TWI620797B - 高溫穩定性熱傳導材料 - Google Patents
高溫穩定性熱傳導材料 Download PDFInfo
- Publication number
- TWI620797B TWI620797B TW101102003A TW101102003A TWI620797B TW I620797 B TWI620797 B TW I620797B TW 101102003 A TW101102003 A TW 101102003A TW 101102003 A TW101102003 A TW 101102003A TW I620797 B TWI620797 B TW I620797B
- Authority
- TW
- Taiwan
- Prior art keywords
- composition
- component
- metal
- thermally conductive
- polysiloxane
- Prior art date
Links
- 239000004020 conductor Substances 0.000 title abstract description 3
- 239000000203 mixture Substances 0.000 claims abstract description 136
- -1 polysiloxane Polymers 0.000 claims abstract description 113
- 229920001296 polysiloxane Polymers 0.000 claims abstract description 38
- 239000011231 conductive filler Substances 0.000 claims abstract description 27
- 238000000034 method Methods 0.000 claims abstract description 23
- 238000006459 hydrosilylation reaction Methods 0.000 claims abstract description 15
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical compound N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 claims abstract description 14
- 239000000463 material Substances 0.000 claims description 29
- 229910052751 metal Inorganic materials 0.000 claims description 29
- 239000002184 metal Substances 0.000 claims description 29
- 125000000217 alkyl group Chemical group 0.000 claims description 18
- 125000000962 organic group Chemical group 0.000 claims description 17
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 claims description 14
- 229910052802 copper Inorganic materials 0.000 claims description 13
- 239000010949 copper Substances 0.000 claims description 13
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 12
- 239000000654 additive Substances 0.000 claims description 9
- 125000001931 aliphatic group Chemical group 0.000 claims description 9
- 125000003342 alkenyl group Chemical group 0.000 claims description 9
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 7
- 239000011787 zinc oxide Substances 0.000 claims description 7
- 230000000996 additive effect Effects 0.000 claims description 6
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical group Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 claims description 6
- 239000002923 metal particle Substances 0.000 claims description 6
- 229910052582 BN Inorganic materials 0.000 claims description 5
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 claims description 5
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims description 5
- 229920000049 Carbon (fiber) Polymers 0.000 claims description 4
- 239000004917 carbon fiber Substances 0.000 claims description 4
- 239000000395 magnesium oxide Substances 0.000 claims description 4
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 claims description 4
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 claims description 4
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 claims description 4
- FRWYFWZENXDZMU-UHFFFAOYSA-N 2-iodoquinoline Chemical compound C1=CC=CC2=NC(I)=CC=C21 FRWYFWZENXDZMU-UHFFFAOYSA-N 0.000 claims description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 3
- RREGISFBPQOLTM-UHFFFAOYSA-N alumane;trihydrate Chemical compound O.O.O.[AlH3] RREGISFBPQOLTM-UHFFFAOYSA-N 0.000 claims description 3
- 229910002113 barium titanate Inorganic materials 0.000 claims description 3
- JRPBQTZRNDNNOP-UHFFFAOYSA-N barium titanate Chemical compound [Ba+2].[Ba+2].[O-][Ti]([O-])([O-])[O-] JRPBQTZRNDNNOP-UHFFFAOYSA-N 0.000 claims description 3
- LTPBRCUWZOMYOC-UHFFFAOYSA-N beryllium oxide Inorganic materials O=[Be] LTPBRCUWZOMYOC-UHFFFAOYSA-N 0.000 claims description 3
- 238000006243 chemical reaction Methods 0.000 claims description 3
- 229910003460 diamond Inorganic materials 0.000 claims description 3
- 239000010432 diamond Substances 0.000 claims description 3
- 229910002804 graphite Inorganic materials 0.000 claims description 3
- 239000010439 graphite Substances 0.000 claims description 3
- VTHJTEIRLNZDEV-UHFFFAOYSA-L magnesium dihydroxide Chemical compound [OH-].[OH-].[Mg+2] VTHJTEIRLNZDEV-UHFFFAOYSA-L 0.000 claims description 3
- 239000000347 magnesium hydroxide Substances 0.000 claims description 3
- 229910001862 magnesium hydroxide Inorganic materials 0.000 claims description 3
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 claims description 3
- 229910010271 silicon carbide Inorganic materials 0.000 claims description 3
- UONOETXJSWQNOL-UHFFFAOYSA-N tungsten carbide Chemical compound [W+]#[C-] UONOETXJSWQNOL-UHFFFAOYSA-N 0.000 claims description 3
- 125000004429 atom Chemical group 0.000 claims description 2
- 238000005538 encapsulation Methods 0.000 claims 2
- 238000001879 gelation Methods 0.000 claims 2
- 239000007809 chemical reaction catalyst Substances 0.000 claims 1
- 239000000945 filler Substances 0.000 description 43
- 239000002245 particle Substances 0.000 description 26
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical group [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 14
- 125000003118 aryl group Chemical group 0.000 description 13
- 150000002430 hydrocarbons Chemical group 0.000 description 13
- 239000003795 chemical substances by application Substances 0.000 description 12
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 12
- 229920000642 polymer Polymers 0.000 description 12
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 11
- 239000003054 catalyst Substances 0.000 description 11
- 229920001577 copolymer Polymers 0.000 description 11
- 229920005989 resin Polymers 0.000 description 11
- 239000011347 resin Substances 0.000 description 11
- 239000010948 rhodium Substances 0.000 description 11
- 239000002253 acid Substances 0.000 description 10
- 229910052782 aluminium Inorganic materials 0.000 description 10
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 10
- 125000004432 carbon atom Chemical group C* 0.000 description 10
- 150000001875 compounds Chemical class 0.000 description 10
- 239000011159 matrix material Substances 0.000 description 10
- 238000002156 mixing Methods 0.000 description 10
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 10
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 9
- 125000006850 spacer group Chemical group 0.000 description 9
- 239000003381 stabilizer Substances 0.000 description 9
- 239000002318 adhesion promoter Substances 0.000 description 8
- 125000000524 functional group Chemical group 0.000 description 8
- 239000000126 substance Substances 0.000 description 8
- 229910045601 alloy Inorganic materials 0.000 description 7
- 239000000956 alloy Substances 0.000 description 7
- 230000004907 flux Effects 0.000 description 7
- 125000005023 xylyl group Chemical group 0.000 description 7
- 235000014692 zinc oxide Nutrition 0.000 description 7
- 125000003545 alkoxy group Chemical group 0.000 description 6
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 6
- 125000000753 cycloalkyl group Chemical group 0.000 description 6
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 6
- 235000013870 dimethyl polysiloxane Nutrition 0.000 description 6
- RBTKNAXYKSUFRK-UHFFFAOYSA-N heliogen blue Chemical compound [Cu].[N-]1C2=C(C=CC=C3)C3=C1N=C([N-]1)C3=CC=CC=C3C1=NC([N-]1)=C(C=CC=C3)C3=C1N=C([N-]1)C3=CC=CC=C3C1=N2 RBTKNAXYKSUFRK-UHFFFAOYSA-N 0.000 description 6
- 229910052739 hydrogen Inorganic materials 0.000 description 6
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 6
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 description 6
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 6
- 125000003944 tolyl group Chemical group 0.000 description 6
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 5
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 5
- 229910004298 SiO 2 Inorganic materials 0.000 description 5
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 5
- 239000004205 dimethyl polysiloxane Substances 0.000 description 5
- 239000000499 gel Substances 0.000 description 5
- 125000006038 hexenyl group Chemical group 0.000 description 5
- 239000001257 hydrogen Substances 0.000 description 5
- 239000004615 ingredient Substances 0.000 description 5
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 5
- 229910052697 platinum Inorganic materials 0.000 description 5
- 229910000077 silane Inorganic materials 0.000 description 5
- 229910052710 silicon Inorganic materials 0.000 description 5
- 239000010703 silicon Substances 0.000 description 5
- 125000004079 stearyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 5
- 239000004094 surface-active agent Substances 0.000 description 5
- 125000002948 undecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 5
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 5
- 229920002554 vinyl polymer Polymers 0.000 description 5
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 4
- SNRUBQQJIBEYMU-UHFFFAOYSA-N Dodecane Natural products CCCCCCCCCCCC SNRUBQQJIBEYMU-UHFFFAOYSA-N 0.000 description 4
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- 150000001336 alkenes Chemical class 0.000 description 4
- 125000004369 butenyl group Chemical group C(=CCC)* 0.000 description 4
- 229910052801 chlorine Inorganic materials 0.000 description 4
- 125000004122 cyclic group Chemical group 0.000 description 4
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 4
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 4
- 229920001971 elastomer Polymers 0.000 description 4
- 239000000806 elastomer Substances 0.000 description 4
- 125000005375 organosiloxane group Chemical group 0.000 description 4
- 239000000049 pigment Substances 0.000 description 4
- 239000004014 plasticizer Substances 0.000 description 4
- 150000003057 platinum Chemical class 0.000 description 4
- 230000003014 reinforcing effect Effects 0.000 description 4
- 229920006395 saturated elastomer Polymers 0.000 description 4
- 229920002379 silicone rubber Polymers 0.000 description 4
- 229910052709 silver Inorganic materials 0.000 description 4
- 125000000094 2-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 3
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 3
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 3
- 229910004283 SiO 4 Inorganic materials 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 3
- WYUIWUCVZCRTRH-UHFFFAOYSA-N [[[ethenyl(dimethyl)silyl]amino]-dimethylsilyl]ethene Chemical compound C=C[Si](C)(C)N[Si](C)(C)C=C WYUIWUCVZCRTRH-UHFFFAOYSA-N 0.000 description 3
- 239000000370 acceptor Substances 0.000 description 3
- 150000001412 amines Chemical class 0.000 description 3
- 239000001055 blue pigment Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 239000003431 cross linking reagent Substances 0.000 description 3
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 3
- 230000009975 flexible effect Effects 0.000 description 3
- 239000003112 inhibitor Substances 0.000 description 3
- 239000011256 inorganic filler Substances 0.000 description 3
- 229910003475 inorganic filler Inorganic materials 0.000 description 3
- 229910052740 iodine Inorganic materials 0.000 description 3
- 239000010410 layer Substances 0.000 description 3
- 150000001451 organic peroxides Chemical class 0.000 description 3
- 229920006136 organohydrogenpolysiloxane Polymers 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- 238000002360 preparation method Methods 0.000 description 3
- 230000002035 prolonged effect Effects 0.000 description 3
- 239000004332 silver Substances 0.000 description 3
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 3
- 238000012546 transfer Methods 0.000 description 3
- 229910052725 zinc Inorganic materials 0.000 description 3
- 239000011701 zinc Substances 0.000 description 3
- WRIDQFICGBMAFQ-UHFFFAOYSA-N (E)-8-Octadecenoic acid Natural products CCCCCCCCCC=CCCCCCCC(O)=O WRIDQFICGBMAFQ-UHFFFAOYSA-N 0.000 description 2
- LIKMAJRDDDTEIG-UHFFFAOYSA-N 1-hexene Chemical compound CCCCC=C LIKMAJRDDDTEIG-UHFFFAOYSA-N 0.000 description 2
- CEBKHWWANWSNTI-UHFFFAOYSA-N 2-methylbut-3-yn-2-ol Chemical compound CC(C)(O)C#C CEBKHWWANWSNTI-UHFFFAOYSA-N 0.000 description 2
- KSLSOBUAIFEGLT-UHFFFAOYSA-N 2-phenylbut-3-yn-2-ol Chemical compound C#CC(O)(C)C1=CC=CC=C1 KSLSOBUAIFEGLT-UHFFFAOYSA-N 0.000 description 2
- LQJBNNIYVWPHFW-UHFFFAOYSA-N 20:1omega9c fatty acid Natural products CCCCCCCCCCC=CCCCCCCCC(O)=O LQJBNNIYVWPHFW-UHFFFAOYSA-N 0.000 description 2
- NECRQCBKTGZNMH-UHFFFAOYSA-N 3,5-dimethylhex-1-yn-3-ol Chemical compound CC(C)CC(C)(O)C#C NECRQCBKTGZNMH-UHFFFAOYSA-N 0.000 description 2
- QSBYPNXLFMSGKH-UHFFFAOYSA-N 9-Heptadecensaeure Natural products CCCCCCCC=CCCCCCCCC(O)=O QSBYPNXLFMSGKH-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- 239000004970 Chain extender Substances 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 2
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- 239000005642 Oleic acid Substances 0.000 description 2
- ZQPPMHVWECSIRJ-UHFFFAOYSA-N Oleic acid Natural products CCCCCCCCC=CCCCCCCCC(O)=O ZQPPMHVWECSIRJ-UHFFFAOYSA-N 0.000 description 2
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 description 2
- 239000004642 Polyimide Substances 0.000 description 2
- GOOHAUXETOMSMM-UHFFFAOYSA-N Propylene oxide Chemical compound CC1CO1 GOOHAUXETOMSMM-UHFFFAOYSA-N 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 2
- 239000012790 adhesive layer Substances 0.000 description 2
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 2
- 230000032683 aging Effects 0.000 description 2
- 125000000304 alkynyl group Chemical group 0.000 description 2
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 2
- 239000011324 bead Substances 0.000 description 2
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 2
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical compound C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 description 2
- 239000012964 benzotriazole Substances 0.000 description 2
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 125000000480 butynyl group Chemical group [*]C#CC([H])([H])C([H])([H])[H] 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 150000001735 carboxylic acids Chemical class 0.000 description 2
- 239000013522 chelant Substances 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- 125000001309 chloro group Chemical group Cl* 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000009833 condensation Methods 0.000 description 2
- 230000005494 condensation Effects 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 239000007822 coupling agent Substances 0.000 description 2
- 150000001993 dienes Chemical class 0.000 description 2
- 235000014113 dietary fatty acids Nutrition 0.000 description 2
- 125000000118 dimethyl group Chemical group [H]C([H])([H])* 0.000 description 2
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 2
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 description 2
- 239000006023 eutectic alloy Substances 0.000 description 2
- 239000000194 fatty acid Substances 0.000 description 2
- 229930195729 fatty acid Natural products 0.000 description 2
- 239000011152 fibreglass Substances 0.000 description 2
- 239000012530 fluid Substances 0.000 description 2
- 239000011888 foil Substances 0.000 description 2
- 238000009472 formulation Methods 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 125000001188 haloalkyl group Chemical group 0.000 description 2
- 125000005843 halogen group Chemical group 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 229930195733 hydrocarbon Natural products 0.000 description 2
- 230000007062 hydrolysis Effects 0.000 description 2
- 238000006460 hydrolysis reaction Methods 0.000 description 2
- 229910052738 indium Inorganic materials 0.000 description 2
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 2
- QXJSBBXBKPUZAA-UHFFFAOYSA-N isooleic acid Natural products CCCCCCCC=CCCCCCCCCC(O)=O QXJSBBXBKPUZAA-UHFFFAOYSA-N 0.000 description 2
- 229910044991 metal oxide Inorganic materials 0.000 description 2
- 150000004706 metal oxides Chemical class 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 150000004767 nitrides Chemical class 0.000 description 2
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 2
- ZQPPMHVWECSIRJ-KTKRTIGZSA-N oleic acid Chemical compound CCCCCCCC\C=C/CCCCCCCC(O)=O ZQPPMHVWECSIRJ-KTKRTIGZSA-N 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 229910052763 palladium Inorganic materials 0.000 description 2
- 125000002255 pentenyl group Chemical group C(=CCCC)* 0.000 description 2
- 125000000286 phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 2
- 230000000704 physical effect Effects 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 125000002568 propynyl group Chemical group [*]C#CC([H])([H])[H] 0.000 description 2
- 229910052703 rhodium Inorganic materials 0.000 description 2
- 150000003284 rhodium compounds Chemical class 0.000 description 2
- 229930195734 saturated hydrocarbon Natural products 0.000 description 2
- NDVLTYZPCACLMA-UHFFFAOYSA-N silver oxide Chemical compound [O-2].[Ag+].[Ag+] NDVLTYZPCACLMA-UHFFFAOYSA-N 0.000 description 2
- 230000000087 stabilizing effect Effects 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 229910052718 tin Inorganic materials 0.000 description 2
- 239000011135 tin Substances 0.000 description 2
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 2
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 2
- RRKODOZNUZCUBN-CCAGOZQPSA-N (1z,3z)-cycloocta-1,3-diene Chemical compound C1CC\C=C/C=C\C1 RRKODOZNUZCUBN-CCAGOZQPSA-N 0.000 description 1
- YJTKZCDBKVTVBY-UHFFFAOYSA-N 1,3-Diphenylbenzene Chemical group C1=CC=CC=C1C1=CC=CC(C=2C=CC=CC=2)=C1 YJTKZCDBKVTVBY-UHFFFAOYSA-N 0.000 description 1
- QYLFHLNFIHBCPR-UHFFFAOYSA-N 1-ethynylcyclohexan-1-ol Chemical compound C#CC1(O)CCCCC1 QYLFHLNFIHBCPR-UHFFFAOYSA-N 0.000 description 1
- VMAWODUEPLAHOE-UHFFFAOYSA-N 2,4,6,8-tetrakis(ethenyl)-2,4,6,8-tetramethyl-1,3,5,7,2,4,6,8-tetraoxatetrasilocane Chemical compound C=C[Si]1(C)O[Si](C)(C=C)O[Si](C)(C=C)O[Si](C)(C=C)O1 VMAWODUEPLAHOE-UHFFFAOYSA-N 0.000 description 1
- HMVBQEAJQVQOTI-UHFFFAOYSA-N 3,5-dimethylhex-3-en-1-yne Chemical compound CC(C)C=C(C)C#C HMVBQEAJQVQOTI-UHFFFAOYSA-N 0.000 description 1
- GRGVQLWQXHFRHO-UHFFFAOYSA-N 3-methylpent-3-en-1-yne Chemical compound CC=C(C)C#C GRGVQLWQXHFRHO-UHFFFAOYSA-N 0.000 description 1
- BTXXTMOWISPQSJ-UHFFFAOYSA-N 4,4,4-trifluorobutan-2-one Chemical compound CC(=O)CC(F)(F)F BTXXTMOWISPQSJ-UHFFFAOYSA-N 0.000 description 1
- BQACOLQNOUYJCE-FYZZASKESA-N Abietic acid Natural products CC(C)C1=CC2=CC[C@]3(C)[C@](C)(CCC[C@@]3(C)C(=O)O)[C@H]2CC1 BQACOLQNOUYJCE-FYZZASKESA-N 0.000 description 1
- RSWGJHLUYNHPMX-UHFFFAOYSA-N Abietic-Saeure Natural products C12CCC(C(C)C)=CC2=CCC2C1(C)CCCC2(C)C(O)=O RSWGJHLUYNHPMX-UHFFFAOYSA-N 0.000 description 1
- 229910001316 Ag alloy Inorganic materials 0.000 description 1
- 229910017944 Ag—Cu Inorganic materials 0.000 description 1
- 239000005711 Benzoic acid Substances 0.000 description 1
- 229910001152 Bi alloy Inorganic materials 0.000 description 1
- 229910016338 Bi—Sn Inorganic materials 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 description 1
- 239000005751 Copper oxide Substances 0.000 description 1
- 229910017518 Cu Zn Inorganic materials 0.000 description 1
- 229910017752 Cu-Zn Inorganic materials 0.000 description 1
- 229910017770 Cu—Ag Inorganic materials 0.000 description 1
- 229910017932 Cu—Sb Inorganic materials 0.000 description 1
- 229910017943 Cu—Zn Inorganic materials 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 1
- 229920000271 Kevlar® Polymers 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- KWYHDKDOAIKMQN-UHFFFAOYSA-N N,N,N',N'-tetramethylethylenediamine Chemical compound CN(C)CCN(C)C KWYHDKDOAIKMQN-UHFFFAOYSA-N 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- 239000004734 Polyphenylene sulfide Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 1
- 229910004738 SiO1 Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229910020836 Sn-Ag Inorganic materials 0.000 description 1
- 229910020988 Sn—Ag Inorganic materials 0.000 description 1
- 235000021355 Stearic acid Nutrition 0.000 description 1
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
- 239000007983 Tris buffer Substances 0.000 description 1
- 239000012963 UV stabilizer Substances 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- 229910001297 Zn alloy Inorganic materials 0.000 description 1
- 239000001361 adipic acid Substances 0.000 description 1
- 235000011037 adipic acid Nutrition 0.000 description 1
- 150000001335 aliphatic alkanes Chemical class 0.000 description 1
- 125000005370 alkoxysilyl group Chemical group 0.000 description 1
- SWLVFNYSXGMGBS-UHFFFAOYSA-N ammonium bromide Chemical compound [NH4+].[Br-] SWLVFNYSXGMGBS-UHFFFAOYSA-N 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- 159000000032 aromatic acids Chemical class 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 150000001555 benzenes Chemical class 0.000 description 1
- 235000010233 benzoic acid Nutrition 0.000 description 1
- ZPOLOEWJWXZUSP-AATRIKPKSA-N bis(prop-2-enyl) (e)-but-2-enedioate Chemical compound C=CCOC(=O)\C=C\C(=O)OCC=C ZPOLOEWJWXZUSP-AATRIKPKSA-N 0.000 description 1
- ZPOLOEWJWXZUSP-WAYWQWQTSA-N bis(prop-2-enyl) (z)-but-2-enedioate Chemical compound C=CCOC(=O)\C=C/C(=O)OCC=C ZPOLOEWJWXZUSP-WAYWQWQTSA-N 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- BRPQOXSCLDDYGP-UHFFFAOYSA-N calcium oxide Chemical compound [O-2].[Ca+2] BRPQOXSCLDDYGP-UHFFFAOYSA-N 0.000 description 1
- 239000000292 calcium oxide Substances 0.000 description 1
- ODINCKMPIJJUCX-UHFFFAOYSA-N calcium oxide Inorganic materials [Ca]=O ODINCKMPIJJUCX-UHFFFAOYSA-N 0.000 description 1
- 150000001721 carbon Chemical group 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- 229910002091 carbon monoxide Inorganic materials 0.000 description 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 239000002826 coolant Substances 0.000 description 1
- 229910000431 copper oxide Inorganic materials 0.000 description 1
- XCJYREBRNVKWGJ-UHFFFAOYSA-N copper(II) phthalocyanine Chemical compound [Cu+2].C12=CC=CC=C2C(N=C2[N-]C(C3=CC=CC=C32)=N2)=NC1=NC([C]1C=CC=CC1=1)=NC=1N=C1[C]3C=CC=CC3=C2[N-]1 XCJYREBRNVKWGJ-UHFFFAOYSA-N 0.000 description 1
- 239000011258 core-shell material Substances 0.000 description 1
- 125000000582 cycloheptyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- KQAHMVLQCSALSX-UHFFFAOYSA-N decyl(trimethoxy)silane Chemical compound CCCCCCCCCC[Si](OC)(OC)OC KQAHMVLQCSALSX-UHFFFAOYSA-N 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 239000003085 diluting agent Substances 0.000 description 1
- SCPWMSBAGXEGPW-UHFFFAOYSA-N dodecyl(trimethoxy)silane Chemical compound CCCCCCCCCCCC[Si](OC)(OC)OC SCPWMSBAGXEGPW-UHFFFAOYSA-N 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
- 238000004043 dyeing Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010292 electrical insulation Methods 0.000 description 1
- 239000008393 encapsulating agent Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 150000004665 fatty acids Chemical class 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 150000008282 halocarbons Chemical group 0.000 description 1
- 125000003187 heptyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 150000004687 hexahydrates Chemical class 0.000 description 1
- CZWLNMOIEMTDJY-UHFFFAOYSA-N hexyl(trimethoxy)silane Chemical compound CCCCCC[Si](OC)(OC)OC CZWLNMOIEMTDJY-UHFFFAOYSA-N 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 238000011065 in-situ storage Methods 0.000 description 1
- 238000010348 incorporation Methods 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 239000011630 iodine Substances 0.000 description 1
- 230000005865 ionizing radiation Effects 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 229910052745 lead Inorganic materials 0.000 description 1
- 125000005647 linker group Chemical group 0.000 description 1
- 238000011068 loading method Methods 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 150000001247 metal acetylides Chemical class 0.000 description 1
- CRJSCSRODDRNDN-UHFFFAOYSA-N methyl-tris(2-methylbut-3-yn-2-yloxy)silane Chemical compound C#CC(C)(C)O[Si](C)(OC(C)(C)C#C)OC(C)(C)C#C CRJSCSRODDRNDN-UHFFFAOYSA-N 0.000 description 1
- 239000003094 microcapsule Substances 0.000 description 1
- 125000001421 myristyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 229910000480 nickel oxide Inorganic materials 0.000 description 1
- 239000002736 nonionic surfactant Substances 0.000 description 1
- NIHNNTQXNPWCJQ-UHFFFAOYSA-N o-biphenylenemethane Natural products C1=CC=C2CC3=CC=CC=C3C2=C1 NIHNNTQXNPWCJQ-UHFFFAOYSA-N 0.000 description 1
- QJAOYSPHSNGHNC-UHFFFAOYSA-N octadecane-1-thiol Chemical compound CCCCCCCCCCCCCCCCCCS QJAOYSPHSNGHNC-UHFFFAOYSA-N 0.000 description 1
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 1
- OQCDKBAXFALNLD-UHFFFAOYSA-N octadecanoic acid Natural products CCCCCCCC(C)CCCCCCCCC(O)=O OQCDKBAXFALNLD-UHFFFAOYSA-N 0.000 description 1
- SLYCYWCVSGPDFR-UHFFFAOYSA-N octadecyltrimethoxysilane Chemical compound CCCCCCCCCCCCCCCCCC[Si](OC)(OC)OC SLYCYWCVSGPDFR-UHFFFAOYSA-N 0.000 description 1
- MSRJTTSHWYDFIU-UHFFFAOYSA-N octyltriethoxysilane Chemical compound CCCCCCCC[Si](OCC)(OCC)OCC MSRJTTSHWYDFIU-UHFFFAOYSA-N 0.000 description 1
- 229960003493 octyltriethoxysilane Drugs 0.000 description 1
- 239000011146 organic particle Substances 0.000 description 1
- 229920000620 organic polymer Polymers 0.000 description 1
- 239000011242 organic-inorganic particle Substances 0.000 description 1
- 150000002902 organometallic compounds Chemical class 0.000 description 1
- 229910052762 osmium Inorganic materials 0.000 description 1
- SYQBFIAQOQZEGI-UHFFFAOYSA-N osmium atom Chemical compound [Os] SYQBFIAQOQZEGI-UHFFFAOYSA-N 0.000 description 1
- 125000003544 oxime group Chemical group 0.000 description 1
- GNRSAWUEBMWBQH-UHFFFAOYSA-N oxonickel Chemical compound [Ni]=O GNRSAWUEBMWBQH-UHFFFAOYSA-N 0.000 description 1
- 238000012856 packing Methods 0.000 description 1
- 125000000913 palmityl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229910000073 phosphorus hydride Inorganic materials 0.000 description 1
- 229920006391 phthalonitrile polymer Polymers 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
- 229920006255 plastic film Polymers 0.000 description 1
- CLSUSRZJUQMOHH-UHFFFAOYSA-L platinum dichloride Chemical compound Cl[Pt]Cl CLSUSRZJUQMOHH-UHFFFAOYSA-L 0.000 description 1
- 229920003207 poly(ethylene-2,6-naphthalate) Polymers 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 239000011112 polyethylene naphthalate Substances 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 229920002098 polyfluorene Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229920000069 polyphenylene sulfide Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920005990 polystyrene resin Polymers 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 125000002572 propoxy group Chemical group [*]OC([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000012763 reinforcing filler Substances 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000007086 side reaction Methods 0.000 description 1
- 125000005372 silanol group Chemical group 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 229910001923 silver oxide Inorganic materials 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000012798 spherical particle Substances 0.000 description 1
- 239000008117 stearic acid Substances 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- FBEIPJNQGITEBL-UHFFFAOYSA-J tetrachloroplatinum Chemical compound Cl[Pt](Cl)(Cl)Cl FBEIPJNQGITEBL-UHFFFAOYSA-J 0.000 description 1
- 239000003017 thermal stabilizer Substances 0.000 description 1
- 229920001169 thermoplastic Polymers 0.000 description 1
- 239000004416 thermosoftening plastic Substances 0.000 description 1
- JOUDBUYBGJYFFP-FOCLMDBBSA-N thioindigo Chemical compound S\1C2=CC=CC=C2C(=O)C/1=C1/C(=O)C2=CC=CC=C2S1 JOUDBUYBGJYFFP-FOCLMDBBSA-N 0.000 description 1
- 150000003573 thiols Chemical class 0.000 description 1
- 150000003852 triazoles Chemical class 0.000 description 1
- FZMJEGJVKFTGMU-UHFFFAOYSA-N triethoxy(octadecyl)silane Chemical compound CCCCCCCCCCCCCCCCCC[Si](OCC)(OCC)OCC FZMJEGJVKFTGMU-UHFFFAOYSA-N 0.000 description 1
- UBMUZYGBAGFCDF-UHFFFAOYSA-N trimethoxy(2-phenylethyl)silane Chemical compound CO[Si](OC)(OC)CCC1=CC=CC=C1 UBMUZYGBAGFCDF-UHFFFAOYSA-N 0.000 description 1
- NMEPHPOFYLLFTK-UHFFFAOYSA-N trimethoxy(octyl)silane Chemical compound CCCCCCCC[Si](OC)(OC)OC NMEPHPOFYLLFTK-UHFFFAOYSA-N 0.000 description 1
- ZNOCGWVLWPVKAO-UHFFFAOYSA-N trimethoxy(phenyl)silane Chemical compound CO[Si](OC)(OC)C1=CC=CC=C1 ZNOCGWVLWPVKAO-UHFFFAOYSA-N 0.000 description 1
- AXNJHBYHBDPTQF-UHFFFAOYSA-N trimethoxy(tetradecyl)silane Chemical compound CCCCCCCCCCCCCC[Si](OC)(OC)OC AXNJHBYHBDPTQF-UHFFFAOYSA-N 0.000 description 1
- PQDJYEQOELDLCP-UHFFFAOYSA-N trimethylsilane Chemical compound C[SiH](C)C PQDJYEQOELDLCP-UHFFFAOYSA-N 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- GPPXJZIENCGNKB-UHFFFAOYSA-N vanadium Chemical compound [V]#[V] GPPXJZIENCGNKB-UHFFFAOYSA-N 0.000 description 1
- RNWHGQJWIACOKP-UHFFFAOYSA-N zinc;oxygen(2-) Chemical class [O-2].[Zn+2] RNWHGQJWIACOKP-UHFFFAOYSA-N 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K5/00—Heat-transfer, heat-exchange or heat-storage materials, e.g. refrigerants; Materials for the production of heat or cold by chemical reactions other than by combustion
- C09K5/08—Materials not undergoing a change of physical state when used
- C09K5/14—Solid materials, e.g. powdery or granular
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/0091—Complexes with metal-heteroatom-bonds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/16—Nitrogen-containing compounds
- C08K5/34—Heterocyclic compounds having nitrogen in the ring
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/16—Nitrogen-containing compounds
- C08K5/34—Heterocyclic compounds having nitrogen in the ring
- C08K5/3412—Heterocyclic compounds having nitrogen in the ring having one nitrogen atom in the ring
- C08K5/3415—Five-membered rings
- C08K5/3417—Five-membered rings condensed with carbocyclic rings
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L101/00—Compositions of unspecified macromolecular compounds
- C08L101/12—Compositions of unspecified macromolecular compounds characterised by physical features, e.g. anisotropy, viscosity or electrical conductivity
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
- C08L83/04—Polysiloxanes
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F28—HEAT EXCHANGE IN GENERAL
- F28F—DETAILS OF HEAT-EXCHANGE AND HEAT-TRANSFER APPARATUS, OF GENERAL APPLICATION
- F28F21/00—Constructions of heat-exchange apparatus characterised by the selection of particular materials
- F28F21/06—Constructions of heat-exchange apparatus characterised by the selection of particular materials of plastics material
- F28F21/067—Details
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F28—HEAT EXCHANGE IN GENERAL
- F28F—DETAILS OF HEAT-EXCHANGE AND HEAT-TRANSFER APPARATUS, OF GENERAL APPLICATION
- F28F23/00—Features relating to the use of intermediate heat-exchange materials, e.g. selection of compositions
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
- H01B1/20—Conductive material dispersed in non-conductive organic material
- H01B1/22—Conductive material dispersed in non-conductive organic material the conductive material comprising metals or alloys
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/12—Polysiloxanes containing silicon bound to hydrogen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/20—Polysiloxanes containing silicon bound to unsaturated aliphatic groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/18—Oxygen-containing compounds, e.g. metal carbonyls
- C08K3/20—Oxides; Hydroxides
- C08K3/22—Oxides; Hydroxides of metals
- C08K2003/2217—Oxides; Hydroxides of metals of magnesium
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/18—Oxygen-containing compounds, e.g. metal carbonyls
- C08K3/20—Oxides; Hydroxides
- C08K3/22—Oxides; Hydroxides of metals
- C08K2003/2227—Oxides; Hydroxides of metals of aluminium
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/18—Oxygen-containing compounds, e.g. metal carbonyls
- C08K3/20—Oxides; Hydroxides
- C08K3/22—Oxides; Hydroxides of metals
- C08K2003/2296—Oxides; Hydroxides of metals of zinc
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/01—Use of inorganic substances as compounding ingredients characterized by their specific function
- C08K3/013—Fillers, pigments or reinforcing additives
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/10—Metal compounds
- C08K3/14—Carbides
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/28—Nitrogen-containing compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/16—Nitrogen-containing compounds
- C08K5/34—Heterocyclic compounds having nitrogen in the ring
- C08K5/3467—Heterocyclic compounds having nitrogen in the ring having more than two nitrogen atoms in the ring
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/56—Organo-metallic compounds, i.e. organic compounds containing a metal-to-carbon bond
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L2205/00—Polymer mixtures characterised by other features
- C08L2205/02—Polymer mixtures characterised by other features containing two or more polymers of the same C08L -group
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Thermal Sciences (AREA)
- General Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Materials Engineering (AREA)
- Combustion & Propulsion (AREA)
- Dispersion Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Abstract
本發明揭示包含可經由矽氫化反應固化之聚矽氧組合物、熱傳導填料及酞菁之熱傳導材料之組合物、其製法及其用途。該新穎組合物即使在固化後長時間維持於高溫下仍保留其理想可撓性。
Description
熱傳導凝膠及囊封材料為用於自發熱電子組件轉移消除熱之軟的順應性及高傳導材料。其重點在於在電子組件之使用壽命期間保留該等材料之物理性質(諸如硬度及順應性),以防護該電子裝置且維持與熱傳導基材之良好接觸。然而,通常發現在長時間曝露於90至150℃範圍內之溫度下,該等熱傳導凝膠或囊封材料之硬度會顯著增加,而該等凝膠或囊封材料之有效性因其開始無法維持緊密接觸該等電子組件而減小。熱傳導凝膠及囊封材料通常於有機矽氧烷彈性體基質中使用高負載量之熱傳導填料。即使該有機矽氧烷彈性體基質在90至150℃範圍內之溫度下保持穩定,咸信利用填料(及填料之大數量表面積)時,仍有許多副反應會造成硬度隨時間而增加之結果。
因此,尚需要在長時間曝露於高溫後仍保留軟及順應性之熱傳導凝膠及囊封材料。
酞菁化合物及該等化合物之金屬衍生物已作為顏料用於聚矽氧樹脂及有機矽氧烷組合物中,其隨後再藉由使用有機過氧化物及加熱之方式或藉由具有羥基末端之聚二有機矽氧烷與矽酸烷基酯或有機氫矽氧烷反應之方式固化形成彈性體。揭示酞菁化合物之該用途之參考文獻包括美國專利案第3,364,161號、英國專利案第1,470,465號;及日本特許公開案編號1/279,981及62/223,788。
英國專利案第893,399號教示使用陰丹士林藍、聯三
苯、酞菁或金屬酞菁,可讓特定聚矽氧彈性體類型在熱及電離輻射下阻抗降解。該等彈性體係使用有機過氧化物、硫或矽酸烷基酯在羧酸或胺之金屬鹽作為觸媒之存在下固化。美國專利案第2,723,964號教示使用諸如酞菁銅及硫靛類染料之多核苯型化合物改良使用有機過氧化物固化之聚矽氧彈性體之熱穩定性。
如U.S.5,153,244所教示,已知將酞菁添加至聚矽氧彈性體來改良固化之聚矽氧彈性體之壓縮特性值。
本發明者發現,併入基於酞菁之顏料時,於防止熱傳導聚矽氧烷材料之硬度在高溫下隨時間增加之效果比過去之報告結果具有更有利之影響。
本發明之一態樣為一種組合物,其包含(A)每分子具有平均至少0.1個矽鍵結烯基之有機烷基聚矽氧烷;(B)每分子具有平均至少2個矽鍵結氫原子之有機聚矽氧烷;(C)其用量足以引發組合物(A)及(B)之固化反應之矽氫化反應觸媒;(D)熱傳導填料;及(E)選自由不含金屬及含金屬之酞菁化合物組成之群之添加劑。
於一些實施例中,該添加劑為含金屬酞菁化合物。特定言之,該金屬為銅。更特定言之,該含銅酞菁化合物為29H,31H-酞菁基(2-)-N29,N30,N31,N32銅。
於一些實施例中,本發明組合物之熱傳導填料係選自氮化鋁、氧化鋁、三水合鋁、鈦酸鋇、氧化鈹、氮化硼、碳纖維、金剛石、石墨、氫氧化鎂、氧化鎂、金屬顆粒、縞
瑪瑙(onyx)、碳化矽、碳化鎢、氧化鋅及其組合。
本發明之另一態樣為一種由前一段所述組合物固化製得之固化聚矽氧。本發明之又一態樣為一種增加熱傳導聚有機矽氧烷組合物之穩定性之方法,該方法包括將酞菁化合物添加至可固化聚有機矽氧烷組合物之步驟。本發明亦提供一種自第一組件傳導熱至第二組件之方法,其中包括由包含酞菁化合物之上述組合物固化獲得之聚矽氧材料之組合物與該第一組件及該第二組件接觸。
1.可固化聚有機矽氧烷組合物。本發明提供一種聚有機矽氧烷組合物,其可經矽氫化固化且包含酞菁化合物,形成即使長時間曝露於高溫後仍維持其可撓性質之熱傳導聚矽氧組合物。該組合物包含(A)每分子具有平均至少0.1個矽鍵結烯基之有機烷基聚矽氧烷;(B)每分子具有平均至少2個矽鍵結氫原子之有機聚矽氧烷;(C)其用量足以引發組合物(A)及(B)之固化反應之矽氫化反應觸媒;(D)熱傳導填料;及(E)選自由不含金屬及含金屬之酞菁化合物組成之群之穩定化添加劑。該組合物可視需要包含額外組份,以提供其他功能給該組合物及該組合物之固化材料。
固化後之熱傳導有機聚矽氧烷材料具有在高溫下隨時間硬化之傾向。穩定化添加劑可延遲或防止這種硬度增加之進展。本發明出示適用為穩定化添加劑之酞菁化合物。
構成組份(A)之有機烷基聚矽氧烷聚合物每分子包含平
均至少2個矽鍵結烯基。該有機烷基聚矽氧烷可具有直鏈分子結構或某一程度之分支鏈或樹枝狀分子結構。其可呈單一聚合物、共聚合物或兩種或更多種聚合物之混合物之形式。
組份(A)之矽鍵結烯基實例為乙烯基、烯丙基、丁烯基、戊烯基、己烯基或庚烯基,其中乙烯基、烯丙基或己烯基為較佳。可於一分子中發現一種以上的烯基。組份(A)中之該等脂族不飽和有機基團可位於末端、側基或末端與側基兩個位置。
組份(A)中留存的矽鍵結有機基團可為沒有脂族不飽和性之單價有機基團。該單價有機基團可具有至少一個及多達如2、3、4、5、6、7、8、9、10、11、12、16、18及20個碳原子,且舉例(但不限於)為烷基,諸如甲基、乙基、丙基、丁基、戊基、辛基、癸基、十一碳烷基、十二碳烷基及十八碳烷基;環烷基,諸如環戊基及環己基;及芳族(芳基)基團,諸如苯基、甲苯基、二甲苯基、苄基及2-苯基乙基;及3,3,3-三氟丙基,或類似之鹵代烷基。於一些實施例中,該等有機基團為甲基或苯基。
端基可為前段所述之烷基或芳基,以甲氧基、乙氧基及丙氧基為例之烷氧基,或羥基。
組份(A)之一些例示性分子可由以下化學式表示:式(I):R1 2R2SiO(R1 2SiO)d(R1R2SiO)eSiR1 2R2,式(II):R1 3SiO(R1 2SiO)f(R1R2SiO)gSiR1 3,或其組合。
式(I)及(II)中,各R1獨立地為沒有脂族不飽和性之單價有機基團,及各R2獨立地為脂族不飽和有機基團。下標d為至少0.1,通常至少0.5,更通常至少0.8,及最通常為至少2之平均值,或者下標d之數值可在0.1至2000之範圍內。下標e可為0或正數。或者,下標e可為0至2000範圍內之平均值。下標f可為0或正數。或者,下標f可為0至2000範圍內之平均值。下標g為至少0.1,通常至少0.5,更通常至少0.8,及最通常為至少2之平均值。或者,下標g可為0.1至2000範圍內之平均值。R1之適宜單價有機基團包括(但不限於)烷基,諸如甲基、乙基、丙基、戊基、辛基、十一碳烷基及十八碳烷基;環烷基,諸如環戊基及環己基;及芳基,諸如苯基、甲苯基、二甲苯基、苄基及2-苯基乙基。各R2獨立地為脂族不飽和單價有機基團,舉例為烯基,諸如乙烯基、烯丙基、丁烯基、戊烯基、己烯基或庚烯基。
適用為組份(A)之例示性分子為:分子兩端經二甲基乙烯基矽氧基封端之二甲基聚矽氧烷;分子兩端經甲基苯基乙烯基矽氧基封端之二甲基聚矽氧烷;分子兩端經二甲基乙烯基矽氧基封端之甲基苯基矽氧烷與二甲基矽氧烷之共聚物;分子兩端經三甲基矽氧基封端之甲基乙烯基矽氧烷與二甲基矽氧烷之共聚物;分子兩端經二甲基乙烯基矽氧基封端之甲基乙烯基矽氧烷
與二甲基矽氧烷之共聚物;分子兩端經二甲基乙烯基矽氧基封端之甲基(3,3,3-三氟丙基)聚矽氧烷;分子兩端經二甲基乙烯基矽氧基封端之甲基(3,3,3-三氟丙基)矽氧烷與二甲基矽氧烷之共聚物;分子兩端經矽醇基封端之甲基乙烯基矽氧烷與二甲基矽氧烷之共聚物;分子兩端經矽醇基封端之甲基乙烯基矽氧烷、甲基苯基矽氧烷及二甲基矽氧烷之共聚物;或由藉由以下化學式:(CH3)3SiO½、(CH3)2(CH2=CH)SiO½、CH3SiO3/2、及(CH3)2SiO2/2表示之矽氧烷單位組成之有機矽氧烷共聚物。
組份(A)可為單基質聚合物或包含兩種或更多種其差異在於至少一種以下性質之基質聚合物之組合:結構、黏度、平均分子量、矽氧烷單位及序列。
相關技藝中習知製造適用為組份(A)之聚有機烷基矽氧烷流體之方法,諸如由對應之有機鹵代矽烷進行水解及縮合或由環狀聚二有機矽氧烷達成平衡。
除了上述聚二有機矽氧烷之外,組份(A)可進一步包含樹脂,諸如基本上由RxSiO1/2單位及SiO4/2單位組成之MQ樹脂、基本上由RxSiO3/2單位及Rx 2SiO2/2單位組成之TD樹脂、基本上由RxSiO單位及RxSiO3/2單位組成之MT樹脂、基本上由RxSiO1/2單位、RxSiO3/2單位及Rx 2SiO2/2單位組成之MTD樹脂或其組合。Rx表示任何單價有機基團,例如
(但不限於)單價烴基及單價鹵代烴基。單價烴基包括(但不限於)烷基,諸如甲基、乙基、丙基、戊基、辛基、十一烷基及十八烷基;環烷基,諸如環己基;烯基,諸如乙烯基、烯丙基、丁烯基及己烯基;炔基,諸如乙炔基、丙炔基及丁炔基;及芳基,諸如苯基、甲苯基、二甲苯基、苄基及2-苯基乙基。
組份(B)包括每分子具有平均至少2個矽鍵結氫原子之矽烷或有機聚矽氧烷,其與組份(A)之烷基發生矽氫化反應,且結果使組份(A)交聯並固化。組份(B)可具有直鏈、分支鏈、部分支化直鏈、環狀、樹枝狀或樹脂質分子結構。組份(B)中該等矽鍵結氫原子可位於末端、側基或末端與側基兩個位置。
組份(B)相對於組份(A)之用量應為足使組份(B)中SiH基對組份(A)中脂族不飽和有機基團之莫耳比(通常稱為SiH:Vi比)達到10:1至0.1:1之範圍,其取決於組合物所需之固化產物性質。於一些實施例中,該SiH:Vi比在3:1之範圍內,及於其他實施例中,為約2:1至約0.3:1;較佳為1.5:1至0.5:1。
組份(B)中矽鍵結氫原子除外之矽鍵結基團可由不含不飽和脂族鍵之單價烴基表示,諸如甲基、乙基、丙基、丁基、戊基、己基、庚基、辛基、癸基、十一碳烷基、十二碳烷基或類似烷基;環戊基、環己基或類似環烷基;苯基、甲苯基、二甲苯基或類似芳基;苄基、苯基乙基或類
似芳烷基;或3,3,3-三氟丙基、3-氯丙基或類似鹵代烷基。較佳為烷基及芳基,特定言之,為甲基及苯基。
組份(B)可包含矽氧烷單位,包括(但不限於)HR3 2Si01/2、R3 3Si01/2、HR3SiO2/2、R3 2SiO2/2、R3SiO3/2及SiO4/2單位。前述化學式中,各R3獨立地選自沒有脂族不飽和性之單價有機基團。
組份(B)可包括如下化學式之化合物:(III)R3 3SiO(R3 2SiO)h(R3HSiO)iSiR3 3,(IV)R3 2HSiO(R3 2SiO)j(R3HSiO)kSiR3 2H,或其組合。
上式(III)及(IV)中,下標h為0至2000範圍內之平均值,下標i為2至2000範圍內之平均值,下標j為0至2000範圍內之平均值,及下標k為0至2000範圍內之平均值。各R3獨立地為單價有機基團。適宜之單價有機基團包括烷基,諸如甲基、乙基、丙基、戊基、辛基、癸基、十一碳烷基、十二碳烷基及十八碳烷基;環烷基,諸如環戊基及環己基;烯基,諸如乙烯基、烯丙基、丁烯基及己烯基;炔基,諸如乙炔基、丙炔基及丁炔基;及芳基,諸如苯基、甲苯基、二甲苯基、苄基及2-苯基乙基。
適用為組份(B)之例示性分子為:分子兩端經三甲基矽氧基封端之甲基氫聚矽氧烷;分子兩端經三甲基矽氧基封端之甲基氫矽氧烷與二甲基矽氧烷之共聚物;分子兩端經二甲基氫矽氧基封端之二甲基聚矽氧烷;
分子兩端經二甲基氫矽氧基封端之甲基氫聚矽氧烷;分子兩端經二甲基氫矽氧基封端之甲基氫矽氧烷及二甲基矽氧烷之共聚物;環狀甲基氫聚矽氧烷;由以下化學式:(CH3)3SiO½、(CH3)2HSiO½、及SiO4/2表示之矽氧烷單位組成之有機矽氧烷;肆(二甲基氫矽氧基)矽烷,或甲基-三(二甲基氫矽氧基)矽烷。
組份(B)可為兩種或更多種其差異在於至少一種以下性質之有機氫聚矽氧烷之組合:結構、平均分子量、黏度、矽氧烷單位及序列。組份(B)可包括矽烷。具有相當低聚合度(例如,DP為3至50之範圍內)之具有二甲基氫矽氧基末端之聚二甲基矽氧烷通常稱為鏈延長劑,且組份(B)之一部分可為鏈延長劑。
相關技藝中習知製備適用為組份(B)之直鏈、分支鏈及環狀有機氫聚矽氧烷之方法,諸如有機鹵代矽烷之水解及縮合。適用為組份(B)之有機氫聚矽氧烷樹脂之製法亦為熟知,如美國專利案5,310,843;4,370,358;及4,707,531所例示。
組份(C)為加速矽氫化反應之觸媒。適宜之矽氫化觸媒係相關技藝中習知且可自市面獲得。組份(C)可包括選自鉑、銠、釕、鈀、鋨或銥金屬之鉑族金屬或其有機金屬化合物或其組合。
組份(C)之用量係使依佔組份(A)與(B)總重量之重量單位
表示之鉑族金屬含量介於0.01至1,000 ppm,或者0.1至500 ppm,或者1至500 ppm,或者2至200,或者5至150 ppm範圍內。
組份(C)舉例為鉑金屬細粉、鉑黑、二氯化鉑、四氯化鉑;氯鉑酸、經醇修飾之氯鉑酸、六水合氯鉑酸;及該等化合物之錯合物,諸如烯烴之鉑錯合物、羰基之鉑錯合物、烯基矽氧烷(例如,1,3-二乙烯基四甲基二矽氧烷)之鉑錯合物、低分子量有機聚矽氧烷(例如1,3-二乙烯基-1,1,3,3-四甲基二矽氧烷)之鉑錯合物、氯鉑酸與β-二酮之-錯合物、氯鉑酸與烯烴之錯合物及氯鉑酸與1,3-二乙烯基四甲基二矽氧烷之錯合物。
組份(C)亦可為諸如彼等由以下化學式表示之銠化合物:RhX3[(R4)2S]3;(R5 3P)2Rh(CO)X、(R5 3P)2Rh(CO)H、Rh2X2Y4、HfRhg(En)hCli、或Rh[O(CO)R]3-j(OH)j(其中X表示氫原子、氯原子、溴原子或碘原子;Y表示甲基、乙基或類似烷基、CO、C8H14或0.5C8H12;R4表示甲基、乙基、丙基或類似烷基;環庚基、環己基或類似環烷基;或苯基、二甲苯基或類似芳基;R5表示甲基、乙基或類似烷基;苯基、甲苯基、二甲苯基或類似芳基;甲氧基、乙氧基或類似烷氧基;「En」表示乙烯、丙烯、丁烯、己烯或類似烯烴;「f」為0或1;「g」為1或2;「h」為1至4之整數;「i」為2、3或4;及「j」為0或1)。更特定言之,該銠化合物為RhCl(Ph3P)3、RhCl3[S(C4H9)2]3、[Rh(O2CCH3)2]2、Rh(OCCH3)3、Rh2(C8H15O2)4、Rh(C5H7O2)3、Rh(C5H7O2)
(CO)2及Rh(CO)[Ph3P](C5H7O2)。
組份(C)亦可為彼等由以下化學式表示之銥族觸媒:Ir(OOCCH3)3、Ir(C5H7O2)3、[Ir(Z)(En)2]2或[Ir(Z)(二烯)]2(其中「Z」表示氯原子、溴原子、碘原子,或甲氧基、乙氧基或類似烷氧基;「En」表示乙烯、丙烯、丁烯、己烯或類似烯烴;及「二烯」表示環辛二烯肆(三苯基))。組份(C)亦可為鈀,鈀黑與三苯基膦之混合物。
該等錯合物可經微囊封裝至樹脂基質或核殼型結構中,或可混合並囊封在由甲基丙烯酸甲酯樹脂、碳酸酯樹脂、聚苯乙烯樹脂、聚矽氧樹脂或類似樹脂組成之熱塑性有機樹脂粉末中。
組份(D)為熱傳導填料。組份(D)可能同時具熱傳導性及具電傳導性。或者,組份(D)可具熱傳導性及電絕緣性。熱傳導填料係相關技藝中習知,參見:例如,美國專利案第6,169,142號(第4欄,第7至33行)。組份(D)可包括金屬填料、無機填料、可熔填料或其組合。
組合物中組份(D)的量係取決於不同因素,包括針對於該組合物選擇之聚矽氧固化機轉及針對該組份(D)選擇之熱傳導填料。然而,組份(D)的量可佔組合物體積之30%至97%,或者50%至95%。
金屬填料包括金屬顆粒及顆粒之表面上具有覆層之金屬顆粒。例如,該等覆層可為位於顆粒表面上之金屬氮化物層或金屬氧化物層。適宜之金屬填料實例為選自由鋁、
銅、金、鎳、錫、銀及其組合組成之群,及或者為鋁之金屬顆粒。適宜之金屬填料進一步舉例為其表面上具有覆層之上述金屬顆粒,其選自由氮化鋁、氧化鋁、氧化銅、氧化鎳、氧化銀及其組合組成之群。例如,該金屬填料可包括其表面上具有氧化鋁層之鋁顆粒。
無機填料舉例為縞瑪瑙;三水合鋁,諸如氧化鋁、氧化鈹、氧化鎂及氧化鋅之金屬氧化物;諸如氮化鋁及氮化硼之氮化物;諸如碳化矽及碳化鎢之碳化物;及其組合;鈦酸鋇、碳纖維、金剛石、石墨、氫氧化鎂、及其組合。
可熔填料可包括Bi、Ga、In、Sn或其合金。該可熔填料可視情況進一步包括Ag、Au、Cd、Cu、Pb、Sb、Zn或其組合。適宜可熔填料之實例包括Ga、In-Bi-Sn合金、Sn-In-Zn合金、Sn-In-Ag合金、Sn-Ag-Bi合金、Sn-Bi-Cu-Ag合金、Sn-Ag-Cu-Sb合金、Sn-Ag-Cu合金、Sn-Ag合金、Sn-Ag-Cu-Zn合金,及其組合。該可熔填料之熔點為50℃至250℃,或者150℃至225℃之範圍內。該可熔填料可為低共熔合金、非低共熔合金或純金屬。可熔填料可自市面商品獲得。
熱傳導填料顆粒之形狀沒有明確限制,然而,圓形或球形顆粒可防止組合物在該熱傳導填料高負載量下之黏度增加至不期望之程度。熱傳導填料之平均粒徑取決於多種因素,包括針對於組份(D)選擇之熱傳導填料類型及添加至可固化組合物之確實用量,及其中使用該組合物之固化產物之裝置之黏合層厚度。於一些特定實例中,熱傳達填料
之平均粒徑為0.1微米至80微米、或者0.1微米至50微米、及或者0.1微米至10微米之範圍內。
組份(D)可為單一熱傳導填料或兩種或更多種其差異在於至少一種以下性質之熱傳導填料之組合:諸如顆粒形狀、平均粒徑、粒徑分佈及填料類型。於一些實施例中,可使用金屬與無機填料之組合,諸如鋁與氧化鋁填料之組合;鋁與氧化鋅填料之組合;或鋁、氧化鋁及氧化鋅填料之組合。於其他實施例中,可能需要將具有較大平均粒徑之第一傳導填料與具有較小平均粒徑之第二傳導填料組合,以符合最密堆積理論分佈曲線之比例。一項實例係將具有不同平均粒徑之兩種氧化鋁製劑混合。於其他實施例中,可使用具有不同粒徑之不同熱傳導填料,例如,將具有較大平均粒徑之氧化鋁與具有較小平均粒徑之氧化鋅組合。或者,可能需要使用諸如具有較大平均粒徑之第一鋁及具有較小平均粒徑之第二鋁之金屬填料之組合。使用具有較大平均粒徑之第一填料及平均粒徑小於該第一填料之第二填料可改良填充效率,可減小黏度,且可增進熱轉移。
熱傳導填料可自市面商品獲得。例如,可熔填料可購自Indium Corporation of America,Utica,N.Y.,U.S.A.;Arconium,Providence,R.I.,U.S.A.;及AIM Solder,Cranston,R.I.,U.S.A。鋁填料購自例如Toyal America,Inc.Naperville,Illinois,U.S.A.及Valimet Inc.,Stockton,California,U.S.A。銀填料購自Metalor Technologies
U.S.A.Corp.Attleboro,Massachusetts,U.S.A。諸如具有商標KADOX®及XX®之氧化鋅之鋅氧化物係購自Zinc Corporation America of Monaca,Pennsylvania,U.S.A。此外,CB-A20S與Al-43-Me為購自Showa-Denko之粒徑不同之氧化鋁填料,及AA 18為購自Sumitomo Chemical Company之氧化鋁填料。氮化硼填料購自Momentive Corporation,Cleveland,Ohio,U.S.A。
組份(E)為具有保留熱傳導聚矽氧材料之所需物理特性(亦即適當之軟度及順應性)之效果之顏料。組份(E)包括酞菁化合物。以酞菁化合物之重量單位計,熱傳導聚有機矽氧烷組合物中之組份(E)添加量應佔整體組合物之0.01至5.0%範圍內。或者,該酞腈化合物佔該組合物之0.05至0.2%。或者,酞菁化合物佔該組合物之0.07至0.1%。
適宜之酞菁化合物由式(V)表示。
X各自獨立地表示氫或鹵原子。適宜之鹵原子為氯、溴及碘。較佳地,該酞菁化合物為29H,31H-酞菁。
金屬酞菁化合物可由下式表示:
式(VI)中X係如式(V)中之相同定義,及M為選自銅、鎳、鈷、鐵、鉻、鋅、鉑及釩之金屬原子。[當M為銅時,X均為氫]。較佳之酞菁化合物為29H,31H-酞菁基(2-)-N29,N30,N31,N32銅。酞菁化合物可自市面商品獲得,諸如購自PolyOne Corporation,Avon Lake,Ohio,USA之Stan-toneTM 40SP03。
有機聚矽氧烷組合物可包含其他視需要選用之組份。該額外組份可選自由(F)間隔物,(G)增強或增積填料,(H)填料處理劑,(I)黏著促進劑,(J)媒劑,(K)表面活性劑,(L)助焊劑,(M)酸受體,(N)矽氫化抑制劑,(O)額外穩定劑(例如,矽氫化固化穩定劑、熱穩定劑或UV穩定劑)及其組合組成之群。
組份(F)為間隔物。間隔物可包括有機顆粒、無機顆粒
或其組合。間隔物可具熱傳導性、電傳導性或兩者。間隔物之粒徑可為至少25微米至125微米。間隔物可包括單一分散性珠粒,諸如玻璃或聚合物(例如聚苯乙烯)珠粒。間隔物可包括諸如氧化鋁、氮化鋁、氣霧化金屬粉末、氮化硼、銅及銀之熱傳導填料。組份(F)的量取決於多種因素,包括粒徑分佈、鋪放可固化組合物或由其製得之固化產物期間所施加之壓力及鋪放期間之溫度。然而,該組合物中之組份(F)含量可為0.05%至2%,或者0.1%至1%之範圍內。可添加組份(F)控制可固化組合物之固化產物之黏合層厚度。
組份(G)為增強及/或增積填料。組合物中組份(G)的量取決於多種因素,包括針對組份(A)、(B)、(C)、(D)及(E)選擇之材料及該組合物之最終用途。然而,組份(G)的量可佔組合物重量之0.1重量%至10重量%。適宜之增強及增積填料係相關技藝中習知且舉例為沉澱及研磨二氧化矽、沉澱及研磨碳酸鈣、石英、滑石、諸如短切KEVLAR®之短切纖維或其組合。
針對組份(D)之熱傳導填料及針對組份(G)之增強及/或增積填料及/或針對組份(F)之間隔物假若存在時,可視情況經過組份(H)處理劑進行表面處理。處理劑及處理法係相關技藝中習知,參見:例如,美國專利案第6,169,142號(第4卷,第42行至第5卷,第2行)。
組份(H)的量可根據多種因素變化,包括針對組份(D)及(G)選擇之填料類型及用量,及填料是否係於原位或在與組合物之其他組份組合之前經過組份(H)處理。然而,該組合物之組份(H)含量可為0.1%至2%之範圍內。
該組份(H)可包括如式:R6 mSi(OR7)(4-m)之烷氧基矽烷,其中下標m為1、2或3;或者m為3。各R6獨立地為單價有機基團,諸如1至50個碳原子,或者6至18個碳原子之烴基。R6之實例為烷基,諸如己基、辛基、十二碳烷基、十四碳烷基、十六碳烷基及十八碳烷基;及芳族基,諸如苄基、苯基及苯基乙基。R6可為飽和或不飽和分支鏈或直鏈且未經取代。R6可為飽和直鏈且未經取代。
各R7可為1至4個碳原子,或者1至2個碳原子之未經取代飽和烴基。針對組份(H)之烷氧基矽烷實例為己基三甲氧基矽烷、辛基三乙氧基矽烷、癸基三甲氧基矽烷、十二烷基三甲氧基矽烷、十四烷基三甲氧基矽烷、苯基三甲氧基矽烷、苯乙基三甲氧基矽烷、十八烷基三甲氧基矽烷、十八烷基三乙氧基矽烷及其組合。
具有烷氧基官能基之寡聚矽氧烷亦可用為處理劑。具有烷氧基官能基之寡聚矽氧烷及其製法係相關技藝中習知,參見:例如,EP 1 101 167 A2。例如,適宜之具有烷氧基官能基之寡聚矽氧烷包括彼等如式(R8O)nSi(OSiR9 2R10)(4-n)者。該式中,下標n為1、2或3,或者n為3。各R8可為烷基。各R9可獨立地選自1至10個碳原子之飽和及不飽和單價烴基。各R10可為具有至少11個碳原子之飽和或不飽和
單價烴基。
金屬填料可藉由諸如十八烷基硫醇及其他之烷基硫醇,及諸如油酸、硬脂酸之脂肪酸,鈦酸酯,鈦酸酯偶聯劑,鋯酸酯偶聯劑及其組合處理。
針對氧化鋁或鈍化氮化鋁之處理劑可包括具有烷氧基矽烷基官能基之烷基甲基聚矽氧烷(例如,R11 OR12 pSi(OR13)(4-o-p)之部分水解縮合物或共水解縮合物或混合物),或其中該可水解基團可包括矽氮烷、醯氧基或肟基之類似材料。所有該等中附接至Si之基團(諸如上式中之R11)為長鏈不飽和單價烴或具單價芳族官能基之烴。各R12獨立地為單價烴基,及各R13獨立地為1至4個碳原子之單價烴基。上式中,下標o為1、2或3及下標p為0、1或2,且限制條件為o+p總和為1、2或3。熟習相關技藝者可採用最適當之特定處理法,無需進行過度實驗即有助於分散填料。
組份(I)為黏著促進劑。適宜之黏著促進劑可包括式R14 qSi(OR15)(4-q)之烷氧矽烷,其中下標q為1、2或3,或者q為3。各R14獨立地為單價有機官能基。R14可為諸如縮水甘油氧基丙基或(環氧環己基)乙基之環氧官能基,諸如胺基乙基胺基丙基或胺基丙基之胺基官能基,甲基丙烯醯氧基丙基,或不飽和有機基團。各R15獨立地為至少1個碳原子之未經取代飽和烴基。R15可具有1至4個碳原子,或者1至2個碳原子。R15之實例為甲基、乙基、正丙基及異丙
基。
適宜黏著促進劑之實例包括縮水甘油氧基丙基三甲氧基矽烷及縮水甘油氧基丙基三甲氧基矽烷與鋁螯合物或鋯螯合物之組合。針對矽氫化可固化組合物之黏著促進劑之實例可參見於美國專利案4,087,585及美國專利案5,194,649中。該可固化組合物可包含以組合物之重量計0.5%至5%之黏著促進劑。
組份(J)為諸如溶劑或稀釋劑之媒劑。組份(J)可在製備組合物期間添加,例如,以助於混合及遞送。可視情況在製得組合物之後移除全部或一部分組份(J)。
組份(K)為表面活性劑。適宜之表面活性劑包括聚矽氧聚醚、環氧乙烷聚合物、環氧丙烷聚合物、環氧乙烷與環氧丙烷之共聚物、其他非離子表面活性劑及其組合。組合物可包含以組合物之重量計至多0.05%之表面活性劑。
組份(L)為助焊劑。組合物可包含以組合物之重量計至多2%之助焊劑。可使用含化學活性官能基之分子諸如羧酸及胺作為助焊劑。該等助焊劑可包括脂族酸,諸如琥珀酸、松香酸、油酸及己二酸;芳族酸,諸如苯甲酸;脂族胺及其衍生物,諸如三乙醇胺、胺之鹽酸鹽及胺之氫溴酸鹽。助焊劑係相關技藝中習知且可自市面獲得。
組份(M)為酸受體。適宜之酸受體包括氧化鎂、氧化鈣及其組合。組合物可包含以組合物之重量計至多2%之組份(M)。
組份(N)為防止可固化組合物提早固化之矽氫化穩定劑。為了調整固化速度及改良工業條件下組合物之操作,該組合物可進一步組合使用炔醇、烯炔化合物、苯并三唑、胺(諸如四甲基乙二胺)、富馬酸二烷酯、富馬酸二烯基酯、富馬酸二烷氧基烷酯、馬來酸酯(諸如馬來酸二烯丙基酯)及其組合。或者,該穩定劑可包括炔醇。該等化合物之具體實例如下:諸如2-甲基-3-丁炔-2-醇、3-甲基-1-丁炔-3-醇、3,5-二甲基-1-己炔-3-醇、2-苯基-3-丁炔-2-醇、3-苯基-1-丁炔-3-醇、1-乙炔基-1-環己醇、1,1-二甲基-2-丙炔基)氧基)三甲基矽烷、甲基(叁(1,1-二甲基-2-丙炔基氧基))矽烷,或類似炔型化合物;3-甲基-3-戊烯-1-炔、3,5-二甲基-3-己烯-1-炔或類似烯-炔化合物;其他添加劑可包括以肼為主之化合物,以膦為主之化合物,以硫醇為主之化合物,環烯基矽氧烷,諸如:甲基乙烯基環矽氧烷,諸如1,3,5,7-四甲基-1,3,5,7-四乙烯基環四矽氧烷、1,3,5,7-四甲基-1,3,5,7-四己烯基環四矽氧烷、苯并三唑或類似之三唑。矽氫化可固化熱傳導聚矽氧彈性體組合物中該等抑制劑之含量可介於0.0001至5份(以重量計)/100份(以重量計)組份(A)範圍內。適宜之矽氫化固化抑制劑揭示於例如美國專利案3,445,420;3,989,667;4,584,361;及
5,036,117。
組份(O)為另一穩定劑。可添加增塑劑及可穩定組合物對抗熱、UV及其他物理條件之其他已知試劑,進一步增強可固化及已固化組合物之穩定性。
熟習此項相關技藝者咸了解,當選擇適用於上述組合物之組份時,組份類型之間可能會出現重疊情況,因為本文所述之一些組份可能具有一種以上的功能。例如,某些烷氧矽烷可能適用為填料處理劑及黏著促進劑,及諸如脂肪酸酯之某些塑化劑亦可適用為填料處理劑。熟習此項相關技藝者可依據多種因素作出區別並選擇適宜之組份及其用量,該等因素包括該組合物之計劃用途及該組合物是否可製成單組件或多組件組合物。
組合物製法可包括採用諸如於周溫或高溫下混合之任何習知方式,組合所有成分。或者,組合物製法可混合一些組份形成第一混合物(即部份(a))及分開混合其他組份形成第二混合物(即部份(b)),然後於即將固化之前才混合這兩部份。部份(a)及部份(b)均可包含一些相同組份。在該組合物係於高溫下製備時,製備期間之溫度係低於組合物之固化溫度。
當存在成分(H)時,該組合物之製法可視情況採用成分(H)對成分(D)(及成分(G),假若存在)進行表面處理,然後將其產物與組合物之其他成分混合。或者,例如,當成分
(N)不存在或當組合物欲在使用之前儲存一段長時間時,組合物可製成例如:多組件組合物。於多組件組合物中,交聯劑及觸媒係以分開組件之方式儲存,且在即將使用組合物之前才組合該等組件。例如,兩件式可固化聚矽氧組合物之製法可採用諸如混合法之任何習知方法,將包括基質聚合物、觸媒、熱傳導填料及塑化劑之成分與在基質部份中之一或多種額外成分組合。固化劑部份之製法可採用諸如混合法之任何習知方法,將包括交聯劑、基質聚合物、熱傳導填料及塑化劑之成分與一或多種額外成分組合。該等成分可於周溫或高溫下組合,其取決於所選擇之固化機轉。在使用兩件式可固化聚矽氧組合物時,基質對固化劑之用量重量比可為1:1至10:1。熟習此項相關技藝者無需進行過度實驗即可製備該可固化組合物。
調配本文所述該等組合物,以使其在固化時可具有某些如下文所述之所需特性。
該組合物可經調配形成導熱率在0.2至7 W/mK範圍內之固化聚矽氧。熱阻抗性取決於多種因素,包括固化聚矽氧之厚度及針對成分(D)選擇之填料之用量及類型。
上述組合物可經固化形成熱介面材料(TIM)。一種形成TIM之方法可包括:1)沿著介於熱源及散熱器之間之熱通道放置上述組合物,然後2)將該組合物加熱至足以固化該組合物之溫度,因而形成熱介面材料。
步驟1)中,該組合物可施用至熱源(例如,(光)電子組件)後再施用至散熱器、該組合物可施用至散熱器後再施用至熱源、或該組合物可同時施用至熱源及散熱器。
或者,該方法可包括:
1)固化上述組合物,及此後2)沿著介於熱源及散熱器之間之熱通道放置步驟1)之產物。步驟2)中,步驟1)之該產物可施用至熱源(例如,(光)電子組件)後再施用至散熱器、該組合物可施用至散熱器後再施用至熱源、或該組合物可同時施用至熱源及散熱器。該方法可視需要進一步包括在步驟1)之前將組合物施用至支撐物之步驟。該方法之該產物為介面材料。
該介面材料包括:1)藉由固化上述組合物製得固化聚矽氧,其中該固化聚矽氧係形成扁平部件、半球狀點、凸部件、三角錐體或圓錐體。
該組合物可視情況在步驟I)之前施用至支撐物之表面。該支撐物實例為碳纖維格網、金屬箔、多孔金屬箔(格網)、經填充或未經填充之塑膠膜(諸如聚醯胺薄片、聚醯亞胺薄片、聚萘二甲酸乙二酯薄片、聚對苯二甲酸乙二酯聚酯薄片、聚碸薄片、聚醚醯亞胺薄片或聚苯硫醚薄片)、或編織或非編織基材(諸如玻璃纖維布、玻璃纖維格網或芳族聚醯胺紙)。該組合物可塗覆於該支撐物之兩面。該介面材料可進一步包括II)覆蓋該支撐物反面上固化聚矽氧表面之釋離薄片。
於本文所述之方法及裝置中,該熱源可包括(光)電子組
件,諸如發光二極體(LED)、半導體、電晶體、積體電路或離散元件。該散熱器可包括散熱片、熱傳導板、熱傳導覆蓋層、鼓風機、循環冷卻劑系統或其組合。
此等實例係為熟習此項相關技藝者說明本發明,而不應理解為限制述於請求項中之本發明之範圍。以下原料係用以製備該等實例中之樣品。兩件式混合物之部份(a)係藉由混合組份(A)、(C)、(D)及(H)製得。該兩件式混合物之部份(b)係藉由混合組份(A)、(B)、(D)、(H)、(N)及染色用之碳黑顏料製得。組份(A)為黏度在300至1000厘沲(cSt)範圍內之具有乙烯基末端之聚二甲基矽氧烷。組份(B)為具有三甲基末端之聚(二甲基氫矽氧烷)聚合物及分子兩端經二甲基氫矽氧基封端之二甲基聚矽氧烷。組份(C)為含在聚矽氧流體中之鉑觸媒之混合物。組份(D)為平均粒徑2 μm之氧化鋁。組份(H)為正辛基三甲氧基矽烷。添加3,5-二甲基-1-己炔-3-醇作為組份(N)。準備使用時,組合等量之部份(a)及部份(b)。組合此兩部份後之組合物之SiH/Vi比為0.7。氧化鋁顆粒佔組合物之83重量%。觸媒鉑佔該組合物之180 ppm及矽氫化穩定劑佔該組合物之0.005重量%。
實例1之組合物可藉由讓經過組合之組份於125℃下靜置60分鐘後固化,繼而根據硬度計Shore型OO量表(ASTM D 2240)測定並出示固化材料之硬度。該固化材料然後在爐
中維持於恆定溫度環境下長達50天。結果示於圖1中,其顯示該固化材料之硬度變化與老化溫度呈函數關係。在第4、9、17、23、33、46及100天針對維持在50(◆藍)、70(■棕)、90(綠)、120(紫)及150(淺藍)℃環境之批料23178-36測定硬度。該固化材料亦維持在85℃及85%之控制濕度(●,橙,85/85)。如圖1所見,該硬度於高溫下隨時間而增加。表1亦出示數字形式之數據。
除了0.08重量%(相對於最終組合之組合物)之酞菁銅(0.2% Harwick Stan-ToneTM 40SP03(PolyOne,Ohio,USA)藍顏料)係以在固化之前即混合至部份(b)中之方式加至一些樣品之外,其他數個批次之兩件式組合物樣品則依上述製得。經固化之組合物係維持在90℃及120℃下長達37天。在第3、7或8,18或21,及34天時,利用硬度計Shore OO量表測定硬度。表2a至2b出示含有及不含酞菁藍顏料之批料23634-11之該等結果。
圖2亦顯示3種不同製劑23534-11、11A/144B及148A/11B之結果。如表及圖中可見,含酞菁銅之組合物(圖2,+藍,橙圓)在試驗期間,在任一溫度下均仍保留其可撓性質,而不含酞菁銅之組合物(圖2,淺藍)之硬度則增加。
依實例1中所述製備兩件式組合物,但其中氧化鋁填料改為平均粒徑為35 μm之第一類型(56.52重量%)與平均粒徑為2 μm之第二類型之混合物,且SiH/Vi比改為0.7。該組合物亦包含長鏈聚矽氧處理劑(0.15重量%)作為另一組份。關於實例2,添加0.08重量%(相對於最終組合之組合物)之酞菁銅(0.2% Harwick Stan-ToneTM 40SP03(PolyOne,Ohio,USA)藍顏料)至一些樣品中之方式係將其混合至部份(b)中。該固化組合物係維持在90℃及120℃下長達37天。在第2、8、21及37天利用硬度計Shore OO量表測定硬度。表3a至3b出示結果。含酞菁銅之組合物在實驗期間仍保留
其可撓性質,而不含酞菁銅之組合物之硬度則增加。
圖1顯示熱傳導聚有機矽氧烷組合物的硬度變化與老化溫度之函數關係(批料23178-36),其中該硬度在溫度之變化下隨時間增加。
圖2顯示添加酞菁化合物防止硬度增加。
Claims (12)
- 一種凝膠或囊封組合物,其包含:(A)每分子具有平均至少0.1個矽鍵結烯基之有機烷基聚矽氧烷;(B)每分子具有平均至少2個矽鍵結氫原子之聚有機矽氧烷,其中組份(B)中SiH基對組份(A)中脂族不飽和有機基團(SiH:Vi)之莫耳比為1.5:1至0.1:1;(C)用量足以引發組合物(A)及(B)之固化反應之矽氫化反應觸媒;(D)熱傳導填料,其中其用量佔該組合物體積之30%至97%;及(E)選自由不含金屬及含金屬之酞菁化合物組成之群之添加劑,其中該添加劑之用量佔整體組合物之0.01至5.0重量%。
- 如請求項1之組合物,其中該添加劑為含金屬之酞菁化合物。
- 如請求項2之組合物,其中該金屬為銅。
- 如請求項3之組合物,其中該含銅酞菁化合物為29H,31H-肽菁基-(2-)-N29,N30,N31,N32銅。
- 如請求項1之組合物,其中該熱傳導填料係選自氮化鋁、氧化鋁、三水合鋁、鈦酸鋇、氧化鈹、氮化硼、碳纖維、金剛石、石墨、氫氧化鎂、氧化鎂、金屬顆粒、縞瑪瑙(onyx)、碳化矽、碳化鎢、氧化鋅及其組合。
- 一種固化聚矽氧,其係藉由固化如請求項1至5中任一項之組合物而製得。
- 一種熱介面材料,其包含如請求項6之固化聚矽氧。
- 如請求項7之熱介面材料,其中該材料包括塗覆固化聚矽氧之支撐物。
- 如請求項8之熱介面材料,其中該熱介面材料消散熱。
- 一種增加熱傳導有機聚矽氧烷之凝膠或囊封組合物之穩定性之方法,其包括將佔整體組合物之0.01至5.0重量%範圍之酞菁化合物以及佔整體組合物體積之30%至97%之熱傳導填料添加至可固化有機聚矽氧烷組合物中之步驟,其中該可固化有機聚矽氧烷組合物中SiH:Vi之莫耳比為1.5:1至0.1:1。
- 一種自第一組件傳導熱至第二組件之方法,其中該第一組件之溫度高於該第二組件,且使如請求項7之熱介面材料與該第一組件及該第二組件接觸。
- 一種自第一組件消散熱之方法,其中使如請求項9之熱介面材料與該第一組件接觸。
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201161436214P | 2011-01-26 | 2011-01-26 | |
| US61/436,214 | 2011-01-26 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201245338A TW201245338A (en) | 2012-11-16 |
| TWI620797B true TWI620797B (zh) | 2018-04-11 |
Family
ID=45563525
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW101102003A TWI620797B (zh) | 2011-01-26 | 2012-01-18 | 高溫穩定性熱傳導材料 |
Country Status (7)
| Country | Link |
|---|---|
| US (2) | US9598575B2 (zh) |
| EP (1) | EP2668239B1 (zh) |
| JP (1) | JP6048416B2 (zh) |
| KR (1) | KR101866299B1 (zh) |
| CN (2) | CN109401333A (zh) |
| TW (1) | TWI620797B (zh) |
| WO (1) | WO2012102852A1 (zh) |
Families Citing this family (70)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2013052147A1 (en) * | 2011-10-06 | 2013-04-11 | Dow Corning Corporation | Gel having improved thermal stability |
| EP2764055B1 (en) * | 2011-10-06 | 2018-03-21 | Dow Corning Corporation | Method of forming a gel having improved thermal stability |
| US9070660B2 (en) * | 2013-03-15 | 2015-06-30 | Intel Corporation | Polymer thermal interface material having enhanced thermal conductivity |
| WO2014149670A2 (en) | 2013-03-15 | 2014-09-25 | Dow Corning Corporation | Aryl group-containing siloxane compositions including alkaline earth metal |
| JP6205824B2 (ja) * | 2013-04-26 | 2017-10-04 | 富士電機株式会社 | パワーモジュール |
| KR102335293B1 (ko) * | 2013-09-18 | 2021-12-06 | 다우 실리콘즈 코포레이션 | 수지-선형 유기실록산 블록 공중합체의 조성물 |
| CN105899714B (zh) | 2013-12-05 | 2018-09-21 | 霍尼韦尔国际公司 | 具有经调节的pH的甲基磺酸亚锡溶液 |
| JP6411537B2 (ja) * | 2014-03-06 | 2018-10-24 | ヘンケル・アクチェンゲゼルシャフト・ウント・コムパニー・コマンディットゲゼルシャフト・アウフ・アクチェンHenkel AG & Co. KGaA | 単結晶アルミナ充填ダイアタッチペースト |
| EP3166999B1 (en) | 2014-07-07 | 2023-03-08 | Honeywell International Inc. | Thermal interface material with ion scavenger |
| JP6395153B2 (ja) * | 2014-11-04 | 2018-09-26 | 日本タングステン株式会社 | コーティング膜、その製造方法およびコーティング膜形成方法 |
| KR102470083B1 (ko) | 2014-12-05 | 2022-11-23 | 허니웰 인터내셔널 인코포레이티드 | 저열 임피던스를 갖는 고성능 열 계면 재료 |
| CN104497574A (zh) * | 2014-12-10 | 2015-04-08 | 深圳市博恩实业有限公司 | 多功能有机硅热界面材料 |
| US10312177B2 (en) | 2015-11-17 | 2019-06-04 | Honeywell International Inc. | Thermal interface materials including a coloring agent |
| US11686459B2 (en) | 2015-12-15 | 2023-06-27 | Wangs Alliance Corporation | LED lighting methods and apparatus |
| US10941924B2 (en) | 2015-12-15 | 2021-03-09 | Wangs Alliance Corporation | LED lighting methods and apparatus |
| US10208935B2 (en) | 2015-12-15 | 2019-02-19 | Wangs Alliance Corporation | LED lighting apparatus with adjustable beam angle lens |
| US10781349B2 (en) | 2016-03-08 | 2020-09-22 | Honeywell International Inc. | Thermal interface material including crosslinker and multiple fillers |
| US10501671B2 (en) | 2016-07-26 | 2019-12-10 | Honeywell International Inc. | Gel-type thermal interface material |
| US11213409B2 (en) | 2016-08-11 | 2022-01-04 | Willowwood Global Llc | Conductive human interfaces |
| US11464438B2 (en) | 2016-08-11 | 2022-10-11 | Willowwood Global Llc | Conductive human interfaces |
| SG10201607550RA (en) * | 2016-09-09 | 2018-04-27 | 3M Innovative Properties Co | Thermal Interface Material |
| EP3522779B1 (en) | 2016-10-06 | 2022-10-26 | WillowWood Global LLC | Conductive human interfaces comprising electrodes formed using electrically conductive gel |
| JP6702233B2 (ja) * | 2017-03-09 | 2020-05-27 | 信越化学工業株式会社 | 付加硬化型オルガノポリシロキサン樹脂組成物、該組成物の硬化物及び該硬化物を有する半導体装置 |
| JP6941810B2 (ja) * | 2017-04-19 | 2021-09-29 | パナソニックIpマネジメント株式会社 | 樹脂組成物ならびにそれを用いた電子部品および電子機器 |
| US11812525B2 (en) | 2017-06-27 | 2023-11-07 | Wangs Alliance Corporation | Methods and apparatus for controlling the current supplied to light emitting diodes |
| KR102592111B1 (ko) * | 2017-06-27 | 2023-10-20 | 세키수이 폴리머텍 가부시키가이샤 | 열전도성 시트 |
| EP3660099B1 (en) * | 2017-07-24 | 2024-09-11 | Dow Toray Co., Ltd. | Thermally-conductive silicone gel composition, thermally-conductive member, and heat dissipation structure |
| CN111094458B (zh) | 2017-07-24 | 2022-03-29 | 陶氏东丽株式会社 | 导热性硅酮凝胶组合物、导热性部件及散热构造体 |
| CN111051434B (zh) | 2017-07-24 | 2022-03-29 | 陶氏东丽株式会社 | 多成分硬化型导热性硅酮凝胶组合物、导热性部件及散热构造体 |
| US11041103B2 (en) | 2017-09-08 | 2021-06-22 | Honeywell International Inc. | Silicone-free thermal gel |
| JP7264817B2 (ja) | 2017-09-15 | 2023-04-25 | ダウ・東レ株式会社 | 電子部品またはその前駆体、それらの製造方法 |
| WO2019054370A1 (ja) | 2017-09-15 | 2019-03-21 | 東レ・ダウコーニング株式会社 | 硬化性オルガノポリシロキサン組成物およびパターン形成方法 |
| US10344194B2 (en) * | 2017-09-27 | 2019-07-09 | Momentive Performance Materials Inc. | Thermal interface composition comprising ionically modified siloxane |
| US10428256B2 (en) | 2017-10-23 | 2019-10-01 | Honeywell International Inc. | Releasable thermal gel |
| JP6646643B2 (ja) * | 2017-12-14 | 2020-02-14 | 株式会社ノリタケカンパニーリミテド | 感光性組成物とその利用 |
| US11072706B2 (en) | 2018-02-15 | 2021-07-27 | Honeywell International Inc. | Gel-type thermal interface material |
| EP3527615A1 (en) * | 2018-02-16 | 2019-08-21 | Venator Germany GmbH | Thermoconductive filler particles and polymer compositions containing them |
| EP3814426A4 (en) * | 2018-06-27 | 2022-01-26 | Dow Silicones Corporation | THERMAL SPACE CHARGE AND ITS APPLICATION TO A BATTERY MANAGEMENT SYSTEM |
| JP6956697B2 (ja) * | 2018-09-18 | 2021-11-02 | 住友理工株式会社 | シリコーンゴム組成物およびシリコーンゴム架橋体 |
| CN109261207B (zh) * | 2018-09-26 | 2021-05-28 | 合肥国轩高科动力能源有限公司 | 光催化材料及其制法和在废旧锂电池电解液处理中的应用 |
| WO2020080326A1 (ja) * | 2018-10-18 | 2020-04-23 | ダウ・東レ株式会社 | 耐寒性に優れる硬化性オルガノポリシロキサン組成物、パターン形成方法および電子部品等 |
| JP7033047B2 (ja) * | 2018-10-26 | 2022-03-09 | 信越化学工業株式会社 | 熱伝導性シリコーン組成物及びその硬化物 |
| US20210403716A1 (en) * | 2018-12-29 | 2021-12-30 | Dow Global Technologies Llc | Thermally conductive composition containing mgo filler and methods and devices in which said composition is used |
| US11373921B2 (en) | 2019-04-23 | 2022-06-28 | Honeywell International Inc. | Gel-type thermal interface material with low pre-curing viscosity and elastic properties post-curing |
| CN110172250A (zh) * | 2019-05-22 | 2019-08-27 | 平湖阿莱德实业有限公司 | 一种新能源汽车用超低密度高导热填隙界面材料及其制备方法 |
| EP3792305B1 (en) * | 2019-06-24 | 2024-03-27 | Fuji Polymer Industries Co., Ltd. | Heat-tolerant thermally conductive composition and heat-tolerant thermally conductive sheet |
| CN115516060A (zh) * | 2019-11-19 | 2022-12-23 | 汉高股份有限及两合公司 | 热界面材料及其应用方法 |
| US12281783B2 (en) | 2019-12-31 | 2025-04-22 | Lumien Enterprise, Inc. | Electronic module group |
| CN110985903B (zh) | 2019-12-31 | 2020-08-14 | 江苏舒适照明有限公司 | 一种灯模组 |
| US11598517B2 (en) | 2019-12-31 | 2023-03-07 | Lumien Enterprise, Inc. | Electronic module group |
| WO2021161580A1 (ja) | 2020-02-13 | 2021-08-19 | 富士高分子工業株式会社 | 耐熱性シリコーン樹脂組成物及び耐熱性シリコーン樹脂複合材料 |
| KR102560192B1 (ko) * | 2020-03-05 | 2023-07-28 | 다우 실리콘즈 코포레이션 | 전단 담화 열전도성 실리콘 조성물 |
| WO2021179276A1 (en) * | 2020-03-13 | 2021-09-16 | Ddp Specialty Electronic Materials Us, Llc | Thermal interface material comprising magnesium hydroxide |
| CN115210321A (zh) * | 2020-03-16 | 2022-10-18 | 美国陶氏有机硅公司 | 导热有机硅组合物 |
| CN111503556B (zh) | 2020-04-23 | 2020-11-27 | 江苏舒适照明有限公司 | 一种射灯结构 |
| US12195666B2 (en) * | 2020-07-27 | 2025-01-14 | Google Llc | Thermal interface material and method for making the same |
| US12187951B2 (en) | 2020-07-27 | 2025-01-07 | Google Llc | Thermal interface material and method for making the same |
| KR20230071158A (ko) * | 2020-09-23 | 2023-05-23 | 다우 글로벌 테크놀로지스 엘엘씨 | 낮은 분배 점도, 분배 후 낮은 수직 유동 및 경화 후 낮은 열 임피던스를 갖는 열 계면 재료 |
| CN114539781A (zh) * | 2020-11-25 | 2022-05-27 | 深圳先进电子材料国际创新研究院 | 一种导热凝胶及其制备方法 |
| US20240199935A1 (en) * | 2021-04-09 | 2024-06-20 | Dow Toray Co., Ltd. | Curable organopolysiloxane composition, thermally conductive member, and heat dissipation structure |
| US12230950B2 (en) | 2021-07-29 | 2025-02-18 | Lumien Enterprise, Inc. | Junction box |
| US20250109256A1 (en) * | 2021-11-19 | 2025-04-03 | Dow Silicones Corporation | Silicone rubber composition |
| JPWO2023171353A1 (zh) | 2022-03-08 | 2023-09-14 | ||
| KR20240157074A (ko) | 2022-03-08 | 2024-10-31 | 신에쓰 가가꾸 고교 가부시끼가이샤 | 열전도성 부가 경화형 실리콘 조성물 및 그 실리콘 경화물 |
| CN115214202A (zh) * | 2022-04-26 | 2022-10-21 | 北京科技大学 | 一种高导热层状热界面材料及其制备方法 |
| US11802682B1 (en) | 2022-08-29 | 2023-10-31 | Wangs Alliance Corporation | Modular articulating lighting |
| WO2024086138A1 (en) | 2022-10-19 | 2024-04-25 | Dow Silicones Corporation | Liquid silicone rubber composition |
| EP4590758A1 (en) | 2022-10-19 | 2025-07-30 | Dow Silicones Corporation | Liquid silicone rubber composition |
| KR20250086759A (ko) | 2022-10-19 | 2025-06-13 | 다우 실리콘즈 코포레이션 | 액체 실리콘 고무 조성물 |
| WO2025039204A1 (en) * | 2023-08-23 | 2025-02-27 | Dow Silicones Corporation | High temperature stable thermally conductive materials |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5153244A (en) * | 1989-10-31 | 1992-10-06 | Dow Corning Toray Silicone Company, Ltd. | Curable organosiloxane composition yielding elastomers exhibiting reduced compression set values |
| TWI303261B (zh) * | 2001-05-01 | 2008-11-21 | Shinetsu Chemical Co |
Family Cites Families (42)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB731166A (en) * | 1952-05-27 | 1955-06-01 | Midland Silicones Ltd | Improvements in or relating to organosiloxane elastomers |
| GB893399A (en) | 1959-09-24 | 1962-04-11 | Dow Corning | Improvements in or relating to organosiloxane compositions |
| NL129346C (zh) | 1966-06-23 | |||
| US3364161A (en) | 1967-01-19 | 1968-01-16 | Navy Usa | Silicone rubber composition containing corrosion inhibiting curing agent |
| US3989667A (en) | 1974-12-02 | 1976-11-02 | Dow Corning Corporation | Olefinic siloxanes as platinum inhibitors |
| GB1470465A (en) | 1975-01-20 | 1977-04-14 | Int Paint Co | Coated marine surfaces |
| US4087585A (en) | 1977-05-23 | 1978-05-02 | Dow Corning Corporation | Self-adhering silicone compositions and preparations thereof |
| US4370358A (en) | 1980-09-22 | 1983-01-25 | General Electric Company | Ultraviolet curable silicone adhesives |
| JPS61195129A (ja) | 1985-02-22 | 1986-08-29 | Toray Silicone Co Ltd | 有機けい素重合体の製造方法 |
| US4584361A (en) | 1985-06-03 | 1986-04-22 | Dow Corning Corporation | Storage stable, one part polyorganosiloxane compositions |
| JPS62223788A (ja) | 1986-03-26 | 1987-10-01 | 株式会社日立製作所 | デイスプレイ装置 |
| JP2670804B2 (ja) | 1988-05-06 | 1997-10-29 | コスモ石油株式会社 | 塗膜塗料組成物 |
| US5036117A (en) | 1989-11-03 | 1991-07-30 | Dow Corning Corporation | Heat-curable silicone compositions having improved bath life |
| JP3029680B2 (ja) | 1991-01-29 | 2000-04-04 | 東レ・ダウコーニング・シリコーン株式会社 | オルガノペンタシロキサンおよびその製造方法 |
| JP2511348B2 (ja) | 1991-10-17 | 1996-06-26 | 東レ・ダウコーニング・シリコーン株式会社 | オルガノポリシロキサンおよびその製造方法 |
| JP3046484B2 (ja) * | 1993-12-28 | 2000-05-29 | ジーイー東芝シリコーン株式会社 | 安定した電気特性を有するシリコーンゴム組成物 |
| KR20000064867A (ko) | 1997-02-07 | 2000-11-06 | 아이. 데이비드 크로산 | 전도성,수지-기재 조성물 |
| JPH1145965A (ja) * | 1997-07-28 | 1999-02-16 | Kyocera Corp | 伝熱性化合物およびこれを用いた半導体装置 |
| JP3444199B2 (ja) | 1998-06-17 | 2003-09-08 | 信越化学工業株式会社 | 熱伝導性シリコーンゴム組成物及びその製造方法 |
| DE69930855T2 (de) | 1998-07-24 | 2006-11-23 | Sun Microsystems, Inc., Santa Clara | Verfahren und vorrichtung zur durchführung einer deterministischen speicherzuordnungsantwort in einem computer-system |
| JP4727017B2 (ja) * | 1999-11-15 | 2011-07-20 | 東レ・ダウコーニング株式会社 | 熱伝導性シリコーンゴム組成物 |
| US20030207128A1 (en) * | 2000-04-10 | 2003-11-06 | Tomoaki Uchiya | Thermally conductive sheet |
| US20040092655A1 (en) * | 2001-04-02 | 2004-05-13 | Takayoshi Otomo | Mouldable silicone gel compositions |
| US20040195678A1 (en) * | 2001-07-02 | 2004-10-07 | Yoshinao Yamazaki | Thermoconductive composition |
| JP4551074B2 (ja) | 2003-10-07 | 2010-09-22 | 信越化学工業株式会社 | 硬化性オルガノポリシロキサン組成物および半導体装置 |
| JP4413649B2 (ja) * | 2004-03-03 | 2010-02-10 | 日産自動車株式会社 | 放熱構造体及びその製造方法 |
| US20050228097A1 (en) * | 2004-03-30 | 2005-10-13 | General Electric Company | Thermally conductive compositions and methods of making thereof |
| US7655719B2 (en) * | 2004-07-13 | 2010-02-02 | Cool Options, Inc. | Thermally conductive polymer compositions having moderate tensile and flexural properties |
| JP4828146B2 (ja) * | 2005-03-30 | 2011-11-30 | 東レ・ダウコーニング株式会社 | 熱伝導性シリコーンゴム組成物 |
| JP4828145B2 (ja) * | 2005-03-30 | 2011-11-30 | 東レ・ダウコーニング株式会社 | 熱伝導性シリコーンゴム組成物 |
| US20070219312A1 (en) * | 2006-03-17 | 2007-09-20 | Jennifer Lynn David | Silicone adhesive composition and method for preparing the same |
| TWI380325B (en) * | 2006-09-26 | 2012-12-21 | Polytronics Technology Corp | Heat-conductive dielectric polymer composition and heat dissipation substrate containing the same |
| DE102006048575A1 (de) * | 2006-10-13 | 2008-04-17 | Evonik Degussa Gmbh | Oberflächenmodifizierte Kieselsäuren |
| JP4970987B2 (ja) * | 2007-03-08 | 2012-07-11 | 株式会社メニコン | 眼用レンズ材料用シリコーンインク組成物 |
| EP2183312A1 (en) * | 2007-08-31 | 2010-05-12 | Cabot Corporation | Thermal interface materials |
| JP4572243B2 (ja) | 2008-03-27 | 2010-11-04 | 信越化学工業株式会社 | 熱伝導性積層体およびその製造方法 |
| JP5329114B2 (ja) | 2008-03-31 | 2013-10-30 | 株式会社ジーシー | 歯科用シリコーン系適合試験材組成物 |
| KR20110133608A (ko) * | 2009-03-12 | 2011-12-13 | 다우 코닝 코포레이션 | 열계면 물질 및 이의 제조 및 사용을 위한 방법 |
| JP5538872B2 (ja) * | 2009-12-24 | 2014-07-02 | 東レ・ダウコーニング株式会社 | シリコーンエラストマー組成物 |
| JP5783128B2 (ja) | 2012-04-24 | 2015-09-24 | 信越化学工業株式会社 | 加熱硬化型熱伝導性シリコーングリース組成物 |
| JP5947267B2 (ja) | 2013-09-20 | 2016-07-06 | 信越化学工業株式会社 | シリコーン組成物及び熱伝導性シリコーン組成物の製造方法 |
| EP3150672B1 (en) | 2015-10-02 | 2018-05-09 | Shin-Etsu Chemical Co., Ltd. | Thermal conductive silicone composition and semiconductor device |
-
2012
- 2012-01-10 KR KR1020137019092A patent/KR101866299B1/ko active Active
- 2012-01-10 EP EP12702642.5A patent/EP2668239B1/en active Active
- 2012-01-10 WO PCT/US2012/020699 patent/WO2012102852A1/en not_active Ceased
- 2012-01-10 JP JP2013551984A patent/JP6048416B2/ja active Active
- 2012-01-10 US US13/990,446 patent/US9598575B2/en active Active
- 2012-01-10 CN CN201811365168.7A patent/CN109401333A/zh active Pending
- 2012-01-10 CN CN2012800052058A patent/CN103298887A/zh active Pending
- 2012-01-18 TW TW101102003A patent/TWI620797B/zh active
-
2017
- 2017-02-22 US US15/439,644 patent/US10000680B2/en active Active
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5153244A (en) * | 1989-10-31 | 1992-10-06 | Dow Corning Toray Silicone Company, Ltd. | Curable organosiloxane composition yielding elastomers exhibiting reduced compression set values |
| TWI303261B (zh) * | 2001-05-01 | 2008-11-21 | Shinetsu Chemical Co |
Also Published As
| Publication number | Publication date |
|---|---|
| US20130248163A1 (en) | 2013-09-26 |
| EP2668239A1 (en) | 2013-12-04 |
| WO2012102852A1 (en) | 2012-08-02 |
| US9598575B2 (en) | 2017-03-21 |
| KR20140007823A (ko) | 2014-01-20 |
| CN103298887A (zh) | 2013-09-11 |
| EP2668239B1 (en) | 2018-08-15 |
| US10000680B2 (en) | 2018-06-19 |
| JP2014503680A (ja) | 2014-02-13 |
| JP6048416B2 (ja) | 2016-12-21 |
| US20170158937A1 (en) | 2017-06-08 |
| TW201245338A (en) | 2012-11-16 |
| CN109401333A (zh) | 2019-03-01 |
| KR101866299B1 (ko) | 2018-06-12 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| TWI620797B (zh) | 高溫穩定性熱傳導材料 | |
| CN102341459B (zh) | 热界面材料和它们的制备与使用方法 | |
| TWI851537B (zh) | 導熱性聚矽氧凝膠組合物、導熱性構件及散熱結構體 | |
| CN112805334B (zh) | 导热组合物以及使用所述组合物的方法和装置 | |
| CN101544089B (zh) | 导热层压材料及其制造方法 | |
| TWI779092B (zh) | 導熱組成物 | |
| CN104822790A (zh) | 制造电子器件的方法 | |
| TW201908459A (zh) | 導熱性聚矽氧凝膠組合物、導熱性構件及散熱結構體 | |
| CN102159647A (zh) | 液体小片粘合剂 | |
| CN112867765B (zh) | 导热性有机硅组合物及其固化物 | |
| WO2012173167A1 (en) | Cross-linkable silicone composition and cross-linked product thereof | |
| WO2022038888A1 (ja) | 硬化性オルガノポリシロキサン組成物、熱伝導性部材および放熱構造体 | |
| TWI831858B (zh) | 加成硬化型聚矽氧樹脂組成物、其硬化物,及光半導體裝置 | |
| TW202313855A (zh) | 導熱性矽酮組成物 | |
| TW202509181A (zh) | 高溫穩定導熱材料 |