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TWI629568B - Illumination device and exposure device including the same - Google Patents

Illumination device and exposure device including the same Download PDF

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Publication number
TWI629568B
TWI629568B TW103125455A TW103125455A TWI629568B TW I629568 B TWI629568 B TW I629568B TW 103125455 A TW103125455 A TW 103125455A TW 103125455 A TW103125455 A TW 103125455A TW I629568 B TWI629568 B TW I629568B
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Taiwan
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light
illuminance
illumination
frequency
light source
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TW103125455A
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Chinese (zh)
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TW201514632A (en
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Akiyoshi Fujimori
藤森昭芳
Tomohiko HONDA
本多友彥
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Orc Manufacturing Co., Ltd.
日商奧克製作所股份有限公司
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Publication of TW201514632A publication Critical patent/TW201514632A/en
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Publication of TWI629568B publication Critical patent/TWI629568B/en

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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01JMEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00Photometry, e.g. photographic exposure meter
    • G01J1/02Details
    • G01J1/04Optical or mechanical part supplementary adjustable parts
    • G01J1/0407Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings
    • G01J1/0411Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings using focussing or collimating elements, i.e. lenses or mirrors; Aberration correction
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B47/00Circuit arrangements for operating light sources in general, i.e. where the type of light source is not relevant
    • H05B47/10Controlling the light source
    • H05B47/175Controlling the light source by remote control
    • H05B47/185Controlling the light source by remote control via power line carrier transmission
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01JMEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00Photometry, e.g. photographic exposure meter
    • G01J1/02Details
    • G01J1/04Optical or mechanical part supplementary adjustable parts
    • G01J1/0407Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings
    • G01J1/0414Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings using plane or convex mirrors, parallel phase plates, or plane beam-splitters
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01JMEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00Photometry, e.g. photographic exposure meter
    • G01J1/02Details
    • G01J1/08Arrangements of light sources specially adapted for photometry standard sources, also using luminescent or radioactive material
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01JMEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00Photometry, e.g. photographic exposure meter
    • G01J1/10Photometry, e.g. photographic exposure meter by comparison with reference light or electric value provisionally void
    • G01J1/16Photometry, e.g. photographic exposure meter by comparison with reference light or electric value provisionally void using electric radiation detectors
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008Production of exposure light, i.e. light sources
    • G03F7/70016Production of exposure light, i.e. light sources by discharge lamps
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008Production of exposure light, i.e. light sources
    • G03F7/7005Production of exposure light, i.e. light sources by multiple sources, e.g. light-emitting diodes [LED] or light source arrays
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/708Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Circuit Arrangement For Electric Light Sources In General (AREA)
  • Photometry And Measurement Of Optical Pulse Characteristics (AREA)

Abstract

本發明的目的是適當地檢測光源發出的照明光的照度/強度。將以基本頻率F重疊了因各燈管而異的特定頻率f1~f4的交流電力,做為供給至各放電燈管的交流電力,使各放電燈管的照明光週期地變動。照度感測器40檢測出各放電燈管的有震盪的照明光重疊而成的合成照明光的照度。照度量測部45根據彼此不同的特定頻率f1~f4,以同步檢測的方式檢測出不含震盪成分的各放電燈管的照度。 An object of the present invention is to appropriately detect the illuminance / intensity of the illuminating light emitted from a light source. The alternating current power of the specific frequency f1 to f4, which is different for each lamp tube, is superimposed at the basic frequency F as the alternating current power supplied to each discharge lamp tube, and the illumination light of each discharge lamp tube is periodically changed. The illuminance sensor 40 detects the illuminance of the synthetic illumination light obtained by superimposing the oscillating illumination light of each discharge lamp. The illuminance measurement unit 45 detects the illuminance of each discharge lamp tube that does not contain an oscillating component in a synchronous manner based on specific frequencies f1 to f4 different from each other.

Description

照明裝置及包含該照明裝置的曝光裝置 Illumination device and exposure device including the same

本發明係有關於可使用於曝光裝置等的照明裝置,且特別有關於照明裝置的照度量測。 The present invention relates to an illuminating device that can be used in an exposure device and the like, and particularly relates to an illuminance measurement of the illuminating device.

曝光裝置中會使用發光強度大的短弧型放電燈管。為了提高發光強度,會將複數放電燈管組成的多燈式照明裝置組裝在內(例如,參照專利文獻1)。在其中,規則地排列由放電燈管及反射器組成的光源元件來構成燈管單元,用以照明基板。 The exposure device uses a short-arc discharge lamp having a large light emission intensity. In order to increase the light emission intensity, a multi-lamp lighting device composed of a plurality of discharge lamp tubes is incorporated (for example, refer to Patent Document 1). Among them, a light source element composed of a discharge lamp tube and a reflector is regularly arranged to constitute a lamp tube unit for illuminating a substrate.

關於照度調整,為了均勻地照明基板,會採用定照度點燈方法。在基板所搭載的平台等配置照度計,檢測出曝光動作前的照明光的照度。然後,調整放電燈管的輸出使達到與目標照度一致(例如,參照專利文獻2)。 Regarding illumination adjustment, in order to uniformly illuminate the substrate, a constant illumination method is adopted. An illuminance meter is arranged on a platform or the like mounted on the substrate, and the illuminance of the illumination light before the exposure operation is detected. Then, the output of the discharge lamp is adjusted to match the target illuminance (for example, refer to Patent Document 2).

[先行技術文獻] [Advanced technical literature]

專利文獻1:日本特開2012-221726號公報 Patent Document 1: Japanese Patent Application Publication No. 2012-221726

專利文獻2:日本特開2012-208351號公報 Patent Document 2: Japanese Patent Application Publication No. 2012-208351

多燈式照明裝置的情況下,從複數光源分別射出的光聚成單一照明光朝基板照射。因此,配置於平台上的照度 計檢測出基於全部光源的照度(全體照度),而沒有檢測出個別光源的照度。 In the case of a multi-lamp lighting device, light emitted from each of a plurality of light sources is condensed into a single illumination light and irradiated onto a substrate. Therefore, the illuminance placed on the platform The meter detects the illuminance (all illuminance) based on all light sources, but does not detect the illuminance of individual light sources.

光源本身有個體差,隨使用時間經過而損耗的比例也各不相同。因此,即使供給相同的電力(供給電力)給各光源,照度下降會依光源而異。然而,若是起因於特定光源而造成全體照度下降,在定照度點燈控制下,會一律地增加對全部光源的供給電力。 The light source itself has individual differences, and the proportion of loss due to the use of time varies. Therefore, even if the same power (supply power) is supplied to each light source, the illuminance decreases depending on the light source. However, if the overall illuminance is reduced due to a specific light source, the power supply to all light sources will be uniformly increased under the constant illuminance lighting control.

結果,對照度幾乎沒有下降的光源供給電力過大,反而加速損耗。這進一步招致全體照度下降,而關係到多燈式照明裝置的發光效率的惡化與壽命縮短。 As a result, the power supply of the light source, which has almost no decrease in contrast, is too large, and the loss is accelerated. This further causes a decrease in the overall illuminance, which is related to the deterioration of the luminous efficiency and shortened life of the multi-lamp lighting device.

另一方面,在各光源旁設置複數的照度計的情況下,在光源側所量測的照度與在基板側所量測的照度不一定一致。原因可能是照明光學系統的配置特性,或者是在平台附近有來自裝置外部的照明光。因此,當光源的放射光以外的外來光重疊後,就無法適當地量測照度。 On the other hand, when plural illuminance meters are provided beside each light source, the illuminance measured on the light source side and the illuminance measured on the substrate side do not necessarily match. The reason may be the configuration characteristics of the illumination optical system, or there may be illumination light from the outside of the device near the platform. Therefore, when the external light other than the light emitted from the light source overlaps, the illuminance cannot be measured properly.

因此,照明裝置需要能適當地檢測出光源的照度/強度。 Therefore, the lighting device needs to be able to detect the illuminance / intensity of the light source appropriately.

本發明的照明裝置,包括:複數的光源,分別發出照明光;光檢出部,配置在照明光學系統與被照射領域之間,檢測出該複數的光源的全體照明光的照度或強度(以下以照度/強度表示);以及照明控制部,對各個該複數的光源進行發光控制。在維持照度為一定的定照度點燈方式下,照明控 制部可一律地控制對各光源的供給電力。 The lighting device of the present invention includes a plurality of light sources, each of which emits illumination light; and a light detection unit, which is arranged between the illumination optical system and the illuminated area, and detects the illuminance or intensity of the entire illumination light of the plurality of light sources (hereinafter (Expressed as illuminance / intensity); and a lighting control unit that controls light emission for each of the plurality of light sources. In a constant-illumination lighting mode with a constant illumination, the lighting control The control unit can uniformly control the power supplied to each light source.

照明控制部讓該複數的光源分別發出照度/強度隨著對應複數的光源的各自不同的頻率而變動的量測照明光。而光檢出部根據各自不同的頻率,從各光源的量測照明光重疊後的全體量測照明光中,獲得各光源的不包含變動成分的照明光的照度/強度。 The illumination control unit causes the plurality of light sources to emit measurement illumination light whose illuminance / intensity varies with different frequencies of the corresponding plurality of light sources. The light detection unit obtains the illuminance / intensity of the illuminating light of each light source that does not include a fluctuation component from the total of the measured illuminating light in which the measured illuminating light of each light source is superimposed according to different frequencies.

照明控制部可根據照度/強度會因應供給至各光源的電力的週期變動而產生週期變動的頻率,來發出量測照明光。 The lighting control unit may measure the illumination light based on the frequency at which the illuminance / intensity changes periodically in response to the periodic change in the power supplied to each light source.

例如,複數的光源個別因為交流電力輸入而發出照明光,照明控制部對各光源,供給具有基本頻率及對應該光源的特定頻率重疊而成的合成頻率的交流電力,來發出量測照明光。 For example, a plurality of light sources individually emit illumination light due to AC power input, and the illumination control unit supplies AC power having a basic frequency and a composite frequency corresponding to a specific frequency of the light source to each light source to emit measurement illumination light.

考慮到確實地抽出特定頻率,照明控制部可將至少超過基本頻率的2倍的特定頻率重疊於基本頻率。又,對應該複數的光源的複數的特定頻率彼此之間可具有容許最小間隔以上的頻率間隔。 Considering that the specific frequency is accurately extracted, the lighting control unit may overlap the specific frequency at least twice the basic frequency on the basic frequency. In addition, the specific frequency of the plurality of light sources corresponding to the plurality of light sources may have a frequency interval greater than or equal to an allowable minimum interval.

例如,照明控制部可將滿足以下式子的範圍的特定頻率重疊至基本頻率。式子中的上限值是從過去沒有被了解的供給電力與特定頻率的關係中根據經驗推導出來。其中fm可以設定在滿足上限值以下,或者是滿足下限值以上的範圍。 For example, the lighting control unit may superimpose a specific frequency that satisfies the range of the following expression to the basic frequency. The upper limit value in the formula is derived from the relationship between the power supply and the specific frequency that has not been known in the past based on experience. Among them, fm can be set to a range that satisfies the upper limit value or above the lower limit value.

6×F≦fm≦10/PW0 6 × F ≦ fm ≦ 10 / PW0

其中fm表示特定頻率(kHz),F表示基本頻率(kHz),PW0表示具有基本頻率F的矩形波的交流電力(kW)。 Among them, fm represents a specific frequency (kHz), F represents a fundamental frequency (kHz), and PW0 represents AC power (kW) of a rectangular wave having a fundamental frequency F.

做為檢出各光源的照度的構造,例如光檢出部可設置同步檢測部。 As a structure for detecting the illuminance of each light source, for example, the light detection section may be provided with a synchronization detection section.

或者是,光檢出部中,具備將全體照明光分離為各光源的量測照明光的濾波器,光檢出部從各光源的量測照明光的振幅中檢測出震盪的照明光的照度/強度。 Alternatively, the light detection unit includes a filter for measuring the illumination light that separates the entire illumination light into each light source, and the light detection unit detects the illuminance of the oscillating illumination light from the amplitude of the measurement illumination light of each light source. /strength.

本發明的另一態樣的照明裝置,包括:單一光源,發出照明光;光檢出部,配置於照明光學系統與被照射領域之間,檢測出該光源產生的全體照明光的照度/強度;以及照明控制部,對該光源進行發光控制。照明控制部將具有光源的電力波形及對應光源的特定頻率重疊後的合成頻率的交流電力,供給至光源,藉此使光源發出隨該合成頻率變動的量測照明光。光檢出部根據合成頻率,從重疊了光源的量測照明光的全體量測照明光中,得到光源的不含變動成分的照明光的照度/強度。 A lighting device according to another aspect of the present invention includes: a single light source that emits illumination light; and a light detection unit that is disposed between the illumination optical system and the illuminated area and detects the illuminance / intensity of the entire illumination light generated by the light source. And a lighting control unit that controls light emission of the light source. The lighting control unit supplies the light source with alternating current power having a power waveform of the light source and a synthesized frequency corresponding to a specific frequency of the light source superimposed on the light source, thereby causing the light source to emit measurement illumination light that varies with the synthesized frequency. The light detection unit obtains the illuminance / intensity of the illuminating light that does not contain a fluctuation component of the light source from the entire measurement illuminating light of the measurement illuminating light superimposed on the light source based on the combined frequency.

根據本發明,能夠適當地檢測出光源放射的照明光的照度/強度(以下,有時單以照度稱之)。 According to the present invention, the illuminance / intensity of the illuminating light emitted from the light source can be appropriately detected (hereinafter sometimes referred to simply as illuminance).

10‧‧‧曝光裝置 10‧‧‧Exposure device

20‧‧‧照明裝置 20‧‧‧Lighting device

20A~20D‧‧‧光源單元 20A ~ 20D‧‧‧Light source unit

21‧‧‧鏡面 21‧‧‧Mirror

22A~22D‧‧‧電源電路 22A ~ 22D‧‧‧Power circuit

24‧‧‧折返鏡面 24‧‧‧ Fold back mirror

26‧‧‧照明光學系統 26‧‧‧ Illumination Optical System

28A~28D‧‧‧放電燈管 28A ~ 28D‧‧‧Discharge lamp

29A~29D‧‧‧反射器 29A ~ 29D‧‧‧Reflector

30‧‧‧曝光頭 30‧‧‧ exposure head

40‧‧‧照度感測器 40‧‧‧illumination sensor

45‧‧‧照度量測部 45‧‧‧Measurement and Measurement Department

50‧‧‧控制部 50‧‧‧Control Department

S‧‧‧基板 S‧‧‧ substrate

M‧‧‧半個週期 M‧‧‧ half cycle

PW、PW0‧‧‧交流電力 PW, PW0‧‧‧AC power

W‧‧‧供給電力振幅 W‧‧‧ Power supply amplitude

Wm‧‧‧照度振幅 Wm‧‧‧illuminance amplitude

第1圖係第1實施型態的曝光裝置的方塊圖。 FIG. 1 is a block diagram of an exposure apparatus according to a first embodiment.

第2圖係顯示照度測量時供給各燈管的交流電力。 Figure 2 shows the AC power supplied to each lamp during illuminance measurement.

第3圖係第2圖的電極矩形波的部份放大圖。 FIG. 3 is a partially enlarged view of the electrode rectangular wave in FIG. 2.

第4圖係顯示以照度感測器檢測出各燈管的照明光所合成的全體照明光的照度震盪。 FIG. 4 shows the illuminance fluctuation of the entire illumination light synthesized by the illumination light of each lamp tube detected by the illuminance sensor.

第5圖係顯示以同步檢測所檢測的各放電燈管的照度。 Fig. 5 shows the illuminance of each discharge lamp detected by synchronous detection.

第6圖係顯示第2實施型態的濾波後的照明光的時序上的變動。 Fig. 6 is a graph showing a temporal change of the filtered illumination light in the second embodiment.

以下,參照圖式說明本發明的實施型態。 Hereinafter, embodiments of the present invention will be described with reference to the drawings.

第1圖係第1實施型態的曝光裝置的方塊圖。 FIG. 1 is a block diagram of an exposure apparatus according to a first embodiment.

曝光裝置10對塗布或貼上光阻等的感光材料的基板S,投影照明光形成圖樣。基板S設置於描繪桌(未圖示)上。 The exposure device 10 projects illumination light onto a substrate S to which a photosensitive material such as a photoresist is applied or adhered to form a pattern. The substrate S is provided on a drawing table (not shown).

曝光裝置10具備照明裝置20、曝光頭30、控制部50,由控制部50來實行、控制曝光動作。照明裝置20在此由4個光源單元20A~20D所組成。光源單元20A具備放電燈管28A及反射器29A,其他的光源單元20B~20D也分別具有短弧型放電燈管28B、28C、28D及反射器29B、29C、29D。 The exposure device 10 includes an illumination device 20, an exposure head 30, and a control unit 50. The control unit 50 executes and controls the exposure operation. The lighting device 20 is composed of four light source units 20A-20D. The light source unit 20A includes a discharge lamp tube 28A and a reflector 29A, and the other light source units 20B to 20D also include short-arc discharge lamp tubes 28B, 28C, and 28D and reflectors 29B, 29C, and 29D, respectively.

放電燈管28A~28D在此適用短弧型放電燈管,水銀量封入0.15mg/mm3以上。放電燈管28A~28D根據交流電力點燈,在此,以電源電路22A~22D供給具有大約0.05~0.2(kHz)的頻率(基本頻率)的矩形波交流電力。 The discharge lamps 28A to 28D are suitable for short arc discharge lamps, and the mercury content is sealed at 0.15mg / mm 3 or more. The discharge lamps 28A to 28D are lit according to the AC power, and here, the rectangular wave AC power having a frequency (basic frequency) of approximately 0.05 to 0.2 (kHz) is supplied by the power supply circuits 22A to 22D.

分別從放電燈管28A~28D放射的光經反射器29A~29D聚集射出,並在折返鏡面24反射。在折返鏡面24反射的光朝照明光學系統26入射。照明光學系統26具有複眼透鏡等的光學系統,將空間上均一強度的光束所組成的光射出。從照明光學系統26射出的光透過鏡面21等被導引至曝光頭30內的DMD(未圖示)。 The light emitted from the discharge lamp tubes 28A to 28D is collected and emitted through the reflectors 29A to 29D, and is reflected on the folded-back mirror surface 24. The light reflected on the folding mirror surface 24 is incident on the illumination optical system 26. The illumination optical system 26 includes an optical system such as a fly-eye lens, and emits light composed of a light beam having a uniform intensity in space. The light emitted from the illumination optical system 26 is guided to a DMD (not shown) in the exposure head 30 through the mirror 21 and the like.

控制部50配合基板S相對於描繪桌的位置來發送網格資料發送給DMD。做為空間光調變器的DMD是微小矩形狀的微鏡面配置成二維矩陣狀。DMD的各微鏡面根據網格資料而控制在ON/OFF。 The control unit 50 transmits the grid data to the DMD according to the position of the substrate S relative to the drawing table. The DMD as a spatial light modulator is a micro-rectangular micromirror arranged in a two-dimensional matrix. Each micromirror surface of the DMD is controlled to be ON / OFF according to the grid data.

照度感測器40設置於桌面的一端,曝光動作開始前會移動到曝光區域的位置。照度量測時,控制部50控制電源電路22A~22D,變動放電燈管28A~28D個別的光輸出,使個別的照明光及全體的照明光產生照度震盪。照度量測部45從被量測的全體的照明光中檢測到個別燈管的照明光的照度。 The illuminance sensor 40 is disposed at one end of the desktop, and moves to the position of the exposure area before the exposure operation starts. During the measurement, the control unit 50 controls the power supply circuits 22A to 22D, and varies the individual light output of the discharge lamp tubes 28A to 28D, so that the individual illumination light and the entire illumination light are oscillated. The illuminance measurement unit 45 detects the illuminance of the illuminating light of an individual lamp tube from the entire illuminating light to be measured.

控制部50進行定照度點燈控制,一律地控制往放電燈管28A~28D的供給電力。同時,控制部50個別地監控各放電燈管的照度。當特別的放電燈管的照度下降到超出預定範圍的情況下,控制部50對螢幕(未圖示)送出燈管交換通知的資料。或者是,可以設置發出蜂鳴聲的機制。 The control unit 50 performs constant-illumination lighting control, and uniformly controls the power supply to the discharge lamp tubes 28A to 28D. At the same time, the control unit 50 individually monitors the illuminance of each discharge lamp. When the illuminance of the special discharge lamp exceeds a predetermined range, the control unit 50 sends the data of the lamp exchange notification to the screen (not shown). Alternatively, a beep mechanism can be set.

第2圖係顯示照度測量時供給各燈管的交流電力。第3圖係第2圖的電極矩形波的部份放大圖。第4圖係顯示以照度感測器檢測出各燈管的照明光所合成的全體照明光的照度震盪。接著,使用第2~4圖說明照度量測時所供給的交流電力特性。 Figure 2 shows the AC power supplied to each lamp during illuminance measurement. FIG. 3 is a partially enlarged view of the electrode rectangular wave in FIG. 2. FIG. 4 shows the illuminance fluctuation of the entire illumination light synthesized by the illumination light of each lamp tube detected by the illuminance sensor. Next, the characteristics of the AC power supplied during the measurement will be described using FIGS. 2 to 4.

通常的曝光動作中,具有低頻率F(以下稱為基本頻率)的矩形波的交流電力PW0送至放電燈管28A~28D。供給電力的值對任一放電燈管皆相同。在此,基本頻率F定在0.05~0.2(kHz)的範圍。 In a normal exposure operation, a rectangular wave AC power PW0 having a low frequency F (hereinafter referred to as a fundamental frequency) is sent to the discharge lamps 28A to 28D. The value of the supplied power is the same for any discharge lamp. Here, the fundamental frequency F is set in a range of 0.05 to 0.2 (kHz).

另一方面,進行照度量測的情況下,也就是說更 換基板期間、燈管點燈開始的定期檢查期間、曝光裝置的系統變更期間等,當不形成圖樣於基板時,控制部50供給了高頻率(以下稱為特定頻率)fm重疊至基本頻率F的重疊頻率(合成頻率)的交流電力PW。 On the other hand, in the case of measurement, that is, more During the substrate change, the periodic inspection start period of the lamp lighting, and the system change period of the exposure device, etc., when the pattern is not formed on the substrate, the control unit 50 supplies a high frequency (hereinafter referred to as a specific frequency) fm overlapping to the basic frequency F AC power PW with overlapping frequency (synthetic frequency).

第2圖中,顯示了具有振幅W與基本頻率F的矩形波的交流供給電力PW0的波形,以及特定頻率fm(m=1~4)重疊至基本頻率F的合成頻率的交流供給電力PW的波形。第3圖放大了第2圖的交流供給電力PW的矩形波半個週期(M)。對放電燈管28A~28D的供給電力具有特定頻率f1~f4分別重疊至基本頻率F的合成頻率的交流電力波形。放電燈管28A~28D的供給電力波形分別以符號A~D表示。 FIG. 2 shows a waveform of an AC power supply PW0 having a rectangular wave having an amplitude W and a fundamental frequency F, and a waveform of the AC power supply PW having a specific frequency fm (m = 1 to 4) superimposed on the composite frequency of the basic frequency F Waveform. FIG. 3 enlarges the rectangular wave half cycle (M) of the AC power supply PW of FIG. 2. The electric power supplied to the discharge lamps 28A to 28D has AC power waveforms in which specific frequencies f1 to f4 are respectively superimposed on the composite frequency of the basic frequency F. The power supply waveforms of the discharge lamps 28A to 28D are represented by symbols A to D, respectively.

特定頻率f1~f4是比基本頻率F高的頻率,設定在數kHz~數100kHz的範圍。又,特定頻率fm的值會因燈管而異。關於特定頻率fm的下限值,是設定為不干涉基本的交流電力PW0的矩形波形。例如,基本頻率F的矩形波的略半週期的期間內,特定頻率fm的波形至少出現1個週期的分量,也就是說可規定為超過基本頻率F的2倍。 The specific frequencies f1 to f4 are frequencies higher than the basic frequency F, and are set in the range of several kHz to several 100 kHz. The value of the specific frequency fm varies depending on the lamp. The lower limit value of the specific frequency fm is a rectangular waveform set so as not to interfere with the basic AC power PW0. For example, during a period of approximately half the period of the rectangular wave of the fundamental frequency F, a waveform of a specific frequency fm appears at least one period of component, that is, it may be specified to exceed twice the fundamental frequency F.

另一方面,關於特定頻率fm的上限值,則設定為照明光的照度不會產生不穩定的狀態。具體來說,照明光配合供給電力的變動而變動,也就是,上限值設定在照度/強度的週期變動與供給電力的週期變動成比例的可能範圍。 On the other hand, the upper limit value of the specific frequency fm is set such that the illuminance of the illumination light does not become unstable. Specifically, the illumination light fluctuates in accordance with the fluctuation of the supplied power, that is, the upper limit value is set in a possible range in which the periodic fluctuation of the illuminance / intensity is proportional to the periodic fluctuation of the supplied power.

照明光的變動是因為供給電力的變動造成電極溫度及水銀蒸發量等的變動而發生。特別是,封入水銀0.15(mg/mm3)以上的短弧型放電燈管的情況下,照度的變動速 度有其界限,而反應於供給電力變動的照明光變動的反應性也有其界線。 Fluctuations in illumination light occur due to fluctuations in electrode temperature, mercury evaporation, etc. caused by fluctuations in power supply. In particular, when a short-arc discharge lamp having a mercury content of 0.15 (mg / mm 3 ) or more is enclosed, there is a limit to the rate of change in illuminance, and the reactivity of the illumination light to respond to a change in power supply also has a limit.

因此,供給電力大照度高的燈管的情況下,特定頻率重疊而產生供給電力的變動量變大,另一方面,照度變得無法追隨供給電力的變動,而變得無法量測正確的照度變動量。 Therefore, in the case of a lamp with a large power supply and a high illuminance, the amount of fluctuation in the supply power increases due to the overlap of a specific frequency. On the other hand, the illuminance becomes unable to follow the change in the supply power and it is impossible to measure the correct illuminance change the amount.

上述短弧型放電燈的情況下,特定頻率必須是照度能夠追隨供給電力的變動的最大值(特定頻率上限值fmmax)以下。本實施型態中,當燈管的水銀封入量在既定範圍內的情況下,根據經驗發現能夠從特定頻率與供給電力的關係中設定出特定頻率的上限。具體來說,封入燈管內的水銀量為0.15~0.4(mg/mm3),供給燈管的交流電力為0.05~0.6(kW)的情況下,特定頻率的上限值可由以下式子求出。其中fmmax表示特定頻率上限值(kHz)。 In the case of the short-arc discharge lamp, the specific frequency must be equal to or less than a maximum value (specific frequency upper limit value fmmax) at which the illuminance can follow the fluctuation of the supplied power. In this embodiment, when the amount of mercury enclosed in the lamp is within a predetermined range, it has been found from experience that the upper limit of the specific frequency can be set from the relationship between the specific frequency and the power supply. Specifically, when the amount of mercury enclosed in the lamp is 0.15 to 0.4 (mg / mm 3 ) and the AC power supplied to the lamp is 0.05 to 0.6 (kW), the upper limit value of the specific frequency can be obtained by the following formula Out. Where fmmax represents the upper limit value (kHz) of the specific frequency.

fmmax=10/PW0..(1) fmmax = 10 / PW0 .. (1)

短弧型放電燈管的照度除了供給電力的變動外,也有受到週邊環境(例如燈管週邊溫度)影響而微小變化的可能性。為了不受到這種照度變動的影響而抽出特定頻率,必須是相對於基本頻率,超出某一基準值的高頻率。 In addition to fluctuations in the power supply, the short-arc discharge lamp may have a small change due to the influence of the surrounding environment (for example, the temperature around the lamp). In order to extract a specific frequency without being affected by such an illuminance change, it must be a high frequency that exceeds a certain reference value with respect to the basic frequency.

具體來說,為了檢測出因應供給電力變動的正確的照明光變動量,在基本頻率F的矩形波的半週期期間,特定頻率fm的波形至少出現3個週期的分量。也就是說,如下式所示,規定特定頻率fm超過基本頻率F的6倍為佳。 Specifically, in order to detect the correct fluctuation amount of the illumination light in accordance with the fluctuation of the supplied power, a waveform of a specific frequency fm has at least three periods of components during a half period of the rectangular wave of the fundamental frequency F. That is, as shown in the following formula, it is preferable to specify that the specific frequency fm exceeds 6 times the basic frequency F.

6×F≦fm≦10/PW0..(2) 6 × F ≦ fm ≦ 10 / PW0 .. (2)

又,特定頻率f1~f4要設定為彼此的頻率間隔在一定值以上(需具有容許最小間隔以上的頻率間隔)。這是為了容易進行照度/強度的個別檢測處理。在此,基本頻率F為90Hz的情況下,特定頻率f1、f2、f3、f4可分別設定為2.43(kHz)、2.61(kHz)、2.79(kHz)、2.97(kHz)。也可等間隔地設定特定頻率。 In addition, the specific frequencies f1 to f4 are set such that the frequency interval between them is equal to or greater than a certain value (the frequency interval must be equal to or greater than the allowable minimum interval). This is to facilitate individual detection processing of illuminance / intensity. Here, when the basic frequency F is 90 Hz, the specific frequencies f1, f2, f3, and f4 can be set to 2.43 (kHz), 2.61 (kHz), 2.79 (kHz), and 2.97 (kHz), respectively. Specific frequencies can also be set at regular intervals.

各放電燈管所發射的個別的照明光會與第3圖中的各放電燈管的供給電力波形成比例而週期變動。照明感測器40因為檢測出合成各燈管的照明光後的全體照明光,所以如第4圖所示,全體的照明光的震盪是不規則的。 The individual illuminating light emitted by each discharge lamp tube varies periodically in proportion to the power supply wave of each discharge lamp tube in FIG. 3. Since the illumination sensor 40 detects the entire illumination light after the illumination light of each lamp tube is synthesized, as shown in FIG. 4, the oscillation of the entire illumination light is irregular.

第5圖係顯示以同步檢測所檢測的各放電燈的照度。 Fig. 5 shows the illuminance of each discharge lamp detected by synchronous detection.

照度量測部45以同步檢測求取各放電燈管的照度。照度量測部45按照控制部50送來的配合特定頻率f1~f4的時脈信號,在同步時間點檢測各放電燈管的照度。 The illuminance measurement unit 45 obtains the illuminance of each discharge lamp by synchronous detection. The illuminance measurement unit 45 detects the illuminance of each discharge lamp at a synchronized time point according to a clock signal sent by the control unit 50 in accordance with a specific frequency f1 to f4.

第5圖中,將放電燈管28A~28D的照度分別以符號A~D表示。利用同步檢測,從全體的照明光的震盪中檢測出直流成分的各燈管的照度。控制部50從被量測的各放電燈管的照度A~D中判斷是否有超出規格範圍外的放電燈管的照度存在。可以將燈管點燈開始時的照度為基準值,對各放電燈管量測出以基準值為標準的照度下降率。 In FIG. 5, the illuminances of the discharge lamps 28A to 28D are represented by symbols A to D, respectively. Using synchronous detection, the illuminance of each lamp with a DC component is detected from the oscillation of the entire illumination light. The control unit 50 determines from the measured illuminances A to D of each discharge lamp whether there is an illuminance of the discharge lamp outside the specification range. The illuminance at the start of lamp lighting can be used as a reference value, and the illuminance reduction rate based on the reference value can be measured for each discharge lamp.

當有超出規定範圍外的照度下降的放電燈管存在的情況下,將該狀況告知操作者。當操作者交換新的燈管時,再次進行定照度點燈控制,一律地進行電力調整。 When there is a discharge lamp whose illuminance falls outside the prescribed range, the operator is informed of the situation. When the operator exchanges a new lamp, the fixed-illuminance lighting control is performed again, and the power is adjusted uniformly.

根據本實施型態,使各放電燈管的交流供給電力為基本頻率F與依各燈管而異的特定頻率f1~f4重疊的交流供給電力,週期地變動各放電燈管的照明光。照度感測器40檢測出各放電燈管的有震盪的照明光所重疊的合成照明光的照度。照度量測部45根據彼此不同的特定頻率f1~f4,以同步檢測檢測出不含震盪的各放電燈管的照度。 According to this embodiment mode, the AC supply power of each discharge lamp is an AC supply power whose base frequency F overlaps with a specific frequency f1 to f4 that varies with each lamp, and the illumination light of each discharge lamp is periodically changed. The illuminance sensor 40 detects the illuminance of the combined illumination light superimposed on the oscillating illumination light of each discharge lamp. The illuminance measurement unit 45 detects the illuminance of each discharge lamp that does not contain vibrations in synchronization with specific frequencies f1 to f4 different from each other.

藉由個別地檢測出放電燈管的照度,在一律調整供給電力的定照度點燈控制下,能夠防止過度提昇沒有照度下降的放電燈管的供給電力,結果,就能延長照明裝置全體的壽命,提高發光效率。 By individually detecting the illuminance of the discharge lamp, it is possible to prevent the supply power of the discharge lamp from being excessively increased under the constant-illumination lighting control that uniformly adjusts the supplied power. As a result, the life of the entire lighting device can be extended. To improve luminous efficiency.

因為特定頻率fm相對於基本頻率F相當地高,所以不與基本頻率F的電力矩形波產生干涉。另一方面,因為也沒有過度地提高特定頻率fm,能夠防止放射光的變動不跟隨供給電力變動這類的不穩定震盪的情況。又因為頻率間隔大致相等,容易進行同步檢測。 Since the specific frequency fm is considerably higher than the fundamental frequency F, it does not interfere with the rectangular electric power wave of the fundamental frequency F. On the other hand, because the specific frequency fm is not increased too much, it is possible to prevent a situation in which the fluctuation of the emitted light does not follow the unstable oscillation such as the fluctuation of the supplied power. Because the frequency intervals are almost equal, synchronization detection is easy.

接著,使用第6圖說明第2實施型態。第2實施型態中,以濾波器將照明光依燈管分離,根據照明光的振幅來量測光強度/照度。除此之外的構造與第1實施型態相同。 Next, a second embodiment will be described with reference to FIG. 6. In the second embodiment, a filter is used to separate the illumination light by the tube, and the light intensity / illumination is measured based on the amplitude of the illumination light. The other structures are the same as those of the first embodiment.

第6圖係顯示第2實施型態的濾波後的照明光的時序上的變動。 Fig. 6 is a graph showing a temporal change of the filtered illumination light in the second embodiment.

第2實施型態中,照度量測部45具有習知的濾波電路,全體的照明光透過濾波電路而分離為各放電燈管的照明光。然後,根據以下的式子,求出各放電燈管的照明光的照度。其中,Em(m=1~4)表示透過濾波器檢測的各放電燈管的照 度,Vm表示各放電燈管的具有特定頻率的供給電力的振幅,Wm表示各放電燈管的照明光的振幅。而k、Y表示根據照明光學系統等的光學特性的係數。 In the second embodiment, the illumination measurement unit 45 includes a conventional filter circuit, and the entire illumination light is transmitted through the filter circuit to be separated into the illumination light of each discharge lamp. Then, the illuminance of the illuminating light of each discharge lamp was obtained by the following formula. Among them, Em (m = 1 ~ 4) represents the photos of each discharge lamp detected through the filter. Degree, Vm represents the amplitude of the power supplied with a specific frequency of each discharge lamp, and Wm represents the amplitude of the illumination light of each discharge lamp. Meanwhile, k and Y represent coefficients according to the optical characteristics of the illumination optical system and the like.

Em=k×(Wm/Vm)+Y..(3) Em = k × (Wm / Vm) + Y .. (3)

也可以用1個放電燈管代替複數的放電燈管來構成照明裝置。這種情況下,即使燈管以外的外界光入射照度感測器的情況下,也能夠正確地檢測出各放電燈管的照明光的照度/強度。另外,供給直流電力的放電燈管也可適用,也能夠使用放電燈管以外的光源。 One discharge lamp may be used instead of a plurality of discharge lamps to constitute a lighting device. In this case, even when external light other than the lamp enters the illuminance sensor, the illuminance / intensity of the illumination light of each discharge lamp can be accurately detected. A discharge lamp that supplies DC power is also applicable, and a light source other than the discharge lamp can also be used.

[實施例] [Example]

以下使用實施例說明滿足上述(1)式的放電燈管。 In the following, an embodiment is used to describe a discharge lamp that satisfies the formula (1).

本發明的實施例的放電燈管做為光源以單一放電燈管構成,水銀封入量設定在0.15~0.4(mg/mm3)。接著,進行實驗,一邊改變特定頻率與供給電力,一邊確認照度變動的追隨性。 The discharge lamp according to the embodiment of the present invention is constituted by a single discharge lamp as a light source, and the amount of mercury enclosed is set to 0.15 to 0.4 (mg / mm 3 ). Next, an experiment was performed to confirm the followability of the illuminance variation while changing the specific frequency and power supply.

首先,在不重疊特定頻率的情況下測量照度。接著,重疊特定頻率的情況下檢測出照度。然後,對不同的供給電力分別量測照度。以下的表1為實驗結果。 First, measure illuminance without overlapping specific frequencies. Next, the illuminance is detected when a specific frequency is superimposed. Then, the illuminance is measured separately for different supplied power. The following Table 1 shows the experimental results.

根據表1,可知在確認有照度追隨性的範圍內的供給電力(kW)與特定頻率(kHz)的關係性是供給電力(kW)與特定頻率(kHz)的乘積在10以下。即使供給電力在0.05~0.6(kW)之間,配合供給電力而準備數個特定頻率時,也能導出相同的上限值。 From Table 1, it can be seen that the relationship between the power supply (kW) and the specific frequency (kHz) within the range where the illuminance followability is confirmed is that the product of the power supply (kW) and the specific frequency (kHz) is 10 or less. Even when the supplied power is between 0.05 and 0.6 (kW), the same upper limit value can be derived when several specific frequencies are prepared in accordance with the supplied power.

Claims (9)

一種照明裝置,包括:複數的光源,分別發出照明光;光檢出部,配置在照明光學系統與被照射領域之間,檢測出該複數的光源的全體照明光的照度/強度;以及照明控制部,對各個該複數的光源進行發光控制,其中該照明控制部讓該複數的光源分別發出照度/強度隨著對應該複數的光源的各自不同的頻率而變動的量測照明光,該光檢出部根據各自不同的頻率,從各光源的量測照明光重疊後的全體量測照明光中,獲得各光源的不包含變動成分的照明光的照度/強度;其中該複數的光源個別因為交流電力輸入而發出照明光;該照明控制部對各光源,供給具有基本頻率及對應該光源的特定頻率重疊而成的合成頻率的交流電力,來發出量測照明光。An illumination device includes: a plurality of light sources each emitting illumination light; a light detection unit disposed between an illumination optical system and an illuminated area to detect the illuminance / intensity of the entire illumination light of the plurality of light sources; and lighting control The light control unit controls the light sources of each of the plurality of light sources, wherein the lighting control unit causes the light sources of the plurality of light sources to respectively emit illuminance / intensity for measuring illumination light that varies with different frequencies corresponding to the plurality of light sources. The output unit obtains the illuminance / intensity of the illuminating light of each light source that does not contain a variable component from the total of the measured illuminating light after the measured illuminating light of each light source overlaps according to different frequencies; wherein the plurality of light sources are individually due to AC Electric power is input to emit illumination light; the illumination control unit supplies AC power having a basic frequency and a composite frequency corresponding to a specific frequency of the light source to each light source to emit measurement illumination light. 如申請專利範圍第1項所述之照明裝置,其中該照明控制部根據照度/強度會因應供給至各光源的電力的週期變動而產生週期變動的頻率,來發出量測照明光。The lighting device according to item 1 of the scope of the patent application, wherein the lighting control unit emits the measurement lighting light according to the frequency of the periodic variation of the illuminance / intensity due to the periodic variation of the power supplied to each light source. 如申請專利範圍第1項所述之照明裝置,其中該照明控制部將至少超過基本頻率的2倍的特定頻率重疊於基本頻率。The lighting device according to item 1 of the scope of patent application, wherein the lighting control section overlaps the specific frequency at least twice the basic frequency with the basic frequency. 如申請專利範圍第1項所述之照明裝置,其中該照明控制部將滿足以下式子的範圍的特定頻率重疊至基本頻率,6×F≦fm≦10/PW0其中fm表示特定頻率(kHz),F表示基本頻率(kHz),PW0表示具有基本頻率F的矩形波的交流電力(kW)。The lighting device according to item 1 of the scope of patent application, wherein the lighting control section overlaps a specific frequency that satisfies the following formula to the basic frequency, 6 × F ≦ fm ≦ 10 / PW0, where fm represents a specific frequency (kHz) , F represents the fundamental frequency (kHz), and PW0 represents the AC power (kW) of a rectangular wave having the fundamental frequency F. 如申請專利範圍第1項所述之照明裝置,其中對應該複數的光源的複數的特定頻率彼此之間具有容許最小間隔以上的頻率間隔。The lighting device according to item 1 of the scope of patent application, wherein a specific frequency of a plurality of light sources corresponding to a plurality of light sources has a frequency interval greater than an allowable minimum interval. 如申請專利範圍第1至5項任一項所述之照明裝置,其中該光檢出部具有同步檢測部。The lighting device according to any one of claims 1 to 5, wherein the light detection section has a synchronization detection section. 如申請專利範圍第1至5項任一項所述之照明裝置,其中該光檢出部具有將全體照明光分離為各光源的量測照明光的濾波器,該光檢出部從各光源的量測照明光的振幅中檢測出震盪的照明光的照度/強度。The lighting device according to any one of claims 1 to 5, wherein the light detection section has a filter for measuring the illumination light that separates the entire illumination light into each light source, and the light detection section separates from each light source The illuminance / intensity of the oscillating illumination light is detected in the measurement of the amplitude of the illumination light. 如申請專利範圍第1至5項任一項所述之照明裝置,其中該照明控制部一律地控制供給至各光源的供給電力。The lighting device according to any one of claims 1 to 5, in which the lighting control unit uniformly controls the power supplied to each light source. 一種曝光裝置,包括:如申請專利範圍第1至5項任一項所述之照明裝置。An exposure device includes the illumination device according to any one of claims 1 to 5.
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