TWI603421B - Wet chemistry process apparatus - Google Patents

Description

Wet process equipment

The invention relates to a wet process equipment, in particular to a wet process equipment capable of reducing wear on a substrate and performing double-sided processing on a substrate in a process.

In general, the wet process is used in the industry to process the glass substrate of the touch panel. For example, the wet process is performed by etching the glass substrate through an etching process or by surface cleaning. When the glass substrate is subjected to the above-described wet process, the plate body of the glass substrate and the side portions extending from the plate body are simultaneously fixed and conveyed by the roller. Therefore, on the side where the glass substrate is in contact with the roller, the roller easily wears the glass substrate (including the plate body and the side portion extending from the plate body), and the side of the glass substrate in contact with the roller is also not effectively wetted by the arrangement of the roller. The process, that is, the conventional method of fixing and conveying the glass substrate by using a roller, can only perform single-sided processing on the glass substrate.

Therefore, the present invention provides a wet process apparatus capable of reducing wear on a substrate and performing a double-sided process on a substrate in a process to solve the above problems.

In order to achieve the above object, the present invention discloses a wet process apparatus for transporting a substrate along a conveying direction, the substrate having a plate portion and a side portion extending from the plate portion, the plate The body has an upper surface and a lower surface opposite to the upper surface, the wet processing apparatus includes a tank body, a plurality of guide wheels, and a plurality of liquid floating carrier plates for receiving the substrate, the plurality a plurality of guide wheels are disposed in the groove body, the plurality of guide wheels are corresponding to the side edge portion of the substrate and are used for supporting the side edge portion, and the plurality of liquid floating carrier plates are disposed under the lower surface and adjacent to each other, each liquid The floating carrier plate comprises a plurality of straight water flow channels and at least one first oblique water flow channel, the plurality of straight water flow channels having a direction orthogonal to the conveying direction, so that the plurality of straight water flow channels can treat a processing liquid perpendicular to the The conveying direction is sprayed in a row direction, wherein the liquid body supports the plate body portion, and the at least one first oblique water flow channel is disposed between the plurality of straight water flow channels and at least one edge of the liquid floating carrier plate, the at least one An oblique water flow channel is obliquely intersected in the conveying direction, so that the at least one first oblique water flow channel can spray the processing liquid along a first oblique direction that is not perpendicular to the conveying direction, so as to be the lower surface A laminar flow is formed between the plurality of liquid floating carriers to flow in the conveying direction, and the laminar flow is used for liquid floating to support the plate portion.

According to one embodiment of the invention, the inner product of the first oblique direction and the transport direction is greater than zero.

According to one embodiment of the present invention, the at least one edge of each liquid floating carrier includes a first side and a second side opposite to the first side, the first side to the second side The direction is defined as the conveying direction, the number of the at least one first oblique water flow channel on each liquid floating carrier plate is one, and the first oblique water flow channel is selectively disposed on the corresponding liquid floating carrier plate Adjacent to or adjacent to the first side edge.

According to one embodiment of the present invention, the at least one edge of the substrate comprises a first a side of the second side opposite to the first side, a direction of the first side to the second side is defined as the conveying direction, and the number of the at least one first inclined water flow channel is two, And the two first oblique water flow channels are respectively disposed adjacent to the first side edge and adjacent to the second side edge of the liquid floating carrier.

According to one embodiment of the present invention, the wet processing apparatus further includes at least one second oblique water flow channel disposed between the at least one first oblique water flow channel and at least one edge of the liquid floating carrier, The direction of the at least one second oblique flow channel is oblique to the conveying direction, so that the at least one second oblique flow channel can eject the treatment liquid in a second oblique direction that is not perpendicular to the conveying direction, so as to The lower surface and the plurality of liquid floating carriers form a laminar flow of the film that can flow in the conveying direction.

According to an embodiment of the invention, the inner product value of the first oblique direction and the conveying direction is greater than zero, and the inner product value of the second oblique direction and the conveying direction is greater than zero.

According to one embodiment of the present invention, the inner product value of the second oblique direction and the transport direction is equal to the inner product value of the first oblique direction and the transport direction.

According to one embodiment of the present invention, the at least one edge of the liquid floating carrier includes a first side and a second side opposite the first side, the first side to the second side The direction of the flow is defined as the transport direction, the number of the at least one first oblique flow channel is one, the number of the at least one second oblique flow channel is one, and the first oblique flow channel is adjacent to the second oblique The water flow channel is arranged, and the first oblique water flow channel and the second oblique water flow channel are selectively disposed adjacent to or adjacent to the first side edge of the liquid floating carrier.

According to one embodiment of the present invention, the second oblique direction and the inside of the conveying direction The product value is greater than the inner product of the first oblique direction and the transport direction.

According to one embodiment of the present invention, the at least one edge of the liquid floating carrier includes a first side and a second side opposite the first side, the first side to the second side The direction of the flow is defined as the transport direction, the number of the at least one first oblique flow channel is one, the number of the at least one second oblique flow channel is one, and the first oblique flow channel is adjacent to the second oblique The water flow channel is arranged, and the first oblique water flow channel and the second oblique water flow channel are selectively disposed adjacent to or adjacent to the first side edge of the liquid floating carrier.

In summary, the guide wheel of the wet process apparatus of the present invention only corresponds to the side portion of the substrate, and the plate body portion of the substrate is supported by the laminar flow of the film generated by the liquid floating carrier plate, so that the wet type of the present invention The guide wheel of the process device does not contact the plate body portion of the substrate, thereby reducing the wear on the plate body portion of the substrate. In addition, the processing liquid sprayed by the liquid floating carrier of the wet processing apparatus of the present invention may be an etching liquid or a cleaning liquid, that is, the wet processing apparatus of the present invention can use a water jet nozzle (not shown). In the wet process of etching or cleaning the upper surface of the plate body portion of the substrate, the wet process apparatus of the present invention can also spray the treatment liquid onto the lower surface of the plate body portion of the substrate by using the liquid floating carrier plate. The wet process of etching or cleaning the lower surface of the plate body is also performed, so that the wet process equipment of the present invention achieves the purpose of performing a two-sided wet process on the substrate. The above and other technical contents, features and advantages of the present invention will be apparent from the following detailed description of the embodiments of the invention.

The directional terms mentioned in the following embodiments, such as up, down, left, right, front or back, etc., are only directions referring to the additional drawings. Therefore, the directional terminology used is for the purpose of illustration and not limitation. Please refer to FIG. 1 and FIG. 2 . FIG. 1 is a schematic plan view of a wet processing apparatus 1000 according to a first embodiment of the present invention, and FIG. 2 is a cross-sectional view of the wet processing apparatus 1000 shown in FIG. A schematic cross-sectional view. As shown in FIG. 1 and FIG. 2, the wet process apparatus 1000 can be used to support a substrate 1 having a plate portion 10 and a side portion 11 extending from the plate portion 10, the plate The body 10 has an upper surface 101 and a lower surface 102 opposite the upper surface 101. In this embodiment, the substrate 1 can be a glass substrate of a touch panel, and the wet processing apparatus 1000 can be used to perform a wet process on the glass substrate, for example, the glass substrate can be subjected to an etching process. Perform pattern etching or surface cleaning after cleaning.

In addition, the wet process apparatus 1000 can be used to transport the substrate 1 in a transport direction A, wherein the transport direction A is the direction in which the substrate 1 shown by the broken line in FIG. 1 moves toward the substrate 1 shown by the solid line. . The wet process equipment 1000 includes a tank body 2, a plurality of guide wheels 3, and a plurality of liquid floating carrier plates 4, the tank body 2 is for accommodating the substrate 1, and the plurality of guide wheels 3 are disposed in the tank body 2, and a plurality of The guide wheel 3 corresponds to the side portion 11 of the substrate 1 and is used to support the side portion 11, and a plurality of liquid floating carrier plates 4 are disposed below the lower surface 102 of the plate portion 10 and adjacent to each other, and a plurality of liquid floating carrier plates 4 A processing liquid 6 is sprayed on the lower surface 102 to form a thin film laminar flow 6' between the lower surface 102 and the plurality of liquid floating carriers 4, wherein the thin film laminar flow 6' can be used to float the substrate of the substrate 1 by liquid floating. Department 10. In addition, the inlet body 20 and the outlet 21 are formed on the tank body 2, so that the guide wheel 3 can feed the substrate 1 into the tank body 2 via the inlet 20, or the guide wheel 3 can send the substrate 1 out of the tank body 2 via the outlet 21. .

In summary, the thin film laminar flow 6' produced by the liquid floating carrier 4 of the wet processing apparatus 1000 of the present invention can float the support body portion 10 of the substrate 1 and the guide wheel 3 of the wet process apparatus 1000 of the present invention. The side portion 11 of the substrate 1 can be supported, so that the substrate 1 can be stably wet-processed in the tank 2. In addition, the guide wheel 3 of the wet process apparatus 1000 of the present invention only corresponds to the side portion 11 of the substrate 1, and the plate body portion 10 of the substrate 1 is supported by the thin film laminar flow 6' generated by the liquid floating carrier 4. Therefore, the wet process apparatus 1000 of the present invention can reduce the contact with the board portion 10 of the substrate 1, thereby reducing the wear on the board portion 10 of the substrate 1. In addition, the processing liquid 6 sprayed by the liquid floating carrier 4 of the wet processing apparatus 1000 of the present invention may be an etching liquid or a cleaning liquid, that is, the wet processing apparatus 1000 of the present invention can utilize a water jet nozzle. (not shown in the drawing) The wet process apparatus 1000 of the present invention can also use the liquid floating carrier 4 to the substrate 1 in addition to the wet process of etching or cleaning the upper surface 101 of the board portion 10 of the substrate 1. The lower surface 102 of the plate body portion 10 ejects the processing liquid 6 to perform a wet process such as etching or cleaning the lower surface 102 of the plate body portion 10, thereby causing the wet process apparatus 1000 of the present invention to achieve double-sided substrate 1 The purpose of the wet process.

As shown in FIG. 1 and FIG. 2, each liquid floating carrier 4 includes a plurality of straight water flow channels 40 and a first oblique water flow channel 41, and the straight water flow channels 40 are oriented orthogonal to the transport direction A, first. The oblique flow passage 41 is disposed between the plurality of straight flow passages 40 and at least one edge 42 of the liquid floating carrier 4, and the direction of the first oblique flow passage 41 is oblique to the conveying direction A. It is worth mentioning that at least one edge 42 of each liquid floating carrier 4 includes a first side 420 and a second side 421 opposite to the first side 420, wherein the first side 420 is toward the second side The direction of 421 is defined as the conveying direction A. In this embodiment, the number of the first oblique water flow channels 41 on each liquid floating carrier 4 is one, and the first oblique water flow channel 41 is disposed adjacent to the first side edge 420 of the liquid floating carrier 4 . Further, in this embodiment, an angle θ1 between the course of the straight water flow path 40 and the course of the first oblique water flow path 41 may be 5 degrees, but the present invention is not limited thereto.

In addition, the wet processing apparatus 1000 may further include a water supply pump 5 for supplying the processing liquid 6, and the plurality of straight water flow channels 40 and the first oblique water flow channels 41 of each liquid floating carrier 4 may be respectively connected to each other. In the water supply pump 5. In this way, each of the straight water flow passages 40 can eject the processing liquid 6 supplied from the water supply pump 5 in the direction B perpendicular to the conveying direction A, and support the plate body portion 10 of the substrate 1 by liquid floating and the plate body portion. 10 floats off by the liquid floating carrier 4. In addition, the first oblique flow channel 41 can further eject the processing liquid 6 supplied from the water supply pump 5 in a first oblique direction Y1 that is not perpendicular to the conveying direction A, wherein the first oblique direction Y1 and the conveying direction A are The inner product value is greater than zero, that is, the projection component of the first oblique direction Y1 in the transport direction A is in the same direction as the transport direction A. In this way, the processing liquid 6 ejected from the first oblique flow channel 41 in the first oblique direction Y1 can be between the lower surface 102 of the plate portion 10 of the substrate 1 and the plurality of liquid floating carriers 4 The processing liquid 6 ejected in the straight flow direction 40 in the straight direction B together forms a thin film laminar flow 6' which can flow in the conveying direction A, so that the thin film laminar flow 6' can float the supporting plate body portion 10 and make the laminar flow 6 'The plate body 10 can be transported in the conveying direction A.

Please refer to FIG. 3, which is a cross-sectional view of a wet process apparatus 2000 according to a second embodiment of the present invention. As shown in FIG. 3, the main difference between the wet process apparatus 2000 and the wet process apparatus 1000 described above is that the first oblique flow passage 41 of each liquid floating carrier 4' of the wet process apparatus 2000 is disposed in the liquid. The floating carrier 4 is adjacent to the second side 421. The components of the embodiment having the same reference numerals as in the above embodiments have the same structural design and function principle, and are not described herein for brevity. In summary, each of the first oblique flow channels of the wet process apparatus of the present invention can be selectively disposed adjacent to the first side of the corresponding liquid floating carrier (for example, the first oblique flow of the liquid floating carrier 4) The passage 41) or adjacent to the first side (for example, the first oblique flow passage 41 of the liquid floating carrier 4') depends on actual needs.

Please refer to FIG. 4, which is a cross-sectional view of a wet process apparatus 3000 according to a third embodiment of the present invention. As shown in FIG. 4, the main difference between the wet process apparatus 3000 and the wet process apparatus 1000 described above is that the number of the first oblique flow channels 41 of each of the liquid floating carriers 4'' of the wet process apparatus 3000 is as shown in FIG. There are two, and the first oblique flow channels 41 are respectively disposed adjacent to the first side of the liquid floating carrier and adjacent to the second side. The components of the embodiment having the same reference numerals as in the above embodiments have the same structural design and function principle, and are not described herein for brevity. In summary, the first oblique flow passage of the wet process apparatus of the present invention may be selectively one (for example, the first oblique flow passage 41 of the liquid floating carrier 4) or two (for example, the liquid floating carrier 4 ''The first oblique flow channel 41), that is, the structural design of the liquid floating carrier comprising at least one first oblique flow channel, all within the scope of protection of the present invention, as to which of the above designs is used, depending on actual needs And set.

Please refer to FIG. 5. FIG. 5 is a cross-sectional view of a wet process apparatus 4000 according to a fourth embodiment of the present invention. As shown in FIG. 5, the main difference between the wet process apparatus 4000 and the wet process apparatus 1000 described above is that the wet process apparatus 4000 further includes a second oblique flow passage 43. In this embodiment, the first The inclined flow channel 41 and the second oblique flow channel 43 are disposed adjacent to the second side 421 of the liquid floating carrier 4"" of the wet process apparatus 4000, but the invention is not limited thereto, for example, the first The oblique flow channel 41 and the second oblique flow channel 43 may also be selectively disposed adjacent to the first side 420 of the liquid floating carrier 4"", or the first oblique flow channel 41 and the second oblique line The water flow passages 43 may also be respectively disposed adjacent to the first side edge 420 and the adjacent second side edge 421 of the liquid floating carrier plate 4"", depending on actual needs.

In addition, the direction of the second oblique flow channel 43 is oblique to the transport direction A, so that the second oblique flow channel 43 can eject the treatment liquid 6 in a second oblique direction Y2 that is not perpendicular to the transport direction A, such that The treatment liquid 6 ejected in the straight direction B by the plurality of straight water passages 40, the treatment liquid 6 ejected from the first oblique flow passage 41 in the first oblique direction Y1, and the second oblique flow passage 43 The processing liquid 6 ejected in the oblique direction Y2 can form a thin film laminar flow 6' which can flow in the conveying direction A between the lower surface 102 of the plate portion 10 of the substrate 1 and the plurality of liquid floating carriers 4 to form a film. The laminar flow 6' can float the support plate body portion 10 and allow the film laminar flow 6' to transport the plate body portion 10 in the conveying direction A.

In addition, the inner product value of the first oblique direction Y1 and the transport direction A is greater than zero, and the inner product value of the second oblique direction Y2 and the transport direction A is also greater than zero, that is, the first oblique direction Y1 is transported. The projection component of the direction A is in the same direction as the transport direction A, and the projection component of the second oblique direction Y2 in the transport direction A is also in the same direction as the transport direction A. In this embodiment, the inner product value of the first oblique direction Y1 and the transport direction A and the second oblique direction Y2 are equal to the inner product value of the transport direction A, that is, the projection component of the first oblique direction Y1 in the transport direction A. It is equal to the projection component of the second oblique direction Y2 in the transport direction A, and the first oblique direction Y1 is parallel to the second oblique direction Y2. In other words, the angle θ1 between the course of the straight flow channel 40 and the course of the first oblique flow channel 41 is equal to an angle θ2 between the course of the straight flow channel 40 and the second oblique direction Y2, and in this embodiment, The angle θ1 and the angle θ2 may both be 5 degrees, but the present invention is not limited thereto. The components of the embodiment having the same reference numerals as in the above embodiments have the same structural design and function principle, and are not described herein for brevity.

Please refer to FIG. 6. FIG. 6 is a cross-sectional view showing a wet process apparatus 5000 according to a fifth embodiment of the present invention. As shown in FIG. 6, the main difference between the wet process equipment 5000 and the wet process equipment 4000 described above is that the first oblique flow channel on the one liquid floating carrier 4'"' of the wet process equipment 5000 41 is disposed in common with the first oblique flow channel 43' adjacent to the first side edge 420 of the liquid floating carrier 4"", and the second oblique flow channel 43' is disposed in the first oblique flow channel 41 and Between the one side 420, and the inner product value of the second oblique direction Y2' of the second oblique flow passage 43' and the conveying direction A is greater than the first oblique direction Y1 of the first oblique flow passage 41 and the conveying The inner product value of the direction A, that is, the angle θ1 between the direction of the straight water flow channel 40 and the course of the first oblique water flow channel 41 is smaller than the angle between the course of the straight water flow channel 40 and the course of the second oblique water flow channel 43'. Θ2'. In other words, the course of the first oblique flow channel 41 is not parallel to the course of the second oblique flow channel 43'. The components of the embodiment having the same reference numerals as in the above embodiments have the same structural design and function principle, and are not described herein for brevity. Compared with the prior art, the guide wheel of the wet process equipment of the present invention only corresponds to the side portion of the substrate, and the plate body portion of the substrate is supported by the laminar flow of the film generated by the liquid floating carrier, so that the present invention is wet. The guide wheel of the process equipment does not contact the plate body portion of the substrate, thereby reducing the wear on the plate body portion of the substrate. In addition, the processing liquid sprayed by the liquid floating carrier of the wet processing apparatus of the present invention may be an etching liquid or a cleaning liquid, that is, the wet processing apparatus of the present invention can use a water jet nozzle (not shown). In the wet process of etching or cleaning the upper surface of the plate body portion of the substrate, the wet process apparatus of the present invention can also spray the treatment liquid onto the lower surface of the plate body portion of the substrate by using the liquid floating carrier plate. The wet process of etching or cleaning the lower surface of the plate body is also performed, so that the wet process equipment of the present invention achieves the purpose of performing a two-sided wet process on the substrate. The above are only the preferred embodiments of the present invention, and all changes and modifications made to the scope of the present invention should be within the scope of the present invention.

1000, 2000, 3000, 4000, 5000‧‧‧ Wet process equipment

1‧‧‧Substrate

10‧‧‧ Board Department

101‧‧‧ upper surface

102‧‧‧lower surface

11‧‧‧ Sideside

2‧‧‧Slot

20‧‧‧ entrance

21‧‧‧Export

3‧‧‧guide wheel

4, 4', 4'', 4''', 4''''‧‧‧ liquid floating board

40‧‧‧ Straight water flow channel

41‧‧‧First oblique flow channel

42‧‧‧ edge

420‧‧‧ first side

421‧‧‧ second side

43, 43'‧‧‧Second oblique flow channel

5‧‧‧Water supply pump

6‧‧‧Processing fluid

6'‧‧‧Laminar laminar flow

Θ1, θ2, θ2'‧‧‧ angle

A‧‧‧Transport direction

B‧‧‧Direct direction

Y1‧‧‧ first oblique direction

Y2, Y2'‧‧‧ second oblique direction

X-X‧‧‧ hatching

1 is a top plan view of a wet process apparatus according to a first embodiment of the present invention.

Figure 2 is a cross-sectional view of the wet process apparatus shown in Figure 1 taken along section line X-X.

Figure 3 is a cross-sectional view showing a wet process apparatus according to a second embodiment of the present invention. Figure 4 is a cross-sectional view showing a wet process apparatus according to a third embodiment of the present invention. Figure 5 is a cross-sectional view showing a wet process apparatus according to a fourth embodiment of the present invention. Figure 6 is a cross-sectional view showing a wet process apparatus according to a fifth embodiment of the present invention.

1000‧‧‧wet process equipment

1‧‧‧Substrate

10‧‧‧ Board Department

101‧‧‧ upper surface

102‧‧‧lower surface

2‧‧‧Slot

20‧‧‧ entrance

21‧‧‧Export

3‧‧‧guide wheel

4‧‧‧Liquid floating board

40‧‧‧ Straight water flow channel

41‧‧‧First oblique flow channel

42‧‧‧ edge

420‧‧‧ first side

421‧‧‧ second side

5‧‧‧Water supply pump

6‧‧‧Processing fluid

6'‧‧‧Laminar laminar flow

θ 1‧‧‧ angle

A‧‧‧Transport direction

B‧‧‧Direct direction

Y1‧‧‧ first oblique direction

Claims (10)

A wet process apparatus for transporting a substrate along a transport direction, the substrate having a plate portion and a side portion extending from the plate portion, the plate portion having an upper surface and opposite On the lower surface of the upper surface, the wet process apparatus includes: a tank body for accommodating the substrate; a plurality of guide wheels disposed in the tank body, the plurality of guide wheels corresponding to the side of the substrate And a plurality of liquid floating carrier plates disposed under the lower surface and adjacent to each other, each liquid floating carrier plate comprising: a plurality of straight water flow channels, the direction of which is orthogonal to the conveying direction, so that The plurality of straight water flow channels can spray a treatment liquid in a direction perpendicular to the conveying direction, thereby supporting the plate body portion by liquid floating; and at least one first oblique water flow channel disposed in the plurality of straight water flow channels Between the at least one edge of the liquid floating carrier, the direction of the at least one first oblique water flow channel is oblique to the conveying direction, so that the at least one first oblique water flow channel can not perpendicularize the processing liquid The conveying direction Discharging a first oblique direction to form a fluid between a floating carrier plate on the lower surface and the plurality of film layer can flow in a flow direction of the conveyor, the film layer supporting the floating liquid flow to the plate portion. The wet process apparatus of claim 1, wherein the inner product of the first oblique direction and the transport direction is greater than zero. The wet process apparatus of claim 1, wherein the at least one edge of each liquid floating carrier comprises a first side and a second side opposite the first side, the first side The direction of the second side is defined as the conveying direction, and the at least one first oblique flow channel of each liquid floating carrier The number is one, and the first oblique flow channel is selectively disposed at or adjacent to the corresponding first floating side of the liquid floating carrier. The wet process apparatus of claim 1, wherein the at least one edge of the liquid floating carrier comprises a first side and a second side opposite the first side, the first side The direction of the second side is defined as the conveying direction, the number of the at least one first oblique water flow channel is two, and the two first oblique water flow channels are respectively disposed adjacent to the first side of the liquid floating carrier The side is adjacent to the second side. The wet process apparatus of claim 1, further comprising: at least one second oblique flow channel disposed between the at least one first oblique flow channel and at least one edge of the liquid floating carrier, the at least A second oblique flow channel is obliquely intersected in the conveying direction, so that the at least one second oblique flow channel can eject the treatment liquid in a second oblique direction that is not perpendicular to the conveying direction, so as to The lower surface and the plurality of liquid floating carriers form a laminar flow of the film that can flow in the conveying direction. The wet process apparatus of claim 5, wherein an inner product value of the first oblique direction and the conveying direction is greater than zero, and an inner product value of the second oblique direction and the conveying direction is greater than zero. The wet process apparatus of claim 6, wherein an inner product value of the second oblique direction and the conveying direction is equal to an inner product value of the first oblique direction and the conveying direction. The wet process apparatus of claim 7, wherein the at least one edge of the liquid floating carrier comprises a first side and a second side opposite the first side, the first side Second side The direction of the flow is defined as the transport direction, the number of the at least one first oblique flow channel is one, the number of the at least one second oblique flow channel is one, and the first oblique flow channel is adjacent to the second oblique The water flow channel is arranged, and the first oblique water flow channel and the second oblique water flow channel are selectively disposed adjacent to or adjacent to the first side edge of the liquid floating carrier. The wet process apparatus of claim 6, wherein an inner product value of the second oblique direction and the transport direction is greater than an inner product value of the first oblique direction and the transport direction. The wet process apparatus of claim 9, wherein the at least one edge of the liquid floating carrier comprises a first side and a second side opposite the first side, the first side The direction of the second side is defined as the conveying direction, the number of the at least one first oblique flow channel is one, and the number of the at least one second oblique flow channel is one, and the first oblique flow channel is adjacent to the a second oblique flow channel, and the first oblique flow channel and the second oblique flow channel are selectively disposed adjacent to or adjacent to the first side of the liquid floating carrier At the side.