduced pressure is generally performed at a pressure of less than 200 mmHg for 1 second to 20 seconds, and the pre-baking system heat-treats the coating film at 70 ° C to 110 ° C for 1 minute to 15 minutes.

接著，以具有特定圖案之光罩對前述之預烤塗膜進行 曝光處理。曝光處理所使用之光線可為g線、h線或i線等之紫外光，且紫外光之照射裝置可為(超)高壓水銀燈或金屬鹵素燈。 Next, the aforementioned pre-baking coating film is performed with a mask having a specific pattern. Exposure processing. The light used for the exposure processing may be ultraviolet light such as g-line, h-line, or i-line, and the ultraviolet light irradiation device may be (ultra-high pressure) mercury lamp or metal halide lamp.

進行曝光處理後，將前述曝光後之預烤塗膜浸漬於21℃至25℃之顯影液(developing solution)中，以去除上述未經曝光之部分的預烤塗膜，而可在基板上形成特定的圖案。 After the exposure process, the pre-baking coating film after the exposure is immersed in a developing solution at 21 ° C to 25 ° C to remove the pre-baking coating film of the unexposed part, and it can be formed on a substrate. Specific patterns.

前述之顯影液可為氫氧化鈉、氫氧化鉀、碳酸鈉、碳酸氫鈉、碳酸鉀、碳酸氫鉀、矽酸鈉、甲基矽酸鈉、氨水、乙胺、二乙胺、二甲基乙醇胺、氫氧化四甲胺、氫氧化四乙胺、膽鹼、吡咯、哌啶或1,8-二氮雜二環-[5,4,0]-7-十一烯等之鹼性化合物。該顯影液之濃度一般為0.001重量百分比至10重量百分比，較佳為0.005重量百分比至5重量百分比，且更佳為0.01重量百分比至1重量百分比。 The aforementioned developing solution may be sodium hydroxide, potassium hydroxide, sodium carbonate, sodium bicarbonate, potassium carbonate, potassium bicarbonate, sodium silicate, sodium methyl silicate, ammonia, ethylamine, diethylamine, dimethyl Basic compounds such as ethanolamine, tetramethylamine hydroxide, tetraethylamine hydroxide, choline, pyrrole, piperidine, or 1,8-diazabicyclo- [5,4,0] -7-undecene . The concentration of the developing solution is generally 0.001 to 10 weight percent, preferably 0.005 to 5 weight percent, and more preferably 0.01 to 1 weight percent.

進行顯影處理後，將具有特定圖案之基板以水洗淨，並利用壓縮空氣或壓縮氮氣風乾上述之基板。然後，以熱板或烘箱等加熱裝置進行後烤處理，即可於基板上形成黑色矩陣。後烤處理之溫度一般為150℃至250℃。當加熱裝置係使用熱板時，其加熱時間為5分鐘至60分鐘；當加熱裝置係使用烘箱時，其加熱時間為15分鐘至150分鐘。 After the development process, the substrate having a specific pattern is washed with water, and the above substrate is air-dried with compressed air or compressed nitrogen. Then, a post-baking process is performed with a heating device such as a hot plate or an oven to form a black matrix on the substrate. The post-baking temperature is generally 150 ° C to 250 ° C. When the heating device is a hot plate, the heating time is 5 minutes to 60 minutes; when the heating device is an oven, the heating time is 15 minutes to 150 minutes.

<彩色濾光片之製備方法> <Preparation method of color filter>

本發明之彩色濾光片之製備係先藉由旋轉塗佈、流延塗佈或輥式塗佈等塗布方式，將溶液狀態之彩色濾光片用的感光性樹脂組成物均勻地塗佈在前述具有黑色矩陣及/或黑色間隙體之基板上，以形成塗膜。 The color filter of the present invention is prepared by firstly applying a photosensitive resin composition for a color filter in a solution state by a coating method such as spin coating, cast coating, or roll coating. A coating film is formed on the aforementioned substrate having a black matrix and / or a black spacer.

形成塗膜後，藉由減壓乾燥去除大部份之溶劑，且以預烤之方式去除剩餘之溶劑，以形成預烤塗膜。其中，根據各成分之種類或比例的不同，減壓乾燥及預烤之條件係隨之改變。減壓乾燥一般係在0mmHg至200mmHg之壓力下進行1秒至60秒，且預烤係在70℃ 至110℃下對塗膜加熱處理1分鐘至15分鐘。 After the coating film is formed, most of the solvent is removed by drying under reduced pressure, and the remaining solvent is removed by pre-baking to form a pre-baking coating film. Among them, the conditions for reduced-pressure drying and pre-baking vary according to the type or ratio of each component. Drying under reduced pressure is generally performed at a pressure of 0mmHg to 200mmHg for 1 second to 60 seconds, and the pre-baking system is at 70 ° C. The coating film is heat-treated at 110 ° C for 1 minute to 15 minutes.

然後，以具有特定圖案之光罩對前述之預烤塗膜進行曝光處理。曝光處理所使用之光線可為g線、h線或i線等之紫外光，且紫外光之照射裝置可為(超)高壓水銀燈或金屬鹵素燈。 Then, the aforementioned pre-baked coating film is exposed with a photomask having a specific pattern. The light used for the exposure processing may be ultraviolet light such as g-line, h-line, or i-line, and the ultraviolet light irradiation device may be (ultra-high pressure) mercury lamp or metal halide lamp.

進行曝光處理後，將前述曝光後之預烤塗膜浸漬於21℃至25℃之顯影液(developing solution)中，以去除上述未經曝光之部分的預烤塗膜，而可在基板上形成特定的圖案。 After the exposure process, the pre-baking coating film after the exposure is immersed in a developing solution at 21 ° C to 25 ° C to remove the pre-baking coating film of the unexposed part, and it can be formed on a substrate. Specific patterns.

進行顯影處理後，將具有特定圖案之基板以水洗淨，並利用壓縮空氣或壓縮氮氣風乾上述之基板。然後，以熱板或烘箱等加熱裝置進行後烤處理。後烤處理之條件如前所述，在此不另贅述。重複上述之步驟，以形成紅、綠、藍等畫素著色層於基板上。 After the development process, the substrate having a specific pattern is washed with water, and the above substrate is air-dried with compressed air or compressed nitrogen. Then, post-baking treatment is performed with a heating device such as a hot plate or an oven. The conditions of the post-bake treatment are as described above, and are not repeated here. Repeat the above steps to form red, green and blue pixel color layers on the substrate.

接著，於220℃至250℃之真空環境下，利用濺鍍之方式形成ITO保護膜(蒸鍍膜)於前述畫素著色層之表面上。必要時，對ITO保護膜進行蝕刻與佈線，並在ITO保護膜表面塗佈液晶配向膜(液晶配向膜用聚醯亞胺)，而可形成具有畫素層的彩色濾光片。 Next, in a vacuum environment of 220 ° C. to 250 ° C., an ITO protective film (evaporated film) is formed on the surface of the pixel-colored layer by sputtering. If necessary, the ITO protective film is etched and wired, and a liquid crystal alignment film (polyimide for liquid crystal alignment film) is coated on the surface of the ITO protective film to form a color filter having a pixel layer.

<液晶顯示器之製備方法> <Preparation method of liquid crystal display>

將上述所製得之彩色濾光片及設有薄膜電晶體(thin film transistor；TFT)之基板作對向配置，並且在上述兩者之間設置間隙(晶胞間隔；cell gap)。然後，以黏著劑貼合彩色濾光片與上述基板的周圍部分並且留下注入孔。接著，在基板表面以及黏著劑所分隔出的間隙內由注入孔注入液晶，並封住注入孔，以形成液晶層。之後，將偏光板設置在彩色濾光片中接觸液晶層的另一側與基板中接觸液晶層的另一側，而可製成液晶顯示器。 The color filter and the substrate provided with a thin film transistor (TFT) are arranged opposite to each other, and a gap (cell gap) is provided between the two. Then, the color filter and a peripheral portion of the substrate are bonded with an adhesive, and an injection hole is left. Then, liquid crystal is injected through the injection hole in the gap between the substrate surface and the adhesive, and the injection hole is sealed to form a liquid crystal layer. After that, the polarizing plate is disposed on the other side of the color filter that contacts the liquid crystal layer and the other side of the substrate that contacts the liquid crystal layer, so that a liquid crystal display can be manufactured.

上述之液晶可為液晶化合物或液晶組成物，此處並未特別限定，惟可使用任何一種液晶化合物及液晶組成物。 The above liquid crystal may be a liquid crystal compound or a liquid crystal composition, which is not particularly limited here, but any liquid crystal compound and liquid crystal composition may be used.

【1】再者，彩色濾光片中所使用的液晶配向膜是用來限制液晶分 子的配向，且其沒有特別的限制，舉凡無機物或有機物任一者均可，並且本發明並不限於此。 [1] Furthermore, the liquid crystal alignment film used in the color filter is used to limit the liquid crystal separation. The orientation of the electrons is not particularly limited, and any inorganic or organic substance may be used, and the present invention is not limited thereto.

除上述方法外，具有本發明之樹脂黑色矩陣的液晶顯示裝置，亦可使用例如日本專利特開平4-253028號公報、特開平7-159772號公報、特開平9-311348號公報等中所揭示之眾所周知的方法而製造。又，本發明之樹脂黑色矩陣，特佳為安裝在Willem Den Boer，“Active Matrix Liquid Crystal Displays”(Newnes，2005，pp.141-142)等中所揭示之BOA方式等之液晶顯示裝置、或日本專利特開平10-206888號公報、特開2002-277899號公報等中所揭示之COA方式之液晶顯示裝置中。 In addition to the methods described above, the liquid crystal display device having the resin black matrix of the present invention can also be disclosed in, for example, Japanese Patent Laid-Open No. 4-253028, Japanese Patent Laid-Open No. 7-159772, Japanese Patent Laid-Open No. 9-311348 It is manufactured by a well-known method. In addition, the resin black matrix of the present invention is particularly preferably a liquid crystal display device such as a BOA method disclosed in Willem Den Boer, "Active Matrix Liquid Crystal Displays" (Newnes, 2005, pp. 141-142), or the like, or In the liquid crystal display device of the COA method disclosed in Japanese Patent Laid-Open No. 10-206888, Japanese Patent Laid-Open No. 2002-277899, and the like.

茲以下列實例予以詳細說明本發明，唯並不意謂本發明僅侷限於此等實例所揭示之內容。 The following examples are used to explain the present invention in detail, but it is not meant to limit the present invention to the contents disclosed in these examples.

<製備具有不飽和基的樹脂(A-1)> <Preparation of resin (A-1) having unsaturated group>

<製備例A-1-1> <Preparation Example A-1-1>

將100重量份的芴環氧化合物(型號ESF-300，新日鐵化學製；環氧當量231)、30重量份的丙烯酸、0.3重量份的氯化苄基三乙基銨、0.1重量份的2,6-二第三丁基對甲酚，及130重量份的丙二醇單甲基醚醋酸酯以連續式添加方式加入置500mL的四口燒瓶中，且入料速度控制在25重量份/分鐘，該反應過程的溫度維持在100℃至110℃，反應15小時，即可獲得固成分濃度為50wt%之淡黃色透明混合液。 100 parts by weight of a rhenium epoxy compound (model ESF-300, manufactured by Nippon Steel Chemical; epoxy equivalent 231), 30 parts by weight of acrylic acid, 0.3 parts by weight of benzyltriethylammonium chloride, and 0.1 parts by weight of 2,6-Di-tert-butyl p-cresol, and 130 parts by weight of propylene glycol monomethyl ether acetate were continuously added to a 500 mL four-necked flask, and the feed rate was controlled at 25 parts by weight / minute. The temperature of the reaction process is maintained at 100 ° C to 110 ° C, and the reaction is performed for 15 hours to obtain a light yellow transparent mixed solution with a solid content concentration of 50% by weight.

接著，將100重量份的上述所得的淡黃色透明混合液溶於25重量份的乙二醇乙醚醋酸酯中，並同時添加6重量份的四氫鄰苯二甲酸酐及13重量份的二苯甲酮四甲酸二酐，並加熱至110℃至115℃，反應2小時，即可得一酸價為98.0mgKOH/g之具有不飽和基的樹脂(以下簡稱為A-1-1)。 Next, 100 parts by weight of the light yellow transparent mixed solution obtained above was dissolved in 25 parts by weight of ethylene glycol ether acetate, and 6 parts by weight of tetrahydrophthalic anhydride and 13 parts by weight of dibenzene were added simultaneously. The ketone tetracarboxylic dianhydride is heated to 110 ° C. to 115 ° C. and reacted for 2 hours to obtain a resin having an unsaturated group with an acid value of 98.0 mgKOH / g (hereinafter referred to as A-1-1).

<製備例A-1-2> <Preparation Example A-1-2>

將100重量份的芴環氧化合物(型號ESF-300，新日鐵化學製；環氧當量231)、30重量份的丙烯酸、0.3重量份的氯化苄基三乙基銨、0.1重量份的2,6-二第三丁基對甲酚，及130重量份的丙二醇單甲基醚醋酸酯以連續式添加方式加入置500mL的四口燒瓶中，且入料速度控制在25重量份/分鐘，該反應過程的溫度維持在100℃至110℃，反應15小時，即可獲得一固成分濃度為50wt%之淡黃色透明混合液。 100 parts by weight of a rhenium epoxy compound (model ESF-300, manufactured by Nippon Steel Chemical; epoxy equivalent 231), 30 parts by weight of acrylic acid, 0.3 parts by weight of benzyltriethylammonium chloride, and 0.1 parts by weight of 2,6-Di-tert-butyl p-cresol, and 130 parts by weight of propylene glycol monomethyl ether acetate were continuously added to a 500 mL four-necked flask, and the feed rate was controlled at 25 parts by weight / minute. The temperature of the reaction process is maintained at 100 ° C to 110 ° C, and the reaction is performed for 15 hours to obtain a light yellow transparent mixed solution with a solid content concentration of 50% by weight.

接著，將100重量份的上述所得的淡黃色透明混合液溶於25重量份的乙二醇乙醚醋酸酯中，並添加13重量份的二苯甲酮四甲酸二酐，在90℃至95℃下反應2小時，接著，添加6重量份的四氫鄰苯二甲酸酐，並於90℃至95℃下反應4小時，即可得一酸價為99.0mgKOH/g之具有不飽和基的樹脂(以下簡稱為A-1-2)。 Next, 100 parts by weight of the light yellow transparent mixed solution obtained above was dissolved in 25 parts by weight of ethylene glycol ether acetate, and 13 parts by weight of benzophenonetetracarboxylic dianhydride was added, and the temperature was 90 ° C to 95 ° C. React for 2 hours, then add 6 parts by weight of tetrahydrophthalic anhydride, and react at 90 ° C to 95 ° C for 4 hours to obtain a resin having an unsaturated group having an acid value of 99.0 mgKOH / g (Hereinafter referred to as A-1-2).

<製備例A-1-3> <Preparation Example A-1-3>

將400重量份的環氧化合物[型號NC-3000，日本化藥(株)製；環氧當量288]、102重量份的丙烯酸、0.3重量份的對甲氧基酚、5重量份的三苯基膦，及264重量份的丙二醇單甲基醚醋酸酯置於反應瓶中，該反應過程的溫度維持在95℃，反應9小時，即可獲得一酸價為2.2mgKOH/g之中間產物。接著，加入151重量份的四氫鄰苯二甲酸酐，在95℃下反應4小時，即可得一酸價為102mgKOH/g、且重量平均分子量為3,200之具有不飽和基的樹脂(以下簡稱為A-1-3)。 400 parts by weight of an epoxy compound [model NC-3000, manufactured by Nippon Kayaku Co., Ltd .; epoxy equivalent 288], 102 parts by weight of acrylic acid, 0.3 parts by weight of p-methoxyphenol, and 5 parts by weight of triphenyl The phosphine and 264 parts by weight of propylene glycol monomethyl ether acetate were placed in a reaction bottle. The temperature of the reaction process was maintained at 95 ° C and the reaction was performed for 9 hours to obtain an intermediate product having an acid value of 2.2 mgKOH / g. Next, 151 parts by weight of tetrahydrophthalic anhydride was added and reacted at 95 ° C for 4 hours to obtain a resin having an unsaturated group (hereinafter abbreviated as abbreviation hereinafter) having an acid value of 102 mgKOH / g and a weight average molecular weight of 3,200. A-1-3).

<製備其他鹼可溶性樹脂(A-2)> <Preparation of other alkali-soluble resins (A-2)>

<製備例A-2-1> <Preparation Example A-2-1>

將1重量份的2,2’-偶氮雙異丁腈、240重量份的丙二醇單甲基醚醋酸酯、20重量份的甲基丙烯酸、15重量份的苯乙烯、35重量份的甲基丙烯酸苯甲酯、10重量份的甘油單甲基丙烯酸脂及20重量 份的氮-苯基馬來醯亞胺置於一裝有攪拌器及冷凝器之圓底燒瓶中，並使該燒瓶內部充滿氮氣，之後，緩慢攪伴並升溫至80℃，使各反應物均勻混合並進行聚合反應4小時。之後，再將其升溫至100℃，並添加0.5重量份的2,2’-偶氮二異丁腈進行1小時聚合後，即可得一其它鹼可溶性樹脂(以下簡稱為A-2-1)。 1 part by weight of 2,2'-azobisisobutyronitrile, 240 parts by weight of propylene glycol monomethyl ether acetate, 20 parts by weight of methacrylic acid, 15 parts by weight of styrene, and 35 parts by weight of methyl Benzyl acrylate, 10 parts by weight of glycerol monomethacrylate and 20 parts by weight Parts of nitrogen-phenylmaleimide were placed in a round-bottomed flask equipped with a stirrer and a condenser, and the inside of the flask was filled with nitrogen. After that, the reaction was slowly stirred and the temperature was raised to 80 ° C to make each reactant The mixture was uniformly mixed and polymerized for 4 hours. After that, the temperature was further increased to 100 ° C, and 0.5 parts by weight of 2,2'-azobisisobutyronitrile was added for polymerization for 1 hour to obtain another alkali-soluble resin (hereinafter referred to as A-2-1). ).

<製備例A-2-2> <Preparation example A-2-2>

將2重量份的2,2’-偶氮雙異丁腈、300重量份的二丙二醇甲基醚、15重量份的甲基丙烯酸、15重量份的2-羥基丙烯酸乙酯及70重量份的甲基丙烯酸苯甲酯置於一裝有攪拌器及冷凝器之圓底燒瓶中，並使該燒瓶內部充滿氮氣，之後，緩慢攪伴並升溫至80℃，使各反應物均勻混合並進行聚合反應3小時。之後，再將其升溫至100℃，並添加0.5重量份的2,2’-偶氮二異丁腈進行1小時聚合後，即可得一其他鹼可溶性樹脂(以下簡稱為A-2-2)。 2 parts by weight of 2,2'-azobisisobutyronitrile, 300 parts by weight of dipropylene glycol methyl ether, 15 parts by weight of methacrylic acid, 15 parts by weight of ethyl 2-hydroxyacrylate, and 70 parts by weight of The benzyl methacrylate was placed in a round-bottomed flask equipped with a stirrer and a condenser, and the inside of the flask was filled with nitrogen. After that, it was slowly stirred and heated to 80 ° C, so that the reactants were uniformly mixed and polymerized. Reaction for 3 hours. After that, the temperature was further increased to 100 ° C, and 0.5 parts by weight of 2,2'-azobisisobutyronitrile was added for polymerization for 1 hour to obtain another alkali-soluble resin (hereinafter referred to as A-2-2). ).

<實施例> <Example>

<製備黑色感光性樹脂組成物> <Preparation of black photosensitive resin composition>

<實施例1> <Example 1>

將100重量份前述之鹼可溶性樹脂A-1-1、30重量份的二季戊四醇六丙烯酸酯(以下簡稱為B-2-1)、0.1重量份的第一光起始劑(C-1-1；如式(I-1)之化合物)、0.2重量份的1-氯-4-丙氧基噻噸酮(C-2-1)、0.1重量份的1-[9-乙基-6-(2-甲基苯甲醯基)-9H-咔唑-3-取代基]-乙烷酮-1-(O-乙醯基肟)(以下簡稱為C-3-1)、10重量份的第一黑色顏料(E-1-1)、5重量份的第二黑色顏料(商品名MA220；以下簡稱為E-2-1)及0.5重量份的3-縮水甘油醚基丙基三甲氧基矽烷(F-1)加至300重量份的丙二醇單甲基醚醋酸酯(以下簡稱為D-1)中，並以搖動式攪拌器(shaking type stirrer)攪拌均勻後，即可製得實施例1之黑色感光性樹脂組成物。所得之感光性樹脂組成物以下述介電常數和高精細度圖案 的直線性之評價方式進行評價，所得結果如表1所示。 100 parts by weight of the aforementioned alkali-soluble resin A-1-1, 30 parts by weight of dipentaerythritol hexaacrylate (hereinafter abbreviated as B-2-1), and 0.1 parts by weight of a first photoinitiator (C-1- 1; such as a compound of formula (I-1)), 0.2 parts by weight of 1-chloro-4-propoxythioxanthone (C-2-1), 0.1 parts by weight of 1- [9-ethyl-6 -(2-methylbenzyl) -9H-carbazole-3-substituent] -ethanone-1- (O-acetamidooxime) (hereinafter referred to as C-3-1), 10 weight Parts of the first black pigment (E-1-1), 5 parts by weight of the second black pigment (trade name MA220; hereinafter referred to as E-2-1) and 0.5 parts by weight of 3-glycidyl ether propyltrimethyl Oxysilane (F-1) is added to 300 parts by weight of propylene glycol monomethyl ether acetate (hereinafter abbreviated as D-1), and the mixture is stirred with a shaking type stirrer to obtain a mixture. The black photosensitive resin composition of Example 1. The obtained photosensitive resin composition has the following dielectric constant and high-definition pattern The linearity was evaluated by the evaluation method, and the obtained results are shown in Table 1.

<實施例2至13及比較例1至5> <Examples 2 to 13 and Comparative Examples 1 to 5>

實施例2至13及比較例1至5係使用與實施例1之黑色感光性樹脂組成物的製作方法相同之製備方法，不同之處在於實施例2至13及比較例1至5係改變黑色感光性樹脂組成物中原料的種類及使用量，且其配方及評價結果分別如表1及表2所示，在此不另贅述。 Examples 2 to 13 and Comparative Examples 1 to 5 use the same production method as the method for producing the black photosensitive resin composition of Example 1, except that Examples 2 to 13 and Comparative Examples 1 to 5 change the black color. The types and amounts of the raw materials in the photosensitive resin composition are shown in Tables 1 and 2 respectively, and are not repeated here.

<評價方式> <Evaluation method>

<高精細度圖案的直線性> <Linearity of high-definition pattern>

將上述各實施例及比較例的黑色感光性樹脂組成物以旋轉塗佈的方式塗佈在100mm×100mm的玻璃基板上。然後，於約100毫米汞柱(mmHg)的壓力下進行減壓乾燥約30秒鐘。接著，將上述的玻璃基板置於80℃下預烤3分鐘，以形成膜厚為2.5微米的預烤塗膜。之後，隔著具有25微米[間距(pitch)50微米]的條狀圖案的光罩，使用曝光機(Canon製造，型號為PLA-501F)以300毫焦/平方公分(mJ/cm2)的紫外光照射上述的預烤塗膜。使用紫外光照射後，將預烤塗膜浸漬於23℃的顯影液2分鐘。之後，以純水洗淨上述預烤塗膜，並以200℃對預烤塗膜進行後烤80分鐘，即可在玻璃基板上形成膜厚為2.0微米的黑色圖案。 The black photosensitive resin composition of each of the above Examples and Comparative Examples was applied on a glass substrate of 100 mm × 100 mm by spin coating. Then, it is dried under reduced pressure for about 30 seconds under a pressure of about 100 millimeters of mercury (mmHg). Next, the glass substrate was pre-baked at 80 ° C. for 3 minutes to form a pre-baked coating film having a film thickness of 2.5 μm. Thereafter, an exposure machine (manufactured by Canon, model PLA-501F) was used at a rate of 300 mJ / cm 2 (mJ / cm 2 ) through a photomask having a stripe pattern of 25 μm [pitch 50 μm]. Ultraviolet light was irradiated to the above-mentioned pre-baked coating film. After irradiation with ultraviolet light, the pre-bake coating film was immersed in a developing solution at 23 ° C. for 2 minutes. Thereafter, the pre-baked coating film was washed with pure water, and the pre-baked coating film was post-baked at 200 ° C. for 80 minutes to form a black pattern having a thickness of 2.0 μm on the glass substrate.

利用光學顯微鏡對上述方法所形成的條狀圖案進行觀察，並依據下列基準評價高精細度的圖案直線性：◎：90%以上的高精細度圖案的直線性良好；○：80%以上，小於90%的高精細度圖案的直線性良好；△：70%以上，小於80%的高精細度圖案的直線性良好；╳：小於70%的高精細度圖案的直線性良好。 Observe the stripe pattern formed by the above method with an optical microscope, and evaluate the linearity of the high-definition pattern according to the following criteria: ◎: 90% or more of the high-definition pattern has good linearity; ○: 80% or more, less than 90% of high-definition patterns have good linearity; △: 70% or more, less than 80% of high-definition patterns have good linearity; ╳: Less than 70% of high-definition patterns have good linearity.

<介電常數> <Dielectric constant>

於藉由濺鍍法形成有厚度為150nm之ITO膜的玻璃基板上，於與上述相同之條件下，於整個面上形成黑色圖案，而製作ITO基板。將該樣品之ITO基板作為主電極，藉由蒸鍍法，於樹脂黑色矩陣上形成金的對向電極。使用HP公司(現為Agilent公司)製造之4284A型LCR計，測定參照信號之頻率為1KHz、振幅為1V之等效並聯電容而求得介電常數。並依據下列基準評價介電常數：◎：介電常數為未滿3.5；○：介電常數為3.5以上且未滿4；△：介電常數為4以上且未滿5；╳：介電常數為5以上。 A black pattern was formed on the entire surface of a glass substrate on which a ITO film having a thickness of 150 nm was formed by a sputtering method under the same conditions as described above to prepare an ITO substrate. Using the ITO substrate of this sample as the main electrode, a gold counter electrode was formed on the resin black matrix by a vapor deposition method. A 4284A LCR meter manufactured by HP (now Agilent) was used to measure the equivalent parallel capacitance of the reference signal at a frequency of 1 KHz and an amplitude of 1 V to obtain the dielectric constant. The dielectric constant was evaluated based on the following criteria: ◎: Dielectric constant is less than 3.5; ○: Dielectric constant is 3.5 or more and less than 4; △: Dielectric constant is 4 or more and less than 5; ╳: Dielectric constant It is 5 or more.

上述實施例僅為說明本發明之原理及其功效，而非限制本發明。習於此技術之人士對上述實施例所做之修改及變化仍不違背本發明之精神。本發明之權利範圍應如後述之申請專利範圍所列。 The above embodiments are only for explaining the principle of the present invention and its effects, but not for limiting the present invention. Modifications and changes made by those skilled in the art to the above embodiments still do not violate the spirit of the present invention. The scope of rights of the present invention should be listed in the scope of patent application described later.

Claims (14)

一種黑色感光性樹脂組成物，包含：鹼可溶性樹脂(A)；具有乙烯性不飽和基之化合物(B)；光起始劑(C)；溶劑(D)；及黑色顏料(E)，其中：該具有乙烯性不飽和基之化合物(B)包含一具有乙烯性不飽和基之第一化合物(B-1)，該具有乙烯性不飽和基之第一化合物(B-1)包含一具有式(B-I)所示結構之化合物：於式(B-I)中，R1b為氫原子或甲基；R2b為氫原子、丙烯醯基或甲基丙烯醯基；及b為2至3之整數；該光起始劑(C)包含一具有式(C-I)所示結構之第一光起始劑(C-1)：於式(C-I)中，R1、R2、R3、R4、R5、R6、R7及R8彼此獨立地為氫，或R1及R2、R3及R4或R5及R6彼此獨立地共同為但條件為R1及R2、R3及R4或R5及R6中至少一對為或R2係、COR16、NO2或或R7係或COR16；R9、R11及R12係氫；R10係氫、OR17或COR16；X係CO或直接鍵；R13係C1-C20烷基，其係未經取代或經一或多個以下基團取代：鹵素、R17、OR17、SR18或PO(OCkH2k+1)2；或R13係C2-C20烷基，其間雜有一或多個O；或R13係苯基；k係整數2；R14係C1-C20烷基或噻吩基；R15係苯基或萘基，其各係未經取代或經一或多個OR17或C1-C20烷基取代；或R15係噻吩基、氫、C1-C20烷基，該C1-C20烷基係未經取代或經一或多個以下基團取代：OR17、SR18、C3-C8環烷基、NR19R20或COOR17；或R15係C2-C20烷基，其間雜有SO2；R16係苯基或萘基，其各係未經取代或經一或多個以下基團取代：OR17、SR18、NR19R20或C1-C20烷基；或R16係噻吩基；R17係氫、C1-C8烷醯基、C1-C20烷基，該C1-C20烷基係未經取代或經一或多個以下基團取代：鹵素、O(CO)-(C1-C4烷基)、O(CO)-(C2-C4)烯基或間雜有一或多個O之C3-C20環烷基；或R17係C2-C20烷基，其間雜有一或多個O；R18係C3-C20環烷基、C1-C20烷基，其係未經取代或經一或多個OH、O(CO)-(C2-C4)烯基或(CO)OR17取代；或R18係苯基，其係未經取代或經一或多個鹵素取代；R19及R20彼此獨立地為C1-C8烷醯基或C1-C8烷醯基氧基；或R19及R20與其所附接之N原子一起形成間雜有O之5員或6員飽和環；但條件為在該分子中存在至少一個基團該黑色顏料(E)包含一第一黑色顏料(E-1)，其中該第一黑色顏料(E-1)包含一具有式(E-I)所示之化合物、其幾何異構物、其鹽、或其幾何異構物之鹽：於式(E-I)中，R1e及R6e相互獨立為氫原子、CH3、CF3、氟原子或氯原子；R2e、R3e、R4e、R5e、R7e、R8e、R9e及R10e係和其他全部相互獨立為氫原子、鹵素原子、R11e、COOH、COOR11e、COO-、CONH2、CONHR11e、CONR11eR12e、CN、OH、OR11e、COCR11e、OOCNH2、OOCNHR11e、OOCNR11eR12e、NO2、NH2、NHR11e、NRR11eR12e、NHCOR12e、NR11eCOR12e、N=CH2、N=CHR11e、N=CR11eR12e、SH、SR11e、SOR11e、SO2R11e、SO3R11e、SO3H、SO3-、SO2NH2、SO2NHR11e或SO2NR11eR12e；且選自由R2e與R3e、R3e與R4e、R4e與R5e、R7e與R8e、R8e與R9e、及R9e與R10e所組成之群組中之至少1個組合，係為相互直接鍵結，或者藉由氧原子、硫原子、NH或NR11e橋接而相互鍵結；R11e及R12e相互獨立為碳數1至12之烷基、碳數3至12之環烷基、碳數2至12之烯基、碳數3至12之環烯基或碳數2至12之炔基。A black photosensitive resin composition comprising: an alkali-soluble resin (A); a compound (B) having an ethylenically unsaturated group; a photoinitiator (C); a solvent (D); and a black pigment (E), wherein : The compound (B) having an ethylenically unsaturated group includes a first compound (B-1) having an ethylenically unsaturated group, and the first compound (B-1) having an ethylenically unsaturated group includes a compound having Compounds of the structure represented by formula (BI): In formula (BI), R 1b is a hydrogen atom or a methyl group; R 2b is a hydrogen atom, an acrylfluorenyl group or a methacrylfluorenyl group; and b is an integer from 2 to 3; A first photoinitiator (C-1) having a structure represented by formula (CI): In formula (CI), R 1 , R 2 , R 3 , R 4 , R 5 , R 6 , R 7 and R 8 are each independently hydrogen, or R 1 and R 2 , R 3 and R 4 or R 5 and R 6 independently of each other are Provided that at least one of R 1 and R 2 , R 3 and R 4 or R 5 and R 6 is Or R 2 series , COR 16 , NO 2 or Or R 7 series Or COR 16; R 9, R 11 and R 12 hydrogen system; R 10-based hydrogen, OR 17 or COR 16; X based CO or a direct bond; R 13 lines C 1 -C 20 alkyl which is unsubstituted or based Substituted by one or more of the following groups: halogen, R 17 , OR 17 , SR 18 or PO (OC k H 2k + 1 ) 2 ; or R 13 is a C 2 -C 20 alkyl group with one or more intervening in between O; or R 13 is phenyl; k is integer 2; R 14 is C 1 -C 20 alkyl or thienyl; R 15 is phenyl or naphthyl, each of which is unsubstituted or undergoes one or more OR 17 or C 1 -C 20 alkyl substitution; or R 15 is thienyl, hydrogen, C 1 -C 20 alkyl, the C 1 -C 20 alkyl is unsubstituted or substituted with one or more of the following groups : OR 17 , SR 18 , C 3 -C 8 cycloalkyl, NR 19 R 20 or COOR 17 ; or R 15 is C 2 -C 20 alkyl with SO 2 interposed therebetween; R 16 is phenyl or naphthyl , Each of which is unsubstituted or substituted with one or more of the following groups: OR 17 , SR 18 , NR 19 R 20 or C 1 -C 20 alkyl; or R 16 is thienyl; R 17 is hydrogen, C 1- C 8 alkyl, C 1 -C 20 alkyl, the C 1 -C 20 alkyl is unsubstituted or substituted with one or more of the following groups: halogen, O (CO)-(C 1- C 4 alkyl), O (CO)-( C 2 -C 4 ) alkenyl or C 3 -C 20 cycloalkyl with one or more O interspersed; or R 17 is C 2 -C 20 alkyl with one or more O interspersed between them; R 18 is C 3 -C 20 cycloalkyl, C 1 -C 20 alkyl, which are unsubstituted or substituted with one or more OH, O (CO)-(C 2 -C 4 ) alkenyl, or (CO) OR 17 ; R 18 lines or phenyl, which is unsubstituted or system with one or more halo substituents; R 19 and R 20 independently of one another C 1 -C 8 alkanoyl group or a C 1 -C 8 alkyl acyl group; Or R 19 and R 20 together with the N atom to which they are attached form a 5- or 6-membered saturated ring interspersed with O; provided that at least one group is present in the molecule The black pigment (E) includes a first black pigment (E-1), wherein the first black pigment (E-1) includes a compound having a formula (EI), a geometric isomer thereof, a salt thereof, Or its geometric isomer salt: In formula (EI), R 1e and R 6e are each independently a hydrogen atom, CH 3 , CF 3 , fluorine atom or chlorine atom; R 2e , R 3e , R 4e , R 5e , R 7e , R 8e , R 9e And R 10e series and all others are hydrogen atom, halogen atom, R 11e , COOH, COOR 11e , COO-, CONH 2 , CONHR 11e , CONR 11e R 12e , CN, OH, OR 11e , COCR 11e , OOCNH 2 , OOCNHR 11e , OOCNR 11e R 12e , NO 2 , NH 2 , NHR 11e , NRR 11e R 12e , NHCOR 12e , NR 11e COR 12e , N = CH 2 , N = CHR 11e , N = CR 11e R 12e , SH, SR 11e , SOR 11e , SO 2 R 11e , SO 3 R 11e , SO 3 H, SO 3- , SO 2 NH 2 , SO 2 NHR 11e, or SO 2 NR 11e R 12e ; and selected from R 2e and R 3e , the group consisting of R 3e and R 4e, R 4e and R 5e, R 7e and R 8e, R 8e and R 9e, R 9e and R 10e, and the composition is at least 1, each system is a direct bond, or Bonded to each other by bridging with oxygen atom, sulfur atom, NH or NR 11e ; R 11e and R 12e are independently of each other alkyl groups having 1 to 12 carbon atoms, cycloalkyl groups having 3 to 12 carbon atoms, and 2 to 12 carbon atoms Alkenyl, cycloalkenyl having 3 to 12 carbons, or alkynyl having 2 to 12 carbons. 根據請求項1之黑色感光性樹脂組成物，其中該鹼可溶性樹脂(A)包括一具有不飽和基的樹脂(A-1)，其中該具有不飽和基的樹脂(A-1)係由一混合物進行聚合反應所製得，且該混合物包含具有至少二個環氧基的環氧化合物(a-1-1)，以及具有至少一個羧酸基及至少一個乙烯性不飽和基的化合物(a-1-2)。The black photosensitive resin composition according to claim 1, wherein the alkali-soluble resin (A) includes a resin (A-1) having an unsaturated group, and the resin (A-1) having an unsaturated group is composed of a The mixture is prepared by polymerization, and the mixture includes an epoxy compound (a-1-1) having at least two epoxy groups, and a compound (a) having at least one carboxylic acid group and at least one ethylenically unsaturated group. -1-2). 根據請求項2之黑色感光性樹脂組成物，其中該具有至少二個環氧基之環氧化合物(a-1-1)包含一具有式(I)所示結構之化合物、具有式(II)所示結構之化合物或上述化合物之組合：於式(I)中，R1a至該R4a分別獨立地表示氫原子、鹵素原子、碳數為1至5之烷基、碳數為1至5之烷氧基、碳數為6至12之芳香基或碳數為6至12之芳烷基；及於式(II)中，R5a至R18a分別獨立地表示氫原子、鹵素原子、碳數為1至8之烷基或碳數為6至15之芳香基；且a表示0至10之整數。The black photosensitive resin composition according to claim 2, wherein the epoxy compound (a-1-1) having at least two epoxy groups includes a compound having a structure represented by formula (I) and a compound having formula (II) Compound of the structure shown or a combination of the above: In formula (I), R 1a to R 4a each independently represent a hydrogen atom, a halogen atom, an alkyl group having 1 to 5 carbon atoms, an alkoxy group having 1 to 5 carbon atoms, and 6 to 12 carbon atoms. An aromatic group or an aralkyl group having 6 to 12 carbons; and In the formula (II), R 5a to R 18a each independently represent a hydrogen atom, a halogen atom, an alkyl group having a carbon number of 1 to 8 carbon atoms or of an aromatic group of 6 to 15; and a represents an integer of 0 to 10 . 根據請求項2之黑色感光性樹脂組成物，其中基於該鹼可溶性樹脂(A)之使用量為100重量份，該具有不飽和基之樹脂(A-1)之使用量為30重量份至100重量份。The black photosensitive resin composition according to claim 2, wherein the amount of use of the alkali-soluble resin (A) is 100 parts by weight, and the amount of use of the resin (A-1) having an unsaturated group is 30 to 100 parts by weight Parts by weight. 根據請求項1之黑色感光性樹脂組成物，其中基於該鹼可溶性樹脂(A)之使用量為100重量份，該具有乙烯性不飽和基之第一化合物(B-1)之使用量為30重量份至300重量份。The black photosensitive resin composition according to claim 1, wherein the used amount of the alkali-soluble resin (A) is 100 parts by weight, and the used amount of the first compound (B-1) having an ethylenically unsaturated group is 30. Part by weight to 300 parts by weight. 根據請求項1之黑色感光性樹脂組成物，其中基於該鹼可溶性樹脂(A)之使用量為100重量份，該第一光起始劑(C-1)之使用量為0.3重量份至30重量份。The black photosensitive resin composition according to claim 1, wherein the used amount of the alkali-soluble resin (A) is 100 parts by weight, and the used amount of the first photoinitiator (C-1) is 0.3 to 30 parts by weight Parts by weight. 根據請求項1之黑色感光性樹脂組成物，其中該光起始劑(C)包含一具有式(C-II)所示結構之第二光起始劑(C-2)：於式(C-II)中，該E27獨立地表示選自於氫原子、碳數為1至12的烷基、碳數為1至12的烷氧基或鹵素原子。The black photosensitive resin composition according to claim 1, wherein the photoinitiator (C) includes a second photoinitiator (C-2) having a structure represented by the formula (C-II): In formula (C-II), E 27 independently represents a hydrogen atom, an alkyl group having 1 to 12 carbon atoms, an alkoxy group having 1 to 12 carbon atoms, or a halogen atom. 根據請求項7之黑色感光性樹脂組成物，其中基於該鹼可溶性樹脂(A)之使用量為100重量份，該第二光起始劑(C-2)之使用量為0.2重量份至2重量份。The black photosensitive resin composition according to claim 7, wherein the used amount of the alkali-soluble resin (A) is 100 parts by weight, and the used amount of the second photoinitiator (C-2) is 0.2 to 2 parts by weight Parts by weight. 根據請求項1之黑色感光性樹脂組成物，其中於式(E-I)中，R2e、R4e、R5e、R7e、R9e及R10e相互獨立為氫原子、氟原子或氯原子，R3e及R8e相互獨立為氫原子、NO2、OCH3、OC2H5、溴原子、氯原子、CH3、C2H5、N(CH3)2、N(CH3)(C2H5)、N(C2H5)2、α-萘基、β-萘基、SO3H或SO3-，R1e與R6e相同，R2e與R7e相同，R3e與R8e相同，R4e與R9e相同，R5e與R10e相同。The black photosensitive resin composition according to claim 1, wherein in the formula (EI), R 2e , R 4e , R 5e , R 7e , R 9e, and R 10e are each independently a hydrogen atom, a fluorine atom, or a chlorine atom, and R 3e and R 8e are independently hydrogen atom, NO 2 , OCH 3 , OC 2 H 5 , bromine atom, chlorine atom, CH 3 , C 2 H 5 , N (CH 3 ) 2 , N (CH 3 ) (C 2 H 5 ), N (C 2 H 5 ) 2 , α-naphthyl, β-naphthyl, SO 3 H or SO 3- , R 1e is the same as R 6e , R 2e is the same as R 7e , and R 3e is R 8e Same, R 4e is the same as R 9e , and R 5e is the same as R 10e . 根據請求項1之黑色感光性樹脂組成物，其中基於該鹼可溶性樹脂(A)之使用量為100重量份，該黑色顏料(E-1)之使用量為15重量份至150重量份。The black photosensitive resin composition according to claim 1, wherein the use amount of the alkali-soluble resin (A) is 100 parts by weight, and the use amount of the black pigment (E-1) is 15 to 150 parts by weight. 根據請求項1之黑色感光性樹脂組成物，其中基於該鹼可溶性樹脂(A)之使用量為100重量份，該具有乙烯性不飽和基之化合物(B)的使用量為30重量份至300重量份；該光起始劑(C)之使用量為0.4重量份至40重量份；該溶劑(D)之使用量為300重量份至3000重量份；及該黑色顏料(E)之使用量為15重量份至150重量份。The black photosensitive resin composition according to claim 1, wherein the use amount of the alkali-soluble resin (A) is 100 parts by weight, and the use amount of the compound having an ethylenically unsaturated group (B) is 30 parts by weight to 300. Parts by weight; the use amount of the photoinitiator (C) is 0.4 to 40 parts by weight; the use amount of the solvent (D) is 300 to 3,000 parts by weight; and the use amount of the black pigment (E) It is 15 parts by weight to 150 parts by weight. 根據請求項1之黑色感光性樹脂組成物，其進一步包括含環氧基之矽烷化合物(F)。The black photosensitive resin composition according to claim 1, further comprising an epoxy group-containing silane compound (F). 一種黑色圖案，其係藉由根據請求項1至12中任一項之黑色感光性樹脂組成物經一預烤處理、一曝光處理、一顯影處理及一後烤處理所形成。A black pattern is formed by subjecting the black photosensitive resin composition according to any one of claims 1 to 12 to a pre-baking process, an exposure process, a developing process, and a post-baking process. 一種液晶顯示器，其包含根據請求項13中之黑色圖案。A liquid crystal display including a black pattern according to claim 13.
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TW201226393A (en) 2010-10-05 2012-07-01 Basf Se Oxime ester
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