TWI515480B - Display panel and display device - Google Patents
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Description
本發明有關於一種影像顯示器,且特別是有關於具有遮光層的影像顯示器。 The present invention relates to an image display, and more particularly to an image display having a light shielding layer.
目前常見的一些影像顯示器,例如是液晶顯示器(Liquid Crystal Display,LCD),通常都包括影像顯示面板。影像顯示面板通常包括彩色濾光基板與主動元件陣列基板,而影像顯示面板大多是由彩色濾光基板與主動元件陣列基板組合而成。 Some image displays that are commonly used today, such as liquid crystal displays (LCDs), usually include an image display panel. The image display panel usually includes a color filter substrate and an active device array substrate, and the image display panel is mostly composed of a color filter substrate and an active device array substrate.
習知彩色濾光基板在玻璃基板上形成縱橫交錯的黑色遮光層,然後在彼此交錯黑色遮光層之間形成彩色濾光片,最後再覆蓋一層平坦保護膜。一般來說,黑色遮光層與彩色濾光片皆位於玻璃基板上,而黑色遮光層位於各個彩色濾光片之間。 The conventional color filter substrate forms a black and white light-shielding layer on the glass substrate, and then forms a color filter between the black light-shielding layers interlaced with each other, and finally covers a flat protective film. Generally, the black light shielding layer and the color filter are both located on the glass substrate, and the black light shielding layer is located between the respective color filters.
本發明實施例提供一種顯示面板,其所形成的第一遮光條能減少漏光情形。 Embodiments of the present invention provide a display panel, wherein the first light shielding strip formed can reduce light leakage.
本發明實施例提供一種顯示面板,所述顯示面板包括第一基板、透明圖案層、遮光層以及第二基板。第一基板具有顯示區域以及環繞該顯示區域的非顯示區域。透明圖案層配置於該第一基板以及該第二基板之間,且至少部分該透明圖案層位於該顯示區域,其中透明圖案層具有多個溝渠以劃分多個透明層。遮光層包括多條第一遮光條,第一遮光條配置這些溝渠內且於顯示區域。第二基板與第一基板結合。 Embodiments of the present invention provide a display panel including a first substrate, a transparent pattern layer, a light shielding layer, and a second substrate. The first substrate has a display area and a non-display area surrounding the display area. The transparent pattern layer is disposed between the first substrate and the second substrate, and at least a portion of the transparent pattern layer is located in the display area, wherein the transparent pattern layer has a plurality of trenches to divide the plurality of transparent layers. The light shielding layer includes a plurality of first light shielding strips, and the first light shielding strips are disposed in the trenches and in the display area. The second substrate is combined with the first substrate.
本發明實施例提供一種顯示裝置,所述顯示裝置包括前述之顯示面板以及一背光模組,背光模組配置於第一基板與第二基板 的下方。 The embodiment of the invention provides a display device, which includes the foregoing display panel and a backlight module, and the backlight module is disposed on the first substrate and the second substrate. Below.
綜上所述,本發明實施例所提供的遮光層以及透明圖案層,透過透明圖案層定義出多個溝渠,而這些溝渠彼此交錯以將透明圖案層劃分出多個透明層。所述溝渠裸露出各個彩色濾光片彼此之間的交界處,而第一遮光條以及第二遮光條分別位於這些溝渠之內並且位於不同的透明層之間。值得說明的是,遮光層以及透明圖案層位於彩色濾光層之上,據此,第一遮光條以及第二遮光條與主動元件陣列基板的間距縮短,從而減少漏光情形,進而降低大角度色偏發生之機率。 In summary, the light shielding layer and the transparent pattern layer provided by the embodiments of the present invention define a plurality of trenches through the transparent pattern layer, and the trenches are staggered with each other to divide the transparent pattern layer into a plurality of transparent layers. The trenches expose the intersections of the respective color filters with each other, and the first light-shielding strips and the second light-shielding strips are respectively located within the trenches and between different transparent layers. It should be noted that the light shielding layer and the transparent pattern layer are located on the color filter layer, whereby the distance between the first light shielding strip and the second light shielding strip and the active device array substrate is shortened, thereby reducing the light leakage condition, thereby reducing the large angle color. The probability of occurrence.
另外,遮光層以及透明圖案層也可以位於主動元件陣列基板之上,據此,第一遮光條以及第二遮光條不僅得以增加影像對比,還可以遮蔽來自於背光模組的入射光照射至主動元件陣列從而降低主動元件陣列產生漏電流之機率以及減少漏光情形,進而降低左右方位視角的大角度色偏發生之機率。 In addition, the light shielding layer and the transparent pattern layer may also be located on the active device array substrate. Accordingly, the first light shielding strip and the second light shielding strip not only increase image contrast, but also shield incident light from the backlight module to be active. The array of components reduces the probability of leakage current generated by the active device array and reduces light leakage, thereby reducing the probability of occurrence of large-angle color shift of the left and right azimuth viewing angles.
此外,藉由控制所述透明層之間的溝渠的寬度,即可縮小第一遮光條以及第二遮光條的寬度,從而開口率得以提高。 Further, by controlling the width of the trench between the transparent layers, the widths of the first light-shielding strip and the second light-shielding strip can be reduced, so that the aperture ratio is improved.
為了能更進一步瞭解本發明為達成既定目的所採取之技術、方法及功效,請參閱以下有關本發明之詳細說明、圖式,相信本發明之目的、特徵與特點,當可由此得以深入且具體之瞭解,然而所附圖式與附件僅提供參考與說明用,並非用來對本發明加以限制者。 In order to further understand the technology, method and effect of the present invention in order to achieve the intended purpose, reference should be made to the detailed description and drawings of the present invention. The drawings and the annexed drawings are intended to be illustrative and not to limit the invention.
1a、1b、1c、2、3a、3b、4‧‧‧顯示面板 1a, 1b, 1c, 2, 3a, 3b, 4‧‧‧ display panels
5‧‧‧顯示裝置 5‧‧‧Display device
10‧‧‧第一基板 10‧‧‧First substrate
100、102、104‧‧‧彩色濾光基板 100, 102, 104‧‧‧ color filter substrates
106‧‧‧習知彩色濾光基板 106‧‧‧Looking color filter substrate
110、120‧‧‧彩色濾光層 110, 120‧‧‧ color filter layer
110a、110b、110c、120a、120b、120c‧‧‧彩色濾光片 110a, 110b, 110c, 120a, 120b, 120c‧‧‧ color filters
20‧‧‧第二基板 20‧‧‧second substrate
200、206‧‧‧主動元件陣列基板 200, 206‧‧‧ active component array substrate
202、204‧‧‧主動電致發光元件陣列基板 202, 204‧‧‧Active electroluminescent device array substrate
210‧‧‧主動元件 210‧‧‧Active components
220‧‧‧資料線 220‧‧‧Information line
230‧‧‧掃描線 230‧‧‧ scan line
240‧‧‧周邊線路 240‧‧‧ peripheral lines
250‧‧‧有機發光元件陣列 250‧‧‧Organic light-emitting element array
30、32、34、36‧‧‧遮光層 30, 32, 34, 36‧‧‧ shading
30a、32a、34a‧‧‧框型遮光層 30a, 32a, 34a‧‧‧ frame type light shielding layer
30b、32b、34b、36b‧‧‧第一遮光條 30b, 32b, 34b, 36b‧‧‧ first shading strip
30c‧‧‧第二遮光條 30c‧‧‧second shading strip
40、42‧‧‧透明圖案層 40, 42‧‧‧ transparent pattern layer
40a、42a‧‧‧透明層 40a, 42a‧‧‧ transparent layer
60‧‧‧黏著層 60‧‧‧Adhesive layer
50、52‧‧‧填充層 50, 52‧‧‧ fill layer
70‧‧‧背光模組 70‧‧‧Backlight module
A1‧‧‧上半部 Upper part of A1‧‧‧
A2‧‧‧下半部 A2‧‧‧ lower half
BM‧‧‧黑紋層 BM‧‧‧black layer
M1‧‧‧顯示區域 M1‧‧‧ display area
M2‧‧‧非顯示區域 M2‧‧‧ non-display area
P1‧‧‧單元畫素區域 P1‧‧‧ element pixel area
L1、L2‧‧‧寬度 L1, L2‧‧‧ width
S1、S4‧‧‧第一端面 S1, S4‧‧‧ first end face
S2、S3‧‧‧第二端面 S2, S3‧‧‧ second end face
圖1A是本發明第一實施例的顯示面板的俯視示意圖。 1A is a schematic plan view of a display panel according to a first embodiment of the present invention.
圖1B是圖1A中沿線R-R剖面所繪示的剖面示意圖。 1B is a schematic cross-sectional view taken along line R-R of FIG. 1A.
圖1C是圖1A中沿線Q-Q剖面所繪示的剖面示意圖。 1C is a schematic cross-sectional view taken along line Q-Q of FIG. 1A.
圖1D為本發明第二實施例的顯示面板的剖面示意圖。 1D is a schematic cross-sectional view of a display panel in accordance with a second embodiment of the present invention.
圖1E為本發明第三實施例的顯示面板的剖面示意圖。 1E is a schematic cross-sectional view of a display panel according to a third embodiment of the present invention.
圖2是本發明第四實施例的顯示面板的剖面示意圖。 2 is a schematic cross-sectional view of a display panel in accordance with a fourth embodiment of the present invention.
圖3A是本發明第五實施例的顯示面板的剖面示意圖。 3A is a schematic cross-sectional view of a display panel in accordance with a fifth embodiment of the present invention.
圖3B是本發明第六實施例的顯示面板的俯視示意圖。 3B is a top plan view of a display panel according to a sixth embodiment of the present invention.
圖4是本發明第七實施例的顯示面板的俯視示意圖。 4 is a top plan view of a display panel in accordance with a seventh embodiment of the present invention.
圖5是本發明一實施例之顯示裝置的剖面示意圖。 Figure 5 is a cross-sectional view showing a display device in accordance with an embodiment of the present invention.
在隨附圖式中展示一些例示性實施例,而在下文將參閱隨附圖式以更充分地描述各種例示性實施例。值得說明的是,本發明概念可能以許多不同形式來體現,且不應解釋為限於本文中所闡述之例示性實施例。確切而言,提供此等例示性實施例使得本發明將為詳盡且完整,且將向熟習此項技術者充分傳達本發明概念的範疇。在每一圖式中,為了使得所繪示的各層及各區域能夠清楚明確,而可誇示其相對大小的比例,而且類似數字始終指示類似元件。 The exemplary embodiments are described with reference to the accompanying drawings, in which FIG. It should be noted that the inventive concept may be embodied in many different forms and should not be construed as being limited to the illustrative embodiments set forth herein. Rather, these exemplary embodiments are provided so that this invention will be in the In each of the figures, the relative proportions of the various layers and regions may be exaggerated, and like numerals indicate the like elements.
應理解,雖然本文中可能使用術語第一、第二、第三等來描述各種元件,但此等元件不應受此等術語限制。此等術語乃用以區分一元件與另一元件,因此,下文論述之第一元件可稱為第二元件而不偏離本發明概念之教示。另外,本文中可能使用術語「及/或」,此乃指示包括相關聯之列出項目中之任一者及一或多者之所有組合。 It will be understood that, although the terms first, second, third, etc. may be used herein to describe various elements, such elements are not limited by the terms. The terms are used to distinguish one element from another, and thus the first element discussed below may be referred to as a second element without departing from the teachings of the inventive concept. In addition, the term "and/or" may be used herein to indicate that it includes all of the associated listed items and all combinations of one or more.
圖1A為本發明第一實施例的顯示面板的俯視示意圖,圖1B是圖1A中沿線R-R剖面所繪示的剖面示意圖,圖1C是圖1A中沿線Q-Q剖面所繪示的剖面示意圖。請參閱圖1A、圖1B與圖1C,顯示面板1a包括第一基板10、第二基板20、遮光層30以及透明圖案層40。第一基板10與第二基板20結合,遮光層30以及透明圖案層40配置於第一基板10與第二基板20之間。 1A is a schematic plan view of a display panel according to a first embodiment of the present invention, FIG. 1B is a cross-sectional view taken along line R-R of FIG. 1A, and FIG. 1C is a cross-sectional view taken along line Q-Q of FIG. 1A. Referring to FIGS. 1A , 1B and 1C , the display panel 1 a includes a first substrate 10 , a second substrate 20 , a light shielding layer 30 , and a transparent pattern layer 40 . The first substrate 10 is coupled to the second substrate 20 , and the light shielding layer 30 and the transparent pattern layer 40 are disposed between the first substrate 10 and the second substrate 20 .
第一基板10具有顯示區域M1以及環繞於顯示區域M1的非顯示區域M2。一般而言,第一基板10為透明絕緣的基板,其材料可以是玻璃、塑膠或者是石英,而本發明並不以此為限。 The first substrate 10 has a display area M1 and a non-display area M2 surrounding the display area M1. Generally, the first substrate 10 is a transparent insulating substrate, and the material thereof may be glass, plastic or quartz, and the invention is not limited thereto.
顯示面板1a可以更包括彩色濾光層110,而彩色濾光層110可以配置於第一基板10上且位於顯示區域M1內。彩色濾光層110包括多片各種顏色的彩色濾光片110a、110b以及110c,例如這些彩色濾光片110a、110b以及110c的顏色可以是紅色、綠色、藍色、透明色或者是黑色等。彩色濾光片110a、110b以及110c為各色光阻,所使用的材料可以是彩色光阻材料。為了不同的產品設計上的考量,這些彩色濾光片110a、110b以及110c的配列方式可以是馬賽克式、三角式、直條式等,因此彩色濾光片110a、110b以及110c的光阻可以是相同顏色,也可以是不同顏色。此外,值得說明的是,彩色濾光層110也可以配置於第二基板20上,而第一基板10則無需設計配置有彩色濾光層110。不過,本發明並不以彩色濾光層110的配置設計以及各色彩色濾光片110a、110b、110c的顏色以及材料為限。 The display panel 1a may further include a color filter layer 110, and the color filter layer 110 may be disposed on the first substrate 10 and located in the display area M1. The color filter layer 110 includes a plurality of color filters 110a, 110b, and 110c of various colors. For example, the colors of the color filters 110a, 110b, and 110c may be red, green, blue, transparent, or black. The color filters 110a, 110b, and 110c are photoresists of respective colors, and the material used may be a color photoresist material. For different product design considerations, the arrangement of the color filters 110a, 110b, and 110c may be mosaic, triangle, straight strip, etc., so the photoresists of the color filters 110a, 110b, and 110c may be The same color can also be different colors. In addition, it should be noted that the color filter layer 110 may also be disposed on the second substrate 20, and the first substrate 10 does not need to be designed with the color filter layer 110. However, the present invention is not limited to the configuration of the color filter layer 110 and the color and material of the color filters 110a, 110b, and 110c.
遮光層30配置於第一基板10與第二基板20之間。詳細而言,遮光層30位於彩色濾光層110上並且與彩色濾光層110接觸。遮光層30包括多條並列的第一遮光條30b與多條並列的第二遮光條30c。這些第一遮光條30b以及第二遮光條30c皆配置於顯示區域M1內,而第一遮光條30b的寬度L1小於第二遮光條30c的寬度L2。值得說明的是,第一遮光條30b的寬度L1主要小於10μm,而寬度L1最小可介於1至2微米(μm)之間。這些第一遮光條30b以及第二遮光條30c彼此交錯以劃分出多個單元畫素區域P1,每一單元畫素區域P1分別對應各個彩色濾光片110a、110b以及110c,也就是說,各個彩色濾光片110a、110b以及110c對應配置於這些單元畫素區域P1。此外,遮光層30可以更包括框型遮光層30a,框型遮光層30a配置於非顯示區域M2內,且圍繞於彩色濾光層110周圍。 The light shielding layer 30 is disposed between the first substrate 10 and the second substrate 20 . In detail, the light shielding layer 30 is located on the color filter layer 110 and is in contact with the color filter layer 110. The light shielding layer 30 includes a plurality of juxtaposed first light shielding strips 30b and a plurality of second light shielding strips 30c juxtaposed. The first light-shielding strips 30b and the second light-shielding strips 30c are disposed in the display area M1, and the width L1 of the first light-shielding strips 30b is smaller than the width L2 of the second light-shielding strips 30c. It is worth noting that the width L1 of the first light-shielding strip 30b is mainly less than 10 μm, and the width L1 may be at least between 1 and 2 micrometers (μm). The first light-shielding strips 30b and the second light-shielding strips 30c are interlaced with each other to define a plurality of unit pixel regions P1, and each of the unit pixel regions P1 corresponds to each of the color filters 110a, 110b, and 110c, that is, each The color filters 110a, 110b, and 110c are disposed corresponding to the unit pixel regions P1. In addition, the light shielding layer 30 may further include a frame type light shielding layer 30a disposed in the non-display area M2 and surrounding the color filter layer 110.
遮光層30主要用途為遮蔽來自背光模組的光線,因此主要可用以防止因入射光的洩漏而影響到影像的表現以及防止因光線照 射到主動元件而引起錯誤光開關的動作。遮光層30所使用的材料可以是黑色感光性樹脂、黑色光阻材料等,例如是正型黑色感光性樹脂材料或者是負型黑色感光性樹脂材料。於實務上,為了製程成本方面的考量,框型遮光層30a、第一遮光條30b以及第二遮光條30c三者的材料可以是不同種類的黑色感光性樹脂或是黑色光阻材料。不過,本發明並不對遮光層30的材料加以限定。 The main purpose of the light shielding layer 30 is to shield the light from the backlight module, so that it can be mainly used to prevent the appearance of the image from being affected by the leakage of the incident light and to prevent the light from being illuminated. The action of the false optical switch is caused by the active element. The material used for the light shielding layer 30 may be a black photosensitive resin, a black photoresist material, or the like, and is, for example, a positive black photosensitive resin material or a negative black photosensitive resin material. In practice, for the consideration of process cost, the materials of the frame type light shielding layer 30a, the first light shielding strip 30b, and the second light shielding strip 30c may be different kinds of black photosensitive resin or black photoresist material. However, the present invention does not limit the material of the light shielding layer 30.
透明圖案層40具有多個溝渠,而這些溝渠彼此交錯以將透明圖案層40劃分出多個圖案。其中,所述圖案即為多個透明層40a,而每一透明層40a分別配置於每一單元畫素區域P1內。值得說明的是,於本實施例中,所述溝渠的排列為縱向以及橫向彼此交錯排列。不過,於其它實施例中,所述溝渠也可以僅具有縱向或者橫向。然而,本發明並不對溝渠形狀加以限制。 The transparent pattern layer 40 has a plurality of trenches that are staggered with each other to divide the transparent pattern layer 40 into a plurality of patterns. The pattern is a plurality of transparent layers 40a, and each transparent layer 40a is disposed in each of the unit pixel regions P1. It should be noted that, in this embodiment, the arrangement of the trenches is staggered in the longitudinal direction and the lateral direction. However, in other embodiments, the trench may also have only a longitudinal or lateral direction. However, the present invention does not limit the shape of the trench.
於本發明實施例中,透明圖案層40部分覆蓋彩色濾光層110,而彩色濾光層110配置在第一基板10與透明圖案層40之間且對應位於這些遮光層30所劃分出的單元畫素區域P1,據以形成彩色濾光基板100。其中,這些溝渠裸露出部分的彩色濾光層110,更進一步來說,這些溝渠裸露出各個彩色濾光片110a、110b以及110c彼此之間的交界處。 In the embodiment of the present invention, the transparent pattern layer 40 partially covers the color filter layer 110, and the color filter layer 110 is disposed between the first substrate 10 and the transparent pattern layer 40 and correspondingly located in the unit of the light shielding layer 30. The pixel region P1 is formed to form the color filter substrate 100. Wherein, the trenches expose portions of the color filter layers 110, and further, the trenches expose the intersections of the respective color filters 110a, 110b, and 110c with each other.
值得說明的是,第一遮光條30b以及第二遮光條30c分別位於這些縱向及橫向溝渠之內並且位於不同的透明層40a之間,而所述縱向及橫向溝渠的寬度即為第一遮光條30b的寬度L1以及第二遮光條30c的寬度L2。 It should be noted that the first light-shielding strips 30b and the second light-shielding strips 30c are respectively located in the longitudinal and lateral trenches and are located between different transparent layers 40a, and the widths of the longitudinal and lateral trenches are the first light-shielding strips. The width L1 of 30b and the width L2 of the second light-shielding strip 30c.
透明圖案層40的材料可以為一透明光阻材料,如圖1B、圖1C所示,透明層40a的橫剖面形狀可以是一梯形,而各個透明層40a具有第一端面S1與相對第一端面S1的第二端面S2,其中各透明層40a的徑寬從第一端面S1的方向朝向第二端面S2的方向漸窄或相等。不過,本發明並不對透明層40a的材料以及形狀加以限定。 The material of the transparent pattern layer 40 may be a transparent photoresist material. As shown in FIG. 1B and FIG. 1C, the cross-sectional shape of the transparent layer 40a may be a trapezoid, and each transparent layer 40a has a first end surface S1 and an opposite first end surface. The second end surface S2 of S1 in which the diameter of each transparent layer 40a is tapered or equal from the direction of the first end surface S1 toward the second end surface S2. However, the present invention does not limit the material and shape of the transparent layer 40a.
顯示面板1a可以更包括多條資料線220、多條掃描線230以及多個主動元件210,其中主動元件210與資料線220和掃描線230耦接,而多個主動元件210組成一主動元件陣列。這些資料線220、多條掃描線230以及主動元件210皆配置於第二基板20上,主動元件210位於顯示區域M1內。主動元件210所組成的主動元件陣列對應於上述彩色濾光片110a、110b以及110c所形成的配列。周邊線路240,配置於非顯示區域M2內,據此,形成一主動元件陣列基板200。 The display panel 1a may further include a plurality of data lines 220, a plurality of scan lines 230, and a plurality of active elements 210, wherein the active elements 210 are coupled to the data lines 220 and the scan lines 230, and the plurality of active elements 210 form an active device array. . The data lines 220, the plurality of scan lines 230, and the active device 210 are disposed on the second substrate 20, and the active device 210 is located in the display area M1. The active device array composed of the active elements 210 corresponds to the arrangement formed by the above-described color filters 110a, 110b, and 110c. The peripheral line 240 is disposed in the non-display area M2, and accordingly, an active device array substrate 200 is formed.
填充層50配置於第一基板10與第二基板20之間的間隙,用以改變入射光的方向。於本實施例中,填充層50的材料可以是液晶材料,而液晶材料的種類有多種,可以是向列型液晶(Nematic Liquid Crystal)、層列型液晶(Smectic Liquid Crystal)、膽固醇型液晶(Cholesteric Liquid Crystal)等。不過,本發明並不以此為限。 The filling layer 50 is disposed in a gap between the first substrate 10 and the second substrate 20 to change the direction of incident light. In this embodiment, the material of the filling layer 50 may be a liquid crystal material, and the liquid crystal material may be of various types, and may be a Nematic Liquid Crystal, a Smectic Liquid Crystal, or a Cholesteric Liquid Crystal ( Cholesteric Liquid Crystal) et al. However, the invention is not limited thereto.
此外,值得說明的是,顯示面板1a可以更包括導電膜(圖未示)以及配向膜(圖未示)。配向膜具有細溝紋且配置於液晶層50兩側,用以配向未施加電場前的液晶的方向。而導電膜則配置於配向膜與第一基板10或第二基板20之間,用以導電以控制液晶旋轉方向。一般而言,配向膜通常是聚醯亞胺(Polyimide)薄膜,而導電膜則通常為銦錫氧化物薄膜。 In addition, it is worth noting that the display panel 1a may further include a conductive film (not shown) and an alignment film (not shown). The alignment film has fine grooves and is disposed on both sides of the liquid crystal layer 50 for aligning the direction of the liquid crystal before the electric field is applied. The conductive film is disposed between the alignment film and the first substrate 10 or the second substrate 20 for conducting electricity to control the rotation direction of the liquid crystal. In general, the alignment film is usually a polyimide film, and the conductive film is usually an indium tin oxide film.
黏著層60是一種接著劑,用以結合第一基板10以及第二基板20。於本實施例中,黏著層60配置於非顯示區域M2上且圍繞顯示區域M1,並且黏合彩色濾光基板100與主動元件陣列基板200。一般來說,黏著層60的材料主要是環氧樹脂,而依照硬化方式來看,黏著層60可以區分為熱硬化樹脂、或者是光硬化樹脂。不過,本發明並不對此加以限定。 The adhesive layer 60 is an adhesive for bonding the first substrate 10 and the second substrate 20. In the embodiment, the adhesive layer 60 is disposed on the non-display area M2 and surrounds the display area M1, and the color filter substrate 100 and the active device array substrate 200 are bonded. Generally, the material of the adhesive layer 60 is mainly an epoxy resin, and the adhesive layer 60 can be distinguished as a thermosetting resin or a photohardening resin in terms of hardening. However, the invention is not limited thereto.
值得說明的是,遮光層30位於彩色濾光層110之上,據此,第一遮光條30b以及第二遮光條30c與主動元件陣列基板200的 間距縮短,從而減少漏光情形,進而降低上下方位視角的大角度色偏發生之機率。此外,藉由控制所述溝渠的寬度,即可縮小第一遮光條30b以及第二遮光條30c的寬度,從而開口率得以提高。 It should be noted that the light shielding layer 30 is located on the color filter layer 110, according to which the first light shielding strip 30b and the second light shielding strip 30c and the active device array substrate 200 are The pitch is shortened, thereby reducing the light leakage situation, thereby reducing the probability of occurrence of a large angle color shift of the upper and lower azimuth angles of view. Further, by controlling the width of the trench, the widths of the first light-blocking strip 30b and the second light-blocking strip 30c can be reduced, and the aperture ratio can be improved.
具體而言,於本實施例中,框型遮光層30a形成於第一基板10的非顯示區域M2內,而框型遮光層30a的材料為一負型黑色感光性樹脂。 Specifically, in the present embodiment, the frame type light shielding layer 30a is formed in the non-display area M2 of the first substrate 10, and the material of the frame type light shielding layer 30a is a negative type black photosensitive resin.
彩色濾光層110形成於第一基板10上且位於顯示區域M1內,而多片各種顏色的彩色濾光片110a、110b以及110c的配列方式可以是馬賽克式、直條式或者是三角式。本發明並不以各色彩色濾光片的配列方式為限。 The color filter layer 110 is formed on the first substrate 10 and located in the display area M1, and the plurality of color filters 110a, 110b, and 110c of various colors may be arranged in a mosaic, a straight line or a triangle. The present invention is not limited to the arrangement of the color filters of the respective colors.
接著,將一透明光阻材料覆蓋於彩色濾光層110以及框型遮光層30a之上,以形成一透明絕緣層。透過光罩在透明絕緣層製作出多條彼此交錯的縱向及橫向溝渠,據以形成透明圖案層40。也就是說,透明圖案層40劃分出多個透明層40a,而這些縱向及橫向溝渠位於不同的透明層40a之間,其中這些溝渠裸露出各個彩色濾光片110a、110b以及110c彼此之間的交界處,而各透明層40a的橫剖面的形狀為一梯形。 Next, a transparent photoresist material is overlaid on the color filter layer 110 and the frame type light shielding layer 30a to form a transparent insulating layer. A plurality of longitudinal and lateral grooves interlaced with each other are formed on the transparent insulating layer through the reticle to form a transparent pattern layer 40. That is, the transparent pattern layer 40 divides the plurality of transparent layers 40a, and the longitudinal and lateral trenches are located between the different transparent layers 40a, wherein the trenches expose the respective color filters 110a, 110b, and 110c to each other. At the junction, the cross section of each transparent layer 40a has a trapezoidal shape.
而後,正型黑色感光性樹脂層(圖未示)覆蓋於透明圖案層40上,從而使得部分正型黑色感光性樹脂材料覆蓋於各個透明層40a上,而另外部分的正型黑色感光性樹脂材料填滿於所述縱向及橫向溝渠。值得注意的是,正型黑色感光性樹脂層的厚度大於透明圖案層40的厚度。 Then, a positive-type black photosensitive resin layer (not shown) is overlaid on the transparent pattern layer 40 so that a part of the positive-type black photosensitive resin material covers the respective transparent layers 40a, and another part of the positive-type black photosensitive resin The material fills the longitudinal and lateral channels. It is to be noted that the thickness of the positive type black photosensitive resin layer is larger than the thickness of the transparent pattern layer 40.
再後,進行全面性曝光,從而使得正型黑色感光性樹脂層的厚度降低,進而形成第一遮光條30b以及第二遮光條30c。於實務上,第一遮光條30b以及第二遮光條30c的厚度大致上些略低於透明圖案層40的厚度。不過,第一遮光條30b以及第二遮光條30c的厚度也可以齊平於透明圖案層40的厚度。值得說明的是,第一遮光條30b的寬度L1小於及第二遮光條30c的寬度L2,而第一 遮光條30b的寬度L1主要小於10μm,而寬度L1最小可介於1至2微米(μm)之間。 Thereafter, comprehensive exposure is performed to lower the thickness of the positive-type black photosensitive resin layer, thereby forming the first light-blocking strip 30b and the second light-blocking strip 30c. In practice, the thickness of the first light-shielding strip 30b and the second light-shielding strip 30c is substantially slightly lower than the thickness of the transparent pattern layer 40. However, the thickness of the first light-shielding strip 30b and the second light-shielding strip 30c may be flush with the thickness of the transparent pattern layer 40. It should be noted that the width L1 of the first light shielding strip 30b is smaller than the width L2 of the second light shielding strip 30c, and the first The width L1 of the light-shielding strip 30b is mainly less than 10 μm, and the width L1 may be at least between 1 and 2 micrometers (μm).
不過,於其它實施例中,透明絕緣層亦可以僅覆蓋於彩色濾光層110上而沒有覆蓋於框型遮光層30a上。依此,於後續製程中,正型黑色感光性樹脂層得以覆蓋於框型遮光層30a之上,從而框型遮光層30a則包括有下層的負型黑色感光性樹脂材料以及上層的正型黑色感光性樹脂材料。 However, in other embodiments, the transparent insulating layer may also cover only the color filter layer 110 without covering the frame type light shielding layer 30a. Accordingly, in the subsequent process, the positive black photosensitive resin layer is overlaid on the frame type light shielding layer 30a, so that the frame type light shielding layer 30a includes the lower layer of the negative black photosensitive resin material and the upper layer of the positive type black. Photosensitive resin material.
圖1D為本發明第二實施例的顯示面板的剖面示意圖。請參閱圖1D,本發明第二實施例的顯示面板1b與第一實施例的顯示面板1a二者結構相似,例如顯示面板1a與1b同樣都包括主動元件陣列基板200。不過,顯示面板1a與1b之間仍存有差異。以下將僅介紹顯示面板1a與1b二者的差異,其主要在於:第二實施例的遮光層32與第一實施例的遮光層30不同,而顯示面板1a與1b二者相同的特徵則不再重複詳細敘述。 1D is a schematic cross-sectional view of a display panel in accordance with a second embodiment of the present invention. Referring to FIG. 1D, the display panel 1b of the second embodiment of the present invention is similar in structure to the display panel 1a of the first embodiment. For example, the display panels 1a and 1b also include the active device array substrate 200. However, there is still a difference between the display panels 1a and 1b. Only differences between the display panels 1a and 1b will be described below, mainly because the light shielding layer 32 of the second embodiment is different from the light shielding layer 30 of the first embodiment, and the same features of the display panels 1a and 1b are not Repeat the detailed description.
彩色濾光層110配置於第一基板10上,而遮光層32配置於第一基板10與第二基板20之間。遮光層32包括框型遮光層32a、多條並列的第一遮光條32b與多條並列的第二遮光條(圖未示),而透明圖案層40包括多個透明層40a。詳細而言,多條並列的第一遮光條32b與多條並列的第二遮光條彼此交錯以劃分出多個單元畫素區域P1,透明層40a分別配置於每一單元畫素區域P1內,據以形成彩色濾光基板102。 The color filter layer 110 is disposed on the first substrate 10 , and the light shielding layer 32 is disposed between the first substrate 10 and the second substrate 20 . The light shielding layer 32 includes a frame type light shielding layer 32a, a plurality of juxtaposed first light shielding strips 32b and a plurality of juxtaposed second light shielding strips (not shown), and the transparent pattern layer 40 includes a plurality of transparent layers 40a. Specifically, the plurality of juxtaposed first light-blocking strips 32b and the plurality of juxtaposed second light-shielding strips are interlaced with each other to define a plurality of unit pixel regions P1, and the transparent layer 40a is disposed in each of the unit pixel regions P1. The color filter substrate 102 is formed accordingly.
值得注意的是,透明圖案層40僅分布於顯示區域M1,從而透明圖案層40沒有覆蓋於框型遮光層32a上,而第一遮光條32b與第二遮光條的厚度大於透明圖案層40的厚度。 It should be noted that the transparent pattern layer 40 is only distributed on the display area M1, so that the transparent pattern layer 40 is not covered on the frame type light shielding layer 32a, and the thickness of the first light shielding strip 32b and the second light shielding strip is larger than that of the transparent pattern layer 40. thickness.
具體而言,於第二實施例中,同樣地,於第一基板10上形成框型遮光層32a、彩色濾光層110以及透明圖案層40。其中,框型遮光層32a的材料為一負型黑色感光性樹脂。 Specifically, in the second embodiment, the frame type light shielding layer 32a, the color filter layer 110, and the transparent pattern layer 40 are formed on the first substrate 10 in the same manner. The material of the frame type light shielding layer 32a is a negative black photosensitive resin.
接著,負型黑色感光性樹脂層(圖未示)覆蓋於透明圖案層40 以及框型遮光層32a上,從而使得部分負型黑色感光性樹脂材料覆蓋於各個透明層40a以及框型遮光層32a上,而另外部分的負型黑色感光性樹脂材料填滿於所述縱向及橫向溝渠。值得注意的是,負型黑色感光性樹脂層的厚度大於透明圖案層40的厚度。 Next, a negative black photosensitive resin layer (not shown) is overlaid on the transparent pattern layer 40. And the frame type light shielding layer 32a, so that a part of the negative black photosensitive resin material covers the respective transparent layers 40a and the frame type light shielding layer 32a, and another part of the negative black photosensitive resin material fills the longitudinal direction and Horizontal ditches. It is to be noted that the thickness of the negative black photosensitive resin layer is larger than the thickness of the transparent pattern layer 40.
而後,藉由多灰階光罩(gray-tone mask)或是半透性光罩(half-tone mask)進行非全面性曝光,據以移除位於透明圖案層40的第二端面S2上的負型黑色感光性樹脂材料,並且使得位於所述縱向及橫向溝渠的負型黑色感光性樹脂層的厚度降低,進而形成第一遮光條32b以及第二遮光條。於實務上,第一遮光條32b以及第二遮光條的厚度大致上些略高於透明圖案層40的厚度。不過,第一遮光條32b以及第二遮光條的厚度也可以齊平於透明圖案層40的厚度。 Then, the non-comprehensive exposure is performed by a gray-tone mask or a half-tone mask, thereby removing the second end surface S2 located on the transparent pattern layer 40. The negative-type black photosensitive resin material lowers the thickness of the negative-type black photosensitive resin layer located in the longitudinal and lateral grooves, thereby forming the first light-blocking strip 32b and the second light-shielding strip. In practice, the thickness of the first light-shielding strip 32b and the second light-shielding strip is substantially slightly higher than the thickness of the transparent pattern layer 40. However, the thickness of the first light-shielding strip 32b and the second light-shielding strip may be flush with the thickness of the transparent pattern layer 40.
圖1E為本發明第三實施例的顯示面板的剖面示意圖。請參閱圖1E,本發明第三實施例的顯示面板1c與第一實施例的顯示面板1a二者結構相似,例如顯示面板1a與1c同樣都包括主動元件陣列基板200。不過,顯示面板1a與1c之間仍存有差異。以下將僅介紹顯示面板1a與1c二者的差異,而顯示面板1a與1c二者相同的特徵則不再重複詳細敘述。 1E is a schematic cross-sectional view of a display panel according to a third embodiment of the present invention. Referring to FIG. 1E, the display panel 1c of the third embodiment of the present invention is similar in structure to the display panel 1a of the first embodiment. For example, the display panels 1a and 1c also include the active device array substrate 200. However, there is still a difference between the display panels 1a and 1c. Only the differences between the display panels 1a and 1c will be described below, and the features of the display panels 1a and 1c will not be repeated.
在第三實施例中,顯示面板1c包括遮光層34,而遮光層34包括多條並列的第一遮光條34b與多條並列的第二遮光條(圖未示)。詳細而言,如圖1E所繪示,第一遮光條34b包括一上半部A1以及一下半部A2,下半部A2位於這些彩色濾光片110a、110b以及110c之間,且下半部A2由第一基板10的表面延伸至透明圖案層40的底面,而上半部A1由透明圖案層40的底面往第二基板20的方向延伸。同樣地,透明圖案層40部分覆蓋彩色濾光層110,而彩色濾光層110配置在第一基板10與透明圖案層40之間且對應位於這些遮光層34所劃分出的單元畫素區域P1。 In the third embodiment, the display panel 1c includes a light shielding layer 34, and the light shielding layer 34 includes a plurality of juxtaposed first light shielding strips 34b and a plurality of juxtaposed second light shielding strips (not shown). In detail, as shown in FIG. 1E, the first light shielding strip 34b includes an upper half A1 and a lower half A2. The lower half A2 is located between the color filters 110a, 110b and 110c, and the lower half is A2 extends from the surface of the first substrate 10 to the bottom surface of the transparent pattern layer 40, and the upper half A1 extends from the bottom surface of the transparent pattern layer 40 toward the second substrate 20. Similarly, the transparent pattern layer 40 partially covers the color filter layer 110, and the color filter layer 110 is disposed between the first substrate 10 and the transparent pattern layer 40 and corresponding to the unit pixel region P1 defined by the light shielding layers 34. .
值得說明的是,於第三實施例中,上半部A1的材料與下半部 A2為不同感光型態的黑色感光性樹脂材料。不過,於其它實施例中,上半部A1的材料與下半部A2也可以是相同感光型態的黑色感光性樹脂材料。本發明並不對上半部A1以及下半部A2的材料加以限定。 It should be noted that in the third embodiment, the material of the upper half A1 and the lower half are A2 is a black photosensitive resin material of different photosensitive forms. However, in other embodiments, the material of the upper half A1 and the lower half A2 may be black photosensitive resin materials of the same photosensitive type. The present invention does not limit the materials of the upper half A1 and the lower half A2.
具體而言,於第三實施例中,框型遮光層34a以及第一遮光條34b的下半部A2同時形成。值得注意的是,框型遮光層34a以及第一遮光條34b的下半部A2的材料為一負型黑色感光性樹脂。 Specifically, in the third embodiment, the frame type light shielding layer 34a and the lower half A2 of the first light shielding strip 34b are simultaneously formed. It is to be noted that the material of the frame type light shielding layer 34a and the lower half A2 of the first light shielding strip 34b is a negative black photosensitive resin.
接著,正型黑色感光性樹脂層(圖未示)覆蓋於透明圖案層40以及框型遮光層34a上,從而使得部分正型黑色感光性樹脂材料覆蓋於各個透明層40a以及框型遮光層34a上,而另外部分的正型黑色感光性樹脂材料覆蓋於下半部A2之上。值得注意的是,正型黑色感光性樹脂層的厚度大於透明圖案層40的厚度。 Next, a positive-type black photosensitive resin layer (not shown) is overlaid on the transparent pattern layer 40 and the frame-type light-shielding layer 34a, so that a part of the positive-type black photosensitive resin material covers the respective transparent layers 40a and the frame-type light-shielding layer 34a. Further, another portion of the positive type black photosensitive resin material covers the lower half A2. It is to be noted that the thickness of the positive type black photosensitive resin layer is larger than the thickness of the transparent pattern layer 40.
再後,進行全面性曝光,從而使得正型黑色感光性樹脂層的厚度降低,進而形成第一遮光條34b以及第二遮光條。值得注意的是,第一遮光條34b的上半部A1的材料為正型黑色感光性樹脂材料,而下半部A2的材料為負型黑色感光性樹脂材料。於實務上,第一遮光條34b以及第二遮光條的厚度大致上些略低於透明圖案層40的厚度。 Thereafter, comprehensive exposure is performed to lower the thickness of the positive-type black photosensitive resin layer, thereby forming the first light-blocking strips 34b and the second light-shielding strips. It is to be noted that the material of the upper half A1 of the first light-shielding strip 34b is a positive-type black photosensitive resin material, and the material of the lower half A2 is a negative-type black photosensitive resin material. In practice, the thickness of the first light-shielding strip 34b and the second light-shielding strip is substantially slightly lower than the thickness of the transparent pattern layer 40.
不過,必須說明的是,於其它實施例中,第一遮光條34b的上半部A1的材料與下半部A2的材料可以皆為負型黑色感光性樹脂材料。詳細而言,於不同的製程工序考量下,可以是以負型黑色感光性樹脂層(圖未示)覆蓋於透明圖案層40以及框型遮光層34a上,而且藉由多灰階光罩進行非全面性曝光,以便移除位於透明圖案層40的第二端面S2上的負型黑色感光性樹脂材料,並且使得位於所述縱向及橫向溝渠的負型黑色感光性樹脂層的厚度降低,進而形成第一遮光條34b以及第二遮光條34c。於實務上,第一遮光條34b以及第二遮光條34c的厚度大致上些略大於透明圖案層40的厚度。 However, it must be noted that in other embodiments, the material of the upper half A1 of the first light-shielding strip 34b and the material of the lower half A2 may both be negative-type black photosensitive resin materials. In detail, under different process steps, a negative black photosensitive resin layer (not shown) may be overlaid on the transparent pattern layer 40 and the frame type light shielding layer 34a, and the multi-gray mask may be used. Non-integral exposure to remove the negative black photosensitive resin material on the second end face S2 of the transparent pattern layer 40, and to reduce the thickness of the negative black photosensitive resin layer located in the longitudinal and lateral grooves, thereby further The first light blocking strip 34b and the second light blocking strip 34c are formed. In practice, the thickness of the first light-shielding strip 34b and the second light-shielding strip 34c is substantially slightly larger than the thickness of the transparent pattern layer 40.
此外,值得說明的是,遮光層34的上半部以及下半部的材料可以是由不同感光型態的黑色感光性樹脂材料。不過,本發明並不對遮光層34的上半部以及下半部的材料加以限定。 Further, it is to be noted that the material of the upper half and the lower half of the light shielding layer 34 may be a black photosensitive resin material of a different photosensitive type. However, the present invention does not limit the materials of the upper and lower halves of the light shielding layer 34.
圖2為本發明第四實施例的顯示面板的剖面示意圖。請參閱圖2,本發明第四實施例的顯示面板2與第二實施例的顯示面板1b二者結構相似,例如顯示面板2與1b同樣都包括彩色濾光基板102。不過,顯示面板2與1b之間仍存有差異。以下將僅介紹顯示面板2與1b二者的差異,而顯示面板2與1b二者相同的特徵則不再重複詳細敘述。 2 is a cross-sectional view of a display panel in accordance with a fourth embodiment of the present invention. Referring to FIG. 2, the display panel 2 of the fourth embodiment of the present invention is similar in structure to the display panel 1b of the second embodiment. For example, the display panels 2 and 1b both include the color filter substrate 102. However, there is still a difference between the display panels 2 and 1b. Only the differences between the display panels 2 and 1b will be described below, and the features of the display panels 2 and 1b will not be repeated.
在第四實施例中,彩色濾光層110配置於第一基板10上,而遮光層32配置於第一基板10與第二基板20之間。值得說明的是,在第四實施例中,顯示面板2為有機電致發光顯示面板(Organic Light Emitting Display,OLED),因此顯示面板2與1b不同之處在於顯示面板2更包括有機發光膜層250。 In the fourth embodiment, the color filter layer 110 is disposed on the first substrate 10 , and the light shielding layer 32 is disposed between the first substrate 10 and the second substrate 20 . It should be noted that, in the fourth embodiment, the display panel 2 is an organic light emitting display (OLED), and thus the display panel 2 is different from the 1b in that the display panel 2 further includes an organic light emitting film layer. 250.
詳細而言,顯示面板2除了包括多個主動元件210之外,更包括有機發光膜層250,據以形成主動電致發光元件陣列基板202。其中,有機發光膜層250電性連接主動元件210所形成的主動元件陣列。有機發光膜層250包括第一電極(圖未示)、有機發光層(圖未示)以及第二電極(圖未示)。 In detail, the display panel 2 includes an organic light-emitting film layer 250 in addition to the plurality of active elements 210, thereby forming the active electroluminescent element array substrate 202. The organic luminescent film layer 250 is electrically connected to the active device array formed by the active device 210. The organic light-emitting film layer 250 includes a first electrode (not shown), an organic light-emitting layer (not shown), and a second electrode (not shown).
值得注意的是,有機發光膜層250可以是由不同顏色的有機發光膜層所形成的配列,例如是紅色、藍色以及綠色。或者是由白光有機發光膜層所形成的配列。由於主動電致發光元件陣列基板202為自發光,因此,於不同的產品考量下,顯示面板2也可以僅以有機發光膜層250作為入射光。 It is to be noted that the organic light-emitting film layer 250 may be an array formed of organic light-emitting film layers of different colors, such as red, blue, and green. Or an arrangement formed by a white organic light-emitting film layer. Since the active electroluminescent device array substrate 202 is self-illuminating, the display panel 2 may use only the organic luminescent film layer 250 as incident light under different product considerations.
填充層52配置於第一基板10與第二基板20之間的間隙,於本實施例中,填充層52的材料可以是空氣、有機填充材或者是無機填充材。不過,本發明實施例並不對填充層52的材料加以限定。 The filling layer 52 is disposed in a gap between the first substrate 10 and the second substrate 20. In the embodiment, the material of the filling layer 52 may be air, an organic filler or an inorganic filler. However, the material of the filling layer 52 is not limited by the embodiment of the present invention.
圖3A為本發明第五實施例的顯示面板的剖面示意圖。請參閱 圖3A,在第五實施例中,遮光層36位於第二基板20側並且與有機發光膜層250接觸,遮光層36包括多條並列的第一遮光條36b與多條並列的第二遮光條(圖未示)。詳細而言,第一遮光條36b位於資料線220上,而第二遮光條位於掃描線上。不過,於其它實施例中,第一遮光條36b也可以位於掃描線上,而第二遮光條位於資料線220上,所以,圖3A中的第一遮光條36b以及第二遮光條的位置僅供舉例說明,並非用來限定本發明。 3A is a cross-sectional view of a display panel in accordance with a fifth embodiment of the present invention. See 3A, in the fifth embodiment, the light shielding layer 36 is located on the second substrate 20 side and is in contact with the organic light emitting film layer 250. The light shielding layer 36 includes a plurality of juxtaposed first light shielding strips 36b and a plurality of juxtaposed second light shielding strips. (not shown). In detail, the first light-shielding strip 36b is located on the data line 220, and the second light-shielding strip is located on the scan line. However, in other embodiments, the first light-shielding strip 36b may also be located on the scan line, and the second light-shielding strip is located on the data line 220. Therefore, the positions of the first light-shielding strip 36b and the second light-shielding strip in FIG. 3A are only for The illustrations are not intended to limit the invention.
這些第一遮光條36b以及第二遮光條彼此交錯以劃分出多個單元畫素區域P1,每一單元畫素區域P1分別對應主動元件210所形成的主動元件陣列,也就是說,各個主動元件210對應配置於這些單元畫素區域P1。值得說明的是,第一遮光條36b的寬度L1主要小於10μm,而寬度最小可介於1至2微米(μm)之間。 The first light-shielding strips 36b and the second light-shielding strips are interlaced with each other to define a plurality of unit pixel regions P1, and each of the pixel pixel regions P1 respectively corresponds to an active device array formed by the active device 210, that is, each active device 210 is correspondingly arranged in these unit pixel regions P1. It is worth noting that the width L1 of the first light-shielding strip 36b is mainly less than 10 μm, and the width may be at least between 1 and 2 micrometers (μm).
透明圖案層42包括多個透明層42a,而每一透明層42a分別配置於每一單元畫素區域P1內。詳細來說,透明圖案層42具有多條縱向及橫向溝渠,而這些溝渠彼此交錯以將透明圖案層42劃分出多個圖案。 The transparent pattern layer 42 includes a plurality of transparent layers 42a, and each of the transparent layers 42a is disposed in each of the unit pixel regions P1. In detail, the transparent pattern layer 42 has a plurality of longitudinal and lateral trenches, and the trenches are staggered with each other to divide the transparent pattern layer 42 into a plurality of patterns.
所述圖案即為透明層42a。透明層42a的橫剖面形狀可以是一梯形,而各個透明層42a具有第一端面S4與相對第一端面S4的第二端面S3,其中各透明層42a的徑寬從第一端面S4的方向朝向第二端面S3的方向漸窄或相等。不過,本發明並不對透明層42a的材料以及形狀加以限定。 The pattern is the transparent layer 42a. The cross-sectional shape of the transparent layer 42a may be a trapezoid, and each transparent layer 42a has a first end surface S4 and a second end surface S3 opposite to the first end surface S4, wherein the diameter of each transparent layer 42a is oriented from the direction of the first end surface S4. The direction of the second end face S3 is tapered or equal. However, the present invention does not limit the material and shape of the transparent layer 42a.
於第五發明實施例中,透明圖案層42部分覆蓋有機發光膜層250,而主動元件210配置在第二基板20與有機發光膜層250之間且對應位於這些單元畫素區域P1,據以形成主動電致發光元件陣列基板204。其中,這些溝渠裸露出主動元件210彼此之間的交界處,更進一步來說,這些溝渠裸露出各個資料線220以及掃描線。值得說明的是,所述圖案即為多個透明層42a,第一遮光條36b以及第二遮光條分別位於這些縱向及橫向溝渠之內並且位於 不同的透明層42a之間,而所述縱向及橫向溝渠的寬度即為第一遮光條36b的寬度以及第二遮光條的寬度。 In the fifth embodiment of the present invention, the transparent pattern layer 42 partially covers the organic light-emitting film layer 250, and the active device 210 is disposed between the second substrate 20 and the organic light-emitting film layer 250 and correspondingly located in the unit pixel regions P1. The active electroluminescent element array substrate 204 is formed. Wherein, the trenches expose the intersections of the active elements 210 with each other, and further, the trenches expose the respective data lines 220 and the scan lines. It should be noted that the pattern is a plurality of transparent layers 42a, and the first light-shielding strips 36b and the second light-shielding strips are respectively located in the longitudinal and lateral trenches and are located Between the different transparent layers 42a, the widths of the longitudinal and lateral grooves are the width of the first light-shielding strip 36b and the width of the second light-shielding strip.
值得說明的是,由於遮光層36位於主動電致發光元件陣列基板204側,也就是位於資料線220以及掃描線之上,第一遮光條36b以及第二遮光條不僅得以增加影像對比,還可以遮蔽來自有機發光膜層250的出光照射至主動元件陣列從而降低主動元件陣列產生漏電流之機率以及減少漏光情形,進而降低左右大視角色偏發生之機率。 It should be noted that, since the light shielding layer 36 is located on the side of the active electroluminescent device array substrate 204, that is, above the data line 220 and the scanning line, the first light shielding strip 36b and the second light shielding strip not only increase image contrast, but also The light from the organic light-emitting film layer 250 is shielded from the active device array to reduce the probability of leakage current generated by the active device array and to reduce light leakage, thereby reducing the probability of occurrence of left and right large-view characters.
此外,藉由控制所述溝渠的寬度,即可縮小第一遮光條36b以及第二遮光條的寬度,從而開口率得以提高。於第五實施例中,依照不同的製程需求,第一遮光條36b、第二遮光條以及黑紋層BM可以是相同感光型態的黑色感光性樹脂材料,此外,也可以是不同感光型態的黑色感光性樹脂材料。值得說明的是,可以依照不同的製程需求,對第一遮光條36b、第二遮光條以及黑紋層BM的製作步驟順序以及方法進行調整及變化。本發明並不對遮光層36的結構及製作方面的設計加以限定。 Further, by controlling the width of the trench, the widths of the first light-blocking strip 36b and the second light-shielding strip can be reduced, so that the aperture ratio is improved. In the fifth embodiment, the first light-shielding strips 36b, the second light-shielding strips, and the black-grain layer BM may be black photosensitive resin materials of the same photosensitive type according to different process requirements, and may also be different photosensitive patterns. Black photosensitive resin material. It should be noted that the order and method of making the first light-shielding strip 36b, the second light-shielding strip, and the black-grain layer BM can be adjusted and changed according to different process requirements. The present invention does not limit the structure and fabrication of the light shielding layer 36.
顯示面板3a可以更包括一習知彩色濾光基板106,習知彩色濾光基板106包括彩色濾光層120,而彩色濾光層120位於顯示區域M1內。彩色濾光層120包括多片各種顏色的彩色濾光片120a、120b和120c以及黑紋層BM。不過,本發明並不對習知彩色濾光基板106的結構加以限制。 The display panel 3a may further include a conventional color filter substrate 106. The conventional color filter substrate 106 includes a color filter layer 120, and the color filter layer 120 is located in the display region M1. The color filter layer 120 includes a plurality of color filters 120a, 120b, and 120c of various colors and a black layer BM. However, the present invention does not limit the structure of the conventional color filter substrate 106.
圖3B為本發明第六實施例的顯示面板的剖面示意圖。請參閱圖3B,本發明第六實施例的顯示面板3b與第五實施例的顯示面板3a二者結構相似,例如顯示面板3b與3a同樣都包括習知彩色濾光基板106。不過,顯示面板3b與3a之間仍存有差異。以下將僅介紹顯示面板3b與3a二者的差異,其主要在於:第六實施例的顯示面板3b為液晶顯示面板,而顯示面板3b與3a二者相同的特徵則不再重複詳細敘述。 3B is a cross-sectional view of a display panel according to a sixth embodiment of the present invention. Referring to FIG. 3B, the display panel 3b of the sixth embodiment of the present invention is similar in structure to the display panel 3a of the fifth embodiment. For example, the display panels 3b and 3a also include the conventional color filter substrate 106. However, there is still a difference between the display panels 3b and 3a. Only the differences between the display panels 3b and 3a will be described below, mainly because the display panel 3b of the sixth embodiment is a liquid crystal display panel, and the same features of the display panels 3b and 3a will not be described in detail.
在第六實施例中,遮光層36位於主動元件陣列基板206側並且與資料線220以及掃描線接觸,遮光層36包括多條並列的第一遮光條36b與多條並列的第二遮光條。詳細而言,第一遮光條36b位於資料線220上,而第二遮光條(圖未示)位於掃描線上。不過,第一遮光條36b以及第二遮光條的位置僅供舉例說明,並非用來限定本發明。 In the sixth embodiment, the light shielding layer 36 is located on the side of the active device array substrate 206 and is in contact with the data line 220 and the scanning line. The light shielding layer 36 includes a plurality of juxtaposed first light shielding strips 36b and a plurality of juxtaposed second light shielding strips. In detail, the first light-shielding strip 36b is located on the data line 220, and the second light-shielding strip (not shown) is located on the scan line. However, the positions of the first light-shielding strips 36b and the second light-shielding strips are for illustrative purposes only and are not intended to limit the invention.
透明圖案層42部分覆蓋主動元件210,而這些主動元件210配置在第二基板20與透明圖案層42之間且對應位於這些單元畫素區域P1,,據以形成主動元件陣列基板206。其中,這些溝渠裸露出主動元件210彼此之間的交界處,更進一步來說,這些溝渠裸露出各個資料線220以及掃描線。值得說明的是,所述圖案即為多個透明層42a,第一遮光條36b以及第二遮光條分別位於這些縱向及橫向溝渠之內並且位於不同的透明層42a之間,而所述縱向及橫向溝渠的寬度即為第一遮光條36b的寬度以及第二遮光條的寬度。 The transparent pattern layer 42 partially covers the active elements 210, and the active elements 210 are disposed between the second substrate 20 and the transparent pattern layer 42 and correspondingly located in the unit pixel regions P1, thereby forming the active device array substrate 206. Wherein, the trenches expose the intersections of the active elements 210 with each other, and further, the trenches expose the respective data lines 220 and the scan lines. It should be noted that the pattern is a plurality of transparent layers 42a, and the first light-shielding strips 36b and the second light-shielding strips are respectively located in the longitudinal and lateral trenches and are located between different transparent layers 42a, and the longitudinal direction is The width of the lateral trench is the width of the first light-shielding strip 36b and the width of the second light-shielding strip.
值得說明的是,由於遮光層36位於主動元件陣列基板206側,也就是位於資料線220以及掃描線之上,第一遮光條36b以及第二遮光條不僅得以增加影像對比,還可以遮蔽來自於背光模組的入射光照射至主動元件陣列從而降低主動元件陣列產生漏電流之機率以及減少漏光情形,進而降低左右大視角色偏發生之機率。 It should be noted that, since the light shielding layer 36 is located on the active device array substrate 206 side, that is, above the data line 220 and the scan line, the first light shielding strip 36b and the second light shielding strip not only increase the image contrast, but also can be shielded from the image. The incident light of the backlight module is irradiated to the active device array to reduce the probability of leakage current generated by the active device array and reduce the light leakage, thereby reducing the probability of occurrence of left and right large-view characters.
圖4為本發明第七實施例的顯示面板的剖面示意圖。請參閱圖4,本發明第七實施例的顯示面板4包括彩色濾光基板100、主動元件陣列基板206、遮光層36以及透明圖案層42。彩色濾光基板100與主動元件陣列基板206結合,遮光層36以及透明圖案層42配置於彩色濾光基板100與主動元件陣列基板206之間。 4 is a cross-sectional view showing a display panel of a seventh embodiment of the present invention. Referring to FIG. 4 , the display panel 4 of the seventh embodiment of the present invention includes a color filter substrate 100 , an active device array substrate 206 , a light shielding layer 36 , and a transparent pattern layer 42 . The color filter substrate 100 is coupled to the active device array substrate 206, and the light shielding layer 36 and the transparent pattern layer 42 are disposed between the color filter substrate 100 and the active device array substrate 206.
承上述,本發明第七實施例的顯示面板4與第一實施例的顯示面板1a以及第六實施例的顯示面板3b二者結構相似。詳細來 說,顯示面板4與1a同樣都包括彩色濾光基板100,而顯示面板4與3b同樣都包括主動元件陣列基板206、遮光層36以及透明圖案層42。值得說明的是,根據以上敘述,在不脫離本發明的精神下,本發明的顯示面板得以根據不同的產品設計而有不同的相關設計之組合。 In view of the above, the display panel 4 of the seventh embodiment of the present invention is similar in structure to the display panel 1a of the first embodiment and the display panel 3b of the sixth embodiment. Detailed The display panels 4 and 1a all include the color filter substrate 100, and the display panels 4 and 3b also include the active device array substrate 206, the light shielding layer 36, and the transparent pattern layer 42. It should be noted that, according to the above description, the display panel of the present invention can have a combination of different related designs according to different product designs without departing from the spirit of the present invention.
圖5是本發明一實施例之顯示裝置的剖面示意圖。請參閱圖5,顯示裝置5包括顯示面板1a以及背光模組70,其中背光模組70配置於第一基板10與第二基板20的下方。 Figure 5 is a cross-sectional view showing a display device in accordance with an embodiment of the present invention. Referring to FIG. 5 , the display device 5 includes a display panel 1 a and a backlight module 70 . The backlight module 70 is disposed under the first substrate 10 and the second substrate 20 .
背光模組70用於提供顯示面板1充足且均勻的光源。而言,背光模組70可以是側邊入光式背光模組(side type backlight module)、直下式背光模組(direct type back light module)等。其中,背光模組70的發光源可以是冷陰極螢光燈管或者是發光二極體,對此,背光模組70的種類僅供舉例說明,並非用以限定本發明。 The backlight module 70 is used to provide a sufficient and uniform light source for the display panel 1. The backlight module 70 can be a side type backlight module, a direct type back light module, or the like. The illumination source of the backlight module 70 may be a cold cathode fluorescent tube or a light emitting diode. The type of the backlight module 70 is for illustrative purposes only and is not intended to limit the present invention.
綜上所述,本發明實施例所提供的遮光層以及透明圖案層,透過透明圖案層定義出多個溝渠,而這些溝渠彼此交錯以將透明圖案層劃分出多個透明層。所述溝渠裸露出各個彩色濾光片彼此之間的交界處,而第一遮光條以及第二遮光條分別位於這些溝渠之內並且位於不同的透明層之間。值得說明的是,遮光層以及透明圖案層位於彩色濾光層之上,據此,第一遮光條以及第二遮光條與主動元件陣列基板的間距縮短,從而減少漏光情形,進而降低上下方位視角的大角度色偏發生之機率。 In summary, the light shielding layer and the transparent pattern layer provided by the embodiments of the present invention define a plurality of trenches through the transparent pattern layer, and the trenches are staggered with each other to divide the transparent pattern layer into a plurality of transparent layers. The trenches expose the intersections of the respective color filters with each other, and the first light-shielding strips and the second light-shielding strips are respectively located within the trenches and between different transparent layers. It should be noted that the light shielding layer and the transparent pattern layer are located on the color filter layer, whereby the distance between the first light shielding strip and the second light shielding strip and the active device array substrate is shortened, thereby reducing the light leakage condition, thereby reducing the vertical and horizontal azimuth angles. The probability of a large angle color shift occurs.
另外,遮光層以及透明圖案層也可以位於主動元件陣列基板之上,據此,第一遮光條以及第二遮光條不僅得以增加影像對比,還可以遮蔽來自於背光模組的入射光或有機發光膜層的出光照射至主動元件陣列從而降低主動元件陣列產生漏電流之機率以及減少漏光情形,進而降低左右方位視角的大角度色偏發生之機率。 In addition, the light shielding layer and the transparent pattern layer may also be located on the active device array substrate. Accordingly, the first light shielding strip and the second light shielding strip not only increase image contrast, but also shield incident light or organic light from the backlight module. The light of the film layer is irradiated to the active device array to reduce the probability of leakage current generated by the active device array and reduce the light leakage, thereby reducing the probability of occurrence of large-angle color shift of the left and right azimuth viewing angles.
值得說明的是,一般來說,在形成縱橫交錯的習知黑色遮光層 的過程中,是先將黑色遮光材料定型於玻璃基板上,不過,在顯影工序中,若所形成的習知黑色遮光層之形狀太細,則容易提高邊框破損(Matrix Pattern defect)的機率。然而,本發明透過於透明圖案層形成多條縱橫交錯的溝渠,從而便於提高溝渠的深寬比,進而控制位於溝渠內的第一遮光條以及第二遮光條的寬度。因此,藉由控制所述透明層之間的溝渠的寬度,即可縮小第一遮光條以及第二遮光條的寬度,從而開口率得以提高。 It is worth noting that, in general, the conventional black shading layer is formed in crisscross In the process, the black light-shielding material is first set on the glass substrate. However, in the development process, if the shape of the conventional black light-shielding layer formed is too small, the probability of the Matrix Pattern defect is easily increased. However, the present invention forms a plurality of criss-crossed trenches through the transparent pattern layer, thereby facilitating the improvement of the aspect ratio of the trenches, thereby controlling the widths of the first light-shielding strips and the second light-shielding strips located in the trenches. Therefore, by controlling the width of the trench between the transparent layers, the widths of the first light-shielding strip and the second light-shielding strip can be reduced, and the aperture ratio can be improved.
本發明能應用於多種不同的顯示裝置。根據以上描述,本發明的顯示裝置可以配置不同的背光模組,但是在其他發明實施例中,顯示裝置可以依據產品的需求進行設計,因此本發明並不限定顯示器的種類。 The invention can be applied to a variety of different display devices. According to the above description, the display device of the present invention can be configured with different backlight modules. However, in other embodiments of the invention, the display device can be designed according to the requirements of the product, and thus the present invention does not limit the type of the display.
以上所述僅為本發明的實施例,其並非用以限定本發明的專利保護範圍。任何熟習相像技藝者,在不脫離本發明的精神與範圍內,所作的更動及潤飾的等效替換,仍為本發明的專利保護範圍內。 The above is only an embodiment of the present invention, and is not intended to limit the scope of the invention. It is still within the scope of patent protection of the present invention to make any substitutions and modifications of the modifications made by those skilled in the art without departing from the spirit and scope of the invention.
1a‧‧‧顯示面板 1a‧‧‧ display panel
10‧‧‧第一基板 10‧‧‧First substrate
100‧‧‧彩色濾光基板 100‧‧‧Color filter substrate
110‧‧‧彩色濾光層 110‧‧‧Color filter layer
110a、110b、110c‧‧‧彩色濾光片 110a, 110b, 110c‧‧‧ color filters
20‧‧‧第二基板 20‧‧‧second substrate
200‧‧‧主動元件陣列基板 200‧‧‧Active component array substrate
210‧‧‧主動元件 210‧‧‧Active components
220‧‧‧資料線 220‧‧‧Information line
240‧‧‧周邊線路 240‧‧‧ peripheral lines
30‧‧‧遮光層 30‧‧‧Lighting layer
30a‧‧‧框型遮光層 30a‧‧‧Frame type shading
30b‧‧‧第一遮光條 30b‧‧‧First shading strip
40‧‧‧透明圖案層 40‧‧‧Transparent pattern layer
40a‧‧‧透明層 40a‧‧‧Transparent layer
60‧‧‧黏著層 60‧‧‧Adhesive layer
50‧‧‧填充層 50‧‧‧fill layer
M1‧‧‧顯示區域 M1‧‧‧ display area
M2‧‧‧非顯示區域 M2‧‧‧ non-display area
S1‧‧‧第一端面 S1‧‧‧ first end face
S2‧‧‧第二端面 S2‧‧‧ second end face
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