TWI644246B - Resistive touch panel and method of manufacturing the same - Google Patents

Abstract

The invention discloses a resistive touch panel and a preparation method thereof. The resistive touch panel includes a base layer and a surface layer. A first transparent conductive layer is provided on an upper surface of the base layer, and a second surface is provided on a lower surface of the surface layer. The transparent conductive layer, because the upper surface of the first transparent conductive layer and the lower surface of the second transparent conductive layer are rough surfaces, both are provided with transparent protruding particles. When pressure is applied on the panel, the surface of the two transparent conductive layers The transparent protruding particles will preferentially contact, thereby improving the touch sensitivity of the resistive touch panel, reducing the loss of the transparent conductive layer, and extending the life of the resistive touch panel.

Description

Resistive touch panel and preparation method thereof

The invention relates to the field of touch-sensitive panels, in particular to a resistive touch-sensitive panel and a method for manufacturing the same.

The main part of the panel of the resistive touch panel is a multilayer composite film attached to the surface of the display screen. It is basically a structure of a thin film and glass, and the adjacent surface of the thin film and glass is coated with ITO (nano-indium tin metal oxide). ) Coating, ITO coating has good conductivity and transparency. There are many fine transparent insulating particles between the two layers of ITO coating, so that the two layers of ITO coating are in an insulating state when no pressure is applied. When touched, the ITO in the lower layer of the film will contact the ITO in the upper layer of the glass, and the corresponding electric signal will be sent out through the sensor, and then sent to the processor through the conversion circuit, which will be converted into the X and Y values on the panel through calculation, thus completing the point The selected action is displayed on the panel.

During the use of the resistive touch panel, the ITO under the thin film continuously contacts the ITO over the glass. After a long time, the surface ITO continuously wears out, resulting in reduced sensitivity, short circuit in some areas, and reduced service life. At present, capacitive touch panels on the market can overcome all of the above problems and thus become mainstream. However, in some market areas, resistive touch panels are still used due to cost reasons. Therefore, the sensitivity of resistive touch panels is enhanced and their service life is extended. Has become a subject that needs to be overcome.

In order to solve the above-mentioned shortcomings of the prior art resistive touch panel, embodiments of the present invention provide a resistive touch panel and a method for manufacturing the same. The resistive touch panel improves touch sensitivity and service life. The technical solution is as follows:

A resistive touch panel includes a base layer and a surface layer. A first transparent conductive layer is provided on an upper surface of the base layer, a second transparent conductive layer is provided on a lower surface of the surface layer, and the first transparent conductive layer and the second transparent layer are provided. Transparent insulating spacer particles are arranged between the conductive layers, and the surface roughness of the upper surface of the first transparent conductive layer and the lower surface of the second transparent conductive layer is 1 nm-6 nm.

Preferably, the surface roughness of the upper surface of the first transparent conductive layer and the lower surface of the second transparent conductive layer is 1.5 nm-3.5 nm.

Further, the material of the first transparent conductive layer and the second transparent conductive layer is one of In ₂ O ₃ : TiO ₂ , In ₂ O ₃ : SnO ₂ , In ₂ O ₃ : ZnO ₂ .

Preferably, the material of the first transparent conductive layer and the second transparent conductive layer is In ₂ O ₃ : TiO ₂ , and the weight percentage of TiO ₂ is 1% -5% In ₂ O ₃ : TiO ₂ .

Further, the thickness of the first transparent conductive layer and the second transparent conductive layer is 15nm-25nm.

Further, the base layer is a glass layer, and the surface layer is a thin film layer.

Further, a method for preparing the resistive touch panel by magnetron sputtering is characterized in that it comprises: setting a flow rate of argon gas to 150 sccm-200 sccm and a flow rate of oxygen gas to 0.5 sccm-1 sccm; and the working power source is AC power or Direct current.

The beneficial effect of the present invention is that the resistive touch panel provided by the embodiment of the present invention, since the upper surface of the first transparent conductive layer and the lower surface of the second transparent conductive layer are rough surfaces, both are provided with transparent protruding particles. , When pressure is applied to the panel, both The transparent protruding particles on the surface of the transparent conductive layer will preferentially contact, thereby improving the touch sensitivity of the resistive touch panel, reducing the loss of the transparent conductive layer, and extending the life of the resistive touch panel.

1‧‧‧ grassroots

2‧‧‧ surface layer

3‧‧‧ the first transparent conductive layer

4‧‧‧ second transparent conductive layer

5‧‧‧ transparent insulating particles

FIG. 1 is a schematic structural diagram of a resistive touch panel according to the present invention.

FIG. 2 is a surface micrograph (scanning electron microscope, SEM) of a conductive layer for a resistive touch panel prepared in a comparative example.

FIG. 3 is a surface micrograph (scanning electron microscope, SEM) of a conductive layer for a resistive touch panel prepared in Example 1. FIG.

FIG. 4 is a surface micrograph (atomic force microscope, AFM) of a conductive layer for a resistive touch panel prepared in Example 1. FIG.

FIG. 5 is a surface micrograph (atomic force microscope, AFM) of a conductive layer for a resistive touch panel prepared in Example 2. FIG.

FIG. 6 is a surface micrograph (atomic force microscope, AFM) of a conductive layer for a resistive touch panel prepared in Example 3. FIG.

It should be noted that, in the case of no conflict, the embodiments of the present invention and the features in the embodiments can be combined with each other. In the following, the technical solutions in the embodiments of the present invention will be clearly and completely described with reference to the drawings in the embodiments of the present invention. Obviously, the described embodiments are only a part of the embodiments of the present invention, but not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by a person of ordinary skill in the art without creative efforts shall fall within the protection scope of the present invention.

As described in the background art, during the use of the prior art resistive touch panel, the upper and lower transparent conductive ITO layers appear after continuous contact for a long time. Wear and tear, resulting in reduced sensitivity of the resistive touch panel, short circuit in some areas, and reduced service life. In order to solve the technical problem, an embodiment of the present invention provides a resistive touch panel.

As shown in FIG. 1, FIG. 1 shows a multilayer composite structure in a resistive touch panel provided by the present invention. The resistive touch panel includes a base layer 1 and a surface layer 2. A transparent conductive layer 3 is provided with a second transparent conductive layer 4 on the lower surface of the surface layer 2, that is, a first transparent conductive layer 3 and a second transparent layer are respectively provided on two surfaces adjacent to the base layer 1 and the surface layer 2. Conductive layer 4. Transparent insulating spacer particles 5 are provided between the first transparent conductive layer 3 and the second transparent conductive layer 4; the upper surface of the first transparent conductive layer 3 and the lower surface of the second transparent conductive layer 4 are both integrally formed. Transparent protruding particles, and their surface roughness is independently 1nm-6nm, both can be the same or different, so that the two transparent conductive layers in the resistive touch panel are easier to contact, thereby improving the resistance Touch sensitivity of the touch panel.

In order to further improve the service life of the resistive touch panel, the surface roughness of the upper surface of the first transparent conductive layer 3 and the lower surface of the second transparent conductive layer 4 is preferably 1.5 nm to 3.5 nm.

In order to obtain good conductivity and transparency, the materials of the first transparent conductive layer 3 and the second transparent conductive layer 4 are mainly selected from a composite oxide of In ₂ O ₃ and TiO _{2, and} a composite of In ₂ O ₃ and SnO ₂ . One of oxides, In ₂ O ₃ and ZnO ₂ composite oxides.

In a preferred embodiment of the present invention, the material of the first transparent conductive layer 3 and the second transparent conductive layer 4 is a composite oxide of In ₂ O ₃ and TiO ₂ , and the weight percentage of TiO ₂ accounts for the total composite oxidation. 1% -5%, making the final surface roughness of the transparent conductive layer easier to control.

The thickness of the transparent conductive layer is preferably greater than 10 nm, especially The range of 15nm-25nm is more preferable. When the thickness of the transparent conductive layer is less than 10 nm, the resistance value is high, which causes the touch sensitivity of the touch panel to be low.

The base layer 1 and the surface layer 2 used in the present invention are not particularly limited as long as they can satisfy transparency, and may be various applicable glass plates or flexible film sheets known to those skilled in the art. For example, glass plates may be preferred. From borosilicate glass, soda lime glass, etc .; the material of the flexible film sheet is preferably polyethylene terephthalate (PET), polycarbonate resin (PC), polymethacrylate (PMMA), polynaphthalene dicarboxylic acid Ethylene glycol (PEN) and the like. In a preferred embodiment of the present invention, the base layer 1 is a glass layer, and the surface layer 2 is a thin film layer.

As a method for forming the transparent conductive layer of the present invention, there are a vacuum evaporation method, a sputtering method, a CVD method, an ion plating method, and a thermal spraying method. The above method can be appropriately selected according to the required film thickness. In the present invention, a magnetron sputtering method is preferred as a method for forming a transparent conductive layer. As a reactive gas, the oxygen-containing gas may be a mixed gas of oxygen and an inert gas, or may be air, preferably an oxygen and an inert gas. mixed gas. The inert gas may be at least one of nitrogen, helium, neon, argon, krypton, xenon, and krypton. Moreover, as long as the objective of this invention is not impaired, you may apply a bias voltage, such as a direct current, an alternating current, and a high frequency, to a base material. In a preferred embodiment of the present invention, the flow rate of argon gas is preferably set to 150 sccm-200 sccm, and the flow rate of oxygen gas is set to 0.5 sccm-1 sccm.

The beneficial effects of the present invention will be further described below in combination with the examples and comparative examples.

Examples 1 to 5

At room temperature, an In ₂ O ₃ : TiO ₂ film is formed on the base layer 1 (glass layer) and surface layer 2 (thin film layer) by a magnetron sputtering method, wherein the weight of TiO ₂ is In ₂ O ₃ 1% -5% of the total weight of the composite oxide with TiO _2. See Table 1 for the main process parameters.

Example 6

The difference from Example 1 is that an In ₂ O ₃ : ZnO ₂ film is formed on the base layer 1 (glass layer) and the surface layer 2 (thin film layer), wherein the weight of ZnO _{2 is} the weight of In ₂ O ₃ and ZnO ₂ 3% by weight of the combined oxide.

Comparative example

The difference from Example 1 is that an In ₂ O ₃ : SnO ₂ film is formed on the base layer 1 (glass layer) and the surface layer 2 (thin film layer), where the weight of SnO _{2 is} the weight of In ₂ O ₃ and SnO ₂ 4% of the total weight of the composite oxide.

In addition, Table 1 also shows the results of performance tests such as the surface roughness of the transparent conductive layer used in the resistive touch panels prepared in Examples 1 to 6 and the comparative examples, and the dot test of the resistive touch panel, and FIGS. 2 to FIG. 6 shows the microscopic morphology of the surfaces of the conductive layers prepared in Examples 1 to 3 and the comparative example, so that it can be known that the surface uneven structure of the conductive layer prepared in Examples 1 to 3 is more obvious than the conductive layer prepared in the comparative example. Therefore, the touch sensitivity of the resistive touch panel is improved; the number of dots of the resistive touch panel prepared in Examples 1 to 6 is obviously more than that of the resistive touch panel prepared in Comparative Example, that is, prepared in Examples 1 to 6. The conductive layer extends the life of the resistive touch panel.

The above are only specific embodiments of the present invention, but the scope of protection of the present invention is not limited to this. Any person skilled in the art can easily think of changes or replacements within the technical scope disclosed by the present invention. All should be covered by the protection scope of the present invention. Therefore, the protection scope of the present invention shall be subject to the protection scope of the claims.

Claims (7)

A resistive touch panel includes a base layer and a surface layer, a first transparent conductive layer is provided on an upper surface of the base layer, a second transparent conductive layer is provided on a lower surface of the surface layer, and the first transparent conductive layer and the Transparent insulating spacer particles are arranged between the second transparent conductive layer, and the transparent transparent particles are provided on the upper surface of the first transparent conductive layer and the lower surface of the second transparent conductive layer. The surface roughness of the upper surface of the layer and the lower surface of the second transparent conductive layer is 1 nm to 6 nm. According to the resistive touch panel described in item 1 of the patent application scope, the surface roughness of the upper surface of the first transparent conductive layer and the lower surface of the second transparent conductive layer is 1.5 nm-3.5 nm. The resistive touch panel according to item 1 or item 2 of the patent application scope, wherein the material of the first transparent conductive layer and the second transparent conductive layer is In ₂ O ₃ : TiO ₂ , In ₂ O ₃ : One of SnO ₂ and In ₂ O ₃ : ZnO ₂ . The resistive touch panel according to item 1 or item 2 of the scope of patent application, wherein the material of the first transparent conductive layer and the second transparent conductive layer is In ₂ O ₃ : TiO ₂ , weight percentage of TiO ₂ 1% -5% In ₂ O ₃ : TiO ₂ . The resistive touch panel according to item 1 of the application, wherein the thickness of the first transparent conductive layer and the second transparent conductive layer is 15nm-25nm. The resistive touch panel according to item 1 of the scope of the patent application, wherein the base layer is a glass layer and the surface layer is a thin film layer. A method for preparing a resistive touch panel according to item 1 of the patent application range by magnetron sputtering, further comprising setting a flow rate of argon gas from 150 sccm to 200 sccm and a flow rate of oxygen gas from 0.5 sccm to 1 sccm; the working power source is alternating current Or direct current.