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TWI595956B - Processing equipment - Google Patents

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Publication number
TWI595956B
TWI595956B TW104121135A TW104121135A TWI595956B TW I595956 B TWI595956 B TW I595956B TW 104121135 A TW104121135 A TW 104121135A TW 104121135 A TW104121135 A TW 104121135A TW I595956 B TWI595956 B TW I595956B
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Taiwan
Prior art keywords
processing
workpiece
substrate
light source
processing apparatus
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TW104121135A
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Chinese (zh)
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TW201611936A (en
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邱俊凱
謝咏明
黃國興
陳長營
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財團法人工業技術研究院
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Publication of TWI595956B publication Critical patent/TWI595956B/en

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Description

加工設備 Processing Equipment

本發明是有關於一種加工設備,且特別是有關於一種以雷射切割及修邊的加工設備。 This invention relates to a processing apparatus, and more particularly to a processing apparatus for laser cutting and trimming.

隨著顯示及觸控科技的日益進步,人類的生活愈加便利,並且目前的顯示及觸控裝置更朝著輕薄的趨勢發展,以方便攜帶與使用。在顯示及觸控面板的製作過程中,玻璃切割是其中一項非常重要的製程。以往厚度大於500微米的玻璃切割完後,可透過機械磨邊的方式來將玻璃切割過程中所造成的微缺陷去除。然而,在顯示面板輕薄化的發展趨勢下,玻璃厚度越來越薄,並且對於玻璃切邊品質的要求也愈加嚴格。一般的超薄玻璃無法採用傳統機械磨邊的方式來達成缺陷去除的目的,原因在於傳統機械磨邊方式會造成超薄玻璃的破裂。 With the advancement of display and touch technology, human life has become more convenient, and current display and touch devices are moving toward a thin and light trend to facilitate carrying and use. Glass cutting is one of the most important processes in the production of displays and touch panels. In the past, after the glass having a thickness of more than 500 μm was cut, the micro-defects caused by the glass cutting process could be removed by mechanical edging. However, under the trend of thinner and lighter display panels, the thickness of the glass is getting thinner and thinner, and the requirements for the quality of the glass trimming are becoming more stringent. The general ultra-thin glass can not achieve the purpose of defect removal by the traditional mechanical edging method, because the traditional mechanical edging method will cause the rupture of the ultra-thin glass.

為於超薄玻璃上達成傳統玻璃的切邊品質,目前可行的方式是採取熱破裂的方式來達成。然而,以熱破裂的方式加工的困難度極高,需配合多層切割及邊緣熱破裂製程,即一般所稱的修邊技術製程。因此,如何整合多層切割與修邊技術製程並且達 成可量產的目的成為重要的課題。 In order to achieve the trimming quality of conventional glass on ultra-thin glass, the current feasible way is to achieve thermal cracking. However, the difficulty of processing in the form of thermal cracking is extremely high, and it is required to cooperate with a multi-layer cutting and edge thermal cracking process, which is generally referred to as a trimming process. Therefore, how to integrate the multi-layer cutting and trimming technology process and The purpose of mass production is an important issue.

本發明提供一種加工設備,其可同時應用於多層堆疊結構的切割與修邊。 The present invention provides a processing apparatus that can be simultaneously applied to the cutting and trimming of a multilayer stack structure.

本發明的加工設備包括第一載台、第一加工裝置、傳送裝置以及第二加工裝置。第一載台具有承載面,其用來承載板材。承載面的面積被設置為小於板材的面積,而使板材的外緣突出於第一載台外。第一加工裝置用來自板材分離出工件。傳送裝置用來將工件由第一位置移動至第二位置,並且暴露出工件的側面。第二加工裝置用來在第二位置上對工件的側面加工。 The processing apparatus of the present invention includes a first stage, a first processing unit, a conveyor, and a second processing unit. The first stage has a bearing surface for carrying the sheet material. The area of the bearing surface is set to be smaller than the area of the sheet such that the outer edge of the sheet protrudes beyond the first stage. The first processing device separates the workpiece from the sheet. A conveyor is used to move the workpiece from the first position to the second position and expose the sides of the workpiece. The second processing device is used to machine the side of the workpiece in the second position.

基於上述,本發明的加工設備具有第一加工裝置與第二加工裝置,並且第一加工裝置可自第一載台的承載面上的板材分離出工件。此外,工件可經由傳送裝置的傳送而由原本的第一位置移動至第二位置,以暴露出工件的側面。再者,第二加工裝置可針對工件的側面進行加工。因此,本發明的加工設備可由板件分離出工件,並且可同時對於分離出的工件的側面進行後續加工。 Based on the above, the processing apparatus of the present invention has a first processing apparatus and a second processing apparatus, and the first processing apparatus can separate the workpiece from the sheet material on the bearing surface of the first stage. Additionally, the workpiece can be moved from the original first position to the second position via the transfer of the conveyor to expose the sides of the workpiece. Furthermore, the second processing device can process the sides of the workpiece. Therefore, the processing apparatus of the present invention can separate the workpiece from the panel, and can simultaneously perform subsequent processing on the side of the separated workpiece.

基於上述,本發明的加工設備具有第一加工裝置與第二加工裝置,並且第一加工裝置可自第一載台上的板材分離出工件。此外,工件可經由傳送裝置的傳送而由原本的第一位置移動至第二位置,以暴露出工件的側面。再者,第二加工裝置可針對工件的側面進行加工。因此,本發明的加工設備可由板件分離出 工件,並且可同時對於分離出的工件的側面進行後續加工。透過前述本發明的工件分離的方式,第一加工裝置可分離出具有多層堆疊結構的工件。同時,第二加工裝置可針對工件的側面進行修邊加工,以達成近無裂痕缺陷的修邊品質。再者,本發明的加工設備可將上述的工件分離與修邊的兩道製程的機構加以整合,以提升製程速度,從而提高製程的可量產性。 Based on the above, the processing apparatus of the present invention has a first processing apparatus and a second processing apparatus, and the first processing apparatus can separate the workpiece from the sheet material on the first stage. Additionally, the workpiece can be moved from the original first position to the second position via the transfer of the conveyor to expose the sides of the workpiece. Furthermore, the second processing device can process the sides of the workpiece. Therefore, the processing apparatus of the present invention can be separated from the board The workpiece and the subsequent processing of the side of the separated workpiece can be performed simultaneously. Through the aforementioned separation of the workpiece of the present invention, the first processing apparatus can separate the workpiece having the multilayer stack structure. At the same time, the second processing device can trim the side of the workpiece to achieve the trimming quality of the near crack-free defect. Furthermore, the processing apparatus of the present invention can integrate the above-described two-process mechanism of workpiece separation and trimming to increase the process speed, thereby improving the mass production of the process.

為讓本發明的上述特徵能更明顯易懂,下文特舉實施例,並配合所附圖式作詳細說明如下。 In order to make the above-described features of the present invention more comprehensible, the following detailed description of the embodiments will be described in detail below.

20、24、50、60、70‧‧‧聚焦點 20, 24, 50, 60, 70 ‧ ‧ focus points

22、26、62‧‧‧路徑 22, 26, 62‧ ‧ path

80‧‧‧板材 80‧‧‧ plates

82、92‧‧‧第一基板 82, 92‧‧‧ first substrate

82a、92a‧‧‧第一表面 82a, 92a‧‧‧ first surface

84、94‧‧‧膠層 84, 94‧‧ ‧ adhesive layer

86、96‧‧‧第二基板 86, 96‧‧‧ second substrate

86a、96a‧‧‧第三表面 86a, 96a‧‧‧ third surface

90‧‧‧工件 90‧‧‧Workpiece

90-1‧‧‧圓形工件 90-1‧‧‧Circular workpiece

90-2‧‧‧矩形工件 90-2‧‧‧Rectangular workpiece

90-3‧‧‧導角矩形工件 90-3‧‧‧Conductor rectangular workpiece

90-4‧‧‧不規則形工件 90-4‧‧‧ Irregular workpiece

90a、90b、90c、90d‧‧‧側面 90a, 90b, 90c, 90d‧‧‧ side

92-1‧‧‧第一圓形基板 92-1‧‧‧First circular substrate

92-2‧‧‧第一矩形基板 92-2‧‧‧First rectangular substrate

92-3‧‧‧第一導角基板 92-3‧‧‧First lead angle substrate

92-4‧‧‧第一不規則形基板 92-4‧‧‧First irregular shaped substrate

94-1‧‧‧圓形膠層 94-1‧‧‧round rubber layer

94-2‧‧‧矩形膠層 94-2‧‧‧Rectangular layer

94-3‧‧‧導角矩形膠層 94-3‧‧‧Guided rectangular rubber layer

94-4‧‧‧不規則形膠層 94-4‧‧‧ irregular rubber layer

96-1‧‧‧第二圓形基板 96-1‧‧‧Second circular substrate

96-2‧‧‧第二矩形基板 96-2‧‧‧Second rectangular substrate

96-3‧‧‧第二導角矩形基板 96-3‧‧‧Second angle rectangular substrate

96-4‧‧‧第二不規則形基板 96-4‧‧‧Second irregular shaped substrate

100‧‧‧加工設備 100‧‧‧Processing equipment

102‧‧‧人機介面單元 102‧‧‧Human Machine Interface Unit

104‧‧‧控制終端單元 104‧‧‧Control terminal unit

106‧‧‧加工處理單元 106‧‧‧Processing unit

106a‧‧‧第一加工裝置 106a‧‧‧First processing unit

106b‧‧‧第二加工裝置 106b‧‧‧Second processing unit

107‧‧‧尋邊裝置 107‧‧‧ Edge-finding device

108‧‧‧第一載台 108‧‧‧First stage

108a‧‧‧承載面 108a‧‧‧ bearing surface

109‧‧‧輸送帶 109‧‧‧Conveyor belt

110‧‧‧偵測單元 110‧‧‧Detection unit

112‧‧‧傳送裝置 112‧‧‧Transportation device

113a‧‧‧退出機構 113a‧‧‧Exit agency

113b‧‧‧抓取機構 113b‧‧‧ Grab institutions

114‧‧‧第二載台 114‧‧‧Second stage

114a‧‧‧第二承載面 114a‧‧‧second bearing surface

115‧‧‧承載架 115‧‧‧Carriage

119‧‧‧對位標記 119‧‧‧ alignment mark

1042‧‧‧信號傳輸/轉換單元 1042‧‧‧Signal transmission/conversion unit

1044‧‧‧致動信號單元 1044‧‧‧Acoustic signal unit

1044-2‧‧‧加工光源強度控制單元 1044-2‧‧‧Processing light source intensity control unit

1044-4‧‧‧加工光源頻率控制單元 1044-4‧‧‧Processing light source frequency control unit

1044-6‧‧‧加工光源位置控制單元 1044-6‧‧‧Processing light source position control unit

1044-8‧‧‧第一載台控制單元 1044-8‧‧‧First stage control unit

1044-10‧‧‧振鏡頭控制單元 1044-10‧‧‧Vibration lens control unit

1044-12‧‧‧傳輸裝置控置單元 1044-12‧‧‧Transmission device control unit

1044-14‧‧‧第二載台控制單元 1044-14‧‧‧Second stage control unit

1046‧‧‧回授運算單元 1046‧‧‧Return arithmetic unit

1062‧‧‧加工光源單元 1062‧‧‧Processing light source unit

1062-2‧‧‧加工光源信號傳輸/轉換單元 1062-2‧‧‧Processing light source signal transmission/conversion unit

1062-4‧‧‧第一加工光源移動軸 1062-4‧‧‧The first processing light source moving axis

1062-6‧‧‧第一加工光源 1062-6‧‧‧First processing light source

1062-8‧‧‧第二加工光源移動軸 1062-8‧‧‧Second processing light source moving axis

1062-10‧‧‧第二加工光源 1062-10‧‧‧Second processing light source

1064‧‧‧光源調整單元 1064‧‧‧Light source adjustment unit

1064-2‧‧‧振鏡信號傳輸/轉換單元 1064-2‧‧‧ galvanometer signal transmission/conversion unit

1064-4‧‧‧振鏡軸向移動軸 1064-4‧‧‧ galvanometer axial movement axis

1064-6‧‧‧振鏡第一維度移動軸 1064-6‧‧‧ galvanometer first dimension moving axis

1064-8‧‧‧振鏡第二維度移動軸 1064-8‧‧‧ galvanometer second dimension moving axis

1064-10‧‧‧振鏡組 1064-10‧‧‧ galvanometer group

1080-2‧‧‧第一載台信號傳輸/轉換單元 1080-2‧‧‧First stage signal transmission/conversion unit

1080-4‧‧‧第一載台第一維度移動軸 1080-4‧‧‧First stage first dimension moving axis

1080-6‧‧‧第一載台第二維度移動軸 1080-6‧‧‧First stage second dimension moving axis

1080-8‧‧‧第一載台本體 1080-8‧‧‧First stage body

1100-2‧‧‧偵測信號傳輸/轉換單元 1100-2‧‧‧Detection signal transmission/conversion unit

1100-4‧‧‧感測器 1100-4‧‧‧Sensor

1120-2‧‧‧傳遞單元信號傳輸/轉換單元 1120-2‧‧‧Transfer unit signal transmission/conversion unit

1120-6‧‧‧第一移動軸 1120-6‧‧‧First moving axis

1120-8‧‧‧第二移動軸 1120-8‧‧‧Second moving axis

1120-10‧‧‧真空幫浦 1120-10‧‧‧vacuum pump

1140-2‧‧‧第二載台信號傳輸/轉換單元 1140-2‧‧‧Second stage signal transmission/conversion unit

1140-4‧‧‧第二載台第一維度移動軸 1140-4‧‧‧Second stage first dimension moving axis

1140-6‧‧‧第二載台第二維度移動軸 1140-6‧‧‧Second stage second dimension moving axis

1140-8‧‧‧第二載台本體 1140-8‧‧‧Second stage body

A1‧‧‧區域 A1‧‧‧ area

P1‧‧‧第一位置 P1‧‧‧ first position

P2、P2’‧‧‧第二位置 P2, P2’‧‧‧ second position

t1、t2‧‧‧時間 T1, t2‧‧‧ time

L1、L2‧‧‧寬度 L1, L2‧‧‧ width

d1‧‧‧掃瞄距離 D1‧‧‧ scan distance

d2‧‧‧距離 D2‧‧‧ distance

圖1是根據本發明一實施例的加工設備的示意圖。 1 is a schematic illustration of a processing apparatus in accordance with an embodiment of the present invention.

圖2是圖1的加工設備的系統方塊示意圖。 2 is a block diagram of the system of the processing apparatus of FIG. 1.

圖3A是根據本發明另一實施例的加工設備的示意圖。 3A is a schematic illustration of a processing apparatus in accordance with another embodiment of the present invention.

圖3B是圖3A的第二載台的實施方式的示意圖。 3B is a schematic illustration of an embodiment of the second stage of FIG. 3A.

圖4是圖3A與3B的加工設備的系統方塊示意圖。 4 is a block diagram of the system of the processing apparatus of FIGS. 3A and 3B.

圖5是本發明一實施例的加工設備的板材的示意圖。 Figure 5 is a schematic illustration of a sheet of a processing apparatus in accordance with an embodiment of the present invention.

圖6A是根據本發明一實施例的第一加工光源的掃描路徑的示意圖。 6A is a schematic diagram of a scan path of a first processing light source, in accordance with an embodiment of the present invention.

圖6B是圖6A的第一加工光源的掃描路徑的俯視圖。 Figure 6B is a top plan view of the scan path of the first processing light source of Figure 6A.

圖7A是根據本發明另一實施例的第一加工光源的掃描路徑的示意圖。 7A is a schematic diagram of a scan path of a first processing light source in accordance with another embodiment of the present invention.

圖7B是圖7A的第一加工光源的掃描路徑的俯視圖。 Figure 7B is a top plan view of the scan path of the first processing light source of Figure 7A.

圖8A至圖8D是圖6A、6B及圖7A、7B的工件示意圖。 8A to 8D are schematic views of the workpieces of Figs. 6A, 6B and Figs. 7A, 7B.

圖9是根據本發明另一實施例的加工設備的示意圖。 Figure 9 is a schematic illustration of a processing apparatus in accordance with another embodiment of the present invention.

圖10A及圖10B為圖9的加工設備的一加工方式的示意圖。 10A and 10B are schematic views of a processing mode of the processing apparatus of Fig. 9.

圖11為圖9的加工設備的另一加工方式的示意圖。 Figure 11 is a schematic illustration of another processing of the processing apparatus of Figure 9.

圖12為圖9的加工設備的另一加工方式的示意圖。 Figure 12 is a schematic illustration of another processing of the processing apparatus of Figure 9.

圖13A、圖13B以及圖13C是根據本發明另一實施例的工件堆疊方式的示意圖。 13A, 13B, and 13C are schematic views of a stacking manner of a workpiece according to another embodiment of the present invention.

圖1是根據本發明一實施例的加工設備的示意圖。圖2是圖1的加工設備的系統方塊示意圖。請參考圖1與2,本實施例的加工設備100例如是用來執行板材80切割的切割裝置。加工設備100包括第一載台108、第一加工裝置106a、傳送裝置112以及第二加工裝置106b,其中第一加工裝置106a與第二加工裝置106b可共同組成加工處理單元106。第一載台108具有承載面108a,用來承載板材80。此外,第一加工裝置106a可為雷射出光裝置,其可用來自板材80切割分離出工件90。再者,傳送裝置112可使切割好的工件90沿承載面108a垂直的方向移動。舉例而言,傳送裝置112包括退出機構113a,並且退出機構113a例如是Z軸的頂出機構,其配置於第一載台108。退出機構113a可將切割好的工件90由原本位於承載面108a上的第一位置P1沿垂直承 載面108a的方向移動至同樣位於第一載台108上的第二位置P2,以暴露出工件90的側面90a。此外,第二加工裝置106b可在工件90的側面90a的方向上對工件90的側面90a進行例如是修邊的後續加工步驟。值得一提的是,在本實施例中,承載面108a的面積可設置為小於板材80的面積,以使板材80的外緣突出於第一載台108外。舉例而言,圖1中的板材80的寬度L2是大於承載面108a的寬度L1,使得板材80突出於承載面108a。在其他實施例中,板材80的每一邊的尺寸皆可大於承載面108a的尺寸,使得板材80的面積大承載面108a的面積,並且使得板材80的每一邊皆突出於承載面108a。在本實施中,板材80突出承載面108a的長度例如為5公厘。本實施例經由前述的配置可避免例如是雷射光的加工光源聚焦於第一載台108上時,由於載台的導熱造成熱量散失並且影響加工效果。 1 is a schematic illustration of a processing apparatus in accordance with an embodiment of the present invention. 2 is a block diagram of the system of the processing apparatus of FIG. 1. Referring to Figures 1 and 2, the processing apparatus 100 of the present embodiment is, for example, a cutting device for performing the cutting of the sheet 80. The processing apparatus 100 includes a first stage 108, a first processing apparatus 106a, a conveyor apparatus 112, and a second processing apparatus 106b, wherein the first processing apparatus 106a and the second processing apparatus 106b may collectively constitute a processing unit 106. The first stage 108 has a bearing surface 108a for carrying the sheet material 80. Additionally, the first processing device 106a can be a laser exit device that can be used to cut and separate the workpiece 90 from the sheet 80. Further, the transfer device 112 can move the cut workpiece 90 in a direction perpendicular to the bearing surface 108a. For example, the transfer device 112 includes an exit mechanism 113a, and the exit mechanism 113a is, for example, a Z-axis ejection mechanism that is disposed on the first stage 108. The exit mechanism 113a can vertically cut the cut workpiece 90 from the first position P1 originally located on the bearing surface 108a. The direction of the carrier surface 108a is moved to a second position P2 also located on the first stage 108 to expose the side 90a of the workpiece 90. Furthermore, the second processing device 106b can perform a subsequent processing step, such as trimming, on the side 90a of the workpiece 90 in the direction of the side 90a of the workpiece 90. It is worth mentioning that in the present embodiment, the area of the bearing surface 108a can be set smaller than the area of the plate 80 so that the outer edge of the plate 80 protrudes outside the first stage 108. For example, the width L2 of the sheet 80 in FIG. 1 is greater than the width L1 of the bearing surface 108a such that the sheet 80 protrudes from the bearing surface 108a. In other embodiments, each side of the sheet 80 may be sized larger than the size of the load bearing surface 108a such that the area of the sheet 80 is greater than the area of the load bearing surface 108a and such that each side of the sheet 80 protrudes from the load bearing surface 108a. In the present embodiment, the length of the sheet 80 projecting surface 108a is, for example, 5 mm. The present embodiment can prevent the heat source such as the laser light from being focused on the first stage 108 via the foregoing configuration, which causes heat loss due to heat conduction of the stage and affects the processing effect.

圖3A是根據本發明另一實施例的加工設備的示意圖。在本實施例中,加工設備100也可另外包括第二載台114來承載切割好的工件90,並且利用傳送裝置112將切割好的工件90由第一載台108上的第一位置P1移動至位於第二載台114的第二位置P2’。在本實施例中,傳送裝置112可包括抓取機構113b,用以抓取位在第一位置P1上的工件90。舉例而言,抓取機構113b可為機械手臂,其由第一載台108上抓取工件90,並且將工件90置放在位於第二載台114的第二位置P2’上。在本實施例中,切割好的工件90經由前述的搬移,可暴露出工件90的側面90a以供第二 加工裝置106b進行後續加工。此外,在本實施例中,加工設備100可包括尋邊裝置107。尋邊裝置107例如是配置於第二加工裝置106b上,並且位於第二載台114的第二位置P2’的一側。在本實施例中,尋邊裝置107以例如是紅外線的方式偵測工件90的側面90a的位置,以使第二加工裝置106b可更加精確地對工件90進行加工。 3A is a schematic illustration of a processing apparatus in accordance with another embodiment of the present invention. In the present embodiment, the processing apparatus 100 may additionally include a second stage 114 to carry the cut workpiece 90, and the cut workpiece 90 is moved by the transfer device 112 from the first position P1 on the first stage 108. To the second position P2' of the second stage 114. In the present embodiment, the conveyor 112 may include a gripping mechanism 113b for gripping the workpiece 90 positioned at the first position P1. For example, the gripping mechanism 113b can be a robotic arm that grasps the workpiece 90 from the first stage 108 and places the workpiece 90 on the second position P2' of the second stage 114. In the present embodiment, the cut workpiece 90 can expose the side 90a of the workpiece 90 for the second through the aforementioned transfer. The processing device 106b performs subsequent processing. Further, in the present embodiment, the processing apparatus 100 may include an edge finding device 107. The edge finding device 107 is disposed, for example, on the second processing device 106b and on one side of the second position P2' of the second stage 114. In the present embodiment, the edge finding device 107 detects the position of the side surface 90a of the workpiece 90 in the form of, for example, infrared rays, so that the second processing device 106b can process the workpiece 90 more accurately.

此外,本實施例的第一載台108的承載面108a上可配置輸送帶109,以沿承載面108a平移板材80。因此,上述的板材80未經切割的部分可移動至第一位置P1,使得第一加工裝置106a可對於板材80的其餘部份進行切割,並分離出其他的工件90。除此之外,上述第二載台114可具有第二承載面114a,並且第二承載面114a上亦可配置輸送帶(未示出),以將完成側面修邊的工件90平移離開第二位置P2’,同時將其他的工件90移入第二位置P2’來進行後續的加工。 In addition, a conveyor belt 109 may be disposed on the bearing surface 108a of the first stage 108 of the present embodiment to translate the sheet 80 along the bearing surface 108a. Accordingly, the uncut portion of the sheet 80 described above can be moved to the first position P1 such that the first processing device 106a can cut the remainder of the sheet 80 and separate the other workpieces 90. In addition, the second stage 114 may have a second bearing surface 114a, and a conveyor belt (not shown) may be disposed on the second bearing surface 114a to translate the workpiece 90 that completes the side trimming away from the second. At position P2', other workpieces 90 are moved into the second position P2' for subsequent processing.

再者,第二載台114可包括承載架115來承載多在個自板材80分離的工件90。舉例來說,如圖3A所示。在本實施例中,第二載台114的承載架115可承載多個切割完成的工件90(圖3A舉例繪示三片)。當多個工件90藉由承載架115同時堆疊於第二載台114上時,第二加工裝置106b可同時對於多個工件90的側面90a同時進行加工,以節省加工時間,並且提升加工效率。 Further, the second stage 114 can include a carrier 115 to carry a plurality of workpieces 90 separated from the sheet 80. For example, as shown in FIG. 3A. In this embodiment, the carrier 115 of the second stage 114 can carry a plurality of cut workpieces 90 (three pieces are illustrated in FIG. 3A). When a plurality of workpieces 90 are simultaneously stacked on the second stage 114 by the carrier 115, the second processing apparatus 106b can simultaneously process the side faces 90a of the plurality of workpieces 90 simultaneously to save processing time and improve processing efficiency.

圖3B是圖3A的第二載台的實施方式的示意圖。在本實施例中,第二載台114的第二載台本體1140-8可帶動工件90藉由 第二載台第二維度移動軸1140-6相對於第二載台114旋轉。如圖3B所示,藉由第二載台本體1140-8的旋轉,第二加工裝置106b可對於工件90的不同側面90a、90b、90c、90d分別進行修邊加工。 3B is a schematic illustration of an embodiment of the second stage of FIG. 3A. In this embodiment, the second stage body 1140-8 of the second stage 114 can drive the workpiece 90 by The second stage second dimension moving axis 1140-6 rotates relative to the second stage 114. As shown in FIG. 3B, by the rotation of the second stage body 1140-8, the second processing device 106b can trim the different sides 90a, 90b, 90c, 90d of the workpiece 90, respectively.

圖2及圖4的系統方塊示意圖分別對應圖1及圖3A的加工設備的示意圖。本實施例的加工設備100除上述的加工處理單元106、第一載台108、第二載台114以及傳送裝置112外。加工設備100還可包括控制上述元件的控制終端單元104、人機介面單元102以及感測外界信號的偵測單元110。此外,本實施例的加工處理單元106包括加工光源單元1062,並且加工光源單元1062包括加工光源信號傳輸/轉換單元1062-2。此外,加工光源單元1062還包括分別配置於第一與第二加工裝置106a、106b的第一加工光源1062-6與第二加工光源1062-10,以及控制第一與第二加工光源1062-6、1062-10的移動方向的第一加工光源移動軸1062-4與第二加工光源移動軸1062-8。 The block diagrams of the systems of Figures 2 and 4 correspond to the schematic diagrams of the processing apparatus of Figures 1 and 3A, respectively. The processing apparatus 100 of the present embodiment is other than the processing unit 106, the first stage 108, the second stage 114, and the transfer unit 112 described above. The processing device 100 may further include a control terminal unit 104, a human interface unit 102, and a detecting unit 110 that senses an external signal, which control the above components. Further, the processing unit 106 of the present embodiment includes a processing light source unit 1062, and the processing light source unit 1062 includes a processing light source signal transmission/conversion unit 1062-2. In addition, the processing light source unit 1062 further includes first processing light sources 1062-6 and second processing light sources 1062-10 respectively disposed at the first and second processing devices 106a, 106b, and controlling the first and second processing light sources 1062-6 The first processing light source moving axis 1062-4 in the moving direction of 1062-10 and the second processing light source moving axis 1062-8.

在本實施例中,第一與第二加工光源1062-6與1062-10可為相同或不同的加工光源。舉例而言,第一加工光源1062-6可為雷射二極體激發固態雷射(diode-pumped soild-state laser;簡稱DPSSL),其具有介於1瓦(W)至100瓦之間的平均功率,以及奈秒(nano-seconds)或皮秒(pico-second)範圍的脈衝寬度(pulse width)。此外,第一加工光源1062-6的加工速率是介於1厘米/秒至1000厘米/秒之間。在本實施例中,第一加工光源1062-6也可 為二氧化碳雷射(CO2 laser),其可具有介於1瓦至300瓦之間的平均功率以及奈秒範圍的脈衝寬度。此外,二氧化碳雷射可具有介於1厘米/秒至1000厘米/秒之間的加工速率。除此之外,本實施例的第二加工光源1062-10亦可為二氧化碳雷射。再者,第一與第二加光源移動軸1062-4、1062-8可為同一組或不同一組的移動軸機件。 In this embodiment, the first and second processing light sources 1062-6 and 1062-10 may be the same or different processing light sources. For example, the first processing light source 1062-6 can be a diode-pumped soild-state laser (DPSSL) having a range of between 1 watt (W) and 100 watts. Average power, and pulse width in the nano-seconds or pico-second range. Additionally, the processing rate of the first processing light source 1062-6 is between 1 cm/sec and 1000 cm/sec. In the present embodiment, the first processing light source 1062-6 may also be a CO 2 laser, which may have an average power between 1 watt and 300 watts and a pulse width in the nanosecond range. Additionally, the carbon dioxide laser can have a processing rate between 1 cm/sec and 1000 cm/sec. In addition, the second processing light source 1062-10 of the embodiment may also be a carbon dioxide laser. Moreover, the first and second light source moving axes 1062-4, 1062-8 can be the same group or a different set of moving shaft members.

除此之外,本實施例的加工處理單元106還包括光源調整單元1064,其中光源調整單元1064可耦接至第二加工光源1062-10,以調整第二加工光源1062-10所發出的光束的方向,並且將第二加工光源1062-10所發出的光束傳送至第二載板114。在本實施例中,光源調整單元1064可為振鏡單元,藉由移動調整振鏡的方向可改變本實施例的加工光源的出光方向。此外,光源調整單元1064可包括振鏡組1064-10,其耦接於振鏡信號傳輸/轉換單元1064-2、振鏡軸向移動軸1064-4、振鏡第一維度移動軸1064-6以及振鏡第二維度移動軸1064-8。在本實施例中,來自於控制終端單元104的信號經振鏡信號傳輸/轉換單元1064-2轉換後傳輸至振鏡第一維度移動軸1064-6以及振鏡第二維度移動軸1064-8以控制振鏡組1064-10的移動,並藉以控制第二加工光源1062-10的出光方向。 In addition, the processing unit 106 of the present embodiment further includes a light source adjusting unit 1064, wherein the light source adjusting unit 1064 can be coupled to the second processing light source 1062-10 to adjust the light beam emitted by the second processing light source 1062-10. The direction and the light beam emitted by the second processing light source 1062-10 is transmitted to the second carrier 114. In this embodiment, the light source adjusting unit 1064 can be a galvanometer unit, and the light emitting direction of the processing light source of the embodiment can be changed by moving the direction of the adjusting galvanometer. In addition, the light source adjusting unit 1064 may include a galvanometer group 1064-10 coupled to the galvanometer signal transmission/conversion unit 1062-4, the galvanometer axial movement axis 1064-4, and the galvanometer first dimension moving axis 1064-6. And the galvanometer second dimension moving axis 1064-8. In the present embodiment, the signal from the control terminal unit 104 is converted by the galvanometer signal transmission/conversion unit 1064-2 and transmitted to the galvanometer first dimension moving axis 1064-6 and the galvanometer second dimension moving axis 1064-8. The movement of the galvanometer group 1064-10 is controlled to control the light exiting direction of the second processing light source 1062-10.

此外,第一載台108可包括第一載台信號傳輸/轉換單元1080-2、第一載台第一維度移動軸1080-4、第一載台第二維度移動軸1080-6以及第一載台本體1080-8。在本實施例中,第一載台 第一維度移動軸1080-4的第一維度包含上下(Z)、左右(X)、或前後(Y),而第一載台第二維度移動軸1080-6的第二維度是以第一載台本體1080-8的中心軸作旋轉移動。此外,第一載台信號傳輸/轉換單元1080-2可接收來自控制終端單元104的控制信號,並且轉換為第一載台第一維度移動軸1080-4與第一載台第二維度移動軸1080-6可接收的信號,藉以在第一維度與第二維度上控制第一載台本體1080-8的移動。 Further, the first stage 108 may include a first stage signal transmission/conversion unit 1080-2, a first stage first dimension moving axis 1080-4, a first stage second dimension moving axis 1080-6, and a first Stage body 1080-8. In this embodiment, the first stage The first dimension of the first dimension moving axis 1080-4 includes upper and lower (Z), left and right (X), or front and rear (Y), and the second dimension of the first stage second dimension moving axis 1080-6 is the first dimension The central axis of the stage body 1080-8 is rotationally moved. Further, the first stage signal transmission/conversion unit 1080-2 can receive the control signal from the control terminal unit 104, and converts to the first stage first dimension moving axis 1080-4 and the first stage second dimension moving axis The 1080-6 receivable signal controls the movement of the first stage body 1080-8 in the first dimension and the second dimension.

另一方面,如圖3A及圖4的實施例所示,第二載台114可包括第二載台信號傳輸/轉換單元1140-2、第二載台第一維度移動軸1140-4、第二載台第二維度移動軸1140-6以及第二載台本體1140-8。在本實施例中,第二載台第一維度移動軸1140-4的第一維度是包含上下(Z)、左右(X)、或前後(Y),而第二載台第二維度移動軸1140-6的第二維度是以第二載台本體1140-8的中心軸作旋轉移動。此外,第二載台信號傳輸/轉換單元1140-2可接收來自控制終端單元104的控制信號,並且轉換為第二載台第一維度移動軸1140-4與第二載台第二維度移動軸1140-6可接收的信號,並藉以在第一維度與第二維度上控制第二載台本體1140-8的移動。 On the other hand, as shown in the embodiment of FIG. 3A and FIG. 4, the second stage 114 may include a second stage signal transmission/conversion unit 1140-2, a second stage first dimension movement axis 1140-4, and a second stage. The second stage has a second dimension moving axis 1140-6 and a second stage body 1140-8. In this embodiment, the first dimension of the second stage first dimension moving axis 1140-4 includes upper and lower (Z), left and right (X), or front and rear (Y), and the second stage has a second dimension moving axis. The second dimension of 1140-6 is rotationally moved by the central axis of the second stage body 1140-8. Further, the second stage signal transmission/conversion unit 1140-2 can receive the control signal from the control terminal unit 104 and converts to the second stage first dimension moving axis 1140-4 and the second stage second dimension moving axis. The 1140-6 receivable signal controls the movement of the second stage body 1140-8 in the first dimension and the second dimension.

再者,上述圖3A及圖4的實施例中的加工設備100的傳送裝置112除可包括例如是機械手臂的抓取機構113b之外,傳送裝置112還包括傳遞單元信號傳輸/轉換單元1120-2,並且其可用來接收來自控制終端單元104的信號。此外,傳送裝置112還具有第一移動軸1120-6與第二移動軸1120-8。第一移動軸1120-6的 移動方向包括上下(Z)、左右(X)以及前後(Y),而第二移動軸1120-8則是包含旋轉移動的方向。當傳遞單元信號傳輸/轉換單元1120-2接受到來自控制終端單元104的信號時,抓取機構113b可經由接收到信號的進行控制,而經由第一移動軸1120-6或第二移動軸1120-8作動產生移動。此外,傳送裝置112還可包括真空幫浦1120-10,以吸起在第二載台114上堆疊的工件90。 Furthermore, the transfer device 112 of the processing apparatus 100 in the embodiment of FIGS. 3A and 4 described above may include, in addition to the gripping mechanism 113b, such as a robot arm, the transfer device 112 further includes a transfer unit signal transmission/conversion unit 1120- 2, and it can be used to receive signals from the control terminal unit 104. In addition, the conveyor 112 also has a first axis of movement 1120-6 and a second axis of movement 1120-8. First moving axis 1120-6 The moving direction includes upper and lower (Z), left and right (X), and front and rear (Y), and the second moving axis 1120-8 is a direction including rotational movement. When the transfer unit signal transmission/conversion unit 1120-2 receives the signal from the control terminal unit 104, the gripping mechanism 113b may control via the received signal via the first moving axis 1120-6 or the second moving axis 1120. -8 actuation produces movement. Additionally, the conveyor 112 can also include a vacuum pump 1120-10 to pick up the workpiece 90 stacked on the second stage 114.

請再參考圖2及圖4,人機介面單元102可用來輸入各種加工參數,例如所欲切割的工件的外型及尺寸、雷射移動速度、雷射輸出頻率及功率、雷射聚焦位置以及振鏡行程等。此外,人機介面單元102還可用來使加工設備100的系統歸零或啟動、即時顯示加工影像以及緊急停止加工等。 Referring to FIG. 2 and FIG. 4 again, the human interface unit 102 can be used to input various processing parameters, such as the shape and size of the workpiece to be cut, the laser moving speed, the laser output frequency and power, the laser focus position, and Galvanometer strokes, etc. In addition, the human interface unit 102 can also be used to zero or activate the system of the processing apparatus 100, display processed images immediately, and emergency stop processing.

此外,如圖2及圖4的系統方塊圖所示,本實施例的控制終端單元104可包括信號傳輸/轉換單元1042、致動信號單元1044以及回授運算單元1046。信號傳輸/轉換單元1042的功能為接收人機介面單元102輸入的資訊並且轉換為致動信號單元1044可以接收的信號模式,例如數位/類比轉換。此外,致動信號單元1044可包括控制加工光源強度的加工光源強度控制單元1044-2、控制加工光源頻率的加工光源頻率控制單元1044-4、控制加工光源位置的加工光源位置控制單元1044-6以及控制振鏡的振鏡頭控制單元1044-10。此外,圖3A及圖4的實施例中的加工設備100還進一步包括控制傳送裝置112的傳輸裝置控制單元1044-12,以及控制第一與第二載台108、114並且分別耦接第一、第二載台信 號傳輸/轉換單元1080-2、1140-2的第一與第二載台控制單元1044-8、1044-14等。此外,加工光源強度控制單元1044-2、加工光源頻率控制單元1044-4以及加工光源位置控制單元1044-6共同耦接至加工光源單元1062的加工光源傳輸/轉換單元1062-2。換言之,加工光源傳輸/轉換單元1062-2可同時接收、轉換並且傳輸來自加工光源強度控制單元1044-2、加工光源頻率控制單元1044-4以及加工光源位置控制單元1044-6的信號。再者,振鏡頭控制單元1044-10耦接至振鏡信號傳輸/轉換單元1064-2,以將信號轉換並且傳輸至振鏡組1064-10,以控制振鏡組1064-10的運動方向。 In addition, as shown in the system block diagrams of FIGS. 2 and 4, the control terminal unit 104 of the present embodiment may include a signal transmission/conversion unit 1042, an actuation signal unit 1044, and a feedback operation unit 1046. The function of signal transmission/conversion unit 1042 is to receive information input by human interface unit 102 and convert to a signal pattern that can be received by actuation signal unit 1044, such as digital/analog conversion. In addition, the actuation signal unit 1044 may include a processing light source intensity control unit 1044-2 that controls the intensity of the processing light source, a processing light source frequency control unit 1044-4 that controls the processing light source frequency, and a processing light source position control unit 1044-6 that controls the processing light source position. And an oscillating lens control unit 1044-10 that controls the galvanometer. In addition, the processing apparatus 100 in the embodiment of FIGS. 3A and 4 further includes a transmission device control unit 1044-12 that controls the transmitting device 112, and controls the first and second stages 108, 114 and respectively coupled to the first, Second station letter The first and second stage control units 1044-8, 1044-14, and the like of the number transmission/conversion units 1080-2, 1140-2. Further, the processing light source intensity control unit 1044-2, the processing light source frequency control unit 1044-4, and the processing light source position control unit 1044-6 are commonly coupled to the processing light source transmission/conversion unit 1062-2 of the processing light source unit 1062. In other words, the processing light source transmission/conversion unit 1062-2 can simultaneously receive, convert, and transmit signals from the processing light source intensity control unit 1044-2, the processing light source frequency control unit 1044-4, and the processing light source position control unit 1044-6. Furthermore, the oscillating lens control unit 1044-10 is coupled to the galvanometer signal transmission/conversion unit 1064-2 to convert and transmit the signals to the galvanometer group 1064-10 to control the direction of motion of the galvanometer group 1064-10.

再者,如圖2及圖4所示,加工設備100的偵測單元110包括偵測信號傳輸/轉換單元1100-2以及感測器1100-4。在本實施例中,感測器1100-4例如是用來偵測距離的距離感測器。此外,偵測信號傳輸/轉換單元1100-2耦接至控制終端單元104的回授運算單元1046以回授調整上述耦接控制終端單元104的各個元件裝置,例如調整加工光源的強度、頻率或位置,或者是第一及第二載台108、114的位置。 Moreover, as shown in FIG. 2 and FIG. 4, the detecting unit 110 of the processing device 100 includes a detecting signal transmission/conversion unit 1100-2 and a sensor 1100-4. In the present embodiment, the sensor 1100-4 is, for example, a distance sensor for detecting a distance. In addition, the detection signal transmission/conversion unit 1100-2 is coupled to the feedback operation unit 1046 of the control terminal unit 104 to feedback and adjust the respective component devices of the coupling control terminal unit 104, for example, adjusting the intensity, frequency, or The position, or the position of the first and second stages 108, 114.

請再參考圖1及圖3A,根據上述的內容,本發明的加工設備100可執行板材80的切割,其中板材80例如是多層堆疊結構。此外,加工設備100可針對板材80切割完後所形成的工件90的側面進行修邊,使得工件100的彎曲應力可達到例如是300兆帕(Mpa)以上。如上述的實施例所述,透過控制終端單元104控制 第一載台本體1080-8,並且透過退出機構113a將部分第一載台108上切割完成的工件80向上頂出,或者藉由抓取機構113b傳送至第二載台114。接著,根據人機界面單元102所輸入的欲形成的結構外形與尺寸,調整加工處理單元106、第一載台108以及/或是第二載台114。此外,藉由偵測單元110感測工件90的側面90a的起伏。然後,再經由回授運算單元1046回授調整加工光源單元1062或是第一載台108以及/或是第二載台114的位置。再者,加工設備100可進一步經由振鏡組1064-10的輔助調整及改變第二加工光源1062-10的出光路徑,以完成工件90的修邊。 Referring again to Figures 1 and 3A, in accordance with the above, the processing apparatus 100 of the present invention can perform the cutting of the sheet 80, wherein the sheet 80 is, for example, a multi-layer stack. Further, the processing apparatus 100 may trim the side of the workpiece 90 formed after the sheet 80 is cut, so that the bending stress of the workpiece 100 may be, for example, 300 MPa or more. Controlled by the control terminal unit 104 as described in the above embodiment The first stage body 1080-8, and the workpiece 80 cut by the partial first stage 108 is ejected upward through the ejecting mechanism 113a, or transmitted to the second stage 114 by the grasping mechanism 113b. Next, the processing unit 106, the first stage 108, and/or the second stage 114 are adjusted in accordance with the structural shape and size to be formed by the human interface unit 102. Further, the undulation of the side surface 90a of the workpiece 90 is sensed by the detecting unit 110. Then, the position of the processing light source unit 1062 or the first stage 108 and/or the second stage 114 is adjusted by the feedback arithmetic unit 1046. Moreover, the processing apparatus 100 can further adjust and change the light exit path of the second processing light source 1062-10 via the auxiliary of the galvanometer group 1064-10 to complete the trimming of the workpiece 90.

圖5是本發明一實施例的加工設備的板材的示意圖。在本實施例中,板材80可為多層結構,並且板材80包括第一基板82、第二基板86以及膠層84。第一基板82可配置於例如上述第一載台108承載面108a上。此外,第二基板86可配置於第一基板82上,並且第二基板86的硬度小於第一基板82的硬度。再者,膠層84配置於第一基板82與第二基板86之間。舉例而言,第一基板82例如是以超薄玻璃組成的硬脆材料層,而第二基板86則例如是以聚對苯二甲酸乙二酯(Polyethylene terephthalate,簡稱PET)所形成的高分子聚合物層。此外,膠層84則例如是以光學膠(optical clear adhesion,簡稱OCA)所組成。 Figure 5 is a schematic illustration of a sheet of a processing apparatus in accordance with an embodiment of the present invention. In the present embodiment, the sheet material 80 may have a multi-layered structure, and the sheet material 80 includes a first substrate 82, a second substrate 86, and a glue layer 84. The first substrate 82 can be disposed, for example, on the first stage 108 bearing surface 108a. Further, the second substrate 86 may be disposed on the first substrate 82, and the hardness of the second substrate 86 is smaller than the hardness of the first substrate 82. Furthermore, the glue layer 84 is disposed between the first substrate 82 and the second substrate 86. For example, the first substrate 82 is, for example, a hard and brittle material layer composed of ultra-thin glass, and the second substrate 86 is, for example, a polymer formed of polyethylene terephthalate (PET). Polymer layer. In addition, the glue layer 84 is composed of, for example, optical clear adhesion (OCA).

圖6A是根據本發明一實施例的第一加工光源的掃描路徑的示意圖。圖6B是圖6A的第一加工光源的掃描路徑的俯視圖。請參考圖6A及圖6B,當以第一加工裝置106a的第一加工光源 1062-6對板材80進行切割時,第二基板86面向第一加工光源1062-6,並且第一加工光源1062-6所發出的第一加工光束的聚焦點20位於第一基板82的第一表面82a,並且第一表面82a與膠層84相鄰。在本實施例中,將聚焦點20聚焦於以硬脆材料層所組成的第一基板82的第一表面82a,可達成較窄的切割寬度與較強的切割能量。此外,如圖6B所示,第一加工光源1062-6的切割路徑的俯視圖如路徑22所示。本實施例的切割方式是採用沿切割路徑22左右來回掃描的方式以完成切割,其中掃描的次數與工件80的厚度有關。 6A is a schematic diagram of a scan path of a first processing light source, in accordance with an embodiment of the present invention. Figure 6B is a top plan view of the scan path of the first processing light source of Figure 6A. Please refer to FIG. 6A and FIG. 6B, when the first processing light source of the first processing device 106a is used. When the plate 80 is cut 1062-6, the second substrate 86 faces the first processing light source 1062-6, and the focus point 20 of the first processing beam emitted by the first processing light source 1062-6 is located at the first of the first substrate 82. Surface 82a, and first surface 82a is adjacent to glue layer 84. In the present embodiment, focusing the focus point 20 on the first surface 82a of the first substrate 82 composed of a hard and brittle material layer can achieve a narrower cut width and stronger cutting energy. Further, as shown in FIG. 6B, a top view of the cutting path of the first processing light source 1062-6 is shown as path 22. The cutting mode of this embodiment is to perform scanning by scanning left and right along the cutting path 22, wherein the number of scanning is related to the thickness of the workpiece 80.

圖7A是根據本發明另一實施例的第一加工光源的掃描路徑的示意圖。圖7B是圖7A第一加工光源的掃描路徑的俯視圖。請參考圖7A、7B,在本實施例中,當以第一加工裝置106a的第一加工光源1062-6沿加工路徑26對板材80進行切割時,第二基板86面向第一加工光源1062-6。第一加工光源1062-6的聚焦點24位於板材80之外,並且與第二基板86的第三表面86a相隔一段距離,其中聚焦點24與第三表面86a相隔的距離大小可介於0微米至1000微米之間。第三表面86a與膠層84分別位於第二基板86的相對兩側。如上所述,第一加工光源1062-6的聚焦點24是聚焦於板材80的表面上方,也就是以所謂的下離焦的方式來切割板材80,以完成局部選擇性(offset)的切割。如圖7A及圖7B所示,圖中區域A1的部份即為選擇性切割的部份。採用下離焦方式可達到較大的線寬提升移除效率,並且使得聚焦點24遠離第一基 板82,而避免傷害第一基板82的表面。也就是說,本實施例的切割方式可避免傷害例如是玻璃基板的表面。 7A is a schematic diagram of a scan path of a first processing light source in accordance with another embodiment of the present invention. Figure 7B is a top plan view of the scan path of the first processing light source of Figure 7A. Referring to FIGS. 7A and 7B, in the present embodiment, when the sheet 80 is cut along the processing path 26 by the first processing light source 1062-6 of the first processing device 106a, the second substrate 86 faces the first processing light source 1062- 6. The focus point 24 of the first processing light source 1062-6 is located outside of the sheet 80 and at a distance from the third surface 86a of the second substrate 86, wherein the focus point 24 is spaced from the third surface 86a by a distance of 0 microns. Between 1000 microns. The third surface 86a and the glue layer 84 are respectively located on opposite sides of the second substrate 86. As noted above, the focus point 24 of the first processing light source 1062-6 is focused over the surface of the sheet 80, i.e., the sheet 80 is cut in a so-called lower defocusing manner to complete a partial offset cut. As shown in Fig. 7A and Fig. 7B, the portion of the area A1 in the figure is the portion selectively cut. The lower defocusing mode can achieve a larger line width to improve the removal efficiency and make the focus point 24 away from the first base. The plate 82 avoids damaging the surface of the first substrate 82. That is, the cutting method of the present embodiment can avoid damage such as the surface of the glass substrate.

此外,經由上述實施例的切割方式切割完成的工件90例如是圖8A中的圓形工件90-1、圖8B中的矩形工件90-2或者是圖8D的不規則形工件90-4。此外,在形成矩形工件90-2的加工步驟中,另可選用聚焦景深較高的振鏡組1064-10,且在不變加工光源的焦長的情況下,對如圖8C的矩形的導角區域進行加工,以形成導角矩形工件90-3。在本實施例中,圖8A的圓形工件90-1包括切割完成的第一圓形基板92-1、圓形膠層94-1以及第二圓形基板96-1。圖8B的矩形工件90-2包括切割完成的第一矩形基板92-2、矩形膠層94-2以及第二矩形基板96-2。圖8C的導角矩形工件90-3包括切割完成的第一導角矩形基板92-3、導角矩形膠層94-3以及第二導角矩形基板96-3。此外,圖8D的不規則形工件90-4包括切割完成的第一不規則形基板92-4、不規則形膠層94-4以及第二不規則形基板96-4。當然,本發明的加工步驟所形成的工件90的形狀並不以前述的形狀為限,本實施例可經由加工光源以及工件位置的調整形成所需求的工件形狀。 Further, the workpiece 90 cut through the cutting method of the above embodiment is, for example, the circular workpiece 90-1 in Fig. 8A, the rectangular workpiece 90-2 in Fig. 8B, or the irregular shaped workpiece 90-4 in Fig. 8D. In addition, in the processing step of forming the rectangular workpiece 90-2, a galvanometer group 1064-10 having a higher focusing depth of field may be additionally used, and in the case of constant processing of the focal length of the light source, a rectangular guide as shown in FIG. 8C The corner regions are machined to form a tapered rectangular workpiece 90-3. In the present embodiment, the circular workpiece 90-1 of FIG. 8A includes a first circular substrate 92-1, a circular rubber layer 94-1, and a second circular substrate 96-1. The rectangular workpiece 90-2 of FIG. 8B includes a cut first rectangular substrate 92-2, a rectangular adhesive layer 94-2, and a second rectangular substrate 96-2. The lead-angle rectangular workpiece 90-3 of FIG. 8C includes a cut-out first lead-angle rectangular substrate 92-3, a lead-angle rectangular adhesive layer 94-3, and a second lead-angle rectangular substrate 96-3. Further, the irregular shaped workpiece 90-4 of FIG. 8D includes the cut first irregular shaped substrate 92-4, the irregular shaped adhesive layer 94-4, and the second irregular shaped substrate 96-4. Of course, the shape of the workpiece 90 formed by the processing steps of the present invention is not limited to the aforementioned shape. In this embodiment, the desired workpiece shape can be formed by processing the light source and adjusting the position of the workpiece.

圖9是根據本發明另一實施例的加工設備的示意圖。圖10A及圖10B為圖9的第二加工光源的掃描路徑的示意圖。本實施例的加工設備100與上述實施例的不同之處在於,第二加工裝置106b的第二加工光源1062-10除可如上述的圖1設置於第二位置P2’的一側外,亦可將第二加工光源1062-10設置於第二位置P2’ 的上方,以對工件90進行正面修邊。此外,如圖10A及圖10B所示,在本實施例中,當第二加工光源1062-10對工件90進行修邊時,第二基板96面向第二加工光源1062-10,並且第二加工光源1062-10所發出的第二加工光束的聚焦點60位於第一基板92的第一表面92a,並且第一表面92a與膠層94相鄰。當將第二加工光源1062-10的聚焦點60聚焦於以硬脆材料層所組成的第一基板92的第一表面92a時,可達成較窄的修邊寬度並獲致較強的光源修邊能量。此外,如圖10B所示,第二加工光源1062-10的修邊掃瞄路徑的上視圖如路徑62所示。本實施例修邊的方式是採用沿修邊路徑62左右來回掃描以完成修邊,並且掃描的次數與工件90的厚度有關。 Figure 9 is a schematic illustration of a processing apparatus in accordance with another embodiment of the present invention. 10A and 10B are schematic views of a scanning path of the second processing light source of Fig. 9. The processing apparatus 100 of the present embodiment is different from the above embodiment in that the second processing light source 1062-10 of the second processing device 106b can be disposed on the side of the second position P2' as shown in FIG. The second processing light source 1062-10 can be disposed at the second position P2' Above, the front side of the workpiece 90 is trimmed. In addition, as shown in FIGS. 10A and 10B, in the present embodiment, when the second processing light source 1062-10 trims the workpiece 90, the second substrate 96 faces the second processing light source 1062-10, and the second processing The focus point 60 of the second processing beam emitted by the light source 1062-10 is located on the first surface 92a of the first substrate 92, and the first surface 92a is adjacent to the glue layer 94. When the focus point 60 of the second processing light source 1062-10 is focused on the first surface 92a of the first substrate 92 composed of a hard and brittle material layer, a narrower trimming width can be achieved and a stronger light source trimming can be achieved. energy. In addition, as shown in FIG. 10B, a top view of the trimming scan path of the second processing light source 1062-10 is shown as path 62. The manner of trimming in this embodiment is to scan left and right along the trimming path 62 to complete the trimming, and the number of scans is related to the thickness of the workpiece 90.

圖11為圖9的加工設備的另一加工方式的示意圖。在本實施例中,當工件90被移動到第二位置P2’時,第一基板92面向第二加工光源1062-10,並且第二加工光源1062-10的第二加工光束的聚焦點64位於第一基板92的第二表面92b。此外,第二表面92b與膠層94分別位於第一基板92的相對兩側。 Figure 11 is a schematic illustration of another processing of the processing apparatus of Figure 9. In the present embodiment, when the workpiece 90 is moved to the second position P2', the first substrate 92 faces the second processing light source 1062-10, and the focus point 64 of the second processing beam of the second processing light source 1062-10 is located The second surface 92b of the first substrate 92. In addition, the second surface 92b and the glue layer 94 are respectively located on opposite sides of the first substrate 92.

此外,圖12為圖9的加工設備的另一加工方式的示意圖。在本實施例中,當工件90被移動到第二位置P2’時,第二基板96面向第二加工光源1062-10,並且第二加工光源1062-10的聚焦點70位於第二基板96的第三表面96a。此外,第三表面96a與膠層94分別位於第二基板96的相對兩側。 Further, Fig. 12 is a schematic view showing another processing mode of the processing apparatus of Fig. 9. In the present embodiment, when the workpiece 90 is moved to the second position P2', the second substrate 96 faces the second processing light source 1062-10, and the focus point 70 of the second processing light source 1062-10 is located on the second substrate 96. Third surface 96a. In addition, the third surface 96a and the glue layer 94 are respectively located on opposite sides of the second substrate 96.

根據上述實施例中的修邊方式,當加工設備100初步掃 描切割完成工件90的形狀後,可如圖12的實施例所示,選擇直接以加工光源進行後續正面修邊的製程。或者,如圖11的實施例所示,先對於工件90的邊緣先作局部選擇性的切割,以去除第二基板96所包括的高分子聚合物以及膠層94,以避免第二基板96的高分子聚合物及膠層94吸收加工光束而影響修邊效果。 According to the trimming method in the above embodiment, when the processing apparatus 100 is initially scanned After the shape of the workpiece 90 has been cut and cut, as shown in the embodiment of FIG. 12, a process of directly performing the front side trimming directly with the processing light source can be selected. Alternatively, as shown in the embodiment of FIG. 11, the edge of the workpiece 90 is first partially selectively cut to remove the high molecular polymer and the glue layer 94 included in the second substrate 96 to avoid the second substrate 96. The high molecular polymer and the rubber layer 94 absorb the processing beam and affect the trimming effect.

圖13A、圖13B以及圖13C為本發明另一實施例的工件堆疊方式的示意圖。如圖13A所示,當多層的工件90(圖13A舉例繪示3層)堆疊在一起時,由於第二加工光源1062-10的聚焦點50於修邊時掃瞄距離d1的增加,從而增加第二加工光源1062-10的掃描路徑與時間,並且在掃描修邊的過程中造成熱量的散失。換言之,當掃描到頂端或底端的工件90時,位於另一端的工件90熱量已散失。因此,當堆疊的工件90的數目增加時,需減少工件90之間的掃描間隔時間t1、t2。也就是說,需進一步增加第二加工光源1062-10掃瞄的速度,以減緩工件90的側邊熱量散失情形。此外,如圖13B所示,當多層的工件90堆疊在一起時,第二加工光源1062-10的聚焦點50可由上層的工件90開始朝下方的工件90依續進行掃描與修邊,以獲致較好的修邊效果。 13A, 13B, and 13C are schematic views of a stacking method of a workpiece according to another embodiment of the present invention. As shown in FIG. 13A, when the plurality of workpieces 90 (three layers are illustrated in FIG. 13A) are stacked together, since the focus point 50 of the second processing light source 1062-10 is increased by the scanning distance d1 when trimming, thereby increasing The second processing light source 1062-10 scans the path and time and causes heat loss during scanning trimming. In other words, when the workpiece 90 of the top or bottom end is scanned, the heat of the workpiece 90 at the other end has been lost. Therefore, when the number of stacked workpieces 90 is increased, it is necessary to reduce the scanning interval time t1, t2 between the workpieces 90. That is, the speed at which the second processing light source 1062-10 is scanned is further increased to slow the side heat loss of the workpiece 90. In addition, as shown in FIG. 13B, when the plurality of workpieces 90 are stacked together, the focus point 50 of the second processing light source 1062-10 can be continuously scanned and trimmed by the workpiece 90 of the upper layer toward the workpiece 90 below. Better trimming effect.

如圖13C所示,當第二加工光源1062-10對工件90進行正面修邊時,工件90的周圍可配置多個對位標記(alignment mark)119用以提升工件90對位的準確度,並使得第二加工光源1062-10可更加準確地對於工件90進行修邊。詳細而言,在本實施例中,對位標記119與工件90之間可具有距離d2,使得第二加工光源 1062-10對於工件90進行修邊時,由工件90周圍的修邊距離可為固定。 As shown in FIG. 13C, when the second processing light source 1062-10 performs front trimming on the workpiece 90, a plurality of alignment marks 119 may be disposed around the workpiece 90 to improve the accuracy of the workpiece 90 alignment. And the second processing light source 1062-10 can more accurately trim the workpiece 90. In detail, in the embodiment, the alignment mark 119 and the workpiece 90 may have a distance d2, so that the second processing light source When the workpiece 90 is trimmed by the 1062-10, the trimming distance around the workpiece 90 can be fixed.

綜上所述,本發明的加工設備可對於板材進行切割,並且同時對於由板材切割分離出來的工件進行修邊處理。因此,板件的切割與修邊製程可加以整合。此外,在本發明上述的多個實施例中。加工設備可透過加工光源以及工件位置的調整,改變加工光源切割與修邊的路徑,以提升光源的聚焦效果,並且進一步提升板件切割以及工件修邊製程的品質。此外,加工光源可與振鏡組進行搭配,並且經由振鏡組的移動以調整加工光源的出光的方向與位置。因此,本發明的加工設備可同時進行例如是多層堆疊結構的工件的修邊製程,進而提升整體加工設備的製程效率。 In summary, the processing apparatus of the present invention can cut the sheet material and at the same time trim the workpiece separated by the sheet material. Therefore, the cutting and trimming process of the panel can be integrated. Furthermore, in the various embodiments of the invention described above. The processing equipment can change the path of cutting and trimming of the processing light source by adjusting the processing light source and the position of the workpiece to enhance the focusing effect of the light source, and further improve the quality of the board cutting and the trimming process of the workpiece. In addition, the processing light source can be matched with the galvanometer group and the direction and position of the light emitted by the processing light source can be adjusted via the movement of the galvanometer group. Therefore, the processing apparatus of the present invention can simultaneously perform a trimming process of a workpiece such as a multi-layer stacked structure, thereby improving the process efficiency of the overall processing apparatus.

雖然本發明已以實施例揭露如上,然其並非用以限定本發明,任何所屬技術領域中具有通常知識者,在不脫離本發明的精神和範圍內,當可作些許的更動與潤飾,故本發明的保護範圍當視後附的申請專利範圍所界定者為準。 Although the present invention has been disclosed in the above embodiments, it is not intended to limit the present invention, and any one of ordinary skill in the art can make some changes and refinements without departing from the spirit and scope of the present invention. The scope of the invention is defined by the scope of the appended claims.

80‧‧‧板材 80‧‧‧ plates

90‧‧‧工件 90‧‧‧Workpiece

90a‧‧‧側面 90a‧‧‧ side

100‧‧‧加工設備 100‧‧‧Processing equipment

106a‧‧‧第一加工裝置 106a‧‧‧First processing unit

106b‧‧‧第二加工裝置 106b‧‧‧Second processing unit

107‧‧‧尋邊裝置 107‧‧‧ Edge-finding device

108‧‧‧第一載台 108‧‧‧First stage

108a‧‧‧承載面 108a‧‧‧ bearing surface

112‧‧‧傳送裝置 112‧‧‧Transportation device

113a‧‧‧退出機構 113a‧‧‧Exit agency

1062-4‧‧‧第一加工光源移動軸 1062-4‧‧‧The first processing light source moving axis

1062-6‧‧‧第一加工光源 1062-6‧‧‧First processing light source

1062-10‧‧‧第二加工光源 1062-10‧‧‧Second processing light source

1080-4‧‧‧第一載台第一維度移動軸 1080-4‧‧‧First stage first dimension moving axis

1080-6‧‧‧第一載台第二維度移動軸 1080-6‧‧‧First stage second dimension moving axis

L1、L2‧‧‧寬度 L1, L2‧‧‧ width

P1‧‧‧第一位置 P1‧‧‧ first position

P2‧‧‧第二位置 P2‧‧‧ second position

Claims (20)

一種加工設備,包括:一第一載台,具有一承載面,用以承載一板材,其中該承載面的面積被設置為小於該板材的面積,而使該板材的外緣突出於該第一載台外;一第一加工裝置,用以自該板材分離出一工件;一傳送裝置,用以將該工件由一第一位置移動到一第二位置,並且暴露出該工件的一側面;以及一第二加工裝置,用以在該第二位置上對該工件的該側面加工。 A processing apparatus comprising: a first stage having a bearing surface for carrying a plate, wherein an area of the bearing surface is set to be smaller than an area of the plate, and an outer edge of the plate protrudes from the first a first processing device for separating a workpiece from the plate; a conveying device for moving the workpiece from a first position to a second position and exposing a side of the workpiece; And a second processing device for processing the side of the workpiece in the second position. 如申請專利範圍第1項所述的加工設備,其中該傳送裝置包括一退出機構(ejection mechanism),配置於該第一載台,用以在該工件自該板材分離之後,沿垂直該承載面的方向上移或下移該工件。 The processing apparatus of claim 1, wherein the conveying device comprises an ejection mechanism disposed on the first stage for vertically perpendicular to the workpiece after the workpiece is separated from the sheet Move the workpiece up or down in the direction. 如申請專利範圍第1項所述的加工設備,其中該傳送裝置包括一抓取機構,用以抓取該第一位置上的該工件,並將該工件由該第一位置移動到該第二位置。 The processing apparatus of claim 1, wherein the conveying device comprises a gripping mechanism for gripping the workpiece at the first position and moving the workpiece from the first position to the second position. 如申請專利範圍第1項所述的加工設備,其中該第一載台適於沿該承載面平移該板材,將該板材的其他部分移動到該第一位置,以藉由該第一加工裝置自該板材分離出另一工件。 The processing apparatus of claim 1, wherein the first stage is adapted to translate the sheet along the bearing surface, and move the other portion of the sheet to the first position for use by the first processing device Another workpiece is separated from the sheet. 如申請專利範圍第1項所述的加工設備,其中該第一位置以及該第二位置皆位於該第一載台上。 The processing apparatus of claim 1, wherein the first location and the second location are both located on the first stage. 如申請專利範圍第1項所述的加工設備,更包括一第二載台,其中該第二位置位於該第二載台上。 The processing apparatus of claim 1, further comprising a second stage, wherein the second position is located on the second stage. 如申請專利範圍第6項所述的加工設備,其中該第二載台適於沿一第二承載面平移該工件。 The processing apparatus of claim 6, wherein the second stage is adapted to translate the workpiece along a second bearing surface. 如申請專利範圍第6項所述的加工設備,其中該第二載台包括一承載架,用以承載多個自該板材分離的工件,該第二加工裝置適於對堆疊於該承載架上的該些工件的側面同時進行加工。 The processing apparatus of claim 6, wherein the second stage comprises a carrier for carrying a plurality of workpieces separated from the plate, and the second processing device is adapted to be stacked on the carrier. The sides of the workpieces are simultaneously processed. 如申請專利範圍第1項所述的加工設備,其中該板材為多層結構,包括:一第一基板,配置於該承載面上;一第二基板,配置於該第一基板上,且該第二基板的硬度小於該第一基板的硬度;以及一膠層,配置於該第一基板與該第二基板之間。 The processing apparatus of claim 1, wherein the sheet material has a multi-layer structure, comprising: a first substrate disposed on the bearing surface; a second substrate disposed on the first substrate, and the The hardness of the second substrate is smaller than the hardness of the first substrate; and a glue layer is disposed between the first substrate and the second substrate. 如申請專利範圍第9項所述的加工設備,其中該第一加工裝置包括一第一加工光源,位於該第一載台上方。 The processing apparatus of claim 9, wherein the first processing device comprises a first processing light source located above the first stage. 如申請專利範圍第10項所述的加工設備,其中該第二基板面向該第一加工光源,且該第一加工光束的一聚焦點位於該第一基板的一第一表面,該第一表面與該膠層相鄰。 The processing apparatus of claim 10, wherein the second substrate faces the first processing light source, and a focus point of the first processing beam is located on a first surface of the first substrate, the first surface Adjacent to the glue layer. 如申請專利範圍第10項所述的加工設備,其中該第二基板面向該第一加工光源,且該第一加工光束的一聚焦點位於該 板材之外,且與該第二基板的一第三表面相隔一距離,該第三表面與該膠層分別位於該第二基板的相對兩側。 The processing apparatus of claim 10, wherein the second substrate faces the first processing light source, and a focus point of the first processing beam is located And a third surface of the second substrate is separated from the third surface of the second substrate, the third surface and the adhesive layer are respectively located on opposite sides of the second substrate. 如申請專利範圍第9項所述的加工設備,其中該第二加工裝置包括:一第二加工光源,用以提供一第二加工光束至該工件的該側面;以及一光源調整單元,耦接至該第二加工光源,用以調整該第二加工光源發出的該第二加工光束,並傳送該第二加工光束至該板材。 The processing apparatus of claim 9, wherein the second processing device comprises: a second processing light source for providing a second processing beam to the side of the workpiece; and a light source adjusting unit coupled And the second processing light source is configured to adjust the second processing beam emitted by the second processing source and transmit the second processing beam to the sheet. 如申請專利範圍第13項所述的加工設備,其中該第二加工光源設置於該第二位置的一側。 The processing apparatus of claim 13, wherein the second processing light source is disposed at one side of the second position. 如申請專利範圍第13項所述的加工設備,其中該第二加工光源設置於該第二位置的上方。 The processing apparatus of claim 13, wherein the second processing light source is disposed above the second position. 如申請專利範圍第13項所述的加工設備,其中當該工件被移動到該第二位置時,該第二基板面向該第二加工光源,且該第二加工光束的一聚焦點位於該第一基板的一第一表面,該第一表面與該膠層相鄰。 The processing apparatus of claim 13, wherein when the workpiece is moved to the second position, the second substrate faces the second processing light source, and a focus point of the second processing beam is located at the second a first surface of a substrate adjacent the glue layer. 如申請專利範圍第13項所述的加工設備,其中當該工件被移動到該第二位置時,該第一基板面向該第二加工光源,且該第二加工光束的一聚焦點位於該第一基板的一第二表面,該第二表面與該膠層分別位於該第一基板的相對兩側。 The processing apparatus of claim 13, wherein the first substrate faces the second processing light source when the workpiece is moved to the second position, and a focus point of the second processing beam is located at the second a second surface of the substrate, the second surface and the adhesive layer are respectively located on opposite sides of the first substrate. 如申請專利範圍第13項所述的加工設備,其中當該工件被移動到該第二位置時,該第二基板面向該第二加工光源,且該第二加工光束的一聚焦點位於該第二基板的一第三表面,該第三表面與該膠層分別位於該第二基板的相對兩側。 The processing apparatus of claim 13, wherein when the workpiece is moved to the second position, the second substrate faces the second processing light source, and a focus point of the second processing beam is located at the second a third surface of the second substrate, the third surface and the adhesive layer are respectively located on opposite sides of the second substrate. 如申請專利範圍第13項所述的加工設備,更包括一尋邊裝置,配置於該第二位置的一側,用以偵測該工件的該側面的位置。 The processing apparatus of claim 13 further comprising a edge finding device disposed on one side of the second position for detecting a position of the side of the workpiece. 如申請專利範圍第13項所述的加工設備,其中該光源調整單元包括一振鏡模組。 The processing apparatus of claim 13, wherein the light source adjusting unit comprises a galvanometer module.
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