TWI583705B - Styrene-anhydride-acrylate copolymer containing ester or amido group and preparation and uses thereof - Google Patents
Styrene-anhydride-acrylate copolymer containing ester or amido group and preparation and uses thereof Download PDFInfo
- Publication number
- TWI583705B TWI583705B TW104139992A TW104139992A TWI583705B TW I583705 B TWI583705 B TW I583705B TW 104139992 A TW104139992 A TW 104139992A TW 104139992 A TW104139992 A TW 104139992A TW I583705 B TWI583705 B TW I583705B
- Authority
- TW
- Taiwan
- Prior art keywords
- anhydride
- group
- styrene
- monomer
- copolymer
- Prior art date
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- 229920001577 copolymer Polymers 0.000 title claims description 46
- 238000002360 preparation method Methods 0.000 title description 7
- 150000002148 esters Chemical class 0.000 title description 3
- 125000003368 amide group Chemical group 0.000 title 1
- 239000000178 monomer Substances 0.000 claims description 44
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical group C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 claims description 39
- 239000011342 resin composition Substances 0.000 claims description 22
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims description 18
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 claims description 17
- 238000007142 ring opening reaction Methods 0.000 claims description 17
- 150000008065 acid anhydrides Chemical class 0.000 claims description 15
- -1 alkyl methacrylate Chemical compound 0.000 claims description 14
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 12
- 150000008064 anhydrides Chemical class 0.000 claims description 12
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 9
- 125000000217 alkyl group Chemical group 0.000 claims description 9
- 125000002843 carboxylic acid group Chemical group 0.000 claims description 9
- 125000004185 ester group Chemical group 0.000 claims description 9
- 125000000524 functional group Chemical group 0.000 claims description 9
- 229910052739 hydrogen Inorganic materials 0.000 claims description 9
- 239000001257 hydrogen Substances 0.000 claims description 9
- 238000000034 method Methods 0.000 claims description 9
- VZXTWGWHSMCWGA-UHFFFAOYSA-N 1,3,5-triazine-2,4-diamine Chemical group NC1=NC=NC(N)=N1 VZXTWGWHSMCWGA-UHFFFAOYSA-N 0.000 claims description 7
- 239000003999 initiator Substances 0.000 claims description 7
- 229920006395 saturated elastomer Polymers 0.000 claims description 7
- 239000002904 solvent Substances 0.000 claims description 7
- 239000000654 additive Substances 0.000 claims description 6
- 125000005250 alkyl acrylate group Chemical group 0.000 claims description 6
- 125000004122 cyclic group Chemical group 0.000 claims description 6
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 6
- 125000004433 nitrogen atom Chemical group N* 0.000 claims description 5
- 229910052760 oxygen Inorganic materials 0.000 claims description 5
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 4
- 125000000623 heterocyclic group Chemical group 0.000 claims description 4
- 229910052757 nitrogen Inorganic materials 0.000 claims description 4
- 239000002798 polar solvent Substances 0.000 claims description 4
- 125000001424 substituent group Chemical group 0.000 claims description 4
- FMJUDUJLTNVWCH-UHFFFAOYSA-N 2-ethoxy-3-(4-hydroxyphenyl)propanoic acid Chemical compound CCOC(C(O)=O)CC1=CC=C(O)C=C1 FMJUDUJLTNVWCH-UHFFFAOYSA-N 0.000 claims description 3
- AYKYXWQEBUNJCN-UHFFFAOYSA-N 3-methylfuran-2,5-dione Chemical compound CC1=CC(=O)OC1=O AYKYXWQEBUNJCN-UHFFFAOYSA-N 0.000 claims description 3
- OFNISBHGPNMTMS-UHFFFAOYSA-N 3-methylideneoxolane-2,5-dione Chemical compound C=C1CC(=O)OC1=O OFNISBHGPNMTMS-UHFFFAOYSA-N 0.000 claims description 3
- 125000005907 alkyl ester group Chemical group 0.000 claims description 3
- 125000004432 carbon atom Chemical group C* 0.000 claims description 3
- 125000005842 heteroatom Chemical group 0.000 claims description 3
- 238000004519 manufacturing process Methods 0.000 claims description 3
- 229910052717 sulfur Inorganic materials 0.000 claims description 3
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 claims description 2
- 239000012454 non-polar solvent Substances 0.000 claims description 2
- 150000001451 organic peroxides Chemical class 0.000 claims description 2
- 239000004014 plasticizer Substances 0.000 claims description 2
- 238000010526 radical polymerization reaction Methods 0.000 claims description 2
- UNCRKEZQEKKGQX-UHFFFAOYSA-N trans-aconitic acid anhydride Chemical compound OC(=O)C1=CC(=O)OC(=O)C1 UNCRKEZQEKKGQX-UHFFFAOYSA-N 0.000 claims description 2
- 125000000467 secondary amino group Chemical class [H]N([*:1])[*:2] 0.000 claims 4
- 125000004356 hydroxy functional group Chemical group O* 0.000 claims 3
- JLBJTVDPSNHSKJ-UHFFFAOYSA-N 4-Methylstyrene Chemical compound CC1=CC=C(C=C)C=C1 JLBJTVDPSNHSKJ-UHFFFAOYSA-N 0.000 claims 2
- 229910052799 carbon Inorganic materials 0.000 claims 2
- SYIUWAVTBADRJG-UHFFFAOYSA-N 2H-pyran-2,6(3H)-dione Chemical compound O=C1CC=CC(=O)O1 SYIUWAVTBADRJG-UHFFFAOYSA-N 0.000 claims 1
- 239000003086 colorant Substances 0.000 claims 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims 1
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 20
- 239000002253 acid Substances 0.000 description 13
- 229920002120 photoresistant polymer Polymers 0.000 description 10
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 9
- SOGAXMICEFXMKE-UHFFFAOYSA-N Butylmethacrylate Chemical compound CCCCOC(=O)C(C)=C SOGAXMICEFXMKE-UHFFFAOYSA-N 0.000 description 8
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 7
- 239000011347 resin Substances 0.000 description 7
- 229920005989 resin Polymers 0.000 description 7
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 6
- RWRDLPDLKQPQOW-UHFFFAOYSA-N Pyrrolidine Chemical compound C1CCNC1 RWRDLPDLKQPQOW-UHFFFAOYSA-N 0.000 description 6
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 6
- 238000006243 chemical reaction Methods 0.000 description 6
- 238000006116 polymerization reaction Methods 0.000 description 6
- 150000003335 secondary amines Chemical class 0.000 description 6
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 5
- NQRYJNQNLNOLGT-UHFFFAOYSA-N Piperidine Chemical compound C1CCNCC1 NQRYJNQNLNOLGT-UHFFFAOYSA-N 0.000 description 5
- 230000000996 additive effect Effects 0.000 description 5
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 5
- 238000002329 infrared spectrum Methods 0.000 description 5
- SPEUIVXLLWOEMJ-UHFFFAOYSA-N 1,1-dimethoxyethane Chemical compound COC(C)OC SPEUIVXLLWOEMJ-UHFFFAOYSA-N 0.000 description 4
- YFKBXYGUSOXJGS-UHFFFAOYSA-N 1,3-Diphenyl-2-propanone Chemical compound C=1C=CC=CC=1CC(=O)CC1=CC=CC=C1 YFKBXYGUSOXJGS-UHFFFAOYSA-N 0.000 description 4
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 4
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 4
- JQVDAXLFBXTEQA-UHFFFAOYSA-N dibutylamine Chemical compound CCCCNCCCC JQVDAXLFBXTEQA-UHFFFAOYSA-N 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 239000007787 solid Substances 0.000 description 4
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 3
- 125000003118 aryl group Chemical group 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 125000003700 epoxy group Chemical group 0.000 description 3
- 230000000704 physical effect Effects 0.000 description 3
- 229920000642 polymer Polymers 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 3
- ZDQNWDNMNKSMHI-UHFFFAOYSA-N 1-[2-(2-prop-2-enoyloxypropoxy)propoxy]propan-2-yl prop-2-enoate Chemical compound C=CC(=O)OC(C)COC(C)COCC(C)OC(=O)C=C ZDQNWDNMNKSMHI-UHFFFAOYSA-N 0.000 description 2
- XFCMNSHQOZQILR-UHFFFAOYSA-N 2-[2-(2-methylprop-2-enoyloxy)ethoxy]ethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCOCCOC(=O)C(C)=C XFCMNSHQOZQILR-UHFFFAOYSA-N 0.000 description 2
- KTALPKYXQZGAEG-UHFFFAOYSA-N 2-propan-2-ylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(C(C)C)=CC=C3SC2=C1 KTALPKYXQZGAEG-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- IPRJXAGUEGOFGG-UHFFFAOYSA-N N-butylbenzenesulfonamide Chemical compound CCCCNS(=O)(=O)C1=CC=CC=C1 IPRJXAGUEGOFGG-UHFFFAOYSA-N 0.000 description 2
- KAESVJOAVNADME-UHFFFAOYSA-N Pyrrole Chemical compound C=1C=CNC=1 KAESVJOAVNADME-UHFFFAOYSA-N 0.000 description 2
- SQNMYOLYEWHUCQ-UHFFFAOYSA-N acetic acid;methoxymethane;propane-1,2-diol Chemical compound COC.CC(O)=O.CC(O)CO SQNMYOLYEWHUCQ-UHFFFAOYSA-N 0.000 description 2
- 150000001298 alcohols Chemical class 0.000 description 2
- XXROGKLTLUQVRX-UHFFFAOYSA-N allyl alcohol Chemical compound OCC=C XXROGKLTLUQVRX-UHFFFAOYSA-N 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical compound C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- DOIRQSBPFJWKBE-UHFFFAOYSA-N dibutyl phthalate Chemical compound CCCCOC(=O)C1=CC=CC=C1C(=O)OCCCC DOIRQSBPFJWKBE-UHFFFAOYSA-N 0.000 description 2
- HPNMFZURTQLUMO-UHFFFAOYSA-N diethylamine Chemical compound CCNCC HPNMFZURTQLUMO-UHFFFAOYSA-N 0.000 description 2
- JQCXWCOOWVGKMT-UHFFFAOYSA-N diheptyl phthalate Chemical compound CCCCCCCOC(=O)C1=CC=CC=C1C(=O)OCCCCCCC JQCXWCOOWVGKMT-UHFFFAOYSA-N 0.000 description 2
- QMMFVYPAHWMCMS-UHFFFAOYSA-N dimethyl monosulfide Natural products CSC QMMFVYPAHWMCMS-UHFFFAOYSA-N 0.000 description 2
- WEHWNAOGRSTTBQ-UHFFFAOYSA-N dipropylamine Chemical compound CCCNCCC WEHWNAOGRSTTBQ-UHFFFAOYSA-N 0.000 description 2
- STVZJERGLQHEKB-UHFFFAOYSA-N ethylene glycol dimethacrylate Substances CC(=C)C(=O)OCCOC(=O)C(C)=C STVZJERGLQHEKB-UHFFFAOYSA-N 0.000 description 2
- LIWAQLJGPBVORC-UHFFFAOYSA-N ethylmethylamine Chemical compound CCNC LIWAQLJGPBVORC-UHFFFAOYSA-N 0.000 description 2
- 229910052736 halogen Inorganic materials 0.000 description 2
- 125000005843 halogen group Chemical group 0.000 description 2
- 150000002367 halogens Chemical class 0.000 description 2
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 2
- ZXEKIIBDNHEJCQ-UHFFFAOYSA-N isobutanol Chemical compound CC(C)CO ZXEKIIBDNHEJCQ-UHFFFAOYSA-N 0.000 description 2
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 2
- QPJVMBTYPHYUOC-UHFFFAOYSA-N methyl benzoate Chemical compound COC(=O)C1=CC=CC=C1 QPJVMBTYPHYUOC-UHFFFAOYSA-N 0.000 description 2
- IDBOAVAEGRJRIZ-UHFFFAOYSA-N methylidenehydrazine Chemical compound NN=C IDBOAVAEGRJRIZ-UHFFFAOYSA-N 0.000 description 2
- UHOVQNZJYSORNB-UHFFFAOYSA-N monobenzene Natural products C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 2
- GVWISOJSERXQBM-UHFFFAOYSA-N n-methylpropan-1-amine Chemical compound CCCNC GVWISOJSERXQBM-UHFFFAOYSA-N 0.000 description 2
- KPSSIOMAKSHJJG-UHFFFAOYSA-N neopentyl alcohol Chemical compound CC(C)(C)CO KPSSIOMAKSHJJG-UHFFFAOYSA-N 0.000 description 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 239000001294 propane Substances 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 230000035484 reaction time Effects 0.000 description 2
- 229920001897 terpolymer Polymers 0.000 description 2
- QOJXAPSXKQKFKS-UHFFFAOYSA-N (4-ethenylphenyl)methanethiol Chemical compound SCC1=CC=C(C=C)C=C1 QOJXAPSXKQKFKS-UHFFFAOYSA-N 0.000 description 1
- KFJJYOKMAAQFHC-UHFFFAOYSA-N (4-methoxy-5,5-dimethylcyclohexa-1,3-dien-1-yl)-phenylmethanone Chemical compound C1C(C)(C)C(OC)=CC=C1C(=O)C1=CC=CC=C1 KFJJYOKMAAQFHC-UHFFFAOYSA-N 0.000 description 1
- DLUPHJKQEIIYAM-UHFFFAOYSA-N 1-(2-ethoxyphenyl)-2-hydroxy-2-phenylethanone Chemical compound CCOC1=CC=CC=C1C(=O)C(O)C1=CC=CC=C1 DLUPHJKQEIIYAM-UHFFFAOYSA-N 0.000 description 1
- MLKIVXXYTZKNMI-UHFFFAOYSA-N 1-(4-dodecylphenyl)-2-hydroxy-2-methylpropan-1-one Chemical compound CCCCCCCCCCCCC1=CC=C(C(=O)C(C)(C)O)C=C1 MLKIVXXYTZKNMI-UHFFFAOYSA-N 0.000 description 1
- IMDHDEPPVWETOI-UHFFFAOYSA-N 1-(4-tert-butylphenyl)-2,2,2-trichloroethanone Chemical compound CC(C)(C)C1=CC=C(C(=O)C(Cl)(Cl)Cl)C=C1 IMDHDEPPVWETOI-UHFFFAOYSA-N 0.000 description 1
- VMCRQYHCDSXNLW-UHFFFAOYSA-N 1-(4-tert-butylphenyl)-2,2-dichloroethanone Chemical compound CC(C)(C)C1=CC=C(C(=O)C(Cl)Cl)C=C1 VMCRQYHCDSXNLW-UHFFFAOYSA-N 0.000 description 1
- HUDYANRNMZDQGA-UHFFFAOYSA-N 1-[4-(dimethylamino)phenyl]ethanone Chemical compound CN(C)C1=CC=C(C(C)=O)C=C1 HUDYANRNMZDQGA-UHFFFAOYSA-N 0.000 description 1
- LGJCFVYMIJLQJO-UHFFFAOYSA-N 1-dodecylperoxydodecane Chemical compound CCCCCCCCCCCCOOCCCCCCCCCCCC LGJCFVYMIJLQJO-UHFFFAOYSA-N 0.000 description 1
- 239000012956 1-hydroxycyclohexylphenyl-ketone Substances 0.000 description 1
- PIZHFBODNLEQBL-UHFFFAOYSA-N 2,2-diethoxy-1-phenylethanone Chemical compound CCOC(OCC)C(=O)C1=CC=CC=C1 PIZHFBODNLEQBL-UHFFFAOYSA-N 0.000 description 1
- KWVGIHKZDCUPEU-UHFFFAOYSA-N 2,2-dimethoxy-2-phenylacetophenone Chemical compound C=1C=CC=CC=1C(OC)(OC)C(=O)C1=CC=CC=C1 KWVGIHKZDCUPEU-UHFFFAOYSA-N 0.000 description 1
- LCHAFMWSFCONOO-UHFFFAOYSA-N 2,4-dimethylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(C)=CC(C)=C3SC2=C1 LCHAFMWSFCONOO-UHFFFAOYSA-N 0.000 description 1
- HOLGXWDGCVTMTB-UHFFFAOYSA-N 2-(2-aminophenyl)aniline Chemical compound NC1=CC=CC=C1C1=CC=CC=C1N HOLGXWDGCVTMTB-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- YSDGOVHCOMKGCR-UHFFFAOYSA-N 2-(2-methylprop-2-enoyloxy)propyl 2-methylprop-2-enoate;propane-1,2-diol Chemical compound CC(O)CO.CC(=C)C(=O)OC(C)COC(=O)C(C)=C YSDGOVHCOMKGCR-UHFFFAOYSA-N 0.000 description 1
- XMNIXWIUMCBBBL-UHFFFAOYSA-N 2-(2-phenylpropan-2-ylperoxy)propan-2-ylbenzene Chemical compound C=1C=CC=CC=1C(C)(C)OOC(C)(C)C1=CC=CC=C1 XMNIXWIUMCBBBL-UHFFFAOYSA-N 0.000 description 1
- OVOUKWFJRHALDD-UHFFFAOYSA-N 2-[2-(2-acetyloxyethoxy)ethoxy]ethyl acetate Chemical compound CC(=O)OCCOCCOCCOC(C)=O OVOUKWFJRHALDD-UHFFFAOYSA-N 0.000 description 1
- DXYGJDUJLDXFOD-UHFFFAOYSA-N 2-[2-[2-(2-acetyloxyethoxy)ethoxy]ethoxy]ethyl acetate Chemical compound CC(=O)OCCOCCOCCOCCOC(C)=O DXYGJDUJLDXFOD-UHFFFAOYSA-N 0.000 description 1
- LTHJXDSHSVNJKG-UHFFFAOYSA-N 2-[2-[2-[2-(2-methylprop-2-enoyloxy)ethoxy]ethoxy]ethoxy]ethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCOCCOCCOCCOC(=O)C(C)=C LTHJXDSHSVNJKG-UHFFFAOYSA-N 0.000 description 1
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 1
- GTELLNMUWNJXMQ-UHFFFAOYSA-N 2-ethyl-2-(hydroxymethyl)propane-1,3-diol;prop-2-enoic acid Chemical class OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.CCC(CO)(CO)CO GTELLNMUWNJXMQ-UHFFFAOYSA-N 0.000 description 1
- QDPMVUZZMXVFJO-UHFFFAOYSA-N 2-hydroxy-1-(2-methoxyphenyl)-2-phenylethanone Chemical compound COC1=CC=CC=C1C(=O)C(O)C1=CC=CC=C1 QDPMVUZZMXVFJO-UHFFFAOYSA-N 0.000 description 1
- KFZANTDNOBVWKZ-UHFFFAOYSA-N 2-hydroxy-1-[2-(2-methylpropoxy)phenyl]-2-phenylethanone Chemical compound CC(C)COC1=CC=CC=C1C(=O)C(O)C1=CC=CC=C1 KFZANTDNOBVWKZ-UHFFFAOYSA-N 0.000 description 1
- SYKBMHCHADIPDP-UHFFFAOYSA-N 2-hydroxy-1-[2-[(2-methylpropan-2-yl)oxy]phenyl]-2-phenylethanone Chemical compound CC(C)(C)OC1=CC=CC=C1C(=O)C(O)C1=CC=CC=C1 SYKBMHCHADIPDP-UHFFFAOYSA-N 0.000 description 1
- QPXVRLXJHPTCPW-UHFFFAOYSA-N 2-hydroxy-2-methyl-1-(4-propan-2-ylphenyl)propan-1-one Chemical compound CC(C)C1=CC=C(C(=O)C(C)(C)O)C=C1 QPXVRLXJHPTCPW-UHFFFAOYSA-N 0.000 description 1
- RTFWHSONHLXREP-UHFFFAOYSA-N 2-hydroxy-2-phenyl-1-(2-propan-2-yloxyphenyl)ethanone Chemical compound CC(C)OC1=CC=CC=C1C(=O)C(O)C1=CC=CC=C1 RTFWHSONHLXREP-UHFFFAOYSA-N 0.000 description 1
- OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical compound OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 description 1
- LWRBVKNFOYUCNP-UHFFFAOYSA-N 2-methyl-1-(4-methylsulfanylphenyl)-2-morpholin-4-ylpropan-1-one Chemical compound C1=CC(SC)=CC=C1C(=O)C(C)(C)N1CCOCC1 LWRBVKNFOYUCNP-UHFFFAOYSA-N 0.000 description 1
- VNJOEUSYAMPBAK-UHFFFAOYSA-N 2-methylbenzenesulfonic acid;hydrate Chemical compound O.CC1=CC=CC=C1S(O)(=O)=O VNJOEUSYAMPBAK-UHFFFAOYSA-N 0.000 description 1
- OELQSSWXRGADDE-UHFFFAOYSA-N 2-methylprop-2-eneperoxoic acid Chemical compound CC(=C)C(=O)OO OELQSSWXRGADDE-UHFFFAOYSA-N 0.000 description 1
- UPTHZKIDNHJFKQ-UHFFFAOYSA-N 2-methylprop-2-enoic acid;propane-1,2,3-triol Chemical compound CC(=C)C(O)=O.CC(=C)C(O)=O.OCC(O)CO UPTHZKIDNHJFKQ-UHFFFAOYSA-N 0.000 description 1
- RSEBUVRVKCANEP-UHFFFAOYSA-N 2-pyrroline Chemical compound C1CC=CN1 RSEBUVRVKCANEP-UHFFFAOYSA-N 0.000 description 1
- PYSRRFNXTXNWCD-UHFFFAOYSA-N 3-(2-phenylethenyl)furan-2,5-dione Chemical compound O=C1OC(=O)C(C=CC=2C=CC=CC=2)=C1 PYSRRFNXTXNWCD-UHFFFAOYSA-N 0.000 description 1
- JVQIKJMSUIMUDI-UHFFFAOYSA-N 3-pyrroline Chemical compound C1NCC=C1 JVQIKJMSUIMUDI-UHFFFAOYSA-N 0.000 description 1
- OKISUZLXOYGIFP-UHFFFAOYSA-N 4,4'-dichlorobenzophenone Chemical compound C1=CC(Cl)=CC=C1C(=O)C1=CC=C(Cl)C=C1 OKISUZLXOYGIFP-UHFFFAOYSA-N 0.000 description 1
- XOJWAAUYNWGQAU-UHFFFAOYSA-N 4-(2-methylprop-2-enoyloxy)butyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCCCOC(=O)C(C)=C XOJWAAUYNWGQAU-UHFFFAOYSA-N 0.000 description 1
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Landscapes
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Description
本發明係關於一種含酯基或醯胺基之三元共聚物,該三元共聚物係由苯乙烯系單體、環狀不飽和酸酐單體及丙烯酸酯系單體所組成,而且於側鏈上帶有羧酸基、酯基或醯胺基等官能基團。本發明亦關於該共聚物之製備方法及其用途,尤其係用於鹼溶性負型光阻之樹脂組合物。 The present invention relates to a terpolymer containing an ester group or a guanamine group, which is composed of a styrene monomer, a cyclic unsaturated acid anhydride monomer and an acrylate monomer, and is on the side. The chain carries a functional group such as a carboxylic acid group, an ester group or a guanamine group. The present invention also relates to a process for the preparation of the copolymer and its use, and in particular to a resin composition for an alkali-soluble negative photoresist.
於印刷電路板領域中,已知可使用具有優異性質之感光性樹脂組合物作為光阻劑。光阻劑依據顯影過程中曝光區域可被移除或保留而分為正型光阻與負型光阻。負型光阻相較於正型光阻對於多種基材,例如半導體基材(矽、砷化鎵、磷化銦等)與金屬(例如金、銅、鋁等),展現較佳的黏著力,且較為耐酸性。其原料相較於正型光阻成本亦較低。 In the field of printed circuit boards, it is known that a photosensitive resin composition having excellent properties can be used as a photoresist. The photoresist is classified into a positive photoresist and a negative photoresist depending on whether the exposed region can be removed or retained during development. Negative photoresist exhibits better adhesion to a variety of substrates, such as semiconductor substrates (germanium, gallium arsenide, indium phosphide, etc.) and metals (such as gold, copper, aluminum, etc.) than positive photoresists. And more resistant to acid. Its raw materials are also less expensive than positive photoresists.
苯乙烯和馬來酸酐單酯的共聚物是一種常用於印刷電路板的感光性樹脂,近年來對其的研究相當廣泛,其製作方法為,先將苯乙烯和馬來酸酐以自由基聚合方式共聚合,接著,以飽合或不飽合的醇類來使共聚物上的馬來酸酐基單酯化。 A copolymer of styrene and maleic anhydride monoester is a photosensitive resin commonly used in printed circuit boards. In recent years, it has been studied extensively by first-stage polymerization of styrene and maleic anhydride. Copolymerization, followed by monoesterification of the maleic anhydride group on the copolymer with saturated or unsaturated alcohols.
CN1114629C揭示一種含不飽合鍵支鏈的感光性共聚物,主鏈由不含酸酐基之含不飽和鍵單體與含不飽和鍵之酸酐單體所組成,支鏈為酸酐官能基團與含不飽和鍵的醇類進行單酯化開環,而開環的羧酸基與環氧乙基化合物反應產生酯基。CN1114629C只限於支鏈上進行改質,對於樹脂物性可調整的程度有限。 CN1114629C discloses a photosensitive copolymer containing unsaturated bond branches, the main chain is composed of an unsaturated bond-containing monomer containing no acid anhydride group and an unsaturated bond-containing acid anhydride monomer, and the branched chain is an acid anhydride functional group and The alcohol of the unsaturated bond undergoes a monoesterification ring opening, and the ring-opened carboxylic acid group reacts with the epoxy ethyl compound to produce an ester group. CN1114629C is limited to the modification on the branch, and the degree of adjustment of the physical properties of the resin is limited.
TW450980B揭示一種含醯胺基改質的苯乙烯-馬來酸酐共聚物,由苯乙烯-馬來酸酐所構成的主鏈,其酸酐部分與二級胺進行開環反應,再將此中間產物與丙烯酸酯反應,以形成帶有醯胺基與酸基的側鏈。 TW450980B discloses a ruthenium-amine-modified styrene-maleic anhydride copolymer, a main chain composed of styrene-maleic anhydride, an acid anhydride moiety thereof and a ring-opening reaction with a secondary amine, and the intermediate product is The acrylate reacts to form a side chain having a guanamine group and an acid group.
CN 104017128A揭示一種馬來酸酐開環改質分支低聚物製備的鹼溶性光敏樹脂,該低聚物為四元共聚物,單體為甲基丙烯酸、甲基丙烯酸苄基酯、馬來酸酐及對乙烯基苄硫醇,並以丙烯酸羥乙酯使共聚物中之馬來酸酐開環。CN104017128A所使用的對乙烯基苄硫醇穩定性不強,35℃以上易變質,又有難聞氣味,所以在實際應用上受到限制。 CN 104017128A discloses an alkali-soluble photosensitive resin prepared by using a maleic anhydride ring-opening modified branched oligomer, wherein the oligomer is a tetrapolymer, and the monomer is methacrylic acid, benzyl methacrylate, maleic anhydride and The p-vinylbenzyl mercaptan was opened with maleic anhydride in the copolymer as hydroxyethyl acrylate. The para-vinylbenzyl mercaptan used in CN104017128A is not stable, and is easily deteriorated at 35 ° C or higher, and has an unpleasant odor, so it is limited in practical application.
為改善解析度及細線附著度,一種方法為使用含有易以熱解聚合之共聚物與無機粉光敏漿料,US 6103452A揭示一種光敏組合物,其包含(A)含羧基之光敏聚合物,該聚合物由(a)含不飽和雙鍵之酸酐及(b)含不飽和雙鍵化合物之共聚物與(c)含羥基不飽和雙鍵之化合物的反應而製成;(B)稀釋劑;(C)光聚合起始劑;(D)無機粉及(E)安定劑,亦即聚合物主鏈係由含不飽和雙鍵之酸酐(例如馬來酸酐)與含不飽和雙鍵化合物(例如苯乙烯)所形成。 In order to improve the resolution and fine line adhesion, one method is to use a copolymer containing a copolymer which is easily pyrolyzable and an inorganic powder photosensitive paste, and US Pat. No. 6,103,452 A discloses a photosensitive composition comprising (A) a carboxyl group-containing photopolymer. The polymer is prepared by reacting (a) an acid anhydride containing an unsaturated double bond and (b) a copolymer containing an unsaturated double bond compound with (c) a compound having a hydroxyl group-unsaturated double bond; (B) a diluent; (C) photopolymerization initiator; (D) inorganic powder and (E) stabilizer, that is, the polymer backbone is composed of an anhydride containing an unsaturated double bond (for example, maleic anhydride) and an unsaturated double bond-containing compound ( For example, styrene) is formed.
前述文件均未提及細線附著度與顯影解析度。據此,本領域仍需要在保有細線附著度與顯影解析度之同時,仍具備去膜速度快且具有極佳化學耐性(例如耐酸能力)之光阻劑組合物。 None of the foregoing documents mentions fine line adhesion and development resolution. Accordingly, there is still a need in the art for a photoresist composition which has a fast film removal speed and excellent chemical resistance (e.g., acid resistance) while maintaining fine line adhesion and development resolution.
本發明係提供一種含酯基或醯胺基之三元共聚物,該三元共聚物係由苯乙烯系單體、環狀不飽和酸酐單體及丙烯酸酯系單體所組成之苯乙烯-酸酐-丙烯酸酯共聚物,而且於側鏈上帶有羧酸基、酯基或醯胺基等官能基團。 The present invention provides a terpolymer containing an ester group or a guanamine group, which is a styrene composed of a styrene monomer, a cyclic unsaturated acid anhydride monomer, and an acrylate monomer. An acid anhydride-acrylate copolymer having a functional group such as a carboxylic acid group, an ester group or a guanamine group in the side chain.
根據本發明之內容,樹脂的物性除了藉由將聚合物主鏈之環狀酸酐部分開環而形成側鏈上之官能基團來調整以外,在共聚物主鏈引入之第三單體丙烯酸酯系單體亦可調整樹脂之物性。此外,丙烯酸酯系單體可選擇性地包含選自羥基、鹵基、烷基、環氧基、芳基及其組合之官能基,且使用該等第三單體可提供應用層面更廣泛的樹脂改質方法。 According to the present invention, the physical properties of the resin are adjusted in addition to the functional groups on the side chain by ring-opening the cyclic anhydride portion of the polymer backbone, and the third monomer acrylate introduced in the copolymer backbone. The monomer can also adjust the physical properties of the resin. Further, the acrylate monomer may optionally contain a functional group selected from the group consisting of a hydroxyl group, a halogen group, an alkyl group, an epoxy group, an aryl group, and a combination thereof, and the use of the third monomer may provide a wider application level. Resin upgrading method.
例如,本發明應用於鹼溶性光阻時,可提供較佳之成膜性與耐酸性,並在呈現極佳解析度及細線附著度之同時,亦保有不錯的耐酸特性。 For example, when applied to an alkali-soluble photoresist, the present invention provides better film formation and acid resistance, and exhibits excellent acid resistance while exhibiting excellent resolution and fine line adhesion.
本發明所使用之苯乙烯系單體為包含苯乙烯部分之單體,例如可為苯乙烯或α-甲基苯乙烯,其中苯環部分可選擇性地經取代基取代。取代基包含但不限於鹵素、C1-6直鏈或支鏈烷基。在製備本發明之苯乙烯-酸酐-丙烯酸酯共聚物時,苯乙烯系單體之用量為20至65莫耳%,較佳為30至55莫耳,最佳為35至45莫耳%。 The styrene-based monomer used in the present invention is a monomer containing a styrene moiety, and may be, for example, styrene or α-methylstyrene, wherein the benzene ring moiety may be optionally substituted with a substituent. Substituents include, but are not limited to, halogen, C1-6 straight or branched alkyl. In the preparation of the styrene-anhydride-acrylate copolymer of the present invention, the styrene monomer is used in an amount of 20 to 65 mol%, preferably 30 to 55 mol, and most preferably 35 to 45 mol%.
本發明所使用之環狀不飽和酸酐單體由不飽和二或多羧酸經由內部縮合反應形成,實例為馬來酸酐、檸康酸酐、衣康酸酐、順烏頭酸酐、反烏頭酸酐、戊烯二酸酐、黏康酸酐(2,4-己二烯酸酐;亦稱2,7-呯二酮)等。在製備本發明之苯乙烯-酸酐-丙烯酸酯共聚物時,不飽和酸酐單體之用量為20至50莫耳%,較佳為20至40莫耳%,最佳為30至40莫耳%。 The cyclic unsaturated acid anhydride monomer used in the present invention is formed by an internal condensation reaction of an unsaturated di- or polycarboxylic acid, and examples thereof are maleic anhydride, citraconic anhydride, itaconic anhydride, cis-aconitic anhydride, trans-aconitic anhydride, pentene. Diacid anhydride, viscous anhydride (2,4-hexadiene anhydride; also known as 2,7- Anthraquinone) and the like. In the preparation of the styrene-anhydride-acrylate copolymer of the present invention, the unsaturated acid anhydride monomer is used in an amount of 20 to 50 mol%, preferably 20 to 40 mol%, most preferably 30 to 40 mol%. .
本發明所使用之丙烯酸酯系單體係包含丙烯酸部分之單體,該等單體可選擇性地於丙烯酸部分及/或酯基部分包含選自羥基、鹵 素、烷基、環氧基、芳基及其組合之官能基。丙烯酸酯系單體可為例如(但不限於)丙烯酸酯、甲基丙烯酸酯、丙烯酸羥基酯與甲基丙烯酸羥基酯等;其酯類部分可由C1-12烷醇形成,較佳由C4-6烷醇形成;烷醇之烷基部分可經選自羥基、鹵基、烷基、環氧基、芳基及其組合之官能基取代。丙烯酸酯系單體實例包括但不限於丙烯酸C1-6烷基酯、甲基丙烯酸C1-6烷基酯、丙烯酸羥基C1-6烷基酯及甲基丙烯酸羥基C1-6烷基酯。在製備本發明之苯乙烯-酸酐-丙烯酸酯共聚物時,丙烯酸酯系單體之用量為5至50莫耳%,較佳為15至40莫耳%,最佳為25至35莫耳%。 The acrylate-based single system used in the present invention comprises a monomer of an acrylic moiety, which may optionally comprise a hydroxyl group, a halogen, an alkyl group, an epoxy group, and an aromatic moiety in the acrylic moiety and/or the ester moiety. The functional groups of the base and its combination. The acrylate monomer may be, for example, but not limited to, an acrylate, a methacrylate, a hydroxy acrylate, a hydroxy methacrylate or the like; and an ester moiety thereof may be formed from a C 1-12 alkanol, preferably C 4 The -6 alkanol is formed; the alkyl portion of the alkanol may be substituted with a functional group selected from the group consisting of a hydroxyl group, a halogen group, an alkyl group, an epoxy group, an aryl group, and a combination thereof. Examples of acrylate monomers include, but are not limited to acrylic acid C 1-6 alkyl methacrylate, C 1-6 alkyl acrylates, hydroxy C 1-6 alkyl esters of methacrylic acid and hydroxy-C 1-6 alkyl ester. In the preparation of the styrene-anhydride-acrylate copolymer of the present invention, the acrylate monomer is used in an amount of 5 to 50 mol%, preferably 15 to 40 mol%, most preferably 25 to 35 mol%. .
本發明所提供之苯乙烯-酸酐-丙烯酸酯共聚物,藉由使酸酐部分至少一部份進行開環反應,而形成帶有官能基團之側鏈。該官能基團可為羧酸基、酯基、醯胺基等基團。 The styrene-anhydride-acrylate copolymer provided by the present invention forms a side chain having a functional group by subjecting at least a part of the acid anhydride moiety to ring-opening reaction. The functional group may be a group such as a carboxylic acid group, an ester group, or a decylamino group.
本發明所提供之苯乙烯-酸酐-丙烯酸酯共聚物之酸酐部分至少50莫耳%進行開環反應,例如至少60莫耳%、至少70莫耳%、至少80莫耳%、至少90莫耳%、較佳至少95莫耳%、更佳至少98莫耳%進行開環反應。 The at least 50 mole % of the anhydride portion of the styrene-anhydride-acrylate copolymer provided by the present invention is subjected to a ring opening reaction, such as at least 60 mole %, at least 70 mole %, at least 80 mole %, at least 90 moles The ring opening reaction is carried out at %, preferably at least 95 mol%, more preferably at least 98 mol%.
側鏈上之羧酸基可來自經開環之酸酐部分,例如為馬來羧酸基、檸康羧酸基、衣康羧酸基、順烏頭羧酸基、反烏頭羧酸基、戊烯二酸基、黏康酸基等。 The carboxylic acid group on the side chain may be derived from a ring-opened anhydride moiety such as a maleic carboxylic acid group, a citraconic acid group, a itaconin carboxylic acid group, a sulphonic acid group, an aconitine carboxylic acid group, a pentene group. Diacid groups, mukic acid groups, and the like.
側鏈上之酯基可由烷醇類或含不飽和鍵的醇類與酸酐部分進行開環反應而形成。烷醇類或含不飽和鍵的醇類可具有1至6個碳原子,碳鏈部分可為直鏈,例如(但不限於)為甲醇、乙醇、丙醇、異丙醇、丁醇、己醇、乙二醇、丙二醇、烯丙醇等;或碳鏈部分可包含支鏈,例如(但不限於)第三丁醇、異丁醇、3-甲基-2-烯-1-丁醇等。較佳為甲醇。 The ester group on the side chain can be formed by ring-opening reaction of an alkanol or an unsaturated bond-containing alcohol with an acid anhydride moiety. The alkanols or alcohols containing unsaturated bonds may have from 1 to 6 carbon atoms, and the carbon chain moieties may be linear, such as, but not limited to, methanol, ethanol, propanol, isopropanol, butanol, Alcohol, ethylene glycol, propylene glycol, allyl alcohol, etc.; or the carbon chain moiety may comprise a branch, such as, but not limited to, a third butanol, an isobutanol, a 3-methyl-2-ene-1-butanol Wait. Methanol is preferred.
側鏈上之醯胺基可由二級胺類與酸酐部分進行開環反應而形 成。二級胺可由以下式(I)表示之:NR1R2R3 (I) The guanamine group on the side chain can be formed by ring-opening reaction of a secondary amine with an acid anhydride moiety. The secondary amine can be represented by the following formula (I): NR 1 R 2 R 3 (I)
其中R1、R2及R3彼此獨立地為氫或C1-6烷基,其中烷基之-CH2-基團可選擇性地經N、O或S置換;或其中兩者與N原子形成五員或六員飽和或不飽和雜環,該五員或六員飽和或不飽和雜環含有一個氮原子(即通式中之N)及選擇性的額外的一或多個選自N、O及S之雜原子作為環成員;前提為R1、R2及R3其中一者為氫而另外兩者不為氫。實例包括(但不限於)二乙胺、二丙胺、甲基乙胺、甲基丙胺、二丁胺、乙基丙胺、二戊胺、二己胺、乙基丁胺、吡咯啶、2或3-吡咯啉、吡咯、吡咯烷、吡唑、咪唑、咪唑啶、吡唑啶、吡唑啉、哌啶、哌、六氫吡啶、六氫吡及嗎福林等。較佳為二乙胺、二丙胺與二丁胺。 Wherein R 1 , R 2 and R 3 are, independently of each other, hydrogen or C 1-6 alkyl, wherein the -CH 2 - group of the alkyl group is optionally substituted by N, O or S; or both The atom forms a five or six member saturated or unsaturated heterocyclic ring, and the five or six member saturated or unsaturated heterocyclic ring contains a nitrogen atom (i.e., N in the formula) and an additional one or more selected from the group consisting of The heteroatoms of N, O and S are members of the ring; provided that one of R 1 , R 2 and R 3 is hydrogen and the other two are not hydrogen. Examples include, but are not limited to, diethylamine, dipropylamine, methylethylamine, methylpropylamine, dibutylamine, ethylpropylamine, diamylamine, dihexylamine, ethylbutylamine, pyrrolidine, 2 or 3 -pyrroline,pyrrole,pyrrolidine,pyrazole,imidazole,imidazidine,pyrazolidine,pyrazoline,piperidine,piperidin Hexahydropyridine, hexahydropyridyl And ifolin and so on. Preferred are diethylamine, dipropylamine and dibutylamine.
本發明亦提供製備含酯基之苯乙烯-酸酐-丙烯酸酯共聚物之方法,該方法包含以下步驟:(1)使苯乙烯系單體、環狀酸酐單體與丙烯酸酯系單體進行自由基聚合反應獲得未經開環之苯乙烯-酸酐-丙烯酸酯共聚物;(2)使步驟(1)所獲得之未經開環之苯乙烯-酸酐-丙烯酸酯共聚物與烷醇類、含不飽和鍵的醇類及二級胺類之至少一者進行該開環反應。 The present invention also provides a process for preparing an ester group-containing styrene-anhydride-acrylate copolymer, which comprises the steps of: (1) freeing a styrene monomer, a cyclic anhydride monomer, and an acrylate monomer; The base polymerization reaction obtains an unopened styrene-anhydride-acrylate copolymer; (2) the unopened styrene-anhydride-acrylate copolymer obtained in the step (1) and an alkanol, At least one of an unsaturated bond alcohol and a secondary amine performs the ring opening reaction.
該製造方法所述之苯乙烯系單體、環狀酸酐單體、丙烯酸酯系單體、烷醇類、含不飽和鍵的醇類及二級胺類係如前所敘明者。 The styrene monomer, the cyclic anhydride monomer, the acrylate monomer, the alkanol, the unsaturated bond-containing alcohol, and the secondary amine described in the production method are as described above.
步驟(1)中,聚合反應為自由基聚合反應。反應係在極性溶劑中進行,溶劑例如丙酮、丁酮、二亞甲碸及四氫呋喃等。反應溫度為70至110℃,較佳為95℃。反應時間為6至12小時,較佳為8小時。起始劑可為(1)有機過氧化物,例如過氧化二苯甲醯、過氧化二異丙苯、 二(第三丁基)過氧化物、過氧化十二醯、過氧化苯甲酸第三丁酯、過氧化二碳酸二異丙基酯、過氧化二碳酸二環己酯等;(2)偶氮化合物,例如偶氮二異丁腈、偶氮二異庚腈等。 In the step (1), the polymerization reaction is a radical polymerization reaction. The reaction is carried out in a polar solvent such as acetone, methyl ethyl ketone, methylene hydrazine or tetrahydrofuran. The reaction temperature is 70 to 110 ° C, preferably 95 ° C. The reaction time is 6 to 12 hours, preferably 8 hours. The initiator may be (1) an organic peroxide such as dibenzoyl peroxide or dicumyl peroxide. Di(t-butyl) peroxide, dodecyl peroxide, tert-butyl peroxybenzoate, diisopropyl peroxydicarbonate, dicyclohexyl peroxydicarbonate, etc.; (2) A nitrogen compound such as azobisisobutyronitrile or azobisisoheptanenitrile.
步驟(2)中,開環反應係在極性溶劑中進行,溶劑較佳為丙酮、丁酮、二亞甲碸及四氫呋喃。反應溫度為70至100℃,較佳為90℃。反應時間為2至8小時,較佳為4至6小時。可單獨或同時使用醇類與二級胺類進行開環反應。 In the step (2), the ring-opening reaction is carried out in a polar solvent, and the solvent is preferably acetone, methyl ethyl ketone, methylene hydrazine or tetrahydrofuran. The reaction temperature is 70 to 100 ° C, preferably 90 ° C. The reaction time is 2 to 8 hours, preferably 4 to 6 hours. The ring-opening reaction can be carried out using an alcohol and a secondary amine separately or simultaneously.
本發明亦提供一種感光性樹脂組合物,其包含(a)至少一種本發明之苯乙烯-酸酐-丙烯酸酯共聚物,(b)光聚合起始劑,(c)光聚合單體,(d)溶劑及(e)選擇性的添加劑。樹脂組合物可選擇性地包含一般習知之樹脂,例如(1)甲基丙烯酸-甲基丙烯酸甲酯共聚物,(2)苯乙烯和馬來酸酐單酯共聚物,(3)含羧酸基環氧壓克力樹脂,及其類似物。 The present invention also provides a photosensitive resin composition comprising (a) at least one styrene-anhydride-acrylate copolymer of the present invention, (b) a photopolymerization initiator, (c) a photopolymerizable monomer, (d) a solvent and (e) a selective additive. The resin composition may optionally comprise a conventionally known resin such as (1) a methacrylic acid-methyl methacrylate copolymer, (2) a styrene and maleic anhydride monoester copolymer, and (3) a carboxylic acid group. Epoxy acrylic resin, and the like.
本發明所提供之感光性樹脂組合物中,組份(a)苯乙烯-酸酐-丙烯酸酯共聚物之含量為10至70重量%,較佳為30至50重量%。 In the photosensitive resin composition of the present invention, the content of the component (a) styrene-anhydride-acrylate copolymer is from 10 to 70% by weight, preferably from 30 to 50% by weight.
本發明所提供之感光性樹脂組合物中,所使用之組份(b)光聚合起始劑經由吸收光能後形成自由基型態,提供光反應單體聚合所需的自由基。實例為2,2'-雙(2-氯苯基)-4,4'-5,5'-四苯基雙咪唑、1-羥基環己基苯基酮、2,2-二甲氧基-1,2-二苯基乙基-1-酮(2,2-dimethoxy-1,2-diphenylethan-1-one)、2-甲基-1-[4-(甲硫基)苯基]-2-N-嗎啉基丙-1-酮(2-methyl-1-[4-(methylthio)phenyl]-2-morpholino propan-1-one)、2-苯甲基-2-二甲基胺基-1-[4-N-嗎啉基苯基]丁-1-酮(2-benzyl-2-dimethylamino-1-[4-morpholinopheyl]butan-1-one)、2-羥基-2-甲基-1-苯基丙-1-酮(2-hydroxy-2-methyl-1-phenyl propan-1-one)、2,4,6-三甲基苯甲醯基二苯基氧化膦(2,4,6-trimethyl benzoyl diphenyl phosphine oxide)、1-[4-(2-羥基甲氧基)苯基]-2-羥基-2-甲基丙-1-酮(1-[4-(2- hydroxymethoxy)phenyl]-2-hydroxy-2-methyl propan-1-one)、2,4-二乙基硫雜蒽酮(2,4-diethylthioxanetone)、2-氯硫雜蒽酮(2-chlorothioxantone)、2,4-二甲基硫雜蒽酮(2,4-dimethylthioxantone)、3,3-二甲基-4-甲氧基苯甲酮、苯基酮、1-氯-4-丙氧基硫雜蒽酮、1-(4-異丙基苯基)-2-羥基-2-甲基丙-1-酮(1-(4-isopropyl phenyl)-2-hydroxy-2-methyl propan-1-one)、(1-(4-十二烷基苯基)-2-羥基-2-甲基丙-1-酮(1-(4-dodecyl phenyl)-2-hydroxy-2-methyl propan-1-one)、4-苯甲醯基-4'-甲基二甲硫醚(4-benzoyl-4'-methyl dimethylsulfide)、4-二甲胺基苯甲酸、4-(二甲基胺基)苯甲酸甲酯、4-(二甲基胺基)苯甲酸乙酯、4-(二甲基胺基)苯甲酸丁酯、4-二甲基胺基苯甲酸-2-乙基己酯、4-二甲基胺基苯甲酸-2-異戊酯、2,2-二乙氧基苯乙酮、苄基酮二甲縮醛(benzyl ketone dimethyl acetal)、苄基酮β-甲氧基二乙縮醛(benzyl ketone β-diethyl acetal)、1-苯基-1,2-丙基二肟-o,o'-(2-羰基)乙氧基醚(1-phenyl-1,2-propyl dioxime-o,o'-(2-carbonyl)ethoxyether)、鄰苯甲醯苯甲酸甲酯、雙(4-二甲基胺基苯基)酮(bis(4-dimethyl amino phenyl)ketone)、4,4'-雙(二乙基胺基)苯甲酮、4,4'-二氯苯甲酮、苯甲基(benzyl)、安息香、甲氧基安息香、乙氧基安息香、異丙氧基安息香、正丁氧基安息香、異丁氧基安息香、第三丁氧基安息香、對二甲基胺基苯乙酮、對第三丁基三氯苯乙酮、對第三丁基二氯苯乙酮、硫雜蒽酮、2-甲基硫雜蒽酮、2-異丙基硫雜蒽酮、二苯并環庚酮、a,a-二氯-4-苯氧基苯乙酮、戊基-4-二甲胺基苯甲酸酯。較佳為2-甲基-1-[(4-甲硫基苯基)]-2-(4-N-嗎啉基)-1-丙酮與2-異丙基硫雜蒽酮。其含量為0.01至10重量%,較佳為0.5至5重量%。 In the photosensitive resin composition provided by the present invention, the component (b) photopolymerization initiator used forms a radical form by absorbing light energy, and provides a radical required for polymerization of the photoreactive monomer. Examples are 2,2'-bis(2-chlorophenyl)-4,4'-5,5'-tetraphenylbisimidazole, 1-hydroxycyclohexyl phenyl ketone, 2,2-dimethoxy- 1,2-diphenylethyl-1-one, 2,2-dimethoxy-1,2-diphenylethan-1-one, 2-methyl-1-[4-(methylthio)phenyl]- 2- N - morpholino-propan-1-one (2-methyl-1- [4- (methylthio) phenyl] -2-morpholino propan-1-one), 2- benzyl-2-dimethylamine group -1- [4- N - morpholinyl phenyl] butan-1-one (2-benzyl-2-dimethylamino -1- [4-morpholinopheyl] butan-1-one), 2- hydroxy-2- 2-hydroxy-2-methyl-1-phenyl propan-1-one, 2,4,6-trimethylbenzimidyldiphenylphosphine oxide (2 ,4,6-trimethyl benzoyl diphenyl phosphine oxide), 1-[4-(2-hydroxymethoxy)phenyl]-2-hydroxy-2-methylpropan-1-one (1-[4-(2) - hydroxymethoxy)phenyl]-2-hydroxy-2-methyl propan-1-one), 2,4-diethylthioxanetone, 2-chlorothioxantone ), 2,4-dimethylthioxantone, 3,3-dimethyl-4-methoxybenzophenone, phenyl ketone, 1-chloro-4-propoxy Thiopinone, 1-(4-isopropylphenyl)-2-hydroxy-2-methylpropan-1- (1-(4-isopropyl phenyl)-2-hydroxy-2-methyl propan-1-one), (1-(4-dodecylphenyl)-2-hydroxy-2-methylpropan-1- Ketone (1-(4-dodecyl phenyl)-2-hydroxy-2-methyl propan-1-one), 4-benzylidene-4'-methyldimethyl sulfide (4-benzoyl-4'-methyl Dimethylsulfide), 4-dimethylaminobenzoic acid, methyl 4-(dimethylamino)benzoate, ethyl 4-(dimethylamino)benzoate, 4-(dimethylamino)benzene Butyl formate, 2-ethylhexyl 4-methylhexyl benzoate, 2-isoamyl 4-dimethylaminobenzoate, 2,2-diethoxyacetophenone, benzyl ketone dimethyl acetal (benzyl ketone dimethyl acetal), benzyl ketone β - methoxy diethyl acetal (benzyl ketone β-diethyl acetal) , 1- phenyl-1,2-propyl dioxime -o, O'-(2-carbonyl)ethoxy ether (1-phenyl-1,2-propyl dioxime-o,o'-(2-carbonyl)ethoxyether), o-benzidine benzoic acid methyl ester, double (4- Bis(4-dimethylamino phenyl)ketone, 4,4'-bis(diethylamino)benzophenone, 4,4'-dichlorobenzophenone, benzene Benzyl, benzoin, methoxybenzoin, ethoxybenzoin, isopropoxy benzoin, n-butyl Kean, isobutoxybenzoin, tert-butoxybenzoin, p-dimethylaminoacetophenone, p-tert-butyltrichloroacetophenone, p-tert-butyldichloroacetophenone, thia Anthrone, 2-methylthiazepinone, 2-isopropylthioxanthone, dibenzocycloheptanone, a, a-dichloro-4-phenoxyacetophenone, pentyl-4- Dimethylaminobenzoate. Preferred is 2-methyl-1-[(4-methylthiophenyl)]-2-(4- N -morpholinyl)-1-propanone and 2-isopropylthioxanthone. The content is from 0.01 to 10% by weight, preferably from 0.5 to 5% by weight.
本發明所提供之感光性樹脂組合物中,所使用之組份(c)光聚合單體為含不飽和雙鍵的單體,其曝光時進行自由基鏈聚合反應。實例為多官能基的(甲基)丙酸酯單體,例如三伸丙二醇二丙烯酸酯 (tripropylene glycol diacrylate)、乙二醇二甲基丙烯酸酯(ethylene glycol dimethacrylate)、二乙二醇二甲基丙烯酸酯(diethylene glycol dimethacrylate)、四甘醇二甲基丙烯酸酯(tetraethylene glycol dimethacrylate)、丙二醇二甲基丙烯酸酯(propylene glycol dimethacrylate)、聚丙二醇二甲基丙烯酸酯(polypropylene glycol dimethacrylate)、丁二醇二甲基丙烯酸酯(butylene glycol dimethacrylate)、新戊二醇二甲基丙烯酸酯(neopentyl glycol dimethacrylate)、1,6-己二醇二甲基丙烯酸酯(1,6-hexane glycol dimethacrylate)、三羥甲基丙烷三甲基丙烯酸酯(trimethyolpropane trimethacrylate)、三羥甲基丙烷三丙烯酸酯(trimethyolpropane triacrylate)、新戊四醇三丙烯酸酯(pentaerythritol triacrylate)、新戊四醇四丙烯酸酯(pentaerythritol teraacrylate)、丙三醇二甲基丙烯酸酯(glycerin dimethacrylate)、新戊四醇二甲基丙烯酸酯(pentaerythritol dimethacrylate)、新戊四醇三甲基丙烯酸酯(pentaerythritol trimethacrylate)、二新戊四醇五甲基丙烯酸酯(dipentaerythritol pentamethacrylate)、2,2-雙(4-甲基丙烯醯氧基二乙氧基苯基)丙烷(2,2-bis(4-methacryloxydiethoxyphenyl)propane)、三羥甲基丙烷三丙烯酸酯(trimethylolpropane triacrylate)、乙氧化三羥甲基丙烷三丙烯酸酯(ethoxylated trimethylolpropane triacrylate)、乙氧基化雙酚A二丙烯酸酯(ethoxylated bisphenol A diacrylate)、乙氧基化雙酚A二甲基丙烯酸酯(ethoxylated bisphenol A dimethacrylate)、2,2-雙(4-甲基丙烯醯氧基聚乙氧基苯基)丙烷(2,2-bis(4-methacryloxypolyethoxyphenyl)propane)、2-羥基-3-甲基丙烯醯氧丙基甲基丙烯酸酯(2-hydroxy-3-methacryloyloxypropyl methacrylate)、含有多官能之聚胺酯丙烯酸酯等。較佳為三及四官能(甲基)丙烯酸酯單體。光聚合單體含量為1至20重量%,較佳為5至15重量%。 In the photosensitive resin composition provided by the present invention, the component (c) used as a photopolymerizable monomer is a monomer having an unsaturated double bond, and undergoes radical chain polymerization upon exposure. Examples are polyfunctional (meth)propionate monomers such as tri-propylene glycol diacrylate (tripropylene glycol diacrylate), ethylene glycol dimethacrylate, diethylene glycol dimethacrylate, tetraethylene glycol dimethacrylate, propylene glycol Propylene glycol dimethacrylate, polypropylene glycol dimethacrylate, butylene glycol dimethacrylate, neopentyl glycol dimethacrylate (neopentyl glycol) Dimethacrylate), 1,6-hexane glycol dimethacrylate, trimethyolpropane trimethacrylate, trimethyolpropane Triacrylate), pentaerythritol triacrylate, pentaerythritol teraacrylate, glycerin dimethacrylate, neopentyl alcohol dimethacrylate Pentaerythritol dimethacrylate), pentaerythritol trimethacrylate Pentaerythritol trimethacrylate, dipentaerythritol pentamethacrylate, 2,2-bis(4-methylpropenyloxydiethoxyphenyl)propane (2,2-bis (4-methacryloxydiethoxyphenyl)propane), trimethylolpropane triacrylate, ethoxylated trimethylolpropane triacrylate, ethoxylated bisphenol A diacrylate), ethoxylated bisphenol A dimethacrylate, 2,2-bis(4-methylpropenyloxypolyethoxyphenyl)propane (2,2- Bis(4-methacryloxypolyethoxyphenyl)propane), 2-hydroxy-3-methacryloyloxypropyl methacrylate, polyfunctional polyurethane acrylate, and the like. Preferred are tri- and tetra-functional (meth) acrylate monomers. The photopolymerizable monomer content is from 1 to 20% by weight, preferably from 5 to 15% by weight.
本發明所提供之感光性樹脂組合物中,所使用之(d)溶劑可為極性溶劑,例如丙酮、丁酮、四氫呋喃及單甲基醚丙二醇醋酸酯;或可為非極性溶劑,例如甲苯。組合物中所含之溶劑較佳為單甲基醚丙二醇醋酸酯。溶劑含量係根據光聚合起始劑、鹼性顯像黏合劑、光聚合單體與選擇性添加劑的含量來調整。 In the photosensitive resin composition provided by the present invention, the (d) solvent used may be a polar solvent such as acetone, methyl ethyl ketone, tetrahydrofuran or monomethyl ether propylene glycol acetate; or may be a nonpolar solvent such as toluene. The solvent contained in the composition is preferably monomethyl ether propylene glycol acetate. The solvent content is adjusted depending on the content of the photopolymerization initiator, the basic development binder, the photopolymerizable monomer, and the selective additive.
可選擇性地添加不損害本發明感光性樹脂組合物性質之(e)添加劑。添加劑可為增塑劑,例如鄰苯二甲酸酯類,舉例而言包含但不限於鄰苯二甲酸二丁酯、鄰苯二甲酸二庚酯、鄰苯二甲酸二辛酯、鄰苯二甲酸二烯丙酯等;乙二醇酯類,包含但不限於三甘醇二乙酸酯、四乙二醇二乙酸酯等;醯胺類,包含但不限於對甲苯磺醯胺、苯磺醯胺、正丁基苯磺醯胺等;以及磷酸三苯酯等。 The (e) additive which does not impair the properties of the photosensitive resin composition of the present invention can be selectively added. The additive may be a plasticizer such as a phthalate, including, but not limited to, dibutyl phthalate, diheptyl phthalate, dioctyl phthalate, phthalic acid. Diallyl ester or the like; ethylene glycol esters, including but not limited to triethylene glycol diacetate, tetraethylene glycol diacetate, etc.; guanamines, including but not limited to p-toluenesulfonamide, benzenesulfonate Indoleamine, n-butylbenzenesulfonamide, etc.; and triphenyl phosphate.
添加劑亦可為著色物質,例如甲苯磺酸一水合物、鹼性品紅、酞菁綠、金胺鹼、副品紅、結晶紫、甲基橙、尼祿藍2B、維多利亞藍、孔雀綠、金剛綠、鹼性藍。其含量為0.001至5重量%,較佳為0.01至1重量%。 The additive may also be a coloring matter such as toluenesulfonic acid monohydrate, basic fuchsin, phthalocyanine green, auramine, by-product magenta, crystal violet, methyl orange, Nero blue 2B, Victoria blue, malachite green, King Kong green, alkaline blue. The content is from 0.001 to 5% by weight, preferably from 0.01 to 1% by weight.
圖1為未經開環之苯乙烯-馬來酸酐-甲基丙烯酸丁酯共聚物之IR光譜。 Figure 1 is an IR spectrum of an unopened styrene-maleic anhydride-butyl methacrylate copolymer.
圖2為本發明苯乙烯-馬來酸酐-丙烯酸酯共聚物之IR光譜。 Figure 2 is an IR spectrum of a styrene-maleic anhydride-acrylate copolymer of the present invention.
以下以實例進一步闡明本發明之概念,該等實例非意欲限制本發明所欲保護之範圍,僅係用於使本發明所屬技術領域中通常知識可更輕易明瞭本發明內容。 The present invention is further clarified by the following examples, which are not intended to limit the scope of the invention as claimed.
實例1:未經開環之苯乙烯-馬來酸酐-丙烯酸酯共聚物之合成Example 1: Synthesis of unopened styrene-maleic anhydride-acrylate copolymer
苯乙烯、馬來酸酐與甲基丙烯酸丁酯的莫耳比為2:1:1,其中苯乙烯112.99g,馬來酸酐53.19g,甲基丙烯酸丁酯77.13g;起始劑為 偶氮二異丁腈0.85g;介質為丁酮373ml。首先將37.66g苯乙烯、17.73g馬來酸酐、25.71g甲基丙烯酸丁酯與37.2 7ml丁酮投入帶有攪拌棒的1000ml高壓反應容器中加熱溶解。將0.85g的偶氮二異丁腈放入298.46ml丁酮中溶解,然後放在滴加器中作滴加原料。剩餘的75.33g苯乙烯、35.46g馬來酸酐、51.42g甲基丙烯酸丁酯溶於37.27ml丁酮中溶解,然後放在滴加器中作滴加原料。在聚合溫度95℃,反應進行8小時,得到透明無色未經開環之苯乙烯-馬來酸酐-甲基丙烯酸丁酯共聚物溶液,IR光譜如圖1所示。並測量產物之固成分為41.3%及固成分酸價為247.49mg KOH/g。 The molar ratio of styrene, maleic anhydride and butyl methacrylate is 2:1:1, wherein 112.99g of styrene, 53.19g of maleic anhydride and 77.13g of butyl methacrylate; the initiator is Azobisisobutyronitrile 0.85 g; medium was 373 ml of butanone. First, 37.66 g of styrene, 17.73 g of maleic anhydride, 25.71 g of butyl methacrylate, and 37.2 of 7 ml of methyl ethyl ketone were placed in a 1000 ml high pressure reaction vessel equipped with a stir bar to dissolve by heating. 0.85 g of azobisisobutyronitrile was dissolved in 298.46 ml of methyl ethyl ketone, and then placed in a dispenser to drip the raw material. The remaining 75.33 g of styrene, 35.46 g of maleic anhydride, and 51.42 g of butyl methacrylate were dissolved in 37.27 ml of methyl ethyl ketone, and then placed in a dispenser for dropwise addition of the starting material. The reaction was carried out at a polymerization temperature of 95 ° C for 8 hours to obtain a transparent colorless unopened styrene-maleic anhydride-butyl methacrylate copolymer solution, and the IR spectrum was as shown in FIG. The solid content of the product was measured to be 41.3% and the solid content acid value was 247.49 mg KOH/g.
實例2:製備本發明之苯乙烯-馬來酸酐-丙烯酸酯共聚物Example 2: Preparation of the styrene-maleic anhydride-acrylate copolymer of the present invention
在高壓反應容器中加入實例1所合成未經開環之苯乙烯-馬來酸酐-甲基丙烯酸丁酯共聚物(100g)與甲醇(11.8g),於90℃下反應6小時,得到本發明之苯乙烯-馬來酸酐-甲基丙烯酸酯共聚物,IR光譜如圖2所示,由該光譜圖證明酸酐官能基已接近100%開環。並測量產物之固成分為41.32%及固成分酸價為150.65mg KOH/g。 The unopened styrene-maleic anhydride-butyl methacrylate copolymer (100 g) synthesized in Example 1 and methanol (11.8 g) were added to a high pressure reaction vessel, and reacted at 90 ° C for 6 hours to obtain the present invention. The styrene-maleic anhydride-methacrylate copolymer, IR spectrum is shown in Figure 2. From this spectrum it is shown that the anhydride functional group is nearly 100% open-loop. The solid content of the product was measured to be 41.32% and the solid content acid value was 150.65 mg KOH/g.
測量開環改質之苯乙烯-馬來酸酐-甲基丙烯酸丁酯共聚物之IR光譜。如圖2所示,在1800cm-1至2800cm-1之間並未展現馬來酸酐之特徵峰,表示馬來酸酐已實質上全數進行開環反應。 The IR spectrum of the ring-opened modified styrene-maleic anhydride-butyl methacrylate copolymer was measured. As shown in Fig. 2, a characteristic peak of maleic anhydride was not exhibited between 1800 cm -1 and 2800 cm -1 , indicating that the maleic anhydride had substantially completely subjected to a ring-opening reaction.
實例3:製備本發明之感光性樹脂組合物Example 3: Preparation of Photosensitive Resin Composition of the Present Invention
如表1所示,製備本發明及比較性實例之感光性樹脂組合物及所測量之性質:
將組合物塗佈於銅箔基板後烘烤除去溶劑,以紫外線曝光100mj/cm2,以1% Na2CO3顯影45秒。測定各性質之方法如下:感光度:以Stouffer 21 step底片測試光硬化能力,格數愈高表示愈佳。顯像後解像能力:以線路底片測試解像能力,數值愈小表示愈佳。顯像後附著能力:以線路底片測試附著能力,數值愈小表示愈佳。去膜能力:於50℃之3%NaOH水溶液中浸泡可剝離之時間,時間愈短表示愈佳。耐酸性:於6N HCl水溶液中浸泡仍未損害之1分鐘後,附著數值愈小表示耐酸性愈佳。 The composition was applied to a copper foil substrate, baked, and the solvent was removed, exposed to ultraviolet light at 100 mj/cm 2 , and developed with 1% Na 2 CO 3 for 45 seconds. The method for determining each property is as follows: Sensitivity: The photohardenability is tested with a Stouffer 21 step negative film, and the higher the number of cells, the better. Post-imaging resolution: Test the resolution with line negatives. The smaller the value, the better. Attachment ability after development: Test the adhesion ability with the line film. The smaller the value, the better. Film removal ability: The time of peeling can be immersed in a 3% aqueous solution of NaOH at 50 ° C. The shorter the time, the better. Acid resistance: After immersing in 6N HCl aqueous solution for 1 minute, the smaller the adhesion value, the better the acid resistance.
由上數據可知,利用開環改質的苯乙烯-馬來酸酐-丙烯酸酯共聚物製備之感光性樹脂組合物,其相較於已知之共聚物展現較佳之細線附著度、顯影解析度、去膜速度、耐酸性等性質。 As can be seen from the above data, the photosensitive resin composition prepared by the ring-opening modified styrene-maleic anhydride-acrylate copolymer exhibits better fine line adhesion, development resolution, and go compared with the known copolymer. Film speed, acid resistance and other properties.
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| Publication number | Priority date | Publication date | Assignee | Title |
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| TW450980B (en) * | 1999-07-19 | 2001-08-21 | Great Eastern Resins Ind Co Lt | Styrene-anhydride copolymer containing amido group, their preparation and uses |
| TWI239433B (en) * | 1999-11-01 | 2005-09-11 | Ind Tech Res Inst | opolymer containing unsaturated bond chain and photo resist compound containing the copolymer |
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| TW450980B (en) * | 1999-07-19 | 2001-08-21 | Great Eastern Resins Ind Co Lt | Styrene-anhydride copolymer containing amido group, their preparation and uses |
| TWI239433B (en) * | 1999-11-01 | 2005-09-11 | Ind Tech Res Inst | opolymer containing unsaturated bond chain and photo resist compound containing the copolymer |
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