TWI621655B - White curable composition for optical semiconductor device, white ingot for optical semiconductor device, molded body for optical semiconductor device, and optical semiconductor device - Google Patents
White curable composition for optical semiconductor device, white ingot for optical semiconductor device, molded body for optical semiconductor device, and optical semiconductor device Download PDFInfo
- Publication number
- TWI621655B TWI621655B TW103130289A TW103130289A TWI621655B TW I621655 B TWI621655 B TW I621655B TW 103130289 A TW103130289 A TW 103130289A TW 103130289 A TW103130289 A TW 103130289A TW I621655 B TWI621655 B TW I621655B
- Authority
- TW
- Taiwan
- Prior art keywords
- optical semiconductor
- semiconductor device
- white
- ingot
- molded body
- Prior art date
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- 239000004065 semiconductor Substances 0.000 title claims abstract description 315
- 230000003287 optical effect Effects 0.000 title claims abstract description 308
- 239000000203 mixture Substances 0.000 title claims abstract description 107
- 150000001875 compounds Chemical class 0.000 claims abstract description 80
- 239000004593 Epoxy Substances 0.000 claims abstract description 78
- 239000003795 chemical substances by application Substances 0.000 claims abstract description 78
- 150000008065 acid anhydrides Chemical class 0.000 claims abstract description 53
- 239000012463 white pigment Substances 0.000 claims abstract description 47
- 239000000945 filler Substances 0.000 claims abstract description 33
- MUTGBJKUEZFXGO-OLQVQODUSA-N (3as,7ar)-3a,4,5,6,7,7a-hexahydro-2-benzofuran-1,3-dione Chemical compound C1CCC[C@@H]2C(=O)OC(=O)[C@@H]21 MUTGBJKUEZFXGO-OLQVQODUSA-N 0.000 claims abstract description 19
- OUPZKGBUJRBPGC-UHFFFAOYSA-N 1,3,5-tris(oxiran-2-ylmethyl)-1,3,5-triazinane-2,4,6-trione Chemical compound O=C1N(CC2OC2)C(=O)N(CC2OC2)C(=O)N1CC1CO1 OUPZKGBUJRBPGC-UHFFFAOYSA-N 0.000 claims abstract description 17
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 claims description 28
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical group O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 27
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims description 21
- 238000000465 moulding Methods 0.000 claims description 19
- VYKXQOYUCMREIS-UHFFFAOYSA-N methylhexahydrophthalic anhydride Chemical compound C1CCCC2C(=O)OC(=O)C21C VYKXQOYUCMREIS-UHFFFAOYSA-N 0.000 claims description 17
- 238000002844 melting Methods 0.000 claims description 16
- 230000008018 melting Effects 0.000 claims description 16
- 239000011787 zinc oxide Substances 0.000 claims description 14
- 229910000420 cerium oxide Inorganic materials 0.000 claims description 13
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 claims description 13
- 239000004848 polyfunctional curative Substances 0.000 claims description 13
- 238000001721 transfer moulding Methods 0.000 claims description 10
- 230000032683 aging Effects 0.000 claims description 9
- 238000000113 differential scanning calorimetry Methods 0.000 claims description 7
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 claims description 6
- 229910001928 zirconium oxide Inorganic materials 0.000 claims description 6
- 230000009477 glass transition Effects 0.000 claims description 5
- 150000008064 anhydrides Chemical class 0.000 claims description 3
- -1 Hydrogen phthalic anhydride Chemical class 0.000 abstract description 37
- 230000007547 defect Effects 0.000 abstract description 21
- 230000002950 deficient Effects 0.000 abstract description 10
- LGRFSURHDFAFJT-UHFFFAOYSA-N Phthalic anhydride Natural products C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 abstract description 3
- 229910052739 hydrogen Inorganic materials 0.000 abstract description 2
- 239000001257 hydrogen Substances 0.000 abstract description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 18
- 239000002245 particle Substances 0.000 description 18
- 238000000034 method Methods 0.000 description 16
- 239000000463 material Substances 0.000 description 15
- 239000000126 substance Substances 0.000 description 10
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- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical compound OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 description 9
- 229910052698 phosphorus Inorganic materials 0.000 description 8
- 239000011574 phosphorus Substances 0.000 description 8
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 7
- 238000004898 kneading Methods 0.000 description 7
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 6
- MWPLVEDNUUSJAV-UHFFFAOYSA-N anthracene Chemical compound C1=CC=CC2=CC3=CC=CC=C3C=C21 MWPLVEDNUUSJAV-UHFFFAOYSA-N 0.000 description 6
- 239000003963 antioxidant agent Substances 0.000 description 6
- 230000003078 antioxidant effect Effects 0.000 description 6
- 238000011049 filling Methods 0.000 description 6
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- 238000001816 cooling Methods 0.000 description 5
- 239000013078 crystal Substances 0.000 description 5
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- 229920000647 polyepoxide Polymers 0.000 description 5
- 238000012360 testing method Methods 0.000 description 5
- 229910052782 aluminium Inorganic materials 0.000 description 4
- TZCXTZWJZNENPQ-UHFFFAOYSA-L barium sulfate Chemical compound [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 description 4
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 4
- 238000004040 coloring Methods 0.000 description 4
- 239000007822 coupling agent Substances 0.000 description 4
- 239000003085 diluting agent Substances 0.000 description 4
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 4
- 229920002098 polyfluorene Polymers 0.000 description 4
- 238000004381 surface treatment Methods 0.000 description 4
- BJQWBACJIAKDTJ-UHFFFAOYSA-N tetrabutylphosphanium Chemical compound CCCC[P+](CCCC)(CCCC)CCCC BJQWBACJIAKDTJ-UHFFFAOYSA-N 0.000 description 4
- 229930185605 Bisphenol Natural products 0.000 description 3
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 239000000853 adhesive Substances 0.000 description 3
- 230000001070 adhesive effect Effects 0.000 description 3
- 125000002723 alicyclic group Chemical group 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 125000003118 aryl group Chemical group 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- IRDLUHRVLVEUHA-UHFFFAOYSA-N diethyl dithiophosphate Chemical compound CCOP(S)(=S)OCC IRDLUHRVLVEUHA-UHFFFAOYSA-N 0.000 description 3
- 238000009826 distribution Methods 0.000 description 3
- 239000004615 ingredient Substances 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 229920003986 novolac Polymers 0.000 description 3
- 150000002902 organometallic compounds Chemical class 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 239000003826 tablet Substances 0.000 description 3
- 239000001993 wax Substances 0.000 description 3
- GWEHVDNNLFDJLR-UHFFFAOYSA-N 1,3-diphenylurea Chemical compound C=1C=CC=CC=1NC(=O)NC1=CC=CC=C1 GWEHVDNNLFDJLR-UHFFFAOYSA-N 0.000 description 2
- ZCUJYXPAKHMBAZ-UHFFFAOYSA-N 2-phenyl-1h-imidazole Chemical compound C1=CNC(C=2C=CC=CC=2)=N1 ZCUJYXPAKHMBAZ-UHFFFAOYSA-N 0.000 description 2
- SZUPZARBRLCVCB-UHFFFAOYSA-N 3-(2-undecylimidazol-1-yl)propanenitrile Chemical compound CCCCCCCCCCCC1=NC=CN1CCC#N SZUPZARBRLCVCB-UHFFFAOYSA-N 0.000 description 2
- VPWNQTHUCYMVMZ-UHFFFAOYSA-N 4,4'-sulfonyldiphenol Chemical compound C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1 VPWNQTHUCYMVMZ-UHFFFAOYSA-N 0.000 description 2
- XLSZMDLNRCVEIJ-UHFFFAOYSA-N 4-methylimidazole Chemical compound CC1=CNC=N1 XLSZMDLNRCVEIJ-UHFFFAOYSA-N 0.000 description 2
- FKBMTBAXDISZGN-UHFFFAOYSA-N 5-methyl-3a,4,5,6,7,7a-hexahydro-2-benzofuran-1,3-dione Chemical compound C1C(C)CCC2C(=O)OC(=O)C12 FKBMTBAXDISZGN-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- 229910052684 Cerium Inorganic materials 0.000 description 2
- BRLQWZUYTZBJKN-UHFFFAOYSA-N Epichlorohydrin Chemical compound ClCC1CO1 BRLQWZUYTZBJKN-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 2
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 2
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical compound NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 239000012298 atmosphere Substances 0.000 description 2
- JRPBQTZRNDNNOP-UHFFFAOYSA-N barium titanate Chemical compound [Ba+2].[Ba+2].[O-][Ti]([O-])([O-])[O-] JRPBQTZRNDNNOP-UHFFFAOYSA-N 0.000 description 2
- 229910002113 barium titanate Inorganic materials 0.000 description 2
- 229910052797 bismuth Inorganic materials 0.000 description 2
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 2
- OSGAYBCDTDRGGQ-UHFFFAOYSA-L calcium sulfate Chemical compound [Ca+2].[O-]S([O-])(=O)=O OSGAYBCDTDRGGQ-UHFFFAOYSA-L 0.000 description 2
- ZMIGMASIKSOYAM-UHFFFAOYSA-N cerium Chemical compound [Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce] ZMIGMASIKSOYAM-UHFFFAOYSA-N 0.000 description 2
- 239000004927 clay Substances 0.000 description 2
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- 239000003086 colorant Substances 0.000 description 2
- 238000013329 compounding Methods 0.000 description 2
- 238000005520 cutting process Methods 0.000 description 2
- DIOQZVSQGTUSAI-UHFFFAOYSA-N decane Chemical compound CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 description 2
- PPQREHKVAOVYBT-UHFFFAOYSA-H dialuminum;tricarbonate Chemical compound [Al+3].[Al+3].[O-]C([O-])=O.[O-]C([O-])=O.[O-]C([O-])=O PPQREHKVAOVYBT-UHFFFAOYSA-H 0.000 description 2
- QDOXWKRWXJOMAK-UHFFFAOYSA-N dichromium trioxide Chemical compound O=[Cr]O[Cr]=O QDOXWKRWXJOMAK-UHFFFAOYSA-N 0.000 description 2
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical compound C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 description 2
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- 125000000623 heterocyclic group Chemical group 0.000 description 2
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- 239000007937 lozenge Substances 0.000 description 2
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- NIHNNTQXNPWCJQ-UHFFFAOYSA-N o-biphenylenemethane Natural products C1=CC=C2CC3=CC=CC=C3C2=C1 NIHNNTQXNPWCJQ-UHFFFAOYSA-N 0.000 description 2
- QWVGKYWNOKOFNN-UHFFFAOYSA-N o-cresol Chemical compound CC1=CC=CC=C1O QWVGKYWNOKOFNN-UHFFFAOYSA-N 0.000 description 2
- 150000007524 organic acids Chemical class 0.000 description 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 2
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- FKBMTBAXDISZGN-BOJSHJERSA-N (3ar,7as)-5-methyl-3a,4,5,6,7,7a-hexahydro-2-benzofuran-1,3-dione Chemical compound C1C(C)CC[C@@H]2C(=O)OC(=O)[C@H]12 FKBMTBAXDISZGN-BOJSHJERSA-N 0.000 description 1
- KMOUUZVZFBCRAM-OLQVQODUSA-N (3as,7ar)-3a,4,7,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1C=CC[C@@H]2C(=O)OC(=O)[C@@H]21 KMOUUZVZFBCRAM-OLQVQODUSA-N 0.000 description 1
- LDCQBHLZLZUAAF-UHFFFAOYSA-N (5-methyl-2-phenyl-1h-imidazol-4-yl)methanediol Chemical compound OC(O)C1=C(C)NC(C=2C=CC=CC=2)=N1 LDCQBHLZLZUAAF-UHFFFAOYSA-N 0.000 description 1
- AVQQQNCBBIEMEU-UHFFFAOYSA-N 1,1,3,3-tetramethylurea Chemical compound CN(C)C(=O)N(C)C AVQQQNCBBIEMEU-UHFFFAOYSA-N 0.000 description 1
- UDYXMTORTDACTG-UHFFFAOYSA-N 1,1,3-tributylthiourea Chemical compound CCCCNC(=S)N(CCCC)CCCC UDYXMTORTDACTG-UHFFFAOYSA-N 0.000 description 1
- YBBLOADPFWKNGS-UHFFFAOYSA-N 1,1-dimethylurea Chemical compound CN(C)C(N)=O YBBLOADPFWKNGS-UHFFFAOYSA-N 0.000 description 1
- GIWQSPITLQVMSG-UHFFFAOYSA-N 1,2-dimethylimidazole Chemical compound CC1=NC=CN1C GIWQSPITLQVMSG-UHFFFAOYSA-N 0.000 description 1
- 229940057054 1,3-dimethylurea Drugs 0.000 description 1
- FBHPRUXJQNWTEW-UHFFFAOYSA-N 1-benzyl-2-methylimidazole Chemical compound CC1=NC=CN1CC1=CC=CC=C1 FBHPRUXJQNWTEW-UHFFFAOYSA-N 0.000 description 1
- XZKLXPPYISZJCV-UHFFFAOYSA-N 1-benzyl-2-phenylimidazole Chemical compound C1=CN=C(C=2C=CC=CC=2)N1CC1=CC=CC=C1 XZKLXPPYISZJCV-UHFFFAOYSA-N 0.000 description 1
- VLDPXPPHXDGHEW-UHFFFAOYSA-N 1-chloro-2-dichlorophosphoryloxybenzene Chemical compound ClC1=CC=CC=C1OP(Cl)(Cl)=O VLDPXPPHXDGHEW-UHFFFAOYSA-N 0.000 description 1
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 1
- MMEDJBFVJUFIDD-UHFFFAOYSA-N 2-[2-(carboxymethyl)phenyl]acetic acid Chemical compound OC(=O)CC1=CC=CC=C1CC(O)=O MMEDJBFVJUFIDD-UHFFFAOYSA-N 0.000 description 1
- YTWBFUCJVWKCCK-UHFFFAOYSA-N 2-heptadecyl-1h-imidazole Chemical compound CCCCCCCCCCCCCCCCCC1=NC=CN1 YTWBFUCJVWKCCK-UHFFFAOYSA-N 0.000 description 1
- LXBGSDVWAMZHDD-UHFFFAOYSA-N 2-methyl-1h-imidazole Chemical compound CC1=NC=CN1 LXBGSDVWAMZHDD-UHFFFAOYSA-N 0.000 description 1
- LLEASVZEQBICSN-UHFFFAOYSA-N 2-undecyl-1h-imidazole Chemical compound CCCCCCCCCCCC1=NC=CN1 LLEASVZEQBICSN-UHFFFAOYSA-N 0.000 description 1
- UIDDPPKZYZTEGS-UHFFFAOYSA-N 3-(2-ethyl-4-methylimidazol-1-yl)propanenitrile Chemical compound CCC1=NC(C)=CN1CCC#N UIDDPPKZYZTEGS-UHFFFAOYSA-N 0.000 description 1
- SESYNEDUKZDRJL-UHFFFAOYSA-N 3-(2-methylimidazol-1-yl)propanenitrile Chemical compound CC1=NC=CN1CCC#N SESYNEDUKZDRJL-UHFFFAOYSA-N 0.000 description 1
- BVYPJEBKDLFIDL-UHFFFAOYSA-N 3-(2-phenylimidazol-1-yl)propanenitrile Chemical compound N#CCCN1C=CN=C1C1=CC=CC=C1 BVYPJEBKDLFIDL-UHFFFAOYSA-N 0.000 description 1
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- ZUGAOYSWHHGDJY-UHFFFAOYSA-K 5-hydroxy-2,8,9-trioxa-1-aluminabicyclo[3.3.2]decane-3,7,10-trione Chemical compound [Al+3].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O ZUGAOYSWHHGDJY-UHFFFAOYSA-K 0.000 description 1
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- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 description 1
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- OJMOMXZKOWKUTA-UHFFFAOYSA-N aluminum;borate Chemical compound [Al+3].[O-]B([O-])[O-] OJMOMXZKOWKUTA-UHFFFAOYSA-N 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
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- 239000003242 anti bacterial agent Substances 0.000 description 1
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- IRERQBUNZFJFGC-UHFFFAOYSA-L azure blue Chemical compound [Na+].[Na+].[Na+].[Na+].[Na+].[Na+].[Na+].[Na+].[Al+3].[Al+3].[Al+3].[Al+3].[Al+3].[Al+3].[S-]S[S-].[O-][Si]([O-])([O-])[O-].[O-][Si]([O-])([O-])[O-].[O-][Si]([O-])([O-])[O-].[O-][Si]([O-])([O-])[O-].[O-][Si]([O-])([O-])[O-].[O-][Si]([O-])([O-])[O-] IRERQBUNZFJFGC-UHFFFAOYSA-L 0.000 description 1
- UHOVQNZJYSORNB-UHFFFAOYSA-N benzene Substances C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 1
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Landscapes
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Abstract
本發明提供一種可獲得不易產生殘缺且均勻性優異之錠狀物、從而可獲得外觀不良較少之成形體之光半導體裝置用白色硬化性組合物。 The present invention provides a white curable composition for an optical semiconductor device which can obtain a molded article which is less likely to be defective and has excellent uniformity, and which can obtain a molded article having less appearance defects.
本發明之光半導體裝置用白色硬化性組合物含有環氧化合物、酸酐硬化劑、白色顏料、白色顏料以外之填充材、及硬化促進劑,且不含六氫鄰苯二甲酸酐與甲基六氫鄰苯二甲酸酐兩者作為上述酸酐硬化劑,上述環氧化合物含有異氰尿酸三縮水甘油酯,藉由以打錠壓3 t將本發明之光半導體裝置用白色硬化性組合物成形而獲得之直徑13mm及高度30mm之圓柱狀之錠狀物的壓縮彈性模量為100MPa以上、2000MPa以下,且上述圓柱狀之錠狀物之壓縮強度為300N以上。 The white curable composition for an optical semiconductor device of the present invention contains an epoxy compound, an acid anhydride curing agent, a white pigment, a filler other than a white pigment, and a curing accelerator, and does not contain hexahydrophthalic anhydride and methylhexa. Hydrogen phthalic anhydride is used as the acid anhydride curing agent, and the epoxy compound contains triglycidyl isocyanurate, and the white semiconductor composition of the optical semiconductor device of the present invention is molded by a tableting pressure of 3 t. The cylindrical elastic ingot having a diameter of 13 mm and a height of 30 mm has a compressive elastic modulus of 100 MPa or more and 2000 MPa or less, and the cylindrical ingot has a compressive strength of 300 N or more.
Description
本發明係關於一種用於形成光半導體裝置用白色錠狀物之光半導體裝置用白色硬化性組合物。又,本發明係關於一種用於獲得於光半導體裝置中配置於光半導體元件之側方的具有框部之成形體的光半導體裝置用白色錠狀物。又,本發明係關於一種使用上述光半導體裝置用白色硬化性組合物或上述光半導體裝置用白色錠狀物之光半導體裝置用成形體及光半導體裝置。 The present invention relates to a white curable composition for an optical semiconductor device for forming a white ingot for an optical semiconductor device. Moreover, the present invention relates to a white ingot for an optical semiconductor device for obtaining a molded body having a frame portion disposed on the side of the optical semiconductor device in the optical semiconductor device. Moreover, the present invention relates to a molded article for an optical semiconductor device and an optical semiconductor device using the white curable composition for an optical semiconductor device or the white ingot for the optical semiconductor device.
發光二極體(LED,Light Emitting Diode)裝置等光半導體裝置之消耗電力較低且壽命較長。又,光半導體裝置於嚴酷環境下亦可使用。因此,光半導體裝置被用於行動電話用背光、液晶電視用背光、汽車用燈、照明器具及廣告牌等廣泛之用途中。 An optical semiconductor device such as a light emitting diode (LED) device has low power consumption and long life. Moreover, the optical semiconductor device can also be used in a severe environment. Therefore, the optical semiconductor device is used in a wide range of applications such as backlights for mobile phones, backlights for liquid crystal televisions, lamps for automobiles, lighting fixtures, and billboards.
若光半導體裝置所使用之作為發光元件之光半導體元件(例如LED)與大氣直接接觸,則由大氣中之水分或漂浮之污物等導致光半導體元件之發光特性急遽降低。因此,上述光半導體元件通常係藉由光半導體裝置用密封劑加以密封。又,為了填充該密封劑,而於搭載有上述光半導體元件之引線框架上配置具有框部之成形體。於該具有框部之成形體之內側填充上述密封劑。該成形體有時被稱為反射器、外殼材或罩殼。 When an optical semiconductor element (for example, an LED) as a light-emitting element used in an optical semiconductor device is in direct contact with the atmosphere, the light-emitting characteristics of the optical semiconductor element are drastically lowered by moisture in the atmosphere or floating dirt. Therefore, the above optical semiconductor element is usually sealed by a sealing agent for an optical semiconductor device. Moreover, in order to fill the sealant, a molded body having a frame portion is placed on a lead frame on which the optical semiconductor element is mounted. The sealant is filled inside the molded body having the frame portion. The shaped body is sometimes referred to as a reflector, an outer casing or a casing.
作為用以獲得上述成形體之成形材料之一例,於下述之專利文 獻1中揭示有如下成形材料,其含有(A)環氧樹脂、(B)硬化劑及(C)白色顏料,且(B)硬化劑含有熔點為100℃以上之有機酸酐。於專利文獻1中記載:(B)硬化劑含有熔點為100℃以上之有機酸酐,藉此成形材料具有於室溫附近(0℃~30℃)可粉碎之程度之剛性,可充分減少對加工裝置或成形裝置之附著。 As an example of a molding material for obtaining the above-mentioned molded body, the following patents In the first aspect, there is disclosed a molding material comprising (A) an epoxy resin, (B) a curing agent, and (C) a white pigment, and (B) a curing agent containing an organic acid anhydride having a melting point of 100 ° C or higher. Patent Document 1 discloses that (B) the curing agent contains an organic acid anhydride having a melting point of 100 ° C or higher, whereby the molding material has rigidity to a degree that can be pulverized at around room temperature (0° C. to 30° C.), and can be sufficiently reduced in processing. Attachment of the device or forming device.
於下述之專利文獻2中揭示有藉由以下方式獲得之成形材料:使用將(A)含有三衍生物環氧樹脂之環氧樹脂、(B)酸酐及(C)抗氧化劑熔融混合所得之固形物,並將該固形物粉碎。 Patent Document 2 listed below discloses a molding material obtained by the following method: (A) contains three The solid epoxy obtained by melt-mixing the epoxy resin of the derivative epoxy resin, (B) an acid anhydride, and (C) an antioxidant, and pulverizing the solid matter.
[專利文獻1]日本專利特開2011-219634號公報 [Patent Document 1] Japanese Patent Laid-Open Publication No. 2011-219634
[專利文獻2]WO2007/015426A1 [Patent Document 2] WO2007/015426A1
於專利文獻1、2中記載有使用上述成形材料形成錠狀物。 Patent Documents 1 and 2 describe forming a lozenge using the above-described molding material.
然而,於使用如專利文獻1、2所記載之先前之成形材料之情形時,有錠狀物之均勻性較低之情況,且有錠狀物產生殘缺之情況。進而,於使用錠狀物製作成形體時,有容易產生成形體之外觀不良之問題。尤其於專利文獻1中,有錠狀物容易產生殘缺之問題。於專利文獻2中,有錠狀物之均勻性較低、容易產生成形體之外觀不良之問題。 However, in the case of using the former molding material described in Patent Documents 1 and 2, the uniformity of the ingot is low, and the ingot may be defective. Further, when a molded article is produced by using a spindle, there is a problem that the appearance of the molded article is liable to be defective. In particular, in Patent Document 1, there is a problem that the ingot is likely to be defective. In Patent Document 2, there is a problem in that the uniformity of the ingot is low and the appearance of the molded body is liable to be defective.
本發明之目的在於提供一種可獲得不易產生殘缺且均勻性優異之錠狀物、從而可獲得外觀不良較少之成形體之光半導體裝置用白色硬化性組合物。又,本發明之目的在於提供一種不易產生殘缺且均勻性優異,進而於獲得成形體時可減少外觀不良之光半導體裝置用白色錠狀物。 An object of the present invention is to provide a white curable composition for an optical semiconductor device which can obtain a molded article which is less likely to be defective and has excellent uniformity, and which can obtain a molded article having less appearance defects. Further, an object of the present invention is to provide a white ingot for an optical semiconductor device which is less likely to be defective and which is excellent in uniformity and which can reduce appearance defects when a molded article is obtained.
又,本發明之目的在於提供一種使用上述光半導體裝置用白色硬化性組合物或上述光半導體裝置用白色錠狀物之光半導體裝置用成形體及光半導體裝置。 Moreover, an object of the present invention is to provide a molded article for an optical semiconductor device and an optical semiconductor device using the white curable composition for an optical semiconductor device or the white ingot for the optical semiconductor device.
根據本發明之廣泛態樣,提供一種光半導體裝置用白色硬化性組合物,其係用於形成白色之光半導體裝置用白色錠狀物且為白色者,並且上述光半導體裝置用白色錠狀物係用於獲得於光半導體裝置中配置於光半導體元件之側方的具有框部之成形體,上述光半導體裝置用白色硬化性組合物含有環氧化合物、酸酐硬化劑、白色顏料、白色顏料以外之填充材、及硬化促進劑,且不含六氫鄰苯二甲酸酐與甲基六氫鄰苯二甲酸酐兩者作為上述酸酐硬化劑,上述環氧化合物含有異氰尿酸三縮水甘油酯,藉由以打錠壓3t將上述光半導體裝置用白色硬化性組合物進行成形而獲得之直徑13mm及高度30mm之圓柱狀之錠狀物的壓縮彈性模量為100MPa以上、2000MPa以下,且上述圓柱狀之錠狀物之壓縮強度為300N以上。 According to a broad aspect of the present invention, there is provided a white curable composition for an optical semiconductor device which is used for forming a white ingot for a white optical semiconductor device and which is white, and a white ingot for the above optical semiconductor device The molded article having a frame portion which is disposed on the side of the optical semiconductor device in the optical semiconductor device, and the white curable composition for the optical semiconductor device contains an epoxy compound, an acid anhydride curing agent, a white pigment, or a white pigment. The filler and the hardening accelerator do not contain both hexahydrophthalic anhydride and methylhexahydrophthalic anhydride as the acid anhydride curing agent, and the epoxy compound contains triglycidyl isocyanurate. The cylindrical elastic ingot having a diameter of 13 mm and a height of 30 mm obtained by molding the optical semiconductor device with a white curable composition by a tableting pressure of 3 t has a compressive elastic modulus of 100 MPa or more and 2000 MPa or less, and the cylinder The compressive strength of the shaped ingot is 300 N or more.
又,根據本發明之廣泛態樣,提供一種光半導體裝置用白色錠狀物,其係用於獲得於光半導體裝置中配置於光半導體元件之側方的具有框部之成形體,且係使用白色之光半導體裝置用白色硬化性組合物而形成,且為白色者,並且上述光半導體裝置用白色硬化性組合物含有環氧化合物、酸酐硬化劑、白色顏料、白色顏料以外之填充材、及硬化促進劑,且上述光半導體裝置用白色硬化性組合物不含六氫鄰苯二甲酸酐與甲基六氫鄰苯二甲酸酐兩者作為上述酸酐硬化劑,上述環氧化合物含有異氰尿酸三縮水甘油酯,於使用直徑13mm及高度30mm之圓柱狀之錠狀物測定其壓縮彈性模量及壓縮強度時,壓縮彈性模量為100MPa以上、2000MPa以下,且壓縮強度為300N以上。 Moreover, according to a broad aspect of the present invention, a white ingot for an optical semiconductor device for obtaining a molded body having a frame portion disposed on the side of an optical semiconductor device in an optical semiconductor device is used. The white light semiconductor device is formed of a white curable composition and is white, and the white curable composition for an optical semiconductor device contains an epoxy compound, an acid anhydride curing agent, a white pigment, a filler other than a white pigment, and a curing accelerator, wherein the white curable composition for an optical semiconductor device does not contain both hexahydrophthalic anhydride and methylhexahydrophthalic anhydride as the acid anhydride curing agent, and the epoxy compound contains isocyanuric acid The triglycidyl ester has a compressive elastic modulus of 100 MPa or more and 2000 MPa or less and a compressive strength of 300 N or more when the compressive elastic modulus and the compressive strength are measured using a cylindrical ingot having a diameter of 13 mm and a height of 30 mm.
上述光半導體裝置用白色錠狀物較佳為用於藉由轉移成形而獲 得上述成形體。 The white ingot for the above optical semiconductor device is preferably used for transfer molding The above shaped body is obtained.
於本發明之一特定態樣中,於獲得上述光半導體裝置用白色硬化性組合物時,於50℃~90℃下加熱混練10分鐘~60分鐘後,於超過30℃、未達50℃下進行24小時~240小時老化。 In a specific aspect of the invention, when the white curable composition for an optical semiconductor device is obtained, the mixture is heated and kneaded at 50 ° C to 90 ° C for 10 minutes to 60 minutes, and then at 30 ° C or less and less than 50 ° C. Aging for 24 hours to 240 hours.
較佳為上述光半導體裝置用白色硬化性組合物之藉由示差掃描熱量測定而求出之玻璃轉移點為0℃以上、40℃以下。 It is preferable that the glass transition point obtained by the differential scanning calorimetry of the white curable composition for an optical semiconductor device is 0° C. or higher and 40° C. or lower.
上述光半導體裝置用白色硬化性組合物較佳為含有熔點為50℃以下之酸酐硬化劑作為上述酸酐硬化劑,且上述酸酐硬化劑之全部100重量%中,上述熔點為50℃以下之酸酐硬化劑之含量為20重量%以上。 The white curable composition for an optical semiconductor device preferably contains an acid anhydride curing agent having a melting point of 50 ° C or less as the acid anhydride curing agent, and an acid anhydride hardening having a melting point of 50 ° C or less in all 100% by weight of the acid anhydride curing agent. The content of the agent is 20% by weight or more.
較佳為上述環氧化合物之環氧當量為300以下。 It is preferred that the epoxy compound has an epoxy equivalent of 300 or less.
較佳為上述白色顏料為氧化鈦、氧化鋅或氧化鋯,且上述填充材含有二氧化矽。 Preferably, the white pigment is titanium oxide, zinc oxide or zirconium oxide, and the filler contains cerium oxide.
於本發明之某特定態樣中,上述光半導體裝置用白色錠狀物係用於獲得於光半導體裝置中配置於搭載有光半導體元件之引線框架上之成形體。 In a specific aspect of the present invention, the white ingot for the optical semiconductor device is used for obtaining a molded body disposed on a lead frame on which an optical semiconductor element is mounted in an optical semiconductor device.
於本發明之某特定態樣中,上述光半導體裝置用白色錠狀物係用於在獲得複數個成形體連結而成之分割前成形體後,將上述分割前成形體分割而獲得各成形體。 In a specific aspect of the present invention, the white ingot for the optical semiconductor device is used to obtain the pre-division molded body obtained by obtaining a plurality of formed bodies, and then the pre-divided molded body is divided to obtain each molded body. .
根據本發明之廣泛態樣,提供一種光半導體裝置用成形體,其係於光半導體裝置中配置於光半導體元件之側方的具有框部之成形體,且係藉由使用上述光半導體裝置用白色硬化性組合物形成光半導體裝置用白色錠狀物後,將上述光半導體裝置用白色錠狀物成形且使其硬化而獲得。 According to a broad aspect of the present invention, there is provided a molded article for an optical semiconductor device which is a molded body having a frame portion disposed on the side of the optical semiconductor device in the optical semiconductor device, and is used by using the optical semiconductor device. After the white curable composition was formed into a white ingot for an optical semiconductor device, the optical semiconductor device was molded into a white ingot and cured.
根據本發明之廣泛態樣,提供一種光半導體裝置,其具備:引線框架、擔載於上述引線框架上之光半導體元件、及配置於上述引線 框架上且配置於上述光半導體元件之側方的具有框部之成形體,且上述成形體係藉由使用上述光半導體裝置用白色硬化性組合物形成光半導體裝置用白色錠狀物後,將上述光半導體裝置用白色錠狀物成形且使其硬化而獲得。 According to a broad aspect of the present invention, an optical semiconductor device including: a lead frame, an optical semiconductor element carried on the lead frame, and the lead is disposed a molded body having a frame portion disposed on the side of the optical semiconductor element, and the molded system is formed by forming a white ingot for an optical semiconductor device using the white curable composition for an optical semiconductor device. The optical semiconductor device is obtained by molding and hardening a white ingot.
本發明之光半導體裝置用白色硬化性組合物含有環氧化合物、酸酐硬化劑、白色顏料、白色顏料以外之填充材、及硬化促進劑,且不含六氫鄰苯二甲酸酐與甲基六氫鄰苯二甲酸酐兩者作為上述酸酐硬化劑,上述環氧化合物含有異氰尿酸三縮水甘油酯,藉由以打錠壓3t將上述光半導體裝置用白色硬化性組合物進行成形而獲得之直徑13mm及高度30mm之圓柱狀之錠狀物的壓縮彈性模量為100MPa以上、2000MPa以下,且上述圓柱狀之錠狀物之壓縮強度為300N以上,因此可獲得不易產生殘缺且均勻性優異之錠狀物,從而可獲得外觀不良較少之成形體。 The white curable composition for an optical semiconductor device of the present invention contains an epoxy compound, an acid anhydride curing agent, a white pigment, a filler other than a white pigment, and a curing accelerator, and does not contain hexahydrophthalic anhydride and methylhexa. The hydrogen phthalic anhydride is used as the acid anhydride curing agent, and the epoxy compound contains triglycidyl isocyanurate, and the optical semiconductor device is molded with a white curable composition by a tableting pressure of 3 t. The cylindrical elastic ingot having a diameter of 13 mm and a height of 30 mm has a compressive elastic modulus of 100 MPa or more and 2000 MPa or less, and the cylindrical ingot has a compressive strength of 300 N or more, so that it is less likely to be defective and excellent in uniformity. The ingot is used to obtain a molded body having less appearance.
本發明之光半導體裝置用白色錠狀物係使用光半導體裝置用白色硬化性組合物而形成,上述光半導體裝置用白色硬化性組合物含有環氧化合物、酸酐硬化劑、白色顏料、白色顏料以外之填充材、及硬化促進劑,且上述光半導體裝置用白色硬化性組合物不含六氫鄰苯二甲酸酐與甲基六氫鄰苯二甲酸酐兩者作為上述酸酐硬化劑,上述環氧化合物含有異氰尿酸三縮水甘油酯,於使用直徑13mm及高度30mm之圓柱狀之錠狀物測定其壓縮彈性模量及壓縮強度時,上述錠狀物之壓縮彈性模量為100MPa以上、2000MPa以下,且上述圓柱狀之錠狀物之壓縮強度為300N以上,因此不易產生殘缺且均勻性優異,進而於獲得成形體時,可減少外觀不良。 The white ingot for the optical semiconductor device of the present invention is formed using a white curable composition for an optical semiconductor device, and the white curable composition for an optical semiconductor device contains an epoxy compound, an acid anhydride curing agent, a white pigment, or a white pigment. a filler and a curing accelerator, and the white curable composition for an optical semiconductor device does not contain both hexahydrophthalic anhydride and methylhexahydrophthalic anhydride as the acid anhydride curing agent, and the epoxy resin The compound contains triglycidyl isocyanurate. When the compressive elastic modulus and compressive strength are measured using a cylindrical ingot having a diameter of 13 mm and a height of 30 mm, the compressive elastic modulus of the ingot is 100 MPa or more and 2000 MPa or less. Further, since the cylindrical ingot has a compressive strength of 300 N or more, it is less likely to be defective and excellent in uniformity, and further, when the molded body is obtained, appearance defects can be reduced.
1‧‧‧光半導體裝置 1‧‧‧Optical semiconductor device
2‧‧‧引線框架 2‧‧‧ lead frame
2A‧‧‧分割前引線框架 2A‧‧‧Separate lead frame
3‧‧‧光半導體元件 3‧‧‧Optical semiconductor components
4‧‧‧第1成形體 4‧‧‧First molded body
4A‧‧‧分割前第1成形體 4A‧‧‧First molded body before splitting
4a‧‧‧內面 4a‧‧‧ inside
5‧‧‧第2成形體 5‧‧‧2nd molded body
5A‧‧‧分割前第2成形體 5A‧‧‧Second shaped body before splitting
6‧‧‧黏晶材 6‧‧‧Mack crystal
7‧‧‧接合線 7‧‧‧bonding line
8‧‧‧密封劑 8‧‧‧Sealant
11‧‧‧分割前光半導體裝置用零件 11‧‧‧Division of parts for optical semiconductor devices
12‧‧‧分割前光半導體裝置 12‧‧‧Division of pre-optical semiconductor devices
21‧‧‧光半導體裝置 21‧‧‧Optical semiconductor devices
22‧‧‧黏晶材 22‧‧‧Mack crystal
23‧‧‧接合線 23‧‧‧bonding line
31‧‧‧光半導體裝置 31‧‧‧Optical semiconductor device
32‧‧‧成形體 32‧‧‧ Shaped body
32a‧‧‧框部 32a‧‧‧ Frame Department
32b‧‧‧填充部 32b‧‧‧Filling Department
圖1(a)及(b)係示意性地表示具備使用本發明之一實施形態之光半 導體裝置用白色硬化性組合物之成形體的光半導體裝置之一例的剖面圖及立體圖。 1(a) and (b) are schematic views showing the use of a light half using an embodiment of the present invention A cross-sectional view and a perspective view of an example of an optical semiconductor device of a molded body of a white curable composition for a conductor device.
圖2係示意性地表示圖1所示之光半導體裝置之變化例的剖面圖。 Fig. 2 is a cross-sectional view schematically showing a modification of the optical semiconductor device shown in Fig. 1.
圖3係示意性地表示圖2所示之光半導體裝置之變化例的剖面圖。 Fig. 3 is a cross-sectional view schematically showing a modification of the optical semiconductor device shown in Fig. 2.
圖4係示意性地表示包含使用本發明之一實施形態之光半導體裝置用白色硬化性組合物之複數個成形體連結而成之分割前成形體的分割前光半導體裝置用零件之一例的剖面圖。 FIG. 4 is a cross-sectional view showing an example of a component for pre-separation optical semiconductor device including a pre-divided molded body in which a plurality of molded bodies connected by a white curable composition for an optical semiconductor device according to an embodiment of the present invention are used. Figure.
圖5係示意性地表示包含使用本發明之一實施形態之光半導體裝置用白色硬化性組合物之複數個成形體連結而成之分割前成形體的分割前光半導體裝置之一例的剖面圖。 FIG. 5 is a cross-sectional view schematically showing an example of a pre-divided optical semiconductor device including a pre-divided molded body in which a plurality of molded bodies of a white curable composition for an optical semiconductor device according to an embodiment of the present invention are connected.
以下,對本發明詳細地進行說明。 Hereinafter, the present invention will be described in detail.
(光半導體裝置用白色硬化性組合物及光半導體裝置用白色錠狀物) (White curable composition for optical semiconductor device and white ingot for optical semiconductor device)
本發明之光半導體裝置用白色硬化性組合物係用於形成白色之光半導體裝置用白色錠狀物。本發明之光半導體裝置用白色硬化性組合物為白色。上述光半導體裝置用白色錠狀物係用於獲得於光半導體裝置中配置於光半導體元件之側方的具有框部之成形體。 The white curable composition for an optical semiconductor device of the present invention is used to form a white ingot for a white optical semiconductor device. The white curable composition for an optical semiconductor device of the present invention is white. The white ingot for the optical semiconductor device is used to obtain a molded body having a frame portion disposed on the side of the optical semiconductor device in the optical semiconductor device.
本發明之光半導體裝置用白色硬化性組合物含有環氧化合物、酸酐硬化劑、白色顏料、白色顏料以外之填充材、及硬化促進劑。本發明之光半導體裝置用白色硬化性組合物不一併含有六氫鄰苯二甲酸酐與甲基六氫鄰苯二甲酸酐兩者作為上述酸酐硬化劑。本發明之光半導體裝置用白色硬化性組合物係將含有六氫鄰苯二甲酸酐與甲基六氫鄰苯二甲酸酐兩者作為酸酐硬化劑之組合物除外之組合物。關於本發 明之光半導體裝置用白色硬化性組合物,係將含有六氫鄰苯二甲酸酐與甲基六氫鄰苯二甲酸酐兩者作為酸酐硬化劑之組合物除外。上述環氧化合物含有異氰尿酸三縮水甘油酯。藉由以打錠壓3t將本發明之光半導體裝置用白色硬化性組合物進行成形而獲得之直徑13mm及高度30mm之圓柱狀之錠狀物的壓縮彈性模量為100MPa以上、2000MPa以下,且上述圓柱狀之錠狀物之壓縮強度為300N以上。 The white curable composition for an optical semiconductor device of the present invention contains an epoxy compound, an acid anhydride curing agent, a white pigment, a filler other than a white pigment, and a curing accelerator. The white curable composition for an optical semiconductor device of the present invention contains both hexahydrophthalic anhydride and methylhexahydrophthalic anhydride as the acid anhydride curing agent. The white curable composition for an optical semiconductor device of the present invention is a composition excluding a composition containing both hexahydrophthalic anhydride and methylhexahydrophthalic anhydride as an acid anhydride curing agent. About this issue A white curable composition for a bright-light semiconductor device is a composition containing both hexahydrophthalic anhydride and methylhexahydrophthalic anhydride as an acid anhydride curing agent. The above epoxy compound contains triglycidyl isocyanurate. The cylindrical elastic ingot having a diameter of 13 mm and a height of 30 mm obtained by molding the optical semiconductor device of the present invention with a white curable composition at a tableting pressure of 3 t has a compressive elastic modulus of 100 MPa or more and 2000 MPa or less. The cylindrical ingot has a compressive strength of 300 N or more.
藉由採用本發明之光半導體裝置用白色硬化性組合物中之上述構成,可於使用上述硬化性組合物形成光半導體裝置用白色錠狀物時,獲得不易產生殘缺且均勻性優異之錠狀物。進而,藉由使用所獲得之光半導體裝置用白色錠狀物,可獲得外觀不良較少之成形體。 又,藉由上述環氧化合物含有異氰尿酸三縮水甘油酯,亦可抑制錠狀物及成形體之著色。於本發明中,對於著色得到抑制之錠狀物,可使殘缺不易產生且提高均勻性,進而對於著色得到抑制之成形體,可減少外觀不良。 According to the above configuration of the white curable composition for an optical semiconductor device of the present invention, when a white ingot for an optical semiconductor device is formed using the curable composition, an ingot which is less likely to be broken and has excellent uniformity can be obtained. Things. Further, by using the white ingot for the obtained optical semiconductor device, a molded article having less appearance defects can be obtained. Further, the epoxy compound contains triglycidyl isocyanurate, and the coloration of the ingot and the molded body can also be suppressed. In the present invention, in the case of the ingot which is suppressed in coloring, it is possible to prevent the occurrence of defects and to improve the uniformity, and it is possible to reduce the appearance defects in the molded article in which the coloring is suppressed.
又,本發明之光半導體裝置用白色錠狀物係用於獲得於光半導體裝置中配置於光半導體元件之側方的具有框部之成形體。本發明之光半導體裝置用白色錠狀物係使用白色之光半導體裝置用白色硬化性組合物而形成。本發明之光半導體裝置用白色錠狀物為白色。 In addition, the white ingot for the optical semiconductor device of the present invention is used to obtain a molded body having a frame portion disposed on the side of the optical semiconductor device in the optical semiconductor device. The white ingot for the optical semiconductor device of the present invention is formed using a white curable composition for a white optical semiconductor device. The white ingot for the optical semiconductor device of the present invention is white.
於本發明之光半導體裝置用白色錠狀物中,上述光半導體裝置用白色硬化性組合物含有環氧化合物、酸酐硬化劑、白色顏料、白色顏料以外之填充材、及硬化促進劑。於本發明之光半導體裝置用白色錠狀物中,上述光半導體裝置用白色硬化性組合物不一併含有六氫鄰苯二甲酸酐與甲基六氫鄰苯二甲酸酐兩者作為上述酸酐硬化劑。上述光半導體裝置用白色硬化性組合物係將含有六氫鄰苯二甲酸酐與甲基六氫鄰苯二甲酸酐兩者作為酸酐硬化劑之組合物除外之組合物。關於上述光半導體裝置用白色硬化性組合物,係將含有六氫鄰苯二甲酸酐 與甲基六氫鄰苯二甲酸酐兩者作為酸酐硬化劑之組合物除外。上述環氧化合物含有異氰尿酸三縮水甘油酯。就本發明之光半導體裝置用白色錠狀物而言,使用直徑13mm及高度30mm之圓柱狀之錠狀物測定其壓縮彈性模量及壓縮強度時,壓縮彈性模量為100MPa以上、2000MPa以下,且壓縮強度為300N以上。 In the white ingot for an optical semiconductor device of the present invention, the white curable composition for an optical semiconductor device contains an epoxy compound, an acid anhydride curing agent, a white pigment, a filler other than a white pigment, and a curing accelerator. In the white ingot for an optical semiconductor device of the present invention, the white curable composition for an optical semiconductor device does not contain both hexahydrophthalic anhydride and methylhexahydrophthalic anhydride as the acid anhydride. hardener. The white curable composition for an optical semiconductor device is a composition excluding a composition containing both hexahydrophthalic anhydride and methylhexahydrophthalic anhydride as an acid anhydride curing agent. The white curable composition for an optical semiconductor device described above contains hexahydrophthalic anhydride. Except for the combination of methyl hexahydrophthalic anhydride as an acid anhydride hardener. The above epoxy compound contains triglycidyl isocyanurate. In the case of a white ingot for an optical semiconductor device of the present invention, when a compressive elastic modulus and a compressive strength are measured using a cylindrical ingot having a diameter of 13 mm and a height of 30 mm, the compressive elastic modulus is 100 MPa or more and 2000 MPa or less. And the compressive strength is 300N or more.
藉由採用本發明之光半導體裝置用白色錠狀物之上述構成,可使該錠狀物之殘缺不易產生,且提高均勻性。進而,藉由使用所獲得之光半導體裝置用白色錠狀物,可獲得外觀不良較少之成形體。藉由上述環氧化合物含有異氰尿酸三縮水甘油酯,亦可抑制錠狀物及成形體之著色。本發明中,對於著色得到抑制之錠狀物,可使殘缺不易產生且提高均勻性,進而對於著色得到抑制之成形體,可減少外觀不良。 According to the above configuration of the white ingot for the optical semiconductor device of the present invention, the defects of the ingot can be prevented from occurring and the uniformity can be improved. Further, by using the white ingot for the obtained optical semiconductor device, a molded article having less appearance defects can be obtained. When the epoxy compound contains triglycidyl isocyanurate, the coloration of the ingot and the molded body can also be suppressed. In the present invention, in the case of the ingot which is suppressed in coloring, it is possible to prevent the occurrence of defects and to improve the uniformity, and it is possible to reduce the appearance defects in the molded article in which the coloring is suppressed.
又,先前於製作成形體時,大多使用錠狀物。若該錠狀物之強度較低,則有例如向轉移成形機之柱塞部分搬入時,錠狀物破損或殘缺之情況。其結果,有成形體容易產生外觀不良之問題。 Further, in the past, when forming a molded body, a spindle was often used. If the strength of the ingot is low, for example, when the plunger portion of the transfer molding machine is carried in, the ingot may be broken or broken. As a result, there is a problem that the molded body is liable to cause an appearance defect.
又,錠狀物可經原材料之混練步驟、混練物之冷卻步驟、冷卻後之粉碎步驟、及將粉碎物製成錠狀物之打錠步驟而獲得。於上述粉碎步驟及上述打錠步驟中,若粉碎前或打錠前之物質為液狀或半固體狀,則物質附著於粉碎裝置及打錠機上而產生不良狀況。因此,粉碎前及打錠前之上述物質較理想為具有可粉碎及可打錠之程度之較高剛性。上述物質之剛性越高,錠狀物越不易產生殘缺。 Further, the ingot may be obtained by a kneading step of a raw material, a cooling step of the kneaded material, a pulverizing step after cooling, and a tableting step of forming the pulverized material into a lozenge. In the pulverization step and the above-described tableting step, if the substance before or after the pulverization is liquid or semi-solid, the substance adheres to the pulverizing apparatus and the tableting machine to cause a problem. Therefore, it is preferable that the above-mentioned materials before and after the pulverization have a high rigidity to the extent that they can be pulverized and can be tableted. The higher the rigidity of the above substances, the less likely the ingot is to be broken.
針對此種問題點,於本發明中,可使錠狀物之殘缺不易產生且提高均勻性,從而可減少成形體之外觀不良。 In view of such a problem, in the present invention, the defects of the ingot can be prevented from being generated and the uniformity can be improved, and the appearance defect of the molded body can be reduced.
再者,本發明之光半導體裝置用白色錠狀物可為直徑13mm及高度30mm之圓柱狀,亦可並非直徑13mm及高度30mm之圓柱狀。於本發明之光半導體裝置用白色錠狀物並非直徑13mm及高度30mm之 圓柱狀之情形時,準備僅大小與本發明之光半導體裝置用白色錠狀物不同之直徑13mm及高度30mm之圓柱狀之錠狀物,測定上述壓縮彈性模量及上述壓縮強度。 Further, the white ingot for the optical semiconductor device of the present invention may have a cylindrical shape of 13 mm in diameter and 30 mm in height, or may be a columnar shape having a diameter of 13 mm and a height of 30 mm. The white ingot for the optical semiconductor device of the present invention is not 13 mm in diameter and 30 mm in height. In the case of a columnar shape, a cylindrical ingot having a diameter of 13 mm and a height of 30 mm which is different from the white ingot for the optical semiconductor device of the present invention is prepared, and the compressive elastic modulus and the compressive strength are measured.
又,有為了獲得複數個光半導體裝置而於此後將分割為複數個引線框架之分割前引線框架上配置成形體後,將分割前引線框架分割而獲得複數個光半導體裝置之情況。進而,有為了獲得複數個光半導體裝置而於引線框架上配置此後將分割為複數個成形體之分割前成形體後,將分割前成形體分割而獲得複數個光半導體裝置之情況。 In addition, in order to obtain a plurality of optical semiconductor devices, the molded body is placed on the pre-divided lead frame divided into a plurality of lead frames, and then the pre-divided lead frames are divided to obtain a plurality of optical semiconductor devices. Further, in order to obtain a plurality of optical semiconductor devices, a pre-segment molded body which is divided into a plurality of molded bodies after being disposed on the lead frame is divided, and the pre-divided molded body is divided to obtain a plurality of optical semiconductor devices.
藉由使用本發明之光半導體裝置用白色硬化性組合物及本發明之光半導體裝置用白色錠狀物,可抑制成形體之外觀不良,因此於將分割前引線框架及分割前成形體分割時,可有效地抑制成形體自引線框架之剝離。又,於本發明中,例如將本發明之光半導體裝置用白色硬化性組合物成形後,將包含所成形之成形體之LED封裝自流道部分加以分離時,成形體不易自引線框架等剝離。 By using the white curable composition for an optical semiconductor device of the present invention and the white ingot for the optical semiconductor device of the present invention, it is possible to suppress the appearance defect of the molded body. Therefore, when the lead frame before splitting and the pre-divided molded body are divided, The peeling of the formed body from the lead frame can be effectively suppressed. Further, in the present invention, for example, after the white curable composition of the optical semiconductor device of the present invention is molded, and the LED package including the molded body to be molded is separated from the flow path portion, the molded body is less likely to be peeled off from the lead frame or the like.
以下,對本發明之光半導體裝置用白色硬化性組合物所含之各成分之詳細情況進行說明。 Hereinafter, the details of each component contained in the white curable composition for an optical semiconductor device of the present invention will be described.
[環氧化合物(A)] [epoxy compound (A)]
上述光半導體裝置用白色硬化性組合物含有上述環氧化合物(A),以藉由熱之賦予而可進行硬化。上述環氧化合物(A)具有環氧基。藉由使用上述環氧化合物(A)作為熱硬化性化合物,成形體之耐熱性及絕緣可靠性變高。上述環氧化合物(A)可僅使用1種,亦可併用2種以上。 The white curable composition for an optical semiconductor device contains the epoxy compound (A) and can be cured by the imparting of heat. The above epoxy compound (A) has an epoxy group. By using the epoxy compound (A) as a thermosetting compound, the heat resistance and insulation reliability of the molded body become high. The epoxy compound (A) may be used alone or in combination of two or more.
作為上述環氧化合物(A)之具體例,可列舉:雙酚型環氧化合物、酚醛清漆型環氧化合物、使多元酸化合物與表氯醇反應而獲得之縮水甘油酯型環氧化合物、使多胺化合物與表氯醇反應而獲得之縮水甘油胺型環氧化合物、縮水甘油醚型環氧化合物、脂肪族環氧化合 物、氫化型芳香族環氧化合物、具有脂環式骨架之環氧化合物、異氰尿酸三縮水甘油酯等雜環式環氧化合物等。作為上述多元酸化合物,可列舉鄰苯二甲酸及二聚酸等。作為上述多胺化合物,可列舉二胺基二苯甲烷及異氰尿酸等。 Specific examples of the epoxy compound (A) include a bisphenol epoxy compound, a novolac epoxy compound, and a glycidyl ester epoxy compound obtained by reacting a polybasic acid compound with epichlorohydrin. A glycidylamine type epoxy compound obtained by reacting a polyamine compound with epichlorohydrin, a glycidyl ether type epoxy compound, an aliphatic epoxide a hydrogenated aromatic epoxy compound, an epoxy compound having an alicyclic skeleton, or a heterocyclic epoxy compound such as triglycidyl isocyanurate. Examples of the polybasic acid compound include phthalic acid and dimer acid. Examples of the polyamine compound include diaminodiphenylmethane and isocyanuric acid.
作為上述雙酚型環氧化合物,可列舉:雙酚A型環氧化合物、雙酚F型環氧化合物、雙酚S型環氧化合物、及烷基取代雙酚等的二縮水甘油醚等。作為上述酚醛清漆型環氧化合物,可列舉酚系酚醛清漆型環氧化合物及鄰甲酚酚醛清漆型環氧化合物等。作為上述雜環式環氧化合物,可列舉異氰尿酸二縮水甘油酯及異氰尿酸三縮水甘油酯等。 Examples of the bisphenol type epoxy compound include a bisphenol A type epoxy compound, a bisphenol F type epoxy compound, a bisphenol S type epoxy compound, and a diglycidyl ether such as an alkyl substituted bisphenol. Examples of the novolak-type epoxy compound include a phenol novolak type epoxy compound and an o-cresol novolak type epoxy compound. Examples of the heterocyclic epoxy compound include diglycidyl isocyanurate and triglycidyl isocyanurate.
上述環氧化合物(A)較佳為無色、或接近無色之顏色。因此,上述環氧化合物(A)較佳為雙酚A型環氧化合物、雙酚F型環氧化合物、雙酚S型環氧化合物、異氰尿酸二縮水甘油酯或異氰尿酸三縮水甘油酯。為了抑制錠狀物及成形體之著色,上述環氧化合物(A)含有異氰尿酸三縮水甘油酯。 The above epoxy compound (A) is preferably a colorless or nearly colorless color. Therefore, the epoxy compound (A) is preferably a bisphenol A epoxy compound, a bisphenol F epoxy compound, a bisphenol S epoxy compound, diglycidyl isocyanurate or triglycidyl isocyanurate. ester. The epoxy compound (A) contains triglycidyl isocyanurate in order to suppress the coloration of the ingot and the molded body.
就進一步抑制由嚴酷環境下之使用所致之光半導體裝置之品質降低的觀點而言,上述環氧化合物(A)較佳為含有不具有芳香族骨架之環氧化合物,較佳為不具有芳香族骨架之環氧化合物。 The epoxy compound (A) preferably contains an epoxy compound having no aromatic skeleton, and preferably has no aromaticity, from the viewpoint of further suppressing deterioration in quality of the optical semiconductor device due to use in a severe environment. An epoxy compound of a family skeleton.
上述環氧化合物(A)之環氧當量較佳為50以上,更佳為100以上,且較佳為500以下,更佳為300以下。上述環氧化合物(A)之環氧當量尤佳為300以下。若上述環氧當量為上述下限以上及上述上限以下,尤其若上述環氧當量為300以下,則上述硬化性組合物之連續成形性、及成形體對密接對象物之密接性進一步提高。 The epoxy compound (A) preferably has an epoxy equivalent of 50 or more, more preferably 100 or more, and is preferably 500 or less, more preferably 300 or less. The epoxy compound (A) preferably has an epoxy equivalent of 300 or less. When the epoxy equivalent is not less than the above lower limit and not more than the above upper limit, in particular, when the epoxy equivalent is 300 or less, the continuous moldability of the curable composition and the adhesion of the molded article to the object to be adhered are further improved.
上述環氧化合物(A)之調配量係以藉由熱之賦予而適度進行硬化之方式適當調整,並無特別限定。上述光半導體裝置用白色硬化性組合物100重量%中,上述環氧化合物(A)之含量較佳為1重量%以上,更佳為3重量%以上,進而較佳為5重量%以上,且較佳為99重量%以 下,更佳為95重量%以下,進而較佳為90重量%以下,進而更佳為80重量%以下。上述光半導體裝置用白色硬化性組合物100重量%中,異氰尿酸三縮水甘油酯之含量較佳為1重量%以上,更佳為3重量%以上,進而較佳為5重量%以上,且較佳為99重量%以下,更佳為95重量%以下,進而較佳為90重量%以下,進而更佳為80重量%以下。若上述環氧化合物(A)之含量及異氰尿酸三縮水甘油酯之含量為上述下限以上,則藉由加熱從而硬化性組合物更有效地進行硬化。若上述環氧化合物(A)之含量為上述上限以下,則成形體之耐熱性進一步提高。 The blending amount of the epoxy compound (A) is appropriately adjusted so as to be appropriately cured by the application of heat, and is not particularly limited. The content of the epoxy compound (A) is preferably 1% by weight or more, more preferably 3% by weight or more, even more preferably 5% by weight or more, based on 100% by weight of the white curable composition for an optical semiconductor device. Preferably 99% by weight More preferably, it is 95% by weight or less, further preferably 90% by weight or less, and still more preferably 80% by weight or less. The content of the triglycidyl isocyanurate in 100% by weight of the white curable composition for an optical semiconductor device is preferably 1% by weight or more, more preferably 3% by weight or more, still more preferably 5% by weight or more, and It is preferably 99% by weight or less, more preferably 95% by weight or less, further preferably 90% by weight or less, and still more preferably 80% by weight or less. When the content of the epoxy compound (A) and the content of the triglycidyl isocyanurate are at least the above lower limit, the curable composition is more effectively cured by heating. When the content of the epoxy compound (A) is at most the above upper limit, the heat resistance of the molded article is further improved.
[硬化劑(B)] [hardener (B)]
上述光半導體裝置用白色硬化性組合物含有上述硬化劑(B),以藉由熱之賦予而可有效率地進行硬化。其中,上述光半導體裝置用白色硬化性組合物不含六氫鄰苯二甲酸酐與甲基六氫鄰苯二甲酸酐兩者作為上述酸酐硬化劑。上述硬化劑(B)使上述環氧化合物(A)硬化。上述硬化劑(B)為酸酐硬化劑。藉由使用該酸酐硬化劑,與成形體接觸之密封劑或引線框架等構件與成形體之密接性變高。又,藉由使用上述酸酐硬化劑,可維持硬化性較高,進一步抑制成形體之成形不均。作為上述酸酐硬化劑,可使用作為上述環氧化合物(A)之硬化劑而使用之公知之酸酐硬化劑。上述硬化劑(B)可僅使用1種,亦可併用2種以上。 The white curable composition for an optical semiconductor device contains the above-mentioned curing agent (B), and can be efficiently cured by the application of heat. The white curable composition for an optical semiconductor device described above does not contain both hexahydrophthalic anhydride and methylhexahydrophthalic anhydride as the acid anhydride curing agent. The above curing agent (B) hardens the above epoxy compound (A). The above curing agent (B) is an acid anhydride curing agent. By using the acid anhydride curing agent, the adhesion between the member such as the sealant or the lead frame that is in contact with the molded body and the molded body is increased. Moreover, by using the above-described acid anhydride curing agent, the hardenability can be maintained high, and the molding unevenness of the molded body can be further suppressed. As the acid anhydride curing agent, a known acid anhydride curing agent which is used as a curing agent for the epoxy compound (A) can be used. The curing agent (B) may be used alone or in combination of two or more.
又,例如六氫鄰苯二甲酸酐之熔點為-30℃,甲基六氫鄰苯二甲酸酐之熔點為33℃,該等之熔點大不相同。藉由不併用該等,硬化條件之控制變容易。又,可抑制硬化不均。再者,於使用2種以上之硬化劑之情形時,硬化劑之熔點之最大值與最小值之差較佳為50℃以下,更佳為40℃以下,進而較佳為30℃以下。甲基六氫鄰苯二甲酸酐係於六氫鄰苯二甲酸酐之6員環中導入甲基而成之化合物。作為甲基六氫鄰苯二甲酸酐,可列舉4-甲基六氫鄰苯二甲酸酐等。 Further, for example, the melting point of hexahydrophthalic anhydride is -30 ° C, and the melting point of methyl hexahydrophthalic anhydride is 33 ° C, and the melting points thereof are greatly different. By not using these, the control of the hardening conditions becomes easy. Moreover, unevenness in hardening can be suppressed. Further, when two or more kinds of curing agents are used, the difference between the maximum value and the minimum value of the melting point of the curing agent is preferably 50 ° C or lower, more preferably 40 ° C or lower, and still more preferably 30 ° C or lower. Methylhexahydrophthalic anhydride is a compound obtained by introducing a methyl group into a 6-membered ring of hexahydrophthalic anhydride. Examples of the methylhexahydrophthalic anhydride include 4-methylhexahydrophthalic anhydride and the like.
作為上述酸酐硬化劑,可使用具有芳香族骨架之酸酐及具有脂環式骨架之酸酐中之任一種。 As the acid anhydride curing agent, any of an acid anhydride having an aromatic skeleton and an acid anhydride having an alicyclic skeleton can be used.
作為較佳之上述酸酐硬化劑,可列舉:鄰苯二甲酸酐、順丁烯二酸酐、偏苯三甲酸酐、均苯四甲酸二酐、六氫鄰苯二甲酸酐、四氫鄰苯二甲酸酐、甲基耐地酸酐、耐地酸酐、戊二酸酐、甲基六氫鄰苯二甲酸酐及甲基四氫鄰苯二甲酸酐等。 Preferred examples of the acid anhydride curing agent include phthalic anhydride, maleic anhydride, trimellitic anhydride, pyromellitic dianhydride, hexahydrophthalic anhydride, and tetrahydrophthalic anhydride. Methylic acid anhydride, dying anhydride, glutaric anhydride, methylhexahydrophthalic anhydride, methyltetrahydrophthalic anhydride, and the like.
上述酸酐硬化劑較佳為不具有雙鍵。作為不具有雙鍵之較佳之酸酐硬化劑,可列舉六氫鄰苯二甲酸酐及甲基六氫鄰苯二甲酸酐等。上述酸酐硬化劑較佳為六氫鄰苯二甲酸酐及甲基六氫鄰苯二甲酸酐中之一者。 The above acid anhydride hardener preferably does not have a double bond. Preferred examples of the acid anhydride curing agent having no double bond include hexahydrophthalic anhydride and methylhexahydrophthalic anhydride. The acid anhydride curing agent is preferably one of hexahydrophthalic anhydride and methylhexahydrophthalic anhydride.
就提高硬化性組合物本身之混練均勻性之觀點而言,上述光半導體裝置用白色硬化性組合物較佳為含有熔點為50℃以下之酸酐硬化劑作為上述酸酐硬化劑。上述光半導體裝置用白色硬化性組合物所含有之上述酸酐硬化劑100重量%中,上述熔點為50℃以下之酸酐硬化劑之含量較佳為20重量%以上、100重量%以下。上述酸酐硬化劑亦可全部為上述熔點為50℃以下之酸酐硬化劑。上述酸酐硬化劑100重量%中,上述熔點為50℃以下之酸酐硬化劑之含量可為40重量%以上,亦可為50重量%以上。 The white curable composition for an optical semiconductor device preferably contains an acid anhydride curing agent having a melting point of 50 ° C or less as the acid anhydride curing agent, from the viewpoint of improving the kneading uniformity of the curable composition itself. In the 100% by weight of the acid anhydride curing agent contained in the white curable composition for an optical semiconductor device, the content of the acid anhydride curing agent having a melting point of 50 ° C or less is preferably 20% by weight or more and 100% by weight or less. The acid anhydride curing agent may be all an acid anhydride curing agent having a melting point of 50 ° C or lower. The content of the acid anhydride curing agent having a melting point of 50 ° C or less in 100% by weight of the acid anhydride curing agent may be 40% by weight or more, or may be 50% by weight or more.
上述環氧化合物(A)與上述硬化劑(B)之調配比率並無特別限定。相對於上述環氧化合物(A)100重量份,上述硬化劑(B)(酸酐硬化劑)之含量較佳為0.5重量份以上,更佳為1重量份以上,進而較佳為2重量份以上,尤佳為3重量份以上,且較佳為500重量份以下,更佳為300重量份以下,進而較佳為200重量份以下,尤佳為100重量份以下。 The compounding ratio of the epoxy compound (A) and the above curing agent (B) is not particularly limited. The content of the curing agent (B) (an acid anhydride curing agent) is preferably 0.5 parts by weight or more, more preferably 1 part by weight or more, and still more preferably 2 parts by weight or more based on 100 parts by weight of the epoxy compound (A). More preferably, it is 3 parts by weight or more, and preferably 500 parts by weight or less, more preferably 300 parts by weight or less, further preferably 200 parts by weight or less, and particularly preferably 100 parts by weight or less.
又,上述光半導體裝置用白色硬化性組合物中,上述環氧化合物(A)總體之環氧當量與上述硬化劑(B)(酸酐硬化劑)總體之硬化劑當量的當量比(環氧當量:硬化劑當量)較佳為0.3:1~3:1,更佳為 1.3:1~2:1。若上述當量比(環氧當量:硬化劑當量)滿足上述範圍,則成形體之耐熱性及耐候性進一步提高。 Further, in the white curable composition for an optical semiconductor device, the equivalent ratio of the epoxy equivalent of the epoxy compound (A) to the hardener equivalent of the hardener (B) (anhydride hardener) as a whole (epoxy equivalent) : hardener equivalent) is preferably from 0.3:1 to 3:1, more preferably 1.3:1~2:1. When the above equivalent ratio (epoxy equivalent: curing agent equivalent) satisfies the above range, the heat resistance and weather resistance of the molded body are further improved.
(白色顏料(C)) (white pigment (C))
上述光半導體裝置用白色硬化性組合物含有上述白色顏料(C),因此可獲得光之反射率較高之成形體。又,藉由使用上述白色顏料(C),與僅使用上述白色顏料(C)以外之填充材之情形相比,可獲得光之反射率較高之成形體。上述白色顏料(C)可僅使用1種,亦可併用2種以上。 Since the white curable composition for an optical semiconductor device contains the white pigment (C), a molded body having a high light reflectance can be obtained. Moreover, by using the white pigment (C), a molded body having a high reflectance of light can be obtained as compared with the case of using only a filler other than the white pigment (C). The white pigment (C) may be used alone or in combination of two or more.
上述白色顏料(C)並無特別限定。可使用先前公知之白色顏料作為上述白色顏料(C)。 The white pigment (C) is not particularly limited. A previously known white pigment can be used as the above white pigment (C).
作為上述白色顏料(C),可列舉:氧化鋁、氧化鈦、氧化鋅、氧化鋯、氧化銻及氧化鎂等。 Examples of the white pigment (C) include alumina, titania, zinc oxide, zirconium oxide, cerium oxide, and magnesium oxide.
就進一步提高成形體之光反射率之觀點而言,上述白色顏料(C)較佳為氧化鈦、氧化鋅或氧化鋯。於使用該較佳之白色顏料之情形時,可使用氧化鈦、氧化鋅及氧化鋯中之1種或2種以上之白色顏料。上述白色顏料(C)較佳為氧化鈦或氧化鋅,較佳為氧化鈦,較佳為氧化鋅。上述白色顏料(C)亦可為氧化鋯。 The white pigment (C) is preferably titanium oxide, zinc oxide or zirconium oxide from the viewpoint of further increasing the light reflectance of the molded body. In the case of using the preferred white pigment, one or two or more kinds of white pigments of titanium oxide, zinc oxide and zirconium oxide can be used. The white pigment (C) is preferably titanium oxide or zinc oxide, preferably titanium oxide, preferably zinc oxide. The above white pigment (C) may also be zirconia.
上述氧化鈦較佳為金紅石型氧化鈦。藉由使用金紅石型氧化鈦,成形體之耐熱性進一步提高,即便於嚴酷環境下使用光半導體裝置,品質亦不易降低。 The titanium oxide is preferably rutile-type titanium oxide. By using rutile-type titanium oxide, the heat resistance of the molded body is further improved, and the quality is not easily lowered even when an optical semiconductor device is used in a severe environment.
上述氧化鈦較佳為藉由氧化鋁進行了表面處理之金紅石型氧化鈦。上述白色顏料(C)100重量%中,上述藉由氧化鋁進行了表面處理之金紅石型氧化鈦之含量較佳為10重量%以上,更佳為30重量%以上,且為100重量%以下。上述白色顏料(C)亦可全部為上述藉由氧化鋁進行了表面處理之金紅石型氧化鈦。藉由使用上述藉由氧化鋁進行了表面處理之金紅石型氧化鈦,成形體之耐熱性進一步提高。 The titanium oxide is preferably a rutile-type titanium oxide surface-treated with alumina. The content of the rutile-type titanium oxide surface-treated with alumina in 100% by weight of the white pigment (C) is preferably 10% by weight or more, more preferably 30% by weight or more, and 100% by weight or less. . The white pigment (C) may be all rutile-type titanium oxide surface-treated with alumina. The heat resistance of the molded body is further improved by using the above-described rutile-type titanium oxide surface-treated with alumina.
作為上述藉由氧化鋁進行了表面處理之金紅石型氧化鈦,例如可列舉:作為金紅石氯法氧化鈦之石原產業公司製造之「CR-58」、以及作為金紅石硫酸法氧化鈦之石原產業公司製造之「R-630」等。 As the rutile-type titanium oxide which has been surface-treated with alumina, for example, "CR-58" manufactured by Ishihara Sangyo Co., Ltd. as rutile chlorinated titanium oxide, and as a refractory titanium oxide rutile "R-630" manufactured by an industrial company.
上述氧化鋅較佳為經表面處理之氧化鋅。就進一步提高成形體之加工性及成形體之光反射率的觀點而言,上述氧化鋅較佳為藉由含有矽、鋁或二氧化鋯(zirconia)之材料進行表面處理,更佳為藉由含有矽之材料進行表面處理。上述含有矽之材料較佳為聚矽氧化合物。 The above zinc oxide is preferably a surface treated zinc oxide. The zinc oxide is preferably surface-treated by a material containing cerium, aluminum or zirconia, from the viewpoint of further improving the processability of the molded body and the light reflectance of the molded body, and more preferably by The material containing bismuth is surface treated. The above material containing ruthenium is preferably a polyfluorene oxide compound.
上述氧化鋯較佳為經表面處理之氧化鋯。就進一步提高成形體之加工性及成形體之光反射率的觀點而言,上述氧化鋯較佳為藉由含有矽、鋁或二氧化鋯(zirconia)之材料進行表面處理,更佳為藉由含有矽之材料進行表面處理。上述含有矽之材料較佳為聚矽氧化合物。 The above zirconia is preferably a surface treated zirconia. The zirconia is preferably surface-treated by a material containing cerium, aluminum or zirconia, from the viewpoint of further improving the processability of the formed body and the light reflectance of the formed body, more preferably by The material containing bismuth is surface treated. The above material containing ruthenium is preferably a polyfluorene oxide compound.
上述表面處理之方法並無特別限定。作為表面處理之方法,可使用乾式法、濕式法、整體摻合法、以及其他公知慣用之表面處理方法。 The method of the above surface treatment is not particularly limited. As a method of surface treatment, a dry method, a wet method, a bulk blending method, and other well-known conventional surface treatment methods can be used.
上述光半導體裝置用白色硬化性組合物100重量%中,上述白色顏料(C)之含量較佳為3重量%以上,更佳為5重量%以上,進而較佳為7重量%以上,尤佳為10重量%以上,且較佳為95重量%以下,更佳為90重量%以下,進而較佳為85重量%以下。上述光半導體裝置用白色硬化性組合物100重量%中,氧化鈦、氧化鋅及氧化鋯之合計含量較佳為3重量%以上,更佳為5重量%以上,進而較佳為7重量%以上,尤佳為10重量%以上,且較佳為95重量%以下,更佳為90重量%以下,進而較佳為85重量%以下。若上述白色顏料(C)之含量及氧化鈦、氧化鋅及氧化鋯之合計含量分別為上述下限以上及上述上限以下,則成形體之光之反射率進一步提高,上述硬化性組合物之成形性進一步提高。 The content of the white pigment (C) in the white curable composition for an optical semiconductor device is preferably 3% by weight or more, more preferably 5% by weight or more, still more preferably 7% by weight or more, and particularly preferably 100% by weight. It is 10% by weight or more, and preferably 95% by weight or less, more preferably 90% by weight or less, still more preferably 85% by weight or less. In 100% by weight of the white curable composition for an optical semiconductor device, the total content of titanium oxide, zinc oxide, and zirconium oxide is preferably 3% by weight or more, more preferably 5% by weight or more, and still more preferably 7% by weight or more. More preferably, it is 10% by weight or more, and is preferably 95% by weight or less, more preferably 90% by weight or less, still more preferably 85% by weight or less. When the content of the white pigment (C) and the total content of the titanium oxide, the zinc oxide, and the zirconia are each the lower limit or more and the upper limit or less, the reflectance of the light of the molded body is further improved, and the formability of the curable composition is improved. Further improve.
(填充材(D)) (filler (D))
上述填充材(D)係白色顏料(C)以外之填充材。上述填充材(D)與白色顏料(C)不同。上述填充材(D)可僅使用1種,亦可併用2種以上。 The filler (D) is a filler other than the white pigment (C). The above filler (D) is different from the white pigment (C). The filler (D) may be used alone or in combination of two or more.
作為上述填充材(D),可使用無機填充材及有機填充材中之任一種。作為上述填充材(D)之具體例,可列舉:二氧化矽、雲母、氧化鈹、鈦酸鉀、鈦酸鋇、鈦酸鍶、鈦酸鈣、氧化銻、硼酸鋁、氫氧化鋁、氧化鎂、碳酸鈣、碳酸鎂、碳酸鋁、矽酸鈣、矽酸鋁、矽酸鎂、磷酸鈣、硫酸鈣、硫酸鋇、氮化矽、氮化硼、煅燒黏土等黏土、滑石、碳化矽、交聯丙烯酸系樹脂粒子及聚矽氧粒子等。上述填充材(D)較佳為無機填充材。上述填充材(D)並非作為白色顏料之氧化鈦,且並非作為白色顏料之氧化鋅,且並且作為白色顏料之氧化鋯。 As the filler (D), any of an inorganic filler and an organic filler can be used. Specific examples of the filler (D) include cerium oxide, mica, cerium oxide, potassium titanate, barium titanate, barium titanate, calcium titanate, cerium oxide, aluminum borate, aluminum hydroxide, and oxidation. Magnesium, calcium carbonate, magnesium carbonate, aluminum carbonate, calcium citrate, aluminum citrate, magnesium citrate, calcium phosphate, calcium sulfate, barium sulfate, tantalum nitride, boron nitride, calcined clay, clay, talc, tantalum carbide, Crosslinked acrylic resin particles, polyfluorene oxide particles, and the like. The filler (D) is preferably an inorganic filler. The filler (D) is not a titanium oxide as a white pigment, and is not a zinc oxide as a white pigment, and is a white pigment zirconia.
就使上述硬化性組合物之成形性、以及成形體與密接對象物之密接性進一步變良好之觀點而言,上述填充材(D)較佳為含有二氧化矽,更佳為二氧化矽。 The filler (D) preferably contains cerium oxide, more preferably cerium oxide, from the viewpoint of further improving the moldability of the curable composition and the adhesion between the molded article and the object to be adhered.
上述填充材(D)之平均粒徑較佳為0.1μm以上,且較佳為100μm以下。若上述平均粒徑為上述下限以上,則上述硬化性組合物之成形性進一步變良好。若上述平均粒徑為上述上限以下,則更不易產生成形體之外觀不良。 The filler (D) preferably has an average particle diameter of 0.1 μm or more, and preferably 100 μm or less. When the average particle diameter is at least the above lower limit, the formability of the curable composition is further improved. When the average particle diameter is at most the above upper limit, the appearance of the molded article is less likely to occur.
上述填充材(D)之平均粒徑係於體積基準粒度分佈曲線中累積值為50%時之粒徑值。該平均粒徑例如可使用雷射光式粒度分佈計進行測定。作為該雷射光式粒度分佈計之市售品,可列舉:Beckman Coulter公司製造之「LS 13 320」等。 The average particle diameter of the above filler (D) is a particle diameter value when the cumulative value in the volume-based particle size distribution curve is 50%. The average particle diameter can be measured, for example, using a laser light particle size distribution meter. As a commercial item of this laser light-type particle size distribution meter, "LS13320" by Beckman Coulter company, etc. are mentioned.
上述光半導體裝置用白色硬化性組合物100重量%中,上述填充材(D)之含量及上述二氧化矽之含量分別較佳為3重量%以上,更佳為5重量%以上,進而較佳為10重量%以上,進而更佳為20重量%以上,且較佳為95重量%以下,更佳為90重量%以下,進而較佳為85重量%以下。若上述填充材(D)之含量及上述二氧化矽之含量為上述下限以 上及上述上限以下,則硬化性組合物之成形性進一步提高。若上述填充材(D)之含量及上述二氧化矽之含量為上述上限以下,則成形體之光之反射率進一步提高。 In 100% by weight of the white curable composition for an optical semiconductor device, the content of the filler (D) and the content of the cerium oxide are each preferably 3% by weight or more, more preferably 5% by weight or more, and further preferably It is 10% by weight or more, more preferably 20% by weight or more, and is preferably 95% by weight or less, more preferably 90% by weight or less, still more preferably 85% by weight or less. If the content of the filler (D) and the content of the above-mentioned cerium oxide are the above lower limit When it is more than the above upper limit, the formability of the curable composition is further improved. When the content of the filler (D) and the content of the cerium oxide are at most the above upper limit, the reflectance of light of the molded body is further improved.
上述光半導體裝置用白色硬化性組合物100重量%中,上述白色顏料(C)與上述填充材(D)之合計含量較佳為20重量%以上,更佳為50重量%以上,進而較佳為60重量%以上,且較佳為95重量%以下,更佳為90重量%以下,進而較佳為85重量%以下。若上述白色顏料(C)與上述填充材(D)之合計含量為上述下限以上及上述上限以下,則硬化性組合物之成形性及成形體之光之反射率進一步提高,上述硬化性組合物之流動性進一步變適度。又,若上述白色顏料(C)與上述填充材(D)之合計含量為50重量%以上,則成形體之強度進一步提高,上述硬化性組合物之流動性進一步變適度。 In 100% by weight of the white curable composition for an optical semiconductor device, the total content of the white pigment (C) and the filler (D) is preferably 20% by weight or more, more preferably 50% by weight or more, and further preferably It is 60% by weight or more, and preferably 95% by weight or less, more preferably 90% by weight or less, still more preferably 85% by weight or less. When the total content of the white pigment (C) and the filler (D) is at least the above lower limit and not more than the above upper limit, the moldability of the curable composition and the reflectance of the light of the molded article are further improved, and the curable composition is further improved. The liquidity is further moderated. In addition, when the total content of the white pigment (C) and the filler (D) is 50% by weight or more, the strength of the molded body is further improved, and the fluidity of the curable composition is further improved.
(硬化促進劑(E)) (hardening accelerator (E))
上述光半導體裝置用白色硬化性組合物含有硬化促進劑(E)。藉由使用上述硬化促進劑(E),可提高硬化性組合物之硬化性,進而可提高成形體之耐熱性。上述硬化促進劑(E)可僅使用1種,亦可併用2種以上。 The white curable composition for an optical semiconductor device described above contains a curing accelerator (E). By using the above-described curing accelerator (E), the curability of the curable composition can be improved, and the heat resistance of the molded article can be improved. The hardening accelerator (E) may be used alone or in combination of two or more.
作為上述硬化促進劑(E),例如可列舉:脲化合物、鎓鹽化合物、咪唑化合物、磷化合物、胺化合物及有機金屬化合物等。 Examples of the curing accelerator (E) include a urea compound, an onium salt compound, an imidazole compound, a phosphorus compound, an amine compound, and an organometallic compound.
作為上述脲化合物,可列舉:脲、脂肪族脲化合物及芳香族脲化合物等。作為上述脲化合物之具體例,可列舉:脲、甲基脲、1,1-二甲基脲、1,3-二甲基脲、1,1,3,3-四甲基脲、1,3-二苯基脲及三-正丁基硫脲等。亦可使用該等以外之脲化合物。 Examples of the urea compound include urea, an aliphatic urea compound, and an aromatic urea compound. Specific examples of the urea compound include urea, methyl urea, 1,1-dimethylurea, 1,3-dimethylurea, 1,1,3,3-tetramethylurea, and 1, 3-diphenylurea and tri-n-butylthiourea. Urea compounds other than these may also be used.
作為上述鎓鹽化合物,可列舉:銨鹽、鏻鹽及鋶鹽化合物等。 Examples of the onium salt compound include an ammonium salt, a phosphonium salt, and an onium salt compound.
作為上述咪唑化合物,可列舉:2-十一烷基咪唑、2-十七烷基咪唑、2-甲基咪唑、2-乙基-4-甲基咪唑、2-苯基咪唑、2-苯基-4-甲基咪 唑、1-苄基-2-甲基咪唑、1-苄基-2-苯基咪唑、1,2-二甲基咪唑、1-氰基乙基-2-甲基咪唑、1-氰基乙基-2-乙基-4-甲基咪唑、1-氰基乙基-2-十一烷基咪唑、1-氰基乙基-2-苯基咪唑、1-氰基乙基-2-十一烷基咪唑鎓三酸酯、1-氰基乙基-2-苯基咪唑鎓偏苯三酸酯、2,4-二胺基-6-[2'-甲基咪唑基-(1')]-乙基-均三、2,4-二胺基-6-[2'-十一烷基咪唑基-(1')]-乙基-均三、2,4-二胺基-6-[2'-乙基-4'-甲基咪唑基-(1')]-乙基-均三、2,4-二胺基-6-[2'-甲基咪唑基-(1')]-乙基-均三異氰尿酸加成物、2-苯基咪唑異氰尿酸加成物、2-甲基咪唑異氰尿酸加成物、2-苯基-4,5-二羥基甲基咪唑及2-苯基-4-甲基-5-二羥基甲基咪唑等。 Examples of the imidazole compound include 2-undecylimidazole, 2-heptadecylimidazole, 2-methylimidazole, 2-ethyl-4-methylimidazole, 2-phenylimidazole, and 2-benzene. 4-methylimidazole, 1-benzyl-2-methylimidazole, 1-benzyl-2-phenylimidazole, 1,2-dimethylimidazole, 1-cyanoethyl-2-methyl Imidazole, 1-cyanoethyl-2-ethyl-4-methylimidazole, 1-cyanoethyl-2-undecylimidazole, 1-cyanoethyl-2-phenylimidazole, 1- Cyanoethyl-2-undecyl imidazolium triester, 1-cyanoethyl-2-phenylimidazolium trimellitate, 2,4-diamino-6-[2'- Methylimidazolyl-(1')]-ethyl-all three 2,4-Diamino-6-[2'-undecylimidazolyl-(1')]-ethyl-all three 2,4-Diamino-6-[2'-ethyl-4'-methylimidazolyl-(1')]-ethyl-all three 2,4-Diamino-6-[2'-methylimidazolyl-(1')]-ethyl-all three Isocyanuric acid adduct, 2-phenylimidazolium isocyanurate adduct, 2-methylimidazoisocyanuric acid adduct, 2-phenyl-4,5-dihydroxymethylimidazole and 2-phenyl 4-methyl-5-dihydroxymethylimidazole and the like.
上述磷化合物含有磷,為含磷化合物。作為上述磷化合物,可列舉:三苯基膦、四苯基硼酸四苯基鏻、o,o-二乙基二硫代磷酸酯四正丁基鏻、四氟硼酸四正丁基鏻、及四苯基硼酸四-正丁基鏻等。亦可使用該等以外之磷化合物。 The above phosphorus compound contains phosphorus and is a phosphorus-containing compound. Examples of the phosphorus compound include triphenylphosphine, tetraphenylphosphonium tetraphenylborate, tetra-n-butylphosphonium o,o-diethyldithiophosphate, tetra-n-butylphosphonium tetrafluoroborate, and Tetra-n-butylphosphonium tetraphenylborate. Phosphorus compounds other than these may also be used.
作為上述胺化合物,可列舉:二乙胺、三乙胺、二伸乙基四胺、三伸乙基四胺、4,4-二甲基胺基吡啶、二氮雜雙環烷烴、二氮雜雙環烯烴、四級銨鹽、三伸乙基二胺、及三-2,4,6-二甲基胺基甲基苯酚。亦可使用該等化合物之鹽。可列舉:苯基膦、四苯基硼酸四苯基鏻、o,o-二乙基二硫代磷酸酯四正丁基鏻、四氟硼酸四正丁基鏻、四苯基硼酸四正丁基鏻。 The amine compound may, for example, be diethylamine, triethylamine, diethylidenetetraamine, triethylidenetetramine, 4,4-dimethylaminopyridine, diazabicycloalkane or diaza. Bicyclic olefin, quaternary ammonium salt, tri-ethylenediamine, and tris-2,4,6-dimethylaminomethylphenol. Salts of such compounds can also be used. There may be mentioned: phenylphosphine, tetraphenylphosphonium tetraphenylborate, tetra-n-butyl fluorene o,o-diethyldithiophosphate, tetra-n-butylphosphonium tetrafluoroborate, tetra-n-butyl tetraphenylborate Basic.
作為上述有機金屬化合物,可列舉鹼金屬化合物及鹼土金屬化合物等。作為上述有機金屬化合物之具體例,可列舉:環烷酸鋅、環烷酸鈷、辛酸錫、辛酸鈷、雙乙醯丙酮鈷(II)及三乙醯丙酮鈷(III)等。 Examples of the organometallic compound include an alkali metal compound and an alkaline earth metal compound. Specific examples of the organometallic compound include zinc naphthenate, cobalt naphthenate, tin octylate, cobalt octoate, cobalt(II) diacetate, and cobalt (III) triacetate.
就進一步提高上述硬化性組合物之硬化性,進而進一步提高成形體之耐熱性之觀點而言,上述硬化促進劑(E)較佳為脲化合物、鎓鹽化合物或磷化合物。上述硬化促進劑(E)較佳為脲化合物,亦較佳 為鎓鹽化合物,亦較佳為磷化合物。 The curing accelerator (E) is preferably a urea compound, a phosphonium salt compound or a phosphorus compound from the viewpoint of further improving the curability of the curable composition and further improving the heat resistance of the molded article. The above hardening accelerator (E) is preferably a urea compound, and is also preferably The phosphonium salt compound is also preferably a phosphorus compound.
上述環氧化合物(A)與上述硬化促進劑(E)之調配比率並無特別限定。相對於上述環氧化合物(A)100重量份,上述硬化促進劑(E)之含量較佳為0.01重量份以上,更佳為0.1重量份以上,且較佳為100重量份以下,更佳為10重量份以下,進而較佳為5重量份以下。 The compounding ratio of the epoxy compound (A) and the hardening accelerator (E) is not particularly limited. The content of the curing accelerator (E) is preferably 0.01 parts by weight or more, more preferably 0.1 parts by weight or more, and still more preferably 100 parts by weight or less, more preferably 100 parts by weight of the epoxy compound (A). It is 10 parts by weight or less, and more preferably 5 parts by weight or less.
(脫模劑(F)) (release agent (F))
上述光半導體裝置用白色硬化性組合物含有上述脫模劑(F)或不含上述脫模劑(F)。其中,就進一步提高連續成形性之觀點而言,上述光半導體裝置用白色硬化性組合物亦可含有上述脫模劑(F)。上述脫模劑(F)可僅使用1種,亦可併用2種以上。 The white curable composition for an optical semiconductor device contains the above-mentioned release agent (F) or does not contain the above-mentioned release agent (F). In the above, the white curable composition for an optical semiconductor device may further contain the above-mentioned release agent (F) from the viewpoint of further improving the continuous moldability. The above-mentioned release agent (F) may be used alone or in combination of two or more.
上述脫模劑(F)並無特別限定。可使用先前公知之脫模劑作為上述脫模劑(F)。作為上述脫模劑(F),可列舉:脂肪酸酯系蠟、氧化或非氧化聚烯烴系蠟、石蠟系蠟、巴西棕櫚蠟及聚矽氧化合物等。作為上述聚矽氧化合物,可列舉聚矽氧油及改性聚矽氧油等。 The release agent (F) is not particularly limited. A previously known release agent can be used as the above-mentioned release agent (F). Examples of the release agent (F) include a fatty acid ester wax, an oxidized or non-oxidized polyolefin wax, a paraffin wax, a carnauba wax, and a polyoxyxide compound. Examples of the polyfluorene oxide compound include polydecane oxide oil and modified polyoxyxylene oil.
上述光半導體裝置用白色硬化性組合物100重量%中,上述脫模劑(F)之含量為0重量%(未含有)以上,較佳為0.05重量%以上,更佳為0.1重量%以上,且較佳為5重量%以下,更佳為3重量%以下。上述光半導體裝置用白色硬化性組合物亦可不含上述脫模劑(F)。若上述脫模劑(F)之含量為上述下限以上,則連續成形性進一步提高。若上述脫模劑(F)之含量為上述上限以下,則密接對象物與成形體之密接性進一步提高。 In 100% by weight of the white curable composition for an optical semiconductor device, the content of the release agent (F) is 0% by weight or less, preferably 0.05% by weight or more, and more preferably 0.1% by weight or more. It is preferably 5% by weight or less, more preferably 3% by weight or less. The white curable composition for an optical semiconductor device may not contain the above-mentioned release agent (F). When the content of the release agent (F) is at least the above lower limit, the continuous moldability is further improved. When the content of the release agent (F) is at most the above upper limit, the adhesion between the object to be bonded and the molded article is further improved.
就進一步提高密接對象物與成形體之密接性之觀點而言,上述光半導體裝置用白色硬化性組合物尤佳為不含上述脫模劑(F),或者含有上述脫模劑(F)且上述光半導體裝置用白色硬化性組合物100重量%中之上述脫模劑(F)之含量為2重量%以下。 In view of further improving the adhesion between the object to be bonded and the molded article, the white curable composition for an optical semiconductor device preferably contains the release agent (F) or the release agent (F). The content of the above-mentioned release agent (F) in 100% by weight of the white curable composition for an optical semiconductor device is 2% by weight or less.
(其他成分) (other ingredients)
上述光半導體裝置用白色硬化性組合物視需要亦可含有偶合劑、抗氧化劑、樹脂改質劑、著色劑、稀釋劑、表面處理劑、阻燃劑、黏度調節劑、分散劑、分散助劑、表面改質劑、塑化劑、抗菌劑、防黴劑、調平劑、穩定劑、防垂流劑或螢光體等。上述稀釋劑可為反應性稀釋劑,亦可為非反應性稀釋劑。 The white curable composition for the optical semiconductor device may optionally contain a coupling agent, an antioxidant, a resin modifier, a colorant, a diluent, a surface treatment agent, a flame retardant, a viscosity modifier, a dispersant, and a dispersion aid. , surface modifiers, plasticizers, antibacterial agents, anti-fungal agents, leveling agents, stabilizers, anti-sagging agents or phosphors. The diluent may be a reactive diluent or a non-reactive diluent.
作為上述偶合劑,並無特別限定,可列舉矽烷偶合劑及鈦酸酯系偶合劑等。 The coupling agent is not particularly limited, and examples thereof include a decane coupling agent and a titanate coupling agent.
作為上述抗氧化劑,並無特別限定,可列舉:酚系抗氧化劑、磷系抗氧化劑及胺系抗氧化劑等。 The antioxidant is not particularly limited, and examples thereof include a phenol antioxidant, a phosphorus antioxidant, and an amine antioxidant.
作為上述著色劑,並無特別限定,可列舉:酞菁、偶氮化合物、雙偶氮化合物、喹吖啶酮、蒽醌、黃士酮、芘、苝、二、縮合偶氮化合物、甲亞胺化合物、紅外線吸收材及紫外線吸收劑等各種有機系色素、以及硫酸鉛、鉻黃、鋅黃、鉻紅、紅丹、鈷紫、鐵藍、群青、碳黑、鉻綠、氧化鉻及鈷綠等無機顏料等。 The coloring agent is not particularly limited, and examples thereof include a phthalocyanine, an azo compound, a disazo compound, a quinacridone, an anthracene, a yellow ketone, an anthracene, an anthracene, and a Various organic pigments such as condensed azo compounds, azoimine compounds, infrared absorbing materials, and ultraviolet absorbers, and lead sulfate, chrome yellow, zinc yellow, chrome red, red dan, cobalt violet, iron blue, ultramarine blue, carbon black Inorganic pigments such as chrome green, chromium oxide and cobalt green.
(光半導體裝置用白色硬化性組合物之其他詳細情況、光半導體裝置用白色錠狀物之其他詳細情況及光半導體裝置用成形體) (Other details of the white curable composition for an optical semiconductor device, other details of a white ingot for an optical semiconductor device, and a molded article for an optical semiconductor device)
上述光半導體裝置用白色硬化性組合物之藉由示差掃描熱量測定而求出之玻璃轉移點較佳為-20℃以上,更佳為0℃以上,且較佳為50℃以下,更佳為40℃以下。若上述玻璃轉移點為上述下限以上,則錠狀物之強度進一步提高,錠狀物更不易產生殘缺。若上述玻璃轉移點為上述上限以下,則更不易產生成形不良,尤其更不易產生轉移成形時之成形不良。 The glass transition point determined by the differential scanning calorimetry of the white curable composition for an optical semiconductor device is preferably -20 ° C or higher, more preferably 0 ° C or higher, and is preferably 50 ° C or lower, more preferably Below 40 °C. When the glass transition point is at least the above lower limit, the strength of the ingot is further increased, and the ingot is less likely to be defective. When the glass transition point is at most the above upper limit, molding failure is less likely to occur, and in particular, molding failure during transfer molding is less likely to occur.
於上述示差掃描熱量測定中,於自23℃起以降溫速度10℃/min冷卻至-100℃後、以升溫速度10℃/min加熱至200℃之條件下進行測定。於上述示差掃描熱量測定中,例如可使用精工電子奈米科技公司製造之「EXSTAR DSC7020」等。 In the above-described differential scanning calorimetry, the measurement was carried out under the conditions of cooling to -100 ° C at a temperature drop rate of 10 ° C/min from 23 ° C and heating to 200 ° C at a temperature increase rate of 10 ° C / min. In the above-described differential scanning calorimetry, for example, "EXSTAR DSC7020" manufactured by Seiko Instruments Inc. can be used.
上述光半導體裝置用白色錠狀物係用於獲得於光半導體裝置中配置於光半導體元件之側方的具有框部之成形體。上述光半導體裝置用白色錠狀物較佳為用於使用模具而獲得成形體。上述光半導體裝置用白色錠狀物較佳為用於獲得於光半導體裝置中配置於光半導體元件之側方的具有框部、且以於由該框部之內面所包圍之區域內密封上述光半導體元件之方式填充密封劑而使用之成形體。上述光半導體裝置用白色錠狀物較佳為用於獲得具有將由光半導體元件發出之光提取至外部之開口的成形體。 The white ingot for the optical semiconductor device is used to obtain a molded body having a frame portion disposed on the side of the optical semiconductor device in the optical semiconductor device. The white ingot for the optical semiconductor device is preferably used for obtaining a molded body using a mold. The white ingot for the optical semiconductor device is preferably provided with a frame portion disposed on the side of the optical semiconductor device in the optical semiconductor device, and sealed in the region surrounded by the inner surface of the frame portion. A molded body used for filling a sealant as an optical semiconductor element. The white ingot for the optical semiconductor device is preferably used for obtaining a molded body having an opening for extracting light emitted from the optical semiconductor element to the outside.
上述光半導體裝置用白色錠狀物較佳為用於獲得於光半導體裝置中配置於搭載有光半導體元件之引線框架上之成形體的錠狀物。上述引線框架例如為用以支持且固定光半導體元件、並實現光半導體元件之電極與外部配線之電性連接的零件。上述成形體為光半導體裝置用成形體,較佳為光半導體元件搭載用基板。 The white ingot for the optical semiconductor device is preferably a spindle for obtaining a molded body disposed on a lead frame on which the optical semiconductor element is mounted in the optical semiconductor device. The lead frame is, for example, a member for supporting and fixing the optical semiconductor element and electrically connecting the electrode of the optical semiconductor element to the external wiring. The molded body is a molded body for an optical semiconductor device, and is preferably a substrate for mounting an optical semiconductor element.
因可獲得光之反射率較高之成形體,故上述光半導體裝置用白色錠狀物較佳為用於獲得於光半導體裝置中配置於搭載有光半導體元件之引線框架上且上述光半導體元件之側方、且具有將由上述光半導體元件發出之光加以反射之光反射部的成形體者。 The white ingot for the optical semiconductor device is preferably used for obtaining the optical semiconductor device on the lead frame on which the optical semiconductor element is mounted, and the optical semiconductor element is obtained. A molded body having a light reflecting portion that reflects light emitted from the optical semiconductor element on the side.
因可獲得光之反射率較高之成形體,故上述光半導體裝置用白色錠狀物較佳為用於獲得於光半導體裝置中配置於搭載有光半導體元件之引線框架上且以包圍上述光半導體元件之方式配置、且於內面具有將由上述光半導體元件發出之光加以反射之光反射部的成形體者。上述成形體較佳為具有包圍上述光半導體元件之框部,且較佳為包圍上述光半導體元件之外壁構件。上述成形體較佳為框狀構件。再者,上述成形體較佳為與光半導體裝置中用以將光半導體元件進行接合(黏晶)之黏晶材不同。上述成形體較佳為不含上述黏晶材。 In order to obtain a molded body having a high reflectance of light, the white ingot for an optical semiconductor device is preferably used in an optical semiconductor device to be disposed on a lead frame on which an optical semiconductor element is mounted to surround the light. The semiconductor element is disposed so as to have a molded body having a light reflecting portion that reflects light emitted from the optical semiconductor element on the inner surface. Preferably, the molded body has a frame portion surrounding the optical semiconductor element, and preferably surrounds the optical semiconductor element outer wall member. The formed body is preferably a frame-shaped member. Further, it is preferable that the molded body is different from the adhesive crystal material for bonding (bonding) the optical semiconductor element in the optical semiconductor device. Preferably, the formed body does not contain the above-mentioned adhesive crystal.
上述光半導體裝置用白色錠狀物較佳為用於在獲得複數個成形 體連結而成之分割前成形體後,將該分割前成形體分割而獲得各成形體。上述光半導體裝置用白色硬化性組合物較佳為用於在獲得複數個成形體經由引線框架連結而成之分割前成形體後,將上述引線框架切斷而將上述分割前成形體分割而獲得各成形體。 The white ingot for the above optical semiconductor device is preferably used for obtaining a plurality of shapes After the pre-divided molded body obtained by joining the bodies, the pre-divided molded body is divided to obtain each molded body. The white curable composition for an optical semiconductor device is preferably used for cutting a pre-divided molded body obtained by connecting a plurality of formed bodies through a lead frame, and then cutting the lead frame to obtain the pre-divided molded body. Each molded body.
上述光半導體裝置用白色硬化性組合物係藉由以下方式獲得:利用先前公知之方法,將環氧化合物(A)、硬化劑(B)(酸酐硬化劑)、白色顏料(C)、白色顏料以外之填充材(D)、及視需要調配之其他成分混合。作為製作上述硬化性組合物之通常方法,可列舉:藉由擠出機、捏合機、輥、擠壓機等將各成分混練後,將混練物冷卻並加以粉碎之方法。就提高分散性之觀點而言,各成分之混練較佳為於熔融狀態下進行。混練之條件係根據各成分之種類及調配量而適當決定。較佳為於15~150℃下進行5~100分鐘混練,更佳為於15~150℃下進行5~60分鐘,進而較佳為於5~150℃下進行5~40分鐘混練,尤佳為於20~100℃下進行10~30分鐘混練。 The white curable composition for an optical semiconductor device is obtained by using an epoxy compound (A), a hardener (B) (an acid anhydride hardener), a white pigment (C), and a white pigment by a conventionally known method. The filler (D) other than the filler and other ingredients to be blended as needed. As a general method of producing the curable composition, a method in which each component is kneaded by an extruder, a kneader, a roll, an extruder, or the like, and then the kneaded product is cooled and pulverized. From the viewpoint of improving dispersibility, the kneading of the respective components is preferably carried out in a molten state. The conditions of the kneading are appropriately determined depending on the types of the components and the amount of the ingredients. Preferably, the mixing is carried out at 15 to 150 ° C for 5 to 100 minutes, more preferably 5 to 60 minutes at 15 to 150 ° C, and preferably 5 to 40 minutes for mixing at 5 to 150 ° C, preferably For 10~30 minutes at 20~100 °C.
就使成形體之外觀進一步變良好之觀點而言,較佳為於獲得上述光半導體裝置用白色硬化性組合物時,於50℃~90℃下進行10分鐘~60分鐘加熱混練後,於超過30℃、未達50℃下進行24小時~240小時老化。藉由上述老化之溫度超過30℃,由老化引起之反應適當進行,錠狀物強度進一步提高,更不易產生錠狀物之殘缺。藉由上述老化之溫度未達50℃,環氧化合物與酸酐硬化劑之相溶性進一步變良好。 From the viewpoint of further improving the appearance of the molded article, it is preferred to perform heating and kneading at 50 ° C to 90 ° C for 10 minutes to 60 minutes when the white curable composition for an optical semiconductor device is obtained. Aging at 30 ° C, less than 50 ° C for 24 hours to 240 hours. When the temperature of the above aging exceeds 30 ° C, the reaction caused by aging proceeds appropriately, the strength of the ingot is further increased, and the defect of the ingot is less likely to occur. When the temperature of the above aging is less than 50 ° C, the compatibility between the epoxy compound and the acid anhydride hardener is further improved.
本發明之光半導體裝置用成形體係藉由將上述之上述光半導體裝置用白色錠狀物成形且使其硬化而獲得。又,光半導體裝置用白色錠狀物係使用上述光半導體裝置用白色硬化性組合物而形成。上述光半導體裝置用白色錠狀物係成形為特定之形狀。上述成形體較佳為用於在光半導體裝置中將由光半導體元件發出之光加以反射。 The molding system for an optical semiconductor device of the present invention is obtained by molding and curing the above-described optical semiconductor device with a white ingot. Further, the white semiconductor article for the optical semiconductor device is formed using the white curable composition for an optical semiconductor device. The optical semiconductor device is formed into a specific shape by a white ingot. The molded body is preferably used for reflecting light emitted from an optical semiconductor element in an optical semiconductor device.
作為使用上述光半導體裝置用白色錠狀物而獲得上述光半導體裝置用成形體之方法,可列舉:壓縮成形法、轉移成形法、積層成形法、射出成形法、擠出成形法及吹塑成形法等。其中,較佳為轉移成形法。上述光半導體裝置用白色錠狀物較佳用以藉由轉移成形而獲得上述成形體。 Examples of the method for obtaining the molded article for an optical semiconductor device using the white ingot for the optical semiconductor device include a compression molding method, a transfer molding method, a laminate molding method, an injection molding method, an extrusion molding method, and a blow molding method. Law and so on. Among them, a transfer molding method is preferred. The white ingot for the above optical semiconductor device is preferably used to obtain the above-mentioned molded body by transfer molding.
於轉移成形法中,例如於成形溫度100~200℃、成形壓力5~20MPa及成形時間60~300秒之條件下,將上述光半導體裝置用白色錠狀物進行轉移成形,藉此獲得成形體。 In the transfer molding method, for example, at a molding temperature of 100 to 200 ° C, a molding pressure of 5 to 20 MPa, and a molding time of 60 to 300 seconds, the optical semiconductor device is subjected to transfer molding with a white ingot to obtain a molded body. .
(光半導體裝置之詳細情況及光半導體裝置之實施形態) (Details of Optical Semiconductor Device and Embodiment of Optical Semiconductor Device)
本發明之光半導體裝置具備:引線框架、搭載於該引線框架上之光半導體元件、及配置於上述引線框架上且配置於上述光半導體元件之側方的具有框部之成形體。上述光半導體裝置之上述成形體係藉由將上述光半導體裝置用白色錠狀物成形且使其硬化而獲得。上述光半導體裝置用白色錠狀物係使用上述光半導體裝置用白色硬化性組合物而形成。 An optical semiconductor device according to the present invention includes a lead frame, an optical semiconductor element mounted on the lead frame, and a molded body having a frame portion disposed on the lead frame and disposed on a side of the optical semiconductor element. The above-described molding system of the above-described optical semiconductor device is obtained by molding and curing the above-described optical semiconductor device with a white ingot. The white ingot for the optical semiconductor device is formed using the white curable composition for an optical semiconductor device.
於本發明之光半導體裝置中,較佳為上述成形體之內面為將由上述光半導體元件發出之光加以反射之光反射部。 In the optical semiconductor device of the present invention, it is preferable that an inner surface of the molded body is a light reflecting portion that reflects light emitted from the optical semiconductor element.
於圖1(a)及(b)中,以剖面圖及立體圖示意性地表示本發明之一實施形態之光半導體裝置之一例。 In Figs. 1(a) and 1(b), an example of an optical semiconductor device according to an embodiment of the present invention is schematically shown in a cross-sectional view and a perspective view.
本實施形態之光半導體裝置1具有引線框架2、光半導體元件3、第1成形體4及第2成形體5。光半導體元件3較佳為發光二極體(LED)。第1成形體4與第2成形體5並非一體地形成,為不同之2個構件。第1成形體4與第2成形體5亦可一體地形成。第1成形體4為框部。第2成形體5為底部。於光半導體裝置1中,成形體具有框部(第1成形體4)、及底部(第2成形體5)。作為第1成形體4之框部為外壁部。作為第1成形體4之框部為環狀。 The optical semiconductor device 1 of the present embodiment includes a lead frame 2, an optical semiconductor element 3, a first molded body 4, and a second molded body 5. The optical semiconductor element 3 is preferably a light emitting diode (LED). The first molded body 4 and the second molded body 5 are not integrally formed, and are two different members. The first molded body 4 and the second molded body 5 may be integrally formed. The first molded body 4 is a frame portion. The second molded body 5 is a bottom portion. In the optical semiconductor device 1, the molded body has a frame portion (first molded body 4) and a bottom portion (second molded body 5). The frame portion of the first molded body 4 is an outer wall portion. The frame portion of the first molded body 4 is annular.
再者,成形體亦可為不具有底部之成形體。亦可將藉由將上述錠狀物成形且使其硬化而獲得之具有框部之成形體、與其他底構件進行組合而使用。上述成形體亦可為僅框部之框狀之成形體。上述底構件亦可為成形體。 Further, the molded body may be a molded body having no bottom portion. A molded body having a frame portion obtained by molding and hardening the above-mentioned ingot may be used in combination with other bottom members. The molded body may be a frame-shaped molded body of only the frame portion. The bottom member may also be a formed body.
於引線框架2上搭載且配置有光半導體元件3。又,於引線框架2上配置有第1成形體4(框部)。又,於複數個引線框架2之間與引線框架2之下方,配置有第2成形體5(底部)。再者,亦可於引線框架之下方不配置成形體或底構件而引線框架露出。於第1成形體4之內側配置有光半導體元件3。於光半導體元件3之側方配置有第1成形體4,且以包圍光半導體元件3之方式配置第1成形體4。第1、第2成形體4、5(具有框部及底部之成形體)係上述之光半導體裝置用白色硬化性組合物之硬化物,且係藉由將上述光半導體裝置用白色錠狀物成形且使其硬化而獲得。因此,第1成形體4具有光反射性,於內面4a具有光反射部。即,第1成形體4之內面4a為光反射部。因此,光半導體元件3之周圍係由第1成形體4之具有光反射性之內面4a所包圍。亦可僅使第1成形體4為上述光半導體裝置用白色硬化性組合物之硬化物,亦可藉由將上述光半導體裝置用白色錠狀物成形且使其硬化而獲得。 The optical semiconductor element 3 is mounted on the lead frame 2 and disposed. Moreover, the first molded body 4 (frame portion) is disposed on the lead frame 2. Further, a second molded body 5 (bottom portion) is disposed between the plurality of lead frames 2 and below the lead frame 2. Further, the molded body or the bottom member may not be disposed under the lead frame, and the lead frame may be exposed. The optical semiconductor element 3 is disposed inside the first molded body 4. The first molded body 4 is disposed on the side of the optical semiconductor element 3, and the first molded body 4 is disposed to surround the optical semiconductor element 3. The first and second molded bodies 4 and 5 (the molded body having the frame portion and the bottom portion) are cured products of the white curable composition for an optical semiconductor device described above, and the white semiconductor article is used for the optical semiconductor device. It is obtained by forming and hardening it. Therefore, the first molded body 4 has light reflectivity and has a light reflecting portion on the inner surface 4a. That is, the inner surface 4a of the first molded body 4 is a light reflecting portion. Therefore, the periphery of the optical semiconductor element 3 is surrounded by the light-reflecting inner surface 4a of the first molded body 4. The first molded body 4 may be a cured product of the white curable composition for an optical semiconductor device, or may be obtained by molding and curing the optical semiconductor device in a white ingot.
第1成形體4(框部)具有將由光半導體元件3發出之光提取至外部之開口。第1、第2成形體4、5係白色。第1成形體4之內面4a係以內面4a之直徑向開口端逐漸變大之方式形成。因此,由光半導體元件3發出之光中,到達內面4a之箭頭B所示之光經內面4a反射,向光半導體元件3之前方側行進。 The first molded body 4 (frame portion) has an opening for extracting light emitted from the optical semiconductor element 3 to the outside. The first and second molded bodies 4 and 5 are white. The inner surface 4a of the first molded body 4 is formed such that the diameter of the inner surface 4a gradually increases toward the open end. Therefore, among the light emitted from the optical semiconductor element 3, the light indicated by the arrow B reaching the inner surface 4a is reflected by the inner surface 4a, and travels to the front side of the optical semiconductor element 3.
光半導體元件3係使用黏晶材6連接於引線框架2上。黏晶材6具有導電性。設置於光半導體元件3上之接合墊(未圖示)與引線框架2係藉由接合線(bonding wire)7而電性連接。以密封光半導體元件3及接合線7之方式,將密封劑8填充至由第1成形體4之內面4a所包圍之區域 內。 The optical semiconductor element 3 is connected to the lead frame 2 using a die bonding material 6. The cement material 6 has electrical conductivity. A bonding pad (not shown) provided on the optical semiconductor element 3 and the lead frame 2 are electrically connected by a bonding wire 7. The sealing agent 8 is filled in a region surrounded by the inner surface 4a of the first molded body 4 so as to seal the optical semiconductor element 3 and the bonding wires 7. Inside.
於光半導體裝置1中,若驅動光半導體元件3,則如虛線A所示般發出光。於光半導體裝置1中,不僅存在自光半導體元件3向與引線框架2之上表面相反之側即上方照射之光,亦存在到達第1成形體4之內面4a之光如箭頭B所示般被反射之光。因此,自光半導體裝置1中提取之光之亮度較明亮。 In the optical semiconductor device 1, when the optical semiconductor element 3 is driven, light is emitted as indicated by a broken line A. In the optical semiconductor device 1, not only light that is irradiated from the optical semiconductor element 3 to the upper side opposite to the upper surface of the lead frame 2 but also light that reaches the inner surface 4a of the first molded body 4 is present as indicated by an arrow B. The light that is reflected. Therefore, the brightness of the light extracted from the optical semiconductor device 1 is brighter.
於圖2中示出圖1所示之光半導體裝置1之變化例。於圖1所示之光半導體裝置1與圖2所示之光半導體裝置21中,僅利用黏晶材6、22及接合線7、23之電性連接構造不同。光半導體裝置1中之黏晶材6具有導電性。相對於此,光半導體裝置21具有黏晶材22,黏晶材22不具有導電性。於光半導體裝置1中,設置於光半導體元件3上之接合墊(未圖示)與引線框架2(圖1(a)中位於右側之引線框架)係藉由接合線7而電性連接。光半導體裝置21除了具有接合線7外,亦具有接合線23。於光半導體裝置21中,設置於光半導體元件3上之接合墊(未圖示)與引線框架2(圖2中位於右側之引線框架)係藉由接合線7而電性連接,進而設置於光半導體元件3上之接合墊(未圖示)與引線框架2(圖2中位於左側之引線框架)係藉由接合線23而電性連接。 A variation of the optical semiconductor device 1 shown in Fig. 1 is shown in Fig. 2 . In the optical semiconductor device 1 shown in FIG. 1 and the optical semiconductor device 21 shown in FIG. 2, the electrical connection structures of only the adhesive crystals 6, 22 and the bonding wires 7 and 23 are different. The die bonding material 6 in the optical semiconductor device 1 has electrical conductivity. On the other hand, the optical semiconductor device 21 has the die bond 22, and the die bond 22 does not have conductivity. In the optical semiconductor device 1, a bonding pad (not shown) provided on the optical semiconductor element 3 and the lead frame 2 (the lead frame located on the right side in FIG. 1(a)) are electrically connected by a bonding wire 7. The optical semiconductor device 21 has a bonding wire 23 in addition to the bonding wires 7. In the optical semiconductor device 21, a bonding pad (not shown) provided on the optical semiconductor element 3 and the lead frame 2 (the lead frame located on the right side in FIG. 2) are electrically connected by a bonding wire 7, and are further provided on A bonding pad (not shown) on the optical semiconductor element 3 and the lead frame 2 (the lead frame on the left side in FIG. 2) are electrically connected by a bonding wire 23.
於圖3中示出圖2所示之光半導體裝置21之變化例。圖3所示之光半導體裝置31亦為圖1所示之光半導體裝置1之變化例。於圖2所示之光半導體裝置21、與圖3所示之光半導體裝置31中,僅第1、第2成形體4、5及成形體32之構造不同。於光半導體裝置21中,使用第1、第2成形體4、5,且第1成形體4係配置於引線框架2上,第2成形體5係配置於複數個引線框架2之間與引線框架2之下方。相對於此,於光半導體裝置31中,使用1個成形體32。成形體32具有配置於引線框架2上之框部32a、與配置於複數個引線框架2之間之填充部32b。框部32a與填充部32b係一體地形成。如上所述,光半導體裝置只要具有於光半導 體裝置中配置於光半導體元件之側方的框部即可。亦可不於引線框架之下方配置成形體。成形體亦可不具有配置於引線框架之下方之底部。引線框架之背面亦可露出。 A variation of the optical semiconductor device 21 shown in Fig. 2 is shown in Fig. 3. The optical semiconductor device 31 shown in FIG. 3 is also a modification of the optical semiconductor device 1 shown in FIG. 1. In the optical semiconductor device 21 shown in FIG. 2 and the optical semiconductor device 31 shown in FIG. 3, only the structures of the first and second molded bodies 4 and 5 and the molded body 32 are different. In the optical semiconductor device 21, the first and second molded bodies 4 and 5 are used, and the first molded body 4 is disposed on the lead frame 2, and the second molded body 5 is disposed between the plurality of lead frames 2 and the leads. Below the frame 2. On the other hand, in the optical semiconductor device 31, one molded body 32 is used. The molded body 32 has a frame portion 32a disposed on the lead frame 2 and a filling portion 32b disposed between the plurality of lead frames 2. The frame portion 32a is integrally formed with the filling portion 32b. As described above, the optical semiconductor device only has to be semi-conductive to light The frame portion disposed on the side of the optical semiconductor element in the body device may be used. The formed body may not be disposed below the lead frame. The formed body may not have a bottom portion disposed below the lead frame. The back side of the lead frame can also be exposed.
再者,圖1~3所示之構造僅為本發明之光半導體裝置之一例,成形體之構造及光半導體元件之封裝構造等可適當變化。 In addition, the structure shown in FIGS. 1 to 3 is only an example of the optical semiconductor device of the present invention, and the structure of the molded body and the package structure of the optical semiconductor element can be appropriately changed.
又,亦可準備如圖4所示般複數個光半導體裝置用零件連結而成之分割前光半導體裝置用零件11,將分割前光半導體裝置用零件11於虛線X所示之部分切斷,獲得各光半導體裝置用零件。分割前光半導體裝置用零件11具有分割前引線框架2A、分割前第1成形體4A、及分割前第2成形體5A。亦可於獲得各光半導體裝置用零件後,搭載光半導體元件3,藉由密封劑8將該光半導體元件3進行密封,獲得光半導體裝置1。若將分割前引線框架2A於虛線X所示之部分切斷,則獲得引線框架2。若將分割前第1成形體4A於虛線X所示之部分切斷,則獲得第1成形體4。若將分割前第2成形體5A於虛線X所示之部分切斷,則獲得第2成形體5。 In addition, as for the pre-divided optical semiconductor device component 11 in which a plurality of optical semiconductor device components are connected as shown in FIG. 4, the component 11 for pre-divided optical semiconductor device is cut off at a portion indicated by a broken line X. Parts for each optical semiconductor device are obtained. The pre-divided optical semiconductor device component 11 includes a pre-divided lead frame 2A, a pre-divided first molded body 4A, and a pre-divided second molded body 5A. After the components for the optical semiconductor device are obtained, the optical semiconductor device 3 is mounted, and the optical semiconductor device 3 is sealed by the sealant 8 to obtain the optical semiconductor device 1. When the portion of the lead frame 2A before division is cut at a portion indicated by a broken line X, the lead frame 2 is obtained. When the first molded body 4A before the division is cut at a portion indicated by a broken line X, the first molded body 4 is obtained. When the second molded body 5A before the division is cut at a portion indicated by a broken line X, the second molded body 5 is obtained.
進而,亦可準備如圖5所示般複數個分割前光半導體裝置連結而成之分割前光半導體裝置12,將分割前光半導體裝置12於虛線X所示之部分切斷,獲得各光半導體裝置。分割前光半導體裝置12具有分割前引線框架2A、分割前第1成形體4A、及分割前第2成形體5A。又,與圖1~3所示之光半導體裝置1、21、31同樣地,於分割前光半導體裝置12中,於分割前引線框架2A上搭載且配置有光半導體元件3。再者,於圖4、5中,於分割前光半導體裝置用零件及分割前光半導體裝置中,複數個成形體連結而形成分割前成形體,但亦可將複數個成形體未連結之分割前光半導體裝置用零件及分割前光半導體裝置分割,獲得光半導體裝置用零件及光半導體裝置。 Further, a pre-divided optical semiconductor device 12 in which a plurality of pre-divided optical semiconductor devices are connected as shown in FIG. 5 can be prepared, and the pre-divided optical semiconductor device 12 can be cut at a portion indicated by a broken line X to obtain each optical semiconductor. Device. The pre-divided optical semiconductor device 12 includes a pre-divided lead frame 2A, a pre-divided first molded body 4A, and a pre-divided second molded body 5A. In the pre-divided optical semiconductor device 12, the optical semiconductor device 3 is mounted on the pre-divided lead frame 2A and disposed in the same manner as the optical semiconductor devices 1, 21, and 31 shown in FIGS. Further, in FIGS. 4 and 5, in the pre-divided optical semiconductor device component and the pre-divided optical semiconductor device, a plurality of molded bodies are connected to each other to form a pre-divided molded body, but a plurality of formed bodies may be unjoined. The components for the front-end semiconductor device and the pre-divided optical semiconductor device are divided to obtain components for the optical semiconductor device and the optical semiconductor device.
以下,列舉本發明之具體之實施例及比較例,藉此表明本發 明。本發明並不限定於以下之實施例。 Hereinafter, specific embodiments and comparative examples of the present invention will be enumerated, thereby showing the present invention. Bright. The invention is not limited to the following examples.
於實施例及比較例中,使用以下材料。 In the examples and comparative examples, the following materials were used.
(環氧化合物(A)) (epoxy compound (A))
1)EHPE3150(具有脂環式骨架之環氧樹脂,Daicel公司製造,環氧當量177) 1) EHPE3150 (epoxy resin with alicyclic skeleton, manufactured by Daicel, epoxy equivalent 177)
2)TEPIC-S(異氰尿酸三縮水甘油酯,日產化學公司製造,環氧當量100) 2) TEPIC-S (triglycidyl isocyanurate, manufactured by Nissan Chemical Co., Ltd., epoxy equivalent 100)
(硬化劑(B)) (hardener (B))
1)RIKACID MH(4-甲基六氫鄰苯二甲酸酐,新日本理化公司製造,熔點-30℃) 1) RIKACID MH (4-methylhexahydrophthalic anhydride, manufactured by Nippon Chemical and Chemical Co., Ltd., melting point -30 ° C)
2)RIKACID HH(六氫鄰苯二甲酸酐,新日本理化公司製造,熔點33℃) 2) RIKACID HH (hexahydrophthalic anhydride, manufactured by Nippon Chemical and Chemical Co., Ltd., melting point 33 ° C)
(白色顏料(C)) (white pigment (C))
1)CR-58(氧化鈦,金紅石型,藉由Al進行表面處理,平均粒徑0.25μm,石原產業公司製造) 1) CR-58 (titanium oxide, rutile type, surface treatment by Al, average particle size 0.25 μm, manufactured by Ishihara Sangyo Co., Ltd.)
2)UT771(氧化鈦,金紅石型,藉由Al、Zr進行表面處理,平均粒徑0.25μm,經有機物處理,石原產業公司製造) 2) UT771 (titanium oxide, rutile type, surface treated by Al, Zr, average particle size 0.25 μm, treated with organic matter, manufactured by Ishihara Sangyo Co., Ltd.)
3)氧化鋅I種(平均粒徑1μm,堺化學工業公司製造) 3) One type of zinc oxide (average particle size 1 μm, manufactured by 堺Chemical Industries Co., Ltd.)
4)UEP(氧化鋯,平均粒徑0.5μm,第一稀元素化學工業公司製造) 4) UEP (zirconia, average particle size 0.5 μm, manufactured by First Rare Element Chemical Industry Co., Ltd.)
(填充材(D)) (filler (D))
1)MSR-3512(球狀二氧化矽,平均粒徑30μm,龍森公司製造) 1) MSR-3512 (spherical cerium oxide, average particle size 30 μm, manufactured by Ronson Corporation)
2)AA(破碎二氧化矽,平均粒徑6μm,龍森公司製造) 2) AA (broken cerium oxide, average particle size 6 μm, manufactured by Ronson Corporation)
3)B-55(作為破碎填充材之硫酸鋇,平均粒徑1.2μm,堺化學工業公司製造) 3) B-55 (barium sulfate as a crushing filler, an average particle diameter of 1.2 μm, manufactured by Nippon Chemical Industry Co., Ltd.)
(硬化促進劑(E)) (hardening accelerator (E))
1)SA102(DBU-辛酸鹽,SAN-APRO公司製造) 1) SA102 (DBU-octanoate, manufactured by SAN-APRO)
2)PX-4ET(o,o-二乙基二硫代磷酸酯四正丁基鏻,日本化學工業公司製造) 2) PX-4ET (o, o-diethyl dithiophosphate tetra-n-butyl fluorene, manufactured by Nippon Chemical Industry Co., Ltd.)
3)PX-4PB(四苯基硼酸四丁基鏻,日本化學工業公司製造) 3) PX-4PB (tetrabutylphosphonium tetraphenylborate, manufactured by Nippon Chemical Industry Co., Ltd.)
4)C11Z-CN(1-氰基乙基-2-十一烷基咪唑,四國化成工業公司製造) 4) C11Z-CN (1-cyanoethyl-2-undecylimidazole, manufactured by Shikoku Chemical Industry Co., Ltd.)
(脫模劑(F)) (release agent (F))
1)Seridasuto 3715(聚乙烯蠟,Clariant Japan公司製造) 1) Seridasuto 3715 (polyethylene wax, manufactured by Clariant Japan)
2)M-9676(硬脂酸硬脂酯,日油公司製造) 2) M-9676 (stearyl stearate, manufactured by Nippon Oil Co., Ltd.)
(實施例1~4、參考例5、實施例6~9及比較例1~4) (Examples 1 to 4, Reference Example 5, Examples 6 to 9 and Comparative Examples 1 to 4)
將下述表1所示之各成分以下述表1所示之調配量進行調配(調配單位為重量份),利用混合機(東洋精機製作所公司製造之「Laboplastomill R-60」),於表1所示之溫度及時間之條件(加熱混練步驟)下進行加熱混練後,於表1所示之溫度及時間之條件(老化步驟)下進行老化或不進行老化,將所獲得之硬化性組合物粉碎,獲得粉末狀之硬化性組合物。 The components shown in the following Table 1 were blended in the amounts shown in the following Table 1 (the blending unit is part by weight), and the mixture was used ("Laboplastomill R-60" manufactured by Toyo Seiki Seisakusho Co., Ltd.) in Table 1. After the temperature and time conditions (heating and kneading step) are shown as heating and kneading, the cured composition is obtained by aging or not aging under the conditions of temperature and time shown in Table 1 (aging step). It is pulverized to obtain a powdery curable composition.
繼而,使用由與樹脂之接觸面為超硬合金之杵模具與臼模具之一對模具構成的錠狀物製作用模具,於室溫(23℃)下,於錠狀物成型荷重3t(打錠壓)之條件下將所獲得之粉末狀之硬化性組合物成形,製作直徑13mm及高度30mm之圓柱狀之錠狀物。 Then, using a mold for making a mold composed of one of a 杵 mold and a 臼 mold which is a superhard alloy in contact with the resin, the mold is molded at a load of 3 t at room temperature (23 ° C). The obtained powdery curable composition was molded under the conditions of a tablet pressure to prepare a cylindrical ingot having a diameter of 13 mm and a height of 30 mm.
(測定) (measurement)
(1)光半導體裝置用白色硬化性組合物之玻璃轉移點 (1) Glass transfer point of white curable composition for optical semiconductor device
稱量所獲得之粉末狀之硬化性組合物50mg至鋁鍋中,進行示差掃描熱量測定(DSC)。為了進行上述DSC,使用精工電子奈米科技公司製造之「EXSTAR DSC7020」。關於測定條件為自室溫(23℃)起以降溫速度10℃/min冷卻至-100℃後、以升溫速度10℃/min加熱至200℃之 條件。 50 mg of the obtained powdery curable composition was weighed into an aluminum pan to carry out differential scanning calorimetry (DSC). In order to perform the above DSC, "EXSTAR DSC7020" manufactured by Seiko Instruments Inc. is used. The measurement conditions are from room temperature (23 ° C), after cooling to -100 ° C at a cooling rate of 10 ° C / min, and heating to 200 ° C at a temperature increase rate of 10 ° C / min. condition.
(2)光半導體裝置用白色錠狀物的壓縮彈性模量及壓縮強度 (2) Compressive elastic modulus and compressive strength of white ingots for optical semiconductor devices
使用所獲得之錠狀物,依據JIS(Japanese Industrial Standards,日本工業標準)K7181於23℃下測定壓縮彈性模量與壓縮強度。 Using the obtained ingot, the compressive elastic modulus and the compressive strength were measured at 23 ° C according to JIS (Japanese Industrial Standards) K7181.
(評價) (Evaluation)
(1)錠狀物磨損度(殘缺容易程度) (1) Degree of wear of the ingot (easyness of the defect)
測定10粒所獲得之錠狀物(試驗前之錠狀物)之重量後,將錠狀物放入至錠劑磨損度試驗機中,以每分鐘25轉之速度旋轉100次。取出旋轉結束後之錠狀物(試驗後之錠狀物),通過10目之篩,對去除了粉化之物體之重量進行測定。藉由下述式(X)計算磨損度(%)。 After measuring the weight of the obtained tablet (the spindle before the test), the ingot was placed in a tablet abrasion tester and rotated 100 times at a speed of 25 revolutions per minute. The ingot after the end of the rotation (the ingot after the test) was taken out, and the weight of the object to be removed was measured by a 10-mesh sieve. The degree of wear (%) was calculated by the following formula (X).
磨損度(%)={(試驗前之錠狀物之重量一試驗後之錠狀物之重量)/試驗前之錠狀物之重量}×100 式(X) Degree of wear (%) = {(weight of the ingot before the test - weight of the ingot after the test) / weight of the ingot before the test} × 100 Formula (X)
錠狀物之磨損度越低,錠狀物越不易殘缺,錠狀物之均勻性越變高。 The lower the degree of wear of the ingot, the less likely the ingot is to be broken, and the higher the uniformity of the ingot.
(2)成形性 (2) Formability
藉由蝕刻於銅原材料(TAMAC 194)上形成電路後,實施鍍銀,獲得引線框架(鍍銀表面,厚度0.2mm)。 After forming a circuit by etching on a copper material (TAMAC 194), silver plating was performed to obtain a lead frame (silver-plated surface, thickness 0.2 mm).
準備具有以縱15個×橫10個之矩陣狀配置之150個凹部(光半導體元件搭載部)之一次性成形用模具作為模具。模腔尺寸係設為每個4mm×2mm、深度1mm。使用模具清洗材(Nippon Carbide公司製造之「NIKALET RCC」)將上述模具清洗3次後,使用模具脫模恢復材(Nippon Carbide公司製造之「NIKALET ECR-C KU」)對模具賦予脫模性。 A disposable molding die having 150 concave portions (optical semiconductor element mounting portions) arranged in a matrix of 15 vertical × 10 horizontal rows was prepared as a mold. The cavity dimensions were set to 4 mm x 2 mm each and 1 mm depth. After the mold was cleaned three times using a mold cleaning material ("NIKALET RCC" manufactured by Nippon Carbide Co., Ltd.), mold release property ("NIKALET ECR-C KU" manufactured by Nippon Carbide Co., Ltd.) was used to impart mold release property to the mold.
使用經賦予了脫模性之模具進行所獲得之錠狀物之轉移成形,獲得光半導體裝置搭載用基板。目測檢查所獲得之光半導體裝置搭載用基板,按下述基準對成形性進行判定。 Transfer molding of the obtained ingot is carried out using a mold to which mold release property is applied, and a substrate for mounting an optical semiconductor device is obtained. The optical semiconductor device mounting substrate obtained by the inspection was visually inspected, and the moldability was determined according to the following criteria.
[成形性之判定基準] [Formation criteria for formability]
○:成形體不存在由填充不良引起之殘缺及接縫等外觀異常 ○: The molded body does not have any defects such as defects due to poor filling and seams.
×:成形體存在1個以上之由填充不良引起之殘缺及接縫等外觀異常 ×: One or more of the molded articles have defects such as defects due to filling failure and joints such as seams.
將結果示於下述之表1。 The results are shown in Table 1 below.
再者,於參考例5中,關於磨耗度及成形性,獲得了良好之結果,但參考例5與實施例1~4、6~9相比,因未使用異氰尿酸三縮水甘油酯,故錠狀物及成形體可見極輕微之著色。 Further, in Reference Example 5, good results were obtained with respect to the degree of wear and formability, but in Reference Example 5, compared with Examples 1 to 4 and 6 to 9, since triglycidyl isocyanurate was not used, Therefore, the ingot and the formed body can be seen with a slight coloration.
Claims (11)
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