TWI505479B - Optical absorption layer of thin-film solar cell and manufacturing method thereof - Google Patents
Optical absorption layer of thin-film solar cell and manufacturing method thereof Download PDFInfo
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- 239000010409 thin film Substances 0.000 title claims description 37
- 238000004519 manufacturing process Methods 0.000 title claims description 21
- 238000010521 absorption reaction Methods 0.000 title 1
- 230000003287 optical effect Effects 0.000 title 1
- 239000010408 film Substances 0.000 claims description 60
- 239000011669 selenium Substances 0.000 claims description 55
- KTSFMFGEAAANTF-UHFFFAOYSA-N [Cu].[Se].[Se].[In] Chemical compound [Cu].[Se].[Se].[In] KTSFMFGEAAANTF-UHFFFAOYSA-N 0.000 claims description 21
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims description 19
- 229910052782 aluminium Inorganic materials 0.000 claims description 19
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 19
- 239000002243 precursor Substances 0.000 claims description 19
- AKUCEXGLFUSJCD-UHFFFAOYSA-N indium(3+);selenium(2-) Chemical compound [Se-2].[Se-2].[Se-2].[In+3].[In+3] AKUCEXGLFUSJCD-UHFFFAOYSA-N 0.000 claims description 12
- 229910052711 selenium Inorganic materials 0.000 claims description 11
- 150000003346 selenoethers Chemical class 0.000 claims description 11
- 229910052717 sulfur Inorganic materials 0.000 claims description 11
- 239000011593 sulfur Substances 0.000 claims description 11
- 238000010438 heat treatment Methods 0.000 claims description 10
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 claims description 9
- 239000000203 mixture Substances 0.000 claims description 7
- WGMIDHKXVYYZKG-UHFFFAOYSA-N aluminum copper indium(3+) selenium(2-) Chemical compound [Al+3].[Cu++].[Se--].[Se--].[Se--].[Se--].[In+3] WGMIDHKXVYYZKG-UHFFFAOYSA-N 0.000 claims description 6
- LCUOIYYHNRBAFS-UHFFFAOYSA-N copper;sulfanylideneindium Chemical compound [Cu].[In]=S LCUOIYYHNRBAFS-UHFFFAOYSA-N 0.000 claims description 6
- 239000010949 copper Substances 0.000 claims description 5
- IRPLSAGFWHCJIQ-UHFFFAOYSA-N selanylidenecopper Chemical compound [Se]=[Cu] IRPLSAGFWHCJIQ-UHFFFAOYSA-N 0.000 claims description 5
- 238000001816 cooling Methods 0.000 claims description 3
- 229910052802 copper Inorganic materials 0.000 claims description 3
- -1 copper selenide Chemical class 0.000 claims description 2
- 239000000126 substance Substances 0.000 claims description 2
- 239000010410 layer Substances 0.000 claims 23
- 239000002356 single layer Substances 0.000 claims 1
- 210000004027 cell Anatomy 0.000 description 27
- 238000000034 method Methods 0.000 description 17
- 238000006243 chemical reaction Methods 0.000 description 9
- 239000000463 material Substances 0.000 description 7
- 229910052733 gallium Inorganic materials 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 3
- 229910052738 indium Inorganic materials 0.000 description 3
- 230000031700 light absorption Effects 0.000 description 3
- MARUHZGHZWCEQU-UHFFFAOYSA-N 5-phenyl-2h-tetrazole Chemical compound C1=CC=CC=C1C1=NNN=N1 MARUHZGHZWCEQU-UHFFFAOYSA-N 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 238000010549 co-Evaporation Methods 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 2
- 230000035484 reaction time Effects 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 235000012431 wafers Nutrition 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 description 1
- MOAPOQQDYQRCET-UHFFFAOYSA-N [Cu].[In].[Se]=S Chemical compound [Cu].[In].[Se]=S MOAPOQQDYQRCET-UHFFFAOYSA-N 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 210000003850 cellular structure Anatomy 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- HVMJUDPAXRRVQO-UHFFFAOYSA-N copper indium Chemical compound [Cu].[In] HVMJUDPAXRRVQO-UHFFFAOYSA-N 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- ZZEMEJKDTZOXOI-UHFFFAOYSA-N digallium;selenium(2-) Chemical compound [Ga+3].[Ga+3].[Se-2].[Se-2].[Se-2] ZZEMEJKDTZOXOI-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 229920002457 flexible plastic Polymers 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 231100001231 less toxic Toxicity 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000005693 optoelectronics Effects 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 230000036632 reaction speed Effects 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000005987 sulfurization reaction Methods 0.000 description 1
- 238000004073 vulcanization Methods 0.000 description 1
Classifications
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
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- Photovoltaic Devices (AREA)
Description
本發明係關於一種薄膜太陽能電池的光吸收層,特別是關於一種具有三個能帶區段的調變膜層的薄膜太陽能電池的光吸收層及其製作方法。The present invention relates to a light absorbing layer of a thin film solar cell, and more particularly to a light absorbing layer of a thin film solar cell having a modulated film layer of three energy band segments and a method of fabricating the same.
太陽能電池是目前所知的環保電力之一,而以矽晶圓為主的太陽能電池由於必須維持一定的矽晶圓厚度(約150~300微米)。相較之下,薄膜太陽能電池只需使用一層極薄光電材料(約1~3微米),材料使用非常少,而且薄膜結構可使用軟性基材,應用彈性大。半導體薄膜太陽能電池目前大致上分為三類,分別為矽薄膜(Silicon TF)、碲化鎘(CdTe)以及銅銦鎵硒(CIGS)。Solar cells are one of the currently known environmentally friendly power sources, and solar cells based on germanium wafers must maintain a certain silicon wafer thickness (about 150 to 300 microns). In contrast, thin-film solar cells only need to use a very thin layer of optoelectronic material (about 1-3 microns), the material is very small, and the film structure can use a soft substrate, and the application flexibility is large. Semiconductor thin film solar cells are currently roughly classified into three types, namely, thin film (Silicon TF), cadmium telluride (CdTe), and copper indium gallium selenide (CIGS).
在薄膜太陽能電池中,以銅銦硒(CuInSe2 ,Copper Indium Diselenide)或是銅銦鎵硒(CuIn1-x Gax Se2 ,Copper Indium Gallium Diselenide,又稱CIGS)屬於I-III-VI族化合物半導體。這類材料具有卓越的光吸收性質,而且材料穩定性也相當好。在能量轉換效率方面,若是利用聚光裝置的輔助,目前電池效率已經可達30%,在AM1.5標準環境測試下也達到20.3%,足以媲美同為複晶結構矽太陽電池的元件表現。在大面積製程上,採用軟性塑膠基板的最佳轉換效率也已經達到14.1%。由於穩定性和轉換效率相當優異,因此被視為最有發展潛力的薄膜太陽能電池。In thin-film solar cells, CuInSe 2 (Copper Indium Diselenide) or CuIn 1-x Ga x Se 2 (Copper Indium Gallium Diselenide, also known as CIGS) belongs to Group I-III-VI. Compound semiconductor. These materials have excellent light absorption properties and material stability is also quite good. In terms of energy conversion efficiency, if the concentrating device is used, the current battery efficiency has reached 30%, and it has reached 20.3% under the AM1.5 standard environmental test, which is comparable to the performance of the solar cell component of the same crystal structure. In the large-area process, the optimum conversion efficiency of the flexible plastic substrate has reached 14.1%. Due to its excellent stability and conversion efficiency, it is considered to be the most promising thin film solar cell.
目前CIGS的製程主要有共蒸鍍與硒化兩種。共蒸鍍可得到鎵(Ga)具濃度梯度分佈的CIGS薄膜,也就是說在CIGS膜內有一V型的能隙分佈,有助於光的有效吸收及載子的收集,這些優點再加上因共蒸鍍薄膜成長速率慢而有較好的材料性質,因此可製作出較高效率的太陽能電 池,但其成長速率慢也導致其製程產出量低而使成本相對提高;而硒化製程分兩階段,即先鍍製前驅物預鍍層再予加熱反應而得。所鍍製的前驅物可以是組成之金屬元素分層鍍製,各層厚度則依所需組成做適當調配,如果在硒蒸氣或H2 Se氣流中以慢速升溫長時間加熱,例如500℃,30分鐘,則可得到材料品質優良的薄膜;另一硒化方式稱為快速硒化(Rapid thermal selenization),此方法是在多層前驅物預鍍層結構上進一步鍍上硒元素層成為前驅物的一部分,此前驅物結構可應用快速升溫(大於10℃/sec),例如500℃,1分鐘,因此可實現短時間內完成反應,加上前驅物預鍍層可使用各種大面積甚至低成本製程,例如濺鍍、墨印(ink printing)或電鍍等進行鍍製,因此具量產之成本優勢。At present, CIGS processes mainly include co-evaporation and selenization. Co-evaporation can obtain a CIGS film with a concentration gradient of gallium (Ga), which means that there is a V-type energy gap distribution in the CIGS film, which contributes to the effective absorption of light and the collection of carriers. Because the growth rate of the co-deposited film is slow and has good material properties, a solar cell with higher efficiency can be produced, but the slow growth rate also leads to a low process yield and a relatively high cost; and the selenization process It is divided into two stages, that is, the pre-plating of the precursor is first plated and then heated and reacted. The plated precursor may be layered and plated with a metal element of the composition, and the thickness of each layer is appropriately adjusted according to the required composition, if heated in a selenium vapor or H 2 Se gas stream at a slow temperature for a long time, for example, 500 ° C, In 30 minutes, a film with excellent material quality can be obtained; another method of selenization is called Rapid Thermal Selenization, which is to further deposit a layer of selenium on the pre-plated structure of the multilayer precursor as part of the precursor. The precursor structure can be applied with rapid temperature rise (greater than 10 ° C / sec), for example, 500 ° C, 1 minute, so that the reaction can be completed in a short time, and the pre-coating of the precursor can be used in various large-area or even low-cost processes, such as Sputtering, ink printing or electroplating, etc., has the cost advantage of mass production.
然而,使用快速硒化法製備具有V型能隙分佈的CIGS薄膜 有實質的困難,而且因為該製程其反應速度快,不易得到性質良好的CIGS薄膜,因此光電轉換效率較差。除此之外,Ga與Se是成本較高的元素,在大量生產上不具有成本優勢。However, a CIGS film with a V-type energy gap distribution was prepared using a rapid selenization method. There are substantial difficulties, and because of the rapid reaction speed of the process, it is difficult to obtain a CIGS film with good properties, so the photoelectric conversion efficiency is poor. In addition, Ga and Se are costly elements and do not have a cost advantage in mass production.
基於上述理由,有必要提供一種薄膜太陽能電池光吸收層及 其製造方法,以解決習用技術所存在的間題。For the above reasons, it is necessary to provide a thin film solar cell light absorbing layer and The manufacturing method is to solve the problems existing in the conventional technology.
本發明之主要目的在於提供一種薄膜太陽能電池的光吸收層,具有三個能帶區段,以提高光吸收層的光電轉換效率。SUMMARY OF THE INVENTION A primary object of the present invention is to provide a light absorbing layer of a thin film solar cell having three band segments to improve the photoelectric conversion efficiency of the light absorbing layer.
本發明之次要目的在於提供一種薄膜太陽能電池的光吸收層,其係利用鋁(Al)及硫(S)等較易取得且成本低的元素取代傳統光吸收層CIGS薄膜的Ga及Se,降低製造成本,提升其經濟競爭力。A secondary object of the present invention is to provide a light absorbing layer of a thin film solar cell which replaces Ga and Se of a conventional light absorbing layer CIGS film with an easily obtainable and low cost element such as aluminum (Al) and sulfur (S). Reduce manufacturing costs and increase their economic competitiveness.
本發明之另一目的在於提供一種製造薄膜太陽能電池的光吸收層的方法,其係適合於利用快速硒化法,得以縮短反應時間且生產品質優良的薄膜太陽能電池的光吸收層,進而提高量產優勢。Another object of the present invention is to provide a method for producing a light absorbing layer of a thin film solar cell, which is suitable for use in a rapid selenization method, which can shorten the reaction time and produce a light absorbing layer of a thin film solar cell excellent in quality, thereby increasing the amount Production advantage.
為達上述之目的,本發明提供一種薄膜太陽能電池的光吸收層,其包含一半導體化合物組成的調變膜層,該調變膜層具有一銅銦硒(CuInSe2 )單一組成膜層且形成三個能帶區段。To achieve the above object, the present invention provides a light absorbing layer of a thin film solar cell comprising a modulation film layer composed of a semiconductor compound having a copper indium selenide (CuInSe 2 ) single composition film layer and formed Three energy bands.
在本發明之一實施例中,該調變膜層的結構如下列通 式:CuInSy Se2-y /CuInSe2 /CuIn1-x Alx Se2 ,其中,x<1、y<2。In one embodiment of the present invention, the structure of the modulation film layer is as follows: CuInS y Se 2-y /CuInSe 2 /CuIn 1-x Al x Se 2 , wherein x<1, y<2.
在本發明之一實施例中,相鄰的該能帶區段之傳導帶能量的梯度係不相同。In an embodiment of the invention, the gradient of the conduction band energy of the adjacent band segments is different.
在本發明之一實施例中,該銅銦硫硒(CuInSy Se2-y )、銅銦硒(CuInSe2 )以及銅銦鋁硒(CuIn1-x Alx Se2 )的厚度分別為0.3微米至0.9微米、0.5微米至1.5微米及0.2微米至0.6微米。In one embodiment of the present invention, the copper indium sulfur selenide (CuInS y Se 2-y) , thickness of the copper indium diselenide (CuInSe 2) aluminum and copper indium selenide (CuIn 1-x Al x Se 2) of 0.3 Micron to 0.9 micron, 0.5 micron to 1.5 micron, and 0.2 micron to 0.6 micron.
在本發明之一實施例中,該調變膜層的厚度介於介於1微米至3微米。In one embodiment of the invention, the thickness of the modulating film layer is between 1 micron and 3 microns.
在本發明之一實施例中,當該調變膜層具有三個能帶區段時,中間的能帶區段的能隙介於0.90至1.10電子伏特之間。In one embodiment of the invention, when the modulating film layer has three band segments, the energy band of the intermediate band segment is between 0.90 and 1.10 eV.
本發明另提供一種薄膜太陽能電池的光吸收層的製造方法,其包含步驟:(1)提供一元素及硒化物疊層為前驅物,具有鋁(Al)/硒化銦(In-Se)/硒化銅(Cu-Se)/硒(Se)的膜層順序;(2)以每秒10℃以上快速加熱該元素及硒化物疊層前驅物至600℃,維持溫度在一預定時間;(3)冷卻至室溫以製造一硒化薄膜,該硒化薄膜具有一銅銦硒(CuInSe2 )單一組成膜層,以及一銅銦鋁硒(CuIn1-x Alx Se2 )漸變膜層;以及(4)提供一硫蒸氣並加熱至400℃以上藉以硫化該硒化薄膜,使其表層形成一銅銦硫硒(CuInSy Se2-y )漸變膜層;完成上述程序之光吸收層包含一調變膜層結構如下列:CuInSy Se2-y /CuInSe2 /CuIn1-x Alx Se2 ,其中,x<1、y<2,且該調變膜層具有三個能帶區段。The invention further provides a method for manufacturing a light absorbing layer of a thin film solar cell, comprising the steps of: (1) providing an element and a selenide stack as a precursor, having aluminum (Al) / indium selenide (In-Se) / a sequence of copper selenide (Cu-Se) / selenium (Se); (2) rapidly heating the element and the selenide laminated precursor to 600 ° C at a temperature of 10 ° C or more per second, maintaining the temperature for a predetermined time; 3) cooling to room temperature to produce a selenide film having a copper indium selenide (CuInSe 2 ) single composition film layer and a copper indium aluminum selenide (CuIn 1-x Al x Se 2 ) gradient film layer And (4) providing a sulfur vapor and heating to above 400 ° C to vulcanize the selenide film to form a copper indium sulphide (CuInS y Se 2-y ) graded film layer; the light absorbing layer of the above procedure is completed; A modulation film layer structure is included as follows: CuInS y Se 2-y /CuInSe 2 /CuIn 1-x Al x Se 2 , wherein x<1, y<2, and the modulation film layer has three energy bands Section.
在本發明之一實施例中,步驟(2)之該預定時間為30秒以上。In an embodiment of the invention, the predetermined time of step (2) is 30 seconds or more.
在本發明之一實施例中,該硒化薄膜的鋁濃度梯度係藉由該 元素疊層前驅物的厚度及該快速加熱的溫度控制。In an embodiment of the invention, the aluminum concentration gradient of the selenized film is by the The thickness of the element stack precursor and the temperature control of the rapid heating.
在本發明之一實施例中,該前驅物中的鋁(Al)/硒化銦(In-Se)/硒化銅(Cu-Se)/硒(Se)的膜層厚度分別為100奈米/200奈米/550奈米/1000奈米。In one embodiment of the present invention, the thickness of aluminum (Al)/indium selenide (In-Se)/copper selenide (Cu-Se)/selenium (Se) in the precursor is 100 nm, respectively. /200 nm / 550 nm / 1000 nm.
在本發明之一實施例中,步驟(2)至(5)均在鈍態氣氛中進行。In an embodiment of the invention, steps (2) through (5) are both carried out in a passive atmosphere.
在本發明之一實施例中,該調變膜層的硫含量係藉由硫蒸氣通入量控制。In one embodiment of the invention, the sulfur content of the modulating film layer is controlled by the amount of sulfur vapor introduced.
A‧‧‧傳導帶能量曲線A‧‧‧ Conduction band energy curve
B‧‧‧價帶能量曲線B‧‧‧Price band energy curve
第1圖:本發明第一實施例之薄膜太陽能電池的光吸收層之能帶結構示意圖。Fig. 1 is a schematic view showing the energy band structure of a light absorbing layer of a thin film solar cell according to a first embodiment of the present invention.
第2圖:本發明第二實施例之薄膜太陽能電池的光吸收層製造方法之鋁含量的濃度梯度變化圖。Fig. 2 is a graph showing a change in concentration gradient of aluminum content in a method for producing a light absorbing layer of a thin film solar cell according to a second embodiment of the present invention.
第3圖:本發明第二實施例之薄膜太陽能電池的光吸收層製造方法之硫含量的濃度梯度變化圖。Fig. 3 is a graph showing a change in concentration gradient of sulfur content in a method for producing a light absorbing layer of a thin film solar cell according to a second embodiment of the present invention.
為了讓本發明之上述及其他目的、特徵、優點能更明顯易懂,下文將特舉本發明較佳實施例,並配合所附圖式,作詳細說明如下。再者,本發明所提到的方向用語,例如上、下、頂、底、前、後、左、右、內、外、側面、周圍、中央、水平、橫向、垂直、縱向、軸向、徑向、最上層或最下層等,僅是參考附加圖式的方向。因此,使用的方向用語是用以說明及理解本發明,而非用以限制本發明。The above and other objects, features and advantages of the present invention will become more <RTIgt; Furthermore, the directional terms mentioned in the present invention, such as upper, lower, top, bottom, front, rear, left, right, inner, outer, side, surrounding, central, horizontal, horizontal, vertical, longitudinal, axial, Radial, uppermost or lowermost, etc., only refer to the direction of the additional schema. Therefore, the directional terminology used is for the purpose of illustration and understanding of the invention.
本發明第一實施例之薄膜太陽能電池的光吸收層,其包含一調變膜層,該調變膜層的結構可以下列通式表之:CuInSy Se2-y /CuInSe2 /CuIn1-x Alx Se2 ,其中,x<1、y<2。該調變膜層的傳導帶示意圖請參考第1圖。The light absorbing layer of the thin film solar cell of the first embodiment of the present invention comprises a modulation film layer, and the structure of the modulation film layer can be expressed by the following formula: CuInS y Se 2-y /CuInSe 2 /CuIn 1- x Al x Se 2 , wherein x<1, y<2. Please refer to Figure 1 for a schematic diagram of the conduction band of the modulation film layer.
第1圖是本發明的第一實施例之薄膜太陽能電池的光吸收層之能帶結構示意圖,其中A代表價帶能量曲線,B代表傳導帶能量曲線,A至B之間的差距代表能隙,實線部分為原本銅銦硒(CuInSe2 ,簡稱CIS) 薄膜的能量曲線,虛線部分則為本發明中該調變膜層的傳導帶及價帶的斜率變化。第1圖中靠近背電極(Mo)處,因為CIS薄膜結構中鋁的加入而形成該調變膜層中銅銦鋁硒(CuIn1-x Alx Se2 ,簡稱CIAS)的部分,使得傳導帶能量曲線B的斜率出現變化,從實線處轉變為虛線處,有利於讓電子離開,因此減少電洞再度被結合(Recombination)的機會。而靠近緩衝層處,例如第1圖中的CdS,因為硫的加入而形成該調變膜層中銅銦硫硒(CuInSy Se2-y ,簡稱CISSe)的結構,影響了傳導帶能量曲線B,使傳導帶能量曲線B由圖中實線處轉為虛線處,減少了原本CISSe與CdS之間的傳導帶能量曲線B的不連續性,有利於電子的傳輸;硫的加入亦影響了價帶能量曲線A的斜率,使其導電性質接近本質半導體的特性,可以延伸空乏區的範圍,有利於光的吸收。再者,靠近CdS處已形成n-type的結構,使得p-n連接點(p-n junction)的位置移至該調變膜層的結構內,能減少CdS/CISSe界面缺陷所造成的影響。1 is a schematic view showing the energy band structure of a light absorbing layer of a thin film solar cell according to a first embodiment of the present invention, wherein A represents a valence band energy curve, B represents a conduction band energy curve, and a gap between A and B represents an energy gap. The solid line part is the energy curve of the original copper indium selenide (CuInSe 2 , CIS for short) film, and the broken line part is the change of the conduction band and the valence band of the modulation film layer in the invention. In the first figure, near the back electrode (Mo), a portion of CuIn 1-x Al x Se 2 (CIAS) in the modulation film layer is formed by the addition of aluminum in the CIS film structure, so that conduction The slope of the band with the energy curve B changes, from the solid line to the dotted line, which helps to let the electrons leave, thus reducing the chance that the hole will be recombined again. Close to the buffer layer, such as CdS in Fig. 1, the formation of CuInS y Se 2-y (CISSe) in the modulation layer due to the addition of sulfur affects the conduction band energy curve. B, the conduction band energy curve B is changed from the solid line to the dotted line in the figure, which reduces the discontinuity of the conduction band energy curve B between the original CISSe and CdS, which is beneficial to the transmission of electrons; the addition of sulfur also affects The slope of the valence band energy curve A makes its conductive properties close to those of the intrinsic semiconductor, and can extend the range of the depletion region, which is beneficial to the absorption of light. Furthermore, an n-type structure has been formed near the CdS, so that the position of the pn junction is moved into the structure of the modulation film layer, which can reduce the influence of the CdS/CISSe interface defect.
根據本發明的一較佳實施例,該光吸收層所包含之調變膜層 係由銅銦硫硒(CuInSy Se2-y )、銅銦硒(CuInSe2 )以及銅銦鋁硒(CuIn1-x Alx Se2 )所依序組成,由於銅銦硫硒(CuInSy Se2-y )以及銅銦鋁硒(CuIn1-x Alx Se2 )的漸變膜層結構,因此可形成具上述效果之能帶區段。在本發明的一較佳實施例中,當該調變膜層具有三個能帶區段時,該傳導帶能量變化為不同的三段式梯度。該調變膜層的厚度介於1微米至3微米之間。該銅銦硫硒(CuInSy Se2-y )、銅銦硒(CuInSe2 )以及銅銦鋁硒(CuIn1-x Alx Se2 )的厚度分別為0.3微米至0.9微米、0.5微米至1.5微米、0.2微米至0.6微米。此外,該銅銦硫硒(CuInSy Se2-y )、銅銦硒(CuInSe2 )以及銅銦鋁硒(CuIn1-x Alx Se2 )薄膜結構的能隙分別為1.20至1.30電子伏特、1.00電子伏特左右以及1.35至1.50電子伏特,可例如為1.30電子伏特/1.03電子伏特/1.40電子伏特。According to a preferred embodiment of the present invention, the light absorbing layer comprises a modulation film layer consisting of copper indium sulphide (CuInS y Se 2-y ), copper indium selenide (CuInSe 2 ), and copper indium aluminum selenide (CuIn 1-x Al x Se 2 ) is formed in sequence, which can be formed due to the graded film structure of CuInS y Se 2-y and CuIn 1-x Al x Se 2 An energy band segment having the above effects. In a preferred embodiment of the invention, when the modulation film layer has three energy band segments, the conduction band energy changes to different three-stage gradients. The thickness of the modulating film layer is between 1 micrometer and 3 micrometers. The thicknesses of the copper indium sulphide (CuInS y Se 2-y ), copper indium selenide (CuInSe 2 ), and copper indium aluminum selenide (CuIn 1-x Al x Se 2 ) are respectively 0.3 micrometers to 0.9 micrometers, 0.5 micrometers to 1.5 millimeters. Micron, 0.2 microns to 0.6 microns. In addition, the energy gaps of the copper indium sulphide (CuInS y Se 2-y ), copper indium selenide (CuInSe 2 ), and copper indium aluminum selenide (CuIn 1-x Al x Se 2 ) film structures are respectively 1.20 to 1.30 eV. , about 1.00 eV and 1.35 to 1.50 eV, which may be, for example, 1.30 eV/1.03 eV/1.40 eV.
本發明第二實施例之薄膜太陽能電池的光吸收層的製造方 法首先係:提供一元素及硒化物疊層前驅物,其具有鋁/銅/銦/硒的膜層順序。在本步驟中,該元素及硒化物疊層為前驅物,可使用硒化銅/硒化銦/鋁或者硒化銅/硒化銦鋁等材料來形成於已鍍上背電極層的基板上,該背電極層可例如為鉬(Mo)。Manufacturer of light absorbing layer of thin film solar cell according to second embodiment of the present invention The first method is to provide an elemental and selenide laminate precursor having a film sequence of aluminum/copper/indium/selenium. In this step, the element and the selenide stack are precursors, and may be formed on the substrate on which the back electrode layer is plated using a material such as copper selenide/indium selenide/aluminum or copper selenide/indium selenide. The back electrode layer may be, for example, molybdenum (Mo).
本發明第二實施例之薄膜太陽能電池的光吸收層的製造方 法接著係:以每秒10℃以上快速加熱該元素疊層前驅物。在本步驟中,加熱程序由室溫以每秒10℃以上升溫,可例如每秒15℃加熱至600℃,維持溫度至少30秒,以快速加熱的方式進行反應生成CuIn1-x Alx Se2 (CIAS)的化合物,此步驟稱之為快速硒化。A method of producing a light absorbing layer of a thin film solar cell according to a second embodiment of the present invention is followed by rapidly heating the element laminated precursor at a temperature of 10 ° C or more per second. In this step, the heating program is heated from room temperature to 10 ° C per second or higher, and can be heated to, for example, 15 ° C per second to 600 ° C, maintaining the temperature for at least 30 seconds, and reacting in a rapid heating manner to form CuIn 1-x Al x Se 2 (CIAS) compound, this step is called rapid selenization.
本發明第二實施例之薄膜太陽能電池的光吸收層的製造方 法接著係:冷卻至室溫以製造一硒化薄膜。在本步驟中,該硒化薄膜的鋁濃度梯度可藉由該元素疊層前驅物的厚度以及反應溫度來控制。鋁濃度梯度會影響到靠近背電極層的薄膜結構,進而影響到其傳導帶能量的斜率。在本發明的一較佳實施例中,該前驅物中,鋁(Al)/硒化銦(In-Se)/硒化銅(Cu-Se)/硒(Se)的厚度分別為100奈米/200奈米/550奈米/1000奈米。而該反應溫度較佳的如上所述的快速硒化步驟中,控制在約600℃。鋁濃度梯度變化圖請參考第2圖。Manufacturer of light absorbing layer of thin film solar cell according to second embodiment of the present invention The process is followed by cooling to room temperature to produce a selenide film. In this step, the aluminum concentration gradient of the selenized film can be controlled by the thickness of the element stack precursor and the reaction temperature. The aluminum concentration gradient affects the structure of the film near the back electrode layer, which in turn affects the slope of its conduction band energy. In a preferred embodiment of the present invention, the thickness of aluminum (Al) / indium selenide (In-Se) / copper selenide (Cu - Se) / selenium (Se) in the precursor is 100 nm, respectively. /200 nm / 550 nm / 1000 nm. While the reaction temperature is preferably as described above in the rapid selenization step, it is controlled at about 600 °C. Please refer to Figure 2 for the gradient of aluminum concentration gradient.
從第2圖可以看出,在CIS與CuIn0.7 Al0.3 Se2 之間的鋁濃度形成梯度變化,部分的銦已由鋁取代,但膜層中其他組成大部分仍為CIS。As can be seen from Fig. 2 , the aluminum concentration between CIS and CuIn 0.7 Al 0.3 Se 2 forms a gradient change, and part of the indium has been replaced by aluminum, but most of the other components in the film layer are still CIS.
本發明第二實施例之薄膜太陽能電池的光吸收層的製造方法接著係:提供一硫蒸氣於該硒化薄膜。在本步驟中,該硒化薄膜較佳的被置入一鈍態氣氛中並且通入硫蒸氣,其通入量可例如為每秒5.5x1015 原子/平方公分。該鈍態氣氛可例如為氮氣或氬氣。A method of producing a light absorbing layer of a thin film solar cell according to a second embodiment of the present invention is followed by providing a sulfur vapor to the selenized film. In this step, the selenized film is preferably placed in a passive atmosphere and passed through a sulfur vapor, which may be, for example, 5.5 x 10 15 atoms/cm 2 per second. The passive atmosphere can be, for example, nitrogen or argon.
本發明第二實施例之薄膜太陽能電池的光吸收層的製造方法接著係:加熱至400℃以上,以形成一調變膜層,該調變膜層的化學組成如下列通式:CuInSy Se2-y /CuInSe2 /CuIn1-x Alx Se2 其中,x<1、y<2,且該膜層具有三個能帶區段,每一能帶區段可具有不同的傳導帶能量梯度。在本步驟中,加熱的溫度亦可例如為450℃,並在該溫度下維持約5分鐘。硫濃度梯度會影響到靠近緩衝層的薄膜結構,進而影響到其傳導帶和價帶的斜率。在本發明的一較佳實施例中,該調變膜層的硫含量的濃度梯度係藉由該硫蒸氣的通入量來控制,若提高硫通入量則可以大幅縮短硫化反應時間。硫濃度梯度變化圖請參考第3圖。從第3圖可 看出,部分的硒已被硫取代。A method for producing a light absorbing layer of a thin film solar cell according to a second embodiment of the present invention is followed by heating to 400 ° C or higher to form a modulation film layer having a chemical composition such as the following formula: CuInS y Se 2-y /CuInSe 2 /CuIn 1-x Al x Se 2 wherein x<1, y<2, and the film layer has three energy band segments, each band segment having different conduction band energy gradient. In this step, the temperature of the heating may also be, for example, 450 ° C, and maintained at this temperature for about 5 minutes. The sulfur concentration gradient affects the structure of the film near the buffer layer, which in turn affects the slope of its conduction band and valence band. In a preferred embodiment of the present invention, the concentration gradient of the sulfur content of the modulated membrane layer is controlled by the amount of sulfur vapor introduced, and if the sulfur is introduced, the sulfurization reaction time can be greatly shortened. Please refer to Figure 3 for the sulfur concentration gradient change chart. As can be seen from Figure 3, part of the selenium has been replaced by sulfur.
以本發明之實施例所提供之薄膜太陽能電池的光吸收層及其製造方法,因為使用鋁取代鎵,可降低生產成本,並且在硫化過程中,使用純硫蒸氣而不使用硫化物氣體,例如H2 S,因此較無毒性且反應溫度可降低至450℃,製程時間縮短至5分鐘以下,因為製程時間短,具備低成本和高產量的特色,且可應用於玻璃或可撓式基板,亦適合於平進式(in-line)或卷對卷式(roll-to-roll)之產線設計。The light absorbing layer of the thin film solar cell provided by the embodiment of the present invention and the method of manufacturing the same can reduce the production cost by using aluminum instead of gallium, and use pure sulfur vapor instead of sulfide gas during the vulcanization process, for example, H 2 S, therefore less toxic and the reaction temperature can be reduced to 450 ° C, the process time is shortened to less than 5 minutes, because of the short process time, low cost and high output characteristics, and can be applied to glass or flexible substrates, Also suitable for in-line or roll-to-roll production lines.
雖然本發明已以較佳實施例揭露,然其並非用以限制本發明,任何熟習此項技藝之人士,在不脫離本發明之精神和範圍內,當可作各種更動與修飾,因此本發明之保護範圍當視後附之申請專利範圍所界定者為準。The present invention has been disclosed in its preferred embodiments, and is not intended to limit the invention, and the present invention may be modified and modified without departing from the spirit and scope of the invention. The scope of protection is subject to the definition of the scope of the patent application.
A‧‧‧價帶能量曲線A‧‧‧ valence band energy curve
B‧‧‧傳導帶能量曲線B‧‧‧Transmission band energy curve
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