[go: up one dir, main page]

TWI618165B - Wafer detection device and detection method of the same - Google Patents

Wafer detection device and detection method of the same Download PDF

Info

Publication number
TWI618165B
TWI618165B TW105143545A TW105143545A TWI618165B TW I618165 B TWI618165 B TW I618165B TW 105143545 A TW105143545 A TW 105143545A TW 105143545 A TW105143545 A TW 105143545A TW I618165 B TWI618165 B TW I618165B
Authority
TW
Taiwan
Prior art keywords
wafer
carrier
wafers
bracket
dial
Prior art date
Application number
TW105143545A
Other languages
Chinese (zh)
Other versions
TW201824414A (en
Inventor
黃浚維
林春全
戴展祺
張家維
林弘杰
游家源
Original Assignee
中美矽晶製品股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 中美矽晶製品股份有限公司 filed Critical 中美矽晶製品股份有限公司
Priority to TW105143545A priority Critical patent/TWI618165B/en
Application granted granted Critical
Publication of TWI618165B publication Critical patent/TWI618165B/en
Publication of TW201824414A publication Critical patent/TW201824414A/en

Links

Landscapes

  • Testing Or Measuring Of Semiconductors Or The Like (AREA)

Abstract

一種晶片檢測裝置,其包括有:一支架;一承載件,用以裝載複數個晶片;一撥動件,具有可撓性,該撥動件係設置於該支架上;以及一位移機構,與該支架及該承載件的其中之一者連接,用以使該支架與該承載件之間產生相對位移,以使得該撥動件接觸各該晶片的邊緣。其晶片檢測方法在於:移動該撥動件及該承載件的其中之一者,使得該撥動件與該承載件之間於該第一方向上產生相對位移,以使得該撥動件依序接觸各該晶片的邊緣;藉以,透過該撥動件以接觸施力予各該晶片的方式,篩選出具有缺陷的晶片。A wafer detecting device comprising: a bracket; a carrier for loading a plurality of wafers; a dial member having flexibility, the dial member being disposed on the bracket; and a displacement mechanism, and The bracket and one of the carrier members are coupled to cause relative displacement between the bracket and the carrier such that the dial member contacts an edge of each of the wafers. The method for detecting a wafer is: moving one of the dial member and the carrier member such that a relative displacement between the dial member and the carrier member is generated in the first direction, so that the dial member is sequentially Contacting the edges of each of the wafers; thereby, screening the defective wafers by means of the urging member in contact with each of the wafers.

Description

晶片檢測裝置及其檢測方法Wafer detecting device and detecting method thereof

本發明係與晶片檢測有關;特別是指一種可篩選出具有缺陷之晶片的檢測裝置與檢測方法。The invention relates to wafer inspection; in particular to a detection device and a detection method for screening a wafer having defects.

於半導體製程領域中,晶片的製程工藝日趨繁雜,因此,不可避免的是,於晶片經過某些製程之後,若干的晶片可能會產生結構異常之缺陷,例如有缺陷的晶片可能具有暗裂、內裂或嚴重脫晶等異常。In the field of semiconductor manufacturing, the process of wafer processing is becoming more and more complicated. Therefore, it is inevitable that after the wafer has undergone certain processes, several wafers may have structural defects, such as defective wafers may have cracks and inner defects. Abnormalities such as cracking or severe decrystallization.

而為了及早發現晶片之異常,於製程中,於部分站點之間大多會安排晶片進入檢測站點,以進行晶片異常的檢測,例如將整批的晶片送進暗裂檢測模組(ATP)進行檢測,然而,該暗裂檢測模組的造價不但昂貴,且其檢測週期長,而有檢測成本高、效率不彰的問題。In order to detect the abnormality of the chip early, in the process, most of the wafers are arranged between the stations to enter the inspection site for detecting the abnormality of the wafer, for example, sending the whole batch of wafers into the crack detection module (ATP). The detection is performed. However, the cost of the crack detection module is not only expensive, but also has a long detection period, and has a problem of high detection cost and inefficiency.

另一方面,部分的業者,是透過站點的工作人員以手指撥弄整批晶片的方式,試圖以手指施加外力撥片,以將具有缺陷之晶片透過外力破壞的方式撥破,以避免異常的晶片流向下一製程站點。然而,上述以工作人員手指直接撥動晶片的方式,其個別人員所施予晶片的力道、角度甚至速度皆不盡相同,因此無法達到測試作業流程的標準化。On the other hand, some of the operators use the finger of the site to fiddle with the whole batch of wafers, trying to apply external force to the fingers to break the defective wafer through external force to avoid abnormality. The wafer flows to the next process site. However, in the above manner, the force, the angle, and the speed of the wafer applied by the individual personnel are different in the manner in which the worker directly dials the wafer, and thus the standardization of the test operation flow cannot be achieved.

是以,如何兼具低成本、高效率又可準確檢測出具有缺陷的晶片,以降低異常晶片流向後段製程的生產成本以及降低異常晶片流至客戶端造成因品質不佳等客訴的風險,是當前業者努力創新所亟欲改進的方向之一。Therefore, how to combine low-cost, high-efficiency and accurate detection of defective wafers, in order to reduce the production cost of abnormal wafer flow to the back-end process and reduce the risk of abnormal wafers flowing to the client due to poor quality, etc. It is one of the directions that current industry players are striving to innovate.

有鑑於此,本發明之目的在於提供一種低成本、高效率的晶片檢測裝置及其檢測方法,可有效地檢測出具有缺陷的晶片。In view of the above, an object of the present invention is to provide a low-cost, high-efficiency wafer inspection apparatus and a detection method thereof, which can efficiently detect a wafer having defects.

緣以達成上述目的,本發明提供的一種晶片檢測裝置,其包括有一支架;一承載件,用以裝載複數個晶片;一撥動件,具有可撓性,該撥動件係設置於該支架上;以及一位移機構,與該支架及該承載件的其中之一者連接,用以使該支架與該承載件之間產生相對位移,以使得該撥動件接觸各該晶片的邊緣。In order to achieve the above object, a wafer inspection apparatus provided by the present invention includes a holder; a carrier for loading a plurality of wafers; and a dial member having flexibility, the dial member being disposed on the bracket And a displacement mechanism coupled to one of the bracket and the carrier for causing relative displacement between the bracket and the carrier such that the dial contacts the edges of each of the wafers.

緣以達成上述目的,本發明另提供的一種晶片檢測方法,其包括有以下步驟:提供一承載件以及一具有可撓性的撥動件,其中該承載件裝載有複數個沿一第一方向間隔排列的晶片;移動該撥動件及該承載件的其中之一者,使得該撥動件與該承載件之間於該第一方向上產生相對位移,以使得該撥動件依序接觸各該晶片的邊緣;藉以,透過該撥動件以接觸施力予各該晶片的方式,篩選出具有缺陷的晶片。In order to achieve the above object, the present invention further provides a wafer inspection method comprising the steps of: providing a carrier member and a flexible dial member, wherein the carrier member is loaded with a plurality of first directions along a first direction a wafer arranged at intervals; moving one of the dial member and the carrier member to cause a relative displacement between the dial member and the carrier member in the first direction, so that the dial member is sequentially contacted An edge of each of the wafers; thereby, the wafer having the defects is screened by the biasing member in contact with each of the wafers.

本發明之效果在於,透過操作撥動件以接觸施力於各該晶片的方式,可達到撥片力道、角度等作業流程標準化的效果,並可有效檢測出具有缺陷的晶片。The effect of the present invention is that the operation of the paddle force, the angle, and the like can be standardized by the operation of the dial member in contact with each of the wafers, and the wafer having the defect can be effectively detected.

為能更清楚地說明本發明,茲舉實施例並配合圖式詳細說明如後。請參圖1所示,為本發明一第一實施例之晶片檢測裝置100,其包括有一位移機構10、一支架20、一承載件30以及一撥動件40。In order to explain the present invention more clearly, the embodiments are described in detail with reference to the drawings. Referring to FIG. 1, a wafer inspection apparatus 100 according to a first embodiment of the present invention includes a displacement mechanism 10, a bracket 20, a carrier member 30, and a dial member 40.

該位移機構10係與該支架20及該承載件30的其中之一者連接,用以使該支架20與該承載件30之間產生相對位移,更進一步地說,該位移機構10係可受一動力源的作用,進而驅使該支架20與該承載件30中的其中至少一者移動,以使得之間該支架20與該承載件30之間產生相對位移,其中,所述的動力源可為人力、引擎或馬達等,但不以此為限。於本實施例中,所述的位移機構10包括有二軌道12以及二驅動單元14,該二軌道12係並列地設置於一平台上,各該驅動單元14分別與一該軌道12連接,用以驅動設置於該軌道12上的支架20沿著該軌道12移動。更進一步地說,於本實施例中,所述的軌道12上分別設置有一滾珠螺桿16,該支架20的底部兩端分別連接有一基座22,該基座22係套設於該滾珠螺桿16上;而該驅動單元14係以步進馬達為例,各該步進馬達係用以驅動各該滾珠螺桿16旋轉,以帶動該支架20沿著軌道12的長度方向線性移動。另外,於其他實際應用上,並不以設置有兩個驅動單元14為必要,於一實施例中,亦可僅設置單一驅動單元14於其中一該軌道12上,而另一邊的軌道12則用以供該支架之一該基座22滑移之用,藉以使得支架20的底部兩端皆有所支撐,從而在作動上,支架的運動可獲得較穩固的支撐效果。The displacement mechanism 10 is coupled to one of the bracket 20 and the carrier 30 for causing relative displacement between the bracket 20 and the carrier 30. Further, the displacement mechanism 10 is Actuating a power source, thereby driving at least one of the bracket 20 and the carrier 30 to cause relative displacement between the bracket 20 and the carrier 30, wherein the power source is For human, engine or motor, etc., but not limited to this. In the embodiment, the displacement mechanism 10 includes two rails 12 and two driving units 14 . The two rails 12 are arranged side by side on a platform, and each of the driving units 14 is respectively connected to a rail 12 . The carriage 20 disposed on the rail 12 is driven to move along the rail 12. Further, in the embodiment, a ball screw 16 is disposed on the rail 12, and a base 22 is respectively coupled to the bottom of the bracket 20, and the base 22 is sleeved on the ball screw 16 The driving unit 14 is exemplified by a stepping motor, and each of the stepping motors is configured to drive each of the ball screws 16 to rotate to drive the bracket 20 to linearly move along the length of the track 12. In addition, in other practical applications, it is not necessary to provide two driving units 14. In one embodiment, only a single driving unit 14 may be disposed on one of the tracks 12, and the other side of the track 12 may be It is used for sliding the base 22 of the bracket, so that the bottom of the bracket 20 is supported at both ends, so that the movement of the bracket can obtain a relatively stable supporting effect.

該承載件30係用以裝載晶片之用。於本實施例中,所述的承載件30為一晶片提籃,請一併配合圖2所示,該承載件30內部裝載有複數個沿一第一方向D1間隔排列的晶片W。The carrier 30 is for loading a wafer. In the embodiment, the carrier 30 is a wafer basket. As shown in FIG. 2, the carrier 30 is internally loaded with a plurality of wafers W arranged along a first direction D1.

該撥動件40係設置於該支架20上,於使用上,該撥動件40係用以供與各該晶片W產生接觸,以檢測晶片是否具有缺陷。該撥動件40係具有可撓性,舉例而言,該撥動件40主要可由橡膠類、樹脂類等具有可撓特性之聚合物或其組合所製成,而於本實施例中,較佳者,該撥動件40主要以聚氨酯橡膠(Polyurethane)製成,其具有高耐磨特性以及抗靜電之特性,特別適合於測試半導體晶片之用。另外,於其他實際實施上,撥動件亦可由其他具有可撓特性之聚合物製成,例如,透過其他橡膠類、樹脂類、塑料等製成,而不以上述之聚氨酯橡膠為限。The dialing member 40 is disposed on the bracket 20. In use, the dialing member 40 is configured to make contact with each of the wafers W to detect whether the wafer has defects. The dial member 40 has flexibility. For example, the dial member 40 can be mainly made of a polymer having a flexible property such as rubber or resin, or a combination thereof, and in this embodiment, Preferably, the toggle member 40 is mainly made of urethane, which has high wear resistance and antistatic properties, and is particularly suitable for testing semiconductor wafers. In addition, in other practical implementations, the dial member may also be made of other polymers having flexible properties, for example, by other rubbers, resins, plastics, etc., and not limited to the above-mentioned urethane rubber.

另外,於本實施例中,係以兩個撥動件40為例,該二撥動件40係透過可拆離之活動式夾具固定於支架20之上方,且該二撥動件40係間隔設置,藉以可平均地施力於各該晶片W之邊緣。但於其他實施上,並不以此為限,亦可設置單一撥動件或是大於兩個以上之撥動件進行測試。In the embodiment, the two dial members 40 are fixed to the bracket 20 through a detachable movable clamp, and the two dial members 40 are spaced apart. The arrangement is such that the edge of each of the wafers W can be applied equally. However, in other implementations, it is not limited thereto, and a single dial member or more than two dial members may be provided for testing.

本發明所提供之晶片檢測方法,用以篩選出具有缺陷的晶片,其包含有以下步驟:The wafer inspection method provided by the present invention is used for screening a defective wafer, which comprises the following steps:

步驟一:提供一承載件以及一具有可撓性的撥動件。於本實施例中,係提供裝載有複數個沿第一方向D1間隔排列之晶片W的承載件30靜置於一平台上;以及提供具有可撓性的撥動件40於該承載件30上方,並且使得該撥動件40與該些晶片W於一第二方向D2上具有部分的重疊,其中該第二方向D2概與第一方向D1垂直,又或者與該撥動件40的長度方向平行。Step 1: Provide a carrier and a flexible dial. In this embodiment, a carrier 30 loaded with a plurality of wafers W arranged at intervals in the first direction D1 is placed on a platform; and a toggle member 40 having flexibility is provided above the carrier 30. And the portion of the wafer 40 having a partial overlap with the wafers W in a second direction D2, wherein the second direction D2 is substantially perpendicular to the first direction D1, or the length direction of the dial member 40 parallel.

其中,關於該撥動件40與晶片W之間重疊部分的重疊區域面積、重疊的長度,可根據所欲施予晶片的作用力大小、撥動件40的材質、長度、厚度等參數進行調整,較佳者,該撥動件40與各該晶片W之重疊區域面積占各該晶片W之面積的比例不大於2%。舉例而言,於本實施例中,該撥動件40係以聚氨酯橡膠(Polyurethane)製成,其長度與寬度分別約為10mm,其總高度約為210mm,其自支架20之夾具以下起算至用以接觸晶片之末端的高度係為55mm;所進行測試的晶片W為尺寸156mm*156mm、厚度約為180~200µm之類方形晶片,其中,當以撥動件40與晶片W之間重疊的長度來看,較佳者,該撥動件40與晶片W於該部分重疊之長度L係介於0.5mm至2mm之間,更佳者,該部分重疊之長度L係以1mm為佳;另外,當以撥動件40與晶片W之間的重疊面積來看,較佳者,該撥動件40與各該晶片W的重疊面積不大於486mm 2左右。藉以,可有效達到提供撥動各晶片之作用力,以及降低因接觸摩擦而破壞晶片之晶面的機會。另外,於其他實際實施上,亦可使用其他尺寸的撥動件,而不僅侷限於上述之尺寸的撥動件40。 The area of the overlapping area and the overlapping length of the overlapping portion between the dial 40 and the wafer W can be adjusted according to the magnitude of the force applied to the wafer, the material, the length, and the thickness of the dial 40. Preferably, the ratio of the area of the overlapping area of the dialing member 40 and each of the wafers W to the area of each of the wafers W is not more than 2%. For example, in the present embodiment, the dial member 40 is made of urethane, and has a length and a width of about 10 mm, respectively, and a total height of about 210 mm, which is calculated from the clamp of the bracket 20 to The height of the end for contacting the wafer is 55 mm; the wafer W to be tested is a square wafer having a size of 156 mm * 156 mm and a thickness of about 180 - 200 μm, wherein when the slider 40 and the wafer W are overlapped In terms of length, preferably, the length L of the dial member 40 and the wafer W overlapping between the portions is between 0.5 mm and 2 mm, and more preferably, the length L of the partial overlap is preferably 1 mm; In view of the overlapping area between the dial member 40 and the wafer W, preferably, the overlapping area of the dial member 40 and each of the wafers W is not more than about 486 mm 2 . Therefore, the force for providing each wafer can be effectively achieved, and the chance of damaging the crystal plane of the wafer due to contact friction can be reduced. In addition, in other practical implementations, other sizes of the dial members may be used, and are not limited to the dial members 40 of the above size.

步驟二:係移動該撥動件及該承載件的其中之一者,使得該撥動件與該承載件之間於該第一方向上產生相對位移,以使得該撥動件依序接觸各該晶片的邊緣。於本實施例中,係控制該驅動單元14驅動滾珠螺桿16旋轉,以帶動支架20沿著該軌道12於第一方向D1移動,以使得設置於支架20上的撥動件40與該承載件30及其中的晶片W之間產生相對的位移,以使得撥動件40可依序接觸各該晶片W的邊緣,藉此,參圖3所示,可透過撥動件40分別施予一定的作用力予各該晶片W,其中,在撥動件40撥過晶片W的過程中,藉由撥動件40具有可撓性的效果,可產生彈性變形,而可有效施予晶片W一作用力,但又不致撞壞該晶片W。Step 2: moving one of the dial member and the carrier member such that a relative displacement between the dial member and the carrier member is generated in the first direction, so that the dial member sequentially contacts each The edge of the wafer. In this embodiment, the driving unit 14 is controlled to drive the rotation of the ball screw 16 to drive the bracket 20 to move along the rail 12 in the first direction D1, so that the dial member 40 disposed on the bracket 20 and the carrier member The relative displacement between the wafers W and the wafers W therein is such that the dial members 40 can sequentially contact the edges of the wafers W, whereby, as shown in FIG. 3, a certain amount can be imparted through the dial members 40, respectively. The force is applied to each of the wafers W, wherein during the process of the dialing member 40 being slid over the wafer W, the deflecting member 40 has a flexible effect, and elastic deformation can be generated, and the wafer W can be effectively applied. Force, but not damage the wafer W.

其中,於本實施例當中所進行測試的晶片W為尺寸156mm*156mm、厚度約為180~200µm之類方形晶片,當該晶片為正常片時,其可耐受而不會破裂的作用力約為4牛頓以內;當該晶片為具有缺陷的異常片時,而只需要受到低於0.5牛頓左右的作用力,便可被直接破壞,進而可檢測出該晶片為具有缺陷的異常片。是以,為達到在不破壞正常片但可有效破壞異常片之功效,藉以自多個晶片當中檢測出異常片,於本實施例中,更可進一步控制該撥動件40施予各該晶片W的作用力大小,譬如控制該撥動件40施予各該晶片W的作用力不大於3.8牛頓。The wafer W tested in the present embodiment is a square wafer having a size of 156 mm*156 mm and a thickness of about 180 to 200 μm. When the wafer is a normal sheet, the force can be tolerated without breaking. It is within 4 Newtons; when the wafer is a defective piece with defects, it only needs to be subjected to a force of less than about 0.5 Newton, and can be directly destroyed, thereby detecting that the wafer is a defective piece having defects. Therefore, in order to achieve the effect of not destroying the normal piece but effectively destroying the abnormal piece, the abnormal piece is detected from among the plurality of wafers. In the embodiment, the dialing member 40 is further controlled to be applied to each of the chips. The magnitude of the force of W, such as controlling the force applied by the dial member 40 to each of the wafers W, is not more than 3.8 Newtons.

其中,舉例而言,控制該撥動件40接觸晶片W時的作用力大小,係可基於撥動件40相對於晶片W之間的移動速率來調整,譬如,可基於本案對於該撥動件40的長度、聚氨酯橡膠之材質選擇,將該移動速率設定在10至16 cm/sec之間,較佳者,其移動速率可設定為12 cm/sec,藉以使得各該撥動件40在接觸各該晶片W時,可分別施予該晶片W約0.5牛頓的作用力(兩撥動件40作用於該晶片W的作用力之總和約1牛頓),藉以可有效地破壞具有缺陷之異常片。但於其他實際實施上,當選用不同材質、長寬高之撥動件40時,亦可設定有不同的移動速率,而不以上述說明為限。For example, the magnitude of the force when the dial member 40 contacts the wafer W can be adjusted based on the moving speed between the dial member 40 and the wafer W. For example, the dialing member can be based on the present case. The length of 40, the material of the urethane rubber is selected, and the moving speed is set between 10 and 16 cm/sec. Preferably, the moving speed can be set to 12 cm/sec, whereby the respective dial members 40 are in contact. Each of the wafers W can be applied with a force of about 0.5 Newtons of the wafer W (the sum of the forces acting on the wafer W by the two dial members 40 is about 1 Newton), thereby effectively destroying the defective piece with defects. . However, in other practical implementations, when different materials, length, width, and height of the dial member 40 are selected, different moving speeds may be set, and are not limited to the above description.

請配合圖4所示,若所述的晶片W是具有如暗裂、內裂或嚴重脫晶等缺陷的異常片時,該晶片W便會在受到撥動件接觸時的作用力時破裂,從而能夠在該批晶片送往下一製程之前,提早將具有缺陷的異常片有效地篩選出來,進而可降低其生產成本與降低異常晶片流向下游製程的風險。除此之外,本發明之晶片檢測裝置及檢測方法有別於習用透過工作人員的手指直接觸碰晶片的方式,可有效地達到施予各該晶片的作用力一致,以及作業流程標準化的效果。As shown in FIG. 4, if the wafer W is an abnormal sheet having defects such as dark cracking, internal cracking or severe decrystallization, the wafer W may be broken when subjected to the force of the toggle member contact. Therefore, it is possible to effectively screen out the defective abnormal sheets early before the batch of wafers is sent to the next process, thereby reducing the production cost and reducing the risk of abnormal wafer flow to the downstream process. In addition, the wafer detecting device and the detecting method of the present invention are different from the conventional method of directly touching the wafer by the finger of the worker, and can effectively achieve the same force applied to each of the wafers, and the effect of standardizing the operation flow. .

除此之外,以習用透過暗裂檢測模組(ATP)來進行檢測,其檢測每片晶片約需耗時2.5秒,亦即,一批50片晶片則需耗時125秒,反觀本發明所提供的晶片檢測裝置與檢測方法,可快速地掃過各該晶片即可快速完成檢測。兩相比較後可知,本發明的晶片檢測裝置除了在檢測效率上優於習用的暗裂檢測模組外,在裝置成本上,更比暗裂檢測模組相對地低廉。In addition, the detection by the blind detection module (ATP) takes about 2.5 seconds to detect each wafer, that is, a batch of 50 wafers takes 125 seconds, which is a reflection of the present invention. The provided wafer inspection device and detection method can quickly scan each wafer to complete the detection quickly. Comparing the two phases, the wafer detecting device of the present invention is relatively cheaper than the dark detecting module in terms of device cost, in addition to the detection efficiency superior to the conventional crack detecting module.

請參圖5所示,為本發明一第二實施例之晶片檢測裝置200,其與前述第一實施例之晶片檢測裝置100大致相同,不同的是,其僅在單邊設置有一軌道212,並設置單一的驅動單元214與該軌道212連接,且其支架220係採懸臂式設計,亦即,該支架220僅有一端連接於該軌道212,另一端呈懸空狀。藉此,同樣可透過控制該驅動單元214驅動該軌道212上的支架220相對於該承載件30產生位移,藉以使得撥動件40可依序接觸各該晶片以進行檢測。Referring to FIG. 5, a wafer detecting device 200 according to a second embodiment of the present invention is substantially the same as the wafer detecting device 100 of the first embodiment, except that a track 212 is provided on only one side. A single driving unit 214 is connected to the track 212, and the bracket 220 is designed in a cantilever manner, that is, the bracket 220 has only one end connected to the rail 212 and the other end is suspended. Thereby, the bracket 220 on the track 212 can be driven to be displaced relative to the carrier 30 by controlling the driving unit 214, so that the dial member 40 can sequentially contact each of the wafers for detection.

另外,請參圖6所示,為本發明一第三實施例之晶片檢測裝置300,其與前述第二實施例之晶片檢測裝置200大致相同,其支架320同樣是採單臂之懸臂式設計,其不同之處在於:其僅設置有單一軌道312,並未設置有驅動單元,其支架320係以可在該軌道312上滑動的方式設置於該軌道312上,且於該支架320上方設置有一手持部322,該手持部322用以供測試人員透過手部操作該支架320於該軌道312上位移。換言之,於一實施例中,位移機構的動力來源亦可為測試人員所提供的人力。In addition, referring to FIG. 6, a wafer detecting device 300 according to a third embodiment of the present invention is substantially the same as the wafer detecting device 200 of the second embodiment, and the bracket 320 is also a cantilever design using a single arm. The difference is that it is only provided with a single track 312, and no driving unit is provided. The bracket 320 is disposed on the track 312 so as to be slidable on the track 312, and is disposed above the bracket 320. There is a hand 322 for the tester to displace the bracket 320 on the track 312 through the hand. In other words, in one embodiment, the power source of the displacement mechanism can also be the manpower provided by the tester.

值得一提的是,上述所舉之實施例多採承載件靜置於一平面上,並操作支架帶動撥動件於軌道上移動,以使得撥動件與承載件之間產生相對的位移,以使得撥動件依序接觸各該晶片的邊緣。另外,於其他實際實施上,亦可將撥動件設計為固定不動,而採移動承載件的方式,使得撥動件與承載件之間產生相對位移來進行測試。舉例而言,請參圖7所示,為本發明之第四實施例之晶片檢測裝置400,其與前述實施例不同之處在於,其支架420以及設置於支架420上的撥動件40是採固定不動的方式設置;其位移機構包括有一軌道412以及一驅動單元(圖未示),所述的裝載有晶片之承載件30係放置於該軌道412上,該驅動單元係與該軌道412連接,用以帶動該軌道412上的承載件沿著第一方向D1移動,藉以使得該撥動件40與承載件30之間於該第一方向D1上產生相對的位移。以使得撥動件40依序接觸各該晶片的邊緣。It is worth mentioning that, in the above-mentioned embodiment, the multi-purpose bearing member is statically placed on a plane, and the operating bracket drives the dial member to move on the rail, so that a relative displacement between the dial member and the carrier member is generated. So that the dial members sequentially contact the edges of each of the wafers. In addition, in other practical implementations, the dial member may also be designed to be stationary, and the manner of moving the carrier member may be such that a relative displacement between the dial member and the carrier member is used for testing. For example, referring to FIG. 7, a wafer detecting device 400 according to a fourth embodiment of the present invention is different from the foregoing embodiment in that the bracket 420 and the dialing member 40 disposed on the bracket 420 are The displacement mechanism includes a track 412 and a driving unit (not shown). The wafer-loaded carrier 30 is placed on the track 412, and the driving unit is coupled to the track 412. The connecting member is configured to drive the carrier on the track 412 to move along the first direction D1, so that the relative displacement between the dial member 40 and the carrier 30 in the first direction D1 is generated. In order to cause the dial member 40 to sequentially contact the edges of each of the wafers.

另外,於一實施例中,在第四實施例的架構下,所述的驅動單元亦可由人力所取代,亦即,可透過人力帶動裝載有晶片之承載件沿著軌道移動,進而使得承載件與撥動件之間產生相對的位移,而不以上述實施例為限。In addition, in an embodiment, under the framework of the fourth embodiment, the driving unit can also be replaced by a manual force, that is, the carrier carrying the wafer can be moved along the track by human power, thereby enabling the carrier. A relative displacement is generated between the dial member and the dial member, and is not limited to the above embodiment.

於上述實施例當中所述的晶片係以類方形晶片為示範,但於其他實際應用上,以可對圓形的晶片(晶圓)進行檢測,而不以上述之類方形晶片為限。The wafers described in the above embodiments are exemplified by a square-like wafer, but in other practical applications, circular wafers (wafers) can be detected without being limited to the above-mentioned square wafers.

值得一提的是,於其他實際實施上,本發明所提供的晶片檢測裝置以及檢測方法亦可應用在其他尺寸的晶片上,而不以上述實施例所提及之晶片尺寸為限。It should be noted that, in other practical implementations, the wafer inspection apparatus and the detection method provided by the present invention can also be applied to wafers of other sizes, and not limited to the wafer size mentioned in the above embodiments.

以上所述僅為本發明較佳可行實施例而已,於其他實際應用上,亦可同時移動該撥動件及該承載件,使得該撥動件與該承載件之間產生相對的位移,舉凡應用本發明說明書及申請專利範圍所為之等效變化,理應包含在本發明之專利範圍內。The above description is only a preferred embodiment of the present invention. In other practical applications, the dial member and the carrier member may be simultaneously moved, so that a relative displacement between the dial member and the carrier member is generated. Equivalent changes in the scope of the present invention and the scope of the claims are intended to be included within the scope of the invention.

W‧‧‧晶片
[本發明]
100‧‧‧晶片檢測裝置
10‧‧‧位移機構
12‧‧‧軌道
14‧‧‧驅動單元
16‧‧‧滾珠螺桿
20‧‧‧支架
22‧‧‧基座
30‧‧‧承載件
40‧‧‧撥動件
D1‧‧‧第一方向
D2‧‧‧第二方向
L‧‧‧長度
200‧‧‧晶片檢測裝置
212‧‧‧軌道
214‧‧‧驅動單元
220‧‧‧支架
300‧‧‧晶片檢測裝置
312‧‧‧軌道
320‧‧‧支架
322‧‧‧手持部
400‧‧‧晶片檢測裝置
412‧‧‧軌道
420‧‧‧支架
W‧‧‧ wafer [present invention]
100‧‧‧ wafer inspection device
10‧‧‧displacement mechanism
12‧‧‧ Track
14‧‧‧ drive unit
16‧‧‧Ball screw
20‧‧‧ bracket
22‧‧‧ pedestal
30‧‧‧Carrier
40‧‧‧WD parts
D1‧‧‧ first direction
D2‧‧‧ second direction
L‧‧‧ length
200‧‧‧ wafer inspection device
212‧‧‧ Track
214‧‧‧ drive unit
220‧‧‧ bracket
300‧‧‧ wafer inspection device
312‧‧‧ Track
320‧‧‧ bracket
322‧‧‧Handheld Department
400‧‧‧ wafer inspection device
412‧‧‧ Track
420‧‧‧ bracket

圖1為本發明一第一實施例之晶片檢測裝置的立體圖。 圖2為圖1之2-2方向剖視圖。 圖3為撥動件撥過一晶片邊緣的示意圖。 圖4為具有缺陷之晶片受力而破裂的示意圖。 圖5為本發明一第二實施例之晶片檢測裝置的側視圖。 圖6為本發明一第三實施例之晶片檢測裝置的側視圖。 圖7為本發明一第四實施例之晶片檢測裝置的側視圖。BRIEF DESCRIPTION OF THE DRAWINGS Figure 1 is a perspective view of a wafer inspection apparatus according to a first embodiment of the present invention. Figure 2 is a cross-sectional view taken along line 2-2 of Figure 1. Figure 3 is a schematic illustration of the dial member being pulled over the edge of a wafer. Figure 4 is a schematic illustration of a wafer with defects being broken by force. Figure 5 is a side elevational view of a wafer inspection apparatus in accordance with a second embodiment of the present invention. Figure 6 is a side elevational view of a wafer inspection apparatus in accordance with a third embodiment of the present invention. Figure 7 is a side elevational view of a wafer inspection apparatus in accordance with a fourth embodiment of the present invention.

Claims (12)

一種晶片檢測裝置,其包含有: 一支架; 一承載件,用以裝載複數個晶片; 一撥動件,具有可撓性,該撥動件係設置於該支架上;以及 一位移機構,與該支架及該承載件的其中之一者連接,用以使該支架與該承載件之間產生相對位移,以使得該撥動件接觸各該晶片的邊緣。A wafer detecting device comprising: a bracket; a carrier for loading a plurality of wafers; a dial member having flexibility, the dial member being disposed on the bracket; and a displacement mechanism, and The bracket and one of the carrier members are coupled to cause relative displacement between the bracket and the carrier such that the dial member contacts an edge of each of the wafers. 如請求項1所述之晶片檢測裝置,其中該位移機構包含有一軌道;該支架係設置於該軌道上,並可沿著該軌道移動。The wafer detecting device of claim 1, wherein the displacement mechanism comprises a track; the frame is disposed on the track and movable along the track. 如請求項2所述之晶片檢測裝置,其中該位移機構包含有一驅動單元,與該軌道連接,用以驅動該支架沿著該軌道移動。The wafer detecting device of claim 2, wherein the displacement mechanism comprises a driving unit coupled to the rail for driving the bracket to move along the rail. 如請求項1所述之晶片檢測裝置,其中該撥動件主要係選自橡膠類、樹脂類之材料或其組合所製成。The wafer detecting device of claim 1, wherein the dial member is mainly made of a rubber material, a resin material, or a combination thereof. 如請求項1所述之晶片檢測裝置,其中該位移機構包含有一軌道,該承載件係被放置於該軌道上,並受該軌道的帶動而與該支架之間產生相對位移。The wafer detecting device of claim 1, wherein the displacement mechanism comprises a track on which the carrier is placed and driven by the track to be relatively displaced from the holder. 如請求項5所述之晶片檢測裝置,其中該位移機構包含有一驅動單元,該驅動單元與該軌道連接,用以驅動該承載件沿著該軌道移動,以使得該承載件與該支架之間產生相對位移。The wafer detecting device of claim 5, wherein the displacement mechanism comprises a driving unit coupled to the rail for driving the carrier to move along the rail such that the carrier and the bracket are between Produce relative displacement. 一種晶片檢測方法,用以篩選出具有缺陷的晶片,其包含有以下步驟: 提供一承載件以及一具有可撓性的撥動件,其中該承載件裝載有複數個沿一第一方向間隔排列的晶片; 移動該撥動件及該承載件的其中之一者,使得該撥動件與該承載件之間於該第一方向上產生相對位移,以使得該撥動件依序接觸各該晶片的邊緣; 藉以,透過該撥動件以接觸施力予各該晶片的方式,篩選出具有缺陷的晶片。A wafer inspection method for screening a defective wafer, comprising the steps of: providing a carrier and a flexible toggle member, wherein the carrier is loaded with a plurality of spacers arranged along a first direction And moving one of the dial member and the carrier member such that the shifting member and the carrier member are relatively displaced in the first direction, so that the dial member sequentially contacts each of the The edge of the wafer; thereby, the wafer having the defect is screened by contacting the biasing member with each of the wafers. 如請求項7所述之晶片檢測方法,更包含有提供一位移機構,該位移機構包含有一軌道,該軌道係與該承載件及該撥動件的其中一者連接,用以帶動該承載件與該撥動件的其中一者相對於另一者產生相對的位移。The wafer inspection method of claim 7, further comprising providing a displacement mechanism, the displacement mechanism comprising a track coupled to the carrier and the one of the dial members for driving the carrier A relative displacement is generated with respect to one of the dial members relative to the other. 如請求項8所述之晶片檢測方法,其中該位移機構更包含有一驅動單元,該驅動單元與該軌道連接,用以驅動該承載件與該撥動件的其中一者相對於另一者產生相對的位移。The wafer detecting method of claim 8, wherein the displacement mechanism further comprises a driving unit coupled to the rail for driving one of the carrier and the dialing member to generate relative to the other Relative displacement. 如請求項7所述之晶片檢測方法,其中該撥動件與各該晶片於一第二方向上具有部分重疊,其中該第二方向垂直於該第一方向。The wafer detecting method of claim 7, wherein the dial member has a partial overlap with each of the wafers in a second direction, wherein the second direction is perpendicular to the first direction. 如請求項7所述之晶片檢測方法,其中該撥動件與各該晶片之重疊區域面積占各該晶片之面積的比例不大於2%。The wafer detecting method according to claim 7, wherein a ratio of an area of the overlapping area of the dial member and each of the wafers to an area of each of the wafers is not more than 2%. 如請求項7所述之晶片檢測方法,其中該撥動件施予各該晶片的作用力不大於3.8牛頓。The wafer detecting method of claim 7, wherein the force applied by the dial member to each of the wafers is not more than 3.8 Newtons.
TW105143545A 2016-12-28 2016-12-28 Wafer detection device and detection method of the same TWI618165B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW105143545A TWI618165B (en) 2016-12-28 2016-12-28 Wafer detection device and detection method of the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW105143545A TWI618165B (en) 2016-12-28 2016-12-28 Wafer detection device and detection method of the same

Publications (2)

Publication Number Publication Date
TWI618165B true TWI618165B (en) 2018-03-11
TW201824414A TW201824414A (en) 2018-07-01

Family

ID=62189079

Family Applications (1)

Application Number Title Priority Date Filing Date
TW105143545A TWI618165B (en) 2016-12-28 2016-12-28 Wafer detection device and detection method of the same

Country Status (1)

Country Link
TW (1) TWI618165B (en)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009238993A (en) * 2008-03-27 2009-10-15 Oki Semiconductor Co Ltd Wafer transfer apparatus
US20130238113A1 (en) * 2012-03-08 2013-09-12 Hitachi Kokusai Electric Inc. Substrate Processing Apparatus, Method of Transferring Substrate, Method of Manufacturing Semiconductor Device, and State Detecting Program
CN103376197A (en) * 2012-04-16 2013-10-30 苏州中导光电设备有限公司 Solar cell and silicon wafer backside optical detection system

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009238993A (en) * 2008-03-27 2009-10-15 Oki Semiconductor Co Ltd Wafer transfer apparatus
US20130238113A1 (en) * 2012-03-08 2013-09-12 Hitachi Kokusai Electric Inc. Substrate Processing Apparatus, Method of Transferring Substrate, Method of Manufacturing Semiconductor Device, and State Detecting Program
CN103376197A (en) * 2012-04-16 2013-10-30 苏州中导光电设备有限公司 Solar cell and silicon wafer backside optical detection system

Also Published As

Publication number Publication date
TW201824414A (en) 2018-07-01

Similar Documents

Publication Publication Date Title
JP6071027B2 (en) Prober
JP5664938B2 (en) Prober and probe inspection method
CN108700405B (en) Wafer carrier thickness measuring device
US20080102542A1 (en) Wafer processing method
CN201508402U (en) rotary substrate testing mechanism
TW201721162A (en) Detector and probe contact method
CN115274484A (en) Wafer detection device and detection method thereof
TW201330161A (en) Belt conveyor for transporting solar wafers during processing
CN108896855B (en) Electrical characteristic detection device
CN116068043A (en) An aeroengine blade eddy current detection device and damage location method
CN108333511B (en) Motor performance test system
JP5747428B2 (en) Positioning and fixing device
TWI618165B (en) Wafer detection device and detection method of the same
CN110749301B (en) A single crystal silicon rod cutting surface angle detection device and square cutting machine
KR20160066741A (en) apparatus for examining edge of flat panel display panel and method of using the same
JP2006049880A (en) Wafer holding device
CN110702695A (en) Multi-view visual inspection jig for surface defects of semiconductor silicon wafers
CN109461675A (en) Detect the cleaning equipment and its cleaning method of position of silicon wafer exception
JPH06342837A (en) Inspection and repair device and burn-in inspection device for semiconductor wafer
CN119382618A (en) Photovoltaic module IV test device and photovoltaic module testing equipment
JP4312315B2 (en) Substrate holding mechanism and circuit board inspection apparatus
KR100795105B1 (en) Adhesive Tape Tester
CN118032930A (en) Workpiece detection equipment with flaw detection function and application method thereof
JP2005332839A (en) Testing device
CN112053966B (en) CP probe machine and adjustment method thereof

Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees