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TWI693471B - 著色組成物、螢光感測器及螢光感測器的製造方法 - Google Patents

著色組成物、螢光感測器及螢光感測器的製造方法 Download PDF

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Publication number
TWI693471B
TWI693471B TW105123973A TW105123973A TWI693471B TW I693471 B TWI693471 B TW I693471B TW 105123973 A TW105123973 A TW 105123973A TW 105123973 A TW105123973 A TW 105123973A TW I693471 B TWI693471 B TW I693471B
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TW
Taiwan
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pigment
group
coloring composition
mass
formula
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TW105123973A
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English (en)
Chinese (zh)
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TW201710785A (zh
Inventor
上村哲也
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日商富士軟片股份有限公司
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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/44—Polymerisation in the presence of compounding ingredients, e.g. plasticisers, dyestuffs, fillers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/75—Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated
    • G01N21/77—Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated by observing the effect on a chemical indicator
    • G01N21/78—Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated by observing the effect on a chemical indicator producing a change of colour
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Organic Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Engineering & Computer Science (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Analytical Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Polymerisation Methods In General (AREA)
TW105123973A 2015-08-19 2016-07-29 著色組成物、螢光感測器及螢光感測器的製造方法 TWI693471B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2015161717 2015-08-19
JP2015-161717 2015-08-19

Publications (2)

Publication Number Publication Date
TW201710785A TW201710785A (zh) 2017-03-16
TWI693471B true TWI693471B (zh) 2020-05-11

Family

ID=58052162

Family Applications (1)

Application Number Title Priority Date Filing Date
TW105123973A TWI693471B (zh) 2015-08-19 2016-07-29 著色組成物、螢光感測器及螢光感測器的製造方法

Country Status (4)

Country Link
JP (1) JP6663433B2 (fr)
KR (1) KR102121760B1 (fr)
TW (1) TWI693471B (fr)
WO (1) WO2017030155A1 (fr)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI814365B (zh) * 2022-04-29 2023-09-01 由田新技股份有限公司 基於雷射光源之光學檢測系統及雷射光學系統

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200930777A (en) * 2007-11-28 2009-07-16 Jsr Corp Radiation-sensitive composition for a red color filter, color filter and color liquid crystal display device
CN102665916A (zh) * 2009-11-23 2012-09-12 3M创新有限公司 微孔阵列制品及使用方法
TW201319178A (zh) * 2011-08-31 2013-05-16 Fujifilm Corp 著色組成物、使用其的彩色濾光片的製造方法、彩色濾光片及固態影像裝置

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60129739A (ja) 1983-12-16 1985-07-11 Agency Of Ind Science & Technol 透明着色画像形成用感光性樹脂組成物
JPH04348142A (ja) * 1991-03-29 1992-12-03 Agency Of Ind Science & Technol カラーフィルター形成用樹脂組成物
US5686300A (en) * 1995-09-11 1997-11-11 Becton Dickinson And Company Fluorescence detector
JPH10239835A (ja) 1997-02-28 1998-09-11 Sekisui Chem Co Ltd 画像形成用着色組成物、カラーフィルタ及びその製造方法
JP4816294B2 (ja) * 2005-07-15 2011-11-16 住友化学株式会社 着色感光性樹脂組成物およびそれを用いたパターン形成方法
JP2007058192A (ja) * 2005-07-29 2007-03-08 Sumitomo Chemical Co Ltd 着色感光性樹脂組成物
JP2008145309A (ja) * 2006-12-12 2008-06-26 Fujifilm Corp 表面プラズモン増強蛍光センサ
JP5329817B2 (ja) * 2008-01-28 2013-10-30 サカタインクス株式会社 カラーフィルター用顔料分散物及びそれを含有するカラーフィルター用顔料分散レジスト組成物
KR20110045530A (ko) * 2009-10-27 2011-05-04 동우 화인켐 주식회사 적색 감광성 수지 조성물, 컬러필터 및 이를 포함하는 액정표시장치
JPWO2013099217A1 (ja) * 2011-12-28 2015-04-30 日本化薬株式会社 顔料分散剤、顔料組成物及び化合物
JP6488731B2 (ja) * 2014-02-21 2019-03-27 東洋インキＳｃホールディングス株式会社 着色組成物、およびそれを用いたカラーフィルタ

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200930777A (en) * 2007-11-28 2009-07-16 Jsr Corp Radiation-sensitive composition for a red color filter, color filter and color liquid crystal display device
CN102665916A (zh) * 2009-11-23 2012-09-12 3M创新有限公司 微孔阵列制品及使用方法
TW201319178A (zh) * 2011-08-31 2013-05-16 Fujifilm Corp 著色組成物、使用其的彩色濾光片的製造方法、彩色濾光片及固態影像裝置

Also Published As

Publication number Publication date
KR102121760B1 (ko) 2020-06-11
JPWO2017030155A1 (ja) 2018-05-31
KR20180029064A (ko) 2018-03-19
WO2017030155A1 (fr) 2017-02-23
TW201710785A (zh) 2017-03-16
JP6663433B2 (ja) 2020-03-11

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