TWI589080B - Laser device and laser processing machine - Google Patents
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Description
本發明係有關於一種雷射裝置、以及使用該雷射裝置之雷射加工機,該雷射裝置係將自種子光源所輸出之光予以光學性地放大,並輸出高峰值功率(peak power)的脈衝(pulse)光者。 The present invention relates to a laser device and a laser processing machine using the same, which optically amplifies light output from a seed light source and outputs high peak power. The pulse of the light.
使用雷射之細微加工,例如小徑的穿孔、標記(marking)等係以高峰值功率而產生具有高脈衝能量(pulse energy)的光之雷射裝置為有效。而且,因應加工對象的材料、加工後的孔徑、孔深度等的加工要求,能夠將脈衝頻率、脈衝寬度、脈衝峰值功率等獨立地控制在涵蓋寬廣範圍之雷射裝置為理想。 Fine laser processing using lasers, such as perforation of small diameters, marking, etc., is effective in generating a laser having high pulse energy with high peak power. Further, it is desirable to independently control the pulse frequency, the pulse width, the pulse peak power, and the like in a wide range of laser devices in accordance with processing requirements of materials to be processed, apertures after processing, and hole depth.
就以高峰值功率而輸出高脈衝能量的光之習知的雷射光源而言,已知一種含有Nd:YAG結晶、Nd:YVO4結晶等之雷射媒質的固體雷射之Q開關(Q-switch)振盪器。雖然固體雷射之Q開關振盪器係自振盪器直接以高峰值功率而獲得高脈衝能量的雷射光,惟輸出脈衝的重複頻率、脈衝寬度則僅能控制在有限的範圍內。 For a conventional laser light source that outputs light of high pulse energy with high peak power, a solid-state laser Q switch (Q) containing a laser medium such as Nd:YAG crystal, Nd:YVO 4 crystal or the like is known. -switch) Oscillator. Although the solid-state laser Q-switched oscillator derives high-pulse energy laser light directly from the oscillator at high peak power, the repetition frequency and pulse width of the output pulse can only be controlled within a limited range.
此外,就作為以高峰值功率而輸出高脈衝能 量的光之雷射光源之另外的構成,已知一種具備產生比較弱功率的雷射光作為種子光的振盪器、以及用以將來自振盪器的種子光予以放大之光放大器之MOPA(Master Oscillator and Power Amplifier,主振盪器配功率放大器)方式之雷射裝置。例如,提案有使用半導體雷射(LD)作為種子光源,且以光纖(fiber)放大器予以放大之雷射裝置。作為種子光源而使用半導體雷射,控制注入於半導體雷射的電流,藉此能夠將輸出脈衝的重複頻率、脈衝寬度控制在較寬廣範圍。 In addition, it outputs high pulse energy as high peak power. Another configuration of a laser light source of a quantity of light is known as an oscillator having a laser light that generates relatively weak power as a seed light, and an MOPA (Master Oscillator) for amplifying an optical light from a seed light of an oscillator. And Power Amplifier, the main oscillator with power amplifier) laser device. For example, a laser device using a semiconductor laser (LD) as a seed light source and amplified by a fiber amplifier is proposed. By using a semiconductor laser as a seed light source, the current injected into the semiconductor laser is controlled, whereby the repetition frequency and pulse width of the output pulse can be controlled over a wide range.
例如,專利文獻1係在將自種子光源所輸出的脈衝叢發(burst)光予以在光放大器裡放大之雷射系統(system)中,藉由改變脈衝叢發內的脈衝和脈衝之間的種子光源的功率,使光放大器的激發功率保持固定之狀態下,控制放大後的個別的脈衝光的峰值功率或脈衝能量。此外,專利文獻2係在具備光纖放大器、作為種子光源的半導體雷射2、以及作為激發光源的半導體雷射之雷射光源裝置中,種子光源的半導體雷射係在主照射期間將脈衝光作為種子光而射出,而在預備照射期間係具有較脈衝光的峰值功率更小的功率,且將實質的連續光作為種子光而射出,藉此獲得具有在開始射出時所期望的峰值功率之脈衝光。 For example, Patent Document 1 is directed to a laser system in which a pulse burst light output from a seed light source is amplified in an optical amplifier by changing a pulse between a pulse and a pulse. The power of the seed source is used to control the peak power or pulse energy of the amplified individual pulsed light while maintaining the excitation power of the optical amplifier. Further, Patent Document 2 is a laser light source device including a fiber amplifier, a semiconductor laser 2 as a seed light source, and a semiconductor laser as an excitation light source, and the semiconductor laser system of the seed light source uses pulsed light during main illumination. The seed light is emitted, and during the preliminary irradiation, the power is smaller than the peak power of the pulsed light, and substantially continuous light is emitted as the seed light, thereby obtaining a pulse having a peak power desired at the start of the emission. Light.
專利文獻: Patent literature:
專利文獻1:日本特表2013-500583號公報 Patent Document 1: Japanese Special Table 2013-500583
專利文獻2:日本特開2010-171131號公報 Patent Document 2: Japanese Laid-Open Patent Publication No. 2010-171131
以光纖放大器將種子光予以放大時,當放大後的峰值功率提高時,會有引起受激拉曼(Raman)散射、自相位調變等之不理想的非線性現象,或使光纖受損之情形。開始產生非線性現象的峰值功率,通常係根據使用之光纖的核心(core)直徑和長度而受限制。由於將光纖縮短係指將放大媒質予以縮短,故在保持放大率之狀態下將光纖縮短係具有一定的界限。當光纖的核心直徑變大時,已知為至較高的峰值功率雖不會產生非線性現象、以及光纖受損之情形,但,易使放大後的雷射光之橫向模態(mode)惡化。為了不使雷射光之橫向模態惡化,且獲得更高的峰值功率之一個方法,可想到追加使被放大光在雷射媒質中不進行波導路徑性之傳播的光放大器,亦即非波導路型之光放大器,也就是具有具備熱透鏡(lens)功效之放大媒質之光放大器。被放大光在光放大器中未進行波導路徑性傳播時,即使被放大光的截面積較大,亦不易使雷射之橫向模態惡化,且能夠在保持優良的光束(beam)品質之狀態下,放大至高峰值功率。 When the seed light is amplified by the fiber amplifier, when the amplified peak power is increased, there is an undesirable nonlinear phenomenon that causes stimulated Raman scattering, self-phase modulation, etc., or damage of the optical fiber. situation. The peak power that begins to produce a nonlinear phenomenon is usually limited depending on the core diameter and length of the fiber used. Since shortening the optical fiber means shortening the amplifying medium, the optical fiber shortening system has a certain limit while maintaining the amplification factor. When the core diameter of the optical fiber becomes large, it is known that the higher peak power does not cause nonlinear phenomena and the optical fiber is damaged, but it is easy to deteriorate the lateral mode of the amplified laser light. . In order to prevent the lateral mode of the laser light from deteriorating and to obtain a higher peak power, it is conceivable to add an optical amplifier that does not propagate the waveguide path in the laser medium, that is, a non-waveguide. A type of optical amplifier, that is, an optical amplifier having an amplifying medium having a thermal lens function. When the amplified light is not propagated in the optical path of the optical amplifier, even if the cross-sectional area of the amplified light is large, the lateral mode of the laser is not easily deteriorated, and the beam quality can be maintained while maintaining excellent beam quality. , zoom to high peak power.
就該非波導路型之光放大器而言,亦即作為具有具備熱透鏡功效之放大媒質之光放大器係例如可使用經採用柱(rod)狀的Nd:YAG結晶、Nd:YVO4結晶等之光 放大器。然而,在前述之光放大器中,已知當產生的熱量有變動時,會有使熱透鏡的特性產生變化,且使放大後的雷射光束傳播產生變化之現象。 In the optical amplifier of the non-waveguide type, that is, an optical amplifier having an amplifying medium having a thermal lens function, for example, a light using a rod-shaped Nd:YAG crystal or a Nd:YVO 4 crystal can be used. Amplifier. However, in the optical amplifier described above, it is known that when the generated heat varies, there is a phenomenon in which the characteristics of the thermal lens are changed and the amplified laser beam propagates.
如專利文獻1,藉由將光放大器的激發功率保持固定之狀態下使種子光源的輸出波形產生變化,來控制放大後脈衝的峰值功率或脈衝能量時,會有使放大後的平均功率產生變化之情形。然而其中所敘述之平均功率係指在較脈衝叢發中的脈衝和脈衝的間隔更充分長的時間,將瞬間的頻率予以平均時的功率。此外,此處所敘述之脈衝叢發並非僅為具有相同波形之連續的脈衝,而可含有複數的脈衝,亦可為各種不同的脈衝波形。如前述,可推想當在光放大器的後段存在有非波導路型之光放大器時,射入於後段之光放大器的被放大光的平均功率不同,故使自後段之光放大器所取出放大光的功率產生變化,且使在後段之光放大器所產生的熱量產生變動,據此而使熱透鏡的特性產生變化,並使放大後的雷射光束傳播產生變化之問題。 According to Patent Document 1, when the output power of the seed light source is changed while the excitation power of the optical amplifier is kept constant, and the peak power or pulse energy of the amplified pulse is controlled, the average power after amplification is changed. The situation. However, the average power described therein refers to the power at which the instantaneous frequency is averaged over a period of time that is longer than the interval between the pulse and the pulse in the burst burst. In addition, the pulse bursts described herein are not only continuous pulses having the same waveform, but may include a plurality of pulses, or may be various pulse waveforms. As described above, it is conceivable that when there is a non-waveguide type optical amplifier in the latter stage of the optical amplifier, the average power of the amplified light incident on the optical amplifier in the latter stage is different, so that the amplified optical light is taken out from the optical amplifier in the latter stage. The power is varied, and the heat generated by the optical amplifier in the latter stage is varied, whereby the characteristics of the thermal lens are changed, and the amplified laser beam propagates to cause a change.
本發明之目的係提供一種雷射裝置、以及使用該雷射裝置之雷射加工機,其中即使採用非波導路型之光放大器,亦即使用具有具備熱透鏡功效之放大媒質之光放大器時,亦能在抑制熱透鏡的特性變化之狀態下,能將脈衝光的峰值功率或脈衝能量控制在寬廣範圍者。 An object of the present invention is to provide a laser device and a laser processing machine using the same, wherein even if a non-waveguide type optical amplifier is used, that is, an optical amplifier having an amplifying medium having a thermal lens function is used, It is also possible to control the peak power or pulse energy of the pulsed light to a wide range while suppressing the change in the characteristics of the thermal lens.
為了達成上述之目的,本發明之雷射裝置係 具備:種子光源,係輸出光;前置光放大器,係將自前述種子光源所輸出之光予以光學性地放大;後置光放大器,係將自前述前置光放大器所輸出之光予以光學性地放大,且包含具有熱透鏡功效之放大媒質;功率監視器(monitor)部,係測定自前述前置光放大器所輸出之光的平均功率;種子光源驅動器(driver),係驅動前述種子光源;前置光放大器驅動器,係驅動前述前置光放大器;以及控制部,係控制前述種子光源驅動器、以及前述前置光放大器驅動器;前述控制部係透過前述種子光源驅動器而控制前述種子光源,俾使之選擇性地輸出連續光或複數的脈衝,前述控制部係根據前述功率監視器部的測定結果,並透過前述前置光放大器驅動器而控制前述前置光放大器的增益,俾使自前述前置光放大器所輸出之光的平均功率能成為固定。 In order to achieve the above object, the laser device of the present invention Having a seed light source for outputting light; a front optical amplifier for optically amplifying light output from the seed light source; and a post optical amplifier for optically outputting light output from the front optical amplifier Zooming in and including an amplifying medium having a thermal lens function; a power monitor portion measuring an average power of light outputted from the front optical amplifier; and a seed light source driver driving the seed light source; a front optical amplifier driver driving the front optical amplifier; and a control unit for controlling the seed light source driver and the front optical amplifier driver; wherein the control unit controls the seed light source through the seed light source driver to cause the seed light source to be controlled Selectively outputting continuous light or a plurality of pulses, and the control unit controls the gain of the front optical amplifier by the front optical amplifier driver based on the measurement result of the power monitor unit, and the front portion is controlled from the front The average power of the light output by the optical amplifier can be fixed.
此外,本發明之雷射裝置係具備:種子光源,係輸出光;前置光放大器,係將自前述種子光源所輸出之光予以光學性地放大;後置光放大器,係將自前述前置光放大器所輸出之光 予以光學性地放大,且包含具有熱透鏡功效之放大媒質;功率監視器部,係測定自前述前置光放大器所輸出之光的平均功率;種子光源驅動器,係驅動前述種子光源;後置光放大器驅動器,係驅動後置光放大器;以及控制部,係控制前述種子光源驅動器、以及前述後置光放大器驅動器;前述控制部係透過前述種子光源驅動器而控制前述種子光源,俾使之選擇性地輸出連續光或複數的脈衝,前述控制部係根據前述功率監視器部的測定結果,並透過前述後置光放大器驅動器而控制前述後置光放大器的增益,俾使自前述後置光放大器後之光束的傳播狀態成為固定。 Further, the laser device of the present invention comprises: a seed light source for outputting light; a front optical amplifier for optically amplifying light output from the seed light source; and a rear optical amplifier for front-end optical amplifier Light output by an optical amplifier Optically amplified, and comprising an amplifying medium having thermal lens efficiency; a power monitor unit for measuring an average power of light outputted from the pre-amplifier; a seed light source driver for driving the seed light source; a rear light An amplifier driver for driving a post-optical amplifier; and a control unit for controlling the seed light source driver and the post-optical amplifier driver; wherein the control unit controls the seed light source through the seed light source driver to selectively Outputting a continuous light or a plurality of pulses, the control unit controls the gain of the post-optical amplifier through the post-optical amplifier driver based on the measurement result of the power monitor unit, and the post-optical amplifier The propagation state of the beam becomes fixed.
此外,本發明之雷射裝置係具備:種子光源,係輸出光;前置光放大器,係將自前述種子光源所輸出之光予以光學性地放大;後置光放大器,係將自前述前置光放大器所輸出之光予以光學性地放大,且包含具有熱透鏡功效之放大媒質;光束監視器部,係測定自前述後置光放大器所輸出之光的光束之光束直徑;種子光源驅動器,係驅動前述種子光源;後置光放大器驅動器,係驅動前述後置光放大器;以及 控制部,係控制前述種子光源驅動器、以及前述後置光放大器驅動器;前述控制部係透過前述種子光源驅動器而控制前述種子光源,俾使之選擇性地輸出連續光或複數的脈衝,前述控制部係透過前述前置光放大器驅動器來控制前述前置光放大器的增益,或透過前述後置光放大器驅動器來控制前述後置光放大器的增益,俾使根據前述光束監視器部所計算的光束直徑不會產生變化。 Further, the laser device of the present invention comprises: a seed light source for outputting light; a front optical amplifier for optically amplifying light output from the seed light source; and a rear optical amplifier for front-end optical amplifier The light output by the optical amplifier is optically amplified, and includes an amplifying medium having a thermal lens function; the beam monitor portion is a beam diameter of a beam of light output from the rear optical amplifier; the seed light source driver is Driving the aforementioned seed light source; a post-optical amplifier driver driving the aforementioned post-amplifier; The control unit controls the seed light source driver and the post-optical amplifier driver; the control unit controls the seed light source through the seed light source driver to selectively output continuous light or a plurality of pulses, and the control unit Controlling the gain of the front optical amplifier through the front optical amplifier driver, or controlling the gain of the rear optical amplifier through the rear optical amplifier driver, so that the beam diameter calculated according to the beam monitor portion is not Will change.
在本發明當中,前述種子光源較佳係半導體雷射。 In the present invention, the seed light source is preferably a semiconductor laser.
在本發明當中,前述前置光放大器較佳係包含光纖型放大媒質、以及對該光纖型放大媒質供應激發光之激發光源,前述控制部係控制前述前置光放大器之激發光功率及激發光波長的至少一方。 In the present invention, the front optical amplifier preferably includes an optical fiber type amplifying medium and an excitation light source for supplying excitation light to the optical fiber type amplifying medium, and the control unit controls the excitation light power and the excitation light of the front optical amplifier. At least one of the wavelengths.
在本發明當中,前述後置光放大器較佳係包含具備熱透鏡功效之柱狀放大媒質、以及對該柱狀放大媒質供應激發光之激發光源。 In the present invention, the post-optical amplifier preferably includes a columnar amplifying medium having a thermal lens function and an excitation light source for supplying excitation light to the columnar amplifying medium.
在本發明當中,前述後置光放大器較佳係包含具備熱透鏡功效之柱狀放大媒質、以及對該柱狀放大媒質供應激發光之激發光源,前述控制部係控制前述後置光放大器之激發光功率及激發光波長的至少一方。 In the present invention, the post-optical amplifier preferably includes a columnar amplifying medium having a thermal lens function and an excitation light source for supplying excitation light to the columnar amplifying medium, and the control unit controls the excitation of the post-optical amplifier. At least one of optical power and excitation light wavelength.
在本發明當中,前述前置光放大器較佳係包含光纖型放大媒質、以及對該光纖型放大媒質供應激發光之激發光 源為理想。 In the present invention, the pre-optical amplifier preferably includes a fiber-type amplifying medium and excitation light for supplying excitation light to the fiber-type amplifying medium. The source is ideal.
在本發明當中,較佳係前述後置光放大器之後,包含波長變換器。 In the present invention, preferably after the aforementioned post-amplifier, a wavelength converter is included.
此外,本發明之雷射加工機係具備:上述雷射裝置;聚光光學系統,係將自前述雷射裝置所輸出的雷射光束予以聚光;以及掃描機構,係將集光之雷射光束及被加工物進行相對性的掃描。 Further, the laser processing machine of the present invention includes: the above-described laser device; a collecting optical system for collecting a laser beam output from the laser device; and a scanning mechanism for collecting laser light The beam and the workpiece are scanned relative to each other.
在本發明當中,前述雷射光束的波長較佳係紫外線區域者。 In the present invention, the wavelength of the aforementioned laser beam is preferably in the ultraviolet region.
根據本發明,藉由控制前置光放大器的增益,俾使自前置光放大器所輸出之光的平均功率能成為固定,藉此即使種子光源所輸出之光的波形產生變化時,亦能抑制後置光放大器之熱透鏡的特性變化。結果,不使輸出光束的傳播產生變化,亦能將脈衝光的峰值功率或脈衝能量控制在寬廣範圍。 According to the present invention, by controlling the gain of the pre-amplifier, the average power of the light output from the pre-amplifier is fixed, thereby suppressing even if the waveform of the light output from the seed source changes. The characteristic change of the thermal lens of the rear optical amplifier. As a result, the peak power or pulse energy of the pulsed light can be controlled over a wide range without changing the propagation of the output beam.
此外,根據本發明,藉由控制後置光放大器的增益,俾使後置光放大器的熱透鏡成為固定,藉此即使種子光源輸出之光的波形產生變化時,亦能抑制後置光放大器的熱透鏡的特性變化。結果,不使輸出光束的傳播產生變化,亦能將脈衝光的峰值功率或脈衝能量控制在寬廣範圍。 Further, according to the present invention, by controlling the gain of the post-amplifier, the thermal lens of the post-amplifier is fixed, whereby the post-amplifier can be suppressed even when the waveform of the light output from the seed source is changed. The characteristics of the thermal lens change. As a result, the peak power or pulse energy of the pulsed light can be controlled over a wide range without changing the propagation of the output beam.
此外,根據本發明,藉由控制前置光放大器 或後置光放大器的增益,俾使自後置光放大器所輸出之光的光束的光束直徑不會產生變化,藉此即使種子光源所輸出之光的波形產生變化時,亦能抑制後置光放大器的熱透鏡的特性變化。結果,不使輸出光束的傳播產生變化,亦能將脈衝光的峰值功率或脈衝能量控制在寬廣範圍。 Further, according to the present invention, by controlling the pre-amplifier Or the gain of the post-amplifier, so that the beam diameter of the beam of light output from the post-amplifier does not change, thereby suppressing the backlight after the waveform of the light output by the seed source changes. The characteristic change of the thermal lens of the amplifier. As a result, the peak power or pulse energy of the pulsed light can be controlled over a wide range without changing the propagation of the output beam.
1‧‧‧種子光源 1‧‧‧ Seed light source
2‧‧‧控制部 2‧‧‧Control Department
3‧‧‧種子光源驅動器 3‧‧‧Seed light source driver
4‧‧‧前置光放大器驅動器 4‧‧‧Front optical amplifier driver
5‧‧‧輸出提取手段 5‧‧‧ Output extraction means
6、8‧‧‧光 6, 8‧ ‧ light
7‧‧‧功率監視器電路 7‧‧‧Power monitor circuit
9‧‧‧後置光放大器驅動器 9‧‧‧ Rear Optical Amplifier Driver
10‧‧‧光束提取手段 10‧‧‧ Beam extraction means
11‧‧‧光束監視器 11‧‧‧ Beam Monitor
100‧‧‧雷射裝置 100‧‧‧ Laser device
110‧‧‧前置光放大器 110‧‧‧front optical amplifier
120‧‧‧後置光放大器 120‧‧‧ rear optical amplifier
130‧‧‧波長變換器 130‧‧‧wavelength converter
111‧‧‧半導體雷射 111‧‧‧Semiconductor laser
112‧‧‧結合器 112‧‧‧ combiner
113‧‧‧光纖型放大媒質 113‧‧‧Fiber type amplifying medium
121a、121b‧‧‧二向分光反射鏡 121a, 121b‧‧‧ dichroic mirror
122‧‧‧放大媒質 122‧‧‧Amplification medium
123a、123b‧‧‧激發光源 123a, 123b‧‧‧ excitation light source
124a至124d‧‧‧傳遞光學系統 124a to 124d‧‧‧Transmission optical system
130‧‧‧波長變換器 130‧‧‧wavelength converter
131、133‧‧‧透鏡 131, 133‧‧ lens
132‧‧‧波長變換元件 132‧‧‧ wavelength conversion components
135‧‧‧波長選擇元件 135‧‧‧wavelength selection component
201‧‧‧光束調整光學系統 201‧‧‧ Beam adjustment optical system
202‧‧‧導光反射鏡 202‧‧‧Light guide mirror
203‧‧‧聚光透鏡 203‧‧‧ Concentrating lens
204‧‧‧基座台 204‧‧‧Base table
205‧‧‧雷射光束 205‧‧‧Laser beam
206‧‧‧被加工物 206‧‧‧Processed objects
207‧‧‧基座掃描方向 207‧‧‧ pedestal scanning direction
208‧‧‧加工孔 208‧‧‧Mask holes
lambda1至lambda3‧‧‧光束 Lambda1 to lambda3‧‧‧beam
B1、B2‧‧‧光束傳播 B1, B2‧‧‧ Beam Propagation
BM‧‧‧光束監視器部 BM‧‧‧ Beam Monitor Department
PM‧‧‧功率監視器部 PM‧‧‧Power Monitor Department
第1圖係表示本發明之實施形態1、3的雷射裝置之構成圖。 Fig. 1 is a view showing the configuration of a laser device according to Embodiments 1 and 3 of the present invention.
第2圖係表示前置光放大器110的一例之構成圖。 Fig. 2 is a view showing a configuration of an example of the front optical amplifier 110.
第3圖係表示後置光放大器120的一例之構成圖。 Fig. 3 is a view showing a configuration of an example of the rear optical amplifier 120.
第4圖(a)至(d)係表示種子光源的輸出之瞬時功率、前置光放大器的激發功率、前置光放大器後的瞬時功率、以及前置光放大器後的平均功率之時間變化之一例的曲線圖(graph)。 Fig. 4 (a) to (d) show the instantaneous power of the output of the seed light source, the excitation power of the preamplifier, the instantaneous power after the preamplifier, and the time variation of the average power after the preamplifier. An example of a graph.
第5圖(a)至(d)係比較例,並顯示前置光放大器的激發功率為固定時,種子光源之瞬時功率、前置光放大器的激發功率、以及放大後的功率之時間變化之一例的曲線圖。 Fig. 5 (a) to (d) are comparative examples, and show that the instantaneous power of the seed light source, the excitation power of the preamplifier, and the time after the amplified power are fixed when the excitation power of the front optical amplifier is fixed. A graph of an example.
第6圖係表示射入於後置光放大器之信號光的平均功率、與能自後置光放大器所取出之功率的關係之一例的曲線圖。 Fig. 6 is a graph showing an example of the relationship between the average power of the signal light incident on the post-amplifier and the power that can be taken out from the post-amplifier.
第7圖係表示放大媒質的熱透鏡的變化之信號光的光束傳播的變化之一例的說明圖。 Fig. 7 is an explanatory view showing an example of a change in beam propagation of signal light of a change in a thermal lens of a magnifying medium.
第8圖係表示於二次諧波產生中之基本波的峰值功率 與波長變換後之平均功率的關係之一例的曲線圖。 Figure 8 shows the peak power of the fundamental wave in the second harmonic generation. A graph showing an example of the relationship between the average power after wavelength conversion.
第9圖係表示波長變換器130的一例之構成圖。 Fig. 9 is a view showing a configuration of an example of the wavelength converter 130.
第10圖係表示本發明之實施形態2、4的雷射裝置之構成圖。 Fig. 10 is a view showing the configuration of a laser device according to Embodiments 2 and 4 of the present invention.
第11圖係表示Yb(鐿)的吸收光譜(spectrum)的曲線圖。 Fig. 11 is a graph showing the absorption spectrum of Yb (镱).
第12圖係表示本發明之實施形態5的雷射裝置之構成圖。 Fig. 12 is a view showing the configuration of a laser device according to a fifth embodiment of the present invention.
第13圖係表示本發明之實施形態6的雷射加工機之構成圖。 Figure 13 is a view showing the configuration of a laser processing machine according to a sixth embodiment of the present invention.
本專利申請案係將2014年8月29日於日本提案之日本特願2014-175240號作為優先權的基礎,據此參考其揭示內容而編入本專利申請案。 This patent application is based on Japanese Patent Application No. 2014-175240, filed on Jan. 29,,,,,,,,,,,,,,,,,,,
以下,參考圖式而說明最佳的實施形態。 Hereinafter, the best mode will be described with reference to the drawings.
第1圖係表示本發明之實施形態1的雷射裝置之構成圖。雷射裝置100係具備:種子光源1、前置光放大器110、後置光放大器120、波長變換器130、控制部2、種子光源驅動器3、前置光放大器驅動器4、後置光放大器驅動器9、以及功率監視器部PM等。又,雖未特別明示,但,雷射裝置100亦可在光信號通過的路徑上含有用以控制折回光的光隔離體(isolator)、以及用以傳遞光信號的透鏡、反射鏡(mirror)等之傳遞光學系統等。 Fig. 1 is a view showing the configuration of a laser device according to a first embodiment of the present invention. The laser device 100 includes a seed light source 1, a front optical amplifier 110, a rear optical amplifier 120, a wavelength converter 130, a control unit 2, a seed light source driver 3, a front optical amplifier driver 4, and a rear optical amplifier driver 9. And the power monitor unit PM and the like. Further, although not specifically shown, the laser device 100 may include an optical isolator for controlling the folded light and a lens and a mirror for transmitting the optical signal on the path through which the optical signal passes. Such as the transmission of optical systems and the like.
種子光源1係藉由種子光源驅動器3驅動而輸出種子光。種子光源1係由可將輸出脈衝的重複頻率及/或脈衝寬度控制在較寬廣範圍的半導體雷射而構成者為佳,例如可使用分佈反饋型(DFB)雷射、分佈反射繞射(Bragg)型(DBR)雷射、法布里-伯羅(Fabry-Perot)型(FP)雷射、外部空腔(cavity)型雷射、以及垂直共振器面發光雷射(VCSEL)等。種子光源1的發光波長之一例為1064nm,但,並不限定為該值,亦可為另外的波長。種子光源1亦可為藉由外部共振器等的構造性控制或外部的溫度控制而使發光波長產生變化的波長可變型雷射。 The seed light source 1 is driven by the seed light source driver 3 to output seed light. The seed light source 1 is preferably composed of a semiconductor laser capable of controlling the repetition frequency and/or the pulse width of the output pulse over a wide range, for example, a distributed feedback type (DFB) laser or a distributed reflection diffraction (Bragg) Type (DBR) lasers, Fabry-Perot type (FP) lasers, external cavity type lasers, and vertical resonator surface emitting lasers (VCSELs). An example of the light emission wavelength of the seed light source 1 is 1064 nm, but it is not limited to this value, and may be another wavelength. The seed light source 1 may be a wavelength-variable laser that changes the light-emitting wavelength by structural control of an external resonator or the like or external temperature control.
前置光放大器110係與種子光源1作光學性的連接,藉由前置光放大器驅動器4而驅動,且將自種子光源1所輸出的光予以光學性地放大。 The front optical amplifier 110 is optically coupled to the seed light source 1, is driven by the front optical amplifier driver 4, and optically amplifies the light output from the seed light source 1.
第2圖係表示前置光放大器110的一例之構成圖。前置光放大器110係含有:光纖型放大媒質113;半導體雷射111,係用以對光纖型放大媒質113供應激發光;以及結合器112,係用以將激發光導入於光纖型放大媒質113。 Fig. 2 is a view showing a configuration of an example of the front optical amplifier 110. The pre-amplifier 110 includes: a fiber-type amplifying medium 113; a semiconductor laser 111 for supplying excitation light to the fiber-type amplifying medium 113; and a combiner 112 for introducing excitation light to the fiber-type amplifying medium 113 .
光纖型放大媒質113係使被放大光進行波導路徑性傳播之波導路型,並不需熱透鏡、或不受熱透鏡的影響而能放大,由在玻璃(glass)光纖的核心部添加希土類元素,例如,Yb(鐿)、Er(鉺)、Nd(釹)、Tm(銩)、Ho(硼)、Pr(鐠)等而構成。光纖型放大媒質113亦可作為雙包層(double clad)光纖及/或偏光保持光纖而構成。又,第2圖 雖為例示一段的光纖型放大媒質113,但,亦可作成串聯的複數段之光纖型放大媒質113的構成。此外,第2圖雖為例示一段的前置光放大器110,但,亦可將複數段串聯著半導體雷射111、結合器112、光纖型放大媒質113的組件(set)作為前置光放大器110而構成。 The optical fiber type amplifying medium 113 is a waveguide type that allows waveguide light to propagate through a waveguide, and does not require a thermal lens or can be amplified without being affected by a thermal lens, and a rare earth element is added to a core portion of a glass optical fiber. For example, it is composed of Yb (镱), Er (铒), Nd (钕), Tm (銩), Ho (boron), Pr (鐠), and the like. The optical fiber type amplifying medium 113 can also be configured as a double clad fiber and/or a polarization maintaining fiber. Again, Figure 2 Although the optical fiber type amplifying medium 113 of one segment is exemplified, a configuration of a plurality of fiber-optic amplifying media 113 of a plurality of stages may be employed. In addition, although FIG. 2 is a front-end optical amplifier 110 exemplifying a section, a set of a plurality of semiconductor lasers 111, a combiner 112, and a fiber-type amplifying medium 113 may be used in series as the pre-amplifier 110. And constitute.
控制部2係透過前置光放大器驅動器4,改變半導體雷射111的激發光功率,藉此能控制前置光放大器110的增益。 The control unit 2 changes the excitation light power of the semiconductor laser 111 through the front optical amplifier driver 4, whereby the gain of the front optical amplifier 110 can be controlled.
回到第1圖,功率監視器部PM係具備:輸出提取手段5,係用以提取前置光放大器110的輸出之一部分;以及功率監視器電路7,係測定藉由輸出提取手段5所提取之光6的平均功率。輸出提取手段5係例如可使用將光的一部分予以反射之部分反射反射鏡、以及僅將光的一部分予以提取之纖維耦合器(coupler)等,其一例為提取前置光放大器110的輸出之1%程度。功率監視器電路7係含有將提取之光變換成電氣信號的元件,例如熱電堆(thermopile)或光二極體(photodiode)、以及低通濾波器(low-pass filter)等,測定自前置光放大器110所輸出之光的平均功率,且將該測定結果傳送給控制部2。 Returning to Fig. 1, the power monitor unit PM includes an output extraction means 5 for extracting one of the outputs of the front optical amplifier 110, and a power monitor circuit 7 for measuring the output by the output extraction means 5. The average power of the light 6. The output extraction means 5 is, for example, a partial reflection mirror that reflects a part of light, and a fiber coupler that extracts only a part of light, and an example thereof is an output of the extraction front optical amplifier 110. %degree. The power monitor circuit 7 includes an element that converts the extracted light into an electrical signal, such as a thermopile or a photodiode, and a low-pass filter, etc., measured from the front light. The average power of the light output from the amplifier 110 is transmitted to the control unit 2.
後置光放大器120係藉由後置光放大器驅動器9而驅動,且用以將自前置光放大器110所輸出且通過功率監視器部PM之光8予以光學性地放大。後置光放大器120係使被放大光在雷射媒質中不進行波導路徑性傳播之光放大器,亦即以非波導路型之光放大器所構成,為了 抑制受激拉曼散射(SRS)、自相位調變(SPM)等之不佳的非線性現象之發生、以及放大器的射出端面之光學性的損壞,而構成為使被放大光相較於前置光放大器110能以較大之截面積進行射出入。 The rear optical amplifier 120 is driven by the post optical amplifier driver 9 and is used to optically amplify the light 8 output from the pre-optical amplifier 110 and passing through the power monitor unit PM. The rear optical amplifier 120 is an optical amplifier that does not perform waveguide path propagation in the laser medium, that is, a non-waveguide type optical amplifier, in order to Suppressing the occurrence of non-linear phenomena such as stimulated Raman scattering (SRS), self-phase modulation (SPM), and optical damage of the exit end face of the amplifier, and constituting the amplified light compared to the former The optical amplifier 110 can be injected with a large cross-sectional area.
第3圖係表示後置光放大器120的一例之構成圖。後置光放大器120係含有:放大媒質122、二向(dichroic)分光反射鏡121a、121b、傳遞光學系統124a、124b、124c、124d、以及激發光源123a、123b等。 Fig. 3 is a view showing a configuration of an example of the rear optical amplifier 120. The rear optical amplifier 120 includes an amplifying medium 122, dichroic spectroscopic mirrors 121a and 121b, transmission optical systems 124a, 124b, 124c, and 124d, and excitation light sources 123a and 123b.
放大媒質122係形成為使被放大光不進行波導路徑性傳播之非波導路型,亦即具有熱透鏡的功效之構成,例如,具有圓柱、角柱等的柱狀或棒狀的形狀,且例如在YAG(釔鋁石榴石)、YVO4、GdVO4、藍寶石(sapphire)、玻璃等之光學結晶或光學玻璃添加Nd、Yb、Er、Tm、Ho、Pr、Ti等的元素而構成。放大媒質122的側面係設有直接的或間接的冷卻用之冷卻機構。二向分光反射鏡121a、121b係構成為用以反射被放大光8的波長,且用以透射激發光的波長。 The amplifying medium 122 is formed into a non-waveguide type in which the amplified light does not propagate in a waveguide path, that is, a configuration having an effect of a thermal lens, for example, a columnar or rod-shaped shape having a column, a corner, or the like, and for example An element such as Nd, Yb, Er, Tm, Ho, Pr, or Ti is added to an optical crystal such as YAG (yttrium aluminum garnet), YVO 4 , GdVO 4 , sapphire, or glass, or an optical glass. The side of the amplifying medium 122 is provided with a direct or indirect cooling mechanism for cooling. The dichroic mirrors 121a and 121b are configured to reflect the wavelength of the amplified light 8 and to transmit the wavelength of the excitation light.
激發光源123a、123b係例如半導體雷射、固體雷射等,且用以分別從放大媒質122的兩端供應激發光。激發光的波長係以因應於放大媒質122的吸收波長之方式而設定,其一例為放大媒質122係Nd:YVO4時,則設定為例如808nm、880nm、888nm、914nm等。傳遞光學系統124a至124d係含有透鏡、反射鏡等,且將來自激發光源123a、123b的激發光傳遞給放大媒質122。 The excitation light sources 123a, 123b are, for example, semiconductor lasers, solid lasers, etc., and are used to supply excitation light from both ends of the amplification medium 122, respectively. The wavelength of the excitation light is set in accordance with the absorption wavelength of the amplification medium 122. For example, when the amplification medium 122 is Nd:YVO 4 , it is set to, for example, 808 nm, 880 nm, 888 nm, 914 nm or the like. The transfer optical systems 124a to 124d include lenses, mirrors, and the like, and transmit excitation light from the excitation light sources 123a and 123b to the amplification medium 122.
關於動作,自前置光放大器110所輸出之光8係以二向分光反射鏡121a加以反射,且通過放大媒質122時加以放大,此後,以二向分光反射鏡121b加以反射,且朝向後段輸出。放大媒質122當因吸收自激發光源123a、123b所輸出之激發光而產生熱時,則因應於該熱量的分佈而形成熱透鏡。當使前述之熱透鏡的強度產生變動時,則使放大後的光束傳播變化。 Regarding the operation, the light 8 output from the pre-amplifier 110 is reflected by the dichroic mirror 121a, amplified by the amplification of the medium 122, and then reflected by the dichroic mirror 121b, and is output toward the rear stage. . When the amplifying medium 122 generates heat by absorbing the excitation light output from the excitation light sources 123a and 123b, a thermal lens is formed in accordance with the distribution of the heat. When the intensity of the aforementioned thermal lens is varied, the amplified beam propagates.
又,第3圖雖係例示一段的放大媒質122,但,亦可作成串聯複數段之放大媒質122而構成。此外,第3圖雖係例示一段的後置光放大器120,但,亦可將複數段串聯著二向分光反射鏡121a、121b、放大媒質122、激發光源123a、123b、傳遞光學系統124a至124d的組件作為後置光放大器120而構成。 Further, although the third embodiment is an amplifying medium 122 exemplified in a section, it may be configured by forming a plurality of enlarged mediums 122 in series. Further, although FIG. 3 illustrates a post-stage optical amplifier 120, a plurality of sections may be connected in series to the dichroic mirrors 121a and 121b, the amplifying medium 122, the excitation light sources 123a and 123b, and the transmission optical systems 124a to 124d. The components are constructed as a post-amplifier 120.
回到第1圖,波長變換器130係例如含有非線性光學結晶等,且具有將自後置光放大器120所輸出之光的波長變換成另外的波長之功能。前述之波長變換係例如二次諧波產生、和頻產生、差頻產生、光參量(parametric)振盪、或此該等之組合。不需進行波長變換時,則可省略波長變換器130。 Returning to Fig. 1, the wavelength converter 130 includes, for example, a nonlinear optical crystal or the like, and has a function of converting the wavelength of light output from the post-optical amplifier 120 into another wavelength. The aforementioned wavelength conversion is, for example, second harmonic generation, sum frequency generation, difference frequency generation, parametric oscillation, or the like. The wavelength converter 130 can be omitted when wavelength conversion is not required.
繼而說明全部動作。控制部2係透過種子光源驅動器3而控制種子光源1能切換CW模式與脈衝叢發模式,使種子光源1能選擇性地輸出連續光(CW)或脈衝叢發。脈衝叢發係能使脈衝叢發中的脈衝和脈衝之間的功率控制為0、或較大於0之低於脈衝的峰值功率之值。此外, 亦能控制CW時的功率。 Then all the actions will be explained. The control unit 2 controls the seed light source 1 to switch between the CW mode and the pulse burst mode through the seed light source driver 3, so that the seed light source 1 can selectively output continuous light (CW) or pulse burst. The pulse burst system can control the power between the pulses and pulses in the burst burst to zero, or a value greater than zero below the peak power of the pulse. In addition, It can also control the power at CW.
如專利文獻1所說明,在脈衝輸出的導通(on)和關斷(off)的轉換當中,調整輸出脈衝叢發之前的種子光之CW的功率,藉此能將包含於放大器後之脈衝叢發的全部脈衝的峰值功率作成標稱上固定狀態。此外,在脈衝叢發中的脈衝和脈衝之間的期間當中,藉由改變種子光源的功率,而能控制放大後之個別的脈衝的峰值功率。另一方面,令放大器的激發功率為固定之狀態,切換CW模式和脈衝模式,或使脈衝叢發中的脈衝和脈衝之間的種子光源的功率產生變化,藉此而使種子光源的輸出波形變化係會有引起使放大器後之平均功率變化的現象。專利文獻1之構成雖係藉由調整種子光之CW時的功率、或脈衝叢發中的脈衝和脈衝之間的功率,而能控制放大器後之脈衝的峰值功率,但,放大器的激發功率為固定時,則亦無法同時控制放大後之平均輸出。 As described in Patent Document 1, in the on-and-off transition of the pulse output, the power of the CW of the seed light before the output pulse burst is adjusted, whereby the pulse bundle included in the amplifier can be The peak power of all pulses generated is nominally fixed. Further, during the period between the pulse and the pulse in the burst, the peak power of the amplified individual pulses can be controlled by changing the power of the seed source. On the other hand, the excitation power of the amplifier is fixed, the CW mode and the pulse mode are switched, or the power of the seed light source between the pulse and the pulse in the pulse burst is changed, thereby making the output waveform of the seed light source The change system has a phenomenon that causes the average power after the amplifier to change. The configuration of Patent Document 1 can control the peak power of the pulse after the amplifier by adjusting the power at the CW of the seed light or the power between the pulse and the pulse in the burst, but the excitation power of the amplifier is When fixed, it is also impossible to control the average output after amplification.
特別是,在第1段的光放大器(前置光放大器110)之後,存在有第2段的光放大器(後置光放大器120)時,當射入於後置光放大器的平均功率產生變化時,使在後置光放大器使用於雷射光的放大之功率產生變化,故使後置光放大器所產生的熱量產生變化。此時後置光放大器係不進行波導路徑性傳播之非波導路型,亦即包含具有熱透鏡之放大媒質時,當後置光放大器所產生的熱量產生變化時,則使後置光放大器之熱透鏡的強度產生變化,且使後置光放大器後的光束傳播產生變化。 In particular, when the optical amplifier (the rear optical amplifier 120) of the second stage exists after the optical amplifier (front optical amplifier 110) of the first stage, when the average power incident on the rear optical amplifier changes, Therefore, the power used for the amplification of the laser light in the post-amplifier is changed, so that the heat generated by the post-amplifier is changed. In this case, the post-amplifier is a non-waveguide type that does not perform waveguide path propagation, that is, when an amplifying medium having a thermal lens is included, when the heat generated by the post-amplifier changes, the post-amplifier is made. The intensity of the thermal lens changes and causes a change in the beam propagation after the post-amplifier.
本實施形態中,控制部2係根據功率監視器部PM的測定結果,並透過前置光放大器驅動器4而使半導體雷射111的激發光功率產生變化,而回授(feedback)控制前置光放大器110的增益,俾使前置光放大器110後的平均功率不會產生變化。據此而即使種子光源1的功率在時間上產生變化,亦能將前置光放大器110的平均功率保持固定。結果,未使後置光放大器120後的光束傳播產生變化,而能將脈衝的峰值功率或脈衝能量控制在寬廣範圍。 In the present embodiment, the control unit 2 changes the excitation light power of the semiconductor laser 111 by the front optical amplifier driver 4 based on the measurement result of the power monitor unit PM, and feeds back the control front light. The gain of the amplifier 110 does not cause a change in the average power after the pre-amplifier 110. Accordingly, even if the power of the seed light source 1 changes in time, the average power of the pre-optical amplifier 110 can be kept constant. As a result, the beam propagation after the post-optical amplifier 120 is not changed, and the peak power or pulse energy of the pulse can be controlled over a wide range.
第4圖(a)至(d)係分別表示種子光源1的輸出之瞬時功率、前置光放大器110的激發功率、前置光放大器110後的瞬時功率、以及前置光放大器110後的平均功率之時間變化之一例的曲線圖。又,由於相對於典型的脈衝寬度係100ps至100ns左右的較短時間,脈衝叢發中的脈衝和脈衝之間隔就典型而言係1μs至1ms左右之非常長的時間,故為了促進理解,圖中有關於脈衝和脈衝之間隔係以壓縮之方式加以表示。此外,有關相對於脈衝的峰值功率之CW的功率、以及脈衝和脈衝之間的功率,亦為了促進理解,圖中係以誇大之方式加以表示。 4(a) to (d) show the instantaneous power of the output of the seed light source 1, the excitation power of the front optical amplifier 110, the instantaneous power after the front optical amplifier 110, and the average after the front optical amplifier 110, respectively. A graph of one of the time variations in power. Moreover, since the interval between the pulse and the pulse in the burst burst is typically a very long time of about 1 μs to 1 ms with respect to a typical pulse width of about 100 ps to 100 ns, in order to facilitate understanding, The interval between pulses and pulses is expressed in terms of compression. In addition, the power of the CW with respect to the peak power of the pulse, and the power between the pulse and the pulse are also expressed in an exaggerated manner for the purpose of promoting understanding.
在第4圖(a)當中,脈衝叢發之前的CW的功率係調整成前置光放大器110後之脈衝的峰值功率為標稱上固定。因此,種子光源1的CW時的功率係隨後續之脈衝叢發中的放大後的峰值功率的大小而產生變化。因此,前置光放大器110的激發功率為固定時,CW時的放大後的平均功率係產生變化。有益於將前置光放大器110後之 平均功率保持固定係因應於種子光源1的功率而使前置光放大器的激發功率產生變化。 In Fig. 4(a), the power of the CW before the burst burst is adjusted to the peak power of the pulse after the pre-amplifier 110 is nominally fixed. Therefore, the power at the CW of the seed light source 1 varies with the magnitude of the amplified peak power in the subsequent bursts. Therefore, when the excitation power of the front optical amplifier 110 is fixed, the average power after amplification at the CW changes. Good for the front optical amplifier 110 The average power remains fixed in response to the power of the seed source 1 to cause a change in the excitation power of the pre-amplifier.
此外,脈衝叢發中的脈衝和脈衝之間的功率係根據放大後的脈衝的峰值功率而決定。因此,前置光放大器110的激發功率為固定時,雖能使放大後的脈衝的峰值功率產生變化,但,無法控制放大後的平均功率。 In addition, the power between the pulse and the pulse in the burst is determined based on the peak power of the amplified pulse. Therefore, when the excitation power of the front optical amplifier 110 is fixed, the peak power of the amplified pulse can be changed, but the average power after amplification cannot be controlled.
因此,種子光的瞬時功率係如第4圖(a),使CW和脈衝叢發、或脈衝叢發中的脈衝和脈衝之間的功率產生變化,進而如第4圖(b),控制前置光放大器110的激發功率。據此,即能夠如第4圖(c),控制前置光放大器110後之脈衝的峰值功率,且如第4圖(d),將前置光放大器110後之平均功率保持固定。結果,後置光放大器120之熱透鏡的特性實質上並未產生變化,且後置光放大器120後的光束傳播實質上亦未產生變化。 Therefore, the instantaneous power of the seed light is as shown in Fig. 4(a), causing a change in the power between the pulse and the pulse in the CW and the burst burst, or in the burst burst, and further as shown in Fig. 4(b) before the control. The excitation power of the optical amplifier 110 is set. Accordingly, the peak power of the pulse after the front optical amplifier 110 can be controlled as shown in Fig. 4(c), and the average power after the front optical amplifier 110 is kept constant as shown in Fig. 4(d). As a result, the characteristics of the thermal lens of the post-amplifier 120 are substantially unchanged, and the beam propagation after the post-amplifier 120 is substantially unchanged.
第5圖係比較例,顯示前置光放大器110的激發功率為固定時,種子光源1之瞬時功率、前置光放大器110的激發功率、以及放大後的功率之時間變化之一例的曲線圖。如第5圖(a),使種子光源1的瞬時功率產生變化,且如第5圖(b),將前置光放大器110的激發功率保持固定時,如第5圖(c),雖能控制前置光放大器110後之脈衝的峰值功率,但,如第5圖(d),可知前置光放大器110的平均功率係產生變化。如此之平均功率的變化係如前述,形成引起後置光放大器120之熱透鏡的變化,且使後置光放大器120後的光束傳播產生變化。 Fig. 5 is a graph showing an example of temporal changes in the instantaneous power of the seed light source 1, the excitation power of the front optical amplifier 110, and the amplified power when the excitation power of the front optical amplifier 110 is fixed. As shown in Fig. 5(a), the instantaneous power of the seed light source 1 is changed, and as shown in Fig. 5(b), when the excitation power of the front optical amplifier 110 is kept constant, as shown in Fig. 5(c), The peak power of the pulse after the front optical amplifier 110 is controlled. However, as shown in Fig. 5(d), it can be seen that the average power of the front optical amplifier 110 changes. Such a change in the average power is as described above, forming a change in the thermal lens that causes the post-optical amplifier 120, and causing a change in the beam propagation after the post-amplifier 120.
又,在第4圖及第5圖當中,雖記載種子光源1係輸出大致2種類的脈衝叢發,但,亦可輸出1種類或3種類以上的脈衝叢發。此外,脈衝叢發中的脈衝和脈衝之間的功率亦可在各脈衝產生變化。 In addition, in the fourth and fifth figures, the seed light source 1 outputs two types of pulse bursts, but one type or three or more types of burst bursts can be output. In addition, the power between the pulses and pulses in the pulse burst can also vary in each pulse.
第6圖係表示射入於後置光放大器120之信號光的平均功率、與能夠自後置光放大器120所取出之功率的關係之一例的曲線圖。可得知當射入於後置光放大器120之平均功率變大時,能夠自後置光放大器120所取出之功率係呈飽和。射入於後置光放大器120之平均功率變小,且自後置光放大器120所取出之功率未呈飽和之區域,亦即在未飽和區域使用時,相對於射入於後置光放大器120之平均功率的變動,產生的熱量係較大的變化,故獲得使本發明的功效更為顯著。 Fig. 6 is a graph showing an example of the relationship between the average power of the signal light incident on the rear optical amplifier 120 and the power that can be taken out from the post-optical amplifier 120. It can be seen that when the average power incident on the post-optical amplifier 120 becomes large, the power that can be taken out from the post-amplifier 120 is saturated. The average power injected into the post-amplifier 120 becomes smaller, and the power extracted from the post-amplifier 120 is not saturated, that is, when used in an unsaturated region, relative to the incident optical amplifier 120. The change in the average power produces a large change in the amount of heat generated, so that the effect of the present invention is more remarkable.
第7圖係表示放大媒質的熱透鏡的變化之信號光的光束傳播的變化之一例的說明圖。實線係表示熱透鏡的變化前,虛線係表示熱透鏡的變化後。在放大媒質122的內部當中,受起因光吸收的發熱藉此形成某強度的熱透鏡時,通過放大媒質122的光束係以光束傳播B1之方式傳播。此後,使前置光放大器110的射出光之功率產生變化,藉此使在後置光放大器120之放大媒質122當中發生的熱量產生變化。例如,放大媒質122之熱透鏡的強度產生5%變化時,光束係以光束傳播B2之方式傳播。該對策係當前置光放大器110的輸出為固定,且控制前置光放大器110的激發功率時,由於後置光放大器120之熱透鏡實 質上未產生變化,故光束傳播係未產生變化。 Fig. 7 is an explanatory view showing an example of a change in beam propagation of signal light of a change in a thermal lens of a magnifying medium. The solid line indicates the change of the thermal lens, and the broken line indicates the change of the thermal lens. When a heat lens of a certain intensity is formed by heat generated by light absorption in the inside of the amplifying medium 122, the light beam that has passed through the amplifying medium 122 propagates as the light beam B1. Thereafter, the power of the light emitted from the front optical amplifier 110 is changed, whereby the amount of heat generated in the amplifying medium 122 of the post optical amplifier 120 is changed. For example, when the intensity of the thermal lens of the amplifying medium 122 is changed by 5%, the beam propagates in the manner of beam propagation B2. The countermeasure is that the output of the current optical amplifier 110 is fixed, and when the excitation power of the pre-amplifier 110 is controlled, the thermal lens of the rear optical amplifier 120 is There is no change in the quality, so the beam propagation system does not change.
第8圖係表示於二次諧波產生中之基本波的峰值功率、與波長變換後之平均功率的關係之一例的曲線圖。如第4圖(c)所示,種子光為CW的期間、以及脈衝叢發中的脈衝和脈衝之間的期間相較於脈衝的峰值時,功率係相當低,故實質上可忽視波長變換後的輸出。因此,使基本波的峰值功率變動,藉此即能控制波長變換後的平均功率。 Fig. 8 is a graph showing an example of the relationship between the peak power of the fundamental wave and the average power after the wavelength conversion in the second harmonic generation. As shown in Fig. 4(c), the period during which the seed light is CW and the period between the pulse and the pulse in the pulse burst are relatively low compared to the peak of the pulse, so the wavelength conversion can be substantially ignored. After the output. Therefore, the peak power of the fundamental wave is varied, whereby the average power after the wavelength conversion can be controlled.
第9圖係表示波長變換器130的一例之構成圖。後置光放大器後的光束lambda1係藉由透鏡131而聚光,且射入於第1波長變換元件132。波長變換元件132係將光束lambda1之功率的一部分變換成和光束lambda1不同波長的光束lambda2。光束lambda1及光束lambda2係藉由透鏡133而再聚光,且射入於第2波長變換元件134。波長變換元件134係將光束lambda1及光束lambda2之功率的一部分變換成波長和光束lambda1及光束lambda2不同的光束lambda3。光束lambda1、lambda2、lambda3係射入於波長選擇元件135,而選擇性地僅取出光束lambda3。例如,光束lambda1的波長為1064nm,光束lambda2的波長為532nm,而光束lambda3的波長為355nm。波長變換元件131、134係例如LBO、BBO、CLBO、CBO、KBBF、KTP的結晶。波長選擇元件135係例如反射/透射光束lambda3的波長,且透射/反射光束lambda1及光束lambda2的波長之反射鏡、以及稜鏡(prism)等。未使用本發明之構成, 當後置光放大器120後的光束之傳播產生變化時,則使波長變換元件132及134中的光束直徑產生變化。波長變換元件中的光束直徑的變化係對波長變換效率、波長變換元件的壽命造成影響。使用本發明之構成時,能抑制此等之影響,故具有波長變換器130時,更使本發明達成進一步的功效。 Fig. 9 is a view showing a configuration of an example of the wavelength converter 130. The light beam lambda1 after the rear optical amplifier is condensed by the lens 131 and incident on the first wavelength conversion element 132. The wavelength conversion element 132 converts a part of the power of the light beam lambda1 into a light beam lambda2 of a different wavelength from the light beam lambda1. The light beam lambda1 and the light beam lambda2 are re-concentrated by the lens 133 and incident on the second wavelength conversion element 134. The wavelength conversion element 134 converts a part of the power of the light beam lambda1 and the light beam lambda2 into a light beam lambda3 having a wavelength different from that of the light beam lambda1 and the light beam lambda2. The light beams lambda1, lambda2, and lambda3 are incident on the wavelength selective element 135, and selectively only the light beam lambda3 is taken out. For example, the beam lambda1 has a wavelength of 1064 nm, the beam lambda2 has a wavelength of 532 nm, and the beam lambda3 has a wavelength of 355 nm. The wavelength conversion elements 131 and 134 are, for example, crystals of LBO, BBO, CLBO, CBO, KBBF, and KTP. The wavelength selecting element 135 is, for example, a mirror that reflects/transmits the wavelength of the light beam lambda3, and a mirror that transmits/reflects the wavelengths of the light beam lambda1 and the light beam lambda2, and a prism or the like. The composition of the present invention is not used, When the propagation of the light beam after the rear optical amplifier 120 changes, the beam diameters in the wavelength conversion elements 132 and 134 are changed. The change in the beam diameter in the wavelength conversion element affects the wavelength conversion efficiency and the lifetime of the wavelength conversion element. When the configuration of the present invention is used, the influence of these effects can be suppressed. Therefore, when the wavelength converter 130 is provided, the present invention achieves further effects.
第10圖係表示本發明之實施形態2的雷射裝置之構成圖。雷射裝置100係具備:種子光源1、前置光放大器110、後置光放大器120、波長變換器130、控制部2、種子光源驅動器3、前置光放大器驅動器4、後置光放大器驅動器9、以及功率監視器部PM等。關於個別的構成要素係和實施形態1相同的構成,故省略重覆說明。 Fig. 10 is a view showing the configuration of a laser device according to a second embodiment of the present invention. The laser device 100 includes a seed light source 1, a front optical amplifier 110, a rear optical amplifier 120, a wavelength converter 130, a control unit 2, a seed light source driver 3, a front optical amplifier driver 4, and a rear optical amplifier driver 9. And the power monitor unit PM and the like. Since the individual components are the same as those of the first embodiment, the description thereof will not be repeated.
本實施形態中係在將前置光放大器110之激發光功率維持固定的狀態下,即使改變種子光源1的輸出狀態時,亦能藉由控制後置光放大器120的增益,來控制成使後置光放大器120的熱透鏡之強度不會產生變化。具體而言,控制部2係根據功率監視器部PM的測定結果,並透過後置光放大器驅動器9,以使後置光放大器120的熱透鏡能成為固定的狀態之方式,前饋(feedforward)控制後置光放大器120的增益,較佳前饋控制激發光功率。 In the present embodiment, even when the output state of the seed light source 1 is changed while the excitation light power of the front optical amplifier 110 is maintained constant, the gain of the post-amplifier 120 can be controlled to control the subsequent state. The intensity of the thermal lens of the optical amplifier 120 does not change. Specifically, the control unit 2 transmits the feed lens to the rear optical amplifier driver 9 in accordance with the measurement result of the power monitor unit PM so that the thermal lens of the rear optical amplifier 120 can be fixed. The gain of the post-amplifier 120 is controlled, preferably with feedforward control of the excitation optical power.
在第10圖中,控制部2係對功率監視器部PM的測定結果,事前量測使後置光放大器120的熱透鏡成 為固定之後置光放大器120的激發光功率,且將兩者的關係作為資料庫(database)而保存於記憶體(memory)等。動作之時,種子光源1的輸出狀態產生變化,使前置光放大器110之輸出的平均功率產生變化,該狀態係由功率監視器部PM予以測定。控制部2係以不會使後置光放大器120的熱透鏡產生變化之方式,自資料庫讀取與變化之平均功率相對應的激發光功率目標值,且透過後置光放大器驅動器9而調整後置光放大器120的激發光功率。結果,能令前置光放大器110之激發光功率為固定之狀態,不使後置光放大器120後的光束之傳播產生變化,將脈衝光的峰值功率或脈衝能量控制在寬廣範圍。 In Fig. 10, the control unit 2 measures the measurement result of the power monitor unit PM, and measures the thermal lens of the rear optical amplifier 120 in advance. The excitation light power of the optical amplifier 120 is fixed, and the relationship between the two is stored in a memory or the like as a database. At the time of the operation, the output state of the seed light source 1 changes, and the average power of the output of the front optical amplifier 110 changes, and this state is measured by the power monitor unit PM. The control unit 2 reads the excitation light power target value corresponding to the changed average power from the data library so as not to change the thermal lens of the rear optical amplifier 120, and adjusts it through the rear optical amplifier driver 9. The excitation light power of the post-amplifier 120. As a result, the excitation light power of the front optical amplifier 110 can be made constant, the propagation of the light beam after the rear optical amplifier 120 is not changed, and the peak power or pulse energy of the pulse light is controlled to a wide range.
本實施形態中係在第1圖的構成中以控制前置光放大器110的增益為手段,實質上未使前置光放大器110之激發光功率產生變化,而使前置光放大器110之激發光波長產生變化。當激發光波長產生變化時,則使前置光放大器110中的光纖型放大媒質113的激發光吸收率產生變化,且使前置光放大器110的增益產生變化。據此和實施形態1相同的,能控制前置光放大器110後的平均功率。 In the present embodiment, in the configuration of Fig. 1, the excitation light of the front optical amplifier 110 is substantially not changed by controlling the gain of the front optical amplifier 110, and the excitation light of the front optical amplifier 110 is not substantially changed. The wavelength changes. When the wavelength of the excitation light changes, the excitation light absorption rate of the fiber-type amplification medium 113 in the front optical amplifier 110 is changed, and the gain of the front optical amplifier 110 is changed. According to this, in the same manner as in the first embodiment, the average power after the front optical amplifier 110 can be controlled.
在第2圖的構成中,就用以對光纖型放大媒質113供應激發光的半導體雷射111而言,可使用波長可變型半導體雷射。其一例,使用帕耳帖(Peltier)元件而控制法布理-伯羅型半導體雷射的溫度,藉此可使振盪波長產生 變化。 In the configuration of Fig. 2, a wavelength-variable semiconductor laser can be used for the semiconductor laser 111 for supplying excitation light to the fiber-type amplification medium 113. In one example, a Peltier element is used to control the temperature of a Fabry-Berro type semiconductor laser, thereby generating an oscillation wavelength. Variety.
控制部2係根據功率監視器部PM的測定結果,並透過前置光放大器驅動器4而使半導體雷射111的激發光波長產生變化,而回授控制前置光放大器110的增益,據此而能將前置光放大器110後的平均功率保持固定。 The control unit 2 changes the wavelength of the excitation light of the semiconductor laser 111 by the pre-optical amplifier driver 4 based on the measurement result of the power monitor unit PM, and feedbacks the gain of the pre-optical amplifier 110. The average power after the front optical amplifier 110 can be kept constant.
第11圖係表示Yb的吸收光譜的曲線圖。縱軸為吸收係數,橫軸為波長。例如,當添加Yb於前置光放大器110的光纖型放大媒質113時,使激發光的波長自吸收光譜的峰值之976nm產生達數nm的變化,而使吸收係數產生較大的變化。該情形時,由於使被吸收於光纖型放大媒質113之激發光的功率產生變化,故亦使前置光放大器110的增益產生變化,而能使前置光放大器110後的平均功率產生變化。 Fig. 11 is a graph showing the absorption spectrum of Yb. The vertical axis is the absorption coefficient and the horizontal axis is the wavelength. For example, when Yb is added to the fiber-type amplification medium 113 of the pre-amplifier 110, the wavelength of the excitation light is changed by a few nm from the peak of the absorption spectrum at 976 nm, and the absorption coefficient is largely changed. In this case, since the power of the excitation light absorbed by the optical fiber type amplifying medium 113 is changed, the gain of the front optical amplifier 110 is also changed, and the average power after the front optical amplifier 110 is changed.
本實施形態中係在第10圖的構成中以控制後置光放大器120的增益為手段,實質上未使後置光放大器120之激發光功率產生變化,而使後置光放大器120之激發光波長產生變化。當激發光波長產生變化時,則使後置光放大器120中的放大媒質122的激發光吸收率產生變化,且使後置光放大器120的增益產生變化。據此和實施形態2相同的,能以使後置光放大器120的熱透鏡之強度未產生變化之方式進行控制。 In the present embodiment, in the configuration of Fig. 10, by controlling the gain of the rear optical amplifier 120, the excitation light power of the rear optical amplifier 120 is substantially not changed, and the excitation light of the rear optical amplifier 120 is made. The wavelength changes. When the wavelength of the excitation light changes, the excitation light absorption rate of the amplification medium 122 in the post-optical amplifier 120 is changed, and the gain of the post-optical amplifier 120 is changed. According to this, in the same manner as in the second embodiment, it is possible to control so that the intensity of the thermal lens of the rear optical amplifier 120 does not change.
在第3圖的構成中,就用以對放大媒質122 供應激發光的激發光源123a、123b而言,可使用波長可變型半導體雷射。其一例,使用帕耳帖元件而控制法布理-伯羅型半導體雷射的溫度,藉此可使振盪波長產生變化。 In the configuration of FIG. 3, it is used to amplify the medium 122. For the excitation light sources 123a, 123b that supply the excitation light, a wavelength-variable semiconductor laser can be used. As an example, the temperature of the Fabry-Berro type semiconductor laser is controlled using a Peltier element, whereby the oscillation wavelength can be changed.
控制部2係根據功率監視器部PM的測定結果,並透過後置光放大器驅動器9而使激發光源123a、123b的激發光波長產生變化,而前饋控制後置光放大器120的增益,據此而能將後置光放大器120的熱透鏡之特性保持固定。 The control unit 2 changes the wavelength of the excitation light of the excitation light sources 123a and 123b through the post-optical amplifier driver 9 based on the measurement result of the power monitor unit PM, and feeds forward the gain of the post-amplifier 120. The characteristics of the thermal lens of the post-amplifier 120 can be kept constant.
第12圖係表示本發明之實施形態5的雷射裝置之構成圖。雷射裝置100係具備:種子光源1、前置光放大器110、後置光放大器120、波長變換器130、控制部2、種子光源驅動器3、前置光放大器驅動器4、後置光放大器驅動器9、監視後置放大器後的光束的輪廓(profile)之光束監視器部BM、以及監視由光束提取手段10所提取的光束的輪廓之光束監視器11等。關於個別的構成要素係和實施形態1相同的構成,故省略重覆說明。 Fig. 12 is a view showing the configuration of a laser device according to a fifth embodiment of the present invention. The laser device 100 includes a seed light source 1, a front optical amplifier 110, a rear optical amplifier 120, a wavelength converter 130, a control unit 2, a seed light source driver 3, a front optical amplifier driver 4, and a rear optical amplifier driver 9. The beam monitor unit BM that monitors the profile of the beam after the post-amplifier, and the beam monitor 11 that monitors the contour of the beam extracted by the beam extracting means 10 and the like. Since the individual components are the same as those of the first embodiment, the description thereof will not be repeated.
本實施形態中光束監視器部BM係由將後置放大器後的光束之一部分予以提取之光束提取手段10、以及測定射入的光束的輪廓之光束監視器11所構成,監視後置光放大器120後的光束的輪廓,且計算光束的直徑。光束提取手段10係例如僅反射或透射光束之一部分之部分反射反射鏡。光束監視器11係例如CCD影像感測器(image sensor)、以及CMOS影像感測器等。當藉由後置光放大器120所產生的熱透鏡之強度產生變化時,則藉由光束監視器11所監視的光束的輪廓係產生變化,且計算之光束直徑亦產生變化。因此,根據由光束監視器部BM所計算之光束直徑的變化,而能觀測後置光放大器120所產生的熱透鏡之強度的變化。控制部2係透過前置光放大器驅動器4,且調整前置光放大器110的激發功率或激發波長來控制增益,或透過後置光放大器驅動器9,且調整後置光放大器120的激發功率或激發波長來控制增益,俾使藉由光束監視器部BM所計算之光束直徑不會產生變化。結果,不需監視前置光放大器110的輸出,而能使後置光放大器120所產生的熱透鏡之強度保持固定,且不使後置光放大器120後的光束之傳播產生變化,即能將脈衝光的峰值功率或脈衝能量控制在寬廣範圍。 In the present embodiment, the beam monitor unit BM is composed of a beam extracting means 10 for extracting one of the beams after the post-amplifier, and a beam monitor 11 for measuring the contour of the incident beam, and monitoring the post-amplifier 120. The contour of the back beam and the diameter of the beam is calculated. The beam extraction means 10 is, for example, a partial reflection mirror that only reflects or transmits a portion of the beam. The beam monitor 11 is, for example, a CCD image sensor (image) Sensor), and CMOS image sensor. When the intensity of the thermal lens generated by the post-optical amplifier 120 changes, the profile of the beam monitored by the beam monitor 11 changes, and the calculated beam diameter also changes. Therefore, the change in the intensity of the thermal lens generated by the post-optical amplifier 120 can be observed based on the change in the beam diameter calculated by the beam monitor unit BM. The control unit 2 transmits the excitation power or the excitation wavelength of the pre-optical amplifier 110 to control the gain through the pre-optical amplifier driver 4, or transmits the post-amplifier driver 9, and adjusts the excitation power or excitation of the post-amplifier 120. The wavelength is used to control the gain so that the diameter of the beam calculated by the beam monitor portion BM does not change. As a result, it is not necessary to monitor the output of the front optical amplifier 110, and the intensity of the thermal lens generated by the rear optical amplifier 120 can be kept constant, and the propagation of the light beam after the rear optical amplifier 120 is not changed, that is, The peak power or pulse energy of the pulsed light is controlled over a wide range.
第13圖係表示本發明之實施形態6的雷射加工機之構成圖。雷射加工機200係具備:雷射裝置100、光束調整光學系201、導光反射鏡202、聚光透鏡203、以及基座(stage)台204等。雷射裝置100係由本發明之實施形態1至5之中之任意一者所記載之方法所構成。自雷射裝置100所射出的雷射光束205係藉由光束調整光學系統201,調整及整形為期望的光束直徑及輪廓,且在藉由導光反射鏡202予以導光之後,藉由聚光透鏡203而聚光於被加工物206。 基座台204係朝基座掃描方向207的方向運動,掃描相對於雷射光束之被加工物206的位置,藉此在期望的位置形成細微的加工孔208。加工孔208的種類係例如有盲孔或貫穿孔等。加工孔208亦可分別為不同的大小。又,本實施形態雖係作成按基座掃描方向207掃描基座台204之構成,但,並不限定於該情形,由於亦可進行被加工物206和雷射光束205之間之相對性的掃描,故將基座台204予以固定,且藉由電流(galvano)反射鏡、多角形(polygon)反射鏡等掃描雷射光束205,亦能取得相同的功效。該情形時,可使用F θ透鏡203作為聚光透鏡203而進行照射。被加工物206係例如有可撓性(flexible)基板、多層基板等。由於此等之基板係由樹脂及銅箔所構成,故雷射光束205的波長係以具有吸收於樹脂及銅箔的雙方之紫外線區域為更佳。 Figure 13 is a view showing the configuration of a laser processing machine according to a sixth embodiment of the present invention. The laser processing machine 200 includes a laser device 100, a beam adjustment optical system 201, a light guiding mirror 202, a collecting lens 203, a stage table 204, and the like. The laser device 100 is constituted by the method described in any one of the first to fifth embodiments of the present invention. The laser beam 205 emitted from the laser device 100 is adjusted and shaped into a desired beam diameter and contour by the beam adjusting optical system 201, and is guided by the light guiding mirror 202, and then concentrated by light. The lens 203 is condensed on the workpiece 206. The susceptor table 204 is moved in the direction of the susceptor scanning direction 207 to scan the position of the workpiece 206 with respect to the laser beam, thereby forming a finely machined hole 208 at a desired position. The type of the processing hole 208 is, for example, a blind hole or a through hole. The processing holes 208 can also be of different sizes. Further, in the present embodiment, the base unit 204 is scanned in the susceptor scanning direction 207. However, the present invention is not limited to this case, and the relative relationship between the workpiece 206 and the laser beam 205 can be performed. Scanning, the susceptor table 204 is fixed, and the same effect can be obtained by scanning the laser beam 205 by a current (galvano) mirror, a polygon mirror or the like. In this case, the F θ lens 203 can be used as the condensing lens 203 to perform irradiation. The workpiece 206 is, for example, a flexible substrate, a multilayer substrate, or the like. Since these substrates are composed of a resin and a copper foil, the wavelength of the laser beam 205 is preferably such that it has an ultraviolet region that is absorbed by both the resin and the copper foil.
藉由使用本發明之實施形態1至5之中之任意一者所記載之雷射裝置於雷射裝置100,在控制成用於對被加工物206形成加工孔208之最佳的脈衝能量及峰值功率之狀態下,不使光束之傳播產生變化而能將光束照射於被加工物206,故不需改變被加工物206的位置之光束直徑,即能穩定而形成加工孔208。 By using the laser device described in any one of the first to fifth embodiments of the present invention, the laser device 100 controls the optimum pulse energy for forming the processing hole 208 for the workpiece 206 and In the state of the peak power, the beam can be irradiated onto the workpiece 206 without changing the propagation of the beam. Therefore, the diameter of the beam of the workpiece 206 can be changed without changing the beam diameter at the position of the workpiece 206.
本發明雖以和最佳實施形態及檢附圖式相關連而說明,但,本發明所屬技術領域中具有通常知識者自當瞭解各種的變化或變更。如此之變化或變更係由檢附之申請專利範圍而定義,在不脫離本發明之範圍內應可理解。 The present invention has been described in connection with the preferred embodiments and the drawings. However, those skilled in the art of the present invention are aware of various changes and modifications. Such changes or modifications are to be understood by the scope of the appended claims, and should be understood without departing from the scope of the invention.
1‧‧‧種子光源 1‧‧‧ Seed light source
2‧‧‧控制部 2‧‧‧Control Department
3‧‧‧種子光源驅動器 3‧‧‧Seed light source driver
4‧‧‧前置光放大器驅動器 4‧‧‧Front optical amplifier driver
5‧‧‧輸出提取手段 5‧‧‧ Output extraction means
6、8‧‧‧光 6, 8‧ ‧ light
7‧‧‧功率監視器電路 7‧‧‧Power monitor circuit
9‧‧‧後置光放大器驅動器 9‧‧‧ Rear Optical Amplifier Driver
100‧‧‧雷射裝置 100‧‧‧ Laser device
110‧‧‧前置光放大器 110‧‧‧front optical amplifier
120‧‧‧後置光放大器 120‧‧‧ rear optical amplifier
130‧‧‧波長變換器 130‧‧‧wavelength converter
PM‧‧‧功率監視器部 PM‧‧‧Power Monitor Department
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| JP6687999B2 (en) * | 2015-02-06 | 2020-04-28 | スペクトロニクス株式会社 | Laser light source device and laser pulse light generation method |
| WO2017175344A1 (en) * | 2016-04-07 | 2017-10-12 | ギガフォトン株式会社 | Solid-state laser device, solid-state laser system, and laser device for light exposure device |
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| JP6931243B2 (en) * | 2017-05-01 | 2021-09-01 | スペクトロニクス株式会社 | Laser light source device and laser pulse light generation method |
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