TWI505387B - - Google Patents
Info
- Publication number
- TWI505387B TWI505387B TW101143569A TW101143569A TWI505387B TW I505387 B TWI505387 B TW I505387B TW 101143569 A TW101143569 A TW 101143569A TW 101143569 A TW101143569 A TW 101143569A TW I505387 B TWI505387 B TW I505387B
- Authority
- TW
- Taiwan
Links
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201110437212.2A CN103177925B (en) | 2011-12-23 | 2011-12-23 | A kind of adjustable confinement ring for plasma processing apparatus |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201332042A TW201332042A (en) | 2013-08-01 |
| TWI505387B true TWI505387B (en) | 2015-10-21 |
Family
ID=48637706
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW101143569A TW201332042A (en) | 2011-12-23 | 2012-11-21 | Adjustable confining ring for plasma processing device |
Country Status (2)
| Country | Link |
|---|---|
| CN (1) | CN103177925B (en) |
| TW (1) | TW201332042A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI828132B (en) * | 2021-06-23 | 2024-01-01 | 大陸商中微半導體設備（上海）股份有限公司 | Confinement ring, plasma processing device and exhaust control method thereof |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105789014B (en) * | 2014-12-26 | 2018-10-09 | 中微半导体设备(上海)有限公司 | It is a kind of to realize the plasma processing apparatus being uniformly vented |
| CN106935530B (en) * | 2015-12-31 | 2020-04-17 | 中微半导体设备(上海)股份有限公司 | Plasma etching photoresist device |
| CN109037019B (en) * | 2018-07-03 | 2020-04-28 | 深圳市华星光电半导体显示技术有限公司 | Dry etching apparatus |
| CN111383896B (en) * | 2018-12-29 | 2023-10-13 | 北京北方华创微电子装备有限公司 | Lining and reaction chamber |
| JP7308711B2 (en) * | 2019-09-26 | 2023-07-14 | 東京エレクトロン株式会社 | Plasma processing equipment |
| CN114334593B (en) * | 2020-09-29 | 2023-10-31 | 中微半导体设备(上海)股份有限公司 | Confinement ring, plasma processing device and exhaust method thereof |
| CN114639585B (en) * | 2020-12-16 | 2025-02-14 | 中微半导体设备(上海)股份有限公司 | Confinement ring assembly, plasma processing device and exhaust control method thereof |
| CN115954257B (en) * | 2023-03-14 | 2023-05-23 | 长鑫存储技术有限公司 | Substrate processing apparatus, gas confinement assembly, and adjustment method and adjustment apparatus therefor |
| CN116779409A (en) * | 2023-07-31 | 2023-09-19 | 安徽四象半导体材料科技有限公司 | Confined rings for plasma etching |
| CN120261250B (en) * | 2025-05-30 | 2025-08-22 | 上海邦芯半导体科技有限公司 | Exhaust adjusting device of plasma equipment and plasma equipment |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW200829088A (en) * | 2006-12-27 | 2008-07-01 | Advanced Micro Fab Equip Inc | Plasma confinement apparatus |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6896765B2 (en) * | 2002-09-18 | 2005-05-24 | Lam Research Corporation | Method and apparatus for the compensation of edge ring wear in a plasma processing chamber |
| US7972467B2 (en) * | 2003-04-17 | 2011-07-05 | Applied Materials Inc. | Apparatus and method to confine plasma and reduce flow resistance in a plasma reactor |
| CN101150909B (en) * | 2006-09-22 | 2010-05-12 | 中微半导体设备(上海)有限公司 | Plasm restraint device |
| CN100576438C (en) * | 2006-11-15 | 2009-12-30 | 应用材料股份有限公司 | Confinement Baffles and Flow Equalizers for Enhanced Magnetic Control of Radial Plasma Distribution |
| TWM377038U (en) * | 2009-05-15 | 2010-03-21 | Advanced Micro Fab Equip Inc | Plasma confinement device and plasma processing device using the same |
-
2011
- 2011-12-23 CN CN201110437212.2A patent/CN103177925B/en active Active
-
2012
- 2012-11-21 TW TW101143569A patent/TW201332042A/en unknown
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW200829088A (en) * | 2006-12-27 | 2008-07-01 | Advanced Micro Fab Equip Inc | Plasma confinement apparatus |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI828132B (en) * | 2021-06-23 | 2024-01-01 | 大陸商中微半導體設備（上海）股份有限公司 | Confinement ring, plasma processing device and exhaust control method thereof |
Also Published As
| Publication number | Publication date |
|---|---|
| CN103177925B (en) | 2015-08-26 |
| CN103177925A (en) | 2013-06-26 |
| TW201332042A (en) | 2013-08-01 |