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TWI588945B - Manufacturing device of laminated semiconductor package - Google Patents

Manufacturing device of laminated semiconductor package Download PDF

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Publication number
TWI588945B
TWI588945B TW104137784A TW104137784A TWI588945B TW I588945 B TWI588945 B TW I588945B TW 104137784 A TW104137784 A TW 104137784A TW 104137784 A TW104137784 A TW 104137784A TW I588945 B TWI588945 B TW I588945B
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Taiwan
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semiconductor package
package
contact
heater
contact heater
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TW104137784A
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Chinese (zh)
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TW201620083A (en
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崔鍾鳴
李漢晟
李尙勳
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普羅科技有限公司
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    • H10P72/0438
    • H10P72/0431
    • H10P72/0602
    • H10P72/3212
    • H10W40/22
    • H10W40/259
    • H10P72/00
    • H10W72/536
    • H10W72/5363
    • H10W74/00

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  • Die Bonding (AREA)

Description

積層型半導體封裝體的製造裝置Manufacturing device of laminated semiconductor package

本發明涉及一種積層型半導體封裝體的製造裝置,更詳細而言,涉及一種用以製造多個半導體封裝體沿上下方向依序積層而成的積層型半導體封裝體的積層型半導體封裝體的製造裝置。The present invention relates to a device for manufacturing a laminated semiconductor package, and more particularly to a method for manufacturing a stacked semiconductor package in which a plurality of semiconductor packages are sequentially stacked in a vertical direction. Device.

半導體元件為了擴大其電容及功能,在晶片(wafer)製造製程中集成度逐漸增加。如果欲在晶片上擴大半導體元件的電容及功能,則需在晶片製造製程中投入大量的設備且需要較多的費用。In order to expand its capacitance and function, semiconductor components are gradually increasing in integration in a wafer manufacturing process. If the capacitance and function of the semiconductor device are to be expanded on the wafer, a large amount of equipment is required in the wafer manufacturing process and a large cost is required.

與此相反,如果在晶片上製作半導體晶片(chip)後組裝成封裝體的過程中利用將兩個以上的半導體晶片或兩個以上的半導體封裝體整合成一體的方法,則能夠以較少的設備投入及費用來擴大半導體元件的電容及功能。因此,在半導體製造中,封裝(packaging)技術作為最終決定器件(device)的電性能、可靠性、生產性及電子系統(electronic system)的小型化的核心技術而其重要性日益增加。On the contrary, if a semiconductor chip is fabricated on a wafer and assembled into a package, a method of integrating two or more semiconductor wafers or two or more semiconductor packages into one body can be used. Equipment investment and cost to expand the capacitance and function of semiconductor components. Therefore, in semiconductor manufacturing, packaging technology is increasingly important as a core technology that ultimately determines the electrical performance, reliability, productivity, and miniaturization of an electronic system.

最近,許多半導體企業為了在封裝製程中進一步提高單位體積的安裝效率,應用整合型半導體封裝體技術。作為代表性的整合型半導體封裝體,有系統級封裝體(System In Package,SIP)、多晶片封裝體(Multi Chip Package,MCP)、積層型封裝體(Package On Package,POP;以下稱為“積層型半導體封裝體”)等。在這些整合型半導體封裝體中,積層型半導體封裝體是將完成封裝製程及電檢查製程的多個單一半導體封裝體整合成一體的封裝體。因此,以對單一半導體封裝體充分地檢查電功能而去除不良的狀態實現組裝,故而具有如下優點:在組裝成積層型封裝體(Package On Package)結構後發生的電性不良減少,可將執行不同功能的單一半導體封裝體制成一個半導體封裝體。Recently, many semiconductor companies have applied integrated semiconductor package technology in order to further increase the installation efficiency per unit volume in the packaging process. Typical integrated semiconductor packages include System In Package (SIP), Multi Chip Package (MCP), and Package On Package (POP; hereinafter referred to as " A laminated semiconductor package") or the like. In these integrated semiconductor packages, the stacked semiconductor package is a package in which a plurality of single semiconductor packages that complete a packaging process and an electrical inspection process are integrated. Therefore, assembly is performed by sufficiently checking the electrical function of the single semiconductor package and removing the defective state. Therefore, there is an advantage that electrical defects occurring after assembly into a package-on-package (Package On Package) structure are reduced, and execution can be performed. A single semiconductor package of different functions is fabricated into a semiconductor package.

這種積層型半導體封裝體經由焊接(soldering)製程而製成,所述焊接製程是在積層有多個單一半導體封裝體的狀態下,加熱至將所述多個單一半導體封裝體電連接的焊球(solder ball)的熔點以上。然而,存在如下問題:因在高溫焊接製程中積層而成的半導體封裝體的翹曲現象(warpage)而在兩個半導體封裝體的接合部發生接著不良;或在焊接製程後,焊球產生龜裂(crack)。The laminated semiconductor package is fabricated by a soldering process in which a plurality of single semiconductor packages are stacked and heated to solder the plurality of single semiconductor packages. Above the melting point of the ball. However, there is a problem in that the warpage of the semiconductor package laminated in the high-temperature soldering process causes a defect in the joint portion of the two semiconductor packages; or after the soldering process, the solder ball produces a turtle Crack.

[先前技術文獻][Previous Technical Literature]

[專利文獻][Patent Literature]

韓國公開專利公報第2010-0121231號(2010.11.17.)Korean Open Patent Gazette No. 2010-0121231 (2010.11.17.)

韓國公開專利公報第2013-0116100號(2013.10.23.)Korean Open Patent Gazette No. 2013-0116100 (2013.10.23.)

[發明欲解決的課題][Question to be solved by the invention]

本發明是為了解決如上所述的必要性而提出,目的在於提供一種可減少因第二半導體封裝體或第一半導體封裝體的翹曲現象引起的第二半導體封裝體與第一半導體封裝體的接合部的接著不良或產生龜裂的問題的積層型半導體封裝體的製造裝置。The present invention has been made to solve the above-mentioned needs, and an object thereof is to provide a second semiconductor package and a first semiconductor package which can be reduced by a warpage phenomenon of a second semiconductor package or a first semiconductor package. A manufacturing apparatus of a laminated semiconductor package in which the bonding portion is defective or has a problem of cracking.

[解決課題的手段][Means for solving the problem]

用以達成所述目的的本發明的積層型半導體封裝體的製造裝置用以製造第一半導體封裝體與第二半導體封裝體以通過第一半導體封裝體與第二半導體封裝體之間的封裝體連接端子電連接的方式上下積層而成的積層型半導體封裝體,所述積層型半導體封裝體的製造裝置的特徵在於包含:接觸式加熱器(heater),其以能夠與所述第二半導體封裝體的一面接觸的方式設置,以便可通過封裝體組裝體的所述第二半導體封裝體而對接著劑及封裝體連接端子進行加熱,所述封裝體組裝體是以在所述第一半導體封裝體與所述第二半導體封裝體之間介置有用以接合第一半導體封裝體與第二半導體封裝體的所述接著劑及所述封裝體連接端子的狀態下,將所述第一半導體封裝體與所述第二半導體封裝體結合而成;及控制器(controller),其以如下方式對所述接觸式加熱器進行控制,即,在所述接觸式加熱器與所述第二半導體封裝體的一面接觸的狀態下,將所述接觸式加熱器的加熱溫度分別以固定時間保持為使所述接著劑硬化的硬化溫度及使所述封裝體連接端子熔融的焊接溫度。A manufacturing apparatus of a stacked type semiconductor package of the present invention for achieving the object is used for manufacturing a first semiconductor package and a second semiconductor package to pass a package between the first semiconductor package and the second semiconductor package A laminated semiconductor package in which a connection terminal is electrically connected to each other, wherein the manufacturing apparatus of the laminated semiconductor package includes a contact heater capable of being able to be coupled to the second semiconductor package One side of the body is disposed in contact so that the adhesive and the package connection terminal can be heated by the second semiconductor package of the package assembly, the package assembly being in the first semiconductor package The first semiconductor package is interposed between the body and the second semiconductor package to bond the adhesive of the first semiconductor package and the second semiconductor package and the package connection terminal The body is combined with the second semiconductor package; and a controller that pairs the contact heater in the following manner Controlling, that is, maintaining the heating temperature of the contact heater for a fixed time to harden the adhesive in a state where the contact heater is in contact with one surface of the second semiconductor package The curing temperature and the soldering temperature at which the package connection terminals are melted.

[發明的效果][Effects of the Invention]

本發明的積層型半導體封裝體的製造裝置利用介置在第一半導體封裝體與第二半導體封裝體之間的封裝體連接端子焊接第一半導體封裝體與第二半導體封裝體,同時利用第一半導體封裝體與第二半導體封裝體之間的接著劑將第一半導體封裝體與第二半導體封裝體接合。因此,可製造比僅利用封裝體連接端子將第一半導體封裝體與第二半導體封裝體接合的以往的積層型半導體封裝體更堅固且在結構上更優異的積層型半導體封裝體。The manufacturing apparatus of the laminated semiconductor package of the present invention solders the first semiconductor package and the second semiconductor package by using a package connection terminal interposed between the first semiconductor package and the second semiconductor package, while using the first An adhesive between the semiconductor package and the second semiconductor package bonds the first semiconductor package to the second semiconductor package. Therefore, it is possible to manufacture a laminated semiconductor package in which a conventional laminated semiconductor package in which the first semiconductor package and the second semiconductor package are bonded by only the package connection terminal is more robust and structurally superior.

另外,本發明的積層型半導體封裝體的製造裝置利用接觸式加熱器按壓第二半導體封裝體使第一半導體封裝體與第二半導體封裝體之間的接著劑硬化而牢固地接合第一半導體封裝體與第二半導體封裝體,因此可減少如下問題:像以往一樣,在高溫焊接製程中,因第一半導體封裝體或第二半導體封裝體的翹曲現象(warpage)而在兩個半導體封裝體的接合部發生接著不良;或在焊接製程後,在封裝體連接端子等產生龜裂。Further, in the apparatus for manufacturing a laminated semiconductor package of the present invention, the second semiconductor package is pressed by the contact heater to harden the adhesive between the first semiconductor package and the second semiconductor package to firmly bond the first semiconductor package. The body and the second semiconductor package can reduce the problem that in the high temperature soldering process, in the high temperature soldering process, the two semiconductor packages are in the warpage due to the warpage of the first semiconductor package or the second semiconductor package The joint portion is defective in the next step; or after the soldering process, cracks are generated at the package connection terminal or the like.

另外,本發明的積層型半導體封裝體的製造裝置在使接觸式加熱器與封裝體組裝體的上表面接觸的狀態下,高速控制接觸式加熱器的溫度,由此可迅速且連續地執行對介置在第一半導體封裝體與第二半導體封裝體之間的接著劑及封裝體連接端子的硬化製程及焊接製程。因此,可縮短製造時間,提高製造效率。Further, in the apparatus for manufacturing a laminated semiconductor package of the present invention, the temperature of the contact heater is controlled at a high speed in a state where the contact heater is brought into contact with the upper surface of the package assembly, whereby the pair can be quickly and continuously performed. A curing process and a soldering process for interposing the package between the first semiconductor package and the second semiconductor package and the package connection terminal. Therefore, manufacturing time can be shortened and manufacturing efficiency can be improved.

以下,參照附圖,詳細地對本發明的積層型半導體封裝體的製造裝置進行說明。Hereinafter, a manufacturing apparatus of a laminated semiconductor package of the present invention will be described in detail with reference to the drawings.

圖1是表示通過本發明的一實施例的積層型半導體封裝體的製造裝置而製造的積層型半導體封裝體的側視圖,圖2是概略性地表示本發明的一實施例的積層型半導體封裝體的製造裝置的構成圖,圖3是表示圖2所示的積層型半導體封裝體的製造裝置的加熱單元的圖。1 is a side view showing a laminated semiconductor package manufactured by a manufacturing apparatus of a stacked semiconductor package according to an embodiment of the present invention, and FIG. 2 is a schematic view showing a stacked semiconductor package according to an embodiment of the present invention. FIG. 3 is a view showing a configuration of a manufacturing apparatus of a bulk semiconductor device, and FIG. 3 is a view showing a heating unit of the apparatus for manufacturing a laminated semiconductor package shown in FIG. 2 .

如圖1所示,本發明的一實施例的積層型半導體封裝體的製造裝置100用以製造第二半導體封裝體30以通過封裝體連接端子34而與第一半導體封裝體20電連接的方式積層到所述第一半導體封裝體20上而成的積層型半導體封裝體10。這種積層型半導體封裝體的製造裝置100可解決如下問題:在以往的高溫焊接製程中,因第一半導體封裝體或第二半導體封裝體的翹曲現象(warpage)而在兩個半導體封裝體的接合部發生接著不良;或在焊接製程後,在焊球等產生龜裂。As shown in FIG. 1, a manufacturing apparatus 100 for a stacked semiconductor package according to an embodiment of the present invention is used to manufacture a second semiconductor package 30 to be electrically connected to the first semiconductor package 20 through a package connection terminal 34. The stacked semiconductor package 10 is laminated on the first semiconductor package 20. The manufacturing apparatus 100 of the laminated semiconductor package can solve the problem that in the conventional high-temperature soldering process, the two semiconductor packages are in the warpage due to the warpage of the first semiconductor package or the second semiconductor package. The joint portion is defective; or a crack occurs in the solder ball or the like after the soldering process.

參照圖1,通過本實施例的積層型半導體封裝體的製造裝置100而製造的積層型半導體封裝體10包含第一半導體封裝體20、第二半導體封裝體30、及接著劑層(layer)40。Referring to Fig. 1, a laminated semiconductor package 10 manufactured by the apparatus 100 for manufacturing a laminated semiconductor package of the present embodiment includes a first semiconductor package 20, a second semiconductor package 30, and an adhesive layer 40. .

第一半導體封裝體20包含第一封裝體基板21、第一晶片22、外部連接端子23、及第一密封材24。在第一封裝體基板21的上表面及下表面分別具備端子墊(terminal pad)25、26。第一晶片22安裝到第一封裝體基板21,通過晶片連接端子27而與端子墊25電連接。外部連接端子23與第一封裝體基板21的端子墊26電連接。外部連接端子23用以與其他基板等電子器件實現電連接,可由焊球等構成。在第一封裝體基板21的內部,可具備將端子墊25與端子墊26電連接的電路配線(未圖示)。第一密封材24由絕緣性素材構成,以覆蓋第一晶片22的方式具備在第一封裝體基板21的上側一面。The first semiconductor package 20 includes a first package substrate 21 , a first wafer 22 , an external connection terminal 23 , and a first sealing material 24 . Terminal pads 25 and 26 are provided on the upper surface and the lower surface of the first package substrate 21, respectively. The first wafer 22 is mounted to the first package substrate 21, and is electrically connected to the terminal pad 25 through the wafer connection terminal 27. The external connection terminal 23 is electrically connected to the terminal pad 26 of the first package substrate 21. The external connection terminal 23 is for electrically connecting to an electronic device such as another substrate, and may be formed of a solder ball or the like. Inside the first package substrate 21, a circuit wiring (not shown) that electrically connects the terminal pad 25 and the terminal pad 26 may be provided. The first sealing material 24 is made of an insulating material, and is provided on the upper side of the first package substrate 21 so as to cover the first wafer 22 .

第二半導體封裝體30包含第二封裝體基板31、第二晶片32、33、封裝體連接端子34、及第二密封材35。在第二封裝體基板31的上表面及下表面分別具備端子墊36、37。第二晶片32、33安裝到第二封裝體基板31,通過晶片連接端子38而與端子墊36電連接。封裝體連接端子34與第二封裝體基板31的端子墊37電連接。封裝體連接端子34為電連接到第一半導體封裝體20的端子墊25的部分,可由焊球等構成。第一半導體封裝體20與第二半導體封裝體30通過封裝體連接端子34而電連接。封裝體連接端子34通過焊接製程而將第一半導體封裝體20與第二半導體封裝體30電連接,同時將第一半導體封裝體20與第二半導體封裝體30固定成相互結合的狀態。在第二封裝體基板31的內部,可具備將端子墊36與端子墊37電連接的電路配線(未圖示)。第二密封材35由絕緣性素材構成,以覆蓋第二晶片32、33的方式配置到第二封裝體基板31的上側一面。The second semiconductor package 30 includes a second package substrate 31 , second wafers 32 and 33 , a package connection terminal 34 , and a second sealing material 35 . Terminal pads 36 and 37 are provided on the upper surface and the lower surface of the second package substrate 31, respectively. The second wafers 32, 33 are mounted to the second package substrate 31, and are electrically connected to the terminal pads 36 through the wafer connection terminals 38. The package connection terminal 34 is electrically connected to the terminal pad 37 of the second package substrate 31. The package connection terminal 34 is a portion electrically connected to the terminal pad 25 of the first semiconductor package 20, and may be constituted by a solder ball or the like. The first semiconductor package 20 and the second semiconductor package 30 are electrically connected by the package connection terminal 34. The package connection terminal 34 electrically connects the first semiconductor package 20 and the second semiconductor package 30 by a soldering process, while fixing the first semiconductor package 20 and the second semiconductor package 30 in a state of being bonded to each other. Inside the second package substrate 31, a circuit wiring (not shown) that electrically connects the terminal pad 36 and the terminal pad 37 may be provided. The second sealing member 35 is made of an insulating material and is disposed on the upper side of the second package substrate 31 so as to cover the second wafers 32 and 33.

接著劑層40介置到第一半導體封裝體20的第一密封材24的上表面與第二半導體封裝體30的第二封裝體基板31之間而與封裝體連接端子34一同使第一半導體封裝體20與第二半導體封裝體30相互接合。接著劑層40以如下方式形成:環氧樹脂(epoxy)等接著劑45以接著在第一半導體封裝體20及第二半導體封裝體30兩者的狀態硬化。接著劑層40最大能夠以與第一半導體封裝體20的第一密封材24上表面的寬度對應的寬度形成。The adhesive layer 40 is interposed between the upper surface of the first sealing material 24 of the first semiconductor package 20 and the second package substrate 31 of the second semiconductor package 30 to form the first semiconductor together with the package connection terminal 34. The package body 20 and the second semiconductor package 30 are bonded to each other. The adhesive layer 40 is formed in such a manner that an adhesive 45 such as an epoxy is hardened in the state of both the first semiconductor package 20 and the second semiconductor package 30. The adhesive layer 40 can be formed at a maximum width corresponding to the width of the upper surface of the first sealing member 24 of the first semiconductor package 20.

如上所述,封裝體連接端子34也通過焊接製程而使第一半導體封裝體20與第二半導體封裝體30相互接合,但由接著劑層40形成的第一半導體封裝體20與第二半導體封裝體30的接合面積大於由封裝體連接端子34形成的第一半導體封裝體20與第二半導體封裝體30的接合面積,且所述接著劑層40的接合力也大於封裝體連接端子34的接合力。因此,通過本發明的積層型半導體封裝體的製造裝置100而製造的積層型半導體封裝體10比僅利用封裝體連接端子結合第一半導體封裝體與第二半導體封裝體的以往的積層型半導體封裝體更堅固且在結構上更優異。As described above, the package connection terminal 34 also bonds the first semiconductor package 20 and the second semiconductor package 30 to each other by a soldering process, but the first semiconductor package 20 and the second semiconductor package are formed of the adhesive layer 40. The bonding area of the body 30 is larger than the bonding area of the first semiconductor package 20 and the second semiconductor package 30 formed by the package connecting terminal 34, and the bonding force of the adhesive layer 40 is also greater than the bonding force of the package connecting terminal 34. . Therefore, the laminated semiconductor package 10 manufactured by the manufacturing apparatus 100 for a laminated semiconductor package of the present invention has a conventional laminated semiconductor package in which the first semiconductor package and the second semiconductor package are bonded by only the package connection terminal. The body is stronger and more structurally superior.

如圖2所示,製造這種積層型半導體封裝體10的本實施例的積層型半導體封裝體的製造裝置100包含移送單元110、裝載器(loader)120、接著劑分配器(dispenser)130、組裝用裝載器140、加熱單元150、及檢查單元170。As shown in FIG. 2, the apparatus 100 for manufacturing a laminated semiconductor package of the present embodiment in which the multilayer semiconductor package 10 is manufactured includes a transfer unit 110, a loader 120, an adhesive dispenser 130, The assembly loader 140, the heating unit 150, and the inspection unit 170.

在移送單元110載置滑車(jigger)115,在滑車115放置半導體封裝體20、30、第一半導體封裝體20與第二半導體封裝體30結合而成的封裝體組裝體15或積層型半導體封裝體10。移送單元110沿固定的移送路徑移送滑車115,在移送單元110的移送路徑中依序配置裝載器120、接著劑分配器130、組裝用裝載器140、加熱單元150、及檢查單元170。作為移送單元110,可利用可提供直線移送路徑的輸送機(conveyor)或可提供圓形移送路徑的轉檯(Turn Table)等各種結構的移送單元。滑車115可利用固定式或分離式等可搭載一個以上的半導體封裝體20、30的各種結構的滑車。當然,可省略滑車115,還可具備可將半導體封裝體20、30以水平狀態穩定地固定到移送單元110上的固定結構。A package assembly 15 or a laminated semiconductor package in which the transfer unit 110 mounts a jigger 115, and the semiconductor package 20, 30, the first semiconductor package 20 and the second semiconductor package 30 are bonded to the pulley 115. Body 10. The transfer unit 110 transfers the carriage 115 along a fixed transfer path, and the loader 120, the adhesive distributor 130, the assembly loader 140, the heating unit 150, and the inspection unit 170 are sequentially disposed in the transfer path of the transfer unit 110. As the transfer unit 110, a transfer unit of various configurations such as a conveyor that can provide a linear transfer path or a turn table that can provide a circular transfer path can be utilized. The pulley 115 can be a pulley of various configurations in which one or more semiconductor packages 20 and 30 can be mounted, such as a fixed type or a separate type. Of course, the pulley 115 may be omitted, and a fixing structure that can stably fix the semiconductor packages 20 and 30 to the transfer unit 110 in a horizontal state may be provided.

裝載器120拾取(pickup)第一半導體封裝體20而裝載(loading)到移送單元110上的滑車115。作為裝載器120,可利用可通過吸附方法或夾持(clamping)方法等各種方法拾取第一半導體封裝體20的各種結構的裝載器。在滑車為分離式結構的情況下,裝載器120還可採用可拾取安裝有第一半導體封裝體20的滑車的結構。The loader 120 picks up the first semiconductor package 20 and loads the pulley 115 onto the transfer unit 110. As the loader 120, a loader that can pick up various structures of the first semiconductor package 20 by various methods such as an adsorption method or a clamping method can be utilized. In the case where the pulley is a separate structure, the loader 120 may also adopt a structure in which the pulley of the first semiconductor package 20 is picked up.

接著劑分配器130在第一半導體封裝體20上塗布接著劑45。作為接著劑分配器130,可利用可塗布接著劑45的各種結構的接著劑分配器。作為接著劑45,可利用環氧樹脂等具有接著力的各種物質。The adhesive dispenser 130 applies an adhesive 45 on the first semiconductor package 20. As the adhesive dispenser 130, an adhesive dispenser of various structures to which the adhesive 45 can be applied can be utilized. As the adhesive 45, various substances having an adhesive force such as an epoxy resin can be used.

組裝用裝載器140拾取第二半導體封裝體30而結合到第一半導體封裝體20上,由此形成第一半導體封裝體20與第二半導體封裝體30上下積層而成的封裝體組裝體15。作為組裝用裝載器140,可利用可通過吸附方法或夾持方法等各種方法拾取第二半導體封裝體30而結合到第一半導體封裝體20上的各種結構的組裝用裝載器。The assembly loader 140 picks up the second semiconductor package 30 and bonds it to the first semiconductor package 20, thereby forming the package assembly 15 in which the first semiconductor package 20 and the second semiconductor package 30 are stacked one on another. As the assembly loader 140, an assembly loader of various configurations that can be attached to the first semiconductor package 20 by picking up the second semiconductor package 30 by various methods such as an adsorption method or a clamping method can be used.

參照圖2及圖3,加熱單元150包含接觸式加熱器151、加熱器冷卻單元158、升降機構165、及控制器169。控制器169對接觸式加熱器151、加熱器冷卻單元158及升降機構165進行控制。這種加熱單元150可在使接觸式加熱器151與封裝體組裝體15接觸的狀態下,連續執行對封裝體組裝體15的硬化製程及焊接製程。2 and 3, the heating unit 150 includes a contact heater 151, a heater cooling unit 158, a lifting mechanism 165, and a controller 169. The controller 169 controls the contact heater 151, the heater cooling unit 158, and the elevating mechanism 165. Such a heating unit 150 can continuously perform a hardening process and a welding process for the package assembly 15 in a state where the contact heater 151 is brought into contact with the package assembly 15.

接觸式加熱器151以可升降的方式設置到封裝體組裝體15的上側,以便可與封裝體組裝體15的第二半導體封裝體30的一面接觸。接觸式加熱器151具有與第二半導體封裝體30的第二密封材35的上表面接觸的接觸面152。在接觸面152具備用以吸附第二半導體封裝體30的吸附孔hole153。吸附孔153與具備在加熱器冷卻單元158的冷卻套(cooling jacket)159的一側的氣孔(air hole)154連接。在氣孔154連接用以向吸附孔153提供抽吸力的真空壓力供給器(未圖示)。當然,氣孔154也可形成到接觸式加熱器151的外側面。The contact heater 151 is provided on the upper side of the package assembly 15 so as to be movable up and down so as to be in contact with one surface of the second semiconductor package 30 of the package assembly 15. The contact heater 151 has a contact surface 152 that is in contact with the upper surface of the second sealing material 35 of the second semiconductor package 30. The contact surface 152 is provided with an adsorption hole hole 153 for adsorbing the second semiconductor package 30. The adsorption hole 153 is connected to an air hole 154 provided on one side of a cooling jacket 159 of the heater cooling unit 158. A vacuum pressure supplier (not shown) for supplying a suction force to the adsorption holes 153 is connected to the air holes 154. Of course, the air holes 154 may also be formed to the outer side of the contact heater 151.

這種接觸式加熱器151以與第二半導體封裝體30的第二密封材35上表面接觸而吸附第二半導體封裝體30的狀態,通過第二半導體封裝體30對第一半導體封裝體20與第二半導體封裝體30之間的接著劑45及封裝體連接端子34進行加熱。在接觸式加熱器151設置溫度感測器(temperature sensor)155。溫度感測器155以與接觸式加熱器151接觸的方式設置,檢測接觸式加熱器151的溫度並將這個檢測信息傳輸到控制器169。接觸式加熱器151從電源裝置156接收電力而運作。控制器169從溫度感測器155接收接觸式加熱器151的發熱溫度的反饋(feedback)而調節對接觸式加熱器151的供電,由此控制接觸式加熱器151的加熱溫度。The contact heater 151 is in contact with the upper surface of the second sealing material 35 of the second semiconductor package 30 to adsorb the second semiconductor package 30, and the first semiconductor package 20 is passed through the second semiconductor package 30. The adhesive 45 and the package connection terminal 34 between the second semiconductor packages 30 are heated. A temperature sensor 155 is provided in the contact heater 151. The temperature sensor 155 is disposed in contact with the contact heater 151, detects the temperature of the contact heater 151, and transmits this detection information to the controller 169. The contact heater 151 operates by receiving power from the power supply device 156. The controller 169 receives feedback of the heat generation temperature of the contact heater 151 from the temperature sensor 155 to adjust the power supply to the contact heater 151, thereby controlling the heating temperature of the contact heater 151.

作為接觸式加熱器151,可利用陶瓷(ceramic)加熱器。陶瓷加熱器通常具備陶瓷基板、及埋入到所述陶瓷基板或固定到所述陶瓷基板的電阻性加熱元件。因陶瓷物質的優異的熱導率而由電阻性加熱元件產生的熱可迅速地傳遞到以與陶瓷基板鄰接的方式配置的靶(target)物質。當然,接觸式加熱器151除陶瓷加熱器以外,可利用與封裝體組裝體15接觸而可對封裝體組裝體15中間的接著劑45及封裝體連接端子34進行加熱的各種接觸式加熱器。As the contact heater 151, a ceramic heater can be used. The ceramic heater usually includes a ceramic substrate, and a resistive heating element embedded in the ceramic substrate or fixed to the ceramic substrate. The heat generated by the resistive heating element due to the excellent thermal conductivity of the ceramic material can be quickly transferred to a target substance disposed adjacent to the ceramic substrate. Needless to say, the contact heater 151 can be used in addition to the ceramic heater, and various contact heaters that can contact the package assembly 15 to heat the adhesive 45 and the package connection terminal 34 in the middle of the package assembly 15 can be used.

加熱器冷卻單元158通過熱導方式冷卻接觸式加熱器151。加熱器冷卻單元158包含:冷卻套159,其以與接觸式加熱器151接觸的方式設置;及冷卻介質供給器163,其以可向冷卻套159供給冷卻介質的方式與冷卻套159連接。在冷卻套159的內部具備供從冷卻介質供給器163供給的冷卻介質流動的冷卻流路160。冷卻介質供給器163與流入口161及排出口162連接,所述流入口161及排出口162以相互隔開的方式具備在冷卻套159的外側面。從冷卻介質供給器163供給的冷卻介質在依次通過冷卻套159的流入口161、冷卻流路160及排出口162而冷卻接觸式加熱器151後,再次被回收到冷卻介質供給器163。被回收在冷卻介質供給器163的冷卻介質再次被冷卻後,可再次供給到冷卻套159。作為冷卻介質,可利用冷卻水等液體或空氣等氣體等各種冷卻介質。當然,加熱器冷卻單元158除圖中所示的結構以外,可利用可通過各種方式迅速地冷卻接觸式加熱器151的各種結構的加熱器冷卻單元。The heater cooling unit 158 cools the contact heater 151 by thermal conduction. The heater cooling unit 158 includes a cooling jacket 159 that is disposed in contact with the contact heater 151, and a cooling medium supplier 163 that is coupled to the cooling jacket 159 in such a manner as to supply a cooling medium to the cooling jacket 159. A cooling flow path 160 through which a cooling medium supplied from the cooling medium supplier 163 flows is provided inside the cooling jacket 159. The cooling medium supplier 163 is connected to the inflow port 161 and the discharge port 162, and the inflow port 161 and the discharge port 162 are provided on the outer surface of the cooling jacket 159 so as to be spaced apart from each other. The cooling medium supplied from the cooling medium supplier 163 passes through the inflow port 161, the cooling flow path 160, and the discharge port 162 of the cooling jacket 159 in order to cool the contact heater 151, and is again recovered to the cooling medium supplier 163. After the cooling medium recovered in the cooling medium supplier 163 is cooled again, it can be supplied to the cooling jacket 159 again. As the cooling medium, various cooling media such as a liquid such as cooling water or a gas such as air can be used. Of course, the heater cooling unit 158 can utilize various types of heater cooling units that can rapidly cool the contact heater 151 by various means in addition to the structure shown in the drawing.

升降機構165以與接觸式加熱器151連接的方式設置,以便使接觸式加熱器151在封裝體組裝體15的上側升降。升降機構165使接觸式加熱器151向封裝體組裝體15下降而使接觸式加熱器151與封裝體組裝體15的第二半導體封裝體30接觸。另外,通過向封裝體組裝體15側按壓接觸式加熱器151而以固定壓力使接觸式加熱器151密接到封裝體組裝體15的第二半導體封裝體30。The elevating mechanism 165 is provided in connection with the contact heater 151 so that the contact heater 151 is raised and lowered on the upper side of the package assembly 15. The elevating mechanism 165 lowers the contact heater 151 toward the package assembly 15 to bring the contact heater 151 into contact with the second semiconductor package 30 of the package assembly 15 . Moreover, the contact heater 151 is adhered to the second semiconductor package 30 of the package assembly 15 at a fixed pressure by pressing the contact heater 151 toward the package assembly 15 side.

在升降機構165與加熱器冷卻單元158的冷卻套159之間設置壓力感測器167。壓力感測器167檢測接觸式加熱器151對第二半導體封裝體30的接觸壓力並將這個檢測信息傳輸到控制器169。控制器169從壓力感測器167接收接觸式加熱器151對第二半導體封裝體30的接觸壓力的反饋而以接觸式加熱器151能夠以固定壓力與第二半導體封裝體30接觸的方式對升降機構165的動作進行控制。作為壓力感測器167,可利用測力計(load cell)等。壓力感測器167除像圖中所示一樣設置到升降機構165與冷卻套159之間以外,可設置到接觸式加熱器151、或接觸式加熱器151與升降機構165之間等各種位置。A pressure sensor 167 is disposed between the lift mechanism 165 and the cooling jacket 159 of the heater cooling unit 158. The pressure sensor 167 detects the contact pressure of the contact heater 151 with respect to the second semiconductor package 30 and transmits this detection information to the controller 169. The controller 169 receives the feedback of the contact pressure of the contact heater 151 to the second semiconductor package 30 from the pressure sensor 167, and the contact heater 151 can lift and lower with the second semiconductor package 30 at a fixed pressure. The action of the mechanism 165 is controlled. As the pressure sensor 167, a load cell or the like can be used. The pressure sensor 167 is provided at various positions, such as between the contact heater 151 or the contact heater 151 and the elevating mechanism 165, in addition to being disposed between the elevating mechanism 165 and the cooling jacket 159 as shown in the drawing.

檢查單元170檢查通過加熱單元150形成的積層型半導體封裝體10而檢測積層型半導體封裝體10的缺陷。作為檢查單元170,可利用可檢查積層型半導體封裝體10的電特性等的公知的各種結構的檢查單元。The inspection unit 170 inspects the laminated semiconductor package 10 formed by the heating unit 150 to detect defects of the laminated semiconductor package 10. As the inspection unit 170, an inspection unit of various known configurations that can check the electrical characteristics of the laminated semiconductor package 10 or the like can be used.

以下,對利用本實施例的積層型半導體封裝體的製造裝置100的積層型半導體封裝體10的製造過程進行說明。Hereinafter, a manufacturing process of the laminated semiconductor package 10 using the manufacturing apparatus 100 of the stacked semiconductor package of the present embodiment will be described.

在如上所述的結構的第一半導體封裝體20及第二半導體封裝體30分別被供給到指定的作業位置後,裝載器120拾取第一半導體封裝體20而裝載到移送單元110的滑車115上。裝載在滑車115上的第一半導體封裝體20通過移送單元110的作用而被移送到接著劑塗布位置。在接著劑塗布位置,接著劑分配器130在第一半導體封裝體20的第一密封材24上表面塗布接著劑45。After the first semiconductor package 20 and the second semiconductor package 30 having the above-described structure are respectively supplied to the designated work positions, the loader 120 picks up the first semiconductor package 20 and loads it onto the pulley 115 of the transfer unit 110. . The first semiconductor package 20 loaded on the pulley 115 is transferred to the adhesive application position by the action of the transfer unit 110. In the adhesive application position, the adhesive dispenser 130 applies an adhesive 45 on the upper surface of the first sealing member 24 of the first semiconductor package 20.

被塗布接著劑45的第一半導體封裝體20通過移送單元110的作用而被移送到移送路徑中的封裝體組裝位置。在封裝體組裝位置,組裝用裝載器140拾取第二半導體封裝體30而積層到第一半導體封裝體20上,由此形成封裝體組裝體15。此時,第二半導體封裝體30的第二封裝體基板31與塗布在第一半導體封裝體20的第一密封材24上的接著劑45接觸。並且,第二半導體封裝體30的封裝體連接端子34與第二半導體封裝體30的端子墊25(參照圖1)接觸,由此第一半導體封裝體20與第二半導體封裝體30通過封裝體連接端子34而電連接。The first semiconductor package 20 to which the adhesive 45 is applied is transferred to the package assembly position in the transfer path by the action of the transfer unit 110. At the package assembly position, the assembly loader 140 picks up the second semiconductor package 30 and laminates it onto the first semiconductor package 20, thereby forming the package assembly 15. At this time, the second package substrate 31 of the second semiconductor package 30 is in contact with the adhesive 45 coated on the first sealing member 24 of the first semiconductor package 20. Further, the package connection terminal 34 of the second semiconductor package 30 is in contact with the terminal pad 25 (see FIG. 1) of the second semiconductor package 30, whereby the first semiconductor package 20 and the second semiconductor package 30 pass through the package. The terminal 34 is connected to be electrically connected.

以此方式在滑車115上完成組裝的封裝體組裝體15通過移送單元110的作用而被移送到設置有加熱單元150的加熱製程位置。在加熱製程位置,加熱單元150執行對封裝體組裝體15的加熱製程。通過這種加熱單元150進行的封裝體組裝體15的加熱製程具體如下。The package assembly 15 that is assembled on the pulley 115 in this manner is transferred to the heating process position where the heating unit 150 is disposed by the action of the transfer unit 110. In the heating process position, the heating unit 150 performs a heating process for the package assembly 15. The heating process of the package assembly 15 by such a heating unit 150 is specifically as follows.

當封裝體組裝體15位於接觸式加熱器151的下部時,控制器169對升降機構165及電源裝置156進行控制而使接觸式加熱器151的接觸面152與第二半導體封裝體30的第二密封材35上表面接觸,使接觸式加熱器151升溫。在接觸式加熱器151與第二半導體封裝體30相接時,因具備在接觸式加熱器151的接觸面152的吸附孔153的吸附力而接觸式加熱器151與第二半導體封裝體30吸附。When the package assembly 15 is located at a lower portion of the contact heater 151, the controller 169 controls the lift mechanism 165 and the power supply device 156 to make the contact surface 152 of the contact heater 151 and the second semiconductor package 30 second. The upper surface of the sealing material 35 is in contact with the contact heater 151 to raise the temperature. When the contact heater 151 is in contact with the second semiconductor package 30, the contact heater 151 and the second semiconductor package 30 are adsorbed by the adsorption force of the adsorption hole 153 at the contact surface 152 of the contact heater 151. .

在接觸式加熱器151與第二半導體封裝體30的上表面相接時,控制器169使接觸式加熱器151的加熱溫度上升至可使封裝體組裝體15的接著劑45硬化的硬化溫度而使封裝體組裝體15的接著劑45硬化。具體而言,參照圖4,控制器169使接觸式加熱器151的溫度在固定時間T1內升溫至低於硬化溫度的預熱溫度,並在固定時間T2期間維持。在使接觸式加熱器151與第一半導體封裝體20的上表面接觸的狀態下使接觸式加熱器151的溫度在固定時間T3內迅速地升溫至硬化溫度,之後以這個硬化溫度保持固定時間T4而使封裝體組裝體15的接著劑45硬化。When the contact heater 151 is in contact with the upper surface of the second semiconductor package 30, the controller 169 raises the heating temperature of the contact heater 151 to a hardening temperature at which the adhesive 45 of the package assembly 15 can be hardened. The adhesive 45 of the package assembly 15 is cured. Specifically, referring to FIG. 4, the controller 169 raises the temperature of the contact heater 151 to a preheating temperature lower than the hardening temperature for a fixed time T1, and is maintained during the fixed time T2. The temperature of the contact heater 151 is rapidly raised to a hardening temperature within a fixed time T3 in a state where the contact heater 151 is brought into contact with the upper surface of the first semiconductor package 20, and then held at this hardening temperature for a fixed time T4. The adhesive 45 of the package assembly 15 is cured.

如果以此方式使接觸式加熱器151的溫度先升溫至預熱溫度後階段性地升溫至硬化溫度,而不是從常溫急速升溫至硬化溫度,則可在使接觸式加熱器151與第一半導體封裝體20的上表面接觸後迅速地升溫至硬化溫度,從而可縮短硬化製程時間,可減少對接觸式加熱器151造成負擔的問題。此處,預熱溫度並不限定為曲線圖所示的溫度,可設定為低於硬化溫度的各種溫度。並且,還可在接觸式加熱器151與第一半導體封裝體20接觸前開始進行接觸式加熱器151的預熱。If the temperature of the contact heater 151 is first raised to the preheating temperature in this manner and then the temperature is raised stepwise to the hardening temperature instead of rapidly increasing from the normal temperature to the hardening temperature, the contact heater 151 and the first semiconductor can be made. When the upper surface of the package 20 is in contact with each other, the temperature is rapidly raised to the curing temperature, whereby the hardening process time can be shortened, and the problem of burden on the contact heater 151 can be reduced. Here, the preheating temperature is not limited to the temperature shown in the graph, and may be set to various temperatures lower than the hardening temperature. Further, preheating of the contact heater 151 may be started before the contact heater 151 comes into contact with the first semiconductor package 20.

控制器169以此方式控制接觸式加熱器151的加熱溫度,並且控制升降機構165而調節接觸式加熱器151對第二半導體封裝體30的接觸壓力。即,如圖4的曲線圖,控制器169在通過升降機構165而使接觸式加熱器151對第二半導體封裝體30的接觸壓力在固定時間t1內上升至第一壓力後,保持固定時間t2。因此,接觸式加熱器151一面以第一壓力按壓第二半導體封裝體30,一面通過第二半導體封裝體30將接著劑45加熱至硬化溫度。由此,塗布在封裝體組裝體15的第一半導體封裝體20與第二半導體封裝體30之間的接著劑45寬廣地擴展而與第一半導體封裝體20及第二半導體封裝體30兩者穩定地密接並硬化。The controller 169 controls the heating temperature of the contact heater 151 in this manner, and controls the elevating mechanism 165 to adjust the contact pressure of the contact heater 151 to the second semiconductor package 30. That is, as shown in the graph of FIG. 4, the controller 169 maintains the contact pressure of the contact heater 151 to the second semiconductor package 30 by the elevating mechanism 165 after the contact pressure rises to the first pressure for a fixed time t1, and maintains the fixed time t2. . Therefore, the contact heater 151 presses the second semiconductor package 30 with the first pressure while heating the adhesive 45 to the curing temperature by the second semiconductor package 30. Thereby, the adhesive 45 applied between the first semiconductor package 20 and the second semiconductor package 30 of the package assembly 15 is broadly expanded to be compatible with both the first semiconductor package 20 and the second semiconductor package 30. Stable and tightly bonded and hardened.

繼而,控制器169將接觸式加熱器151的加熱溫度以固定時間T4保持為硬化溫度後,在固定時間T5內迅速地升溫至使封裝體組裝體15的封裝體連接端子34熔融的焊接溫度。接著,將接觸式加熱器151的加熱溫度以固定時間T6保持為焊接溫度而使封裝體連接端子34熔融。此時,封裝體連接端子34與第一半導體封裝體20的端子墊25熔合,由此封裝體組裝體15的第一半導體封裝體20與第二半導體封裝體30通過封裝體連接端子34而焊接。Then, the controller 169 promptly raises the heating temperature of the contact heater 151 to the curing temperature for a fixed time T4, and then rapidly raises the temperature to the soldering temperature at which the package connection terminal 34 of the package assembly 15 is melted. Next, the heating temperature of the contact heater 151 is maintained at the soldering temperature for a fixed time T6, and the package connection terminal 34 is melted. At this time, the package connection terminal 34 is fused with the terminal pad 25 of the first semiconductor package 20, whereby the first semiconductor package 20 and the second semiconductor package 30 of the package assembly 15 are soldered through the package connection terminal 34. .

控制器169使接觸式加熱器151的加熱溫度升溫至焊接溫度,並且對升降機構165進行控制而使接觸式加熱器151對第二半導體封裝體30的接觸壓力在固定時間t3內上升至第二壓力。接觸式加熱器151一面以第二壓力在固定時間t4期間按壓第二半導體封裝體30,一面通過第二半導體封裝體30對封裝體連接端子34進行加熱而使封裝體連接端子34與第一半導體封裝體20熔合。The controller 169 raises the heating temperature of the contact heater 151 to the soldering temperature, and controls the elevating mechanism 165 to raise the contact pressure of the contact heater 151 to the second semiconductor package 30 to the second within a fixed time t3. pressure. The contact heater 151 presses the second semiconductor package 30 while the second pressure is applied for a fixed period of time t4, and the package connection terminal 34 is heated by the second semiconductor package 30 to connect the package connection terminal 34 to the first semiconductor. The package 20 is fused.

通過利用這種接觸式加熱器151進行的硬化製程及焊接製程,形成如下的積層型半導體封裝體10:第一半導體封裝體20與第二半導體封裝體30通過其等之間的封裝體連接端子34而電連接,同時通過接著劑層40而牢固地接合。如果硬化製程及焊接製程結束,則控制器169對升降機構165進行控制而在固定時間t5內使接觸式加熱器151遠離第二半導體封裝體30的第二密封材35。並且,與此同時,中止對接觸式加熱器151施加電力,使加熱器冷卻單元158運作而冷卻接觸式加熱器151。即,使冷卻介質供給器163運作而使冷卻介質向結合在接觸式加熱器151的冷卻套159流動,從而通過熱導方式使接觸式加熱器151在固定時間T7內迅速地降溫至預熱溫度。其原因在於,可使接觸式加熱器151立即對嶄新的封裝體組裝體15執行後續加熱製程。 By the hardening process and the soldering process by the contact heater 151, the laminated semiconductor package 10 is formed as follows: a package connection terminal between the first semiconductor package 20 and the second semiconductor package 30 34 is electrically connected while being firmly joined by the adhesive layer 40. If the hardening process and the welding process are completed, the controller 169 controls the lift mechanism 165 to move the contact heater 151 away from the second seal member 35 of the second semiconductor package 30 for a fixed time t5. Further, at the same time, power is applied to the contact heater 151 to cause the heater cooling unit 158 to operate to cool the contact heater 151. That is, the cooling medium supplier 163 is operated to flow the cooling medium to the cooling jacket 159 coupled to the contact heater 151, thereby rapidly cooling the contact heater 151 to the preheating temperature for a fixed time T7 by the thermal conduction method. . The reason for this is that the contact heater 151 can be immediately subjected to a subsequent heating process to the brand-new package assembly 15.

在圖4中,表示為預熱溫度為約50度,硬化溫度為約150度,焊接溫度為約250度,但這種接觸式加熱器151的溫度可根據接著劑45或封裝體連接端子34的種類等實現各種變更。並且,接觸式加熱器151的升溫時間或溫度保持時間也可實現各種變更,接觸式加熱器151對第二半導體封裝體30的接觸壓力也可實現各種變更。 In FIG. 4, the preheating temperature is about 50 degrees, the hardening temperature is about 150 degrees, and the soldering temperature is about 250 degrees, but the temperature of the contact heater 151 can be based on the adhesive 45 or the package connecting terminal 34. Various types of changes are realized. Further, the temperature rise time or the temperature holding time of the contact heater 151 can be variously changed, and the contact pressure of the contact heater 151 with respect to the second semiconductor package 30 can be variously changed.

參照圖2,通過加熱單元150形成的積層型半導體封裝體10被移送到檢查單元170而經由檢查製程分為良品或不良品。 Referring to Fig. 2, the laminated semiconductor package 10 formed by the heating unit 150 is transferred to the inspection unit 170 to be classified into good or defective products through an inspection process.

如上所述,本實施例的積層型半導體封裝體的製造裝置100利用介置在第一半導體封裝體20與第二半導體封裝體30之間的封裝體連接端子34而焊接第一半導體封裝體20與第二半導體封裝體30,同時利用接著劑45將第一半導體封裝體20與第二半導體封裝體30接合。因此,可製造比僅利用封裝體連接端子將第一半導體封裝體與第二半導體封裝體接合的以往的積層型半導體封裝體更堅固且在結構上更優異的積層型半導體封裝體10。As described above, the manufacturing apparatus 100 of the stacked semiconductor package of the present embodiment solders the first semiconductor package 20 by the package connection terminal 34 interposed between the first semiconductor package 20 and the second semiconductor package 30. The first semiconductor package 20 and the second semiconductor package 30 are bonded to the second semiconductor package 30 by the adhesive 45 at the same time. Therefore, it is possible to manufacture the laminated semiconductor package 10 which is more robust and structurally superior than the conventional laminated semiconductor package in which the first semiconductor package and the second semiconductor package are bonded by only the package connection terminal.

另外,利用接觸式加熱器151按壓第二半導體封裝體30而使第一半導體封裝體20與第二半導體封裝體30之間的接著劑45硬化,從而將第一半導體封裝體20與第二半導體封裝體30牢固地接合,因此可減少如下問題:像以往一樣,在高溫焊接製程中,因第一半導體封裝體或第二半導體封裝體的翹曲現象(warpage)而在兩個半導體封裝體的接合部發生接著不良;或在焊接製程後,在封裝體連接端子等產生龜裂。In addition, the second semiconductor package 30 is pressed by the contact heater 151 to harden the adhesive 45 between the first semiconductor package 20 and the second semiconductor package 30, thereby bonding the first semiconductor package 20 and the second semiconductor. The package body 30 is firmly bonded, so that the following problems can be reduced: in the high temperature soldering process, in the high temperature soldering process, the warpage of the first semiconductor package or the second semiconductor package is in the two semiconductor packages. The joint portion has a defective defect; or after the soldering process, cracks are generated at the package connection terminal or the like.

另外,在使接觸式加熱器151與第二半導體封裝體30的上表面接觸的狀態下,通過電源裝置156及升降機構165而高速控制接觸式加熱器151的溫度及壓力,由此可迅速且連續地執行對介置在第一半導體封裝體20與第二半導體封裝體30之間的接著劑45及封裝體連接端子34的硬化製程及焊接製程。因此,可縮短製造時間,提高製造效率。Further, in a state where the contact heater 151 is brought into contact with the upper surface of the second semiconductor package 30, the temperature and pressure of the contact heater 151 are controlled at high speed by the power supply device 156 and the elevating mechanism 165, thereby being quick and The hardening process and the soldering process for the adhesive 45 and the package connection terminal 34 interposed between the first semiconductor package 20 and the second semiconductor package 30 are continuously performed. Therefore, manufacturing time can be shortened and manufacturing efficiency can be improved.

另外,在進行利用接觸式加熱器151的加熱製程後,利用加熱器冷卻單元158迅速地冷卻接觸式加熱器151而使其以可立即執行下一加熱製程的方式待機,由此可提高作業效率。Further, after the heating process by the contact heater 151 is performed, the contact heater 151 is rapidly cooled by the heater cooling unit 158 to be standby in such a manner that the next heating process can be immediately performed, thereby improving work efficiency. .

以上,列舉優選的示例對本發明進行了說明,但本發明的範圍並不限定於之前所說明的實施例。The present invention has been described above by way of preferred examples, but the scope of the present invention is not limited to the embodiments described above.

例如,在圖中,積層型半導體封裝體的製造裝置100表示為在第一半導體封裝體20的上表面塗布接著劑45而在所述接著劑45上積層第二半導體封裝體30,但也可將接著劑塗布到第二半導體封裝體的下表面,以在第一半導體封裝體與第二半導體封裝體之間介置接著劑的方式積層所述第一半導體封裝體與所述第二半導體封裝體。For example, in the drawing, the manufacturing apparatus 100 for a laminated semiconductor package is shown in which an adhesive 45 is applied on the upper surface of the first semiconductor package 20 and the second semiconductor package 30 is laminated on the adhesive 45, but it is also possible. Applying an adhesive to a lower surface of the second semiconductor package to laminate the first semiconductor package and the second semiconductor package by interposing an adhesive between the first semiconductor package and the second semiconductor package body.

另外,在圖中,積層型半導體封裝體的製造裝置100表示為以在第二半導體封裝體30的下表面設置有封裝體連接端子34的狀態,在第一半導體封裝體20上積層第二半導體封裝體30,但也能夠以封裝體連接端子安裝在第一半導體封裝體上的狀態,在第一半導體封裝體上積層第二半導體封裝體。In the figure, the manufacturing apparatus 100 of the laminated semiconductor package is shown in a state in which the package connection terminal 34 is provided on the lower surface of the second semiconductor package 30, and the second semiconductor is laminated on the first semiconductor package 20. Although the package body 30 is mounted on the first semiconductor package with the package connection terminal, the second semiconductor package can be laminated on the first semiconductor package.

另外,在圖中,積層型半導體封裝體的製造裝置100表示為在具備外部連接端子23的第一半導體封裝體20上積層第二半導體封裝體30,但也能夠以如下方式製造積層型半導體封裝體:以外部連接端子朝向上側的方式將具備所述外部連接端子的第一半導體封裝體積層到第二半導體封裝體上。In addition, in the manufacturing apparatus 100 of the laminated semiconductor package, the second semiconductor package 30 is laminated on the first semiconductor package 20 including the external connection terminals 23, but the laminated semiconductor package can also be manufactured as follows. The first semiconductor package volume layer including the external connection terminal is applied to the second semiconductor package such that the external connection terminal faces upward.

另外,在圖中,接觸式加熱器151的溫度錶示為階段性地從預熱溫度變為硬化溫度、從硬化溫度變為焊接溫度、從焊接溫度變為預熱溫度,但接觸式加熱器的溫度分佈(profile)可根據接著劑或封裝體連接端子的特性等而實現各種設計。另外,接觸式加熱器對第二半導體封裝體的壓力分佈也並不限定於圖中所示。In addition, in the figure, the temperature of the contact heater 151 is expressed as a stepwise change from a preheating temperature to a hardening temperature, a hardening temperature to a soldering temperature, and a soldering temperature to a preheating temperature, but a contact heater The temperature profile can be variously designed according to the characteristics of the adhesive or the connection terminal of the package, and the like. Further, the pressure distribution of the contact heater to the second semiconductor package is not limited to that shown in the drawing.

另外,在圖中,積層型半導體封裝體的製造裝置100表示為在滑車115上載置有一個第一半導體封裝體20的狀態下執行各製造製程,但也可為搭載有多個半導體封裝體的托盤被移送或搬送到各製造製程位置而對搭載在托盤的多個半導體封裝體執行各製造製程。In the figure, the manufacturing apparatus 100 of the laminated semiconductor package is shown in which each manufacturing process is performed in a state in which the first semiconductor package 20 is placed on the pulley 115. However, a plurality of semiconductor packages may be mounted. The tray is transferred or transported to each manufacturing process position, and each manufacturing process is performed on a plurality of semiconductor packages mounted on the tray.

另外,本發明的積層型半導體封裝體的製造裝置也可呈不利用移送單元的構成。在此情況下,可具備將第一半導體封裝體或第二半導體封裝體、封裝體組裝體或積層型半導體封裝體搬送到設置有各製程裝置的製程位置的搬送單位。Further, the apparatus for manufacturing a laminated semiconductor package of the present invention may have a configuration in which the transfer unit is not used. In this case, a transport unit that transports the first semiconductor package, the second semiconductor package, the package assembly, or the stacked semiconductor package to a process position where each process device is provided may be provided.

另外,本發明的積層型半導體封裝體的製造裝置也可利用在從外部接收封裝體組裝體後僅執行加熱製程的技術。In addition, the manufacturing apparatus of the laminated semiconductor package of the present invention can also utilize a technique of performing only a heating process after receiving the package assembly from the outside.

10‧‧‧積層型半導體封裝體
15‧‧‧封裝體組裝體
20‧‧‧第一半導體封裝體
21‧‧‧第一封裝體基板
22‧‧‧第一晶片
23‧‧‧外部連接端子
24‧‧‧第一密封材
25、26、36、37‧‧‧端子墊
27、38‧‧‧晶片連接端子
30‧‧‧第二半導體封裝體
31‧‧‧第二封裝體基板
32、33‧‧‧第二晶片
34‧‧‧封裝體連接端子
35‧‧‧第二密封材
40‧‧‧接著劑層
45‧‧‧接著劑
100‧‧‧積層型半導體封裝體的製造裝置
110‧‧‧移送單元
115‧‧‧滑車
120‧‧‧裝載器
130‧‧‧接著劑分配器
140‧‧‧組裝用裝載器
150‧‧‧加熱單元
151‧‧‧接觸式加熱器
152‧‧‧接觸面
153‧‧‧吸附孔
154‧‧‧氣孔
155‧‧‧溫度感測器
156‧‧‧電源裝置
158‧‧‧加熱器冷卻單元
159‧‧‧冷卻套
160‧‧‧冷卻流路
161‧‧‧流入口
162‧‧‧排出口
163‧‧‧冷卻介質供給器
165‧‧‧升降機構
167‧‧‧壓力感測器
169‧‧‧控制器
170‧‧‧檢查單元
T1、T2、T3、T4、T5、T6、T7、t1、t2、t3、t4、t5‧‧‧時間
10‧‧‧Laminated semiconductor package
15‧‧‧Package assembly
20‧‧‧First semiconductor package
21‧‧‧First package substrate
22‧‧‧First chip
23‧‧‧External connection terminal
24‧‧‧First sealing material
25, 26, 36, 37‧‧‧ terminal pads
27, 38‧‧‧ wafer connection terminal
30‧‧‧Second semiconductor package
31‧‧‧Second package substrate
32, 33‧‧‧ second chip
34‧‧‧Package connection terminal
35‧‧‧Second sealing material
40‧‧‧ adhesive layer
45‧‧‧Binder
100‧‧‧Manufacturing device for laminated semiconductor package
110‧‧‧Transfer unit
115‧‧‧ tackle
120‧‧‧Loader
130‧‧‧Binder dispenser
140‧‧‧Assembler loader
150‧‧‧heating unit
151‧‧‧Contact heater
152‧‧‧Contact surface
153‧‧‧Adsorption holes
154‧‧‧ stomata
155‧‧‧temperature sensor
156‧‧‧Power supply unit
158‧‧‧heater cooling unit
159‧‧‧Cooling sleeve
160‧‧‧Cooling flow path
161‧‧‧Inlet
162‧‧‧Export
163‧‧‧Cooling medium feeder
165‧‧‧ Lifting mechanism
167‧‧‧ Pressure Sensor
169‧‧‧ Controller
170‧‧‧Check unit
T1, T2, T3, T4, T5, T6, T7, t1, t2, t3, t4, t5‧‧‧

圖1是表示通過本發明的一實施例的積層型半導體封裝體的製造裝置而製造的積層型半導體封裝體的側視圖。 圖2是概略性地表示本發明的一實施例的積層型半導體封裝體的製造裝置的構成圖。 圖3是表示圖2所示的積層型半導體封裝體的製造裝置的加熱單元(heating unit)的圖。 圖4是表示圖3所示的加熱單元的硬化製程及焊接製程中的溫度及壓力變化的曲線圖(graph)。1 is a side view showing a laminated semiconductor package manufactured by a manufacturing apparatus of a stacked semiconductor package according to an embodiment of the present invention. FIG. 2 is a configuration diagram schematically showing an apparatus for manufacturing a laminated semiconductor package according to an embodiment of the present invention. 3 is a view showing a heating unit of the apparatus for manufacturing a laminated semiconductor package shown in FIG. 2. Fig. 4 is a graph showing changes in temperature and pressure in a hardening process and a welding process of the heating unit shown in Fig. 3.

10‧‧‧積層型半導體封裝體 10‧‧‧Laminated semiconductor package

15‧‧‧封裝體組裝體 15‧‧‧Package assembly

20‧‧‧第一半導體封裝體 20‧‧‧First semiconductor package

21‧‧‧第一封裝體基板 21‧‧‧First package substrate

23‧‧‧外部連接端子 23‧‧‧External connection terminal

24‧‧‧第一密封材 24‧‧‧First sealing material

30‧‧‧第二半導體封裝體 30‧‧‧Second semiconductor package

34‧‧‧封裝體連接端子 34‧‧‧Package connection terminal

35‧‧‧第二密封材 35‧‧‧Second sealing material

40‧‧‧接著劑層 40‧‧‧ adhesive layer

45‧‧‧接著劑 45‧‧‧Binder

100‧‧‧積層型半導體封裝體的製造裝置 100‧‧‧Manufacturing device for laminated semiconductor package

110‧‧‧移送單元 110‧‧‧Transfer unit

115‧‧‧滑車 115‧‧‧ tackle

120‧‧‧裝載器 120‧‧‧Loader

130‧‧‧接著劑分配器 130‧‧‧Binder dispenser

140‧‧‧組裝用裝載器 140‧‧‧Assembler loader

150‧‧‧加熱單元 150‧‧‧heating unit

151‧‧‧接觸式加熱器 151‧‧‧Contact heater

158‧‧‧加熱器冷卻單元 158‧‧‧heater cooling unit

159‧‧‧冷卻套 159‧‧‧Cooling sleeve

163‧‧‧冷卻介質供給器 163‧‧‧Cooling medium feeder

165‧‧‧升降機構 165‧‧‧ Lifting mechanism

169‧‧‧控制器 169‧‧‧ Controller

170‧‧‧檢查單元 170‧‧‧Check unit

Claims (12)

一種積層型半導體封裝體的製造裝置,所述積層型半導體封裝體是第一半導體封裝體與第二半導體封裝體以通過所述第一半導體封裝體與第二半導體封裝體之間的封裝體連接端子電連接的方式上下積層而成,所述積層型半導體封裝體的製造裝置包含: 接觸式加熱器,其以能夠與所述第二半導體封裝體的一面接觸的方式設置,以便通過封裝體組裝體的所述第二半導體封裝體而對接著劑及封裝體連接端子進行加熱,所述封裝體組裝體是以在所述第一半導體封裝體與所述第二半導體封裝體之間介置有用以接合所述第一半導體封裝體與所述第二半導體封裝體的所述接著劑及所述封裝體連接端子的狀態下,將所述第一半導體封裝體與所述第二半導體封裝體結合而成;及 控制器,其以如下方式對所述接觸式加熱器進行控制,即,在所述接觸式加熱器與所述第二半導體封裝體的一面接觸的狀態下,將所述接觸式加熱器的加熱溫度分別以固定時間保持為使所述接著劑硬化的硬化溫度及使所述封裝體連接端子熔融的焊接溫度。A manufacturing apparatus of a laminated semiconductor package, wherein the stacked semiconductor package is a first semiconductor package and a second semiconductor package to be connected by a package between the first semiconductor package and the second semiconductor package The terminal is electrically connected to each other, and the manufacturing apparatus of the laminated semiconductor package includes: a contact heater disposed in contact with one surface of the second semiconductor package to be assembled through the package The second semiconductor package of the body heats the adhesive and the package connection terminal, and the package assembly is interposed between the first semiconductor package and the second semiconductor package Bonding the first semiconductor package and the second semiconductor package in a state in which the first semiconductor package and the adhesive of the second semiconductor package and the package connection terminal are bonded And a controller that controls the contact heater in such a manner that the contact heater and the first The state of the semiconductor package in contact with one side of the heating temperature of the heater are respectively held in contact with a fixed time and then the hardening temperature and the hardening temperature of the package body so that the welding connection terminal melted. 如申請專利範圍第1項所述的積層型半導體封裝體的製造裝置,其中: 還包含加熱器冷卻單元,所述加熱器冷卻單元冷卻所述接觸式加熱器。The apparatus for manufacturing a laminated semiconductor package according to claim 1, further comprising: a heater cooling unit that cools the contact heater. 如申請專利範圍第2項所述的積層型半導體封裝體的製造裝置,其中所述加熱器冷卻單元包含: 冷卻套,其以與所述接觸式加熱器接觸的方式設置,在內部具備供冷卻介質流動的冷卻流路;及冷卻介質供給器,其與所述冷卻套連接,以便向所述冷卻套的冷卻流路供給冷卻介質。The apparatus for manufacturing a laminated semiconductor package according to claim 2, wherein the heater cooling unit comprises: a cooling jacket disposed in contact with the contact heater and provided for cooling inside a cooling flow path through which the medium flows; and a cooling medium supplier connected to the cooling jacket to supply a cooling medium to the cooling flow path of the cooling jacket. 如申請專利範圍第1項所述的積層型半導體封裝體的製造裝置,其中: 所述接觸式加熱器在與所述第二半導體封裝體的一面接觸的接觸面具備吸附孔,以便吸附所述第二半導體封裝體。The apparatus for manufacturing a laminated semiconductor package according to claim 1, wherein: the contact heater has an adsorption hole at a contact surface contacting one surface of the second semiconductor package to adsorb the A second semiconductor package. 如申請專利範圍第1項所述的積層型半導體封裝體的製造裝置,其中: 還包含溫度感測器,所述溫度感測器以與所述接觸式加熱器接觸的方式設置,以便檢測所述接觸式加熱器的溫度並將這個檢測信息傳輸到所述控制器。The apparatus for manufacturing a laminated semiconductor package according to claim 1, wherein: further comprising: a temperature sensor disposed in contact with the contact heater to detect the location The temperature of the contact heater is described and this detection information is transmitted to the controller. 如申請專利範圍第1項所述的積層型半導體封裝體的製造裝置,其中: 還包含升降機構,所述升降機構與所述接觸式加熱器連接而使所述接觸式加熱器在所述封裝體組裝體的上側升降,以便所述接觸式加熱器與所述封裝體組裝體的所述第二半導體封裝體的一面接觸。The apparatus for manufacturing a laminated semiconductor package according to claim 1, wherein: further comprising: a lifting mechanism, wherein the lifting mechanism is connected to the contact heater to cause the contact heater to be in the package The upper side of the body assembly is raised and lowered so that the contact heater is in contact with one surface of the second semiconductor package of the package assembly. 如申請專利範圍第6項所述的積層型半導體封裝體的製造裝置,其中: 所述控制器以如下方式對所述接觸式加熱器及所述升降機構進行控制,即,所述接觸式加熱器以第一壓力按壓所述第二半導體封裝體而對所述接著劑進行加熱,所述接觸式加熱器以第二壓力按壓所述第二半導體封裝體而對所述封裝體連接端子進行加熱。The apparatus for manufacturing a laminated semiconductor package according to claim 6, wherein: the controller controls the contact heater and the elevating mechanism in such a manner that the contact heating The device heats the adhesive by pressing the second semiconductor package with a first pressure, and the contact heater presses the second semiconductor package with a second pressure to heat the package connection terminal . 如申請專利範圍第7項所述的積層型半導體封裝體的製造裝置,其中: 還包含壓力感測器,所述壓力感測器設置到所述接觸式加熱器或所述接觸式加熱器與所述升降機構之間,以便檢測所述接觸式加熱器對所述第二半導體封裝體的接觸壓力並將這個檢測信息傳輸到所述控制器。The apparatus for manufacturing a laminated semiconductor package according to claim 7, wherein: further comprising a pressure sensor, the pressure sensor being disposed to the contact heater or the contact heater Between the lifting mechanisms, in order to detect the contact pressure of the contact heater to the second semiconductor package and transmit the detection information to the controller. 如申請專利範圍第1項所述的積層型半導體封裝體的製造裝置,其中: 還包含接著劑分配器,所述接著劑分配器向所述第一半導體封裝體與所述第二半導體封裝體中的至少一者塗布所述接著劑。The apparatus for manufacturing a laminated semiconductor package according to claim 1, wherein: further comprising an adhesive dispenser, the adhesive distributor to the first semiconductor package and the second semiconductor package At least one of the coatings is applied. 如申請專利範圍第9項所述的積層型半導體封裝體的製造裝置,還包含: 移送單元,其將所述第一半導體封裝體及所述第二半導體封裝體中的任一者固定成水平狀態而沿固定的移送路徑進行移送;及 組裝用裝載器,其拾取所述第一半導體封裝體及所述第二半導體封裝體中的剩餘的另一者而積層到通過所述移送單元水平移送的所述第一半導體封裝體及所述第二半導體封裝體中的任一者,從而形成所述封裝體組裝體;且 所述接著劑分配器在所述移送單元的移送路徑中設置在比所述組裝用裝載器更靠上游,以便向通過所述移送單元而水平移送的所述第一半導體封裝體及所述第二半導體封裝體中的任一者塗布所述接著劑, 所述接觸式加熱器在所述移送單元的移送路徑中設置在比所述接著劑分配器更靠下游,以便與通過所述移送單元而移送的所述封裝體組裝體的所述第二半導體封裝體的一面接觸。The apparatus for manufacturing a laminated semiconductor package according to claim 9, further comprising: a transfer unit that fixes any one of the first semiconductor package and the second semiconductor package to a level a state of being transferred along a fixed transfer path; and an assembly loader that picks up the remaining one of the first semiconductor package and the second semiconductor package and laminates to the horizontal transfer through the transfer unit Any one of the first semiconductor package and the second semiconductor package to form the package assembly; and the adhesive dispenser is disposed in a transfer path of the transfer unit The assembly loader is further upstream to apply the adhesive to any one of the first semiconductor package and the second semiconductor package that is horizontally transferred by the transfer unit, the contact a heater disposed downstream of the adhesive dispenser in a transfer path of the transfer unit for the package group transferred through the transfer unit Contacting the second side of the body of the semiconductor package. 如申請專利範圍第10項所述的積層型半導體封裝體的製造裝置,其中: 還包含檢查單元,所述檢查單元在所述移送單元的移送路徑中設置在比所述接觸式加熱器更靠下游,以便檢查通過所述接觸式加熱器焊接所述第一半導體封裝體與所述第二半導體封裝體而形成的積層型半導體封裝體。The apparatus for manufacturing a laminated semiconductor package according to claim 10, further comprising: an inspection unit, the inspection unit being disposed in the transfer path of the transfer unit more than the contact heater Downstream, in order to inspect a laminated semiconductor package formed by soldering the first semiconductor package and the second semiconductor package by the contact heater. 如申請專利範圍第1項所述的積層型半導體封裝體的製造裝置,其中: 所述接觸式加熱器為陶瓷加熱器。The apparatus for manufacturing a laminated semiconductor package according to claim 1, wherein the contact heater is a ceramic heater.
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