TWI590285B - An ion source with vaporizer - Google Patents

Description

Ion source with evaporator

The present invention relates to an ion source, and more particularly to an ion source having a vaporizer that uses a thermal insulator to reduce heat loss and/or use a radiation mask having high thermal conductivity to conduct heat, such that The temperature distribution within the evaporator can be more uniform, and in particular relates to an ion source having an evaporator that uses a hollow diffuser having a plurality of openings to transfer the vaporized material from the vessel in the evaporator to the arc chamber .

Ion implantation is a must-have but expensive process for modern component fabrication techniques, such as semiconductor component fabrication or planar panel fabrication techniques. Ion implantation is primarily used to dope a chemically active material into a workpiece such as a semiconductor material that is typically tantalum. In most cases there are no other processes that can replace ion implantation. Ion implantation also has an increasing trend in other applications, such as the definition of critical areas on components and the control of dopant mobility within the workpiece.

At present, the ion implanter in mainstream use is a beam-line type ion implanter, wherein the plasma is generated and maintained in an arc chamber, and a large amount of ions are continuously extracted from the arc chamber. It is then adjusted to an ion beam of the desired type of ion before the workpiece is implanted. It is apparent that as ions are continuously withdrawn from the arc chamber, materials having the desired species of ions must be continuously supplied to the arc chamber to maintain the plasma.

In general, when a gaseous state material having a particular type of ion is present at room temperature, in order to simplify the hardware and operation, the gaseous state material is stored outside the arc chamber and then transferred to the arc chamber, so that one has The plasma of a particular type of ion can be maintained. For example, phosphine (PH3) gas which is widely used for supplying phosphorus, arsine (AsH3) gas which is widely used for supplying arsenic, and boron trifluoride (BF) which is widely used for supplying boron 3) Gas. However, for some other special types of ions, there are no gaseous state materials available, at least no commercial gas state materials. For example, bismuth (Sb), indium (In), and aluminum (Al) are valuable materials for semiconductor processes, but there are no commercially available gas state materials. For example, the implantation of these elemental materials is a new development topic, but most of these elemental materials exist in the form of compounds, such as metal oxides at room temperature.

It is very common that when a particular type of ion is not available from a gaseous state material at room temperature, an evaporator adjacent to an arc chamber is widely used to carry a solid or liquid material having this particular type of ion such that it has evaporated. Material can be transferred from the evaporator to a nearby arc chamber.

Figure 1A shows a common ion source structure. An evaporator 10 is disposed adjacent an arc chamber 16 and has a housing 11, a container 12 and a channel member 13. The container 12, such as a box or a tubular container, is located within the outer casing 11 and is used to store solid or liquid material to be vaporized, while the channel member 13, such as a nozzle and/or metal tube having an opening, is mechanically coupled. To the container 12, the evaporated material can be transferred from the container 12 to the arc chamber 16 via the channel member 13. Since the temperature of the arc chamber is typically at least a few hundred degrees Celsius, and since the distance between the arc chamber 16 and the outer casing 11 is not far, the arc chamber 16 acts as a heat source, providing thermal energy into the container 12 to vaporize the stored material. Please note that the evaporation temperature of a material can range from less than 50 degrees Celsius to more than one thousand degrees Celsius.

The first B diagram shows another common ion source structure. An evaporator 10 has a housing 11, a container 12, a channel member 13 and a heater 14. A container 12, such as a box or a tubular container, is located within the outer casing 11 and is used to store solid or liquid material to be evaporated. Since the outer casing 11 is in direct contact with the arc chamber 16, the evaporated material can be directly transferred to the arc chamber 16. A heater 14, such as an oven or some heating coil, is located within the outer casing 11 adjacent the container 12 to heat the solid or liquid material stored in the container 12. The material to be evaporated in this structure is heated by at least the heater 14. Therefore, when the temperature of the heater 14 is sufficiently high, the material having an evaporation temperature higher than the temperature of the arc chamber 16 can be evaporated by the heater 14.

There are still other common ion source structures. For example, as shown in FIG. C, an alternative ion source configuration is a combination of a first A map and a first B graph ion source structure, wherein the outer casing 11 is separated from the arc chamber 16 but still adjacent to the arc chamber 16 And the channel element 13 is used to connect the arc chamber 16 to the vessel 12 heated by the heater 14 in the outer casing 11. For example, as shown in FIG. D, an alternative ion source configuration is changed such that a thermal shield 15 is disposed between the arc chamber 16 and the outer casing 11 to block at least a portion of the thermal radiation from the arc chamber 16, and primarily The material stored in the container 12 is heated by the heater 14.

Nevertheless, the above ion source structure still has some disadvantages.

First, different materials usually have different evaporation temperatures, and even different materials containing the same kind of ions have different evaporation temperatures, but the temperature of the arc chamber 16 is usually not particularly adjustable to the required evaporation temperature, because this temperature inevitably affects the arc chamber. The plasma, in turn, inevitably affects the amount of ions taken from the plasma. Thus, evaporation of material, such as the rate of evaporation of material within the vessel 12, is generally not optimized when the arc chamber 16 is a heat source, whether or not the heater 14 acts as a heat source, even though the heat shield 15 is used to reduce the effects of the arc chamber 16. .

Second, due to practical limitations, the temperature of the arc chamber may fluctuate, even if the plasma temperature within the arc chamber 16 is not dynamically adjusted to provide ions having different energies/densities. Therefore, the heat energy transferred from the arc chamber 16 to the container 12 is inevitably unstable. In addition, the heat provided by the heater 14 may also be unstable or uneven due to limitations of actual operation. Thus, the evaporation of material within the evaporator 10 and the flow rate of the vaporized material from the evaporator 10 to the arc chamber 16 tend to be unstable, which inevitably affects the plasma within the arc chamber 16.

Third, the evaporated material may condense on the transport path of the vessel 12 to the arc chamber 16 because both ends of the channel member 13 may be indirectly heated by a heat source, such as the arc chamber 16 and the heater 14.

Fourth, the heat dissipated from the container 12 is generally not uniform, or even somewhat uncontrollable, due to the limitations of the actual structure of the container 12, the outer casing 11 and other portions of the evaporator 10. Therefore, not only is the evaporation rate of the material in the container 12 lowered due to heat dissipation, but the evaporation rate of the material in the container 12 is also uneven. Therefore, the function of the evaporator 10 is attenuated due to actual heat dissipation.

Fifth, the distribution of the material to be evaporated in the container 12 may also be uneven, particularly the relative geometric relationship between the distribution of the storage material and the channel member 13. Therefore, the generation of vaporized material in the gaseous state may also be uneven.

Sixth, the use of an evaporator inevitably increases the cost and complexity of the ion source, especially when certain parts of the evaporator can be replaced when different materials are used.

Therefore, there is a need to develop a novel ion source evaporator to more efficiently and more stably evaporate materials and transport evaporated materials.

The present invention provides an ion source having an evaporator for an ion implanter, wherein the evaporator is arranged to adjust how the material stored therein is evaporated by heating and how the material being evaporated is transported. The evaporator may use one or more of the following methods: the thermal insulator is disposed adjacent to at least a portion of the container, the thermal insulator surrounds the container and the heater to heat the container, and the radiation mask having a high thermal conductivity is disposed outside the outer casing or even Evaporating material on the transport path.

Some preferred embodiments of the invention relate to an ion source having an evaporator wherein one or more thermal insulators are disposed adjacent to the container and/or housing. Thus, these embodiments can reduce the amount of thermal energy lost from the container or housing to increase the rate of evaporation of the material to be evaporated stored in the container as compared to conventional heatless insulators disposed adjacent to or at least adjacent to the outer casing. Moreover, when the heat source is typically located near a particular portion of the container, the temperature difference within the container can be reduced by providing a thermal insulator adjacent to other portions of the container. Here, the thermal insulator is not limited to whether it is in direct contact with the container. In fact, the number and geometric distribution of thermal insulators, and even other relevant parameters, are optional and should be determined by different practical designs.

Some preferred embodiments of the invention relate to an ion source having an evaporator wherein one or more thermal insulators are disposed to surround the container simultaneously with the heater for heating the container. Thus, these embodiments can more flexibly and efficiently heat the container by adjusting the operation of the heater compared to conventional evaporators that only use thermal energy from the arc chamber to heat the vessel and conventional evaporators that only heat the vessel with a heater. The temperature difference within the vessel can be reduced by adjusting the number and distribution of thermal insulators and heaters. Please note that the thermal insulator reduces the amount of heat lost from the heater and then increases the amount of heat transferred from the heater to the vessel, thereby increasing the evaporation of the material to be evaporated stored. Also note that the thermal insulator reduces the heat transfer from the arc chamber to the combination of the vessel and the heater, and then reduces the evaporation disturbance caused by the unstable thermal energy from the arc chamber.

Some preferred embodiments of the present invention relate to an ion source having an evaporator, wherein a hollow channel member is mechanically coupled to the inner space of the outer casing to the arc chamber, and a radiation mask having a high thermal conductivity is disposed adjacent to the outer casing and the passage At least a portion of a combination of components. Thus, since the radiation mask can direct heat through the portion in which the radiation mask is disposed, the temperature difference within the outer casing and/or channel member can be reduced. In particular, because the radiation shield can be placed adjacent to a portion that may not be effectively heated by the arc chamber and/or the container, condensation of the evaporated material within the channel member can be reduced, so that the material to be evaporated within the container can be more efficiently evaporated and Transmission, because the average temperature and temperature distribution within the outer casing is improved, while the transport of evaporated material through the channel elements is more uniform.

The present invention further provides an ion source having an evaporator for efficiently transporting vaporized material into the arc chamber, wherein the arrangement of the evaporator focuses on how the material to be evaporated is placed in the container and how the vaporized material is transported away from the container.

Some preferred embodiments of the invention relate to an ion source having an evaporator, wherein a diffuser is at least partially located within the container, the diffuser being a hollow structure having at least one opening in the container. Thus, the evaporated material within the container can be sequentially diffused through the opening and the interior of the hollow diffuser until it reaches the arc chamber. Reasonably, since the material to be evaporated which is commercially available is usually a powdery material determined by the material supplier rather than the ion implanter supplier, the size and number of openings can be adjusted according to the size and evaporation temperature of the powdered material. . Therefore, the evaporation of the evaporated material can be reduced and the flow rate of the evaporated material can be adjusted. Additionally, the diffuser can have a plate structure that traverses the direction of the diffuser axis and the inner end of the container. Thus, the landside of the stored material within the container can be blocked by the plate structure and the evaporated material can diffuse to the openings in other portions of the diffuser.

10‧‧‧Evaporator

11‧‧‧Shell

12‧‧‧ Container

13‧‧‧channel components

14‧‧‧heater

15‧‧‧Hot mask

16‧‧‧Arc chamber

20‧‧‧Evaporator

21‧‧‧ Shell

22‧‧‧ Container

23‧‧‧Channel components

235‧‧‧Diffuser

24‧‧‧ Thermal Insulators

25‧‧‧heater

26‧‧‧ mask

27‧‧‧Additional mask

28‧‧‧Opening

29‧‧‧Arc chamber

The first to the first D are respectively sectional views of the structure of a conventional conventional ion source evaporator.

The second A and second L views are respectively cross-sectional views of some embodiments of the proposed ion source of the present invention.

The detailed description of the present invention will be discussed by the following examples, which are not intended to limit the scope of the invention, and are applicable to other applications. The drawings disclose some details, and it must be understood that the details of the design of the disclosed elements may differ from those disclosed, unless the features of the elements are explicitly limited.

An ion source according to an embodiment of the present invention is shown in FIGS. 2A and 2B. An evaporator 20 is disposed adjacent to an adjacent arc chamber 29 such that the material to be evaporated in the evaporator 20, whether solid or liquid, It can be vaporized and then transferred into the arc chamber 29 to have a large amount of plasma of the desired species of ions within the arc chamber 29. Further, the evaporator 20 has at least one outer casing 21 adjacent to the arc chamber 29, a container 22 disposed in the outer casing 21 for placing the material to be evaporated, and a passage member 23 for mechanically connecting the container 22 to the arc chamber 29 so that The evaporated material can diffuse from the container 22 through the channel member 23 to the arc chamber 29, and a thermal insulator 24 disposed adjacent to the outer casing 21. Here, the second A diagram shows the case where the thermal insulator 24 directly mechanically contacts the arc chamber 29 with the container 22, and the second B diagram shows the case where the thermal insulator 24 and the container 22 are separated from each other. In addition, both the second A diagram and the second B diagram show the case where one end of the container 22 faces the arc chamber 29 and the other end faces the thermal insulator 24, and both of them show that the thermal insulator 24 is located inside the casing 21.

Reasonably, since the thermal insulator 24 is adjacent to the container 22, the thermal energy exiting the container 22 may be reduced, whether via loss of radiation, loss of conduction, and/or loss of convection. The container 22 overlaps with the thermal insulator 24 The larger the part, the more the loss of heat energy is reduced. The shorter the distance between the container 22 and the thermal insulator 24, the more the loss of thermal energy is reduced. Further, the smaller the thermal conductivity of the thermal insulator 24, the more the loss of thermal energy is reduced. Therefore, by using the thermal insulator 24, the evaporation process of the material to be evaporated in the container 22 can be improved due to the reduction in the total amount of heat energy loss.

Moreover, in order to achieve the use of thermal insulator 24 to reduce thermal energy dissipation and temperature differential, the present invention remains resilient to the details of thermal insulator 24 and also maintains resiliency to the details of the heat source used to heat vessel 22.

For example, in the case shown in the second A and second B, when the thermal insulator 24 is adjacent to the rear end of the container 22 and the front end of the container 22 faces the arc chamber 29, the temperature difference between the two ends of the container 22 may be due to heat. The insulator 24 significantly reduces the loss of thermal energy near the rear end of the container 22 and reduces it. Therefore, the material to be evaporated in the container 22 can be uniformly heated and the evaporation of the material to be evaporated can be more stable.

For example, in some embodiments not shown, when one end of the container 22 faces the arc chamber 29 and the other end is away from the arc chamber 29, the thermal insulator 24 is disposed to surround the entire container 22 or only the side wall of the container 22. Meanwhile, the thermal insulator 24 may be composed of any material having a low thermal conductivity, and the present invention does not limit the material of the thermal insulator 24. Further, when the thermal insulator 24 is mechanically separated from the container 22, the distance between the thermal insulator 24 and the container 22 is an adjustable variable. Meanwhile, when the relative relationship between the thermal insulator 24 and the container 22 is critical, the thermal insulator 24 may be disposed inside and/or outside the outer casing 21.

Moreover, the shape of the container 22 can be selectively varied when the material of the container 22, particularly the material of the outer casing of the container 22, also affects how thermal energy is lost from the container 22. For example, when the thermal insulator 24 is disposed adjacent one end of the container 22, the end of the container 22 can be selected to have a thicker outer casing such that the thermal insulator 24 is in direct contact with the container 22, but the end of the container 22 can also be selected. There is a thinner outer casing to mechanically move the thermal insulator 24 away from the container 22. Here the thickness of the outer casing of the container 22 can affect how the heat is Being conducted away, the distance between the thermal insulator 24 and the outer casing of the container 22 can affect how the thermal energy is radiated away. Variations of different containers 22 may also be selected to balance different thermal energy losses caused by different structures of the ion source and/or different types and/or quantities of material to be evaporated.

For example, in some embodiments not shown, a cylindrical oven may be optionally disposed within the outer casing 21 to heat the container 22 by placing the container 22 in a cylindrical oven, and may also be selected in a cylindrical oven. Some heating coils are mounted on the side walls to heat the vessel 22 by introducing electrical current into the heating coils. The use of a cylindrical oven and a heating coil is advantageous because the container 22 can be precisely heated by elastically adjusting the operational and structural configuration of the cylindrical oven and the heating coil.

Moreover, when the position of the thermal insulator is not limited, when certain portions of the container 22 are closer to the heating source, the temperature difference within the container 22 can be reduced by providing the thermal insulator 24 adjacent to other portions of the container 22. In other words, the evaporation of the material to be evaporated in the vessel 22, such as the rate of evaporation, can be more uniform by using the thermal insulator 24 to reduce heat loss, particularly to reduce heat loss from a portion of the vessel 22 located remotely from the source of heat. Here, the heating source can be an arc chamber 29, the above described oven and heating coil, and/or any commercially available product.

Further, although having the channel member 23 in the case shown in the second A diagram and the second B diagram, the above discussion of the thermal insulator 24 and the heater 25 is not limited by the channel member 23, provided that the channel member 23 cannot be Block. Thus, in some embodiments not shown, the outer casing 21 is in direct contact with the arc chamber 29 and an opening is located between the outer casing 21 and the arc chamber 29 to enable diffusion of the vaporized material. In some embodiments not shown, there are no channel elements 23 and the openings are not blocked by the heater 25 and the thermal insulator 24. In other words, it is possible to choose whether the thermal insulator 24 is adjacent to the opening.

Thus, these embodiments of the present invention have at least some major advantages over conventional ion sources that do not use thermal insulators: when the operation of the heat source is not altered, the temperature difference within the vessel 22 is reduced by the presence of the thermal insulator 24, The rate of evaporation of the material to be evaporated within 22 can be more uniform within the vessel 22, while at the same time the heat lost from the vessel 22 is reduced by the presence of the thermal insulator 24, which can increase the rate of evaporation of the material to be evaporated within the vessel 22.

The ion source of some embodiments of the present invention is as shown in the second C diagram, the second D diagram and the second E diagram. An evaporator 20 is disposed adjacent to an adjacent arc chamber 29 so that the evaporator 20 material to be evaporated can be Evaporation can then be transferred into the arc chamber 29 to provide a plasma of a large amount of ions of the desired species within the arc chamber 29. Furthermore, the evaporator 20 has at least one outer casing 21 adjacent to the arc chamber 29, a container 22 disposed in the outer casing 21 for placing the material to be evaporated, and a mechanical connection of the container 22 to the channel member 23 of the arc chamber 29 so that The evaporative material can diffuse from the container 22 through the channel member 23 to the arc chamber 29, and a heater 25 disposed at least adjacent to a portion of the container 22. Here, the second C-picture shows that the heater 25 includes the entire container 22 and the thermal insulator 24 is disposed adjacent to the side wall of the heater 25, and the second D-graph shows that the heater 25 surrounds the side wall of the container 22 and the thermal insulator 24 is disposed adjacent to the heating. The case of the side wall of the device 25, while the second E diagram shows that the thermal insulator 245 is disposed adjacent to the end of the container 22 facing the arc chamber 29 and the heater 25 is disposed adjacent to the side wall and the other end of the container 22.

Reasonably, since the heater 25 is disposed adjacent to the container 22, particularly closer to the container 22 than the arc chamber 29, the heater 25 can effectively heat the container 22. In particular, the structure and operation of the heater 25 can be adjusted based on the evaporation requirements within the vessel 22 because the heater 25 is external to the arc chamber 29 that is not tunable to meet the evaporation requirements within the vessel 22, as is conventional structure and operation.

Reasonably, the thermal insulator 24 can reduce the heat dissipated from the container 22 and the heater 25, whether the thermal insulator 24 is in direct proximity to the vessel 22 or near the heater 25. In particular, the distribution of the thermal insulator 24 limits how thermal energy is transferred away from the vessel 22 and the heater 25, and even limits how heat is transferred through the space surrounding the thermal insulator 24. Here, the thermal insulator 24 and the heater 25 are disposed around the container 22 in a suitable manner, and the temperature distribution in the container 22 can be more uniform.

In addition, the purpose of using the thermal insulator 24 and the heater 25 is to improve temperature uniformity and even reduce heat dissipation. The present invention maintains elasticity of the details of the thermal insulator 24 and the heater 25, as well as how to provide the thermal insulator 24 and the heater 25. The details remain flexible.

For example, in some embodiments not shown, the heater 25 is located outside of the housing 21 and adjacent to the housing 21, or attached to the surface of the housing 21, although the heater 25 is typically located within the housing 21 and adjacent to the container 22 for more efficient operation. The vessel 22 is heated. Note that the thermal energy generated by the heater 25 balances the loss of thermal energy, and the distribution of the heater 25 can affect the temperature distribution within the vessel 22. Accordingly, to improve the temperature profile within the container 22, the heater 25 can be selected to include the entire container 22 or at least the entire sidewall of the container 22. For the former, the heater 25 can be an oven with the container 22 disposed therein. For the latter, the heater 25 can be some of the heating coils distributed adjacent the side walls of the container 22, particularly evenly distributed adjacent the side walls of the container 22. Thus, both of these conditions can reduce temperature variations within the vessel 22, at least reducing temperature variations in the radial direction of the vessel 22.

Of course, the heater 25 can also be provided only adjacent to a portion of the container 22. For example, if the temperature of the container 22 is relatively low relative to the two ends and the temperature of other portions of the container 22 is relatively high, the heater 25 may optionally be attached to the container 22 without the thermal insulator 24 approaching the container 22 and/or the outer casing 21. The opposite end. Thus, the heat loss near the two ends of the container 22 can be balanced by the heat generated by the heater 25, and can be reduced. The temperature difference within the container 22 is small. A related option is that the heater 25 is also attached to a portion of the side wall of the container 22 adjacent the opposite ends of the container 22 to further reduce the temperature differential within the container 22. Of course, there are other options for the configuration of the heater 25. For example, in addition to the end of the vessel 22 facing the arc chamber 29, the heater 25 can be located around most of the vessel 22 such that each portion and each surface of the vessel 22 can be heated by the heater 25 and/or the arc chamber 29, respectively. .

In addition, any commercially available heater can be used as the heater 25. The oven and the heating coil described above are only two examples. Moreover, the number of heaters 25 is optional, although the number of heaters 25 required may be proportional to the extent to which the temperature within the vessel 22 is not uniform when the heater 25 is not present or is not energized.

For example, in some embodiments not shown, the thermal insulator 24 is disposed around the entire container 22 and the entire heater 25. Please note that the presence of thermal insulators 25 may reduce heat dissipation and the distribution of thermal insulators 25 may affect how heat dissipation is reduced. Thus, in these embodiments, almost all of the thermal energy generated by the heater 25 can be used to heat the vessel 22, and each portion of the vessel 22 may be heated almost equally. As such, the temperature of the container 22 can be increased to reduce the temperature differential within the container 22.

Of course, in other embodiments not shown, the thermal insulator 24 can be disposed to surround only a portion of the container 22, only a portion of the surrounding heater 25, or all portions of the surrounding container 22 that are not directly adjacent to the heater 25. For example, when the heater 25 is a set of heating coils adjacent portions of the side wall of the container 22, the optional thermal insulator 24 can be located adjacent one or more ends of the container 22 to directly reduce heat loss from one or more ends of the container 22. Alternatively, the thermal insulator 24 can be located adjacent other portions of the sidewall of the container 22 to directly reduce thermal energy lost from other portions of the container 22.

Of course, in other embodiments not shown, the thermal insulator 24 and the container 22 may be located on different sides of the heater 25, even on opposite sides of the heater 25. Therefore, the heater 25 is generated but Thermal energy that is not directly transferred to the container 22 can be blocked by the thermal insulator 24 and can then be redirected to the container 22. It will be apparent that not only the portion of the thermal energy generated by the heater 25 but also transferred to the vessel 22 can be increased, but also how the thermal energy generated by the heater 25 can be distributed within the vessel 22. As such, by appropriately adjusting the geometric relationship between the container 22, the thermal insulator 24, and the heater 25, the temperature difference within the container 22 can be reduced and the temperature of the container 22 can be increased. Here, for the present invention, the geometrical relationship between the container 22, the thermal insulator 24 and the heater 24 is not limited to the above and the following illustrated and unillustrated embodiments.

Moreover, in other embodiments not shown, the thermal insulator 24 may be densely distributed between the arc chamber 29 and the container 22, whether the thermal insulator 24 is located between the container 22 and the outer casing 21 or the thermal insulator 24 is adjacent. The outer surface of the outer casing 21. As such, the thermal insulator 22 essentially prevents thermal energy from being transferred from the arc chamber 29 to the vessel 22, such that evaporation disturbances caused by plasma disturbances in the unavoidable arc chamber 29 can be reduced or even minimized.

Further, although the case shown in the second C to the second E has the channel member 23, the above discussion regarding the thermal insulator 24 and the heater 25 is not restricted by the channel member 23 except that the channel member 25 should not be blocked. . Thus, in some embodiments not shown, the outer casing 21 is in direct contact with the arc chamber 29, and an opening is located between the outer casing 21 and the arc chamber 29 to allow the evaporated material to diffuse. For the non-illustrated embodiment, there are no channel elements and the openings are not blocked by the heater 25 and the thermal insulator 24. In other words, whether the aperture is adjacent to the thermal insulator 24 and/or the heater 25 is optional.

Thus, these embodiments of the present invention have at least some major advantages over conventional ion sources that do not use thermal insulator 24 with heater 25 at the same time: the evaporation rate of the material to be evaporated within vessel 22 within vessel 22 can be more uniform. This can be increased because the heater 25 can provide thermal energy into the container 22, while the thermal insulator 24 can reduce the heat energy lost from the container 22, while the evaporation of the material to be evaporated in the container 22 can be more This is precisely controlled because the container 22 can be heated only by the heater 25, and the operation of the heater 25 can be adjusted only according to the temperature and thermal energy required for evaporation.

An ion source according to some embodiments of the present invention, as shown in the second F and second G diagrams, an evaporator 20 disposed adjacent to an adjacent arc chamber 29 such that material to be evaporated in the evaporator 20 can be vaporized and transferred to the arc Within the chamber 29 is a plasma having a large amount of ions of the desired type within the arc chamber 29. Furthermore, the evaporator 20 has at least one outer casing 21 adjacent to the arc chamber 29, a container 22 disposed in the outer casing 21 for placing the material to be evaporated, and a mechanical connection of the container 22 to the channel member 23 of the arc chamber 29 so that The evaporative material can diffuse from the container 22 through the channel member 23 to the arc chamber 29, and a radiation shield disposed adjacent the outer surface of the combination of the outer casing 21 and the channel member 23. Here, the second F diagram shows a case where the radiation mask having a high thermal conductivity is a mask 26 disposed on a portion of the outer casing 21 to transfer thermal energy through the outer casing for setting a portion of the mask, the second G diagram showing A radiation mask having a high thermal conductivity is a case of an additional mask 27 disposed on the channel member 23 and on a particular portion between the outer casing 21 and the arc chamber 29 to transfer thermal energy from the outer casing 21 to one of the channel members 23. Special part.

Reasonably, the mask 26 disposed in the outer casing 21 can transfer heat energy through the outer casing 21 for the portion where the mask is disposed. Thus, when the mask 26 is disposed in a particular portion of the outer casing 21, the temperature distribution within a particular portion of the outer casing 21 may be more uniform because any thermal energy that reaches the particular portion may be transmitted through a particular portion of the outer casing 21, regardless of thermal energy. It is transferred from the inner space of the container 22, the outer casing 21 and/or other parts of the outer casing 21. Therefore, for an ion source in which the temperature distribution in the outer casing 21 is uneven and the evaporated material sometimes tends to condense in the low temperature portion, the present invention can improve these ion sources simply by disposing the mask on at least the low temperature portion of the outer casing 21. .

It is reasonable that the additional mask 27 provided on the channel element 23 can convey the portion of the thermal energy that is provided through the channel element 23 to provide an additional mask. Thus, when the additional mask 27 is located at a particular portion of the channel member 23 between the outer casing 21 and the arc chamber 29, the temperature distribution within the particular portion of the channel member 23 may be more uniform. This is because any thermal energy that reaches a particular portion can be transferred by a particular portion of the channel member 23, whether the thermal energy is transferred from the outer casing 21, the arc chamber 29, or other source of heat.

Furthermore, in order to use a radiation mask having a high thermal conductivity to increase temperature uniformity and prevent condensation of the evaporated material, the present invention maintains elasticity of the details of the mask 26 and the additional mask 27, as well as the mask 26 and additional masking. The details of the relationship between the covers 27 remain resilient.

For example, the configuration of the mask 26 is variable. When the second F-picture shows that the length of the mask 26 is about two-thirds of the length of the outer casing 21, the masks 26 of other embodiments not shown may have different configurations. For example, in the case where the heater 25 is located at the central portion of the outer casing 21, the optional mask 26 is located only near the opposite ends of the outer casing 21, and the length of the mask 26 is not more than one fifth of the length of the outer casing 21. For example, when the channel member 23 is only mechanically coupled to one end of the housing 21, or only to one end of the container 22, the optional mask 26 can be disposed only in the portion of the housing 21, or adjacent one end of the container 22, to maintain the channel member 23 and the housing 21 The temperature at the interface between one end or one end of the vessel 22 reduces the risk of condensation of evaporated material therebetween.

In addition, the shape, number, and material of the mask 26 remain elastic. For example, when the outer casing 21 is of a cylindrical configuration, the mask 26 can be a two-half curved clip disposed at one end of the outer casing 21 in direct contact with the channel member 23. For example, when the outer casing 21 is cylindrical toward one end of the arc chamber 29, the mask 26 may be a circular clip located outside the outer casing 21 and adjacent to the end. For example, when the function of the mask 26 is to extract heat through the disposed portion of the outer casing 21, the mask 26 may be constructed of metal or any material having a high thermal conductivity. to make. Therefore, heat energy can be efficiently transferred from the other portion of the outer casing 21 to the disposed portion of the entire outer casing 21, and heat transferred directly from the heater 26 to any portion of the outer portion of the outer casing 21 can be efficiently transferred to the disposed portion of the entire outer casing 21.

In addition, the mask 26 is located at the location of the outer casing 21, typically in the portion of the outer casing 21 where the temperature is lower than the other portions when there is no radiation mask. Thus, in some embodiments not shown, there may be one or more additional heaters located outside of the outer casing 21 and adjacent the shroud 26 such that the disposed portion of the outer casing 21 may be further heated. Therefore, the temperature difference between different portions of the outer casing 21 can be appropriately reduced by appropriately adjusting the operation and distribution of the additional heater.

For example, the configuration of the additional mask 27 is variable. When the second G diagram shows the case where the length of the mask 26 is equal to the length of the particular portion of the channel member 23 between the outer casing 21 and the arc chamber 29, there may be different additional mask 27 configurations in other embodiments not shown. . For example, where a particular portion of the channel member 23 is indirectly heated by the arc chamber 29 and the outer casing 21, an optional additional mask 27 can be selected to be disposed adjacent only the central portion of the particular portion of the channel member 23. Thus, even if the length of the particular portion of the channel member 23 is sufficiently large that a particular portion of the entire channel member 23 cannot be uniformly heated by the arc chamber 29 and the outer casing 21, the additional mask 27 can still be drawn from the two ends of the particular portion of the channel member 23. The heat is applied to the central portion of the particular portion of the channel member 23. Therefore, the risk of condensation of the evaporated material inside the channel member 23 can be reduced because the temperature of the central portion of the channel member 23 may not be significantly lower than the temperature of the arc chamber 29 due to the presence of the additional mask 27 and/or The temperature of the outer casing 21.

In addition, the shape, number, and material of the additional mask 27 can be elastically varied. For example, when the channel member 23 is a hollow cylindrical structure, the additional mask 27 may be a circular clip or a semi-circular clip disposed in a special portion of the channel member 23 between the arc chamber 29 and the outer casing 21. . For example, when The track element 23 is a hollow cube structure and the additional mask 27 can be four rectangular clips disposed at a particular portion of the channel element 23 between the arc chamber 29 and the outer casing 21. For example, when the function of the additional mask 27 is to guide heat through the disposed portion of the channel member 23 to maintain the warmth of the set portion, the additional mask 27 may be composed of metal or any material having a high thermal conductivity. Therefore, thermal energy can be efficiently transferred from the outer casing 21 and/or the arc chamber 29 to the disposed portion of the entire passage member 23, and even the thermal energy directly guided from the container 22 to other portions of the passage member 23 can be transferred to the disposed portion of the entire outer casing 21.

Moreover, since the additional mask 27 is typically located in a portion of the channel member 23 having a lower temperature than the temperature of the outer casing 21 and the arc chamber 29 if the radiation mask is not installed, some embodiments not shown may have one or more portions of the channel member 23 An additional heater is provided adjacent to the adjacent mask 27. Therefore, the disposed portion of the channel member 23 can be further heated, so that the temperature difference of the portion of the channel member 23 can be reduced by appropriately adjusting the operation and distribution of the additional heater.

Of course, the mask 26 and the additional mask 27 can be used together. For example, in some embodiments not shown, the additional mask 27 is placed into the mask 26 in good contact so that thermal energy can be effectively transferred from the mask 26 to the additional mask 27. These examples are particularly useful where the vaporized material typically condenses at the interface between the outer casing 21 and the channel member 23 when no radiation mask is used. Thus, when the first portion of the channel member 23 between the outer casing 21 and the arc chamber 29 can be heated by the arc chamber 29, the channel member 23 is covered by the outer casing 21 and/or adjacent the second portion of the outer casing 21 may not be properly used by the arc chamber 29. And/or when the container 22 is heated, the combination of the mask 26 and the additional mask 27 can effectively transfer thermal energy to the second portion of the channel member 23 because the additional mask 27 is disposed adjacent to or adjacent to the channel member 23. the second part.

In addition, when a radiation mask having a high thermal conductivity can increase the thermal conductivity of the channel member 23 by increasing the temperature of the channel member 23 and/or reducing the temperature difference of the channel member 23, the heat conduction of the channel member 23 is improved. An equivalent path is to increase the inner diameter of the channel member 23 to reduce the temperature required within the channel member 23. The physics behind it is that the increased thermal conductivity of the channel element 23 correspondingly reduces the temperature required to produce the same flow rate from the container 22. For example, for the special case where the diameter of the channel member 23 is L1, the arc chamber temperature and the container temperature may be 650 ° C, and the temperature of the channel member 23 may be 600 ° C because the channel member 23 is located between the two. . Then, when only the inner diameter of the channel member 23 is increased, even if the temperature of the container 22 is lowered to 500 ° C, the channel member 23 can achieve the same thermal conductivity. As such, the arc chamber 29 temperature can still be maintained at 650 ° C, and then the temperature of the channel element can be lowered between 650 ° C and 500 ° C, such as 550. °C. As a result, the temperature gradually increases from the vessel 22 to the arc chamber 29, and the corresponding result is that the evaporated material does not condense in its diffusion path.

For example, a selectable criterion for increasing the inner diameter of the channel member 23 to reduce the temperature required for the channel member 23 is that the ratio of the inner diameter of the particular portion of the channel member 23 to the cross-sectional diameter of the container 22 is the same as the container 22 The evaporation temperature of the evaporating material is proportional, with a particular portion of the channel element 23 being located between the outer casing 21 and the arc chamber 29.

Thus, these embodiments of the present invention have at least some major advantages over conventional ion sources having a high thermal conductivity radiation mask in areas where condensation does not occur, the temperature difference within the outer casing 21 and the channel element 23 being located in the outer casing 21 The temperature difference between the special portions of the arc chamber 29 can be reduced, thereby reducing the risk of condensation of the evaporated material. In addition, when the radiation mask can transfer thermal energy and maintain the temperature of the corresponding portion, the required temperature of the outer casing 21 can be lowered (or the temperature required for the container 22 can be lower) because there is no need to increase The temperature of the outer casing 21 and/or the entire container 22 is such as to prevent condensation of the evaporated material at a location below the temperature of the outer casing 21 and/or the container 22.

As a brief summary, the above embodiments use three different methods to reduce the temperature differential within the vessel 22 and/or to reduce the temperature differential from the vessel 22 to the arc chamber 29 transport path. Here, the three methods include the use of thermal insulator 24, the simultaneous use of thermal insulator 24 with heater 25, and the use of a radiation mask comprising mask 26 and/or additional mask 27. Thus evaporation within the vessel 22 can be more efficient and can reduce condensation of the vaporized material on the transport path. In particular, the hardware and operation of each method are independent of the hardware and operation of the other method. Thus, other embodiments of the invention may use any, any two, or even all three methods, although not specifically illustrated how two or more methods may be used together.

The present invention also provides an ion source that efficiently transports evaporated material to the arc chamber 29, wherein the evaporator has a diffuser to directly transfer the vaporized material from the vessel 22 to the arc chamber 29. Here, the diffuser is designed to effectively collect the evaporated material within the container 22 and reduce the risk of diffusion of the evaporated material being blocked. It will be apparent that the diffuser described herein can be the channel element 23 described above, when the channel element 23 is a hollow structure that allows the evaporated material to diffuse.

The ion source of some embodiments of the present invention, as shown in the second H, second, and second J, is disposed adjacent to an adjacent arc chamber 29 such that the material to be evaporated in the evaporator 20 can be evaporated. It can then be transferred into the arc chamber 29 to provide a large amount of plasma of the desired species of ions within the arc chamber 29. Further, the evaporator 20 has at least one outer casing 21 adjacent to the arc chamber 29, a container 22 disposed in the outer casing 21 for placing the material to be evaporated, and a diffuser 235 for mechanically connecting the container 22 to the arc chamber 29 so that The evaporated material can diffuse through. Here, the second H diagram shows that the diffuser 235 is a hollow structure having a plurality of openings 28 in the container 22. The second I diagram shows the diffuser 235 as a hollow structure with a plurality of openings 28 between the container 22 and the outer casing 21. The second J diagram shows that the diffuser 235 is a hollow structure having a plurality of openings 28 and a T-shaped end in the container 22.

Reasonably, the opening 28 in the outer casing of the diffuser 235 allows diffusion of the evaporated material. Thus, when the opening 28 is in a space, such as the interior of the container 22 or the space between the outer casing 21 and the container 22, the evaporated material can diffuse through the opening 28 into the diffuser 235 and diffuse through the diffuser 235 into the arc chamber. 29. It will be apparent that at least the number, cross-sectional area and distribution of the apertures 28 will affect how the evaporated material diffuses through the apertures 28, for example, the rate at which the evaporated material is transferred into the arc chamber 29.

Reasonably, when the material to be evaporated is in a solid state, such as a powder form, the T-shaped end of the diffuser 235 may reduce the risk that the opening 28 is at least partially blocked by the material to be evaporated and then reduces the spread or even complete blocking of the evaporated material. When the container 22 is placed horizontally, if the amount of material to be evaporated is relatively large, so that the height of the material to be evaporated stored in the container 22 is higher than the height of the opening, the material to be evaporated may collapse and block the opening. In this case, if the height of the T-shaped end is higher than the height of the material to be evaporated stored, the T-shaped end of the diffuser 235 may prevent the collapse of the material to be evaporated. In general, the structure of the evaporator 20 is limited by the configuration of the arc chamber 29 and the configuration of the pipeline and/or to the arc chamber 29 equipment, and the material to be evaporated is typically a powdered material that is commercially available. Therefore, the evaporator 20 may sometimes not be placed horizontally, so that the risk of storing the material to be evaporated covering the opening 28 cannot be ignored.

Furthermore, in order to use the opening 28 and the T-shaped end of the diffuser 235 to diffuse the evaporated material into the arc chamber 29 and to avoid blocking diffusion, the details of the T-shaped end of the opening 28, the diffuser 235 of the present invention are even the diffuser 235 The geometry remains elastic.

For example, the T-shaped end of the diffuser 235 in the container 22 can have a hollow tubular structure and a plate structure. Here, the hollow tubular structure directly mechanically connects the plate structure, and the plate structure traverses the axial direction of the hollow tubular structure. Therefore, referring to the second J diagram, it is obvious that the size of the plate structure can determine the inside of the container 22 to be steamed. The hair material can be stored at the highest height where slippage does not occur. For example, when the hollow tubular structure is centered on the cross-sectional area of the container 22, the highest height is the sum of the radius of the plate structure and the radius of the cross-sectional area of the container 22.

Moreover, when the panel structure is used to block materials in powder form, the optional panel structure has no openings 28 to allow the powder to be blocked by the entire panel structure. In addition, because the powder forms of the different materials may have different diameters, the optional plate structure may be provided with one or more openings 28 if the diameter of the openings 28 is less than the diameter of the powder form material stored in the container 22.

For example, the apertures 28 can be located in a plate structure (the plate structure having the apertures 28 can be viewed as a grid) or on the sidewalls of the hollow tubular structure. In addition, the presence of apertures 28 in the container 22 allows the vaporized material produced within the container 22 to flow directly through the apertures 28 into the diffuser 235 and then into the arc chamber 29. Moreover, if the amount of evaporating material transported from the container 22 into the space between the outer casing 21 and the container 22 is not negligible, the optional diffuser 235 also has an opening 28 in the space between the outer casing 21 and the container 22, such as the second I. The figure shows.

Obviously, when the opening 28 is the interface between the internal space of the opening 28 and the space inside the container 22, or even the interface between the housing 21 and the container 22, the size, number and even shape of the opening 28 are some To a certain extent, it is an important variable of the present invention.

For example, the diameter of each opening 28 can be selected to be proportional to the evaporation temperature of the material to be evaporated. Thus, a high evaporation temperature means that there is less evaporated material and a larger area of opening 28 can collect more evaporating material. Moreover, to avoid the risk of the opening 28 being blocked by material, the diameter of the at least one opening can be selected to be proportional to the diameter of the powdered material stored in the container 22. Thus, even if the end of the diffuser 235 is not T-shaped or even the T-shaped end of the diffuser 235 is not large enough to prevent slippage of all of the stored material, this risk can be reduced.

For example, the number of openings 28 can be selected to be proportional to the evaporation temperature of the material to be evaporated, or the diameter of the opening 28 can be selected to be proportional to the evaporation temperature of the material to be evaporated. Please note that the number and diameter of the openings 28 determine the conductivity of the evaporated material flow path. Thus, for materials having a higher evaporation temperature, such as materials that are less susceptible to evaporation, it is preferred to use larger numbers and/or large diameter openings 28 so that any evaporated material can be easily transported through the diffuser 235 to the arc. Room 29. Conversely, a material that evaporates at a lower temperature or, in other words, a material that evaporates easily, preferably uses a smaller number and/or smaller diameter opening 28 to limit the flow of evaporated material to avoid excessive pressure.

For example, when the material to be evaporated is aluminum chloride (AlCl3), the diffuser 235 may have three openings 28 in its side walls, each opening 28 having a diameter of 0.5 mm. For example, when the material to be evaporated is ytterbium (Yb), the diffuser 235 may have eighteen openings 28 in its side walls, each opening 28 having a diameter of 1.6 mm. For example, for other types of elements, the diffuser 235 can have eight apertures 28, each aperture 28 having a diameter of 2 millimeters. Here, the second K map and the second L map respectively show two selectable diffusers 235 having different numbers and different diameter openings 28. A plate structure of the diffuser 235 is located within the container 22 to prevent the storage material from collapsing, and the opposing plate structure can be attached to the sidewall of the arc chamber 29 or to the nozzle boundary of the arc chamber 29.

Additionally, the diffuser 235 can be directly coupled to the arc chamber 29 or mechanically coupled to a nozzle that is directly coupled to the arc chamber 29. In fact, the primary key is to allow the opening 28 of the vaporized material to be transported and the T-shaped end of the diffuser 235 that blocks the material to be evaporated stored in the barrier container 22, and other details of the diffuser 235 are optional, including the diffuser The cross-sectional area of 235, the length of the diffuser 235, the material of the diffuser 235, the nozzle of the diffuser 235, or other components connect the diffuser 235 to the arc chamber 29 or the like.

Furthermore, since different diffusers 235 having different openings 28 are suitable for different materials to be evaporated, regardless of different element types or different powder forms, the present invention may select diffuser 235 as an evaporator. 20 replaceable components. Likewise, when the diffuser 235 can be connected to a nozzle that directly connects the arc chamber 29, the optional nozzle is also a replaceable element. In particular, when the evaporated material may condense on the diffuser 235 and/or the nozzle, the diffuser 235 and the nozzle may be selected as separately replaceable components.

Thus, such an embodiment of the present invention has at least some major advantages over conventional ion sources that use conventional channel elements 23 to diffuse evaporated material between vessel 22 and arc chamber 29: the vaporized material can be efficiently transported To the diffuser 235, which then diffuses through the diffuser into the arc chamber 29, the T-shaped end of the diffuser 235 reduces the risk of the material to be vaporized blocking the diffuser 235.

Moreover, any of the embodiments described above with diffuser 235 can be combined with any embodiment having at least one thermal insulator 24, heater 25, mask 26 and additional shroud 27.

For example, the combination of the diffuser 235 described above and the use of a radiation mask prevents condensation of the evaporated material. Importantly, the placement of a radiation mask with a high thermal conductivity in the diffuser and/or nozzle may increase the temperature of the set portion, keeping it warm enough to avoid condensation of the evaporated material. Conversely, for a conventional ion source without such a radiation mask, the material to be evaporated evaporates in the container but the gaseous evaporated material sometimes spreads slightly below the temperature of the container and/or arc chamber 29 when it reaches a temperature. Condensation occurs when the device and/or nozzle are used. Furthermore, the combination of the aforementioned diffuser 235 and the thermal insulator 24 also prevents condensation of the evaporated material. Please note that the heat insulator 24 surrounds the diffuser and/or the nozzle to maintain a uniform temperature so that the evaporated material can pass uniformly.

For example, the concept of providing a radiation mask adjacent to an additional heater may be suitable for applying one or more additional heaters around the diffuser and/or nozzle, even though the diffuser and/or nozzle may not be accessible from the arc chamber 29 and/or When the outer casing 21 is properly heated, the diffuser and/or the nozzle can still be sufficiently heated. Therefore, when spreading The heaters and/or nozzles can be heated by an additional heater, which eliminates the need to operate the arc chamber 29 to heat the diffuser and/or the nozzle, providing more freedom of operation.

While the invention has been described in terms of the preferred embodiments, it is understood that modifications and variations can be made without departing from the spirit and scope of the invention as claimed.

20‧‧‧Evaporator

21‧‧‧ Shell

22‧‧‧ Container

23‧‧‧Channel components

24‧‧‧ Thermal Insulators

25‧‧‧heater

29‧‧‧Arc chamber

Claims (42)

An ion source comprising: an arc chamber; and an evaporator disposed adjacent to the arc chamber, comprising: an outer casing adjacent to the arc chamber; a container positioned within the outer casing; and a thermal insulator adjacent to the outer casing Wherein the container stores a material to be evaporated; wherein a first portion of the container faces the arc chamber and a second portion faces the thermal insulator. The ion source of claim 1, wherein the first portion and the second portion are opposite ends of the container. The ion source of claim 1, wherein the thermal insulator is mechanically coupled to the second portion of the container. The ion source of claim 1, wherein the thermal insulator is mechanically separated from the second portion of the container. The ion source of claim 4, wherein the thermal insulator is located outside of the outer casing but adjacent to the outer casing. The ion source of claim 5, wherein the thermal insulator is adjacent to a sidewall of the container. The ion source of claim 1, further comprising a diffuser at least partially located in the container, the diffuser being a hollow structure having at least one opening in the container. The ion source of claim 7, wherein the connection of the diffuser comprises at least one of: the diffuser is directly connected to the arc chamber, or the diffuser is mechanically coupled to a direct connection to the arc chamber. nozzle. The ion source of claim 7, wherein the diffuser comprises a hollow tubular structure and a plate structure, wherein the hollow tubular structure directly mechanically connects the plate structure, and the plate structure traverses the hollow tubular structure Axis direction. The ion source of claim 7, wherein each of the possible locations of the opening comprises: the plate structure; and a sidewall of the hollow tubular structure. The ion source of claim 7, wherein the opening comprises at least one of: the number of the openings is proportional to an evaporation temperature of the material to be evaporated, the diameter of the opening and the material to be evaporated The evaporation temperature is proportional to the diameter of at least one of the openings and is proportional to the diameter of the powdered material stored in the container. The ion source of claim 7, wherein the diffuser is non-fixedly attached to the container such that the diffuser and the container are replaceable, respectively. An ion source comprising: an arc chamber; and an evaporator disposed adjacent to the arc chamber, comprising: an outer casing adjacent to the arc chamber; a container located within the outer casing; and a container located adjacent to the outer casing At least a portion of the heater; and a thermal insulator positioned within the housing adjacent to at least a portion of the heater; Wherein the container stores a material to be evaporated. The ion source of claim 13, wherein the heater is an oven surrounding the container. The ion source of claim 14, wherein the heater further comprises a plurality of heating coils located outside the oven adjacent to the oven. The ion source of claim 14, wherein the thermal insulator is located outside the oven and surrounds the oven. The ion source of claim 13, wherein the heater comprises a plurality of heating coils located outside the container and surrounding the container. The ion source of claim 13, wherein the thermal insulator surrounds the heater and the container. The ion source of claim 13 wherein the thermal insulator is adjacent the end of the container away from the arc chamber. The ion source of claim 13, wherein the thermal insulator is adjacent to an end of the container adjacent to the arc chamber. The ion source of claim 13 further comprising a diffuser at least partially located within the container, the diffuser being a hollow structure having at least one opening in the container. The ion source of claim 21, wherein the connection of the diffuser comprises at least one of: the diffuser is directly connected to the arc chamber, or the diffuser is mechanically coupled to a direct connection to the arc chamber nozzle. The ion source of claim 21, wherein the diffuser comprises a hollow tubular structure and a plate structure, wherein the hollow tubular structure directly mechanically connects the plate structure, and the plate structure traverses the hollow tubular structure Axis direction. The ion source of claim 21, wherein each possible opening of the opening comprises: the plate structure; and a sidewall of the hollow tubular structure. The ion source of claim 21, wherein the opening comprises at least one of: the number of the openings is proportional to an evaporation temperature of the material to be evaporated, the diameter of the opening and the material to be evaporated The evaporation temperature is proportional to the diameter of at least one of the openings and is proportional to the diameter of the powdered material stored in the container. The ion source of claim 21, wherein the diffuser is non-fixedly attached to the container such that the diffuser and the container are replaceable, respectively. An ion source comprising: an arc chamber; and an evaporator disposed adjacent to the arc chamber, comprising: an outer casing adjacent to the arc chamber; a container located within the outer casing; and mechanically connecting the arc chamber to the a channel member of the outer casing; and a radiation shield disposed outside the outer casing; wherein the container stores a material to be evaporated; wherein the channel member is hollow to transmit the evaporated material to the arc chamber via the channel member; Wherein the radiation mask is adjacent at least a portion of the outer casing in combination with one of the channel elements. The ion source of claim 27, wherein the channel member mechanically connects the arc chamber to the container such that the evaporated material can be transferred from the container to the arc chamber. The ion source of claim 27, wherein the radiation mask is composed of a material having a high thermal conductivity. The ion source of claim 27, wherein the radiation mask comprises a mask on the outer casing such that thermal energy can be transmitted through the disposed portion of the outer casing. The ion source of claim 27, wherein the radiation mask comprises an additional mask that is placed in the mask in good contact and is in mechanical contact with a portion of the channel member that is not located within the housing. Thermal energy can be transferred from the housing to the portion of the channel element. The ion source of claim 31, wherein the mask is a combination of two semi-circular masks, the additional mask being an additional circular mask. The ion source of claim 27, wherein the radiation mask comprises the additional mask surrounding a portion of the channel member that is not located within the housing. The ion source of claim 33 further comprising at least one additional heater located outside of the housing adjacent to the additional mask. The ion source of claim 27, wherein the channel element comprises a nozzle in mechanical contact with the arc chamber and outside the outer casing. The ion source of claim 27, wherein the channel element comprises a diffuser at least partially located within the container, and wherein the diffuser has at least one opening in the container. The ion source of claim 27, wherein a ratio of an inner diameter of a particular portion of the channel member to a diameter of the cross-sectional area of the container is proportional to an evaporation temperature of the material to be evaporated, wherein the special portion of the channel member It is located between the outer casing and the arc chamber. The ion source of claim 36, wherein the connection of the diffuser comprises at least one of: the diffuser is directly connected to the arc chamber, or the diffuser is mechanically coupled to a direct connection to the arc chamber nozzle. The ion source of claim 36, wherein the diffuser comprises a hollow tubular structure and a plate structure, wherein the hollow tubular structure directly mechanically connects the plate structure, and the plate structure traverses the hollow tubular structure Axis direction. The ion source of claim 36, wherein each possible opening of the opening comprises: the plate structure; and a sidewall of the hollow tubular structure. The ion source of claim 36, wherein the opening comprises at least one of: the number of the openings is proportional to an evaporation temperature of the material to be evaporated, the diameter of the opening and the material to be evaporated The evaporation temperature is proportional to the diameter of at least one of the openings and is proportional to the diameter of the powdered material stored in the container. The ion source of claim 36, wherein the diffuser is non-fixedly attached to the container such that the diffuser and the container are replaceable, respectively.