[go: up one dir, main page]

TWI628771B - Semiconductor element-mounted substrate - Google Patents

Semiconductor element-mounted substrate Download PDF

Info

Publication number
TWI628771B
TWI628771B TW105139225A TW105139225A TWI628771B TW I628771 B TWI628771 B TW I628771B TW 105139225 A TW105139225 A TW 105139225A TW 105139225 A TW105139225 A TW 105139225A TW I628771 B TWI628771 B TW I628771B
Authority
TW
Taiwan
Prior art keywords
capacitor
semiconductor element
conductor path
conductor
insulating substrate
Prior art date
Application number
TW105139225A
Other languages
Chinese (zh)
Other versions
TW201820576A (en
Inventor
城下誠
和田久義
Original Assignee
京瓷股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 京瓷股份有限公司 filed Critical 京瓷股份有限公司
Priority to TW105139225A priority Critical patent/TWI628771B/en
Publication of TW201820576A publication Critical patent/TW201820576A/en
Application granted granted Critical
Publication of TWI628771B publication Critical patent/TWI628771B/en

Links

Landscapes

  • Production Of Multi-Layered Print Wiring Board (AREA)
  • Structures For Mounting Electric Components On Printed Circuit Boards (AREA)

Abstract

本發明提供一種半導體元件搭載基板,包括:電路導體,被配設在絕緣基板;多個半導體元件連接焊盤,與電路導體連接;半導體元件,被搭載在絕緣基板表面上;第1電容器及第2電容器,被配設在絕緣基板表面或內部;第1導體路徑,將第1電容器連接在半導體元件連接焊盤之間;以及第2導體路徑,將第2電容器連接在所述半導體元件連接焊盤之間,其中,第1導體路徑的電感小於第2導體路徑的電感,並且,所述第1電容器的電容量小於所述第2電容器的電容量且第1電容器的內部電感小於第2電容器的內部電感。 The present invention provides a semiconductor element mounting substrate including: a circuit conductor disposed on an insulating substrate; a plurality of semiconductor element connection pads connected to the circuit conductor; and a semiconductor element mounted on the surface of the insulating substrate; the first capacitor and the first capacitor 2, the capacitor is disposed on the surface or inside of the insulating substrate; the first conductor path connects the first capacitor between the semiconductor element connection pads; and the second conductor path connects the second capacitor to the semiconductor element connection welding Between the disks, wherein the inductance of the first conductor path is smaller than the inductance of the second conductor path, and the capacitance of the first capacitor is smaller than the capacitance of the second capacitor and the internal inductance of the first capacitor is smaller than the second capacitor Internal inductance.

Description

半導體元件搭載基板 Semiconductor component mounting substrate

本發明係關於具備多個電容器的半導體元件搭載基板。 The present invention relates to a semiconductor element mounting substrate including a plurality of capacitors.

近年來,在攜帶式遊戲機、通信設備所代表的電子設備的高功能化、小型化的發展過程中,該等所使用的半導體元件搭載基板也被要求高功能化、小型化。因此,對於運算處理量增加的半導體元件而言,需要在受限的空間中穩定地供給更多電流。 In recent years, in the development of high-performance and miniaturization of electronic devices represented by portable game machines and communication devices, the semiconductor element mounting substrates used for such devices have been required to be highly functional and miniaturized. Therefore, for a semiconductor element in which the amount of arithmetic processing is increased, it is necessary to stably supply more current in a limited space.

為了達成這些要求,而有在半導體元件的正下方內置了多個電容器的半導體元件搭載基板。這種電容器內置的基板係例如揭示於日本專利第4863546號公報。 In order to achieve these requirements, there is a semiconductor element mounting substrate in which a plurality of capacitors are built directly under the semiconductor element. A substrate in which such a capacitor is built is disclosed, for example, in Japanese Patent No. 4863546.

本發明的課題在於提供一種半導體元件搭載基板,通過抑制基板所具有的阻抗的值來減小電流變動,而能夠使電子設備穩定地工作。 An object of the present invention is to provide a semiconductor element mounting substrate which can reduce the current fluctuation by suppressing the value of the impedance of the substrate, thereby enabling the electronic device to operate stably.

本發明的一實施方式之半導體元件搭載基板係包括:絕緣基板,具有積層了多個絕緣層的積層構造;電路導體,被配設在絕緣基板的表面及內部;多個半導體 元件連接焊盤,被配設在絕緣基板的表面且與電路導體的一部分連接;半導體元件,經由半導體元件連接焊盤而被搭載在絕緣基板的表面上;第1電容器及第2電容器,被配設在絕緣基板的表面或內部;和第1導體路徑及第2導體路徑,包含電路導體的一部分,該第1導體路徑將第1電容器電連接在預定的半導體元件連接焊盤之間,該第2導體路徑將所述第2電容器電連接在所述預定的半導體元件連接焊盤之間,所述第1導體路徑的電感小於所述第2導體路徑的電感,並且,所述第1電容器的電容量小於所述第2電容器的電容量且所述第1電容器的內部電感小於所述第2電容器的內部電感。 A semiconductor device mounting substrate according to an embodiment of the present invention includes: an insulating substrate having a laminated structure in which a plurality of insulating layers are laminated; a circuit conductor disposed on a surface and inside of the insulating substrate; and a plurality of semiconductors The element connection pad is disposed on the surface of the insulating substrate and connected to a part of the circuit conductor; the semiconductor element is mounted on the surface of the insulating substrate via the semiconductor element connection pad; the first capacitor and the second capacitor are matched Provided on a surface or inside of the insulating substrate; and the first conductor path and the second conductor path include a part of the circuit conductor, and the first conductor path electrically connects the first capacitor between the predetermined semiconductor element connection pads. a second conductor path electrically connecting the second capacitor between the predetermined semiconductor element connection pads, wherein an inductance of the first conductor path is smaller than an inductance of the second conductor path, and the first capacitor The capacitance is smaller than the capacitance of the second capacitor and the internal inductance of the first capacitor is smaller than the internal inductance of the second capacitor.

1‧‧‧絕緣基板 1‧‧‧Insert substrate

1a‧‧‧絕緣層 1a‧‧‧Insulation

1b‧‧‧絕緣層 1b‧‧‧Insulation

2‧‧‧電路導體 2‧‧‧Circuit conductor

3‧‧‧半導體元件連接焊盤 3‧‧‧Semiconductor component connection pads

4‧‧‧外部連接焊盤 4‧‧‧External connection pads

5‧‧‧第1電容器 5‧‧‧1st capacitor

5t‧‧‧電極 5t‧‧‧electrode

6‧‧‧第2電容器 6‧‧‧2nd capacitor

6t‧‧‧電極 6t‧‧‧electrode

7‧‧‧凹部 7‧‧‧ recess

8‧‧‧凹部 8‧‧‧ recess

9‧‧‧通孔 9‧‧‧through hole

10‧‧‧通孔 10‧‧‧through hole

11‧‧‧穿孔 11‧‧‧Perforation

12‧‧‧阻焊層 12‧‧‧ solder mask

12a‧‧‧開口 12a‧‧‧ openings

12b‧‧‧開口 12b‧‧‧ openings

A‧‧‧基板 A‧‧‧Substrate

B‧‧‧焊料凸塊 B‧‧‧ solder bumps

S‧‧‧半導體元件 S‧‧‧Semiconductor components

第1圖為顯示本發明的半導體元件搭載基板的實施方式的一例的示意剖視圖。 Fig. 1 is a schematic cross-sectional view showing an example of an embodiment of a semiconductor element mounting substrate of the present invention.

首先,基於第1圖對本發明的半導體元件搭載基板A的一例進行說明。 First, an example of the semiconductor element mounting substrate A of the present invention will be described based on Fig. 1 .

配線基板A係包括:絕緣基板1、電路導體2、半導體元件連接焊盤3、外部連接焊盤4、半導體元件S、第1電容器5和第2電容器6。 The wiring board A includes an insulating substrate 1, a circuit conductor 2, a semiconductor element connection pad 3, an external connection pad 4, a semiconductor element S, a first capacitor 5, and a second capacitor 6.

此種半導體元件搭載基板A係具備:絕緣基板1,形成為在核心用的絕緣層1a的上下表面積層了疊構(build up)用的絕緣層1b;電路導體2,被配設在絕緣基 板1的表面及內部;多個半導體元件連接焊盤3,被配設在絕緣基板1的表面,並與電路導體2的一部分連接;半導體元件S,經由半導體元件連接焊盤3而被搭載在絕緣基板1的表面上;和第1電容器5及第2電容器6,被內置於絕緣基板1。 The semiconductor element mounting substrate A includes an insulating substrate 1 formed as an insulating layer 1b for building up and down on the upper and lower surfaces of the insulating layer 1a for the core, and a circuit conductor 2 disposed on the insulating substrate. The surface and the inside of the board 1 are provided; the plurality of semiconductor element connection pads 3 are disposed on the surface of the insulating substrate 1 and connected to a part of the circuit conductor 2; and the semiconductor element S is mounted on the semiconductor element connection pad 3 via the semiconductor element The surface of the insulating substrate 1 and the first capacitor 5 and the second capacitor 6 are built in the insulating substrate 1.

第1電容器5被內置於搭載有半導體元件S的一側的絕緣基板1的上側內,並通過由電路導體2的一部分所形成的第1導體路徑而電連接在預定的半導體元件連接焊盤3彼此之間。 The first capacitor 5 is built in the upper side of the insulating substrate 1 on the side on which the semiconductor element S is mounted, and is electrically connected to the predetermined semiconductor element connection pad 3 via the first conductor path formed by a part of the circuit conductor 2 . between us.

第2電容器6被內置於絕緣基板1中的第1電容器5的下方,並通過由電路導體2的一部分所形成且長於第1導體路徑長度的第2導體路徑而電連接在所述預定的半導體元件連接焊盤3彼此之間。 The second capacitor 6 is built in the lower side of the first capacitor 5 in the insulating substrate 1, and is electrically connected to the predetermined semiconductor by a second conductor path formed by a part of the circuit conductor 2 and longer than the length of the first conductor path. The component connection pads 3 are between each other.

如此,通過分別經由第1及第2導體路徑而相對於半導體元件S來並聯連接被內置於半導體元件S正下方的絕緣基板1內的第1及第2電容器5、6,從而成為向半導體元件S供給更多電流的構造。 In this way, the first and second capacitors 5 and 6 built in the insulating substrate 1 directly under the semiconductor element S are connected in parallel to the semiconductor element S via the first and second conductor paths, thereby forming the semiconductor element. S is a structure that supplies more current.

為了向半導體元件S穩定地供給電流,重點在於:通過使第1電容器5的電容與第2電容器6的電容之和設為充分大,且使第1電容器5的內部電感與第1導體路徑的電感之和、以及第2電容器6的內部電感與第2導體路徑的電感之和當中的至少一方盡可能地小,從而抑制導體路徑整體的阻抗值。 In order to stably supply a current to the semiconductor element S, it is important that the sum of the capacitance of the first capacitor 5 and the capacitance of the second capacitor 6 is sufficiently large, and the internal inductance of the first capacitor 5 and the first conductor path are made. At least one of the sum of the inductances and the sum of the internal inductance of the second capacitor 6 and the inductance of the second conductor path is as small as possible, and the impedance value of the entire conductor path is suppressed.

絕緣基板1係形成為在核心用的絕緣層1a的 上下表面積層了疊構用的絕緣層1b。 The insulating substrate 1 is formed as an insulating layer 1a for the core The upper and lower surface areas are laminated with an insulating layer 1b for lamination.

各絕緣層1a、1b包含例如環氧樹脂、雙馬來醯亞胺三嗪樹脂(Bismaleimide-Triazine Resin)等熱固化性樹脂。 Each of the insulating layers 1a and 1b contains a thermosetting resin such as an epoxy resin or a Bismaleimide-Triazine Resin.

在核心用的絕緣層1a的上表面中央部形成有凹部7。在核心用的絕緣層1a的下表面中央部形成有凹部8。此等各凹部7、8係例如通過噴砂加工、雷射加工而被形成。 A recess 7 is formed in a central portion of the upper surface of the insulating layer 1a for the core. A recess 8 is formed in a central portion of the lower surface of the insulating layer 1a for the core. These recesses 7, 8 are formed, for example, by sandblasting or laser processing.

在凹部7載置有第1電容器5。而且,通過在核心用的絕緣層1a的上表面積層疊構用的絕緣層1b以填充凹部7與第1電容器5之間的間隙,從而將第1電容器5固定在凹部7內。 The first capacitor 5 is placed on the recess 7. In addition, the first capacitor 5 is fixed in the recess 7 by filling the gap between the recess 7 and the first capacitor 5 by laminating the insulating layer 1b on the upper surface area of the insulating layer 1a for the core.

在凹部8載置有第2電容器6。而且,通過在核心用的絕緣層1a的下表面積層疊構用的絕緣層1b以填充凹部8與第2電容器6之間的間隙,從而將第2電容器6固定在凹部8內。 The second capacitor 6 is placed on the recess 8 . Then, the second capacitor 6 is fixed in the recess 8 by filling the gap between the recess 8 and the second capacitor 6 by laminating the insulating layer 1b disposed on the lower surface area of the insulating layer 1a for the core.

在絕緣基板1的上側具有以第1電容器的電極5t作為底面的多個通孔9。在絕緣基板1的下側具有以第2電容器的電極6t作為底面的多個通孔10。通孔9、10的直徑為20~100μm左右,通過例如雷射加工而被形成。 On the upper side of the insulating substrate 1, a plurality of through holes 9 having the electrode 5t of the first capacitor as a bottom surface are provided. On the lower side of the insulating substrate 1, a plurality of through holes 10 having the electrode 6t of the second capacitor as a bottom surface are provided. The through holes 9 and 10 have a diameter of about 20 to 100 μm and are formed by, for example, laser processing.

絕緣基板1具有貫通上下的多個穿孔11。穿孔11的直徑為50~300μm左右,通過例如鑽孔加工而被形成。 The insulating substrate 1 has a plurality of through holes 11 penetrating the upper and lower sides. The perforation 11 has a diameter of about 50 to 300 μm and is formed by, for example, drilling.

電路導體2被形成在絕緣基板1的上下表面以及通孔9、10內及穿孔11內。被形成在通孔9內的電路導體2與第1電容器的電極5t連接。被形成在通孔10內的電路導體2與第2電容器的電極6t連接。 The circuit conductor 2 is formed in the upper and lower surfaces of the insulating substrate 1 and in the through holes 9, 10 and in the through holes 11. The circuit conductor 2 formed in the through hole 9 is connected to the electrode 5t of the first capacitor. The circuit conductor 2 formed in the through hole 10 is connected to the electrode 6t of the second capacitor.

被形成在穿孔11內的電路導體2將絕緣基板1的上下表面的電路導體2彼此電連接。 The circuit conductors 2 formed in the through holes 11 electrically connect the circuit conductors 2 on the upper and lower surfaces of the insulating substrate 1 to each other.

電路導體2係例如通過習知的半加成法、減成法,利用銅鍍覆等的良導電性金屬而被形成。 The circuit conductor 2 is formed by, for example, a conventional semi-additive method or a subtractive method using a good conductive metal such as copper plating.

半導體元件連接焊盤3包括於絕緣基板1的上表面所形成的電路導體2的一部分。半導體元件連接焊盤3係露出於開口12a內,所述開口12a係被設置在絕緣基板1的上表面所覆著的阻焊層12。 The semiconductor element connection pad 3 includes a part of the circuit conductor 2 formed on the upper surface of the insulating substrate 1. The semiconductor element connection pad 3 is exposed in the opening 12a, and the opening 12a is provided on the solder resist layer 12 which is provided on the upper surface of the insulating substrate 1.

外部連接焊盤4包括於絕緣基板1的下表面所形成的電路導體2的一部分。外部連接焊盤4係露出於開口12b內,所述開口12b係被設置在絕緣基板1的下表面所覆著的阻焊層12。 The external connection pad 4 includes a part of the circuit conductor 2 formed on the lower surface of the insulating substrate 1. The external connection pads 4 are exposed in the opening 12b, and the openings 12b are provided on the solder resist layer 12 which is provided on the lower surface of the insulating substrate 1.

半導體元件S可舉例如微處理器、半導體記憶體等,由矽、鍺等形成。半導體元件S的電極係例如經由焊料凸塊B而與半導體元件連接焊盤3連接。 The semiconductor element S can be formed, for example, of a microprocessor or a semiconductor memory, and is formed of ruthenium, iridium or the like. The electrode of the semiconductor element S is connected to the semiconductor element connection pad 3 via solder bumps B, for example.

第1電容器5及第2電容器6係例如形成為交替地積層含陶瓷的介電體與含銅的電極。第1及第2電容器5、6在最外層的兩個位置分別具有電極5t及6t。 The first capacitor 5 and the second capacitor 6 are formed, for example, by alternately laminating a ceramic-containing dielectric body and a copper-containing electrode. The first and second capacitors 5 and 6 have electrodes 5t and 6t at two positions on the outermost layer.

第2電容器6的電容量係大於第1電容器5的電容量,而能夠向半導體元件S供給更多的電流。另一方面,第1電容器5的內部電感係小於第2電容器6的內部電感而有利於電流供給路徑的阻抗的降低。 The capacitance of the second capacitor 6 is larger than the capacitance of the first capacitor 5, and more current can be supplied to the semiconductor element S. On the other hand, the internal inductance of the first capacitor 5 is smaller than the internal inductance of the second capacitor 6, which is advantageous in reducing the impedance of the current supply path.

第1電容器5係與半導體元件連接焊盤3連接,並經由包括被形成於通孔9內的電路導體2之第1導 體路徑而與半導體元件S電連接。 The first capacitor 5 is connected to the semiconductor element connection pad 3 and passes through the first lead including the circuit conductor 2 formed in the through hole 9. The body path is electrically connected to the semiconductor element S.

第2電容器6係與半導體元件連接焊盤3連接,並經由包括被形成於絕緣基板1的上下表面及穿孔11內、以及通孔10內的電路導體2之第2導體路徑而與半導體元件S電連接。 The second capacitor 6 is connected to the semiconductor element connection pad 3 and passes through the second conductor path including the circuit conductor 2 formed in the upper and lower surfaces of the insulating substrate 1 and the through hole 11 and in the via hole 10, and the semiconductor element S. Electrical connection.

如此,由於第1導體路徑長度短於第2導體路徑長度,因此第1導體路徑的電感小於第2導體路徑的電感。 As described above, since the length of the first conductor path is shorter than the length of the second conductor path, the inductance of the first conductor path is smaller than the inductance of the second conductor path.

在具有多個導體路徑的以往的半導體元件搭載基板中,例如,第2導體路徑長度長於第1導體路徑長度的情況下,第2導體路徑的電感有時會大於第1導體路徑的電感。 In the conventional semiconductor element mounting substrate having a plurality of conductor paths, for example, when the second conductor path length is longer than the first conductor path length, the inductance of the second conductor path may be larger than the inductance of the first conductor path.

因此,如果不考慮與第1導體路徑連接的第1電容器5的內部電感和與第2導體路徑連接的第2電容器6的內部電感的大小關係,則無法抑制導體路徑整體的阻抗值,使得電流變動變大。其結果,可能無法使電子設備穩定地進行工作。 Therefore, if the internal inductance of the first capacitor 5 connected to the first conductor path and the internal inductance of the second capacitor 6 connected to the second conductor path are not considered, the impedance value of the entire conductor path cannot be suppressed, so that the current is suppressed. The change becomes larger. As a result, the electronic device may not be able to operate stably.

相對於此,本發明的半導體元件搭載基板A係將內部電感比第2電容器6小的第1電容器5與電感較小的第1導體路徑連接。由此,能夠確保電感成分更小的路徑,而抑制導體路徑整體的阻抗值。 On the other hand, in the semiconductor element mounting substrate A of the present invention, the first capacitor 5 having a smaller internal inductance than the second capacitor 6 is connected to the first conductor path having a smaller inductance. Thereby, it is possible to secure a path having a smaller inductance component and suppress the impedance value of the entire conductor path.

而且,通過將與第2導體路徑連接的第2電容器6的電容設為大於第1電容器5的電容,而能夠使第1電容器5的電容量與第2電容器6的電容量之和充分大。 Further, by setting the capacitance of the second capacitor 6 connected to the second conductor path to be larger than the capacitance of the first capacitor 5, the sum of the capacitance of the first capacitor 5 and the capacitance of the second capacitor 6 can be sufficiently increased.

其結果,能夠向半導體元件S供給經抑制電流變動的 更多電流。因此,能夠提供可使電子設備穩定地工作的半導體元件搭載基板A。 As a result, it is possible to supply the semiconductor element S with a suppressed current fluctuation. More current. Therefore, it is possible to provide the semiconductor element mounting substrate A which can stably operate the electronic device.

Claims (2)

一種半導體元件搭載基板,包括:絕緣基板,具有積層了多個絕緣層的積層構造;電路導體,被配設在該絕緣基板的表面及內部;多個半導體元件連接焊盤,被配設在所述絕緣基板的表面且與所述電路導體的一部分連接;半導體元件,經由所述半導體元件連接焊盤而被搭載在所述絕緣基板的表面上;第1電容器及第2電容器,該第1電容器被配設在該半導體元件正下方之所述絕緣基板的內部,該第2電容器被配設在該第1電容器的下方;和第1導體路徑及第2導體路徑,包含所述電路導體的一部分,該第1導體路徑將所述第1電容器電連接在預定的所述半導體元件連接焊盤之間,該第2導體路徑將所述第2電容器與所述第1電容器並聯地電連接在所述預定的半導體元件連接焊盤之間,所述第1導體路徑的電感小於所述第2導體路徑的電感,並且,所述第1電容器的電容量小於所述第2電容器的電容量且所述第1電容器的內部電感小於所述第2電容器的內部電感。 A semiconductor element mounting substrate includes: an insulating substrate having a laminated structure in which a plurality of insulating layers are laminated; a circuit conductor disposed on a surface and inside of the insulating substrate; and a plurality of semiconductor element connection pads disposed in the substrate a surface of the insulating substrate is connected to a part of the circuit conductor; a semiconductor element is mounted on a surface of the insulating substrate via the semiconductor element connection pad; and a first capacitor and a second capacitor, the first capacitor The second capacitor is disposed below the first capacitor, and the first conductor path and the second conductor path include a part of the circuit conductor. The first conductor path electrically connects the first capacitor between predetermined semiconductor element connection pads, and the second conductor path electrically connects the second capacitor and the first capacitor in parallel Between the predetermined semiconductor element connection pads, the inductance of the first conductor path is smaller than the inductance of the second conductor path, and the capacitance of the first capacitor It is smaller than the capacitance of the second capacitor and the first capacitor internal inductance is less than the internal inductance of the second capacitor. 如申請專利範圍第1項所述的半導體元件搭載基板,其中,所述第1導體路徑的長度短於第2導體路徑的長度。 The semiconductor element mounting substrate according to the first aspect of the invention, wherein the length of the first conductor path is shorter than the length of the second conductor path.
TW105139225A 2016-11-29 2016-11-29 Semiconductor element-mounted substrate TWI628771B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW105139225A TWI628771B (en) 2016-11-29 2016-11-29 Semiconductor element-mounted substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW105139225A TWI628771B (en) 2016-11-29 2016-11-29 Semiconductor element-mounted substrate

Publications (2)

Publication Number Publication Date
TW201820576A TW201820576A (en) 2018-06-01
TWI628771B true TWI628771B (en) 2018-07-01

Family

ID=63258063

Family Applications (1)

Application Number Title Priority Date Filing Date
TW105139225A TWI628771B (en) 2016-11-29 2016-11-29 Semiconductor element-mounted substrate

Country Status (1)

Country Link
TW (1) TWI628771B (en)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW523556B (en) * 1998-05-12 2003-03-11 Semitool Inc Process for etching thin-film layers of a workpiece used to form microelectronic circuits or components
TW200531176A (en) * 2003-12-11 2005-09-16 Ibm Wrap-around gate field effect transistor
TWI553785B (en) * 2014-03-31 2016-10-11 美光科技公司 Stacked semiconductor die assembly with improved thermal performance and related systems and methods

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW523556B (en) * 1998-05-12 2003-03-11 Semitool Inc Process for etching thin-film layers of a workpiece used to form microelectronic circuits or components
TW200531176A (en) * 2003-12-11 2005-09-16 Ibm Wrap-around gate field effect transistor
TWI553785B (en) * 2014-03-31 2016-10-11 美光科技公司 Stacked semiconductor die assembly with improved thermal performance and related systems and methods

Also Published As

Publication number Publication date
TW201820576A (en) 2018-06-01

Similar Documents

Publication Publication Date Title
JP4387231B2 (en) Capacitor-mounted wiring board and manufacturing method thereof
JP5715009B2 (en) Component built-in wiring board and manufacturing method thereof
JP5583828B1 (en) Electronic component built-in multilayer wiring board and method for manufacturing the same
US10109576B2 (en) Capacitor mounting structure
KR20080076241A (en) Electronic circuit board and manufacturing method
JP4365166B2 (en) Capacitor, multilayer wiring board, and semiconductor device
TWI599281B (en) Package carrier and method for manufacturing same
JP4829998B2 (en) Capacitor-mounted wiring board
JP4983906B2 (en) Electronic component built-in module
JP5190811B2 (en) Power module
KR20150065029A (en) Printed circuit board, manufacturing method thereof and semiconductor package
CN108122856B (en) Semiconductor element mounting substrate
KR102194719B1 (en) Package board and package using the same
JP2019179865A (en) Circuit board and method for manufacturing circuit board
TWI628771B (en) Semiconductor element-mounted substrate
US20140201992A1 (en) Circuit board structure having embedded electronic element and fabrication method thereof
JP2013073951A (en) Multilayer circuit board with built-in through capacitor and mounting structure of multilayer circuit board with built-in through capacitor
US20170125348A1 (en) System in package
JP2017045821A (en) Semiconductor device mounting substrate
KR20180060589A (en) Semiconductor device mounting board
JP2015126153A (en) Wiring board
WO2021084750A1 (en) Interposer mounted substrate
KR100653247B1 (en) Printed circuit board with built-in electric element and manufacturing method thereof
JP4084728B2 (en) Package for semiconductor device and semiconductor device
US9984984B1 (en) Semiconductor element mounting board