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TWI643370B - Sealed structure, organic electroluminescence display device and sensor - Google Patents

Sealed structure, organic electroluminescence display device and sensor Download PDF

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Publication number
TWI643370B
TWI643370B TW105135828A TW105135828A TWI643370B TW I643370 B TWI643370 B TW I643370B TW 105135828 A TW105135828 A TW 105135828A TW 105135828 A TW105135828 A TW 105135828A TW I643370 B TWI643370 B TW I643370B
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substrate
adhesive layer
metal layer
main surface
layer
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TW105135828A
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Chinese (zh)
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TW201731136A (en
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Takao Shiraga
白神崇生
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Futaba Corporation
日商双葉電子工業股份有限公司
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    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00Organic light-emitting devices
    • H10K50/80Constructional details
    • H10K50/84Passivation; Containers; Encapsulations
    • H10K50/842Containers
    • H10K50/8426Peripheral sealing arrangements, e.g. adhesives, sealants
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B17/00Layered products essentially comprising sheet glass, or glass, slag, or like fibres
    • B32B17/06Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material
    • B32B17/061Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material of metal
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B37/00Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding
    • B32B37/12Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by using adhesives
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B7/00Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
    • B32B7/04Interconnection of layers
    • B32B7/12Interconnection of layers using interposed adhesives or interposed materials with bonding properties
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B9/00Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00
    • B32B9/005Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00 comprising one layer of ceramic material, e.g. porcelain, ceramic tile
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B9/00Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00
    • B32B9/04Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00 comprising such particular substance as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • B32B9/041Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00 comprising such particular substance as the main or only constituent of a layer, which is next to another layer of the same or of a different material of metal
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00Organic light-emitting devices
    • H10K50/80Constructional details
    • H10K50/84Passivation; Containers; Encapsulations
    • H10K50/841Self-supporting sealing arrangements
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00Organic light-emitting devices
    • H10K50/80Constructional details
    • H10K50/84Passivation; Containers; Encapsulations
    • H10K50/842Containers
    • H10K50/8423Metallic sealing arrangements
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10OLED displays
    • H10W76/60
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2457/00Electrical equipment
    • B32B2457/20Displays, e.g. liquid crystal displays, plasma displays
    • B32B2457/206Organic displays, e.g. OLED

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  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Electroluminescent Light Sources (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)

Abstract

本發明的密封結構1具備:第1基板2,其具有主面2a;框狀的第1金屬層11,其沿第1基板2的邊緣被設置在主面2a上;框狀的黏接層12,其被設置於第1金屬層11上;第2基板4,其位於黏接層12的上方,且具有與主面2a對置的主面4a;以及,元件部5,其在主面2a上且被設置於由第1基板2、第1金屬層11、黏接層12及第2基板4所包圍而被密封的密封空間S內。黏接層12含有烴類樹脂或者非極性熱塑性樹脂,並且黏接層12黏接於第1金屬層11。The sealing structure 1 of the present invention includes: a first substrate 2 having a main surface 2a; a frame-shaped first metal layer 11 provided on the main surface 2a along an edge of the first substrate 2; and a frame-shaped adhesive layer 12, which is provided on the first metal layer 11, the second substrate 4, which is located above the adhesive layer 12, and has a main surface 4a opposite to the main surface 2a; and the element portion 5, which is on the main surface 2a is provided in a sealed space S surrounded by the first substrate 2, the first metal layer 11, the adhesive layer 12, and the second substrate 4 and sealed. The adhesion layer 12 contains a hydrocarbon resin or a non-polar thermoplastic resin, and the adhesion layer 12 is adhered to the first metal layer 11.

Description

密封結構、有機電致發光顯示裝置及感測器Sealed structure, organic electroluminescence display device and sensor

本發明關於一種密封結構、有機電致發光顯示裝置以及感測器。The invention relates to a sealed structure, an organic electroluminescence display device and a sensor.

近年,作為顯示裝置,有一種使用了含有有機EL材料(EL:Electro-Luminescence(電致發光))的有機EL元件之自發光型顯示裝置備受人們的關注。由於該有機EL元件若有水分浸入則會劣化,因而會對該有機EL元件採取一些措施以保護該有機EL元件免受外部氣體影響。例如,在下述專利文獻1中記載了一種密封結構,其使用由紫外線固化型樹脂製成的黏接劑與密封基板來對設置於玻璃基板上的有機EL元件進行密封。In recent years, as a display device, a self-emitting display device using an organic EL element containing an organic EL material (EL: Electro-Luminescence) has attracted much attention. Since the organic EL element is degraded if moisture is infiltrated, some measures are taken to protect the organic EL element from external air. For example, Patent Document 1 described below describes a sealing structure that uses an adhesive made of an ultraviolet-curable resin and a sealing substrate to seal an organic EL element provided on a glass substrate.

專利文獻1:日本特開2004-152511號公報。Patent Document 1: Japanese Patent Application Laid-Open No. 2004-152511.

在上述專利文獻1中,使用環氧樹脂作為黏接劑。若黏接劑由環氧樹脂等具有極性基團的樹脂構成,則水分容易在該黏接劑內擴散。因此,在上述專利文獻1的密封結構中,水分有可能經由黏接劑浸入到被密封的區域內。另一方面,若使用由不具有極性基團的樹脂等製成的黏接劑,則根據構成基板的材料,黏接劑有時無法良好地黏接於該基板。此時,可能會造成基板從黏接劑剝離。In the aforementioned Patent Document 1, an epoxy resin is used as an adhesive. When the adhesive is made of a resin having a polar group such as epoxy resin, moisture easily diffuses in the adhesive. For this reason, in the sealing structure of the said patent document 1, there exists a possibility that moisture may infiltrate into the sealed area via an adhesive agent. On the other hand, if an adhesive made of a resin or the like having no polar group is used, depending on the material constituting the substrate, the adhesive may not adhere well to the substrate. In this case, the substrate may be peeled from the adhesive.

本發明的目的在於提供一種能夠抑制基板剝離和水分浸入的密封結構、有機EL顯示裝置以及感測器。An object of the present invention is to provide a sealing structure, an organic EL display device, and a sensor capable of suppressing substrate peeling and moisture intrusion.

本發明的一種態樣所涉及的密封結構具備:第1基板,其具有第1主面;框狀的第1金屬層,其沿第1基板的邊緣而被設置在第1主面上;框狀的黏接層,其被設置於第1金屬層上;第2基板,其位於黏接層的上方且具有與第1主面對置的第2主面;以及,元件部,其位於第1主面上,且被設置於由第1基板、第1金屬層、黏接層及第2基板所包圍而被密封的密封空間內,黏接層含有烴類樹脂或者非極性熱塑性樹脂,並且黏接層黏接於第1金屬層。A sealing structure according to one aspect of the present invention includes: a first substrate having a first main surface; a frame-shaped first metal layer provided on the first main surface along an edge of the first substrate; a frame A second adhesive layer, which is provided on the first metal layer; a second substrate, which is located above the adhesive layer and has a second main surface opposite to the first main surface; and an element portion, which is located on the first 1 on the main surface, and is provided in a sealed space enclosed by the first substrate, the first metal layer, the adhesive layer, and the second substrate. The adhesive layer contains a hydrocarbon resin or a non-polar thermoplastic resin, and The adhesive layer is adhered to the first metal layer.

在該密封結構中,由於黏接層含有不具有極性基團的烴類樹脂或者非極性熱塑性樹脂,因而水分難以在該黏接層內擴散。因此,水分難以浸入到被設置於由第1基板、第1金屬層、黏接層及第2基板所包圍而被密封的密封空間內的元件部。而且,黏接層黏接於第1金屬層。一般而言,由烴類樹脂或者非極性熱塑性樹脂製成的黏接層對金屬會展現出良好的黏接性。因此,例如即使是在黏接層難以黏接於第1基板的情況下,由於該黏接層能夠良好地黏接於被設置在第1主面上的第1金屬層,因而能夠抑制第1基板從黏接層剝離的情形。In this sealing structure, since the adhesive layer contains a hydrocarbon resin or a non-polar thermoplastic resin which does not have a polar group, it is difficult for water to diffuse in the adhesive layer. Therefore, it is difficult for water to penetrate into the element portion provided in the sealed space enclosed by the first substrate, the first metal layer, the adhesive layer, and the second substrate. The adhesive layer is adhered to the first metal layer. Generally speaking, an adhesion layer made of a hydrocarbon resin or a non-polar thermoplastic resin exhibits good adhesion to metals. Therefore, for example, even when the adhesive layer is difficult to adhere to the first substrate, the adhesive layer can be well adhered to the first metal layer provided on the first main surface, so that the first layer can be suppressed. When the substrate is peeled from the adhesive layer.

並且,上述密封結構還可以具備被設置於第2主面上的框狀的第2金屬層,並且黏接層黏接於第2金屬層。此時,例如即使是在黏接層難以黏接於第2基板的情況下,由於該黏接層能夠良好地黏接於被設置在第2主面上的第2金屬層,因而能夠抑制第2基板從黏接層剝離的情形。The sealing structure may further include a frame-shaped second metal layer provided on the second main surface, and the adhesive layer may be adhered to the second metal layer. At this time, for example, even when the adhesive layer is difficult to adhere to the second substrate, the adhesive layer can be well adhered to the second metal layer provided on the second main surface, so that the first layer can be suppressed. 2 The case where the substrate is peeled from the adhesive layer.

並且,第2基板可以是金屬基板,且黏接層黏接於第2主面。此時,黏接層能夠良好地黏接於第2主面,因而能夠抑制第2基板從黏接層剝離的情形。In addition, the second substrate may be a metal substrate, and the adhesive layer is adhered to the second main surface. In this case, since the adhesive layer can adhere well to the second main surface, the second substrate can be prevented from being peeled from the adhesive layer.

並且,第1金屬層中的黏接有黏接層的面可以是設置有凸部和凹部之凹凸面。此時,黏接層與第1金屬層的界面的面積變大。藉此,從外部經由該界面到密封空間的距離變長。因此,水分便難以經由該界面浸入到密封空間。除此之外,由於黏接層與第1金屬層接觸的面積增加,因而黏接層相對於第1金屬層的黏接力得到提高。The surface of the first metal layer to which the adhesive layer is adhered may be an uneven surface provided with convex portions and concave portions. At this time, the area of the interface between the adhesive layer and the first metal layer becomes larger. Thereby, the distance from the outside to the sealed space via the interface becomes longer. Therefore, it is difficult for water to penetrate into the sealed space through the interface. In addition, since the contact area between the adhesive layer and the first metal layer is increased, the adhesion force of the adhesive layer to the first metal layer is improved.

並且,凸部的平均節距可以是10nm以上且1μm以下,且凸部相對於凹部的平均高度可以是50nm以上且1μm以下。此時,水分更加難以經由該界面浸入到密封空間。In addition, the average pitch of the convex portions may be 10 nm or more and 1 μm or less, and the average height of the convex portions with respect to the concave portions may be 50 nm or more and 1 μm or less. At this time, it is more difficult for water to penetrate into the sealed space through the interface.

並且,黏接層由烴類樹脂構成,烴類樹脂可以是烯烴樹脂。The adhesive layer is made of a hydrocarbon resin, and the hydrocarbon resin may be an olefin resin.

並且,黏接層由非極性熱塑性樹脂構成,非極性熱塑性樹脂可以是氟系樹脂。The adhesive layer is made of a non-polar thermoplastic resin, and the non-polar thermoplastic resin may be a fluorine-based resin.

並且,第1基板可以是玻璃基板、陶瓷基板或者半導體基板。此時,黏接層難以黏接於第1基板。但是,由於黏接層能夠良好地黏接於被設置於第1主面上的第1金屬層,因而能夠抑制第1基板從黏接層剝離的情形。The first substrate may be a glass substrate, a ceramic substrate, or a semiconductor substrate. At this time, the adhesive layer is difficult to adhere to the first substrate. However, since the adhesive layer can adhere well to the first metal layer provided on the first main surface, it is possible to prevent the first substrate from being peeled from the adhesive layer.

本發明的另一種態樣所涉及的有機EL顯示裝置具備上述的其中一個段落中所記載的一種密封結構,並且元件部具有有機EL元件。An organic EL display device according to another aspect of the present invention includes the sealing structure described in one of the paragraphs above, and the element portion includes an organic EL element.

在該有機EL顯示裝置中,由於在密封結構內設置有有機EL元件,並且黏接層含有不具有極性基團的烴類樹脂或者非極性熱塑性樹脂,因此,水分難以在該黏接劑內擴散。因此,水分難以浸入到被設置於由第1基板、第1金屬層、黏接層和第2基板所包圍而被密封的空間內的有機EL元件。並且,黏接層黏接於第1金屬層。一般而言,由烴類樹脂或者非極性熱塑性樹脂製成的黏接層會對金屬展現出良好的黏接性。因此,例如即使是在黏接層難以黏接於第1基板的情況下,由於該黏接層能夠良好地黏接於被設置在第1主面上的第1金屬層,因而能夠抑制第1基板從黏接層剝離的情形。In this organic EL display device, since an organic EL element is provided in a sealed structure, and the adhesive layer contains a hydrocarbon resin or a non-polar thermoplastic resin having no polar group, it is difficult for water to diffuse in the adhesive. . Therefore, it is difficult for water to penetrate into the organic EL element provided in a space enclosed by the first substrate, the first metal layer, the adhesive layer, and the second substrate and sealed. The adhesive layer is adhered to the first metal layer. Generally speaking, an adhesion layer made of a hydrocarbon resin or a non-polar thermoplastic resin exhibits good adhesion to metals. Therefore, for example, even when the adhesive layer is difficult to adhere to the first substrate, the adhesive layer can be well adhered to the first metal layer provided on the first main surface, so that the first layer can be suppressed. When the substrate is peeled from the adhesive layer.

本發明的另一種態樣所涉及的感測器具有上述的其中一個段落中所記載的一種密封結構,並且元件部具有感測器元件。The sensor according to another aspect of the present invention has a sealing structure described in one of the above paragraphs, and the element portion has a sensor element.

在該感測器中,在密封結構內設置有感測器元件,並且黏接層含有不具有極性基團的烴類樹脂或者非極性熱塑性樹脂,因此,水分難以在該黏接層內擴散。因此,水分難以浸入到被設置於由第1基板、第1金屬層、黏接層和第2基板所包圍而被密封的空間內的感測器元件。並且,黏接層黏接於第1金屬層。一般而言,由烴類樹脂或者非極性熱塑性樹脂製成的黏接層會對金屬展現出良好的黏接性。因此,例如即使是在黏接層難以黏接於第1基板的情況下,由於該黏接層能夠良好地黏接於被設置在第1主面上的第1金屬層,因而能夠抑制第1基板從黏接層剝離的情形。In this sensor, a sensor element is provided in the sealed structure, and the adhesive layer contains a hydrocarbon resin or a non-polar thermoplastic resin having no polar group, so it is difficult for moisture to diffuse in the adhesive layer. Therefore, it is difficult for water to penetrate into the sensor element provided in the space enclosed by the first substrate, the first metal layer, the adhesive layer, and the second substrate and sealed. The adhesive layer is adhered to the first metal layer. Generally speaking, an adhesion layer made of a hydrocarbon resin or a non-polar thermoplastic resin exhibits good adhesion to metals. Therefore, for example, even when the adhesive layer is difficult to adhere to the first substrate, the adhesive layer can be well adhered to the first metal layer provided on the first main surface, so that the first layer can be suppressed. When the substrate is peeled from the adhesive layer.

根據本發明的一種態樣,能夠提供一種抑制基板剝離和水分浸入的密封結構、有機EL顯示裝置以及感測器。According to one aspect of the present invention, it is possible to provide a sealing structure, an organic EL display device, and a sensor that suppress substrate peeling and moisture intrusion.

以下,參照隨附圖式對本發明的有效的實施型態進行詳細說明。另外,在以下的說明中,對同一要件或者具有同一功能的要件標注相同的符號,並且省略重複說明。Hereinafter, an effective embodiment of the present invention will be described in detail with reference to the accompanying drawings. In the following description, the same elements or elements having the same function are denoted by the same reference numerals, and repeated descriptions are omitted.

第1圖是表示實施型態所涉及的密封結構的概略俯視圖。第2圖是沿第1圖的α-α線的剖視圖。如第1圖以及第2圖所示,密封結構1具備:具有主面(第1主面)2a的第1基板2、被設置於第1基板2上的框狀的密封部3、位於密封部3的上方且具有與主面2a對置的主面(第2主面)4a的第2基板4、被設置於由第1基板2、密封部3及第2基板4所包圍而被密封的密封空間S內的元件部5、被設置於密封空間S內的乾燥劑6。FIG. 1 is a schematic plan view showing a sealing structure according to an embodiment. FIG. 2 is a cross-sectional view taken along line α-α in FIG. 1. As shown in FIG. 1 and FIG. 2, the sealing structure 1 includes a first substrate 2 having a main surface (first main surface) 2 a, a frame-shaped sealing portion 3 provided on the first substrate 2, and a sealing portion 3. The second substrate 4 above the portion 3 and having a principal surface (second principal surface) 4a opposite to the principal surface 2a is provided and enclosed by the first substrate 2, the sealing portion 3, and the second substrate 4 and sealed The element portion 5 in the sealed space S, and the desiccant 6 provided in the sealed space S.

第1基板2是俯視時大致呈矩形形狀的基板。因此,第1基板2的主面2a大致呈矩形形狀。可以使用例如玻璃基板、陶瓷基板或者半導體基板作為第1基板2。另外,第1基板2可以具有透光性以及撓性等。在本實施型態中,第1基板2使用玻璃基板。The first substrate 2 is a substrate having a substantially rectangular shape in a plan view. Therefore, the main surface 2a of the first substrate 2 has a substantially rectangular shape. As the first substrate 2, for example, a glass substrate, a ceramic substrate, or a semiconductor substrate can be used. The first substrate 2 may have translucency, flexibility, and the like. In this embodiment, a glass substrate is used as the first substrate 2.

密封部3是接合第1基板2與第2基板4的部分。密封部3沿著第1基板2的邊緣被設置在該第1基板2的主面2a上。密封部3具有:被設置於主面2a上的框狀的第1金屬層11、被設置於第1金屬層11上的框狀的黏接層12、被設置於黏接層12上且與第1金屬層11對置的第2金屬層13。在密封部3中,第1金屬層11的與第2金屬層13對置的對置面11a和黏接層12的與第1金屬層11對置的主面12a以沒有間隙的方式緊貼在一起。另外,第2金屬層13的與第1金屬層11對置的對置面13a和黏接層12的與第2金屬層13對置的主面12b以沒有間隙的方式緊貼在一起。The sealing portion 3 is a portion where the first substrate 2 and the second substrate 4 are joined. The sealing portion 3 is provided on the main surface 2 a of the first substrate 2 along the edge of the first substrate 2. The sealing portion 3 includes a frame-shaped first metal layer 11 provided on the main surface 2 a, a frame-shaped adhesive layer 12 provided on the first metal layer 11, and the adhesive layer 12 provided on the adhesive layer 12 and The second metal layer 13 is opposed to the first metal layer 11. In the sealing portion 3, the facing surface 11a of the first metal layer 11 facing the second metal layer 13 and the main surface 12a of the adhesive layer 12 facing the first metal layer 11 are closely contacted without gaps. Together. In addition, the facing surface 13 a of the second metal layer 13 facing the first metal layer 11 and the main surface 12 b of the adhesive layer 12 facing the second metal layer 13 are in close contact with each other without a gap.

第1金屬層11被沿著第1基板2的主面2a的邊緣設置且具有框狀的形狀。第1金屬層11例如透過將被設置於主面2a上的金屬膜圖案化成框狀而形成。該金屬膜例如透過真空蒸鍍法或者濺鍍法等而形成。第1金屬層11例如為鉬層、鈮層、鋁層、鎳層或者鉻層等各種金屬層。第1金屬層11可以是單層結構也可以是層疊結構。第1金屬層11的厚度例如為50nm以上。另外,第1金屬層11的寬度例如為1μm以上且2mm以下,較佳為100μm以上且1mm以下。The first metal layer 11 is provided along the edge of the main surface 2 a of the first substrate 2 and has a frame-like shape. The first metal layer 11 is formed by, for example, patterning a metal film provided on the main surface 2 a into a frame shape. This metal film is formed by, for example, a vacuum evaporation method or a sputtering method. The first metal layer 11 is, for example, various metal layers such as a molybdenum layer, a niobium layer, an aluminum layer, a nickel layer, or a chromium layer. The first metal layer 11 may have a single-layer structure or a laminated structure. The thickness of the first metal layer 11 is, for example, 50 nm or more. The width of the first metal layer 11 is, for example, 1 μm or more and 2 mm or less, and preferably 100 μm or more and 1 mm or less.

黏接層12是由黏接於第1金屬層11以及第2金屬層13的黏接劑所構成的框狀的層。黏接層12所包含的黏接劑透過加熱得以熔融從而發揮黏接性,並且含有不具有羥基以及羧基等極性基團的有機化合物。例如可以使用烯烴樹脂等烴類樹脂或者氟系樹脂等非極性熱塑性樹脂作為這種有機化合物。在本實施型態中,使用烯烴膜作為黏接層12。黏接層12的厚度例如為50μm以上且300μm以下。另外,黏接層12的寬度例如為1μm以上且2mm以下,較佳為100μm以上且1mm以下。The adhesive layer 12 is a frame-shaped layer made of an adhesive that is adhered to the first metal layer 11 and the second metal layer 13. The adhesive contained in the adhesive layer 12 is melted by heating to exert adhesiveness, and contains an organic compound having no polar group such as a hydroxyl group and a carboxyl group. For example, a hydrocarbon resin such as an olefin resin or a non-polar thermoplastic resin such as a fluorine-based resin can be used as the organic compound. In this embodiment, an olefin film is used as the adhesive layer 12. The thickness of the adhesive layer 12 is, for example, 50 μm or more and 300 μm or less. The width of the adhesive layer 12 is, for example, 1 μm or more and 2 mm or less, and preferably 100 μm or more and 1 mm or less.

在本實施型態中,黏接層12的邊緣超出第1金屬層11的邊緣以及第2金屬層13的邊緣,但是,黏接層12的邊緣也可以與第1金屬層11的邊緣以及第2金屬層13的邊緣對齊。另外,在將黏接層12配置於第1金屬層11上之前,可以對黏接層12中的與第1金屬層11接觸的主面12a以及與第2金屬層13接觸的主面12b中的至少一個主面實施大氣壓電漿處理。所謂的大氣壓電漿處理,是指例如對黏接層12照射電漿化後的氣體的處理。例如使用氦氣作為電漿化的氣體。透過對黏接層12實施大氣壓電漿處理,黏接層12中的被電漿化後的氣體照射過的表面得到活化。透過將黏接層12中的被活化過的表面作為黏接面,可以利用化學性黏接而牢固地將該表面與第1金屬層11和第2金屬層13中的至少一個金屬層接合。另外,上述所謂的活化,是指在表面生成懸空鍵(不飽和鍵)、或者是在該表面產生自由基。另外,也可以對黏接層12照射臭氧氣體,從而代替大氣壓電漿處理。In this embodiment, the edge of the adhesive layer 12 exceeds the edge of the first metal layer 11 and the edge of the second metal layer 13. However, the edge of the adhesive layer 12 may be the same as the edge of the first metal layer 11 and the first metal layer 11. 2 The edges of the metal layer 13 are aligned. In addition, before the adhesive layer 12 is disposed on the first metal layer 11, the main surface 12 a of the adhesive layer 12 that is in contact with the first metal layer 11 and the main surface 12 b of the second metal layer 13 that is in contact At least one of the main surfaces is treated with an atmospheric piezoelectric slurry. The atmospheric piezoelectric plasma treatment refers to, for example, a treatment in which the adhesive layer 12 is irradiated with plasma-formed gas. For example, helium is used as the plasmatizing gas. By performing an atmospheric piezoelectric slurry treatment on the adhesive layer 12, the surface of the adhesive layer 12 that has been irradiated with the plasma-activated gas is activated. By using the activated surface in the adhesive layer 12 as an adhesive surface, the surface can be firmly bonded to at least one of the first metal layer 11 and the second metal layer 13 by chemical adhesion. The above-mentioned activation refers to the generation of dangling bonds (unsaturated bonds) on the surface or the generation of free radicals on the surface. Alternatively, the adhesive layer 12 may be irradiated with ozone gas instead of the atmospheric piezoelectric slurry treatment.

第2金屬層13被沿著第2基板4的主面4a的邊緣設置且具有框狀的形狀。第2金屬層13例如透過將被設置於主面4a上的金屬膜圖案化成框狀而形成。該金屬膜例如透過真空蒸鍍法或者濺鍍法等而形成。第2金屬層13例如為鉬層、鈮層、鋁層、鎳層或者鉻層等各種金屬層。第2金屬層13可以是單層結構也可以是層疊結構。第2金屬層13的厚度例如為50nm以上。另外,第2金屬層13的寬度例如為1μm以上且2mm以下,較佳為100μm以上且1mm以下。在本實施型態中,第2金屬層13的寬度與第1金屬層11的寬度一致,但是第2金屬層13的寬度也可以與第1金屬層11的寬度不同。The second metal layer 13 is provided along the edge of the main surface 4 a of the second substrate 4 and has a frame-like shape. The second metal layer 13 is formed by, for example, patterning a metal film provided on the main surface 4 a into a frame shape. This metal film is formed by, for example, a vacuum evaporation method or a sputtering method. The second metal layer 13 is, for example, various metal layers such as a molybdenum layer, a niobium layer, an aluminum layer, a nickel layer, or a chromium layer. The second metal layer 13 may have a single-layer structure or a laminated structure. The thickness of the second metal layer 13 is, for example, 50 nm or more. The width of the second metal layer 13 is, for example, 1 μm or more and 2 mm or less, and preferably 100 μm or more and 1 mm or less. In this embodiment, the width of the second metal layer 13 is the same as the width of the first metal layer 11, but the width of the second metal layer 13 may be different from the width of the first metal layer 11.

第2基板4是俯視時大致呈矩形形狀的基板。因此,第2基板4的主面4a大致呈矩形形狀。如上述,主面4a與第1基板2的主面2a對置。並且,主面4a的形狀與主面2a的形狀大致相同。因此,被設置於該主面4a上的第2金屬層13位於與第1金屬層11對置並且與黏接層12黏接的位置。可以使用例如玻璃基板、陶瓷基板、塑膠基板或者金屬基板作為第2基板4。另外,第2基板4可以具有透光性以及撓性等。在第2基板4為塑膠基板的情況下,例如使用具有耐熱性的聚醯亞胺基板等。另外,金屬基板是至少含有金屬元素的基板,也可以是由合金製成的基板。另外,金屬基板也可以是以金屬或者合金為主成分的基板。可以使用例如銅板、鉬板或者不銹鋼板等作為金屬基板。在本實施型態中,使用玻璃基板作為第2基板4。The second substrate 4 is a substrate having a substantially rectangular shape in a plan view. Therefore, the main surface 4a of the second substrate 4 has a substantially rectangular shape. As described above, the main surface 4 a faces the main surface 2 a of the first substrate 2. The shape of the main surface 4a is substantially the same as the shape of the main surface 2a. Therefore, the second metal layer 13 provided on the main surface 4 a is located at a position facing the first metal layer 11 and adhering to the adhesive layer 12. As the second substrate 4, for example, a glass substrate, a ceramic substrate, a plastic substrate, or a metal substrate can be used. The second substrate 4 may have translucency, flexibility, and the like. When the second substrate 4 is a plastic substrate, for example, a polyimide substrate having heat resistance is used. The metal substrate is a substrate containing at least a metal element, and may be a substrate made of an alloy. The metal substrate may be a substrate mainly composed of a metal or an alloy. As the metal substrate, for example, a copper plate, a molybdenum plate, or a stainless steel plate can be used. In this embodiment, a glass substrate is used as the second substrate 4.

元件部5位於密封空間S內,且具有被形成於第1基板2的主面2a上的電性元件、配線、電子電路以及電子部件等。電氣元件是透過電力供給而發揮某些功能的元件,例如具有發光元件以及感測器元件等中的任意一個元件。電子電路例如是為了驅動電性元件而運作的電路。該電子電路例如由被形成於主面2a上的電阻、電晶體以及電容器等所構成。電子部件例如是積體電路等。在本實施型態中,在元件部5內形成有一個或者複個有機EL元件,以作為容易因水分浸入而劣化的元件。因此,密封結構1構成有機EL顯示裝置。The element portion 5 is located in the sealed space S, and includes electrical elements, wiring, electronic circuits, and electronic components formed on the main surface 2 a of the first substrate 2. The electric element is an element that performs certain functions by power supply, and includes, for example, any one of a light emitting element and a sensor element. An electronic circuit is, for example, a circuit that operates to drive electrical components. This electronic circuit is composed of, for example, a resistor, a transistor, and a capacitor formed on the main surface 2a. The electronic component is, for example, an integrated circuit. In this embodiment mode, one or a plurality of organic EL elements are formed in the element portion 5 as elements that are liable to deteriorate due to infiltration of moisture. Therefore, the sealing structure 1 constitutes an organic EL display device.

乾燥劑6吸附密封空間S內的水分。乾燥劑6位於於密封空間S內,且被形成於第2基板4的主面4a上。乾燥劑6是片狀或者粉體狀等的固體、或者是凝膠狀。乾燥劑6可以是無機物也可以是有機物。另外,在第2基板4具有透光性的情況下,乾燥劑6也可以具備透光性。使用直鏈狀或者環狀的有機金屬化合物作為具備透光性的乾燥劑。該有機金屬化合物例如包含鋁、鑭、釔、鎵、矽或者鍺中的任意一種。The desiccant 6 adsorbs moisture in the sealed space S. The desiccant 6 is located in the sealed space S and is formed on the main surface 4 a of the second substrate 4. The desiccant 6 is a solid such as a sheet or powder, or a gel. The desiccant 6 may be an inorganic substance or an organic substance. When the second substrate 4 is translucent, the desiccant 6 may be translucent. A linear or cyclic organometallic compound is used as a light-transmitting drying agent. The organometallic compound includes, for example, any one of aluminum, lanthanum, yttrium, gallium, silicon, and germanium.

根據以上說明的本實施方式型態所涉及的密封結構1,黏接層12是由烴類樹脂製成的烯烴膜。藉此,黏接層12不具有極性基團,水分難以在該黏接層12內擴散。因此,水分難以浸入到被設置於由第1基板2、密封部3及第2基板4所包圍而被密封的密封空間S內的元件部5,其中,該密封部3具有第1金屬層11、黏接層12及第2金屬層13。另外,黏接層12與第1金屬層11以及第2金屬層13黏接。一般而言,由烴類樹脂製成的黏接層12會對金屬展現出良好的黏接性。因而,例如,即使在黏接層12難以黏接於第1基板2以及第2基板4中的一方或雙方的情況下,由於該黏接層12能夠良好地黏接於被設置於主面2a上的第1金屬層11,因而能夠抑制第1基板2從黏接層12剝離的情形。此外,由於黏接層12能夠良好地黏接於被設置於主面4a上的第2金屬層13,因而能夠抑制第2基板4從黏接層12剝離的情形。According to the sealing structure 1 according to the embodiment described above, the adhesive layer 12 is an olefin film made of a hydrocarbon resin. Thereby, the adhesive layer 12 does not have a polar group, and it is difficult for water to diffuse in the adhesive layer 12. Therefore, it is difficult for moisture to penetrate into the element portion 5 provided in the sealed space S enclosed by the first substrate 2, the sealing portion 3, and the second substrate 4. The sealing portion 3 includes the first metal layer 11. , The adhesion layer 12 and the second metal layer 13. The adhesive layer 12 is adhered to the first metal layer 11 and the second metal layer 13. Generally, the adhesion layer 12 made of a hydrocarbon resin exhibits good adhesion to metals. Therefore, for example, even when the adhesive layer 12 is difficult to adhere to one or both of the first substrate 2 and the second substrate 4, the adhesive layer 12 can adhere well to the main surface 2a. The first metal layer 11 on the surface can prevent the first substrate 2 from being peeled from the adhesive layer 12. In addition, since the adhesive layer 12 can be well adhered to the second metal layer 13 provided on the main surface 4 a, it is possible to suppress the second substrate 4 from being peeled from the adhesive layer 12.

並且,第1基板2可以是玻璃基板、陶瓷基板或者半導體基板。此時,黏接層12難以與第1基板2黏接。但是,由於黏接層12能夠良好地黏接於被設置於主面2a上的第1金屬層11,因而能夠抑制第1基板2從黏接層12剝離的情形。The first substrate 2 may be a glass substrate, a ceramic substrate, or a semiconductor substrate. At this time, the adhesion layer 12 is difficult to adhere to the first substrate 2. However, since the adhesive layer 12 can adhere well to the first metal layer 11 provided on the main surface 2a, it is possible to suppress the first substrate 2 from being peeled from the adhesive layer 12.

另外,可以在密封空間S內設置乾燥劑6。此時,由於密封空間S內的水分被乾燥劑6吸附,因而水分便不能輕易浸入到元件部5。In addition, a desiccant 6 may be provided in the sealed space S. At this time, since the moisture in the sealed space S is adsorbed by the desiccant 6, the moisture cannot easily enter the element portion 5.

以下,說明上述實施型態的第1變化例~第3變化例。在第1變化例~第3變化例的說明中,主要針對與上述實施型態不同之處進行說明。Hereinafter, the first modification to the third modification of the above-mentioned embodiment will be described. In the description of the first modification to the third modification, the differences from the above-mentioned embodiment are mainly described.

第3圖是表示第1變化例所涉及的密封結構的概略剖視圖。如第3圖所示,密封結構1A的第2基板4A為金屬基板。另外,密封部3A僅具有第1金屬層11和黏接層12。因此,在第2基板4A的主面4a上並未設置有第2金屬層13,主面4a直接黏接於黏接層12。FIG. 3 is a schematic cross-sectional view showing a sealing structure according to a first modification. As shown in FIG. 3, the second substrate 4A of the sealing structure 1A is a metal substrate. The sealing portion 3A includes only the first metal layer 11 and the adhesive layer 12. Therefore, the second metal layer 13 is not provided on the main surface 4 a of the second substrate 4A, and the main surface 4 a is directly adhered to the adhesive layer 12.

根據上述第1變化例,黏接層12對金屬基板也就是第2基板4A展現出良好的黏接性。因此,與上述實施型態相同,能夠實現抑制第2基板4A從黏接層12剝離的作用效果。此外,由於密封部3A可以不具有第2金屬層13,因而能夠簡單地形成該密封部3A。According to the first modified example, the adhesive layer 12 exhibits good adhesion to the metal substrate, that is, the second substrate 4A. Therefore, similarly to the above-mentioned embodiment, the effect of suppressing the second substrate 4A from peeling from the adhesive layer 12 can be achieved. In addition, since the sealing portion 3A may not have the second metal layer 13, the sealing portion 3A can be easily formed.

第4圖(a)是表示第2變化例所涉及的密封結構的密封部的概略放大剖視圖。如第4圖(a)所示,在密封結構1B的密封部3中,第1金屬層11A的對置面11a是設置有複數個凸部21以及複數個凹部22的凹凸面。凸部21以及凹部22例如透過使用硫酸-雙氧水等腐蝕劑的濕式蝕刻或者RIE(反應離子蝕刻)等乾式蝕刻而得到。凸部21的高度可以相同也可以不同,凹部22的深度可以相同也可以不同,凸部21彼此之間的節距可以相同也可以不同。另外,凸部21以及凹部22可以密集設置在第1金屬層11A的一部分區域,也可以分散設置凸部21以及凹部22。Fig. 4 (a) is a schematic enlarged cross-sectional view showing a sealing portion of a sealing structure according to a second modification. As shown in FIG. 4 (a), in the sealing portion 3 of the sealing structure 1B, the opposing surface 11 a of the first metal layer 11A is an uneven surface provided with a plurality of convex portions 21 and a plurality of concave portions 22. The convex portion 21 and the concave portion 22 are obtained by, for example, wet etching using an etchant such as sulfuric acid-hydrogen peroxide or dry etching such as RIE (Reactive Ion Etching). The height of the convex portions 21 may be the same or different, the depth of the concave portions 22 may be the same or different, and the pitches between the convex portions 21 may be the same or different. In addition, the convex portions 21 and the concave portions 22 may be densely provided in a part of the area of the first metal layer 11A, or the convex portions 21 and the concave portions 22 may be dispersedly provided.

相鄰的凸部21之間的平均節距P1為10nm以上且1μm以下。該平均節距P1是相鄰的凸部21的頂點之間的俯視時的平均距離。另外,凸部21相對於凹部22的平均高度H1為50nm以上且1μm以下。平均高度H1是指從凹部22的底點到凸部21的頂點為止的平均高度。凸部21以及凹部22沿第1金屬層11A的寬度方向延伸,並且以通過平均高度H1的中心的中心線C1為基準來決定凸部21以及凹部22。具體而言,在第1金屬層11A的厚度方向上,將比中心線C1更靠第2基板4側作為凸部21,將比中心線C1更靠第1基板2側作為凹部22。另外,以下將第1金屬層11A的寬度方向簡稱為寬度方向,將第1金屬層11A的厚度方向簡稱為厚度方向。The average pitch P1 between adjacent convex portions 21 is 10 nm or more and 1 μm or less. This average pitch P1 is an average distance in plan view between the vertexes of the adjacent convex portions 21. The average height H1 of the convex portion 21 with respect to the concave portion 22 is 50 nm or more and 1 μm or less. The average height H1 is an average height from the bottom point of the concave portion 22 to the apex of the convex portion 21. The convex portion 21 and the concave portion 22 extend in the width direction of the first metal layer 11A, and the convex portion 21 and the concave portion 22 are determined on the basis of a center line C1 passing through the center of the average height H1. Specifically, in the thickness direction of the first metal layer 11A, the convex portion 21 is positioned on the second substrate 4 side than the center line C1, and the concave portion 22 is positioned on the first substrate 2 side than the center line C1. Hereinafter, the width direction of the first metal layer 11A is simply referred to as the width direction, and the thickness direction of the first metal layer 11A is simply referred to as the thickness direction.

與第1金屬層11A相同,第2金屬層13A的對置面13a是設置有複數個凸部31和複數個凹部32的凹凸面。與凸部21以及凹部22相同,凸部31以及凹部32例如透過濕式蝕刻或者乾式蝕刻而得到。因此,凸部31的高度可以相同也可以不同,凹部32的深度可以相同也可以不同,凸部31彼此之間的節距可以相同也可以不同。相鄰的凸部31之間的平均節距P2為10nm以上且1μm以下。該平均節距P2是指相鄰的凸部31的頂點之間的俯視時的平均距離。並且,凸部31相對於凹部32的平均高度H2為50nm以上且1μm以下。平均高度H2是指從凹部32的底點到凸部31的頂點為止的平均高度。凸部31以及凹部32沿寬度方向延伸,並且以通過平均高度H2的中心的中心線C2為基準來決定凸部31以及凹部32。具體而言,在厚度方向上,將比中心線C2更靠第1基板2側作為凸部31,將比中心線C2更靠第2基板4側作為凹部32。Similar to the first metal layer 11A, the opposing surface 13 a of the second metal layer 13A is an uneven surface provided with a plurality of convex portions 31 and a plurality of concave portions 32. Similar to the convex portion 21 and the concave portion 22, the convex portion 31 and the concave portion 32 are obtained by, for example, wet etching or dry etching. Therefore, the height of the convex portions 31 may be the same or different, the depth of the concave portions 32 may be the same or different, and the pitches between the convex portions 31 may be the same or different. The average pitch P2 between adjacent convex portions 31 is 10 nm or more and 1 μm or less. The average pitch P2 is an average distance in plan view between the vertexes of the adjacent convex portions 31. The average height H2 of the convex portion 31 with respect to the concave portion 32 is 50 nm or more and 1 μm or less. The average height H2 is an average height from the bottom point of the concave portion 32 to the vertex of the convex portion 31. The convex portion 31 and the concave portion 32 extend in the width direction, and the convex portion 31 and the concave portion 32 are determined on the basis of a center line C2 passing through the center of the average height H2. Specifically, in the thickness direction, the first substrate 2 side is positioned as the convex portion 31 and the second substrate 4 side is positioned as the concave portion 32 on the second substrate 4 side than the center line C2.

在上述第2變化例中,也能夠獲得與上述實施型態相同的作用效果。並且,黏接有黏接層12的對置面11a是凸部21以及凹部22連續交替設置的凹凸面。因此,黏接層12的主面12a與對置面11a的界面的面積變大。藉此,從外部經由該界面到密封空間S的距離變長。因此,水分難以經由上述界面浸入到密封空間S。除此之外,由於黏接層12與第1金屬層11A接觸的面積增加,因而黏接層12相對於第1金屬層11A的黏接力得到提高。Also in the above-mentioned second modification, the same effect as that of the above-mentioned embodiment can be obtained. The opposing surface 11 a to which the adhesive layer 12 is adhered is a concave-convex surface in which convex portions 21 and concave portions 22 are alternately provided continuously. Therefore, the area of the interface between the main surface 12 a and the opposing surface 11 a of the adhesive layer 12 is increased. Thereby, the distance from the outside to the sealed space S via the interface becomes longer. Therefore, it is difficult for water to penetrate into the sealed space S through the interface. In addition, since the contact area between the adhesive layer 12 and the first metal layer 11A increases, the adhesion force of the adhesive layer 12 to the first metal layer 11A is improved.

並且,透過將平均節距P1以及平均高度H1設定在上述範圍內,能夠更好地抑制水分經由黏接層12的主面12a與第1金屬層11A的對置面11a的界面而浸入到密封空間S的情形。In addition, by setting the average pitch P1 and the average height H1 within the above ranges, it is possible to better prevent moisture from being immersed in the seal through the interface between the main surface 12a of the adhesive layer 12 and the opposing surface 11a of the first metal layer 11A. The situation in space S.

而且,與第1金屬層11A相同,黏接有黏接層12的對置面13a是凸部31以及凹部32連續交替設置的凹凸面。因此,黏接層12的主面12b與對置面13a的界面的面積變大。藉此,從外部經由該界面到密封空間S的距離變長。因此,水分難以經由上述界面浸入到密封空間S。除此之外,由於黏接層12與第2金屬層13A接觸的面積增加,因而黏接層12相對於第2金屬層13A的黏接力得到提高。而且,透過將平均節距P2以及平均高度H2設定在上述範圍,能夠更好地抑制水分經由主面12b與對置面13a的界面而浸入到密封空間S的情形。In addition, like the first metal layer 11A, the facing surface 13 a to which the adhesive layer 12 is adhered is an uneven surface in which convex portions 31 and concave portions 32 are alternately provided continuously. Therefore, the area of the interface between the main surface 12 b and the opposing surface 13 a of the adhesive layer 12 is increased. Thereby, the distance from the outside to the sealed space S via the interface becomes longer. Therefore, it is difficult for water to penetrate into the sealed space S through the interface. In addition, since the contact area between the adhesion layer 12 and the second metal layer 13A increases, the adhesion force of the adhesion layer 12 to the second metal layer 13A is improved. In addition, by setting the average pitch P2 and the average height H2 within the above-mentioned ranges, it is possible to better prevent moisture from entering the sealed space S through the interface between the main surface 12b and the opposing surface 13a.

在第2變化例中,凸部21與凹部32彼此對置,凹部22與凸部31彼此對置。在此情況下,能夠避免黏接層12出現不均勻,因而能夠抑制第1金屬層11A與黏接層12之間的剝離情形,並且能夠抑制第2金屬層13A與黏接層12之間的剝離情形。但是,也可以使凸部21與凸部31彼此對置,還可以使凹部22與凹部32彼此對置。In the second modification, the convex portion 21 and the concave portion 32 face each other, and the concave portion 22 and the convex portion 31 face each other. In this case, unevenness of the adhesive layer 12 can be avoided, and thus the peeling between the first metal layer 11A and the adhesive layer 12 can be suppressed, and the adhesion between the second metal layer 13A and the adhesive layer 12 can be suppressed. Peeling situation. However, the convex portion 21 and the convex portion 31 may be opposed to each other, and the concave portion 22 and the concave portion 32 may be opposed to each other.

第4圖(b)是表示第3變化例所涉及的密封結構的密封部的概略放大剖視圖。如第4圖(b)所示,密封結構1C的第2基板4B是金屬基板。並且,密封部3A僅具有第1金屬層11A和黏接層12。因此,在第2基板4A的主面4a上並未設置有第2金屬層13,主面4a直接黏接於黏接層12。FIG. 4 (b) is a schematic enlarged cross-sectional view showing a sealing portion of a sealing structure according to a third modified example. As shown in FIG. 4 (b), the second substrate 4B of the sealing structure 1C is a metal substrate. The sealing portion 3A includes only the first metal layer 11A and the adhesive layer 12. Therefore, the second metal layer 13 is not provided on the main surface 4 a of the second substrate 4A, and the main surface 4 a is directly adhered to the adhesive layer 12.

在第2基板4B的主面4a中,黏接有黏接層12的區域4b是設置有複數個凸部41和複數個凹部42的凹凸面。與凸部21和凹部22相同,凸部41和凹部42例如透過濕式蝕刻或者乾式蝕刻而得到。因此,凸部41的高度可以相同也可以不同,凹部42的深度可以相同也可以不同,凸部41彼此之間的節距可以相同也可以不同。相鄰的凸部41之間的平均節距P3為10nm以上且1μm以下。該平均節距P3是指相鄰的凸部41的頂點之間的俯視時的平均距離。另外,凸部41相對於凹部42的平均高度H3為50nm以上且1μm以下。平均高度H3是指從凹部42的底點到凸部41的頂點為止的平均高度。凸部41和凹部42沿寬度方向延伸,並且以通過平均高度H3的中心的中心線C3為基準來決定凸部41以及凹部42。具體而言,在厚度方向上,將比中心線C3更靠第1基板2側作為凸部41,將比中心線C3更靠第2基板4B側作為凹部42。In the main surface 4 a of the second substrate 4B, a region 4 b to which the adhesive layer 12 is adhered is an uneven surface provided with a plurality of convex portions 41 and a plurality of concave portions 42. Similar to the convex portions 21 and the concave portions 22, the convex portions 41 and the concave portions 42 are obtained by, for example, wet etching or dry etching. Therefore, the height of the convex portions 41 may be the same or different, the depth of the concave portions 42 may be the same or different, and the pitches between the convex portions 41 may be the same or different. The average pitch P3 between the adjacent convex portions 41 is 10 nm or more and 1 μm or less. The average pitch P3 is an average distance in plan view between the vertexes of the adjacent convex portions 41. The average height H3 of the convex portion 41 with respect to the concave portion 42 is 50 nm or more and 1 μm or less. The average height H3 refers to the average height from the bottom point of the concave portion 42 to the apex of the convex portion 41. The convex portion 41 and the concave portion 42 extend in the width direction, and the convex portion 41 and the concave portion 42 are determined on the basis of a center line C3 passing through the center of the average height H3. Specifically, in the thickness direction, the convex portion 41 is positioned on the first substrate 2 side than the center line C3, and the concave portion 42 is positioned on the second substrate 4B side than the center line C3.

在上述第3變化例中,也可以得到與上述第2變化例相同的作用效果。除此之外,與第1變化例相同,在第3變化例中,密封部3A也可以不具有第2金屬層13,因而能夠簡單地形成該密封部3A。In the third modification, the same effects as the second modification can be obtained. Other than that, as in the first modification, in the third modification, the sealing portion 3A does not need to have the second metal layer 13, and thus the sealing portion 3A can be easily formed.

另外,透過將平均節距P3以及平均高度H3設定在上述範圍,能夠更好地抑制水分經由黏接層12的主面12a與第2基板4B的主面4a的界面而浸入密封空間S的情形。In addition, by setting the average pitch P3 and the average height H3 within the above-mentioned ranges, it is possible to better prevent the moisture from entering the sealed space S via the interface between the main surface 12a of the adhesive layer 12 and the main surface 4a of the second substrate 4B. .

在第3變化例中,凸部21與凹部42彼此對置,凹部22與凸部41彼此對置。在此情況下,能夠避免黏接層12出現不均勻,因而能夠抑制第1金屬層11A與黏接層12之間的剝離情形,並且能夠抑制第2基板4B與黏接層12之間的剝離情形。但是,也可以使凸部21與凸部41彼此對置,還可以使凹部22與凹部42彼此對置。In the third modification, the convex portion 21 and the concave portion 42 face each other, and the concave portion 22 and the convex portion 41 face each other. In this case, unevenness of the adhesive layer 12 can be avoided, and thus, peeling between the first metal layer 11A and the adhesive layer 12 can be suppressed, and peeling between the second substrate 4B and the adhesive layer 12 can be suppressed. situation. However, the convex portion 21 and the convex portion 41 may be opposed to each other, and the concave portion 22 and the concave portion 42 may be opposed to each other.

本發明的密封結構並不限定於上述實施型態和變化例,還可以存在其他各種變化。例如,本發明的元件部5也可以具有MEMS(微機電系統)等感測器以代替顯示元件。此時,上述密封結構成為感測器。另外,元件部5也可以具有顯示元件以及感測器元件這兩者,還可以具有其他有機電子器件(有機半導體元件或者色素增感型太陽能電池等)。The sealing structure of the present invention is not limited to the above-mentioned embodiments and modified examples, and various other changes are possible. For example, the element section 5 of the present invention may include a sensor such as a MEMS (Micro Electro Mechanical System) instead of a display element. At this time, the above-mentioned sealing structure becomes a sensor. The element portion 5 may include both a display element and a sensor element, and may include other organic electronic devices (organic semiconductor elements or dye-sensitized solar cells, etc.).

另外,在上述實施型態以及上述變化例中,黏接層12也可以不是被形成為框狀的膜。例如,黏接層12也可以是使液體狀的黏接劑固化之後形成的部件。此時,例如可以在第1金屬層上塗布黏接劑,並將第2金屬層接合於該黏接劑上,然後透過熱處理等使黏接劑固化。另外,除了黏接劑之外,黏接層12還可以含有各種添加物。例如,作為添加物可例舉出無機填料或者表面活性劑。在含有無機填料的黏接層12內,水分更加難以擴散。在含有表面活性劑的黏接層12與第1金屬層的界面以及該黏接層12與第2金屬層的界面,水分更加難以浸入。另外,在由氟系樹脂等非極性熱塑性樹脂來構成黏接層12的情況下,也能夠得到與上述實施型態以及上述變化例相同的效果。In addition, in the above-mentioned embodiment and the modification, the adhesive layer 12 may not be formed into a frame-shaped film. For example, the adhesive layer 12 may be a member formed by curing a liquid adhesive. In this case, for example, an adhesive may be applied to the first metal layer, the second metal layer may be bonded to the adhesive, and then the adhesive may be cured by heat treatment or the like. In addition to the adhesive, the adhesive layer 12 may contain various additives. Examples of the additives include inorganic fillers and surfactants. In the adhesive layer 12 containing an inorganic filler, it is more difficult for water to diffuse. At the interface between the adhesive layer 12 containing the surfactant and the first metal layer and the interface between the adhesive layer 12 and the second metal layer, it is more difficult for water to penetrate. In addition, when the adhesive layer 12 is composed of a non-polar thermoplastic resin such as a fluorine-based resin, the same effects as those of the above-mentioned embodiment and the above-mentioned modification can be obtained.

另外,在第2變化例中,亦可僅有第1金屬層11A的對置面11a與第2金屬層13A的對置面13a中的其中一個面為凹凸面。同樣地,在第3變化例中,亦可僅有第2基板4B的區域4b為凹凸面。另外,第3變化例的區域4b也可以形成於整個主面4a。換言之,凸部41以及凹部42可以連續交替形成在整個主面4a上。In addition, in the second modification, only one of the opposing surface 11 a of the first metal layer 11A and the opposing surface 13 a of the second metal layer 13A may be an uneven surface. Similarly, in the third modified example, only the region 4b of the second substrate 4B may be an uneven surface. The region 4b of the third modified example may be formed on the entire main surface 4a. In other words, the convex portions 41 and the concave portions 42 may be continuously and alternately formed on the entire main surface 4a.

另外,在上述第2變化例中,平均節距P1、P2以及平均高度H1、H2中的至少一個設定在上述範圍即可。同樣地,在上述第3變化例中,平均節距P1、P3以及平均高度H1、H3中的至少一個設定在上述範圍即可。In the second modification, at least one of the average pitches P1 and P2 and the average heights H1 and H2 may be set in the above range. Similarly, in the third modification, at least one of the average pitches P1 and P3 and the average heights H1 and H3 may be set in the above range.

另外,在上述實施型態以及上述第1變化例~第3變化例中,第1金屬層可以是不連續的。亦即,第1金屬層的一部分可以中斷。此時,可以在第1基板上的未設置有第1金屬層的部分設置與元件部5連接的引出配線等。In addition, in the embodiment and the first to third modifications, the first metal layer may be discontinuous. That is, a part of the first metal layer may be interrupted. At this time, a lead wire or the like connected to the element portion 5 may be provided on a portion of the first substrate where the first metal layer is not provided.

[實施例] 下面,透過以下的實施例進一步詳細說明本發明,但是本發明並不限定於這些例子。[Examples] Hereinafter, the present invention will be described in more detail through the following examples, but the present invention is not limited to these examples.

(實施例1) 第5圖是表示實施例所涉及的密封結構的概略剖視圖。如第5圖所示,製備了藉由框狀的密封部3來黏接第1基板2A與第2基板4而成的密封結構101,其中,該第1基板2A在主面2a的中央部設置有凹陷51,第2基板4具有與該凹陷51對置的主面4。下面對該密封結構101的製造方法進行說明。Embodiment 1 FIG. 5 is a schematic cross-sectional view showing a sealing structure according to an embodiment. As shown in FIG. 5, a sealing structure 101 in which a first substrate 2A and a second substrate 4 are adhered by a frame-shaped sealing portion 3 is prepared, and the first substrate 2A is at the center of the main surface 2 a A depression 51 is provided, and the second substrate 4 has a main surface 4 facing the depression 51. A method of manufacturing the sealing structure 101 will be described below.

首先,製備第1基板2A與第2基板4,其中該第1基板2A在主面2a的中央部設置有凹陷51,且該第2基板4具有與該凹陷51對置的主面4a。接著,在主面2a上形成由鉬所構成的金屬膜,並且在主面4a上形成由鉬所構成的金屬膜。接著,分別將上述金屬膜圖案化,形成沿主面2a的邊緣的框狀的第1金屬層11,並且形成沿主面4a的邊緣的框狀的第2金屬層13。接著,將第1基板2A在50%aq的硫酸-雙氧水中浸泡10分鐘,藉此形成對置面11a為凹凸面的第1金屬層11A。同樣地,將第2基板4在50%aq的硫酸-雙氧水中浸泡10分鐘,藉此形成對置面13a為凹凸面的第2金屬層13A。接著,在露點為-70℃的手模式操作箱內,在凹陷51中填充約100mg的乾燥劑52也就是片狀的氧化鈣(CaO)。接著,使用將環烯烴聚合物(日本瑞翁株式會社制ZEONOR、注冊商標)成型為框狀的膜狀的黏接層12來暫時固定第1基板2A與第2基板4。此時,透過第1金屬層11A的對置面11a與第2金屬層13A的對置面13a來夾持黏接層12。然後,在惰性氣體中且在160℃以上的條件下進行熱處理。藉此,使黏接層12與第1金屬層11A以及第2金屬層13A熔敷,從而得到密封結構101。First, a first substrate 2A and a second substrate 4 are prepared, wherein the first substrate 2A is provided with a recess 51 in a central portion of the main surface 2a, and the second substrate 4 has a main surface 4a opposite to the recess 51. Next, a metal film made of molybdenum is formed on the main surface 2a, and a metal film made of molybdenum is formed on the main surface 4a. Next, each of the metal films is patterned to form a frame-like first metal layer 11 along the edge of the main surface 2a, and a frame-like second metal layer 13 is formed along the edge of the main surface 4a. Next, the first substrate 2A was immersed in 50% aq of sulfuric acid-hydrogen peroxide for 10 minutes, thereby forming a first metal layer 11A whose opposed surface 11a was an uneven surface. Similarly, the second substrate 4 is immersed in 50% aq of sulfuric acid-hydrogen peroxide for 10 minutes, thereby forming a second metal layer 13A whose facing surface 13 a is an uneven surface. Next, in a hand mode operation box with a dew point of -70 ° C, about 100 mg of a desiccant 52, which is flake calcium oxide (CaO), is filled in the depression 51. Next, the first substrate 2A and the second substrate 4 are temporarily fixed using a film-shaped adhesive layer 12 formed by molding a cycloolefin polymer (ZEONOR, a registered trademark) manufactured by Nippon Ryo Co., Ltd. into a frame shape. At this time, the adhesive layer 12 is sandwiched between the opposing surface 11 a of the first metal layer 11A and the opposing surface 13 a of the second metal layer 13A. Then, heat treatment is performed in an inert gas at a temperature of 160 ° C or higher. Thereby, the adhesive layer 12 is welded to the first metal layer 11A and the second metal layer 13A to obtain a sealing structure 101.

(實施例2) 除了預先對膜狀的黏接層12實施大氣壓電漿處理以外,透過與實施例1相同的手法製備了密封結構。在大氣壓電漿處理中,首先對氦氣施加頻率為10kHz的10kV的交流電壓,從而使該氦氣電漿化。接著,向大氣中噴射該電漿化後的氦氣,使其照射於黏接層12的表面。(Example 2) A sealed structure was prepared by the same method as in Example 1, except that the film-shaped adhesive layer 12 was previously subjected to atmospheric piezoelectric slurry treatment. In the atmospheric piezoelectric slurry treatment, first, an alternating voltage of 10 kV at a frequency of 10 kHz is applied to helium, thereby plasmatizing the helium. Next, the plasma-converted helium gas is sprayed into the atmosphere to irradiate the surface of the adhesive layer 12.

(比較例) 使用環氧樹脂系黏接劑(Nagase ChemteX株式會社制XNR5516)來代替密封部3而將第1基板2A與第2基板4接合,從而得到密封結構。在本比較例中,在第1基板2A的主面2a上並未形成第1金屬層11,且在第2基板4的主面4a上並未形成第2金屬層13。因此,在本比較例中,第1基板2A以及第2基板4並未浸泡於硫酸-雙氧水。(Comparative Example) An epoxy-based adhesive (XNR5516 manufactured by Nagase ChemteX Co., Ltd.) was used instead of the sealing portion 3 to bond the first substrate 2A and the second substrate 4 to obtain a sealed structure. In this comparative example, the first metal layer 11 is not formed on the main surface 2 a of the first substrate 2A, and the second metal layer 13 is not formed on the main surface 4 a of the second substrate 4. Therefore, in this comparative example, the first substrate 2A and the second substrate 4 were not immersed in sulfuric acid-hydrogen peroxide.

(高溫高濕試驗) 分別對實施例1的密封結構101、實施例2的密封結構和比較例的密封結構進行高溫高濕試驗,並測量被填充於各密封結構內的乾燥劑的重量變化。在高溫高濕試驗中,將各個密封結構靜止放置在溫度為85℃、濕度為85%的條件下300個小時。(High-temperature and high-humidity test) The high-temperature and high-humidity test was performed on the sealing structure 101 of Example 1, the sealing structure of Example 2, and the sealing structure of the comparative example, and the weight change of the desiccant filled in each sealing structure was measured. In the high-temperature and high-humidity test, each sealed structure was left standing for 300 hours under conditions of a temperature of 85 ° C and a humidity of 85%.

第6圖是表示實施例1、2和比較例的乾燥劑的重量變化的圖表。在第6圖中,縱軸表示乾燥劑的水分增加量,橫軸表示試驗時間。另外,曲線61表示實施例1的測量結果,曲線62表示實施例2的測量結果,曲線63表示比較例的測量結果。在比較例中,在進行了300小時的高溫高濕試驗後,乾燥劑的重量增加了約0.00025g(0.25mg)。與此相對,在實施例1中,乾燥劑的重量增加了約0.0001g(0.1mg)。並且,在實施例2中,並未確認到乾燥劑的重量增加。因此,證實了在使用經過大氣壓電漿處理之後的黏接層12的實施例2的密封結構中,水分最難以浸入到密封空間S內。Fig. 6 is a graph showing changes in weight of the desiccant in Examples 1, 2 and Comparative Examples. In Fig. 6, the vertical axis indicates the amount of moisture increase of the desiccant, and the horizontal axis indicates the test time. In addition, the curve 61 shows the measurement result of Example 1, the curve 62 shows the measurement result of Example 2, and the curve 63 shows the measurement result of the comparative example. In the comparative example, the weight of the desiccant was increased by about 0.00025 g (0.25 mg) after the high temperature and high humidity test for 300 hours. In contrast, in Example 1, the weight of the desiccant was increased by about 0.0001 g (0.1 mg). Moreover, in Example 2, no increase in the weight of the desiccant was confirmed. Therefore, it was confirmed that in the sealing structure of Example 2 using the adhesive layer 12 after being subjected to the atmospheric piezoelectric paste treatment, it is most difficult for water to penetrate into the sealed space S.

1‧‧‧密封結構 1‧‧‧sealed structure

1A‧‧‧密封結構 1A‧‧‧Sealed structure

1B‧‧‧密封結構 1B‧‧‧Sealed structure

1C‧‧‧密封結構 1C‧‧‧Sealed structure

2‧‧‧第1基板 2‧‧‧ the first substrate

2a‧‧‧主面(第1主面) 2a ‧ ‧ main surface (first main surface)

2A‧‧‧第1基板 2A‧‧‧The first substrate

3‧‧‧密封部 3‧‧‧Sealing Department

3A‧‧‧密封部 3A‧‧‧Sealing Department

4‧‧‧第2基板 4‧‧‧ 2nd substrate

4a‧‧‧主面(第2主面) 4a ‧ ‧ main surface (second main surface)

4A‧‧‧第2基板 4A‧‧‧The second substrate

4B‧‧‧第2基板 4B‧‧‧The second substrate

5‧‧‧元件部 5‧‧‧Element Department

6‧‧‧乾燥劑 6‧‧‧ Desiccant

11‧‧‧第1金屬層 11‧‧‧ 1st metal layer

11a‧‧‧對置面 11a‧‧‧ Opposite side

11A‧‧‧第1金屬層 11A‧‧‧The first metal layer

12‧‧‧黏接層 12‧‧‧ Adhesive layer

12a‧‧‧主面 12a‧‧‧Main face

12b‧‧‧主面 12b‧‧‧ main face

13‧‧‧第2金屬層 13‧‧‧Second metal layer

13a‧‧‧對置面 13a‧‧‧ Opposite side

13A‧‧‧第2金屬層 13A‧‧‧Second metal layer

21‧‧‧凸部 21‧‧‧ convex

22‧‧‧凹部 22‧‧‧ Recess

31‧‧‧凸部 31‧‧‧ convex

32‧‧‧凹部 32‧‧‧ recess

41‧‧‧凸部 41‧‧‧ convex

42‧‧‧凹部 42‧‧‧ Recess

51‧‧‧凹陷 51‧‧‧ Depression

52‧‧‧乾燥劑 52‧‧‧ Desiccant

61‧‧‧曲線 61‧‧‧ curve

62‧‧‧曲線 62‧‧‧ curve

63‧‧‧曲線 63‧‧‧ curve

101‧‧‧密封結構 101‧‧‧sealed structure

C1‧‧‧中心線 C1‧‧‧ Centerline

C2‧‧‧中心線 C2‧‧‧ Centerline

C3‧‧‧中心線 C3‧‧‧ Centerline

H1‧‧‧平均高度 H1‧‧‧ average height

H2‧‧‧平均高度 H2‧‧‧ average height

H3‧‧‧平均高度 H3‧‧‧ average height

P‧‧‧平均節距 P‧‧‧average pitch

P1‧‧‧平均節距 P1‧‧‧average pitch

P2‧‧‧平均節距 P2‧‧‧average pitch

P3‧‧‧平均節距 P3‧‧‧average pitch

S‧‧‧密封空間 S‧‧‧Sealed space

第1圖是表示實施型態所涉及的密封結構的概略俯視圖。 第2圖是沿第1圖的α-α線的剖視圖。 第3圖是表示第1變化例所涉及的密封結構的概略剖視圖。 第4圖(a)是表示第2變化例所涉及的密封結構的密封部的概略放大剖視圖,第4圖(b)是表示第3變化例所涉及的密封結構的密封部的概略放大剖視圖。 第5圖是表示實施例所涉及的密封結構的概略剖視圖。 第6圖是表示實施例1、2和比較例的乾燥劑的重量變化的圖表。FIG. 1 is a schematic plan view showing a sealing structure according to an embodiment. FIG. 2 is a cross-sectional view taken along line α-α in FIG. 1. FIG. 3 is a schematic cross-sectional view showing a sealing structure according to a first modification. FIG. 4 (a) is a schematic enlarged cross-sectional view showing a sealing portion of a sealing structure according to a second modified example, and FIG. 4 (b) is a schematic enlarged cross-sectional view showing a sealing portion of a sealing structure according to a third modified example. Fig. 5 is a schematic cross-sectional view showing a sealing structure according to the embodiment. Fig. 6 is a graph showing changes in weight of the desiccant in Examples 1, 2 and Comparative Examples.

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國外寄存資訊 (請依寄存國家、機構、日期、號碼順序註記) 無Information on foreign deposits (please note in order of deposit country, institution, date, and number) None

(請換頁單獨記載) 無(Please change pages to record separately) None

Claims (8)

一種密封結構,其具備:第1基板,其具有第1主面;框狀的第1金屬層,其沿前述第1基板的邊緣被設置在前述第1主面上;框狀的黏接層,其被設置於前述第1金屬層上;第2基板,其位於前述黏接層的上方,且具有與前述第1主面對置的第2主面;以及,元件部,其在前述第1主面上,且被設置於由前述第1基板、前述第1金屬層、前述黏接層及前述第2基板所包圍而被密封的密封空間內;其中,前述黏接層含有烴類樹脂或者非極性熱塑性樹脂,並且前述黏接層黏接於前述第1金屬層;前述第1金屬層中的前述黏接層所黏接的面為設置有凸部和凹部之凹凸面;前述凸部的平均節距為10nm以上且1μm以下;並且,前述凸部相對於前述凹部的平均高度為50nm以上且1μm以下。A sealing structure includes a first substrate having a first main surface, a frame-shaped first metal layer provided on the first main surface along an edge of the first substrate, and a frame-shaped adhesive layer. Is disposed on the first metal layer; the second substrate is located above the adhesive layer and has a second main surface facing the first main surface; and the element portion is disposed on the first 1 on the main surface and provided in a sealed space enclosed by the first substrate, the first metal layer, the adhesive layer, and the second substrate and sealed; wherein the adhesive layer contains a hydrocarbon resin Or a non-polar thermoplastic resin, and the adhesive layer is adhered to the first metal layer; a surface to which the adhesive layer in the first metal layer is adhered is a concave-convex surface provided with convex portions and concave portions; the convex portion The average pitch of P is 10 nm or more and 1 μm or less; and the average height of the convex portion with respect to the concave portion is 50 nm or more and 1 μm or less. 如請求項1所述的密封結構,其中更具備:框狀的第2金屬層,其被設置於前述第2主面上;並且,前述黏接層黏接於前述第2金屬層。The sealing structure according to claim 1, further comprising: a frame-shaped second metal layer provided on the second main surface; and the adhesive layer is adhered to the second metal layer. 如請求項1所述的密封結構,其中:前述第2基板為金屬基板;前述黏接層黏接於前述第2主面。The sealing structure according to claim 1, wherein: the second substrate is a metal substrate; and the adhesive layer is adhered to the second main surface. 如請求項1至3中任一項所述的密封結構,其中:前述黏接層由前述烴類樹脂製成;前述烴類樹脂為烯烴樹脂。The sealing structure according to any one of claims 1 to 3, wherein: the adhesive layer is made of the hydrocarbon resin; and the hydrocarbon resin is an olefin resin. 如請求項1至3中任一項所述的密封結構,其中:前述黏接層由前述非極性熱塑性樹脂製成;前述非極性熱塑性樹脂為氟系樹脂。The sealing structure according to any one of claims 1 to 3, wherein the adhesive layer is made of the non-polar thermoplastic resin, and the non-polar thermoplastic resin is a fluorine-based resin. 如請求項1至3中任一項所述的密封結構,其中:前述第1基板為玻璃基板、陶瓷基板或者半導體基板。The sealing structure according to any one of claims 1 to 3, wherein the first substrate is a glass substrate, a ceramic substrate, or a semiconductor substrate. 一種有機電致發光顯示裝置,其具備請求項1至6中任一項所述的密封結構;並且,前述元件部具有有機電致發光元件。An organic electroluminescence display device comprising the sealing structure according to any one of claims 1 to 6; and the element portion includes an organic electroluminescence element. 一種感測器,其具備請求項1至6中任一項所述的密封結構;並且,前述元件部具有感測器元件。A sensor including the sealing structure according to any one of claims 1 to 6; and the element portion includes a sensor element.
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