TWI532880B - A surface treatment agent for a laminated metal material, and a method for producing a laminated metal material - Google Patents
A surface treatment agent for a laminated metal material, and a method for producing a laminated metal material Download PDFInfo
- Publication number
- TWI532880B TWI532880B TW099137244A TW99137244A TWI532880B TW I532880 B TWI532880 B TW I532880B TW 099137244 A TW099137244 A TW 099137244A TW 99137244 A TW99137244 A TW 99137244A TW I532880 B TWI532880 B TW I532880B
- Authority
- TW
- Taiwan
- Prior art keywords
- compound
- surface treatment
- metal material
- film
- treatment agent
- Prior art date
Links
- 239000007769 metal material Substances 0.000 title claims description 73
- 239000012756 surface treatment agent Substances 0.000 title claims description 72
- 238000004519 manufacturing process Methods 0.000 title claims description 15
- 150000001875 compounds Chemical class 0.000 claims description 91
- DIOQZVSQGTUSAI-UHFFFAOYSA-N decane Chemical compound CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 claims description 66
- 125000002091 cationic group Chemical group 0.000 claims description 51
- 229910052751 metal Inorganic materials 0.000 claims description 36
- 239000002184 metal Substances 0.000 claims description 36
- -1 polypropylene Polymers 0.000 claims description 36
- 229920005989 resin Polymers 0.000 claims description 36
- 239000011347 resin Substances 0.000 claims description 36
- 239000007822 coupling agent Substances 0.000 claims description 34
- 229910052731 fluorine Inorganic materials 0.000 claims description 31
- 229920002803 thermoplastic polyurethane Polymers 0.000 claims description 31
- 238000002156 mixing Methods 0.000 claims description 24
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims description 23
- 239000011737 fluorine Substances 0.000 claims description 23
- 125000000524 functional group Chemical group 0.000 claims description 19
- 150000002484 inorganic compounds Chemical class 0.000 claims description 17
- 229910010272 inorganic material Inorganic materials 0.000 claims description 17
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 claims description 16
- 239000011888 foil Substances 0.000 claims description 16
- 229910052782 aluminium Inorganic materials 0.000 claims description 10
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 10
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 claims description 8
- 125000001153 fluoro group Chemical group F* 0.000 claims description 8
- 239000010935 stainless steel Substances 0.000 claims description 8
- 229910001220 stainless steel Inorganic materials 0.000 claims description 8
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 claims description 7
- 125000001302 tertiary amino group Chemical group 0.000 claims description 7
- 125000003277 amino group Chemical group 0.000 claims description 5
- 125000000467 secondary amino group Chemical group [H]N([*:1])[*:2] 0.000 claims description 5
- 239000004743 Polypropylene Substances 0.000 claims description 4
- 229920001225 polyester resin Polymers 0.000 claims description 4
- 239000004645 polyester resin Substances 0.000 claims description 4
- 229920001155 polypropylene Polymers 0.000 claims description 4
- 125000001453 quaternary ammonium group Chemical group 0.000 claims description 4
- 229920013716 polyethylene resin Polymers 0.000 claims description 3
- 239000010936 titanium Substances 0.000 description 33
- 238000004381 surface treatment Methods 0.000 description 29
- 238000000034 method Methods 0.000 description 28
- 230000007797 corrosion Effects 0.000 description 26
- 238000005260 corrosion Methods 0.000 description 26
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 21
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 19
- 238000006243 chemical reaction Methods 0.000 description 19
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 18
- 230000000694 effects Effects 0.000 description 15
- 239000000463 material Substances 0.000 description 15
- 238000012545 processing Methods 0.000 description 15
- 239000002253 acid Substances 0.000 description 14
- 238000000576 coating method Methods 0.000 description 14
- 238000003475 lamination Methods 0.000 description 13
- 239000010455 vermiculite Substances 0.000 description 13
- 235000019354 vermiculite Nutrition 0.000 description 13
- 229910052902 vermiculite Inorganic materials 0.000 description 13
- 239000011248 coating agent Substances 0.000 description 12
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 12
- 239000000126 substance Substances 0.000 description 12
- 230000008569 process Effects 0.000 description 11
- 238000012360 testing method Methods 0.000 description 11
- 150000002736 metal compounds Chemical class 0.000 description 10
- 229920005862 polyol Polymers 0.000 description 10
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 9
- 230000000052 comparative effect Effects 0.000 description 9
- 150000003077 polyols Chemical class 0.000 description 9
- 239000003513 alkali Substances 0.000 description 8
- 239000002585 base Substances 0.000 description 8
- 238000011156 evaluation Methods 0.000 description 8
- 238000010030 laminating Methods 0.000 description 8
- 239000007788 liquid Substances 0.000 description 8
- 239000003795 chemical substances by application Substances 0.000 description 7
- 239000006185 dispersion Substances 0.000 description 7
- 229920005749 polyurethane resin Polymers 0.000 description 7
- 238000003860 storage Methods 0.000 description 7
- HBBGRARXTFLTSG-UHFFFAOYSA-N Lithium ion Chemical compound [Li+] HBBGRARXTFLTSG-UHFFFAOYSA-N 0.000 description 6
- 239000004721 Polyphenylene oxide Substances 0.000 description 6
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 6
- WERYXYBDKMZEQL-UHFFFAOYSA-N butane-1,4-diol Chemical compound OCCCCO WERYXYBDKMZEQL-UHFFFAOYSA-N 0.000 description 6
- 239000011651 chromium Substances 0.000 description 6
- 230000007613 environmental effect Effects 0.000 description 6
- 238000010438 heat treatment Methods 0.000 description 6
- NIMLQBUJDJZYEJ-UHFFFAOYSA-N isophorone diisocyanate Chemical compound CC1(C)CC(N=C=O)CC(C)(CN=C=O)C1 NIMLQBUJDJZYEJ-UHFFFAOYSA-N 0.000 description 6
- 229910001416 lithium ion Inorganic materials 0.000 description 6
- 239000005022 packaging material Substances 0.000 description 6
- 229920000515 polycarbonate Polymers 0.000 description 6
- 239000004417 polycarbonate Substances 0.000 description 6
- 229920000570 polyether Polymers 0.000 description 6
- 238000005406 washing Methods 0.000 description 6
- 229910000838 Al alloy Inorganic materials 0.000 description 5
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 5
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 5
- 229910019142 PO4 Inorganic materials 0.000 description 5
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 5
- 125000001931 aliphatic group Chemical group 0.000 description 5
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 5
- 238000013329 compounding Methods 0.000 description 5
- RRAMGCGOFNQTLD-UHFFFAOYSA-N hexamethylene diisocyanate Chemical compound O=C=NCCCCCCN=C=O RRAMGCGOFNQTLD-UHFFFAOYSA-N 0.000 description 5
- 239000011572 manganese Substances 0.000 description 5
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 5
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 5
- 235000021317 phosphate Nutrition 0.000 description 5
- 239000011701 zinc Substances 0.000 description 5
- 239000005057 Hexamethylene diisocyanate Substances 0.000 description 4
- 239000005058 Isophorone diisocyanate Substances 0.000 description 4
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 4
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 4
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 4
- 125000002723 alicyclic group Chemical group 0.000 description 4
- 238000001035 drying Methods 0.000 description 4
- QQVIHTHCMHWDBS-UHFFFAOYSA-N isophthalic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1 QQVIHTHCMHWDBS-UHFFFAOYSA-N 0.000 description 4
- 239000005001 laminate film Substances 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 239000010452 phosphate Substances 0.000 description 4
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 4
- 229920002635 polyurethane Polymers 0.000 description 4
- 239000004814 polyurethane Substances 0.000 description 4
- CXMXRPHRNRROMY-UHFFFAOYSA-N sebacic acid Chemical compound OC(=O)CCCCCCCCC(O)=O CXMXRPHRNRROMY-UHFFFAOYSA-N 0.000 description 4
- 239000011734 sodium Substances 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- 150000003512 tertiary amines Chemical group 0.000 description 4
- 229910052719 titanium Inorganic materials 0.000 description 4
- 229910052726 zirconium Inorganic materials 0.000 description 4
- OERNJTNJEZOPIA-UHFFFAOYSA-N zirconium nitrate Chemical compound [Zr+4].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O OERNJTNJEZOPIA-UHFFFAOYSA-N 0.000 description 4
- DNIAPMSPPWPWGF-VKHMYHEASA-N (+)-propylene glycol Chemical compound C[C@H](O)CO DNIAPMSPPWPWGF-VKHMYHEASA-N 0.000 description 3
- YPFDHNVEDLHUCE-UHFFFAOYSA-N 1,3-propanediol Substances OCCCO YPFDHNVEDLHUCE-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- 239000004593 Epoxy Substances 0.000 description 3
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 230000002378 acidificating effect Effects 0.000 description 3
- 239000000853 adhesive Substances 0.000 description 3
- 230000001070 adhesive effect Effects 0.000 description 3
- 230000002411 adverse Effects 0.000 description 3
- APUPEJJSWDHEBO-UHFFFAOYSA-P ammonium molybdate Chemical compound [NH4+].[NH4+].[O-][Mo]([O-])(=O)=O APUPEJJSWDHEBO-UHFFFAOYSA-P 0.000 description 3
- 239000011609 ammonium molybdate Substances 0.000 description 3
- 235000018660 ammonium molybdate Nutrition 0.000 description 3
- 229940010552 ammonium molybdate Drugs 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 3
- 125000003118 aryl group Chemical group 0.000 description 3
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 3
- HSJPMRKMPBAUAU-UHFFFAOYSA-N cerium(3+);trinitrate Chemical compound [Ce+3].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O HSJPMRKMPBAUAU-UHFFFAOYSA-N 0.000 description 3
- JOPOVCBBYLSVDA-UHFFFAOYSA-N chromium(6+) Chemical compound [Cr+6] JOPOVCBBYLSVDA-UHFFFAOYSA-N 0.000 description 3
- GVPFVAHMJGGAJG-UHFFFAOYSA-L cobalt dichloride Chemical compound [Cl-].[Cl-].[Co+2] GVPFVAHMJGGAJG-UHFFFAOYSA-L 0.000 description 3
- 239000003599 detergent Substances 0.000 description 3
- VAYGXNSJCAHWJZ-UHFFFAOYSA-N dimethyl sulfate Chemical compound COS(=O)(=O)OC VAYGXNSJCAHWJZ-UHFFFAOYSA-N 0.000 description 3
- 229940079593 drug Drugs 0.000 description 3
- 239000003814 drug Substances 0.000 description 3
- 238000001125 extrusion Methods 0.000 description 3
- 235000013305 food Nutrition 0.000 description 3
- XXMIOPMDWAUFGU-UHFFFAOYSA-N hexane-1,6-diol Chemical compound OCCCCCCO XXMIOPMDWAUFGU-UHFFFAOYSA-N 0.000 description 3
- 150000002596 lactones Chemical class 0.000 description 3
- 229920000728 polyester Polymers 0.000 description 3
- 229920005906 polyester polyol Polymers 0.000 description 3
- 239000005056 polyisocyanate Substances 0.000 description 3
- 229920001228 polyisocyanate Polymers 0.000 description 3
- 229920000166 polytrimethylene carbonate Polymers 0.000 description 3
- 150000003141 primary amines Chemical group 0.000 description 3
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- 239000004094 surface-active agent Substances 0.000 description 3
- PUPZLCDOIYMWBV-UHFFFAOYSA-N (+/-)-1,3-Butanediol Chemical compound CC(O)CCO PUPZLCDOIYMWBV-UHFFFAOYSA-N 0.000 description 2
- 239000005059 1,4-Cyclohexyldiisocyanate Substances 0.000 description 2
- OVBFMUAFNIIQAL-UHFFFAOYSA-N 1,4-diisocyanatobutane Chemical compound O=C=NCCCCN=C=O OVBFMUAFNIIQAL-UHFFFAOYSA-N 0.000 description 2
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 2
- MFAWEYJGIGIYFH-UHFFFAOYSA-N 2-[4-(trimethoxymethyl)dodecoxymethyl]oxirane Chemical compound C(C1CO1)OCCCC(C(OC)(OC)OC)CCCCCCCC MFAWEYJGIGIYFH-UHFFFAOYSA-N 0.000 description 2
- BWLBGMIXKSTLSX-UHFFFAOYSA-N 2-hydroxyisobutyric acid Chemical compound CC(C)(O)C(O)=O BWLBGMIXKSTLSX-UHFFFAOYSA-N 0.000 description 2
- WXUAQHNMJWJLTG-UHFFFAOYSA-N 2-methylbutanedioic acid Chemical compound OC(=O)C(C)CC(O)=O WXUAQHNMJWJLTG-UHFFFAOYSA-N 0.000 description 2
- SVTBMSDMJJWYQN-UHFFFAOYSA-N 2-methylpentane-2,4-diol Chemical compound CC(O)CC(C)(C)O SVTBMSDMJJWYQN-UHFFFAOYSA-N 0.000 description 2
- LBIHNTAFJVHBLJ-UHFFFAOYSA-N 3-(triethoxymethyl)undec-1-ene Chemical compound C(=C)C(C(OCC)(OCC)OCC)CCCCCCCC LBIHNTAFJVHBLJ-UHFFFAOYSA-N 0.000 description 2
- XJMMNTGIMDZPMU-UHFFFAOYSA-N 3-methylglutaric acid Chemical compound OC(=O)CC(C)CC(O)=O XJMMNTGIMDZPMU-UHFFFAOYSA-N 0.000 description 2
- SXPGQGNWEWPWQZ-UHFFFAOYSA-N 4-(triethoxymethyl)dodecan-1-amine Chemical compound NCCCC(C(OCC)(OCC)OCC)CCCCCCCC SXPGQGNWEWPWQZ-UHFFFAOYSA-N 0.000 description 2
- DFYGYTNMHPUJBY-UHFFFAOYSA-N 4-(trimethoxymethyl)dodecane-1-thiol Chemical compound SCCCC(C(OC)(OC)OC)CCCCCCCC DFYGYTNMHPUJBY-UHFFFAOYSA-N 0.000 description 2
- DDFHBQSCUXNBSA-UHFFFAOYSA-N 5-(5-carboxythiophen-2-yl)thiophene-2-carboxylic acid Chemical compound S1C(C(=O)O)=CC=C1C1=CC=C(C(O)=O)S1 DDFHBQSCUXNBSA-UHFFFAOYSA-N 0.000 description 2
- OZJPLYNZGCXSJM-UHFFFAOYSA-N 5-valerolactone Chemical compound O=C1CCCCO1 OZJPLYNZGCXSJM-UHFFFAOYSA-N 0.000 description 2
- 239000004925 Acrylic resin Substances 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- WRAGBEWQGHCDDU-UHFFFAOYSA-M C([O-])([O-])=O.[NH4+].[Zr+] Chemical compound C([O-])([O-])=O.[NH4+].[Zr+] WRAGBEWQGHCDDU-UHFFFAOYSA-M 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 2
- BGPRILKWLAIMJP-UHFFFAOYSA-N ClCCCC(C(OC)(OC)C)CCCCCCCC Chemical compound ClCCCC(C(OC)(OC)C)CCCCCCCC BGPRILKWLAIMJP-UHFFFAOYSA-N 0.000 description 2
- ROSDSFDQCJNGOL-UHFFFAOYSA-N Dimethylamine Chemical compound CNC ROSDSFDQCJNGOL-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 2
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 2
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 2
- KTGXWDZUZLWXOF-UHFFFAOYSA-N NCCNCCCC(C(OC)(OC)C)CCCCCCCC Chemical compound NCCNCCCC(C(OC)(OC)C)CCCCCCCC KTGXWDZUZLWXOF-UHFFFAOYSA-N 0.000 description 2
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- QOSMNYMQXIVWKY-UHFFFAOYSA-N Propyl levulinate Chemical compound CCCOC(=O)CCC(C)=O QOSMNYMQXIVWKY-UHFFFAOYSA-N 0.000 description 2
- GOOHAUXETOMSMM-UHFFFAOYSA-N Propylene oxide Chemical compound CC1CO1 GOOHAUXETOMSMM-UHFFFAOYSA-N 0.000 description 2
- KJNMFTZWJLGHIS-UHFFFAOYSA-N SCCCC(C(OC)(OC)C)CCCCCCCC Chemical compound SCCCC(C(OC)(OC)C)CCCCCCCC KJNMFTZWJLGHIS-UHFFFAOYSA-N 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 2
- KXBFLNPZHXDQLV-UHFFFAOYSA-N [cyclohexyl(diisocyanato)methyl]cyclohexane Chemical compound C1CCCCC1C(N=C=O)(N=C=O)C1CCCCC1 KXBFLNPZHXDQLV-UHFFFAOYSA-N 0.000 description 2
- 238000007792 addition Methods 0.000 description 2
- 239000001361 adipic acid Substances 0.000 description 2
- 235000011037 adipic acid Nutrition 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- 150000008064 anhydrides Chemical class 0.000 description 2
- 125000000129 anionic group Chemical group 0.000 description 2
- 125000004429 atom Chemical group 0.000 description 2
- HKVFISRIUUGTIB-UHFFFAOYSA-O azanium;cerium;nitrate Chemical compound [NH4+].[Ce].[O-][N+]([O-])=O HKVFISRIUUGTIB-UHFFFAOYSA-O 0.000 description 2
- TZCXTZWJZNENPQ-UHFFFAOYSA-L barium sulfate Chemical compound [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 description 2
- 239000010953 base metal Substances 0.000 description 2
- QMKYBPDZANOJGF-UHFFFAOYSA-N benzene-1,3,5-tricarboxylic acid Chemical compound OC(=O)C1=CC(C(O)=O)=CC(C(O)=O)=C1 QMKYBPDZANOJGF-UHFFFAOYSA-N 0.000 description 2
- XJHCXCQVJFPJIK-UHFFFAOYSA-M caesium fluoride Chemical compound [F-].[Cs+] XJHCXCQVJFPJIK-UHFFFAOYSA-M 0.000 description 2
- 229910000420 cerium oxide Inorganic materials 0.000 description 2
- PHFQLYPOURZARY-UHFFFAOYSA-N chromium trinitrate Chemical compound [Cr+3].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O PHFQLYPOURZARY-UHFFFAOYSA-N 0.000 description 2
- 229910000151 chromium(III) phosphate Inorganic materials 0.000 description 2
- IKZBVTPSNGOVRJ-UHFFFAOYSA-K chromium(iii) phosphate Chemical compound [Cr+3].[O-]P([O-])([O-])=O IKZBVTPSNGOVRJ-UHFFFAOYSA-K 0.000 description 2
- UFMZWBIQTDUYBN-UHFFFAOYSA-N cobalt dinitrate Chemical compound [Co+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O UFMZWBIQTDUYBN-UHFFFAOYSA-N 0.000 description 2
- 229910001981 cobalt nitrate Inorganic materials 0.000 description 2
- 239000013527 degreasing agent Substances 0.000 description 2
- 210000003298 dental enamel Anatomy 0.000 description 2
- PPQREHKVAOVYBT-UHFFFAOYSA-H dialuminum;tricarbonate Chemical compound [Al+3].[Al+3].[O-]C([O-])=O.[O-]C([O-])=O.[O-]C([O-])=O PPQREHKVAOVYBT-UHFFFAOYSA-H 0.000 description 2
- NMGYKLMMQCTUGI-UHFFFAOYSA-J diazanium;titanium(4+);hexafluoride Chemical compound [NH4+].[NH4+].[F-].[F-].[F-].[F-].[F-].[F-].[Ti+4] NMGYKLMMQCTUGI-UHFFFAOYSA-J 0.000 description 2
- 235000014113 dietary fatty acids Nutrition 0.000 description 2
- 125000005442 diisocyanate group Chemical group 0.000 description 2
- 239000000539 dimer Substances 0.000 description 2
- GNTDGMZSJNCJKK-UHFFFAOYSA-N divanadium pentaoxide Chemical compound O=[V](=O)O[V](=O)=O GNTDGMZSJNCJKK-UHFFFAOYSA-N 0.000 description 2
- AMGXTMFXWTXVHS-UHFFFAOYSA-J dodecanoate titanium(4+) Chemical compound [Ti+4].CCCCCCCCCCCC([O-])=O.CCCCCCCCCCCC([O-])=O.CCCCCCCCCCCC([O-])=O.CCCCCCCCCCCC([O-])=O AMGXTMFXWTXVHS-UHFFFAOYSA-J 0.000 description 2
- 238000005886 esterification reaction Methods 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- 239000000194 fatty acid Substances 0.000 description 2
- 229930195729 fatty acid Natural products 0.000 description 2
- JBFHTYHTHYHCDJ-UHFFFAOYSA-N gamma-caprolactone Chemical compound CCC1CCC(=O)O1 JBFHTYHTHYHCDJ-UHFFFAOYSA-N 0.000 description 2
- GAEKPEKOJKCEMS-UHFFFAOYSA-N gamma-valerolactone Chemical compound CC1CCC(=O)O1 GAEKPEKOJKCEMS-UHFFFAOYSA-N 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 2
- 150000004820 halides Chemical class 0.000 description 2
- MBAKFIZHTUAVJN-UHFFFAOYSA-I hexafluoroantimony(1-);hydron Chemical compound F.F[Sb](F)(F)(F)F MBAKFIZHTUAVJN-UHFFFAOYSA-I 0.000 description 2
- 230000007062 hydrolysis Effects 0.000 description 2
- 238000006460 hydrolysis reaction Methods 0.000 description 2
- AMWRITDGCCNYAT-UHFFFAOYSA-L hydroxy(oxo)manganese;manganese Chemical compound [Mn].O[Mn]=O.O[Mn]=O AMWRITDGCCNYAT-UHFFFAOYSA-L 0.000 description 2
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 239000011777 magnesium Substances 0.000 description 2
- YIXJRHPUWRPCBB-UHFFFAOYSA-N magnesium nitrate Chemical compound [Mg+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O YIXJRHPUWRPCBB-UHFFFAOYSA-N 0.000 description 2
- MMIPFLVOWGHZQD-UHFFFAOYSA-N manganese(3+) Chemical compound [Mn+3] MMIPFLVOWGHZQD-UHFFFAOYSA-N 0.000 description 2
- MEFBJEMVZONFCJ-UHFFFAOYSA-N molybdate Chemical compound [O-][Mo]([O-])(=O)=O MEFBJEMVZONFCJ-UHFFFAOYSA-N 0.000 description 2
- SLCVBVWXLSEKPL-UHFFFAOYSA-N neopentyl glycol Chemical compound OCC(C)(C)CO SLCVBVWXLSEKPL-UHFFFAOYSA-N 0.000 description 2
- 229910000008 nickel(II) carbonate Inorganic materials 0.000 description 2
- ZULUUIKRFGGGTL-UHFFFAOYSA-L nickel(ii) carbonate Chemical compound [Ni+2].[O-]C([O-])=O ZULUUIKRFGGGTL-UHFFFAOYSA-L 0.000 description 2
- 239000010955 niobium Substances 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- OEIJHBUUFURJLI-UHFFFAOYSA-N octane-1,8-diol Chemical compound OCCCCCCCCO OEIJHBUUFURJLI-UHFFFAOYSA-N 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 2
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 2
- WLJVNTCWHIRURA-UHFFFAOYSA-N pimelic acid Chemical compound OC(=O)CCCCCC(O)=O WLJVNTCWHIRURA-UHFFFAOYSA-N 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 235000013772 propylene glycol Nutrition 0.000 description 2
- CYIDZMCFTVVTJO-UHFFFAOYSA-N pyromellitic acid Chemical compound OC(=O)C1=CC(C(O)=O)=C(C(O)=O)C=C1C(O)=O CYIDZMCFTVVTJO-UHFFFAOYSA-N 0.000 description 2
- 239000011342 resin composition Substances 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 150000003335 secondary amines Chemical group 0.000 description 2
- 229910052708 sodium Inorganic materials 0.000 description 2
- 239000011780 sodium chloride Substances 0.000 description 2
- PUZPDOWCWNUUKD-UHFFFAOYSA-M sodium fluoride Chemical compound [F-].[Na+] PUZPDOWCWNUUKD-UHFFFAOYSA-M 0.000 description 2
- 239000011684 sodium molybdate Substances 0.000 description 2
- 235000015393 sodium molybdate Nutrition 0.000 description 2
- TVXXNOYZHKPKGW-UHFFFAOYSA-N sodium molybdate (anhydrous) Chemical compound [Na+].[Na+].[O-][Mo]([O-])(=O)=O TVXXNOYZHKPKGW-UHFFFAOYSA-N 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- TYFQFVWCELRYAO-UHFFFAOYSA-N suberic acid Chemical compound OC(=O)CCCCCCC(O)=O TYFQFVWCELRYAO-UHFFFAOYSA-N 0.000 description 2
- 125000001424 substituent group Chemical group 0.000 description 2
- DXIGZHYPWYIZLM-UHFFFAOYSA-J tetrafluorozirconium;dihydrofluoride Chemical compound F.F.F[Zr](F)(F)F DXIGZHYPWYIZLM-UHFFFAOYSA-J 0.000 description 2
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 2
- QDZRBIRIPNZRSG-UHFFFAOYSA-N titanium nitrate Chemical compound [O-][N+](=O)O[Ti](O[N+]([O-])=O)(O[N+]([O-])=O)O[N+]([O-])=O QDZRBIRIPNZRSG-UHFFFAOYSA-N 0.000 description 2
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 2
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 2
- ARCGXLSVLAOJQL-UHFFFAOYSA-N trimellitic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1 ARCGXLSVLAOJQL-UHFFFAOYSA-N 0.000 description 2
- 229910052720 vanadium Inorganic materials 0.000 description 2
- 229910052725 zinc Inorganic materials 0.000 description 2
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 description 2
- UAYWVJHJZHQCIE-UHFFFAOYSA-L zinc iodide Chemical compound I[Zn]I UAYWVJHJZHQCIE-UHFFFAOYSA-L 0.000 description 2
- 229910000166 zirconium phosphate Inorganic materials 0.000 description 2
- LEHFSLREWWMLPU-UHFFFAOYSA-B zirconium(4+);tetraphosphate Chemical compound [Zr+4].[Zr+4].[Zr+4].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O LEHFSLREWWMLPU-UHFFFAOYSA-B 0.000 description 2
- BNGXYYYYKUGPPF-UHFFFAOYSA-M (3-methylphenyl)methyl-triphenylphosphanium;chloride Chemical compound [Cl-].CC1=CC=CC(C[P+](C=2C=CC=CC=2)(C=2C=CC=CC=2)C=2C=CC=CC=2)=C1 BNGXYYYYKUGPPF-UHFFFAOYSA-M 0.000 description 1
- DNIAPMSPPWPWGF-GSVOUGTGSA-N (R)-(-)-Propylene glycol Chemical compound C[C@@H](O)CO DNIAPMSPPWPWGF-GSVOUGTGSA-N 0.000 description 1
- ANBBCZAIOXDZPV-UHFFFAOYSA-N 1,1,1-trimethoxy-2-methyldecane Chemical compound CC(C(OC)(OC)OC)CCCCCCCC ANBBCZAIOXDZPV-UHFFFAOYSA-N 0.000 description 1
- FRKBDVGTLHBNSN-UHFFFAOYSA-N 1,3,2,4lambda2-dioxazastannetidin-2-ium 2-oxide nitrate Chemical compound [Sn+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O FRKBDVGTLHBNSN-UHFFFAOYSA-N 0.000 description 1
- SBJCUZQNHOLYMD-UHFFFAOYSA-N 1,5-Naphthalene diisocyanate Chemical compound C1=CC=C2C(N=C=O)=CC=CC2=C1N=C=O SBJCUZQNHOLYMD-UHFFFAOYSA-N 0.000 description 1
- ALVZNPYWJMLXKV-UHFFFAOYSA-N 1,9-Nonanediol Chemical compound OCCCCCCCCCO ALVZNPYWJMLXKV-UHFFFAOYSA-N 0.000 description 1
- DGZPBRFJRXDRDD-UHFFFAOYSA-N 1-chloro-4-(triethoxymethyl)dodecane Chemical compound ClCCCC(C(OCC)(OCC)OCC)CCCCCCCC DGZPBRFJRXDRDD-UHFFFAOYSA-N 0.000 description 1
- LFSYUSUFCBOHGU-UHFFFAOYSA-N 1-isocyanato-2-[(4-isocyanatophenyl)methyl]benzene Chemical compound C1=CC(N=C=O)=CC=C1CC1=CC=CC=C1N=C=O LFSYUSUFCBOHGU-UHFFFAOYSA-N 0.000 description 1
- RTBFRGCFXZNCOE-UHFFFAOYSA-N 1-methylsulfonylpiperidin-4-one Chemical compound CS(=O)(=O)N1CCC(=O)CC1 RTBFRGCFXZNCOE-UHFFFAOYSA-N 0.000 description 1
- QFGCFKJIPBRJGM-UHFFFAOYSA-N 12-[(2-methylpropan-2-yl)oxy]-12-oxododecanoic acid Chemical compound CC(C)(C)OC(=O)CCCCCCCCCCC(O)=O QFGCFKJIPBRJGM-UHFFFAOYSA-N 0.000 description 1
- YTPFRRRNIYVFFE-UHFFFAOYSA-N 2,2,3,3,5,5-hexamethyl-1,4-dioxane Chemical compound CC1(C)COC(C)(C)C(C)(C)O1 YTPFRRRNIYVFFE-UHFFFAOYSA-N 0.000 description 1
- BRXKVEIJEXJBFF-UHFFFAOYSA-N 2,2-bis(hydroxymethyl)-3-methylbutane-1,4-diol Chemical compound OCC(C)C(CO)(CO)CO BRXKVEIJEXJBFF-UHFFFAOYSA-N 0.000 description 1
- GCZWJRLXIPVNLU-UHFFFAOYSA-N 2,2-dimethoxy-3-methylundecane Chemical compound CC(C(OC)(OC)C)CCCCCCCC GCZWJRLXIPVNLU-UHFFFAOYSA-N 0.000 description 1
- OJRJDENLRJHEJO-UHFFFAOYSA-N 2,4-diethylpentane-1,5-diol Chemical compound CCC(CO)CC(CC)CO OJRJDENLRJHEJO-UHFFFAOYSA-N 0.000 description 1
- JZUMVFMLJGSMRF-UHFFFAOYSA-N 2-Methyladipic acid Chemical compound OC(=O)C(C)CCCC(O)=O JZUMVFMLJGSMRF-UHFFFAOYSA-N 0.000 description 1
- LCZVSXRMYJUNFX-UHFFFAOYSA-N 2-[2-(2-hydroxypropoxy)propoxy]propan-1-ol Chemical compound CC(O)COC(C)COC(C)CO LCZVSXRMYJUNFX-UHFFFAOYSA-N 0.000 description 1
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 1
- DSKYSDCYIODJPC-UHFFFAOYSA-N 2-butyl-2-ethylpropane-1,3-diol Chemical compound CCCCC(CC)(CO)CO DSKYSDCYIODJPC-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- KIBVFIDMXQZCBS-UHFFFAOYSA-N 2-methyloctanedioic acid Chemical compound OC(=O)C(C)CCCCCC(O)=O KIBVFIDMXQZCBS-UHFFFAOYSA-N 0.000 description 1
- QWGRWMMWNDWRQN-UHFFFAOYSA-N 2-methylpropane-1,3-diol Chemical compound OCC(C)CO QWGRWMMWNDWRQN-UHFFFAOYSA-N 0.000 description 1
- CPSKVIYXUCHQAR-UHFFFAOYSA-N 3,8-dimethyldecanedioic acid Chemical compound OC(=O)CC(C)CCCCC(C)CC(O)=O CPSKVIYXUCHQAR-UHFFFAOYSA-N 0.000 description 1
- JYLNVJYYQQXNEK-UHFFFAOYSA-N 3-amino-2-(4-chlorophenyl)-1-propanesulfonic acid Chemical compound OS(=O)(=O)CC(CN)C1=CC=C(Cl)C=C1 JYLNVJYYQQXNEK-UHFFFAOYSA-N 0.000 description 1
- SYEOWUNSTUDKGM-YFKPBYRVSA-N 3-methyladipic acid Chemical compound OC(=O)C[C@@H](C)CCC(O)=O SYEOWUNSTUDKGM-YFKPBYRVSA-N 0.000 description 1
- SXFJDZNJHVPHPH-UHFFFAOYSA-N 3-methylpentane-1,5-diol Chemical compound OCCC(C)CCO SXFJDZNJHVPHPH-UHFFFAOYSA-N 0.000 description 1
- RBQLGIKHSXQZTB-UHFFFAOYSA-N 3-methylpentane-2,4-diol Chemical compound CC(O)C(C)C(C)O RBQLGIKHSXQZTB-UHFFFAOYSA-N 0.000 description 1
- SYMYWDHCQHTNJC-UHFFFAOYSA-J 3-oxobutanoate;zirconium(4+) Chemical compound [Zr+4].CC(=O)CC([O-])=O.CC(=O)CC([O-])=O.CC(=O)CC([O-])=O.CC(=O)CC([O-])=O SYMYWDHCQHTNJC-UHFFFAOYSA-J 0.000 description 1
- UPMLOUAZCHDJJD-UHFFFAOYSA-N 4,4'-Diphenylmethane Diisocyanate Chemical compound C1=CC(N=C=O)=CC=C1CC1=CC=C(N=C=O)C=C1 UPMLOUAZCHDJJD-UHFFFAOYSA-N 0.000 description 1
- HSEYYGFJBLWFGD-UHFFFAOYSA-N 4-methylsulfanyl-2-[(2-methylsulfanylpyridine-3-carbonyl)amino]butanoic acid Chemical compound CSCCC(C(O)=O)NC(=O)C1=CC=CN=C1SC HSEYYGFJBLWFGD-UHFFFAOYSA-N 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- CPELXLSAUQHCOX-UHFFFAOYSA-M Bromide Chemical compound [Br-] CPELXLSAUQHCOX-UHFFFAOYSA-M 0.000 description 1
- QRCXDXYGNVQYNX-UHFFFAOYSA-N C(=C)C(CCCCCCCCC)(OC)OC Chemical compound C(=C)C(CCCCCCCCC)(OC)OC QRCXDXYGNVQYNX-UHFFFAOYSA-N 0.000 description 1
- KJKCNRWXADKKRU-UHFFFAOYSA-N C(=C)CC(CCCCCCCCC)(OCC)OCC Chemical compound C(=C)CC(CCCCCCCCC)(OCC)OCC KJKCNRWXADKKRU-UHFFFAOYSA-N 0.000 description 1
- AAVQACKPQVDAEK-UHFFFAOYSA-N C(C(=C)C)(=O)OCCCC(C(OCC)(OCC)OCC)CCCCCCCC Chemical compound C(C(=C)C)(=O)OCCCC(C(OCC)(OCC)OCC)CCCCCCCC AAVQACKPQVDAEK-UHFFFAOYSA-N 0.000 description 1
- GKLXZYMUWOOVDQ-UHFFFAOYSA-N C(C1CO1)OCCCC(C(OC)(OC)C)CCCCCCCC Chemical compound C(C1CO1)OCCCC(C(OC)(OC)C)CCCCCCCC GKLXZYMUWOOVDQ-UHFFFAOYSA-N 0.000 description 1
- XYSNGNNDJGSUMY-UHFFFAOYSA-N C(C1CO1)OCCCC(C(OCC)(OCC)C)CCCCCCCC Chemical compound C(C1CO1)OCCCC(C(OCC)(OCC)C)CCCCCCCC XYSNGNNDJGSUMY-UHFFFAOYSA-N 0.000 description 1
- MTDLVDBRMBSPBJ-UHFFFAOYSA-N C(C1CO1)OCCCC(C(OCC)(OCC)OCC)CCCCCCCC Chemical compound C(C1CO1)OCCCC(C(OCC)(OCC)OCC)CCCCCCCC MTDLVDBRMBSPBJ-UHFFFAOYSA-N 0.000 description 1
- OQSHEUYHQYDEMA-UHFFFAOYSA-N C1(=CC=CC=C1)NCCCC(C(OCC)(OCC)C)CCCCCCCC Chemical compound C1(=CC=CC=C1)NCCCC(C(OCC)(OCC)C)CCCCCCCC OQSHEUYHQYDEMA-UHFFFAOYSA-N 0.000 description 1
- YDEAAJZYBOCXIO-UHFFFAOYSA-N C1(=CC=CC=C1)NCCCC(C(OCC)(OCC)OCC)CCCCCCCC Chemical compound C1(=CC=CC=C1)NCCCC(C(OCC)(OCC)OCC)CCCCCCCC YDEAAJZYBOCXIO-UHFFFAOYSA-N 0.000 description 1
- UFUYDYUQFXMKFB-UHFFFAOYSA-N CC(C(Cl)(Cl)C)CCCCCCCC Chemical compound CC(C(Cl)(Cl)C)CCCCCCCC UFUYDYUQFXMKFB-UHFFFAOYSA-N 0.000 description 1
- LNEJJQMNHUGXDW-UHFFFAOYSA-N CC(C(OCC)(OCC)C)CCCCCCCC Chemical compound CC(C(OCC)(OCC)C)CCCCCCCC LNEJJQMNHUGXDW-UHFFFAOYSA-N 0.000 description 1
- PZKBIVOXIFYDRI-UHFFFAOYSA-N CC(C(OCC)(OCC)OCC)CCCCCCCC Chemical compound CC(C(OCC)(OCC)OCC)CCCCCCCC PZKBIVOXIFYDRI-UHFFFAOYSA-N 0.000 description 1
- BKCSLWVTTCJBRE-UHFFFAOYSA-N CC(C)=O.CC(C)=O.CC(C)O[Ti]OC(C)C Chemical compound CC(C)=O.CC(C)=O.CC(C)O[Ti]OC(C)C BKCSLWVTTCJBRE-UHFFFAOYSA-N 0.000 description 1
- ZQBSPSZMRYBLLZ-UHFFFAOYSA-N CC(CCCCCCCCCCl)(C)C Chemical compound CC(CCCCCCCCCCl)(C)C ZQBSPSZMRYBLLZ-UHFFFAOYSA-N 0.000 description 1
- UIVXCPGVSFNWLY-UHFFFAOYSA-N CCC=COCCCC(C(OC)(OC)C)CCCCCCCC Chemical compound CCC=COCCCC(C(OC)(OC)C)CCCCCCCC UIVXCPGVSFNWLY-UHFFFAOYSA-N 0.000 description 1
- QHJSCTNRFWNYID-UHFFFAOYSA-N CCC=COCCCC(C(OC)(OC)OC)CCCCCCCC Chemical compound CCC=COCCCC(C(OC)(OC)OC)CCCCCCCC QHJSCTNRFWNYID-UHFFFAOYSA-N 0.000 description 1
- KOIGTNYADMQQMS-UHFFFAOYSA-N CCC=COCCCC(C(OCC)(OCC)C)CCCCCCCC Chemical compound CCC=COCCCC(C(OCC)(OCC)C)CCCCCCCC KOIGTNYADMQQMS-UHFFFAOYSA-N 0.000 description 1
- WRXQVXQQFKZLKR-UHFFFAOYSA-N CCCCCCCCC(CCC)C(OC)(OC)OC.N=C=O Chemical compound CCCCCCCCC(CCC)C(OC)(OC)OC.N=C=O WRXQVXQQFKZLKR-UHFFFAOYSA-N 0.000 description 1
- MHUWIWFJCFIQHI-UHFFFAOYSA-N CCCCCCCCC(CCC)C(OCC)(OCC)OCC.N=C=O Chemical compound CCCCCCCCC(CCC)C(OCC)(OCC)OCC.N=C=O MHUWIWFJCFIQHI-UHFFFAOYSA-N 0.000 description 1
- CYHCBZDSFYWDNA-UHFFFAOYSA-M CCCCCCCCCCCCCCCCCC[N+](C)(C)CCCCCCCCCCCCC(C)(OC)OC.[Cl-] Chemical compound CCCCCCCCCCCCCCCCCC[N+](C)(C)CCCCCCCCCCCCC(C)(OC)OC.[Cl-] CYHCBZDSFYWDNA-UHFFFAOYSA-M 0.000 description 1
- WDZJNLKBLKQMSF-UHFFFAOYSA-M CCCCCCCCCCCCCCCCCC[N+](C)(C)CCCCCCCCCCCCC(C)(OCC)OCC.[Cl-] Chemical compound CCCCCCCCCCCCCCCCCC[N+](C)(C)CCCCCCCCCCCCC(C)(OCC)OCC.[Cl-] WDZJNLKBLKQMSF-UHFFFAOYSA-M 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 1
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- QWQCFZZGYARFRI-UHFFFAOYSA-N ClCCCC(C(OCC)(OCC)C)CCCCCCCC Chemical compound ClCCCC(C(OCC)(OCC)C)CCCCCCCC QWQCFZZGYARFRI-UHFFFAOYSA-N 0.000 description 1
- 229910021503 Cobalt(II) hydroxide Inorganic materials 0.000 description 1
- RZTOWFMDBDPERY-UHFFFAOYSA-N Delta-Hexanolactone Chemical compound CC1CCCC(=O)O1 RZTOWFMDBDPERY-UHFFFAOYSA-N 0.000 description 1
- ROHFNLRQFUQHCH-UHFFFAOYSA-N Leucine Natural products CC(C)CC(N)C(O)=O ROHFNLRQFUQHCH-UHFFFAOYSA-N 0.000 description 1
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 description 1
- WAEMQWOKJMHJLA-UHFFFAOYSA-N Manganese(2+) Chemical compound [Mn+2] WAEMQWOKJMHJLA-UHFFFAOYSA-N 0.000 description 1
- 229910000914 Mn alloy Inorganic materials 0.000 description 1
- CLHYNYWPHZFHIN-UHFFFAOYSA-N N(C1=CC=CC=C1)CCCC(C(OC)(OC)C)CCCCCCCC Chemical compound N(C1=CC=CC=C1)CCCC(C(OC)(OC)C)CCCCCCCC CLHYNYWPHZFHIN-UHFFFAOYSA-N 0.000 description 1
- XEEHRQPQNJOFIQ-UHFFFAOYSA-N N(C1=CC=CC=C1)CCCC(C(OC)(OC)OC)CCCCCCCC Chemical compound N(C1=CC=CC=C1)CCCC(C(OC)(OC)OC)CCCCCCCC XEEHRQPQNJOFIQ-UHFFFAOYSA-N 0.000 description 1
- RPEPYKKYVMJWQW-UHFFFAOYSA-N N=C=O.N=C=O.CC1=CC=C(C)C(C)=C1C Chemical compound N=C=O.N=C=O.CC1=CC=C(C)C(C)=C1C RPEPYKKYVMJWQW-UHFFFAOYSA-N 0.000 description 1
- LBFPJYOAXXNNDV-UHFFFAOYSA-N N=C=O.N=C=O.N.N Chemical compound N=C=O.N=C=O.N.N LBFPJYOAXXNNDV-UHFFFAOYSA-N 0.000 description 1
- HDJGANPLOWXKTM-UHFFFAOYSA-N NC(=O)NCCCC(C(OCC)(OCC)OCC)CCCCCCCC Chemical compound NC(=O)NCCCC(C(OCC)(OCC)OCC)CCCCCCCC HDJGANPLOWXKTM-UHFFFAOYSA-N 0.000 description 1
- OBLLLECULNVMRA-UHFFFAOYSA-N NCCC(C(OC)(OC)OC)(CCCCCCCC)CCCN Chemical compound NCCC(C(OC)(OC)OC)(CCCCCCCC)CCCN OBLLLECULNVMRA-UHFFFAOYSA-N 0.000 description 1
- XJDCHDFUMGSEHD-UHFFFAOYSA-N NCCCC(C(OC)(OC)OC)CCCCCCCC Chemical compound NCCCC(C(OC)(OC)OC)CCCCCCCC XJDCHDFUMGSEHD-UHFFFAOYSA-N 0.000 description 1
- PEXBBTCNDBSFHT-UHFFFAOYSA-N NCCNCCCC(C(OC)(OC)OC)CCCCCCCC Chemical compound NCCNCCCC(C(OC)(OC)OC)CCCCCCCC PEXBBTCNDBSFHT-UHFFFAOYSA-N 0.000 description 1
- DCIXGUPVOHOLTK-UHFFFAOYSA-N NCCNCCCC(C(OCC)(OCC)C)CCCCCCCC Chemical compound NCCNCCCC(C(OCC)(OCC)C)CCCCCCCC DCIXGUPVOHOLTK-UHFFFAOYSA-N 0.000 description 1
- UAIIRSWVSPOAHZ-UHFFFAOYSA-N NCCNCCCC(C(OCC)(OCC)OCC)CCCCCCCC Chemical compound NCCNCCCC(C(OCC)(OCC)OCC)CCCCCCCC UAIIRSWVSPOAHZ-UHFFFAOYSA-N 0.000 description 1
- 229910002651 NO3 Inorganic materials 0.000 description 1
- 229910019800 NbF 5 Inorganic materials 0.000 description 1
- 229910021586 Nickel(II) chloride Inorganic materials 0.000 description 1
- ALQSHHUCVQOPAS-UHFFFAOYSA-N Pentane-1,5-diol Chemical compound OCCCCCO ALQSHHUCVQOPAS-UHFFFAOYSA-N 0.000 description 1
- YGYAWVDWMABLBF-UHFFFAOYSA-N Phosgene Chemical compound ClC(Cl)=O YGYAWVDWMABLBF-UHFFFAOYSA-N 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- LTXWMKAFURFHSO-UHFFFAOYSA-N SCCCC(C(OCC)(OCC)C)CCCCCCCC Chemical compound SCCCC(C(OCC)(OCC)C)CCCCCCCC LTXWMKAFURFHSO-UHFFFAOYSA-N 0.000 description 1
- KRWKYUMVNGWTNM-UHFFFAOYSA-N SCCCC(C(OCC)(OCC)OCC)CCCCCCCC Chemical compound SCCCC(C(OCC)(OCC)OCC)CCCCCCCC KRWKYUMVNGWTNM-UHFFFAOYSA-N 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 1
- 229910021626 Tin(II) chloride Inorganic materials 0.000 description 1
- 229910021627 Tin(IV) chloride Inorganic materials 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 229910021551 Vanadium(III) chloride Inorganic materials 0.000 description 1
- 229910021542 Vanadium(IV) oxide Inorganic materials 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- FMRLDPWIRHBCCC-UHFFFAOYSA-L Zinc carbonate Chemical compound [Zn+2].[O-]C([O-])=O FMRLDPWIRHBCCC-UHFFFAOYSA-L 0.000 description 1
- WUJZFIUWROAWCC-UHFFFAOYSA-M [Cl-].C(CCCCCCCCCCCCCCCCC)[N+](CCCCCCCCCCCCC(OCC)(OCC)OCC)(C)C Chemical compound [Cl-].C(CCCCCCCCCCCCCCCCC)[N+](CCCCCCCCCCCCC(OCC)(OCC)OCC)(C)C WUJZFIUWROAWCC-UHFFFAOYSA-M 0.000 description 1
- ZSSVEBPGQUWAHT-UHFFFAOYSA-M [Cl-].COC(CCCCCCCCCCCC[N+](C)(C)CCCCCCCCCCCCCCCCCC)(OC)OC Chemical compound [Cl-].COC(CCCCCCCCCCCC[N+](C)(C)CCCCCCCCCCCCCCCCCC)(OC)OC ZSSVEBPGQUWAHT-UHFFFAOYSA-M 0.000 description 1
- KRSNPTJGAKAXDS-UHFFFAOYSA-N [Cr].CC(=O)C.C(C)#N Chemical compound [Cr].CC(=O)C.C(C)#N KRSNPTJGAKAXDS-UHFFFAOYSA-N 0.000 description 1
- VDRXMXHYWDRPDY-UHFFFAOYSA-M [Mn+].S(=O)(=O)([O-])[O-].[NH4+] Chemical compound [Mn+].S(=O)(=O)([O-])[O-].[NH4+] VDRXMXHYWDRPDY-UHFFFAOYSA-M 0.000 description 1
- XXEIZNCSNMQBLE-UHFFFAOYSA-N [Ni].CC(=O)C.C(C)#N Chemical compound [Ni].CC(=O)C.C(C)#N XXEIZNCSNMQBLE-UHFFFAOYSA-N 0.000 description 1
- YZETUZZBXNVESH-UHFFFAOYSA-I [V+5].CC(=O)CC([O-])=O.CC(=O)CC([O-])=O.CC(=O)CC([O-])=O.CC(=O)CC([O-])=O.CC(=O)CC([O-])=O Chemical compound [V+5].CC(=O)CC([O-])=O.CC(=O)CC([O-])=O.CC(=O)CC([O-])=O.CC(=O)CC([O-])=O.CC(=O)CC([O-])=O YZETUZZBXNVESH-UHFFFAOYSA-I 0.000 description 1
- NDZRILJASQYFSY-UHFFFAOYSA-J [Zr+4].OP(O)([O-])=O.OP(O)([O-])=O.OP(O)([O-])=O.OP(O)([O-])=O Chemical compound [Zr+4].OP(O)([O-])=O.OP(O)([O-])=O.OP(O)([O-])=O.OP(O)([O-])=O NDZRILJASQYFSY-UHFFFAOYSA-J 0.000 description 1
- GPEHQHXBPDGGDP-UHFFFAOYSA-N acetonitrile;propan-2-one Chemical compound CC#N.CC(C)=O GPEHQHXBPDGGDP-UHFFFAOYSA-N 0.000 description 1
- 150000008065 acid anhydrides Chemical class 0.000 description 1
- 239000002313 adhesive film Substances 0.000 description 1
- 238000007605 air drying Methods 0.000 description 1
- 150000001335 aliphatic alkanes Chemical class 0.000 description 1
- 125000003342 alkenyl group Chemical group 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 125000005037 alkyl phenyl group Chemical group 0.000 description 1
- 150000008051 alkyl sulfates Chemical class 0.000 description 1
- 125000000304 alkynyl group Chemical group 0.000 description 1
- CECABOMBVQNBEC-UHFFFAOYSA-K aluminium iodide Chemical compound I[Al](I)I CECABOMBVQNBEC-UHFFFAOYSA-K 0.000 description 1
- ILRRQNADMUWWFW-UHFFFAOYSA-K aluminium phosphate Chemical compound O1[Al]2OP1(=O)O2 ILRRQNADMUWWFW-UHFFFAOYSA-K 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- DIZPMCHEQGEION-UHFFFAOYSA-H aluminium sulfate (anhydrous) Chemical compound [Al+3].[Al+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O DIZPMCHEQGEION-UHFFFAOYSA-H 0.000 description 1
- 229940118662 aluminum carbonate Drugs 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- MXZRMHIULZDAKC-UHFFFAOYSA-L ammonium magnesium phosphate Chemical compound [NH4+].[Mg+2].[O-]P([O-])([O-])=O MXZRMHIULZDAKC-UHFFFAOYSA-L 0.000 description 1
- BFNBIHQBYMNNAN-UHFFFAOYSA-N ammonium sulfate Chemical compound N.N.OS(O)(=O)=O BFNBIHQBYMNNAN-UHFFFAOYSA-N 0.000 description 1
- 229910052921 ammonium sulfate Inorganic materials 0.000 description 1
- 235000011130 ammonium sulphate Nutrition 0.000 description 1
- JFCQEDHGNNZCLN-UHFFFAOYSA-N anhydrous glutaric acid Natural products OC(=O)CCCC(O)=O JFCQEDHGNNZCLN-UHFFFAOYSA-N 0.000 description 1
- 239000002518 antifoaming agent Substances 0.000 description 1
- 239000012736 aqueous medium Substances 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- UNTBPXHCXVWYOI-UHFFFAOYSA-O azanium;oxido(dioxo)vanadium Chemical compound [NH4+].[O-][V](=O)=O UNTBPXHCXVWYOI-UHFFFAOYSA-O 0.000 description 1
- WDIHJSXYQDMJHN-UHFFFAOYSA-L barium chloride Chemical compound [Cl-].[Cl-].[Ba+2] WDIHJSXYQDMJHN-UHFFFAOYSA-L 0.000 description 1
- 229910001626 barium chloride Inorganic materials 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- BMRWNKZVCUKKSR-UHFFFAOYSA-N butane-1,2-diol Chemical compound CCC(O)CO BMRWNKZVCUKKSR-UHFFFAOYSA-N 0.000 description 1
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-N carbonic acid Chemical compound OC(O)=O BVKZGUZCCUSVTD-UHFFFAOYSA-N 0.000 description 1
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 1
- 239000004359 castor oil Substances 0.000 description 1
- 235000019438 castor oil Nutrition 0.000 description 1
- 239000003093 cationic surfactant Substances 0.000 description 1
- VGBWDOLBWVJTRZ-UHFFFAOYSA-K cerium(3+);triacetate Chemical compound [Ce+3].CC([O-])=O.CC([O-])=O.CC([O-])=O VGBWDOLBWVJTRZ-UHFFFAOYSA-K 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- ZHXZNKNQUHUIGN-UHFFFAOYSA-N chloro hypochlorite;vanadium Chemical compound [V].ClOCl ZHXZNKNQUHUIGN-UHFFFAOYSA-N 0.000 description 1
- 229960001701 chloroform Drugs 0.000 description 1
- ZCDOYSPFYFSLEW-UHFFFAOYSA-N chromate(2-) Chemical compound [O-][Cr]([O-])(=O)=O ZCDOYSPFYFSLEW-UHFFFAOYSA-N 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 229910021563 chromium fluoride Inorganic materials 0.000 description 1
- WYYQVWLEPYFFLP-UHFFFAOYSA-K chromium(3+);triacetate Chemical compound [Cr+3].CC([O-])=O.CC([O-])=O.CC([O-])=O WYYQVWLEPYFFLP-UHFFFAOYSA-K 0.000 description 1
- GRWVQDDAKZFPFI-UHFFFAOYSA-H chromium(III) sulfate Chemical compound [Cr+3].[Cr+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O GRWVQDDAKZFPFI-UHFFFAOYSA-H 0.000 description 1
- 229910000428 cobalt oxide Inorganic materials 0.000 description 1
- 229910000152 cobalt phosphate Inorganic materials 0.000 description 1
- 229910000361 cobalt sulfate Inorganic materials 0.000 description 1
- 229940044175 cobalt sulfate Drugs 0.000 description 1
- KTVIXTQDYHMGHF-UHFFFAOYSA-L cobalt(2+) sulfate Chemical compound [Co+2].[O-]S([O-])(=O)=O KTVIXTQDYHMGHF-UHFFFAOYSA-L 0.000 description 1
- XTUHPOUJWWTMNC-UHFFFAOYSA-N cobalt(2+);dioxido(dioxo)chromium Chemical compound [Co+2].[O-][Cr]([O-])(=O)=O XTUHPOUJWWTMNC-UHFFFAOYSA-N 0.000 description 1
- ZBDSFTZNNQNSQM-UHFFFAOYSA-H cobalt(2+);diphosphate Chemical compound [Co+2].[Co+2].[Co+2].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O ZBDSFTZNNQNSQM-UHFFFAOYSA-H 0.000 description 1
- ASKVAEGIVYSGNY-UHFFFAOYSA-L cobalt(ii) hydroxide Chemical compound [OH-].[OH-].[Co+2] ASKVAEGIVYSGNY-UHFFFAOYSA-L 0.000 description 1
- IVMYJDGYRUAWML-UHFFFAOYSA-N cobalt(ii) oxide Chemical compound [Co]=O IVMYJDGYRUAWML-UHFFFAOYSA-N 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 239000012611 container material Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 238000007766 curtain coating Methods 0.000 description 1
- QYQADNCHXSEGJT-UHFFFAOYSA-N cyclohexane-1,1-dicarboxylate;hydron Chemical compound OC(=O)C1(C(O)=O)CCCCC1 QYQADNCHXSEGJT-UHFFFAOYSA-N 0.000 description 1
- HEBKCHPVOIAQTA-NGQZWQHPSA-N d-xylitol Chemical compound OC[C@H](O)C(O)[C@H](O)CO HEBKCHPVOIAQTA-NGQZWQHPSA-N 0.000 description 1
- XAYGUHUYDMLJJV-UHFFFAOYSA-Z decaazanium;dioxido(dioxo)tungsten;hydron;trioxotungsten Chemical compound [H+].[H+].[NH4+].[NH4+].[NH4+].[NH4+].[NH4+].[NH4+].[NH4+].[NH4+].[NH4+].[NH4+].O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.[O-][W]([O-])(=O)=O.[O-][W]([O-])(=O)=O.[O-][W]([O-])(=O)=O.[O-][W]([O-])(=O)=O.[O-][W]([O-])(=O)=O.[O-][W]([O-])(=O)=O XAYGUHUYDMLJJV-UHFFFAOYSA-Z 0.000 description 1
- FOTKYAAJKYLFFN-UHFFFAOYSA-N decane-1,10-diol Chemical compound OCCCCCCCCCCO FOTKYAAJKYLFFN-UHFFFAOYSA-N 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 238000005237 degreasing agent Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 229940105990 diglycerin Drugs 0.000 description 1
- GPLRAVKSCUXZTP-UHFFFAOYSA-N diglycerol Chemical compound OCC(O)COCC(O)CO GPLRAVKSCUXZTP-UHFFFAOYSA-N 0.000 description 1
- NAAXGLXYRDSIRS-UHFFFAOYSA-L dihydrogen phosphate;manganese(2+) Chemical compound [Mn+2].OP(O)([O-])=O.OP(O)([O-])=O NAAXGLXYRDSIRS-UHFFFAOYSA-L 0.000 description 1
- WMYWOWFOOVUPFY-UHFFFAOYSA-L dihydroxy(dioxo)chromium;phosphoric acid Chemical compound OP(O)(O)=O.O[Cr](O)(=O)=O WMYWOWFOOVUPFY-UHFFFAOYSA-L 0.000 description 1
- MHJAJDCZWVHCPF-UHFFFAOYSA-L dimagnesium phosphate Chemical compound [Mg+2].OP([O-])([O-])=O MHJAJDCZWVHCPF-UHFFFAOYSA-L 0.000 description 1
- 229910000395 dimagnesium phosphate Inorganic materials 0.000 description 1
- IEJIGPNLZYLLBP-UHFFFAOYSA-N dimethyl carbonate Chemical compound COC(=O)OC IEJIGPNLZYLLBP-UHFFFAOYSA-N 0.000 description 1
- 150000002009 diols Chemical class 0.000 description 1
- ROORDVPLFPIABK-UHFFFAOYSA-N diphenyl carbonate Chemical compound C=1C=CC=CC=1OC(=O)OC1=CC=CC=C1 ROORDVPLFPIABK-UHFFFAOYSA-N 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- SZXQTJUDPRGNJN-UHFFFAOYSA-N dipropylene glycol Chemical compound OCCCOCCCO SZXQTJUDPRGNJN-UHFFFAOYSA-N 0.000 description 1
- SFXJSNATBHJIDS-UHFFFAOYSA-N disodium;dioxido(oxo)tin;trihydrate Chemical compound O.O.O.[Na+].[Na+].[O-][Sn]([O-])=O SFXJSNATBHJIDS-UHFFFAOYSA-N 0.000 description 1
- 239000002612 dispersion medium Substances 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- 239000003995 emulsifying agent Substances 0.000 description 1
- 239000000839 emulsion Substances 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 1
- 125000004494 ethyl ester group Chemical group 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 150000004665 fatty acids Chemical class 0.000 description 1
- 238000005242 forging Methods 0.000 description 1
- 238000001879 gelation Methods 0.000 description 1
- 235000011187 glycerol Nutrition 0.000 description 1
- ZEMPKEQAKRGZGQ-XOQCFJPHSA-N glycerol triricinoleate Natural products CCCCCC[C@@H](O)CC=CCCCCCCCC(=O)OC[C@@H](COC(=O)CCCCCCCC=CC[C@@H](O)CCCCCC)OC(=O)CCCCCCCC=CC[C@H](O)CCCCCC ZEMPKEQAKRGZGQ-XOQCFJPHSA-N 0.000 description 1
- 229910052735 hafnium Inorganic materials 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- SXCBDZAEHILGLM-UHFFFAOYSA-N heptane-1,7-diol Chemical compound OCCCCCCCO SXCBDZAEHILGLM-UHFFFAOYSA-N 0.000 description 1
- BQWORYKVVNTRAW-UHFFFAOYSA-N heptane-3,5-diol Chemical compound CCC(O)CC(O)CC BQWORYKVVNTRAW-UHFFFAOYSA-N 0.000 description 1
- 239000004312 hexamethylene tetramine Substances 0.000 description 1
- 235000010299 hexamethylene tetramine Nutrition 0.000 description 1
- VKYKSIONXSXAKP-UHFFFAOYSA-N hexamethylenetetramine Chemical compound C1N(C2)CN3CN1CN2C3 VKYKSIONXSXAKP-UHFFFAOYSA-N 0.000 description 1
- VLKZOEOYAKHREP-UHFFFAOYSA-N hexane Substances CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 1
- ACCCMOQWYVYDOT-UHFFFAOYSA-N hexane-1,1-diol Chemical compound CCCCCC(O)O ACCCMOQWYVYDOT-UHFFFAOYSA-N 0.000 description 1
- FBPFZTCFMRRESA-UHFFFAOYSA-N hexane-1,2,3,4,5,6-hexol Chemical compound OCC(O)C(O)C(O)C(O)CO FBPFZTCFMRRESA-UHFFFAOYSA-N 0.000 description 1
- 238000007602 hot air drying Methods 0.000 description 1
- 150000004677 hydrates Chemical class 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 230000002209 hydrophobic effect Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
- 150000004679 hydroxides Chemical class 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- XDBSEZHMWGHVIL-UHFFFAOYSA-M hydroxy(dioxo)vanadium Chemical compound O[V](=O)=O XDBSEZHMWGHVIL-UHFFFAOYSA-M 0.000 description 1
- 125000002768 hydroxyalkyl group Chemical group 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- ZLNQQNXFFQJAID-UHFFFAOYSA-L magnesium carbonate Chemical compound [Mg+2].[O-]C([O-])=O ZLNQQNXFFQJAID-UHFFFAOYSA-L 0.000 description 1
- 239000001095 magnesium carbonate Substances 0.000 description 1
- 229910000021 magnesium carbonate Inorganic materials 0.000 description 1
- VTHJTEIRLNZDEV-UHFFFAOYSA-L magnesium dihydroxide Chemical compound [OH-].[OH-].[Mg+2] VTHJTEIRLNZDEV-UHFFFAOYSA-L 0.000 description 1
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 description 1
- 229910001635 magnesium fluoride Inorganic materials 0.000 description 1
- 239000000347 magnesium hydroxide Substances 0.000 description 1
- 229910001862 magnesium hydroxide Inorganic materials 0.000 description 1
- 239000000395 magnesium oxide Substances 0.000 description 1
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 1
- 229910052943 magnesium sulfate Inorganic materials 0.000 description 1
- 235000019341 magnesium sulphate Nutrition 0.000 description 1
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 1
- 239000011656 manganese carbonate Substances 0.000 description 1
- 235000006748 manganese carbonate Nutrition 0.000 description 1
- 229940093474 manganese carbonate Drugs 0.000 description 1
- IPJKJLXEVHOKSE-UHFFFAOYSA-L manganese dihydroxide Chemical compound [OH-].[OH-].[Mn+2] IPJKJLXEVHOKSE-UHFFFAOYSA-L 0.000 description 1
- UOGMEBQRZBEZQT-UHFFFAOYSA-L manganese(2+);diacetate Chemical compound [Mn+2].CC([O-])=O.CC([O-])=O UOGMEBQRZBEZQT-UHFFFAOYSA-L 0.000 description 1
- MIVBAHRSNUNMPP-UHFFFAOYSA-N manganese(2+);dinitrate Chemical compound [Mn+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O MIVBAHRSNUNMPP-UHFFFAOYSA-N 0.000 description 1
- 229910000016 manganese(II) carbonate Inorganic materials 0.000 description 1
- SQQMAOCOWKFBNP-UHFFFAOYSA-L manganese(II) sulfate Chemical compound [Mn+2].[O-]S([O-])(=O)=O SQQMAOCOWKFBNP-UHFFFAOYSA-L 0.000 description 1
- 229910000357 manganese(II) sulfate Inorganic materials 0.000 description 1
- XMWCXZJXESXBBY-UHFFFAOYSA-L manganese(ii) carbonate Chemical compound [Mn+2].[O-]C([O-])=O XMWCXZJXESXBBY-UHFFFAOYSA-L 0.000 description 1
- QWYFOIJABGVEFP-UHFFFAOYSA-L manganese(ii) iodide Chemical compound [Mn+2].[I-].[I-] QWYFOIJABGVEFP-UHFFFAOYSA-L 0.000 description 1
- SRVINXWCFNHIQZ-UHFFFAOYSA-K manganese(iii) fluoride Chemical compound [F-].[F-].[F-].[Mn+3] SRVINXWCFNHIQZ-UHFFFAOYSA-K 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000002609 medium Substances 0.000 description 1
- HEBKCHPVOIAQTA-UHFFFAOYSA-N meso ribitol Natural products OCC(O)C(O)C(O)CO HEBKCHPVOIAQTA-UHFFFAOYSA-N 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 150000004702 methyl esters Chemical class 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 229910000476 molybdenum oxide Inorganic materials 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- KYTZHLUVELPASH-UHFFFAOYSA-N naphthalene-1,2-dicarboxylic acid Chemical compound C1=CC=CC2=C(C(O)=O)C(C(=O)O)=CC=C21 KYTZHLUVELPASH-UHFFFAOYSA-N 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 description 1
- 229910000480 nickel oxide Inorganic materials 0.000 description 1
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 1
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 description 1
- BFDHFSHZJLFAMC-UHFFFAOYSA-L nickel(ii) hydroxide Chemical compound [OH-].[OH-].[Ni+2] BFDHFSHZJLFAMC-UHFFFAOYSA-L 0.000 description 1
- KBJMLQFLOWQJNF-UHFFFAOYSA-N nickel(ii) nitrate Chemical compound [Ni+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O KBJMLQFLOWQJNF-UHFFFAOYSA-N 0.000 description 1
- ZKATWMILCYLAPD-UHFFFAOYSA-N niobium pentoxide Inorganic materials O=[Nb](=O)O[Nb](=O)=O ZKATWMILCYLAPD-UHFFFAOYSA-N 0.000 description 1
- URLJKFSTXLNXLG-UHFFFAOYSA-N niobium(5+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Nb+5].[Nb+5] URLJKFSTXLNXLG-UHFFFAOYSA-N 0.000 description 1
- 150000002823 nitrates Chemical class 0.000 description 1
- 239000002736 nonionic surfactant Substances 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- PQQKPALAQIIWST-UHFFFAOYSA-N oxomolybdenum Chemical compound [Mo]=O PQQKPALAQIIWST-UHFFFAOYSA-N 0.000 description 1
- GNRSAWUEBMWBQH-UHFFFAOYSA-N oxonickel Chemical compound [Ni]=O GNRSAWUEBMWBQH-UHFFFAOYSA-N 0.000 description 1
- RGRFMLCXNGPERX-UHFFFAOYSA-L oxozirconium(2+) carbonate Chemical compound [Zr+2]=O.[O-]C([O-])=O RGRFMLCXNGPERX-UHFFFAOYSA-L 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- LYTNHSCLZRMKON-UHFFFAOYSA-L oxygen(2-);zirconium(4+);diacetate Chemical compound [O-2].[Zr+4].CC([O-])=O.CC([O-])=O LYTNHSCLZRMKON-UHFFFAOYSA-L 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 1
- GTCCGKPBSJZVRZ-UHFFFAOYSA-N pentane-2,4-diol Chemical compound CC(O)CC(C)O GTCCGKPBSJZVRZ-UHFFFAOYSA-N 0.000 description 1
- GYUPBLLGIHQRGT-UHFFFAOYSA-N pentane-2,4-dione;titanium Chemical compound [Ti].CC(=O)CC(C)=O GYUPBLLGIHQRGT-UHFFFAOYSA-N 0.000 description 1
- 239000012466 permeate Substances 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- JKJKPRIBNYTIFH-UHFFFAOYSA-N phosphanylidynevanadium Chemical compound [V]#P JKJKPRIBNYTIFH-UHFFFAOYSA-N 0.000 description 1
- 229940085991 phosphate ion Drugs 0.000 description 1
- DTEMQJHXKZCSMQ-UHFFFAOYSA-J phosphonato phosphate;zirconium(4+) Chemical compound [Zr+4].[O-]P([O-])(=O)OP([O-])([O-])=O DTEMQJHXKZCSMQ-UHFFFAOYSA-J 0.000 description 1
- 150000003013 phosphoric acid derivatives Chemical class 0.000 description 1
- 229920003207 poly(ethylene-2,6-naphthalate) Polymers 0.000 description 1
- 229920001748 polybutylene Polymers 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920006267 polyester film Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 239000011112 polyethylene naphthalate Substances 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 229920001451 polypropylene glycol Polymers 0.000 description 1
- GRLPQNLYRHEGIJ-UHFFFAOYSA-J potassium aluminium sulfate Chemical compound [Al+3].[K+].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O GRLPQNLYRHEGIJ-UHFFFAOYSA-J 0.000 description 1
- 239000012286 potassium permanganate Substances 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 238000002203 pretreatment Methods 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 238000007142 ring opening reaction Methods 0.000 description 1
- DCKVNWZUADLDEH-UHFFFAOYSA-N sec-butyl acetate Chemical compound CCC(C)OC(C)=O DCKVNWZUADLDEH-UHFFFAOYSA-N 0.000 description 1
- GJPYYNMJTJNYTO-UHFFFAOYSA-J sodium aluminium sulfate Chemical compound [Na+].[Al+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O GJPYYNMJTJNYTO-UHFFFAOYSA-J 0.000 description 1
- 239000001509 sodium citrate Substances 0.000 description 1
- NLJMYIDDQXHKNR-UHFFFAOYSA-K sodium citrate Chemical compound O.O.[Na+].[Na+].[Na+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O NLJMYIDDQXHKNR-UHFFFAOYSA-K 0.000 description 1
- 239000011775 sodium fluoride Substances 0.000 description 1
- 235000013024 sodium fluoride Nutrition 0.000 description 1
- 229940079864 sodium stannate Drugs 0.000 description 1
- 229940071182 stannate Drugs 0.000 description 1
- 235000011150 stannous chloride Nutrition 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 230000001954 sterilising effect Effects 0.000 description 1
- 238000004659 sterilization and disinfection Methods 0.000 description 1
- 229910052567 struvite Inorganic materials 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 150000005846 sugar alcohols Polymers 0.000 description 1
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 1
- 239000013077 target material Substances 0.000 description 1
- 150000000000 tetracarboxylic acids Chemical class 0.000 description 1
- 229920001169 thermoplastic Polymers 0.000 description 1
- 239000004416 thermosoftening plastic Substances 0.000 description 1
- AXZWODMDQAVCJE-UHFFFAOYSA-L tin(II) chloride (anhydrous) Chemical compound [Cl-].[Cl-].[Sn+2] AXZWODMDQAVCJE-UHFFFAOYSA-L 0.000 description 1
- HPGGPRDJHPYFRM-UHFFFAOYSA-J tin(iv) chloride Chemical compound Cl[Sn](Cl)(Cl)Cl HPGGPRDJHPYFRM-UHFFFAOYSA-J 0.000 description 1
- 229910000349 titanium oxysulfate Inorganic materials 0.000 description 1
- XROWMBWRMNHXMF-UHFFFAOYSA-J titanium tetrafluoride Chemical compound [F-].[F-].[F-].[F-].[Ti+4] XROWMBWRMNHXMF-UHFFFAOYSA-J 0.000 description 1
- SOBXOQKKUVQETK-UHFFFAOYSA-H titanium(3+);trisulfate Chemical compound [Ti+3].[Ti+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O SOBXOQKKUVQETK-UHFFFAOYSA-H 0.000 description 1
- HDUMBHAAKGUHAR-UHFFFAOYSA-J titanium(4+);disulfate Chemical compound [Ti+4].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O HDUMBHAAKGUHAR-UHFFFAOYSA-J 0.000 description 1
- NLPMQGKZYAYAFE-UHFFFAOYSA-K titanium(iii) fluoride Chemical compound F[Ti](F)F NLPMQGKZYAYAFE-UHFFFAOYSA-K 0.000 description 1
- DVKJHBMWWAPEIU-UHFFFAOYSA-N toluene 2,4-diisocyanate Chemical compound CC1=CC=C(N=C=O)C=C1N=C=O DVKJHBMWWAPEIU-UHFFFAOYSA-N 0.000 description 1
- RUELTTOHQODFPA-UHFFFAOYSA-N toluene 2,6-diisocyanate Chemical compound CC1=C(N=C=O)C=CC=C1N=C=O RUELTTOHQODFPA-UHFFFAOYSA-N 0.000 description 1
- 238000005809 transesterification reaction Methods 0.000 description 1
- KAHROJAJXYSFOD-UHFFFAOYSA-J triazanium;zirconium(4+);tricarbonate;hydroxide Chemical compound [NH4+].[NH4+].[NH4+].[OH-].[Zr+4].[O-]C([O-])=O.[O-]C([O-])=O.[O-]C([O-])=O KAHROJAJXYSFOD-UHFFFAOYSA-J 0.000 description 1
- 150000003627 tricarboxylic acid derivatives Chemical class 0.000 description 1
- FTBATIJJKIIOTP-UHFFFAOYSA-K trifluorochromium Chemical compound F[Cr](F)F FTBATIJJKIIOTP-UHFFFAOYSA-K 0.000 description 1
- 239000013638 trimer Substances 0.000 description 1
- QXJQHYBHAIHNGG-UHFFFAOYSA-N trimethylolethane Chemical compound OCC(C)(CO)CO QXJQHYBHAIHNGG-UHFFFAOYSA-N 0.000 description 1
- YQMWDQQWGKVOSQ-UHFFFAOYSA-N trinitrooxystannyl nitrate Chemical compound [Sn+4].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O YQMWDQQWGKVOSQ-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- CMPGARWFYBADJI-UHFFFAOYSA-L tungstic acid Chemical compound O[W](O)(=O)=O CMPGARWFYBADJI-UHFFFAOYSA-L 0.000 description 1
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 description 1
- GRUMUEUJTSXQOI-UHFFFAOYSA-N vanadium dioxide Chemical compound O=[V]=O GRUMUEUJTSXQOI-UHFFFAOYSA-N 0.000 description 1
- HQYCOEXWFMFWLR-UHFFFAOYSA-K vanadium(iii) chloride Chemical compound [Cl-].[Cl-].[Cl-].[V+3] HQYCOEXWFMFWLR-UHFFFAOYSA-K 0.000 description 1
- UUUGYDOQQLOJQA-UHFFFAOYSA-L vanadyl sulfate Chemical compound [V+2]=O.[O-]S([O-])(=O)=O UUUGYDOQQLOJQA-UHFFFAOYSA-L 0.000 description 1
- 239000002912 waste gas Substances 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
- 238000004065 wastewater treatment Methods 0.000 description 1
- 239000011667 zinc carbonate Substances 0.000 description 1
- 235000004416 zinc carbonate Nutrition 0.000 description 1
- 229910000010 zinc carbonate Inorganic materials 0.000 description 1
- 239000011592 zinc chloride Substances 0.000 description 1
- 235000005074 zinc chloride Nutrition 0.000 description 1
- NWONKYPBYAMBJT-UHFFFAOYSA-L zinc sulfate Chemical compound [Zn+2].[O-]S([O-])(=O)=O NWONKYPBYAMBJT-UHFFFAOYSA-L 0.000 description 1
- 229910000368 zinc sulfate Inorganic materials 0.000 description 1
- 229960001763 zinc sulfate Drugs 0.000 description 1
- MFXMOUUKFMDYLM-UHFFFAOYSA-L zinc;dihydrogen phosphate Chemical compound [Zn+2].OP(O)([O-])=O.OP(O)([O-])=O MFXMOUUKFMDYLM-UHFFFAOYSA-L 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
- OMQSJNWFFJOIMO-UHFFFAOYSA-J zirconium tetrafluoride Chemical compound F[Zr](F)(F)F OMQSJNWFFJOIMO-UHFFFAOYSA-J 0.000 description 1
- XJUNLJFOHNHSAR-UHFFFAOYSA-J zirconium(4+);dicarbonate Chemical compound [Zr+4].[O-]C([O-])=O.[O-]C([O-])=O XJUNLJFOHNHSAR-UHFFFAOYSA-J 0.000 description 1
- ZXAUZSQITFJWPS-UHFFFAOYSA-J zirconium(4+);disulfate Chemical compound [Zr+4].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O ZXAUZSQITFJWPS-UHFFFAOYSA-J 0.000 description 1
- PAPBSGBWRJIAAV-UHFFFAOYSA-N ε-Caprolactone Chemical compound O=C1CCCCCO1 PAPBSGBWRJIAAV-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B15/00—Layered products comprising a layer of metal
- B32B15/04—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
- B32B15/08—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B15/00—Layered products comprising a layer of metal
- B32B15/20—Layered products comprising a layer of metal comprising aluminium or copper
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/32—Layered products comprising a layer of synthetic resin comprising polyolefins
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/36—Layered products comprising a layer of synthetic resin comprising polyesters
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
- C09D5/08—Anti-corrosive paints
- C09D5/082—Anti-corrosive paints characterised by the anti-corrosive pigment
- C09D5/084—Inorganic compounds
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C22/00—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
- C23C22/05—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions
- C23C22/06—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions using aqueous acidic solutions with pH less than 6
- C23C22/34—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions using aqueous acidic solutions with pH less than 6 containing fluorides or complex fluorides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C22/00—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
- C23C22/05—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions
- C23C22/06—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions using aqueous acidic solutions with pH less than 6
- C23C22/40—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions using aqueous acidic solutions with pH less than 6 containing molybdates, tungstates or vanadates
- C23C22/44—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions using aqueous acidic solutions with pH less than 6 containing molybdates, tungstates or vanadates containing also fluorides or complex fluorides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C2222/00—Aspects relating to chemical surface treatment of metallic material by reaction of the surface with a reactive medium
- C23C2222/20—Use of solutions containing silanes
Landscapes
- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Metallurgy (AREA)
- Mechanical Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Wood Science & Technology (AREA)
- Chemical Treatment Of Metals (AREA)
- Laminated Bodies (AREA)
Description
本發明關於用於形成表面處理皮膜的層合金屬材料用之表面處理劑及層合金屬材料的製造方法,該表面處理皮膜係提高金屬材料的表面與層合薄膜的密接性(包含加工密接性),更且提高層合有薄膜的金屬材料之耐蝕性(尤其耐強酸性及耐強鹼性)。
更詳細地,關於用於形成表面處理皮膜的層合金屬材料用之表面處理劑及層合金屬材料的製造方法,該表面處理皮膜係在鋁系金屬箔及不銹鋼系金屬箔等的金屬材料之表面上層合樹脂薄膜後,即使在施予深拉加工、減薄拉延加工或張拉加工等的嚴酷成形加工時,也可賦予高的密接性而使得其層合薄膜不剝離,更且物品(成形加工品)具有優異的耐蝕性。
層合加工係在金屬材料的表面上加熱壓黏(或經由接著劑而壓黏)樹脂製的薄膜(以下稱為樹脂薄膜或層合薄膜)之加工手段,作為以表面保護或圖案設計性賦予為目的之金屬材料表面的被覆方法之一個,使用於各式各樣的領域中。此層合加工係將樹脂組成物塗佈、烘烤乾燥而形成樹脂皮膜之方法,即與塗裝相比,烘烤乾燥時所產生的溶劑及二氧化碳等之廢氣或溫暖化氣體之發生量少。因此,於環保方面係較佳,其用途係擴大,例如使用於以鋁薄板材、鋼薄板材、包裝用鋁箔或不銹鋼箔等當作原料材的食品用罐之本體或蓋材、食品用容器或乾電池容器等。
特別地於最近,作為攜帶電話、電子筆記本、筆記型個人電腦、攝影機等中所用的行動電話用鋰離子蓄電池之外裝材,較宜使用輕量且障壁性高的鋁箔及不銹鋼箔等的金屬箔,層合加工係適用於如此的金屬箔。又,作為電動汽車或混合動力汽車的驅動能量,有檢討鋰離子蓄電池,惟作為其外裝材,亦檢討經層合加工的金屬箔。
如此的層合加工中所用的層合薄膜,由於在貼合於直接金屬材料後,進行加熱壓黏,故與塗佈樹脂組成物,然後進行加熱乾燥的一般樹脂皮膜相比,具有可抑制材料的浪費、針孔(缺陷部)少及加工性優異等之優點。作為層合薄膜的材料,一般使用聚對苯二甲酸乙二酯及聚萘二甲酸乙二酯等的聚酯系樹脂、或聚乙烯及聚丙烯等的聚烯烴。
於金屬材料的表面(亦僅稱金屬表面)上層合加工層合薄膜之際,為了提高層合薄膜與金屬表面的密接性及耐蝕性,於將金屬表面脫脂洗淨後,通常施予磷酸鉻酸鹽等的化成處理。然而,如此的化成處理係在處理後必須有去除多餘的處理液之洗淨步驟,由於洗淨步驟所排出的洗淨水之廢水處理係花費成本。特別地,磷酸鉻酸鹽等的化成處理由於使用含六價鉻的處理液,從近年來環境的關懷來看,係有迴避的傾向。
另一方面,若對金屬表面不施予化成處理等的處理而進行層合加工,則有層合薄膜自金屬表面剝離或對金屬材料發生腐蝕之問題。例如,於食品用容器或包裝材中,在層合加工後的容器或包裝材中加入內容物後,施予以殺菌為目的之加熱處理,但在該加熱處理時層合薄膜會自金屬表面剝離。又,鋰離子蓄電池的外裝材等係在其製造步驟中接受加工度高的加工。如此的外裝材若被長期使用,則大氣中的水分滲入內部,此與電解質反應而生成氫氟酸,其穿透層合薄膜,而發生金屬表面與層合薄膜之剝離,同時有腐蝕金屬表面之問題。
對於如此的問題,有各種的提案,其為在層合加工之前,形成用於提高層合薄膜對金屬表面的密接性之皮膜的方法。
例如,專利文獻1中提案於鋁合金條的單面上形成化成處理膜,在該化成處理膜上被覆樹脂薄膜而構成的深拉‧減薄拉延罐用鋁合金之製造方法。此化成處理膜係以含有由鉻系、鈦系及鋯系所選出的一種金屬成分之化成處理液所形成的膜,藉由金屬附著量而改變與樹脂薄膜的密接性和耐蝕性,該金屬附著量較佳為5~50mg/m2之情況。
又,專利文獻2中提案用於形成表面處理皮膜的接著基底用之表面處理劑,該表面處理皮膜係提高金屬表面與層合薄膜之層間的密接性,更且提高層合有薄膜的金屬材料之耐蝕性。此表面處理劑較佳為含有胺化酚聚合物與由Ti、Zr、Hf、Mo、W、Se、Ce、Fe、Cu、Zn、V及3價Cr所選出的至少1種之金屬化合物,pH係在1.5~6.0的範圍。
再者,專利文獻3中提案一種表面處理劑,其不是用於形成提高金屬表面與層合薄膜之密接性的表面處理皮膜之表面處理劑,而是用於形成提高金屬表面上所塗佈形成的塗裝膜之密接性的塗裝基底膜之表面處理劑。此表面處理劑係含有矽烷偶合劑(A)、陽離子性胺甲酸乙酯樹脂(B)、Zr化合物及/或Ti化合物(C)以及含氟的無機化合物(D)之預塗金屬材料用表面處理劑,(A)/(B)的質量比為1/50~20/1,(Zr及/或Ti原子)/(B)的質量比為1/1,000~1/2,且氟原子/(B)的質量比為1/1,000~2/1。
先前技術文獻
專利文獻
專利文獻1:特開2005-120422號公報
專利文獻2:特開2003-138382號公報
專利文獻3:特開2006-328445號公報
特別地於最近,對攜帶電話、電子筆記本、筆記型個人電腦或攝影機等中所用的攜帶用鋰離子蓄電池、或作為電動汽車或混合動力汽車的驅動能量的鋰離子蓄電池之外裝材等,要求高的加工性與耐蝕性。因此,於對如此的金屬材料進行層合加工之前所形成的表面處理皮膜中,比以往還增加,要求對金屬材料的高密接性及耐蝕性。
本發明係可回應最近的高水平之要求者,其目的在於是供用於形成表面處理皮膜的層合金屬材料用表面處理劑,其係在金屬材料的表面上層合樹脂薄膜後,即使在施予深拉加工、減薄拉延加工或張拉加工等的嚴酷成形加工時,也可賦予高的密接性與高的耐蝕性,而使得其層合薄膜不剝離。又,本發明之另一目的在於提供層合金屬材料的製造方法,該層合金屬材料具有以如此表面處理劑所形成的表面處理皮膜。
本發明者檢討上述專利文獻3中記載的塗裝基底膜用表面處理劑是否亦可使用作為層合金屬材料用的表面處理劑,發現照原樣地係無法形成密接性與耐蝕性優異的表面處理皮膜,藉由將特定的成分規定在特定的範圍內才可達成,終於完成本發明。
為了解決上述問題,本發明的層合金屬材料用表面處理劑之特徵為含有矽烷偶合劑(A)、陽離子性胺甲酸乙酯樹脂(B)、Zr化合物(C1)、Ti化合物(C2)及含氟的無機化合物(D),配合比(A)/(B)以重量比表示為1/50以上20/1以下,配合比(C)/(B)以重量比表示為1/100以上1/2以下(惟,(C)的重量係(C1)與(C2)的合計),配合比(氟原子)/(B)以重量比表示為1/1000以上2/1以下,而且配合比(C1)/(C2)以重量比表示為1/10以上且未達2/1。
於本發明的層合金屬材料用表面處理劑中,前述陽離子性胺甲酸乙酯樹脂(B)含有由二級胺基及三級胺基所選出的胺基性官能基。
於本發明的層合金屬材料用表面處理劑中,前述矽烷偶合劑(A)全體的5質量%以上係具有由一級胺基、二級胺基、三級胺基及四級銨基所選出的胺基性官能基之矽烷偶合劑。
於本發明的層合金屬材料用表面處理劑中,前述Zr化合物(C1)及前述Ti化合物(C2)係氟化物或氟酸或氟酸鹽。
為了解決上述問題,本發明之層合金屬材料的製造方法之特徵為在金屬材料表面塗佈乾燥上述本發明之層合金屬材料用表面處理劑,以形成0.01~1g/m2的皮膜,接著層合聚酯系樹脂、聚乙烯系樹脂、聚丙烯系樹脂或此等的改性樹脂。
於本發明之層合金屬材料的製造方法中,前述金屬材料係鋁系或不銹鋼系的金屬箔。
若藉由本發明的層合金屬材料用表面處理劑,則可達成與層合薄膜的密接性(包含加工密接性)及耐蝕性(尤其耐強酸性及耐強鹼性)優異之製作層合金屬材料、層合金屬容器或層合金屬包裝材用的表面處理劑之優異效果。又,若藉由本發明的層合金屬材料用表面處理劑,則不具有六價鉻,亦考慮近年之環境問題的完全無鉻,達成環境負荷少的效果。又,若藉由本發明之層合金屬材料的製造方法,則達成可提供密接性及耐蝕性優異的金屬容器或包裝材之優異效果。
實施發明的形態
以下詳細說明本發明的層合金屬材料用表面處理劑及層合金屬材料的製造方法。再者,於本申請案中,重量比與質量比、重量與質量係皆同義。
[層合金屬材料用表面處理劑]
本發明的層合金屬材料用表面處理劑(以下亦僅稱「表面處理劑」)係含有矽烷偶合劑(A)、陽離子性胺甲酸乙酯樹脂(B)、Zr化合物(C1)、Ti化合物(C2)及含氟的無機化合物(D)當作必要成分。再者,含氟的無機化合物(D)係可當作單獨的化合物進行配合,也可為含有氟的Zr化合物(C1)或Ti化合物(C2)。於Zr化合物(C1)或Ti化合物(C2)含有氟時,含有氟的Zr化合物(C1)或Ti化合物(C2)亦可稱為含氟的無機化合物(D)。藉由將如此的表面處理劑塗佈於金屬表面上及使乾燥,可形成作為層合金屬材料用的基底皮膜之較佳表面處理皮膜。
(矽烷偶合劑)
矽烷偶合劑(A)藉由水解所生成的矽烷醇基之-OH的活性係高,與母材的金屬材料M經由氧原子而進行-Si-O-M的強固化學鍵結。此化學鍵結係特別有助於與金屬材料M的良好密接性。又,矽烷偶合劑(A)係藉由與作為上層設置的層合薄膜中所含有的有機官能基之反應,而亦有助於與層合薄膜的密接性提高。於矽烷偶合劑(A)中導入以極性強的O、N等當作構成元素的官能基時,進一步提高與層合薄膜的密接性。
作為矽烷偶合劑(A),例如可舉出γ-胺基丙基三甲氧基矽烷、γ-胺基丙基三乙氧基矽烷、N-苯基-3-丙基三甲氧基矽烷N-苯基-3-丙基三乙氧基矽烷、N-(2-胺基乙基)胺基丙基三甲氧基矽烷、N-(2-胺基乙基)胺基丙基甲基二甲氧基矽烷、N-(2-胺基乙基)胺基丙基三乙氧基矽烷、N-(2-胺基乙基)胺基丙基甲基二乙氧基矽烷、N-(2-胺基乙基)胺基丙基甲基二甲氧基矽烷、γ-甲基丙烯醯氧基丙基三甲氧基矽烷、γ-甲基丙烯醯氧基丙基甲基二甲氧基矽烷、γ-甲基丙烯醯氧基丙基三乙氧基矽烷、γ-甲基丙烯醯氧基丙基甲基二乙氧基矽烷、N-β-(N-乙烯基苄基胺基乙基)-3-胺基丙基三甲氧基矽烷、N-β-(N-乙烯基苄基胺基乙基)-3-胺基丙基甲基二甲氧基矽烷、N-β-(N-乙烯基苄基胺基乙基)-3-胺基丙基三乙氧基矽烷、N-β-(N-乙烯基苄基胺基乙基)-3-胺基丙基甲基二乙氧基矽烷、γ-環氧丙氧基丙基三甲氧基矽烷、γ-環氧丙氧基丙基甲基二甲氧基矽烷、γ-環氧丙氧基丙基三乙氧基矽烷、γ-環氧丙氧基丙基甲基二乙氧基矽烷、γ-巰基丙基三甲氧基矽烷、γ-巰基丙基甲基二甲氧基矽烷、γ-巰基丙基三乙氧基矽烷、γ-巰基丙基甲基二乙氧基矽烷、甲基三甲氧基矽烷、二甲基二甲氧基矽烷、甲基三乙氧基矽烷、二甲基二乙氧基矽烷、乙烯基三乙醯氧基矽烷、γ-氯丙基三甲氧基矽烷、γ-氯丙基甲基二甲氧基矽烷、γ-氯丙基三乙氧基矽烷、γ-氯丙基甲基二乙氧基矽烷、六甲基二矽氮烷、γ-苯胺基丙基三甲氧基矽烷、γ-苯胺基丙基甲基二甲氧基矽烷、γ-苯胺基丙基三乙氧基矽烷、γ-苯胺基丙基甲基二乙氧基矽烷、異氰酸酯基丙基三甲氧基矽烷、異氰酸酯基丙基三乙氧基矽烷、脲基丙基三乙氧基矽烷、雙(三甲氧基矽烷基)胺基乙烯基三甲氧基矽烷、乙烯基甲基二甲氧基矽烷、乙烯基三乙氧基矽烷、乙烯基甲基二乙氧基矽烷、十八基二甲基[3-(三甲氧基矽烷基)丙基]銨氯化物、十八基二甲基[3-(甲基二甲氧基矽烷基)丙基]銨氯化物、十八基二甲基[3-(三乙氧基矽烷基)丙基]銨氯化物、十八基二甲基[3-(甲基二乙氧基矽烷基)丙基]銨氯化物、γ-氯丙基甲基二甲氧基矽烷、γ-巰基丙基甲基二甲氧基矽烷、甲基三氯矽烷、二甲基二氯矽烷、三甲基氯矽烷等。
矽烷偶合劑(A)係具有與作為上層所層合的層合薄膜(後述的樹脂薄膜或壓出層合樹脂)之相容性,取決於組合,性能係有不出現符合期待的案例。於以表面處理劑當作層合金屬材料用的本發明之用途中,採用具有胺基的矽烷偶合劑(A)時,與層合薄膜的相容性良好。因此,於本發明的表面處理劑中,矽烷偶合劑(A)較佳為含有至少1種(1種或2種以上)的具胺基性官能基者。
此處,所謂的胺基性官能基,就是由一級胺基、二級胺基、三級胺基及四級銨基所選出的官能基。再者,作為具有四級銨基時的相對離子,可舉出以氯離子為首的鹵素離子、磷酸離子、硝酸離子、硫酸離子、有機酸離子等。更佳的胺基官能基係三級胺基。其理由係因為與層合薄膜的密接性亦良好,但於工業上使用時,作為表面處理劑的安定性(儲存安定性)係重要。根據此觀點,本發明者發現賦予高的密接性,且具有優異的儲存安定性和伴隨其的操作安定性之三級胺基係最佳。
如此具有至少1種的胺基性官能基之矽烷偶合劑,對於矽烷偶合劑(A)全體而言的含量較佳為5質量%以上,更佳為10質量%以上,特佳為20質量%以上。具有如此含量的矽烷偶合劑(A),係可消除由於層合薄膜之種類而可能發生的與層合薄膜之密接性、耐蝕性等之不利影響,或抑制在最小限度。
混合2種以上使用矽烷偶合劑(A)時,較佳為使用具有互相反應而生成新的鍵結之官能基的矽烷偶合劑(A)。藉由如此作,可進一步提高薄膜密接性(加工密接性),亦可提高耐蝕性。例如,作為與具有一級胺基及/或二級胺基的矽烷偶合劑反應而生成新的縮合之矽烷偶合劑,較佳為(i)具有環氧丙基當作前述官能基的矽烷偶合劑,而且較佳可舉出(ii)具有或能生成羥基當作前述官能基的矽烷偶合劑(例如具有環氧丙基當作官能基的矽烷偶合劑)與具有異氰酸酯基當作前述官能基的矽烷偶合劑之倂用。如後者(ii)之具有互相反應而生成鍵結的官能基之矽烷偶合劑彼此的配合比例,係沒有必要互相的官能基為不多不少之反應量,一方的官能基(例如一級胺基或二級胺基)與另一方的官能基(例如環氧丙基)之當量比較佳為50:1~1:50之範圍,更佳為30:1~1:30之範圍。
(陽離子性胺甲酸乙酯樹脂)
陽離子性胺甲酸乙酯樹脂(B)係水溶性或水系乳液形態者。陽離子性胺甲酸乙酯樹脂(B)在水中溶解或分散,係可以自溶解性或自分散性為基礎而達成,而且亦可藉由陽離子性界面活性劑(例如烷基四級銨鹽等)及/或非離子性界面活性劑(例如烷基苯基醚等)的存在而分散。如此的陽離子性胺甲酸乙酯樹脂(B)係對所得到的表面處理皮膜賦予柔軟性,而且有助於層合薄膜的密接性之提高,結果發揮有效地提高加工密接性之作用。
陽離子性胺甲酸乙酯樹脂(B)只要是具有由二級胺基、三級胺基及四級銨鹽中所選出的至少1種(1種或2種以上)之陽離子性官能基者,則所構成的單體成分之多元醇及聚異氰酸酯成分及聚合方法係沒有特別的限定。其中,較佳為至少具有三級胺基者。另一方面,一級胺基由於反應性激烈,馬上與環氧丙基等反應,故在藥劑的安定性或密接性顯著降低之點係不宜,可不含有。於陽離子性官能基之中,三級胺基的比例較佳為30~100%,更佳為60%~100%,藉由使三級胺在此範圍,尤其在層合金屬材料用途的表面處理皮膜中,可提高其密接性。
陽離子性胺甲酸乙酯樹脂(B),例如係可藉由習知的方法使六亞甲基二異氰酸酯(HDI)、二環己基甲烷二異氰酸酯(HMDI)、異佛爾酮二異氰酸酯(IPDI)等的脂肪族、脂環式或芳香族二異氰酸酯與聚酯多元醇、聚醚多元醇、聚碳酸酯多元醇等之在鏈中導入有胺基的多元醇進行聚合,以硫酸烷酯等將胺一部皆四級化而得。作為陽離子性官能基的氮上之取代基,可舉出氫、烷基、芳基、烯基、炔基、羥烷基等的取代基,惟不受此等所限定。於表面處理劑中,可混合2種以上的陽離子性胺甲酸乙酯樹脂(B)。
於上述中,作為脂肪族、脂環式或芳香族聚異氰酸酯,可舉出四亞甲基二異氰酸酯、六亞甲基二異氰酸酯、離胺酸二異氰酸酯、氫化苯二甲基二異氰酸酯、1,4-伸環己基二異氰酸酯、4,4’-二環己基甲烷二異氰酸酯、2,4’-二環己基甲烷二異氰酸酯、異佛爾酮二異氰酸酯、3,3’-二甲氧基-4,4’-伸聯苯基二異氰酸酯、1,5-萘二異氰酸酯、1,5-四氫萘二異氰酸酯、2,4-甲苯二異氰酸酯、2,6-甲苯二異氰酸酯、4,4’-二苯基甲烷二異氰酸酯、2,4’-二苯基甲烷二異氰酸酯、伸苯基二異氰酸酯、苯二甲基二異氰酸酯、四甲基苯二甲基二異氰酸酯等。於此等之中,使用四亞甲基二異氰酸酯、六亞甲基二異氰酸酯、離胺酸二異氰酸酯、氫化苯二甲基二異氰酸酯、1,4-伸環己基二異氰酸酯、4,4’-二環己基甲烷二異氰酸酯、2,4’-二環己基甲烷二異氰酸酯、異佛爾酮二異氰酸酯等的脂肪族或脂環式聚異氰酸酯化合物時,由於得到耐藥品性與防蝕性優異的表面處理皮膜而較佳。
於上述中,作為多元醇,例如可舉出乙二醇、二乙二醇、三乙二醇、1,2-丙二醇、1,3-丙二醇、新戊二醇、1,2-丁二醇、1,3-丁二醇、1,4-丁二醇、己二醇、雙酚A、氫化雙酚A、三羥甲基丙烷、1,2-丙二醇、1,3-丙二醇、2-甲基-1,3-丙二醇、2-丁基-2-乙基-1,3-丙二醇、1,4-丁二醇、新戊二醇、3-甲基-2,4-戊二醇、2,4-戊二醇、1,5-戊二醇、3-甲基-1,5-戊二醇、2-甲基-2,4-戊二醇、2,4-二乙基-1,5-戊二醇、1,6-己二醇、1,7-庚二醇、3,5-庚二醇、1,8-辛二醇、2-甲基-1,8-辛二醇、1,9-壬二醇、1,10-癸二醇等的脂肪族二醇化合物、三羥甲基乙烷、三羥甲基丙烷、己糖醇類、戊糖醇類、甘油、二甘油、聚甘油、季戊四醇、二季戊四醇、四羥甲基丙烷等的3價以上之脂肪族或脂環族醇化合物等。
於上述中,作為聚醚多元醇,例如可舉出乙二醇、二乙二醇、三乙二醇等的環氧乙烷加成物、丙二醇、二丙二醇、三丙二醇等的環氧丙烷加成物、上述多元醇的環氧乙烷及/或環氧丙烷加成物、聚丁二醇等。
於上述中,作為聚酯多元醇,例如可舉出上述多元醇等與比其化學計算量少的量之多元羧酸或其酯、酐、鹵化物等的酯形成性衍生物、及/或內酯類或其進行水解開環而得之羥基羧酸化合物之直接酯化反應及/或酯交換反應所得者。作為多元羧酸,例如可舉出草酸、丙二酸、琥珀酸、戊二酸、己二酸、庚二酸、辛二酸、壬二酸、癸二酸、十二烷二酸、2-甲基琥珀酸、2-甲基己二酸、3-甲基己二酸、3-甲基戊二酸、2-甲基辛二酸、3,8-二甲基癸二酸、3,7-二甲基癸二酸、二聚酸、氫化二聚酸等的脂肪族二羧酸類,環己烷二羧酸等的脂環式二羧酸類;苯二甲酸、間苯二甲酸、對苯二甲酸、萘二羧酸等的芳香族二羧酸類;偏苯三酸、均苯三酸、蓖麻油脂肪酸的三聚物等的三羧酸類,苯均四酸等的四羧酸等之多羧酸。作為該酯形成性衍生物,可舉出此等的多元羧酸之酸酐,該多元羧酸的氯化物、溴化物等的鹵化物,該多元羧酸的甲酯、乙酯、丙酯、異丙酯、丁酯、異丁酯、戊酯等的低級脂肪族酯等。作為上述內酯類,可舉出γ-己內酯、δ-己內酯、ε-己內酯、γ-戊內酯、δ-戊內酯等的內酯類等。
於上述中,作為聚碳酸酯多元醇,例如可使用使碳酸與脂肪酸多元醇進行酯化反應而得者等。具體地,可舉出如1,3-丙二醇、1,4-丁二醇、1,6-己二醇、二乙二醇、二乙二醇、聚乙二醇、聚丙二醇或聚丁二醇等的二醇與碳酸二甲酯或碳酸二苯酯或光氣等的反應生成物等。
於陽離子性胺甲酸乙酯樹脂(B)中,作為可溶化劑或乳化劑的界面活性劑之使用,由於有對金屬材料的密接性或耐水性造成不利影響之虞,更佳為不使用如此的界面活性劑之無皂或抑制其使用量者。
陽離子性胺甲酸乙酯樹脂(B)的重量平均分子量較佳為1,000~1,000,000,更佳為2,000~500,000。重量平均分子量未達1,000時,表面處理皮膜的形成性有變不充分的傾向,另一方面,重量平均分子量超過1,000,000時,表面處理劑的安定性有降低的傾向。
又,只要是與陽離子性胺甲酸乙酯樹脂(B)相溶者,則亦可混合丙烯酸系樹脂、酯系樹脂、胺系樹脂、環氧系樹脂或酚系樹脂等而使用。此等樹脂亦可具有水溶性或水分散性。只要是與本發明的表面處理可相溶,不使所形成的皮膜之性能降低者,則沒有特別的限定。又,陽離子性、陰離子性、非離子性等的樹脂之離子性亦沒有限定。另外,為了提高其造膜性,形成更均勻的平滑皮膜,亦可使用有機溶劑。
陽離子性胺甲酸乙酯樹脂(B)與矽烷偶合劑(A)的配合比(A)/(B)以重量比表示較佳為1/50以上20/1以下。藉由成為如此的配合比,在與上層的層合薄膜之間可得到優異的密接性。再者,配合比(A)/(B)的更佳範圍為1/20以上10/1以下,尤佳的範圍為1/10以上5/1以下。配合比(A)/(B)未達1/50時,所得之表面處理皮膜的硬度降低,難以得到充分的加工密接性,而配合比(A)/(B)超過20/1時,反而難以得到與基底金屬的金屬表面之間的密接性,隔著表面處理皮膜的層合薄膜之密接性會變差。
(Zr化合物與Ti化合物)
Zr化合物(C1)與Ti化合物(C2)具有使所得之表面處理皮膜提高金屬材料的耐蝕性之作用。於本發明的表面處理劑中,以此Zr化合物(C1)與Ti化合物(C2)當作必要成分,以其配合比(C1)/(C2)以重量比表示為1/10以上且未達2/1之範圍者當作必要的構成。於本發明中,藉由以Zr化合物(C1)與Ti化合物(C2)當作必要成分,與僅含有任一方的情況相比,可提高與表面處理皮膜上所層合的樹脂薄膜或壓出層合樹脂對密接性,更且提高金屬表面的耐蝕性。
作為Zr化合物(C1)及Ti化合物(C2),可使用Zr或Ti的碳酸鹽、氧化物、氫氧化物、硝酸鹽、硫酸鹽、磷酸鹽、氟化物、氟酸(鹽)、有機酸鹽、有機錯化合物等,其中較佳為兼任後述含氟的無機化合物(D)之氟化物、氟酸(鹽)。具體地,鹼式碳酸鋯、碳酸氧鋯、碳酸鋯銨、碳酸氧鋯銨(NH4)2[Zr(CO3)2(OH)2]、氧化鋯(IV)(zirconia)、氧化鈦(IV)(titania)、硝酸鋯、硝酸氧鋯ZrO(NO3)2、硝酸鈦、硫酸鋯(IV)、硫酸氧鋯、硫酸鈦(III)、硫酸鈦(IV)、硫酸氧鈦TiOSO4、磷酸氧鋯、焦磷酸鋯、磷酸二氫氧鋯、氟化鋯、氟化鈦(III)、氟化鈦(IV)、六氟鋯酸H2ZrF6、六氟鋯酸銨[(NH4)2ZrF6]、六氟鈦酸H2TiF6、六氟鈦酸銨[(NH4)2TiF6]、醋酸氧鋯、月桂酸鈦、乙醯丙酮鋯Zr(OC(=CH2)CH2COCH3)4、二異丙氧基鈦雙丙酮(C5H7O2)2Ti[OCH(CH3)2]2、乙醯丙酮鈦Ti(OC(=CH2)CH2COCH3)3等。此等亦可為酐或水合物。Zr化合物及Ti化合物各自的化合物係可單獨使用,也可組合2種以上使用。
Zr化合物(C1)與Ti化合物(C2)的合計配合量(C=C1+C2),對於陽離子性胺甲酸乙酯樹脂(B)而言,配合比(C)/(B)以重量比表示必須為1/100以上1/2以下,較佳為1/50以上1/4以下,更佳為1/20以上1/10以下。配合比(C)/(B)未達1/100時,耐蝕性不充分,配合比(C)/(B)超過1/2時,層合薄膜的密接性或表面處理劑的儲存安定性有降低的傾向。
又,Zr化合物(C1)與Ti化合物(C2)係配合比(C1)/(C2)以重量比表示必須為1/10以上且未達2/1的範圍。藉由使Zr化合物(C1)與Ti化合物(C2)在此範圍內共存,可提高所得之表面處理皮膜與所層合的樹脂薄膜或壓出層合樹脂之密接性,更且可提高金屬表面的耐蝕性。再者,於Zr化合物(C1)與Ti化合物(C2)不在此範圍內共存時,無法得到作為層合金屬材料用的基底皮膜之充分特性(密接性與耐蝕性)。具體地,配合比(C1)/(C2)未達1/10時,發生密接性的降低或外觀不良,配合比(C1)/(C2)為2/1以上時,耐蝕性有降低的傾向。
因此,本發明由如後述的實施例及比較例之結果亦可明知,發現藉由使Zr化合物(C1)與Ti化合物(C2)共存,而且著眼於兩者的含有比,使在前述特定的範圍內,則可解決得到高的密接性(包含加工密接性)及高的耐蝕性(尤其耐強酸性及耐強鹼性)之開頭的問題。
(含氟的無機化合物)
含氟的無機化合物(D)係在液中放出游離氟化物離子或錯合氟化物離子,達成作為對於表面處理皮膜的形成對象之金屬表面的蝕刻劑之任務。含氟的無機化合物(D)係沒有特別的限定,例如作為放出游離氟化物離子者,可舉出氫氟酸、氟化銨、氟化鈉等。又,作為錯合氟化物,可舉出六氟矽酸、六氟矽酸鋅、六氟矽酸錳、六氟矽酸鎂、六氟矽酸鎳、六氟鈦酸、六氟鋯酸等。上述化合物係可單獨1種類使用,也可混合2種類以上使用。
含氟的無機化合物(D)係可作為單獨的化合物配合,也可為上述Zr化合物(C1)或Ti化合物(C2)。於Zr化合物(C1)或Ti化合物(C2)含有氟時,含有氟的Zr化合物(C1)或Ti化合物(C2)係成為此處所言之含氟的無機化合物(D)。再者,此時,Zr化合物(C1)或Ti化合物(C2)係可與其以外之含氟的無機化合物同時被含有。
含氟的無機化合物(D)係氟原子對陽離子性胺甲酸乙酯樹脂(B)的配合量(氟原子)/(B)以重量比表示必須為1/1000以上2/1以下,較佳為1/500以上1/1,更佳為1/250以上1/2以下。氟原子/(B)未達1/1000時,密接性不充分,氟原子/(B)超過2/1時,水系表面處理劑的安定性降低。再者,氟原子係原子換算質量。
(其任意成分)
於本發明的表面處理劑中,可更配合作為任意成分的由V化合物、Mo化合物、W化合物、Co化合物、Al化合物、Zn化合物、Ni化合物、Mn化合物、Ce化合物、Nb化合物、Sn化合物、Mg化合物及Cr化合物所選出的至少1種之金屬化合物(E)。此等金屬化合物(E)係特別具有使耐蝕性升高的功效。作為金屬化合物(E),可舉出上述金屬的碳酸鹽、氧化物、氫氧化物、硝酸鹽、硫酸鹽、磷酸鹽、氟化錯化合物、有機酸鹽、有機錯化合物等。
作為V化合物、Mo化合物、W化合物、Co化合物、Al化合物、Zn化合物,具體地可舉出五氧化二釩、偏釩酸HVO3、偏釩酸銨、三氯氧化釩VOCl3、三氧化二釩V2O3、二氧化釩、硫酸氧釩VOSO4、乙醯丙酮氧釩VO(OC(=CH2)CH2COCH3)3、三氯化釩VCl3,磷釩鉬酸H15-X[PV12-XMoO40]‧nH2O(6<X<12,n<30)、氧化鉬、鉬酸H2MoO4、鉬酸銨、偏鉬酸銨、鉬酸鈉、鉬磷酸化合物(例如鉬磷酸銨(NH4)3[PO4Mo12O36]‧3H2O、鉬磷酸鈉Na3[PO4Mo12O36]‧nH2O等);偏鎢酸H6[H2W12O40]、偏鎢酸銨(NH4)6[H2W12O40]、偏鎢酸鈉、仲鎢酸H10[W12O46H10]、仲鎢酸銨、仲鎢酸鈉,氯化鈷、氯五胺合鈷氯化物[CoCl(NH3)5]Cl、六胺合鈷氯化物[Co(NH3)6]C12、鉻酸鈷、硫酸鈷、硫酸銨鈷、硝酸鈷、氧化鈷2鋁CoO‧Al2O3、氫氧化鈷、磷酸鈷,硝酸鎳、硫酸鎳、碳酸鎳、乙醯丙酮鎳Ni(OC(=CH2)CH2COCH3)3、氯化鎳、六胺合鎳氯化物[Ni(NH3)6]C12、氧化鎳、氫氧化鎳;硝酸鋁、硫酸鋁、硫酸鉀鋁、硫酸鈉鋁、硫酸銨鋁、磷酸鋁、碳酸鋁、氧化鋁、氫氧化鋁、碘化鋁;硫酸鋅、碳酸鋅、氯化鋅、碘化鋅、乙醯丙酮鋅Zn(OC(=CH2)CH2COCH3)2、磷酸二氫鋅等。
作為Mn化合物、Ce化合物、Nb化合物、Sn化合物、Mg化合物及Cr化合物,具體地可舉出過錳酸HMnO4、過錳酸鉀、過錳酸鈉、磷酸二氫錳Mn(H2PO4)2、硝酸錳Mn(NO3)2、硫酸錳(II)、(III)或(IV)、氟化錳(II)或(III)、碳酸錳、醋酸錳(II)或(III)、硫酸銨錳、乙醯丙酮錳Mn(OC(=CH2)CH2COCH3)3、碘化錳、氧化錳、氫氧化錳;氧化鈰、醋酸鈰Ce(CH3CO2)3、硝酸鈰(III)或(IV)、硝酸鈰銨、硫酸鈰、氯化鈰,五氧化二鈮(Nb2O5)、鈮酸鈉(NaNbO3)、氟化鈮(NbF5)、六氟鈮酸銨(NH4)NbF6,氧化錫(IV)、錫酸鈉Na2SnO3、氯化錫(II)、氯化錫(IV)、硝酸錫(II)、硝酸錫(IV)、六氟錫酸銨(NH4)SnF6,硝酸鎂、硫酸鎂、碳酸鎂、氫氧化鎂、氟化鎂、磷酸銨鎂、磷酸氫鎂、氧化鎂,醋酸鉻、硫酸鉻、硝酸鉻、氟化鉻、磷酸鉻、乙醯丙酮鉻(Cr(C5H7O2)3)等。
金屬化合物(E)係對於陽離子性胺甲酸乙酯樹脂(B)而言,配合比(E)/(B)之重量比適當為1/1000以上1/2以下,更佳為1/100以上1/4以下,尤更佳為1/50以上1/8以下。金屬化合物(E)與陽離子性胺甲酸乙酯樹脂(B)的配合比(E)/(B)以重量比表示未達1/1000時,沒有密接性提高等的效果,另一方面,超過1/2時,藥劑的儲存安定性顯著降低。再者,配合比(E)/(B)的「(E)」係金屬化合物(E)的原子換算質量。
又,於本發明的表面處理劑中,視需要亦可含有矽石成分。例如,作為矽石成分,可使用氣相矽石、膠態矽石、疏水性矽石等。藉由使含有矽石成分,可作為表面處理劑的消泡劑而作用,同時可造成能提高與層合板的密接性之較佳效果。
如此的矽石對於陽離子性胺甲酸乙酯樹脂(B)而言,配合比(矽石)/(B)的重量比適當為1/100以上1/5以下,更佳為1/50以上1/10以下。矽石與陽離子性胺甲酸乙酯樹脂(B)的配合比(矽石)/(B)以重量比表示未達1/100時,在密接性等沒有效果,另一方面,超過1/5時,皮膜變脆而密接性顯著降低。再者,配合比(矽石)/(B)的「(矽石)」係氧化矽的原子換算質量。
於本發明的表面處理劑中,在不損害水系表面處理劑的液安定性及皮膜性能之範圍,亦可更配合用於在被塗面上得到均勻的皮膜之稱為潤濕性改良劑之界面活性劑或增黏劑等當作任意成分。
(其它構成)
本發明的表面處理劑所用的介質通常為水,以改善所得之表面處理皮膜的乾燥性等為目的,亦可倂用少量(例如水性介質全體的10容量%以下)的醇、酮、溶纖劑系的水溶性有機溶劑。
本發明的表面處理劑之pH係沒有特別的限制,較佳為3~12的範圍,更佳為4~8的範圍。以鋁或其合金當作對象材料時,pH低於3時,蝕刻變過多,無法充分發揮作為表面處理劑的機能,而且液安定性亦有降低的傾向。pH超過12時,鋁或其合金的溶解速度增加,而且對矽烷偶合劑(A)的儲存安定性亦出現不利影響的傾向。於必須調整pH時,亦可添加氨、二甲胺及三乙胺等的鹼成分、或醋酸及磷酸等的酸性成分。
關於本發明的表面處理劑中的合計固體成分濃度之下限,只要能達成本發明的效果,則沒有特別的限制,從液安定性的觀點來看,上限係受限制。本發明的表面處理劑之合計固體成分濃度較佳為調整至0.1~40質量%的範圍,更佳為調整至1~30質量%的範圍,尤更佳為調整至5~25質量%的範圍。
本發明的表面處理劑係藉由將矽烷偶合劑(A)、陽離子性胺甲酸乙酯樹脂(B)、Zr化合物(C1)、Ti化合物(C2)、含氟的無機化合物(D)及視情況的金屬化合物(E)加到分散介質的水中,攪拌而製造。其添加順序係沒有特別的限制。
[表面處理方法]
其次,說明採用本發明的表面處理劑之表面處理方法。作為可採用本發明的表面處理劑之金屬材料,可舉出以鋁箔、鋁合金箔、不銹鋼箔等當作合適的材料。如此的金屬材料之厚度係沒有特別的限定,對於稱為箔、薄片、板者雖然可適用,但於本發明中,由於在以表面處理劑形成表面處理皮膜後,進行層合加工,然後進行深拉加工、減薄拉延加工或張拉加工等,而加工成鋰離子蓄電池的外裝材等,故使用於如此用途的厚者為較佳。例如,較佳可採用厚度0.01~2mm左右的箔當作金屬材料。
於使用表面處理劑的表面處理方法中,先前的前處理步驟係沒有特別的限制,通常在進行正式處理之前,為了去掉金屬材料上所附著的油分或污垢,用鹼脫脂劑或酸性脫脂劑來洗淨,或進行熱水洗、溶劑洗淨等。然後,按照需要,進行酸或鹼等所致的表面調整。於進行此等處理後,較佳為進行水洗,以使得洗淨劑儘可能不殘留在金屬材料的表面。
於表面處理劑對金屬材料的塗佈中,可以採用以往塗佈方法,例如輥塗、簾幕塗覆、空氣噴灑、無空氣噴灑、浸漬、硬塗、刷毛塗抹等的通常塗佈方法。表面處理劑的溫度係沒有特別的限制,本處理劑的溶劑由於是水為主體的水系處理劑,其溫度較佳為0~60℃,更佳為5~40℃。
於以表面處理劑處理而形成表面處理皮膜後的乾燥步驟中,不需要促進陽離子性胺甲酸乙酯樹脂(B)的硬化而僅進行附著水的去除時,未必需要熱,可僅藉由風乾或吹氣等來去除水。然而,為了促進陽離子性胺甲酸乙酯樹脂(B)的硬化,或為了使所形成的表面處理皮膜進行熱軟化而提高在基底金屬材料上的均勻被覆效果,較佳為進行加熱處理。該加熱處理溫度較佳為50~250℃,更佳為60~220℃。
[表面處理皮膜]
以上述表面處理方法所形成的表面處理皮膜,係其附著量以乾燥皮膜重量表示較佳為0.01~1g/m2的範圍。附著量的更佳範圍為0.01~0.5g/m2的範圍,尤佳為0.03~0.25g/m2。附著量未達0.005g/m2時,由於皮膜量少,耐蝕性變不充分。又,附著量超過1g/m2時,反而密接性變差,同時在成本面亦不利。表面處理皮膜亦可按照目的對金屬材料表面的單面進行處理。
[層合金屬材料的製造方法]
其次,說明本發明的層合金屬材料之製造方法。層合金屬材料係藉由在金屬材料的表面上,使用本發明的表面處理劑,以上述表面處理方法形成表面處理皮膜,更且於該表面處理皮膜上層合樹脂薄膜(亦稱為層合薄膜)或壓出層合樹脂而製造。樹脂薄膜係按照目的可僅形成在表面處理金屬材料的單面,也可形成在兩面。
樹脂薄膜的層合係大致區分為以下兩種:(i)於基底皮膜的表面處理皮膜之形成後,直接層合樹脂薄膜之方法,(ii)於基底皮膜的表面處理皮膜之形成後,塗佈形成稱為底漆的黏著改良劑(聚酯系接著劑、聚醚系接著劑等),然後將樹脂薄膜層合之方法。可依照所要求的品質和成本來選擇任一者。再者,於層合中,亦可使用將樹脂薄膜層合之方法與將熔融狀態的樹脂層合之方法(一般稱為「壓出層合」,將該樹脂稱為「壓出層合樹脂」)的任一方法。所層合的樹脂薄膜或壓出層合樹脂之樹脂材料係沒有特別的限制,較佳可舉出聚酯系樹脂、聚乙烯系樹脂、聚丙烯系樹脂或此等的改性樹脂。
於本發明的層合金屬材料之製造方法中,採用上述本發明的表面處理劑。該表面處理劑係與層合薄膜的密接性(包含加工密接性)及耐蝕性(尤其耐強酸性、耐強鹼性)優異,用於製作層合金屬材料、層合金屬容器或層合金屬包裝材的特佳表面處理劑。再者,該表面處理劑係不含有六價鉻,也考慮近年之環境問題的完全無鉻,亦具有環境負荷少的優點。根據以上,本發明的層合金屬材料之製造方法,係達成可提供密接性、耐蝕性優異的金屬容器或包裝材當作層合金屬材料之優異效果。
實施例
以下,舉出實施例與比較例來更具體說明本發明。本發明係不受以下的實施例所限定。再者,以下的「份」係重量份(與質量份同義)。
[實施例1~30、比較例1~21]
(供試材及前處理)
作為供試材,使用市售的鋁合金板(鋁-錳合金板:JIS A 3004,板厚:0.3mm,板尺寸:200mm×300mm)。藉由對於此鋁合金板,在75℃噴灑市售的酸性洗淨劑(Palclean 500:日本PARKERIZING株式會社製)的8%水溶液20秒而洗淨,接著水洗而潔淨其表面。另一方面,作為另一供試材,使用市售的不銹鋼板(JIS SUS304,板厚:0.3mm,板尺寸:200mm×300mm)。藉由對於此不銹鋼板,在60℃噴灑市售的洗淨劑(Finecleaner 4328:日本PARKERIZING株式會社製)的2%水溶液20秒而洗淨,接著水洗而潔淨其表面。
(表面處理及表面處理劑)
於前處理後的供試材之表面(單面)上,使用以表1中所示配合而形成的表面處理劑,以輥塗機來塗佈而使得乾燥皮膜重量(附著量)成為0.1g/m2,以熱風乾燥爐進行乾燥而使得供試材的到達溫度成為80℃。
表1中,No.1~30係本發明的表面處理劑(實施例1~30),No.31~47係本發明的範圍外之表面處理劑(比較例1~17)。構成No.15的矽烷偶合劑(A)之A1的胺基與A3的環氧丙基之當量比為5:1。又,表1中,(A)/(B)係矽烷偶合劑(A)與陽離子性胺甲酸乙酯樹脂(B)的配合質量比,(C1)/(C2)係Zr化合物(C1)與Ti化合物(C2)的配合質量比,(C)/(B)係Zr化合物及Ti化合物的合計與陽離子性胺甲酸乙酯樹脂(B)之配合質量比,(E)/(B)係構成金屬化合物的金屬種(E)(原子換算重量)與陽離子性胺甲酸乙酯樹脂(B)之配合質量比,氟/(B)係構成含氟的無機化合物(D)的氟(原子換算重量)與陽離子性胺甲酸乙酯樹脂(B)之配合質量比。以下顯示表1中的各成分之內容。
<矽烷偶合劑(A)>
A1:γ-胺基丙基三乙氧基矽烷
A2:2-胺基乙基-3-胺基丙基三甲氧基矽烷
A3:γ-環氧丙氧基丙基三甲氧基矽烷
A4:γ-巰基丙基三甲氧基矽烷
<陽離子性水系聚胺甲酸乙酯樹脂(B)>
B1:陽離子性聚醚系聚胺甲酸乙酯水分散體
B2:陽離子性聚酯系聚胺甲酸乙酯水分散體
B3:陽離子性聚碳酸酯系聚胺甲酸乙酯水分散體
B4:Superflex 410(陰離子性聚碳酸酯系聚胺甲酸乙酯水分散體,第一工業製藥株式會社製)
B5:Primal K-3(聚丙烯酸樹脂,ROHM AND HAAS公司製)
上述中,B1、B2及B3係藉由以下的手法調整。
『B1:陽離子性聚醚系聚胺甲酸乙酯樹脂(水分散體)』
將150質量份的聚醚多元醇(合成成分:聚丁二醇及乙二醇,分子量1500)、6質量份的三羥甲基丙烷、24質量份的N-甲基-N,N-二乙醇胺、94質量份的異佛爾酮二異氰酸酯基及135質量份的甲基乙基酮分別取入反應容器中,邊保持在70~75℃邊使反應,於所形成的胺甲酸乙酯預聚物中,添加15質量份的硫酸二甲酯,於50~60℃使反應30~60分鐘,而得到陽離子性胺甲酸乙酯預聚物。再者,將576質量份的水加到前述陽離子性胺甲酸乙酯預聚物中,使均勻乳化後,回收甲基乙基酮,而得到陽離子性的水溶性聚胺甲酸乙酯樹脂(B1)。
『B2:陽離子性聚酯系聚胺甲酸乙酯樹脂(水分散體)』
將135質量份的聚酯多元醇(合成成分:間苯二甲酸、己二酸及1,6-己二醇、乙二醇、分子量1700)、5質量份的三羥甲基丙烷、22質量份的N-甲基-N,N-二乙醇胺、86質量份的異佛爾酮二異氰酸酯及120質量份的甲基乙基酮分別取入反應容器中,邊保持在70~75℃邊使反應,於所形成的胺甲酸乙酯預聚物中,添加17質量份的硫酸二甲酯,於50~60℃使反應30~60分鐘,而得到陽離子性胺甲酸乙酯預聚物。再者,將615質量份的水加到前述陽離子性胺甲酸乙酯預聚物中,使均勻乳化後,回收甲基乙基酮,而得到陽離子性的水溶性聚胺甲酸乙酯樹脂(B2)。
『B3:陽離子性聚碳酸酯系聚胺甲酸乙酯樹脂(水分散體)』
將130質量份的聚碳酸酯多元醇(合成成分:1,6-己烷碳酸酯二醇、乙二醇、分子量2000)、4質量份的三羥甲基丙烷、21質量份的N-甲基-N,N-二乙醇胺、75質量份的異佛爾酮二異氰酸酯及115質量份的甲基乙基酮分別取入反應容器中,邊保持在70~75℃邊使反應,於所形成的胺甲酸乙酯預聚物中,添加22質量份的硫酸二甲酯,於50~60℃使反應30~60分鐘,而得到陽離子性胺甲酸乙酯預聚物。再者,將633質量份的水加到前述陽離子性胺甲酸乙酯預聚物中,使均勻乳化後,回收甲基乙基酮,而得到陽離子性的水溶性聚胺甲酸乙酯樹脂(B3)。
<Zr化合物(C1)>
C11:六氟鋯酸
C12:六氟鋯酸銨
C13:乙醯丙酮鋯
C14:碳酸鋯銨
C15:氧化鋯溶膠
<Ti化合物(C2)>
C21:乙醯丙酮鈦
C22:硫酸氧鈦
C23:六氟鈦酸
C24:六氟鈦酸銨
C25:月桂酸鈦
<含氟的無機化合物(D)>
D1:氟化銨
D2:氫氟酸
D3:六氟矽酸
<金屬化合物(E)>
E1:乙醯丙酮氧釩
E2:鉬酸銨
E3:偏鎢酸銨
E4:硝酸鈷
E5:氫氧化鋁
E6:硝酸鈰銨
E7:碳酸鎳
<矽石>
使用膠態矽石(日產化學工業株式會社製,商品名:Snowtex O)當作矽石。加有矽石的表面處理劑係表1中的No.6及No.7之表面處理劑。矽石的配合比係記載於表1中,No.6的表面處理劑係在No.5的表面處理劑中以配合比(矽石)/(B)為1/50所配合者,No.7的表面處理劑係在No.5的表面處理劑中以配合比(矽石)/(B)為1/10所配合者。
(薄膜層合)
於形成有表面處理皮膜的供試料上,在250℃ 5秒的條件下,熱層合熱塑性聚酯薄膜(膜厚30μm),而得到層合金屬材料。熱層合時的面壓係以50kg/cm2進行。
[比較例18~21]
作為比較例18,於50℃ 5秒噴灑處理市售的磷酸鉻酸鹽處理劑(AM-K702:日本PARKERIZING株式會社製),進行水洗而去除未反應的藥劑,於80℃加熱乾燥1分鐘而得到試驗片(Cr附著量為20mg/m2)。又,作為比較例19,於40℃ 20秒噴灑處理市售的磷酸鋯處理劑(AL-404:日本PARKERIZING株式會社製),進行水洗而去除未反應的藥劑,於80℃加熱乾燥1分鐘而得到試驗片(Zr附著量為15mg/m2)。又,作為比較例20、21,亦製作僅脫脂的試驗片。
[評價試驗]
(1次密接性)
將已薄膜層合的前述層合金屬材料衝壓成Φ140mm,將此衝壓板拉深加工以製作拉深杯。接著,再度拉深此杯,更且以3片的鍛模進行減薄拉延加工,而形成拉深減薄拉延罐(罐體)。
觀察前述經拉深減薄拉延加工後的罐體之外觀,將發生斷裂時評價為「×」,將沒有斷裂但有損傷評價為「△」,將沒有斷裂也沒有損傷時評價為「○」。然後,使用被評價為「○」的罐體,藉由市售的Enamel Rater(Peco公司製)來測定洩漏電流。使用0.5%食鹽水當作測定液,測定在6.3V 4秒後的電流值。電流值低者為佳,將未達0.1mA時評價為「◎」,將0.1mA以上且未達0.3mA時評價為「○」,將0.3mA以上且未達1.0mA時評價為「△」,將1.0mA以上時評價為「×」。
(2次密接性)
將注有5%的氫氧化鈉水溶液的罐體與注有5%的硫酸水溶液之罐體在25℃保管2星期。接著,水洗此等的罐體,洗濯後,與先前同樣地藉由市售的Enamel Rater(Peco公司製)來測定洩漏電流。測定液亦使用與先前同樣的0.5%食鹽水,測定在6.3V 4秒後的電流值。電流值係與先前同樣地低者為佳,將未達0.1mA時評價為「◎」,將0.1mA以上且未達0.3mA時評價為「○」,將0.3mA以上且未達1.0mA時評價為「△」,將1.0mA以上時評價為「×」。耐酸性、耐鹼性差者係此時的電流值變大。
(儲存安定性)
於40℃的恆溫裝置中將表面處理劑儲存3個月,以肉眼觀察其後的膠化或沈澱等之狀態,按照以下的基準來評價儲存安定性。此時,將無變化時評價為「○」,將增黏時評價為「△」,將膠化或沈澱時評價為場合「×」。
[評價結果]
對於實施例1~32及比較例1~21的各試驗片,實施前述試驗,按照評價基準進行判定。表2中顯示其結果。如由表2的結果可明知,本發明的表面處理劑係於採用作為層合薄膜用的表面處理時,發揮優異的性能。特別地,可知藉由使Zr化合物(C1)與Ti化合物(C2)共存且使兩者的含有比成為1/10以上且未達2/1,特別對於強酸及強鹼的兩方之2次密接性優異。又,可知使用含矽石的表面處理劑之實施例6及實施例7,係在全部的評價項目中皆優異。還有,可知成分組成為更佳形態或範圍的實施例9~12及實施例15,係在全部的評價項目中皆優異。
Claims (6)
- 一種層合金屬材料用表面處理劑,其特徵為含有矽烷偶合劑(A)、陽離子性胺甲酸乙酯樹脂(B)、Zr化合物(C1)、Ti化合物(C2)及含氟的無機化合物(D),配合比(A)/(B)以重量比表示為1/50以上20/1以下,配合比(C)/(B)以重量比表示為1/100以上1/2以下(惟,(C)的重量係(C1)與(C2)的合計),配合比(氟原子)/(B)以重量比表示為1/1000以上2/1以下,而且配合比(C1)/(C2)以重量比表示為1/10以上且未達2/1。
- 如申請專利範圍第1項之層合金屬材料用表面處理劑,其中前述陽離子性胺甲酸乙酯樹脂(B)係含有由二級胺基及三級胺基所選出的胺基性官能基。
- 如申請專利範圍第1或2項之層合金屬材料用表面處理劑,其中前述矽烷偶合劑(A)全體的5質量%以上係具有由一級胺基、二級胺基、三級胺基及四級銨基所選出的胺基性官能基之矽烷偶合劑。
- 如申請專利範圍第1或2項之層合金屬材料用表面處理劑,其中前述Zr化合物(C1)及前述Ti化合物(C2)係氟化物或氟酸或氟酸鹽。
- 一種層合金屬材料的製造方法,其特徵為在金屬材料的表面上塗佈乾燥如申請專利範圍第1~4項中任一項之層合金屬材料用表面處理劑,以形成0.01~1g/m2的皮膜,接著層合聚酯系樹脂、聚乙烯系樹脂、聚丙烯系樹脂或此等的改性樹脂。
- 如申請專利範圍第5項之層合金屬材料的製造方法,其中前述金屬材料係鋁系或不銹鋼系的金屬箔。
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009249886 | 2009-10-30 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201132801A TW201132801A (en) | 2011-10-01 |
| TWI532880B true TWI532880B (zh) | 2016-05-11 |
Family
ID=43921942
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW099137244A TWI532880B (zh) | 2009-10-30 | 2010-10-29 | A surface treatment agent for a laminated metal material, and a method for producing a laminated metal material |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JP5663490B2 (zh) |
| KR (1) | KR101444566B1 (zh) |
| CN (1) | CN102666922A (zh) |
| TW (1) | TWI532880B (zh) |
| WO (1) | WO2011052520A1 (zh) |
Families Citing this family (27)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2981366B1 (fr) * | 2011-10-14 | 2014-10-17 | Univ Toulouse 3 Paul Sabatier | Procede de traitement anticorrosion d'un substrat metallique solide et substrat metallique solide traite susceptible d'etre obtenu par un tel procede |
| US8343238B1 (en) | 2011-12-30 | 2013-01-01 | L'oreal Sa. | Process for altering the appearance of hair using a composition containing dyes and non-hydroxide bases |
| US8556994B2 (en) | 2011-12-30 | 2013-10-15 | L'oreal | Process for altering the appearance of hair using a composition containing direct dyes and non-hydroxide bases |
| US8506651B2 (en) | 2011-12-30 | 2013-08-13 | L'oreal S.A. | Process for altering the appearance of hair using a composition containing dyes and non-hydroxide bases |
| US8591872B2 (en) | 2011-12-30 | 2013-11-26 | L'oreal | Composition and process for reducing the curl and frizziness of hair |
| RU2609585C2 (ru) | 2012-08-29 | 2017-02-02 | Ппг Индастриз Огайо, Инк. | Циркониевые композиции для предварительной обработки, содержащие литий, соответствующие способы обработки металлических субстратов и соответствующие металлические субстраты с покрытиями |
| CA2883180C (en) | 2012-08-29 | 2017-12-05 | Ppg Industries Ohio, Inc. | Zirconium pretreatment compositions containing molybdenum, associated methods for treating metal substrates, and related coated metal substrates |
| CN103540918A (zh) * | 2013-09-27 | 2014-01-29 | 宁波金恒机械制造有限公司 | 一种铸铁表面防腐处理剂 |
| CN103540917B (zh) * | 2013-09-27 | 2016-06-22 | 宁波英科特精工机械股份有限公司 | 一种金属表面处理剂及其制备方法 |
| CN103526195B (zh) * | 2013-09-27 | 2016-06-01 | 宁波英科特精工机械股份有限公司 | 一种金属表面防腐蚀处理剂及其制备方法 |
| JP6526950B2 (ja) * | 2013-12-18 | 2019-06-05 | 日本パーカライジング株式会社 | 水系金属表面処理剤、金属表面処理皮膜及び金属表面処理皮膜付き金属材料 |
| CN110983315A (zh) * | 2013-12-18 | 2020-04-10 | 日本帕卡濑精株式会社 | 水系金属表面处理剂、金属表面处理被膜及带有金属表面处理被膜的金属材料 |
| CN104900481B (zh) * | 2014-03-04 | 2018-06-01 | 中芯国际集成电路制造(上海)有限公司 | 清洗焊盘的方法 |
| KR101867913B1 (ko) * | 2015-01-20 | 2018-07-23 | 케이씨에프테크놀로지스 주식회사 | 연성회로 동장 적층판과 이를 이용한 인쇄회로 기판 및 그 제조 방법 |
| KR102313803B1 (ko) * | 2015-01-20 | 2021-10-15 | 에스케이넥실리스 주식회사 | 연성회로 동장 적층판과 이를 이용한 인쇄회로 기판 및 그 제조 방법 |
| KR102313800B1 (ko) * | 2015-01-20 | 2021-10-15 | 에스케이넥실리스 주식회사 | 연성회로 동장 적층판과 이를 이용한 인쇄회로 기판 및 그 제조 방법 |
| JP6495702B2 (ja) * | 2015-03-19 | 2019-04-03 | 株式会社神戸製鋼所 | 表面処理方法および表面処理装置 |
| JP6510844B2 (ja) * | 2015-03-20 | 2019-05-08 | 株式会社神戸製鋼所 | 表面処理方法、表面処理装置およびアルミニウム表面処理材料 |
| CN105441920B (zh) * | 2015-11-12 | 2018-11-30 | 上海耀岩化学品有限公司 | 以硅烷偶联剂为主要成分的金属表面处理剂及其制备方法 |
| CN107488847B (zh) * | 2016-06-12 | 2019-10-25 | 宝山钢铁股份有限公司 | 一种表面处理剂、涂覆有该表面处理剂的搪瓷用钢和零件 |
| US11518960B2 (en) | 2016-08-24 | 2022-12-06 | Ppg Industries Ohio, Inc. | Alkaline molybdenum cation and phosphonate-containing cleaning composition |
| PL3336219T3 (pl) * | 2016-12-19 | 2019-10-31 | Henkel Ag & Co Kgaa | Sposób chroniącej przed korozją i czyszczącej obróbki wstępnej metalicznych elementów konstrukcyjnych |
| CN115786897B (zh) * | 2018-03-29 | 2025-07-29 | 日本帕卡濑精株式会社 | 表面处理剂、以及具有表面处理皮膜的铝或铝合金材料及其制造方法 |
| KR102428824B1 (ko) * | 2019-12-11 | 2022-08-02 | 주식회사 포스코 | 금속-플라스틱 복합소재 및 이의 제조 방법 |
| JP7060178B1 (ja) * | 2020-10-05 | 2022-04-26 | Jfeスチール株式会社 | 有機樹脂被覆用表面処理鋼板及びその製造方法、並びに有機樹脂被覆鋼板及びその製造方法 |
| CN112281148A (zh) * | 2020-10-27 | 2021-01-29 | 宁波沈鑫电子有限公司 | 一种金属表面处理剂 |
| TWI881642B (zh) * | 2023-12-29 | 2025-04-21 | 財團法人工業技術研究院 | 防蝕結構 |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3998057B2 (ja) * | 2002-04-23 | 2007-10-24 | 日本ペイント株式会社 | ノンクロム金属表面処理方法、及び、アルミニウム又はアルミニウム合金板 |
| JP3904983B2 (ja) * | 2002-06-14 | 2007-04-11 | 日本ペイント株式会社 | 被覆金属材料、及び、ノンクロム金属表面処理方法 |
| JP3904984B2 (ja) * | 2002-06-14 | 2007-04-11 | 日本ペイント株式会社 | 被覆金属材料、及び、ノンクロム金属表面処理方法 |
| JP4083661B2 (ja) * | 2003-10-16 | 2008-04-30 | 古河スカイ株式会社 | 片面ラミネート被覆深絞りしごき缶用アルミニウム合金条の製造方法 |
| JP2006328445A (ja) * | 2005-05-23 | 2006-12-07 | Nippon Parkerizing Co Ltd | プレコート金属材料用水系表面処理剤、表面処理方法及びプレコート金属材料の製造方法 |
| JP5086040B2 (ja) * | 2007-11-19 | 2012-11-28 | 関西ペイント株式会社 | 金属表面処理組成物 |
| JP5529372B2 (ja) * | 2007-11-20 | 2014-06-25 | 関西ペイント株式会社 | 金属表面処理組成物 |
-
2010
- 2010-10-25 WO PCT/JP2010/068809 patent/WO2011052520A1/ja not_active Ceased
- 2010-10-25 JP JP2011538405A patent/JP5663490B2/ja active Active
- 2010-10-25 CN CN2010800486128A patent/CN102666922A/zh active Pending
- 2010-10-25 KR KR1020127013818A patent/KR101444566B1/ko not_active Expired - Fee Related
- 2010-10-29 TW TW099137244A patent/TWI532880B/zh not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| WO2011052520A1 (ja) | 2011-05-05 |
| KR101444566B1 (ko) | 2014-09-24 |
| JPWO2011052520A1 (ja) | 2013-03-21 |
| JP5663490B2 (ja) | 2015-02-04 |
| KR20120079478A (ko) | 2012-07-12 |
| TW201132801A (en) | 2011-10-01 |
| CN102666922A (zh) | 2012-09-12 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| TWI532880B (zh) | A surface treatment agent for a laminated metal material, and a method for producing a laminated metal material | |
| KR101268720B1 (ko) | 프레코트 금속 재료용 수계 표면 처리제, 표면 처리 금속 재료 및 프레코트 금속 재료 | |
| CN102877055B (zh) | 金属表面处理剂以及利用该处理剂进行处理而得到的金属材料 | |
| KR101708155B1 (ko) | 수계 금속 표면 처리제 및 그 처리제로 처리하여 이루어지는 금속 재료 | |
| JP2006328445A (ja) | プレコート金属材料用水系表面処理剤、表面処理方法及びプレコート金属材料の製造方法 | |
| JP5889561B2 (ja) | 水系金属表面処理剤及び表面皮膜付き金属材料 | |
| JP5718752B2 (ja) | 金属表面処理剤及びその処理剤で処理してなる金属材料 | |
| JP5457611B1 (ja) | 傷部及び端面耐食性に優れた表面処理亜鉛系めっき鋼板及びその製造方法 | |
| CN105143513B (zh) | 涂装钢板用基底处理组合物、以及进行了基底处理的镀覆钢板及其制造方法、涂装镀覆钢板及其制造方法 | |
| KR20100020429A (ko) | 프라이머 겸용 수계 도장 하지 처리제, 표면 처리 금속 재료 및 프레코트 금속 재료 | |
| KR101712253B1 (ko) | 표면 처리 알루미늄판 및 유기 수지 피복 표면 처리 알루미늄판 그리고 이것을 이용하여 이루어지는 캔체 및 캔 덮개 | |
| TWI509105B (zh) | 複層表面處理鋼板所用之黏著層形成用組成物 | |
| CN101378967A (zh) | 易开盖 | |
| JP6244729B2 (ja) | 樹脂被覆シームレスアルミニウム缶 | |
| JP6428857B2 (ja) | 表面処理液及び該表面処理液を用いた表面処理アルミニウム板の製造方法並びに表面処理アルミニウム板 | |
| JP6186792B2 (ja) | 表面処理アルミニウム板及び有機樹脂被覆表面処理アルミニウム板並びにこれを用いて成る缶体及び缶蓋 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MM4A | Annulment or lapse of patent due to non-payment of fees |