TWI526865B - Gui device for direct drawing device, direct drawing system, method for setting drawing area and recording medium - Google Patents

Description

Graphic user interface device for direct drawing device, direct drawing system, drawing area setting method, and recording medium

The present invention relates to a graphical user interface device (GUI device) for directly drawing a device, which draws a wiring pattern or the like on a substrate on which a photoresist film is formed.

Conventionally, various patterns such as a semiconductor substrate, a printed wiring board, and a glass substrate are irradiated with light passing through the mask to form a pattern. In recent years, in order to cope with the formation of various patterns, there is a technique of performing exposure processing by directly irradiating a substrate with spatially modulated light without using a photomask to draw a pattern.

The exposure apparatus that performs the exposure processing as described above is called a direct drawing device. For example, Patent Document 1 describes a graphic user interface device for directly drawing a device (for example, paragraph 0054 and FIG. 3 in Patent Document 1). The graphic user interface device is used when a plurality of block units are set over substantially the entire surface of a circularly shaped substrate to set exposure conditions such as drawing parameters. The block has a rectangular shape and is arranged on the substrate in the column direction and the row direction. In other words, a plurality of blocks are arranged in a matrix on the substrate.

In addition, a technique for performing exposure processing on an end portion of the substrate corresponding to the arc-shaped strip-shaped region in which the plating electrode is formed is described in Patent Document 2 (for example, the paragraph in Patent Document 2) 0029 and Figure 17). In addition to the electrode for plating, a numbered region in which an arc-shaped strip having a serial number or the like is formed by laser marking or the like is provided at the end portion of the substrate, and the arc-shaped strip-shaped region is also required to be considered in the exposure processing.

[Previous Technical Literature] [Patent Literature]

[Patent Document 1] Japanese Patent Laid-Open Publication No. 2013-77718

[Patent Document 2] Japanese Patent Laid-Open Publication No. 2005-5462

Fig. 17 shows arc-shaped strip-shaped regions E1 to E8 in which eight plating electrodes are to be formed along the peripheral edge at the end portion of the circular-shaped substrate W. When the arcuate strip regions E1 to E8 are subjected to rendering processing by the direct drawing device, it is necessary to set the positions of the arcuate strip regions E1 to E8 to the drawing region or non-deline in the graphic user interface device. region.

For example, when designing one arc-shaped strip-shaped region E1 by the graphic user interface device, it is considered to designate each of the position P1, the position P2, the position P3, and the position P4 at the four corners of the arc-shaped strip-shaped region E1. The method of two-dimensional coordinate values (x1, y1), (x2, y2), (x3, y3), and (x4, y4). In this method, since each coordinate value has two pieces of information, it is necessary to input a total of eight pieces of information to the graphic user interface device, thereby causing a problem that the setting operation amount is increased.

Moreover, when the coordinate value of the four corners of the arc strip region is input by the operator using the graphic user interface device as described above, it is difficult to intuitively understand the position of the circular strip-shaped region relative to the circular shaped substrate or Other issues like scope. For example, if the substrate has a rectangular shape, it is easy to intuitively set the strip-shaped region based on the two-dimensional coordinate value. However, if the substrate has a circular shape, it is not easy to intuitively grasp the arc-shaped strip region based on the two-dimensional coordinates.

In view of the above circumstances, an object of the present invention is to provide a graphic user interface device for direct drawing device, a direct drawing system, a drawing region setting method, and a recording The recording medium can intuitively set the arcuate strip-shaped area on the circular substrate as a drawing area or a non-drawing area of the direct drawing device with a small amount of work.

A first aspect of the invention is a graphic user interface device for use in a direct drawing device for patterning a photoresist film formed on a surface of a circular substrate for setting an arc band in a substrate. The graphic user interface device includes: a display unit having a screen; an operation unit that operates the screen of the display unit; and a display control unit that controls display of the screen of the display unit; Further, the display control unit includes a week information input unit that displays an input area for inputting information on a length of a circular arc-shaped region in a circumferential direction on the screen of the display unit, and a diameter information input unit. An input area for inputting positional information of an arcuate strip-shaped region in a radial direction of the substrate is displayed on the screen of the display unit; and a width information input unit is displayed on the screen of the display unit for inputting a circle An input area of the width information in the radial direction of the arc strip region; a drawing instruction input unit displayed on the screen of the display unit An input area for inputting an arcuate strip-shaped area set by the radial information input unit, the weekly information input unit, and the width information input unit as either a drawing area or a non-drawing area; and a confirmation display unit And displaying the outer shape of the substrate and the arc-shaped strip-shaped region on the screen of the display unit, wherein the arc-shaped strip-shaped region is input to the radial information input unit, the weekly information input unit, and the width by the operation unit. The information input unit and the above-mentioned information indicating the input unit are drawn.

According to a second aspect of the invention, the display control unit combines the weekly information input unit, the radial information input unit, the width information input unit, and the drawing instruction input unit, and combines the display information with the display unit. An input area for inputting each piece of information in the circumferential direction is displayed on the screen.

According to a third aspect of the invention, the week information input unit displays, on the screen of the display unit, a numerical value for inputting an angle as a circumference of an arc band region. An input area for information relating to the length, or an input area for inputting the length dimension of the arc as information relating to the length of the circular arc-shaped region in the circumferential direction.

According to a fourth aspect of the invention, the width information input unit displays a plurality of input areas for inputting width information to a plurality of ranges in the radial direction on the screen of the display unit.

A fifth aspect of the invention provides a direct drawing system comprising: the graphic user interface device according to any one of the first invention to the fourth invention; and a direct drawing device that scans the photoresist film with a spatially modulated light beam Draw a pattern.

According to a sixth aspect of the invention, there is provided a drawing area setting method of setting a drawing area to be drawn as a direct drawing device or a non-drawing area not to be drawn by a graphic user interface device having a display unit and an operation unit; In the area, the drawing area setting method includes an input screen display step of displaying an input area for inputting information related to the length of the circular arc-shaped area in the circumferential direction on the screen of the display unit, for inputting An input region of position information in a radial direction of the substrate, an input region for inputting width information in a radial direction of the arc strip region, and an input circular arc region as either a drawing region or a non-drawing region Information input area; the information input step is performed by the operation unit respectively inputting each piece of information to each input area displayed on the screen of the display unit by the input screen display step; and confirming the display step Displaying the shape of the substrate and the information input based on the information input step on the screen of the display unit Circular arc band.

According to a seventh aspect of the invention, the combination of the input areas displayed by the input screen display step is displayed in a plurality of circumferential directions, and the information input step is performed for each of the combinations of the input areas. The step of entering the information in order.

An eighth aspect of the invention is a recording medium characterized by recording a computer readable program provided in a graphic user interface device, the graphic user interface device being attached to a photoresist film formed on a surface of a circular substrate Used in the direct drawing device for drawing patterns, The circular strip-shaped area in the substrate is set as a drawing area or a non-drawing area, and the recording medium recording program causes the computer to perform the following functions on the screen of the display unit of the graphic user interface device: display of the weekly information input area Function, which is an input area for inputting information related to the length of the circular arc-shaped region in the circumferential direction; a display function of the radial information input region, which is a circular strip-shaped region for inputting the radial direction of the substrate The input area of the position information; the display function of the width information input area, which displays an input area for inputting the radial width information of the arc strip region; the display function indicating the input area is displayed for input An arc-shaped region set by the radial information input unit, the weekly information input unit, and the width information input unit is an input region for information of any one of a drawing region and a non-drawing region; and a confirmation display function Displaying an outer shape of the substrate and the arc-shaped strip-shaped region, wherein the arc-shaped strip region is based on the graphic Interface by means of the operating portion having a diameter above are input to the input region information, information obtained by the information input by the peripheral region of the input region and the width of the rendering information indicative of the input region.

According to a ninth aspect of the invention, the computer has the function of: the track information input area, the week information input area, the width information input area, and the drawing instruction input area on the screen of the display unit; A combination, and in this combination, an input area for sequentially inputting information in the circumferential direction is displayed.

According to a tenth aspect of the invention, in the eighth aspect of the invention, the computer is configured to display, on the screen of the display unit, an input value for inputting an angle as information relating to a length of a circumferential direction of the arcuate strip-shaped region. The area, or the input area for inputting the length dimension of the arc as the information relating to the length of the circular arc-shaped area in the circumferential direction.

According to an eleventh aspect of the invention, the computer has a function of displaying a plurality of input areas for inputting width information to a plurality of ranges in the radial direction on the screen of the display unit.

According to any one of the first invention to the eleventh aspect of the present invention, a graphic user interface device, a direct drawing system, a drawing area setting method, and a recording medium for a direct drawing device can be provided, and can be intuitively set with a small amount of work The arc-shaped strip-shaped area on the circular-shaped substrate serves as a drawing area or a non-drawing area of the direct drawing device.

1‧‧‧Design data creation device

2‧‧‧Graphic user interface device

3‧‧‧Image processing device

4‧‧‧Direct drawing system

5‧‧‧ computer

7‧‧‧ screen

10‧‧‧ mounting table

10a‧‧‧Part 1

10b‧‧‧Part 2

20‧‧‧Moving station moving mechanism

21‧‧‧Rotating mechanism

22‧‧‧Support board

23‧‧‧Sub Scanning Mechanism

23a‧‧‧Linear motor

23b‧‧‧A pair of rails

24‧‧‧floor

25‧‧‧Main scanning mechanism

25a‧‧‧linear motor

25b‧‧‧A pair of rails

30‧‧‧Location parameter measuring mechanism

31‧‧‧Laser light exit

32‧‧‧Distributor

33‧‧‧Curve bender

34‧‧‧1st cognac

35‧‧‧2nd cognac

50‧‧‧ Optical head

53‧‧‧Lighting optical system

54‧‧‧Laser oscillator

55‧‧‧Laser drive

60‧‧‧Aligning the camera

70‧‧‧Control Department

71‧‧‧ computer

72‧‧‧ memory

73‧‧‧Rasterization Department

75‧‧‧Data Generation Department

76‧‧‧Drawing pattern information

77‧‧‧Grating data

80‧‧‧Confirm display area

90‧‧‧Input area

91‧‧‧"No." column

92‧‧‧"θ" column

93‧‧‧"R0" column

94‧‧‧"Inside" column

95‧‧‧"Outside" column

96‧‧‧"Exposure" column

97‧‧‧ radio button

98‧‧‧ radio button

99‧‧‧"Arc length" column

100‧‧‧Direct drawing device

101‧‧‧ ontology framework

102‧‧‧ Cover

110‧‧‧Substrate storage area

120‧‧‧Transfer robot

130‧‧‧Abutment

140‧‧‧ head support

141‧‧‧foot members

142‧‧‧ foot members

143‧‧ ‧ beam components

144‧‧‧ beam members

172‧‧‧ box

200‧‧‧Display Department

230‧‧‧CPU

231‧‧‧ROM

232‧‧‧ memory

233‧‧‧Media Drive

234‧‧‧Operation Department

235‧‧‧ bus line

240‧‧‧Display Control Department

241‧‧Week Information Input Department

242‧‧‧Path Information Input Department

243‧‧‧Width Information Input Department

244‧‧‧Drawing instruction input section

245‧‧‧Confirmation display

400‧‧‧Graphic drawing system

511‧‧‧Space light modulator

512‧‧‧Light modulation unit

513‧‧‧Drawing Signal Processing Department

514‧‧‧Exposure Control Department

515‧‧‧Drawing Control Department

516‧‧‧Mirror

517‧‧‧Projection optical system

518, 519, 520, 522‧‧ lens

521‧‧‧shading board

524‧‧‧focus lens

530a‧‧‧ movable belt

531b‧‧‧Fixed tape

535‧‧‧ thick line

536‧‧‧Drive circuit unit

540‧‧‧ far mirror

541‧‧‧ Concentrating lens

542‧‧‧Duffer

543‧‧ ‧focus lens

Center of Ct‧‧‧ substrate

D0‧‧‧Design materials

D1‧‧‧ Revised design information

E1~E8‧‧‧ arc band

E1a‧‧‧1st arc band

K1‧‧‧non-depiction area

L3‧‧‧ imaginary circle

M‧‧ Record Media

N‧‧‧Network

P‧‧‧ program

R0‧‧‧ imaginary line

R1‧‧‧ imaginary line

R2‧‧‧ imaginary line

R3‧‧‧ imaginary line

S1~S5, S10~S40‧‧‧ steps

Width of t1‧‧‧

T1‧‧‧Arc area data

W‧‧‧Substrate

WO‧‧‧ outline

Figure 1 is a diagram showing a rendering system including an exposure system.

Figure 2 is a block diagram showing the hardware configuration of the graphical user interface device.

Figure 3 is a block diagram showing the functional configuration of the graphical user interface device.

Fig. 4 is a flow chart showing the flow of drawing area setting.

Fig. 5 is a view showing an initial input screen.

6(a) and 6(b) are diagrams for explaining the information input operation in the first embodiment.

Fig. 7 is a view showing a screen after input.

8(a) and 8(b) are diagrams for explaining the information input operation in the second embodiment.

9(a) and 9(b) are diagrams for explaining the information input operation in the third embodiment.

Figure 10 is a side elevational view of the device directly depicted.

Figure 11 is a top plan view of the device directly depicted.

Fig. 12 is a view showing an illumination optical system and a projection optical system.

Fig. 13 is a view showing an enlarged view of a spatial light modulator.

Fig. 14 is a block diagram showing the connection structure between each unit of the direct drawing device and the control unit.

Fig. 15 is a block diagram showing a control unit for controlling the drawing operation.

Figure 16 is a flow chart for directly depicting the actions of the device.

Figure 17 is a diagram for explaining the background art.

Hereinafter, embodiments of the present invention will be described with reference to the accompanying drawings.

<The whole structure of the system>

Fig. 1 is a view showing a graphic drawing system 400 including a direct drawing system 4 as an embodiment of the present invention. The pattern drawing system 400 is a system for selectively exposing a photoresist film on a circular semiconductor substrate (hereinafter simply referred to as "substrate"), thereby directly drawing a pattern corresponding to a circuit pattern on the photoresist film. .

The graphic drawing system 400 includes a design data creating device 1, an image processing device 3, and a direct drawing device 100 that are connected to each other via a network N such as a LAN. The image processing device 3 includes a graphic user interface device 2.

The design data creation device 1 is a device for creating and editing data, and the data describes a pattern region to be drawn on a substrate as a drawing object. Specifically, the data is created by graphically describing the graphic data in the form of a vector. Hereinafter, this material is referred to as design data D0. The design data D0 created by the design data creation device 1 is transmitted to the image processing device 3 and the direct drawing device 100 via the network N, respectively. In addition, the design data D0 is used to form a wiring pattern or the like of a semiconductor wafer on the surface of the substrate W other than the arc-shaped strip-shaped regions E1 to E8 to be described later.

The image processing device 3 corrects the design data D0 transmitted via the network N to create the corrected design data D1. The corrected design data D1 created by the image processing apparatus 3 is transmitted to the direct drawing apparatus 100 via the network N.

Specifically, the image processing device 3 has a function of performing a process of increasing the line width size of the circuit pattern to be exposed (drawn) (thickening processing) on the design material D0 in accordance with the change of the exposure condition (drawing condition), Or the processing of reducing the line width size (thinning processing), and obtaining the corrected design data D1. The thickening and thinning processing is performed by dividing a plurality of block units in the substrate.

Further, the image processing device 3 corrects the exposure conditions of the respective blocks in the design data D0. For example, it has the following function: when the design data D0 is a material that is exposed to a standard pattern for all the blocks, it is corrected to the data of the specific block to be exposed by the test pattern. Obtained revised design data D1. Here, the "standard pattern" is used to form a pattern for forming a circuit pattern of a semiconductor element, and unlike the "standard pattern", the "test pattern" is used for verification of, for example, a semiconductor element or a manufacturing process. The pattern of the circuit pattern exposure.

Further, the image processing apparatus 3 has a function of setting the circular arc area data T1 or setting for setting the arc-shaped strip-shaped region for forming the plating electrode at the end portion of the substrate or the like using the graphic user interface device 2. A material T1 for forming an arc area for forming an arc band region of a number or the like. Further, the arc area data T1 may be a data such that a serial number or the like formed at the end portion of the substrate by laser marking or the like is not broken by the subsequent step, and a serial number or the like is formed. The number area is set to an arc band area.

<Composition of Graphic User Interface Device>

The graphic user interface device 2 is provided in the image processing device 3 and functions as a graphical user interface for the operator. 2 is a block diagram showing the hardware configuration of the graphical user interface device 2.

The graphic user interface device 2 is, for example, a computer 5, and includes a CPU 230, a ROM 231, a memory 232, a media drive 233, a display unit 200, an operation unit 234, and the like. The hardware is electrically connected by bus bar 235, respectively.

The CPU 230 controls the hardware components based on the program stored in the ROM 231 (or the program read by the media drive 233) P to realize the function of the computer 5 (the graphic user interface device 2). The program P is readable by the computer 5 and causes the computer 5 to perform various functions. Further, the program P stored in the hard disk drive (HDD) may be read into the RAM to cause the computer 5 to perform various functions.

The ROM 231 is a memory device for storing the program P and the data required for the control of the graphic user interface device 2 in advance.

The memory 232 is a memory device that can be read and written, and temporarily stores data generated by the CPU 230 when performing arithmetic processing. The memory 232 is composed of SRAM, DRAM or the like.

The media drive 233 has a function of reading information stored in the recording medium M. The recording medium M is a portable recording medium such as a CD-ROM, a DVD (Digital Versatile Disk), or a floppy disk. For example, when the program P is recorded in advance on the recording medium M, the computer 5 reads the program P through the recording medium M.

The display unit 200 includes a display such as a color LCD, and variably displays an image for operation of the user interface of the graphic, various materials, operation states, and the like.

The operation unit 234 is provided with a keyboard and a mouse input device, and accepts user operations of commands or input of various materials. The operator uses the operation unit 234 to input various information to the graphic user interface operation screen displayed on the display unit 200, and operates the screen of the display unit 200.

3 is a block diagram showing the functional configuration of the graphical user interface device 2. FIG. 3 is a block diagram showing the functions of the hardware configuration of the graphic user interface device 2 by the program P shown in FIG. 2, but the functional blocks can be combined by hardware and software. It is implemented in various forms.

As shown in FIG. 3, the graphic user interface device 2 includes a display control unit 240. The display control unit 240 controls the screen display of the display unit 200, and includes a weekly information input unit 241, a radial information input unit 242, a width information input unit 243, a drawing instruction input unit 244, and a confirmation display unit 245. The display control unit 2 realizes the functions of the respective units by the operation of the operation unit 234 by the operator, and the details thereof will be described in the description of the operation.

<Flow of drawing area setting>

Fig. 4 is a flow chart showing the flow of drawing area setting. The flow of the operation of setting the arcuate strip-shaped region will be described with reference to Fig. 4 . First, in the input screen display step of step S10, the initial input screen is displayed on the screen of the display unit 200 provided in the graphic user interface device 2. FIG. 5 is an example of an initial input screen, and a confirmation display area 80 and an input area 90 are displayed on the screen 7. The input area 90 is displayed on the screen 7 by the functions of the above-described weekly information input unit 241, the diameter information input unit 242, the width information input unit 243, and the drawing instruction input unit 245. Regarding the details of the input area 90, as the next The step of step S20 is described in the information input step.

Returning to Fig. 4, the information input step of step S20 will be described. The information input step includes a weekly information input step (step S21), a radial information input step (step S22), a width information input step (step S23), and a drawing instruction input step (step S24).

<First Embodiment>

A first embodiment which is an example of the information input step (step S20) will be described with reference to Fig. 6 . Fig. 6(a) conceptually shows a state in which the first arc-shaped strip-shaped region E1 and the second arc-shaped strip-shaped region E2 are set, and Fig. 6(b) shows a state in which the information is input to the input region 90.

As shown in FIG. 6(b), the input area 90 is an input area having a list of rows and columns. In the "No." column 91 of the first row, the column number of the list is displayed, and the first column displays "0" as the initial value (preset value). The second column is sequentially displayed as "1, 2, 3‧‧‧", and each column is a combination for specifying an arc band.

The "θ" column 92 of the second line is an input area displayed by the function of the week information input unit 241, and is an input area for inputting the numerical value of the angle. Further, when the "arc length" column 99 is set as the input area displayed by the function of the week information input unit 241, the "θ" column 91 displays the arc input in the "arc length" column 99. The length of the corresponding dimension of the length dimension. The value of the angle input in the "θ" column 92 or the length dimension of the arc input in the "arc length" column 99 is information relating to the length of the circumferential direction of the arc band region.

In the "R0" column 93 of the third row, the length from the center of the substrate to the arc-shaped strip-shaped region in the radial direction, which is one of the positional information of the arc-shaped strip-shaped region in the radial direction of the substrate of the circular shape to be drawn, is input. The input area of the size is an input area displayed by the function of the diameter information input unit 242.

The "inner" column 94 on the fourth line and the "outer" column 95 on the fifth line are respectively used to input an input area having a length dimension inside the virtual circle having a radius of the length dimension input in the "R0" column 93. Specifically, the "inner" column 94 and the "outer" column 95 are used to input and input the input area of the width dimension of the arc-shaped strip-shaped region in the radial direction in two stages, and the "inner" column 94 The width dimension of the center Ct side of the middle input substrate, and the width dimension of the imaginary circle side is input to the "outer" column 95. The input area of the "inner" column 94 and/or the "outer" column 95 is an input area displayed by the function of the width information input unit 243.

In the "Exposure" column 96 of the sixth row, two radio buttons 97 and 98 arranged side by side are displayed. In the case of selecting the radio button 97 on the left side, the area input and set in the "inside" column 94 is entered as the information of the drawing area (which should be exposed) to be drawn. In the case where the radio button 98 on the right side is selected, the area input and set in the "outside" column 95 is entered as the information of the drawing area (which should be exposed) to be drawn. On the contrary, the state in which the radio buttons 97 and 98 are not selected is a state in which this area is input as a non-drawing area which is not an area to be drawn. The "Exposure" column 96 is displayed by drawing the function of the instruction input unit 244.

In the "arc length" column 99 of the seventh row, the length of the angular range input in the "θ" column 92 in the circumferential length of the imaginary circle having the radius of the length dimension input in the "R0" column 93 is displayed as an arc. The size of the length. Further, regarding the "arc length" column 99, the "arc length" column 99 may be set as an input area displayed by the function of the week information input unit 242. In this case, information relating to the arc length of the arc band region is input to the "arc length" column 99, and the value of the angle is displayed in the "θ" column 92 as described above based on the input value.

In "No. 0" of the first column, the "θ" column 92 displays 0 degrees as an initial value (preset value). It conceptually represents an imaginary line R0 extending in the radial direction from the center Ct of the substrate shown in Fig. 6(a).

Returning to Fig. 4, the information input step S20 will be described. First, in the week information input step of step S21, in the "No. 1" of the second column of the input area 90 shown in Fig. 6 (b), for example, "10" is input in the "θ" column 92. Next, for example, "150" mm is input to the "R0" column 93 by the path information input step of step S22.

It is conceptually shown that the imaginary line R1 extending from the center Ct of the substrate shown in Fig. 6(a) by a length of 150 mm in the radial direction is located at an angle of 10 degrees in the counterclockwise direction with respect to the imaginary line R0. Furthermore, the symbol WO in the figure indicates a shape line outside the substrate, in this case, the substrate The radius is 150 mm. In this embodiment, the outer shape line WO of the substrate coincides with the imaginary circle L3. The value entered in the "R0" column 93 is arbitrary, and if it is a value other than "150" mm, the outline WO does not coincide with the imaginary circle.

Next, by the width information input step of step S23, for example, "5" mm is input in the "inner" column 94 of the same column (column 2). It is shown that the width dimension t1 of the inner region is set to 5 mm in the two-stage region from the end of the imaginary line R0 and the imaginary circle L3 of the terminal of the imaginary line R1 toward the inner side (the center Ct side of the substrate). Further, "0" is input to the "outer" column 95, which indicates that there is no width in the area in the outer and outer regions of the two stages. As a result, the first arc-shaped strip-shaped region E1 having the width dimension t1 of 5 mm is set.

Next, by the drawing instruction input step of step S24, the radio button 97 on the left side of the "exposure" column 96 of the same column (column 2) is selected and designated. This selection designates a region corresponding to the width dimension input in the input "inner" column 94 as the drawing region to be drawn, and as a result, the first arc band region E1 is input as the drawing region to be drawn. On the other hand, when the first arc-shaped strip-shaped area E1 is set as the non-drawing area which is not drawn, the radio button 98 on the right side of the "exposure" column 96 is selected and designated. In this case, the radio button 97 corresponding to the left side of the drawing instruction to the "inside" column 94 is not selected. Therefore, the area of the width size input in the "inner" column 94 is set as the non-drawing area.

In the "arc length" column 99 of the same column (second column), "26.17" mm is displayed as the length of the arc in conjunction with the input operation to the "θ" column 92. In the case where the week information input step (step S22) is executed by using the "arc length" column 99 as the input area, if "26.17" mm is input in the "arc length" column 99, the first circle can be set in the same manner. Arc band area E1. In this case, in conjunction with the input operation to the "arc length" column 99, "10" is displayed in the "θ" column 92.

Furthermore, the weekly information input step, the diameter information input step, the width information input step, and the drawing instruction step in the information input step are not necessarily performed in the above order, and the step sequence may be arbitrarily set.

Next, by the confirmation display step of step S30, the shape of the first arc-shaped strip-shaped region E1 and the arrangement position on the substrate are displayed in the confirmation display area 80 of the screen 7 by the function of the confirmation display unit 245.

Next, in step S40, the operator determines whether or not the setting of the arc-shaped strip-shaped area in the substrate is completed based on the display content in the confirmation display area 80 or the like, and returns to the case where the determination is not completed (in the case of No), and returns. To the information input step (step S20), the input job is continued. When it is judged that the setting operation has been completed (in the case of Yes), the setting operation is ended.

In the case of No in step S40, for example, steps S21 to S24, which are input operations of "No. 2" in the third column shown in the input area 90 of Fig. 6(b), are executed by the operator. Specifically, the operator uses the operation unit 234 to input "35" degrees into the "θ" column 92, "150" mm into the "R0" column 93, and input "0" mm and "outside" to the "Inside" column 94. In the field, enter "0" mm and specify the radio button 97 on the left side of the "Exposure" column. At this time, "91.58" mm is displayed in the "Arc Length" column 99. Further, similarly to the above, instead of inputting to the "θ" column 92, an input operation to the "arc length" column 99 may be performed.

By inputting each piece of information to each input area of "No. 2" in the third column, an imaginary line R2 having a length of 150 mm is conceptually placed in the inverse of the imaginary line R1 shown in Fig. 6(a). The direction of the hour hand advances after 35 degrees. A region having a width of "0" mm from the end of the connection imaginary line R1 and the end of the arc of the imaginary line R2 toward the inner side is an arc band-shaped region, but in this case, since there is no width dimension Therefore, the arc band region is not substantially set.

Next, the input operation of "No. 3" in the fourth column shown in the input area 90 of Fig. 6(b), that is, the steps S21 to S24, is executed by the operator. The input content is the same as the input content in "No. 2" of the second column, and the operator inputs "10" degrees to the "θ" column 92 and "150" mm to the "R0" column 93 using the operation unit 234. Enter "5" mm in the "Inside" column 94 and "0" mm in the "Outside" column, and specify the radio button on the left side of the "Exposure" column. Button 97. At this time, "26.17" mm is displayed in the "Arc Length" column 99. Further, similarly to the above, the input operation to the "arc length" column 99 may be performed instead of the input to the "θ" column 92.

By inputting each piece of information to each input area of "No. 3" in the fourth column, an imaginary line R3 having a length of 150 mm is displayed, which is conceptually arranged counterclockwise from the imaginary line R2 shown in Fig. 6(a). The direction is advanced after 10 degrees. A region having a width of "5" mm toward the inner side of the arc of the terminal connecting the imaginary line R2 and the imaginary line R3 is set as the second arc-shaped strip-shaped region E2.

Fig. 7 is an example of the screen 7 when the setting operation is completed (Yes) by the step S40 of Fig. 6. In FIG. 7, the result of the operation shown in FIG. 6 is repeated, and the state in which the first to eighth arc-shaped strip-shaped regions E1 to E8 are set is combined with the substrate outer shape WO by the confirmation display portion. The function of 245 is displayed on the confirmation display area 80. Specifically, it is confirmed that the display region 80 displays a state in which eight arc-shaped strip-shaped regions E1 to E8 having a length of 10 degrees in the circumferential direction and a size of 5 mm in the radial direction are spaced apart from each other by 35 degrees along the substrate outer shape WO. And configuration. Further, the input result of the second column (No. 1) to the 17th column (No. 16) is displayed in the input area 90.

When the setting operation in step S40 is completed, the arc area information T1 corresponding to the arc band regions E1 to E8 is generated by the image processing device 3, and transmitted to the direct drawing device 100 via the network N. The image processing device 3 generates, for example, the arc area data T1 as vector data indicating an outer line such as the arc band area E1. Furthermore, the image processing device 3 can also synthesize the circular region data T1 and the design data D0 or the modified design data D1 based on the vector data, and send the synthesized vector data to the network N through the network N. The device 100 is directly depicted.

As described above, the arc band region is set by the week information input in the "θ" column 92, the path information input in the "R0" column, and the three pieces of width information input in the "inner" column 94. 8 with coordinates of 4 corners for the arc-shaped strip region shown in Fig. 17 Compared with the previous example in which the information is set, the amount of work can be reduced.

Further, as described above, the length of the circular strip-shaped region in the circumferential direction is specified according to the information of the angle information or the length of the arc, and the position of the radial direction is specified by the distance from the center of the substrate, so as to be the length of the arc. By specifying the width dimension in the radial direction, the arc band region can be intuitively set as compared with the method of specifying the coordinates of the four corners of the arc band region shown in FIG. Since the base substrate has a circular shape and the arcuate strip-shaped region is set on the peripheral portion of the substrate, the setting method of the present embodiment can be intuitively performed.

Further, the information input step (step S20) of the above-described steps S21 to S24 is set as one combination to form one arc-shaped strip-shaped region, and the setting operation is sequentially repeated in the circumferential direction of the substrate, whereby the circumferential direction can be easily performed. Global setting operation. For example, as shown in the previous example shown in FIG. 17, for example, the operation of designating the coordinate positions of the four corners of the eight arc-shaped strip-shaped regions requires that the two-dimensional coordinate positions in the circular-shaped substrate are found one by one for each coordinate, and thus easily.

<Second embodiment>

A second embodiment which is another example of the information input step (step S20) will be described with reference to Fig. 8 .

The difference from the above-described first embodiment is that in the width information input step of step S23, "0" is input to the "inner" column 94 of the second column (No. 1) indicated by the input area 90, and Enter "5" mm in the "Outside" column 95. Further, unlike the above-described first embodiment, the radio button 98 on the right side of the "exposure" column 96 of the same column (second column) is designated in the drawing instruction step S24.

In the second embodiment, the outer region is set to a width of 5 mm in the two-stage region in which the circular arc of the terminal connecting the virtual line R0 and the virtual circle L3 at the end of the virtual line R1 faces inward, and the inner side is set to the inner side. The area is set to a width of 0 mm. In addition, as a result of setting the outer region of 5 mm as the drawing region, the first arc-shaped strip-shaped region E1 having the width t1 of 5 mm is set as the drawing region as in the first embodiment. Further, when the first arc-shaped strip-shaped region E1 is set as a non-drawing region that is not drawn, Select and assign the radio button 97 to the left of the "Exposure" column 96. In this case, the radio button 98 corresponding to the right side of the drawing instruction to the "outside" column 95 is not selected, so the area of the width size input in the "outer" column 95 is set as the non-drawing area.

The third column (No. 2) shown in the input area 90 performs the same information input step as the first embodiment (step S20), and the fourth column (No. 3) executes the second embodiment. The second information (No. 2) is the same information input step (step S20). As a result of performing the above operation in the circumferential direction, in the second embodiment, eight arc-shaped strip-shaped regions E1 to E8 shown in the confirmation display region 80 of Fig. 7 can be set in the same manner as in the first embodiment.

<Third embodiment>

A third embodiment which is another example of the information input step (step S20) will be described with reference to Fig. 9 .

The difference from the first embodiment and the second embodiment is that in the width information input step of step S23, "2" is input to the "inner" column 94 of the second column (No. 1) indicated by the input area 90. "mm" and enter "3" mm into the "outside" column 95. Further, unlike the first embodiment described above, in the drawing instruction input step of step S24, the radio button 97 on the right side of the "exposure" column 96 of the same column (second column) is selected and designated.

In the third embodiment, the outer region is set to a width of 3 mm in a two-stage region in which the arc of the virtual virtual line R3 at the end of the imaginary line R0 and the imaginary line R1 is directed to the inner side. The inner area is set to a width of 2 mm. In addition, since the outer side region having the set width of 3 mm is used as the drawing region, the first arc-shaped strip-shaped region E1a having the width dimension t2 of 3 mm is set as the drawing region.

Further, in the two-stage region from the arc toward the inside, the region having the inner width of 2 mm is the non-drawing region k1. The non-drawing area k1 has a meaning other than the arc-shaped strip-shaped area, for example, the drawing prohibition area k1 in which a pattern such as a wiring pattern is not drawn. By providing the drawing prohibition region k1 between the first arc-shaped strip-shaped region E1a and the wiring pattern or the like, it is possible to form an arc-shaped strip-shaped plating electrode or the like formed on the substrate with the wiring pattern. Make sure the required interval is set.

The third column (No. 2) shown in the input area 90 performs the same information input step as the first embodiment (step S20), and the fourth column (No. 3) is executed in the third column (No. 3). The second information (No. 2) is the same information input step (step S20). As a result of performing the operation in the circumferential direction, eight arc-shaped strip regions E1a to E8a and drawing prohibition regions k1 to k8 are set, and the setting result is displayed on the confirmation display region 80 of FIG.

In the width information input step of step S23 in each of the above embodiments, the arc to the inner side of the imaginary circle L3 is input in a two-stage range, but may be two or more stages or a plurality of ranges in the radial direction. Enter the width information separately. Further, it is not limited to the inner side of the arc, and the width information of the outer region or the inner and outer regions may be input.

<Composition of direct drawing device>

Next, the configuration of the direct drawing device 100 will be described with reference to Figs. 10 and 11 . Fig. 10 is a side view of the direct drawing device 100 according to an embodiment of the present invention, and Fig. 11 is a plan view of the direct drawing device 100 shown in Fig. 10.

The direct drawing device 100 is a device that scans a spatially modulated light beam on a surface of a substrate W such as a semiconductor substrate or a glass substrate having a photoresist film (photosensitive material) on its surface to form an exposure pattern. Specifically, the device is used for drawing a wiring of a photosensitive resist film formed on the surface of a support substrate (hereinafter simply referred to as "substrate") W as an exposure target substrate in the manufacturing process of the semiconductor device wafer. pattern. The substrate W has a circular shape, and a portion of the outer peripheral edge thereof is formed with a slit called a groove. There is also a case where an orientation flat is provided on one of the outer circumferences of the substrate W instead of the groove. Further, the direct drawing device 100 is an exposure device that performs exposure processing in units of blocks in the partition substrate W.

As shown in FIGS. 10 and 11 , the direct drawing device 100 mainly includes a mounting table 10 that holds the substrate W, a mounting table moving mechanism 20 that moves the mounting table 10, and a position parameter measuring mechanism that measures positional parameters corresponding to the position of the mounting table 10. 30. An optical head 50 that irradiates the surface of the substrate W with pulsed light, an alignment camera 60, and a control unit 70.

Further, in the direct drawing device 100, each of the devices is disposed inside the main body of the main body frame 101, and the main body portion is disposed on the outside of the main body portion (in the present embodiment, as shown in FIG. The substrate housing cassette 110 is disposed on the +Y side of the main body portion. The substrate storage cassette 110 stores an unprocessed substrate W to be subjected to exposure processing, and the substrate W is placed on the main body by the transfer robot 120 disposed inside the main body. After the exposure processing (pattern drawing processing) is performed on the unprocessed substrate W, the substrate W is unloaded from the main body portion by the transfer robot 120 and returned to the substrate housing cassette 110. In this way, the transport robot 120 functions as a transport unit.

As shown in FIG. 11, in the main body portion, the transport robot 120 is disposed at the +Y side end portion of the inside of the main body surrounded by the outer cover 102. Further, a base 130 is disposed on the -Y side of the transfer robot 120. One end side region (the +Y side region in FIGS. 10 and 11) of the base 130 serves as a substrate transfer region for transferring the substrate W to and from the transfer robot 120. Further, among the bases 130, the central side region in the Y direction is a pattern drawing region for patterning the substrate W. As shown in FIG. 10, the head support portion 140 includes two leg members 141 that are erected upward from the base 130, and two legs that are erected upward from the base 130 on the -Y side of the two leg members 141. Foot member 142. Further, the head support portion 140 includes a beam member 143 that is provided to bridge the top of the two leg members 141, and a beam member 144 that is provided to bridge the top of the two leg members 142. Further, as shown in FIG. 10, an alignment camera (image pickup unit) 60 is fixed to the -Y side of the beam member 143, and the surface of the substrate W held by the mounting table 10 (the drawn surface and the exposed surface) can be imaged as will be described later. a plurality of alignment marks or lower patterns on the).

The mounting table 10 as the support portion of the support substrate W is moved on the base 130 by the stage moving mechanism 20 in the X direction, the Y direction, and the θ direction. In other words, the stage moving mechanism 20 performs positioning by moving the stage 10 two-dimensionally in the horizontal plane, and rotating it around the θ axis (vertical axis) to adjust the relative angle with respect to the optical head 50 to be described later.

Moreover, the optical head unit 50 is attached to the head support unit 140 configured in this manner so as to be movable in the vertical direction. In this way, the alignment camera 60 and the optical head 50 are mounted on the head. The support unit 140 fixes the positional relationship between the two in the XY plane. Further, the optical head 50 is a pattern in which the substrate W is patterned, and is moved in the vertical direction by a head moving mechanism (not shown). Further, the optical head unit 50 is moved in the vertical direction by the head moving mechanism, and the distance between the optical head 50 and the substrate W held by the mounting table 10 can be adjusted with high precision. In this manner, the optical head 50 functions as a drawing head.

Further, the casing 172 of the optical system in which the optical head 50 is housed is provided so that the two beam members 143 and 144, the tops of the two leg members 141, and the tops of the two leg members 142 are bridged.

The mounting table 10 has a cylindrical outer shape and is provided with a holding portion in which the substrate W is placed in a horizontal posture on the upper surface thereof. A plurality of suction holes (not shown) are formed on the upper surface of the mounting table 10. Therefore, when the substrate W is placed on the mounting table 10, the substrate W is adsorbed and fixed to the upper surface of the mounting table 10 by the suction pressure of the plurality of suction holes. Further, in the surface (main surface) of the substrate W which is the target of the drawing process in the present embodiment, a photoresist (photosensitive material) film is formed in advance by a spin coating method (rotary coating method) or the like.

The stage moving mechanism 20 is for moving the stage 10 to the main scanning direction (Y-axis direction), the sub-scanning direction (X-axis direction), and the rotation direction (around the Z-axis) with respect to the base 130 of the direct drawing device 100. Rotation direction) The mechanism of movement. The stage moving mechanism 20 includes a rotating mechanism 21 that rotates the mounting table 10, a support plate 22 that supports the mounting table 10 to be rotatable, a sub-scanning mechanism 23 that moves the support plate 22 in the sub-scanning direction, and a sub-scanning mechanism 23. The bottom plate 24 of the support plate 22 and the main scanning mechanism 25 for moving the bottom plate 24 in the main scanning direction are supported.

The rotation mechanism 21 has a motor composed of a rotor attached to the inside of the mounting table 10. Further, a rotary bearing mechanism is provided between the lower surface side of the central portion of the mounting table 10 and the support plate 22. Therefore, when the motor is operated, the rotor moves in the θ direction, and the mounting table 10 rotates within a certain angle around the rotation axis of the rotary bearing mechanism.

The sub-scanning mechanism 23 has a linear motor 23a which generates a sub-scanning side by a mover attached to the lower surface of the support plate 22 and a stator attached to the upper surface of the bottom plate 24. Advance to it. Further, the sub-scanning mechanism 23 has a pair of guide rails 23b that guide the support plate 22 in the sub-scanning direction with respect to the bottom plate 24. Therefore, when the linear motor 23a is operated, the support plate 22 and the mounting table 10 move in the sub-scanning direction along the guide rail 23b on the bottom plate 24.

The main scanning mechanism 25 has a linear motor 25a that generates a propulsive force in the main scanning direction by a mover attached to the lower surface of the bottom plate 24 and a stator attached to the upper surface of the head support portion 140. Further, the main scanning mechanism 25 has a pair of guide rails 25b that guide the bottom plate 24 in the main scanning direction with respect to the head supporting portion 140. Therefore, when the linear motor 25a is operated, the bottom plate 24, the support plate 22, and the mounting table 10 are moved in the main scanning direction along the guide rail 25b on the base 130. Further, as such a stage moving mechanism 20, a conventional X-Y-θ axis moving mechanism can be used.

The position parameter measuring mechanism 30 is a mechanism for measuring the positional parameter of the mounting table 10 by using the dryness of the laser light. The position parameter measuring unit 30 mainly includes a laser light emitting unit 31, a beam splitter 32, a bender 33, a first dry meter 34, and a second dry meter 35.

The laser light emitting portion 31 is a light source device for emitting laser light for measurement. The laser light emitting portion 31 is provided at a fixed position, that is, at a position fixed to the base 130 or the optical head 50 of the device. The laser light emitted from the laser light emitting portion 31 is first incident on the spectroscope 32, branched into the first branch light from the spectroscope 32 toward the bender 33, and the second branch from the spectroscope 32 toward the second dry meter 35. Light.

The first branch light is reflected by the bender 33, and is incident on the first dry meter 34, and is irradiated from the first dry meter 34 to the first portion on the -Y side of the mounting table 10 (here, the -Y side) The central portion of the end side) 10a. Then, the first branched light reflected by the first portion 10a is again incident on the first dry meter 34. The first dry meter 34 measures the positional parameter corresponding to the position of the first portion 10a of the mounting table 10 based on the first branch light that is directed toward the mounting table 10 and the first branched light that is reflected from the mounting table 10.

On the other hand, the second branch light is incident on the second dry meter 35, and is irradiated from the second dry meter 35 to the second portion on the -Y side of the mounting table 10 (the portion different from the first portion 10a) Bit) 10b. Then, the second branched light reflected by the second portion 10b is again incident on the second dry meter 35. The second dry meter 35 measures the positional parameter corresponding to the position of the second portion 10b of the mounting table 10 based on the second branch light that is directed toward the mounting table 10 and the second branched light that is reflected from the mounting table 10. The first dry meter 34 and the second dry meter 35 transmit the position parameters obtained by the respective measurements to the control unit 70.

The optical head 50 is a light irradiation portion that irradiates the surface of the substrate W held on the mounting table 10 with pulsed light. The beam member 143 is mounted on the base 130 so as to straddle the mounting table 10 and the stage moving mechanism 20, and the optical head 50 is disposed substantially at the center of the beam member 143 in the sub-scanning direction. The optical head 50 is connected to one laser oscillator 54 via an illumination optical system 53. Further, a laser drive unit 55 that drives the laser oscillator 54 is connected to the laser oscillator 54 as a light source. When the laser driving unit 55 is operated, pulsed light is emitted from the laser oscillator 54, and the pulsed light is introduced into the optical head 50 via the illumination optical system 53.

Inside the optical head 50, pulsed light is introduced from the introduction portion, introduced into the optical head 50 from the illumination optical system 53, and the introduced pulsed light is irradiated onto the surface of the substrate W as a light beam shaped into a specific pattern shape. Light is applied to the photoresist film (photosensitive layer) on the substrate W to thereby draw a pattern on the surface of the substrate W.

In the direct drawing device 100 of FIG. 10, a laser oscillator 54 as a light source is disposed in the casing 172, and light from the laser oscillator 54 is introduced into the optical head 50 via the illumination optical system 53. In the main surface of the substrate W of the present embodiment, a photoresist (photosensitive material) film that is exposed to ultraviolet light is formed in advance, and the laser oscillator 54 emits an ultraviolet (i-ray) laser having a wavelength λ of about 365 nm. light source. Of course, the laser oscillator 54 may also be light of other wavelengths contained in the wavelength band from which the photosensitive material of the substrate W is exposed.

FIG. 12 is a view showing the illumination optical system 53 and the projection optical system 517 of the direct drawing device 100. Light from the laser oscillator 54 shown in FIG. 10 is irradiated to the spatial light modulator 511 of the light modulation unit 512 via the illumination optical system 53 and the mirror 516 shown in FIG. The spatially modulated light passing through the spatial light modulator 511 passes through the projection optical system 517. The light is applied to the substrate W supported by the mounting table 10.

The illumination optical system 53 includes a telescope 540, a collecting lens 541, an extinction 542, and a focus lens 543. The telescope 540 has a function of expanding the beam diameter (cross-sectional shape) of the light (laser beam) in the X and Z directions, and includes three lenses. The condenser lens 541 has a function of expanding the laser beam in the X direction. The dimmer 542 adjusts the energy (transmission amount) of the laser beam to be passed. The focus lens 543 has a function of reducing the cross-sectional size of the laser beam in the Z direction. The light (laser beam) emitted from the self-focusing lens 543 extends in the X direction via the mirror 516, and is irradiated to the spatial light modulator 511 as the linearly illuminating light in the Y direction. Further, the illumination optical system 53 is not necessarily configured as shown in FIG. 12, and other optical elements may be added.

The light that is incident on the spatial modulator 511 from the illumination optical system 53 is preferably near-parallel light because the regular reflection light (zero-order light) reflected from the spatial light modulator 511 passes through the shadowing of the projection optical system described later. The opening of the plate 521, and (±1) times of the diffracted light generated from the spatial light modulator 511 is shielded by the shielding plate 521. Therefore, the numerical aperture NA1 of the illumination optical system 53 is set to be greater than 0 (zero) and 0.06 or less. Further, when the maximum angle of the illumination light with respect to the optical axis when the linear illumination light extending in the X direction passes through the YZ plane is θ1, the numerical aperture NA1 is obtained by NA1=n‧sinθ1. Here, n is the refractive index of the medium. In the case of the present embodiment, the medium is air, and therefore the refractive index n is 1.

The projection optical system 517 includes four lenses 518, 519, 520, and 522, a shielding plate (aperture member) 521, a zoom lens 523, and a focus lens 524. The lenses 518, 519, 520, 522 and the shielding plate 521 of the projection optical system 517 are constructed as two telecentric schrieren optical systems, and the light passing through the lens 520 is guided into the shielding plate 521 having an opening, a part Light (positive reflected light (0th order light)) is guided to the lens 522 through the opening, and the remaining light ((±1) times of diffracted light) is shielded by the shielding plate 521. The light that has passed through the lens 522 is guided to the zoom lens 523, and is guided to the photoresist film (photosensitive material) on the substrate W at a specific magnification via the focus lens 524. Furthermore, the projection optical system 517 does not have to be constructed as shown in FIG. Other optical components can be added.

In order to reduce the change in the diameter (width) of the light irradiated on the substrate W corresponding to the focus position (focus position), it is necessary to set the depth of field of the projection optical system 517 to be long (deep). Therefore, the numerical aperture NA2 of the projection optical system 517 is preferably small, for example, set to 0.1. Further, when the maximum angle of the projection light when the linear projection light extending in the X direction passes through the YZ plane with respect to the optical axis is θ2, the numerical aperture NA2 is obtained by NA2=n‧sinθ2. Here, n is the refractive index of the medium. In the case of the present embodiment, since the medium is air, the refractive index n is 1.

As described above, in order to illuminate the specular reflected light reflected by the spatial light modulator 511 onto the substrate W in a desired shape, the numerical aperture NA1 of the illumination optical system 53 is divided by the numerical aperture NA2 of the projection optical system 517 (σ). The value) is preferably close to 0, for example, set to be greater than 0 and 0.6 or less.

A rendering control unit 515 that performs modulation control of the optical modulation unit 512 is electrically connected to the spatial light modulator 511. The drawing control unit 515 and the projection optical system 517 are built in the optical head 50. The exposure control unit 514 and the rendering signal processing unit 513 are electrically connected to the drawing control unit 515, respectively. The exposure control unit 514 is electrically connected to the drawing signal processing unit 513 and the stage moving mechanism 20. The exposure control unit 514 and the rendering signal processing unit 513 are provided in the control unit 70 of Fig. 10 .

Fig. 13 is a view showing the spatial light modulator 511 enlarged. The spatial light modulator 511 shown in Fig. 13 is manufactured by a semiconductor device manufacturing technique and is a diffraction grating capable of changing the grating depth. A plurality of movable belts 530a and fixing belts 531b are alternately arranged in parallel with each other in the spatial light modulator 511. As will be described later, the movable belt 530a can be moved up and down individually with respect to the reference plane on the back side, and the fixing belt 531b is fixed. Fixed relative to the reference plane. As a diffraction grating type spatial light modulator, for example, GLV (Grating Light Valve) (registered trademark of Silicon Light Machines (San Jose, California)) is known.

A fixed reflecting surface is provided on the upper surface of the fixing belt 531b, and a movable reflecting surface is provided on the upper surface of the movable belt 530a. The plurality of movable belts 530a and the fixed belt 531b are irradiated with a beam of light having a long line direction. In the spatial light modulator 511, when one adjacent one of the movable belt 530a and the fixed belt 531b is a pair of belt elements, the three or more adjacent grating elements correspond to the pattern to be drawn. One pixel. In the present embodiment, the set of four raster elements adjacent to each other is a modulation element corresponding to one pixel, and in FIG. 13, the pair of bands constituting one modulation element is a thick line with a symbol 535 attached thereto. Surrounded by rectangles.

The driver circuit unit 536 applies a voltage (potential difference) between the movable belt 530a and the reference surface, thereby bending the movable belt 530a toward the reference surface side. As a result, the movable belt 530a moves up and down between the initial position away from the reference surface and the position of the contact reference surface, and sets the height position of the movable belt 530a.

The control unit 70 shown in FIG. 10 is an information processing unit for executing various arithmetic processing and controlling the operation of each unit in the direct drawing device 100. FIG. 14 is a block diagram showing a connection configuration between the above-described respective units of the direct drawing device 100 and the control unit 70. As shown in FIG. 14, the control unit 70 is connected to the above-described rotating mechanism 21, linear motors 23a and 25a, laser light emitting unit 31, first dry meter 34, second dry meter 35, illumination optical system 53, and laser drive unit 55. The projection optical system 517 and the alignment camera 60 are electrically connected. The control unit 70 includes, for example, a computer having a CPU and a memory, and the computer operates in accordance with a program installed in the computer, thereby performing operation control of each of the above units.

Further, the control unit 70 includes a computer 71 having a CPU, a memory 72, and the like, and an exposure control unit 514. Fig. 15 is a block diagram showing a control unit for controlling the drawing operation. The CPU in the computer 71 performs arithmetic processing in accordance with a specific program, thereby realizing the rasterizing unit 73 and the data generating unit 75.

For example, the data corresponding to the pattern of one semiconductor package is prepared in the memory 72 as the drawing pattern data 76 in advance by the pattern data generated by the external CAD or the like. based on The drawing pattern data 76 and the data generating unit 75 draw a drawing pattern of the semiconductor package on the substrate W as will be described later. Here, the computer 71 is responsible for the role of the drawing signal processing unit 513 shown in FIG. Further, the drawing pattern data 76 corresponds to the design data D0, the corrected design data D1, and the circular area data T1. Further, the drawing pattern data 76 also has a case where the design data D0 or the corrected design data D1 and the circular area data T1 are combined.

The rasterizing unit 73 divides and rasterizes the unit area indicated by the drawing data generated by the data generating unit 75, and generates raster data 77 and stores it in the memory 72. Thus, the unprocessed substrate W is rendered after the preparation of the raster data 77 or simultaneously with the preparation of the raster data 77.

The drawing data generated in this manner is sent from the data generating unit 75 to the exposure control unit 514, and the exposure control unit 514 performs drawing of one strip by controlling each of the light modulation unit 512 and the stage moving mechanism 20. Further, as shown in FIG. 15, the exposure control unit 514 controls the light modulation unit 512 via the drawing control unit 515. Further, when the exposure recording of one stripe is completed, the same processing is performed on the next divided area, and each stripe is repeatedly drawn. In the present embodiment, the control unit of the present invention is realized by the control unit 70, the drawing control unit 515, the exposure control unit 514, the driver circuit unit 536, and the like.

Further, when the direct drawing device 100 performs the drawing operation for each stripe, the exposure control unit 514, which is executed by the drawing control unit 515 shown in FIG. 12, controls the light modulation unit 512 based on the plurality of regions of the substrate W. The exposure conditions set for each of the blocks perform the exposure operation in block units.

Further, the direct drawing device 100 performs a drawing operation on the first to eighth arc-shaped strip regions E1 to E8 set in the first embodiment, the second embodiment, or the third embodiment, for example. These arc-shaped strip-shaped regions are, for example, regions where the plating electrodes are formed, and are regions where the photoresist film is removed in the subsequent development processing step. When the photoresist film is a positive type, the direct drawing device 100 uses the arcuate strip-shaped region as a drawing region, and scans the light beam to expose the photoresist film located in the region. When the photoresist film is in a negative type, the device 100 is directly drawn. The arc-shaped strip-shaped region is used as a non-drawing region, and beam scanning is not performed, and the photoresist film located in the region is not exposed.

In the case where the arc-shaped strip-shaped region is the above-mentioned numbered region, in order to prevent the laser light located in the numbered region from being damaged in the subsequent step, whether the photoresist film is positive or negative, and the subsequent processing steps are considered. Etc., the arc band region is used as the drawing region or the non-drawing region, and the drawing process is performed.

In the present embodiment, the computer 71 shown in FIG. 15 is provided in the direct drawing device 100. However, the computer 71 may be provided in the image processing device 3 shown in FIG. 1.

<Location control of the mounting table>

The direct drawing device 100 has a function of controlling the position of the mounting table 10 based on the respective measurement results of the first dry meter 34 and the second dry meter 35. Hereinafter, the position control of the above-described mounting table 10 will be described.

As described above, the first dry meter 34 and the second dry meter 35 measure positional parameters corresponding to the positions of the first portion 10a and the second portion 10b of the mounting table 10, respectively. The first dry meter 34 and the second dry meter 35 transmit the position parameters obtained by the respective measurements to the control unit 70. As shown in FIG. 15, the control unit 70 has a computer 71 as a calculation unit. The function of the computer 71 is realized by, for example, the CPU of the computer 71 operating in accordance with a specific program.

On the other hand, the control unit 70 calculates the position (the position in the Y-axis direction and the rotation angle around the Z-axis) of the mounting table 10 based on the positional parameters transmitted from the first dry meter 34 and the second dry meter 35. Next, the control unit 70 refers to the calculated position of the stage 10 and operates the stage moving mechanism 20, thereby accurately controlling the position of the stage 10 and the moving speed of the stage 10. Here, the control unit 70 also corrects the inclination of the stage 10 (the deviation of the rotation angle around the Z axis) by the movement of the stage 10 by rotating the stage 10 around the Z axis. Moreover, the control unit 70 refers to the calculated position of the mounting table 10 and operates the laser driving unit 55, thereby accurately controlling the irradiation position of the pulse light on the surface of the substrate W.

<Action of direct drawing device>

Next, an example of the operation of the direct drawing device 100 will be described with reference to the flowchart of Fig. 16 .

When the processing of the substrate W is performed in the direct drawing device 100, first, a calibration process for adjusting the position and amount of the pulsed light irradiated from the optical head 50 is performed (step S1). In the calibration process, first, a CCD camera (not shown) is placed below the optical head 50 by moving the bottom plate 24. Then, the CCD camera is moved in the sub-scanning direction and the pulsed light is irradiated from the optical head 50, and the pulsed light is irradiated by the CCD camera. The control unit 70 operates the illumination optical system 53 of the optical head 50 based on the acquired image data, thereby adjusting the position and amount of the pulsed light irradiated from the optical head 50.

When the calibration process is completed, the transfer robot 120 carries the substrate W and places it on the upper surface of the mounting table 10 (step S2).

Then, the direct drawing device 100 performs alignment processing for adjusting the relative positions of the substrate W placed on the mounting table 10 and the optical head 50 (step S3). In the above step S2, the substrate W is placed at a substantially specific position on the mounting table 10, but in many cases, it is not sufficient as the positional accuracy for drawing the fine pattern. Therefore, the position and the inclination of the substrate W are finely adjusted by the alignment process, and the accuracy of the subsequent drawing process is improved.

In the alignment process, first, the alignment marks formed on the four corners of the upper surface of the substrate W are respectively taken by the alignment camera 60. The control unit 70 calculates the amount of deviation from the ideal position of the substrate W based on the position of each of the alignment marks in the image obtained by the alignment camera 60 (the amount of positional deviation in the X-axis direction, the amount of positional deviation in the Y-axis direction, and And the amount of tilt around the Z axis). Then, the stage moving mechanism 20 is operated in the direction of reducing the calculated amount of deviation to correct the position of the substrate W.

Next, the direct drawing device 100 performs drawing processing on the aligned substrate W (step S4). That is, the direct drawing device 100 moves the mounting table 10 in the main scanning direction and the sub-scanning direction, and irradiates the pulsed light from the optical head 50 toward the upper surface of the substrate W, thereby The upper surface of the substrate W depicts a regular pattern by arranging each of the plurality of blocks within the substrate W. Further, a drawing operation is performed on the arcuate strip-shaped regions E1 to E8.

When the drawing process is completed, the direct drawing device 100 operates the stage moving mechanism 20 to move the stage 10 and the substrate W to the carry-out position. Then, the transport robot 120 carries out the substrate W from the upper surface of the mounting table 10 (step S5).

<Change implementation>

In the direct drawing device 100 of the above-described embodiment, the substrate W is moved relative to the optical head 50 or the like. However, the optical head 50 or the like can be moved relative to the substrate W supported by the solid to achieve relative movement.

90‧‧‧Input area

91‧‧‧"No." column

92‧‧‧"θ" column

93‧‧‧"R0" column

94‧‧‧"Inside" column

95‧‧‧"Outside" column

96‧‧‧"Exposure" column

97‧‧‧ radio button

98‧‧‧ radio button

99‧‧‧"Arc length" column

Center of Ct‧‧‧ substrate

E1, E2‧‧‧ arc band

L3‧‧‧ imaginary circle

R0‧‧‧ imaginary line

R1‧‧‧ imaginary line

R2‧‧‧ imaginary line

R3‧‧‧ imaginary line

Width of t1‧‧‧

WO‧‧‧ outline

Claims (11)

A graphic user interface device for a direct drawing device, which is used in a direct drawing device for drawing a pattern of a photoresist film formed on a surface of a circular substrate for setting an arc band in a substrate The graphic user interface device includes: a display unit having a screen; an operation unit that operates the screen of the display unit; and a display control unit that controls display of the screen of the display unit And the display control unit includes: a week information input unit that displays an input area for inputting information related to a length of a circular strip-shaped area in a circumferential direction on the screen of the display unit; and a diameter information input unit; An input area for inputting position information of an arc-shaped strip-shaped region in a radial direction of the substrate is displayed on the screen of the display unit; and a width information input unit is displayed on the screen of the display unit for inputting an arc band An input area of the width information in the radial direction of the region; a drawing instruction input unit that is displayed on the screen of the display unit An input area for inputting an arc band region set by the track information input unit, the week information input unit, and the width information input unit as either a drawing area or a non-drawing area; and a confirmation display unit The outer shape of the substrate and the arc-shaped strip-shaped region are displayed on the screen of the display unit, and the arc-shaped strip-shaped region is input to the radial information input unit, the weekly information input unit, the width information input unit, and the The person who draws the information indicating the input unit is drawn. A graphical user interface device for direct drawing device of claim 1, wherein the display control unit is The weekly information input unit, the radial information input unit, the width information input unit, and the drawing instruction input unit are combined as a combination, and the information for sequentially inputting each information in the circumferential direction is displayed on the screen combined with the display unit. Input area. The graphic user interface device for direct drawing device of claim 1, wherein the weekly information input unit displays the value for inputting the angle as the length of the circular arc-shaped region in the circumferential direction of the arcuate region on the screen of the display portion The input area of the relevant information, or the input area for inputting the length dimension of the arc as the information relating to the length of the circular arc-shaped area in the circumferential direction. The graphic user interface device for direct drawing device of claim 1, wherein the width information input unit displays a plurality of input areas for inputting width information into a plurality of ranges in the radial direction on the screen of the display unit. . A direct drawing system comprising: a graphical user interface device according to any one of claims 1 to 4; and a direct rendering device that scans the photoresist film by spatially modulated light beams. A drawing area setting method for setting an arcuate strip-shaped area to be drawn as a direct drawing device or a non-drawing area not to be drawn by a graphic user interface device having a display unit and an operation unit, The drawing area setting method includes an input screen display step of displaying an input area for inputting information related to a length of a circumferential direction of the arcuate strip-shaped region on a screen of the display unit, for inputting a radial direction of the substrate An input area of the position information, an input area for inputting the width information of the arc strip area in the radial direction, and an input area for inputting information of the arc strip area as any of the drawing area or the non-drawing area And an information input step of each of the input areas displayed on the screen of the display unit by the operation unit by the operation unit And inputting the information; and confirming the display step of displaying the shape of the substrate and the arc-shaped strip-shaped region based on the information input by the information input step on the screen of the display unit. The drawing area setting method of claim 6, wherein the combination of the input areas displayed by the input screen display step is displayed in a plurality of circumferential directions, and the information input step is for each combination of the input areas. The steps to enter each information in the order of the week. A recording medium for recording a program, characterized in that it records a computer readable program of a graphic user interface device, the graphic user interface device being drawn on a photoresist film formed on a surface of a circular substrate The pattern drawing device is used to set an arcuate strip-shaped area in the substrate as a drawing area or a non-drawing area, and the recording medium recording program causes the computer to play on the screen of the display unit of the graphic user interface device. The following functions: the display function of the weekly information input area, which displays an input area for inputting information related to the length of the circular arc-shaped area in the circumferential direction; the display function of the radial information input area, which is used for inputting the substrate The input area of the positional information of the arc-shaped strip-shaped area in the radial direction; the display function of the width information input area, which displays an input area for inputting the width information in the radial direction of the arc-shaped strip-shaped area; a display function for inputting the input information input unit and the weekly information input unit Said circular-arc belt-like region width information set by the input unit is depicted in the drawing area or the input area information according to any one of the area; and a display function for displaying a shape of the substrate and the arc-shaped strip-shaped region, wherein the arc-shaped strip-shaped region is input to the radial information input region and the weekly information input by an operation unit provided by the graphic user interface device The area, the width information input area, and the above-described information indicating the input area are obtained. According to the recording medium of claim 8, the program for causing the computer to perform the function of inputting the track information input area, the week information input area, the width information input area, and the drawing instruction on the screen of the display unit The area serves as a combination, and the combination is used to display an input area for sequentially inputting information in the circumferential direction. The recording medium of claim 8, wherein the computer displays a program for causing the computer to display a value for inputting an angle as the arc band region on the screen of the display portion on the screen of the display portion An input area for information relating to the length of the circumferential direction or an input area for inputting the length dimension of the circular arc as information relating to the length of the circular arc-shaped region in the circumferential direction. The recording medium of claim 8 records a program for causing the computer to display a plurality of input areas for inputting width information into a plurality of ranges in the radial direction on the screen of the display unit.