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TWI685780B - Cover glass of touch panel, touch panel, and manufacturing method thereof - Google Patents

Cover glass of touch panel, touch panel, and manufacturing method thereof Download PDF

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Publication number
TWI685780B
TWI685780B TW108105239A TW108105239A TWI685780B TW I685780 B TWI685780 B TW I685780B TW 108105239 A TW108105239 A TW 108105239A TW 108105239 A TW108105239 A TW 108105239A TW I685780 B TWI685780 B TW I685780B
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Taiwan
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substrate
layer
conductive layer
disposed
trace
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TW108105239A
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Chinese (zh)
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TW202032333A (en
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葉又瑗
陳煜東
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恆顥科技股份有限公司
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Abstract

A touch panel includes a visible region and a peripheral region disposed by at least one side of the visible region. The touch panel further includes a first substrate, a first decoration layer, a non-conductive layer, a trace, and a touch device. The first decoration layer is disposed on a surface of the first substrate and in the peripheral region. The non-conductive layer is disposed on the surface of the first substrate and in the peripheral region, the first decoration layer and the non-conductive layer are disposed on the same horizontal plane, and the non-conductive layer includes a transparent non-conductive material or a fluorescent material. The trace is disposed in the peripheral region, and the touch device is disposed in the visible region, and the trace is electrically connected to the touch device.

Description

觸控面板之蓋板、觸控面板及其製作方法 Cover plate of touch panel, touch panel and manufacturing method thereof

本發明係關於一種觸控面板之蓋板、觸控面板及其製作方法,尤指一種周邊區具有標識圖案之觸控面板之蓋板、觸控面板及其製作方法。 The invention relates to a cover plate of a touch panel, a touch panel and a manufacturing method thereof, in particular to a cover plate of a touch panel with a marking pattern in a peripheral area, a touch panel and a manufacturing method thereof.

在習知的觸控面板中,位於周邊區內之標識圖案(LOGO)常用金屬材料製作,使得標識圖案與同樣位於周邊區內的走線會產生電磁干擾(electromagnetic interference,EMI),影響訊號的傳輸品質。因此,標識圖案的設置位置需和走線的位置在垂直投影方向上錯開,以減少電磁干擾的影響,如此則導致周圍區的寬度無法有效地縮小。 In the conventional touch panel, the logo pattern (LOGO) located in the surrounding area is usually made of metal materials, so that the logo pattern and the traces also located in the surrounding area will produce electromagnetic interference (EMI), which affects the signal. Transmission quality. Therefore, the installation position of the logo pattern needs to be staggered from the position of the trace in the vertical projection direction to reduce the influence of electromagnetic interference, so that the width of the surrounding area cannot be effectively reduced.

本發明之主要目的之一在於提供一種觸控面板之蓋板、觸控面板及其製作方法,能夠避免周邊區內標識圖案與走線產生電磁干擾,同時可進一步縮小周邊區的寬度。 One of the main objects of the present invention is to provide a cover plate for a touch panel, a touch panel and a manufacturing method thereof, which can avoid the electromagnetic interference caused by the marking patterns and wiring in the surrounding area, and can further reduce the width of the surrounding area.

為達上述目的,本發明之一實施例提供一種觸控面板,其具有一可視區以及一周圍區位於可視區之至少一側,且觸控面板包括一第一基板、一第 一裝飾層、一非導電層、一走線以及一觸控元件。第一裝飾層設置在第一基板之一表面上並設置在周圍區內。非導電層設置在第一基板之表面上並設置在周圍區內,其中第一裝飾層與非導電層設置在同一水平面上,且非導電層包括透明非導電材料或螢光材料。走線設置在周圍區內,觸控元件設置在可視區內,其中走線與觸控元件電性連接。 To achieve the above objective, an embodiment of the present invention provides a touch panel having a visible area and a surrounding area on at least one side of the visible area, and the touch panel includes a first substrate and a first A decorative layer, a non-conductive layer, a trace, and a touch element. The first decoration layer is disposed on one surface of the first substrate and disposed in the surrounding area. The non-conductive layer is disposed on the surface of the first substrate and in the surrounding area, wherein the first decorative layer and the non-conductive layer are disposed on the same horizontal plane, and the non-conductive layer includes a transparent non-conductive material or a fluorescent material. The wiring is arranged in the surrounding area, and the touch element is arranged in the visible area, wherein the trace is electrically connected to the touch element.

為達上述目的,本發明之一實施例提供一種觸控面板的製作方法,其包括以下步驟。提供一第一基板,其中第一基板定義有一可視區以及一周圍區位於可視區之至少一側。於周圍區內的第一基板之一表面上形成一非導電層,其中非導電層包括透明非導電材料或螢光材料。於周圍區內的第一基板之表面上形成一第一裝飾層,其中第一裝飾層與非導電層設置在同一水平面上。於周圍區內的第一基板上或者對應第一基板的周圍區於一第二基板上形成一走線。於可視區內的第一基板上或者對應第一基板的可視區於第二基板上形成一觸控元件,其中走線與觸控元件電性連接。 To achieve the above objective, an embodiment of the present invention provides a method for manufacturing a touch panel, which includes the following steps. A first substrate is provided, wherein the first substrate defines a visible area and a surrounding area is located on at least one side of the visible area. A non-conductive layer is formed on one surface of the first substrate in the surrounding area, wherein the non-conductive layer includes a transparent non-conductive material or a fluorescent material. A first decorative layer is formed on the surface of the first substrate in the surrounding area, wherein the first decorative layer and the non-conductive layer are disposed on the same horizontal plane. A trace is formed on the first substrate in the surrounding area or corresponding to the surrounding area of the first substrate on a second substrate. A touch element is formed on the first substrate in the visible area or the visible area corresponding to the first substrate on the second substrate, wherein the trace is electrically connected to the touch element.

為達上述目的,本發明之一實施例提供一種觸控面板之蓋板,其具有一可視區以及一周圍區位於可視區之至少一側,且蓋板包括一基板、一裝飾層、以及一非導電層。裝飾層設置在基板之一表面上並設置在周圍區內。非導電層設置在基板之表面上並設置在周圍區內,其中裝飾層與非導電層設置在同一水平面上,且非導電層包括透明非導電材料或螢光材料。 To achieve the above object, an embodiment of the present invention provides a cover plate for a touch panel, which has a visible area and a surrounding area on at least one side of the visible area, and the cover plate includes a substrate, a decorative layer, and a Non-conductive layer. The decorative layer is provided on one surface of the substrate and in the surrounding area. The non-conductive layer is arranged on the surface of the substrate and in the surrounding area, wherein the decorative layer and the non-conductive layer are arranged on the same horizontal plane, and the non-conductive layer includes transparent non-conductive material or fluorescent material.

10‧‧‧觸控面板 10‧‧‧Touch panel

102‧‧‧第一基板 102‧‧‧The first substrate

104、204、1081、1101、1062‧‧‧表面 104, 204, 1081, 1101, 1062‧‧‧surface

106‧‧‧非導電層 106‧‧‧Non-conductive layer

1061、1083‧‧‧開口 1061, 1083‧‧‧ opening

108‧‧‧第一裝飾層 108‧‧‧The first decorative layer

1082、112、114‧‧‧斜面 1082, 112, 114‧‧‧Bevel

110‧‧‧第二裝飾層 110‧‧‧Second decorative layer

20‧‧‧蓋板 20‧‧‧Cover

202‧‧‧第二基板 202‧‧‧Second substrate

302‧‧‧黏著層 302‧‧‧ Adhesive layer

304‧‧‧保護層 304‧‧‧Protective layer

BR‧‧‧橋接線 BR‧‧‧Bridge

HP‧‧‧水平面 HP‧‧‧horizontal

IN‧‧‧絕緣層 IN‧‧‧Insulation

R1‧‧‧可視區 R1‧‧‧Viewable area

R2‧‧‧周圍區 R2‧‧‧ Surrounding area

S102、S104、S106、S108、S110‧‧‧步驟 S102, S104, S106, S108, S110

TD‧‧‧觸控元件 TD‧‧‧Touch element

TE1‧‧‧第一感測電極 TE1‧‧‧First sensing electrode

TE2‧‧‧第二感測電極 TE2‧‧‧Second sensing electrode

TR‧‧‧走線 TR‧‧‧Trace

V‧‧‧垂直投影方向 V‧‧‧Vertical projection direction

W1‧‧‧第一寬度 W1‧‧‧First width

W2‧‧‧第二寬度 W2‧‧‧second width

W3‧‧‧第三寬度 W3‧‧‧third width

X‧‧‧水平方向 X‧‧‧horizontal

第1圖為本發明觸控面板的製作方法的步驟流程圖。 FIG. 1 is a flowchart of steps of the method for manufacturing a touch panel of the present invention.

第2圖至第5圖繪示了本發明第一實施例之蓋板及觸控面板的製作方法示意圖。 FIGS. 2 to 5 are schematic diagrams of the manufacturing method of the cover plate and the touch panel according to the first embodiment of the present invention.

第6圖至第8圖繪示了本發明第二實施例之蓋板及觸控面板的製作方法示意圖。 6 to 8 are schematic diagrams of the manufacturing method of the cover plate and the touch panel according to the second embodiment of the present invention.

第9圖繪示了本發明第三實施例之觸控面板的剖面示意圖。 FIG. 9 is a schematic cross-sectional view of a touch panel according to a third embodiment of the invention.

第10圖繪示了本發明第四實施例之觸控面板的剖面示意圖。 FIG. 10 is a schematic cross-sectional view of a touch panel according to a fourth embodiment of the invention.

第11圖繪示了本發明第五實施例之觸控面板的剖面示意圖。 FIG. 11 is a schematic cross-sectional view of a touch panel according to a fifth embodiment of the invention.

為使熟習本揭露所屬領域之技術人員能瞭解本揭露,下文配合所附圖示詳細說明本發明的觸控面板。為了使讀者能容易瞭解及圖式的簡潔,本揭露中的多張圖式只繪出觸控面板或蓋板的一部分,且圖式中的特定元件並非依照實際比例繪圖。此外,圖中各元件的數量及尺寸僅作為示意,並非用來限制本揭露的範圍。各元件詳細的數量、尺寸、比例或位置可依照設計的需求進行調整。值得一提的是,本揭露中不同實施例中的技術特徵彼此之間可互相結合、置換、搭配,以組合出另一實施例。 In order for those skilled in the art who are familiar with the present disclosure to understand the present disclosure, the touch panel of the present invention will be described in detail below with reference to the accompanying drawings. In order to make it easy for the reader to understand and the simplicity of the drawings, the multiple drawings in this disclosure only depict a part of the touch panel or cover plate, and the specific elements in the drawings are not drawn according to the actual scale. In addition, the number and size of each element in the drawings are only for illustration, not for limiting the scope of the present disclosure. The detailed quantity, size, ratio or position of each component can be adjusted according to the design requirements. It is worth mentioning that the technical features in different embodiments of the present disclosure can be combined, replaced, and matched with each other to combine another embodiment.

請參考第1圖至第5圖。第1圖為本發明觸控面板的製作方法的步驟流程圖,第2圖至第5圖繪示了本發明第一實施例之蓋板及觸控面板的製作方法示意圖。首先進行第1圖中的步驟S102並參考第2圖,提供一第一基板102,其中第一基板102定義有一可視區R1以及一周圍區R2位於可視區R1之至少一側。舉例而言,以一俯視方向觀看第一基板102之一表面104時,周圍區R2可圍繞可視區R1,但不以此為限。第一基板102可包括硬質或可撓的透明基板,例如可包括玻璃基板、塑膠基板、玻璃膜片、塑膠膜片、透光覆蓋板或其他適合之材料及/或 功能之基板。接著進行第1圖中的步驟S104並參考第2圖,於周圍區R2內的第一基板102之表面104上形成一非導電層106。本實施例之非導電層106可做為標識圖案,其可例如具有顏色或圖形,使得使用者能夠辨認出該標識圖案。非導電層106可藉由圖案化製程而具有圖形,舉例而言,非導電層106可具有開口1061,其中開口1061的數量不以圖中所示為限。另外,非導電層106亦可不具有開口1061。在某些實施例中,非導電層106可藉由網印製程形成。另在某些實施例中,可先於表面104上全面形成非導電材料,再透過微影暨蝕刻製程形成非導電層106。然而,非導電層106的形成方法並不以上述方法為限,並在形成非導電層106及/或非導電材料的製程中可包括各種型式的鍍膜、塗佈等製造方法。 Please refer to Figure 1 to Figure 5. FIG. 1 is a flowchart of steps of the method for manufacturing a touch panel of the present invention, and FIGS. 2 to 5 are schematic diagrams of a method for manufacturing a cover plate and a touch panel of the first embodiment of the present invention. First, perform step S102 in FIG. 1 and refer to FIG. 2 to provide a first substrate 102, wherein the first substrate 102 defines a visible area R1 and a surrounding area R2 located on at least one side of the visible area R1. For example, when viewing a surface 104 of the first substrate 102 in a top-view direction, the surrounding area R2 may surround the visible area R1, but not limited thereto. The first substrate 102 may include a hard or flexible transparent substrate, such as a glass substrate, a plastic substrate, a glass diaphragm, a plastic diaphragm, a light-transmitting cover plate, or other suitable materials and/or Functional substrate. Next, perform step S104 in FIG. 1 and refer to FIG. 2 to form a non-conductive layer 106 on the surface 104 of the first substrate 102 in the surrounding area R2. The non-conductive layer 106 in this embodiment may be used as a logo pattern, which may have a color or a graphic, for example, so that the user can recognize the logo pattern. The non-conductive layer 106 may have a pattern through a patterning process. For example, the non-conductive layer 106 may have openings 1061, and the number of the openings 1061 is not limited to that shown in the figure. In addition, the non-conductive layer 106 may not have the opening 1061. In some embodiments, the non-conductive layer 106 can be formed by a screen printing process. In some embodiments, a non-conductive material may be formed on the surface 104 first, and then the non-conductive layer 106 may be formed through a lithography and etching process. However, the method for forming the non-conductive layer 106 is not limited to the above method, and various types of manufacturing methods such as plating and coating may be included in the process of forming the non-conductive layer 106 and/or the non-conductive material.

非導電層106可包括非導電材料,在本實施例中,非導電層106可包括透明非導電材料或螢光材料。透明非導電材料可包括透明非導電高折射率材料、透明非導電中折射率材料及/或透明非導電低折射率材料,但不以此為限。舉例而言,透明非導電高折射率材料的折射率可例如大於2,其可例如包括Nb2O5、TiO2、Ti3O5、Ti2O3、TiO、Ta2O5、ZrO2、CeO2、ZnS、ZnSe、其他合適的透明非導電高折射率材料或其組合。透明非導電中折射率材料的折射率可例如大於或等於1.6並小於或等於2,其可例如包括Al2O3、HfO2、MgO、Y2O3、CeF3、LaF3、其他合適的透明非導電中折射率材料或其組合。透明非導電低折射率材料的折射率可例如小於1.6,其可例如包括MgF2、SiO2、YF3、BaF2、AlF3、Na3AlF6、Na5Al3F14、其他合適的透明非導電低折射率材料或其組合。舉例而言,非導電層106可包括多個材料層互相堆疊的疊層結構,這些材料層可包括不同的折射率,並可選自以上舉例的各種透明非導電高折射率材料、透明非導電中折射率材料及/或透明非導電低折射率材料。透過不同折射率的材料層的堆疊,可以使得非導電層106顯現出不同的顏色(如紅、綠等)。 The non-conductive layer 106 may include a non-conductive material. In this embodiment, the non-conductive layer 106 may include a transparent non-conductive material or a fluorescent material. The transparent non-conductive material may include a transparent non-conductive high refractive index material, a transparent non-conductive medium refractive index material, and/or a transparent non-conductive low refractive index material, but not limited thereto. For example, the refractive index of the transparent non-conductive high refractive index material may be greater than 2, for example, which may include, for example, Nb 2 O 5 , TiO 2 , Ti 3 O 5 , Ti 2 O 3 , TiO, Ta 2 O 5 , ZrO 2 , CeO 2 , ZnS, ZnSe, other suitable transparent non-conductive high refractive index materials, or a combination thereof. The refractive index of the transparent non-conductive medium refractive index material may be, for example, greater than or equal to 1.6 and less than or equal to 2, which may include, for example, Al 2 O 3 , HfO 2 , MgO, Y 2 O 3 , CeF 3 , LaF 3 , other suitable Transparent non-conductive medium refractive index material or a combination thereof. The refractive index of the transparent non-conductive low refractive index material may be, for example, less than 1.6, which may include, for example, MgF 2 , SiO 2 , YF 3 , BaF 2 , AlF 3 , Na 3 AlF 6 , Na 5 Al 3 F 14 , other suitable transparent Non-conductive low refractive index material or a combination thereof. For example, the non-conductive layer 106 may include a stacked structure in which a plurality of material layers are stacked on each other, these material layers may include different refractive indexes, and may be selected from various transparent non-conductive high refractive index materials, transparent non-conductive Medium refractive index materials and/or transparent non-conductive low refractive index materials. Through the stacking of material layers with different refractive indexes, the non-conductive layer 106 can show different colors (such as red, green, etc.).

另一方面,螢光材料可例如包括Zn2GeO4:Mn2+、SrAl2O4:Eu2+,Dy3+、Zn2SiO4:Mn2+、ZnS:Mn2+、其他合適的螢光材料或其組合。螢光材料可經特定波長(常為短波長)的入射光照射後,再發出出射光(波長常大於入射光的波長,如可見光波段),藉此,可透過選擇不同的螢光材料製作非導電層106而使得非導電層106顯現出不同的顏色。 On the other hand, the fluorescent material may include, for example, Zn 2 GeO 4 : Mn 2+ , SrAl 2 O 4 : Eu 2+ , Dy 3+ , Zn 2 SiO 4 : Mn 2+ , ZnS: Mn 2+ , other suitable Fluorescent materials or combinations thereof. Fluorescent materials can be irradiated with incident light of a specific wavelength (usually short wavelength), and then emit outgoing light (wavelength is often greater than the wavelength of incident light, such as the visible light band), by which, by selecting different fluorescent materials The conductive layer 106 causes the non-conductive layer 106 to exhibit different colors.

接著進行第1圖中的步驟S106並參考第3圖,於周圍區R2內的第一基板102之表面104上形成一第一裝飾層108。本實施例的非導電層106與第一裝飾層108可直接接觸第一基板102之表面104,但不以此為限,也可有其他膜層設置於非導電層106與第一基板102之間或第一裝飾層108與第一基板102之間。在本實施例的製作方法中,在形成第一裝飾層108之前先形成非導電層106,但不以此為限。本實施例的非導電層106可具有開口1061,而後續形成之第一裝飾層108的厚度可大於非導電層106的厚度,且第一裝飾層108可填入開口1061並在一垂直投影方向V上覆蓋非導電層106。因此,非導電層106在垂直投影方向V上設置於第一基板102與第一裝飾層108之間。所述垂直投影方向V可例如係垂直於第一基板102之表面104的一個方向,但不限於此。此外,本實施例的第一裝飾層108可具有相連之一表面1081與一斜面1082,表面1081可與表面104大體上平行,且斜面1082可設置在周圍區R2與可視區R1的交界附近。舉例而言,本實施例之第一裝飾層108的材料可為油墨(例如非感光樹脂),但不以此為限。第一裝飾層108的材料亦可包括感光樹脂(例如有色光阻)、陶瓷、有機材料、有機材料與無機材料之混合物或有機-無機混成化合物,其可為單層結構或多層堆疊結構,以用於遮蔽觸控面板中不欲被看到的元件或光線。製作第一裝飾層108的方法可包括各種型式的鍍膜、塗佈、網印、圖案化製程(如微影暨蝕刻製程)等製造方法。 Next, perform step S106 in FIG. 1 and refer to FIG. 3 to form a first decoration layer 108 on the surface 104 of the first substrate 102 in the surrounding area R2. In this embodiment, the non-conductive layer 106 and the first decoration layer 108 may directly contact the surface 104 of the first substrate 102, but it is not limited thereto, and other film layers may be provided between the non-conductive layer 106 and the first substrate 102 Sometimes between the first decoration layer 108 and the first substrate 102. In the manufacturing method of this embodiment, the non-conductive layer 106 is formed before the first decoration layer 108 is formed, but it is not limited thereto. The non-conductive layer 106 of this embodiment may have an opening 1061, and the thickness of the first decorative layer 108 to be formed later may be greater than the thickness of the non-conductive layer 106, and the first decorative layer 108 may fill the opening 1061 and be in a vertical projection direction V上盖 non-conductive layer 106. Therefore, the non-conductive layer 106 is disposed between the first substrate 102 and the first decoration layer 108 in the vertical projection direction V. The vertical projection direction V may be, for example, a direction perpendicular to the surface 104 of the first substrate 102, but is not limited thereto. In addition, the first decoration layer 108 of this embodiment may have a surface 1081 and a slope 1082 connected thereto. The surface 1081 may be substantially parallel to the surface 104, and the slope 1082 may be disposed near the boundary between the surrounding area R2 and the viewing area R1. For example, the material of the first decoration layer 108 in this embodiment may be ink (such as non-photosensitive resin), but not limited thereto. The material of the first decorative layer 108 may also include photosensitive resin (such as colored photoresist), ceramics, organic materials, a mixture of organic materials and inorganic materials, or organic-inorganic hybrid compounds, which may be a single-layer structure or a multi-layer stacked structure, to It is used to block the undesirable components or light in the touch panel. The method for manufacturing the first decorative layer 108 may include various types of manufacturing methods such as coating, coating, screen printing, and patterning processes (such as lithography and etching processes).

在本實施例中,可透過步驟S102至步驟S106形成一觸控面板之一蓋板20。另補充說明的是,製作蓋板20的方法並不限於上述的步驟(S102至S106),可以在任何所述步驟之前、之後或之間執行其他步驟。此外,一些步驟可以同時執行,或者以與上文不同的順序執行。藉此,本實施例之觸控面板的蓋板20具有一可視區R1以及一周圍區R2位於可視區R1之至少一側,且蓋板20包括一基板(如第一基板102)、一裝飾層(如第一裝飾層108)以及一非導電層106。第一裝飾層108設置在第一基板102之表面104上並設置在周圍區R2內。非導電層106設置在第一基板102之表面104上並設置在周圍區R2內,且非導電層106包括透明非導電材料或螢光材料。並如第3圖所示,第一裝飾層108與非導電層106設置在同一水平面HP上,其中水平面HP大體上平行於第一基板102之表面104並可距離表面104一小段距離(例如小於非導電層106的厚度)。換言之,在以水平面HP所切出的蓋板20的橫截面中可同時發現第一裝飾層108與非導電層106。 In this embodiment, a cover 20 of a touch panel can be formed through steps S102 to S106. It is additionally added that the method of manufacturing the cover 20 is not limited to the above steps (S102 to S106), and other steps may be performed before, after, or between any of the steps. In addition, some steps may be performed simultaneously, or in a different order than above. In this way, the cover 20 of the touch panel of this embodiment has a visible area R1 and a surrounding area R2 located on at least one side of the visible area R1, and the cover 20 includes a substrate (such as the first substrate 102) and a decoration Layers (such as the first decorative layer 108) and a non-conductive layer 106. The first decoration layer 108 is disposed on the surface 104 of the first substrate 102 and disposed in the surrounding area R2. The non-conductive layer 106 is disposed on the surface 104 of the first substrate 102 and in the surrounding area R2, and the non-conductive layer 106 includes a transparent non-conductive material or a fluorescent material. As shown in FIG. 3, the first decoration layer 108 and the non-conductive layer 106 are disposed on the same horizontal plane HP, where the horizontal plane HP is substantially parallel to the surface 104 of the first substrate 102 and may be a short distance from the surface 104 (e.g. less than The thickness of the non-conductive layer 106). In other words, the first decoration layer 108 and the non-conductive layer 106 can be found in the cross section of the cover plate 20 cut at the horizontal plane HP.

接著,如第1圖所示,進行步驟S108,於周圍區內的第一基板上或者對應第一基板的周圍區於一第二基板上形成一走線,並進行步驟S110,於可視區內的第一基板上或者對應第一基板的可視區於第二基板上形成一觸控元件,其中走線與觸控元件電性連接。如第4圖所示,本實施例之步驟S108係對應第一基板102的周圍區R2於一第二基板202上形成一條或多條走線TR,且本實施例之步驟S110係對應第一基板102的可視區R1於第二基板202上形成一觸控元件TD。第4圖中的第二基板202也可具有可視區R1與周圍區R2,並且可對應於第一基板102的可視區R1與周圍區R2。第二基板202可與上述第一基板102的材料相同,但不以此為限。在某些實施例中,第二基板202可以為一材料層(film),而非基板或載板。另如第4圖所示,走線TR與觸控元件TD可例如直接形成在第二基 板202之一表面204上,但不以此為限,也可有其他膜層設置於走線TR與第二基板202之間或觸控元件TD與第二基板202之間。此外,舉例而言,可在第二基板202之表面204上形成一透明導電材料層,透明導電材料層可包括多個第一感測電極TE1與多個第二感測電極TE2(第4圖繪示出其中一個),該等第一感測電極TE1可形成多個第一感測串列且該等第二感測電極TE2可形成多個第二感測串列,且第一感測串列與第二感測串列可在表面204上交錯延伸,但不以此為限。第一感測電極TE1可與第二感測電極TE2分開並電性隔離。本實施例的透明導電材料可例如為透明導電氧化物(transparent conductive oxide,TCO),但不以此為限。在某些實施例中,感測電極也可以例如是由奈米金屬細線、網格狀金屬層或是其他非透明導電材料所形成,或是也可以由透明導電金屬氧化物與非透明導電材料(例如網格狀金屬)重疊而成,並不限制於單獨的由透明導電材料或非透明導電材料所形成。 Next, as shown in FIG. 1, step S108 is performed to form a trace on the first substrate in the surrounding area or on a second substrate corresponding to the surrounding area of the first substrate, and step S110 is performed in the visible area A touch element is formed on the first substrate or the visible area corresponding to the first substrate on the second substrate, wherein the trace is electrically connected to the touch element. As shown in FIG. 4, step S108 in this embodiment corresponds to the surrounding area R2 of the first substrate 102 to form one or more traces TR on a second substrate 202, and step S110 in this embodiment corresponds to the first The visible region R1 of the substrate 102 forms a touch element TD on the second substrate 202. The second substrate 202 in FIG. 4 may also have a visible area R1 and a surrounding area R2, and may correspond to the visible area R1 and the surrounding area R2 of the first substrate 102. The second substrate 202 may be the same material as the first substrate 102 described above, but not limited thereto. In some embodiments, the second substrate 202 may be a film instead of a substrate or a carrier. As also shown in FIG. 4, the trace TR and the touch element TD can be formed directly on the second substrate, for example On one surface 204 of the board 202, but not limited to this, other film layers may be disposed between the trace TR and the second substrate 202 or between the touch element TD and the second substrate 202. In addition, for example, a transparent conductive material layer may be formed on the surface 204 of the second substrate 202. The transparent conductive material layer may include a plurality of first sensing electrodes TE1 and a plurality of second sensing electrodes TE2 (FIG. 4 One of them), the first sensing electrodes TE1 may form a plurality of first sensing series and the second sensing electrodes TE2 may form a plurality of second sensing series, and the first sensing The series and the second sensing series may extend alternately on the surface 204, but not limited thereto. The first sensing electrode TE1 may be separated from the second sensing electrode TE2 and electrically isolated. The transparent conductive material in this embodiment may be, for example, transparent conductive oxide (TCO), but not limited thereto. In some embodiments, the sensing electrode may be formed of, for example, nano metal thin wires, a grid-like metal layer, or other non-transparent conductive materials, or may be formed of transparent conductive metal oxides and non-transparent conductive materials ( For example, a grid-like metal) is formed by overlapping, and is not limited to being formed of a transparent conductive material or a non-transparent conductive material alone.

此外,本實施例的觸控元件TD可包括多個橋接線BR與一絕緣層IN,相鄰兩個第一感測電極TE1可透過一條橋接線BR電性連接,橋接線BR的材料可包括透明導電材料(如TCO)或非透明導電材料(如金屬),但不以此為限。絕緣層IN可設置在橋接線BR與第二感測電極TE2之間,其中絕緣層IN可包括絕緣材料以使橋接線BR與第二感測電極TE2電性隔離。本實施例的觸控元件TD可例如包括架橋式(例如SITO設計)、雙層式(例如DITO設計)等的電極結構。 In addition, the touch element TD of this embodiment may include a plurality of bridge lines BR and an insulating layer IN, two adjacent first sensing electrodes TE1 may be electrically connected through a bridge line BR, and the material of the bridge line BR may include Transparent conductive materials (such as TCO) or non-transparent conductive materials (such as metal), but not limited to this. The insulating layer IN may be disposed between the bridge line BR and the second sensing electrode TE2, where the insulating layer IN may include an insulating material to electrically isolate the bridge line BR from the second sensing electrode TE2. The touch element TD of this embodiment may include, for example, an electrode structure such as a bridge type (for example, SITO design) or a double-layer type (for example, DITO design).

另一方面,觸控元件TD可與一或多條走線TR電性連接。舉例而言,各個第一感測串列與各個第二感測串列可分別與一條走線TR電性連接。如第4圖所示,其中一條走線TR與其中一個第一感測電極TE1連接,使得第一感測電極TE1之訊號可經走線TR傳送至外部電路或其他電子元件做進一步處理。走線 TR的材料可包括如銀、鋁、銅、鎂、鉬、鉻、鈦、上述材料之複合層或上述材料之合金等非透明導電材料,或包括如氧化銦錫、氧化銦鋅或氧化鋁鋅等透明導電材料,但並不以此為限。在本實施例中,走線TR與橋接線BR可以用同一材料一併形成,例如於形成橋接線BR時一併形成走線TR。在某些實施例中,走線TR與第一感測電極TE1及/或第二觸控感測電極TE2也可以用同一材料一併形成,例如於形成第一感測電極TE1及/或第二觸控感測電極TE2時一併形成走線TR。此外,走線TR也可包括導電粒子、奈米碳管、奈米金屬線(例如奈米銀絲)、石墨烯或矽烯等材料。製作觸控元件TD中的各元件及/或走線TR的方法可包括各種型式的鍍膜、塗佈、網印、圖案化製程(如微影暨蝕刻製程)等製造方法。 On the other hand, the touch element TD can be electrically connected to one or more traces TR. For example, each first sensing series and each second sensing series may be electrically connected to a trace TR, respectively. As shown in FIG. 4, one of the traces TR is connected to one of the first sensing electrodes TE1, so that the signal of the first sense electrode TE1 can be transmitted to an external circuit or other electronic components through the trace TR for further processing. Traces TR materials may include non-transparent conductive materials such as silver, aluminum, copper, magnesium, molybdenum, chromium, titanium, composite layers of the above materials or alloys of the above materials, or include indium tin oxide, indium zinc oxide or aluminum zinc oxide And other transparent conductive materials, but not limited to this. In this embodiment, the trace TR and the bridge line BR can be formed together using the same material, for example, the trace TR is formed together when the bridge line BR is formed. In some embodiments, the trace TR and the first sensing electrode TE1 and/or the second touch sensing electrode TE2 may also be formed of the same material, for example, when forming the first sensing electrode TE1 and/or the second The two touch sensing electrodes TE2 form a trace TR together. In addition, the trace TR may also include materials such as conductive particles, nano carbon tubes, nano metal wires (such as nano silver wires), graphene or silicon. The methods for manufacturing each element and/or trace TR in the touch element TD may include various types of manufacturing methods such as coating, coating, screen printing, and patterning processes (such as photolithography and etching processes).

此外,如第5圖所示,可將第一基板102與第二基板202進行接合。在本實施例中,透過一黏著層302將第一基板102與第二基板202接合,其中接合的方式係將第二基板202之表面204面對第一基板102之表面104設置並透過黏著層302接合,但不以此為限。換言之,黏著層302設置在第二基板202與第一基板102之間。黏著層302可包括光學膠(optical adhesive,OCA)等透明黏性材料。此外,第二基板202上的觸控元件TD對應第一基板102的可視區R1貼附,第二基板202上的走線TR對應第一基板102的周圍區R2貼附,且走線TR與非導電層106在垂直投影方向V上重疊。藉此,可透過步驟S102至步驟S110以及參考第1圖至第5圖以形成一觸控面板10。然而,製作觸控面板10的方法並不限於上述的步驟(S102至S110),可以在任何所述步驟之前、之後或之間執行其他步驟。此外,一些步驟可以同時執行,或者以與上文不同的順序執行。 In addition, as shown in FIG. 5, the first substrate 102 and the second substrate 202 may be bonded. In this embodiment, the first substrate 102 and the second substrate 202 are bonded through an adhesive layer 302, wherein the bonding method is to set the surface 204 of the second substrate 202 to face the surface 104 of the first substrate 102 and pass through the adhesive layer 302 is engaged, but not limited to this. In other words, the adhesive layer 302 is disposed between the second substrate 202 and the first substrate 102. The adhesive layer 302 may include transparent adhesive materials such as optical adhesive (OCA). In addition, the touch element TD on the second substrate 202 is attached to the visible region R1 of the first substrate 102, the trace TR on the second substrate 202 is attached to the surrounding region R2 of the first substrate 102, and the trace TR is The non-conductive layer 106 overlaps in the vertical projection direction V. Thereby, a touch panel 10 can be formed through steps S102 to S110 and referring to FIGS. 1 to 5. However, the method of manufacturing the touch panel 10 is not limited to the above steps (S102 to S110), and other steps may be performed before, after, or between any of the steps. In addition, some steps may be performed simultaneously, or in a different order than above.

簡而言之,本實施例的觸控面板10具有一可視區R1以及一周圍區R2位於可視區R1之至少一側,在此所述之觸控面板10的可視區R1及周圍區R2可對 應於上文所述之第一基板102及/或第二基板202的可視區R1及周圍區R2。觸控面板10包括第一基板102、第一裝飾層108、非導電層106、走線TR以及觸控元件TD。第一裝飾層108設置在第一基板102之表面104上並設置在周圍區R2內。非導電層106設置在第一基板102之表面104上並設置在周圍區R2內,其中第一裝飾層108與非導電層106設置在同一水平面HP上,且非導電層106包括透明非導電材料或螢光材料。走線TR設置在周圍區R2內,走線TR與非導電層106在垂直於第一基板102之垂直投影方向V上重疊,而觸控元件TD設置在可視區R1內,其中走線TR與觸控元件TD電性連接。 In short, the touch panel 10 of this embodiment has a visible area R1 and a surrounding area R2 located on at least one side of the visible area R1. The visible area R1 and the surrounding area R2 of the touch panel 10 described herein may be Correct It should be in the visible region R1 and the surrounding region R2 of the first substrate 102 and/or the second substrate 202 described above. The touch panel 10 includes a first substrate 102, a first decoration layer 108, a non-conductive layer 106, a trace TR, and a touch element TD. The first decoration layer 108 is disposed on the surface 104 of the first substrate 102 and disposed in the surrounding area R2. The non-conductive layer 106 is disposed on the surface 104 of the first substrate 102 and in the surrounding area R2, wherein the first decorative layer 108 and the non-conductive layer 106 are disposed on the same horizontal plane HP, and the non-conductive layer 106 includes a transparent non-conductive material Or fluorescent materials. The trace TR is disposed in the surrounding area R2, the trace TR and the non-conductive layer 106 overlap in the vertical projection direction V perpendicular to the first substrate 102, and the touch element TD is disposed in the viewing area R1, where the trace TR and The touch element TD is electrically connected.

此外,如第5圖所示,本實施例的第一基板102及第二基板202可皆為玻璃基板,因此觸控面板10可例如為GG(玻璃-玻璃)型式,但不以此為限。舉例而言,在某些實施例中,第一基板102可為玻璃基板,第二基板202可例如是一材料層(film),而非玻璃基板或硬質載板,此種觸控面板可例如為GF(玻璃-材料層)型式。另在某些實施例中,第一基板102可為玻璃基板,第一感測串列及與其對應的走線可設置在一材料層上,第二感測串列及與其對應的走線可設置在另一材料層上,且三者互相接合在一起,此種觸控面板可例如為GFF(玻璃-材料層-材料層)型式。 In addition, as shown in FIG. 5, the first substrate 102 and the second substrate 202 of this embodiment may both be glass substrates, so the touch panel 10 may be, for example, GG (glass-glass) type, but not limited to this . For example, in some embodiments, the first substrate 102 may be a glass substrate, and the second substrate 202 may be, for example, a film instead of a glass substrate or a rigid carrier board. Such a touch panel may, for example, GF (glass-material layer) type. In some embodiments, the first substrate 102 may be a glass substrate, the first sensing series and corresponding traces may be disposed on a material layer, and the second sensing series and corresponding traces may be It is disposed on another material layer, and the three are bonded to each other. Such a touch panel may be, for example, GFF (glass-material layer-material layer) type.

在本實施例中,由於非導電層106為非導電材料,因此即使將走線TR與非導電層106在垂直投影方向V上重疊設置,也可避免電磁干擾(electromagnetic interference,EMI)的問題產生,除此之外,還可進一步縮減周圍區R2的寬度,以實現窄邊框的設計。 In this embodiment, since the non-conductive layer 106 is a non-conductive material, even if the trace TR and the non-conductive layer 106 are overlapped in the vertical projection direction V, the problem of electromagnetic interference (EMI) can be avoided In addition, the width of the surrounding area R2 can be further reduced to achieve a narrow bezel design.

下文將針對本發明的其餘實施例進行說明,且為簡化說明,以下說 明主要針對其餘實施例與上述實施例不同之處進行詳述,而不再對相同之處作重覆贅述。此外,本發明之其餘實施例與上述實施例中相同之元件係以相同之標號進行標示,以利於各實施例間互相對照。 The following will describe the remaining embodiments of the present invention, and to simplify the description, the following The description mainly focuses on the differences between the remaining embodiments and the above-mentioned embodiments, without repeating the similarities. In addition, the same elements in the remaining embodiments of the present invention as in the above-mentioned embodiments are marked with the same reference numerals to facilitate comparison between the embodiments.

請參考第6圖至第8圖,其繪示了本發明第二實施例之蓋板及觸控面板的製作方法示意圖。本實施例與第一實施例不同的地方在於本實施例在形成非導電層106之前先形成第一裝飾層108,如第6圖所示,先將第一裝飾層108形成於第一基板102之表面104上,第一裝飾層108具有一或多個開口1083,且這些開口1083的圖形可以對應標示圖案所具有的圖形。接著,如第7圖所示,在第一裝飾層108形成之後形成非導電層106,非導電層106可填入開口1083並在垂直投影方向V上覆蓋第一裝飾層108。因此,第一裝飾層108在垂直投影方向V上設置於第一基板102與非導電層106之間。填入開口1083之非導電層106可做為標示圖案,並可讓使用者觀察到標示圖案的圖形及顏色。因此,在本實施例中,第一裝飾層108與非導電層106設置在同一水平面HP上,亦即在以水平面HP所切出的蓋板20的橫截面中可同時發現第一裝飾層108與非導電層106。 Please refer to FIG. 6 to FIG. 8, which are schematic diagrams of the manufacturing method of the cover plate and the touch panel according to the second embodiment of the present invention. The difference between this embodiment and the first embodiment is that the first decoration layer 108 is formed before the non-conductive layer 106 is formed in this embodiment. As shown in FIG. 6, the first decoration layer 108 is first formed on the first substrate 102 On the surface 104, the first decorative layer 108 has one or more openings 1083, and the graphics of these openings 1083 can correspond to the graphics of the marking pattern. Next, as shown in FIG. 7, after the first decoration layer 108 is formed, a non-conductive layer 106 is formed. The non-conductive layer 106 may fill the opening 1083 and cover the first decoration layer 108 in the vertical projection direction V. Therefore, the first decoration layer 108 is disposed between the first substrate 102 and the non-conductive layer 106 in the vertical projection direction V. The non-conductive layer 106 filled in the opening 1083 can be used as a marking pattern, and allows the user to observe the graphics and color of the marking pattern. Therefore, in this embodiment, the first decorative layer 108 and the non-conductive layer 106 are disposed on the same horizontal plane HP, that is, the first decorative layer 108 can be found at the same time in the cross section of the cover plate 20 cut with the horizontal plane HP与NON-conductive layer 106.

此外,本實施例的製作方法可選擇性地包括在非導電層106上形成一第二裝飾層110,且第二裝飾層110可覆蓋非導電層106。在本實施例中,非導電層106可設置在第二裝飾層110與第一裝飾層108之間,也可有其他膜層設置於非導電層106與第二裝飾層110之間。本實施例的第二裝飾層110可用於增加第一裝飾層108或非導電層106的色彩飽和度,但不限於此。另外,在一水平方向X上,第一裝飾層108具有第一寬度W1,非導電層106具有第二寬度W2,且第二裝飾層110具有第三寬度W3。在本實施例中,第一寬度W1可大於第二寬度W2,且第二寬度W2可大於第三寬度W3,並且在周圍區R2與可視區R1的交界附近,第一裝 飾層108、非導電層106及第二裝飾層110的側面可形成一斜面112,但不以此為限。在本實施例中,水平方向X可與垂直投影方向V垂直,但不限於此。 In addition, the manufacturing method of this embodiment may optionally include forming a second decoration layer 110 on the non-conductive layer 106, and the second decoration layer 110 may cover the non-conductive layer 106. In this embodiment, the non-conductive layer 106 may be disposed between the second decorative layer 110 and the first decorative layer 108, or other film layers may be disposed between the non-conductive layer 106 and the second decorative layer 110. The second decoration layer 110 of this embodiment can be used to increase the color saturation of the first decoration layer 108 or the non-conductive layer 106, but is not limited thereto. In addition, in a horizontal direction X, the first decorative layer 108 has a first width W1, the non-conductive layer 106 has a second width W2, and the second decorative layer 110 has a third width W3. In this embodiment, the first width W1 may be greater than the second width W2, and the second width W2 may be greater than the third width W3, and near the boundary between the surrounding area R2 and the viewing area R1, the first device A slope 112 may be formed on the sides of the decoration layer 108, the non-conductive layer 106, and the second decoration layer 110, but it is not limited thereto. In this embodiment, the horizontal direction X may be perpendicular to the vertical projection direction V, but it is not limited thereto.

接著,如第8圖所示,類似於上述第5圖及相關說明,將第7圖所形成之蓋板20透過黏著層302與第二基板202接合,其中第二基板202上形成有觸控元件TD及走線TR。在本實施例中,第二裝飾層110設置在非導電層106與走線TR之間,且走線TR與非導電層106在垂直投影方向V上重疊。 Next, as shown in FIG. 8, similar to the above FIG. 5 and related descriptions, the cover plate 20 formed in FIG. 7 is bonded to the second substrate 202 through the adhesive layer 302, where the touch is formed on the second substrate 202 Component TD and trace TR. In this embodiment, the second decoration layer 110 is disposed between the non-conductive layer 106 and the trace TR, and the trace TR and the non-conductive layer 106 overlap in the vertical projection direction V.

請參考第9圖,其繪示了本發明第三實施例之觸控面板的剖面示意圖。本實施例與第一實施例不同的地方在於本實施例的觸控面板10可例如為單片玻璃式(one glass solution,OGS)觸控面板,其中觸控元件TD及走線TR皆設置在第一基板102上。如第9圖所示,本實施例在製作完第3圖的結構之後,進行步驟S108,於周圍區R2內的第一基板102上形成走線TR,以及進行S110,於可視區R1內的第一基板102上形成觸控元件TD。在本實施例中,走線TR形成在第一裝飾層108上,例如係與第一裝飾層108之表面1081直接接觸,但不以此為限。另一方面,觸控元件TD可例如係與第一基板102之表面104直接接觸,但不以此為限。換言之,亦可於第一裝飾層108與走線TR之間或第一基板102與觸控元件TD之間設置其他膜層。另舉例而言,如第9圖所示,其中一個第一感測電極TE1可從可視區R1延伸至周圍區R2,並延伸至第一裝飾層108之斜面1082及部分的表面1081,以與其中一條走線TR接觸,使走線TR與觸控元件TD電性連接,但做法不以此為限。此外,本實施例的觸控面板10的製作方法另包括於第一基板102上形成保護層304,其中保護層304覆蓋觸控元件TD、走線TR、第一裝飾層108與非導電層106,亦即觸控元件TD、走線TR、第一裝飾層108與非導電層106設置在第一基板102與保護層304之間。保護層304可包括透明絕緣材料,但不以此為 限。 Please refer to FIG. 9, which illustrates a schematic cross-sectional view of a touch panel according to a third embodiment of the present invention. The difference between this embodiment and the first embodiment is that the touch panel 10 of this embodiment may be, for example, a one glass solution (OGS) touch panel, in which the touch element TD and the trace TR are both disposed at On the first substrate 102. As shown in FIG. 9, after the structure of FIG. 3 is fabricated in this embodiment, step S108 is performed to form a trace TR on the first substrate 102 in the surrounding region R2, and S110 is performed in the visible region R1. The touch element TD is formed on the first substrate 102. In this embodiment, the trace TR is formed on the first decoration layer 108, for example, it directly contacts the surface 1081 of the first decoration layer 108, but it is not limited thereto. On the other hand, the touch element TD may directly contact the surface 104 of the first substrate 102, but not limited thereto. In other words, other film layers may also be provided between the first decoration layer 108 and the trace TR or between the first substrate 102 and the touch element TD. For another example, as shown in FIG. 9, one of the first sensing electrodes TE1 may extend from the visible area R1 to the surrounding area R2, and extend to the inclined surface 1082 of the first decoration layer 108 and a part of the surface 1081 to One of the traces TR is in contact, so that the trace TR is electrically connected to the touch element TD, but the method is not limited to this. In addition, the manufacturing method of the touch panel 10 of this embodiment further includes forming a protective layer 304 on the first substrate 102, wherein the protective layer 304 covers the touch element TD, the trace TR, the first decoration layer 108 and the non-conductive layer 106 That is, the touch element TD, the trace TR, the first decoration layer 108 and the non-conductive layer 106 are disposed between the first substrate 102 and the protective layer 304. The protective layer 304 may include a transparent insulating material, but not as limit.

請參考第10圖,其繪示了本發明第四實施例之觸控面板的剖面示意圖。本實施例與第二實施例不同的地方在於本實施例的觸控面板10可例如為單片玻璃式(one glass solution,OGS)觸控面板,其中觸控元件TD及走線TR皆設置在第一基板102上。如第10圖所示,本實施例在製作完第7圖的結構之後,進行步驟S108及步驟S110,於第一基板102上形成觸控元件TD與走線TR,以及另於第一基板102上形成保護層304,其做法類似於第三實施例。然而,與第三實施例不同的是,本實施例之走線TR形成在第二裝飾層110上,使第二裝飾層110設置在非導電層106和走線TR之間,且走線TR例如可與第二裝飾層110之表面1101直接接觸,但不以此為限。此外,在周圍區R2與可視區R1的交界附近,第一裝飾層108、非導電層106及第二裝飾層110的側面可形成一斜面112,且其中一個第一感測電極TE1可從可視區R1延伸至周圍區R2,並延伸至斜面112及部分的表面1101,以與其中一條走線TR接觸,使走線TR與觸控元件TD電性連接,但做法不以此為限。 Please refer to FIG. 10, which illustrates a schematic cross-sectional view of a touch panel according to a fourth embodiment of the present invention. The difference between this embodiment and the second embodiment is that the touch panel 10 of this embodiment can be, for example, a one glass solution (OGS) touch panel, in which the touch element TD and the trace TR are both disposed at On the first substrate 102. As shown in FIG. 10, after the structure of FIG. 7 is fabricated in this embodiment, step S108 and step S110 are performed to form a touch element TD and a trace TR on the first substrate 102, and another on the first substrate 102 The protective layer 304 is formed thereon in a manner similar to the third embodiment. However, unlike the third embodiment, the wiring TR of this embodiment is formed on the second decoration layer 110 so that the second decoration layer 110 is disposed between the non-conductive layer 106 and the wiring TR, and the wiring TR For example, it may directly contact the surface 1101 of the second decoration layer 110, but not limited thereto. In addition, near the boundary between the surrounding area R2 and the visible area R1, a slope 112 may be formed on the sides of the first decoration layer 108, the non-conductive layer 106, and the second decoration layer 110, and one of the first sensing electrodes TE1 may be visible from The region R1 extends to the surrounding region R2, and extends to the inclined surface 112 and part of the surface 1101 to contact one of the traces TR to electrically connect the trace TR to the touch element TD, but the method is not limited to this.

請參考第11圖,其繪示了本發明第五實施例之觸控面板的剖面示意圖。本實施例與第四實施例不同的地方在於本實施例的觸控面板10並未包括第二裝飾層。如第11圖所示,本實施例之走線TR形成在非導電層106上,且走線TR例如可與非導電層106之表面1062直接接觸,但不以此為限。此外,在周圍區R2與可視區R1的交界附近,第一裝飾層108與非導電層106的側面可形成一斜面114,且其中一個第一感測電極TE1可從可視區R1延伸至周圍區R2,並延伸至斜面114及部分的表面1062,以與其中一條走線TR接觸,使走線TR與觸控元件TD電性連接,但做法不以此為限。 Please refer to FIG. 11, which illustrates a schematic cross-sectional view of a touch panel according to a fifth embodiment of the present invention. The difference between this embodiment and the fourth embodiment is that the touch panel 10 of this embodiment does not include a second decoration layer. As shown in FIG. 11, the trace TR of this embodiment is formed on the non-conductive layer 106, and the trace TR may directly contact the surface 1062 of the non-conductive layer 106, but not limited thereto. In addition, near the boundary between the surrounding area R2 and the visible area R1, a slope 114 may be formed on the sides of the first decoration layer 108 and the non-conductive layer 106, and one of the first sensing electrodes TE1 may extend from the visible area R1 to the surrounding area R2 extends to the inclined surface 114 and part of the surface 1062 to contact one of the traces TR to electrically connect the trace TR to the touch element TD, but the method is not limited to this.

綜上所述,根據本發明之觸控面板之蓋板、觸控面板及其製作方法,其使用非導電材料(如透明非導電材料或螢光材料)於周圍區內形成標識圖案。透過本發明的製作方法,蓋板或觸控面板的周圍區內設有非導電層與至少一層裝飾層,且裝飾層與非導電層設置在同一水平面上,亦即在以水平面所切出的橫截面中可同時發現裝飾層與非導電層。另一方面,由於標識圖案為非導電材料,因此即使將走線與標識圖案在垂直投影方向上重疊設置,也可避免電磁干擾(electromagnetic interference,EMI)的問題產生,除此之外,還可進一步縮減周圍區的寬度,以實現窄邊框的設計。本發明的概念可應用在蓋板或OGS、GG、GF、GFF等其他型式的觸控面板。 In summary, according to the cover plate of the touch panel of the present invention, the touch panel and the manufacturing method thereof, non-conductive materials (such as transparent non-conductive materials or fluorescent materials) are used to form a logo pattern in the surrounding area. Through the manufacturing method of the present invention, a non-conductive layer and at least one decorative layer are provided in the surrounding area of the cover plate or touch panel, and the decorative layer and the non-conductive layer are arranged on the same horizontal plane, that is, cut out in a horizontal plane A decorative layer and a non-conductive layer can be found in the cross section at the same time. On the other hand, since the marking pattern is a non-conductive material, even if the wiring and the marking pattern are overlapped in the vertical projection direction, the problem of electromagnetic interference (EMI) can be avoided. In addition, Further reduce the width of the surrounding area to achieve a narrow border design. The concept of the present invention can be applied to cover plates or other types of touch panels such as OGS, GG, GF, and GFF.

以上所述僅為本發明之較佳實施例,凡依本發明申請專利範圍所做之均等變化與修飾,皆應屬本發明之涵蓋範圍。 The above are only the preferred embodiments of the present invention, and all changes and modifications made in accordance with the scope of the patent application of the present invention shall fall within the scope of the present invention.

10‧‧‧觸控面板 10‧‧‧Touch panel

102‧‧‧第一基板 102‧‧‧The first substrate

104、204‧‧‧表面 104, 204‧‧‧surface

106‧‧‧非導電層 106‧‧‧Non-conductive layer

1061‧‧‧開口 1061‧‧‧ opening

108‧‧‧第一裝飾層 108‧‧‧The first decorative layer

1082‧‧‧斜面 1082‧‧‧Bevel

20‧‧‧蓋板 20‧‧‧Cover

202‧‧‧第二基板 202‧‧‧Second substrate

302‧‧‧黏著層 302‧‧‧ Adhesive layer

BR‧‧‧橋接線 BR‧‧‧Bridge

HP‧‧‧水平面 HP‧‧‧horizontal

IN‧‧‧絕緣層 IN‧‧‧Insulation

R1‧‧‧可視區 R1‧‧‧Viewable area

R2‧‧‧周圍區 R2‧‧‧ Surrounding area

TD‧‧‧觸控元件 TD‧‧‧Touch element

TE1‧‧‧第一感測電極 TE1‧‧‧First sensing electrode

TE2‧‧‧第二感測電極 TE2‧‧‧Second sensing electrode

TR‧‧‧走線 TR‧‧‧Trace

V‧‧‧垂直投影方向 V‧‧‧Vertical projection direction

X‧‧‧水平方向 X‧‧‧horizontal

Claims (13)

一種觸控面板,具有一可視區以及一周圍區位於該可視區之至少一側,且該觸控面板包括:一第一基板;一第一裝飾層,設置在該第一基板之一表面上並設置在該周圍區內;一非導電層,設置在該第一基板之該表面上並設置在該周圍區內,其中該第一裝飾層與該非導電層設置在同一水平面上,且該非導電層包括透明非導電材料或螢光材料;一走線,設置在該周圍區內;以及一觸控元件,設置在該可視區內,其中該走線與該觸控元件電性連接,其中該非導電層在一垂直投影方向上設置於該第一基板與該第一裝飾層之間。 A touch panel has a visible area and a surrounding area located on at least one side of the visible area, and the touch panel includes: a first substrate; a first decorative layer disposed on a surface of the first substrate And disposed in the surrounding area; a non-conductive layer is disposed on the surface of the first substrate and in the surrounding area, wherein the first decorative layer and the non-conductive layer are disposed on the same horizontal plane, and the non-conductive The layer includes a transparent non-conductive material or a fluorescent material; a trace is provided in the surrounding area; and a touch element is provided in the viewing area, wherein the trace is electrically connected to the touch element, wherein the non-conductive The conductive layer is disposed between the first substrate and the first decoration layer in a vertical projection direction. 如請求項1所述之觸控面板,其中該走線與該非導電層在垂直於該第一基板之該垂直投影方向上重疊。 The touch panel of claim 1, wherein the trace and the non-conductive layer overlap in the vertical projection direction perpendicular to the first substrate. 如請求項1所述之觸控面板,其中該觸控元件設置在該第一基板上,且該走線設置在該第一裝飾層上。 The touch panel according to claim 1, wherein the touch element is disposed on the first substrate, and the trace is disposed on the first decoration layer. 如請求項1所述之觸控面板,其中該觸控面板另包括:一保護層,其中該觸控元件、該走線、該第一裝飾層與該非導電層設置在該第一基板與該保護層之間。 The touch panel according to claim 1, wherein the touch panel further comprises: a protective layer, wherein the touch element, the trace, the first decoration layer and the non-conductive layer are disposed on the first substrate and the Between protective layers. 如請求項1所述之觸控面板,另包括: 一第二基板,其中該走線與該觸控元件設置在該第二基板上;以及一黏著層,設置在該第二基板與該第一基板之間。 The touch panel as described in claim 1, further including: A second substrate, wherein the trace and the touch element are disposed on the second substrate; and an adhesive layer is disposed between the second substrate and the first substrate. 一種觸控面板的製作方法,包括:提供一第一基板,其中該第一基板定義有一可視區以及一周圍區位於該可視區之至少一側;於該周圍區內的該第一基板之一表面上形成一非導電層,其中該非導電層包括透明非導電材料或螢光材料;於該周圍區內的該第一基板之該表面上形成一第一裝飾層,其中該第一裝飾層與該非導電層設置在同一水平面上;於該周圍區內的該第一基板上或者對應該第一基板的該周圍區於一第二基板上形成一走線;以及於該可視區內的該第一基板上或者對應該第一基板的該可視區於該第二基板上形成一觸控元件,其中該走線與該觸控元件電性連接,其中在形成該第一裝飾層之前先形成該非導電層,該非導電層具有一開口,後續形成之該第一裝飾層填入該開口,且該非導電層在一垂直投影方向上設置於該第一基板與該第一裝飾層之間。 A method for manufacturing a touch panel, comprising: providing a first substrate, wherein the first substrate defines a visible area and a surrounding area on at least one side of the visible area; one of the first substrates in the surrounding area A non-conductive layer is formed on the surface, wherein the non-conductive layer includes a transparent non-conductive material or a fluorescent material; a first decorative layer is formed on the surface of the first substrate in the surrounding area, wherein the first decorative layer and The non-conductive layer is disposed on the same horizontal plane; a trace is formed on the first substrate in the surrounding area or the surrounding area corresponding to the first substrate on a second substrate; and the first in the visible area A touch element is formed on the substrate or the viewable area corresponding to the first substrate on the second substrate, wherein the trace is electrically connected to the touch element, and the non-contact element is formed before the first decoration layer is formed A conductive layer, the non-conductive layer has an opening, the first decorative layer formed subsequently fills the opening, and the non-conductive layer is disposed between the first substrate and the first decorative layer in a vertical projection direction. 如請求項6所述之觸控面板的製作方法,其中該走線與該非導電層在垂直於該第一基板之該垂直投影方向上重疊。 The method for manufacturing a touch panel according to claim 6, wherein the trace and the non-conductive layer overlap in the vertical projection direction perpendicular to the first substrate. 如請求項6所述之觸控面板的製作方法,其中該走線形成在該第一裝飾層上。 The method for manufacturing a touch panel according to claim 6, wherein the trace is formed on the first decoration layer. 如請求項6所述之觸控面板的製作方法,其中該走線與該觸控元件形成在該第一基板上,且該製作方法另包括:於該第一基板上形成一保護層,其中該保護層覆蓋該觸控元件、該走線、該第一裝飾層與該非導電層。 The method for manufacturing a touch panel according to claim 6, wherein the trace and the touch element are formed on the first substrate, and the manufacturing method further includes: forming a protective layer on the first substrate, wherein The protective layer covers the touch element, the trace, the first decoration layer and the non-conductive layer. 如請求項6所述之觸控面板的製作方法,其中該走線與該觸控元件形成在該第二基板之一表面上,且該製作方法另包括:透過一黏著層將該第一基板與該第二基板接合,其中該第二基板之該表面面對該第一基板之該表面設置。 The method for manufacturing a touch panel according to claim 6, wherein the trace and the touch element are formed on a surface of the second substrate, and the manufacturing method further includes: using a bonding layer to apply the first substrate Bonded to the second substrate, wherein the surface of the second substrate is disposed facing the surface of the first substrate. 一種觸控面板之蓋板,具有一可視區以及一周圍區位於該可視區之至少一側,且該蓋板包括:一基板;一裝飾層,設置在該基板之一表面上並設置在該周圍區內;以及一非導電層,設置在該基板之該表面上並設置在該周圍區內,其中該裝飾層與該非導電層設置在同一水平面上,且該非導電層包括透明非導電材料或螢光材料,其中該非導電層在一垂直投影方向上設置於該第一基板與該第一裝飾層之間。 A cover plate of a touch panel has a visible area and a surrounding area on at least one side of the visible area, and the cover plate includes: a substrate; a decorative layer disposed on a surface of the substrate and on the surface The surrounding area; and a non-conductive layer disposed on the surface of the substrate and in the surrounding area, wherein the decorative layer and the non-conductive layer are disposed on the same horizontal plane, and the non-conductive layer includes a transparent non-conductive material or Fluorescent material, wherein the non-conductive layer is disposed between the first substrate and the first decoration layer in a vertical projection direction. 一種觸控面板,具有一可視區以及一周圍區位於該可視區之至少一側,且該觸控面板包括:一第一基板;一第一裝飾層,設置在該第一基板之一表面上並設置在該周圍區內; 一非導電層,設置在該第一基板之該表面上並設置在該周圍區內,其中該第一裝飾層與該非導電層設置在同一水平面上,且該非導電層包括透明非導電材料或螢光材料,其中該第一裝飾層在一垂直投影方向上設置於該第一基板與該非導電層之間;一走線,設置在該周圍區內;一觸控元件,設置在該可視區內,其中該走線與該觸控元件電性連接;以及一第二裝飾層,設置在該非導電層和該走線之間。 A touch panel has a visible area and a surrounding area located on at least one side of the visible area, and the touch panel includes: a first substrate; a first decorative layer disposed on a surface of the first substrate And set in the surrounding area; A non-conductive layer is disposed on the surface of the first substrate and in the surrounding area, wherein the first decorative layer and the non-conductive layer are disposed on the same horizontal plane, and the non-conductive layer includes a transparent non-conductive material or fluorescent Optical material, wherein the first decorative layer is disposed between the first substrate and the non-conductive layer in a vertical projection direction; a trace is disposed in the surrounding area; and a touch element is disposed in the visible area , Wherein the trace is electrically connected to the touch element; and a second decoration layer is disposed between the non-conductive layer and the trace. 一種觸控面板的製作方法,包括:提供一第一基板,其中該第一基板定義有一可視區以及一周圍區位於該可視區之至少一側;於該周圍區內的該第一基板之一表面上形成一非導電層,其中該非導電層包括透明非導電材料或螢光材料;於該周圍區內的該第一基板之該表面上形成一第一裝飾層,其中該第一裝飾層與該非導電層設置在同一水平面上,其中在形成該非導電層之前先形成該第一裝飾層,該第一裝飾層具有一開口,後續形成之該非導電層填入該開口,且該第一裝飾層在一垂直投影方向上設置於該第一基板與該非導電層之間;於該周圍區內的該第一基板上或者對應該第一基板的該周圍區於一第二基板上形成一走線;於該可視區內的該第一基板上或者對應該第一基板的該可視區於該第二基板上形成一觸控元件,其中該走線與該觸控元件電性連接;以及在該非導電層上形成一第二裝飾層,其中該第二裝飾層設置在該非導電層與該走線之間。 A method for manufacturing a touch panel, comprising: providing a first substrate, wherein the first substrate defines a visible area and a surrounding area on at least one side of the visible area; one of the first substrates in the surrounding area A non-conductive layer is formed on the surface, wherein the non-conductive layer includes a transparent non-conductive material or a fluorescent material; a first decorative layer is formed on the surface of the first substrate in the surrounding area, wherein the first decorative layer and The non-conductive layer is arranged on the same horizontal plane, wherein the first decorative layer is formed before the non-conductive layer is formed, the first decorative layer has an opening, the non-conductive layer formed subsequently fills the opening, and the first decorative layer Disposed between the first substrate and the non-conductive layer in a vertical projection direction; forming a trace on the second substrate in the surrounding area or on the second substrate corresponding to the surrounding area of the first substrate A touch element is formed on the first substrate in the viewable area or the viewable area corresponding to the first substrate on the second substrate, wherein the trace is electrically connected to the touch element; and in the non- A second decorative layer is formed on the conductive layer, wherein the second decorative layer is disposed between the non-conductive layer and the trace.
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US20140347577A1 (en) * 2013-05-24 2014-11-27 Wintek Corporation Touch panel
TWM503607U (en) * 2014-04-17 2015-06-21 Wintek Corp Cover substrate and touch device
TWI525495B (en) * 2013-01-28 2016-03-11 宸鴻科技(廈門)有限公司 Touch panel and manufacturing method thereof

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TWI525495B (en) * 2013-01-28 2016-03-11 宸鴻科技(廈門)有限公司 Touch panel and manufacturing method thereof
US20140347577A1 (en) * 2013-05-24 2014-11-27 Wintek Corporation Touch panel
TWM503607U (en) * 2014-04-17 2015-06-21 Wintek Corp Cover substrate and touch device

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