TWI512420B - Fluid supply adjustment device - Google Patents
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- TWI512420B TWI512420B TW100127992A TW100127992A TWI512420B TW I512420 B TWI512420 B TW I512420B TW 100127992 A TW100127992 A TW 100127992A TW 100127992 A TW100127992 A TW 100127992A TW I512420 B TWI512420 B TW I512420B
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- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
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- 238000010276 construction Methods 0.000 description 2
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- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
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Description
本發明是有關流體供給量調節裝置,特別是有關於供半導體製造裝置的各種藥液的混合時的供給流量的控制所使用的流體供給量調節裝置。The present invention relates to a fluid supply amount adjusting device, and more particularly to a fluid supply amount adjusting device used for controlling supply flow rate when various chemical liquids of a semiconductor manufacturing device are mixed.
在半導體的製造等,供給矽晶圓的洗淨和蝕刻處理用的藥液等的流體的情況時,會要求流體有較高的清淨度。在國際半導體技術發展藍圖(ITRS)中從2010年正式(真正)地開始32nm的配線間距的製造,預定今後將進一步縮窄配線寬度。因此,極力抑制灰塵從流體的流通路徑混入,是非常重要。When a fluid such as a chemical solution for cleaning and etching of a wafer is supplied to a semiconductor or the like, the fluid is required to have a high degree of cleanliness. In the International Semiconductor Technology Development Blueprint (ITRS), the manufacturing of the wiring pitch of 32 nm has been officially (really) started in 2010, and it is planned to further narrow the wiring width in the future. Therefore, it is very important to suppress the intrusion of dust from the flow path of the fluid as much as possible.
現在,矽晶圓洗淨的主流是由單片方式進行洗淨。因此,有需要將極少量的氫氟酸等的藥液由正確的精度供給並與純水及混合地供給。為了可進行這種微少流量域的調節,例如使用如滾針閥的調節閥(專利文獻1等參照)和其他的調節閥(專利文獻2等參照)。專利文獻1等的調節閥,是主要是在藥液及純水的混合部的上流位置,與各藥液的供給配管內連接(專利文獻3等參照)。Now, the mainstream of enamel wafer cleaning is washed by a single piece. Therefore, it is necessary to supply a very small amount of a chemical solution such as hydrofluoric acid with a correct precision and supply it with pure water and a mixture. In order to adjust such a small flow rate, for example, a regulating valve such as a needle valve (refer to Patent Document 1 or the like) and other regulating valves (refer to Patent Document 2 and the like) are used. The regulating valve of the patent document 1 and the like is mainly connected to the supply pipe of each chemical liquid in the upstream position of the mixing portion of the chemical liquid and the pure water (refer to Patent Document 3 and the like).
既有的微少流量用的調節閥,具有供調節設有隔膜開度用的閥體及閥座。因此,該調節閥的閥室內的流體會受到在調節閥的下流側發生的壓力變動(也包含流體的供給、供給停止等)的影響。調節閥的構造上因為隔膜是面向閥室,即使是些微的壓力變動,施加於隔膜的壓力就會變化,與隔膜連結的閥體的位置也會變化。即,閥座的開度會變化。The existing regulating valve for the micro flow rate has a valve body and a valve seat for adjusting the opening degree of the diaphragm. Therefore, the fluid in the valve chamber of the regulator valve is affected by the pressure fluctuation occurring on the downstream side of the regulator valve (including the supply of the fluid, the supply stop, and the like). In the construction of the regulating valve, since the diaphragm faces the valve chamber, even if there is a slight pressure fluctuation, the pressure applied to the diaphragm changes, and the position of the valve body connected to the diaphragm also changes. That is, the opening of the valve seat changes.
隨著這種壓力變動所導致的閥座的開度的變化的對應方法,已被提案一種調節閥,其具有在閥室將2枚的隔膜相面對配置並將兩隔膜軸部連接的構造(專利文獻4參照)。但是,專利文獻4的調節閥的情況,在閥室內前述的軸部因為是被插通,所以欲減小閥室孔徑是困難的。因此,不適合於微少流量域的調節。且,如軸部的加工、組裝、動作時的位置的晃動等,也有可能在動作時使軸部與閥室孔接觸而產生灰塵。With the method of responding to the change in the opening degree of the valve seat caused by such a pressure fluctuation, a regulating valve having a structure in which two diaphragms are disposed facing each other in the valve chamber and the two diaphragm shaft portions are connected is proposed. (Reference Patent Document 4). However, in the case of the regulating valve of Patent Document 4, since the aforementioned shaft portion in the valve chamber is inserted, it is difficult to reduce the valve chamber diameter. Therefore, it is not suitable for the adjustment of the small traffic domain. Further, if the shaft portion is processed, assembled, or swayed during operation, there is a possibility that the shaft portion comes into contact with the valve chamber hole during operation to generate dust.
[專利文獻1]日本特開2004-68935號公報[Patent Document 1] Japanese Patent Laid-Open Publication No. 2004-68935
[專利文獻2]日本專利第4365477號公報[Patent Document 2] Japanese Patent No. 4365477
[專利文獻3]日本特開2008-258437號公報[Patent Document 3] Japanese Patent Laid-Open Publication No. 2008-258437
[專利文獻4]日本特開2007-24069號公報[Patent Document 4] Japanese Patent Laid-Open Publication No. 2007-24069
本發明,是鑑於前述的問題點,提供一種使具備隔膜的流量調節閥部可抑制因受到被控制流體的壓力變動而使該流量調節閥部內的閥座的開度變化,並且可極力抑制灰塵產生且適合微少流量域的流量調節之流體供給量調節裝置。The present invention has been made in view of the above problems, and provides a flow rate adjusting valve portion including a diaphragm that can suppress a change in opening degree of a valve seat in the flow rate adjusting valve portion due to a pressure fluctuation of a controlled fluid, and can suppress dust as much as possible. A fluid supply amount adjusting device that produces and is suitable for flow regulation of a small flow field.
即,申請專利範圍第1項的發明,是一種流體供給量調節裝置,是用來調節150mL/min以下的微少流量域的被控制流體的供給流量之流量調節裝置,具備:流量調節閥部,是與被控制流體的供給部及流體混合部之間的流體配管連接,進行被控制流體的流量調節;及壓力控制閥部,是抑制在被控制流體發生的壓力變動;及流量感測器,是設在前述流體配管中;及計算裝置;且前述計算裝置,是進行依據前述流量感測器的流量測量值的反饋控制,其特徵為:前述流量調節閥部,具備:閥室殼體部,形成有:讓被控制流體通過的第1流路部及第2流路部、及將前述第1流路部及前述第2流路部連接並讓被控制流體流通的閥室;及閥座,呈平坦狀形成有閥室開口部,且在前述閥室殼體部中使前述第1流路部對於前述閥室成為直徑為1mm以下;及平坦閥體,具備將前述閥座可進退自如地密封的密封部並且使該密封部呈平坦狀形成;及閥機構體,是形成於前述密封部側相反側且具備被裝設於前述閥室側的隔膜部;及進退手段,是藉由受到由前述計算裝置所進行的反饋控制使前述閥機構體進退來調節前述平坦閥部及前述閥座的距離,且在前述第2流路部側設置前述壓力控制閥部,抑制當被控制流體施加於前述隔膜部時所發生的壓力變動。In other words, the invention of claim 1 is a fluid supply amount adjusting device, which is a flow rate adjusting device for adjusting a supply flow rate of a controlled fluid in a flow rate range of 150 mL/min or less, and includes a flow rate adjusting valve portion. Is connected to a fluid pipe between the supply portion of the fluid to be controlled and the fluid mixing portion to adjust the flow rate of the fluid to be controlled; and the pressure control valve portion is for suppressing pressure fluctuation occurring in the fluid to be controlled; and a flow rate sensor; Provided in the fluid pipe; and a calculation device; and the calculation device is a feedback control based on the flow rate measurement value of the flow sensor, wherein the flow rate adjustment valve portion includes: a valve chamber housing portion a first flow path portion and a second flow path portion through which the controlled fluid passes, and a valve chamber that connects the first flow path portion and the second flow path portion to allow the controlled fluid to flow; and a valve a valve chamber opening portion is formed in a flat shape, and the first flow path portion has a diameter of 1 mm or less with respect to the valve chamber in the valve chamber casing portion; and the flat valve body includes the valve seat a sealing portion that is removably sealed and formed in a flat shape; and a valve mechanism body that is formed on a side opposite to the sealing portion side and that includes a diaphragm portion that is attached to the valve chamber side; The distance between the flat valve portion and the valve seat is adjusted by the feedback control by the calculation device, and the distance between the flat valve portion and the valve seat is adjusted, and the pressure control valve portion is provided on the second flow path portion side to suppress the The pressure fluctuation that occurs when the fluid is applied to the diaphragm portion is controlled.
申請專利範圍第2項的發明,是如申請專利範圍第1項的流體供給量調節裝置,其中,前述第2流路部側是前述流量調節閥部中的下流側,前述壓力控制閥部是可一定地保持該壓力控制閥部的上流側的被控制流體的流體壓力用的壓力控制閥。The invention of claim 2 is the fluid supply amount adjusting device according to the first aspect of the invention, wherein the second flow path portion side is a downstream side of the flow rate adjusting valve portion, and the pressure control valve portion is A pressure control valve for fluid pressure of the fluid to be controlled on the upstream side of the pressure control valve portion can be surely held.
申請專利範圍第3項的發明,是如申請專利範圍第1項的流體供給量調節裝置,其中,前述第2流路部側是前述流量調節閥部中的下流側,前述壓力控制閥部是可一定地保持該壓力控制閥部的上流側的被控制流體的流體壓力用的壓力控制閥,前述壓力控制閥部是形成於前述流量調節閥部內。The fluid supply amount adjusting device according to the first aspect of the invention, wherein the second flow path portion side is a downstream side of the flow rate adjusting valve portion, and the pressure control valve portion is A pressure control valve for fluid pressure of the fluid to be controlled on the upstream side of the pressure control valve portion is fixedly held, and the pressure control valve portion is formed in the flow rate adjustment valve portion.
申請專利範圍第4項的發明,是如申請專利範圍第1項的流體供給量調節裝置,其中,前述第2流路部側是前述流量調節閥部中的上流側,前述壓力控制閥部是可一定地保持該壓力控制閥部的下流側的被控制流體的流體壓力用的壓力控制閥。The fluid supply amount adjusting device according to the first aspect of the invention, wherein the second flow path portion side is an upstream side of the flow rate adjusting valve portion, and the pressure control valve portion is A pressure control valve for fluid pressure of the fluid to be controlled on the downstream side of the pressure control valve portion can be surely held.
申請專利範圍第5項的發明,是如申請專利範圍第1項的流體供給量調節裝置,其中,前述進退手段是使用依據前述計算裝置的反饋控制藉由電動氣動轉換器作出的調壓氣體。The invention of claim 5 is the fluid supply amount adjusting device according to the first aspect of the invention, wherein the forward/backward means is a pressure regulating gas which is produced by an electropneumatic converter using feedback according to the calculation means.
申請專利範圍第6項的發明,是如申請專利範圍第1項的流體供給量調節裝置,其中,前述進退手段是受到前述計算裝置的反饋控制之後依據馬達控制基板被控制的步進馬達。The invention of claim 6 is the fluid supply amount adjusting device according to the first aspect of the invention, wherein the forward/backward means is a stepping motor controlled by the motor control board after being subjected to feedback control by the computing device.
依據申請專利範圍第1項的發明的流體供給量調節裝置,因為是一種流體供給量調節裝置,是用來調節150mL/min以下的微少流量域的被控制流體的供給流量之流量調節裝置,具備:流量調節閥部,是與被控制流體的供給部及流體混合部之間的流體配管連接,進行被控制流體的流量調節;及壓力控制閥部,是抑制在被控制流體發生的壓力變動;及流量感測器,是設在前述流體配管中;及計算裝置;且前述計算裝置,是進行依據前述流量感測器的流量測量值的反饋控制,其特徵為:前述流量調節閥部,具備:閥室殼體部,形成有:讓被控制流體通過的第1流路部及第2流路部、及將前述第1流路部及前述第2流路部連接並讓被控制流體流通的閥室;及閥座,呈平坦狀形成有閥室開口部,且在前述閥室殼體部中使前述第1流路部對於前述閥室成為直徑為1mm以下;及平坦閥體,具備將前述閥座可進退自如地密封的密封部並且使該密封部呈平坦狀形成;及閥機構體,是形成於前述密封部側相反側且具備被裝設於前述閥室側的隔膜部;及進退手段,是藉由受到由前述計算裝置所進行的反饋控制使前述閥機構體進退來調節前述平坦閥部及前述閥座的距離;且在前述第2流路部側設置前述壓力控制閥部,使抑制當被控制流體施加於前述隔膜部時的所發生的壓力變動,所以可抑制具備隔膜的流量調節閥部因受到被控制流體的壓力變動而使該流量調節閥部內的閥座的開度的變化。且,可以極力抑制從閥體的構造產生灰塵,可以獲得適合於微少流量域的流量調節且可抑制灰塵產生的流體供給量調節裝置。The fluid supply amount adjusting device according to the invention of claim 1 is a fluid supply amount adjusting device, and is a flow rate adjusting device for adjusting a supply flow rate of a controlled fluid in a minute flow region of 150 mL/min or less. The flow regulating valve unit is connected to a fluid pipe between the supply unit and the fluid mixing unit of the controlled fluid to adjust the flow rate of the controlled fluid; and the pressure control valve unit is configured to suppress a pressure fluctuation occurring in the controlled fluid; And the flow sensor is disposed in the fluid pipe; and the calculating device; and the calculating device is a feedback control according to the flow rate measurement value of the flow sensor, wherein the flow regulating valve portion is provided The valve chamber casing portion is formed with a first flow path portion and a second flow path portion through which the controlled fluid passes, and the first flow path portion and the second flow path portion are connected to allow the controlled fluid to flow. a valve chamber opening; a valve chamber opening portion is formed in a flat shape; and the first flow path portion has a diameter of 1 mm or less with respect to the valve chamber in the valve chamber housing portion; and The valve body includes a seal portion that can seal the valve seat in a releasable manner, and the seal portion is formed in a flat shape; and the valve mechanism body is formed on the opposite side of the seal portion side and is provided in the valve chamber The side diaphragm portion and the advancing and retracting means adjust the distance between the flat valve portion and the valve seat by the forward and backward movement of the valve mechanism body by feedback control by the computing device; and on the second flow path portion side The pressure control valve portion is provided to suppress fluctuations in pressure generated when the controlled fluid is applied to the diaphragm portion, so that the flow rate adjusting valve portion including the diaphragm can be prevented from being subjected to pressure fluctuation of the controlled fluid to cause the flow rate adjusting valve The change in the opening of the valve seat in the part. Further, it is possible to suppress the generation of dust from the structure of the valve body as much as possible, and it is possible to obtain a fluid supply amount adjusting device suitable for flow rate regulation in a small flow rate region and suppressing generation of dust.
特別是,本發明的流體供給量調節裝置,因為是以調節微少流量域的被控制流體的供給流量為目的,所以藉由抑制被控制流體的流體壓力的變動影響流量調節閥部,就可以確保控制流體的供給量的正確性。In particular, the fluid supply amount adjusting device of the present invention is intended to adjust the supply flow rate of the controlled fluid in the small flow rate range, thereby ensuring that the flow rate adjusting valve portion is affected by the fluctuation of the fluid pressure of the controlled fluid. Control the correctness of the supply of fluid.
依據申請專利範圍第2項的發明的流體供給量調節裝置,因為是如申請專利範圍第1項的發明,其中,前述第2流路部側是前述流量調節閥部中的下流側,前述壓力控制閥部是可一定地保持該壓力控制閥部的上流側的被控制流體的流體壓力用的壓力控制閥,所以可以減少流量調節閥部受到在流體供給量調節裝置的流量調節閥部的下流側發生的被控制流體的流體壓力的變動的影響。The fluid supply amount adjusting device according to the invention of claim 2, wherein the second flow path portion side is a downstream side of the flow rate adjusting valve portion, the pressure The control valve portion is a pressure control valve for constantly maintaining the fluid pressure of the fluid to be controlled on the upstream side of the pressure control valve portion, so that the flow regulating valve portion can be reduced from flowing down the flow regulating valve portion of the fluid supply amount adjusting device. The influence of fluctuations in the fluid pressure of the controlled fluid occurring on the side.
依據申請專利範圍第3項的發明的流體供給量調節裝置,因為是如申請專利範圍第1項的發明,其中,前述第2流路部側是前述流量調節閥部中的下流側,前述壓力控制閥部是可一定地保持該壓力控制閥部的上流側的被控制流體的流體壓力用的壓力控制閥,前述壓力控制閥部是形成於前述流量調節閥部內,所以可以減少流量調節閥部受到來自流體供給量調節裝置內的流量調節閥部的下流側的被控制流體的流體壓力的變動的影響。進一步,可以抑制裝置本身的容積並可以減少設置場所。The fluid supply amount adjusting device according to the invention of claim 3, wherein the second flow path portion side is a downstream side of the flow rate adjusting valve portion, and the pressure is The control valve portion is a pressure control valve for holding the fluid pressure of the fluid to be controlled on the upstream side of the pressure control valve portion, and the pressure control valve portion is formed in the flow rate adjusting valve portion, so that the flow rate adjusting valve portion can be reduced. The fluctuation of the fluid pressure of the fluid to be controlled on the downstream side of the flow rate adjusting valve portion in the fluid supply amount adjusting device is affected. Further, the volume of the device itself can be suppressed and the installation place can be reduced.
依據申請專利範圍第4項的發明的流體供給量調節裝置,因為是如申請專利範圍第1項的發明,其中,前述第2流路部側是前述流量調節閥部中的上流側,前述壓力控制閥部是可一定地保持該壓力控制閥部的下流側的被控制流體的流體壓力用的壓力控制閥,所以可以減少流量調節閥部受到在流體供給量調節裝置的流量調節閥部的上流側發生的被控制流體的流體壓力的變動的影響。The fluid supply amount adjusting device according to the invention of claim 4, wherein the second flow path portion side is an upstream side of the flow rate adjusting valve portion, the pressure The control valve portion is a pressure control valve for constantly maintaining the fluid pressure of the fluid to be controlled on the downstream side of the pressure control valve portion, so that the flow regulating valve portion can be reduced from being subjected to the flow regulating valve portion of the fluid supply amount adjusting device. The influence of fluctuations in the fluid pressure of the controlled fluid occurring on the side.
依據申請專利範圍第5項的發明的流體供給量調節裝置,因為是如申請專利範圍第1項的發明,其中,前述進退手段是使用依據前述計算裝置的反饋控制藉由電動氣動轉換器作出的調壓氣體,所以朝電動氣動轉換器的電源供給若停止時可以將閥座的狀態維持在安全的位置。The fluid supply amount adjusting device according to the invention of claim 5, which is the invention of claim 1, wherein the advance and retreat means is performed by an electropneumatic converter using feedback control according to the foregoing calculating means The gas is regulated, so that the power supply to the electropneumatic converter can be maintained in a safe position when stopped.
依據申請專利範圍第6項的發明的流體供給量調節裝置,因為是如申請專利範圍第1項的發明,其中,前述進退手段是受到前述計算裝置的反饋控制之後依據馬達控制基板被控制的步進馬達,所以是絕對或相對位置的控制容易。且,即使無壓縮空氣設備的情況時也可進行開度的調節。The fluid supply amount adjusting device according to the invention of claim 6 is the invention according to claim 1, wherein the forward/backward means is a step controlled by the motor control substrate after being subjected to feedback control by the computing device Into the motor, so it is easy to control the absolute or relative position. Moreover, the adjustment of the opening degree can be performed even in the case of no compressed air device.
第1圖的概略圖是顯示將矽晶圓W1枚1枚地處理的單片方式的基板處理裝置。本發明的流體供給量調節裝置5A、5B、5C主要是被組入所揭示的基板處理裝置內。矽晶圓W是被載置在自旋挾盤1的旋轉盤。在矽晶圓W的正上具備將處理液放出的處理液噴嘴2。矽晶圓的洗淨等的處理液是通過流體配管3被供給至處理液噴嘴2。被控制流體可例示:氫氟酸、鹽酸、氨水等的藥液。在圖示中依據藥液的種類分別儲存於供給部9A、9B、9C,並依序流通於流體配管3a、3b、3c。各藥液,是被貯留在供給部14並與從流體配管15被供給的純水(包含溫純水)在流體混合部4依據預定比率被混合調製之後,被供給至流體配管3。The schematic view of Fig. 1 is a single-chip substrate processing apparatus that displays a single wafer W1. The fluid supply amount adjusting devices 5A, 5B, and 5C of the present invention are mainly incorporated in the disclosed substrate processing apparatus. The wafer W is a rotating disk placed on the spin disk 1. The processing liquid nozzle 2 that discharges the processing liquid is provided directly on the crucible wafer W. The processing liquid such as the cleaning of the silicon wafer is supplied to the processing liquid nozzle 2 through the fluid pipe 3 . The controlled fluid can be exemplified by a chemical solution such as hydrofluoric acid, hydrochloric acid or ammonia. In the drawing, the types of the chemical liquid are stored in the supply units 9A, 9B, and 9C, respectively, and sequentially flow through the fluid pipes 3a, 3b, and 3c. Each of the chemical liquids is stored in the supply unit 14 and mixed with pure water (including warm pure water) supplied from the fluid pipe 15 in the fluid mixing unit 4 in accordance with a predetermined ratio, and then supplied to the fluid pipe 3.
如圖示,對於成為被控制流體的各藥液皆具備流體供給量調節裝置,用來控制該藥液的流量的調節、供給停止或供給再開。在各流體配管3a、3b、3c中的流體供給量調節裝置因為是相同構成,所以只以流體供給量調節裝置5A為代表,依序說明裝置的構成。流體供給量調節裝置5A是與被控制流體(藥液)的供給部9A及流體混合部4之間的流體配管3a連接。進行該被控制流體的流量調節用的流量調節閥部10A是與流體供給量調節裝置5A連接。抑制在流體配管3a內的被控制流體發生的流體壓力的變動用的壓力控制閥部20A也與同流體配管3a連接。且,也具備供檢出流體配管3a內的被控制流體(藥液)的流量用的流量感測器6A(流量計)。As shown in the figure, each of the chemical liquids to be controlled fluids is provided with a fluid supply amount adjusting device for controlling the flow rate of the chemical liquid, stopping the supply, or supplying the liquid. Since the fluid supply amount adjusting devices in the respective fluid pipes 3a, 3b, and 3c have the same configuration, only the fluid supply amount adjusting device 5A is representative, and the configuration of the device will be described in order. The fluid supply amount adjusting device 5A is connected to the fluid pipe 3a between the supply portion 9A of the controlled fluid (chemical liquid) and the fluid mixing portion 4. The flow rate adjusting valve portion 10A for adjusting the flow rate of the controlled fluid is connected to the fluid supply amount adjusting device 5A. The pressure control valve portion 20A for suppressing the fluctuation of the fluid pressure generated by the controlled fluid in the fluid pipe 3a is also connected to the same fluid pipe 3a. Further, a flow rate sensor 6A (flow meter) for detecting the flow rate of the controlled fluid (medicine solution) in the fluid pipe 3a is also provided.
來自流量感測器6A的檢出訊號是通過訊號線s朝計算裝置7A(PLC:可設計程式的邏輯控制器)被發訊。在計算裝置7A,是進行對應前述的流量感測器6A的檢出結果的反饋控制的計算。依據反饋控制的控制計算的結果進行流量調節閥部10A的流量調節。在流量調節因為採用反饋控制,所以將流量切換時反應速度快速,進一步可以進行精度佳且穩定的流量調節。The detection signal from the flow sensor 6A is signaled to the computing device 7A (PLC: programmable logic controller) via the signal line s. The calculation device 7A is a calculation for performing feedback control corresponding to the detection result of the flow sensor 6A described above. The flow rate adjustment of the flow rate adjusting valve portion 10A is performed in accordance with the result of the control calculation of the feedback control. Since the flow rate adjustment uses feedback control, the reaction speed is fast when the flow rate is switched, and further accurate and stable flow rate adjustment can be performed.
在流量調節閥部10A等,其閥部的開度調節是採用藉由調壓氣體進行的機構(第2圖等參照)的情況時,具備將藉由計算裝置7A被控制的調壓氣體作出用的電動氣動轉換器8A(電動氣動調節器)。在流體供給量調節裝置5B以及5C中,流體配管3b、3c中的流量調節閥部10B、10C、壓力控制閥部20B、20C、流量感測器6B、6C的配置、這些與計算裝置7B、7C、電動氣動轉換器8B、8C的連接也是同樣。且,如第3圖的流量調節閥部10K具備將朝馬達各相的驅動電流作出用的馬達控制基板8R。第6圖也同樣。第1圖中,符號11是在純水(包含溫純水)的流體配管15中的流量感測器,12是流量控制閥部,13是壓力控制閥部。In the flow rate adjusting valve unit 10A or the like, when the opening degree of the valve portion is adjusted by a pressure regulating gas (see FIG. 2 and the like), the pressure regulating gas controlled by the calculating device 7A is provided. Electropneumatic converter 8A (electropneumatic regulator). In the fluid supply amount adjusting devices 5B and 5C, the flow regulating valve portions 10B and 10C, the pressure control valve portions 20B and 20C, the flow sensor sensors 6B and 6C in the fluid pipes 3b and 3c, and the calculation device 7B, The connection of 7C and electropneumatic converters 8B and 8C is also the same. Further, the flow rate adjusting valve portion 10K of Fig. 3 includes a motor control board 8R for making a drive current for each phase of the motor. The same is true in Figure 6. In Fig. 1, reference numeral 11 is a flow rate sensor in a fluid pipe 15 of pure water (including warm pure water), 12 is a flow rate control valve portion, and 13 is a pressure control valve portion.
特別是,流體供給量調節裝置5A,是被使用於150mL/min以下,進一步是5~20mL/min的微少流量域的被控制流體(藥液)的供給流量的精密的調節。且,從圖示的5B、5C開始,在以下的圖示的實施例所揭示的流體供給量調節裝置也同樣被使用於微少流量域的被控制流體(藥液)的供給流量的調節。In particular, the fluid supply amount adjusting device 5A is a fine adjustment of the supply flow rate of the controlled fluid (chemical liquid) used in a minute flow rate range of 150 mL/min or less and further 5 to 20 mL/min. Further, from the 5B and 5C shown in the drawings, the fluid supply amount adjusting device disclosed in the following embodiments is similarly used for adjusting the supply flow rate of the controlled fluid (chemical liquid) in the minute flow rate range.
對於將微少流量域的被控制流體的供給流量調節的流體供給量調節裝置5A(第1實施例),使用第2圖的剖面圖說明同裝置5A中的流量調節閥部10A及壓力控制閥部20A的構造。The fluid supply amount adjusting device 5A (first embodiment) for adjusting the supply flow rate of the controlled fluid in the small flow rate field, the flow rate adjusting valve portion 10A and the pressure control valve portion in the same device 5A will be described using the cross-sectional view of Fig. 2 The construction of 20A.
流量調節閥部10A,主要是由:閥室殼體部101、及外殼殼體部102、及將閥室殼體部101及外殼殼體部102連接的中間殼體部103的3部位所構成。The flow rate adjusting valve portion 10A mainly consists of three parts of the valve chamber housing portion 101, the outer casing portion 102, and the intermediate casing portion 103 that connects the valve chamber housing portion 101 and the outer casing portion 102. .
在閥室殼體部101中,具備讓被控制流體(藥液)通過的第1流路部111及第2流路部112。形成有同時與第1流路部111及第2流路部112連接並使被控制流體流通的閥室110。在第2圖的流體供給量調節裝置5A的流量調節閥部10A中,第1流路部111側是上流側(供給部側),第2流路部112側是下流側(流體混合部側)。圖中的符號113是第1流路連接部,114是第2流路連接部。The valve chamber casing portion 101 includes a first flow path portion 111 and a second flow path portion 112 through which a controlled fluid (medicine liquid) passes. A valve chamber 110 that is connected to the first flow path portion 111 and the second flow path portion 112 and that allows the controlled fluid to flow is formed. In the flow rate adjusting valve portion 10A of the fluid supply amount adjusting device 5A of Fig. 2, the first flow path portion 111 side is the upstream side (supply portion side), and the second flow path portion 112 side is the downstream side (fluid mixing portion side). ). Reference numeral 113 in the figure is a first flow path connecting portion, and 114 is a second flow path connecting portion.
在閥室殼體部101中,第1流路部111是對於閥室110將直徑形成1mm(Φ 1mm)以下的閥室開口部116。朝閥室開口部116的閥室110側的開口末端是成為呈平坦狀形成的閥座115。具備在閥座115的正上將該閥座115可進退自如地密封的密封部121。密封部121是形成平坦狀,密封部121是被配置於平坦閥體122。習知的滾針閥的情況,因為構件本身的公差、製造和組裝時的軸的偏離等的要因而使閥體與閥座側接觸,閥座、閥體等被切削而使閥座的開口量會變化,所以有容易隨此流量會變化的問題。此點,在平坦閥體122的密封部121及閥座115的關係中,軸偏離的影響被減輕,其結果可以抑制隨著平坦閥體122的進退動作而發生灰塵。In the valve chamber casing portion 101, the first flow path portion 111 is a valve chamber opening portion 116 having a diameter of 1 mm ( Φ 1 mm) or less with respect to the valve chamber 110. The opening end toward the valve chamber 110 side of the valve chamber opening portion 116 is a valve seat 115 which is formed in a flat shape. A sealing portion 121 that can seal the valve seat 115 forward and backward on the valve seat 115 is provided. The sealing portion 121 is formed in a flat shape, and the sealing portion 121 is disposed in the flat valve body 122. In the case of a conventional needle valve, the valve body and the valve seat side are brought into contact due to the tolerance of the member itself, the deviation of the shaft during manufacture and assembly, and the valve seat, the valve body, and the like are cut to open the valve seat. The amount will change, so there is a problem that it is easy to change with this flow. At this point, in the relationship between the sealing portion 121 of the flat valve body 122 and the valve seat 115, the influence of the shaft deviation is alleviated, and as a result, it is possible to suppress the occurrence of dust as the flat valve body 122 moves forward and backward.
隔膜部123是朝向閥室110側的方式形成於平坦閥體122的密封部121側相反側。實施例,是將平坦閥體122及隔膜部123一體形成的方式形成閥機構體120。與圖示相異,將平坦閥體及隔膜部由各別的零件構成也可以。在隔膜部123的周圍形成有隔膜緣部124。隔膜緣部124因為被閥室殼體部101及中間殼體部103挾持,所以閥機構體120被配置於閥室110的預定位置。在中間殼體部103也形成呼吸路105,被使用於隔膜部124的背面側的空氣的流出入。The diaphragm portion 123 is formed on the side opposite to the sealing portion 121 side of the flat valve body 122 so as to face the valve chamber 110 side. In the embodiment, the valve body 120 is formed such that the flat valve body 122 and the diaphragm portion 123 are integrally formed. Different from the illustration, the flat valve body and the diaphragm portion may be composed of separate components. A diaphragm edge portion 124 is formed around the diaphragm portion 123. Since the diaphragm edge portion 124 is held by the valve chamber housing portion 101 and the intermediate housing portion 103, the valve mechanism body 120 is disposed at a predetermined position of the valve chamber 110. The breathing path 105 is also formed in the intermediate casing portion 103, and the air used for the back side of the diaphragm portion 124 flows in.
閥機構體120,是透過其上部的閥體連接部125與活塞部131的活塞下部132連接。如從圖示被把握的方式,在中間殼體部103中形成有活塞部131可滑動的貫通部。在中間殼體部103的上部的外殼殼體部102內,收容有活塞部131及彈簧135。彈簧135是透過活塞部131的活塞頭部133將該活塞部131朝壓下方向推迫。The valve mechanism body 120 is connected to the piston lower portion 132 of the piston portion 131 through the valve body connecting portion 125 at the upper portion thereof. As shown in the figure, a through portion in which the piston portion 131 is slidable is formed in the intermediate casing portion 103. A piston portion 131 and a spring 135 are housed in the outer casing portion 102 of the upper portion of the intermediate casing portion 103. The spring 135 urges the piston portion 131 in the pressing direction through the piston head portion 133 of the piston portion 131.
且在外殼殼體部102形成有空氣通口104,使藉由電動氣動轉換器8A作出的調壓氣體朝外殼殼體部102內的空氣室134流出入。調壓氣體的流出入量,是計算裝置7A是依據對應流量感測器6A的檢出結果的反饋控制的計算結果來控制調節電動氣動轉換器8A。且,也會受到作業者所進行的被控制流體的供給停止或供給再開的控制。Further, an air port 104 is formed in the outer casing portion 102, so that the pressure regulating gas by the electropneumatic converter 8A flows into the air chamber 134 in the outer casing portion 102. The outflow amount of the pressure regulating gas is that the calculating means 7A controls the adjusting electropneumatic converter 8A based on the calculation result of the feedback control of the detection result of the corresponding flow sensor 6A. Further, it is also controlled by the operator to stop the supply of the controlled fluid or to supply the reopening.
如圖示,外殼殼體部102內的空間是藉由活塞頭部133被區劃成空氣室134及彈簧室136。因此,空氣室134的內部壓力若上昇的話,可以抵抗彈簧135的推迫力將活塞部131及與此連接的閥機構體120擧升,將平坦閥體122的密封部121及閥座115的距離擴大來加大閥座115的開度。As illustrated, the space within the outer casing portion 102 is zoned by the piston head 133 into an air chamber 134 and a spring chamber 136. Therefore, if the internal pressure of the air chamber 134 rises, the piston portion 131 and the valve mechanism body 120 connected thereto can be lifted against the biasing force of the spring 135, and the distance between the sealing portion 121 of the flat valve body 122 and the valve seat 115 can be increased. Expand to increase the opening of the valve seat 115.
相反地,空氣室134的內部壓力若下降的情況時,彈簧135的推迫力較強而使活塞部131及與其連接的閥機構體120降下。即,平坦閥體122的密封部121及閥座115的距離會變窄,進一步,平坦閥體122會與閥座115接觸。Conversely, when the internal pressure of the air chamber 134 is lowered, the biasing force of the spring 135 is strong, and the piston portion 131 and the valve mechanism body 120 connected thereto are lowered. That is, the distance between the sealing portion 121 of the flat valve body 122 and the valve seat 115 is narrowed, and further, the flat valve body 122 is in contact with the valve seat 115.
從圖示及其說明明顯可知,在流量調節閥部10A中,藉由受到由計算裝置7A進行的反饋控制使閥機構體120進退使平坦閥部122及閥座115的距離的調節,是由:藉由電動氣動轉換器8A作出的調壓氣體、活塞部131、及彈簧135擔任。在此,在實施例的流量調節閥部10A中,調壓氣體、活塞部131、及彈簧135是成為進退手段130。使用調壓氣體的進退驅動的情況時,例如,即使朝電動氣動轉換器8A的電源供給停止而沒有調壓氣體的供給的情況,也可以將閥座115的狀態維持在安全的位置。As is apparent from the drawings and the description, in the flow rate adjusting valve portion 10A, the valve mechanism body 120 is advanced and retracted by the feedback control by the calculating device 7A, so that the distance between the flat valve portion 122 and the valve seat 115 is adjusted. The pressure regulating gas, the piston portion 131, and the spring 135 which are made by the electro-pneumatic converter 8A are used. Here, in the flow rate adjusting valve portion 10A of the embodiment, the pressure regulating gas, the piston portion 131, and the spring 135 are the advancing and retracting means 130. When the forward/backward driving of the pressure-regulating gas is used, for example, even if the supply of the power to the electro-pneumatic converter 8A is stopped and there is no supply of the pressure-regulating gas, the state of the valve seat 115 can be maintained at a safe position.
在活塞部131中,套設有由尿烷橡膠、NBR、HNBR、矽橡膠、氟樹脂橡膠等的耐久性素材形成的O形環137。因此,空氣室134的氣密性被確保,活塞部131的進退動作穩定化。彈簧室136的空氣是通過外殼呼吸路106流出入。The piston portion 131 is provided with an O-ring 137 formed of a durable material such as urethane rubber, NBR, HNBR, enamel rubber, or fluororesin rubber. Therefore, the airtightness of the air chamber 134 is ensured, and the forward and backward movement of the piston portion 131 is stabilized. The air in the spring chamber 136 flows in through the outer casing breathing path 106.
如第1、2圖,流量調節閥部10A的第2流路部112側是下流側。在此,從成為流量調節閥部10A的下流側的第2流路部112側發生的被控制流體的壓力變動的影響,會朝流量調節閥部10A的閥室110及面對隔膜部123傳遞。即,閥機構體120的隔膜部123會受到來自第2流路部112側的被控制流體的壓力變動。隔膜部123因為是由與密封部121相比較寬的面積受到壓力變動,所以平坦閥體122的密封部121及閥座115的距離會變化,閥座115的開度有可能變化。As shown in the first and second figures, the second flow path portion 112 side of the flow rate adjusting valve portion 10A is the downstream side. Here, the influence of the pressure fluctuation of the fluid to be controlled which is generated on the downstream side of the second flow path portion 112 of the flow rate adjusting valve portion 10A is transmitted to the valve chamber 110 of the flow rate adjusting valve portion 10A and the diaphragm portion 123. . In other words, the diaphragm portion 123 of the valve mechanism body 120 receives the pressure fluctuation of the controlled fluid from the second flow path portion 112 side. Since the diaphragm portion 123 is subjected to pressure fluctuation by a relatively wide area from the sealing portion 121, the distance between the sealing portion 121 of the flat valve body 122 and the valve seat 115 changes, and the opening degree of the valve seat 115 may change.
為了對應此點,在流體供給量調節裝置5A中,為了抑制在流量調節閥部10A的第2流路部112側施加於前述的隔膜部123的被控制流體的發生的壓力變動,而設置壓力控制閥部20A。第2圖所揭示的壓力控制閥部20A,是如負壓閥等的壓力控制閥,具有可將該壓力控制閥部20A的上流側的被控制流體的流體壓力一定地保持的功能。In order to cope with this, the fluid supply amount adjusting device 5A is provided with a pressure to suppress the pressure fluctuation of the controlled fluid applied to the diaphragm portion 123 on the second flow path portion 112 side of the flow rate adjusting valve portion 10A. The valve portion 20A is controlled. The pressure control valve unit 20A disclosed in FIG. 2 is a pressure control valve such as a negative pressure valve, and has a function of holding the fluid pressure of the fluid to be controlled on the upstream side of the pressure control valve unit 20A in a constant manner.
在壓力控制閥部20A中,在閥室殼體部201中,具備讓被控制流體(藥液)通過的第1流路部211及第2流路部212。同時形成有將第1流路部211及第2流路部212連接並使被控制流體流通的閥室210。圖中的符號213是第1流路連接部,214是第2流路連接部。在流量調節閥部10A的第2流路連接部114連接有第1流路連接部213。又,雙方的連接形態,連接方法等可適宜地變更。且,將流量調節閥部10A的閥室殼體部101及壓力控制閥部20A的閥室殼體部201由一體化的封裝品構成也可以。In the pressure control valve unit 20A, the valve chamber housing portion 201 includes a first flow path portion 211 and a second flow path portion 212 through which a controlled fluid (medicine solution) passes. At the same time, a valve chamber 210 that connects the first flow path portion 211 and the second flow path portion 212 and allows the controlled fluid to flow is formed. Reference numeral 213 in the figure is a first flow path connecting portion, and 214 is a second flow path connecting portion. The first flow path connecting portion 213 is connected to the second flow path connecting portion 114 of the flow rate adjusting valve portion 10A. Further, the connection form, the connection method, and the like of both of them can be appropriately changed. Further, the valve chamber casing portion 101 of the flow rate adjusting valve portion 10A and the valve chamber casing portion 201 of the pressure control valve portion 20A may be formed of an integrated package.
第2流路部212及閥室210的連接部位是閥座215。在閥座215的正上配置有閥體222。在閥體222中具備將閥座215可進退自如地密封的密封部221。The connection portion between the second flow path portion 212 and the valve chamber 210 is a valve seat 215. A valve body 222 is disposed directly above the valve seat 215. The valve body 222 is provided with a sealing portion 221 that seals the valve seat 215 in a releasable manner.
在閥體222的密封部221側相反側,隔膜部223是朝向閥室210側形成。實施例的壓力控制閥部20A,是將閥體222及隔膜部223一體形成而形成閥機構體220。與圖示相異,將平坦閥體及隔膜部由各別的零件構成也可以。在隔膜部223的周圍形成有隔膜緣部224。隔膜緣部224因為是被閥室殼體部101及外殼殼體部202挾持,所以閥機構體220會被配置於閥室210的預定位置。On the side opposite to the sealing portion 221 side of the valve body 222, the diaphragm portion 223 is formed toward the valve chamber 210 side. In the pressure control valve portion 20A of the embodiment, the valve body 222 and the diaphragm portion 223 are integrally formed to form the valve mechanism body 220. Different from the illustration, the flat valve body and the diaphragm portion may be composed of separate components. A diaphragm edge portion 224 is formed around the diaphragm portion 223. Since the diaphragm edge portion 224 is held by the valve chamber housing portion 101 and the outer casing portion 202, the valve mechanism body 220 is disposed at a predetermined position of the valve chamber 210.
在外殼殼體部202內,形成有收容室228,且具備彈簧225及承受同彈簧225的推迫力的推迫塊體226。推迫塊體226是與閥機構體220連接。通常,閥機構體220的密封部221,是受到彈簧225的推迫力而與閥座215接觸。藉由從壓力控制閥部20A的上流側的流量調節閥部10A使預定流量的被控制流體被供給,使由被控制流體的流體壓力所產生的負荷抵抗彈簧225的推迫力時,密封部221及閥座215的接觸狀態就會被解除。因此,成為可送通預定的流體壓力的被控制流體。在外殼殼體部202中也形成呼吸路227,被使用於隔膜部223(推迫塊體226)的背面側的空氣的流出入。A housing chamber 228 is formed in the outer casing portion 202, and includes a spring 225 and a pressing block 226 that receives the pressing force of the spring 225. The pushing block 226 is coupled to the valve mechanism body 220. Normally, the sealing portion 221 of the valve mechanism body 220 is in contact with the valve seat 215 by the biasing force of the spring 225. When the controlled flow rate of the predetermined flow rate is supplied from the flow rate adjusting valve portion 10A on the upstream side of the pressure control valve portion 20A, and the load generated by the fluid pressure of the controlled fluid resists the pressing force of the spring 225, the sealing portion 221 The contact state with the valve seat 215 is released. Therefore, it becomes a controlled fluid that can deliver a predetermined fluid pressure. The breathing path 227 is also formed in the outer casing portion 202, and is used for the outflow of air on the back side of the diaphragm portion 223 (the pushing block 226).
在此,在壓力控制閥部20A的下流側中,被控制流體的流體壓力若急速上昇或降下的情況,其流體壓力的變動,會朝壓力控制閥部20A的閥室210及面對隔膜部223傳遞。受到彈簧225的推迫力關機構體220,可以透過隔膜部223,使閥體222的密封部121及閥座215的距離變化。在此,壓力控制閥部20A的下流側的壓力變動,藉由閥機構體220控制與閥座215的開度變化而被調整。即,流量調節閥部10A就成為不會受到壓力控制閥部20A的下流側的壓力變動的影響。Here, in the downstream side of the pressure control valve portion 20A, if the fluid pressure of the controlled fluid rapidly rises or falls, the fluctuation of the fluid pressure is directed to the valve chamber 210 of the pressure control valve portion 20A and the diaphragm portion. 223 passed. The mechanism body 220 is biased by the biasing force of the spring 225, and the diaphragm portion 223 can be transmitted to change the distance between the sealing portion 121 of the valve body 222 and the valve seat 215. Here, the pressure fluctuation on the downstream side of the pressure control valve portion 20A is adjusted by the valve mechanism body 220 controlling the change in the opening degree of the valve seat 215. In other words, the flow rate adjusting valve portion 10A is not affected by the pressure fluctuation on the downstream side of the pressure control valve portion 20A.
第3圖的剖面圖,是顯示可以替代第1圖的各流體供給量調節裝置5A、5B、5C內的流量調節閥部10A、10B、10C的流量調節閥部10K(第2實施例)。在第3圖的流量調節閥部10K中,第1流路部、第2流路部、閥室、閥座、及閥機構體等的構成,進一步作用,本質上是與前述的流量調節閥部10A同樣。因此,對於共通的部位附加與第2圖的流量調節閥部10A相同的符號。The cross-sectional view of Fig. 3 shows a flow rate adjusting valve portion 10K (second embodiment) which can replace the flow rate adjusting valve portions 10A, 10B, and 10C in each of the fluid supply amount adjusting devices 5A, 5B, and 5C of Fig. 1 . In the flow rate adjusting valve portion 10K of Fig. 3, the first flow path portion, the second flow path portion, the valve chamber, the valve seat, and the valve mechanism body further function, and essentially the flow regulating valve described above The same is true for the part 10A. Therefore, the same reference numerals as those of the flow rate adjusting valve portion 10A of Fig. 2 are added to the common portion.
在流量調節閥部10K,藉由將閥機構體120進退來調節平坦閥部122的密封部121及閥座115的距離用的進退手段130K,是被組裝於受到計算裝置7R的反饋控制並依據馬達控制基板8R被控制的步進馬達140。圖示的步進馬達140是被收容於中間殼體部103的上方。使成為這些的蓋的方式外殼殼體部102被覆蓋,步進馬達140是藉由螺栓146被固定於中間殼體部103。In the flow rate adjusting valve portion 10K, the advancing and retracting means 130K for adjusting the distance between the sealing portion 121 of the flat valve portion 122 and the valve seat 115 by advancing and retracting the valve mechanism body 120 is incorporated in the feedback control by the computing device 7R. The motor control board 8R is controlled by a stepping motor 140. The illustrated stepping motor 140 is housed above the intermediate casing portion 103. The outer casing portion 102 is covered so that the cover is formed, and the stepping motor 140 is fixed to the intermediate casing portion 103 by bolts 146.
在步進馬達140中,具備:成為固定側的定子144(電磁鐵)及成為旋轉側的轉子141(永久磁鐵),依據旋轉角度的正確地控制來進行轉子141的旋轉。在轉子141的進一步內部具備中空圓筒狀的馬達軸142(旋轉軸)。昇降軸151是被插通馬達軸142內。在昇降軸151的表面形成有昇降軸溝152,昇降軸溝152是與形成於馬達軸142內的內軸螺紋山143螺合。在昇降軸151的下端具備推壓部153。The stepping motor 140 includes a stator 144 (electromagnet) serving as a fixed side and a rotor 141 (permanent magnet) serving as a rotating side, and the rotor 141 is rotated in accordance with the correct control of the rotation angle. Further, a motor shaft 142 (rotation shaft) having a hollow cylindrical shape is provided inside the rotor 141. The lifting shaft 151 is inserted into the motor shaft 142. A lifting shaft groove 152 is formed on the surface of the lifting shaft 151, and the lifting shaft groove 152 is screwed to the inner shaft threaded mountain 143 formed in the motor shaft 142. A pressing portion 153 is provided at a lower end of the lifting shaft 151.
由計算裝置7R所產生的反饋控制的訊號是朝馬達控制基板8R被發訊,在同馬達控制基板8R使脈衝被輸出。在此,步進馬達140內的轉子141是隨著預定角度的旋轉使馬達軸142也旋轉預定角度。馬達軸142的旋轉量,是被變換成與同馬達軸142螺合的昇降軸151的上下方向的移動量。此結果,推壓部153的上下方向的移動量會變化。符號147是配線。The feedback control signal generated by the computing device 7R is signaled toward the motor control board 8R, and the pulse is outputted on the same motor control board 8R. Here, the rotor 141 in the stepping motor 140 rotates the motor shaft 142 by a predetermined angle as the predetermined angle is rotated. The amount of rotation of the motor shaft 142 is converted into an amount of movement in the vertical direction of the lift shaft 151 that is screwed to the motor shaft 142. As a result, the amount of movement of the pressing portion 153 in the vertical direction changes. Symbol 147 is wiring.
推壓部153若降下的情況時,被放置於活塞部131的上部的彈簧135因為是藉由推壓部153朝下方壓下所以活塞部131會降下。在此,與活塞部131連接的閥機構體120的平坦閥體122的密封部121是接近閥座115,進一步成為相互接觸。相反地,推壓部153若上昇的情況時,對於彈簧135的推壓部153的朝下方壓下力被減輕。在此,與活塞部131連接的閥機構體120的平坦閥體122的密封部121會從閥座115脫離。When the pressing portion 153 is lowered, the spring portion 135 placed on the upper portion of the piston portion 131 is lowered downward by the pressing portion 153, so that the piston portion 131 is lowered. Here, the sealing portion 121 of the flat valve body 122 of the valve mechanism body 120 connected to the piston portion 131 is close to the valve seat 115 and further comes into contact with each other. Conversely, when the pressing portion 153 is raised, the downward pressing force of the pressing portion 153 of the spring 135 is reduced. Here, the sealing portion 121 of the flat valve body 122 of the valve mechanism body 120 connected to the piston portion 131 is detached from the valve seat 115.
在步進馬達140中,藉由電動氣動訊號與轉子141連動的馬達軸142被旋轉。其結果,成為也可透過與馬達軸142螺合的昇降軸151、推壓部153使彈簧135的彈簧負荷細微地變化。圖中,符號145是原點感測器。藉由使用步進馬達,使成為容易進行絕對或相對的位置控制,也成為可進行彈簧負荷的細微調節。且,即使無壓縮空氣設備的情況時也可進行開度的調節。In the stepping motor 140, the motor shaft 142 that is interlocked with the rotor 141 by the electro-pneumatic signal is rotated. As a result, the spring load of the spring 135 can be slightly changed by the lifting shaft 151 and the pressing portion 153 which are screwed to the motor shaft 142. In the figure, symbol 145 is an origin sensor. By using a stepping motor, it is easy to perform absolute or relative position control, and it is also possible to finely adjust the spring load. Moreover, the adjustment of the opening degree can be performed even in the case of no compressed air device.
第4圖的流體供給量調節裝置5D(第3實施例),是在與流量調節閥部10A的第2流路部112的下流側連接的壓力控制閥部20D適用如負壓控制閥等的壓力控制閥的裝置。該流體供給量調節裝置5D中的流量調節閥部,是既述的10A或10K的其中任一也可以。在圖示中為10A。流量調節閥部10A的構造、作用等,因為是如第2圖說明,所以省略詳細說明。In the fluid supply amount adjusting device 5D (third embodiment) of the fourth embodiment, the pressure control valve unit 20D connected to the downstream side of the second flow path portion 112 of the flow rate adjusting valve portion 10A is applied to, for example, a negative pressure control valve. Pressure control valve device. The flow rate adjusting valve portion in the fluid supply amount adjusting device 5D may be any of 10A or 10K described above. It is 10A in the illustration. Since the configuration, operation, and the like of the flow rate adjusting valve portion 10A are as described in FIG. 2, detailed description thereof will be omitted.
對於壓力控制閥部20D的構造,請參照日本專利第3467438號、US6386509B等。壓力控制閥部20D,主要是由上部殼體部301a、中間殼體部301b、下部殼體部301c所組合,在中間殼體部301b內形成有流路部302。For the structure of the pressure control valve portion 20D, please refer to Japanese Patent No. 3467438, US Pat. The pressure control valve portion 20D is mainly composed of an upper casing portion 301a, an intermediate casing portion 301b, and a lower casing portion 301c, and a flow path portion 302 is formed in the intermediate casing portion 301b.
被控制流體是從第1流路連接部303朝壓力控制閥部20D內的第1閥室306流入。在面向第1閥室306的位置配置有第1隔膜部321。設在第1隔膜部321的周圍的隔膜緣部323是藉由上部殼體部301a及中間殼體部301b被挾持,使第1隔膜部321被固定。在第1隔膜部321的背後側形成有第1加壓室308。在此,第1隔膜部321是受到從給氣通口312流入第1加壓室308內並被保持在同第1加壓室的調壓氣體的加壓力。符號314是調壓氣體用的排氣通口。The controlled fluid flows from the first flow path connecting portion 303 toward the first valve chamber 306 in the pressure control valve portion 20D. The first diaphragm portion 321 is disposed at a position facing the first valve chamber 306. The diaphragm edge portion 323 provided around the first diaphragm portion 321 is held by the upper casing portion 301a and the intermediate casing portion 301b, and the first diaphragm portion 321 is fixed. A first pressurizing chamber 308 is formed on the back side of the first diaphragm portion 321 . Here, the first diaphragm portion 321 is a pressing force that receives the pressure-regulating gas that flows into the first pressurizing chamber 308 from the air supply port 312 and is held in the same first pressurizing chamber. Symbol 314 is an exhaust port for a pressure regulating gas.
在中間殼體部301b的中央部分形成有上下的貫通路,在其途中具備閥座305。被控制流體是從第1閥室306經由閥座305到達第2閥室307。且,從第2流路連接部304流出。從第4圖的流量調節閥部10A及壓力控制閥部20D的配置可知,第1流路連接部303是上流側,第2流路連接部304是下流側。A vertical through-passage is formed in a central portion of the intermediate casing portion 301b, and a valve seat 305 is provided in the middle thereof. The controlled fluid reaches the second valve chamber 307 from the first valve chamber 306 via the valve seat 305. Then, it flows out from the second flow path connecting portion 304. As is clear from the arrangement of the flow rate adjusting valve portion 10A and the pressure control valve portion 20D in Fig. 4, the first flow path connecting portion 303 is the upstream side, and the second flow path connecting portion 304 is the downstream side.
在面向第2閥室307的位置配置有第2隔膜部322。設在第2隔膜部322的周圍的隔膜緣部324是藉由中間殼體部301b及下部殼體部301c被挾持,使第2隔膜部322也被固定。在第2隔膜部322的背後側形成有第2加壓室309。在此,第2隔膜部322是受到第2彈簧311的推迫。符號313是第2加壓室309內的空氣用的呼吸路,325是保持構件。The second diaphragm portion 322 is disposed at a position facing the second valve chamber 307. The diaphragm edge portion 324 provided around the second diaphragm portion 322 is held by the intermediate housing portion 301b and the lower housing portion 301c, and the second diaphragm portion 322 is also fixed. A second pressurizing chamber 309 is formed on the back side of the second diaphragm portion 322. Here, the second diaphragm portion 322 is urged by the second spring 311. Reference numeral 313 is a breathing path for air in the second pressurizing chamber 309, and 325 is a holding member.
第1隔膜部321及第2隔膜部322是藉由閥部320被連結且形成閥機構體C1。閥機構體C1的閥部320及閥座305的距離(接近、隔離、接觸),是藉由從給氣通口312朝第1加壓室308內流入的調壓氣體的加壓力被調整。在此實施例中,可對應流量感測器的檢出流量、設定變更後的流量,進行閥部320及閥座305的最適合的開度調節。在壓力控制閥部20D中,第1隔膜部321雖是受到調壓氣體的加壓力,第2隔膜部322雖是受到第2彈簧311的推迫的構成,但不限定這些,任一的隔膜部,皆可以適宜地選擇由彈簧所產生的推迫或由彈簧及調壓氣體的雙方所產生的推迫和加壓。The first diaphragm portion 321 and the second diaphragm portion 322 are connected by the valve portion 320 to form the valve mechanism body C1. The distance (proximity, isolation, and contact) between the valve portion 320 of the valve mechanism body C1 and the valve seat 305 is adjusted by the pressing force of the pressure-regulating gas flowing into the first pressurizing chamber 308 from the air supply port 312. In this embodiment, the optimum opening degree adjustment of the valve portion 320 and the valve seat 305 can be performed in accordance with the detected flow rate of the flow rate sensor and the flow rate after the setting change. In the pressure control valve portion 20D, the first diaphragm portion 321 is pressurized by the pressure-regulating gas, and the second diaphragm portion 322 is biased by the second spring 311. However, the diaphragm is not limited thereto. For the part, the pushing by the spring or the pushing and pressing by the spring and the regulating gas can be appropriately selected.
對於成為壓力控制閥部20D的下流側的被控制流體的壓力變動,首先第2隔膜部322會受到作用。因為具備第1隔膜部321及第2隔膜部322,且彼此連結,所以第1隔膜部321也隨著第2隔膜部322側的變化與閥部320一起移動。其結果,兩隔膜部是各別受到被控制流體的流體壓力而使閥部320移動至雙方均衡的位置,壓力控制閥部20D的閥座305的開度就會變化。如此的話,在壓力控制閥部20D被控制流體的壓力變動的影響是被吸收,被配置於其結果,使壓力控制閥部的上流的流量調節閥部10A所覆蓋的被控制流體的壓力變動被抑制。The pressure change of the fluid to be controlled which is the downstream side of the pressure control valve portion 20D first acts on the second diaphragm portion 322. Since the first diaphragm portion 321 and the second diaphragm portion 322 are provided and connected to each other, the first diaphragm portion 321 also moves along with the valve portion 320 as the second diaphragm portion 322 side changes. As a result, the two diaphragm portions are respectively subjected to the fluid pressure of the fluid to be controlled, and the valve portion 320 is moved to a position where both of them are equalized, and the opening degree of the valve seat 305 of the pressure control valve portion 20D changes. In this case, the influence of the pressure fluctuation of the control fluid in the pressure control valve unit 20D is absorbed, and as a result, the pressure fluctuation of the controlled fluid covered by the flow rate adjustment valve unit 10A that is upflowed by the pressure control valve unit is inhibition.
第5圖的流體供給量調節裝置5E(第4實施例),是將安全閥等的壓力控制閥部本身組裝至如第2圖等所揭示的流量調節閥部的內部而形成的裝置。即,可以稱為將流量調節閥部及壓力控制閥部組合的複合調節閥部(5E)。在第5圖的流體供給量調節裝置5E中,在上部側形成有擔任被控制流體的流量調節用的流量調節閥部10E。且,在下部側也形成可將被控制流體的壓力變動一定地保持的壓力控制閥部20E。流體供給量調節裝置5E的流量調節閥部10E及壓力控制閥部20E,是可以直接與如第2圖所揭示的流體供給量調節裝置5A中的流量調節閥部10A及壓力控制閥部20A交換。流量調節閥部10E,因為本質上是採用與前述的流量調節閥部10A同樣的構成,所以對於共通的構造部位使用同一符號。In the fluid supply amount adjusting device 5E (fourth embodiment) of Fig. 5, the pressure control valve unit itself such as a safety valve is assembled to the inside of the flow rate adjusting valve portion as disclosed in Fig. 2 and the like. That is, it may be referred to as a composite regulating valve portion (5E) that combines the flow rate adjusting valve portion and the pressure control valve portion. In the fluid supply amount adjusting device 5E of Fig. 5, a flow rate adjusting valve portion 10E for adjusting the flow rate of the controlled fluid is formed on the upper side. Further, a pressure control valve portion 20E that can hold the pressure fluctuation of the controlled fluid at a constant level is also formed on the lower side. The flow rate adjusting valve portion 10E and the pressure control valve portion 20E of the fluid supply amount adjusting device 5E can be directly exchanged with the flow rate adjusting valve portion 10A and the pressure control valve portion 20A in the fluid supply amount adjusting device 5A disclosed in Fig. 2 . Since the flow rate adjusting valve portion 10E basically has the same configuration as the above-described flow rate adjusting valve portion 10A, the same reference numerals are used for the common structural portions.
流體供給量調節裝置(複合調節閥部)5E,具備:將被控制流體用的流路形成於內部的閥室殼體部101、及將前述的進退手段130(活塞部131)等可進退自如地收容的外殼殼體部102、及將閥室殼體部101及外殼殼體部102連接的中間殼體部103,進一步,在閥室殼體部101的正下具備底部外殼殼體部107。The fluid supply amount adjusting device (combination regulating valve portion) 5E includes a valve chamber casing portion 101 in which a flow path for the fluid to be controlled is formed, and the advancing and retracting means 130 (piston portion 131) can be moved forward and backward. The outer casing portion 102 that is housed and the intermediate casing portion 103 that connects the valve chamber casing portion 101 and the outer casing portion 102 are further provided with a bottom outer casing portion 107 directly below the valve chamber casing portion 101. .
在流體供給量調節裝置5E的整體中,第1流路連接部113是成為上流側,讓被控制流體流入,第2流路連接部114是成為下流側,讓被控制流體流出。在閥室殼體部101中,形成有:被控制流體通過的第1流路部111及第2流路部172(控制側流路部)、及使被控制流體從第1流路部111流入的第1閥室110、及使被控制流體朝第2流路部172流出的第2閥室170。In the entire fluid supply amount adjusting device 5E, the first flow path connecting portion 113 is on the upstream side, and the controlled fluid flows in, and the second flow path connecting portion 114 is on the downstream side to allow the controlled fluid to flow out. In the valve chamber casing portion 101, a first flow path portion 111 and a second flow path portion 172 (control side flow path portion) through which the controlled fluid passes, and the controlled fluid from the first flow path portion 111 are formed. The first valve chamber 110 that has flowed in, and the second valve chamber 170 that allows the controlled fluid to flow out toward the second flow path portion 172.
在閥室殼體部101中,第1流路部111是對於第1閥室110將直徑形成1mm(Φ 1mm)以下的閥室開口部116。朝閥室開口部116的閥室110側的開口末端是成為呈平坦狀形成的閥座115。進一步在閥室殼體部101中,也形成於:使第2流路部172朝第2閥室170開口的第2閥座175、及將第1閥室110及第2閥室170連接的內部流路部171。在流量調節閥部10E的構成中,內部流路部171是相當於第2圖參照的第2流路部112。且,在壓力控制閥部20E的構成中,內部流路部171是相當於第2圖的第1流路部211。In the valve chamber casing portion 101, the first flow path portion 111 is a valve chamber opening portion 116 having a diameter of 1 mm ( Φ 1 mm) or less with respect to the first valve chamber 110. The opening end toward the valve chamber 110 side of the valve chamber opening portion 116 is a valve seat 115 which is formed in a flat shape. Further, the valve chamber casing portion 101 is also formed in a second valve seat 175 that opens the second flow path portion 172 toward the second valve chamber 170, and connects the first valve chamber 110 and the second valve chamber 170. Internal flow path portion 171. In the configuration of the flow rate adjusting valve portion 10E, the internal flow path portion 171 is the second flow path portion 112 corresponding to the second drawing. Further, in the configuration of the pressure control valve unit 20E, the internal flow path portion 171 corresponds to the first flow path portion 211 of Fig. 2 .
在第1閥座115的正上配置有第1平坦閥體122。在第1平坦閥體122中具備將第1閥座115可進退自如地密封的第1密封部121,該第1密封部121也形成平坦狀。第1隔膜部123是朝向第1閥室110側的方式被設在第1平坦閥體122的第1密封部121側相反側。實施例,是將第1平坦閥體122及第1隔膜部123一體形成而形成第1閥機構體120。在第1隔膜部123的周圍形成第1隔膜緣部124。第1隔膜緣部124因為是被閥室殼體部101及中間殼體部103挾持,所以第1閥機構體120是被配置於閥室110的預定位置。在中間殼體部103中也形成呼吸路105,被使用於第1隔膜部124的背面側的空氣的流出入。The first flat valve body 122 is disposed directly above the first valve seat 115. The first flat valve body 122 is provided with a first sealing portion 121 that can seal the first valve seat 115 in a releasable manner, and the first sealing portion 121 is also formed in a flat shape. The first diaphragm portion 123 is provided on the side opposite to the first seal portion 121 side of the first flat valve body 122 so as to face the first valve chamber 110 side. In the embodiment, the first flat valve body 122 and the first diaphragm portion 123 are integrally formed to form the first valve mechanism body 120. The first diaphragm edge portion 124 is formed around the first diaphragm portion 123. Since the first diaphragm edge portion 124 is held by the valve chamber housing portion 101 and the intermediate housing portion 103, the first valve mechanism body 120 is disposed at a predetermined position of the valve chamber 110. The breathing path 105 is also formed in the intermediate casing portion 103, and the air used for the back side of the first diaphragm portion 124 flows in.
第1閥機構體120,是與活塞部131的活塞下部132連接。在中間殼體部103中形成有活塞部131可滑動的貫通部。在中間殼體部103的上部的外殼殼體部102內,收容有活塞部131及該活塞部131及第1彈簧135。第1彈簧135是透過活塞部131的活塞頭部133將該活塞部131朝壓下方向推迫。The first valve mechanism body 120 is connected to the piston lower portion 132 of the piston portion 131. A through portion in which the piston portion 131 is slidable is formed in the intermediate casing portion 103. The piston portion 131, the piston portion 131, and the first spring 135 are housed in the outer casing portion 102 of the upper portion of the intermediate casing portion 103. The first spring 135 urges the piston portion 131 in the pressing direction through the piston head portion 133 of the piston portion 131.
在外殼殼體部102中形成有空氣通口104,使藉由電動氣動轉換器8A作出的調壓氣體朝外殼殼體部102內的空氣室134流入。調壓氣體的流入量,是由計算裝置7A依據對應流量感測器6A的檢出結果的反饋控制的計算結果來控制調節電動氣動轉換器8A。且,也會受到作業者所進行的被控制流體的供給停止或供給再開的控制。在流體供給量調節裝置5E的流量調節閥部10E中,也受到藉由計算裝置7A所進行的反饋控制藉由將第1閥機構體120進退來進行的第1平坦閥部122及第1閥座115的距離的調節,是藉著由電動氣動轉換器8A作出的調壓氣體、活塞部131、及第1彈簧135擔任。在此,實施例的流量調節閥部10E,也是由調壓氣體、活塞部131、及第1彈簧135構成進退手段130。An air port 104 is formed in the outer casing portion 102, so that the pressure-regulating gas by the electropneumatic converter 8A flows into the air chamber 134 in the outer casing portion 102. The inflow amount of the pressure-regulating gas is controlled by the computing device 7A in accordance with the calculation result of the feedback control of the detection result of the corresponding flow sensor 6A to adjust the electro-pneumatic converter 8A. Further, it is also controlled by the operator to stop the supply of the controlled fluid or to supply the reopening. In the flow rate adjusting valve unit 10E of the fluid supply amount adjusting device 5E, the first flat valve portion 122 and the first valve are also subjected to the feedback control by the calculating device 7A by advancing and retracting the first valve mechanism body 120. The distance of the seat 115 is adjusted by the pressure regulating gas, the piston portion 131, and the first spring 135 which are made by the electropneumatic converter 8A. Here, in the flow rate adjusting valve portion 10E of the embodiment, the pressure regulating gas, the piston portion 131, and the first spring 135 constitute the advancing and retracting means 130.
在壓力控制閥部20E中,也在第2閥座175的正下配置有第2平坦閥體182。在第2平坦閥體182中具備將第2閥座175可進退自如地密封的第2密封部181,該第2密封部181也形成平坦狀。在第2平坦閥體182的第2密封部181側相反側第2隔膜部183是朝向第2閥室170側形成。在實施例中,第2平坦閥體182及第2隔膜部183也一體形成而形成第2閥機構體180。在第2隔膜部183的周圍形成有第2隔膜緣部184。第2隔膜緣部184因為被閥室殼體部101及底部外殼殼體部107挾持,所以第2閥機構體180也被配置於第2閥室170的預定位置。在實施例將中,第2平坦閥體182雖圖示為平坦狀,但不限定於此形態。In the pressure control valve portion 20E, the second flat valve body 182 is also disposed directly below the second valve seat 175. The second flat valve body 182 includes a second seal portion 181 that can seal the second valve seat 175 in a releasable manner, and the second seal portion 181 is also formed in a flat shape. The second diaphragm portion 183 is formed toward the second valve chamber 170 side on the side opposite to the second seal portion 181 side of the second flat valve body 182. In the embodiment, the second flat valve body 182 and the second diaphragm portion 183 are also integrally formed to form the second valve mechanism body 180. A second diaphragm edge portion 184 is formed around the second diaphragm portion 183. Since the second diaphragm edge portion 184 is held by the valve chamber housing portion 101 and the bottom housing case portion 107, the second valve mechanism body 180 is also disposed at a predetermined position of the second valve chamber 170. In the embodiment, the second flat valve body 182 is illustrated as being flat, but is not limited to this embodiment.
在底部外殼殼體部107內,形成有收容室176,具備第2彈簧185及承受該第2彈簧185的推迫力的第2推迫塊體186。第2推迫塊體186是與第2閥機構體180連接。第2閥機構體180的第2密封部181,是時常受到彈簧185的推迫力而與第2閥座175接觸。預定流量的被控制流體是藉由從成為壓力控制閥部20E的上流側的流量調節閥部10E的內部流路部171被供給,使被控制流體的流體壓力抵抗第2彈簧185的推迫力的話,第2密封部181及第2閥座175的接觸狀態會被解除。因此,成為可送通預定的流體壓力的被控制流體。在底部外殼殼體部107形成有呼吸路108,被使用於第2隔膜部183(推迫塊體186)的背面側的空氣的流出入。A housing chamber 176 is formed in the bottom outer casing portion 107, and includes a second spring 185 and a second urging block 186 that receives the urging force of the second spring 185. The second pressing block 186 is connected to the second valve mechanism body 180. The second seal portion 181 of the second valve mechanism body 180 is constantly in contact with the second valve seat 175 by the biasing force of the spring 185. When the fluid to be controlled is supplied from the internal flow path portion 171 of the flow rate adjusting valve portion 10E which is the upstream side of the pressure control valve portion 20E, and the fluid pressure of the controlled fluid is pressed against the biasing force of the second spring 185, The contact state of the second seal portion 181 and the second valve seat 175 is released. Therefore, it becomes a controlled fluid that can deliver a predetermined fluid pressure. A breathing passage 108 is formed in the bottom outer casing portion 107, and is used for the outflow of air on the back side of the second diaphragm portion 183 (the pushing block 186).
在流體供給量調節裝置5E中,因為未採用滾針閥形狀,所以與前述同樣,軸偏離的影響被減輕,可以抑制隨著第1平坦閥體122和第2平坦閥體182的進退動作而發生灰塵。如實施例的流體供給量調節裝置5E,藉由將具有不同的功能的流量調節閥部10E及壓力控制閥部20E組合在一個裝置,就可以抑制裝置本身的容積,減少設置場所。In the fluid supply amount adjusting device 5E, since the needle valve shape is not used, the influence of the shaft misalignment is reduced as described above, and the forward and backward movements of the first flat valve body 122 and the second flat valve body 182 can be suppressed. Dust has occurred. In the fluid supply amount adjusting device 5E of the embodiment, by combining the flow rate adjusting valve portion 10E and the pressure control valve portion 20E having different functions in one device, the volume of the device itself can be suppressed, and the installation place can be reduced.
第6圖的流體供給量調節裝置5F(第5實施例)也是將安全閥等的壓力控制閥部本身組裝在第2圖等所揭示的流量調節閥部的內部而形成的裝置。同樣地,可以稱為將流量調節閥部及壓力控制閥部組合的複合調節閥部(5F)。在第6圖的流體供給量調節裝置5F中,在上部側中形成有擔任被控制流體的流量調節用的流量調節閥部10F。且,在下部側也形成有可將被控制流體的壓力變動一定地保持用的壓力控制閥部20F。因此,流量調節閥部10F以及壓力控制閥部20F是採用與前述的流量調節閥部10E以及壓力控制閥部20E同樣的構成。因此,對於共通的構造部位使用同一符號,並省略說明。The fluid supply amount adjusting device 5F (fifth embodiment) of Fig. 6 is also a device in which the pressure control valve unit itself such as a safety valve is incorporated in the flow regulating valve portion disclosed in Fig. 2 and the like. Similarly, it may be referred to as a composite regulating valve portion (5F) that combines the flow regulating valve portion and the pressure control valve portion. In the fluid supply amount adjusting device 5F of Fig. 6, a flow rate adjusting valve portion 10F for adjusting the flow rate of the controlled fluid is formed on the upper side. Further, a pressure control valve portion 20F for holding the pressure fluctuation of the fluid to be controlled constant is also formed on the lower side. Therefore, the flow rate adjusting valve portion 10F and the pressure control valve portion 20F have the same configuration as the above-described flow rate adjusting valve portion 10E and pressure control valve portion 20E. Therefore, the same reference numerals are used for the common structural portions, and the description is omitted.
在第6圖的流體供給量調節裝置5F中,在前述的第5圖所揭示的流體供給量調節裝置5E中的進退手段(調壓氣體、活塞部及第1彈簧),是被變更成為受到計算裝置7R的反饋控制而依據馬達控制基板8R被控制的步進馬達140的進退手段130L的構成。圖中的步進馬達140中的內部構成、動作因為是如前述的第3圖說明,所以對於共通的構造部位使用同一符號,並省略說明。In the fluid supply amount adjusting device 5F of Fig. 6, the advancing and retracting means (pressure regulating gas, piston portion, and first spring) in the fluid supply amount adjusting device 5E disclosed in Fig. 5 described above are changed to receive The feedback control of the computing device 7R is based on the configuration of the advance/reverse means 130L of the stepping motor 140 controlled by the motor control board 8R. Since the internal configuration and operation of the stepping motor 140 in the figure are as described in the third embodiment, the same reference numerals are used for the common structural portions, and the description thereof is omitted.
第7圖,是部分地顯示將本發明的其他的流體供給量調節裝置組入的基板處理裝置的概略圖。在同圖中,被控制流體,是從供給部9G依:流量感測器6G、壓力控制閥部20G、流量調節閥部10G的順序流通流體配管3g,在流體混合部4中依據預定比率純水(溫純水)等混合、調製,並被供給至流體配管3。圖示的流體供給量調節裝置5G,與前述的第1圖的裝置的情況相比,是將流量調節閥部及壓力控制閥部對調的構成。Fig. 7 is a schematic view partially showing a substrate processing apparatus in which another fluid supply amount adjusting device of the present invention is incorporated. In the same figure, the fluid to be controlled flows from the supply unit 9G in the order of the flow rate sensor 6G, the pressure control valve unit 20G, and the flow rate adjustment valve unit 10G, and is fluidly mixed in the fluid mixing unit 4 according to a predetermined ratio. Water (warm pure water) or the like is mixed and prepared, and is supplied to the fluid pipe 3. The fluid supply amount adjusting device 5G shown in the drawing has a configuration in which the flow rate adjusting valve portion and the pressure control valve portion are reversed as compared with the case of the device of the first embodiment described above.
與流體配管連接的流量調節閥部和壓力控制閥部的配置,可對應管路構成柔軟地設定。將被控制流體的壓力變動由隔膜部承受的情況時,與密封部受到被控制流體的壓力變動的情況相比,因為受壓面積較寬,所以會大大地受到壓力變動的影響,藉此使開度變化。因為有需要抑制這種開度變化,所以第7圖的流體供給量調節裝置5G的構成也被考慮。又,計算裝置7G、電動氣動轉換器8G(電動氣動調節器)的構成、作用是與前述的第1圖的裝置同樣。The arrangement of the flow rate adjusting valve portion and the pressure control valve portion connected to the fluid pipe can be flexibly set corresponding to the pipe configuration. When the pressure fluctuation of the fluid to be controlled is received by the diaphragm portion, the pressure receiving area is wider than that of the sealing portion due to the pressure fluctuation of the fluid to be controlled, thereby greatly affecting the pressure fluctuation. The opening changes. Since it is necessary to suppress such a change in opening degree, the configuration of the fluid supply amount adjusting device 5G of Fig. 7 is also considered. Further, the configuration and function of the calculation device 7G and the electro-pneumatic transducer 8G (electropneumatic regulator) are the same as those of the device of the first embodiment described above.
第8圖,是將成為第7圖的流體供給量調節裝置5G的詳細的壓力控制閥部20G及流量調節閥部10G揭示的剖面圖(第6實施例)。在流體供給量調節裝置5G中的流量調節閥部10G,其第1流路部、第2流路部、閥室、閥座、及閥機構體等的構成、甚至作用,本質上與前述的流量調節閥部10A同樣。因此,在共通的部位中附加與第2圖的流量調節閥部10A相同的符號省略詳細。前述的第3圖的流量調節閥部10K(第2實施例)也可以適用倣照圖示的流量調節閥部10G的流路部的方向。Fig. 8 is a cross-sectional view showing a detailed pressure control valve unit 20G and a flow rate adjusting valve unit 10G of the fluid supply amount adjusting device 5G of Fig. 7 (sixth embodiment). In the flow rate adjusting valve portion 10G of the fluid supply amount adjusting device 5G, the configuration or even the action of the first flow path portion, the second flow path portion, the valve chamber, the valve seat, and the valve mechanism body is substantially the same as described above. The flow rate adjusting valve portion 10A is the same. Therefore, the same reference numerals as those of the flow rate adjusting valve portion 10A of Fig. 2 are attached to the common portions, and the details are omitted. The flow rate adjusting valve portion 10K (second embodiment) of the above-described third embodiment can also be applied to the direction of the flow path portion of the flow rate adjusting valve portion 10G as shown.
但是,從圖示的裝置配置可知,在第1流路部111中形成閥座115,其是平坦狀地形成對於流量調節閥部10G的閥室110將直徑形成1mm以下的閥室開口部116。如此,形成閥座115的第1流路部111,因為是位於被控制流體從閥室110流出的側,所以為下流側。被控制流體因為是通過第2流路部112流入閥室110內,所以在此實施例中第2流路部112側是成為流量調節閥部10G的上流側。在此,從流量調節閥部10G的成為上流側的第2流路部112側發生的被控制流體的壓力變動的影響,會傳到流量調節閥部10G的與閥室110相面對的隔膜部123,使閥機構體120的隔膜部123受到來自第2流路部112側的被控制流體的壓力變動。與前述同樣地,隔膜部123因為是由與密封部121相比較寬的面積受到壓力變動,所以平坦閥體122的密封部121及閥座115的距離會變化,閥座115的開度有可能變化。However, it is understood that the valve seat 115 is formed in the first flow path portion 111, and the valve chamber opening portion 116 having a diameter of 1 mm or less is formed in the valve chamber 110 of the flow rate adjusting valve portion 10G in a flat manner. . As described above, since the first flow path portion 111 forming the valve seat 115 is located on the side where the controlled fluid flows out from the valve chamber 110, it is the downstream side. Since the controlled fluid flows into the valve chamber 110 through the second flow path portion 112, the second flow path portion 112 side is the upstream side of the flow rate adjusting valve portion 10G in this embodiment. Here, the influence of the pressure fluctuation of the controlled fluid generated from the side of the second flow path portion 112 on the upstream side of the flow rate adjusting valve portion 10G is transmitted to the diaphragm facing the valve chamber 110 of the flow rate adjusting valve portion 10G. The portion 123 receives the pressure fluctuation of the controlled fluid from the second flow path portion 112 side of the diaphragm portion 123 of the valve mechanism body 120. In the same manner as described above, since the diaphragm portion 123 is subjected to pressure fluctuation in a relatively wide area from the sealing portion 121, the distance between the sealing portion 121 of the flat valve body 122 and the valve seat 115 is changed, and the opening degree of the valve seat 115 is possible. Variety.
在此,如流體供給量調節裝置5G,在流量調節閥部10G的上流側具備壓力控制閥部20G。壓力控制閥部20G,具有可將其下流側的被控制流體的流體壓力一定地保持的功能。第8圖的流體供給量調節裝置5G(第6實施例),是將減壓閥等的控制閥適用於與流量調節閥部10G的第1流路部111的上流側連接的壓力控制閥部20G的裝置。Here, the fluid supply amount adjusting device 5G is provided with a pressure control valve portion 20G on the upstream side of the flow rate adjusting valve portion 10G. The pressure control valve portion 20G has a function of holding the fluid pressure of the fluid to be controlled on the downstream side thereof constant. In the fluid supply amount adjusting device 5G (sixth embodiment) of Fig. 8, a control valve such as a pressure reducing valve is applied to a pressure control valve portion connected to the upstream side of the first flow path portion 111 of the flow rate adjusting valve portion 10G. 20G device.
與流量調節閥部10G的上流側連接的壓力控制閥部20G的構造,是例如日本專利第2671183號、日本專利第3373144號(US5983926B)、日本專利第3276936號(US6199582B、EP1014244B、DE69921434.3B)等所揭示的壓力控制閥。壓力控制閥部20G,主要是由上部殼體部401a、中間殼體部401b、下部殼體部401c組合,且在中間殼體部401b內形成有流路部402。The configuration of the pressure control valve portion 20G that is connected to the upstream side of the flow rate adjusting valve portion 10G is, for example, Japanese Patent No. 2671831, Japanese Patent No. 3373144 (US Pat. No. 5,983,926), Japanese Patent No. 3,276,936 (US Pat. No. 6,919,582 B, EP 1014244B, DE69921434.3B). The pressure control valve disclosed herein. The pressure control valve portion 20G is mainly composed of an upper casing portion 401a, an intermediate casing portion 401b, and a lower casing portion 401c, and a flow path portion 402 is formed in the intermediate casing portion 401b.
被控制流體是從第1流路連接部403朝壓力控制閥部20G內的第1閥室406流入。在面向第1閥室406的位置配置有第1隔膜部421。設在第1隔膜部421的周圍的隔膜緣部423是藉由中間殼體部401b及下部殼體部401c被挾持,使第1隔膜部421被固定。在第1隔膜部421的背後側形成有第1加壓室408。在此,第1隔膜部421是受到第1彈簧410的推迫。符號413是第1加壓室408內的空氣用的呼吸路。The controlled fluid flows from the first flow path connecting portion 403 toward the first valve chamber 406 in the pressure control valve portion 20G. The first diaphragm portion 421 is disposed at a position facing the first valve chamber 406. The diaphragm edge portion 423 provided around the first diaphragm portion 421 is held by the intermediate housing portion 401b and the lower housing portion 401c, and the first diaphragm portion 421 is fixed. A first pressurizing chamber 408 is formed on the back side of the first diaphragm portion 421. Here, the first diaphragm portion 421 is urged by the first spring 410. Reference numeral 413 is a breathing path for air in the first pressurizing chamber 408.
在中間殼體部401b的中央部分形成有上下的貫通路,在其途中具備閥座405。被控制流體是從第1閥室406經由閥座405到達第2閥室407。且,從第2流路連接部404流出。從第8圖的壓力控制閥部20G及流量調節閥部10G的配置可知,第1流路連接部403是上流側,第2流路連接部404是下流側。A vertical through-passage is formed in a central portion of the intermediate casing portion 401b, and a valve seat 405 is provided in the middle thereof. The controlled fluid reaches the second valve chamber 407 from the first valve chamber 406 via the valve seat 405. Then, it flows out from the second flow path connecting portion 404. As is clear from the arrangement of the pressure control valve portion 20G and the flow rate adjusting valve portion 10G in Fig. 8, the first flow path connecting portion 403 is the upstream side, and the second flow path connecting portion 404 is the downstream side.
在面向第2閥室407的位置配置有第2隔膜部422。設在第2隔膜部422的周圍的隔膜緣部424是藉由上部殼體部401a及中間殼體部401b被挾持,第2隔膜部422也被固定。在第2隔膜部422的背後側中形成有第2加壓室409。在此,第2隔膜部422會受到從給氣通口412流入第2加壓室409內且被保持在同第2加壓室內調壓氣體的加壓力。符號414是調壓氣體用的排氣通口。The second diaphragm portion 422 is disposed at a position facing the second valve chamber 407. The diaphragm edge portion 424 provided around the second diaphragm portion 422 is held by the upper case portion 401a and the intermediate case portion 401b, and the second diaphragm portion 422 is also fixed. A second pressurizing chamber 409 is formed in the back side of the second diaphragm portion 422. Here, the second diaphragm portion 422 receives a pressing force that flows into the second pressurizing chamber 409 from the air supply port 412 and is held in the same pressure chamber as the second pressurized chamber. Symbol 414 is an exhaust port for a pressure regulating gas.
第1隔膜部421及第2隔膜部422是藉由閥部420被連結而形成閥機構體C2。閥機構體C2的閥部420及閥座405的距離(接近、隔離、接觸),是藉由從給氣通口412朝第2加壓室409內流入的調壓氣體的加壓力被調整。在此實施例中,可對應流量感測器的檢出流量、設定變更後的流量,進行閥部420及閥座405的最適合的開度調節。在壓力控制閥部20G中,第1隔膜部421雖是受到第1彈簧410的推迫,第2隔膜部422雖是受到調壓氣體的加壓力構成,但不限定於這些,任一的隔膜部,皆可以適宜地選擇由彈簧所產生的推迫或由彈簧及調壓氣體的雙方所產生的推迫和加壓。The first diaphragm portion 421 and the second diaphragm portion 422 are connected to each other by the valve portion 420 to form the valve mechanism body C2. The distance (proximity, isolation, and contact) between the valve portion 420 and the valve seat 405 of the valve mechanism body C2 is adjusted by the pressing force of the pressure-regulating gas flowing into the second pressurizing chamber 409 from the air supply port 412. In this embodiment, the optimum opening degree adjustment of the valve portion 420 and the valve seat 405 can be performed in accordance with the detected flow rate of the flow rate sensor and the flow rate after the setting change. In the pressure control valve portion 20G, the first diaphragm portion 421 is biased by the first spring 410, and the second diaphragm portion 422 is formed by the pressure of the pressure-regulating gas. However, the diaphragm is not limited thereto. For the part, the pushing by the spring or the pushing and pressing by the spring and the regulating gas can be appropriately selected.
對於成為壓力控制閥部20G的上流側的被控制流體的壓力變動,首先第1隔膜部421會受到作用。在壓力控制閥部20G具備第1隔膜部421及第2隔膜部422,因為兩隔膜部是彼此被連結,所以第1隔膜部421也隨著第2隔膜部422側的變化與閥部420一起移動。兩隔膜部因為是各別受到被控制流體的流體壓力而使閥部420朝雙方均衡的位置移動,所以壓力控制閥部20G的閥座405的開度會變化。如此的話,在壓力控制閥部20G中被控制流體的壓力變動的影響會被吸收,其結果被配置於壓力控制閥部的下流的流量調節閥部10G所蒙受的被控制流體的壓力變動的影響可被抑制。The first diaphragm portion 421 is firstly acted upon by the pressure fluctuation of the fluid to be controlled which is the upstream side of the pressure control valve portion 20G. The pressure control valve portion 20G includes the first diaphragm portion 421 and the second diaphragm portion 422. Since the two diaphragm portions are coupled to each other, the first diaphragm portion 421 also changes with the valve portion 420 along with the change of the second diaphragm portion 422 side. mobile. Since the two diaphragm portions are moved by the fluid pressure of the fluid to be controlled and the valve portion 420 is moved to the both sides, the opening degree of the valve seat 405 of the pressure control valve portion 20G changes. In this case, the influence of the pressure fluctuation of the controlled fluid in the pressure control valve unit 20G is absorbed, and as a result, the pressure fluctuation of the fluid to be controlled which is disposed in the downstream flow rate adjusting valve unit 10G of the pressure control valve unit is affected. Can be suppressed.
至此為止,在圖示詳述的流量調節閥部以及壓力控制閥部中,在其內部流通的被控制流體因為主要是藥液所以腐蝕性較高。因此,如各圖的閥室殼體部的各種的殼體部、各圖的隔膜部和閥部(閥機構體),是由如耐腐蝕性、耐藥品性優異的PTFE的各種氟樹脂等形成,並藉由切削等被加工。Up to this point, in the flow rate adjusting valve unit and the pressure control valve unit which are described in detail, the controlled fluid flowing inside is highly corrosive because it is mainly a chemical liquid. Therefore, the various casing portions of the valve chamber casing portion, the diaphragm portion and the valve portion (valve mechanism body) of each of the drawings are various fluororesins such as PTFE which are excellent in corrosion resistance and chemical resistance. It is formed and processed by cutting or the like.
1...自旋挾盤1. . . Spin disk
2...處理液噴嘴2. . . Treatment liquid nozzle
3...流體配管3. . . Fluid piping
3a,3b,3c...流體配管3a, 3b, 3c. . . Fluid piping
3g...流體配管3g. . . Fluid piping
4...流體混合部4. . . Fluid mixing department
5A,5B,5C...流體供給量調節裝置5A, 5B, 5C. . . Fluid supply amount adjusting device
5D...流體供給量調節裝置5D. . . Fluid supply amount adjusting device
5E...流體供給量調節裝置5E. . . Fluid supply amount adjusting device
5F...流體供給量調節裝置5F. . . Fluid supply amount adjusting device
5G...流體供給量調節裝置5G. . . Fluid supply amount adjusting device
6A...流量感測器6A. . . Flow sensor
6B,6C...流量感測器6B, 6C. . . Flow sensor
6G...流量感測器6G. . . Flow sensor
7A...計算裝置7A. . . Computing device
7B,7C...計算裝置7B, 7C. . . Computing device
7G...計算裝置7G. . . Computing device
7R...計算裝置7R. . . Computing device
8A...電動氣動轉換器8A. . . Electric pneumatic converter
8B,8C...電動氣動轉換器8B, 8C. . . Electric pneumatic converter
8G...電動氣動轉換器8G. . . Electric pneumatic converter
8R...馬達控制基板8R. . . Motor control board
9A,9B,9C...供給部9A, 9B, 9C. . . Supply department
9G...供給部9G. . . Supply department
10A,10B,10C...流量調節閥部10A, 10B, 10C. . . Flow regulating valve
10E...流量調節閥部10E. . . Flow regulating valve
10F...流量調節閥部10F. . . Flow regulating valve
10G...流量調節閥部10G. . . Flow regulating valve
10K...流量調節閥部10K. . . Flow regulating valve
13...活塞部13. . . Piston part
14...供給部14. . . Supply department
15...流體配管15. . . Fluid piping
18...推迫塊體18. . . Push block
20A...壓力控制閥部20A. . . Pressure control valve
20B,20C...壓力控制閥部20B, 20C. . . Pressure control valve
20D...壓力控制閥部20D. . . Pressure control valve
20E...壓力控制閥部20E. . . Pressure control valve
20F...壓力控制閥部20F. . . Pressure control valve
20G...壓力控制閥部20G. . . Pressure control valve
22...推迫塊體twenty two. . . Push block
101...閥室殼體部101. . . Valve chamber housing
102...外殼殼體部102. . . Housing part
103...中間殼體部103. . . Intermediate housing
104...空氣通口104. . . Air port
105...呼吸路105. . . Respiratory road
106...外殼呼吸路106. . . Shell breathing path
107...底部外殼殼體部107. . . Bottom housing part
108...呼吸路108. . . Respiratory road
110...閥室110. . . Valve room
111...第1流路部111. . . First flow path
112...第2流路部112. . . Second flow path
113...第1流路連接部113. . . First flow connection
114...第2流路連接部114. . . Second flow connection
115...閥座115. . . Seat
116...閥室開口部116. . . Valve chamber opening
120...閥機構體120. . . Valve body
121...密封部121. . . Sealing part
122...平坦閥體122. . . Flat valve body
123...隔膜部123. . . Diaphragm
124...隔膜緣部124. . . Diaphragm edge
125...閥體連接部125. . . Valve body connection
130...進退手段130. . . Advance and return means
130K...進退手段130K. . . Advance and return means
130L...進退手段130L. . . Advance and return means
131...活塞部131. . . Piston part
132...活塞下部132. . . Lower piston
133...活塞頭部133. . . Piston head
134...空氣室134. . . Air room
135...彈簧135. . . spring
136...彈簧室136. . . Spring chamber
137...O形環137. . . O-ring
140...步進馬達140. . . Stepper motor
141...轉子141. . . Rotor
142...馬達軸142. . . Motor shaft
143...內軸螺紋山143. . . Inner shaft threaded mountain
144...定子144. . . stator
146...螺栓146. . . bolt
151...昇降軸151. . . Lifting shaft
152...昇降軸溝152. . . Lifting shaft groove
153...推壓部153. . . Pushing department
170...第2閥室170. . . Second valve chamber
171...內部流路部171. . . Internal flow section
172...第2流路部172. . . Second flow path
175...第2閥座175. . . 2nd seat
176...收容室176. . . Containment room
180...第2閥機構體180. . . Second valve mechanism body
181...第2密封部181. . . Second seal
182...第2平坦閥體182. . . Second flat valve body
183...第2隔膜部183. . . Second diaphragm
184...第2隔膜緣部184. . . Second diaphragm edge
185...第2彈簧185. . . Second spring
186...第2推迫塊體186. . . Second push block
201...閥室殼體部201. . . Valve chamber housing
202...外殼殼體部202. . . Housing part
210...閥室210. . . Valve room
211...第1流路部211. . . First flow path
212...第2流路部212. . . Second flow path
213...第1流路連接部213. . . First flow connection
214...第2流路連接部214. . . Second flow connection
215...閥座215. . . Seat
220...閥機構體220. . . Valve body
221...密封部221. . . Sealing part
222...閥體222. . . Valve body
223...隔膜部223. . . Diaphragm
224...隔膜緣部224. . . Diaphragm edge
225...彈簧225. . . spring
226...推迫塊體226. . . Push block
227...呼吸路227. . . Respiratory road
228...收容室228. . . Containment room
301a...上部殼體部301a. . . Upper housing
301b...中間殼體部301b. . . Intermediate housing
301c...下部殼體部301c. . . Lower housing
302...流路部302. . . Flow path
303...第1流路連接部303. . . First flow connection
304...第2流路連接部304. . . Second flow connection
305...閥座305. . . Seat
306...第1閥室306. . . First valve chamber
307...第2閥室307. . . Second valve chamber
308...第1加壓室308. . . First pressurizing chamber
309...第2加壓室309. . . Second pressurizing chamber
311...第2彈簧311. . . Second spring
312...給氣通口312. . . Gas supply port
320...閥部320. . . Valve department
321...第1隔膜部321. . . First diaphragm
322...第2隔膜部322. . . Second diaphragm
323...隔膜緣部323. . . Diaphragm edge
324...隔膜緣部324. . . Diaphragm edge
401a...上部殼體部401a. . . Upper housing
401b...中間殼體部401b. . . Intermediate housing
401c...下部殼體部401c. . . Lower housing
402...流路部402. . . Flow path
403...第1流路連接部403. . . First flow connection
404...第2流路連接部404. . . Second flow connection
405...閥座405. . . Seat
406...第1閥室406. . . First valve chamber
407...第2閥室407. . . Second valve chamber
408...第1加壓室408. . . First pressurizing chamber
409...第2加壓室409. . . Second pressurizing chamber
410...第1彈簧410. . . First spring
412...給氣通口412. . . Gas supply port
420...閥部420. . . Valve department
421...第1隔膜部421. . . First diaphragm
422...第2隔膜部422. . . Second diaphragm
423...隔膜緣部423. . . Diaphragm edge
424...隔膜緣部424. . . Diaphragm edge
[第1圖]將本發明的流體供給量調節裝置組入的基板處理裝置的概略圖。[Fig. 1] A schematic view of a substrate processing apparatus in which a fluid supply amount adjusting device of the present invention is incorporated.
[第2圖]第1實施例的流體供給量調節裝置的剖面圖。[Fig. 2] A cross-sectional view of the fluid supply amount adjusting device of the first embodiment.
[第3圖]第2實施例的流體供給量調節裝置的流量調節閥部的剖面圖。[Fig. 3] A cross-sectional view of a flow rate adjusting valve portion of the fluid supply amount adjusting device of the second embodiment.
[第4圖]第3實施例的流體供給量調節裝置的剖面圖。Fig. 4 is a cross-sectional view showing the fluid supply amount adjusting device of the third embodiment.
[第5圖]第4實施例的流體供給量調節裝置的流量調節閥部的剖面圖。[Fig. 5] A cross-sectional view of a flow rate adjusting valve portion of the fluid supply amount adjusting device of the fourth embodiment.
[第6圖]第5實施例的流體供給量調節裝置的流量調節閥部的剖面圖。[Fig. 6] Fig. 6 is a cross-sectional view showing a flow rate adjusting valve portion of the fluid supply amount adjusting device of the fifth embodiment.
[第7圖]將本發明的其他的流體供給量調節裝置組入的基板處理裝置的一部分概略圖。[Fig. 7] A schematic view showing a part of a substrate processing apparatus in which another fluid supply amount adjusting device of the present invention is incorporated.
[第8圖]第6實施例的流體供給量調節裝置的剖面圖。Fig. 8 is a cross-sectional view showing a fluid supply amount adjusting device of a sixth embodiment.
5A...流體供給量調節裝置5A. . . Fluid supply amount adjusting device
7A...計算裝置7A. . . Computing device
8A...電動氣動轉換器8A. . . Electric pneumatic converter
10A...流量調節閥部10A. . . Flow regulating valve
20A...壓力控制閥部20A. . . Pressure control valve
101...閥室殼體部101. . . Valve chamber housing
102...外殼殼體部102. . . Housing part
103...中間殼體部103. . . Intermediate housing
104...空氣通口104. . . Air port
105...呼吸路105. . . Respiratory road
106...外殼呼吸路106. . . Shell breathing path
110...閥室110. . . Valve room
111...第1流路部111. . . First flow path
112...第2流路部112. . . Second flow path
113...第1流路連接部113. . . First flow connection
114...第2流路連接部114. . . Second flow connection
115...閥座115. . . Seat
116...閥室開口部116. . . Valve chamber opening
120...閥機構體120. . . Valve body
121...密封部121. . . Sealing part
122...平坦閥體122. . . Flat valve body
123...隔膜部123. . . Diaphragm
124...隔膜緣部124. . . Diaphragm edge
125...閥體連接部125. . . Valve body connection
130...進退手段130. . . Advance and return means
131...活塞部131. . . Piston part
132...活塞下部132. . . Lower piston
133...活塞頭部133. . . Piston head
134...空氣室134. . . Air room
135...彈簧135. . . spring
136...彈簧室136. . . Spring chamber
137...O形環137. . . O-ring
201...閥室殼體部201. . . Valve chamber housing
202...外殼殼體部202. . . Housing part
210...閥室210. . . Valve room
211...第1流路部211. . . First flow path
212...第2流路部212. . . Second flow path
213...第1流路連接部213. . . First flow connection
214...第2流路連接部214. . . Second flow connection
215...閥座215. . . Seat
220...閥機構體220. . . Valve body
221...密封部221. . . Sealing part
222...閥體222. . . Valve body
223...隔膜部223. . . Diaphragm
224...隔膜緣部224. . . Diaphragm edge
225...彈簧225. . . spring
226...推迫塊體226. . . Push block
227...呼吸路227. . . Respiratory road
Claims (6)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2011001960U JP3168588U (en) | 2011-04-08 | 2011-04-08 | Fluid supply control device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201241588A TW201241588A (en) | 2012-10-16 |
| TWI512420B true TWI512420B (en) | 2015-12-11 |
Family
ID=47602072
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW100127992A TWI512420B (en) | 2011-04-08 | 2011-08-05 | Fluid supply adjustment device |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JP3168588U (en) |
| TW (1) | TWI512420B (en) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2013161418A (en) * | 2012-02-08 | 2013-08-19 | Ckd Corp | Flow control device and flow control system |
| JP6166618B2 (en) * | 2013-08-12 | 2017-07-19 | アドバンス電気工業株式会社 | Constant flow valve |
| JP6254863B2 (en) * | 2014-02-04 | 2017-12-27 | アドバンス電気工業株式会社 | Flow control valve and flow control device using the same |
| JP6238798B2 (en) * | 2014-03-10 | 2017-11-29 | 旭有機材株式会社 | Flow regulating valve and fluid control apparatus including the same |
| JP6599838B2 (en) * | 2016-10-11 | 2019-10-30 | Ckd株式会社 | Wear type manual on-off valve |
| JP7146283B2 (en) * | 2017-08-10 | 2022-10-04 | 株式会社フジキン | Fluid supply device and fluid supply method |
| US11598430B2 (en) | 2019-01-31 | 2023-03-07 | Fujikin Incorporated | Valve device, flow rate control method, fluid control device, semiconductor manufacturing method, and semiconductor manufacturing apparatus using the valve device |
| JP7360156B2 (en) * | 2019-11-29 | 2023-10-12 | 株式会社フジキン | Valve devices, flow control devices and flow dividing devices |
| JP7593607B2 (en) * | 2020-02-18 | 2024-12-03 | サーパス工業株式会社 | Flow rate control device and method for controlling flow rate control device |
| JP7470012B2 (en) | 2020-10-23 | 2024-04-17 | 藤倉コンポジット株式会社 | Flow Control Device |
| JP7336173B1 (en) * | 2023-06-08 | 2023-08-31 | 東フロコーポレーション株式会社 | Flow controller |
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|---|---|---|---|---|
| US5983926A (en) * | 1997-09-10 | 1999-11-16 | Advance Denki Kougyou Kabushiki Kaisha | Flow control valve |
| US6199582B1 (en) * | 1998-12-25 | 2001-03-13 | Advance Denki Kougyou Kabushiki | Flow control valve |
| US6386509B1 (en) * | 1999-09-29 | 2002-05-14 | Advance Denki Kougyou Kabushiki Kaisha | Back pressure control valve |
| TW200301339A (en) * | 2001-12-20 | 2003-07-01 | Advance Denki Kougyog Kabushik | Constant flow valve and constant flow mixing method |
| TW200303981A (en) * | 2002-03-12 | 2003-09-16 | Advance Denki Kougyou Kabushik | Flow rate sensor |
| TW200723384A (en) * | 2005-09-09 | 2007-06-16 | Advance Denki Kogyo Kabushiki Kaisha | Flow control system |
| JP2008258437A (en) * | 2007-04-05 | 2008-10-23 | Dainippon Screen Mfg Co Ltd | Substrate processing method and substrate processing apparatus |
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- 2011-04-08 JP JP2011001960U patent/JP3168588U/en not_active Expired - Lifetime
- 2011-08-05 TW TW100127992A patent/TWI512420B/en active
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5983926A (en) * | 1997-09-10 | 1999-11-16 | Advance Denki Kougyou Kabushiki Kaisha | Flow control valve |
| US6199582B1 (en) * | 1998-12-25 | 2001-03-13 | Advance Denki Kougyou Kabushiki | Flow control valve |
| US6386509B1 (en) * | 1999-09-29 | 2002-05-14 | Advance Denki Kougyou Kabushiki Kaisha | Back pressure control valve |
| TW200301339A (en) * | 2001-12-20 | 2003-07-01 | Advance Denki Kougyog Kabushik | Constant flow valve and constant flow mixing method |
| TW200303981A (en) * | 2002-03-12 | 2003-09-16 | Advance Denki Kougyou Kabushik | Flow rate sensor |
| TW200723384A (en) * | 2005-09-09 | 2007-06-16 | Advance Denki Kogyo Kabushiki Kaisha | Flow control system |
| JP2008258437A (en) * | 2007-04-05 | 2008-10-23 | Dainippon Screen Mfg Co Ltd | Substrate processing method and substrate processing apparatus |
Also Published As
| Publication number | Publication date |
|---|---|
| JP3168588U (en) | 2011-06-16 |
| TW201241588A (en) | 2012-10-16 |
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