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TWI538588B - Production method for airtight via of a substrate - Google Patents

Production method for airtight via of a substrate Download PDF

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Publication number
TWI538588B
TWI538588B TW103144136A TW103144136A TWI538588B TW I538588 B TWI538588 B TW I538588B TW 103144136 A TW103144136 A TW 103144136A TW 103144136 A TW103144136 A TW 103144136A TW I538588 B TWI538588 B TW I538588B
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metal
metal paste
substrate
manufacturing
sintering
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TW103144136A
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Chinese (zh)
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TW201625092A (en
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黃銘鋒
陳靖儀
譚祖榮
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晶越微波積體電路製造股份有限公司
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Publication of TW201625092A publication Critical patent/TW201625092A/en

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Description

氣密金屬導孔之製造方法 Method for manufacturing gas tight metal guide hole

本發明為一種金屬導孔之製造方法,特別為一種氣密金屬導孔之製造方法。 The invention relates to a method for manufacturing a metal via hole, in particular to a method for manufacturing a gas tight metal via hole.

所有的電子產品及其應用,幾乎都必須使用一個以上的基板,用以承載元件、佈設電子線路、以及形成必要之裝置連結。就電子線路的部份分析,由於需將基板表面積充分使用,一般皆使用多層板佈設電子線路,也因此各層基板之間電子線路的連結變得更加複雜,而也更加重要。 Almost all electronic products and their applications must use more than one substrate to carry components, route electronic circuits, and form the necessary device connections. As for the partial analysis of the electronic circuit, since the surface area of the substrate needs to be fully used, the electronic circuit is generally disposed using the multi-layer board, and thus the connection of the electronic circuits between the layers of the substrate becomes more complicated and more important.

於所有基板的製程中,各層基板之間電子線路的連結通常採用機械鑽孔或雷射鑽孔的方式形成導孔,再於導孔填入金屬物質以電性導通導孔之兩端,各層基板之電子線路再分別連接至導孔以形成整個基板上的完整電路。 In the process of all substrates, the connection of the electronic circuits between the layers of the substrate is usually formed by mechanical drilling or laser drilling, and the metal holes are filled in the guiding holes to electrically conduct the two ends of the guiding holes. The electronic circuitry of the substrate is then separately connected to the vias to form a complete circuit over the entire substrate.

然而,由於受限於金屬物質的溫度收縮特性,導孔內的金屬物質固化後,經常在內部留有孔隙,無法具備氣密特性,接著,當基板被使用在真空封裝製程時,就會有洩漏問題產生。因此,在使用多層式設計的基板時,通常需將上下導通之線路利 用層間平移錯位,避開直接貫通時的洩漏問題。但此方法必需於生胚基板上製作,對已燒結完成的熟胚基板,則完全無法使用。 However, due to the temperature shrinkage characteristics of the metal substance, the metal material in the via hole often has voids inside and cannot be hermetically sealed. Then, when the substrate is used in a vacuum packaging process, there is A leak problem arises. Therefore, when using a multi-layered substrate, it is usually necessary to connect the wires up and down. Displacement between layers is used to avoid leakage problems during direct penetration. However, this method must be fabricated on the green substrate, and it is completely unusable for the sintered mature substrate.

有鑑於此,如何開發創造出一個完全氣密的導孔之製造方法,不但可以應用於生胚基板之導孔製作,亦可以於燒結後的熟胚基板上製作氣密的導孔,便成為當代電子產業界的一個重要課題。 In view of this, how to develop a method for creating a completely airtight guide hole can be applied not only to the guide hole of the green substrate but also to the production of the airtight guide hole on the cooked mature substrate. An important topic in the contemporary electronics industry.

本發明為一種氣密金屬導孔之製造方法,其包括下列依序進行之步驟:提供一基板;形成金屬導孔;進行填孔;進行液體均壓緻密化;進行第一次燒結;印刷氣密金屬膏;印刷導線;以及進行第二次燒結。藉由本發明之實施,可以確保基板的金屬導孔之氣密而不會於封裝製程中產生洩漏,有效提高基板及其應用產品之可靠度。 The invention relates to a method for manufacturing a gas-tight metal via hole, which comprises the following steps of sequentially: providing a substrate; forming a metal via hole; performing hole filling; performing liquid pressure equalization; performing first sintering; printing gas a dense metal paste; a printed wire; and a second sintering. Through the implementation of the invention, the metal via hole of the substrate can be ensured to be airtight without causing leakage in the packaging process, thereby effectively improving the reliability of the substrate and the application product thereof.

本發明係提供一種氣密金屬導孔之製造方法,其包括有下列依序進行之步驟:提供一基板,其中基板具有一第一表面及與第一表面相對之一第二表面;形成金屬導孔,其係形成貫穿基板並貫通第一表面及第二表面之複數個金屬導孔(via);進行填孔,其係以一金屬膏充填每一金屬導孔;進行液體均壓緻密化,其係對基板以真空方式包覆一包膜,並以一液態流體對包膜後之基板均勻地以一特定壓力進行液體均壓緻密化,再進而移除包膜;進行第一次燒結,其係對基板進行燒結使該些金屬導孔內之金屬膏固化;印刷氣密金屬膏,其係於每一金屬導孔與第一表面及第二表面相接處印刷固著一氣密金屬膏,氣密金屬膏並與金屬 膏相貼合且電性相連接;印刷導線,其係於第一表面或第二表面印刷並固著至少一導線,導線並係電性連接氣密金屬膏且與至少一金屬導孔導電接通共同形成一電路;以及進行第二次燒結,其係對基板進行燒結使氣密金屬膏及導線固化。 The invention provides a method for manufacturing a gas-tight metal via hole, comprising the steps of: providing a substrate, wherein the substrate has a first surface and a second surface opposite to the first surface; forming a metal guide a hole, which is formed by a plurality of metal vias penetrating through the substrate and penetrating the first surface and the second surface; filling the holes, filling each metal via hole with a metal paste; performing liquid pressure equalization densification, The substrate is vacuum-coated with a coating film, and the coated substrate is uniformly densified by liquid pressure at a specific pressure with a liquid fluid, and then the coating is removed; the first sintering is performed. The method is characterized in that the substrate is sintered to cure the metal paste in the metal via holes; and the airtight metal paste is printed on the metal via hole and the first surface and the second surface are printed and fixed with a gas-tight metal paste. , airtight metal paste and metal The paste is bonded and electrically connected; the printed wire is printed on the first surface or the second surface and fixed with at least one wire, and the wire is electrically connected to the airtight metal paste and electrically connected to the at least one metal via hole A common circuit is formed; and a second sintering is performed, which is performed by sintering the substrate to cure the hermetic metal paste and the wire.

藉由本發明的實施,至少可達到下列進步功效: With the implementation of the present invention, at least the following advancements can be achieved:

一、確保基板的金屬導孔之氣密而不會於封裝製程中產生洩漏。 First, ensure that the metal via holes of the substrate are airtight without causing leakage in the packaging process.

二、可應用於燒結前之生胚基板及燒結後之熟胚基板。 Second, it can be applied to the raw germ substrate before sintering and the mature embryo substrate after sintering.

三、製作成本低廉,且不須使用昂貴的機器設備。 Third, the production cost is low, and it is not necessary to use expensive machinery and equipment.

四、有效提高基板及其應用產品之可靠度。 Fourth, effectively improve the reliability of the substrate and its application products.

為了使任何熟習相關技藝者了解本發明之技術內容並據以實施,且根據本說明書所揭露之內容、申請專利範圍及圖式,任何熟習相關技藝者可輕易地理解本發明相關之目的及優點,因此將在實施方法中詳細敘述本發明之詳細特徵以及優點。 In order to make those skilled in the art understand the technical content of the present invention and implement it, and according to the disclosure, the patent scope and the drawings, the related objects and advantages of the present invention can be easily understood by those skilled in the art. Therefore, the detailed features and advantages of the present invention will be described in detail in the embodiments.

10‧‧‧基板 10‧‧‧Substrate

11‧‧‧第一表面 11‧‧‧ first surface

12‧‧‧第二表面 12‧‧‧ second surface

20‧‧‧金屬導孔 20‧‧‧Metal Guide Hole

30‧‧‧金屬膏 30‧‧‧metal paste

40‧‧‧鋼版 40‧‧‧Steel

50‧‧‧真空吸引的方向 50‧‧‧The direction of vacuum attraction

60‧‧‧包膜 60‧‧‧ envelope

70‧‧‧特定壓力 70‧‧‧Special pressure

80‧‧‧氣密金屬膏 80‧‧‧Airtight metal paste

85‧‧‧網版 85‧‧‧Web Edition

86‧‧‧刮刀 86‧‧‧ scraper

90‧‧‧導線 90‧‧‧ wire

S100‧‧‧氣密金屬導孔之製造方法 S100‧‧‧Method for manufacturing airtight metal guide holes

S10‧‧‧提供一基板 S10‧‧‧ provides a substrate

S20‧‧‧形成金屬導孔 S20‧‧‧ forming metal guide holes

S30‧‧‧進行填孔 S30‧‧‧ fill holes

S40‧‧‧進行液體均壓緻密化 S40‧‧‧ Liquid pressure equalization

S50‧‧‧進行第一次燒結 S50‧‧‧First sintering

S60‧‧‧印刷氣密金屬膏 S60‧‧‧Printing airtight metal paste

S70‧‧‧印刷導線 S70‧‧‧Printed wire

S80‧‧‧進行第二次燒結 S80‧‧‧Second sintering

第1圖為本發明實施例之一種氣密金屬導孔之製造方法之步驟流程圖。 FIG. 1 is a flow chart showing the steps of a method for manufacturing a gas-tight metal via hole according to an embodiment of the present invention.

第2圖為本發明實施例之一種基板及金屬導孔之剖視示意圖。 FIG. 2 is a cross-sectional view showing a substrate and a metal via hole according to an embodiment of the present invention.

第3A圖為本發明實施例之一種形成有金屬導孔之基板,於金屬導孔填入金屬膏之剖視示意圖。 FIG. 3A is a cross-sectional view showing a substrate in which a metal via hole is formed and a metal paste is filled in the metal via hole according to an embodiment of the present invention.

第3B圖為本發明實施例之一種以鋼版及進行真空吸引而於金屬導孔填入金屬膏之剖視示意圖。 FIG. 3B is a schematic cross-sectional view showing a metal plate filled with a metal paste by a steel plate and vacuum suction according to an embodiment of the present invention.

第4圖為為本發明實施例之一種進行液體均壓緻密化步驟之示意 圖。 Figure 4 is a schematic view showing a step of performing liquid pressure equalization densification according to an embodiment of the present invention Figure.

第5A圖為本發明實施例之一種於金屬導孔與第一表面及第二表面相接處固著有氣密金屬膏之剖視圖。 FIG. 5A is a cross-sectional view showing a gas-tight metal paste adhered to a metal via hole at a first surface and a second surface according to an embodiment of the present invention.

第5B圖為本發明實施例之一種以網版印刷方式於金屬導孔與第一表面及第二表面相接處印刷固著氣密金屬膏之示意圖。 FIG. 5B is a schematic view showing a method of printing and fixing a gas-tight metal paste on a metal guide hole at a position where the metal guide hole is in contact with the first surface and the second surface by a screen printing method according to an embodiment of the invention.

第6圖為本發明實施例之一種具有相連接的金屬導孔、金屬膏、氣密金屬膏及導線之示意圖。 Figure 6 is a schematic view showing a metal via hole, a metal paste, a gas-tight metal paste, and a wire connected to each other according to an embodiment of the present invention.

【實施方法】 【Method of implementation】

如第1圖所示,本實施例為一種氣密金屬導孔之製造方法S100,其包括有下列依序進行之步驟:提供一基板(步驟S10);形成金屬導孔(步驟S20);進行填孔(步驟S30);進行液體均壓緻密化(步驟S40);進行第一次燒結(步驟S50);印刷氣密金屬膏(步驟S60);印刷導線(步驟S70);以及進行第二次燒結(步驟S80)。 As shown in FIG. 1 , the present embodiment is a method for manufacturing a gas-tight metal via hole, which includes the following steps: providing a substrate (step S10); forming a metal via hole (step S20); Filling the hole (step S30); performing liquid pressure equalization (step S40); performing the first sintering (step S50); printing the airtight metal paste (step S60); printing the wire (step S70); and performing the second time Sintering (step S80).

如第1圖及第2圖所示,提供一基板(步驟S10),其係以一基板10做為製造氣密金屬導孔20之基底,其中基板10具有一第一表面11及與第一表面11相對之一第二表面12。所使用之基板10可以為陶瓷基板,陶瓷基板具有堅固、耐高溫及不易變形之特性及優點。 As shown in FIG. 1 and FIG. 2, a substrate is provided (step S10), which uses a substrate 10 as a base for manufacturing a gas-tight metal via 20, wherein the substrate 10 has a first surface 11 and a first Surface 11 is opposite one of the second surfaces 12. The substrate 10 used may be a ceramic substrate having characteristics and advantages of being strong, resistant to high temperatures, and not easily deformed.

如第1圖及第2圖所示,形成金屬導孔(步驟S20),其係於基板10形成貫穿第一表面11及第二表面12之複數個金屬導孔20(via)。金屬導孔20形成之方式,係可以用雷射打孔、機械鑽孔或高壓液體鑽孔的方法進行。 As shown in FIGS. 1 and 2, a metal via hole is formed (step S20), and a plurality of metal via holes 20 that penetrate the first surface 11 and the second surface 12 are formed on the substrate 10. The metal via 20 can be formed by laser drilling, mechanical drilling or high pressure liquid drilling.

如第1圖及第3A圖所示,進行填孔(步驟S30),其係 其係以一金屬膏30充填並填滿每一個金屬導孔20。金屬膏30可以為銀、銅、金、鉑、鈀材質或上述最少二種材質之合金材質所形成。 As shown in Fig. 1 and Fig. 3A, a hole is filled (step S30), which is It is filled with a metal paste 30 and fills each of the metal via holes 20. The metal paste 30 may be formed of an alloy material of silver, copper, gold, platinum, palladium or at least two of the above materials.

如第1圖、第3A圖及第3B圖所示,進行填孔(步驟S30)之步驟實施時,也可以於第一表面11覆蓋鋼版(stencil)40,並於第二表面12進行真空吸引。如第3B圖所示,真空吸引的方向50,為對金屬導孔20充填金屬膏30之一側的相反側,並離開基板10的方向。 As shown in FIG. 1 , FIG. 3A and FIG. 3B , when the step of filling the hole (step S30 ) is performed, the stencil 40 may be covered on the first surface 11 and the vacuum may be applied to the second surface 12 . attract. As shown in FIG. 3B, the direction 50 of vacuum suction is the direction opposite to the side on which one side of the metal paste 30 is filled with the metal via 30, and is separated from the substrate 10.

進行填孔(步驟S30)之步所使用鋼版40係具有與該些金屬導孔20完全對應之複數個孔洞41,如此便可以將金屬膏30容易的導引填入每一個金屬導孔20之內,並將每一個金屬導孔20完全填滿。 The steel plate 40 used for the step of filling the holes (step S30) has a plurality of holes 41 completely corresponding to the metal guide holes 20, so that the metal paste 30 can be easily guided into each of the metal guide holes 20. Within, each metal via 20 is completely filled.

為使成本得到控制,所使用的鋼版40之大小,可以製作成為與基板10之大小相當,而鋼版40之厚度則可以到達恰使鋼版40於使用時不會彎曲變形或損壞之厚度即可。 In order to control the cost, the size of the steel plate 40 used can be made to be comparable to the size of the substrate 10, and the thickness of the steel plate 40 can reach a thickness that does not bend or damage the steel plate 40 when it is used. Just fine.

如第1圖及第4圖所示,進行液體均壓緻密化(步驟S40),其係對基板10以真空方式包覆包膜60,並以一液態流體對包膜60包覆後之基板10均勻地以一特定壓力70進行液體均壓緻密化(步驟S40),然後再進而移除包膜60。 As shown in FIGS. 1 and 4, liquid pressure equalization is performed (step S40), which is a substrate in which the coating film 60 is vacuum-coated on the substrate 10 and the coating film 60 is coated with a liquid fluid. 10 is uniformly subjected to liquid pressure equalization at a specific pressure 70 (step S40), and then the envelope 60 is further removed.

包膜60的使用材質並無特殊限定,可以選擇於進行液體均壓緻密化(步驟S40)之步驟中不會裂損,或不會與金屬膏30產生物理或化學反應之材質。 The material to be used for the envelope 60 is not particularly limited, and may be selected from materials which do not break in the step of performing liquid pressure equalization (step S40) or which do not physically or chemically react with the metal paste 30.

另一方面,進行液體均壓緻密化(步驟S40)之步驟中,液態流體所施加的特定壓力70,係可以為100psi以上之壓力。 如此,便可以具有足夠的壓力將填滿金屬導孔20之內的金屬膏30均勻的緻密化。 On the other hand, in the step of performing liquid pressure equalization (step S40), the specific pressure 70 applied by the liquid fluid may be a pressure of 100 psi or more. Thus, sufficient pressure can be applied to uniformly densify the metal paste 30 filled in the metal via 20 .

如的1圖所示,進行第一次燒結(步驟S50)(first sintering),其係對基板10進行燒結,使該些金屬導孔20內之金屬膏30固化。進行第一次燒結(步驟S50)之步驟所使用的溫度曲線(temperature profile)係無特殊之限定,可以應用僅需使金屬導孔20內之金屬膏30完全固化之溫度曲線即可。 As shown in Fig. 1, a first sintering (step S50) is performed to sinter the substrate 10 to cure the metal paste 30 in the metal vias 20. The temperature profile used in the step of performing the first sintering (step S50) is not particularly limited, and a temperature profile in which only the metal paste 30 in the metal via 20 is completely cured can be applied.

如第1圖及第5A圖所示,印刷氣密金屬膏(步驟S60),其係於每一金屬導孔20與第一表面11及第二表面12相接處印刷固著氣密金屬膏80,氣密金屬膏80並與金屬膏30相貼合且電性相連接。 As shown in FIG. 1 and FIG. 5A, a gas-tight metal paste is printed (step S60), and a metal-tight metal paste is printed and fixed at a position where each metal via 20 is in contact with the first surface 11 and the second surface 12. 80. The airtight metal paste 80 is adhered to the metal paste 30 and electrically connected.

如第1圖及第5A圖所示,印刷氣密金屬膏(步驟S60)之步驟所使用之氣密金屬膏80,係可以為銀、銅、金、鉑、鈀材質或上述最少二種材質之合金材質所形成。 As shown in FIGS. 1 and 5A, the hermetic metal paste 80 used in the step of printing the airtight metal paste (step S60) may be silver, copper, gold, platinum, palladium or at least two of the above materials. The alloy material is formed.

另外為了達到氣密,不論是由前述材質之何種材質所形成,氣密金屬膏80可以含有粒徑為0.8-1.2微米(micro-meter)或1微米以下的形成材質之金屬細粒。 Further, in order to achieve airtightness, the hermetic metal paste 80 may contain metal fine particles of a material having a particle diameter of 0.8 to 1.2 micrometers or less, or 1 micrometer or less, regardless of the material of the material.

如第1圖、第5A圖及第5B圖所示,印刷氣密金屬膏(步驟S60)之步驟係可以網版印刷的方式進行,如此,藉由網孔與所有金屬導孔20之位置完全對應的網版85,以及使用刮刀86輔助填入,氣密金屬膏80可以印刷並固著於該些金屬導孔20與第一表面11及第二表面12相接處之金屬膏30的表面上。 As shown in FIG. 1, FIG. 5A and FIG. 5B, the step of printing the airtight metal paste (step S60) can be performed by screen printing, such that the position of the mesh and all the metal vias 20 is completely Corresponding screens 85, and the use of a doctor blade 86 to assist in filling, the airtight metal paste 80 can be printed and fixed on the surface of the metal paste 30 where the metal vias 20 meet the first surface 11 and the second surface 12 on.

接下來請參考如第1圖及第6圖所示,印刷導線(步驟S70),其係於第一表面11或第二表面12印刷並固著至少一導線 90,導線90並係電性連接氣密金屬膏80且與至少一金屬導孔20導電接通共同形成一電路。 Next, please refer to the printed wires (step S70), as shown in FIGS. 1 and 6, which are printed on the first surface 11 or the second surface 12 and fixed with at least one wire. 90. The wire 90 is electrically connected to the gas tight metal paste 80 and electrically connected to the at least one metal via hole 20 to form an electric circuit.

請再參考如第1圖所示,進行第二次燒結(步驟S80)(second sintering),其係對基板10進行燒結,並使氣密金屬膏80及導線90固化。進行第二次燒結(步驟S80)之步驟所使用的溫度曲線亦無特殊之限定,可以應用僅需使氣密金屬膏80及導線90完全固化之溫度曲線即可。 Referring again to FIG. 1, a second sintering (step S80) is performed to sinter the substrate 10 and cure the hermetic metal paste 80 and the wires 90. The temperature profile used in the step of performing the second sintering (step S80) is also not particularly limited, and a temperature profile in which only the gas-tight metal paste 80 and the wire 90 are completely cured can be applied.

惟,進行第二次燒結(步驟S80)之步驟,其進行時間若過久將導致金屬膏30或氣密金屬膏80過度結晶而影響使用壽命或使用品質。為了避免金屬膏30或氣密金屬膏80過度結晶的現象產生,進行第二次燒結(步驟S80)之步驟,包括升溫及降溫的總時間可以選擇限定在2小時之內完成。 However, the second sintering step (step S80) is carried out, and if the time is too long, the metal paste 30 or the gas-tight metal paste 80 is excessively crystallized to affect the service life or the quality of use. In order to avoid the occurrence of the phenomenon that the metal paste 30 or the gas-tight metal paste 80 is excessively crystallized, the second sintering (step S80) step, the total time including the temperature rise and the temperature drop may be selected to be completed within 2 hours.

綜上所述,氣密金屬導孔之製造方法S100所製造形成之基板10,因為具有確實填滿金屬導孔20的金屬膏30,與密接覆蓋於金屬導孔20的金屬膏30之上的氣密金屬膏80,再加上氣密金屬膏80可以含有粒徑為0.8-1.2微米(micro-meter)或1微米以下的形成材質之金屬細粒的特性,不但可以確保金屬導孔20、金屬膏30與氣密金屬膏80的氣密,大幅提高其應用可靠度。更由於製程採用進行第一次燒結(步驟S50)及進行第二次燒結(步驟S80)共2次的燒結(sintering)步驟,而可以應用於燒結前之生胚基板及燒結後之熟胚基板的製作,大大增加了氣密金屬導孔之製造方法S100的產業利用性。 In summary, the substrate 10 formed by the method for manufacturing the hermetic metal via hole S100 has a metal paste 30 which is filled with the metal via hole 20 and is adhered to the metal paste 30 which is covered with the metal via hole 20. The gas-tight metal paste 80, together with the gas-tight metal paste 80, may contain a metal fine particle having a particle diameter of 0.8 to 1.2 micrometers or less, which can form a metal via hole, The airtightness of the metal paste 30 and the airtight metal paste 80 greatly improves the reliability of application. Further, since the process employs a sintering process in which the first sintering (step S50) and the second sintering (step S80) are performed twice, it can be applied to the raw substrate before sintering and the cooked mature substrate after sintering. The production has greatly increased the industrial applicability of the manufacturing method of the airtight metal guide hole S100.

惟上述各實施例係用以說明本發明之特點,其目的在使熟習該技術者能瞭解本發明之內容並據以實施,而非限定本 發明之專利範圍,故凡其他未脫離本發明所揭示之精神而完成之等效修飾或修改,仍應包含在以下所述之申請專利範圍中。 The embodiments are described to illustrate the features of the present invention, and the purpose of the present invention is to enable those skilled in the art to understand the contents of the present invention and The scope of the invention is to be construed as being limited by the scope of the appended claims.

S100‧‧‧氣密金屬導孔之製造方法 S100‧‧‧Method for manufacturing airtight metal guide holes

S10‧‧‧提供一基板 S10‧‧‧ provides a substrate

S20‧‧‧形成金屬導孔 S20‧‧‧ forming metal guide holes

S30‧‧‧進行填孔 S30‧‧‧ fill holes

S40‧‧‧進行液體均壓緻密化 S40‧‧‧ Liquid pressure equalization

S50‧‧‧進行第一次燒結 S50‧‧‧First sintering

S60‧‧‧印刷氣密金屬膏 S60‧‧‧Printing airtight metal paste

S70‧‧‧印刷導線 S70‧‧‧Printed wire

S80‧‧‧進行第二次燒結 S80‧‧‧Second sintering

Claims (10)

一種氣密金屬導孔之製作方法,其包括有下列依序進行之步驟:提供一基板,其中該基板具有一第一表面及與該第一表面相對之一第二表面;形成金屬導孔,其係形成貫穿該基板並貫通該第一表面及該第二表面之複數個金屬導孔(via);進行填孔,其係以一金屬膏充填每一該金屬導孔;進行液體均壓緻密化,其係對該基板以真空方式包覆一包膜,並以一液態流體對包膜包覆後之該基板均勻地以一特定壓力進行液體均壓緻密化,再進而移除該包膜;進行第一次燒結,其係對該基板進行燒結使該些金屬導孔內之該金屬膏固化;印刷氣密金屬膏,其係於每一該金屬導孔與該第一表面及該第二表面相接處印刷固著一氣密金屬膏,該氣密金屬膏並與該金屬膏相貼合且電性相連接;印刷導線,其係於該第一表面或該第二表面印刷並固著至少一導線,該導線並係電性連接該氣密金屬膏且與至少一該金屬導孔導電接共同通形成一電路;以及進行第二次燒結,其係對該基板進行燒結使該氣密金屬膏及該導線固化。 A method for manufacturing a gas-tight metal via hole, comprising the steps of: providing a substrate, wherein the substrate has a first surface and a second surface opposite to the first surface; forming a metal via hole, Forming a plurality of metal vias penetrating the substrate and penetrating the first surface and the second surface; filling the holes, filling each of the metal via holes with a metal paste; performing liquid pressure compaction The substrate is vacuum-coated with a coating film, and the substrate coated with a liquid fluid is uniformly coated with a specific pressure to densify the liquid, and then the coating is removed. Performing a first sintering by sintering the substrate to cure the metal paste in the metal vias; printing a gas-tight metal paste on each of the metal vias and the first surface and the first A gas-tight metal paste is printed and fixed on the surface of the two surfaces, and the air-tight metal paste is adhered to and electrically connected to the metal paste; and the printed wire is printed on the first surface or the second surface and fixed At least one wire that is electrically connected And hermetically connected to the metal paste and at least one of the metal guide hole formed on a common conductive ground circuit; and a second sintering, which line the substrate by sintering the metal paste and the lead airtight cured. 如申請專利範圍第1項所述之製造方法,其中該基板係為一陶瓷基板。 The manufacturing method according to claim 1, wherein the substrate is a ceramic substrate. 如申請專利範圍第1項所述之製造方法,其中該些金屬導孔隙 以雷射或機械鑽孔方式所形成。 The manufacturing method of claim 1, wherein the metal conducting pores It is formed by laser or mechanical drilling. 如申請專利範圍第1項所述之製造方法,其中該進行填孔之步驟係於該第一表面覆蓋一鋼版(stencil),並於該第二表面進行真空吸引,其中該鋼版係具有與該些金屬導孔完全對應之複數個孔洞。 The manufacturing method of claim 1, wherein the step of filling the hole is performed by covering the first surface with a stencil and performing vacuum suction on the second surface, wherein the steel plate has a plurality of holes completely corresponding to the metal via holes. 如申請專利範圍第1項所述之製造方法,其中該特定壓力為100psi以上之壓力。 The manufacturing method of claim 1, wherein the specific pressure is a pressure of 100 psi or more. 如申請專利範圍第1項所述之製造方法,其中該印刷氣密金屬膏步驟係以網版印刷方式進行,且該氣密金屬膏係印刷並固著於該些金屬導孔與該第一表面及該第二表面相接處之該金屬膏的表面上。 The manufacturing method of claim 1, wherein the printing the airtight metal paste step is performed by screen printing, and the airtight metal paste is printed and fixed to the metal vias and the first The surface and the second surface meet on the surface of the metal paste. 如申請專利範圍第1項所述之製造方法,其中該氣密金屬膏係至少包含複數個粒徑為0.8-1.2微米(micro-meter)或1微米以下之金屬細粒。 The manufacturing method according to claim 1, wherein the hermetic metal paste contains at least a plurality of metal fine particles having a particle diameter of 0.8 to 1.2 micrometers or less. 如申請專利範圍第1項所述之製造方法,其中該進行第二次燒結之步驟係於2小時內完成,以避免該氣密金屬膏或該金屬膏產生過度結晶。 The manufacturing method according to claim 1, wherein the step of performing the second sintering is completed within 2 hours to avoid excessive crystallization of the hermetic metal paste or the metal paste. 如申請專利範圍第1項所述之製造方法,其中該金屬膏係為銀、銅、金、鉑、鈀或上述最少二種之合金材質所形成。 The manufacturing method according to claim 1, wherein the metal paste is formed of silver, copper, gold, platinum, palladium or at least two of the above alloy materials. 如申請專利範圍第1項或第7項所述之製造方法,其中該氣密金屬膏係為銀、銅、金、鉑、鈀材質或上述最少二種材質之合金材質所形成。 The manufacturing method according to claim 1 or 7, wherein the airtight metal paste is formed of an alloy material of silver, copper, gold, platinum, palladium or at least two of the foregoing materials.
TW103144136A 2014-12-17 2014-12-17 Production method for airtight via of a substrate TWI538588B (en)

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