[go: up one dir, main page]

TWI534940B - 高傳導靜電夾盤 - Google Patents

高傳導靜電夾盤 Download PDF

Info

Publication number
TWI534940B
TWI534940B TW100132405A TW100132405A TWI534940B TW I534940 B TWI534940 B TW I534940B TW 100132405 A TW100132405 A TW 100132405A TW 100132405 A TW100132405 A TW 100132405A TW I534940 B TWI534940 B TW I534940B
Authority
TW
Taiwan
Prior art keywords
electrostatic chuck
conductive
conductive path
workpiece
field region
Prior art date
Application number
TW100132405A
Other languages
English (en)
Chinese (zh)
Other versions
TW201216406A (en
Inventor
大衛 蘇羅納
盧德米拉 史東
朱立安 布雷克
戴爾Ｋ 史東
理查Ａ 庫克
史蒂芬 唐涅爾
香德拉 凡卡拉曼
Original Assignee
恩特格林斯公司
維瑞安半導體設備公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 恩特格林斯公司, 維瑞安半導體設備公司 filed Critical 恩特格林斯公司
Publication of TW201216406A publication Critical patent/TW201216406A/zh
Application granted granted Critical
Publication of TWI534940B publication Critical patent/TWI534940B/zh

Links

Classifications

    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02N—ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR
    • H02N13/00—Clutches or holding devices using electrostatic attraction, e.g. using Johnson-Rahbek effect
    • H10P72/70—
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23Q—DETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
    • B23Q3/00—Devices holding, supporting, or positioning work or tools, of a kind normally removable from the machine
    • B23Q3/15—Devices for holding work using magnetic or electric force acting directly on the work
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23Q—DETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
    • B23Q3/00—Devices holding, supporting, or positioning work or tools, of a kind normally removable from the machine
    • B23Q3/15—Devices for holding work using magnetic or electric force acting directly on the work
    • B23Q3/152—Rotary devices
    • H10P72/72—
    • H10P72/722—
    • H10P72/76—

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Jigs For Machine Tools (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Gasket Seals (AREA)
TW100132405A 2010-09-08 2011-09-08 高傳導靜電夾盤 TWI534940B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US38097010P 2010-09-08 2010-09-08
US201161509970P 2011-07-20 2011-07-20

Publications (2)

Publication Number Publication Date
TW201216406A TW201216406A (en) 2012-04-16
TWI534940B true TWI534940B (zh) 2016-05-21

Family

ID=45811160

Family Applications (1)

Application Number Title Priority Date Filing Date
TW100132405A TWI534940B (zh) 2010-09-08 2011-09-08 高傳導靜電夾盤

Country Status (7)

Country Link
US (1) US9692325B2 (fr)
JP (1) JP5796076B2 (fr)
KR (1) KR101896127B1 (fr)
CN (1) CN103222043B (fr)
SG (1) SG188434A1 (fr)
TW (1) TWI534940B (fr)
WO (1) WO2012033922A2 (fr)

Families Citing this family (41)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010514558A (ja) * 2006-12-26 2010-05-06 フジフィルム ディマティックス， インコーポレイテッド 導電性要素を有するプリントシステム
TWI475594B (zh) 2008-05-19 2015-03-01 恩特格林斯公司 靜電夾頭
WO2014070764A1 (fr) 2012-11-02 2014-05-08 Entegris, Inc. Mandrin électrostatique possédant une surface de contact à saillie souple pouvant être configurée à la lumière
KR101680787B1 (ko) 2009-05-15 2016-11-29 엔테그리스, 아이엔씨. 중합체 돌기들을 가지는 정전 척
US8861170B2 (en) 2009-05-15 2014-10-14 Entegris, Inc. Electrostatic chuck with photo-patternable soft protrusion contact surface
US9025305B2 (en) 2010-05-28 2015-05-05 Entegris, Inc. High surface resistivity electrostatic chuck
JP5796076B2 (ja) * 2010-09-08 2015-10-21 インテグリス・インコーポレーテッド 高導電性静電チャック
US9147593B2 (en) * 2012-10-10 2015-09-29 Lam Research Ag Apparatus for liquid treatment of wafer shaped articles
WO2014084060A1 (fr) * 2012-11-28 2014-06-05 京セラ株式会社 Elément de placement et procédé pour fabriquer celui-ci
WO2014126896A1 (fr) * 2013-02-13 2014-08-21 Entegris, Inc. Plateau à vide muni de bossages en polymère
WO2015020810A1 (fr) * 2013-08-05 2015-02-12 Applied Materials, Inc. Support électrostatique pour manipulation de substrat mince
JP6527524B2 (ja) 2014-02-07 2019-06-05 インテグリス・インコーポレーテッド 静電チャックおよびその作製方法
WO2015192256A1 (fr) * 2014-06-17 2015-12-23 Evatec Ag Mandrin électrostatique à dérivation à radiofréquence
US10325800B2 (en) 2014-08-26 2019-06-18 Applied Materials, Inc. High temperature electrostatic chucking with dielectric constant engineered in-situ charge trap materials
US10978334B2 (en) * 2014-09-02 2021-04-13 Applied Materials, Inc. Sealing structure for workpiece to substrate bonding in a processing chamber
WO2016153582A1 (fr) * 2015-03-20 2016-09-29 Applied Materials, Inc. Mandrin électrostatique en céramique lié par liaison polymère haute température à une base métallique
US9999947B2 (en) * 2015-05-01 2018-06-19 Component Re-Engineering Company, Inc. Method for repairing heaters and chucks used in semiconductor processing
US9623679B1 (en) * 2015-11-18 2017-04-18 Xerox Corporation Electrostatic platen for conductive pet film printing
KR101710010B1 (ko) * 2015-12-30 2017-02-24 성균관대학교산학협력단 문서의 상대적 특징을 반영한 문서 요약 방법 및 시스템
NL2019191A (en) * 2016-07-06 2018-01-11 Stichting Nederlandse Wetenschappelijk Onderzoek Inst A Substrate Holder and a Method of Manufacturing a Substrate Holder.
US11289355B2 (en) 2017-06-02 2022-03-29 Lam Research Corporation Electrostatic chuck for use in semiconductor processing
US11469084B2 (en) 2017-09-05 2022-10-11 Lam Research Corporation High temperature RF connection with integral thermal choke
CN111095522A (zh) * 2017-10-09 2020-05-01 应用材料公司 用于无损衬底处理的静电吸盘
KR102655866B1 (ko) 2018-01-31 2024-04-05 램 리써치 코포레이션 정전 척 (electrostatic chuck, ESC) 페데스탈 전압 분리
US11086233B2 (en) * 2018-03-20 2021-08-10 Lam Research Corporation Protective coating for electrostatic chucks
JP7170449B2 (ja) * 2018-07-30 2022-11-14 東京エレクトロン株式会社 載置台機構、処理装置及び載置台機構の動作方法
US11183368B2 (en) 2018-08-02 2021-11-23 Lam Research Corporation RF tuning systems including tuning circuits having impedances for setting and adjusting parameters of electrodes in electrostatic chucks
EP3884513A4 (fr) * 2018-11-19 2022-08-03 Entegris, Inc. Mandrin électrostatique avec revêtement de dissipation de charge
WO2020117371A1 (fr) * 2018-12-07 2020-06-11 Applied Materials, Inc. Électrode de masse formée dans un porte-substrat électrostatique pour une chambre de traitement au plasma
TWI762978B (zh) * 2019-07-24 2022-05-01 美商恩特葛瑞斯股份有限公司 用於多層之靜電吸盤之接地機構及相關之方法
KR20210089375A (ko) 2020-01-08 2021-07-16 주식회사 미코세라믹스 정전척
US11069554B1 (en) * 2020-01-22 2021-07-20 Applied Materials, Inc. Carbon nanotube electrostatic chuck
KR102787404B1 (ko) * 2020-09-02 2025-03-28 엔테그리스, 아이엔씨. 다이아몬드-유사 탄소 및 침착된 규소-기재 물질을 포함하는 엠보싱을 갖는 정전 척, 및 관련 방법
EP4057068A1 (fr) * 2021-03-09 2022-09-14 ASML Netherlands B.V. Appareil comprenant une pince électrostatique et procédé
JP7303249B2 (ja) 2021-06-30 2023-07-04 新光電気工業株式会社 静電チャック及び基板固定装置
FR3125355A1 (fr) * 2021-07-19 2023-01-20 Soitec Agencement de dispositif de maintien pour une utilisation dans un processus d'implantation d'un substrat piézoélectrique
CN113894720B (zh) * 2021-10-20 2024-09-13 华能(大连)热电有限责任公司 一种汽封弧段固定方法及其固定装置
US12500109B2 (en) 2021-10-28 2025-12-16 Entegris, Inc. Electrostatic chuck that includes upper ceramic layer that includes a dielectric layer, and related methods and structures
CN118696406A (zh) * 2022-02-28 2024-09-24 恩特格里斯公司 具有电荷消散结构的静电卡盘
JP2023180522A (ja) * 2022-06-09 2023-12-21 新光電気工業株式会社 基板固定装置及び基板固定装置の製造方法
WO2025258496A1 (fr) * 2024-06-13 2025-12-18 京セラ株式会社 Porte-échantillon

Family Cites Families (33)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0717153Y2 (ja) 1988-07-15 1995-04-19 日本電子株式会社 静電チャック装置
US5452177A (en) 1990-06-08 1995-09-19 Varian Associates, Inc. Electrostatic wafer clamp
JPH0563063A (ja) 1991-09-02 1993-03-12 Nikon Corp 静電チヤツク装置
JPH08316298A (ja) 1995-05-11 1996-11-29 Souzou Kagaku:Kk 静電チャック
US6370007B2 (en) 1995-09-20 2002-04-09 Hitachi, Ltd. Electrostatic chuck
US6117246A (en) 1997-01-31 2000-09-12 Applied Materials, Inc. Conductive polymer pad for supporting a workpiece upon a workpiece support surface of an electrostatic chuck
JP2000183146A (ja) 1998-12-18 2000-06-30 Ibiden Co Ltd 静電チャック
KR100511854B1 (ko) * 2002-06-18 2005-09-02 아네르바 가부시키가이샤 정전 흡착 장치
JP4010541B2 (ja) * 2002-06-18 2007-11-21 キヤノンアネルバ株式会社 静電吸着装置
EP1391786B1 (fr) * 2002-08-23 2010-10-06 ASML Netherlands B.V. Support, appareil lithographique et méthode de fabrication d'un dispositif
CN100388434C (zh) * 2003-03-12 2008-05-14 东京毅力科创株式会社 半导体处理用的基板保持结构和等离子体处理装置
JP2004349663A (ja) * 2003-05-23 2004-12-09 Creative Technology:Kk 静電チャック
JP2005005001A (ja) * 2003-06-09 2005-01-06 Daicel Chem Ind Ltd 導電ペースト
US6946403B2 (en) * 2003-10-28 2005-09-20 Axcelis Technologies, Inc. Method of making a MEMS electrostatic chuck
TWI274394B (en) 2003-11-14 2007-02-21 Advanced Display Proc Eng Co Electrostatic chuck with support balls as contact plane, substrate support, clamp for substrate fixation, and electrode structure, and fabrication method thereof
JP4349952B2 (ja) 2004-03-24 2009-10-21 京セラ株式会社 ウェハ支持部材とその製造方法
JP2006040993A (ja) * 2004-07-23 2006-02-09 Nikon Corp 静電チャック
WO2006049085A1 (fr) * 2004-11-04 2006-05-11 Ulvac, Inc. Appareil à mandrin électrostatique
TW200721244A (en) 2005-11-17 2007-06-01 Beam Corp E Substrate treatment apparatus and substrate treatment method
JP5289307B2 (ja) * 2006-06-02 2013-09-11 スルザー メタプラス ゲーエムベーハー 基板ホルダーによる金属汚染を防止する方法
JP4890421B2 (ja) 2006-10-31 2012-03-07 太平洋セメント株式会社 静電チャック
JP2008210913A (ja) 2007-02-26 2008-09-11 Creative Technology:Kk 静電チャック
JP2008251737A (ja) * 2007-03-29 2008-10-16 Tomoegawa Paper Co Ltd 静電チャック装置用電極部材ならびにそれを用いた静電チャック装置および静電吸着解除方法
US8051548B2 (en) 2007-09-06 2011-11-08 Creative Technology Corporation Method of manufacturing an electrostatic chuck
US7649729B2 (en) 2007-10-12 2010-01-19 Applied Materials, Inc. Electrostatic chuck assembly
TWI475594B (zh) * 2008-05-19 2015-03-01 恩特格林斯公司 靜電夾頭
US8169768B1 (en) * 2008-06-09 2012-05-01 Kla-Tencor Corporation Electrostatic chuck
KR100903306B1 (ko) 2008-10-08 2009-06-16 주식회사 아이피에스 진공처리장치
US8139340B2 (en) * 2009-01-20 2012-03-20 Plasma-Therm Llc Conductive seal ring electrostatic chuck
US8531814B2 (en) * 2009-04-16 2013-09-10 Varian Semiconductor Equipment Associates, Inc. Removal of charge between a substrate and an electrostatic clamp
KR101680787B1 (ko) 2009-05-15 2016-11-29 엔테그리스, 아이엔씨. 중합체 돌기들을 가지는 정전 척
US8861170B2 (en) * 2009-05-15 2014-10-14 Entegris, Inc. Electrostatic chuck with photo-patternable soft protrusion contact surface
JP5796076B2 (ja) * 2010-09-08 2015-10-21 インテグリス・インコーポレーテッド 高導電性静電チャック

Also Published As

Publication number Publication date
KR101896127B1 (ko) 2018-09-07
JP2013542590A (ja) 2013-11-21
US9692325B2 (en) 2017-06-27
JP5796076B2 (ja) 2015-10-21
US20130155569A1 (en) 2013-06-20
KR20140012613A (ko) 2014-02-03
WO2012033922A3 (fr) 2012-05-31
CN103222043A (zh) 2013-07-24
WO2012033922A2 (fr) 2012-03-15
SG188434A1 (en) 2013-05-31
TW201216406A (en) 2012-04-16
CN103222043B (zh) 2016-10-12

Similar Documents

Publication Publication Date Title
TWI534940B (zh) 高傳導靜電夾盤
TWI740278B (zh) 具有電荷消散塗層之靜電卡盤
TWI534945B (zh) 具有聚合物突出物的靜電吸盤
KR100511854B1 (ko) 정전 흡착 장치
EP1070381B1 (fr) Pince electrostatique pour plaquettes a faible contamination particulaire des plaquettes
CN101802998B (zh) 静电夹具
KR101731136B1 (ko) 표면저항이 높은 정전 척
US20100104403A1 (en) Apparatus for transferring a wafer
KR20170026360A (ko) 무선 주파수 션트를 구비한 정전척
US12046502B2 (en) Electrostatic puck and method of manufacture
KR20050054950A (ko) 미립자 발생도가 낮은 정전기 척 및 그의 제조 방법