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TWI588090B - Coated graphite member - Google Patents

Coated graphite member Download PDF

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TWI588090B
TWI588090B TW105109314A TW105109314A TWI588090B TW I588090 B TWI588090 B TW I588090B TW 105109314 A TW105109314 A TW 105109314A TW 105109314 A TW105109314 A TW 105109314A TW I588090 B TWI588090 B TW I588090B
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graphite
coated
substrate
pbn
graphite substrate
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TW105109314A
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TW201641419A (en
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狩野正樹
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信越化學工業股份有限公司
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Description

被覆石墨構件Coated graphite member

本發明是有關於一種包覆(被覆)有熱解氮化硼(PBN)、熱解石墨(PG)、碳化矽(SiC)、碳化鉭(TaC)等的石墨構件。 The present invention relates to a graphite member coated (coated) with pyrolytic boron nitride (PBN), pyrolytic graphite (PG), tantalum carbide (SiC), tantalum carbide (TaC), or the like.

包覆有PBN、PG、SiC、TaC等的石墨材料具有僅以石墨所無法得到的特性,因此,按照用途被應用於各種構件。尤其是包覆有PBN的石墨材料,由於其耐熱性、耐衝擊性、耐藥品性、耐放射線性、導熱性等優異,且具有僅以石墨所無法得到的電絕緣性,因此作為用於厭碳體系的夾具或構件的材料是有利的。 A graphite material coated with PBN, PG, SiC, TaC or the like has characteristics which are not obtained only by graphite, and therefore is applied to various members according to the use. In particular, a graphite material coated with PBN is excellent in heat resistance, impact resistance, chemical resistance, radiation resistance, thermal conductivity, and the like, and has electrical insulation which is not obtained only by graphite. The material of the fixture or component of the carbon system is advantageous.

並且,由於PBN通過化學氣相沉積(CVD)法合成,因此使用PBN單體作為材料的情況下,對於形狀的限制大,而由於被覆有PBN的石墨材料是向加工後的石墨表面包覆PBN,因此能夠自由地賦予形狀,故能夠在短時間內得到具有PBN特性的複雜形狀的夾具和構件。 Further, since PBN is synthesized by a chemical vapor deposition (CVD) method, when a PBN monomer is used as a material, the shape is restricted, and since the graphite material coated with PBN is coated with PBN on the surface of the processed graphite. Therefore, since the shape can be freely provided, it is possible to obtain a jig and a member having a complicated shape of PBN characteristics in a short time.

因此,被覆有PBN的石墨材料,其適應範圍廣,可用於各種各樣的構件。例如,可用作晶圓托盤、蒸鍍材料熔化坩堝、加熱器、反應容器、熱防護構件、拉晶用坩堝等的材料。另外, 由於對高溫NH3顯示出優異的耐蝕性,所以也可用於GaN單晶培養用坩堝以及GaN磊晶膜生長裝置用的夾具等。 Therefore, the graphite material coated with PBN has a wide range of adaptation and can be used for various members. For example, it can be used as a material for a wafer tray, a vapor deposition material melting crucible, a heater, a reaction container, a heat protection member, a crystal pulling crucible, or the like. In addition, since it exhibits excellent corrosion resistance to high-temperature NH 3 , it can also be used for a crucible for GaN single crystal growth, a jig for a GaN epitaxial film growth apparatus, and the like.

不過,由於包覆有PBN、PG、SiC、TaC等的石墨材料被用作僅石墨的情況下無法適用的夾具或構件的材料,所以一直被認為使基材石墨露出不佳。為此,通常在石墨基材的整個表面上包覆PBN、PG、SiC、TaC等的被覆材料。然而,由於1次塗敷無法對支撐基材的位置進行包覆,因此為了在整個表面對石墨基材進行包覆,需要在第1次塗敷後挪動基材的支撐位置再進行第2次塗敷。這與1次塗敷相比需要花費2倍的成本,故存在不經濟的問題。 However, since a graphite material coated with PBN, PG, SiC, TaC or the like is used as a material of a jig or a member which is not applicable in the case of only graphite, it has been considered that the base graphite is not exposed well. For this reason, a coating material of PBN, PG, SiC, TaC or the like is usually coated on the entire surface of the graphite substrate. However, since the position of the support substrate cannot be covered by one application, in order to coat the graphite substrate over the entire surface, it is necessary to move the support position of the substrate after the first application for the second time. Coating. This requires twice the cost of one application, and there is a problem that it is uneconomical.

因此,為了通過1次塗敷來被覆整個基材表面,專利文獻1提出了以下的塗敷方法,即,懸架於具有比設置在基材上的貫通孔的直徑小的橫剖面積的旋轉支撐杆上,通過反應過程使基材的支撐點連續地移動。但是,該方法的問題在於只能適用於在中央部有貫通孔的形狀的基材。 Therefore, in order to coat the entire surface of the substrate by one application, Patent Document 1 proposes a coating method in which a suspension is suspended on a cross-sectional area having a smaller diameter than a through hole provided in a substrate. On the rod, the support point of the substrate is continuously moved by the reaction process. However, this method has a problem in that it can be applied only to a substrate having a shape of a through hole at the center.

另外,專利文獻2公開了如下方法,即,在基材的一部分上嵌裝或貼付SiC板,通過以該SiC板作為支撐部,通過1次塗敷在基材的整個表面被覆SiC。然而,該方法也存在如下問題,即,為了嵌裝或貼付SiC板,需要花費多餘的成本,並且被覆膜有可能以嵌裝或貼付的部位為起點發生剝離。 Further, Patent Document 2 discloses a method in which a SiC plate is fitted or attached to a part of a base material, and SiC is coated on the entire surface of the base material by one application using the SiC plate as a support portion. However, this method also has a problem in that extra cost is required for inserting or attaching the SiC plate, and the coating film may be peeled off from the portion to be fitted or attached.

此外,關於PBN、PG、SiC、TaC等的被覆石墨材料,由於組合不同物性的材料,因此被指出其缺點是,由於在高溫區域 和低溫區域中的熱膨脹係數不同,容易發生被覆膜的剝離。針對這個問題,專利文獻3記載了一種嘗試,試圖利用電漿和/或反應性氣體對石墨材料進行表面處理之後,再通過CVD法形成PBN的被覆膜。然而,即使在這種被覆石墨材料中,雖然得到了某種程度上的改善,但依然存在容易發生被覆膜剝離的問題。 In addition, as for the coated graphite material of PBN, PG, SiC, TaC, etc., since materials of different physical properties are combined, it is pointed out that the disadvantage is due to the high temperature region. Unlike the coefficient of thermal expansion in the low temperature region, peeling of the coating film is liable to occur. In response to this problem, Patent Document 3 describes an attempt to form a coating film of PBN by a CVD method after attempting to surface-treat a graphite material with a plasma and/or a reactive gas. However, even in such a coated graphite material, although a certain degree of improvement has been obtained, there is still a problem that peeling of the coating film is likely to occur.

[現有技術文獻] [Prior Art Literature]

[專利文獻] [Patent Literature]

[專利文獻1]日本特開昭63-134663號公報 [Patent Document 1] JP-A-63-134663

[專利文獻2]日本特開2000-129444號公報 [Patent Document 2] Japanese Patent Laid-Open Publication No. 2000-129444

[專利文獻3]日本特開昭62-207786號公報 [Patent Document 3] Japanese Laid-Open Patent Publication No. 62-207786

鑒於上述問題,本發明人通過反覆深入的研究發現,包覆有PBN、PG、SiC、TaC等的被覆石墨材料的剝離問題是由減壓或真空下的裝置內的被覆膜內外的壓力差引起的。即,發現當在減壓或真空下的裝置內使用被覆石墨材料時,在進行裝置內的氣體的排氣處理時,由於存在於被覆石墨基材的間隙內的氣體被緻密的被覆膜包圍著,所以會產生其排氣速度變慢的情況。其結果,在被覆膜的內外產生壓力差,該壓力差導致被覆膜的剝離,從而促成了本發明。 In view of the above problems, the inventors have found through repeated studies that the peeling problem of the coated graphite material coated with PBN, PG, SiC, TaC, etc. is the pressure difference between the inside and outside of the coating film in a device under reduced pressure or under vacuum. caused. That is, it was found that when the coated graphite material is used in a device under reduced pressure or under vacuum, when the gas in the device is subjected to the exhaust treatment, the gas existing in the gap of the coated graphite substrate is surrounded by the dense coating film. Therefore, there is a case where the exhaust speed is slow. As a result, a pressure difference occurs between the inside and the outside of the coating film, and the pressure difference causes peeling of the coating film, thereby contributing to the present invention.

因此,本發明的目的是提供一種在減壓或真空下難以產 生被覆膜內外的壓力差、且耐熱衝擊、不容易發生被覆膜剝離的被覆石墨構件。 Accordingly, it is an object of the present invention to provide a method that is difficult to produce under reduced pressure or vacuum. A coated graphite member having a pressure difference between the inside and the outside of the coating film and having a thermal shock resistance and causing peeling of the coating film is unlikely to occur.

本發明是在石墨基材的表面包覆有PBN、PG、SiC、TaC等不同材料的被覆石墨構件,其特徵在於,該石墨基材的一部分露出。並且,較佳的是,該石墨基材的露出部具有相對於基材表面呈凹形狀的沉頭孔或螺絲孔形狀,且其面積為1mm2以上且1200mm2以下。 The present invention is a coated graphite member in which a surface of a graphite substrate is coated with a material such as PBN, PG, SiC or TaC, and a part of the graphite substrate is exposed. Further, it is preferable that the exposed portion of the graphite base material has a countersunk hole or a screw hole shape which is concave with respect to the surface of the base material, and has an area of 1 mm 2 or more and 1200 mm 2 or less.

並且,較佳為石墨基材的露出部設置在溫度為1500℃以下的部位,或者設置在與對石墨具有腐蝕性的氣體不接觸的部位。 Further, it is preferable that the exposed portion of the graphite substrate is provided at a portion having a temperature of 1500 ° C or lower, or at a portion not in contact with a gas corrosive to graphite.

根據本發明,由於在被覆石墨構件的一部分上設有石墨露出的部位,因此,即使在減壓或真空下使用也能夠容易地將存在於石墨材料的間隙內的氣體排出,所以不容易產生被覆膜內外的壓力差,從而能夠防止由該壓力差引起的被覆膜的剝離。 According to the present invention, since a portion where the graphite is exposed is provided in a part of the coated graphite member, the gas existing in the gap of the graphite material can be easily discharged even when used under reduced pressure or under vacuum, so that it is less likely to be generated. The pressure difference between the inside and the outside of the film prevents the peeling of the coating film due to the pressure difference.

1‧‧‧被覆石墨構件 1‧‧‧coated graphite members

2‧‧‧石墨基材 2‧‧‧Graphite substrate

3‧‧‧露出部 3‧‧‧Exposed Department

4‧‧‧沉頭孔 4‧‧‧ countersunk hole

5‧‧‧螺絲孔 5‧‧‧ screw holes

6‧‧‧保持構件 6‧‧‧Retaining components

7‧‧‧圓盤部 7‧‧‧Disc

8‧‧‧軸部 8‧‧‧Axis

9‧‧‧加熱機構 9‧‧‧heating mechanism

圖1(a)~圖1(f)是表示本發明的石墨基材的露出部的沉頭孔或螺絲孔形狀的剖面示意圖。 1(a) to 1(f) are schematic cross-sectional views showing the shape of a countersunk hole or a screw hole in an exposed portion of a graphite substrate of the present invention.

圖2(a)~圖2(f)是表示利用保持構件保持圖1所示的石墨基材的露出部的實施方式的剖面示意圖。 2(a) to 2(f) are schematic cross-sectional views showing an embodiment in which an exposed portion of the graphite substrate shown in Fig. 1 is held by a holding member.

圖3是實施例中使用的被覆石墨構件的示意圖。 Fig. 3 is a schematic view of a coated graphite member used in the examples.

圖4是利用保持構件保持圖3的被覆石墨構件時的剖面模式圖。 Fig. 4 is a schematic cross-sectional view showing a state in which the coated graphite member of Fig. 3 is held by a holding member.

圖5是對所製作的被覆石墨構件進行加熱冷卻試驗時的剖面示意圖。 Fig. 5 is a schematic cross-sectional view showing a state in which a coated graphite member produced is subjected to a heating and cooling test.

以下具體說明本發明的實施方式。 Embodiments of the invention are specifically described below.

本發明的被覆石墨構件被用作例如晶圓托盤、蒸鍍材料熔化坩堝、加熱器、反應容器、熱防護構件、拉晶坩堝、螢光體製造容器、螢光體製造用夾具、陶瓷燒結用托架、合金熱處理退火爐的爐材等,但其用途不受限制,其形狀也可以根據用途和目的自由地設計。 The coated graphite member of the present invention is used as, for example, a wafer tray, a vapor deposition material melting crucible, a heater, a reaction container, a heat protection member, a wafer, a phosphor manufacturing container, a phosphor manufacturing jig, and a ceramic sintering. The material of the bracket, the alloy heat treatment annealing furnace, etc., but its use is not limited, and its shape can be freely designed according to the use and purpose.

尤其是,PBN被覆石墨構件可以用作GaN單晶培養容器、反應器、GaN生長用MOCVD裝置的加熱器、承載盤、隔熱板等。 In particular, the PBN-coated graphite member can be used as a GaN single crystal culture vessel, a reactor, a heater for a MOCVD apparatus for GaN growth, a carrier disk, a heat shield, and the like.

本發明的石墨基材通過機械加工等的方法成形石墨而製造。其材料為各向同性石墨、擠出成型石墨、模造成型石墨、碳纖維強化碳複合材料(C/C複合材料)等。其製造方法並不限定於機械加工等的方法,而且也可以將一部分不同的材料作為石墨基材組合使用。 The graphite base material of the present invention is produced by forming graphite by a method such as machining. The material is isotropic graphite, extruded graphite, mold-forming graphite, carbon fiber-reinforced carbon composite (C/C composite) and the like. The manufacturing method is not limited to a method such as machining, and a part of different materials may be used in combination as a graphite substrate.

成形後的石墨基材在由該保持構件保持著的狀態下,在其表面形成不同材料的被覆膜。此時,可採用PBN、PG、SiC、 TaC等材料作為被覆材料,但並不限定於這些材料,也可以組合多種材料。另外,也可以根據其用途和目的選擇合適的被覆材料。 The formed graphite substrate is formed with a coating film of a different material on the surface thereof while being held by the holding member. At this time, PBN, PG, SiC, Materials such as TaC are used as the coating material, but are not limited to these materials, and a plurality of materials may be combined. In addition, it is also possible to select a suitable covering material according to its use and purpose.

並且,在被覆PBN、PG、SiC、TaC的情況下,作為其被覆方法,一般採用CVD法,不過也可以採用其他方法。例如,作為在石墨基材上被覆PBN的方法,公知有如下方法,即在1000Pa以下的減壓下,將石墨基材從1700℃加熱至2300℃,通過使其與BCl3氣體及NH3氣體接觸,在石墨基材上形成PBN的蒸鍍膜。 Further, in the case of coating PBN, PG, SiC, or TaC, the CVD method is generally employed as the coating method, but other methods may be employed. For example, as a method of coating PBN on a graphite substrate, a method is known in which a graphite substrate is heated from 1700 ° C to 2300 ° C under a reduced pressure of 1000 Pa or less, and is made to react with BCl 3 gas and NH 3 gas. In contact, a vapor deposited film of PBN is formed on the graphite substrate.

本發明的被覆石墨構件的特徵在於,該石墨基材的一部分露出。並且,由此,即使在真空下使用,存在於石墨基材的間隙內的氣體也能夠容易地被排出,因此在被覆膜內外不容易產生壓力差。 The coated graphite member of the present invention is characterized in that a part of the graphite substrate is exposed. Further, by this, even if it is used under vacuum, the gas existing in the gap of the graphite substrate can be easily discharged, so that a pressure difference does not easily occur inside and outside the coating film.

作為本發明的特徵的露出部,可以通過任何方法來設置。既可以將通過保持石墨基材的保持構件所保持著的部位作為露出部,也可以通過實施部分遮蔽來設置未被包覆被覆材料的部位。另外,雖然也可以通過除去部分已經包覆的被覆材料來設置露出部,不過,若將用保持構件支撐的部位作為露出部的話,包覆工序一次即可完成,故不需要新設置露出部所需的工時,從製造效率的角度是較佳的。另外,這樣的露出部既可以設在一處,也可以設在多處。 The exposed portion which is a feature of the present invention can be provided by any method. The portion held by the holding member holding the graphite base material may be used as an exposed portion, or the portion not covered with the covering material may be provided by partial shielding. Further, the exposed portion may be provided by removing a portion of the covering material that has been coated. However, if the portion supported by the holding member is used as the exposed portion, the coating step can be completed once, so that it is not necessary to newly provide the exposed portion. The required working hours are preferred from the viewpoint of manufacturing efficiency. Further, such an exposed portion may be provided in one place or in a plurality of places.

關於露出部的形狀,雖然不特別限定,但較佳為相對於基材表面呈凹形狀的沉頭孔或螺絲孔形狀。如果在石墨基材上預先設置凹形狀的沉頭孔或螺絲孔,並且在保持構件上設置與沉頭 孔或螺絲孔相對應的形狀的突起的話,通過使石墨基材的沉頭孔或螺絲孔與保持構件的突起相互嵌合,能夠容易地保持石墨基材。 The shape of the exposed portion is not particularly limited, but is preferably a counterbore or a screw hole shape that is concave with respect to the surface of the substrate. If a concave shaped counterbore or screw hole is provided in advance on the graphite substrate, and a countersunk head is provided on the holding member When the protrusion of the hole or the screw hole has a shape corresponding to the shape, the graphite substrate can be easily held by fitting the counterbore or the screw hole of the graphite base material to the protrusion of the holding member.

作為沉頭孔的形狀,例如,可以設成如圖1(a)~圖1(f)所示的各種形狀或者將它們組合而成的形狀。另外,從上部觀察沉頭孔4時,其形狀既可以是圓形也可以是多角形,不過若為多角形,能夠將石墨基材2保持成不旋轉。如果在石墨基材2上設置螺絲孔5,則在保持構件上設置相同形狀的外螺紋即可。這樣的話,能夠更穩定地保持石墨基材2,因此能夠防止被覆膜包覆過程的傾倒,從而提高製造的成品率。另外,在利用保持構件來保持石墨基材的情況下,通常由多根支柱支撐,但通過這種沉頭孔或螺絲孔來保持石墨基材的話,如圖2(a)~圖2(f)和圖4所示的那樣,能夠在一個部位通過保持構件6來保持石墨基材2。 The shape of the counterbore may be, for example, various shapes as shown in FIGS. 1(a) to 1(f) or a combination of these. Further, when the counterbore 4 is viewed from the upper portion, the shape may be circular or polygonal, but if it is polygonal, the graphite substrate 2 can be kept in rotation. If the screw hole 5 is provided in the graphite substrate 2, an external thread of the same shape may be provided on the holding member. In this case, since the graphite base material 2 can be held more stably, it is possible to prevent the coating film coating process from being poured, thereby improving the yield of the manufacturing. Further, in the case where the graphite substrate is held by the holding member, it is usually supported by a plurality of pillars, but the graphite substrate is held by such countersunk holes or screw holes, as shown in Fig. 2(a) to Fig. 2(f) As shown in FIG. 4, the graphite base material 2 can be held by the holding member 6 at one location.

關於露出部的面積,由於需要將其大小設置成容易地將存在於石墨基材的間隙內的氣體排出從而使得在被覆膜的內外不產生壓力差,因此至少為1mm2以上。這是因為,若露出部的面積小於1mm2,則當在真空下使用時存在於石墨基材的間隙內的氣體的排出速度慢,而有在被覆膜內外產生壓力差從而導致被覆膜剝離的隱患。因此,當露出部的面積為至少1mm2以上,更佳為3mm2以上,進一步佳為10mm2以上時,能夠使被覆膜的剝離變得難以發生。另外,雖然也取決於構件的大小和形狀,若露出部的面積為30mm2以上,更佳為80mm2以上的話,因為如上所述能夠通過設有突起的保持構件來容易地保持石墨基材,故較佳。 Regarding the area of the exposed portion, it is necessary to set the size so as to easily discharge the gas existing in the gap of the graphite substrate so that a pressure difference does not occur inside and outside the coating film, and therefore it is at least 1 mm 2 or more. This is because if the area of the exposed portion is less than 1 mm 2 , the discharge rate of the gas existing in the gap of the graphite substrate when used under vacuum is slow, and a pressure difference occurs inside and outside the coating film to cause the coating film. The hidden danger of stripping. Thus, when the area of the exposed portion is at least 1mm 2 or more, more preferably 3mm 2 or more, further 10mm 2 or more is good, the coating film can be made to be peeled it becomes difficult to occur. In addition, depending on the size and shape of the member, if the area of the exposed portion is 30 mm 2 or more, and more preferably 80 mm 2 or more, the graphite substrate can be easily held by the holding member provided with the protrusion as described above. Therefore, it is better.

另外,因為被覆石墨構件常在僅石墨基材不能適用的條件下使用,所以不希望石墨基材的露出部過大。特別是在對石墨基材具有腐蝕性的氣體環境下使用的情況下,由於石墨基材的露出部因腐蝕性氣體而消耗導致使用壽命縮短,故露出部的面積較佳為1000mm2以下,更佳為500mm2以下,進一步佳為100mm2以下。實際上,儘管露出部的面積超過1000mm2也不會發生被覆膜的剝離,也是可以使用的,但隨著使用次數的增加,石墨基材因腐蝕性氣體而不斷消耗,從而導致使用壽命縮短,所以較佳為1200mm2以下。 Further, since the coated graphite member is often used under conditions in which only the graphite substrate is not applicable, it is not desirable that the exposed portion of the graphite substrate is excessively large. In particular, when it is used in a gas atmosphere in which the graphite substrate is corrosive, since the exposed portion of the graphite substrate is consumed by the corrosive gas, the service life is shortened, so that the area of the exposed portion is preferably 1000 mm 2 or less. Preferably, it is 500 mm 2 or less, and further preferably 100 mm 2 or less. In fact, although the peeling of the coating film does not occur even if the area of the exposed portion exceeds 1000 mm 2 , it can be used. However, as the number of uses increases, the graphite substrate is continuously consumed by the corrosive gas, resulting in a shortened service life. Therefore, it is preferably 1200 mm 2 or less.

因此,對於露出部的面積而言,為了抑制被覆膜的剝離,較佳為1mm2以上且1200mm2以下,同時,為了抑制石墨基材的消耗從而保持較長的使用壽命,較佳為1mm2以上且1000mm2以下。 Therefore, the area of the exposed portion is preferably 1 mm 2 or more and 1200 mm 2 or less in order to suppress peeling of the coating film, and is preferably 1 mm in order to suppress consumption of the graphite substrate and maintain a long service life. 2 or more and 1000 mm 2 or less.

關於露出部的位置,並不特別限定,也可任意選擇,不過,若本發明的被覆石墨構件在對石墨具有腐蝕性的氣體存在下使用的情況下,較佳為將石墨基材的露出部設置在不直接暴露於腐蝕性氣體的部位。例如,可設置在由其他的構件覆蓋著的部位,或者與其他的構件的結合部。由此,能夠防止石墨基材的腐蝕,故能夠長期穩定地使用。 The position of the exposed portion is not particularly limited, and may be arbitrarily selected. However, when the coated graphite member of the present invention is used in the presence of a gas corrosive to graphite, the exposed portion of the graphite substrate is preferably used. Set at a location that is not directly exposed to corrosive gases. For example, it may be provided at a portion covered by another member or a joint portion with other members. Thereby, corrosion of a graphite base material can be prevented, and it can be used stably for a long period of time.

另外,關於露出部的位置,若本發明的被覆石墨構件在對石墨具有腐蝕性的氣體存在下使用的情況下,較佳為設置在由石墨基材的腐蝕引起的消耗較少的溫度的部位。在溫度為1000℃ 以下的部位,不易產生石墨基材的腐蝕,能夠長期使用,故較佳。實際上,儘管在溫度超過1000℃的部位,也不會發生被覆膜的剝離,故也是可以使用的,不過,隨著使用次數的增加,石墨基材的不斷消耗,從而導致使用壽命縮短,所以較佳為設置在溫度為1500℃以下的部位。 Further, when the coated graphite member of the present invention is used in the presence of a gas which is corrosive to graphite, it is preferable to provide a portion which is provided at a temperature which is less consumed by corrosion of the graphite substrate. . At a temperature of 1000 ° C The following portions are less likely to cause corrosion of the graphite substrate and can be used for a long period of time, which is preferable. In fact, although the peeling of the coating film does not occur at a portion where the temperature exceeds 1000 ° C, it can be used. However, as the number of uses increases, the graphite substrate is continuously consumed, resulting in a shortened service life. Therefore, it is preferably placed at a temperature of 1500 ° C or less.

綜上所述,露出部的位置較佳為溫度為1500℃以下的部位,並且,為了抑制石墨基材的消耗保持較長的使用壽命,較佳為1000℃以下的部位。 As described above, the position of the exposed portion is preferably a portion having a temperature of 1500 ° C or lower, and a portion having a temperature of 1000 ° C or lower is preferable in order to suppress a long life of the graphite substrate.

[實施例] [Examples]

以下,基於附圖對本發明的實施例進行具體說明。 Hereinafter, embodiments of the present invention will be specifically described based on the drawings.

<實施例1> <Example 1>

在實施例1中,首先,對各向同性石墨進行機械磨削加工,準備如圖3所示的圓盤部7的直徑為200mm,厚度為10mm,軸部的直徑為20mm,長度為50mm的承載盤形狀的石墨基材2。然後,如圖4所示,通過保持構件6支撐該石墨基材2的軸部8的底面,設置於高溫蒸鍍爐之後,用真空泵對爐內進行排氣,並加熱升溫到約2000℃。 In the first embodiment, first, the isotropic graphite was subjected to mechanical grinding processing to prepare a disk portion 7 having a diameter of 200 mm, a thickness of 10 mm, a shaft portion having a diameter of 20 mm, and a length of 50 mm as shown in FIG. A graphite substrate 2 in the shape of a disk. Then, as shown in FIG. 4, the bottom surface of the shaft portion 8 of the graphite substrate 2 is supported by the holding member 6, and after being placed in the high-temperature vapor deposition furnace, the inside of the furnace is evacuated by a vacuum pump, and the temperature is raised to about 2000 °C by heating.

接著,保持爐內溫度為約2000℃、爐內壓力為1000Pa以下,通過使BCl3氣體和NH3氣體反應,在石墨基材2的表面被覆PBN膜。並且,由於在該狀態下在PBN蒸鍍時支撐的部分未被包覆,所以,改變支撐的部位後再次進行了PBN的包覆。 Next, while maintaining the furnace temperature at about 2000 ° C and the furnace pressure at 1000 Pa or less, the surface of the graphite substrate 2 was coated with a PBN film by reacting BCl 3 gas with NH 3 gas. Further, since the portion supported at the time of PBN vapor deposition in this state was not coated, the PBN was coated again after the support portion was changed.

然後,使爐內降回到常溫之後,取出整個表面被覆了PBN 的石墨構件1進行觀察,結果發現,PBN膜結實地貼付於石墨基材2的表面,未發生剝離。接著,通過磨削除去軸部8前端部的一部分PBN被覆膜,設置直徑為2mm的露出部3。此時的露出部3的面積是3.14mm2Then, after the inside of the furnace was returned to the normal temperature, the graphite member 1 having the entire surface covered with PBN was taken out and observed, and it was found that the PBN film was firmly attached to the surface of the graphite substrate 2, and peeling did not occur. Next, a part of the PBN coating film at the front end portion of the shaft portion 8 was removed by grinding, and the exposed portion 3 having a diameter of 2 mm was provided. The area of the exposed portion 3 at this time was 3.14 mm 2 .

並且,將設有這種露出部3而製作的被覆石墨構件1放入GaN成膜用MOCVD裝置內後,一邊將設置內抽成真空,一邊以1L/min的流量吹灑NH3氣體。並在此狀態下,進行以100℃/min的升溫速度將承載盤圓盤部7的中央部加熱至1400℃後再以50℃/min的降溫速度冷卻為400℃的加熱冷卻試驗。圖5示出了使用加熱機構9對被覆石墨構件1進行加熱冷卻試驗的情況。在該試驗中,在承載盤圓盤部7的中央部為1400℃時,軸部8前端的石墨基材2的露出部3的溫度是1000℃。 In addition, the coated graphite member 1 prepared by providing the exposed portion 3 was placed in a MOCVD apparatus for GaN film formation, and then the NH 3 gas was blown at a flow rate of 1 L/min while evacuating the inside of the installation. In this state, a heating and cooling test was performed in which the center portion of the disk portion 7 of the carrier disk was heated to 1400 ° C at a temperature increase rate of 100 ° C / min, and then cooled to 400 ° C at a temperature decreasing rate of 50 ° C / min. FIG. 5 shows a case where the coated graphite member 1 is subjected to a heating and cooling test using the heating mechanism 9. In this test, when the center portion of the disk portion 7 of the carrier disk was 1400 ° C, the temperature of the exposed portion 3 of the graphite substrate 2 at the tip end of the shaft portion 8 was 1000 °C.

最後,利用加熱機構9反覆進行了上述加熱冷卻試驗100次,結果確認到PBN被覆膜未剝離。而且,在結束第100次的加熱冷卻試驗時,並未確認到石墨基材2的消耗。 Finally, the heating and cooling test was repeated 100 times by the heating means 9, and it was confirmed that the PBN coating film was not peeled off. Further, when the heating and cooling test of the 100th time was completed, the consumption of the graphite substrate 2 was not confirmed.

<實施例2~實施例5> <Example 2 to Example 5>

在實施例2~實施例5中,通過與實施例1同樣的方法,製造了將石墨基材2的露出部3的直徑和面積改變為表1所示的大小的被覆石墨構件1。 In the second to fifth embodiments, the coated graphite member 1 having the diameter and the area of the exposed portion 3 of the graphite substrate 2 changed to the size shown in Table 1 was produced in the same manner as in the first embodiment.

然後,對於製作的這些被覆石墨構件1,反覆進行了與實施例1同樣的加熱冷卻試驗100次,結果確認到PBN被覆膜未剝離。而且,無論哪個被覆石墨構件1,在結束第100次的加熱冷卻 試驗時,均未確認到石墨基材2的消耗。 Then, the coated graphite member 1 produced was subjected to the same heating and cooling test as in Example 1 for 100 times, and it was confirmed that the PBN coating film was not peeled off. Moreover, regardless of which coated graphite member 1, the 100th heating and cooling is completed. At the time of the test, the consumption of the graphite substrate 2 was not confirmed.

<實施例6> <Example 6>

在實施例6中,首先準備了與實施例1相同大小的承載盤形狀的石墨基材2。並通過機械加工在軸部8的前端部設置了直徑為5mm、深度為5mm的沉頭孔4。此時的露出部3的面積是98.2mm2。然後,通過具有能夠與所形成的沉頭孔4相互嵌合的突起部的保持構件6支撐石墨基材2,並設置於高溫蒸鍍爐。 In Example 6, first, a graphite substrate 2 having a carrier disk shape of the same size as that of Example 1 was prepared. A counterbored hole 4 having a diameter of 5 mm and a depth of 5 mm was provided at the front end portion of the shaft portion 8 by machining. The area of the exposed portion 3 at this time was 98.2 mm 2 . Then, the graphite base material 2 is supported by the holding member 6 having the projections that can be fitted to the formed counterbored holes 4, and is placed in the high-temperature vapor deposition furnace.

接著,用真空泵對爐內進行排氣,並加熱升溫至約2000℃後,將爐內溫度維持在約2000℃,將爐內壓力維持在1000Pa以下,通過使BCl3氣體和NH3氣體反應,在石墨基材2的表面被覆PBN膜。 Next, the inside of the furnace is evacuated by a vacuum pump, and after heating to about 2000 ° C, the temperature in the furnace is maintained at about 2000 ° C, and the pressure in the furnace is maintained below 1000 Pa. By reacting BCl 3 gas with NH 3 gas, The surface of the graphite substrate 2 is covered with a PBN film.

最後,對於製作的被覆石墨構件1,反覆進行了與實施例1同樣的加熱冷卻試驗100次,結果確認到PBN被覆膜未剝離。而且,在結束第100次的加熱冷卻試驗的時,也未確認到石墨基材2的消耗。 Finally, the coated graphite member 1 produced was repeatedly subjected to the same heating and cooling test as in Example 1 for 100 times, and it was confirmed that the PBN coating film was not peeled off. Further, when the heating and cooling test of the 100th time was completed, the consumption of the graphite substrate 2 was not confirmed.

<實施例7~實施例13> <Example 7 to Example 13>

在實施例7~實施例13中,通過與實施例6同樣的方法,製作了將石墨基材2的露出部3的直徑、深度和面積改變為如表1所示數值的大小的被覆石墨構件1。 In Example 7 to Example 13, a coated graphite member in which the diameter, depth, and area of the exposed portion 3 of the graphite substrate 2 were changed to the numerical values shown in Table 1 was produced in the same manner as in Example 6. 1.

然後,對於製作的這些被覆石墨構件1反覆進行與實施例1同樣的加熱冷卻試驗100次,結果確認到PBN被覆膜未剝離。不過,雖然在實施例7~實施例12的被覆石墨構件1中,在結束 第100次的加熱冷卻試驗時未確認到石墨基材的消耗,但在實施例13的被覆石墨構件1中,從結束第90次的加熱冷卻試驗時開始確認到石墨基材2的消耗。 Then, the coated graphite member 1 produced was repeatedly subjected to the same heating and cooling test as in Example 1 for 100 times, and it was confirmed that the PBN coating film was not peeled off. However, in the coated graphite members 1 of Examples 7 to 12, the end is ended. In the case of the heating and cooling test of the 100th time, the graphite substrate was not consumed. However, in the coated graphite member 1 of the thirteenth embodiment, the consumption of the graphite substrate 2 was confirmed from the end of the 90th heating and cooling test.

<實施例14> <Example 14>

在實施例14中,通過與實施例1同樣的方法,用PBN包覆石墨基材2的整個表面,然後,通過機械加工在軸的側面部設置直徑為5mm、深度為5mm的沉頭孔4。此時的露出部3的面積為98.2mm2In Example 14, the entire surface of the graphite substrate 2 was coated with PBN in the same manner as in Example 1, and then a countersunk hole 4 having a diameter of 5 mm and a depth of 5 mm was provided on the side portion of the shaft by machining. . The area of the exposed portion 3 at this time was 98.2 mm 2 .

接下來,對所製作的被覆石墨構件1進行了與實施例1同樣的加熱冷卻試驗,不過,在該試驗中,承載盤圓盤部7的中央部為1400℃時的軸部8的側面部的石墨基材2的露出部的溫度是1200℃。 Next, the coated graphite member 1 produced was subjected to the same heating and cooling test as in Example 1. However, in this test, the central portion of the disk portion 7 was at the side portion of the shaft portion 8 at 1400 °C. The temperature of the exposed portion of the graphite substrate 2 was 1200 °C.

最後,對於製造的被覆石墨構件1反覆進行上述加熱冷卻試驗100次,結果確認到PBN被覆膜未剝離,不過,從結束了第80次的加熱冷卻試驗時開始確認到石墨基材2的消耗。 Finally, the coated graphite member 1 was repeatedly subjected to the above-described heating and cooling test 100 times, and it was confirmed that the PBN coating film was not peeled off. However, the consumption of the graphite substrate 2 was confirmed from the end of the 80th heating and cooling test. .

<實施例15> <Example 15>

在實施例15中,首先準備了與實施例1相同大小的承載盤形狀的石墨基材2。並且,通過機械加工在圓盤部7的中央部設置了直徑為5mm、深度為5mm的沉頭孔4。此時的露出部3的面積是98.2mm2。然後,通過具有與形成的沉頭孔4嵌合的凸狀部的保持構件6支撐石墨基材2,並將其設置於高溫蒸鍍爐內。 In Example 15, first, a graphite substrate 2 having a carrier disk shape of the same size as that of Example 1 was prepared. Further, a counterbored hole 4 having a diameter of 5 mm and a depth of 5 mm was provided at the center portion of the disk portion 7 by machining. The area of the exposed portion 3 at this time was 98.2 mm 2 . Then, the graphite substrate 2 is supported by a holding member 6 having a convex portion fitted to the formed counterbore 4, and is placed in a high-temperature vapor deposition furnace.

接下來,用真空泵對爐內進行排氣,加熱升溫至約2000 ℃後,將爐內溫度維持為約2000℃,將爐內壓力維持在1000Pa以下,通過使BCl3氣體和NH3氣體反應,在石墨基材2的表面被覆了PBN膜。 Next, the inside of the furnace is evacuated by a vacuum pump, and after heating to about 2000 ° C, the temperature in the furnace is maintained at about 2000 ° C, and the pressure in the furnace is maintained below 1000 Pa. By reacting BCl 3 gas with NH 3 gas, The surface of the graphite substrate 2 is covered with a PBN film.

然後,對於所製作的被覆石墨構件1進行了與實施例1同樣的加熱冷卻試驗,在該試驗中,設於承載盤圓盤部7的中央部的石墨基材2的露出部3的最高溫度為1400℃。 Then, the coated graphite member 1 produced was subjected to the same heating and cooling test as in Example 1, and the maximum temperature of the exposed portion 3 of the graphite substrate 2 provided at the center portion of the disk portion 7 was placed in this test. It is 1400 °C.

最後,利用加熱機構9對所製作的被覆石墨構件1反覆進行了上述加熱冷卻試驗100次,結果確認到PBN被覆膜未剝離,不過,從結束了第50次的加熱冷卻試驗時開始確認到石墨基材2的消耗。 Finally, the coated graphite member 1 produced by the heating mechanism 9 was subjected to the above-described heating and cooling test 100 times, and it was confirmed that the PBN coating film was not peeled off. However, it was confirmed from the end of the 50th heating and cooling test. Consumption of the graphite substrate 2.

<比較例1> <Comparative Example 1>

在比較例1中,首先準備了與實施例1同樣大小的承載盤形狀的石墨基材2,並且,支撐該石墨基材2的軸部8的底面將其設置於高溫蒸鍍爐之後,用真空泵對爐內進行排氣,加熱升溫至約2000℃。然後,將爐內溫度保持為約2000℃,將爐內壓力保持在1000Pa以下,通過使BCl3氣體和NH3氣體反應,在石墨基材2表面被覆了PBN膜。 In Comparative Example 1, first, a graphite substrate 2 having a carrier disk shape of the same size as in Example 1 was prepared, and the bottom surface of the shaft portion 8 supporting the graphite substrate 2 was placed in a high-temperature vapor deposition furnace. The vacuum pump exhausts the furnace and heats it to about 2000 °C. Then, the temperature in the furnace was maintained at about 2000 ° C, the pressure in the furnace was maintained at 1000 Pa or less, and the surface of the graphite substrate 2 was coated with a PBN film by reacting BCl 3 gas with NH 3 gas.

接下來,在此狀態下,由於在PBN蒸鍍時支撐的部分未被包覆,所以改變支撐的位置再次進行了PBN的包覆。然後,使爐內降回到常溫之後,取出整個表面被覆了PBN的石墨構件1觀察,結果發現,PBN膜牢固地粘貼於石墨基材2的表面,未發生剝離。 Next, in this state, since the portion supported at the time of PBN vapor deposition is not coated, the position of the support is changed to cover the PBN again. Then, after the inside of the furnace was returned to the normal temperature, the graphite member 1 having the entire surface covered with PBN was taken out, and it was found that the PBN film was firmly adhered to the surface of the graphite substrate 2, and peeling did not occur.

並且,在比較例1中,利用加熱機構9對未設置露出部的被覆石墨構件1反覆進行與實施例1同樣的加熱冷卻試驗,結果在第3次便確認到了被覆膜的剝離。 In addition, in the comparative example 1, the coated graphite member 1 in which the exposed portion was not provided was repeatedly subjected to the heating and cooling test in the same manner as in the first embodiment, and the peeling of the coating film was confirmed in the third time.

2‧‧‧石墨基材 2‧‧‧Graphite substrate

4‧‧‧沉頭孔 4‧‧‧ countersunk hole

Claims (5)

一種被覆石墨構件,是在石墨基材表面包覆有不同材料的被覆石墨構件,其特徵在於,所述石墨基材的一部分露出,且所述石墨基材的露出部為相對於基材表面呈凹形狀的沉頭孔或螺絲孔形狀。 A coated graphite member is a coated graphite member coated with a different material on a surface of a graphite substrate, wherein a part of the graphite substrate is exposed, and an exposed portion of the graphite substrate is opposite to a surface of the substrate Concave shaped counterbore or screw hole shape. 如申請專利範圍第1項所述的被覆石墨構件,其中所述石墨基材的所述露出部的面積為1mm2以上且1200mm2以下。 The coated graphite member according to claim 1, wherein an area of the exposed portion of the graphite substrate is 1 mm 2 or more and 1200 mm 2 or less. 如申請專利範圍第1項或第2項所述的被覆石墨構件,其中所述石墨基材的所述露出部設置在溫度為1500℃以下的部位。 The coated graphite member according to the first or second aspect of the invention, wherein the exposed portion of the graphite substrate is provided at a temperature of 1500 ° C or lower. 如申請專利範圍第1項或第2項所述的被覆石墨構件,其中所述石墨基材的所述露出部設置在與對石墨具有腐蝕性的氣體不接觸的部位。 The coated graphite member according to the first or second aspect of the invention, wherein the exposed portion of the graphite substrate is provided at a portion that does not contact a gas corrosive to graphite. 如申請專利範圍第1項或第2項所述的被覆石墨構件,其中所述不同的材料至少是PBN、PG、SiC、TaC中的任一種。 The coated graphite member according to claim 1 or 2, wherein the different material is at least any one of PBN, PG, SiC, and TaC.
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