TWI610061B - 三維測量裝置 - Google Patents
三維測量裝置 Download PDFInfo
- Publication number
- TWI610061B TWI610061B TW105116968A TW105116968A TWI610061B TW I610061 B TWI610061 B TW I610061B TW 105116968 A TW105116968 A TW 105116968A TW 105116968 A TW105116968 A TW 105116968A TW I610061 B TWI610061 B TW I610061B
- Authority
- TW
- Taiwan
- Prior art keywords
- light
- grid
- stripe pattern
- image data
- light intensity
- Prior art date
Links
- 238000000034 method Methods 0.000 claims abstract description 111
- 238000005259 measurement Methods 0.000 claims abstract description 48
- 239000000758 substrate Substances 0.000 claims abstract description 40
- 238000012545 processing Methods 0.000 claims abstract description 32
- 230000010363 phase shift Effects 0.000 claims abstract description 21
- 238000009826 distribution Methods 0.000 claims description 98
- 230000033001 locomotion Effects 0.000 claims description 39
- 229910000679 solder Inorganic materials 0.000 claims description 24
- 238000007689 inspection Methods 0.000 abstract description 31
- 238000004364 calculation method Methods 0.000 abstract description 13
- 238000005286 illumination Methods 0.000 abstract description 2
- 238000003384 imaging method Methods 0.000 description 41
- 238000004088 simulation Methods 0.000 description 30
- 238000012935 Averaging Methods 0.000 description 7
- 230000003287 optical effect Effects 0.000 description 7
- 230000000694 effects Effects 0.000 description 6
- 238000003860 storage Methods 0.000 description 6
- 238000013500 data storage Methods 0.000 description 5
- 239000004973 liquid crystal related substance Substances 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 4
- 238000002834 transmittance Methods 0.000 description 4
- 230000005540 biological transmission Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000013461 design Methods 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 238000013139 quantization Methods 0.000 description 1
- 238000009738 saturating Methods 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 238000012795 verification Methods 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
- G01B11/25—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures by projecting a pattern, e.g. one or more lines, moiré fringes on the object
- G01B11/2518—Projection by scanning of the object
- G01B11/2527—Projection by scanning of the object with phase change by in-plane movement of the patern
Landscapes
- Engineering & Computer Science (AREA)
- Computer Vision & Pattern Recognition (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Length Measuring Devices By Optical Means (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2015231661A JP6062523B1 (ja) | 2015-11-27 | 2015-11-27 | 三次元計測装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201719112A TW201719112A (zh) | 2017-06-01 |
| TWI610061B true TWI610061B (zh) | 2018-01-01 |
Family
ID=57800032
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW105116968A TWI610061B (zh) | 2015-11-27 | 2016-05-31 | 三維測量裝置 |
Country Status (6)
| Country | Link |
|---|---|
| JP (1) | JP6062523B1 (es) |
| CN (1) | CN107923736B (es) |
| DE (1) | DE112016005425T5 (es) |
| MX (1) | MX366402B (es) |
| TW (1) | TWI610061B (es) |
| WO (1) | WO2017090268A1 (es) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7371443B2 (ja) * | 2019-10-28 | 2023-10-31 | 株式会社デンソーウェーブ | 三次元計測装置 |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW200712435A (en) * | 2005-09-21 | 2007-04-01 | Omron Tateisi Electronics Co | Pattern light irradiation device, three-dimensional shape measuring device, and method of pattern light irradiation |
| JP2007113958A (ja) * | 2005-10-18 | 2007-05-10 | Yamatake Corp | ３次元計測装置、３次元計測方法、及び３次元計測プログラム |
| CN101246228A (zh) * | 2008-02-01 | 2008-08-20 | 黑龙江科技学院 | 一种三维测量系统中相移光栅 |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE202010018585U1 (de) * | 2009-05-27 | 2017-11-28 | Koh Young Technology Inc. | Vorrichtung zur Messung einer dreidimensionalen Form |
| JP2013124938A (ja) * | 2011-12-15 | 2013-06-24 | Ckd Corp | 三次元計測装置 |
| JP5643241B2 (ja) * | 2012-02-14 | 2014-12-17 | Ckd株式会社 | 三次元計測装置 |
| JP6346427B2 (ja) * | 2013-10-30 | 2018-06-20 | キヤノン株式会社 | 画像処理装置、画像処理方法 |
-
2015
- 2015-11-27 JP JP2015231661A patent/JP6062523B1/ja active Active
-
2016
- 2016-05-31 TW TW105116968A patent/TWI610061B/zh active
- 2016-07-08 MX MX2018001490A patent/MX366402B/es active IP Right Grant
- 2016-07-08 CN CN201680046181.9A patent/CN107923736B/zh active Active
- 2016-07-08 WO PCT/JP2016/070238 patent/WO2017090268A1/ja not_active Ceased
- 2016-07-08 DE DE112016005425.4T patent/DE112016005425T5/de active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW200712435A (en) * | 2005-09-21 | 2007-04-01 | Omron Tateisi Electronics Co | Pattern light irradiation device, three-dimensional shape measuring device, and method of pattern light irradiation |
| JP2007113958A (ja) * | 2005-10-18 | 2007-05-10 | Yamatake Corp | ３次元計測装置、３次元計測方法、及び３次元計測プログラム |
| CN101246228A (zh) * | 2008-02-01 | 2008-08-20 | 黑龙江科技学院 | 一种三维测量系统中相移光栅 |
Also Published As
| Publication number | Publication date |
|---|---|
| MX2018001490A (es) | 2018-08-01 |
| DE112016005425T5 (de) | 2018-08-16 |
| CN107923736B (zh) | 2020-01-24 |
| WO2017090268A1 (ja) | 2017-06-01 |
| TW201719112A (zh) | 2017-06-01 |
| JP2017096866A (ja) | 2017-06-01 |
| JP6062523B1 (ja) | 2017-01-18 |
| CN107923736A (zh) | 2018-04-17 |
| MX366402B (es) | 2019-07-08 |
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