TWI625798B - Hollow closed sheet and method of manufacturing hollow package - Google Patents
Hollow closed sheet and method of manufacturing hollow package Download PDFInfo
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- TWI625798B TWI625798B TW103114395A TW103114395A TWI625798B TW I625798 B TWI625798 B TW I625798B TW 103114395 A TW103114395 A TW 103114395A TW 103114395 A TW103114395 A TW 103114395A TW I625798 B TWI625798 B TW I625798B
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- H10W74/124—
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- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
- H03H9/02—Details
- H03H9/05—Holders or supports
- H03H9/10—Mounting in enclosures
- H03H9/1064—Mounting in enclosures for surface acoustic wave [SAW] devices
- H03H9/1078—Mounting in enclosures for surface acoustic wave [SAW] devices the enclosure being defined by a foil covering the non-active sides of the SAW device
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Abstract
本發明提供一種可製作信賴性高的中空封裝之中空封閉薄片及中空封裝之製造方法。本發明係用於中空封閉電子零件之中空封閉薄片,其含樹脂,且在40℃以上且100℃以下控制樹脂對中空部之進入性。於具有寬度20μm之狹縫之成形模具中填充前述樹脂,在壓力10kg/cm2、溫度150℃下加壓前述樹脂10分鐘時,樹脂對前述狹縫之進入量較好為3mm以下。 The present invention provides a hollow sealing sheet and a method of manufacturing a hollow package which can produce a highly reliable hollow package. The present invention relates to a hollow closed sheet of a hollow closed electronic component which contains a resin and controls the ingress of the resin into the hollow portion at 40 ° C or more and 100 ° C or less. The resin was filled in a molding die having a slit having a width of 20 μm, and when the resin was pressed at a pressure of 10 kg/cm 2 and a temperature of 150 ° C for 10 minutes, the amount of resin entering the slit was preferably 3 mm or less.
Description
本發明係關於中空封閉薄片及中空封裝之製造方法。 The present invention relates to a method of manufacturing a hollow closed sheet and a hollow package.
半導體等電子零件封裝之製作中,代表性係採用以封閉樹脂將固定於基板或暫時固定材等之1個或複數個電子零件予以封閉,並視需要以成為電子零件單位封裝之方式切割封閉物之順序。作為該封閉樹脂係使用處理性良好之薄片狀之封閉樹脂。且,作為用以提高中空封閉薄片之性能而增加填充劑之調配量之手法,已提案藉由混練將填充劑調配於封閉用薄片中之技術(專利文獻1)。 In the production of an electronic component package such as a semiconductor, one or a plurality of electronic components fixed to a substrate or a temporary fixing material are sealed by a sealing resin, and the closure is cut as an electronic component unit package as needed. The order. As the sealing resin, a flaky sealing resin having good handleability is used. Further, as a technique for increasing the blending amount of the filler to improve the performance of the hollow sealing sheet, a technique of blending a filler into a sheet for sealing has been proposed (Patent Document 1).
專利文獻1:日本特開2013-7028號公報 Patent Document 1: Japanese Laid-Open Patent Publication No. 2013-7028
近年來,與半導體封裝並列,已進展SAW(表面聲波(Surface Acoustic Wave))濾波片、或CMOS(互補式金屬氧化物半導體(Complementary Metal Oxide Semiconductor)感測器、加速度感測器等之稱為MEMS之微小電子零件的開發。該等電子零件各具有用以確保一般之表面彈性波之傳播或光學系統之維持、可動構件之可動性等之中空構造。封閉時,必須以確保可動構件之作動信賴性或元件之連接信賴性之方式一面維持中空構造一面封閉。對於封閉薄片則要求對應於具有該中空構造之中空封裝之需求。 In recent years, in parallel with semiconductor packages, SAW (Surface Acoustic Wave) filters, or CMOS (Complementary Metal Oxide Semiconductor) sensors, acceleration sensors, etc. have been developed. Development of microelectronic parts for MEMS. Each of these electronic parts has a hollow structure for ensuring the propagation of a general surface elastic wave, the maintenance of an optical system, and the mobility of a movable member. When closing, it is necessary to ensure the movement of the movable member. The reliability or the connection reliability of the components is closed while maintaining the hollow structure. For the closed sheet, a requirement corresponding to the hollow package having the hollow structure is required.
本發明之目的係提供一種可製作信賴性高的中空封裝之中空封閉薄片及中空封裝之製造方法。 SUMMARY OF THE INVENTION An object of the present invention is to provide a hollow sealing sheet and a method of manufacturing a hollow package which can produce a highly reliable hollow package.
本發明人等積極檢討之結果,發現藉由採用下述構成可解決上述課題,因而完成本發明。 As a result of a positive review by the inventors of the present invention, it has been found that the above problems can be solved by adopting the following configuration, and thus the present invention has been completed.
亦即,本發明係一種用於中空封閉電子零件之中空封閉薄片,其含樹脂,且在40℃以上且100℃以下控制樹脂對中空部之進入性。 That is, the present invention is a hollow sealing sheet for a hollow enclosed electronic component which contains a resin and controls the ingress of the resin into the hollow portion at 40 ° C or more and 100 ° C or less.
該中空封閉薄片由於在40℃以上且100℃以下控制樹脂對中空部之進入性,故在中空封閉時能抑制樹脂對中空部之進入,可製作信賴性高之中空封裝。 Since the hollow closed sheet controls the entry of the resin into the hollow portion at 40 ° C or more and 100 ° C or less, the entry of the resin into the hollow portion can be suppressed at the time of hollow sealing, and a highly reliable hollow package can be produced.
該中空封閉薄片較好於具有寬度20μm之狹縫 之成形模具中填充前述樹脂,在壓力10kg/cm2、溫度150℃下加壓前述樹脂10分鐘時之樹脂對前述狹縫之進入量為3mm以下。藉此,由於樹脂在加熱加壓下對特定狹縫之進入性受到抑制,故可製作具有更高信賴性之中空封裝。又,樹脂進入量之測定係如實施例之記載。 The hollow sealing sheet is preferably filled with the resin in a molding die having a slit having a width of 20 μm, and the resin enters the slit at a pressure of 10 kg/cm 2 and a temperature of 150 ° C for 10 minutes. the following. Thereby, since the ingress property of the resin to a specific slit under heat and pressure is suppressed, a hollow package having higher reliability can be produced. Further, the measurement of the amount of resin entering is as described in the examples.
該中空封閉薄片於使樹脂對寬度1μm以上且100μm以下之狹縫之進入量相對於狹縫寬度作圖時,較好該作圖中存在極小值。關於存在該極小值之機制並不確定,但推測如下。例如中空封閉薄片含無機填充劑或彈性體粒子等之擴容(dilatancy)賦予性之微小粒子時,在狹縫周邊區域發揮擴容般作用,而抑制了樹脂對狹縫之進入。狹縫寬度相比於微小粒子之粒徑為充分大時,擴容般作用較弱,使樹脂容易與微小粒子一起進入狹縫中,使樹脂進入量變大。隨著狹縫寬度變小,擴容般作用變強,樹脂進入量亦變小,在某一點樹脂進入量成為極小值。因此,狹縫寬度為一定值以下時,該次之微小粒子對狹縫之進入受到限制,成為僅樹脂成分進入狹縫。僅樹脂時擴容般作用變弱,故樹脂進入量變大。對中空封閉薄片所負載之力為一定時,狹縫寬度愈小樹脂變成朝狹縫擠出,結果,使樹脂進入量變得更大。據此認為樹脂進入量對於狹縫寬度之作圖存在極小值。此外,藉由利用該現象,可以使擴容般作用相對於中空部之間隙間隔最大化之方式設計中空封閉薄片之組成調配,可效率更良好地限制樹脂對中空部之進入而製作高信賴性之中空封裝。 The hollow closed sheet preferably has a minimum value in the drawing when the amount of penetration of the resin into the slit having a width of 1 μm or more and 100 μm or less is plotted against the slit width. The mechanism for the existence of this minimum value is not certain, but is presumed as follows. For example, when the hollow sealing sheet contains fine particles imparted by dilatancy such as an inorganic filler or an elastomer particle, the expansion of the slit is performed in the peripheral region of the slit, and the entry of the resin into the slit is suppressed. When the slit width is sufficiently larger than the particle diameter of the fine particles, the effect of expansion is weak, and the resin easily enters the slit together with the fine particles, so that the resin entering amount becomes large. As the slit width becomes smaller, the effect of expansion becomes stronger, the amount of resin entering becomes smaller, and the amount of resin entering at a certain point becomes a minimum value. Therefore, when the slit width is equal to or less than a certain value, the entry of the secondary fine particles into the slit is restricted, and only the resin component enters the slit. When the resin is only expanded, the effect becomes weak, so the amount of resin entering becomes large. When the force applied to the hollow closed sheet is constant, the smaller the slit width, the resin is extruded toward the slit, and as a result, the amount of resin entering becomes larger. Accordingly, it is considered that the amount of resin entering has a minimum value for the plot of the slit width. Further, by utilizing this phenomenon, it is possible to design the composition of the hollow closed sheet in such a manner that the gap-like action is maximized with respect to the gap interval of the hollow portion, and it is possible to more effectively limit the entry of the resin into the hollow portion to produce high reliability. Hollow package.
該封閉薄片中,前述極小值較好為2mm以下。據此,可更高度地抑制樹脂進入性,可進一步提高中空封裝之信賴性。 In the sealing sheet, the minimum value is preferably 2 mm or less. According to this, the resin ingress property can be more highly suppressed, and the reliability of the hollow package can be further improved.
本發明係一種中空封裝之製造方法,其包含下列步驟:以包覆一或複數電子零件之方式使上述中空封閉薄片在該電子零件上邊維持中空部邊層合之層合步驟,及使前述中空封閉薄片硬化而形成封閉體之封閉體形成步驟。 The present invention relates to a method of manufacturing a hollow package, comprising the steps of: laminating a hollow sealing sheet on a side of the electronic component by laminating one or a plurality of electronic components, and maintaining the hollow portion An enclosure forming step of sealing the sheet to form an enclosure.
本發明之製造方法由於使用樹脂對中空部之進入性受控制之該中空封閉薄片,故可製造良好地確保中空部,同時整體高信賴性之中空封裝。 In the production method of the present invention, since the hollow closed sheet in which the entry property of the hollow portion is controlled by the resin is used, it is possible to manufacture a hollow package in which the hollow portion is favorably secured and the overall reliability is high.
11‧‧‧中空封閉薄片 11‧‧‧ hollow sealing sheets
11a‧‧‧支撐體 11a‧‧‧Support
12‧‧‧印刷配線基板 12‧‧‧Printed wiring substrate
13‧‧‧SAW晶片 13‧‧‧SAW chip
13a‧‧‧突起電極 13a‧‧‧protruding electrode
14‧‧‧中空部 14‧‧‧ Hollow
15‧‧‧封閉體 15‧‧‧Closed
18‧‧‧中空封裝 18‧‧‧ hollow package
100‧‧‧成形模具 100‧‧‧Forming mould
110‧‧‧下模具 110‧‧‧Next mold
111‧‧‧溝 111‧‧‧ditch
120‧‧‧上模具 120‧‧‧Upper mold
130‧‧‧棒 130‧‧‧ great
200‧‧‧樹脂 200‧‧‧Resin
L‧‧‧樹脂進入量 L‧‧‧resistance
O‧‧‧投入口 O‧‧‧ input
S‧‧‧狹縫 S‧‧ slit
圖1係示意性顯示本發明一實施形態之中空封閉薄片之剖面圖。 BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a cross-sectional view schematically showing a hollow sealing sheet according to an embodiment of the present invention.
圖2A係示意性顯示本發明一實施形態之中空封裝之製造方法之一步驟的剖面圖。 Fig. 2A is a cross-sectional view schematically showing a step of a method of manufacturing a hollow package according to an embodiment of the present invention.
圖2B係示意性顯示本發明一實施形態之中空封裝之製造方法之一步驟的剖面圖。 Fig. 2B is a cross-sectional view schematically showing a step of a method of manufacturing a hollow package according to an embodiment of the present invention.
圖2C係示意性顯示本發明一實施形態之中空封裝之製造方法之一步驟的剖面圖。 Fig. 2C is a cross-sectional view schematically showing a step of a method of manufacturing a hollow package according to an embodiment of the present invention.
圖3係本發明實施例之中空封閉薄片之切斷面之SEM 觀察像。 Figure 3 is a SEM of the cut surface of the hollow closed sheet of the embodiment of the present invention Observe the image.
圖4A係用於測定樹脂朝成形模具之狹縫的進入量之成形模具之示意剖面圖。 Fig. 4A is a schematic cross-sectional view of a molding die for measuring the amount of entry of a resin into a slit of a molding die.
圖4B係成形模具之下模之俯視圖。 Figure 4B is a plan view of the lower mold of the forming mold.
圖4C係顯示用以測定樹脂朝成形模具之狹縫的進入量之測定順序的剖面圖。 Fig. 4C is a cross-sectional view showing a measurement procedure for measuring the amount of entry of the resin into the slit of the molding die.
針對本實施形態之中空封閉薄片邊參照圖1邊加以說明。圖1係示意性顯示本發明一實施形態之中空封閉薄片之剖面圖。中空封閉薄片11代表性係以層合於聚對苯二甲酸乙二酯(PET)薄膜等之支撐體11a上之狀態提供。又,為使中空封閉薄片11之剝離容易進行,亦可對支撐體11a施以脫模處理。 The hollow sealing sheet of the present embodiment will be described with reference to Fig. 1 . BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a cross-sectional view schematically showing a hollow sealing sheet according to an embodiment of the present invention. The hollow sealing sheet 11 is typically provided in a state of being laminated on a support 11a of a polyethylene terephthalate (PET) film or the like. Moreover, in order to facilitate the peeling of the hollow sealing sheet 11, the support body 11a may be subjected to a mold release treatment.
中空封閉薄片11在40℃以上且100℃以下之樹脂對中空部14(參照圖2A)之進入性受到控制。據此,使用中空封閉薄片11所得之中空封裝18(參照圖2C)可確保中空部14,可以高水準獲得電子零件之作動信賴性及連接信賴性。 The entry of the resin of the hollow sealing sheet 11 at 40 ° C or more and 100 ° C or less with respect to the hollow portion 14 (refer to FIG. 2A) is controlled. According to this, the hollow package 18 (see FIG. 2C) obtained by using the hollow sealing sheet 11 can secure the hollow portion 14, and can achieve high reliability of the operation reliability and connection reliability of the electronic component.
於具有寬度20μm之狹縫之成形模具中填充形成中空封閉薄片11之樹脂,在壓力10kg/cm2、溫度 150℃下加壓前述樹脂10分鐘時之樹脂對前述狹縫之進入量較好為3mm以下,更好為2mm以下。藉由將加熱加壓下之樹脂進入性設為上述範圍,可製作具有更高信賴性之中空封裝。 The resin forming the hollow sealing sheet 11 is filled in a molding die having a slit having a width of 20 μm, and the resin enters the slit at a pressure of 10 kg/cm 2 and a temperature of 150 ° C for 10 minutes. 3mm or less, more preferably 2mm or less. By setting the resin intrusion under heat and pressure to the above range, a hollow package having higher reliability can be produced.
中空封閉薄片11在將樹脂對寬度1μm以上且100μm以下之狹縫之進入量對狹縫寬度作圖時,該作圖較好存在極小值。據此,可對用以使樹脂對中空部之進入量最小化之中空封閉薄片進行組成設計,可製造信賴性更高之中空封裝。 The hollow closed sheet 11 preferably has a minimum value when the amount of penetration of the resin into the slit having a width of 1 μm or more and 100 μm or less is plotted against the slit width. According to this, it is possible to design a hollow sealing sheet for minimizing the amount of entry of the resin into the hollow portion, and it is possible to manufacture a hollow package having higher reliability.
該封閉薄片中,前述極小值較好為2mm以下,更好為1mm以下。據此,可更高度地抑制樹脂進入性,可進一步提高中空封裝之信賴性。 In the sealing sheet, the minimum value is preferably 2 mm or less, more preferably 1 mm or less. According to this, the resin ingress property can be more highly suppressed, and the reliability of the hollow package can be further improved.
使中空封閉薄片在150℃下熱硬化1小時後在20℃下之線膨脹率較好為15ppm/K以下,更好為10ppm/K以下。據此,可良好地抑制中空封裝中之翹曲。線膨脹率之測定方法如下。使寬度4.9mm、長度25mm、厚度0.2mm之硬化前之中空封閉薄片在150℃硬化1小時。將硬化後之樹脂薄片固定在TMA8310(RIGAKU公司製)上,以拉伸荷重4.9mN、升溫速度10℃/min測定線膨脹率。 The linear expansion ratio at 20 ° C after the hollow sealing sheet is thermally cured at 150 ° C for 1 hour is preferably 15 ppm / K or less, more preferably 10 ppm / K or less. According to this, warpage in the hollow package can be satisfactorily suppressed. The method of measuring the coefficient of linear expansion is as follows. The hollow closed sheet before hardening having a width of 4.9 mm, a length of 25 mm, and a thickness of 0.2 mm was cured at 150 ° C for 1 hour. The cured resin sheet was fixed to TMA8310 (manufactured by RIGAKU Co., Ltd.), and the linear expansion ratio was measured at a tensile load of 4.9 mN and a temperature increase rate of 10 ° C/min.
形成中空封閉薄片之樹脂組成物可較好地賦與如上述之特性,且只要是可利用於半導體晶片等電子零件之樹脂封閉者即無特別限制。其中,較好含可限制中空部附近之樹脂流動的限制材料。該限制材料可較好地使用 彈性體或高黏度環氧樹脂、高黏度酚樹脂等高黏度物質,或無機填充劑等擴容賦予性之微小粒子。 The resin composition forming the hollow closed sheet can be preferably imparted with the above-described characteristics, and is not particularly limited as long as it is a resin sealer which can be used for an electronic component such as a semiconductor wafer. Among them, it is preferable to contain a limiting material which can restrict the flow of the resin in the vicinity of the hollow portion. The limiting material can be used well A high-viscosity substance such as an elastomer or a high-viscosity epoxy resin or a high-viscosity phenol resin, or an inorganic filler or the like to expand the imparting fine particles.
至於高黏度物質之黏度,只要考慮樹脂流動之限制程度或作業性等適當設定即可,但在80℃下較好為2000Pa‧s以上30000Pa‧s以下,更好為5000Pa‧s以上且25000以下。又,黏度可使用TA Instruments公司製之黏彈性測定裝置ARES,以平行板法測定。更詳言之,以間隙100μm、旋轉板直徑20mm、轉速10s-1之條件,測定50℃至200℃範圍之黏度,且讀取此時所得之在80℃下之黏度。 The viscosity of the high-viscosity substance may be appropriately set in consideration of the degree of restriction of the flow of the resin or the workability, but it is preferably 2,000 Pa·s or more and 30,000 Pa·s or less at 80 ° C, more preferably 5,000 Pa·s or more and 25,000 or less. . Further, the viscosity can be measured by a parallel plate method using a viscoelasticity measuring apparatus ARES manufactured by TA Instruments. More specifically, the viscosity in the range of 50 ° C to 200 ° C was measured under the conditions of a gap of 100 μm, a rotating plate diameter of 20 mm, and a number of revolutions of 10 s -1 , and the viscosity at 80 ° C obtained at this time was read.
列舉較佳者為含有以下A成分至E成分作為具體成分之環氧樹脂組成物。 Preferred examples are epoxy resin compositions containing the following components A to E as specific components.
A成分:環氧樹脂 Component A: Epoxy
B成分:酚樹脂 B component: phenolic resin
C成分:彈性體 Component C: Elastomer
D成分:無機填充劑 D component: inorganic filler
E成分:硬化促進劑 Component E: Hardening accelerator
作為熱硬化性樹脂之環氧樹脂(A成分)並無特別限制。可使用例如三苯基甲烷型環氧樹脂、甲酚酚醛清漆型環氧樹脂、聯苯型環氧樹脂、改質雙酚A型環氧樹脂、雙酚A型環氧樹脂、雙酚F型環氧樹脂、改質雙酚F型環氧樹脂、二環戊二烯型環氧樹脂、酚酚醛清漆型環氧樹 脂、苯氧樹脂等各種環氧樹脂。該等環氧樹脂可單獨使用亦可併用2種以上。 The epoxy resin (component A) which is a thermosetting resin is not particularly limited. For example, a triphenylmethane type epoxy resin, a cresol novolak type epoxy resin, a biphenyl type epoxy resin, a modified bisphenol A type epoxy resin, a bisphenol A type epoxy resin, a bisphenol F type can be used. Epoxy resin, modified bisphenol F type epoxy resin, dicyclopentadiene type epoxy resin, phenol novolac type epoxy tree Various epoxy resins such as grease and phenoxy resin. These epoxy resins may be used alone or in combination of two or more.
就確保環氧樹脂硬化後之韌性及環氧樹脂之反應性之觀點而言,以環氧當量150~250、軟化點或熔點為50~130℃之在常溫為固態者較佳,其中,就信賴性之觀點而言,較好為三苯基甲烷型環氧樹脂、甲酚酚醛清漆型環氧樹脂、聯苯型環氧樹脂。 From the viewpoint of ensuring the toughness of the epoxy resin after hardening and the reactivity of the epoxy resin, it is preferable to use an epoxy equivalent of 150 to 250, a softening point or a melting point of 50 to 130 ° C at room temperature as a solid state, wherein From the viewpoint of reliability, a triphenylmethane type epoxy resin, a cresol novolak type epoxy resin, and a biphenyl type epoxy resin are preferable.
且,就低應力性之觀點而言,以具有乙縮醛基或聚氧伸烷基等柔軟性骨架之改質雙酚A型環氧樹脂較佳,具有乙縮醛基之改質雙酚A型環氧樹脂由於為液狀且處理良好,故特別適用。 Further, from the viewpoint of low stress, a modified bisphenol A type epoxy resin having a soft skeleton such as an acetal group or a polyoxyalkylene group is preferred, and an acetal-based modified bisphenol is preferred. A type epoxy resin is particularly suitable because it is liquid and is handled well.
環氧樹脂之重量平均分子量變大時黏度亦變高,環氧樹脂本身可作為上述限制材料發揮作用。重量平均分子量只要為可作為上述限制材料發揮作用之程度即無特別限制,但較好為150以上,更好為300以上。 When the weight average molecular weight of the epoxy resin becomes large, the viscosity also becomes high, and the epoxy resin itself can function as the above-mentioned limiting material. The weight average molecular weight is not particularly limited as long as it can function as the above-mentioned limiting material, but is preferably 150 or more, more preferably 300 or more.
環氧樹脂(A成分)之含量較好設定為相對於環氧樹脂組成物全體為1~10重量%之範圍。 The content of the epoxy resin (component A) is preferably in the range of 1 to 10% by weight based on the total amount of the epoxy resin composition.
酚樹脂(B成分)若為可作為熱硬化性樹脂使用,同時與環氧樹脂(A成分)之間引起硬化反應者即無特別限制。可使用例如酚酚醛清漆樹脂、酚芳烷基樹脂、聯苯芳烷基樹脂、二環戊二烯型酚樹脂、甲酚酚醛清漆樹脂、間苯二酚樹脂等。該等酚樹脂可單獨使用,亦可併用2種以 上。 The phenol resin (component B) is not particularly limited as long as it can be used as a thermosetting resin and a hardening reaction with an epoxy resin (component A). For example, a phenol novolak resin, a phenol aralkyl resin, a biphenyl aralkyl resin, a dicyclopentadiene type phenol resin, a cresol novolak resin, a resorcin resin, or the like can be used. These phenol resins may be used singly or in combination of two on.
作為酚樹脂,就與環氧樹脂(A成分)之反應性之觀點而言,較好使用羥基當量為70~250,軟化點為50~110℃者,其中就硬化反應性高之觀點而言,可較好地使用酚酚醛清漆樹脂。且,就信賴性之觀點而言,亦可較好地使用如酚酚醛清漆樹脂或聯苯芳烷基樹脂之低吸濕性者。 As the phenol resin, from the viewpoint of reactivity with the epoxy resin (component A), it is preferred to use a hydroxyl group equivalent of 70 to 250 and a softening point of 50 to 110 ° C, wherein the curing reactivity is high. The phenol novolak resin can be preferably used. Further, from the viewpoint of reliability, a low hygroscopic property such as a phenol novolak resin or a biphenyl aralkyl resin can be preferably used.
環氧樹脂(A成分)與酚樹脂(B成分)之調配比例,就硬化反應性之觀點而言,較好以使酚樹脂(B成分)中之羥基之合計相對於環氧樹脂(A成分)中之環氧基1當量成為0.7~1.5當量之方式加以調配,更好為0.9~1.2當量。 The ratio of the epoxy resin (component A) to the phenol resin (component B) is preferably such that the total of the hydroxyl groups in the phenol resin (component B) is relative to the epoxy resin (component A) from the viewpoint of curing reactivity. In the case where the epoxy group 1 equivalent is 0.7 to 1.5 equivalents, it is preferably 0.9 to 1.2 equivalents.
酚樹脂之重量平均分子量變大時黏度亦變高,酚樹脂本身可作為上述限制材料發揮作用。重量平均分子量只要為可作為上述限制材料發揮作用之程度即無特別限制,但較好為150以上,更好為300以上。 When the weight average molecular weight of the phenol resin becomes large, the viscosity also becomes high, and the phenol resin itself can function as the above-mentioned limiting material. The weight average molecular weight is not particularly limited as long as it can function as the above-mentioned limiting material, but is preferably 150 or more, more preferably 300 or more.
又,本說明書中,重量平均分子量之測定方法可藉以下方法測定。將試料以0.1wt%溶解於THF中,使用GPC(凝膠滲透層析儀)以聚苯乙烯換算測定重量平均分子量。詳細之測定條件如下。 Further, in the present specification, the method for measuring the weight average molecular weight can be measured by the following method. The sample was dissolved in THF at 0.1% by weight, and the weight average molecular weight was measured in terms of polystyrene using GPC (gel permeation chromatography). The detailed measurement conditions are as follows.
GPC裝置:TOSOH製,HLC-8120GPC GPC device: TOSOH system, HLC-8120GPC
管柱:TOSOH製造(GMHHR-H)+(GMHHR-H)+ (G2000HHR) Pipe column: TOSOH manufacturing (GMHHR-H) + (GMHHR-H) + (G2000HHR)
流量:0.8mL/min Flow rate: 0.8mL/min
濃度:0.1wt% Concentration: 0.1wt%
注入量:100μL Injection volume: 100μL
管柱溫度:40℃ Column temperature: 40 ° C
溶離液:THF Dissolution: THF
與環氧樹脂(A成分)及酚樹脂(B成分)一起使用之彈性體(C成分)可使用例如各種丙烯酸系共聚物或橡膠成分等。就可提高對環氧樹脂(A成分)之分散性,或提高所得中空封閉薄片之耐熱性、可撓性、強度之觀點而言,較好包含橡膠成分。該橡膠成分較好為選自丁二烯系橡膠、苯乙烯系橡膠、丙烯酸系橡膠、聚矽氧系橡膠所組成之群之至少1種。該等可單獨使用,亦可併用2種以上。藉由含高黏度物質的彈性體,可較好地限制樹脂對中空部之進入。 For the elastomer (component C) to be used together with the epoxy resin (component A) and the phenol resin (component B), for example, various acrylic copolymers or rubber components can be used. The rubber component is preferably contained from the viewpoint of improving the dispersibility of the epoxy resin (component A) or improving the heat resistance, flexibility, and strength of the obtained hollow closed sheet. The rubber component is preferably at least one selected from the group consisting of butadiene rubber, styrene rubber, acrylic rubber, and polyoxyn rubber. These may be used alone or in combination of two or more. The entry of the resin into the hollow portion can be better restricted by the elastomer containing the high viscosity substance.
中空封閉薄片中較好分散有彈性體之區塊,區塊之最大直徑為20μm以下。藉此,彈性體可作為具有限制中空部附近之樹脂流動的作用(擴容般作用)之微小粒子發揮功能,且更有效地抑制樹脂對中空部分之進入。彈性體亦可局部集合或凝聚,但就擴容般作用之觀點而言,較好全體同樣地分散。區塊之最大直徑上限若為20μm以下則可無特別限制,但較好為15μm以下,更好 為10μm以下。且,區塊之最大直徑下限,就微細化之物理界限與賦予可撓性之觀點而言,較好為0.1μm以上,更好為0.3μm以上。 Preferably, the block of the elastomer is dispersed in the hollow closed sheet, and the maximum diameter of the block is 20 μm or less. Thereby, the elastic body functions as a fine particle having a function of restricting the flow of the resin in the vicinity of the hollow portion (a function of expansion), and more effectively inhibits entry of the resin into the hollow portion. The elastomer may be partially aggregated or agglomerated, but in terms of the effect of expansion, it is preferable that the entire body is dispersed in the same manner. The upper limit of the maximum diameter of the block is not particularly limited as long as it is 20 μm or less, but preferably 15 μm or less, more preferably It is 10 μm or less. Further, the lower limit of the maximum diameter of the block is preferably 0.1 μm or more, and more preferably 0.3 μm or more from the viewpoint of the physical limit of the refinement and the flexibility.
彈性體(C成分)之含量較好為環氧樹脂組成物整體之1.0~3.5重量%,更好為1.5~3重量%。彈性體(C成分)之含量未達1.0重量%時,難以獲得中空封閉薄片11之柔軟性及可撓性,進而抑制中空封閉薄片翹曲之樹脂封閉亦變困難。相反地上述含量超過3.5重量%時,中空封閉薄片11之熔融黏度變高而使電子零件之埋入性下降,同時會見到中空封閉薄片11之硬化體強度及耐熱性下降之傾向。 The content of the elastomer (component C) is preferably from 1.0 to 3.5% by weight, more preferably from 1.5 to 3% by weight, based on the total amount of the epoxy resin composition. When the content of the elastomer (component C) is less than 1.0% by weight, it is difficult to obtain the flexibility and flexibility of the hollow sealing sheet 11, and it is difficult to prevent the resin from being warped by blocking the hollow sealing sheet. On the other hand, when the content is more than 3.5% by weight, the melt viscosity of the hollow sealing sheet 11 is increased, the embedding property of the electronic component is lowered, and the strength and heat resistance of the hardened body of the hollow sealing sheet 11 tend to be lowered.
且,彈性體(C成分)相對於環氧樹脂(A成分)之重量比率(C成分之重量/A成分之重量)較好設定在0.5~1.5之範圍。其理由為上述重量比率未達0.5時,難以控制中空封閉薄片11之流動性,超過1.5時會見到中空封閉薄片11對電子零件之接著性變差之傾向。 Further, the weight ratio of the elastomer (component C) to the epoxy resin (component A) (weight of the component C/weight of the component A) is preferably set in the range of 0.5 to 1.5. The reason is that when the weight ratio is less than 0.5, it is difficult to control the fluidity of the hollow sealing sheet 11, and when it exceeds 1.5, the adhesion of the hollow sealing sheet 11 to the electronic component tends to be deteriorated.
在60℃下之上述彈性體之拉伸彈性率Ee相對於上述熱硬化性樹脂之拉伸彈性率Et之比Ee/Et較好為5×10-5以上且1×10-2以下,更好為1×10-4以上且5×10-3以下。據此,中空封閉薄片之製造過程中之混練時,來自混練構件及熱硬化性樹脂之剪切應力有效作用於彈性體,可促進彈性體之微小化。又,上述拉伸彈性率Ee及Et之測定方法可藉下述順序進行。以切割刀將彈性體及熱硬化性樹脂之各薄片切成厚度200μm、長度400μm、寬度10mm之短 條狀,作成測定用樣品。使用固體黏彈性測定裝置(RSAIII,Rheometric Scientific公司製),在頻率1Hz、升溫速度10℃/min之條件下,測定該測定樣品之-50~300℃之拉伸彈性率及損失彈性率。讀取該測定時之60℃下之拉伸彈性率的值,獲得目的之拉伸彈性率Ee及Et。 The ratio Ee/Et of the tensile modulus Ee of the elastomer to the tensile modulus E of the thermosetting resin at 60 ° C is preferably 5 × 10 -5 or more and 1 × 10 -2 or less. It is preferably 1 × 10 -4 or more and 5 × 10 -3 or less. According to this, in the kneading process in the manufacturing process of the hollow closed sheet, the shear stress from the kneading member and the thermosetting resin acts effectively on the elastic body, and the miniaturization of the elastic body can be promoted. Moreover, the method of measuring the tensile elastic modulus Ee and Et can be carried out in the following order. Each of the elastic sheet and the thermosetting resin sheet was cut into a strip having a thickness of 200 μm, a length of 400 μm, and a width of 10 mm by a cutter to prepare a sample for measurement. The tensile modulus and the loss elastic modulus of the measurement sample at -50 to 300 ° C were measured using a solid viscoelasticity measuring apparatus (RSAIII, manufactured by Rheometric Scientific Co., Ltd.) at a frequency of 1 Hz and a temperature elevation rate of 10 ° C/min. The value of the tensile modulus at 60 ° C in the measurement was read to obtain the desired tensile modulus Ee and Et.
無機質填充劑(D成分)並無特別限制,可使用以往習知之各種填充劑,列舉為例如石英玻璃、滑石、二氧化矽(熔融二氧化矽或結晶性二氧化矽等)、氧化鋁、氮化鋁、氮化矽、氮化硼之粉末。該等可單獨使用,亦可併用2種以上。藉由含無機填充劑,可更有效地賦予中空封閉薄片在中空部附近之擴容般作用。 The inorganic filler (component D) is not particularly limited, and various conventional fillers can be used, and examples thereof include quartz glass, talc, cerium oxide (melted cerium oxide or crystalline cerium oxide), alumina, and nitrogen. Powder of aluminum, tantalum nitride and boron nitride. These may be used alone or in combination of two or more. By containing an inorganic filler, it is possible to more effectively impart a function of expanding the hollow closed sheet in the vicinity of the hollow portion.
其中,基於藉由減低環氧樹脂組成物之硬化體之熱線膨脹係數而降低內部應力,結果可抑制電子零件之封閉後的中空封閉薄片11之翹曲之觀點而言,較好使用二氧化矽粉末,二氧化矽粉末中更好使用熔融二氧化矽粉末。熔融二氧化矽粉末列舉為球狀熔融二氧化矽粉末、破碎熔融二氧化矽粉末,但就流動性之觀點而言,最好使用球狀熔融二氧化矽粉末。其中,較好使用平均粒徑為54μm以下之範圍者,更好使用0.1~30μm之範圍者,最好使用0.5~20μm之範圍者。 Among them, the internal stress is lowered by reducing the coefficient of thermal linear expansion of the hardened body of the epoxy resin composition, and as a result, it is preferable to use the cerium oxide from the viewpoint of suppressing the warpage of the hollow closed sheet 11 after the electronic component is closed. It is more preferable to use a molten cerium oxide powder in a powder or a cerium oxide powder. The molten cerium oxide powder is exemplified by spherical molten cerium oxide powder and crushed molten cerium oxide powder. However, from the viewpoint of fluidity, it is preferable to use spherical molten cerium oxide powder. Among them, those having an average particle diameter of 54 μm or less are preferably used, and those having a range of 0.1 to 30 μm are preferably used, and those having a range of 0.5 to 20 μm are preferably used.
又,平均粒徑可使用任意自母集團抽取之試料,藉由使用雷射繞射散射式粒度分佈測定裝置測定而導 出。 Further, the average particle diameter can be measured by using a sample drawn from the parent group by using a laser diffraction scattering type particle size distribution measuring device. Out.
無機質填充劑(D成分)之含量較好為環氧樹脂組成物全體之70~90體積%(二氧化矽粒子時,由於比重為2.2g/cm3,故為81~94重量%),更好為74~85體積%(二氧化矽粒子時,為84~91重量%),又更好為76~83體積%(二氧化矽粒子時,為85~90重量%)。無機質填充劑(D成分)之含量未達70體積%時,由於環氧樹脂組成物之硬化體之線膨脹係數變大,故而見到中空封閉薄片11之翹曲變大之傾向。另一方面,上述含量超過90重量%時,由於中空封閉薄片11之柔軟性或流動性變差,故見到與電子零件之接著性下降之傾向。 The content of the inorganic filler (component D) is preferably 70 to 90% by volume based on the entire epoxy resin composition (in the case of cerium oxide particles, the specific gravity is 2.2 g/cm 3 , so it is 81 to 94% by weight), It is preferably 74 to 85% by volume (84 to 91% by weight in the case of cerium oxide particles), and more preferably 76 to 83% by volume (85 to 90% by weight in the case of cerium oxide particles). When the content of the inorganic filler (component D) is less than 70% by volume, the linear expansion coefficient of the cured body of the epoxy resin composition becomes large, so that the warpage of the hollow closed sheet 11 tends to be large. On the other hand, when the content is more than 90% by weight, the flexibility or fluidity of the hollow sealing sheet 11 is deteriorated, so that the adhesion to the electronic component tends to decrease.
硬化促進劑(E成分)若為能使環氧樹脂與酚樹脂之硬化進行者即無特別限制,但就硬化性與保存性之觀點而言,較好使用三苯膦或四苯基鏻四苯基硼酸鹽等之有機磷系化合物,或咪唑系化合物。該等硬化促進劑可單獨使用,亦可與其他硬化促進劑併用。 The curing accelerator (component E) is not particularly limited as long as it can cure the epoxy resin and the phenol resin, but triphenylphosphine or tetraphenylphosphonium is preferably used from the viewpoint of hardenability and preservability. An organophosphorus compound such as a phenylborate or an imidazole compound. These hardening accelerators may be used singly or in combination with other hardening accelerators.
硬化促進劑(E成分)之含量相對於環氧樹脂(A成分)及酚樹脂(B成分)之合計100重量份較好為0.1~5重量份。 The content of the curing accelerator (component E) is preferably 0.1 to 5 parts by weight based on 100 parts by weight of the total of the epoxy resin (component A) and the phenol resin (component B).
且,環氧樹脂組成物中,除了A成分至E成分以 外,亦可添加難燃劑成分。難燃劑組成分可使用例如氫氧化鋁、氫氧化鎂、氫氧化鐵、氫氧化鈣、氫氧化錫、複合金屬氫氧化物等各種金屬氫氧化物。 Moreover, in the epoxy resin composition, except for the components A to E In addition, a flame retardant component can also be added. As the flame retardant component, various metal hydroxides such as aluminum hydroxide, magnesium hydroxide, iron hydroxide, calcium hydroxide, tin hydroxide, and a composite metal hydroxide can be used.
金屬氫氧化物之平均粒徑,就確保環氧樹脂組成物加熱時之適當流動性之觀點而言,平均粒徑較好為1~10μm,更好為2~5μm。金屬氫氧化物之平均粒徑未達1μm時,難以均勻分散於環氧樹脂組成物中,並且有在環氧樹脂組成物加熱時無法獲得充分流動性之傾向。另外,平均粒徑超過10μm時,金屬氫氧化物(E成分)之每添加量之表面積變小,故見到難燃效果下降之傾向。 The average particle diameter of the metal hydroxide is preferably from 1 to 10 μm, more preferably from 2 to 5 μm, from the viewpoint of ensuring proper fluidity when the epoxy resin composition is heated. When the average particle diameter of the metal hydroxide is less than 1 μm, it is difficult to uniformly disperse in the epoxy resin composition, and there is a tendency that sufficient fluidity cannot be obtained when the epoxy resin composition is heated. In addition, when the average particle diameter exceeds 10 μm, the surface area per amount of the metal hydroxide (component E) is small, so that the flame retarding effect tends to decrease.
且,難燃劑成分除上述金屬氫氧化物以外,亦可使用磷腈(phosphazene)化合物。磷腈化合物可作為例如SPR-100、SA-100、SP-100(以上為大塚化學股份有限公司)、FP-100、FP-110(以上為伏見製藥所股份有限公司)等市售品獲得。 Further, as the flame retardant component, in addition to the above metal hydroxide, a phosphazene compound may be used. The phosphazene compound can be obtained, for example, as a commercial product such as SPR-100, SA-100, SP-100 (above, Otsuka Chemical Co., Ltd.), FP-100, and FP-110 (above, Fushimi Pharmaceutical Co., Ltd.).
基於少量即可發揮難燃效果之觀點而言,較好為以式(1)或式(2)表示之磷腈化合物,該等磷腈化合物中所含磷元素之含有率較好為12重量%以上。 From the viewpoint of exerting a flame retardant effect in a small amount, it is preferably a phosphazene compound represented by the formula (1) or the formula (2), and the content of the phosphorus element contained in the phosphazene compound is preferably 12% by weight. %the above.
(式(1)中,n為3~25之整數,R1及R2為相同或不同,係具有選自由烷氧基、苯氧基、胺基、羥基及烯丙基所組成之群的官能基之1價有機基)。 (In the formula (1), n is an integer of from 3 to 25, and R 1 and R 2 are the same or different and each has a group selected from the group consisting of an alkoxy group, a phenoxy group, an amine group, a hydroxyl group, and an allyl group. a monovalent organic group of a functional group).
(式(2)中,n及m分別獨立為3~25之整數,R3及R5為相同或不同,係具有選自由烷氧基、苯氧基、胺基、羥基及烯丙基所組成之群的官能基之1價有機基,R4為具有選自由烷氧基、苯氧基、胺基、羥基及烯丙基所成之群的官能基之2價有機基)。 (In the formula (2), n and m are each independently an integer of from 3 to 25, and R 3 and R 5 are the same or different and are selected from the group consisting of an alkoxy group, a phenoxy group, an amine group, a hydroxyl group and an allyl group. The monovalent organic group of the functional group of the composition, and R 4 is a divalent organic group having a functional group selected from the group consisting of an alkoxy group, a phenoxy group, an amine group, a hydroxyl group, and an allyl group).
此外,就安定性及抑制孔隙生成之觀點而言,較好使用以式(3)表示之環狀磷腈寡聚物。 Further, from the viewpoint of stability and suppression of pore formation, a cyclic phosphazene oligomer represented by the formula (3) is preferably used.
(式(3)中,n為3~25之整數,R6及R7為相同或不同,係氫、羥基、烷基、烷氧基或縮水甘油基)。 (In the formula (3), n is an integer of from 3 to 25, and R 6 and R 7 are the same or different and are hydrogen, a hydroxyl group, an alkyl group, an alkoxy group or a glycidyl group).
以上述式(3)表示之環狀磷腈寡聚物可作為例如FP-100、FP-110(以上為伏見製藥所股份有限公司)等市售品取得。 The cyclic phosphazene oligomer represented by the above formula (3) can be obtained as a commercial product such as FP-100 or FP-110 (above, Fushimi Pharmaceutical Co., Ltd.).
磷腈化合物之含量較好為含有環氧樹脂組成物中所含之環氧樹脂(A成分)、酚樹脂(B成分)、彈性體(D成分)、硬化促進劑(E成分)及磷腈化合物(其他成分)之有機成分全體之10~30重量%。亦即,磷腈化合物之含量未達有機成分全體之10重量%時,中空封閉薄片11之難燃性會下降,並且對被接著體(例如搭載電子零件之基板等)的凹凸追隨性降低,見到發生孔隙之傾向。上述含量超過有機成分全體之30重量%時,中空封閉薄片11之表面容易發生觸黏性,會見到對被接著體難以對位等作業性下降之傾向。 The content of the phosphazene compound is preferably an epoxy resin (component A) contained in the epoxy resin composition, a phenol resin (component B), an elastomer (component D), a hardening accelerator (component E), and a phosphazene. 10 to 30% by weight of the total organic component of the compound (other components). In other words, when the content of the phosphazene compound is less than 10% by weight of the entire organic component, the flame retardancy of the hollow sealing sheet 11 is lowered, and the followability of the adherend (for example, a substrate on which an electronic component is mounted) is lowered. See the tendency to occur in the pores. When the content exceeds 30% by weight of the entire organic component, the surface of the hollow sealing sheet 11 is likely to be sticky, and the workability such as difficulty in alignment of the adherend tends to be lowered.
且,併用上述金屬氫氧化物及磷腈化合物, 亦可獲得確保薄片封閉所需之可撓性,而且難燃性優異之中空封閉薄片11。藉由併用兩者,可獲得僅使用金屬氫氧化物時之充分難燃性與僅使用磷腈化合物時之充分可撓性。 And using the above metal hydroxide and phosphazene compound, It is also possible to obtain a hollow sealing sheet 11 which is required to ensure the flexibility required for the sheet to be closed and which is excellent in flame retardancy. By using both, it is possible to obtain sufficient flame retardancy when only a metal hydroxide is used and sufficient flexibility when only a phosphazene compound is used.
上述難燃劑中,就樹脂封閉成型時之中空封閉薄片之變形性、對電子零件或被接著體之凹凸之追隨性、對電子零件或被接著體之密著性之觀點而言,宜使用有機系難燃劑,尤其較好使用磷腈系難燃劑。 Among the above-mentioned flame retardants, the deformability of the hollow closed sheet at the time of resin sealing molding, the followability to the irregularities of the electronic component or the adherend, and the adhesion to the electronic component or the adherend are preferably used. For organic flame retardants, it is especially preferred to use a phosphazene flame retardant.
又,環氧樹脂組成物除上述各成分以外亦可視需要適當調配以碳黑為代表之顏料等之其他添加劑。 Further, in addition to the above respective components, the epoxy resin composition may be appropriately blended with other additives such as pigments represented by carbon black.
以下說明中空封閉薄片之製作方法。本實施形態之中空封閉薄片之製造方法包含調製含彈性體之混練物之混練步驟,及將前述混練物成形為薄狀獲得中空封閉薄片之成形步驟。 The method of producing the hollow closed sheet will be described below. The method for producing a hollow sealing sheet according to the present embodiment includes a kneading step of preparing a kneaded material containing an elastomer, and a molding step of forming the kneaded material into a thin shape to obtain a hollow sealing sheet.
首先,藉由混合上述各成分而調製環氧樹脂組成物。混合方法若為可均勻分散混合各成分之方法即無特別限制。隨後,藉由以直接捏合機等混練含彈性體之各調配成分而調製混練物。此時,中空封閉薄片之彈性體係以區塊狀分散,且較好以使該區塊之最大直徑成為20μm以下之方式混練。 First, an epoxy resin composition is prepared by mixing the above components. The mixing method is not particularly limited as long as it can uniformly disperse and mix the components. Subsequently, the kneaded material is prepared by kneading each of the blending components containing the elastomer by a direct kneader or the like. At this time, the elastic system of the hollow closed sheet is dispersed in a block shape, and it is preferable to knead the large diameter of the block to be 20 μm or less.
具體而言,使用混練機等習知之方法混合上述A~E成分及視需要之其他添加劑之各成分,隨後,藉熔融混練而調製混練物。熔融混練之方法並無特別限制,但列舉為例如藉由混練輥、加壓式捏合機、擠出機等之習知混練機進行熔融混練之方法等。至於該等捏合機可適當地使用例如於軸方向之一部分具有螺旋葉片之自螺旋軸之突出量比其他部分之螺旋葉片自螺旋軸之突出量更小之部分的混練用螺旋,或具備於軸方向之一部分無螺旋葉片之混練用螺旋之捏合機。螺旋葉片之突出量小的部分或無螺旋葉片之部分成為低剪斷力且為低攪拌,藉此可排除因混練物之壓縮率高而混入之空氣,可抑制所得混練物中之氣孔發生。 Specifically, each component of the above A to E component and other additives as needed is mixed by a conventional method such as a kneading machine, and then the kneaded material is prepared by melt kneading. The method of melt-kneading is not particularly limited, and examples thereof include a method of performing melt-kneading by a conventional kneading machine such as a kneading roll, a pressure kneader, or an extruder. As for the kneading machine, for example, a kneading spiral having a spiral blade whose projection amount is smaller than that of other portions of the spiral blade from the screw shaft, or a shaft is provided, for example, in one of the axial directions One of the directions is a spiral kneading machine without a spiral blade. The portion where the protruding amount of the spiral blade is small or the portion without the spiral blade becomes a low shearing force and is low agitation, thereby eliminating air which is mixed by the high compression ratio of the kneaded material, and suppressing generation of pores in the obtained kneaded material.
混練條件若溫度為上述各成分之軟化點以上即無特別限制,例如為30~150℃,考慮環氧樹脂之熱硬化性時,較好為40~140℃,更好為60~120℃,時間為例如1~30分鐘,較好為5~15分鐘。藉此,可調製混練物。 The kneading condition is not particularly limited as long as the temperature is equal to or higher than the softening point of each of the above components, and is, for example, 30 to 150 ° C. When considering the thermosetting property of the epoxy resin, it is preferably 40 to 140 ° C, more preferably 60 to 120 ° C. The time is, for example, 1 to 30 minutes, preferably 5 to 15 minutes. Thereby, the kneaded material can be modulated.
混練中使用捏合機時,混練轉數r(rpm)相對於混練處理量t(kg/hr)之比r/t較好為60以上,更好為70以上。該比r/t為60以上時,對含彈性體之混練原料可施加充分之剪切應力,可效率良好地促進彈性體之微小化。上述混練轉數r(rpm)較好為200~1000rpm,混練處理量t(kg/hr)較好為3~20kg/hr。 When the kneader is used in the kneading, the ratio r/t of the kneading revolution number r (rpm) to the kneading treatment amount t (kg/hr) is preferably 60 or more, more preferably 70 or more. When the ratio r/t is 60 or more, a sufficient shear stress can be applied to the kneaded material containing the elastomer, and the miniaturization of the elastomer can be efficiently promoted. The kneading revolution number r (rpm) is preferably 200 to 1000 rpm, and the kneading processing amount t (kg/hr) is preferably 3 to 20 kg/hr.
藉由擠出成形使所得混練物成形為薄片狀,可獲得中空封閉薄片11。具體而言,在不使熔融混練後之混練物冷卻而在高溫狀態直接擠出成形,可形成中空封閉薄片11。該擠出方法並無特別限制,列舉為T模嘴擠出法、輥壓延法、輥混練法、共擠出法、軋光機成形法等。擠出溫度若在上述各成分之軟化點以上則無特別限制,但考慮環氧樹脂之熱硬化性及成形性時,為例如40~150℃,較好為50~140℃,更好為70~120℃。藉由以上,可形成中空封閉薄片11。 The obtained kneaded product is formed into a sheet shape by extrusion molding, whereby a hollow closed sheet 11 can be obtained. Specifically, the hollow closed sheet 11 can be formed by directly extruding the kneaded material after the melt-kneading and cooling at a high temperature. The extrusion method is not particularly limited, and examples thereof include a T-die extrusion method, a roll calendering method, a roll kneading method, a co-extrusion method, and a calender molding method. The extrusion temperature is not particularly limited as long as it is at least the softening point of each of the above components. When considering the thermosetting property and moldability of the epoxy resin, it is, for example, 40 to 150 ° C, preferably 50 to 140 ° C, more preferably 70. ~120 °C. With the above, the hollow sealing sheet 11 can be formed.
中空封閉薄片11之厚度並無特別限制,但較好為100~2000μm。在上述範圍內時,可良好地封閉電子零件。且,樹脂薄片為薄型時,可減低發熱量,不易引起硬化收縮。結果,可降低封裝翹曲量,獲得信賴性更高之中空封裝。 The thickness of the hollow closed sheet 11 is not particularly limited, but is preferably from 100 to 2000 μm. When it is within the above range, the electronic component can be well sealed. Further, when the resin sheet is thin, the amount of heat generation can be reduced, and hardening and shrinkage are less likely to occur. As a result, the amount of package warpage can be reduced, and a highly reliable hollow package can be obtained.
如此獲得之中空封閉薄片亦可視需要以成為期望厚度之方式層合使用。亦即,中空封閉薄片可以單層構造使用,亦可以層合為2層以上之多層構造所成之層合體使用。 The hollow closed sheets thus obtained may also be laminated and used in such a manner as to have a desired thickness. That is, the hollow sealing sheet may be used in a single layer structure, or may be laminated in a laminate of two or more layers.
接著,針對使用上述中空封閉薄片之本實施形態之中空封裝之製造方法,邊參照圖2A~2C加以說明。圖2A~2C分別為示意性顯示本發明一實施形態之中空封裝之製造方法之一步驟的剖面圖。本實施形態係以中空封閉薄 片對搭載於基板上之電子零件進行中空封閉而製作中空封裝。又,本實施形態係使用SAW濾波片作為電子零件,且使用印刷配線基板作為被接著體,但亦可使用其以外之要素。例如,可使用電容或感測裝置、發光元件、振盪元件等具有可動部且需要中空部之元件作為電子零件,使用導線架、膠帶承載體(tape carrier)等作為被接著體。使用任一要素,均可利用電子零件之樹脂封閉達成高度之保護。 Next, a method of manufacturing the hollow package of the present embodiment using the above-described hollow sealing sheet will be described with reference to FIGS. 2A to 2C. 2A to 2C are cross-sectional views each schematically showing a step of a method of manufacturing a hollow package according to an embodiment of the present invention. This embodiment is a hollow closed thin The sheet is hollow-sealed to the electronic component mounted on the substrate to form a hollow package. Further, in the present embodiment, a SAW filter is used as the electronic component, and a printed wiring board is used as the adherend, but other elements may be used. For example, an element having a movable portion and requiring a hollow portion such as a capacitor or a sensing device, a light-emitting element, an oscillating element, or the like can be used as an electronic component, and a lead frame, a tape carrier, or the like can be used as the adherend. With either element, a high degree of protection can be achieved by resin encapsulation of electronic parts.
搭載SAW晶片之基板的準備步驟係準備搭載有複數SAW晶片13之印刷配線基板12(參照圖2A)。SAW晶片13可藉由以習知方法切割形成有特定梳型電極之壓電結晶予以單片化而形成。SAW晶片13對於印刷配線基板12之搭載可使用覆晶黏結機或晶粒黏結機(die bonder)等之習知裝置。SAW晶片13與印刷配線基板12係透過凸塊等之突起電極13a電性連接。且,SAW晶片13與印刷配線基板12之間係以不妨礙SAW晶片表面之表面彈性波之傳播之方式維持中空部14。SAW晶片13與印刷配線基板12之間之距離係依各要素之規格而決定,一般為15~50μm左右。 In the preparation step of the substrate on which the SAW wafer is mounted, the printed wiring board 12 on which the plurality of SAW wafers 13 are mounted is prepared (see FIG. 2A). The SAW wafer 13 can be formed by dicing a piezoelectric crystal formed with a specific comb-shaped electrode by a conventional method. A conventional device such as a flip chip bonding machine or a die bonder can be used for mounting the SAW wafer 13 on the printed wiring board 12. The SAW wafer 13 and the printed wiring board 12 are electrically connected to each other through the bump electrodes 13a such as bumps. Further, the hollow portion 14 is maintained between the SAW wafer 13 and the printed wiring board 12 so as not to interfere with the propagation of the surface elastic wave on the surface of the SAW wafer. The distance between the SAW wafer 13 and the printed wiring board 12 is determined according to the specifications of each element, and is generally about 15 to 50 μm.
封閉步驟係以覆蓋SAW晶片13之方式將中空封閉薄 片11層合於印刷配線基板12上,以上述中空封閉薄片樹脂封閉SAW晶片13(參照圖2B)。該中空封閉薄片11係作為用於保護SAW晶片13及其附加之要素免受外部環境影響之封閉樹脂發揮功能。 The sealing step is to cover the hollow cover by covering the SAW wafer 13 The sheet 11 is laminated on the printed wiring substrate 12, and the SAW wafer 13 is sealed with the above-mentioned hollow sealing sheet resin (refer to FIG. 2B). The hollow sealing sheet 11 functions as a sealing resin for protecting the SAW wafer 13 and its additional elements from the external environment.
本實施形態中,藉由採用上述中空封閉薄片11,可藉由對SAW晶片13之被覆而貼附於印刷配線基板12上之程度嵌埋SAW晶片13,而可提高中空封裝之生產效率。該情況下,可利用熱加壓或積層機等之習知方法將中空封閉薄片11層合於印刷配線基板12上。熱加壓條件係溫度為例如40~120℃,較好為50~90℃,壓力為例如0.1~10MPa,較好為0.5~8MPa,時間為例如0.3~10分鐘,較好為0.5~5分鐘。且,考慮中空封閉薄片11對SAW晶片13及印刷配線基板12之密著性及追隨性之提高時,較好在減壓條件下(例如0.1~5kPa)進行加壓。 In the present embodiment, by using the hollow sealing sheet 11, the SAW wafer 13 can be embedded by attaching the SAW wafer 13 to the printed wiring board 12, and the production efficiency of the hollow package can be improved. In this case, the hollow sealing sheet 11 can be laminated on the printed wiring board 12 by a conventional method such as a hot press or a laminator. The hot pressurization condition is, for example, 40 to 120 ° C, preferably 50 to 90 ° C, and the pressure is, for example, 0.1 to 10 MPa, preferably 0.5 to 8 MPa, and the time is, for example, 0.3 to 10 minutes, preferably 0.5 to 5 minutes. . Further, when the adhesion and followability of the hollow sealing sheet 11 to the SAW wafer 13 and the printed wiring board 12 are improved, it is preferable to pressurize under reduced pressure conditions (for example, 0.1 to 5 kPa).
中空封閉薄片11中由於分散有彈性體之微小區塊,故抑制樹脂成分對中空部14之進入,可提高SAW晶片13之作動信賴性或連接信賴性。 Since the micro-block of the elastic body is dispersed in the hollow sealing sheet 11, the entry of the resin component into the hollow portion 14 is suppressed, and the operation reliability or the connection reliability of the SAW wafer 13 can be improved.
封閉體形成步驟係熱硬化處理上述中空封閉薄片而形成封閉體15(參照圖2B)。中空封閉薄片之熱硬化處理條件,作為加熱溫度較好為100℃至200℃,更好為120℃至180℃,作為加熱時間較好為10分鐘至180分鐘,更好為30分鐘至120分鐘,亦可視需要加壓。加壓時, 較好採用0.1MPa至10MPa,更好採用0.5MPa至5MPa。 The closed body forming step thermally hardens the hollow closed sheet to form the closed body 15 (see FIG. 2B). The heat-hardening treatment condition of the hollow closed sheet is preferably from 100 ° C to 200 ° C, more preferably from 120 ° C to 180 ° C, as the heating time is preferably from 10 minutes to 180 minutes, more preferably from 30 minutes to 120 minutes. It can also be pressurized as needed. When pressurized, It is preferably used from 0.1 MPa to 10 MPa, more preferably from 0.5 MPa to 5 MPa.
接著,亦可進行由中空封閉薄片11、印刷配線基板12及SAW晶片13等之要素所成之封閉體15之切割(參照圖2C)。藉此,可獲得以SAW晶片13為單位之中空封裝18。切割通常利用過去習知之切割薄片固定上述封閉體15後進行。 Next, cutting of the closing body 15 made of elements such as the hollow sealing sheet 11, the printed wiring board 12, and the SAW wafer 13 can be performed (see FIG. 2C). Thereby, the hollow package 18 in units of the SAW wafer 13 can be obtained. The cutting is usually carried out by fixing the above-mentioned closure body 15 by a conventionally used cutting sheet.
視需要,可進行對上述所得之中空封裝18形成再配線及凸塊,將其安裝於另一基板(未圖示)上之基板安裝步驟。中空封裝18對基板之安裝可使用覆晶黏結機或晶粒黏結機等之習知裝置。 If necessary, a substrate mounting step of forming a rewiring and a bump on the hollow package 18 obtained above and attaching it to another substrate (not shown) may be performed. The mounting of the hollow package 18 to the substrate may use a conventional device such as a flip chip bonding machine or a die bonding machine.
第1實施形態係以捏合機等混練各調配成分而調製混練物,且將該混練物擠出成形形成為薄片狀。相對於此,本實施形態係塗佈將各成分溶解或分散於有機溶劑等而成之漆料,形成為薄片狀。塗佈法由於可在使彈性體溶解或分散於溶劑等中之狀態下成膜,故可使彈性體之區塊尺寸微小化。 In the first embodiment, the kneaded material is kneaded by kneading each of the blending components, and the kneaded product is extrusion-molded into a sheet shape. On the other hand, in the present embodiment, a paint obtained by dissolving or dispersing each component in an organic solvent or the like is applied to form a sheet. Since the coating method can form a film in a state in which the elastomer is dissolved or dispersed in a solvent or the like, the block size of the elastomer can be made small.
使用漆料之具體製作順序係依據常用方法適當混合上述A~E成分及視需要之其他添加劑,且均勻溶 解或分散於有機溶劑中,調製漆料。隨後,藉由將上述漆料塗佈於聚酯等支撐體上並乾燥,可獲得中空封閉薄片11。接著亦可視需要,貼合用以保護中空封閉薄片表面之聚酯薄膜等之剝離薄片。剝離薄片在封閉時被剝離。 The specific production sequence of the paint is to properly mix the above A~E components and other additives as needed according to the usual methods, and uniformly dissolve. The solution is prepared by dissolving or dispersing in an organic solvent. Subsequently, the hollow cover sheet 11 can be obtained by applying the above paint to a support such as polyester and drying it. Then, if necessary, a release sheet for protecting a polyester film or the like on the surface of the hollow sealing sheet may be attached. The release sheet was peeled off when it was closed.
上述有機溶劑並無特別限制,可使用過去習知之各種有機溶劑,例如甲基乙基酮、丙酮、環己酮、二噁烷、二乙基酮、甲苯、乙酸乙酯等。該等可單獨使用,亦可併用2種以上。且通常,較好以使漆料之固體成分濃度成為30~95重量%之範圍之方式使用有機溶劑。 The organic solvent is not particularly limited, and various conventional organic solvents such as methyl ethyl ketone, acetone, cyclohexanone, dioxane, diethyl ketone, toluene, ethyl acetate and the like can be used. These may be used alone or in combination of two or more. In general, it is preferred to use an organic solvent so that the solid content of the paint is in the range of 30 to 95% by weight.
有機溶劑乾燥後之薄片厚度並無特別限制,但就厚度均勻性與殘留溶劑量之觀點而言,通常較好設定為5~100μm,更好為20~70μm。 The thickness of the sheet after drying the organic solvent is not particularly limited, but is usually preferably from 5 to 100 μm, more preferably from 20 to 70 μm, from the viewpoint of thickness uniformity and residual solvent amount.
以下,例示性詳細說明本發明之較佳實施例。但,該實施例所記載之材料或調配量等,只要未特別限定地記載,則不意指本發明範圍僅限定於該等者。且,以份之表示意指重量份。 Hereinafter, preferred embodiments of the present invention are exemplarily described in detail. However, the materials, the blending amounts, and the like described in the examples are not particularly limited as long as they are not particularly limited. And, in parts, means parts by weight.
以混練機摻合以下成分,並以2軸混練機,將混練轉數設為300rpm、混練處理量設為5kg/hr,在110℃熔融混練10分鐘,接著自T模嘴擠出,藉此製作厚度200μm 之中空封閉薄片。 The following components were blended in a kneading machine, and the number of kneading revolutions was set to 300 rpm, the kneading treatment amount was set to 5 kg/hr, and the kneading was performed at 110 ° C for 10 minutes, followed by extrusion from the T die. Making thickness 200μm Hollow closed sheet.
除了將混練處理量設為3.5kg/hr以外,餘與實施例1同樣製作中空封閉薄片。 A hollow closed sheet was produced in the same manner as in Example 1 except that the kneading treatment amount was changed to 3.5 kg/hr.
除了將混練轉數設為500rpm以外,餘與實施例1同 樣製作中空封閉薄片。 Except that the number of kneading revolutions was set to 500 rpm, the same as in the first embodiment. A hollow closed sheet was prepared.
除了將混練轉數設為1000rpm以外,餘與實施例1同樣製作中空封閉薄片。 A hollow closed sheet was produced in the same manner as in Example 1 except that the number of kneading revolutions was set to 1000 rpm.
使與實施例1相同之成分以相同調配量,溶解並分散於甲基乙基酮與甲苯之1:1混合溶劑中,製作固體成分40重量%之漆料。 The same components as in Example 1 were dissolved and dispersed in a 1:1 mixed solvent of methyl ethyl ketone and toluene in the same compounding amount to prepare a paint having a solid content of 40% by weight.
以使溶劑乾燥後之塗膜厚度成為50μm之方式將漆料塗佈於施以脫模處理之PET膜上,接著將乾燥條件設為120℃、3分鐘,使塗膜乾燥,獲得厚度50μm之樹脂薄片。使用層合機將所得樹脂薄片層合直至厚度為200μm,製作厚度200μm之中空封閉薄片。 The paint was applied onto the PET film subjected to the release treatment so that the thickness of the coating film after drying the solvent was 50 μm, and then the drying conditions were set to 120 ° C for 3 minutes to dry the coating film to obtain a thickness of 50 μm. Resin sheet. The obtained resin sheet was laminated using a laminator to a thickness of 200 μm to prepare a hollow closed sheet having a thickness of 200 μm.
除了將混練轉數設為100rpm以外,餘與實施例1同樣製作中空封閉薄片。 A hollow closed sheet was produced in the same manner as in Example 1 except that the number of kneading revolutions was changed to 100 rpm.
除了將混練轉數設為50rpm以外,餘與實施例1同樣製作中空封閉薄片。 A hollow closed sheet was produced in the same manner as in Example 1 except that the number of kneading revolutions was changed to 50 rpm.
將實施例及比較例之封閉用薄片切成寬度60mm×長度60mm,且夾住中空封閉薄片之兩端部(俯視為對向之邊),緩慢彎曲90°,以下述基準評價可撓性。結果示於表1。 The sealing sheets of the examples and the comparative examples were cut into a width of 60 mm × a length of 60 mm, and the both end portions of the hollow sealing sheet (the side faces in the plan view) were slowly bent by 90°, and the flexibility was evaluated by the following criteria. The results are shown in Table 1.
○:彎曲90°亦無龜裂 ○: bending at 90° without cracking
△:彎曲90°時出現裂縫 △: Crack occurs when bent at 90°
×:彎曲90°時龜裂 ×: Crack when bent at 90°
在150℃下使所製作之中空封閉薄片熱硬化且緩慢冷卻至室溫後,以切割機切斷所得硬化物。以Beauler製自動研磨裝置研磨切斷面,以SEM(2000倍)觀察研磨後之切斷面。圖3顯示實施例1之中空封閉薄片之切斷面之SEM觀察像。SEM觀察像中以黑色表示之區域為彈性體之區塊。接著,隨機選擇50點之該以黑色顯示之彈性體之區塊,測定該等之最大直徑且取平均值作為區塊之最大直徑。其他實施例2~5及比較例1~2亦進行相同之SEM觀察及最大直徑之測定。最大直徑測定之結果示於表1。 After the produced hollow closed sheet was thermally hardened at 150 ° C and slowly cooled to room temperature, the obtained cured product was cut with a cutter. The cut surface was polished by an automatic polishing apparatus manufactured by Beauler, and the cut surface after the polishing was observed by SEM (2000 times). Fig. 3 shows an SEM observation image of the cut surface of the hollow closed sheet of Example 1. The area indicated by black in the image was observed by SEM as an elastomer block. Next, 50 points of the block of the elastomer shown in black were randomly selected, and the largest diameters of these were measured and averaged as the maximum diameter of the block. The same SEM observation and maximum diameter measurement were also carried out in the other Examples 2 to 5 and Comparative Examples 1 and 2. The results of the maximum diameter measurement are shown in Table 1.
使用圖4A至圖4C所示之附狹縫之成形模具,測定樹脂對狹縫之進入量。如圖4A所示,成形模具100為圓盤之外周部分具有立起部分之剖面字型之下模具110, 與圓盤狀之上模具120所成,且下模具110與上模具120之間設有狹縫S及收容樹脂200之空洞部。上模具120之中心設有測定樣品即樹脂200之投入口O。如圖4B所示,俯視下之下模具110之立起部分之上面設有複數條自上面切入特定深度之溝111。各溝111之切入深部係與上模具120組合時獲得特定之狹縫S之寬度的值。 The amount of entry of the resin into the slit was measured using a slit forming mold shown in Figs. 4A to 4C. As shown in FIG. 4A, the forming die 100 has a profile of a rising portion of the outer peripheral portion of the disk. The lower mold 110 is formed with the upper mold 120, and a slit S and a hollow portion for accommodating the resin 200 are provided between the lower mold 110 and the upper mold 120. The input port O of the resin 200, which is a measurement sample, is provided at the center of the upper mold 120. As shown in Fig. 4B, a plurality of grooves 111 cut into a specific depth from above are provided on the upper portion of the rising portion of the mold 110 in a plan view. When the cut-in depth of each groove 111 is combined with the upper mold 120, the value of the width of the specific slit S is obtained.
實際樹脂進入量之測定順序係採用以下順序:如圖4C所示,自成形模具100上之投入口O將樹脂200投入於模具內後,將加壓用之棒130插入投入口O,將成形模具100全體邊加熱邊以棒130加壓時,以樹脂200進入狹縫S內之程度為基準進行評價。測定此時之狹縫S之自內周端部至樹脂200之最大到達點之距離L作為樹脂進入量。測定條件如下所示,結果示於表1。 The order of measurement of the actual resin entering amount is as follows. As shown in FIG. 4C, after the resin 200 is put into the mold from the inlet port O on the forming mold 100, the rod 130 for pressurization is inserted into the inlet port O, and the forming is performed. When the entire mold 100 is heated by the rod 130 while being heated, the evaluation is performed based on the extent to which the resin 200 enters the slit S. The distance L from the inner peripheral end portion of the slit S at this time to the maximum reaching point of the resin 200 was measured as the resin entry amount. The measurement conditions are as follows, and the results are shown in Table 1.
加熱溫度:150℃ Heating temperature: 150 ° C
壓力:10kg/cm2 Pressure: 10kg/cm 2
加壓時間:10分鐘 Pressurization time: 10 minutes
狹縫寬度:1μm、5μm、10μm、20μm、50μm Slit width: 1μm, 5μm, 10μm, 20μm, 50μm
以下述之黏合條件將形成有鋁梳型電極之以下規格之SAW晶片安裝於玻璃基板上,製作SAW晶片安裝基板。 The SAW wafer of the following specifications in which the aluminum comb type electrode was formed was mounted on a glass substrate under the following bonding conditions to fabricate a SAW wafer mounting substrate.
晶片尺寸:1.4×1.1mm□(厚度150μm) Wafer size: 1.4 × 1.1 mm □ (thickness 150 μm)
凸塊材質:Au高度30μm Bump material: Au height 30μm
凸塊數:6個凸塊 Number of bumps: 6 bumps
晶片數:100個(10個×10個) Number of wafers: 100 (10 × 10)
裝置:Panasonic電工(股)製 Device: Panasonic Electrician (share) system
黏合條件:200℃、3N、1秒(超音波輸出2W) Bonding conditions: 200 ° C, 3 N, 1 second (ultrasonic output 2 W)
於以下所示之加熱加壓條件下,將各中空封閉薄片真空加壓而貼附於所得之SAW晶片安裝基板上。 Each of the hollow closed sheets was vacuum-pressed and attached to the obtained SAW wafer mounting substrate under the heat and pressure conditions shown below.
溫度:60℃ Temperature: 60 ° C
加壓力:4MPa Pressure: 4MPa
真空度:1.6kPa Vacuum degree: 1.6kPa
加壓時間:1分鐘 Pressurization time: 1 minute
開放至大氣壓後,在熱風乾燥機中,以150℃、1分鐘之條件使中空封閉薄片熱硬化,獲得封閉體。以電子顯微鏡(KEYENCE公司製,商品名「DIGITAL MICROSCOPE」,200倍),自玻璃基板側測定樹脂對SAW晶片與玻璃基板間之中空部之進入量。樹脂進入量係事先利用中空封閉薄片進行封閉前自玻璃基板側以電子顯微鏡確認及記憶SAW晶片之端部位置,封閉後再度以 電子顯微鏡自玻璃基板側觀察,比較封閉前後之觀察像,測定樹脂自封閉前確認之SAW晶片之端部進入到中空部之最大到達距離,將此作為樹脂進入量。樹脂進入量為20μm以下時評價為「○」,超過20μm時評價為「×」。結果示於表1。 After opening to atmospheric pressure, the hollow closed sheet was thermally hardened in a hot air dryer at 150 ° C for 1 minute to obtain a closed body. The amount of penetration of the resin into the hollow portion between the SAW wafer and the glass substrate was measured from the glass substrate side by an electron microscope (manufactured by KEYENCE, "DIGITAL MICROSCOPE", 200 times). The amount of resin entering is determined by an electron microscope from the side of the glass substrate and the end position of the SAW wafer is confirmed by a hollow closed sheet before sealing. The electron microscope was observed from the side of the glass substrate, and the observation image before and after the closure was compared, and the maximum distance of arrival of the end portion of the SAW wafer confirmed from the resin before entering the hollow portion was measured, and this was taken as the resin entry amount. When the resin entering amount was 20 μm or less, the evaluation was "○", and when it was more than 20 μm, it was evaluated as "×". The results are shown in Table 1.
由表1可知,實施例1~5之中空封閉薄片之可撓性良好。另一方面,比較例1~2發生裂縫,可撓性差。且,實施例1~5與比較例1~2比較,樹脂對模具之狹縫之進入量受到抑制。再者,可知實施例1~5之SAW晶片封裝中,中空封閉薄片之樹脂成分對中空部分之進入受到抑制,可製作高品質之中空封裝。比較例1~2中,樹脂對中空部之進入量均超過20μm。 As is clear from Table 1, the hollow closed sheets of Examples 1 to 5 were excellent in flexibility. On the other hand, cracks occurred in Comparative Examples 1 and 2, and the flexibility was poor. Further, in Examples 1 to 5, compared with Comparative Examples 1 and 2, the amount of penetration of the resin into the slit of the mold was suppressed. Further, it can be seen that in the SAW wafer packages of Examples 1 to 5, the entry of the resin component of the hollow sealing sheet into the hollow portion is suppressed, and a high-quality hollow package can be produced. In Comparative Examples 1 and 2, the amount of entry of the resin into the hollow portion exceeded 20 μm.
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| JP2006032478A (en) * | 2004-07-13 | 2006-02-02 | Nippon Steel Chem Co Ltd | Manufacturing method of semiconductor device |
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| JP5601034B2 (en) * | 2010-06-02 | 2014-10-08 | 住友ベークライト株式会社 | RESIN MOLDED BODY, ITS MANUFACTURING METHOD, AND ELECTRONIC PART DEVICE |
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| JP2000007890A (en) * | 1998-04-23 | 2000-01-11 | Nitto Denko Corp | Epoxy resin composition for semiconductor encapsulation, method for producing the same, and semiconductor device |
| JP2006032478A (en) * | 2004-07-13 | 2006-02-02 | Nippon Steel Chem Co Ltd | Manufacturing method of semiconductor device |
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