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TWI592188B - Mask structure - Google Patents

Mask structure Download PDF

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Publication number
TWI592188B
TWI592188B TW104118678A TW104118678A TWI592188B TW I592188 B TWI592188 B TW I592188B TW 104118678 A TW104118678 A TW 104118678A TW 104118678 A TW104118678 A TW 104118678A TW I592188 B TWI592188 B TW I592188B
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Taiwan
Prior art keywords
mask
mask body
filter layer
main filter
mask structure
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TW104118678A
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Chinese (zh)
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TW201642927A (en
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Jing-Jyr Lin
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Jing-Jyr Lin
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Priority to TW104118678A priority Critical patent/TWI592188B/en
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Publication of TWI592188B publication Critical patent/TWI592188B/en

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Description

口罩結構 Mask structure

本發明係有關於一種口罩結構,尤指一種過濾層之面積小於口罩本體之面積的口罩結構。 The present invention relates to a mask structure, and more particularly to a mask structure in which the area of the filter layer is smaller than the area of the mask body.

一般口罩的功能在於過濾、隔離周遭環境中的灰塵、細菌、病毒等有害物質,以保護口罩使用者,減少或避免環境中有害物質經由口罩使用者的口、鼻而侵襲消化系統或呼吸系統,例如:在醫院服務的醫護人員及各級工作人員,使用口罩可以保護自己。同時,佩戴口罩也可以防止或避免口罩使用者本身的唾液、呼出的廢氣污染環境,例如:進入醫院加護病房探視病患、餐飲業工作者佩戴口罩,可以防止工作者口、鼻的唾液、飛沫污染食物,提高飲食的清潔與衛生,避免傳染病的傳播。吾人皆知,日前的SARS傳染疫情,禽流感的防治,口罩所達成之具體功效,更不在話下。 The function of the general mask is to filter and isolate harmful substances such as dust, bacteria and viruses in the surrounding environment to protect the mask user and reduce or avoid harmful substances in the environment from invading the digestive system or respiratory system through the mouth and nose of the mask user. For example, medical staff in hospitals and staff at all levels can use masks to protect themselves. At the same time, wearing a mask can also prevent or avoid the saliva of the mask user and the exhaled exhaust gas polluting the environment. For example, entering the hospital intensive care unit to visit the patient, the catering industry worker wearing a mask can prevent the worker's mouth and nose from saliva and droplets. Contaminated food, improve the cleanliness and hygiene of the diet, and avoid the spread of infectious diseases. As everyone knows, the SARS infection epidemic, the prevention and control of bird flu, and the specific effects achieved by masks are even more important.

對一般大眾而言,在面對流感時,要防止傳染之最直接方式係為不出入易傳染病毒的場所、常洗手以及佩載口罩。經過幾次全球爆發嚴重急性呼吸道症候群大流行後,口罩的使用及需求性大幅提高,因而口罩也一再被改良更新。 For the general public, in the face of the flu, the most direct way to prevent infection is to not enter the place where the virus is easily transmitted, wash hands frequently, and wear masks. After several global outbreaks of severe acute respiratory syndrome, the use and demand for masks have increased dramatically, and masks have been repeatedly updated.

查,目前口罩之種類大都分為抗菌口罩、活性碳口罩及高效過濾口罩(如:N95口罩)。於此針對活性碳口罩進行討論,活性碳口罩 通常包含二保護層及設置於二保護層間之一活性碳過濾層,然後接合二保護層與活性碳過濾層,但二保護層之間夾有活性碳過濾層之複數個活性碳顆粒,該些個活性碳顆粒常使二保護層無法完全接合,導致該些個活性碳顆粒會從二保護層之間漏出,使用者容易沾染該些個活性碳顆粒而產生髒汙,甚至汙染製程環境及設備,無法使用於需要高潔淨度之環境(如:無塵室)。或者二保護層間設有一非活性碳過濾層,但非活性碳過濾層之厚度太厚,也會導致二保護層無法完全接合。為了減少上述問題產生,必須減少該些活性碳顆粒之密度或過濾層之厚度,進而減少口罩之使用壽命。 Investigate, the current types of masks are mostly divided into antibacterial masks, activated carbon masks and high-efficiency filter masks (such as: N95 masks). Discussed here for activated carbon masks, activated carbon masks Generally comprising a second protective layer and one activated carbon filter layer disposed between the two protective layers, and then bonding the two protective layers and the activated carbon filter layer, but the plurality of activated carbon particles sandwiching the activated carbon filter layer between the two protective layers, The activated carbon particles often fail to completely bond the two protective layers, so that the activated carbon particles will leak from the two protective layers, and the user may easily contaminate the activated carbon particles to cause dirt and even contaminate the process environment and equipment. Can not be used in environments that require high cleanliness (eg, clean rooms). Or an inactive carbon filter layer is disposed between the two protective layers, but the thickness of the inactive carbon filter layer is too thick, and the two protective layers may not be completely joined. In order to reduce the above problems, it is necessary to reduce the density of the activated carbon particles or the thickness of the filter layer, thereby reducing the service life of the mask.

本發明針對上述習知技術之缺點進行改良,而提供一種口罩結構,其主要縮小主過濾層之面積,而使主過濾層不會位於口罩結構之接合處,以避免有上述問題產生,進而降低口罩結構之製造成本,也能提升口罩結構之生產效率及產量。然於口罩結構之接合處更設有一阻隔件,以使口罩結構之內外空氣均只從主過濾層通過,也表示口罩結構之內外空氣均經主過濾層過濾,並不會有未經過濾之空氣進入口罩結構內,也避免外部之汙染微粒、細菌或病毒可進入至口罩結構,另可避免口罩結構內部所產生之細菌或病毒傳播至其外部。 The present invention is directed to an improvement of the above-described disadvantages of the prior art, and provides a mask structure which mainly reduces the area of the main filter layer so that the main filter layer is not located at the joint of the mask structure to avoid the above problems and thereby reduce The manufacturing cost of the mask structure can also increase the production efficiency and output of the mask structure. However, a barrier member is further disposed at the joint of the mask structure, so that the air inside and outside the mask structure only passes through the main filter layer, and also indicates that the air inside and outside the mask structure is filtered through the main filter layer, and there is no unfiltered. Air enters the mask structure and also prevents external contamination particles, bacteria or viruses from entering the mask structure, and prevents bacteria or viruses inside the mask structure from spreading to the outside.

本發明之目的,在於提供一種口罩結構,其具有一主過濾層,主過濾層之面積小於口罩結構之一口罩本體的面積,以避免口罩本體之周緣沾有主過濾層之濾材而無法密合,也可避免主過濾層之濾材從口罩結構漏出。 The object of the present invention is to provide a mask structure having a main filter layer, the area of the main filter layer being smaller than the area of the mask body of the mask structure, so as to prevent the peripheral edge of the mask body from being stained with the filter material of the main filter layer and not being able to be closely adhered. It is also possible to prevent the filter material of the main filter layer from leaking out of the mask structure.

本發明之目的,在於提供一種口罩結構,其具有阻隔件,阻隔件連接於口罩本體之周緣,以導引口罩結構之內外部氣體僅從主過濾層通過,以防止口罩結構之含有污染微粒、細菌或病毒之內外部空氣未經主過濾層過濾而傳入口罩結構之內部及外部。 It is an object of the present invention to provide a mask structure having a barrier member connected to a peripheral edge of the mask body to guide the inside and outside of the mask structure to pass only from the main filter layer to prevent the mask structure from containing contaminating particles. The external air inside the bacteria or virus is filtered through the main filter layer and transmitted to the inside and outside of the inlet cover structure.

本發明之目的,在於提供一種口罩結構,其具有阻隔件,可增加主過濾層之濾材的密度,以增加口罩結構之使用壽命;其也可應用於為厚重材質之主過濾層。 It is an object of the present invention to provide a mask structure having a barrier member that increases the density of the filter material of the primary filter layer to increase the useful life of the mask structure; it can also be applied to a primary filter layer of heavy material.

本發明為一種口罩結構,其包含:一第一口罩本體;一主過濾層,其設置於該第一口罩本體,該主過濾層之面積小於該第一口罩本體之面積;一阻隔件,其設置於該第一口罩本體,並與該主過濾層之邊緣相鄰;以及一第二口罩本體,其與該阻隔件及該第一口罩本體接合。 The present invention is a mask structure comprising: a first mask body; a main filter layer disposed on the first mask body, the area of the main filter layer being smaller than the area of the first mask body; a barrier member And disposed on the first mask body adjacent to an edge of the main filter layer; and a second mask body engaged with the barrier member and the first mask body.

1‧‧‧口罩結構 1‧‧‧ mask structure

10‧‧‧第一口罩本體 10‧‧‧First mask body

101‧‧‧過濾區 101‧‧‧Filter zone

102‧‧‧接合區 102‧‧‧ junction area

11‧‧‧主過濾層 11‧‧‧Main filter layer

12‧‧‧阻隔件 12‧‧‧Resistance

121‧‧‧第一環狀部 121‧‧‧First ring

122‧‧‧第二環狀部 122‧‧‧second ring

1221‧‧‧第一阻隔片 1221‧‧‧First barrier

1222‧‧‧第二阻隔片 1222‧‧‧Second barrier

13‧‧‧第二口罩本體 13‧‧‧Second mask body

131‧‧‧過濾區 131‧‧‧Filter zone

132‧‧‧接合區 132‧‧‧ junction area

133‧‧‧親膚層 133‧‧‧ skin layer

14‧‧‧次過濾層 14‧‧‧ filter layers

第一圖:其為本發明之第一實施例之口罩結構之示意圖;第二圖:其為本發明之第一實施例之口罩結構之組裝圖;第三圖:其為本發明之第一實施例之口罩結構之使用狀態圖;第四圖:其為本發明之第二實施例之口罩結構之使用狀態圖;以及第五圖:其為本發明之第三實施例之口罩結構之使用狀態圖。 1 is a schematic view showing a structure of a mask according to a first embodiment of the present invention; FIG. 2 is an assembled view of a mask structure according to a first embodiment of the present invention; and FIG. 3 is the first embodiment of the present invention; A state of use of the mask structure of the embodiment; a fourth diagram: a state of use of the mask structure of the second embodiment of the present invention; and a fifth diagram: the use of the mask structure of the third embodiment of the present invention State diagram.

為對本發明之特徵及所達成之功效有更進一步之瞭解與認識,謹佐以實施例及配合詳細之說明,說明如後:請參閱第一圖及第二圖,其為本發明之第一實施例之口罩結構的 示意圖及組裝圖;如圖所示,本實施例提供一種口罩結構1,其包含一第一口罩本體10、一主過濾層11、一阻隔件12與一第二口罩本體13,其中第一口罩本體10、主過濾層11及第二口罩本體13均為透氣材質,而阻隔件12為非透氣材質。主過濾層11設置於第一口罩本體10,其面積小於第一口罩本體10之面積。主過濾層11可包含殺菌材料或吸附材料,或者厚度大於1mm的厚重材質,本實施例之主過濾層11包含複數個活性碳顆粒之吸附材料。阻隔件12設置於第一口罩本體10,其為一環狀體,阻隔件12之內周緣與主過濾層11之邊緣相疊合。第二口罩本體13覆蓋於主過濾層11及阻隔件12,然利用熱壓或超音波熔接第二口罩本體13、阻隔件12及第一口罩本體10,以形成口罩結構1。 In order to further understand and understand the features of the present invention and the achievable effects, the following is a description of the embodiments and the detailed description, as follows: Please refer to the first figure and the second figure, which is the first of the present invention. Embodiment of the mask structure As shown in the figure, the present embodiment provides a mask structure 1 including a first mask body 10, a main filter layer 11, a barrier member 12 and a second mask body 13, wherein the first mask The main body 10, the main filter layer 11 and the second mask body 13 are both breathable materials, and the barrier member 12 is a non-breathable material. The main filter layer 11 is disposed on the first mask body 10 and has an area smaller than that of the first mask body 10. The main filter layer 11 may comprise a germicidal material or an adsorbent material, or a thick material having a thickness of more than 1 mm. The main filter layer 11 of the present embodiment comprises a plurality of adsorbent materials of activated carbon particles. The barrier member 12 is disposed on the first mask body 10, which is an annular body, and the inner circumference of the barrier member 12 is overlapped with the edge of the main filter layer 11. The second mask body 13 covers the main filter layer 11 and the barrier member 12, and then the second mask body 13, the barrier member 12 and the first mask body 10 are welded by hot pressing or ultrasonic to form the mask structure 1.

換言之,可將本實施例之口罩結構1的第一口罩本體10及第二口罩本體13分別分為一過濾區101、131及環繞過濾區101、131之一接合區102、132,第一口罩本體10之過濾區101對應第二口罩本體13之過濾區131,第一口罩本體10之接合區102亦與第二口罩本體13之接合區132相對應。主過濾層11位於第一口罩本體10之過濾區101及第二口罩本體13之過濾區131內,如此主過濾層11之面積小於第一口罩本體10及第二口罩本體13之面積。 In other words, the first mask body 10 and the second mask body 13 of the mask structure 1 of the present embodiment can be respectively divided into a filter area 101, 131 and one of the joint areas 102, 132 surrounding the filter areas 101, 131, the first mask The filter zone 101 of the body 10 corresponds to the filter zone 131 of the second mask body 13, and the joint zone 102 of the first mask body 10 also corresponds to the joint zone 132 of the second mask body 13. The main filter layer 11 is located in the filter zone 101 of the first mask body 10 and the filter zone 131 of the second mask body 13, such that the area of the main filter layer 11 is smaller than the area of the first mask body 10 and the second mask body 13.

請一併參閱第三圖,然阻隔件12包含一第一環狀部121及一第二環狀部122,第二環狀部122設置於第一環狀部121之內側,阻隔件12之外周緣位於第一環狀部121,阻隔件12之內周緣位於第二環狀部122。第一環狀部121位於第一口罩本體10之接合區102及第二口罩本體13之接合區132內,第二環狀部122位於二過濾區101、131內,如此阻隔件12之內周緣與主過濾層11之邊緣相疊合 。於本實施例中,阻隔件12之第二環狀部122位於第一口罩本體10與主過濾層11之間,當然阻隔件12之第二環狀部122也可位於第二口罩本體13與主過濾層11之間,如第四圖所示。 Referring to the third figure, the blocking member 12 includes a first annular portion 121 and a second annular portion 122. The second annular portion 122 is disposed inside the first annular portion 121, and the blocking member 12 is The outer circumference is located at the first annular portion 121, and the inner circumference of the barrier member 12 is located at the second annular portion 122. The first annular portion 121 is located in the joint region 102 of the first mask body 10 and the joint region 132 of the second mask body 13, and the second annular portion 122 is located in the two filter regions 101, 131, such that the inner circumference of the barrier member 12 Superimposed on the edge of the main filter layer 11 . In this embodiment, the second annular portion 122 of the blocking member 12 is located between the first mask body 10 and the main filter layer 11, and of course, the second annular portion 122 of the blocking member 12 can also be located between the second mask body 13 and Between the main filter layers 11, as shown in the fourth figure.

然阻隔件12之第一環狀部121連接第一口罩本體10之接合區102及第二口罩本體13之接合區132,而阻隔件12之第二環狀部122及主過濾層11未位於第一口罩本體10、阻隔件12及第二口罩本體13之接合處。 The first annular portion 121 of the barrier member 12 is connected to the joint region 102 of the first mask body 10 and the joint region 132 of the second mask body 13, and the second annular portion 122 of the barrier member 12 and the main filter layer 11 are not located. The joint of the first mask body 10, the barrier member 12 and the second mask body 13.

由上述可知,本實施例之口罩結構1的主過濾層11之面積小於第一口罩本體10及第二口罩本體13之面積,主過濾層11完全位於第一口罩本體10與第二口罩本體13內,並不會位於第一口罩本體10、阻隔件12與第二口罩本體13之接合處,所以第一口罩本體10、阻隔件12與第二口罩本體13間之接合處不會因沾有主過濾層11之複數個活性碳顆粒而無法透過熱壓或超音波熔接密合。若主過濾層11為含有殺菌材料或厚度大於1mm之厚重材質時,也適用於本實施例之口罩結構1,即表示因主過濾層11未位於第一口罩本體10、阻隔件12與第二口罩本體13間之接合處,接合處不會因沾有主過濾層11之濾材或因主過濾層11之厚度過厚而無法透過熱壓或超音波熔接密合。 As can be seen from the above, the area of the main filter layer 11 of the mask structure 1 of the present embodiment is smaller than the area of the first mask body 10 and the second mask body 13, and the main filter layer 11 is completely located at the first mask body 10 and the second mask body 13. Therefore, it is not located at the joint of the first mask body 10, the barrier member 12 and the second mask body 13, so that the joint between the first mask body 10, the barrier member 12 and the second mask body 13 is not contaminated. The plurality of activated carbon particles of the main filter layer 11 cannot be adhered by heat pressing or ultrasonic welding. If the main filter layer 11 is a heavy material containing a sterilizing material or a thickness of more than 1 mm, it is also applicable to the mask structure 1 of the present embodiment, that is, because the main filter layer 11 is not located in the first mask body 10, the barrier member 12 and the second At the joint between the mask bodies 13, the joints are not in contact with the filter material of the main filter layer 11 or because the thickness of the main filter layer 11 is too thick to be intimately bonded by hot pressing or ultrasonic welding.

因第一口罩本體10、阻隔件12與第二口罩本體13間之接合處可密合,於口罩結構1使用時,主過濾層11之該些個活性碳顆粒或其他濾材也不會從第一口罩本體10與第二口罩本體13之接合處漏出而弄髒使用者及使用者所在的環境;或者於口罩結構1製造時汙染製造設備及環境,以有效提高生產效率及生產量。本實施例之口罩結構1也因主過濾層11之面積小於第一口罩本體10及第二口 罩本體13之面積,也使口罩結構1之製造成本降低。同時,本實施例之口罩結構1之主過濾層11之殺菌材料或吸附材料之密度可增加,有效增加口罩結構1之使用壽命。 Since the joint between the first mask body 10, the barrier member 12 and the second mask body 13 is tight, when the mask structure 1 is used, the activated carbon particles or other filter materials of the main filter layer 11 are not from the first The joint between the mask body 10 and the second mask body 13 leaks out to contaminate the environment in which the user and the user are located; or the manufacturing equipment and environment are contaminated during the manufacture of the mask structure 1 to effectively improve production efficiency and throughput. The mask structure 1 of the present embodiment is also smaller than the first mask body 10 and the second port due to the area of the main filter layer 11 The area of the cover body 13 also reduces the manufacturing cost of the mask structure 1. At the same time, the density of the sterilizing material or the adsorbing material of the main filter layer 11 of the mask structure 1 of the present embodiment can be increased, thereby effectively increasing the service life of the mask structure 1.

請一併參閱第三圖,其為本發明之第一實施例之口罩結構的使用狀態圖;如圖所示,使用者配戴本實施例之口罩結構1,當使用者吸氣時,口罩結構1之外部空氣會進入口罩結構1內,因口罩結構1具有非透氣材質之阻隔件12,外部空氣無法穿透阻隔件12,其沿著阻隔件12進入第一口罩本體10之過濾區101,即阻隔件12導引外部空氣僅從第一口罩本體10之過濾區101進入,並通過主過濾層11,再由第二口罩本體13之過濾區131進入口罩結構1之內部,尤其阻隔件12之內周緣與主過濾層11之邊緣相疊合,如此外部空氣不會從阻隔件12與主過濾層11間之間隙通過,即表示外部空氣並不會經過主過濾層11以外之區域,使外部空氣都可被主過濾層11過濾。當然使用者於口罩結構1內呼出之空氣也僅依序從第二口罩本體13之過濾區131、主過濾層11及第一口罩本體10之過濾區101排出,於此不再贅述。 Please refer to the third figure, which is a state of use of the mask structure according to the first embodiment of the present invention; as shown in the figure, the user wears the mask structure 1 of the embodiment, and when the user inhales, the mask The outside air of the structure 1 enters the mask structure 1 because the mask structure 1 has a barrier member 12 of a non-breathable material, and the outside air cannot penetrate the barrier member 12, and enters the filter region 101 of the first mask body 10 along the barrier member 12. That is, the barrier member 12 guides the outside air to enter only from the filter zone 101 of the first mask body 10, and passes through the main filter layer 11, and then enters the interior of the mask structure 1 by the filter zone 131 of the second mask body 13, in particular, the barrier member. The periphery of 12 overlaps the edge of the main filter layer 11, so that the outside air does not pass through the gap between the barrier member 12 and the main filter layer 11, that is, the outside air does not pass through the region other than the main filter layer 11, The outside air can be filtered by the main filtration layer 11. Of course, the air exhaled by the user in the mask structure 1 is only sequentially discharged from the filter zone 131 of the second mask body 13 , the main filter layer 11 and the filter zone 101 of the first mask body 10 , and details are not described herein.

本實施例之口罩結構1為立體口罩結構1,所以本實施例之第一口罩本體10、主過濾層11、阻隔件12及第二口罩本體13本為平面的。當第一口罩本體10、主過濾層11、阻隔件12及第二口罩本體13組裝完成時,再放置第一口罩本體10、主過濾層11、阻隔件12及第二口罩本體13於一立體模具上進行壓製,以形成立體口罩結構1。當然第一口罩本體10、主過濾層11、阻隔件12及第二口罩本體13於組裝前可直接為立體的,如此第一口罩本體10、主過濾層11、阻隔件12及第二口罩本體13直接組裝即可形成立體口罩結構 1。然口罩結構1也可為平面口罩,於此不再贅述。 The mask structure 1 of the present embodiment is a three-dimensional mask structure 1. Therefore, the first mask body 10, the main filter layer 11, the barrier member 12 and the second mask body 13 of the present embodiment are planar. When the first mask body 10, the main filter layer 11, the barrier member 12 and the second mask body 13 are assembled, the first mask body 10, the main filter layer 11, the barrier member 12 and the second mask body 13 are placed in a three-dimensional manner. The mold is pressed to form a three-dimensional mask structure 1. Of course, the first mask body 10, the main filter layer 11, the barrier member 12 and the second mask body 13 can be directly three-dimensional before assembly, such that the first mask body 10, the main filter layer 11, the barrier member 12 and the second mask body 13 direct assembly can form a three-dimensional mask structure 1. The mask structure 1 can also be a flat mask, which will not be described here.

再者,本實施例之第一口罩本體10為一保護層,以避免主過濾層11受到汙染。本實施例之第二口罩本體13為一親膚層,以避免使用者配戴口罩結構1時產生皮膚過敏之問題,同時也提升配戴口罩結構1時之舒適度。本實施例之阻隔件12之材質可選自塑膠、橡膠、金屬或其他不透氣材質,其中塑膠材質又可為(PET)、聚丙烯(PP)或聚乙烯(PE)。上述第一口罩本體10及第二口罩本體13之結構及阻隔件12之材質僅為本發明之一實施例,應不以此為限。(PET)、聚丙烯(PP)或聚乙烯(PE)。上述第一口罩本體10及第二口罩本體13之結構及阻隔件12之材質僅為本發明之一實施例,應不以此為限。 Furthermore, the first mask body 10 of the present embodiment is a protective layer to prevent the main filter layer 11 from being contaminated. The second mask body 13 of the present embodiment is a skin-friendly layer to avoid the problem of skin allergies when the user wears the mask structure 1, and also improves the comfort when the mask structure 1 is worn. The material of the barrier member 12 of this embodiment may be selected from plastic, rubber, metal or other gas-impermeable materials, wherein the plastic material may be (PET), polypropylene (PP) or polyethylene (PE). The structure of the first mask body 10 and the second mask body 13 and the material of the barrier member 12 are only one embodiment of the present invention, and should not be limited thereto. (PET), polypropylene (PP) or polyethylene (PE). The structure of the first mask body 10 and the second mask body 13 and the material of the barrier member 12 are only one embodiment of the present invention, and should not be limited thereto.

請參閱第五圖,其為本發明之第三實施例之口罩結構的使用狀態圖;如圖所示,上述實施例之阻隔件12的第一環狀部121及第二環狀部122均為單層結構,本實施例之阻隔件12的第二環狀部122為雙層結構,即具有一第一阻隔片1221及一第二阻隔片1222,如此第二環狀部122之第一阻隔片1221及第二阻隔片1222可夾住主過濾層11之邊緣,第一阻隔片1221位於第一口罩本體10與主過濾層11之間,第二阻隔片1222位於主過濾層11與第二口罩本體13之間。本實施例之阻隔件12之功效與上述實施例相同,僅在於結構上之不同。 Referring to FIG. 5, it is a view showing a state of use of the mask structure according to the third embodiment of the present invention; as shown in the figure, the first annular portion 121 and the second annular portion 122 of the barrier member 12 of the above embodiment are both The second annular portion 122 of the barrier member 12 of the present embodiment has a two-layer structure, that is, a first barrier piece 1221 and a second barrier piece 1222, such that the second annular portion 122 is first. The barrier sheet 1221 and the second barrier sheet 1222 can sandwich the edge of the main filter layer 11, the first barrier sheet 1221 is located between the first mask body 10 and the main filter layer 11, and the second barrier sheet 1222 is located at the main filter layer 11 and Between the two mask bodies 13. The effect of the barrier member 12 of the present embodiment is the same as that of the above embodiment, only in terms of structural differences.

此外,本實施例更包含一次過濾層14,次過濾層14設置於親膚層133與主過濾層11之間,本實施例之次過濾層14為一粉塵過濾層,以過濾未經主過濾層11過濾之粉塵微粒,避免粉塵微粒進入口罩結構1內。上述次過濾層14也會更換為靜電層,靜電層可吸附 未經主過濾層11過濾之汙染微粒,以避免汙染微粒進入口罩結構1內。當然也可於口罩結構1內設置二次過濾層14,即同時設置粉塵過濾層及靜電層於口罩結構1內,其功效已於上述揭示,於此不再贅述。 In addition, the present embodiment further includes a primary filter layer 14 disposed between the skin-friendly layer 133 and the primary filter layer 11. The secondary filter layer 14 of the present embodiment is a dust filter layer for filtering without primary filtration. The layer 11 filters the dust particles to prevent the dust particles from entering the mask structure 1. The secondary filter layer 14 is also replaced with an electrostatic layer, and the electrostatic layer can be adsorbed. The contaminating particles are not filtered by the main filter layer 11 to prevent contaminating particles from entering the mask structure 1. Of course, the secondary filter layer 14 can also be disposed in the mask structure 1, that is, the dust filter layer and the electrostatic layer are disposed in the mask structure 1 at the same time, and the effect thereof has been disclosed above, and details are not described herein again.

綜上所述,本發明提供一種口罩結構,其主過濾層設置於第一口罩本體及第二口罩本體之間,因主過濾層之面積小於第一口罩本體及第二口罩本體之面積,所以其位於第一口罩本體及第二口罩本體之二過濾區內,有效降低口罩結構之成本,然阻隔件設置於第一口罩本體及第二口罩本體之間,並位於第一口罩本體及第二口罩本體之二接合區。因此主過濾層未位於第一口罩本體及第二口罩本體之二接合區上,可以避免因主過濾層之濾材及其厚度影響第一口罩本體、阻隔件及第二口罩本體之接合,也可避免主過濾層之濾材從第一口罩本體與第二口罩本體之接合處漏出。 In summary, the present invention provides a mask structure in which a main filter layer is disposed between a first mask body and a second mask body. Since the area of the main filter layer is smaller than the area of the first mask body and the second mask body, The utility model is disposed in the two filter areas of the first mask body and the second mask body, thereby effectively reducing the cost of the mask structure, wherein the barrier member is disposed between the first mask body and the second mask body, and is located at the first mask body and the second The two joint areas of the mask body. Therefore, the main filter layer is not located on the two joint areas of the first mask body and the second mask body, thereby avoiding the influence of the filter material of the main filter layer and the thickness thereof on the joint of the first mask body, the barrier member and the second mask body. The filter material of the main filter layer is prevented from leaking from the joint of the first mask body and the second mask body.

再者,阻隔件可防止口罩結構之內外空氣從主過濾層以外之區域通過,換言之,口罩結構之內外空氣均從主過濾層通過及過濾,有效防止外部空氣之污染微粒、細菌或病毒進入至口罩結構內而被使用者吸入,同時也防止口罩結構內含有之污染微粒、細菌或病毒傳播至口罩結構外。此外,本發明之口罩結構可使用高密度之主過濾層或為厚重材質之主過濾層,有效提升本發明之口罩結構的使用壽命。 Furthermore, the barrier member prevents the air inside and outside the mask structure from passing through the area outside the main filter layer. In other words, the air inside and outside the mask structure passes through and filters from the main filter layer, effectively preventing the external air from contaminating particles, bacteria or viruses. The mask structure is inhaled by the user while also preventing the spread of contaminating particles, bacteria or viruses contained in the mask structure from outside the mask structure. In addition, the mask structure of the present invention can use a high-density main filter layer or a heavy-weight main filter layer to effectively improve the service life of the mask structure of the present invention.

故本發明實為一具有新穎性、發明性及可供產業上利用者,應符合我國專利法專利申請要件無疑,爰依法提出發明專利申請,祈鈞局早日賜至准專利,至感為禱。 Therefore, the present invention is novel, inventive, and available for industrial use. It should be in accordance with the patent application requirements of China's patent law. Undoubtedly, the invention patent application is filed according to law, and the prayer bureau will grant the patent as soon as possible. .

惟以上所述者,僅為本發明一實施例而已,並非用來限定本發明實施之範圍,故舉凡依本發明申請專利範圍所述之形狀、構造、特徵及精神所為之均等變化與修飾,均應包括於本發明之申請專利範圍內。 The above is only an embodiment of the present invention, and is not intended to limit the scope of the present invention, so that the shapes, structures, features, and spirits described in the claims of the present invention are equally changed and modified. All should be included in the scope of the patent application of the present invention.

1‧‧‧口罩結構 1‧‧‧ mask structure

10‧‧‧第一口罩本體 10‧‧‧First mask body

11‧‧‧主過濾層 11‧‧‧Main filter layer

12‧‧‧阻隔件 12‧‧‧Resistance

13‧‧‧第二口罩本體 13‧‧‧Second mask body

Claims (13)

一種口罩結構,其包含:一第一口罩本體;一主過濾層,其設置於該第一口罩本體,該主過濾層之面積小於該第一口罩本體之面積;一阻隔件,其設置於該第一口罩本體,該阻隔件之內周緣與該主過濾層之邊緣相疊合;以及一第二口罩本體,其與該阻隔件及該第一口罩本體接合;其中該第一口罩本體及該第二口罩本體分別具有一過濾區及一接合區,該第一口罩本體之該過濾區對應該第二口罩本體之該過濾區,該第一口罩本體之該接合區對應該第二口罩本體之該接合區,該主過濾層位於該二過濾區內,該阻隔件連接該第一口罩本體之該接合區及該第二口罩本體之該接合區。 A mask structure comprising: a first mask body; a main filter layer disposed on the first mask body, the main filter layer has an area smaller than an area of the first mask body; and a barrier member disposed on the a first mask body, an inner circumference of the barrier member is overlapped with an edge of the main filter layer; and a second mask body engaged with the barrier member and the first mask body; wherein the first mask body and the first mask body The second mask body has a filter area and a joint area. The filter area of the first mask body corresponds to the filter area of the second mask body, and the joint area of the first mask body corresponds to the second mask body. In the joint zone, the main filter layer is located in the two filter zones, and the barrier member connects the joint zone of the first mask body and the joint zone of the second mask body. 如申請專利範圍第1項所述之口罩結構,其中該第一口罩本體係包含一保護層。 The mask structure of claim 1, wherein the first mask system comprises a protective layer. 如申請專利範圍第1項所述之口罩結構,其中該第二口罩本體係包含一親膚層。 The mask structure of claim 1, wherein the second mask system comprises a skin-friendly layer. 如申請專利範圍第3項所述之口罩結構,其中該第二口罩本體更包含至少一次過濾層,該至少一次過濾層位於該親膚層與該主過濾層之間。 The mask structure of claim 3, wherein the second mask body further comprises at least one filter layer, the at least one filter layer being located between the skin layer and the main filter layer. 如申請專利範圍第4項所述之口罩結構,其中該至少一次過濾層包含一粉塵過濾層或一靜電層。 The mask structure of claim 4, wherein the at least one filter layer comprises a dust filter layer or an electrostatic layer. 如申請專利範圍第4項所述之口罩結構,其中該至少一次過濾層包含一粉塵過濾層及一靜電層。 The mask structure of claim 4, wherein the at least one filter layer comprises a dust filter layer and an electrostatic layer. 如申請專利範圍第1項所述之口罩結構,其中該阻隔件之材質係選自橡膠、塑膠、金屬或其他不透氣之材質。 The mask structure of claim 1, wherein the material of the barrier member is selected from the group consisting of rubber, plastic, metal or other airtight material. 如申請專利範圍第1項所述之口罩結構,其中該主過濾層包含殺菌材料或吸附材料。 The mask structure of claim 1, wherein the main filter layer comprises a germicidal material or an adsorbent material. 如申請專利範圍第8項所述之口罩結構,其中該吸附材料為複數個活性碳顆粒。 The mask structure of claim 8, wherein the adsorbent material is a plurality of activated carbon particles. 如申請專利範圍第1項所述之口罩結構,其中該阻隔件包含:一第一環狀部,其位於該二接合區內;以及一第二環狀部,其設置於該第一環狀部之內側,並位於該二過濾區內。 The mask structure of claim 1, wherein the barrier member comprises: a first annular portion located in the two joint regions; and a second annular portion disposed in the first annular shape The inside of the part is located in the two filtering zone. 如申請專利範圍第10項所述之口罩結構,其中該第二環狀部位於該第一口罩本體與該主過濾層之間。 The mask structure of claim 10, wherein the second annular portion is located between the first mask body and the main filter layer. 如申請專利範圍第10項所述之口罩結構,其中該第二環狀部位於該第二口罩本體與該主過濾層之間。 The mask structure of claim 10, wherein the second annular portion is located between the second mask body and the main filter layer. 如申請專利範圍第10項所述之口罩結構,其中該第二環狀部具有一第一阻隔片及一第二阻隔片,該第一阻隔片位於該第一口罩本體與該主過濾層之間,該第二阻隔片位於該第二口罩本體與該主過濾層之間。 The mask structure of claim 10, wherein the second annular portion has a first barrier sheet and a second barrier sheet, the first barrier sheet being located between the first mask body and the main filter layer The second barrier sheet is located between the second mask body and the main filter layer.
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TWI650154B (en) * 2017-08-08 2019-02-11 研能科技股份有限公司 Air-filtering protector

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CN120836838A (en) * 2024-04-25 2025-10-28 林净植 Mask structure with nose pad

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Publication number Priority date Publication date Assignee Title
TWI650154B (en) * 2017-08-08 2019-02-11 研能科技股份有限公司 Air-filtering protector

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