TWI620258B - Package structure and its process - Google Patents
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- TWI620258B TWI620258B TW106107678A TW106107678A TWI620258B TW I620258 B TWI620258 B TW I620258B TW 106107678 A TW106107678 A TW 106107678A TW 106107678 A TW106107678 A TW 106107678A TW I620258 B TWI620258 B TW I620258B
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Abstract
本發明提供一種封裝製程,其包括以下步驟:於載板上堆疊多個晶片;於載板上形成封裝層以包覆多個晶片;於封裝層中形成相互分離的多個接觸開口,並於封裝層的多個接觸開口中形成多個接觸導體,其中多個接觸導體相互分離且分別與相對應的晶片電性連接;將線路基板連接於封裝層以及多個接觸導體上,其中線路基板包括多個連接墊,多個連接墊相互分離且分別與相對應的接觸導體電性連接。此外,本發明還提供一種封裝結構。The invention provides a packaging process, which includes the following steps: stacking a plurality of wafers on a carrier board; forming a packaging layer on the carrier board to cover the plurality of wafers; forming a plurality of contact openings separated from each other in the packaging layer, and A plurality of contact conductors are formed in the plurality of contact openings of the packaging layer, wherein the plurality of contact conductors are separated from each other and are electrically connected to the corresponding wafers respectively; the circuit substrate is connected to the packaging layer and the plurality of contact conductors, where the circuit substrate includes A plurality of connection pads, and the plurality of connection pads are separated from each other and are respectively electrically connected to corresponding contact conductors. In addition, the present invention also provides a packaging structure.
Description
本發明是有關於一種半導體結構及其製程,且特別是有關於一種封裝結構及其製程。The invention relates to a semiconductor structure and a manufacturing process thereof, and more particularly to a packaging structure and a manufacturing process thereof.
在現有的多晶片封裝結構中,多個堆疊於線路基板上的晶片通常是透過多條焊線(bonding wires)以使得晶片與線路基板電性連接。一般而言,藉由打線機(wire bonder)所形成的細長焊線通常會面臨阻值較高的問題,進而影響封裝結構的整體效能。此外,為了保護焊線,通常須於線路載板上形成包覆晶片與焊線的封裝層,而在形成封裝層的過程中,較長的焊線會面臨嚴重的甩線(wire sweeping)問題,且甩現問題容易造成斷線、塌線、短路等現象。再者,為了防止焊線暴露於封裝結構之外,封裝層必須具備一定的厚度,使得封裝結構的體積難以降低。因此,如何提升封裝結構的信賴性以及減少封裝結構的體積,實為目前研發人員亟待解決的議題之一。In the existing multi-chip package structure, a plurality of chips stacked on a circuit substrate are usually passed through a plurality of bonding wires to electrically connect the chip to the circuit substrate. Generally speaking, a slender solder wire formed by a wire bonder usually faces a problem of high resistance value, which affects the overall performance of the package structure. In addition, in order to protect the bonding wire, it is usually necessary to form an encapsulation layer covering the wafer and the bonding wire on the circuit carrier board. In the process of forming the packaging layer, the longer bonding wire will face serious wire sweeping problems. , And the problem of dumping is easy to cause disconnection, collapse, short circuit and other phenomena. Furthermore, in order to prevent the bonding wires from being exposed outside the packaging structure, the packaging layer must have a certain thickness, making it difficult to reduce the volume of the packaging structure. Therefore, how to improve the reliability of the packaging structure and reduce the volume of the packaging structure is really one of the issues that researchers currently need to solve.
本發明提供一種具有良好信賴性的封裝結構及其製程。The invention provides a packaging structure with good reliability and a manufacturing process thereof.
本發明的一實施例提供一種封裝製程,其包括以下步驟。於載板上堆疊多個晶片。於載板上形成封裝層以包覆多個晶片。於封裝層中形成相互分離的多個接觸開口,並於封裝層的多個接觸開口中形成多個接觸導體,其中多個接觸導體相互分離且分別與相對應的晶片電性連接。將線路基板連接於封裝層以及多個接觸導體上,其中線路基板包括多個連接墊,多個連接墊相互分離且分別與相對應的接觸導體電性連接。An embodiment of the present invention provides a packaging process, which includes the following steps. Multiple wafers are stacked on a carrier board. An encapsulation layer is formed on a carrier board to cover a plurality of wafers. A plurality of contact openings separated from each other are formed in the packaging layer, and a plurality of contact conductors are formed in the plurality of contact openings of the packaging layer. The plurality of contact conductors are separated from each other and are electrically connected to the corresponding wafers, respectively. The circuit substrate is connected to the packaging layer and the plurality of contact conductors. The circuit substrate includes a plurality of connection pads, and the plurality of connection pads are separated from each other and electrically connected to the corresponding contact conductors, respectively.
本發明的另一實施例提供一種封裝結構,其包括線路基板、多個晶片、封裝層以及多個接觸導體。線路基板包括多個連接墊。多個晶片堆疊於線路基板上,其中每一晶片包括焊墊。封裝層位於線路基板上且包覆多個晶片。多個接觸導體位於封裝層中,其中多個接觸導體相互分離且分別與相對應的連接墊及相對應的焊墊電性連接,其中多個晶片的主動面朝向線路基板。Another embodiment of the present invention provides a packaging structure including a circuit substrate, a plurality of chips, a packaging layer, and a plurality of contact conductors. The circuit substrate includes a plurality of connection pads. A plurality of wafers are stacked on the circuit substrate, and each wafer includes a bonding pad. The packaging layer is located on the circuit substrate and covers a plurality of chips. A plurality of contact conductors are located in the packaging layer, wherein the plurality of contact conductors are separated from each other and are electrically connected to the corresponding connection pads and the corresponding solder pads, respectively, and the active surfaces of the plurality of chips face the circuit substrate.
為讓本發明的上述特徵和優點能更明顯易懂,下文特舉實施例,並配合所附圖式作詳細說明如下。In order to make the above features and advantages of the present invention more comprehensible, embodiments are hereinafter described in detail with reference to the accompanying drawings.
圖1為本發明一實施例於載板上設置晶片的俯視圖。圖2A至圖2E為依照本發明一實施例的封裝製程的剖面示意圖。請參照圖1,於載板100上堆疊多個晶片102,其中每一晶片102包括焊墊104。在本實施例中,載板100上有對位點100a、100b,使得晶片102可準確地設置於載板100上,但本發明不以此為限。請參照圖2A,晶片102沿著第一方向D1堆疊於載板100上,且在相鄰的兩個晶片102之中,較上層的晶片102沿第二方向D2偏移一距離S,使得較下層的晶片102的焊墊104被暴露出來。在一實施例中,偏移的距離S例如是大於焊墊104的寬度W,但本發明不以此為限,只要偏移的距離S足夠暴露出焊墊104即可。FIG. 1 is a top view of a wafer disposed on a carrier board according to an embodiment of the present invention. 2A to 2E are schematic cross-sectional views of a packaging process according to an embodiment of the present invention. Referring to FIG. 1, a plurality of wafers 102 are stacked on a carrier board 100, wherein each wafer 102 includes a bonding pad 104. In this embodiment, there are alignment points 100a and 100b on the carrier board 100, so that the wafer 102 can be accurately set on the carrier board 100, but the invention is not limited thereto. Referring to FIG. 2A, the wafers 102 are stacked on the carrier board 100 in the first direction D1, and among the two adjacent wafers 102, the wafers 102 on the upper layer are offset by a distance S in the second direction D2, so that The pads 104 of the lower wafer 102 are exposed. In an embodiment, the offset distance S is, for example, greater than the width W of the bonding pad 104, but the present invention is not limited thereto, as long as the offset distance S is sufficient to expose the bonding pad 104.
載板100的材料例如是玻璃、聚醯亞胺(Polyimide,PI)或其組合。焊墊104的材料例如是金屬,如銅、鋁、金、銀、鎳、鈀或其組合。The material of the carrier plate 100 is, for example, glass, polyimide (PI), or a combination thereof. The material of the bonding pad 104 is, for example, a metal, such as copper, aluminum, gold, silver, nickel, palladium, or a combination thereof.
另外,為了提升晶片102與載板100之間的附著力,在載板100上堆疊多個晶片102之前,還可對載板100進行表面處理,以增加載板100的表面粗糙度,使得載板100的摩擦係數(friction coefficient)能夠提升,故接觸於載板100的晶片102可穩定地固定於載板100上,而不需藉由額外的黏晶材料將此晶片102固定於載板100上。舉例來說,可藉由電漿對載板100進行表面處理,以適當地提升載板100的表面粗糙度。In addition, in order to improve the adhesion between the wafer 102 and the carrier board 100, before the plurality of wafers 102 are stacked on the carrier board 100, the carrier board 100 may be surface-treated to increase the surface roughness of the carrier board 100 so that the carrier board 100 The friction coefficient of the plate 100 can be improved, so the wafer 102 contacting the carrier plate 100 can be stably fixed on the carrier plate 100 without fixing the wafer 102 to the carrier plate 100 with an additional sticky crystal material. on. For example, the surface of the carrier board 100 may be surface-treated by a plasma to appropriately improve the surface roughness of the carrier board 100.
除此之外,為了提升相鄰的兩個晶片102之間的附著力,還可於相鄰的兩個晶片102之間設置黏著層106,使得晶片102能穩定地堆疊於載板100上。在一實施例中,在相鄰的兩個晶片102之中,於遠離載板100的晶片102的背面102B形成用以黏接靠近載板100的晶片102的黏著層106,此黏著層106部分覆蓋於靠近載板100的晶片102的主動面102A上,使得焊墊104不會被黏著層106所覆蓋。黏著層106例如是晶粒貼附膜(die attach film,DAF),但本發明不以此為限。上述的晶片102的背面102B相對於晶片102主動面102A的表面。In addition, in order to improve the adhesion between two adjacent wafers 102, an adhesive layer 106 may be provided between the two adjacent wafers 102 so that the wafers 102 can be stably stacked on the carrier board 100. In one embodiment, an adhesive layer 106 is formed on the back surface 102B of the wafer 102 far from the carrier board 100 between two adjacent wafers 102, and the adhesive layer 106 is partially Covered on the active surface 102A of the wafer 102 near the carrier board 100 so that the bonding pad 104 is not covered by the adhesive layer 106. The adhesive layer 106 is, for example, a die attach film (DAF), but the invention is not limited thereto. The back surface 102B of the wafer 102 described above faces the active surface 102A of the wafer 102.
請參照圖2B,於載板100上形成封裝層108以包覆多個晶片102。在一實施例中,封裝層108包括第一部分108a以及與第一部分108a連接的第二部分108b。舉例來說,分界線X將封裝層108劃分為覆蓋於晶片102的主動面102A上的第一部分108a以及位於載板100與晶片102之間的第二部分108b。換句話說,封裝層108的第一部分108a覆蓋於晶片102的焊墊104上;而封裝層108的第二部分108b以及載板100則覆蓋於晶片102的背面102B。形成封裝層108的方法例如是包覆型模製製程(over mold)。封裝層108的材料例如是環氧化合物(epoxy)或其他合適的介電材料。Referring to FIG. 2B, an encapsulation layer 108 is formed on the carrier board 100 to cover a plurality of wafers 102. In one embodiment, the encapsulation layer 108 includes a first portion 108a and a second portion 108b connected to the first portion 108a. For example, the boundary line X divides the packaging layer 108 into a first portion 108 a covering the active surface 102A of the chip 102 and a second portion 108 b located between the carrier board 100 and the chip 102. In other words, the first portion 108 a of the encapsulation layer 108 covers the bonding pad 104 of the chip 102; and the second portion 108 b of the encapsulation layer 108 and the carrier board 100 cover the back surface 102B of the chip 102. A method of forming the encapsulation layer 108 is, for example, an over mold. The material of the encapsulation layer 108 is, for example, epoxy or other suitable dielectric materials.
接著,於封裝層108中形成相互分離的多個接觸開口110,以暴露每一晶片102的焊墊104。換句話說,接觸開口110形成於封裝層108的第一部分108a。在一些實施例中,接觸開口110例如是藉由雷射鑽孔的方式形成於封裝層108的第一部分108a中。在另一些實施例中,接觸開口110也可以轉移模製(transfer molding)的方式形成於封裝層108的第一部分108a中。Then, a plurality of contact openings 110 separated from each other are formed in the encapsulation layer 108 to expose the bonding pads 104 of each wafer 102. In other words, the contact opening 110 is formed in the first portion 108 a of the encapsulation layer 108. In some embodiments, the contact opening 110 is formed in the first portion 108 a of the encapsulation layer 108 by laser drilling, for example. In other embodiments, the contact opening 110 may also be formed in the first portion 108 a of the encapsulation layer 108 in a transfer molding manner.
請參照圖2C,於多個接觸開口110中填入導電材料以形成多個接觸導體112,其中接觸導體112分別電性連接於相對應之晶片102。也就是說,接觸導體112相互分離地嵌於封裝層108的第一部分108a中,且分別與相對應之晶片102的焊墊104電性連接。在一些實施例中,形成接觸導體112的方法例如是藉由物理氣相沈積(physical vapor deposition,PVD)的方式,將導電材料填入接觸開口110中,以形成接觸導體112。在另一些實施例中,形成接觸導體112的方法還可例如是先於接觸開口110的表面形成晶種層(未繪示),再藉由鍍覆(plating)(例如,電鍍(electroplating)或無電電鍍(electroless plating)等)或濺鍍(sputtering)的方式,將導電材料形成於晶種層上並且填入接觸開口110中,以形成接觸導體112。接觸導體112的材料例如是銅,但本發明不以此為限。Referring to FIG. 2C, a plurality of contact openings 110 are filled with a conductive material to form a plurality of contact conductors 112, wherein the contact conductors 112 are respectively electrically connected to corresponding wafers 102. That is, the contact conductors 112 are embedded in the first portion 108 a of the encapsulation layer 108 separately from each other, and are respectively electrically connected to the corresponding pads 104 of the chip 102. In some embodiments, the method of forming the contact conductor 112 is, for example, filling a conductive material into the contact opening 110 by physical vapor deposition (PVD) to form the contact conductor 112. In other embodiments, the method of forming the contact conductor 112 may be, for example, forming a seed layer (not shown) before the surface of the contact opening 110, and then performing plating (for example, electroplating or electroplating) Electroless plating, etc.) or sputtering, a conductive material is formed on the seed layer and filled into the contact opening 110 to form the contact conductor 112. The material of the contact conductor 112 is, for example, copper, but the invention is not limited thereto.
請參照圖2D,將線路基板114連接於封裝層108以及接觸導體112上,其中線路基板114包括多個連接墊116,連接墊116相互分離且分別與相對應的接觸導體112電性連接,以於載板100上形成封裝結構118。也就是說,封裝結構118中的接觸導體112可穩定地與晶片102以及線路基板114電性連接,使得此封裝結構118具有良好的信賴性。在一實施例中,晶片102的主動面102A朝向線路基板114,使得接觸導體112的長度L可以最佳化。如此一來,封裝結構118不僅具有良好的電性表現,其尺寸亦能達到微型化設計。舉例來說,接觸導體112可以是垂直於線路基板114以及載板100的導電柱,使得封裝結構118具有良好的電性表現及微型化尺寸。上述的接觸導體112的長度L為接觸導體112沿著第一方向D1沿伸的長度L,其中依據每一晶片102的焊墊104與相對應線路基板114的連接墊116的距離,每一接觸導體112會有不同的長度L。Referring to FIG. 2D, the circuit substrate 114 is connected to the encapsulation layer 108 and the contact conductor 112. The circuit substrate 114 includes a plurality of connection pads 116. The connection pads 116 are separated from each other and are electrically connected to the corresponding contact conductors 112, respectively. A packaging structure 118 is formed on the carrier board 100. In other words, the contact conductor 112 in the package structure 118 can be electrically connected to the chip 102 and the circuit substrate 114 stably, so that the package structure 118 has good reliability. In one embodiment, the active surface 102A of the chip 102 faces the circuit substrate 114 so that the length L of the contact conductor 112 can be optimized. In this way, the package structure 118 not only has good electrical performance, but also achieves a miniaturized design. For example, the contact conductor 112 may be a conductive pillar perpendicular to the circuit substrate 114 and the carrier board 100, so that the package structure 118 has good electrical performance and miniaturization size. The length L of the above-mentioned contact conductor 112 is the length L of the contact conductor 112 extending along the first direction D1, wherein according to the distance between the bonding pad 104 of each chip 102 and the connection pad 116 of the corresponding circuit substrate 114, each contact The conductors 112 will have different lengths L.
請參照圖2E,令多個晶片102以及封裝層108與載板100分離,使得最遠離線路基板114的晶片102被裸露出來。接著,轉置封裝結構118。在一實施例中,最遠離線路基板114的晶片102的背面102B被裸露出來,使得封裝結構118具有較佳的散熱效果。換句話說,本實施例不需經由額外的研磨(grinding)製程,即可暴露最遠離線路基板114的晶片102,因此,可避免如過度研磨導致晶片102受損或是研磨不足導致散熱效果不良的問題,使得封裝結構具有良好的信賴性。Referring to FIG. 2E, the plurality of wafers 102 and the packaging layer 108 are separated from the carrier board 100 so that the wafer 102 farthest from the circuit substrate 114 is exposed. Then, the package structure 118 is transposed. In one embodiment, the back surface 102B of the wafer 102 farthest from the circuit substrate 114 is exposed, so that the package structure 118 has better heat dissipation effect. In other words, in this embodiment, the wafer 102 farthest from the circuit substrate 114 can be exposed without an additional grinding process. Therefore, damage to the wafer 102 due to excessive grinding or poor heat dissipation due to insufficient grinding can be avoided. Problems, making the package structure have good reliability.
請繼續參照圖2E,封裝結構118包括線路基板114、多個晶片102、封裝層108以及多個接觸導體112。線路基板114包括多個連接墊116。晶片102堆疊於線路基板114上,其中每一晶片102包括焊墊104。封裝層108位於線路基板114上且包覆晶片102。接觸導體114位於封裝層108中,其中多個接觸導體114相互分離且分別與相對應的連接墊116及相對應的焊墊104電性連接,其中晶片102的主動面102A朝向線路基板114。在一實施例中,封裝層108包括第一部分108a以及與第一部分108a連接的第二部分108b。第一部分108a位於晶片102與電路載板114之間,且第二部分108b覆蓋晶片102,其中接觸導體112嵌於第一部分108a中。Please continue to refer to FIG. 2E, the package structure 118 includes a circuit substrate 114, a plurality of chips 102, a package layer 108, and a plurality of contact conductors 112. The circuit substrate 114 includes a plurality of connection pads 116. The wafers 102 are stacked on the circuit substrate 114, wherein each wafer 102 includes a bonding pad 104. The encapsulation layer 108 is located on the circuit substrate 114 and covers the wafer 102. The contact conductors 114 are located in the encapsulation layer 108. The plurality of contact conductors 114 are separated from each other and are electrically connected to the corresponding connection pads 116 and the corresponding solder pads 104. The active surface 102A of the chip 102 faces the circuit substrate 114. In one embodiment, the encapsulation layer 108 includes a first portion 108a and a second portion 108b connected to the first portion 108a. The first portion 108a is located between the wafer 102 and the circuit carrier board 114, and the second portion 108b covers the wafer 102, and the contact conductor 112 is embedded in the first portion 108a.
綜上所述,上述實施例所述的封裝結構及其製程是先於載板上形成包覆多個晶片的封裝層,再於封裝層中形成接觸導體,使得接觸導體可穩定地形成於封裝層中,故封裝結構具有良好的信賴性。並且,在上述實施例所述的封裝結構中,晶片的主動面朝向線路基板,使得接觸導體的長度可以最佳化,因此,封裝結構不僅具有良好的電性表現,其尺寸亦能達到微型化設計。To sum up, the package structure and the manufacturing process described in the above embodiments are formed by forming a packaging layer covering a plurality of wafers on a carrier board, and then forming a contact conductor in the packaging layer, so that the contact conductor can be stably formed in the package. Layer, so the package structure has good reliability. Moreover, in the package structure described in the above embodiment, the active surface of the chip faces the circuit substrate, so that the length of the contact conductor can be optimized. Therefore, the package structure not only has good electrical performance, but its size can also be miniaturized. design.
雖然本發明已以實施例揭露如上,然其並非用以限定本發明,任何所屬技術領域中具有通常知識者,在不脫離本發明的精神和範圍內,當可作些許的更動與潤飾,故本發明的保護範圍當視後附的申請專利範圍所界定者為準。Although the present invention has been disclosed as above with the examples, it is not intended to limit the present invention. Any person with ordinary knowledge in the technical field can make some modifications and retouching without departing from the spirit and scope of the present invention. The protection scope of the present invention shall be determined by the scope of the attached patent application.
100‧‧‧載板100‧‧‧ Carrier Board
100a、100b‧‧‧對位點100a, 100b‧‧‧
102‧‧‧晶片102‧‧‧Chip
102A‧‧‧主動面 102A‧‧‧ Active side
102B‧‧‧背面 102B‧‧‧Back
104‧‧‧焊墊 104‧‧‧pad
106‧‧‧黏著層 106‧‧‧ Adhesive layer
108‧‧‧封裝層 108‧‧‧ Packaging
108a‧‧‧第一部分 108a‧‧‧Part I
108b‧‧‧第二部分 108b‧‧‧Part II
110‧‧‧接觸開口 110‧‧‧ contact opening
112‧‧‧接觸導體 112‧‧‧contact conductor
114‧‧‧線路基板 114‧‧‧circuit board
116‧‧‧連接墊 116‧‧‧Connecting pad
118‧‧‧封裝結構 118‧‧‧Packaging Structure
D1‧‧‧第一方向 D1‧‧‧ first direction
D2‧‧‧第二方向 D2‧‧‧ Second direction
S‧‧‧距離 S‧‧‧distance
W‧‧‧寬度 W‧‧‧Width
L‧‧‧長度 L‧‧‧ length
X‧‧‧分界線 X‧‧‧ dividing line
圖1為本發明一實施例於載板上設置晶片的俯視圖。 圖2A至圖2E為依照本發明一實施例的封裝製程的剖面示意圖。FIG. 1 is a top view of a wafer disposed on a carrier board according to an embodiment of the present invention. 2A to 2E are schematic cross-sectional views of a packaging process according to an embodiment of the present invention.
Claims (8)
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| TW106107678A TWI620258B (en) | 2017-03-09 | 2017-03-09 | Package structure and its process |
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| TW106107678A TWI620258B (en) | 2017-03-09 | 2017-03-09 | Package structure and its process |
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| TWI620258B true TWI620258B (en) | 2018-04-01 |
| TW201834090A TW201834090A (en) | 2018-09-16 |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US11158608B2 (en) | 2019-09-25 | 2021-10-26 | Powertech Technology Inc. | Semiconductor package including offset stack of semiconductor dies between first and second redistribution structures, and manufacturing method therefor |
| JP2022002249A (en) * | 2020-06-19 | 2022-01-06 | キオクシア株式会社 | Semiconductor device and manufacturing method thereof |
| JP2022098115A (en) * | 2020-12-21 | 2022-07-01 | キオクシア株式会社 | Semiconductor device and method for manufacturing the same |
| US12266649B2 (en) | 2022-05-12 | 2025-04-01 | Nanya Technology Corporation | Method for manufacturing semiconductor device with substrate for electrical connection |
| TWI847177B (en) * | 2022-05-12 | 2024-07-01 | 南亞科技股份有限公司 | Semiconductor device with substrate for electrical connection |
| US12341123B2 (en) | 2022-05-12 | 2025-06-24 | Nanya Technology Corporation | Semiconductor device having a bonding wire in a hole in the substrate |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20070284139A1 (en) * | 2006-06-10 | 2007-12-13 | Chee Keong Chin | Sawn integrated circuit package system |
| TW200820394A (en) * | 2006-10-31 | 2008-05-01 | Powertech Technology Inc | Stacked-chip package structure |
| TW201005913A (en) * | 2008-07-17 | 2010-02-01 | Powertech Technology Inc | BGA package stacked with multiple substrates |
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2017
- 2017-03-09 TW TW106107678A patent/TWI620258B/en active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20070284139A1 (en) * | 2006-06-10 | 2007-12-13 | Chee Keong Chin | Sawn integrated circuit package system |
| TW200820394A (en) * | 2006-10-31 | 2008-05-01 | Powertech Technology Inc | Stacked-chip package structure |
| TW201005913A (en) * | 2008-07-17 | 2010-02-01 | Powertech Technology Inc | BGA package stacked with multiple substrates |
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