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TWI642731B - Photosensitive resin composition, photosensitive material, color filter and display device - Google Patents

Photosensitive resin composition, photosensitive material, color filter and display device Download PDF

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Publication number
TWI642731B
TWI642731B TW106123548A TW106123548A TWI642731B TW I642731 B TWI642731 B TW I642731B TW 106123548 A TW106123548 A TW 106123548A TW 106123548 A TW106123548 A TW 106123548A TW I642731 B TWI642731 B TW I642731B
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group
carbon atoms
chemical formula
substituted
resin composition
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TW106123548A
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TW201811926A (en
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李在容
梁承秦
柳璋鉉
李多美
朴鍾鎬
朴相均
金載駿
李修蓮
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Lg化學股份有限公司
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    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09BORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B11/00Diaryl- or thriarylmethane dyes
    • C09B11/04Diaryl- or thriarylmethane dyes derived from triarylmethanes, i.e. central C-atom is substituted by amino, cyano, alkyl
    • C09B11/10Amino derivatives of triarylmethanes
    • C09B11/24Phthaleins containing amino groups ; Phthalanes; Fluoranes; Phthalides; Rhodamine dyes; Phthaleins having heterocyclic aryl rings; Lactone or lactame forms of triarylmethane dyes
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D311/00Heterocyclic compounds containing six-membered rings having one oxygen atom as the only hetero atom, condensed with other rings
    • C07D311/02Heterocyclic compounds containing six-membered rings having one oxygen atom as the only hetero atom, condensed with other rings ortho- or peri-condensed with carbocyclic rings or ring systems
    • C07D311/78Ring systems having three or more relevant rings
    • C07D311/80Dibenzopyrans; Hydrogenated dibenzopyrans
    • C07D311/82Xanthenes
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09BORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B1/00Dyes with anthracene nucleus not condensed with any other ring
    • C09B1/16Amino-anthraquinones
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09BORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B11/00Diaryl- or thriarylmethane dyes
    • C09B11/04Diaryl- or thriarylmethane dyes derived from triarylmethanes, i.e. central C-atom is substituted by amino, cyano, alkyl
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09BORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B11/00Diaryl- or thriarylmethane dyes
    • C09B11/04Diaryl- or thriarylmethane dyes derived from triarylmethanes, i.e. central C-atom is substituted by amino, cyano, alkyl
    • C09B11/10Amino derivatives of triarylmethanes
    • C09B11/12Amino derivatives of triarylmethanes without any OH group bound to an aryl nucleus
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09BORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B67/00Influencing the physical, e.g. the dyeing or printing properties of dyestuffs without chemical reactions, e.g. by treating with solvents grinding or grinding assistants, coating of pigments or dyes; Process features in the making of dyestuff preparations; Dyestuff preparations of a special physical nature, e.g. tablets, films
    • C09B67/0033Blends of pigments; Mixtured crystals; Solid solutions
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09BORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B67/00Influencing the physical, e.g. the dyeing or printing properties of dyestuffs without chemical reactions, e.g. by treating with solvents grinding or grinding assistants, coating of pigments or dyes; Process features in the making of dyestuff preparations; Dyestuff preparations of a special physical nature, e.g. tablets, films
    • C09B67/0033Blends of pigments; Mixtured crystals; Solid solutions
    • C09B67/0034Mixtures of two or more pigments or dyes of the same type
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • G02B5/22Absorbing filters
    • G02B5/223Absorbing filters containing organic substances, e.g. dyes, inks or pigments
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509Filters, e.g. light shielding masks
    • G02F1/133514Colour filters
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007Filters, e.g. additive colour filters; Components for display devices
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/0048Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/09Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Nonlinear Science (AREA)
  • Optics & Photonics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Mathematical Physics (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)

Abstract

本發明提供一種光敏樹脂組成物與包含其的彩色濾光片。本說明書是有關於一種包含由化學式1表示的化合物、與由化學式2表示的化合物的光敏樹脂組成物與包含其的彩色濾光片。 The present invention provides a photosensitive resin composition and a color filter comprising the same. The present specification relates to a photosensitive resin composition comprising a compound represented by Chemical Formula 1, a compound represented by Chemical Formula 2, and a color filter comprising the same.

Description

光敏樹脂組成物、光敏材料、彩色濾光片及顯 示器裝置 Photosensitive resin composition, photosensitive material, color filter and display Display device

本說明書是有關於一種光敏樹脂組成物與包含其的彩色濾光片。 This specification relates to a photosensitive resin composition and a color filter comprising the same.

近年來,對於彩色濾光片,要求以高亮度、高對比率(contrast ratio)為特徵的性能。另外,顯示元件開發的主要目的之一在於由色純度的提升帶來的顯示元件性能的差別化及製造步驟上的生產性的提升。 In recent years, for color filters, performance characterized by high brightness and high contrast ratio is required. In addition, one of the main purposes of the development of display elements is the differentiation of display element performance and the improvement of productivity in manufacturing steps due to the improvement in color purity.

先前,用作彩色濾光片的著色劑的顏料類型是以粒子分散狀態存在於彩色光阻劑中,因此,難以藉由調節顏料粒子的尺寸與分佈來調節亮度及對比率。於為顏料粒子的情況下,於彩色濾光片內凝聚,溶解及分散性差,由於凝聚(aggregation)的大粒子而引起光的多重散射(multiple scattering)。已指出此種偏光的光的散射是使對比率降低的主要原因。為了藉由顏料的超微粒化及分散穩定化來提升亮度及對比率,正在不斷地進行努力,但就用以實現高色純度的顯示裝置用色座標的著色劑的選定而言,自 由度受限。另外,使用已開發出的著色材料、尤其是顏料的顏料分散法於提升使用其的彩色濾光片的色純度、亮度及對比率的方面已達到極限。因此,要求開發可提高色純度、且提升色彩再現、亮度及對比率的著色劑或者包含其的光敏樹脂組成物。 Previously, the type of pigment used as a color filter of a color filter was present in a color dispersion in a particle-dispersed state, and therefore, it was difficult to adjust the brightness and the contrast ratio by adjusting the size and distribution of the pigment particles. In the case of pigment particles, it is agglomerated in a color filter, and has poor solubility and dispersibility, and causes multiple scattering of light due to large particles of aggregation. It has been pointed out that the scattering of such polarized light is the main reason for the decrease in the contrast ratio. In order to improve the brightness and the contrast ratio by ultrafine particle formation and dispersion stabilization of pigments, efforts have been made to achieve color matching of color coordinates for display devices for achieving high color purity. Limited by degree. In addition, the pigment dispersion method using the developed coloring material, especially the pigment, has reached the limit in terms of improving the color purity, brightness, and contrast ratio of the color filter using the same. Therefore, development of a coloring agent which can improve color purity and enhance color reproduction, brightness, and contrast ratio or a photosensitive resin composition containing the same is required.

[現有技術文獻] [Prior Art Literature] [專利文獻] [Patent Literature]

[專利文獻1]日本專利特開平9-87534號公報 [Patent Document 1] Japanese Patent Laid-Open No. Hei 9-87534

本發明是有關於一種光敏樹脂組成物、使用其所製造的彩色濾光片。 The present invention relates to a photosensitive resin composition, a color filter produced using the same.

本發明的一實施態樣提供一種包含由下述化學式1表示的化合物、與由下述化學式2表示的化合物的光敏樹脂組成物。 According to an embodiment of the present invention, there is provided a photosensitive resin composition comprising a compound represented by the following Chemical Formula 1 and a compound represented by the following Chemical Formula 2.

[化學式2][(RSiO1.5)n]化學式1中,LA及LB可彼此相同亦可不同,分別獨立地為直接鍵結或碳數1~10的伸烷基,RA~RF可彼此相同亦可不同,分別獨立地選自由氫、重氫、鹵素原子、硝基、經取代或未經取代的碳數1~30的直鏈或分支鏈的烷基、經取代或未經取代的碳數1~30的烷氧基、經取代或未經取代的碳數6~30的單環或多環的芳基、及經取代或未經取代的碳數1~30的單環或多環的雜芳基所組成的群組中,R1~R6可彼此相同亦可不同,分別獨立地選自由氫、重氫、鹵素原子、經取代或未經取代的碳數1~6的直鏈或分支鏈的烷基、及經取代或未經取代的碳數1~6的烷氧基、磺酸基、磺酸酯基、磺酸鹽基、-SO2NHR7基及-SO2NR8R9所組成的群組中,R7~R9可彼此相同亦可不同,分別獨立地為直鏈或分支鏈的碳數1~10的烷基,X1~X5可彼此相同亦可不同,分別獨立地選自由氫、重氫、陰離子性基、羥基、經取代或未經取代的碳數1~30的烷基、經取代或未經取代的碳數6~30的單環或多環的芳基、及經取代或未經取代的碳數1~30的單環或多環的雜芳基所組成的群組中,所述X1~X5的至少一個為陰離子性基, RAA及RBB可彼此相同亦可不同,分別獨立地選自由氫、重氫、經取代或未經取代的碳數1~30的烷基、經取代或未經取代的碳數1~30的烷氧基、經取代或未經取代的碳數6~30的單環或多環的芳基、經取代或未經取代的碳數1~30的單環或多環的雜芳基、鹵素原子、硝基、苯氧基、羧基、羧酸酯基、羧酸鹽基、烷氧基羰基、羥基、磺酸基、磺酸酯基、磺酸鹽基、-SO2NHR'及-SO2NR"R'''所組成的群組中,a及b可彼此相同亦可不同,分別獨立地為0~4的整數,於a及b為2以上的情況下,括號內的結構可彼此相同亦可不同,R'、R"及R'''可彼此相同亦可不同,分別獨立地為碳數1~30的烷基,化學式2中,n為4以上的偶數,R由-(L1)n1-R7表示,多個R可彼此相同亦可不同,L1為直接鍵結、-O-、-S-或碳數1~30的伸烷基,n1為1~5的整數,於n1為2以上的情況下,L1可彼此相同亦可不同,R7為氫、重氫、-OH、環氧基(epoxide group)、-SH、-NH2、-N=C=O、-C=C-、碳數1~30的經取代或未經取代的烷 基、碳數6~30的芳基或者碳數1~30的雜環基。 [Chemical Formula 2] [(RSiO 1.5 ) n ] In Chemical Formula 1, L A and L B may be the same or different, and each independently is a direct bond or an alkyl group having a carbon number of 1 to 10, R A to R F They may be the same or different from each other, and are independently selected from hydrogen, a heavy hydrogen, a halogen atom, a nitro group, a substituted or unsubstituted alkyl group having a linear or branched chain of 1 to 30 carbon atoms, substituted or not. Substituted alkoxy groups having 1 to 30 carbon atoms, substituted or unsubstituted monocyclic or polycyclic aryl groups having 6 to 30 carbon atoms, and substituted or unsubstituted monocyclic rings having 1 to 30 carbon atoms Or a group consisting of polycyclic heteroaryl groups, R 1 to R 6 may be the same or different from each other, and are independently selected from hydrogen, dihydrogen, halogen atom, substituted or unsubstituted carbon number 1~. a straight or branched alkyl group of 6 and a substituted or unsubstituted alkoxy group having 1 to 6 carbon atoms, a sulfonic acid group, a sulfonate group, a sulfonate group, a -SO 2 NHR 7 group, and In the group consisting of -SO 2 NR 8 R 9 , R 7 to R 9 may be the same or different, and each independently is a linear or branched carbon group having 1 to 10 carbon atoms, X 1 to X 5 . They may be the same or different from each other, and are independently selected from , heavy hydrogen, an anionic group, a hydroxyl group, a substituted or unsubstituted alkyl group having 1 to 30 carbon atoms, a substituted or unsubstituted monocyclic or polycyclic aryl group having 6 to 30 carbon atoms, and In the group consisting of a substituted or unsubstituted monocyclic or polycyclic heteroaryl group having 1 to 30 carbon atoms, at least one of X 1 to X 5 is an anionic group, and R AA and R BB may be mutually The same or different, each independently selected from hydrogen, heavy hydrogen, substituted or unsubstituted alkyl group having 1 to 30 carbon atoms, substituted or unsubstituted alkoxy group having 1 to 30 carbon atoms, substituted Or unsubstituted aryl or polycyclic aryl group having 6 to 30 carbon atoms, substituted or unsubstituted monocyclic or polycyclic heteroaryl group having 1 to 30 carbon atoms, halogen atom, nitro group, benzene Oxyl, carboxyl, carboxylate, carboxylate, alkoxycarbonyl, hydroxy, sulfonate, sulfonate, sulfonate, -SO 2 NHR' and -SO 2 NR"R' In the group formed, a and b may be the same or different from each other, and are each independently an integer of 0 to 4. When a and b are 2 or more, the structures in the parentheses may be the same or different. R', R" and R''' may or may not be identical to each other Similarly, each is independently an alkyl group having 1 to 30 carbon atoms, and in the chemical formula 2, n is an even number of 4 or more, and R is represented by -(L 1 ) n1 - R 7 , and a plurality of R may be the same or different from each other, L 1 is a direct bond, -O-, -S- or an alkylene group having 1 to 30 carbon atoms, and n1 is an integer of 1 to 5. When n1 is 2 or more, L 1 may be the same or different. R 7 is hydrogen, heavy hydrogen, -OH, epoxide group, -SH, -NH 2 , And -N=C=O, -C=C-, a substituted or unsubstituted alkyl group having 1 to 30 carbon atoms, an aryl group having 6 to 30 carbon atoms or a heterocyclic group having 1 to 30 carbon atoms.

另外,本發明的一實施態樣提供一種使用所述光敏樹脂組成物所製造的光敏材料與包含其的彩色濾光片。 Further, an embodiment of the present invention provides a photosensitive material produced using the photosensitive resin composition and a color filter containing the same.

關於本發明的一實施態樣的光敏樹脂組成物,於形成彩色濾光片用圖案的情況下,當於圖案內實現孔(hole)時,可使感度降低並且提高亮度。 In the case of forming a pattern for a color filter according to an embodiment of the photosensitive resin composition of the present invention, when a hole is realized in the pattern, the sensitivity can be lowered and the brightness can be improved.

另外,本發明的一實施態樣的光敏樹脂組成物即使感度低,圖案與基板的密著力亦優異。 Further, in the photosensitive resin composition of one embodiment of the present invention, even if the sensitivity is low, the adhesion between the pattern and the substrate is excellent.

圖1表示對使用了本發明的一實施態樣的光敏樹脂組成物的彩色濾光片圖案與比較例的微細圖案的密著力進行測定所得的結果。 Fig. 1 shows the results of measuring the adhesion of a color filter pattern of a photosensitive resin composition according to an embodiment of the present invention to a fine pattern of a comparative example.

以下,對本說明書進行更詳細的說明。 Hereinafter, the present specification will be described in more detail.

本說明書中,於設為某部分「包含」某構成要素的情況下,只要無特別相反的記載,則該情況並非意味著排除其他構成要素,而是指可更包含其他構成要素。 In the present specification, when a certain component is "included" as a component, unless otherwise stated, the case does not mean that other components are excluded, and that other components may be included.

根據本說明書的一實施態樣,提供一種包含由所述化學式1表示的化合物、與由所述化學式2表示的化合物的光敏樹脂組成物。 According to an embodiment of the present specification, there is provided a photosensitive resin composition comprising the compound represented by the above Chemical Formula 1 and the compound represented by the Chemical Formula 2.

本說明書中,「經取代或未經取代的」這一用語是指經 選自包含重氫、鹵素原子、烷基、烯基、烷氧基、環烷基、芳基烯基、芳基、芳基氧基、芳烷基、芳烯基、烷基胺基、芳烷基胺基、芳基胺基、雜芳基、咔唑基、丙烯醯基、丙烯酸酯基、醚基、腈基、硝基、羥基、氰基、含有N原子、O原子、S原子或P原子中的一個以上的雜芳基及陰離子性基的群組中的一個以上的取代基所取代或者不具有任何取代基。 In this specification, the term "substituted or unsubstituted" means Selected from the group consisting of heavy hydrogen, halogen atom, alkyl, alkenyl, alkoxy, cycloalkyl, arylalkenyl, aryl, aryloxy, aralkyl, aralkenyl, alkylamino, aromatic Alkylamino, arylamino, heteroaryl, carbazolyl, acryl fluorenyl, acrylate, ether, nitrile, nitro, hydroxy, cyano, containing N, O, S or One or more substituents in the group of one or more heteroaryl groups and anionic groups in the P atom may or may not have any substituent.

本說明書中,所述烷基可為直鏈或分支鏈,並無特別限定,碳數可為1~30。作為具體例,可列舉甲基、乙基、丙基、異丙基、丁基、第三丁基、戊基、己基及庚基等,但並不限定於該些。 In the present specification, the alkyl group may be a straight chain or a branched chain, and is not particularly limited, and the carbon number may be from 1 to 30. Specific examples thereof include a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, a tert-butyl group, a pentyl group, a hexyl group, and a heptyl group, but are not limited thereto.

本說明書中,所述烯基可為直鏈或分支鏈,并無特別限定,碳數可為2~25。作為具體例,可列舉二苯乙烯(stylbenyl)基、苯乙烯(styrenyl)基等經芳基取代而成的烯基,但並不限定於該些。 In the present specification, the alkenyl group may be a straight chain or a branched chain, and is not particularly limited, and the carbon number may be 2 to 25. Specific examples thereof include an alkenyl group substituted with an aryl group such as a stylbenyl group or a styrenyl group, but are not limited thereto.

本說明書中,所述烷氧基可為直鏈或分支鏈,并無特別限定,碳數可為1~30。 In the present specification, the alkoxy group may be a straight chain or a branched chain, and is not particularly limited, and the carbon number may be from 1 to 30.

本說明書中,環烷基并無特別限定,碳數可為3~20,尤其可為環戊基、環己基。 In the present specification, the cycloalkyl group is not particularly limited, and the carbon number may be 3 to 20, and particularly may be a cyclopentyl group or a cyclohexyl group.

本說明書中,作為鹵素原子的例子,可列舉氟、氯、溴或碘。 In the present specification, examples of the halogen atom include fluorine, chlorine, bromine or iodine.

本說明書中,芳基可為單環式芳基或多環式芳基。 In the present specification, the aryl group may be a monocyclic aryl group or a polycyclic aryl group.

於所述芳基為單環式芳基的情況下,并無特別限定,碳數可為6~40。具體而言,作為單環式芳基,可列舉苯基、聯苯基或聯 三苯基等,但並不限定於此。 In the case where the aryl group is a monocyclic aryl group, it is not particularly limited, and the carbon number may be 6 to 40. Specifically, examples of the monocyclic aryl group include a phenyl group, a biphenyl group or a phenyl group. Triphenyl or the like, but is not limited thereto.

於所述芳基為多環式芳基的情況下,并無特別限定,碳數可為10~40。具體而言,作為多環式芳基,可列舉萘基、蒽基、菲基、芘基、苝基、基或茀基等,但並不限定於此。 In the case where the aryl group is a polycyclic aryl group, it is not particularly limited, and the carbon number may be 10 to 40. Specifically, examples of the polycyclic aryl group include a naphthyl group, an anthracenyl group, a phenanthryl group, an anthryl group, and a fluorenyl group. Base or thiol, etc., but is not limited thereto.

於所述茀基被取代的情況下,可成為等螺茀基,(9,9-二甲基茀基)及(9,9-二苯基茀基)等經取代而成的茀基。但是,並不限定於此。 In the case where the sulfhydryl group is substituted, it can become , Snail base, (9,9-dimethylindenyl) and A fluorenyl group substituted with (9,9-diphenylfluorenyl) or the like. However, it is not limited to this.

本說明書中,雜環基為含有N、O、P、S、Si及Se中的一個以上作為異種原子的雜環基,碳數並無特別限定。根據一實施態樣,所述雜環基的碳數為1~30。作為雜環基的例子,可列舉吡啶基、吡咯基、嘧啶基、噠嗪基、呋喃基、噻吩基、咪唑基、吡唑基、噁唑基、異噁唑基、噻唑基、異噻唑基、三唑基、噁二唑基、噻二唑基、二噻唑基、四唑基、吡喃基、噻喃基、吡嗪基、噁嗪基、噻嗪基、二噁烯基(dioxinyl)、三嗪基、四嗪基、喹啉基(quinolinyl)、異喹啉基、喹唑啉基、喹噁啉基、萘啶基、吖啶基、呫噸基、二氮雜萘基、三氮雜茚基、吲哚基、吲哚啉基、吲嗪基、酞嗪基、吡啶并嘧啶基、吡啶并吡嗪基、吡嗪并吡嗪基、苯并噻唑基、苯并噁唑基、苯并咪唑基、苯并噻吩基、苯并呋喃基、二苯并噻吩基、二苯并呋喃基、咔唑基、苯并咔唑基、二苯并咔唑基、吲哚并咔唑基、茚并咔唑基、啡嗪基、咪唑并吡啶基、 啡噁嗪基、啡啶基、啡啉(phenanthroline)基、啡噻嗪(phenothiazine)基、咪唑并啡啶基、苯并咪唑并喹唑啉基或者苯并咪唑并啡啶基等,但並非僅限定於該些。 In the present specification, the heterocyclic group is a heterocyclic group containing one or more of N, O, P, S, Si, and Se as a hetero atom, and the number of carbon atoms is not particularly limited. According to one embodiment, the heterocyclic group has a carbon number of from 1 to 30. Examples of the heterocyclic group include a pyridyl group, a pyrrolyl group, a pyrimidinyl group, a pyridazinyl group, a furyl group, a thienyl group, an imidazolyl group, a pyrazolyl group, an oxazolyl group, an isoxazolyl group, a thiazolyl group, and an isothiazolyl group. , triazolyl, oxadiazolyl, thiadiazolyl, dithiazolyl, tetrazolyl, pyranyl, thiopyranyl, pyrazinyl, oxazinyl, thiazinyl, dioxenyl , triazinyl, tetrazinyl, quinolinyl, isoquinolinyl, quinazolinyl, quinoxalinyl, naphthyridinyl, acridinyl, xanthene, diaza naphthyl, three Azaindolyl, fluorenyl, porphyrinyl, pyridazinyl, pyridazinyl, pyridopyrimidinyl, pyridopyrazinyl, pyrazinopyrazinyl, benzothiazolyl, benzoxazolyl Benzimidazolyl, benzothienyl, benzofuranyl, dibenzothiophenyl, dibenzofuranyl, oxazolyl, benzoxazolyl, dibenzoxazolyl, indolocarbazole Base, indolocarbazolyl, cyanoazinyl, imidazopyridyl, Phenoxyzinyl, phenanthryl, phenanthroline, phenothiazine, imidazolinyl, benzimidazoquinazolinyl or benzimidazolidinyl, but not Only limited to these.

本說明書的一實施態樣中,所述雜環基的形成環的元素的數量為3~60。另外於一實施態樣中,所述雜環基的形成環的元素的數量為3~40。進而於一實施態樣中,所述雜環基的形成環的元素的數量為3~20。 In an embodiment of the present specification, the number of the ring-forming elements of the heterocyclic group is from 3 to 60. In another embodiment, the number of ring-forming elements of the heterocyclic group is from 3 to 40. Further, in one embodiment, the number of ring-forming elements of the heterocyclic group is from 3 to 20.

本說明書中,所述雜芳基為含有O、N、S或P作為異種原子的芳香族的雜環基,並無特別限定,碳數可為1~30。作為雜環基的例子,可列舉噻吩基、呋喃基、吡咯基、咪唑基、噻唑基、噁唑基、噁二唑基、三唑基、吡啶基、聯吡啶基、三嗪基、吖啶基(acridyl)、噠嗪基、喹啉基、異喹啉基、吲哚基、咔唑基、苯并噁唑基、苯并咪唑基、苯并噻唑基、苯并咔唑基、苯并噻吩基、二苯并噻吩基、苯并呋喃基及二苯并呋喃基等,但並非僅限定於該些。本說明書中,雜芳基除了為芳香族以外,可應用關於所述雜環基的說明。 In the present specification, the heteroaryl group is an aromatic heterocyclic group containing O, N, S or P as a hetero atom, and is not particularly limited, and the carbon number may be from 1 to 30. Examples of the heterocyclic group include thienyl, furyl, pyrrolyl, imidazolyl, thiazolyl, oxazolyl, oxadiazolyl, triazolyl, pyridyl, bipyridyl, triazinyl, acridine. Acridyl, pyridazinyl, quinolyl, isoquinolinyl, fluorenyl, oxazolyl, benzoxazolyl, benzimidazolyl, benzothiazolyl, benzoxazolyl, benzo The thienyl group, the dibenzothiophenyl group, the benzofuranyl group, the dibenzofuranyl group and the like are not limited thereto. In the present specification, the description of the heterocyclic group may be applied to the heteroaryl group in addition to the aromatic group.

本說明書中,伸烷基是指於烷烴(alkane)中有兩個鍵結位置的基團。所述伸烷基可為直鏈、分支鏈或環鏈。伸烷基的碳數並無特別限定,可為2~25。 In the present specification, alkylene refers to a group having two bonding positions in an alkane. The alkylene group may be a straight chain, a branched chain or a cyclic chain. The carbon number of the alkylene group is not particularly limited and may be 2 to 25.

本說明書中,伸芳基(arylene)除了為二價基以外,可應用關於所述芳基的說明。 In the present specification, the description of the aryl group may be applied to the arylene in addition to the divalent group.

本說明書中,伸雜芳基除了為二價基以外,可應用關於 所述雜芳基的說明。 In the present specification, the heteroaryl group may be applied in addition to the divalent group. Description of the heteroaryl group.

本說明書中,鄰接的基團彼此鍵結而形成經取代或未經取代的環,是指形成經取代或未經取代的脂肪族烴環、經取代或未經取代的芳香族烴環、經取代或未經取代的脂肪族雜環、經取代或未經取代的芳香族雜環或者該些的縮合環。 In the present specification, the adjacent groups are bonded to each other to form a substituted or unsubstituted ring, which means that a substituted or unsubstituted aliphatic hydrocarbon ring, a substituted or unsubstituted aromatic hydrocarbon ring is formed, A substituted or unsubstituted aliphatic heterocyclic ring, a substituted or unsubstituted aromatic heterocyclic ring or a condensed ring thereof.

本說明書中,所謂脂肪族烴環,為並非芳香族的環,是指僅包含碳原子與氫原子的環。 In the present specification, the aliphatic hydrocarbon ring is a ring which is not aromatic and means a ring containing only a carbon atom and a hydrogen atom.

具體而言,作為脂肪族烴環的例子,可列舉環丙烷、環丁烷、環丁烯、環戊烷、環戊烯、環己烷、環己烯、1,4-環己二烯、環庚烷、環庚烯、環辛烷、環辛烯等,但並非僅限定於該些。 Specific examples of the aliphatic hydrocarbon ring include cyclopropane, cyclobutane, cyclobutene, cyclopentane, cyclopentene, cyclohexane, cyclohexene, and 1,4-cyclohexadiene. Cycloheptane, cycloheptene, cyclooctane, cyclooctene, etc., but not limited thereto.

本說明書中,所謂芳香族烴環,是指僅包含碳原子與氫原子的芳香族的環。本說明書中,作為芳香族烴環的具體例,可列舉苯、萘、蒽、菲、苝、螢蒽(fluoranthene)、聯伸三苯、萉、芘、稠四苯、、稠五苯、茀、茚、苊、苯并茀、螺茀等,但並非僅限定於該些。 In the present specification, the aromatic hydrocarbon ring means an aromatic ring containing only a carbon atom and a hydrogen atom. In the present specification, specific examples of the aromatic hydrocarbon ring include benzene, naphthalene, anthracene, phenanthrene, anthracene, fluoranthene, ternary triphenyl, anthracene, anthracene, and fused tetrathene. , pentacene, hydrazine, hydrazine, hydrazine, benzopyrene, snail, etc., but not limited to these.

本說明書中,所謂脂肪族雜環,是指含有雜原子中的一個以上的脂肪族環。具體而言,作為脂肪族雜環的例子,可列舉氧雜環丙烷(oxirane)、四氫呋喃、1,4-二噁烷(1,4-dioxane)、吡咯啶、啶啶、嗎啉(morpholine)、氧雜環庚烷(oxepan)、氮雜環辛烷(azocane)、硫雜環辛烷(thiocane)等,但並非僅限定於該些。 In the present specification, the aliphatic heterocyclic ring means one or more aliphatic rings containing a hetero atom. Specific examples of the aliphatic heterocyclic ring include oxirane, tetrahydrofuran, 1,4-dioxane, pyrrolidine, pyridine, and morpholine. And oxepan, azocane, thiocane, etc., but are not limited thereto.

本說明書中,所謂芳香族雜環,是指含有雜原子中的一 個以上的芳香族環。具體而言,作為芳香族雜環的例子,可列舉吡啶、吡咯、嘧啶、噠嗪、呋喃、噻吩、咪唑、吡唑、噁唑、異噁唑、噻唑、異噻唑、三唑、噁二唑、噻二唑、二噻唑、四唑、吡喃、噻喃、二嗪、噁嗪、噻嗪、戴奧辛(dioxin)、三嗪、四嗪、異喹啉、喹啉、氫醌(quinol)、喹唑啉、喹噁啉、萘啶、吖啶、啡啶、二氮雜萘、三氮雜茚、吲哚、吲嗪(indolizine)、苯并噻唑、苯并噁唑、苯并咪唑、苯并噻吩、苯并呋喃、二苯并噻吩、二苯并呋喃、咔唑、苯并咔唑、二苯并咔唑、啡嗪、咪唑并吡啶、啡噁嗪、吲哚并咔唑、茚并咔唑等,但並非僅限定於該些。 In the present specification, the term "aromatic heterocyclic ring" means one of the hetero atoms. More than one aromatic ring. Specific examples of the aromatic heterocyclic ring include pyridine, pyrrole, pyrimidine, pyridazine, furan, thiophene, imidazole, pyrazole, oxazole, isoxazole, thiazole, isothiazole, triazole, and oxadiazole. , thiadiazole, dithiazole, tetrazole, pyran, thiopyran, diazine, oxazine, thiazine, dioxin, triazine, tetrazine, isoquinoline, quinoline, quinol, Quinazoline, quinoxaline, naphthyridine, acridine, phenanthridine, diazepine, triazaindene, anthraquinone, indolizine, benzothiazole, benzoxazole, benzimidazole, benzene And thiophene, benzofuran, dibenzothiophene, dibenzofuran, oxazole, benzoxazole, dibenzoxazole, phenazine, imidazopyridine, phenoxazine, indolocarbazole, anthracene Carbazole, etc., but not limited to these.

本說明書中,所述脂肪族烴環、芳香族烴環、脂肪族雜環及芳香族雜環可為單環,亦可為多環。 In the present specification, the aliphatic hydrocarbon ring, the aromatic hydrocarbon ring, the aliphatic heterocyclic ring, and the aromatic heterocyclic ring may be a single ring or a polycyclic ring.

本說明書的一實施態樣中,LA及LB可彼此相同亦可不同,分別獨立地為直接鍵結或碳數1~10的伸烷基。 In one embodiment of the present specification, L A and L B may be the same or different from each other, and are each independently a direct bond or an alkylene group having a carbon number of 1 to 10.

一實施態樣中,LA及LB分別為伸丙基。 In one embodiment, L A and L B are respectively a propyl group.

本說明書的一實施態樣中,RA~RF可彼此相同亦可不同,分別獨立地選自由氫、重氫、鹵素原子、硝基、經取代或未經取代的碳數1~30的烷基、經取代或未經取代的碳數1~30的烷氧基、經取代或未經取代的碳數6~30的單環或多環的芳基、及經取代或未經取代的碳數1~30的單環或多環的雜芳基所組成的群組中。 In an embodiment of the present specification, R A to R F may be the same or different from each other, and are independently selected from hydrogen, heavy hydrogen, halogen atom, nitro group, substituted or unsubstituted carbon number 1 to 30. An alkyl group, a substituted or unsubstituted alkoxy group having 1 to 30 carbon atoms, a substituted or unsubstituted monocyclic or polycyclic aryl group having 6 to 30 carbon atoms, and a substituted or unsubstituted A group consisting of monocyclic or polycyclic heteroaryl groups having 1 to 30 carbon atoms.

一實施態樣中,RA~RF為氫。 In one embodiment, R A ~ R F are hydrogen.

根據本說明書的一實施態樣,R1~R6可彼此相同亦可不同, 分別獨立地選自由氫、重氫、經取代或未經取代的碳數1~6的直鏈或分支鏈的烷基、磺酸基、磺酸鹽基、-SO2NHR7基及-SO2NR8R9所組成的群組中。 According to an embodiment of the present specification, R 1 to R 6 may be the same or different from each other, and are independently selected from a hydrogen or a heavy hydrogen, a substituted or unsubstituted straight or branched chain having 1 to 6 carbon atoms. A group consisting of an alkyl group, a sulfonic acid group, a sulfonate group, a -SO 2 NHR 7 group, and -SO 2 NR 8 R 9 .

R7~R9可彼此相同亦可不同,分別獨立地為直鏈或分支鏈的碳數1~10的烷基。 R 7 to R 9 may be the same or different from each other, and each independently is a linear or branched alkyl group having 1 to 10 carbon atoms.

根據本說明書的一實施態樣,R1~R6可彼此相同亦可不同,分別獨立地選自由氫、重氫、經取代或未經取代的碳數1~6的直鏈或分支鏈的烷基及磺酸鹽基所組成的群組中。 According to an embodiment of the present specification, R 1 to R 6 may be the same or different from each other, and are independently selected from a hydrogen or a heavy hydrogen, a substituted or unsubstituted straight or branched chain having 1 to 6 carbon atoms. A group consisting of an alkyl group and a sulfonate group.

本說明書的一實施態樣中,X1~X5可彼此相同亦可不同,分別獨立地選自由氫、重氫、陰離子性基、羥基、經取代或未經取代的碳數1~30的烷基、經取代或未經取代的碳數6~30的單環或多環的芳基、及經取代或未經取代的碳數1~30的單環或多環的雜芳基所組成的群組中,所述X1~X5的至少一個為陰離子性基。 In an embodiment of the present specification, X 1 to X 5 may be the same or different from each other, and are independently selected from hydrogen, heavy hydrogen, an anionic group, a hydroxyl group, a substituted or unsubstituted carbon number of 1 to 30. An alkyl group, a substituted or unsubstituted monocyclic or polycyclic aryl group having 6 to 30 carbon atoms, and a substituted or unsubstituted monocyclic or polycyclic heteroaryl group having 1 to 30 carbon atoms; In the group, at least one of X 1 to X 5 is an anionic group.

本說明書的一實施態樣中,所述陰離子性基為選自由-OH、-SO3 -、-SO3H、-SO3 -Z+、-CO2H、-O2 -Z+、-CO2Ra、-SO3Rb及-SO3NRcRd所組成的群組中的至少一者,Z+表示N(Re)4 +、Na+或K+,Ra~Re分別獨立地為選自由經取代或未經取代的碳數1~30的直鏈或分支鏈的烷基、經取代或未經取代的碳數6~30的單環或多環的芳基、及經取代或未經取代的碳數1~30的單環或多環的雜芳基所組成的群組中的至少一者。 In an embodiment of the present specification, the anionic group is selected from the group consisting of -OH, -SO 3 - , -SO 3 H, -SO 3 - Z + , -CO 2 H, -O 2 - Z + , - At least one of the group consisting of CO 2 R a , -SO 3 R b and -SO 3 NR c R d , Z + represents N(R e ) 4 + , Na + or K + , R a ~R e is independently an alkyl group selected from a straight or branched chain having 1 to 30 carbon atoms which may be substituted or unsubstituted, a substituted or unsubstituted monocyclic or polycyclic aryl group having 6 to 30 carbon atoms. And at least one of the group consisting of a substituted or unsubstituted monocyclic or polycyclic heteroaryl group having 1 to 30 carbon atoms.

根據本說明書的另一實施態樣,所述陰離子性基可為-SO3 -或 -SO3 -Na+According to another embodiment of the present specification, the anionic group may be -SO 3 - or -SO 3 - Na + .

所述陰離子性基可以其自身具有陰離子,或者亦可與其他陽離子一併以錯合化合物的形態存在。因而,根據經取代的陰離子性基的個數,化學式1的化合物的分子的總電荷之和可改變。於本發明的化合物的一個胺基中具有陽離子,因此,分子的總電荷之和可具有從自經取代的陰離子性基的個數減去1所得的值的陰離子至0的值。 The anionic group may have an anion itself or may be present together with other cations in the form of a compound. Thus, the sum of the total charges of the molecules of the compound of Chemical Formula 1 can be changed depending on the number of substituted anionic groups. The compound of the present invention has a cation in one amine group, and therefore, the sum of the total charges of the molecules may have an anion to a value of 0 from the number obtained by subtracting 1 from the number of substituted anionic groups.

本說明書的一實施態樣中,R'、R"及R'''可彼此相同亦可不同,分別獨立地為碳數1~30的烷基。 In one embodiment of the present specification, R', R" and R"' may be the same or different from each other, and are each independently an alkyl group having 1 to 30 carbon atoms.

本說明書的一實施態樣中,L1可彼此相同亦可不同,分別獨立地為直接鍵結、-O-、-S-或碳數1~30的伸烷基。 In one embodiment of the present specification, L 1 may be the same or different from each other, and are independently a direct bond, -O-, -S- or an alkylene group having 1 to 30 carbon atoms.

一實施態樣中,L1為-O-。 In one embodiment, L 1 is -O-.

一實施態樣中,L1為亞甲基、伸乙基或伸丙基。 In one embodiment, L 1 is methylene, ethyl or propyl.

本說明書的一實施態樣中,R1為氫、重氫、-OH、環氧基、-SH、碳數1~30的經取代或未經取代的烷基、碳數6~30的芳基或者碳數1~30的雜環基。 In one embodiment of the present specification, R 1 is hydrogen, hydrogen, -OH, epoxy, -SH, substituted or unsubstituted alkyl having 1 to 30 carbon atoms, and aromatic having 6 to 30 carbon atoms. A heterocyclic group having 1 to 30 carbon atoms.

一實施態樣中,R7為-SH。 In one embodiment, R 7 is -SH.

一實施態樣中,R7為環氧基。 In one embodiment, R 7 is an epoxy group.

一實施態樣中,R7為苯基。 In one embodiment, R 7 is phenyl.

本說明書的一實施態樣中,所述R可由下述化學式2-a~化學式2-e的任一者表示。 In an embodiment of the present specification, the R may be represented by any one of the following Chemical Formulas 2-a to 2-e.

[化學式2-a] [Chemical Formula 2-a]

一實施態樣中,所述R可由所述化學式2-b及化學式2-c的任一者表示。 In one embodiment, the R may be represented by any one of the chemical formula 2-b and the chemical formula 2-c.

本說明書的一實施態樣中,由所述化學式2表示的化合物可 為荒川化學工業股份有限公司的SQ506。 In an embodiment of the present specification, the compound represented by the chemical formula 2 may be SQ506 for Arakawa Chemical Industry Co., Ltd.

本說明書的一實施態樣中,由所述化學式2表示的化合物可為信越化學工業股份有限公司的KBM-503。 In one embodiment of the present specification, the compound represented by the chemical formula 2 may be KBM-503 of Shin-Etsu Chemical Co., Ltd.

本說明書的一實施態樣中,所述光敏樹脂組成物可更包含黏合劑樹脂、多官能性單體、光起始劑及溶媒。 In an embodiment of the present specification, the photosensitive resin composition may further comprise a binder resin, a polyfunctional monomer, a photoinitiator, and a solvent.

所述黏合劑樹脂若為可顯示出由樹脂組成物所製造的膜的強度、顯影性等物性者,則並無特別限定。 The binder resin is not particularly limited as long as it exhibits physical properties such as strength and developability of the film produced from the resin composition.

作為所述黏合劑樹脂,能夠使用賦予機械強度的多官能性單體與賦予鹼溶解性的單體的共聚樹脂,亦可更包含本技術領域中通常所使用的黏合劑。 As the binder resin, a copolymer resin which imparts mechanical strength to a polyfunctional monomer and a monomer which imparts alkali solubility can be used, and a binder which is generally used in the art can be further included.

一實施態樣中,作為所述黏合劑樹脂,可列舉丙烯酸系黏合劑樹脂。 In one embodiment, an acrylic binder resin is exemplified as the binder resin.

作為賦予所述膜的機械強度的多官能性單體,可列舉選自包含不飽和羧酸酯類、芳香族乙烯基類、不飽和醚類、不飽和醯亞胺類及酸酐的群組中的任一者以上。 The polyfunctional monomer which imparts mechanical strength to the film may be selected from the group consisting of unsaturated carboxylic acid esters, aromatic vinyls, unsaturated ethers, unsaturated quinones, and acid anhydrides. Any one of them.

作為所述不飽和羧酸酯類的具體例,選自由(甲基)丙烯酸苄酯、(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸丁酯、(甲基)丙烯酸二甲基胺基乙酯、(甲基)丙烯酸異丁酯、(甲基)丙烯酸第三丁酯、(甲基)丙烯酸環己酯、(甲基)丙烯酸異冰片酯、(甲基)丙烯酸乙基己酯、(甲基)丙烯酸2-苯氧基乙酯、(甲基)丙烯酸四氫糠酯、(甲基)丙烯酸羥基乙酯、(甲基)丙烯酸2-羥基丙酯、(甲基)丙烯酸2-羥基-3-氯丙酯、(甲基)丙烯酸4-羥基丁酯、(甲基)丙烯酸醯 基辛基氧基-2-羥基丙酯、丙三醇(甲基)丙烯酸酯、(甲基)丙烯酸2-甲氧基乙酯、(甲基)丙烯酸3-甲氧基丁酯、乙氧基二乙二醇(甲基)丙烯酸酯、甲氧基三乙二醇(甲基)丙烯酸酯、甲氧基三丙二醇(甲基)丙烯酸酯、聚(乙二醇)甲醚(甲基)丙烯酸酯、苯氧基二乙二醇(甲基)丙烯酸酯、對壬基苯氧基聚乙二醇(甲基)丙烯酸酯、對壬基苯氧基聚丙二醇(甲基)丙烯酸酯、(甲基)丙烯酸縮水甘油酯、(甲基)丙烯酸四氟丙酯、(甲基)丙烯酸1,1,1,3,3,3-六氟異丙酯、(甲基)丙烯酸八氟戊酯、(甲基)丙烯酸十七氟癸酯、(甲基)丙烯酸三溴苯酯、α-羥基甲基丙烯酸甲酯、α-羥基甲基丙烯酸乙酯、α-羥基甲基丙烯酸丙酯及α-羥基甲基丙烯酸丁酯所組成的群組中,但並非僅限定於該些。 Specific examples of the unsaturated carboxylic acid esters are selected from the group consisting of benzyl (meth) acrylate, methyl (meth) acrylate, ethyl (meth) acrylate, butyl (meth) acrylate, (methyl) ) dimethylaminoethyl acrylate, isobutyl (meth)acrylate, tert-butyl (meth)acrylate, cyclohexyl (meth)acrylate, isobornyl (meth)acrylate, (methyl) Ethylhexyl acrylate, 2-phenoxyethyl (meth)acrylate, tetrahydrofurfuryl (meth)acrylate, hydroxyethyl (meth)acrylate, 2-hydroxypropyl (meth)acrylate, 2-hydroxy-3-chloropropyl (meth)acrylate, 4-hydroxybutyl (meth)acrylate, bismuth (meth)acrylate Benzyloxy-2-hydroxypropyl ester, glycerol (meth) acrylate, 2-methoxyethyl (meth) acrylate, 3-methoxybutyl (meth) acrylate, ethoxy Diethylene glycol (meth) acrylate, methoxy triethylene glycol (meth) acrylate, methoxy tripropylene glycol (meth) acrylate, poly (ethylene glycol) methyl ether (methyl) Acrylate, phenoxy diethylene glycol (meth) acrylate, p-nonyl phenoxy polyethylene glycol (meth) acrylate, p-nonyl phenoxy polypropylene glycol (meth) acrylate, Glycidyl methacrylate, tetrafluoropropyl (meth) acrylate, 1,1,1,3,3,3-hexafluoroisopropyl (meth) acrylate, octafluoropentyl (meth) acrylate , heptafluorodecyl (meth)acrylate, tribromophenyl (meth)acrylate, α-hydroxymethyl methacrylate, α-hydroxyethyl methacrylate, α-hydroxypropyl methacrylate and α The group consisting of -hydroxybutyl methacrylate is, but not limited to, only those.

作為所述芳香族乙烯基類的單體的具體例,選自由苯乙烯、α-甲基苯乙烯、(鄰、間、對)-乙烯基甲苯、(鄰、間、對)-甲氧基苯乙烯及(鄰、間、對)-氯苯乙烯所組成的群組中,但並非僅限定於該些。 Specific examples of the aromatic vinyl-based monomer are selected from the group consisting of styrene, α-methylstyrene, (o-, m-, p-)-vinyltoluene, (o-, m-, p-)-methoxy The group consisting of styrene and (o-, m-, p-)-chlorostyrene is, but not limited to, only those.

作為所述不飽和醚類的具體例,選自由乙烯基甲醚、乙烯基乙醚及烯丙基縮水甘油醚所組成的群組中,但並非僅限定於該些。 Specific examples of the unsaturated ethers are selected from the group consisting of vinyl methyl ether, vinyl ethyl ether, and allyl glycidyl ether, but are not limited thereto.

作為所述不飽和醯亞胺類的具體例,選自由N-苯基馬來醯亞胺、N-(4-氯苯基)馬來醯亞胺、N-(4-羥基苯基)馬來醯亞胺及N-環己基馬來醯亞胺所組成的群組中,但並非僅限定於該些。 Specific examples of the unsaturated quinone imine are selected from the group consisting of N-phenylmaleimide, N-(4-chlorophenyl)maleimide, and N-(4-hydroxyphenyl) horse. The group consisting of quinone imine and N-cyclohexylmaleimide is not limited to these.

作為所述酸酐,可列舉馬來酸酐、甲基馬來酸酐、四氫鄰苯二甲酸酐等,但並非僅限定於該些。 Examples of the acid anhydride include maleic anhydride, methyl maleic anhydride, and tetrahydrophthalic anhydride, but are not limited thereto.

作為所述賦予鹼溶解性的單體,若為包含酸基者,則並無特別限定,例如較佳為使用選自由(甲基)丙烯酸、巴豆酸、衣康酸、馬來酸、富馬酸、馬來酸單甲酯、5-降冰片烯-2-羧酸、鄰苯二甲酸單-2-((甲基)丙烯醯氧基)乙酯、琥珀酸單-2-((甲基)丙烯醯氧基)乙酯、ω-羧基聚己內酯單(甲基)丙烯酸酯所組成的群組中的一種以上,但並非僅限定於該些。 The monomer which imparts alkali solubility is not particularly limited as long as it contains an acid group. For example, it is preferably selected from (meth)acrylic acid, crotonic acid, itaconic acid, maleic acid, and fumar. Acid, monomethyl maleate, 5-norbornene-2-carboxylic acid, mono-2-((meth)acryloxy)ethyl phthalate, mono-2-(succinic acid) One or more of the group consisting of acryloyloxy)ethyl ester and ω-carboxypolycaprolactone mono(meth)acrylate, but not limited thereto.

根據本說明書的一實施態樣,所述黏合劑樹脂的酸值為50KOH mg/g~130KOH mg/g,重量平均分子量為1,000~50,000。 According to an embodiment of the present specification, the binder resin has an acid value of 50 KOH mg/g to 130 KOH mg/g and a weight average molecular weight of 1,000 to 50,000.

所述多官能性單體為擔負藉由光而形成光阻劑圖像的作用的單體,具體而言,可為選自由丙二醇甲基丙烯酸酯、二季戊四醇六丙烯酸酯、二季戊四醇丙烯酸酯、新戊二醇二丙烯酸酯、6-己二醇二丙烯酸酯、1,6-己二醇丙烯酸酯四乙二醇甲基丙烯酸酯、雙苯氧基乙醇二丙烯酸酯、三羥基乙基異氰脲酸酯三甲基丙烯酸酯、三甲基丙烷三甲基丙烯酸酯、二苯基季戊四醇六丙烯酸酯、季戊四醇三甲基丙烯酸酯、季戊四醇四甲基丙烯酸酯及二季戊四醇六甲基丙烯酸酯所組成的群組中的一種或兩種以上的混合物。 The polyfunctional monomer is a monomer that functions to form a photoresist image by light, and specifically may be selected from the group consisting of propylene glycol methacrylate, dipentaerythritol hexaacrylate, and dipentaerythritol acrylate. Neopentyl glycol diacrylate, 6-hexanediol diacrylate, 1,6-hexanediol acrylate tetraethylene glycol methacrylate, bisphenoxyethanol diacrylate, trihydroxyethyl isocyanide Urea trimethacrylate, trimethylpropane trimethacrylate, diphenyl pentaerythritol hexaacrylate, pentaerythritol trimethacrylate, pentaerythritol tetramethacrylate and dipentaerythritol hexamethacrylate One or a mixture of two or more of the groups.

所述光起始劑若為藉由光而使自由基產生來催化交聯的起始劑,則並無特別限定,例如可為選自由苯乙酮系化合物、聯咪唑系化合物、三嗪系化合物及肟系化合物所組成的群組中的一種以上。 The photoinitiator is not particularly limited as long as it is a starter which catalyzes crosslinking by light generation, and may be, for example, selected from the group consisting of an acetophenone-based compound, a biimidazole-based compound, and a triazine-based compound. One or more of the group consisting of a compound and a lanthanide compound.

作為所述苯乙酮系化合物,可列舉2-羥基-2-甲基-1-苯 基丙烷-1-酮、1-(4-異丙基苯基)-2-羥基-2-甲基丙烷-1-酮、4-(2-羥基乙氧基)-苯基-(2-羥基-2-丙基)酮、1-羥基環己基苯基酮、安息香甲醚、安息香乙醚、安息香異丁醚、安息香丁醚、2,2-二甲氧基-2-苯基苯乙酮、2-甲基-(4-甲硫基)苯基-2-嗎啉基-1-丙烷-1-酮、2-苄基-2-二甲基胺基-1-(4-嗎啉基苯基)-丁烷-1-酮、2-(4-溴)-苄基-2-二甲基胺基-1-(4-嗎啉基苯基)-丁烷-1-酮或2-甲基-1-[4-(甲硫基)苯基]-2-嗎啉基丙烷-1-酮等,但並不限定於此。 Examples of the acetophenone-based compound include 2-hydroxy-2-methyl-1-benzene. Propane-1-one, 1-(4-isopropylphenyl)-2-hydroxy-2-methylpropan-1-one, 4-(2-hydroxyethoxy)-phenyl-(2- Hydroxy-2-propyl)one, 1-hydroxycyclohexyl phenyl ketone, benzoin methyl ether, benzoin ethyl ether, benzoin isobutyl ether, benzoin butyl ether, 2,2-dimethoxy-2-phenylacetophenone , 2-methyl-(4-methylthio)phenyl-2-morpholinyl-1-propan-1-one, 2-benzyl-2-dimethylamino-1-(4-morpholine Phenyl)butane-1-one, 2-(4-bromo)-benzyl-2-dimethylamino-1-(4-morpholinylphenyl)-butan-1-one or 2-methyl-1-[4-(methylthio)phenyl]-2-morpholinylpropan-1-one or the like, but is not limited thereto.

作為所述聯咪唑系化合物,可列舉2,2-雙(2-氯苯基)-4,4',5,5'-四苯基聯咪唑、2,2'-雙(鄰氯苯基)-4,4',5,5'-四(3,4,5-三甲氧基苯基)-1,2'-聯咪唑、2,2'-雙(2,3-二氯苯基)-4,4',5,5'-四苯基聯咪唑、2,2'-雙(鄰氯苯基)-4,4,5,5'-四苯基-1,2'-聯咪唑等,但並不限定於此。 Examples of the biimidazole-based compound include 2,2-bis(2-chlorophenyl)-4,4',5,5'-tetraphenylbiimidazole, and 2,2'-bis(o-chlorophenyl). -4,4',5,5'-tetrakis(3,4,5-trimethoxyphenyl)-1,2'-biimidazole, 2,2'-bis(2,3-dichlorophenyl) -4,4',5,5'-tetraphenylbiimidazole, 2,2'-bis(o-chlorophenyl)-4,4,5,5'-tetraphenyl-1,2'-linked Imidazole or the like, but is not limited thereto.

作為所述三嗪系化合物,可列舉3-{4-[2,4-雙(三氯甲基)-均三嗪-6-基]苯硫基}丙酸、3-{4-[2,4-雙(三氯甲基)-均三嗪-6-基]苯硫基}丙酸1,1,1,3,3,3-六氟異丙酯、2-{4-[2,4-雙(三氯甲基)-均三嗪-6-基]苯硫基}乙酸乙酯、2-{4-[2,4-雙(三氯甲基)-均三嗪-6-基]苯硫基}乙酸2-環氧基乙酯、2-{4-[2,4-雙(三氯甲基)-均三嗪-6-基]苯硫基}乙酸環己酯、2-{4-[2,4-雙(三氯甲基)-均三嗪-6-基]苯硫基}乙酸苄酯、3-{氯-4-[2,4-雙(三氯甲基)-均三嗪-6-基]苯硫基}丙酸、3-{4-[2,4-雙(三氯甲基)-均三嗪-6-基]苯硫基}丙醯胺、2,4-雙(三氯甲基)-6-對甲氧基苯乙烯基-均三嗪、2,4-雙(三氯甲基)-6-(1-對二甲基胺基苯基)-1,3-丁二烯基-均三嗪、2-三氯甲基-4-胺基-6-對甲 氧基苯乙烯基-均三嗪等,但並不限定於此。 Examples of the triazine-based compound include 3-{4-[2,4-bis(trichloromethyl)-s-triazin-6-yl]phenylthio}propionic acid, 3-{4-[2 , 4-bis(trichloromethyl)-s-triazin-6-yl]phenylthio}propionic acid 1,1,1,3,3,3-hexafluoroisopropyl, 2-{4-[2 , 4-bis(trichloromethyl)-s-triazin-6-yl]phenylthio}ethyl acetate, 2-{4-[2,4-bis(trichloromethyl)-s-triazine-6 -yl]phenylthio}acetic acid 2-epoxyethyl ester, 2-{4-[2,4-bis(trichloromethyl)-s-triazin-6-yl]phenylthio}acetic acid cyclohexyl ester , 2-{4-[2,4-bis(trichloromethyl)-s-triazin-6-yl]phenylthio}benzyl acetate, 3-{chloro-4-[2,4-bis(III Chloromethyl)-s-triazin-6-yl]phenylthio}propionic acid, 3-{4-[2,4-bis(trichloromethyl)-s-triazin-6-yl]phenylthio} Propylamine, 2,4-bis(trichloromethyl)-6-p-methoxystyryl-s-triazine, 2,4-bis(trichloromethyl)-6-(1-p-dimethyl Aminophenyl)-1,3-butadienyl-s-triazine, 2-trichloromethyl-4-amino-6-pair The oxystyryl-s-triazine or the like is not limited thereto.

作為所述肟系化合物,可列舉1,2-辛二酮-1-(4-苯硫基)苯基-2-(鄰苯甲醯基肟)(汽巴-嘉基(Ciba-Geigy)公司製造,CGI124)、乙酮-1-(9-乙基)-6-(2-甲基苯甲醯基-3-基)-1-(O-乙醯基肟)(CGI242)、N-1919(艾迪科(Adeka)公司製造)等,但並不限定於此。 As the lanthanoid compound, 1,2-octanedione-1-(4-phenylthio)phenyl-2-(o-benzoyl fluorenyl) (Ciba-Geigy) can be cited. Manufactured by the company, CGI124), Ethyl Ketone-1-(9-Ethyl)-6-(2-methylbenzhydryl-3-yl)-1-(O-ethylindenyl) (CGI242), N -1919 (made by Adeka Co., Ltd.), etc., but is not limited thereto.

作為所述溶媒,可列舉選自由丙酮、甲基乙基酮、甲基異丁基酮、甲基溶纖劑、乙基溶纖劑、四氫呋喃、1,4-二噁烷、乙二醇二甲醚、乙二醇二乙醚、丙二醇二甲醚、丙二醇二乙醚、二乙二醇二甲醚、二乙二醇二乙醚、二乙二醇甲基乙醚、氯仿、二氯甲烷、1,2-二氯乙烷、1,1,1-三氯乙烷、1,1,2-三氯乙烷、1,1,2-三氯乙烯、己烷、庚烷、辛烷、環己烷、苯、甲苯、二甲苯、甲醇、乙醇、異丙醇、丙醇、丁醇、第三丁醇、2-乙氧基丙醇、2-甲氧基丙醇、3-甲氧基丁醇、環己酮、環戊酮、丙二醇甲醚乙酸酯、丙二醇乙醚乙酸酯、3-甲氧基丁基乙酸酯、3-乙氧基丙酸乙酯、乙基溶纖劑乙酸酯、甲基溶纖劑乙酸酯、乙酸丁酯、丙二醇單甲醚及二丙二醇單甲醚所組成的群組中的一種以上,但並非僅限定於該些。 The solvent may be selected from the group consisting of acetone, methyl ethyl ketone, methyl isobutyl ketone, methyl cellosolve, ethyl cellosolve, tetrahydrofuran, 1,4-dioxane, and ethylene glycol. Methyl ether, ethylene glycol diethyl ether, propylene glycol dimethyl ether, propylene glycol diethyl ether, diethylene glycol dimethyl ether, diethylene glycol diethyl ether, diethylene glycol methyl ether, chloroform, dichloromethane, 1, 2 -Dichloroethane, 1,1,1-trichloroethane, 1,1,2-trichloroethane, 1,1,2-trichloroethylene, hexane, heptane, octane, cyclohexane , benzene, toluene, xylene, methanol, ethanol, isopropanol, propanol, butanol, tert-butanol, 2-ethoxypropanol, 2-methoxypropanol, 3-methoxybutanol , cyclohexanone, cyclopentanone, propylene glycol methyl ether acetate, propylene glycol diethyl ether acetate, 3-methoxybutyl acetate, ethyl 3-ethoxypropionate, ethyl cellosolve acetate One or more of the group consisting of ester, methyl cellosolve acetate, butyl acetate, propylene glycol monomethyl ether, and dipropylene glycol monomethyl ether, but is not limited thereto.

本說明書的一實施態樣中,以所述光敏樹脂組成物中的固體成分的總重量為基準,由所述化學式1表示的化合物的含量為0.1重量份~50重量份,由所述化學式2表示的化合物的含量為0.01重量份~10重量 份,所述黏合劑樹脂的含量為1重量份~60重量份,所述光起始劑的含量為0.1重量份~20重量份,所述多官能性單體的含量為0.1重量份~50重量份。 In one embodiment of the present specification, the content of the compound represented by the chemical formula 1 is from 0.1 part by weight to 50 parts by weight based on the total weight of the solid content in the photosensitive resin composition, from the chemical formula 2 The content of the compound represented is 0.01 parts by weight to 10 parts by weight. The content of the binder resin is from 1 part by weight to 60 parts by weight, the content of the photoinitiator is from 0.1 part by weight to 20 parts by weight, and the content of the polyfunctional monomer is from 0.1 part by weight to 50 parts by weight. Parts by weight.

所謂所述固體成分的總重量,是指自樹脂組成物中去除溶媒後的成分的總重量之和。固體成分及各成分的以固體成分為基準的重量份的基準可藉由液相層析法或氣相層析法等本領域中所使用的通常的分析手段進行測定。 The total weight of the solid component refers to the sum of the total weights of the components after the solvent is removed from the resin composition. The basis of the solid content and the weight fraction based on the solid content of each component can be measured by a usual analytical means used in the art such as liquid chromatography or gas chromatography.

本說明書的一實施態樣中,所述光敏樹脂組成物可更包含染料及顏料的至少一者。 In an embodiment of the present specification, the photosensitive resin composition may further comprise at least one of a dye and a pigment.

染料與顏料均為擔負吸收所需範圍的波長而呈現出顏色的作用者,根據對溶媒的溶解度可區分為染料與顏料。染料是指對溶媒的溶解度大而容易溶解者,顏料是指溶解度相對低而難以溶解者。 Dyes and pigments are both responsible for the wavelength of the desired range of absorption, and can be distinguished as dyes and pigments depending on the solubility of the solvent. The dye means that the solubility in the solvent is large and it is easy to dissolve, and the pigment means that the solubility is relatively low and it is difficult to dissolve.

另外,所述染料可為選自包含蒽醌系染料、四氮雜卟啉系染料及三芳基甲烷系染料的群組中的至少一者。 Further, the dye may be at least one selected from the group consisting of an anthraquinone dye, a tetraazaporphyrin dye, and a triarylmethane dye.

另外,所述蒽醌系染料可由下述化學式3表示。 Further, the lanthanide dye can be represented by the following Chemical Formula 3.

所述化學式3中,R11及R12分別獨立地為選自由胺基、烷基胺基、二烷基胺基、苯基胺基及二苯基胺基所組成的群組中的至少一者。 In the chemical formula 3, R 11 and R 12 are each independently at least one selected from the group consisting of an amine group, an alkylamino group, a dialkylamino group, a phenylamino group, and a diphenylamino group. By.

另外,根據本說明書的一實施態樣,所述蒽醌系染料可為選自下述化合物中的任一者。 Further, according to an embodiment of the present specification, the anthraquinone dye may be any one selected from the group consisting of the following compounds.

另外,根據本說明書的一實施態樣,所述四氮雜卟啉系 染料可選自下述化合物。 In addition, according to an embodiment of the present specification, the tetraazaporphyrin system The dye may be selected from the following compounds.

另外,根據本說明書的一實施態樣,所述三芳基甲烷系染料可為選自下述化合物中的任一者。 Further, according to an embodiment of the present specification, the triarylmethane dye may be any one selected from the group consisting of the following compounds.

另外,本說明書的一實施態樣中,所述顏料為藍色顏料。 Further, in an embodiment of the present specification, the pigment is a blue pigment.

所述藍色顏料作為藍色有機顏料,例如可包含C.I.顏料藍15、C.I.顏料藍15:3、C.I.顏料藍15:4、C.I.顏料藍15:6、C.I.顏料藍60等。 The blue pigment may be, for example, a C.I. Pigment Blue 15, C.I. Pigment Blue 15:3, C.I. Pigment Blue 15:4, C.I. Pigment Blue 15:6, C.I. Pigment Blue 60, or the like.

一實施態樣中,所述顏料可包含銅酞青系顏料。 In one embodiment, the pigment may comprise a copper indigo pigment.

另外,所述藍色染料作為藍色染料,例如可包含甲基系染料、蒽醌系染料、偶氮系染料、三芳基甲烷系染料、酞青系染料等。 Further, the blue dye may contain, for example, a methyl dye, an anthraquinone dye, an azo dye, a triarylmethane dye, an indigo dye, or the like as the blue dye.

另外,所述藍色顏料作為藍色色澱顏料,例如可包含藉由色澱化劑來使如所述般的藍色顏料色澱化而成者等。作為色澱化劑,並無特別限定,例如可使用磷鎢酸、磷鉬酸、磷鎢鉬酸、單寧酸、月桂酸、3,4,5-三羥基苯甲酸、鐵氰化物、亞鐵氰化物等。 Further, the blue pigment may be, for example, a blue lake pigment, which may be obtained by lake-forming a blue pigment as described above by a lake forming agent. The coloring agent is not particularly limited, and for example, phosphotungstic acid, phosphomolybdic acid, phosphotungstic acid, tannic acid, lauric acid, 3,4,5-trihydroxybenzoic acid, ferricyanide, or sub- Ferric cyanide and the like.

作為具體的藍色色澱顏料的例子,可列舉:C.I.顏料藍1、C.I.顏料藍1:2、C.I.顏料藍2、C.I.顏料藍3、C.I.顏料藍8、C.I.顏料藍9、C.I.顏料藍10、C.I.顏料藍12、C.I.顏料藍14、C.I.顏料藍17:1、C.I.顏料藍18、C.I.顏料藍19、C.I.顏料藍24、C.I.顏料藍 24:1、C.I.顏料藍53、C.I.顏料藍56、C.I.顏料藍56:1、C.I.顏料藍61、C.I.顏料藍61:1、C.I.顏料藍62、C.I.顏料藍63、C.I.顏料藍78等。 As examples of specific blue lake pigments, CI Pigment Blue 1, CI Pigment Blue 1: 2, CI Pigment Blue 2, CI Pigment Blue 3, CI Pigment Blue 8, CI Pigment Blue 9, CI Pigment Blue 10, CI Pigment Blue 12, CI Pigment Blue 14, CI Pigment Blue 17:1, CI Pigment Blue 18, CI Pigment Blue 19, CI Pigment Blue 24, CI Pigment Blue 24:1, C.I. Pigment Blue 53, C.I. Pigment Blue 56, C.I. Pigment Blue 56:1, C.I. Pigment Blue 61, C.I. Pigment Blue 61:1, C.I. Pigment Blue 62, C.I. Pigment Blue 63, C.I. Pigment Blue 78 and the like.

本說明書的一實施態樣中,所述光敏樹脂組成物更包含分散劑,所述分散劑可包含含有由下述化學式11表示的重複單元或由下述化學式12表示的重複單元的聚合體。 In one embodiment of the present specification, the photosensitive resin composition further contains a dispersing agent, and the dispersing agent may include a polymer containing a repeating unit represented by the following Chemical Formula 11 or a repeating unit represented by the following Chemical Formula 12.

化學式11及化學式12中,R301及R401可彼此相同亦可不同,分別獨立地為氫或碳數1~10的烷基,R302、R303、R402及R403可彼此相同亦可不同,可分別獨立地 為氫、碳數1~30的烷基、碳數6~30的芳基或碳數1~30的雜芳基,或者R302與R303或者R402與R403彼此鍵結而形成經取代或未經取代的環,Ar3及Ar4可彼此相同亦可不同,分別獨立地為直接鍵結、碳數1~10的伸烷基、由-[CH(R311)-CH(R312)-O]x-CH(R313)-CH(R314)-或-[(CH2)y1-O]z-(CH2)y2-表示的二價連結基,R311~R314可彼此相同亦可不同,分別獨立地為氫或碳數1~10的烷基,x為1~18的整數,於x為2以上的情況下,括號內的結構可彼此相同亦可不同,y1及y2可彼此相同亦可不同,分別獨立地為1~5的整數,z為1~18的整數,於z為2以上的情況下,括號內的結構可彼此相同亦可不同,Q為選自由直接鍵結、碳數1~10的伸烷基、碳數6~30的伸芳基、-CONH-、-COO-及碳數1~10的醚基所組成的群組中的任一個或兩個以上連結而成的連結基。 In Chemical Formula 11 and Chemical Formula 12, R 301 and R 401 may be the same or different, and each independently is hydrogen or an alkyl group having 1 to 10 carbon atoms, and R 302 , R 303 , R 402 and R 403 may be the same as each other. Differently, they may independently be hydrogen, an alkyl group having 1 to 30 carbon atoms, an aryl group having 6 to 30 carbon atoms or a heteroaryl group having 1 to 30 carbon atoms, or R 302 and R 303 or R 402 and R 403 may be mutually Bonding to form a substituted or unsubstituted ring, Ar 3 and Ar 4 may be the same or different, each independently being a direct bond, an alkyl group having a carbon number of 1 to 10, and consisting of -[CH(R 311) )-CH(R 312 )-O] x -CH(R 313 )-CH(R 314 )- or -[(CH 2 ) y1 -O] z -(CH 2 ) y2 - represents a divalent linking group, R 311 to R 314 may be the same or different from each other, and each independently is hydrogen or an alkyl group having 1 to 10 carbon atoms, and x is an integer of 1 to 18. In the case where x is 2 or more, the structures in parentheses may be mutually The same or different, y1 and y2 may be the same or different from each other, and are independently an integer of 1 to 5, and z is an integer of 1 to 18. In the case where z is 2 or more, the structures in the parentheses may be identical to each other. Differently, Q is selected from a direct bond, an alkyl group having a carbon number of 1 to 10, and a carbon number of 6 to 30. A linking group in which one or more of the group consisting of an aryl group, -CONH-, -COO-, and an ether group having 1 to 10 carbon atoms are bonded.

一實施態樣中,以所述樹脂組成物中的固體成分的總重量為基準,可以0.5重量份~50重量份而含有所述分散劑。 In one embodiment, the dispersing agent may be contained in an amount of 0.5 part by weight to 50 parts by weight based on the total mass of the solid component in the resin composition.

根據本說明書的一實施態樣,所述樹脂組成物可更包含抗氧化劑。 According to an embodiment of the present specification, the resin composition may further comprise an antioxidant.

根據本說明書的一實施態樣,以所述樹脂組成物中的固體成 分的總重量為基準,所述抗氧化劑的含量為0.1重量份~20重量份。 According to an embodiment of the present specification, the solid in the resin composition is The antioxidant is contained in an amount of from 0.1 part by weight to 20 parts by weight based on the total weight of the part.

根據本說明書的一實施態樣,所述樹脂組成物更包含選自由光交聯增感劑、硬化促進劑、密著促進劑、界面活性劑、熱聚合防止劑、紫外線吸收劑、分散劑及調平劑所組成的群組中的一種或兩種以上的添加劑。 According to an embodiment of the present specification, the resin composition further comprises a photo-crosslinking sensitizer, a hardening accelerator, a adhesion promoter, a surfactant, a thermal polymerization inhibitor, a UV absorber, a dispersant, and One or more additives in the group consisting of leveling agents.

根據本說明書的一實施態樣,以所述樹脂組成物中的固體成分的總重量為基準,所述添加劑的含量為0.1重量份~20重量份。 According to an embodiment of the present specification, the additive is contained in an amount of from 0.1 part by weight to 20 parts by weight based on the total mass of the solid component in the resin composition.

作為所述光交聯增感劑,可使用選自由以下化合物所組成的群組中的一種以上:二苯甲酮、4,4-雙(二甲基胺基)二苯甲酮、4,4-雙(二乙基胺基)二苯甲酮、2,4,6-三甲基胺基二苯甲酮、鄰苯甲醯基苯甲酸甲酯、3,3-二甲基-4-甲氧基二苯甲酮、3,3,4,4-四(第三丁基過氧化羰基)二苯甲酮等二苯甲酮系化合物;9-茀酮、2-氯-9-茀酮、2-甲基-9-茀酮等茀酮系化合物;硫雜蒽酮、2,4-二乙基硫雜蒽酮、2-氯硫雜蒽酮、1-氯-4-丙基氧基硫雜蒽酮、異丙基硫雜蒽酮、二異丙基硫雜蒽酮等硫雜蒽酮系化合物;氧雜蒽酮、2-甲基氧雜蒽酮等氧雜蒽酮系化合物;蒽醌、2-甲基蒽醌、2-乙基蒽醌、第三丁基蒽醌、2,6-二氯-9,10-蒽醌等蒽醌系化合物;9-苯基吖啶、1,7-雙(9-吖啶基)庚烷、1,5-雙(9-吖啶基戊烷)、1,3-雙(9-吖啶基)丙烷等吖啶系化合物;苄基、1,7,7-三甲基-雙環[2,2,1]庚烷-2,3-二酮、9,10-菲醌等二羰基化合物;2,4,6-三甲基苯甲醯基二苯基氧化膦、雙(2,6-二甲氧基苯甲醯基)-2,4,4-三甲基戊基氧化膦等氧化 膦系化合物;4-(二甲基胺基)苯甲酸甲酯、4-(二甲基胺基)苯甲酸乙酯、2-正丁氧基乙基-4-(二甲基胺基)苯甲酸酯等苯甲酸酯系化合物;2,5-雙(4-二乙基胺基亞苄基)環戊酮、2,6-雙(4-二乙基胺基亞苄基)環己酮、2,6-雙(4-二乙基胺基亞苄基)-4-甲基-環戊酮等胺基增效劑;3,3-羰基乙烯基-7-(二乙基胺基)香豆素、3-(2-苯并噻唑基)-7-(二乙基胺基)香豆素、3-苯甲醯基-7-(二乙基胺基)香豆素、3-苯甲醯基-7-甲氧基-香豆素、10,10-羰基雙[1,1,7,7-四甲基-2,3,6,7-四氫-1H,5H、11H-C1]-苯并吡喃并[6,7,8-ij]-喹嗪-11-酮等香豆素系化合物;4-二乙基胺基查耳酮、4-疊氮基亞苄基苯乙酮等查耳酮化合物;2-苯甲醯基亞甲基、3-甲基-b-萘并噻唑啉。 As the photocrosslinking sensitizer, one or more selected from the group consisting of benzophenone, 4,4-bis(dimethylamino)benzophenone, and 4 may be used. 4-bis(diethylamino)benzophenone, 2,4,6-trimethylaminobenzophenone, methyl o-benzoylbenzoate, 3,3-dimethyl-4 a benzophenone compound such as methoxybenzophenone or 3,3,4,4-tetrakis(t-butylperoxycarbonyl)benzophenone; 9-fluorenone, 2-chloro-9- Anthrone-based compounds such as anthrone and 2-methyl-9-fluorenone; thioxanthone, 2,4-diethylthiazinone, 2-chlorothiazepinone, 1-chloro-4-propanone a thioxanthone compound such as a thioxanthone, an isopropyl thioxanthone or a diisopropyl thioxanthone; a xanthone such as xanthone or 2-methylxanthone a compound; an anthraquinone compound such as hydrazine, 2-methyl hydrazine, 2-ethyl hydrazine, tert-butyl hydrazine, 2,6-dichloro-9,10-fluorene; 9-phenyl Acridine, acridine, 1,7-bis(9-acridinyl)heptane, 1,5-bis(9-acridinylpentane), 1,3-bis(9-acridinyl)propane Compound; benzyl, 1,7,7-trimethyl-bicyclo[2,2,1]heptane-2,3-dione, 9,10-phenanthrene Di-carbonyl compound; 2,4,6-trimethylbenzimidyldiphenylphosphine oxide, bis(2,6-dimethoxybenzylidene)-2,4,4-trimethyl Oxidation of pentyl phosphine oxide Phosphine-based compound; methyl 4-(dimethylamino)benzoate, ethyl 4-(dimethylamino)benzoate, 2-n-butoxyethyl-4-(dimethylamino) a benzoate compound such as a benzoate; 2,5-bis(4-diethylaminobenzylidene)cyclopentanone, 2,6-bis(4-diethylaminobenzylidene) An amine-based synergist such as cyclohexanone or 2,6-bis(4-diethylaminobenzylidene)-4-methyl-cyclopentanone; 3,3-carbonylvinyl-7-(diethyl Amino) coumarin, 3-(2-benzothiazolyl)-7-(diethylamino)coumarin, 3-benzylidene-7-(diethylamino)coumarin , 3-benzylidene-7-methoxy-coumarin, 10,10-carbonyl bis[1,1,7,7-tetramethyl-2,3,6,7-tetrahydro-1H , 5H, 11H-C1]-benzopyrano[6,7,8-ij]-quinolizin-11-one and other coumarin compounds; 4-diethylaminochalcone, 4-fold A chalcone compound such as a benzylidene acetophenone; a 2-benzylidene methylene group, a 3-methyl-b-naphthylthiazoline.

所述硬化促進劑是為了提高硬化及機械強度而使用者,具體而言,可使用選自由2-巰基苯并咪唑、2-巰基苯并噻唑、2-巰基苯并噁唑、2,5-二巰基-1,3,4-噻二唑、2-巰基-4,6-二甲基胺基吡啶、季戊四醇-四(3-巰基丙酸酯)、季戊四醇-三(3-巰基丙酸酯)、季戊四醇-四(2-巰基乙酸酯)、季戊四醇-三(2-巰基乙酸酯)、三羥甲基丙烷-三(2-巰基乙酸酯)及三羥甲基丙烷-三(3-巰基丙酸酯)所組成的群組中的一種以上。 The hardening accelerator is used for the purpose of improving hardening and mechanical strength. Specifically, it can be selected from 2-mercaptobenzimidazole, 2-mercaptobenzothiazole, 2-mercaptobenzoxazole, 2,5- Dimercapto-1,3,4-thiadiazole, 2-mercapto-4,6-dimethylaminopyridine, pentaerythritol-tetrakis(3-mercaptopropionate), pentaerythritol-tris(3-mercaptopropionate) ), pentaerythritol-tetrakis(2-mercaptoacetate), pentaerythritol-tris(2-mercaptoacetate), trimethylolpropane-tris(2-mercaptoacetate), and trimethylolpropane-three ( One or more of the group consisting of 3-mercaptopropionate).

作為本說明書中所使用的密著促進劑,可選擇甲基丙烯醯氧基丙基三甲氧基矽烷、甲基丙烯醯氧基丙基二甲氧基矽烷、甲基丙烯醯氧基丙基三乙氧基矽烷、甲基丙烯醯氧基丙基二甲氧基矽烷等甲基丙烯醯基矽烷偶合劑中的一種以上來使用,作為烷基三甲氧基矽烷,可選擇辛基三甲氧基矽烷、十二烷基三甲氧基 矽烷、十八烷基三甲氧基矽烷等中的一種以上來使用。 As the adhesion promoter used in the present specification, methacryloxypropyltrimethoxydecane, methacryloxypropyldimethoxydecane, methacryloxypropyltricarboxylate may be selected. One or more kinds of methacryl decyl decane coupling agents such as ethoxy decane and methacryloxypropyl dimethoxy decane are used, and as the alkyl trimethoxy decane, octyl trimethoxy decane can be selected. Dodecyltrimethoxy One or more of decane, octadecyltrimethoxydecane, and the like are used.

所述界面活性劑為矽系界面活性劑或氟系界面活性劑,具體而言,作為矽系界面活性劑,可使用畢克化學(BYK-Chemie)公司的畢克(BYK)-077、畢克(BYK)-085、畢克(BYK)-300、畢克(BYK)-301、畢克(BYK)-302、畢克(BYK)-306、畢克(BYK)-307、畢克(BYK)-310、畢克(BYK)-320、畢克(BYK)-322、畢克(BYK)-323、畢克(BYK)-325、畢克(BYK)-330、畢克(BYK)-331、畢克(BYK)-333、畢克(BYK)-335、畢克(BYK)-341v344、畢克(BYK)-345v346、畢克(BYK)-348、畢克(BYK)-354、畢克(BYK)-355、畢克(BYK)-356、畢克(BYK)-358、畢克(BYK)-361、畢克(BYK)-370、畢克(BYK)-371、畢克(BYK)-375、畢克(BYK)-380、畢克(BYK)-390等,作為氟系界面活性劑,可使用迪愛生(DIC)(大日本油墨化學(DaiNippon Ink & Chemicals))公司的F-114、F-177、F-410、F-411、F-450、F-493、F-494、F-443、F-444、F-445、F-446、F-470、F-471、F-472SF、F-474、F-475、F-477、F-478、F-479、F-480SF、F-482、F-483、F-484、F-486、F-487、F-172D、MCF-350SF、TF-1025SF、TF-1117SF、TF-1026SF、TF-1128、TF-1127、TF-1129、TF-1126、TF-1130、TF-1116SF、TF-1131、TF1132、TF1027SF、TF-1441、TF-1442等,但並非僅限定於該些。 The surfactant is a ruthenium-based surfactant or a fluorine-based surfactant. Specifically, as a ruthenium-based surfactant, BYK-Chemie (BYK-Chemie) BYK-077 can be used.克(BYK)-085, BYK-300, BYK-301, BYK-302, BYK-306, BYK-307, BYK BYK)-310, BYK-320, BYK-322, BYK-323, BYK-325, BYK-330, BYK -331, BYK-333, BYK-335, BYK-341v344, BYK-345v346, BYK-348, BYK-354 , BYK-355, BYK-356, BYK-358, BYK-361, BYK-370, BYK-371,克 (BYK)-375, BYK-380, BYK-390, etc. As a fluorine-based surfactant, DIC (DaiNippon Ink & Chemicals) can be used. The company's F-114, F-177, F-410, F-411, F-450, F-493, F-494, F-443, F-444, F-445, F-446, F-470, F-471, F-472SF, F-474, F-475, F-477, F-478, F-479, F-480SF, F-482, F-483, F-484, F-486, F-487, F-172D, MCF-350SF, TF-1025SF, TF-1117SF, TF-1026SF, TF-1128, TF-1127, TF-1129, TF-1126, TF-1130, TF-1116SF, TF- 1131, TF1132, TF1027SF, TF-1441, TF-1442, etc., but are not limited to these.

作為所述抗氧化劑,可列舉選自由受阻酚(Hindered phenol)系抗氧化劑、胺系抗氧化劑、硫系抗氧化劑及膦系抗氧化 劑所組成的群組中的一種以上,但並非僅限定於該些。 Examples of the antioxidant include a hindered phenol-based antioxidant, an amine-based antioxidant, a sulfur-based antioxidant, and a phosphine-based antioxidant. One or more of the groups consisting of the agents, but not limited to them.

作為所述抗氧化劑的具體例,可列舉:磷酸、磷酸三甲酯或磷酸三乙酯等磷酸系熱穩定劑;2,6-二-第三丁基-對甲酚、十八烷基-3-(4-羥基-3,5-二-第三丁基苯基)丙酸酯、四雙[亞甲基-3-(3,5-二-第三丁基-4-羥基苯基)丙酸酯]甲烷、1,3,5-三甲基-2,4,6-三(3,5-二-第三丁基-4-羥基苄基)苯、3,5-二-第三丁基-4-羥基苄基亞磷酸二乙酯、2,2-硫代雙(4-甲基-6-第三丁基苯酚)、2,6-g,t-丁基苯酚4,4'-亞丁基-雙(3-甲基-6-第三丁基苯酚)、4,4'-硫代雙(3-甲基-6-第三丁基苯酚)或雙[3,3-雙-(4'-羥基-3'-第三丁基苯基)丁酸]二醇酯(Bis[3,3-bis-(4'-hydroxy-3'-tert-butylphenyl)butanoicacid]glycol ester)等受阻酚(Hindered phenol)系的一次抗氧化劑;苯基-α-萘基胺、苯基-β-萘基胺、N,N'-二苯基-對苯二胺或N,N'-二-β-萘基-對苯二胺等胺系的二次抗氧化劑;二月桂基二硫化物、二月桂基硫代丙酸酯、二硬脂基硫代丙酸酯、巰基苯并噻唑或四甲基秋蘭姆二硫化物四雙[亞甲基-3-(月桂基硫代)丙酸酯]甲烷等硫系的二次抗氧化劑;或者三苯基亞磷酸酯、三(壬基苯基)亞磷酸酯、三異癸基亞磷酸酯、雙(2,4-二丁基苯基)季戊四醇二亞磷酸酯(Bis(2,4-ditbutylphenyl)Pentaerythritol Diphosphite)或(1,1'-聯苯基)-4,4'-二基雙亞膦酸四[2,4-雙(1,1-二甲基乙基)苯基]酯((1,1'-Biphenyl)-4,4'-Diylbisphosphonous acid tetrakis[2,4-bis(1,1-dimethylethyl)phenyl]ester)等亞磷酸酯系的二次抗氧化劑。 Specific examples of the antioxidant include a phosphate-based heat stabilizer such as phosphoric acid, trimethyl phosphate or triethyl phosphate; 2,6-di-t-butyl-p-cresol, octadecyl- 3-(4-hydroxy-3,5-di-t-butylphenyl)propionate, tetra-bis[methylene-3-(3,5-di-t-butyl-4-hydroxyphenyl) Propionate]methane, 1,3,5-trimethyl-2,4,6-tris(3,5-di-t-butyl-4-hydroxybenzyl)benzene, 3,5-di- Diethyl tert-butyl-4-hydroxybenzyl phosphite, 2,2-thiobis(4-methyl-6-tert-butylphenol), 2,6-g, t-butylphenol 4 , 4'-butylidene-bis(3-methyl-6-tert-butylphenol), 4,4'-thiobis(3-methyl-6-tert-butylphenol) or double [3, 3-bis-(4'-hydroxy-3'-t-butylphenyl)butanoic acid]diol (Bis[3,3-bis-(4'-hydroxy-3'-tert-butylphenyl)butanoicacid] Primary antioxidant such as Hindered phenol; phenyl-α-naphthylamine, phenyl-β-naphthylamine, N,N'-diphenyl-p-phenylenediamine or N, Amine secondary antioxidant such as N'-di-β-naphthyl-p-phenylenediamine; dilauryl disulfide, dilauryl thiopropionate, distearyl thiopropionate, hydrazine a secondary anti-oxidant such as benzothiazole or tetramethylthiuram disulfide tetrakis [methylene-3-(laurylthio)propionate] methane; or triphenylphosphite, Tris(nonylphenyl)phosphite, triisodecylphosphite, bis(2,4-dibutylphenyl)pentaerythritol Diphosphite (Bis(2,4-ditbutylphenyl)Pentaerythritol Diphosphite) or 1,1'-biphenyl)-4,4'-diylbisphosphinic acid tetrakis[2,4-bis(1,1-dimethylethyl)phenyl]ester (1,1'- Biphenyl)-4,4'-Diylbisphosphonous acid tetrakis [2,4-bis(1,1-dimethylethyl)phenyl]ester) and other phosphite secondary antioxidants.

作為所述紫外線吸收劑,可使用2-(3-第三丁基-5-甲基-2-羥基苯基)-5-氯-苯并三唑、烷氧基二苯甲酮等,但並不限定於此,若為本領域中通常所使用者,則均能夠使用。 As the ultraviolet absorber, 2-(3-tert-butyl-5-methyl-2-hydroxyphenyl)-5-chloro-benzotriazole, alkoxybenzophenone, or the like can be used, but The present invention is not limited thereto, and can be used if it is generally used by users in the art.

作為所述熱聚合防止劑,例如可包含選自由對苯甲醚、對苯二酚、鄰苯二酚(pyrocatechol)、第三丁基兒茶酚(t-butyl catechol)、N-亞硝基苯基羥基胺銨鹽、N-亞硝基苯基羥基胺鋁鹽、對甲氧基苯酚、二-第三丁基-對甲酚、鄰苯三酚、苯醌、4,4-硫代雙(3-甲基-6-第三丁基酚)、2,2-亞甲基雙(4-甲基-6-第三丁基苯酚)、2-巰基咪唑及啡噻嗪(phenothiazine)所組成的群組中的一種以上,但並非僅限定於該些,亦可包含本技術領域中通常已知者等。 As the thermal polymerization preventing agent, for example, it may be selected from the group consisting of para-anisole, hydroquinone, pyrocatechol, t-butyl catechol, and N-nitroso Phenylhydroxylamine ammonium salt, N-nitrosophenylhydroxylamine aluminum salt, p-methoxyphenol, di-tert-butyl-p-cresol, pyrogallol, benzoquinone, 4,4-thio Bis(3-methyl-6-tert-butylphenol), 2,2-methylenebis(4-methyl-6-tert-butylphenol), 2-mercaptoimidazole and phenothiazine One or more of the group formed, but not limited thereto, may also include those generally known in the art.

所述分散劑可藉由以下方法來使用:以預先對顏料進行表面處理的形態使其內部添加於顏料中的方法、或者使其外部添加於顏料中的方法。作為所述分散劑,能夠使用化合物型、非離子性、陰離子性或陽離子性分散劑,可列舉氟系、酯系、陽離子系、陰離子系、非離子系、兩性界面活性劑等。該些可分別使用,或者亦可將兩種以上組合使用。 The dispersant can be used by a method of adding a pigment to the pigment in a form of surface treatment of the pigment in advance, or a method of externally adding it to the pigment. As the dispersing agent, a compound type, a nonionic, an anionic or a cationic dispersing agent can be used, and examples thereof include a fluorine-based, ester-based, cationic-based, anionic-based, nonionic-based, and amphoteric surfactant. These may be used separately or in combination of two or more.

具體而言,作為所述分散劑,可列舉選自由聚烷二醇及其酯、聚氧伸烷基多元醇、酯環氧烷加成物、醇環氧烷加成物、磺酸酯、磺酸鹽、羧酸酯、羧酸鹽、烷基醯胺環氧烷加成物及烷基胺所組成的群組中的一種以上,但並不限定於此。 Specifically, examples of the dispersant include a polyalkylene glycol and an ester thereof, a polyoxyalkylene polyol, an ester alkylene oxide adduct, an alcohol alkylene oxide adduct, a sulfonate, and the like. One or more of the group consisting of a sulfonate, a carboxylic acid ester, a carboxylate, an alkylguanamine alkylene oxide adduct, and an alkylamine, but is not limited thereto.

所述調平劑可為聚合物性,亦可為非聚合物性。作為聚 合物性的調平劑的具體例,可列舉聚乙烯亞胺、聚醯胺胺、胺與環氧化物的反應產物,作為非聚合物性的調平劑的具體例,包含非聚合物含硫化合物及非聚合物含氮化合物,但不限定於此,若為本領域中通常所使用者,則均能夠使用。 The leveling agent may be polymeric or non-polymeric. As a poly Specific examples of the compound leveling agent include polyethyleneimine, polyamidamine, a reaction product of an amine and an epoxide, and specific examples of a non-polymeric leveling agent, including a non-polymer sulfur-containing compound. The non-polymer nitrogen-containing compound is not limited thereto, and can be used as long as it is generally used in the art.

本說明書的一實施態樣提供一種光敏樹脂組成物,其包含由下述化學式15表示的化合物、由下述化學式2表示的化合物、染料及分散劑,且所述染料為三芳基甲烷系染料。 One embodiment of the present specification provides a photosensitive resin composition comprising a compound represented by the following Chemical Formula 15, a compound represented by the following Chemical Formula 2, a dye, and a dispersing agent, and the dye is a triarylmethane-based dye.

化學式15中,所述R1~R6、RA~RD、RAA、RBB及X1~X5的定義及化學式2的定義參照上文所提及的。 In Chemical Formula 15, the definitions of R 1 to R 6 , R A to R D , R AA , R BB and X 1 to X 5 and the definition of Chemical Formula 2 are as referred to above.

本說明書的一實施態樣提供一種使用所述樹脂組成物所製造的光敏材料。 One embodiment of the present specification provides a photosensitive material produced using the resin composition.

更詳細而言,提供一種藉由適當的方法將本發明的一實施態樣的樹脂組成物塗佈於基材上而成的薄膜或圖案形態的光敏材料。 More specifically, a photosensitive material in the form of a film or a pattern in which a resin composition according to an embodiment of the present invention is applied onto a substrate by an appropriate method is provided.

作為所述塗佈方法,並無特別限制,可使用噴霧法、輥塗法、旋塗法等,通常可廣泛使用旋塗法。另外,於形成塗膜之後,視情況亦可於減壓下去除一部分殘留溶媒。 The coating method is not particularly limited, and a spray method, a roll coating method, a spin coating method, or the like can be used, and a spin coating method can be widely used. Further, after the coating film is formed, a part of the residual solvent may be removed under reduced pressure as the case may be.

作為用於使本說明書的樹脂組成物硬化的光源,例如可列舉發出波長為250nm~450nm的光水銀蒸汽弧(arc)、碳弧、Xe弧等,但未必限定於此。 Examples of the light source for curing the resin composition of the present specification include a light mercury vapor arc (arc) having a wavelength of 250 nm to 450 nm, a carbon arc, a Xe arc, and the like, but are not necessarily limited thereto.

本說明書的樹脂組成物可用於薄膜電晶體液晶顯示器(Thin Film Transistor Liquid Crystal Display,TFT LCD)彩色濾光片製造用的顏料分散型光敏材料、薄膜電晶體液晶顯示器(TFT LCD)或有機發光二極體的黑色矩陣形成用光敏材料、外塗層形成用光敏材料、柱狀間隔物(colomn spacer)光敏材料、光硬化性塗料、光硬化性墨水、光硬化性接著劑、印刷板、印刷配線板用光敏材料、電漿顯示器面板(Plasma Display Panel,PDP)用光敏材料等,其用途並無特別限制。 The resin composition of the present specification can be used for a pigment dispersion type photosensitive material for producing a Thin Film Transistor Liquid Crystal Display (TFT LCD) color filter, a thin film transistor liquid crystal display (TFT LCD) or an organic light emitting diode. Photosensitive material for forming a black matrix of a polar body, a photosensitive material for forming an overcoat layer, a photosensitive spacer material, a photocurable coating material, a photocurable ink, a photocurable adhesive, a printing plate, and a printed wiring The photosensitive material for a sheet, a photosensitive material for a plasma display panel (PDP), and the like are not particularly limited.

根據本說明書的一實施態樣,提供一種包含所述光敏材料的彩色濾光片。 According to an embodiment of the present specification, a color filter comprising the photosensitive material is provided.

所述彩色濾光片包含所述光敏樹脂組成物。將所述光敏樹脂 組成物塗佈於基板上,形成塗佈(coating)膜,對所述塗佈膜進行曝光、顯影及硬化,藉此可形成彩色濾光片。 The color filter includes the photosensitive resin composition. The photosensitive resin The composition is applied onto a substrate to form a coating film, and the coating film is exposed, developed, and cured, whereby a color filter can be formed.

本說明書的一實施態樣的樹脂組成物可提供一種於圖案內實現孔(hole)時,使感度降低並且能夠實現高亮度的彩色濾光片。 The resin composition of an embodiment of the present specification can provide a color filter which reduces sensitivity and enables high luminance when a hole is realized in a pattern.

所述基板可為玻璃板、矽晶圓及聚醚碸(Polyethersulfone,PES)、聚碳酸酯(Polycarbonate,PC)等塑膠基材的板等,其種類並無特別限制。 The substrate may be a glass plate, a ruthenium wafer, a plate of a plastic substrate such as polyether sulfone (PES) or polycarbonate (PC), and the like, and the kind thereof is not particularly limited.

所述彩色濾光片可包含紅色圖案、綠色圖案、藍色圖案、黑色矩陣。 The color filter may include a red pattern, a green pattern, a blue pattern, and a black matrix.

另外,根據一實施態樣,所述彩色濾光片可更包含外塗層。 Additionally, according to an embodiment, the color filter may further comprise an overcoat layer.

於彩色濾光片的彩色畫素之間,出於提升對比率的目的,可配置被稱為黑色矩陣的格子狀的黑色圖案。作為黑色矩陣的材料,可使用鉻。該情況下,可利用以下方式:使鉻蒸鍍於玻璃基板整體上,藉由蝕刻處理來形成圖案。但是,考慮到步驟上的高成本、鉻的高反射率、由鉻廢液引起的環境污染,可使用利用能夠進行微細加工的顏料分散法的樹脂黑色矩陣。 Between the color pixels of the color filter, a lattice-like black pattern called a black matrix can be arranged for the purpose of enhancing the contrast ratio. As a material of the black matrix, chromium can be used. In this case, the chromium can be vapor-deposited on the entire glass substrate, and a pattern can be formed by an etching process. However, in consideration of the high cost in the step, the high reflectance of chromium, and the environmental pollution caused by the chromium waste liquid, a resin black matrix using a pigment dispersion method capable of microfabrication can be used.

本說明書的一實施態樣的黑色矩陣可使用黑色顏料或黑色染料作為著色劑。例如可單獨使用碳黑,亦可將碳黑與著色顏料混合使用,此時,由於將遮光性不足的著色顏料加以混合,故而有如下優點:即使著色劑的量相對增加,膜的強度或者對基 板的密著性亦不會降低。 A black matrix of an embodiment of the present specification may use a black pigment or a black dye as a colorant. For example, carbon black may be used alone, or carbon black may be used in combination with a color pigment. In this case, since the coloring pigment having insufficient light shielding property is mixed, there is an advantage that even if the amount of the coloring agent is relatively increased, the strength or the film strength base The adhesion of the board will not decrease.

提供一種包含本說明書的彩色濾光片的顯示器裝置。 A display device including the color filter of the present specification is provided.

所述顯示器裝置可為電漿顯示器面板(Plasma Display Panel,PDP)、發光二極體(Light Emitting Diode,LED)、有機發光元件(Organic Light Emitting Diode,OLED)、液晶顯示器(Liquid Crystal Display,LCD)、薄膜電晶體液晶顯示器(Thin Film Transistor-Liquid Crystal Display,LCD-TFT)以及陰極射線管(Cathode Ray Tube,CRT)的任一者。 The display device may be a plasma display panel (PDP), a light emitting diode (LED), an organic light emitting diode (OLED), or a liquid crystal display (LCD). Any of a Thin Film Transistor-Liquid Crystal Display (LCD-TFT) and a Cathode Ray Tube (CRT).

以下,為了對本說明書進行具體說明,列舉實施例來詳細地說明。但是,本說明書的實施例能夠變形為各種其他形態,本說明書的範圍不可解釋為限定於以下記載的實施例。本說明書的實施例供於對本領域中有平均知識者更完整地說明本說明書。 Hereinafter, in order to specifically describe the present specification, an embodiment will be described in detail. However, the embodiments of the present specification can be modified into various other forms, and the scope of the present specification is not to be construed as being limited to the embodiments described below. The embodiments of the present specification are intended to provide a more complete description of the present specification to those of ordinary skill in the art.

化合物的合成Synthesis of compounds

為了製造本說明書的一實施態樣的光敏樹脂組成物,藉由下述般的反應式1來生成化合物1。 In order to produce a photosensitive resin composition according to an embodiment of the present specification, Compound 1 is produced by the following Reaction Formula 1.

將5g的A-1(8.710mmol)、8.233g的B-1(34.838mmol)、4.815g的K2CO3(34.5838mmol)放入100ml的N-甲基吡咯啶酮(N-Methyl Pyrrolidone,NMP)中,於95℃下攪拌12小時。之後,於減壓下去除溶媒,將200ml的水放入析出物中並攪拌1小時。另外,於減壓下對析出物進行過濾,並於80℃下使其乾燥12小時。之後,藉由管柱層析法使已乾燥的析出物分離。(溶析液(Eluent)-MC:MeOH) 5 g of A-1 (8.710 mmol), 8.233 g of B-1 (34.838 mmol), 4.815 g of K 2 CO 3 (34.5838 mmol) were placed in 100 ml of N-Methyl Pyrrolidone (N-Methyl Pyrrolidone, In NMP), it was stirred at 95 ° C for 12 hours. Thereafter, the solvent was removed under reduced pressure, and 200 ml of water was placed in the precipitate and stirred for 1 hour. Further, the precipitate was filtered under reduced pressure and dried at 80 ° C for 12 hours. Thereafter, the dried precipitates are separated by column chromatography. (Eluent-MC: MeOH)

結果,可獲得6g的化合物1(3.322mmol),產率為72%。 As a result, 6 g of Compound 1 (3.322 mmol) was obtained in a yield of 72%.

結果如下所述。 The results are as follows.

離子化模式=:大氣壓化學遊離(Atmospheric Pressure Chemical Ionization,APCI)+:m/z=949[M+H]+,準確質量(Exact Mass):948 Ionization mode =: Atmospheric Pressure Chemical Ionization (APCI) +: m / z = 949 [M + H] +, accurate mass (Exact Mass): 948

所述化合物1的1H-NMR的測定結果如下所述。 The measurement results of the 1 H-NMR of the compound 1 are as follows.

1H NMR(500MHz,二甲基亞碸(dimethylsulfoxide,DMSO),ppm):8.03(m,11H),7.69~7.18(m,10H),6.99~6.95(t,1H),6.80~6.01(dd,1H),5.93~5.85(dd,1H),4.06~3.79(m,4H),3.72~3.60(m,4H),2.17~1.70(m,16H) 1 H NMR (500 MHz, dimethyl sulfoxide (DMSO), ppm): 8.03 (m, 11H), 7.69 to 7.18 (m, 10H), 6.99 to 6.95 (t, 1H), 6.80 to 6.01 (dd , 1H), 5.93~5.85 (dd, 1H), 4.06~3.79 (m, 4H), 3.72~3.60 (m, 4H), 2.17~1.70 (m, 16H)

[反應式2] [Reaction formula 2]

如所述反應式2般,將1.43g的C-1(2.732mmol)、2.99g的B-1(9.490mmol)、1.31g的K2CO3(9.490mmol)放入20ml的NMP中,於95℃下攪拌12小時。之後,於減壓下去除溶媒,將200ml的水放入析出物中並攪拌1小時。另外,於減壓下對析出物進行過濾,並於80℃下使其乾燥12小時。之後,藉由管柱層析法使已乾燥的析出物分離。(溶析液(Eluent)-MC:MeOH) As in the above Reaction Scheme 2, 1.43 g of C-1 (2.732 mmol), 2.99 g of B-1 (9.490 mmol), and 1.31 g of K 2 CO 3 (9.490 mmol) were placed in 20 ml of NMP. Stir at 95 ° C for 12 hours. Thereafter, the solvent was removed under reduced pressure, and 200 ml of water was placed in the precipitate and stirred for 1 hour. Further, the precipitate was filtered under reduced pressure and dried at 80 ° C for 12 hours. Thereafter, the dried precipitates are separated by column chromatography. (Eluent-MC: MeOH)

結果,可獲得1.622g的化合物2(1.912mmol),產率為70%。 As a result, 1.622 g of Compound 2 (1.912 mmol) was obtained in a yield of 70%.

離子化模式=:APCI+:m/z=977[M+H]+,準確質量(Exact Mass):976 Ionization mode =: APCI +: m / z = 977 [M + H] +, accurate mass (Exact Mass): 976

如所述反應式3般,將1.608g的D-1(2.732mmol)、2.99g的B-1(9.490mmol)、1.31g的K2CO3(9.490mmol)放入20ml的NMP中,於95℃下攪拌12小時。之後,於減壓下去除溶媒,將200ml的水放入析出物中並攪拌1小時。另外,於減壓下對析出物進行過濾,並於80℃下使其乾燥12小時。之後,藉由管柱層析法使已乾燥的析出物分離。(溶析液(Eluent)-MC:MeOH) As in the above Reaction Scheme 3, 1.608 g of D-1 (2.732 mmol), 2.99 g of B-1 (9.490 mmol), and 1.31 g of K 2 CO 3 (9.490 mmol) were placed in 20 ml of NMP. Stir at 95 ° C for 12 hours. Thereafter, the solvent was removed under reduced pressure, and 200 ml of water was placed in the precipitate and stirred for 1 hour. Further, the precipitate was filtered under reduced pressure and dried at 80 ° C for 12 hours. Thereafter, the dried precipitates are separated by column chromatography. (Eluent-MC: MeOH)

結果,可獲得1.526g的化合物3(1.622mmol),產率為59%。 As a result, 1.526 g of Compound 3 (1.622 mmol) was obtained in a yield of 59%.

離子化模式=:APCI+:m/z=963[M+H]+,準確質量(Exact Mass):962 Ionization mode =: APCI +: m / z = 963 [M + H] +, accurate mass (Exact Mass): 962

如所述反應式4般,將289.5g的酸性紅(Acid Red)(7.388mmol)、8.1g的B-1(25.8mmol)、4.09g的K2CO3(29.554mmol)放入100ml的NMP中,於95℃下攪拌12小時。之後,於減壓下去除溶媒,將100ml的鹽水(brine)添加於析出物中並攪拌1小時。然後,於減壓下對析出物進行過濾,並於80℃下使其乾燥12小時。 As in the above Reaction Scheme 4, 289.5 g of Acid Red (7.388 mmol), 8.1 g of B-1 (25.8 mmol), and 4.09 g of K 2 CO 3 (29.554 mmol) were placed in 100 ml of NMP. The mixture was stirred at 95 ° C for 12 hours. Thereafter, the solvent was removed under reduced pressure, and 100 ml of brine was added to the precipitate and stirred for 1 hour. Then, the precipitate was filtered under reduced pressure, and dried at 80 ° C for 12 hours.

結果,可獲得7.3g的以化合物4為主產物的著色劑(6.945mmol),產率為94%。 As a result, 7.3 g of a coloring agent (6.945 mmol) based on Compound 4 as a main product was obtained in a yield of 94%.

實驗例Experimental example

以下述表1般的比率製作實施例1~實施例4及比較例1~比較例4。各構成的投入單位為克(g)。 Examples 1 to 4 and Comparative Examples 1 to 4 were produced at a ratio similar to the following Table 1. The input unit of each configuration is gram (g).

[表1] [Table 1]

基板的製作Substrate production

將所製作的化合物旋塗(spincoating)於蒸鍍有SiNx的玻璃(5cm×5cm)上,於110℃下進行70秒預烘(prebake)而形成膜。將形成有膜的基板與光罩(photo mask)之間的間隔設為300μm,使用曝光器對基板整面照射30mJ/cm2的曝光量。 The produced compound was spin-coated on a glass (5 cm × 5 cm) on which SiN x was deposited, and prebaked at 110 ° C for 70 seconds to form a film. The interval between the substrate on which the film was formed and the photo mask was set to 300 μm, and the entire surface of the substrate was irradiated with an exposure amount of 30 mJ/cm 2 using an exposer.

之後,利用顯影液(KOH,0.04%)對經曝光的基板顯影55秒,於230℃下進行20分鐘後烘(post bake)而製作基板。 Thereafter, the exposed substrate was developed with a developing solution (KOH, 0.04%) for 55 seconds, and post-bake at 230 ° C for 20 minutes to prepare a substrate.

孔的尺寸測定Hole size determination

利用顯微分光光度計(奧林巴斯(Olympus)光學工業(股)製造,OSPSP200)以1000倍的倍率對於所述般的條件下製作的基板測定孔的內側長度。 The inner length of the pores was measured for a substrate produced under the above-described conditions by a microscopic spectrophotometer (manufactured by Olympus Optical Industries Co., Ltd., OSPSP200) at a magnification of 1000 times.

密著力的測定Determination of adhesion

利用顯微分光光度計(奧林巴斯(Olympus)光學工業(股)製造,OSPSP200)對於所述般的條件下製作的基板進行測定。 The substrate produced under the above-described conditions was measured by a microscopic spectrophotometer (manufactured by Olympus Optical Industries Co., Ltd., OSPSP200).

如所述表1所示,可知於使用包含由所述化學式1表示的化合物與由所述化學式2表示的化合物此兩者的實施例1~實施例4的光敏樹脂組成物來製造彩色濾光片的情況下,微細圖案密著力優異。 As shown in the above Table 1, it is understood that the photosensitive resin composition of Examples 1 to 4 containing both the compound represented by the above Chemical Formula 1 and the compound represented by Chemical Formula 2 is used to produce color filter. In the case of a sheet, the fine pattern has excellent adhesion.

將對所述微細圖案密著力測定所得的結果示於圖1。 The results obtained by measuring the adhesion of the fine pattern are shown in Fig. 1 .

Claims (18)

一種光敏樹脂組成物,其包含:由下述化學式1表示的化合物、與由下述化學式2表示的化合物; [化學式2][(RSiO1.5)n](化學式1中,LA及LB可彼此相同亦可不同,分別獨立地為直接鍵結或碳數1~10的伸烷基,RA~RF可彼此相同亦可不同,分別獨立地選自由氫、重氫、鹵素原子、硝基、經取代或未經取代的碳數1~30的烷基、經取代或未經取代的碳數1~30的烷氧基、經取代或未經取代的碳數6~30的單環或多環的芳基、及經取代或未經取代的碳數1~30的 單環或多環的雜芳基所組成的群組中,R1~R6可彼此相同亦可不同,分別獨立地選自由氫、重氫、鹵素原子、經取代或未經取代的碳數1~6的直鏈或分支鏈的烷基、經取代或未經取代的碳數1~6的烷氧基、磺酸基、磺酸酯基、磺酸鹽基、-SO2NHR7基及-SO2NR8R9所組成的群組中,R7~R9可彼此相同亦可不同,分別獨立地為直鏈或分支鏈的碳數1~10的烷基,X1~X5可彼此相同亦可不同,分別獨立地選自由氫、重氫、陰離子性基、羥基、經取代或未經取代的碳數1~30的烷基、經取代或未經取代的碳數6~30的單環或多環的芳基、及經取代或未經取代的碳數1~30的單環或多環的雜芳基所組成的群組中,所述X1~X5的至少一個為陰離子性基,RAA及RBB可彼此相同亦可不同,分別獨立地選自由氫、重氫、經取代或未經取代的碳數1~30的烷基、經取代或未經取代的碳數1~30的烷氧基、經取代或未經取代的碳數6~30的單環或多環的芳基、經取代或未經取代的碳數1~30的單環或多環的雜芳基、鹵素原子、硝基、苯氧基、羧基、羧酸酯基、羧酸鹽基、烷氧基羰基、羥基、磺酸基、磺酸酯基、磺酸鹽基、-SO2NHR'及-SO2NR"R'''所組成的群組中,a及b可彼此相同亦可不同,分別獨立地為0~4的整數,於a及b為2以上的情況下,括號內的結構可彼此相同亦可不同, R'、R"及R'''可彼此相同亦可不同,分別獨立地為碳數1~30的烷基,化學式2中,n為4以上的偶數,R由-(L1)n1-R7表示,多個R可彼此相同亦可不同,L1為直接鍵結、-O-、-S-或碳數1~30的伸烷基,n1為1~5的整數,於n1為2以上的情況下,L1可彼此相同亦可不同,R7為氫、重氫、-OH、環氧基、-SH、-NH2、-N=C=O、-C=C-、碳數1~30的經取代或未經取代的烷基、碳數6~30的芳基或者碳數1~30的雜環基),「經取代或未經取代的」是指經選自包含重氫,鹵素原子,烷基,烯基,烷氧基,環烷基,芳基烯基,芳基,芳基氧基,芳烷基,芳烯基,烷基胺基,芳烷基胺基,芳基胺基,雜芳基,咔唑基,丙烯醯基,丙烯酸酯基,醚基,腈基,硝基,羥基,氰基,含有N原子、O原子、S原子或P原子中的一個以上的雜芳基及陰離子性基的群組中的一個以上的取代基所取代或者不具有任何取代基。 A photosensitive resin composition comprising: a compound represented by the following Chemical Formula 1 and a compound represented by the following Chemical Formula 2; [Chemical Formula 2] [(RSiO 1.5 ) n ] (In Chemical Formula 1, L A and L B may be the same or different, and each independently is a direct bond or an alkyl group having a carbon number of 1 to 10, R A to R F may be the same or different from each other, and are independently selected from hydrogen, dihydrogen, halogen atom, nitro group, substituted or unsubstituted alkyl group having 1 to 30 carbon atoms, substituted or unsubstituted carbon number 1 ~30 alkoxy, substituted or unsubstituted hexacyclic or polycyclic aryl group having 6 to 30 carbon atoms, and substituted or unsubstituted monocyclic or polycyclic heterocyclic group having 1 to 30 carbon atoms In the group consisting of aryl groups, R 1 to R 6 may be the same or different from each other, and are independently selected from a hydrogen group, a hydrogen atom, a halogen atom, a substituted or unsubstituted carbon number of 1 to 6 or a straight chain or Branched chain alkyl, substituted or unsubstituted alkoxy group having 1 to 6 carbon atoms, sulfonic acid group, sulfonate group, sulfonate group, -SO 2 NHR 7 group and -SO 2 NR 8 R In the group of 9 constituents, R 7 to R 9 may be the same or different from each other, and are independently a linear or branched alkyl group having 1 to 10 carbon atoms, and X 1 to X 5 may be the same or different from each other. , independently selected from hydrogen, heavy hydrogen, anion a hydroxy group, a substituted or unsubstituted alkyl group having 1 to 30 carbon atoms, a substituted or unsubstituted monocyclic or polycyclic aryl group having 6 to 30 carbon atoms, and a substituted or unsubstituted In the group consisting of monocyclic or polycyclic heteroaryl groups having 1 to 30 carbon atoms, at least one of X 1 to X 5 is an anionic group, and R AA and R BB may be the same or different, respectively. Independently selected from hydrogen, heavy hydrogen, substituted or unsubstituted alkyl having from 1 to 30 carbon atoms, substituted or unsubstituted alkoxy groups having from 1 to 30 carbon atoms, substituted or unsubstituted carbon a 6- to 30-membered monocyclic or polycyclic aryl group, a substituted or unsubstituted monocyclic or polycyclic heteroaryl group having 1 to 30 carbon atoms, a halogen atom, a nitro group, a phenoxy group, a carboxyl group, and a carboxy group. a group consisting of an acid ester group, a carboxylate group, an alkoxycarbonyl group, a hydroxyl group, a sulfonic acid group, a sulfonate group, a sulfonate group, -SO 2 NHR', and -SO 2 NR"R'" a and b may be the same or different from each other, and are each independently an integer of 0 to 4. When a and b are 2 or more, the structures in the parentheses may be the same or different, R', R" and R''' may be the same or different from each other, independently An alkyl group having 1 to 30 carbon atoms, and in Chemical Formula 2, n is an even number of 4 or more, the R - n1 -R 7 represents (1 L), the plurality of R may be the same or different from one another, L 1 is a direct bond, -O-, -S- or an alkylene group having 1 to 30 carbon atoms, and n1 is an integer of 1 to 5. When n1 is 2 or more, L 1 may be the same or different, and R 7 is hydrogen and heavy. Hydrogen, -OH, epoxy, -SH, -NH 2 , , -N=C=O, -C=C-, substituted or unsubstituted alkyl group having 1 to 30 carbon atoms, aryl group having 6 to 30 carbon atoms or heterocyclic group having 1 to 30 carbon atoms), "Substituted or unsubstituted" means selected from the group consisting of heavy hydrogen, halogen atom, alkyl, alkenyl, alkoxy, cycloalkyl, arylalkenyl, aryl, aryloxy, aralkyl. Alkyl, aralkenyl, alkylamino, aralkylamino, arylamino, heteroaryl, carbazolyl, acryl oxime, acrylate, ether, nitrile, nitro, hydroxy, cyanide One or more substituents in the group containing one or more heteroaryl groups and anionic groups of an N atom, an O atom, an S atom or a P atom are substituted with or without any substituent. 如申請專利範圍第1項所述的光敏樹脂組成物,其中所述陰離子性基為選自由-OH、-SO3 -、-SO3H、-SO3 -Z+、-CO2H、 -O2 -Z+、-CO2Ra、-SO3Rb及-SO3NRcRd所組成的群組中的至少一者,Z+表示N(Re)4 +、Na+或K+,Ra~Re可彼此相同亦可不同,分別獨立地為選自由經取代或未經取代的碳數1~30的烷基、經取代或未經取代的碳數6~30的單環或多環的芳基、及經取代或未經取代的碳數1~30的單環或多環的雜芳基所組成的群組中的至少一者。 The photosensitive resin composition according to claim 1, wherein the anionic group is selected from the group consisting of -OH, -SO 3 - , -SO 3 H, -SO 3 - Z + , -CO 2 H, - At least one of the group consisting of O 2 - Z + , -CO 2 R a , -SO 3 R b and -SO 3 NR c R d , Z + represents N(R e ) 4 + , Na + or K + , R a ~R e may be the same or different from each other, and are independently selected from a substituted or unsubstituted alkyl group having 1 to 30 carbon atoms, a substituted or unsubstituted carbon number of 6 to 30. At least one of a monocyclic or polycyclic aryl group and a substituted or unsubstituted mono- or polycyclic heteroaryl group having 1 to 30 carbon atoms. 如申請專利範圍第1項所述的光敏樹脂組成物,其中所述R為由下述化學式2-a~化學式2-e的任一者表示者; [化學式2-d] The photosensitive resin composition according to claim 1, wherein the R is represented by any one of the following Chemical Formulas 2-a to 2-e; [Chemical Formula 2-d] 如申請專利範圍第1項所述的光敏樹脂組成物,其更包含:黏合劑樹脂、多官能性單體、光起始劑及溶媒。 The photosensitive resin composition according to claim 1, further comprising: a binder resin, a polyfunctional monomer, a photoinitiator, and a solvent. 如申請專利範圍第4項所述的光敏樹脂組成物,其中以所述光敏樹脂組成物中的固體成分的總重量為基準,由所述化學式1表示的化合物的含量為0.1重量份~50重量份,由所述化學式2表示的化合物的含量為0.01重量份~10重量份,所述黏合劑樹脂的含量為1重量份~60重量份,所述光起始劑的含量為0.1重量份~20重量份,所述多官能性單體的含量為0.1重量份~50重量份。 The photosensitive resin composition according to claim 4, wherein the content of the compound represented by the chemical formula 1 is from 0.1 part by weight to 50% by weight based on the total weight of the solid component in the photosensitive resin composition. The content of the compound represented by the chemical formula 2 is 0.01 parts by weight to 10 parts by weight, the content of the binder resin is 1 part by weight to 60 parts by weight, and the content of the photoinitiator is 0.1 part by weight. The content of the polyfunctional monomer is from 0.1 part by weight to 50 parts by weight per 20 parts by weight. 如申請專利範圍第4項所述的光敏樹脂組成物,其更包含染料及顏料的至少一者。 The photosensitive resin composition according to claim 4, which further comprises at least one of a dye and a pigment. 如申請專利範圍第6項所述的光敏樹脂組成物,其中所述染料為選自包含蒽醌系染料、四氮雜卟啉系染料及三芳基甲烷 系染料的群組中的至少一者。 The photosensitive resin composition according to claim 6, wherein the dye is selected from the group consisting of an anthraquinone dye, a tetraazaporphyrin dye, and a triarylmethane. At least one of the group of dyes. 如申請專利範圍第7項所述的光敏樹脂組成物,其中所述蒽醌系染料為由下述化學式3表示者; (所述化學式3中,R11及R12分別獨立地為選自由胺基、烷基胺基、二烷基胺基、苯基胺基及二苯基胺基所組成的群組中的至少一者)。 The photosensitive resin composition according to claim 7, wherein the lanthanide dye is represented by the following Chemical Formula 3; (In the chemical formula 3, R 11 and R 12 are each independently at least selected from the group consisting of an amine group, an alkylamino group, a dialkylamino group, a phenylamino group, and a diphenylamino group. One). 如申請專利範圍第7項所述的光敏樹脂組成物,其中所述蒽醌系染料為選自下述化合物中的任一者; The photosensitive resin composition according to claim 7, wherein the lanthanide dye is any one selected from the group consisting of the following compounds; 如申請專利範圍第7項所述的光敏樹脂組成物,其中所述四氮雜卟啉系染料為選自下述化合物中的任一者; The photosensitive resin composition according to claim 7, wherein the porphyrazine-based dye is any one selected from the group consisting of the following compounds; 如申請專利範圍第7項所述的光敏樹脂組成物,其中所述三芳基甲烷系染料為選自下述化合物中的任一者; The photosensitive resin composition according to claim 7, wherein the triarylmethane dye is any one selected from the group consisting of: 如申請專利範圍第4項所述的光敏樹脂組成物,其更包含分散劑,所述分散劑為包含含有由下述化學式11表示的重複單元或由化學式12表示的重複單元的聚合體者; (化學式11及化學式12中,R301及R401可彼此相同亦可不同,分別獨立地為氫或碳數1~10的烷基,R302、R303、R402及R403可彼此相同亦可不同,分別獨立地為氫、碳數1~30的烷基、碳數6~30的芳基或碳數1~30的雜芳基,或者 R302與R303或者R402與R403彼此鍵結而形成經取代或未經取代的環,Ar3及Ar4可彼此相同亦可不同,分別獨立地為直接鍵結、碳數1~10的伸烷基、由-[CH(R311)-CH(R312)-O]x-CH(R313)-CH(R314)-或-[(CH2)y-O]z-(CH2)y-表示的二價連結基,R311~R314可彼此相同亦可不同,分別獨立地為氫或碳數1~10的烷基,x為1~18的整數,於x為2以上的情況下,括號內的結構可彼此相同亦可不同,y為1~5的整數,z為1~18的整數,於z為2以上的情況下,括號內的結構可彼此相同亦可不同,Q為選自由碳數1~10的伸烷基、碳數6~30的伸芳基、-CONH-、-COO-及碳數1~10的醚基所組成的群組中的任一個或兩個以上連結而成的連結基)。 The photosensitive resin composition according to claim 4, further comprising a dispersing agent which is a polymer comprising a repeating unit represented by the following Chemical Formula 11 or a repeating unit represented by Chemical Formula 12; (In Chemical Formula 11 and Chemical Formula 12, R 301 and R 401 may be the same or different, and each independently is hydrogen or an alkyl group having 1 to 10 carbon atoms, and R 302 , R 303 , R 402 and R 403 may be the same as each other. Differently, each independently is hydrogen, an alkyl group having 1 to 30 carbon atoms, an aryl group having 6 to 30 carbon atoms or a heteroaryl group having 1 to 30 carbon atoms, or R 302 and R 303 or R 402 and R 403 are mutually Bonding to form a substituted or unsubstituted ring, Ar 3 and Ar 4 may be the same or different, each independently being a direct bond, an alkyl group having a carbon number of 1 to 10, and consisting of -[CH(R 311) -CH(R 312 )-O] x -CH(R 313 )-CH(R 314 )- or -[(CH 2 ) y -O] z -(CH 2 ) y - represents a divalent linking group, R 311 to R 314 may be the same or different from each other, and each independently is hydrogen or an alkyl group having 1 to 10 carbon atoms, and x is an integer of 1 to 18. In the case where x is 2 or more, the structures in parentheses may be mutually The same or different, y is an integer from 1 to 5, and z is an integer from 1 to 18. When z is 2 or more, the structures in the parentheses may be the same or different, and Q is selected from carbon numbers 1 to 10. a group consisting of an alkyl group, an alkyl group having 6 to 30 carbon atoms, a -CONH-, -COO-, and an ether group having 1 to 10 carbon atoms Two or more of any of a linking group formed by coupling). 一種光敏樹脂組成物,其包含:由下述化學式15表示的化合物、由下述化學式2表示的化合物、染料及分散劑,且所述染料為三芳基甲烷系染料;[化學式15] (化學式15中,所述R1~R6、RA~RD、RAA、RBB及X1~X5的定義及化學式2的定義參照申請專利範圍第1項中的定義)。 A photosensitive resin composition comprising: a compound represented by the following Chemical Formula 15, a compound represented by the following Chemical Formula 2, a dye, and a dispersing agent, wherein the dye is a triarylmethane-based dye; [Chemical Formula 15] (In Chemical Formula 15, the definitions of R 1 to R 6 , R A to R D , R AA , R BB , and X 1 to X 5 and the definition of Chemical Formula 2 refer to the definition in the first item of the patent application scope). 如申請專利範圍第13項所述的光敏樹脂組成物,其中所述三芳基甲烷系染料為選自下述化合物中的任一者; The photosensitive resin composition according to claim 13, wherein the triarylmethane dye is any one selected from the group consisting of the following compounds; 如申請專利範圍第13項所述的光敏樹脂組成物,其中所述分散劑為包含含有由下述化學式11表示的重複單元或由化學式12表示的重複單元的聚合體者; [化學式12] (化學式11及化學式12中,所述R301、R302、R303、R401、Ar3、Ar4、R311~R314、x、y、z及Q的定義參照申請專利範圍第12項中的定義)。 The photosensitive resin composition according to claim 13, wherein the dispersing agent is a polymer comprising a repeating unit represented by the following Chemical Formula 11 or a repeating unit represented by Chemical Formula 12; [Chemical Formula 12] (In Chemical Formula 11 and Chemical Formula 12, the definitions of R 301 , R 302 , R 303 , R 401 , Ar 3 , Ar 4 , R 311 to R 314 , x, y, z, and Q refer to the 12th item of the patent application scope. Definition in ). 一種光敏材料,其使用如申請專利範圍第1項至第15項中任一項所述的樹脂組成物所製造。 A photosensitive material produced by using the resin composition according to any one of claims 1 to 15. 一種彩色濾光片,其包含如申請專利範圍第16項所述的光敏材料。 A color filter comprising the photosensitive material of claim 16 of the patent application. 一種顯示器裝置,其包含如申請專利範圍第17項所述的彩色濾光片。 A display device comprising the color filter of claim 17 of the patent application.
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Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102092439B1 (en) * 2016-07-26 2020-03-23 주식회사 엘지화학 Photosensitive resin composition and color filter comprising same
KR102156478B1 (en) * 2018-04-05 2020-09-16 주식회사 엘지화학 Xanthene-based compound photosensitive resin composition, photoresist, color filter, and display device comprising the same
WO2019194384A1 (en) * 2018-04-05 2019-10-10 주식회사 엘지화학 Xanthene-based compound, and photosensitive resin composition, photosensitive material, color filter and display device including same
KR102314483B1 (en) * 2018-06-22 2021-10-19 주식회사 엘지화학 Compound, polymer, colorant composition, resin composition, color filter and display device
KR102662536B1 (en) * 2018-12-06 2024-04-30 주식회사 엘지화학 Colorant composition, photosensitive resin composition, photo resist, color filter, and display device
JP7324046B2 (en) * 2019-05-20 2023-08-09 東友ファインケム株式会社 colored resin composition
JP7291620B2 (en) * 2019-12-27 2023-06-15 大日本印刷株式会社 Tetraazaporphyrin compound, ink composition, film, optical material, optical film, display surface film, and display device

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102650829A (en) * 2011-02-28 2012-08-29 住友化学株式会社 Coloring cured resin composite
TW201341957A (en) * 2012-04-11 2013-10-16 Jsr Corp Radiation-sensitive coloring composition, color filter and display device
JP2014160160A (en) * 2013-02-20 2014-09-04 Toyo Ink Sc Holdings Co Ltd Color filter colorant, coloring composition and color filter

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0987534A (en) 1995-09-25 1997-03-31 Konica Corp Ink jet recording fluid
JP2006071890A (en) 2004-09-01 2006-03-16 Fuji Photo Film Co Ltd Dye-containing negative curable composition, and color filter, and method for producing color filter
JP2006078602A (en) 2004-09-07 2006-03-23 Fuji Photo Film Co Ltd Dye-containing negative-type curable composition, color filter and method for producing the same
JP5109437B2 (en) * 2007-03-27 2012-12-26 Jsr株式会社 Radiation-sensitive composition for forming colored layer, color filter, and color liquid crystal display element
JP2009237151A (en) * 2008-03-26 2009-10-15 Fujifilm Corp Coloring curing composition for color filter and color filter
TWI496840B (en) * 2009-03-30 2015-08-21 Sumitomo Chemical Co Dye composition
JP5515714B2 (en) * 2009-12-16 2014-06-11 Jsr株式会社 Coloring composition, color filter and color liquid crystal display element
WO2012128318A1 (en) 2011-03-23 2012-09-27 三菱化学株式会社 Colored resin composition, color filter, liquid crystal display device, organic el display device
JPWO2013011687A1 (en) * 2011-07-19 2015-02-23 日本化薬株式会社 Colored resin composition for color filter
JP5785810B2 (en) * 2011-07-28 2015-09-30 住友化学株式会社 Colored curable resin composition
TWI428698B (en) * 2011-11-25 2014-03-01 Chi Mei Corp Photosensitive resin composition, black matrix, color filter and liquid crystal display element
JP5953754B2 (en) * 2012-01-13 2016-07-20 住友化学株式会社 Colored curable resin composition
WO2014035203A1 (en) * 2012-08-31 2014-03-06 주식회사 엘지화학 Styryl-based compound, coloring material comprising the styryl-based compound, photosensitive resin composition comprising the coloring material, photoresist material prepared from the photosensitive resin composition, color filter comprising the photoresist material, and display device comprising the color filter
JP6065596B2 (en) * 2013-01-16 2017-01-25 Jsr株式会社 Radiation-sensitive coloring composition, colored cured film, and display element
JP6209499B2 (en) 2014-03-18 2017-10-04 富士フイルム株式会社 Colored curable resin composition, cured film, color filter, method for producing color filter, solid-state imaging device, image display device, compound and cation
CN105278245B (en) * 2014-07-03 2020-11-06 东友精细化工有限公司 Colored curable resin composition
JP2017198815A (en) * 2016-04-27 2017-11-02 東洋インキScホールディングス株式会社 Coloring composition for color filter and color filter
KR102092438B1 (en) * 2016-07-26 2020-03-23 주식회사 엘지화학 Photosensitive resin composition and color filter comprising same
KR102092439B1 (en) * 2016-07-26 2020-03-23 주식회사 엘지화학 Photosensitive resin composition and color filter comprising same

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102650829A (en) * 2011-02-28 2012-08-29 住友化学株式会社 Coloring cured resin composite
TW201341957A (en) * 2012-04-11 2013-10-16 Jsr Corp Radiation-sensitive coloring composition, color filter and display device
JP2014160160A (en) * 2013-02-20 2014-09-04 Toyo Ink Sc Holdings Co Ltd Color filter colorant, coloring composition and color filter

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