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TWI646379B - Display panel - Google Patents

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Publication number
TWI646379B
TWI646379B TW106142412A TW106142412A TWI646379B TW I646379 B TWI646379 B TW I646379B TW 106142412 A TW106142412 A TW 106142412A TW 106142412 A TW106142412 A TW 106142412A TW I646379 B TWI646379 B TW I646379B
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TW
Taiwan
Prior art keywords
substrate
light
shielding pattern
display panel
voltage
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TW106142412A
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Chinese (zh)
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TW201925883A (en
Inventor
蘇家妮
莊凱鈞
何宗昇
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友達光電股份有限公司
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Priority to TW106142412A priority Critical patent/TWI646379B/en
Priority to CN201810129062.0A priority patent/CN108287427B/en
Application granted granted Critical
Publication of TWI646379B publication Critical patent/TWI646379B/en
Publication of TW201925883A publication Critical patent/TW201925883A/en

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    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509Filters, e.g. light shielding masks

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Liquid Crystal (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)

Abstract

一種顯示面板,包括第一基板、設置於第一基板的對向的第二基板、位於第一基板與第二基板之間的顯示介質以及配置於第二基板上的遮光圖案。遮光圖案位於第二基板與顯示介質之間。遮光圖案的電阻率對施加於遮光圖案上之一電壓的變化率小於或等於3.33∙10 13歐姆·公分/伏特,其中電壓大於0伏特且小於或等於30伏特。 A display panel includes a first substrate, a second substrate disposed opposite the first substrate, a display medium located between the first substrate and the second substrate, and a light-shielding pattern disposed on the second substrate. The light-shielding pattern is located between the second substrate and the display medium. The change rate of the resistivity of the light-shielding pattern to a voltage applied to the light-shielding pattern is less than or equal to 3.33 ∙ 10 13 ohm · cm / volt, where the voltage is greater than 0 volts and less than or equal to 30 volts.

Description

顯示面板Display panel

本發明是有關於一種光電裝置,且特別是有關於一種顯示面板。The present invention relates to a photovoltaic device, and more particularly to a display panel.

一般而言,現今的顯示面板在製造時大多使用一種滴下式注入法(One Drop Filling;ODF)的技術,先將顯示介質(例如:液晶)直接滴在一基板上,然後,再取另一片基板進行對組。Generally speaking, most of today ’s display panels are manufactured using a One Drop Filling (ODF) technology. First, a display medium (such as liquid crystal) is directly dropped on a substrate, and then another piece is taken. The substrates are aligned.

然而,使用滴下式注入法將顯示介質滴到其中一基板上的配向膜時,受到滴下之顯示介質的影響,配向膜在滴下區與未滴下區的性質可能產生差異。因此,顯示面板於剛開機的前一至二分鐘時(例如:90秒時),其顯示之白畫面會浮現與滴下區對應的多個黑點,即滴下色暈(drop mura);但顯示面板於開機一段時間後(例如:10分鐘後),所述多個黑點又會消失。滴下色暈(drop mura)嚴重地影響顯示面板的品質,目前急需一種能解決上述問題的方案。However, when the display medium is dropped on one of the substrates by using the dripping injection method, the properties of the alignment film may be different between the dripped area and the non-drip area due to the influence of the dropped display medium. Therefore, when the display panel is turned on for one to two minutes (for example, at 90 seconds), the white screen displayed on the display panel will appear multiple black dots corresponding to the dripping area, that is, drop mura; After turning on for a period of time (for example, after 10 minutes), the multiple black dots will disappear again. Drop mura seriously affects the quality of the display panel, and a solution that can solve the above problems is urgently needed.

本發明提供一種顯示面板,其顯示品質良好。The invention provides a display panel with good display quality.

本發明的一種顯示面板,包括第一基板、設置於第一基板的對向的第二基板、位於第一基板與第二基板之間的顯示介質以及配置於第二基板上的遮光圖案。遮光圖案位於第二基板與顯示介質之間。遮光圖案的電阻率對施加於遮光圖案上之一電壓的變化率小於或等於3.33∙10 13歐姆·公分/伏特,而施加於遮光圖案上的電壓大於0伏特且小於或等於30 伏特。 A display panel of the present invention includes a first substrate, a second substrate disposed opposite to the first substrate, a display medium located between the first substrate and the second substrate, and a light-shielding pattern disposed on the second substrate. The light-shielding pattern is located between the second substrate and the display medium. The change rate of the resistivity of the light-shielding pattern to a voltage applied to the light-shielding pattern is less than or equal to 3.33 ∙ 10 13 ohm · cm / volt, and the voltage applied to the light-shielding pattern is greater than 0 volts and less than or equal to 30 volts.

本發明的一種顯示面板,包括第一基板、設置於第一基板的對向的第二基板、位於第一基板與第二基板之間的顯示介質以及配置於第二基板上的遮光圖案。遮光圖案位於第二基板與顯示介質之間。遮光圖案的電阻率對施加於遮光圖案上之一電壓的變化率小於或等於1.38∙10 13歐姆·公分/伏特,而施加於遮光圖案上的電壓大於20伏特且小於或等於30 伏特。 A display panel of the present invention includes a first substrate, a second substrate disposed opposite to the first substrate, a display medium located between the first substrate and the second substrate, and a light-shielding pattern disposed on the second substrate. The light-shielding pattern is located between the second substrate and the display medium. The change rate of the resistivity of the light-shielding pattern to a voltage applied to the light-shielding pattern is less than or equal to 1.38 · 10 13 ohm · cm / volt, and the voltage applied to the light-shielding pattern is greater than 20 volts and less than or equal to 30 volts.

基於上述,本發明一實施例之顯示面板包括第一基板、設置於第一基板的對向的第二基板、位於第一基板與第二基板之間的顯示介質以及配置於第二基板上的遮光圖案。特別是,遮光圖案之電阻率對施加於其上之電壓的變化率小。藉此,能改善滴下色暈(drop mura)的問題,提升顯示品質。Based on the above, a display panel according to an embodiment of the present invention includes a first substrate, a second substrate disposed opposite to the first substrate, a display medium located between the first substrate and the second substrate, and a display substrate disposed on the second substrate. Shading pattern. In particular, the change rate of the resistivity of the light-shielding pattern with respect to the voltage applied thereto is small. Therefore, the problem of drop mura can be improved, and the display quality can be improved.

為讓本發明的上述特徵和優點能更明顯易懂,下文特舉實施例,並配合所附圖式作詳細說明如下。In order to make the above features and advantages of the present invention more comprehensible, embodiments are hereinafter described in detail with reference to the accompanying drawings.

現將詳細地參考本發明的示範性實施例,示範性實施例的實例說明於圖式中。只要有可能,相同元件符號在圖式和描述中用來表示相同或相似部分。Reference will now be made in detail to the exemplary embodiments of the present invention, examples of which are illustrated in the accompanying drawings. Wherever possible, the same reference numbers are used in the drawings and the description to refer to the same or like parts.

圖1為本發明的一實施例顯示面板的剖面示意圖。FIG. 1 is a schematic cross-sectional view of a display panel according to an embodiment of the present invention.

請參考圖1,顯示面板10包括第一基板100、配置於第一基板100上的畫素單元110、設置於第一基板100之對向的第二基板180、位於第一基板100與第二基板180之間的顯示介質160、以及配置於第二基板180上且位於第二基板180與顯示介質160之間的遮光圖案170。遮光圖案170遮蔽相鄰之多個畫素單元110之多個畫素電極114之間的間隙114b。在本實施例中,顯示面板10還包括彼此交錯且與多個畫素單元110之多個薄膜電晶體112電性連接的多條資料線(未繪示)及多條掃描線(未繪示),而遮光圖案170還遮蔽資料線及掃描線。換言之,在本實施例中,遮光圖案170可以是網狀圖案,而所述網狀圖案的多個網孔170a與多個畫素單元110的多個畫素電極114重疊。Please refer to FIG. 1, the display panel 10 includes a first substrate 100, a pixel unit 110 disposed on the first substrate 100, a second substrate 180 disposed opposite to the first substrate 100, and located on the first substrate 100 and the second substrate 100. A display medium 160 between the substrates 180 and a light-shielding pattern 170 disposed on the second substrate 180 and located between the second substrate 180 and the display medium 160. The light shielding pattern 170 shields the gaps 114 b between the pixel electrodes 114 of the adjacent pixel units 110. In this embodiment, the display panel 10 further includes a plurality of data lines (not shown) and a plurality of scanning lines (not shown) that are staggered with each other and are electrically connected to the plurality of thin film transistors 112 of the plurality of pixel units 110. ), And the light-shielding pattern 170 also shields the data lines and the scanning lines. In other words, in this embodiment, the light-shielding pattern 170 may be a mesh pattern, and the mesh holes 170 a of the mesh pattern overlap the pixel electrodes 114 of the pixel units 110.

於本實施例中,顯示面板10還包括第一配向膜PI1及第二配向膜PI2。第一配向膜PI1配置於第一基板100上、覆蓋畫素單元110且位於顯示介質160與第一基板100之間。第二配向膜PI2配置於第二基板180上、覆蓋遮光圖案170且位於第二基板180與顯示介質160之間。舉例而言,在本實施例中,顯示介質160可以是具有多個液晶分子的液晶層,而第一配向膜PI1及第二配向膜PI2用以在顯示面板10未致能時固定液晶分子的預傾角(pre-tile angle)及方位角(azimuth angle)。In this embodiment, the display panel 10 further includes a first alignment film PI1 and a second alignment film PI2. The first alignment film PI1 is disposed on the first substrate 100, covers the pixel unit 110, and is located between the display medium 160 and the first substrate 100. The second alignment film PI2 is disposed on the second substrate 180, covers the light-shielding pattern 170, and is located between the second substrate 180 and the display medium 160. For example, in this embodiment, the display medium 160 may be a liquid crystal layer having a plurality of liquid crystal molecules, and the first alignment film PI1 and the second alignment film PI2 are used to fix the liquid crystal molecules when the display panel 10 is not enabled. Pre-tile angle and azimuth angle.

於本實施例中,畫素單元110包括薄膜電晶體112及畫素電極114。畫素電極114與薄膜電晶體112電性連接。舉例而言,在本實施例中,顯示面板10還包括絕緣層120,絕緣層120覆蓋薄膜電晶體112,畫素電極114配置於絕緣層120及絕緣層130上且透過絕緣層120的開口120a及絕緣層130的開口130a與畫素電極114電性連接。然而,本發明不限於此,根據其它實施例,畫素電極114也可利用其它方式與薄膜電晶體112電性連接。In this embodiment, the pixel unit 110 includes a thin film transistor 112 and a pixel electrode 114. The pixel electrode 114 is electrically connected to the thin film transistor 112. For example, in this embodiment, the display panel 10 further includes an insulating layer 120. The insulating layer 120 covers the thin film transistor 112. The pixel electrode 114 is disposed on the insulating layer 120 and the insulating layer 130 and passes through the opening 120a of the insulating layer 120. The opening 130 a of the insulating layer 130 is electrically connected to the pixel electrode 114. However, the present invention is not limited to this. According to other embodiments, the pixel electrode 114 may be electrically connected to the thin film transistor 112 by other methods.

於本實施例中,顯示面板10還包括共用電極140,其中,共用電極140與畫素電極114之間的電壓用以驅動顯示介質160,進而使顯示面板10顯示畫面。舉例而言,在本實施例中,共用電極140與畫素電極114可選擇性地皆設置於第一基板100上,共用電極140與畫素電極114之間夾有絕緣層130,畫素電極114可具有與共用電極140重疊的多個狹縫114a,狹縫114a邊緣與共用電極140之間的電場用以驅動顯示介質160。換言之,在本實施例中,顯示面板10例如是邊緣場切換(fringe field switching,FFS)型的液晶顯示面板。然而,本發明不限於此,在其它實施例中,顯示面板10也可以是共面切換(in-plane switching,IPS)型、垂直配向(vertical alignment,VA)型、扭曲向列(Twisted Nematic,TN)、光學補償彎曲(optically compensated bend,OCB)型或其它適當形式的液晶顯示面板。In this embodiment, the display panel 10 further includes a common electrode 140. The voltage between the common electrode 140 and the pixel electrode 114 is used to drive the display medium 160, so that the display panel 10 displays a picture. For example, in this embodiment, the common electrode 140 and the pixel electrode 114 may be selectively disposed on the first substrate 100, and an insulating layer 130 is sandwiched between the common electrode 140 and the pixel electrode 114. The pixel electrode 114 may have a plurality of slits 114a overlapping the common electrode 140, and an electric field between the edge of the slit 114a and the common electrode 140 is used to drive the display medium 160. In other words, in this embodiment, the display panel 10 is, for example, a fringe field switching (FFS) type liquid crystal display panel. However, the present invention is not limited thereto. In other embodiments, the display panel 10 may also be an in-plane switching (IPS) type, a vertical alignment (VA) type, or a twisted nematic, TN), optically compensated bend (OCB) type or other suitable form of liquid crystal display panel.

圖2A至圖2D示出推測之比較例之顯示面板的滴下色暈(drop mura)的形成過程。2A to 2D illustrate a formation process of a drop mura of a display panel of a comparative example that is estimated.

請參考圖2A,圖2A示出比較例之顯示面板10A的剖面,比較例之顯示面板10A與本發明一實施例之顯示面板10類似,比較例之顯示面板10A與本發明一實施例之顯示面板10的差異在於,比較例之顯示面板10A的遮光圖案170A的材料特性與本發明一實施例之顯示面板10的遮光圖案170的材料特性不同。比較例之顯示面板10A係利用滴下式注入法製得;於滴下式注入工序中,當顯示介質材料(例如:液晶)滴至第一基板100上的第一配向膜PI1時,受液晶滴下時所產生之力的影響,第一配向膜PI1在滴下區R1與未滴下區R2的性質可能產生差異,例如:電荷分佈狀態不同。Please refer to FIG. 2A. FIG. 2A shows a cross-section of a display panel 10A of a comparative example. The display panel 10A of the comparative example is similar to the display panel 10 of an embodiment of the present invention. The difference between the panels 10 is that the material characteristics of the light-shielding pattern 170A of the display panel 10A of the comparative example are different from the material characteristics of the light-shielding pattern 170 of the display panel 10 according to an embodiment of the present invention. The display panel 10A of the comparative example is produced by a dripping injection method. In the dripping injection process, when a display medium material (for example, liquid crystal) is dropped on the first alignment film PI1 on the first substrate 100, the liquid crystal is dropped when the liquid crystal is dropped. Due to the influence of the generated force, the properties of the first alignment film PI1 in the dripping region R1 and the non-dropping region R2 may be different, for example, the charge distribution states are different.

請參考圖2B,接著,令顯示面板10A致能,亦即,令畫素電極114與共用電極140之間存在一電壓V而欲使顯示面板10A顯示單一灰階畫面。此時,顯示介質160中的正離子與負離子分別向第一配向膜PI1或第二配向膜PI2移動,例如:負離子往位於第一基板100上的第一配向膜PI1移動,而正離子往位於第二基板180上的第二配向膜PI2移動。同時間,位於第二基板180上的遮光圖案170A也受到電壓V的影響,使得遮光圖案170A的阻抗值下降,造成設有遮光圖案170A的這側產生較大的感電效應,進而使顯示介質160中的正負離子分離現象更明顯。正負離子分離使得施加於滴下區R1上方之部分顯示介質160與施加於未滴下區R2的電場差異更大,導致顯示面板10A出現滴下色暈(drop mura),例如:顯示面板10A剛開機90秒時,其顯示之灰階畫面會浮現與滴下區R1對應的多個黑點。Please refer to FIG. 2B. Next, the display panel 10A is enabled, that is, a voltage V is present between the pixel electrode 114 and the common electrode 140, and the display panel 10A is intended to display a single grayscale picture. At this time, the positive and negative ions in the display medium 160 move toward the first alignment film PI1 or the second alignment film PI2, for example, the negative ions move toward the first alignment film PI1 on the first substrate 100, and the positive ions move toward the first alignment film PI1. The second alignment film PI2 on the second substrate 180 moves. At the same time, the light-shielding pattern 170A located on the second substrate 180 is also affected by the voltage V, which causes the resistance value of the light-shielding pattern 170A to decrease, causing a larger electro-optical effect on the side where the light-shielding pattern 170A is provided, and thus the display medium 160 The separation of positive and negative ions is more obvious. The separation of the positive and negative ions makes the difference between the electric field applied to the portion of the display medium 160 above the dripped region R1 and that applied to the non-drip region R2, which causes the display panel 10A to exhibit a drop mura. At that time, a gray-scale picture displayed on the display will appear multiple black dots corresponding to the dripping area R1.

接著,請參考圖2C,於顯示面板10A致能一段時間後,顯示介質160中游離的離子受到各畫素電極114附近的電場吸引,正離子與負離子分別往第一配向膜PI1與第二配向膜PI2移動。此時,分別往第一配向膜PI1與第二配向膜PI2移動之顯示介質160中的正離子及負離子能降低滴下區R1與未滴下區R2的電荷分佈差異。因此,滴下色暈的現象變輕微,例如:欲顯示灰階畫面之顯示面板10A開機10分鐘後,滴下區R1所對應的黑點會淡化。Next, please refer to FIG. 2C. After the display panel 10A is enabled for a period of time, the free ions in the display medium 160 are attracted by the electric field near the pixel electrodes 114, and the positive and negative ions are respectively directed to the first alignment film PI1 and the second alignment. Membrane PI2 moves. At this time, the positive and negative ions in the display medium 160 moving toward the first alignment film PI1 and the second alignment film PI2, respectively, can reduce the difference in charge distribution between the dripped region R1 and the undrip region R2. Therefore, the phenomenon of dripping halo becomes slight. For example, after the display panel 10A to display a grayscale image is turned on for 10 minutes, the black dot corresponding to the dripping area R1 will fade.

接著,請參考圖2D,顯示面板10A長時間致能後,顯示介質160中游離的離子受到畫素電極114附近的電場吸引而聚集至畫素電極114周圍,而消彌第一配向膜PI1上之滴下區R1與未滴下區R2的電荷分佈差異。此時,滴下色暈的現象消失,例如:欲顯示灰階畫面之顯示面板10A開機半天後,滴下區R1所對應的黑點消失。Next, please refer to FIG. 2D. After the display panel 10A is enabled for a long time, the free ions in the display medium 160 are attracted by the electric field near the pixel electrode 114 to gather around the pixel electrode 114, and the first alignment film PI1 is eliminated. The difference in charge distribution between the dripped region R1 and the non-drip region R2. At this time, the phenomenon of dropping the halo disappears. For example, after the display panel 10A to display a grayscale picture is turned on for half a day, the black dot corresponding to the dropping area R1 disappears.

相較於比較例之顯示面板10A,本發明一實施例的顯示面板10採用耐高壓且具高阻抗的遮光圖案170。由於遮光圖案170具有耐高壓的性質,因此顯示面板10致能而遮光圖案170被施加電壓時,遮光圖案170仍可維持高阻抗狀態,進而使與遮光圖案170同側的第二配向膜PI2上產生的感電效應較小,促使施加於滴下區R1上方之部分顯示介質160與施加於未滴下區R2上方之部分顯示介質160的電場差異不致擴大,藉此能改善滴下色暈現象。Compared with the display panel 10A of the comparative example, the display panel 10 according to an embodiment of the present invention uses a high-voltage-resistant and high-impedance light-shielding pattern 170. Because the light-shielding pattern 170 has a high-voltage resistance property, when the display panel 10 is enabled and the light-shielding pattern 170 is applied with a voltage, the light-shielding pattern 170 can still maintain a high impedance state, so that the second alignment film PI2 on the same side as the light-shielding pattern 170 The small induced electrical effect causes the difference in electric field between the portion of the display medium 160 applied above the dripped region R1 and the portion of the display medium 160 applied above the non-dropped region R2 not to be enlarged, thereby improving the dripping halo phenomenon.

圖3示出比較例之顯示面板的遮光圖案的施加電壓與電阻率的關係、第一實施例之顯示面板的遮光圖案的施加電壓與電阻率的關係以及第二實施例之顯示面板的遮光圖案的施加電壓與電阻率的關係。圖3的縱軸(或稱為垂直軸)代表的是電阻率,電阻率單位為歐姆·公分(Ω‧cm),圖3的橫軸(或稱為水平軸)代表的是施加於遮光圖案上的電壓,電壓的單位為伏特(V)。圖3所示之數據係利用下述方法測得:3 shows the relationship between the applied voltage and resistivity of the light-shielding pattern of the display panel of the comparative example, the relationship between the applied voltage and resistivity of the light-shielding pattern of the display panel of the first embodiment, and the light-shielding pattern of the display panel of the second embodiment. The relationship between the applied voltage and resistivity. The vertical axis (or vertical axis) of FIG. 3 represents the resistivity, and the unit of resistivity is ohm · cm (Ω‧cm), and the horizontal axis (or horizontal axis) of FIG. 3 represents the light-shielding pattern. Voltage in volts (V). The data shown in Figure 3 was measured using the following method:

圖4示出測量遮光圖案170或170A之材料的電阻率的過程。FIG. 4 shows a process of measuring the resistivity of the material of the light-shielding pattern 170 or 170A.

請參考圖4,首先,在基板200上配置導電層,以作為第一電極210。在本實施例中,基板200例如是素玻璃,第一電極210的材料例如是鉻。接著,在第一電極210上配置黑色矩陣BM。黑色矩陣BM是本發明一實施例之遮光圖案170或170A的材料。接著,以加熱板加熱黑色矩陣BM至100℃並維持90秒。然後,去除部分黑色矩陣BM,以使黑色矩陣BM暴露出第一電極210的一部分210a。在本實施例中,去除黑色矩陣BM的方法例如是使用丙酮。在本實施例中,接著,可選擇地令黑色矩陣BM曝光。曝光後,將黑色矩陣BM置入加熱爐,以固化黑色矩陣BM,其中加熱爐係升溫至230℃並維持20分鐘。在本實施例中,已固化的黑色矩陣BM的厚度約為3.3微米(μm)。接著,在黑色矩陣BM上配置第二電極220。在本實施例中,第二電極220的材料例如是銀膠。接著,令第一電極210與第二電極220分別電性連接至一電壓源的兩端,以施予一電壓至黑色矩陣BM,並量測通過黑色矩陣BM的電流值。藉由所述電壓值及所述電流值便能獲得黑色矩陣BM的電阻率。Please refer to FIG. 4. First, a conductive layer is disposed on the substrate 200 as the first electrode 210. In this embodiment, the substrate 200 is, for example, plain glass, and the material of the first electrode 210 is, for example, chromium. Next, a black matrix BM is arranged on the first electrode 210. The black matrix BM is a material of the light-shielding pattern 170 or 170A according to an embodiment of the present invention. Next, the black matrix BM was heated to 100 ° C. with a hot plate for 90 seconds. Then, a part of the black matrix BM is removed so that the black matrix BM exposes a part 210 a of the first electrode 210. In this embodiment, a method of removing the black matrix BM is, for example, using acetone. In this embodiment, the black matrix BM is then optionally exposed. After the exposure, the black matrix BM is placed in a heating furnace to cure the black matrix BM. The heating furnace system is heated to 230 ° C. and maintained for 20 minutes. In this embodiment, the thickness of the cured black matrix BM is about 3.3 micrometers (μm). Next, the second electrode 220 is arranged on the black matrix BM. In this embodiment, the material of the second electrode 220 is, for example, a silver paste. Next, the first electrode 210 and the second electrode 220 are electrically connected to two ends of a voltage source, respectively, to apply a voltage to the black matrix BM, and measure a current value passing through the black matrix BM. The resistivity of the black matrix BM can be obtained by the voltage value and the current value.

在本實施例中,於上述測量黑色矩陣BM之材料的電阻率的過程中,黑色矩陣BM係被曝光,但不限於此,在其它實施例中,如欲得知在未被曝光之黑色矩陣BM的電阻率,亦可省略上述曝光步驟。In this embodiment, during the above-mentioned measurement of the resistivity of the material of the black matrix BM, the black matrix BM is exposed, but it is not limited thereto. In other embodiments, if you want to know the black matrix that is not exposed, The resistivity of BM can also omit the above exposure step.

以下將參照數個實驗,更具體地描述本發明一實施例的遮光圖案170之組成。雖然描述了以下實驗,但是在不逾越本發明範疇的情況下,可適當地改變所用材料、其量及比率、處理細節以及處理流程等等。因此,不應根據下文所述的實驗對本發明作出限制性的解釋。比較例之遮光圖案170A及各實施例的遮光圖案170之組成,例如下表一所示。Hereinafter, the composition of the light-shielding pattern 170 according to an embodiment of the present invention will be described more specifically with reference to several experiments. Although the following experiments are described, the materials used, their amounts and ratios, processing details, processing flow, and the like can be appropriately changed without going beyond the scope of the present invention. Therefore, the present invention should not be interpreted restrictively based on the experiments described below. The composition of the light-shielding pattern 170A of the comparative example and the light-shielding pattern 170 of each example is shown in Table 1 below.

<TABLE border="1" borderColor="#000000" width="85%"><TBODY><tr><td> </td><td> 第一實施例 </td><td> 第二實施例 </td><td> 比較例 </td></tr><tr><td> 炭黑糊 </td><td> F </td><td> F </td><td> F </td></tr><tr><td> 光引發劑 </td><td> D </td><td> D </td><td> D </td></tr><tr><td> 黏合劑 </td><td> F/D </td><td> A/F/D </td><td> A/F/D </td></tr><tr><td> 單體 </td><td> M </td><td> M </td><td> B/D </td></tr><tr><td> 添加劑(流平) </td><td> A </td><td> A </td><td> A </td></tr><tr><td> 添加劑(黏合) </td><td> E </td><td> E </td><td> E </td></tr><tr><td> 溶劑系統 </td><td> A/B/G </td><td> A/B/G </td><td> A/B/G </td></tr><tr><td> 炭黑含量(固態下) </td><td> 46 </td><td> 46 </td><td> 46 </td></tr><tr><td> 固體含量(110℃ 3小時) </td><td> 15% </td><td> 15% </td><td> 15% </td></tr></TBODY></TABLE>[表一] <TABLE border = "1" borderColor = "# 000000" width = "85%"> <TBODY> <tr> <td> </ td> <td> First embodiment </ td> <td> Second implementation Example </ td> <td> Comparative example </ td> </ tr> <tr> <td> Carbon black paste </ td> <td> F </ td> <td> F </ td> <td> F </ td> </ tr> <tr> <td> Photoinitiator </ td> <td> D </ td> <td> D </ td> <td> D </ td> </ tr> <tr> <td> Adhesives </ td> <td> F / D </ td> <td> A / F / D </ td> <td> A / F / D </ td> </ tr> <tr> <td> Monomer </ td> <td> M </ td> <td> M </ td> <td> B / D </ td> </ tr> <tr> <td> Additive ( Leveling) </ td> <td> A </ td> <td> A </ td> <td> A </ td> </ tr> <tr> <td> Additive (bond) </ td> < td> E </ td> <td> E </ td> <td> E </ td> </ tr> <tr> <td> Solvent System </ td> <td> A / B / G </ td > <td> A / B / G </ td> <td> A / B / G </ td> </ tr> <tr> <td> Carbon black content (in solid state) </ td> <td> 46 </ td> <td> 46 </ td> <td> 46 </ td> </ tr> <tr> <td> Solid content (110 ° C for 3 hours) </ td> <td> 15% </ td > <td> 15% </ td> <td> 15% </ td> </ tr> </ TBODY> </ TABLE> [表 一]       

在比較例中,遮光圖案的組成包括黏合劑為A/F/D以及單體為B/D。In the comparative example, the composition of the light-shielding pattern includes A / F / D as an adhesive and B / D as a monomer.

在本發明的第一實施例中,第一實施例採用與比較例類似的組成,不同處在於改變黏合劑為F/D以及改變單體為M。於本實施例之表一中,各符號(如A~G)分別代表一種材料,例如有機材料、高分子材料、無機材料…等。舉例來說,第一實施例之遮光圖案的材料中包含一單體為M材料所組成,而比較例之遮光圖案的材料中則以B材料與D材料所組成,進而影響第一實施例與比較例在電阻特性上的差異。In the first embodiment of the present invention, the first embodiment adopts a composition similar to that of the comparative example, except that the adhesive is changed to F / D and the monomer is changed to M. In Table 1 of this embodiment, each symbol (such as A to G) represents a material, such as an organic material, a polymer material, an inorganic material, etc. For example, the material of the light-shielding pattern of the first embodiment includes a single material composed of M material, and the material of the light-shielding pattern of the comparative example is composed of B material and D material, which further affects the first embodiment and The difference in the resistance characteristics of the comparative example.

如圖3所示,對遮光圖案170、170A施加的電壓為30伏特時,第一實施例之遮光圖案170的電阻率大於10 13歐姆·公分,而比較例之遮光圖案170A的電阻率僅有10 6歐姆·公分。換言之,在被施加高電壓的情況下,第一實施例之遮光圖案170仍具有大於10 12歐姆·公分的高電阻率。 As shown in FIG. 3, when the voltage applied to the light-shielding patterns 170 and 170A is 30 volts, the resistivity of the light-shielding pattern 170 of the first embodiment is greater than 10 13 ohm · cm, while the resistivity of the light-shielding pattern 170A of the comparative example is only 10 6 ohm · cm. In other words, in the case where a high voltage is applied, the light-shielding pattern 170 of the first embodiment still has a high resistivity greater than 10 12 ohm · cm.

如圖3所示,對第一實施例之遮光圖案170施加一電壓為大於25伏特且小於或等於30伏特時,本發明之第一實施例之遮光圖案170的電阻率大於10 12歐姆·公分,而比較例之遮光圖案170A的電阻率僅有10 6~10 8歐姆·公分。 As shown in FIG. 3, when a voltage is applied to the light-shielding pattern 170 of the first embodiment to be greater than 25 volts and less than or equal to 30 volts, the resistivity of the light-shielding pattern 170 of the first embodiment of the present invention is greater than 10 12 ohm · cm The resistivity of the light-shielding pattern 170A of the comparative example is only 10 6 to 10 8 ohm · cm.

基於上述,本發明之第一實施例使用不同組成的遮光圖案170時,第一實施例的遮光圖案170能夠在施予一高壓時仍維持高阻抗狀態。Based on the above, when the first embodiment of the present invention uses the light-shielding pattern 170 with a different composition, the light-shielding pattern 170 of the first embodiment can maintain a high impedance state when a high voltage is applied.

在本發明的另一實施例中,第二實施例之遮光圖案170採用與比較例之遮光圖案170A類似的組成,不同處在於改變單體為M。In another embodiment of the present invention, the light-shielding pattern 170 of the second embodiment adopts a composition similar to the light-shielding pattern 170A of the comparative example, except that the monomer is changed to M.

在本發明的第二實施例中,對遮光圖案170施加一電壓為30伏特時,遮光圖案170的電阻率大於10 13歐姆·公分。 In the second embodiment of the present invention, when a voltage of 30 volts is applied to the light-shielding pattern 170, the resistivity of the light-shielding pattern 170 is greater than 10 13 ohm · cm.

在本發明的第二實施例中,對遮光圖案170施加一電壓為大於25伏特且小於或等於30伏特時,遮光圖案170的電阻率大於10 12歐姆·公分。 In the second embodiment of the present invention, when a voltage is applied to the light-shielding pattern 170 from greater than 25 volts to less than or equal to 30 volts, the resistivity of the light-shielding pattern 170 is greater than 10 12 ohm · cm.

基於上述,本發明之第二實施例的顯示面板使用不同組成的遮光圖案170時,能夠在施予一高壓時仍維持高阻抗狀態。Based on the above, when the display panel of the second embodiment of the present invention uses the light-shielding patterns 170 with different compositions, it can maintain a high-impedance state when a high voltage is applied.

從另一角度而言,本發明的第一、二實施例的遮光圖案170的電阻率不易因施加電壓的變化而過度下降。如圖3所示,在本發明的第一、二實施例中,對遮光圖案170施加一電壓大於0伏特且小於或等於30伏特時,遮光圖案170的電阻率對施加於遮光圖案170上之一電壓的變化率小於或等於3.01∙10 13歐姆·公分/伏特。更進一步地說,在本發明的第一、二實施例中,對遮光圖案170施加一電壓大於20伏特且小於或等於30伏特時,遮光圖案170的電阻率對施加於遮光圖案上之一電壓的變化率小於或等於4.06∙10 12歐姆·公分/伏特。換言之,第一實施例與第二實施例的遮光圖案170受到施予電壓後,其阻抗特性的變動幅度不大,因此第一實施例與第二實施例之遮光圖案170的阻抗狀態不容易受到外界電壓的影響而發生變化。反之,比較例的遮光圖案170A的阻抗狀態則相對容易受到外界電壓的影響而發生劇烈的變化。 From another perspective, the resistivity of the light-shielding pattern 170 according to the first and second embodiments of the present invention is unlikely to be excessively decreased due to a change in applied voltage. As shown in FIG. 3, in the first and second embodiments of the present invention, when a voltage greater than 0 volts and less than or equal to 30 volts is applied to the light-shielding pattern 170, the resistivity of the light-shielding pattern 170 is less than that applied to the light-shielding pattern 170. The rate of change of a voltage is less than or equal to 3.01 ∙ 10 13 ohm · cm / volt. Furthermore, in the first and second embodiments of the present invention, when a voltage greater than 20 volts and less than or equal to 30 volts is applied to the light shielding pattern 170, the resistivity of the light shielding pattern 170 is a voltage applied to the light shielding pattern. The rate of change is less than or equal to 4.06 ∙ 10 12 ohm · cm / volt. In other words, after the voltage is applied to the light-shielding pattern 170 of the first and second embodiments, the impedance characteristics of the light-shielding pattern 170 of the first and second embodiments are not easily changed. The effect of external voltage changes. On the other hand, the impedance state of the light-shielding pattern 170A of the comparative example is relatively susceptible to a drastic change due to the influence of an external voltage.

綜上所述,本發明一實施例的顯示面板包括第一基板、設置於第一基板之對向的第二基板、位於第一基板與第二基板之間的顯示介質以及配置於第二基板上的遮光圖案。特別是,遮光圖案係使用耐高壓的高阻抗材料。藉此,當顯示面板致能而遮光圖案被施予一電壓後仍能夠維持高阻抗率,進而改善滴下色暈的問題,提升顯示面板的品質。In summary, a display panel according to an embodiment of the present invention includes a first substrate, a second substrate disposed opposite to the first substrate, a display medium located between the first substrate and the second substrate, and a second substrate disposed on the display substrate. Shading pattern. In particular, the light-shielding pattern uses a high-resistance high-resistance material. Therefore, when the display panel is enabled and the light-shielding pattern is applied with a voltage, a high resistivity can be maintained, thereby improving the problem of dripping halo and improving the quality of the display panel.

雖然本發明已以實施例揭露如上,然其並非用以限定本發明,任何所屬技術領域中具有通常知識者,在不脫離本發明的精神和範圍內,當可作些許的更動與潤飾,故本發明的保護範圍當視後附的申請專利範圍所界定者為準。Although the present invention has been disclosed as above with the examples, it is not intended to limit the present invention. Any person with ordinary knowledge in the technical field can make some modifications and retouching without departing from the spirit and scope of the present invention. The protection scope of the present invention shall be determined by the scope of the attached patent application.

10、10A‧‧‧顯示面板10, 10A‧‧‧ display panel

100‧‧‧第一基板 100‧‧‧first substrate

110‧‧‧畫素單元 110‧‧‧ pixel unit

112‧‧‧薄膜電晶體 112‧‧‧ thin film transistor

114‧‧‧畫素電極 114‧‧‧pixel electrode

114a‧‧‧狹縫 114a‧‧‧Slit

114b‧‧‧間隙 114b‧‧‧Gap

120、130‧‧‧絕緣層 120, 130‧‧‧ Insulation

120a、130a‧‧‧開口 120a, 130a‧‧‧ opening

140‧‧‧共用電極 140‧‧‧Common electrode

160‧‧‧顯示介質 160‧‧‧Display media

170、170A‧‧‧遮光圖案 170, 170A‧‧‧Shading pattern

170a‧‧‧網孔 170a‧‧‧mesh

180‧‧‧第二基板 180‧‧‧second substrate

200‧‧‧基板 200‧‧‧ substrate

210‧‧‧第一電極 210‧‧‧first electrode

210a‧‧‧部分的第一電極 210a‧‧‧ first electrode

BM‧‧‧黑色矩陣 BM‧‧‧Black Matrix

220‧‧‧第二電極 220‧‧‧Second electrode

PI1‧‧‧第一配向膜 PI1‧‧‧first alignment film

PI2‧‧‧第二配向膜 PI2‧‧‧Second alignment film

R1‧‧‧滴下區 R1‧‧‧Drip zone

R2‧‧‧未滴下區 R2‧‧‧Undrip Zone

V‧‧‧電壓 V‧‧‧Voltage

圖1為本發明的一實施例顯示面板的剖面示意圖。 圖2A至圖2D示出推測比較例之顯示面板的滴下色暈(drop mura)的形成過程。 圖3示出比較例之顯示面板的遮光圖案的施加電壓與電阻率的關係、第一實施例之顯示面板的遮光圖案的施加電壓與電阻率的關係以及第二實施例之顯示面板的遮光圖案的施加電壓與電阻率的關係。 圖4示出測量遮光圖案之材料的電阻率的過程。FIG. 1 is a schematic cross-sectional view of a display panel according to an embodiment of the present invention. 2A to 2D illustrate a process of forming a drop mura of a display panel of a comparative example. 3 shows the relationship between the applied voltage and resistivity of the light-shielding pattern of the display panel of the comparative example, the relationship between the applied voltage and resistivity of the light-shielding pattern of the display panel of the first embodiment, and the light-shielding pattern of the display panel of the second embodiment. The relationship between the applied voltage and resistivity. FIG. 4 shows the process of measuring the resistivity of the material of the light-shielding pattern.

Claims (7)

一種顯示面板,包括: 一第一基板; 一第二基板,設置於該第一基板的對向; 一顯示介質,位於該第一基板與該第二基板之間;以及 一遮光圖案,配置於該第二基板上,且位於該第二基板與該顯示介質之間,其中該遮光圖案的電阻率對施加於該遮光圖案上之一電壓的變化率小於或等於3.33∙10 13歐姆·公分/伏特,而該電壓大於0伏特且小於或等於30伏特。 A display panel includes: a first substrate; a second substrate disposed opposite to the first substrate; a display medium between the first substrate and the second substrate; and a light-shielding pattern disposed on On the second substrate and between the second substrate and the display medium, a change rate of a resistivity of the light-shielding pattern to a voltage applied to the light-shielding pattern is less than or equal to 3.33 · 10 13 ohm · cm / Volts, and the voltage is greater than 0 volts and less than or equal to 30 volts. 一種顯示面板,包括: 一第一基板; 一第二基板,設置於該第一基板的對向; 一顯示介質,位於該第一基板與該第二基板之間;以及 一遮光圖案,配置於該第二基板上,且位於該第二基板與該顯示介質之間,其中該遮光圖案的電阻率對施加於該遮光圖案上之一電壓的變化率小於或等於1.38∙10 13歐姆·公分/伏特,而該電壓大於20伏特且小於或等於30伏特。 A display panel includes: a first substrate; a second substrate disposed opposite to the first substrate; a display medium between the first substrate and the second substrate; and a light-shielding pattern disposed on On the second substrate and between the second substrate and the display medium, a change rate of a resistivity of the light-shielding pattern to a voltage applied to the light-shielding pattern is less than or equal to 1.38 · 10 13 ohm · cm / Volts, and the voltage is greater than 20 volts and less than or equal to 30 volts. 如申請專利範圍第1項或第2項所述的顯示面板,更包括: 多個畫素單元,配置於該第一基板上且位於該顯示介質與該第一基板之間,其中每一畫素單元包括一薄膜電晶體以及與該薄膜電晶體電性連接的一畫素電極,而該遮光圖案遮蔽相鄰之多個畫素單元之多個畫素電極之間的間隙。The display panel according to item 1 or item 2 of the scope of patent application, further comprising: a plurality of pixel units arranged on the first substrate and located between the display medium and the first substrate, each of which The pixel unit includes a thin film transistor and a pixel electrode electrically connected to the thin film transistor, and the light-shielding pattern shields the gaps between the pixel electrodes of the adjacent pixel units. 如申請專利範圍第1項或第2項所述的顯示面板,更包括: 一共用電極,配置於該第一基板上且位於該顯示介質與該第一基板之間,其中該共用電極與每一該畫素單元的該畫素電極之間的電壓用以驅動該顯示介質。The display panel according to item 1 or 2 of the scope of patent application, further comprising: a common electrode disposed on the first substrate and between the display medium and the first substrate, wherein the common electrode and each A voltage between the pixel electrodes of a pixel unit is used to drive the display medium. 如申請專利範圍第1項或第2項所述的顯示面板,其中該顯示介質包括液晶層。The display panel according to item 1 or item 2 of the patent application scope, wherein the display medium includes a liquid crystal layer. 如申請專利範圍第1項或第2項所述的顯示面板,其中被施加該電壓之該遮光圖案的電阻率大於10 13歐姆·公分,而該電壓為30伏特。 The display panel according to item 1 or item 2 of the scope of patent application, wherein the resistivity of the light-shielding pattern to which the voltage is applied is greater than 10 13 ohm · cm, and the voltage is 30 volts. 如申請專利範圍第1項或第2項所述的顯示面板,其中被施加該電壓之該遮光圖案的電阻率大於10 12歐姆·公分,而該電壓大於25伏特且小於或等於30伏特。 The display panel according to item 1 or item 2 of the scope of patent application, wherein the resistivity of the light-shielding pattern to which the voltage is applied is greater than 10 12 ohm · cm, and the voltage is greater than 25 volts and less than or equal to 30 volts.
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