[go: up one dir, main page]

TWI569355B - Control device and control method - Google Patents

Control device and control method Download PDF

Info

Publication number
TWI569355B
TWI569355B TW104123553A TW104123553A TWI569355B TW I569355 B TWI569355 B TW I569355B TW 104123553 A TW104123553 A TW 104123553A TW 104123553 A TW104123553 A TW 104123553A TW I569355 B TWI569355 B TW I569355B
Authority
TW
Taiwan
Prior art keywords
liquid
swirling flow
concave portion
discharge port
fluid passage
Prior art date
Application number
TW104123553A
Other languages
Chinese (zh)
Other versions
TW201611171A (en
Inventor
岩坂□
徳永英幸
河西裕二
Original Assignee
哈莫技術股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 哈莫技術股份有限公司 filed Critical 哈莫技術股份有限公司
Publication of TW201611171A publication Critical patent/TW201611171A/en
Application granted granted Critical
Publication of TWI569355B publication Critical patent/TWI569355B/en

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65GTRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G47/00Article or material-handling devices associated with conveyors; Methods employing such devices
    • B65G47/74Feeding, transfer, or discharging devices of particular kinds or types
    • B65G47/90Devices for picking-up and depositing articles or materials
    • B65G47/91Devices for picking-up and depositing articles or materials incorporating pneumatic, e.g. suction, grippers
    • B65G47/911Devices for picking-up and depositing articles or materials incorporating pneumatic, e.g. suction, grippers with air blasts producing partial vacuum
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B25HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
    • B25JMANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
    • B25J15/00Gripping heads and other end effectors
    • B25J15/06Gripping heads and other end effectors with vacuum or magnetic holding means
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65GTRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G49/00Conveying systems characterised by their application for specified purposes not otherwise provided for
    • B65G49/05Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
    • B65G49/06Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for fragile sheets, e.g. glass
    • B65G49/063Transporting devices for sheet glass
    • B65G49/064Transporting devices for sheet glass in a horizontal position
    • B65G49/065Transporting devices for sheet glass in a horizontal position supported partially or completely on fluid cushions, e.g. a gas cushion
    • H10P72/30

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Robotics (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Coating Apparatus (AREA)
  • Manipulator (AREA)

Description

控制裝置及控制方法 Control device and control method

本發明,是有關於藉由將液體吐出在與板狀的構件之間發生負壓將該構件保持的保持裝置的控制裝置及控制方法。 The present invention relates to a control device and a control method for a holding device that holds a liquid by releasing a liquid between a member and a plate-shaped member.

近年來,將半導體晶圓和玻璃基板等的板狀的構件由非接觸搬運用的裝置已被開發。例如,在專利文獻1中,使用柏努利定理將板狀的構件由非接觸搬運的裝置已被提案。在此裝置中,在裝置下面朝開口的圓筒室內供給流體使迴旋流發生,藉由該迴旋流的中心部的負壓吸引板狀構件,另一方面,藉由從該圓等室流出的流體使在該裝置及板狀構件之間保持一定的距離,使可將板狀的構件非接觸地搬運。在專利文獻1中,作為流體使用液體也已被提案。 In recent years, a plate-shaped member such as a semiconductor wafer or a glass substrate has been developed by a device for non-contact transportation. For example, in Patent Document 1, a device in which a plate-shaped member is conveyed by non-contact using Bernoulli's theorem has been proposed. In this apparatus, a fluid is supplied to the open cylindrical chamber under the apparatus to cause a swirling flow, and the plate-like member is attracted by the negative pressure at the center of the swirling flow, and on the other hand, from the chamber such as the circle. The fluid maintains a certain distance between the device and the plate member so that the plate-like member can be conveyed in a non-contact manner. In Patent Document 1, a liquid as a fluid has also been proposed.

〔習知技術文獻〕 [Practical Technical Literature] 〔專利文獻〕 [Patent Document]

[專利文獻1]日本特開2005-51260號公報 [Patent Document 1] Japanese Patent Laid-Open Publication No. 2005-51260

本發明之目的,是對於藉由將液體吐出在與被保持體之間發生負壓將該被保持體保持的保持裝置,使發生的負壓增大。 An object of the present invention is to increase a negative pressure that occurs when a liquid is discharged from a holding device that holds a held body by a negative pressure between the object and the object to be held.

本發明,是提供一種控制裝置,是控制對於藉由將液體吐出使在與被保持體之間發生負壓將前述被保持體保持的保持裝置的液體的供給用的控制裝置,前述保持裝置,是具備:柱狀的本體、及形成於前述本體且面向前述被保持體的平坦狀的端面、及形成於前述端面的凹部、及朝前述凹部內透過吐出口將液體吐出的1以上的流體通路,前述控制裝置,是在前述凹部內未形成有迴旋流的狀態下,以直到前述流體通路的吐出口是被液體覆蓋為止將前述凹部內由液體裝滿的方式控制液體的供給,直到前述流體通路的吐出口是被液體覆蓋為止在前述凹部內被液體裝滿之後,以藉由從前述流體通路朝前述凹部內被吐出的液體形成迴旋流的方式控制液體的供給。 The present invention provides a control device for controlling the supply of liquid to a holding device that holds the held body by a negative pressure between the object to be held by the discharge of the liquid, the holding device, The columnar body includes a flat end surface formed on the main body and facing the object to be held, a concave portion formed on the end surface, and one or more fluid passages for discharging the liquid through the discharge port in the concave portion. In the control device, the supply of the liquid is controlled such that the liquid in the recess is filled with the liquid until the discharge port of the fluid passage is covered with the liquid in a state where the swirling flow is not formed in the recess until the fluid After the discharge port of the passage is filled with the liquid in the recessed portion after being covered with the liquid, the supply of the liquid is controlled such that the swirling flow is formed by the liquid discharged from the fluid passage into the recess.

上述的控制裝置,是將被供給至前述凹部內的液體的流量設定成第1量,在前述凹部內未形成有迴旋流的狀態下,直到前述流體通路的吐出口是被液體覆蓋為止在前述凹部內由液體裝滿,直到前述流體通路的吐出口 是被液體覆蓋為止在前述凹部內被液體裝滿之後,將被供給至前述凹部內的液體的流量從前述第1量,朝比前述第1量更多的第2量變更,藉由從前述流體通路朝前述凹部內被吐出的液體形成迴旋流也可以。 In the control device described above, the flow rate of the liquid supplied into the concave portion is set to the first amount, and the swirling flow is not formed in the concave portion until the discharge port of the fluid passage is covered with the liquid. The inside of the recess is filled with liquid until the discharge port of the aforementioned fluid passage After the liquid is filled in the concave portion, the flow rate of the liquid supplied into the concave portion is changed from the first amount to a second amount larger than the first amount, The fluid passage may form a swirling flow toward the liquid discharged in the recess.

且在上述的保持裝置中,前述1以上的流體 通路,是包含:從設在前述凹部的底面的第1吐出口將液體吐出的第1流體通路、及從設在前述凹部的內周側面的第2吐出口將液體吐出的第2流體通路,上述的控制裝置,是透過前述第1流體通路朝前述凹部內供給液體,在前述凹部內未形成有迴旋流的狀態下,直到前述第2吐出口是被液體覆蓋為止將前述凹部內由液體裝滿,直到前述第2吐出口是被液體覆蓋為止在前述凹部內被液體裝滿之後,停止透過前述第1流體通路供給液體,透過前述第2流體通路朝前述凹部內供給液體使形成迴旋流也可以。 In the above holding device, the above 1 or more fluids The passage includes a first fluid passage that discharges the liquid from the first discharge port provided on the bottom surface of the recessed portion, and a second fluid passage that discharges the liquid from the second discharge port provided on the inner peripheral side surface of the recessed portion. In the above-described control device, the liquid is supplied into the concave portion through the first fluid passage, and the swirling flow is not formed in the concave portion, and the concave portion is filled with the liquid until the second discharge port is covered with the liquid. When the second discharge port is filled with the liquid in the recessed portion after the second discharge port is covered with the liquid, the liquid is stopped from being supplied through the first fluid passage, and the liquid is supplied into the recess through the second fluid passage to form a swirling flow. can.

且在上述的保持裝置中,前述1以上的流體 通路,是包含:從設在前述凹部的內周側面的第3吐出口將液體吐出而形成第1迴旋流的第3流體通路、及從設在前述凹部的前述內周側面的第4吐出口將液體吐出並形成朝與前述第1迴旋流的繞轉方向相反方向繞轉的第2迴旋流的第4流體通路,上述的控制裝置,是透過前述第3及第4流體通路朝前述凹部內供給液體,在前述凹部內未形成有迴旋流的狀態下,以直到前述第3吐出口是被液體覆蓋為止將前述凹部內由液體裝滿的方式控制液體的供給,直到前述第3吐出口是被液體覆蓋為止在前述凹部內被液 體裝滿之後,在維持透過前述第3流體通路供給液體的狀態,停止透過前述第4流體通路供給液體,藉由從前述第3流體通路朝前述凹部內被吐出的液體形成迴旋流也可以。 In the above holding device, the above 1 or more fluids The passage includes a third fluid passage that discharges the liquid from the third discharge port provided on the inner peripheral side surface of the recessed portion to form the first swirling flow, and a fourth discharge passage that is provided on the inner peripheral side surface of the recessed portion. Discharging the liquid to form a fourth fluid passage that is circulated in a direction opposite to the direction of rotation of the first swirling flow, and the control device passes through the third and fourth fluid passages into the recess In the state in which the swirling flow is not formed in the recessed portion, the supply of the liquid is controlled so that the liquid in the recessed portion is filled until the third discharge port is covered with the liquid, until the third discharge port is Covered in the aforementioned recess by the liquid After the body is filled, the supply of the liquid through the third fluid passage is maintained, the supply of the liquid through the fourth fluid passage is stopped, and the swirling flow is formed by the liquid discharged from the third fluid passage into the recess.

且本發明提供的控制方法,是控制對於藉由 將液體吐出在與被保持體之間發生負壓將前述被保持體保持的保持裝置的液體的供給用的控制方法,前述保持裝置,是具備:柱狀的本體、及形成於前述本體且面向前述被保持體的平坦狀的端面、及形成於前述端面的凹部、及在前述凹部內透過吐出口將液體吐出的1以上的流體通路,前述控制方法,是具有:在前述凹部內未形成有迴旋流的狀態下,以直到前述流體通路的吐出口是被液體覆蓋為止將前述凹部內由液體裝滿的方式控制液體的供給的步驟;及直到前述流體通路的吐出口是被液體覆蓋為止在前述凹部內被液體裝滿之後,以藉由從前述流體通路朝前述凹部內被吐出的液體形成迴旋流的方式控制液體的供給的步驟。 And the control method provided by the present invention is to control A control method for supplying a liquid to a holding device that holds a liquid between a held body and a negative pressure, and the holding device includes a columnar body and a body formed on the body a flat end surface of the object to be held, a concave portion formed on the end surface, and one or more fluid passages for discharging the liquid through the discharge port in the concave portion, wherein the control method includes that the concave portion is not formed. In the state of the swirling flow, the step of controlling the supply of the liquid so as to fill the inside of the recessed portion until the discharge port of the fluid passage is covered with the liquid; and until the discharge port of the fluid passage is covered with the liquid After the inside of the concave portion is filled with the liquid, the supply of the liquid is controlled so as to form a swirling flow by the liquid discharged from the fluid passage into the concave portion.

依據本發明的話,對於藉由將液體吐出在與被保持體之間發生負壓將該被保持體保持的保持裝置,可以將負壓增大。 According to the present invention, the negative pressure can be increased by the holding means for holding the liquid to be held by the negative pressure between the held body and the held body.

1‧‧‧迴旋流形成體 1‧‧‧ whirlpool formation

2‧‧‧電磁閥 2‧‧‧ solenoid valve

3‧‧‧液體供給泵 3‧‧‧Liquid supply pump

4‧‧‧微電腦 4‧‧‧Microcomputer

5‧‧‧迴旋流形成體 5‧‧‧ Circumfluent formation

7‧‧‧迴旋流形成體 7‧‧‧ whirlpool formation

10‧‧‧搬運裝置 10‧‧‧Transportation device

11‧‧‧本體 11‧‧‧Ontology

12‧‧‧凹部 12‧‧‧ recess

13‧‧‧端面 13‧‧‧ end face

14‧‧‧吐出口 14‧‧‧Exporting

15‧‧‧傾斜面 15‧‧‧Sloping surface

16‧‧‧供給口 16‧‧‧ supply port

17‧‧‧環狀通路 17‧‧‧Circular access

18‧‧‧連通路 18‧‧‧Connected Road

19‧‧‧供給路 19‧‧‧Supply road

20‧‧‧搬運裝置 20‧‧‧Transportation device

51‧‧‧本體 51‧‧‧Ontology

52‧‧‧凹部 52‧‧‧ recess

53‧‧‧端面 53‧‧‧ end face

54‧‧‧吐出口 54‧‧‧Spit

55‧‧‧傾斜面 55‧‧‧Sloping surface

56‧‧‧噴出口 56‧‧‧Spray outlet

57‧‧‧導入口 57‧‧‧Import

58‧‧‧導入路 58‧‧‧Introduction

59‧‧‧環狀通路 59‧‧‧Circular access

60‧‧‧連通路 60‧‧‧Connected Road

61‧‧‧供給口 61‧‧‧ supply port

62‧‧‧供給路 62‧‧‧Supply road

71‧‧‧本體 71‧‧‧Ontology

72‧‧‧凹部 72‧‧‧ recess

73‧‧‧端面 73‧‧‧ end face

74‧‧‧吐出口 74‧‧‧Exporting

75‧‧‧傾斜面 75‧‧‧ sloped surface

76‧‧‧導入口 76‧‧‧Import

77‧‧‧導入路 77‧‧‧Introduction

100‧‧‧搬運系統 100‧‧‧Transportation system

101‧‧‧基體 101‧‧‧ base

102‧‧‧摩擦構件 102‧‧‧ Friction members

103‧‧‧孔部 103‧‧‧ Hole Department

200‧‧‧搬運系統 200‧‧‧Transportation system

201‧‧‧基體 201‧‧‧ base

300‧‧‧搬運系統 300‧‧‧Transportation system

[第1圖]顯示第1實施例的迴旋流形成體1的一例的立體圖。 [Fig. 1] A perspective view showing an example of the swirling flow forming body 1 of the first embodiment.

[第2圖]第1圖的A-A線剖面圖。 [Fig. 2] A cross-sectional view taken along line A-A of Fig. 1.

[第3圖]第1圖的B-B線剖面圖。 [Fig. 3] A cross-sectional view taken along line B-B of Fig. 1.

[第4圖]顯示搬運系統100的電路構成的一例的圖。 [Fig. 4] A diagram showing an example of a circuit configuration of the transport system 100.

[第5圖]顯示藉由微電腦4被實行的控制動作的一例的流程圖。 [Fig. 5] A flowchart showing an example of a control operation performed by the microcomputer 4.

[第6圖]顯示流量及吸引壓的關係的一例的圖表。 [Fig. 6] A graph showing an example of the relationship between the flow rate and the suction pressure.

[第7圖]顯示第2實施例的迴旋流形成體5的一例的立體圖。 [Fig. 7] A perspective view showing an example of the swirling flow forming body 5 of the second embodiment.

[第8圖]第7圖的C-C線剖面圖。 [Fig. 8] A cross-sectional view taken along line C-C of Fig. 7.

[第9圖]第7圖的D-D線剖面圖。 [Fig. 9] A cross-sectional view taken along line D-D of Fig. 7.

[第10圖]顯示搬運系統200的電路構成的一例的圖。 [Fig. 10] A diagram showing an example of a circuit configuration of the transport system 200.

[第11圖]顯示藉由微電腦4A被實行的控制動作的一例的流程圖。 [Fig. 11] A flowchart showing an example of a control operation performed by the microcomputer 4A.

[第12圖]顯示第3實施例的迴旋流形成體7的一例的立體圖。 [12] A perspective view showing an example of the swirling flow forming body 7 of the third embodiment.

[第13圖]第12圖的E-E線剖面圖。 [Fig. 13] A cross-sectional view taken along line E-E of Fig. 12.

[第14圖]第12圖的F-F線剖面圖。 [Fig. 14] A cross-sectional view taken along line F-F of Fig. 12.

[第15圖]顯示搬運系統300的電路構成的一例的圖。 [Fig. 15] A diagram showing an example of a circuit configuration of the transport system 300.

[第16圖]顯示藉由微電腦4B被實行的控制動作的一 例的流程圖。 [Fig. 16] shows one of the control actions performed by the microcomputer 4B The flow chart of the example.

[第17圖]顯示搬運裝置10的構成的一例的圖。 [17] A diagram showing an example of the configuration of the transport device 10.

[第18圖]顯示搬運裝置20的構成的一例的圖。 [Embodiment 18] A diagram showing an example of the configuration of the transport device 20.

以下,對於本發明的實施例一邊參照圖面一邊說明。 Hereinafter, embodiments of the present invention will be described with reference to the drawings.

1.第1實施例 1. First Embodiment

第1圖,是顯示本發明的第1實施例的迴旋流形成體1的一例的立體圖。第2圖,是第1圖的A-A線剖面圖。第3圖,是第1圖的B-B線剖面圖。迴旋流形成體1,是將半導體晶圓和玻璃基板等的板狀構件保持地搬運用的裝置。迴旋流形成體1,是藉由將液體吐出在與板狀構件之間發生負壓將該構件保持。在此的液體,是例如純水和碳酸水。迴旋流形成體1的材質,是例如鋁合金。此迴旋流形成體1,是本發明的「保持裝置」的一例。 Fig. 1 is a perspective view showing an example of the swirling flow forming body 1 of the first embodiment of the present invention. Fig. 2 is a cross-sectional view taken along line A-A of Fig. 1. Fig. 3 is a cross-sectional view taken along line B-B of Fig. 1. The whirling flow forming body 1 is a device for holding a plate-shaped member such as a semiconductor wafer or a glass substrate. The swirling flow forming body 1 holds the member by discharging a liquid and generating a negative pressure between the plate member. The liquid here is, for example, pure water and carbonated water. The material of the swirling flow forming body 1 is, for example, an aluminum alloy. This swirling flow forming body 1 is an example of the "holding device" of the present invention.

迴旋流形成體1,是如第1圖乃至第3圖所示,具備:本體11、及凹部12、及端面13、及2個吐出口14、及傾斜面15。本體11,是具有圓柱形狀。端面13,是在本體11的一的面(具體而言,面向被保持體也就是板狀構件的面)(以下稱為「底面」)形成平坦狀。凹部12,是具有圓柱形狀,形成於端面13。凹部12,是與本體11同軸地形成。 The swirling flow forming body 1 includes a main body 11 , a concave portion 12 , an end surface 13 , two discharge ports 14 , and an inclined surface 15 as shown in FIGS. 1 to 3 . The body 11 has a cylindrical shape. The end surface 13 is formed in a flat shape on one surface of the main body 11 (specifically, a surface facing the object to be held, that is, a plate-like member) (hereinafter referred to as "bottom surface"). The recess 12 has a cylindrical shape and is formed on the end surface 13. The recess 12 is formed coaxially with the body 11.

2個吐出口14,是形成於本體11的面向於凹 部12的內周側面。2個吐出口14,是彼此相面對地配置。具體而言,被配置成以本體11或是凹部12的中心軸的軸心為中心點對稱。透過各吐出口14,被供給至迴旋流形成體1的液體是朝凹部12內被吐出。傾斜面15,是形成於凹部12的開口部。 Two discharge ports 14 are formed on the body 11 facing the concave The inner peripheral side of the portion 12. The two discharge ports 14 are disposed to face each other. Specifically, it is arranged to be point-symmetric about the axis of the central axis of the body 11 or the recess 12 . The liquid supplied to the swirling flow forming body 1 is discharged into the concave portion 12 through the respective discharge ports 14. The inclined surface 15 is an opening formed in the recess 12 .

迴旋流形成體1,是如第2圖及第3圖所示, 具備:供給口16、及環狀通路17、及連通路18、及2條的供給路19。供給口16,是具有圓形狀,設於本體11的上面(即與底面相反的面)的中央。供給口16,是透過例如管,與後述的液體供給泵3連接,液體是透過此供給口16朝本體11內被供給。環狀通路17,是具有圓筒形狀,將凹部12包圍的方式形成於本體11的內部。環狀通路17,是與凹部12同軸地形成。環狀通路17,是將從連通路18被供給的液體朝供給路19供給。連通路18,是設在本體11的內部,在本體11的底面或是上面的半徑方向朝直線狀延伸。 The swirling flow forming body 1 is as shown in Figs. 2 and 3, The supply port 16 and the annular passage 17, the communication passage 18, and the two supply passages 19 are provided. The supply port 16 has a circular shape and is provided at the center of the upper surface of the body 11 (i.e., the surface opposite to the bottom surface). The supply port 16 is connected to a liquid supply pump 3, which will be described later, through a pipe, for example, and the liquid is supplied into the body 11 through the supply port 16. The annular passage 17 has a cylindrical shape and is formed inside the body 11 so as to surround the recess 12 . The annular passage 17 is formed coaxially with the recess 12. The annular passage 17 supplies the liquid supplied from the communication passage 18 to the supply passage 19. The communication path 18 is provided inside the main body 11, and extends linearly in the radial direction of the bottom surface or the upper surface of the main body 11.

連通路18,是在其兩端部與環狀通路17連 通。連通路18,是將透過供給口16被供給至本體11內的液體供給至環狀通路17。2條的供給路19,是各別透過吐出口14朝凹部12內將液體吐出,在凹部12內形成迴旋流。具體而言,各供給路19,是對於端面13大致平行,且對於凹部12的外周朝切線方向延伸形成,其一端是與環狀通路17連通,另一端是與吐出口14連通。供給 路19,是本發明的「流體通路」的一例。 The communication path 18 is connected to the annular passage 17 at both ends thereof. through. The communication passage 18 supplies the liquid supplied into the main body 11 through the supply port 16 to the annular passage 17. The two supply passages 19 discharge the liquid into the recess 12 through the respective discharge outlets 14 in the recess 12 A swirling flow is formed inside. Specifically, each of the supply passages 19 is formed substantially parallel to the end surface 13 and extends in the tangential direction with respect to the outer circumference of the recessed portion 12, and one end thereof communicates with the annular passage 17 and the other end thereof communicates with the discharge port 14. supply The path 19 is an example of the "fluid passage" of the present invention.

液體是對於以上說明的迴旋流形成體1透過 供給口16被供給的話,該液體,是通過連通路18、環狀通路17及供給路19從吐出口14朝凹部12內被吐出。朝凹部12被吐出的液體,是在凹部12內成為迴旋流地被整流,其後從凹部12的開口部流出。此時,與端面13相面對若板狀構件存在的情況時,朝凹部12的外部流體(例如空氣)的流入被限制,藉由迴旋流的離心力及挾帶效果,使迴旋流中心部的每單位體積的流體分子的密度變小,在迴旋流形成體1及板狀構件之間負壓會發生。此結果,板狀構件是藉由周圍的流體被推壓朝端面13側被挪近。另一方面,隨著端面13及板狀構件的距離接近,從凹部12內流出的液體的量被限制,從吐出口14朝凹部12內被吐出的液體的速度會變慢,迴旋流中心部的壓力會上昇。此結果,板狀構件不會與端面13接觸,在板狀構件及端面13之間被保持一定的距離。 The liquid is permeated through the swirling flow forming body 1 described above. When the supply port 16 is supplied, the liquid is discharged from the discharge port 14 into the recess 12 through the communication passage 18, the annular passage 17, and the supply passage 19. The liquid discharged into the concave portion 12 is rectified as a swirling flow in the concave portion 12, and then flows out from the opening portion of the concave portion 12. At this time, when the plate-like member exists in contact with the end surface 13, the inflow of the external fluid (for example, air) toward the recessed portion 12 is restricted, and the center of the swirling flow is made by the centrifugal force of the swirling flow and the effect of the entrainment. The density of fluid molecules per unit volume becomes small, and a negative pressure occurs between the swirling flow forming body 1 and the plate-like member. As a result, the plate-like member is moved toward the end surface 13 side by the surrounding fluid being pushed. On the other hand, as the distance between the end surface 13 and the plate-like member approaches, the amount of liquid flowing out of the recessed portion 12 is restricted, and the velocity of the liquid discharged from the discharge port 14 into the recessed portion 12 becomes slow, and the center of the swirling flow is slowed. The pressure will rise. As a result, the plate member does not come into contact with the end face 13, and is kept at a certain distance between the plate member and the end face 13.

第4圖,是顯示包含迴旋流形成體1的搬運 系統100的電路構成的一例的圖。如第4圖所示,迴旋流形成體1的供給口16,是藉由例如管,透過電磁閥2與液體供給泵3連接。電磁閥2,是與微電腦4連接。 Figure 4 is a view showing the conveyance including the swirling flow forming body 1. A diagram of an example of the circuit configuration of the system 100. As shown in Fig. 4, the supply port 16 of the swirling flow forming body 1 is connected to the liquid supply pump 3 through a solenoid valve 2 by, for example, a tube. The solenoid valve 2 is connected to the microcomputer 4.

電磁閥2,具體而言是比例電磁閥,依據從微 電腦4被輸出的控制訊號,使其開度被調整。微電腦4,是隨著規定的程式對於電磁閥2將控制訊號輸出,控制對於迴旋流形成體1被供給的液體的流量(更具體而言,每 單位時間被供給至迴旋流形成體1的液體的量)。此微電腦4,是本發明的「控制裝置」的一例。 Solenoid valve 2, specifically a proportional solenoid valve, based on micro The control signal outputted by the computer 4 is adjusted so that the opening degree is adjusted. The microcomputer 4 outputs a control signal to the solenoid valve 2 in accordance with a prescribed program, and controls the flow rate of the liquid supplied to the swirling flow forming body 1 (more specifically, each The amount of liquid supplied to the swirling flow forming body 1 per unit time). This microcomputer 4 is an example of the "control device" of the present invention.

第5圖,是顯示藉由微電腦4被實行的控制動作的一例的流程圖。此控制動作,在大氣中藉由迴旋流形成體1吸引板狀構件地保持搬運時被實行。又,在本動作的說明中,假定在迴旋流形成體1的凹部12的開口部為朝天方向的狀態下(換言之,其凹部12是朝與垂直方向相反方向開口的狀態)吸引板狀構件地搬運的情況。 Fig. 5 is a flowchart showing an example of a control operation performed by the microcomputer 4. This control operation is carried out while the conveyance is being held by the swirling flow formation body 1 in the atmosphere while sucking the plate-shaped member. In the description of the operation, it is assumed that the opening portion of the concave portion 12 of the swirling flow forming body 1 is in the skyward direction (in other words, the concave portion 12 is open in a direction opposite to the vertical direction). The situation of handling.

在本控制動作的步驟Sa1中,微電腦4,是將電磁閥2控制,開始對於迴旋流形成體1的液體的供給。此時,液體是對於迴旋流形成體1由第1流量被供給。在此,第1流量,是在迴旋流形成體1的凹部12內不會形成迴旋流的流量。在凹部12內形成迴旋流的話,因為液體會藉由迴旋流的離心力從凹部12流出,所以液體不會滯留在凹部12內。 In step Sa1 of this control operation, the microcomputer 4 controls the solenoid valve 2 to start supply of the liquid to the swirling flow forming body 1. At this time, the liquid is supplied to the swirling flow forming body 1 by the first flow rate. Here, the first flow rate is a flow rate in which the swirling flow is not formed in the concave portion 12 of the swirling flow forming body 1. When the swirling flow is formed in the recessed portion 12, since the liquid flows out of the recessed portion 12 by the centrifugal force of the swirling flow, the liquid does not stay in the recessed portion 12.

接著,微電腦4,是開始由正時器計時(步驟Sa2)。且,微電腦4,是判斷是否經過了規定時間(步驟Sa3)。此規定時間,是迴旋流形成體1的凹部12成為滿水為止所需要的時間,該時間是被預先測量,被記憶於微電腦4。 Next, the microcomputer 4 starts counting by the timer (step Sa2). Further, the microcomputer 4 determines whether or not a predetermined time has elapsed (step Sa3). The predetermined time is the time required for the concave portion 12 of the swirling flow forming body 1 to become full, and the time is measured in advance and stored in the microcomputer 4.

微電腦4,是規定時間未經過情況時(步驟Sa3:NO)就待機,規定時間經過的話(即迴旋流形成體1的凹部12是成為滿水的話)(步驟Sa3:YES),將電磁閥2控制,對於迴旋流形成體1開始第2流量中的液體 的供給(步驟Sa4)。在此,第2流量,是比上述的第1流量更多的流量,在迴旋流形成體1的凹部12內可形成迴旋流的流量。在此狀態下,與迴旋流形成體1的端面13相面對若板狀構件存在的話,在迴旋流形成體1及板狀構件之間負壓會發生,成為藉由此負壓使板狀構件藉由迴旋流形成體1被吸引地保持。 When the predetermined time has not elapsed (step Sa3: NO), the microcomputer 4 stands by, and when the predetermined time has elapsed (that is, when the concave portion 12 of the swirling flow forming body 1 is full) (step Sa3: YES), the solenoid valve 2 is placed. Control, for the swirling flow forming body 1 to start the liquid in the second flow rate Supply (step Sa4). Here, the second flow rate is a flow rate larger than the first flow rate described above, and a flow rate of the swirling flow can be formed in the concave portion 12 of the swirling flow formation body 1. In this state, when the end surface 13 of the swirling flow forming body 1 faces, if a plate-like member exists, a negative pressure occurs between the swirling flow forming body 1 and the plate-shaped member, and the plate is formed by the negative pressure. The member is held in attraction by the swirling flow forming body 1.

以上說明藉由微電腦4被實行的控制動作。 The control operation that is performed by the microcomputer 4 is explained above.

第6圖,是顯示在迴旋流形成體1的凹部12內從空的狀態開始形成迴旋流的情況、及凹部12是在滿水的狀態下迴旋流的形成開始的情況下,流量及吸引壓的關係的一例的圖表。同圖表的橫軸是顯示流量(單位:L/min),縱軸是顯示吸引壓(單位:kPa)。依據同圖表可知,無論其中任一的流量,凹部12是在滿水的狀態下迴旋流的形成開始的情況的吸引壓,與凹部12內是從空的狀態迴旋流的形成開始的情況的吸引壓相比較,皆是成為2倍以上。 Fig. 6 is a view showing a case where a swirling flow is formed from an empty state in the concave portion 12 of the swirling flow forming body 1, and a flow rate and suction pressure when the concave portion 12 starts to form a swirling flow in a state of full water. A chart of an example of the relationship. The horizontal axis of the graph is the display flow rate (unit: L/min), and the vertical axis is the display suction pressure (unit: kPa). According to the same graph, the concave portion 12 is the suction pressure when the formation of the swirling flow starts in the state of full water, and the suction in the concave portion 12 from the state of the empty swirling flow. Compared with the pressure phase, it is more than twice.

又,同圖表所示的吸引壓,是使用HARMOTEC股份有限公司製的KUMADE(日本註冊商標)Cup(型號:KMCP-60CW)進行測量。 In addition, the suction pressure shown in the same chart is measured using KUMADE (Japanese registered trademark) Cup (model: KMCP-60CW) manufactured by HARMOTEC Co., Ltd.

依據以上說明的本實施例的控制動作的話,因為在凹部12內形成迴旋流之前將凹部12內滿水,其後形成迴旋流,所以如第6圖所示,與在凹部12內是空的狀態開始迴旋流的形成的情況相比較,可以獲得較高的吸引壓。且,依據本實施例的控制動作的話,板狀構件的搬 運中,迴旋流形成體1的凹部12內因為是藉被液體裝滿,所以可防止板狀構件的表面是藉由乾燥發生的水印(別名,水染)的形成。又,板狀構件是半導體晶圓的情況,此水印一般是由氧化物所組成。 According to the control operation of the present embodiment described above, since the concave portion 12 is filled with water before the swirling flow is formed in the concave portion 12, and then the swirling flow is formed, as shown in Fig. 6, it is empty in the concave portion 12. A higher suction pressure can be obtained as compared with the case where the state begins to form a swirling flow. Moreover, according to the control action of the embodiment, the movement of the plate member In operation, since the inside of the concave portion 12 of the swirling flow forming body 1 is filled with liquid, the surface of the plate-like member can be prevented from being formed by watermarking (alias, water dyeing) which occurs by drying. Further, the plate member is a semiconductor wafer, and the watermark is generally composed of an oxide.

2.第2實施例 2. Second Embodiment

第7圖,是顯示本發明的第2實施例的迴旋流形成體5的一例的立體圖。第8圖,是第7圖的C-C線剖面圖。 第9圖,是第7圖的D-D線剖面圖。迴旋流形成體5,是將半導體晶圓和玻璃基板等的板狀構件保持地搬運用的裝置。迴旋流形成體5,是藉由將液體吐出在與板狀構件之間發生負壓將該構件保持。在此的液體,是例如純水和碳酸水。迴旋流形成體5的材質,是例如鋁合金。此迴旋流形成體5,是本發明的「保持裝置」的一例。 Fig. 7 is a perspective view showing an example of the swirling flow forming body 5 of the second embodiment of the present invention. Fig. 8 is a cross-sectional view taken along line C-C of Fig. 7. Fig. 9 is a cross-sectional view taken along line D-D of Fig. 7. The whirling flow forming body 5 is a device for holding a plate-shaped member such as a semiconductor wafer or a glass substrate. The swirling flow forming body 5 holds the member by discharging a liquid and generating a negative pressure between the plate member. The liquid here is, for example, pure water and carbonated water. The material of the swirling flow forming body 5 is, for example, an aluminum alloy. This swirling flow forming body 5 is an example of the "holding device" of the present invention.

迴旋流形成體5,是如第7圖乃至第9圖所示,具備:本體51、及凹部52、及端面53、及2個吐出口54、及傾斜面55、及噴出口56。本體51,是具有圓柱形狀。端面53,是在本體51的一的面(具體而言,面向被保持體也就是板狀構件的面)(以下稱為「底面」)形成平坦狀。凹部52,是具有圓柱形狀,形成於端面53。凹部52,是與本體51同軸地形成。 As shown in FIGS. 7 to 9 , the swirling flow forming body 5 includes a main body 51 , a concave portion 52 , an end surface 53 , two discharge ports 54 , an inclined surface 55 , and a discharge port 56 . The body 51 has a cylindrical shape. The end surface 53 is formed in a flat shape on one surface of the main body 51 (specifically, a surface facing the object to be held, that is, a plate-like member) (hereinafter referred to as "bottom surface"). The recess 52 has a cylindrical shape and is formed on the end surface 53. The recess 52 is formed coaxially with the body 51.

2個吐出口54,是形成於本體51的面向於凹部52的內周側面。2個吐出口54,是彼此相面對地配置。具體而言,被配置成以本體51或是凹部52的中心軸 的軸心為中心點對稱。透過各吐出口54,被供給至迴旋流形成體5的液體是朝凹部52內被吐出。傾斜面55,是形成於凹部52的開口部。噴出口56,是具有圓形狀,設於凹部52的底面中央。此噴出口56,是與後述的導入路58連通,將液體吐出。 The two discharge ports 54 are formed on the inner peripheral side surface of the body 51 facing the recess 52. The two discharge ports 54 are disposed to face each other. Specifically, it is configured to be the center axis of the body 51 or the recess 52 The axis is symmetrical at the center point. The liquid supplied to the swirling flow forming body 5 is discharged into the concave portion 52 through the respective discharge ports 54. The inclined surface 55 is an opening formed in the recess 52. The discharge port 56 has a circular shape and is provided at the center of the bottom surface of the recess 52. This discharge port 56 communicates with an introduction path 58 which will be described later, and discharges the liquid.

迴旋流形成體5,是如第8圖及第9圖所示, 具備:導入口57、及導入路58、及環狀通路59、及連通路60、及供給口61、及2條的供給路62。導入口57,是具有圓形狀,設於本體51的上面(即與底面相反的面)的中央。導入口57,是透過例如管與液體供給泵3A連接,液體是透過此導入口57朝本體51內被供給。導入路58,是設在本體51的內部,沿著本體51的中心軸呈直線狀延伸。導入路58,其一端是與導入口57連通,另一端是與前述的噴出口56連通。導入路58,是本發明的「流體通路」的一例,尤其是「第1流體通路」的一例。 The swirling flow forming body 5 is as shown in Figs. 8 and 9. The inlet port 57, the introduction path 58, and the annular passage 59, the communication passage 60, the supply port 61, and the two supply passages 62 are provided. The inlet 57 has a circular shape and is provided at the center of the upper surface of the body 51 (i.e., the surface opposite to the bottom surface). The inlet 57 is connected to the liquid supply pump 3A through, for example, a tube through which the liquid is supplied into the body 51. The introduction path 58 is provided inside the body 51 and extends linearly along the central axis of the body 51. The introduction path 58 has one end that communicates with the introduction port 57 and the other end that communicates with the aforementioned discharge port 56. The introduction path 58 is an example of the "fluid passage" of the present invention, and is particularly an example of the "first fluid passage".

環狀通路59,是具有圓筒形狀,將凹部52包 圍的方式形成於本體51的內部。環狀通路59,是與凹部52同軸地形成。環狀通路59,是將從連通路60被供給的液體朝供給路62供給。連通路60,是設在本體51的內部,與本體51的中心軸平行地呈直線狀延伸。連通路60,其一端與環狀通路59連通,另一端與供給口61連通。供給口61,是具有圓形狀,設於本體51的上面。供給口61,是透過例如管與液體供給泵3A連接,流體是透過此供給口61朝本體51內被供給。 The annular passage 59 has a cylindrical shape and includes a recess 52 The surrounding manner is formed inside the body 51. The annular passage 59 is formed coaxially with the recess 52. The annular passage 59 supplies the liquid supplied from the communication passage 60 to the supply passage 62. The communication passage 60 is provided inside the main body 51 and extends linearly in parallel with the central axis of the main body 51. The communication path 60 has one end that communicates with the annular passage 59 and the other end that communicates with the supply port 61. The supply port 61 has a circular shape and is provided on the upper surface of the body 51. The supply port 61 is connected to the liquid supply pump 3A through, for example, a tube, and the fluid is supplied into the body 51 through the supply port 61.

2條的供給路62,是各別透過吐出口54朝凹 部52內將液體吐出,在凹部52內形成迴旋流。具體而言,各供給路62,是對於端面53大致平行,且對於凹部52的外周朝切線方向延伸形成,其一端是與環狀通路59連通,另一端是與吐出口54連通。供給路62,是本發明的「流體通路」的一例,尤其是「第2流體通路」的一例。 The two supply paths 62 are respectively recessed through the discharge port 54 The liquid is discharged from the portion 52, and a swirling flow is formed in the recess 52. Specifically, each of the supply passages 62 is substantially parallel to the end surface 53 and extends in the tangential direction with respect to the outer circumference of the recessed portion 52. One end thereof communicates with the annular passage 59 and the other end communicates with the discharge port 54. The supply path 62 is an example of the "fluid passage" of the present invention, and particularly an example of the "second fluid passage".

液體是對於以上說明的迴旋流形成體5透過 供給口61被供給的話,該液體,是通過連通路60、環狀通路59及供給路62從吐出口54朝凹部52內被吐出。朝凹部52被吐出的液體,是在凹部52內成為迴旋流地被整流,其後從凹部52的開口部流出。此時,與端面53相面對若板狀構件存在的情況時,朝凹部52內的外部流體(例如空氣)的流入被限制,藉由迴旋流的離心力及挾帶效果,迴旋流中心部的每單位體積的流體分子的密度會變小,在迴旋流形成體1及板狀構件之間負壓會發生。此結果,板狀構件是藉由周圍的流體被推壓朝端面53側被挪近。另一方面,隨著端面53及板狀構件的距離接近,從凹部52內流出的液體的量被限制,從吐出口54朝凹部52內被吐出的液體的速度會變慢,迴旋流中心部的壓力會上昇。此結果,板狀構件不會與端面53接觸,在板狀構件及端面53之間被保持一定的距離。 The liquid is permeated through the swirling flow forming body 5 described above. When the supply port 61 is supplied, the liquid is discharged from the discharge port 54 into the recess 52 through the communication passage 60, the annular passage 59, and the supply passage 62. The liquid discharged into the concave portion 52 is rectified as a swirling flow in the concave portion 52, and then flows out from the opening portion of the concave portion 52. At this time, when the plate-like member exists in contact with the end surface 53, the inflow of the external fluid (for example, air) in the recess 52 is restricted, and the centrifugal force and the entrainment effect of the swirling flow are at the center of the swirling flow. The density of fluid molecules per unit volume becomes small, and a negative pressure occurs between the swirling flow forming body 1 and the plate-like member. As a result, the plate-like member is moved toward the end surface 53 side by the surrounding fluid being pushed. On the other hand, as the distance between the end surface 53 and the plate-like member approaches, the amount of liquid flowing out from the recess 52 is restricted, and the velocity of the liquid discharged from the discharge port 54 into the recess 52 is slowed, and the center of the swirling flow is slowed. The pressure will rise. As a result, the plate member does not come into contact with the end face 53, and is kept at a constant distance between the plate member and the end face 53.

第10圖,是顯示包含迴旋流形成體5的搬運 系統200的電路構成的一例的圖。如第10圖所示,迴旋 流形成體5的導入口57,是藉由例如管,透過電磁閥2A與液體供給泵3A連接。且,迴旋流形成體5的供給口61,是藉由例如管,透過電磁閥2B與液體供給泵3A連接。電磁閥2A及2B,是與微電腦4A連接。 Figure 10 is a view showing the conveyance including the swirling flow forming body 5. A diagram of an example of the circuit configuration of the system 200. As shown in Figure 10, the maneuver The introduction port 57 of the flow forming body 5 is connected to the liquid supply pump 3A through a solenoid valve 2A by, for example, a tube. Further, the supply port 61 of the swirling flow forming body 5 is connected to the liquid supply pump 3A through a solenoid valve 2B by, for example, a tube. The solenoid valves 2A and 2B are connected to the microcomputer 4A.

電磁閥2A及2B,是各別依據從微電腦4A被 輸出的導通斷開控制訊號,許可或遮斷從液體供給泵3A被供給的液體的通過。微電腦4A,是隨著規定的程式對於電磁閥2A及2B將導通斷開控制訊號輸出,將對於迴旋流形成體5的液體的供給控制。此微電腦4A,是本發明的「控制裝置」的一例。 Solenoid valves 2A and 2B are individually based on the slave computer 4A The output of the on-off control signal permits or interrupts the passage of the liquid supplied from the liquid supply pump 3A. The microcomputer 4A controls the supply of the liquid to the swirling flow forming body 5 by the ON/OFF control signal output to the solenoid valves 2A and 2B in accordance with a predetermined program. This microcomputer 4A is an example of the "control device" of the present invention.

第11圖,是顯示藉由微電腦4A被實行的控 制動作的一例的流程圖。此控制動作,是在大氣中藉由迴旋流形成體5吸引板狀構件地保持搬運時被實行。又,在本動作的說明中,假定在迴旋流形成體5的凹部52的開口部為朝天方向的狀態下(換言之,其凹部52朝與垂直方向相反方向開口的狀態)吸引板狀構件地搬運的情況。 Figure 11 shows the control that is implemented by the microcomputer 4A. A flowchart of an example of a system operation. This control operation is carried out while holding and transporting the plate-shaped member by the swirling flow forming body 5 in the atmosphere. In the description of the operation, it is assumed that the opening of the concave portion 52 of the swirling flow forming body 5 is in the direction of the sky (in other words, the concave portion 52 is open in a direction opposite to the vertical direction). Case.

在本控制動作的步驟Sb1中,微電腦4,是將 電磁閥2A控制,透過導入口57開始朝迴旋流形成體5的液體的供給。即,開始朝來自設在凹部52底面的噴出口56的凹部52內的液體的供給。此時,電磁閥2B是維持閉狀態,液體不會從設在凹部52內周側面的吐出口54朝凹部52內被供給。因此,在凹部52內不會形成迴旋流。 In step Sb1 of this control action, the microcomputer 4 is The solenoid valve 2A controls the supply of the liquid to the swirling flow forming body 5 through the introduction port 57. That is, the supply of the liquid into the concave portion 52 from the discharge port 56 provided in the bottom surface of the concave portion 52 is started. At this time, the solenoid valve 2B is maintained in a closed state, and the liquid is not supplied into the recess 52 from the discharge port 54 provided on the inner peripheral side surface of the recess 52. Therefore, no swirling flow is formed in the recess 52.

接著,微電腦4A,是開始由正時器計時(步 驟Sb2)。且,微電腦4A,是判斷是否經過了規定時間 (步驟Sb3)。此規定時間,是迴旋流形成體5的凹部52成為滿水為止所需要的時間,該時間是被預先測量,被記憶於微電腦4A。 Then, the microcomputer 4A is started by the timer (step) Step Sb2). Moreover, the microcomputer 4A determines whether or not the specified time has elapsed. (Step Sb3). The predetermined time is the time required for the concave portion 52 of the swirling flow forming body 5 to become full, and the time is measured in advance and stored in the microcomputer 4A.

微電腦4A,是規定時間未經過情況時(步驟Sb3:NO)就待機,規定時間經過的話(即迴旋流形成體5的凹部52是成為滿水的話)(步驟Sb3:YES),將電磁閥2A控制,透過導入口57將朝迴旋流形成體5的液體的供給停止,並且將電磁閥2B控制,透過供給口61開始朝迴旋流形成體5的液體的供給(步驟Sb4)。此結果,液體是從設在凹部52的內周側面的吐出口54朝凹部52內被供給,在凹部52內形成迴旋流。在此狀態下,與迴旋流形成體5的端面53相面對若板狀構件存在的話,在迴旋流形成體5及板狀構件之間負壓會發生,藉由此負壓使板狀構件藉由迴旋流形成體5被吸引地保持。 When the predetermined time has not elapsed (step Sb3: NO), the microcomputer 4A waits for a predetermined period of time (that is, when the concave portion 52 of the swirling flow forming body 5 is full) (step Sb3: YES), the solenoid valve 2A is used. Control, the supply of the liquid to the swirling flow forming body 5 is stopped through the introduction port 57, and the solenoid valve 2B is controlled to start the supply of the liquid to the swirling flow forming body 5 through the supply port 61 (step Sb4). As a result, the liquid is supplied from the discharge port 54 provided on the inner peripheral side surface of the recess 52 into the recess 52, and a swirling flow is formed in the recess 52. In this state, if the plate-like member is present in contact with the end surface 53 of the swirling flow forming body 5, a negative pressure occurs between the swirling flow forming body 5 and the plate-like member, whereby the plate-like member is caused by the negative pressure. The swirling flow forming body 5 is held by suction.

以上說明藉由微電腦4A被實行的控制動作。 The control operation performed by the microcomputer 4A is explained above.

依據以上說明的本實施例的控制動作的話,因為在凹部52內形成迴旋流之前將凹部52內滿水,其後形成迴旋流,所以與第1實施例同樣地,與在凹部52內是空的狀態開始迴旋流的形成的情況相比較,可以獲得較高的吸引壓。且,依據本實施例的控制動作的話,板狀構件的搬運中,因為迴旋流形成體5的凹部52內是藉被液體裝滿,所以與第1實施例同樣地,水印的形成被防止。 According to the control operation of the present embodiment described above, since the recessed portion 52 is filled with water before the swirling flow is formed in the recess 52, and then the swirling flow is formed, it is empty in the recess 52 as in the first embodiment. In comparison with the case where the state begins to form a swirling flow, a higher suction pressure can be obtained. Further, in the conveyance of the plate-shaped member, since the inside of the concave portion 52 of the swirling flow forming body 5 is filled with liquid, the formation of the watermark is prevented as in the first embodiment.

3.第3實施例 3. Third Embodiment

第12圖,是顯示本發明的第3實施例的迴旋流形成體7的一例的立體圖。第13圖,是第12圖的E-E線剖面圖。第14圖,是第12圖的F-F線剖面圖。迴旋流形成體7,是將半導體晶圓和玻璃基板等的板狀構件保持地搬運用的裝置。迴旋流形成體7,是藉由將液體吐出在與板狀構件之間發生負壓將該構件保持。在此的液體,是例如純水和碳酸水。迴旋流形成體7的材質,是例如鋁合金。此迴旋流形成體7,是本發明的「保持裝置」的一例。 Fig. 12 is a perspective view showing an example of the swirling flow forming body 7 of the third embodiment of the present invention. Fig. 13 is a sectional view taken along line E-E of Fig. 12. Fig. 14 is a cross-sectional view taken along line F-F of Fig. 12. The whirling flow forming body 7 is a device for holding a plate-shaped member such as a semiconductor wafer or a glass substrate. The swirling flow forming body 7 holds the member by discharging a liquid and generating a negative pressure between the plate member. The liquid here is, for example, pure water and carbonated water. The material of the swirling flow forming body 7 is, for example, an aluminum alloy. This swirling flow forming body 7 is an example of the "holding device" of the present invention.

迴旋流形成體7,是如第12圖乃至第14圖所 示,具備:本體71、及凹部72、及端面73、及4個吐出口74a、74b、74c及74d(以下,總稱為「吐出口74」)、及傾斜面75、及4個導入口76a、76b、76c及76d(以下,總稱為「導入口76」)、及4條導入路77a、77b、77c及77d(以下,總稱為「導入路77」)。 The swirling flow forming body 7 is as shown in Fig. 12 to Fig. 14 The main body 71, the concave portion 72, the end surface 73, and the four discharge ports 74a, 74b, 74c, and 74d (hereinafter collectively referred to as "discharge port 74"), the inclined surface 75, and the four introduction ports 76a are provided. 76b, 76c, and 76d (hereinafter, collectively referred to as "introduction port 76"), and four introduction paths 77a, 77b, 77c, and 77d (hereinafter, collectively referred to as "introduction path 77").

本體71,是具有圓柱形狀。端面73,是在本 體71的一的面(具體而言,面向被保持體也就是板狀構件的面)(以下,稱為「底面」)形成平坦狀。凹部72,是具有圓柱形狀,形成於端面73。凹部72,是與本體71同軸地形成。 The body 71 has a cylindrical shape. End face 73, is in this The surface of one of the bodies 71 (specifically, the surface facing the object to be held, that is, the plate-like member) (hereinafter referred to as "bottom surface") is formed in a flat shape. The recess 72 has a cylindrical shape and is formed on the end surface 73. The recess 72 is formed coaxially with the body 71.

4個吐出口74,是各別具有圓形狀,形成於本 體71的面向於凹部72的內周側面。4個吐出口74,是被配置於該內周側面的軸方向中央部。吐出口74a及74c,是彼此相面對地配置。具體而言,被配置成以本體71或是凹部72的中心軸的軸心為中心點對稱。吐出口74b及 74d,是彼此相面對地配置。具體而言,被配置成以本體71或是凹部72的中心軸的軸心為中心點對稱。被供給至迴旋流形成體7的液體是透過各吐出口74朝凹部72內被吐出。 4 discharge outlets 74, each having a round shape, formed in this The body 71 faces the inner peripheral side surface of the recess 72. The four discharge ports 74 are arranged in the axial center portion on the inner circumferential side surface. The discharge ports 74a and 74c are disposed to face each other. Specifically, it is arranged to be point-symmetric about the axis of the central axis of the body 71 or the recess 72. Spit outlet 74b and 74d, is configured to face each other. Specifically, it is arranged to be point-symmetric about the axis of the central axis of the body 71 or the recess 72. The liquid supplied to the swirling flow forming body 7 is discharged into the concave portion 72 through the respective discharge ports 74.

傾斜面75,是形成於凹部72的開口部。4個 導入口76,是各別具有圓形狀,形成於本體71的外周側面。4個導入口76,是藉由後述的液體供給泵3B及例如管被連接,液體是透過此導入口76朝本體71內被供給。 The inclined surface 75 is an opening formed in the concave portion 72. 4 The inlets 76 are each formed in a circular shape and formed on the outer peripheral side surface of the body 71. The four introduction ports 76 are connected by a liquid supply pump 3B to be described later, for example, a pipe, and the liquid is supplied into the body 71 through the introduction port 76.

4條導入路77,是對於端面73大致平行,且 對於凹部72的外周朝切線方向延伸形成。各導入路77,是將吐出口74及導入口76連結。具體而言,導入路77a,是將吐出口74a及導入口76a連結,導入路77b,是將吐出口74b及導入口76b連結,導入路77c,是將吐出口74c及導入口76c連結,導入路77,是將吐出口74d及導入口76d連結。 The four introduction paths 77 are substantially parallel to the end faces 73, and The outer circumference of the concave portion 72 is formed to extend in the tangential direction. Each of the introduction paths 77 connects the discharge port 74 and the introduction port 76. Specifically, the introduction path 77a is connected to the discharge port 74a and the introduction port 76a, and the introduction path 77b is connected to the discharge port 74b and the introduction port 76b, and the introduction path 77c is connected to the discharge port 74c and the introduction port 76c. The path 77 connects the discharge port 74d and the introduction port 76d.

各導入路77,是彼此平行延伸地配置。導入 路77a及導入路77d,是被配置於同一直線上,導入路77b及導入路77d,是被配置於同一直線上。導入路77a及77c,是在凹部72內將液體吐出,在凹部72內,形成從迴旋流形成體7的底面側所見朝逆時針繞轉的迴旋流。 導入路77b及77d,是在凹部72內將液體吐出,在凹部72內,形成從迴旋流形成體7的底面側所見朝順時針繞轉的迴旋流。各導入路77,是本發明的「液體通路」的一例。尤其是,導入路77a及77c,是本發明的「第3流 體通路」的一例,導入路77b及77d,是本發明的「第4流體通路」的一例。 Each of the introduction paths 77 is arranged to extend in parallel with each other. Import The road 77a and the introduction path 77d are arranged on the same straight line, and the introduction path 77b and the introduction path 77d are arranged on the same straight line. The introduction paths 77a and 77c discharge the liquid in the concave portion 72, and in the concave portion 72, a swirling flow which is rotated counterclockwise as seen from the bottom surface side of the swirling flow formation body 7 is formed. The introduction paths 77b and 77d discharge the liquid in the concave portion 72, and in the concave portion 72, a swirling flow which is rotated clockwise from the bottom surface side of the swirling flow formation body 7 is formed. Each of the introduction paths 77 is an example of the "liquid passage" of the present invention. In particular, the introduction paths 77a and 77c are the "third stream" of the present invention. In the example of the body passage, the introduction paths 77b and 77d are examples of the "fourth fluid passage" of the present invention.

對於以上說明的迴旋流形成體7,液體是透過 例如導入口76a及76c被供給的話,該液體,是通過導入路77從吐出口74a及74c朝凹部72內被吐出。朝凹部72被吐出的液體,是在凹部72內成為迴旋流地被整流,其後,從凹部72的開口部流出。此時,與端面73相面對若板狀構件存在的情況時,朝凹部72內的外部流體(例如空氣)的流入被限制,藉由迴旋流的離心力及挾帶效果,迴旋流中心部的每單位體積的流體分子的密度會變小,負壓會發生。此結果,板狀構件是藉由周圍的流體被推壓朝端面73側被挪近。另一方面,隨著端面73及板狀構件的距離接近,從凹部72內流出的液體的量被限制,從吐出口74a及74c朝凹部72內被吐出的液體的速度會變慢,迴旋流中心部的壓力會上昇。此結果,板狀構件不會與端面73接觸,在板狀構件及端面73之間被保持一定的距離。 For the swirling flow forming body 7 described above, the liquid is permeated For example, when the inlets 76a and 76c are supplied, the liquid is discharged from the discharge ports 74a and 74c into the recess 72 through the introduction path 77. The liquid discharged into the concave portion 72 is rectified as a swirling flow in the concave portion 72, and then flows out from the opening portion of the concave portion 72. At this time, when the plate-like member exists in contact with the end surface 73, the inflow of the external fluid (for example, air) into the recess 72 is restricted, and the centrifugal force and the entrainment effect of the swirling flow are at the center of the swirling flow. The density of fluid molecules per unit volume becomes smaller and negative pressure occurs. As a result, the plate-like member is moved toward the end surface 73 side by the surrounding fluid being pushed. On the other hand, as the distance between the end surface 73 and the plate-like member approaches, the amount of liquid flowing out from the concave portion 72 is restricted, and the velocity of the liquid discharged from the discharge ports 74a and 74c toward the concave portion 72 becomes slow, and the swirling flow The pressure in the center will rise. As a result, the plate member does not come into contact with the end surface 73, and is held at a constant distance between the plate member and the end surface 73.

第15圖,是顯示包含迴旋流形成體7的搬運 系統300的電路構成的一例的圖。如第15圖所示,迴旋流形成體7的導入口76a及76c,是藉由例如管,透過電磁閥2C與液體供給泵3B連接。另一方面,導入口76b及76d,是藉由例如管,透過電磁閥2D與液體供給泵3B連接。電磁閥2C及2D,是各別與微電腦4B連接。 Figure 15 is a view showing the conveyance including the swirling flow forming body 7. A diagram of an example of the circuit configuration of the system 300. As shown in Fig. 15, the introduction ports 76a and 76c of the swirling flow forming body 7 are connected to the liquid supply pump 3B through a solenoid valve 2C by, for example, a tube. On the other hand, the introduction ports 76b and 76d are connected to the liquid supply pump 3B through the electromagnetic valve 2D by, for example, a tube. The solenoid valves 2C and 2D are individually connected to the microcomputer 4B.

電磁閥2C及2D,是依據從微電腦4B被輸出 的導通斷開控制訊號,許可或遮斷從液體供給泵3B被供給的液體的通過。微電腦4B,是隨著規定的程式對於電磁閥2C及2D將導通斷開控制訊號輸出,將對於迴旋流形成體7的液體的供給控制。此微電腦4B,是本發明的「控制裝置」的一例。 Solenoid valves 2C and 2D are output from the microcomputer 4B The conduction of the disconnection control signal permits or interrupts the passage of the liquid supplied from the liquid supply pump 3B. The microcomputer 4B controls the supply of the liquid to the swirling flow forming body 7 by outputting the on/off control signal to the solenoid valves 2C and 2D in accordance with a predetermined program. This microcomputer 4B is an example of the "control device" of the present invention.

第16圖,是顯示藉由微電腦4B被實行的控 制動作的一例的流程圖。此控制動作,是在大氣中藉由迴旋流形成體7吸引板狀構件地保持搬運時被實行。又,在本動作的說明中,假定在迴旋流形成體7的凹部72的開口部為朝天方向的狀態下(換言之,其凹部72朝與垂直方向相反方向開口的狀態)吸引板狀構件地搬運的情況。 Figure 16 shows the control that is implemented by the microcomputer 4B. A flowchart of an example of a system operation. This control operation is carried out while holding and transporting the plate-shaped member by the swirling flow forming body 7 in the atmosphere. In the description of the operation, it is assumed that the opening of the concave portion 72 of the swirling flow forming body 7 is in the direction of the sky (in other words, the concave portion 72 is opened in a direction opposite to the vertical direction). Case.

在本控制動作的步驟Sc1中微電腦4B,是將 電磁閥2C及2D控制,透過導入口76a~76d開始朝迴旋流形成體7的液體的供給。此結果,透過導入口76a及76c被供給至凹部72內的液體,是欲從迴旋流形成體7的底面側所見形成朝逆時針繞轉的迴旋流,對於此,透過導入口76b及76d朝凹部72內被供給的液體,是從迴旋流形成體7的底面側所見欲形成朝順時針繞轉的迴旋流。 其結果,兩者的流動相互抵消,在凹部72內未形成迴旋流。 In step Sc1 of this control action, the microcomputer 4B is The solenoid valves 2C and 2D control the supply of the liquid to the swirling flow forming body 7 through the introduction ports 76a to 76d. As a result, the liquid supplied into the concave portion 72 through the introduction ports 76a and 76c is a swirling flow that is formed to be reversed from the bottom surface side of the swirling flow forming body 7, and the through-inlet ports 76b and 76d are The liquid supplied into the recessed portion 72 is a swirling flow which is formed to be formed clockwise around the bottom surface side of the swirling flow forming body 7. As a result, the flows of the two cancel each other out, and no swirling flow is formed in the concave portion 72.

接著,微電腦4B,是開始由正時器計時(步 驟Sc2)。且,微電腦4B,是判斷是否經過了規定時間(步驟Sc3)。此規定時間,是迴旋流形成體7的凹部72成為滿水為止所需要的時間,該時間被預先測量,被記憶 於微電腦4B。 Then, the microcomputer 4B is started by the timer (step) Step Sc2). Further, the microcomputer 4B determines whether or not a predetermined time has elapsed (step Sc3). The predetermined time is the time required for the concave portion 72 of the swirling flow forming body 7 to become full, and the time is measured in advance and is memorized. On the microcomputer 4B.

微電腦4B,是規定時間未經過情況時(步驟 Sc3:NO)就待機,規定時間經過的話(即迴旋流形成體7的凹部72是成為滿水的話)(步驟Sc3:YES),電磁閥2C是在維持開狀態的狀態,將電磁閥2D控制,透過導入口76b及76d停止朝迴旋流形成體7供給液體(步驟Sc4)。此結果,液體只有透過導入口76a及76c被供給至凹部72中,在凹部72內形成迴旋流。在此狀態下,與迴旋流形成體7的端面73相面對若板狀構件存在的話,在迴旋流形成體7及板狀構件之間負壓會發生,藉由此負壓使板狀構件藉由迴旋流形成體7被吸引地保持。 Microcomputer 4B, when the specified time has not passed (step When the predetermined time elapses (ie, the concave portion 72 of the swirling flow forming body 7 is full) (step Sc3: YES), the solenoid valve 2C is maintained in the open state, and the solenoid valve 2D is controlled. The supply of the liquid to the swirling flow forming body 7 is stopped through the introduction ports 76b and 76d (step Sc4). As a result, the liquid is supplied into the concave portion 72 only through the introduction ports 76a and 76c, and a swirling flow is formed in the concave portion 72. In this state, if the plate-like member is present in contact with the end surface 73 of the swirling flow forming body 7, a negative pressure is generated between the swirling flow forming body 7 and the plate-like member, whereby the plate-like member is caused by the negative pressure. The swirling flow forming body 7 is held by suction.

以上說明藉由微電腦4B被實行的控制動作。 The control operation performed by the microcomputer 4B is explained above.

依據以上說明的本實施例的控制動作的話, 因為在凹部72內形成迴旋流之前使凹部72內滿水,其後形成迴旋流,所以與第1及第2實施例同樣地,與凹部72內是空的狀態開始迴旋流的形成的情況相比較,可以獲得較高的吸引壓。且,依據本實施例的控制動作的話,板狀構件的搬運中,因為迴旋流形成體7的凹部72內是藉被液體裝滿,所以與第1及第2實施例同樣地,水印的形成被防止。 According to the control action of the embodiment described above, In the case where the concave portion 72 is filled with water before the swirling flow is formed in the concave portion 72, and the swirling flow is formed thereafter, similarly to the first and second embodiments, the formation of the swirling flow is started in a state where the concave portion 72 is empty. In comparison, a higher suction pressure can be obtained. Further, in the conveyance of the plate-shaped member, since the inside of the concave portion 72 of the swirling flow forming body 7 is filled with liquid, the watermark is formed in the same manner as in the first and second embodiments. Being prevented.

4.變形例 4. Modifications

上述的各實施例,是如以下地變形也可以。且,以下的2以上的變形例,是彼此之間組合也可以。 Each of the above embodiments may be modified as follows. Further, the following two or more modifications may be combined with each other.

4-1.變形例1 4-1. Modification 1

上述的第1實施例的迴旋流形成體1,是依據板狀構件的尺寸,在板狀的框架安裝複數使用也可以。第17圖,是顯示本變形例的搬運裝置10的構成的一例的圖。 具體而言,第17圖(a),是搬運裝置10的底面圖,第17圖(b),是搬運裝置10的側面圖。搬運裝置10,是如第17圖所示,具備:基體101、及12個迴旋流形成體1、及12個摩擦構件102、及6個孔部103。 The swirling flow forming body 1 of the above-described first embodiment may be used in a plurality of plate-shaped frames depending on the size of the plate-shaped member. FIG. 17 is a view showing an example of the configuration of the conveying device 10 of the present modification. Specifically, Fig. 17(a) is a bottom view of the transport device 10, and Fig. 17(b) is a side view of the transport device 10. As shown in Fig. 17, the conveying device 10 includes a base body 101, twelve swirling flow forming bodies 1, twelve friction members 102, and six hole portions 103.

基體101,是具有圓板形狀。基體101的材 質,是例如鋁合金。12個迴旋流形成體1,是設於基體101的一的面(具體而言,與被保持體也就是板狀構件W相面對的面)(以下,稱為「底面」)。12個迴旋流形成體1,是在該底面,被配置於同一的圓的周上。12個迴旋流形成體1,是沿著基體101的外周被配置成等間隔。 The base 101 has a circular plate shape. Substrate 101 The quality is, for example, an aluminum alloy. The twelve swirling flow forming bodies 1 are provided on one surface of the base body 101 (specifically, a surface facing the held body, that is, the plate-shaped member W) (hereinafter referred to as "bottom surface"). The twelve swirling flow forming bodies 1 are arranged on the bottom surface of the same circle. The twelve swirling flow forming bodies 1 are arranged at equal intervals along the outer circumference of the base body 101.

12個摩擦構件102,是各別具有圓柱形狀,設 於基體101的底面。12個摩擦構件102,是在該底面,在與配置有迴旋流形成體1的相同的圓的周上被配置成等間隔。2個迴旋流形成體1之間配置有1個摩擦構件102。 各摩擦構件102,是與被保持體也就是板狀構件W的表面接觸,藉由在與該表面之間發生的摩擦力防止板狀構件W的移動的構件。各摩擦構件102的材質,是例如氟橡膠。 6個孔部103,是設在基體101的大致角圓長方形的貫通孔。6個孔部103,是在基體101在同一的圓的周上被配 置成等間隔。孔部103被配置於其周上的圓,是與迴旋流形成體1被配置於其周上的圓同心。孔部103是被配置於比迴旋流形成體1更靠近基體101表面的中心。 12 friction members 102 each having a cylindrical shape and On the bottom surface of the base 101. The twelve friction members 102 are disposed on the bottom surface at equal intervals on the circumference of the same circle as the swirling flow formation body 1 disposed. One friction member 102 is disposed between the two swirling flow formation bodies 1. Each of the friction members 102 is a member that comes into contact with the surface of the body to be held, that is, the plate member W, and prevents the movement of the plate member W by the frictional force generated between the friction members 102. The material of each friction member 102 is, for example, fluororubber. The six hole portions 103 are through holes having a substantially rectangular shape and a rectangular shape provided in the base body 101. The six hole portions 103 are arranged on the circumference of the same circle on the base 101. Set at equal intervals. The hole 103 is disposed on a circumference of the circle, and is concentric with a circle on which the swirling flow forming body 1 is disposed. The hole portion 103 is disposed closer to the center of the surface of the base 101 than the swirling flow forming body 1.

又,在搬運裝置10中,可取代迴旋流形成體1,而安裝第2實施例的迴旋流形成體5、或第3實施例的迴旋流形成體7也可以。 Further, in the conveying device 10, the swirling flow forming body 5 of the second embodiment or the swirling flow forming body 7 of the third embodiment may be attached instead of the swirling flow forming body 1.

4-2.變形例2 4-2. Modification 2

在上述的變形例1中,搬運裝置10的形狀被變更也可以。第18圖,是顯示本變形例的搬運裝置20的構成的一例的圖。具體而言,第18圖(a),是搬運裝置20的底面圖,第18圖(b),是搬運裝置20的側面圖。搬運裝置20,是如第18圖所示,具備:基體201、及10個迴旋流形成體1、及12個摩擦構件102A。 In the first modification described above, the shape of the conveying device 10 may be changed. FIG. 18 is a view showing an example of the configuration of the conveying device 20 of the present modification. Specifically, Fig. 18(a) is a bottom view of the conveying device 20, and Fig. 18(b) is a side view of the conveying device 20. As shown in Fig. 18, the conveying device 20 includes a base body 201, ten swirling flow forming bodies 1, and twelve friction members 102A.

基體201,是二叉形狀的板狀構件,由:矩形的把持部2011、及從把持部2011分岐的2個腕部2012所構成。基體201的材質,是例如鋁合金。10個迴旋流形成體1,是設於構成基體201的2個腕部2012的一的面(具體而言,與被保持體也就是板狀構件W相面對的面)(以下,稱為「底面」)。10個迴旋流形成體1,是在2個腕部2012中,被配置於同一的圓的周上。各腕部2012的5個迴旋流形成體1被配置成等間隔。 The base 201 is a bifurcated plate-shaped member, and is composed of a rectangular grip portion 2011 and two wrist portions 2012 branched from the grip portion 2011. The material of the base 201 is, for example, an aluminum alloy. The ten swirling flow forming bodies 1 are provided on one surface of the two wrist portions 2012 constituting the base body 201 (specifically, a surface facing the held body, that is, the plate-shaped member W) (hereinafter, referred to as "Bottom"). The ten swirling flow forming bodies 1 are arranged on the circumference of the same circle in the two wrists 2012. The five swirling flow formation bodies 1 of the respective wrist portions 2012 are arranged at equal intervals.

12個摩擦構件102A,是板狀的構件,設於2個腕部2012的底面。12個摩擦構件102A,是在該底面, 被配置於與配置有迴旋流形成體1的相同的圓的周上。在各腕部2012中,藉由2個摩擦構件102A將1個迴旋流形成體1挾持地配置。各摩擦構件102A,是與被搬運物也就是板狀構件W的表面接觸,藉由在與該表面之間發生的摩擦力防止板狀構件的移動。各摩擦構件102A的材質,是例如氟橡膠。 The twelve friction members 102A are plate-shaped members and are provided on the bottom surfaces of the two wrist portions 2012. 12 friction members 102A are on the bottom surface, It is disposed on the circumference of the same circle as the swirling flow forming body 1 is disposed. In each of the wrist portions 2012, one of the swirling flow formation bodies 1 is held by the two friction members 102A. Each of the friction members 102A is in contact with the surface of the object to be conveyed, that is, the plate member W, and the movement of the plate member is prevented by the frictional force generated between the friction members 102A. The material of each friction member 102A is, for example, fluororubber.

又,在搬運裝置20中,可取代迴旋流形成體 1,而安裝第2實施例的迴旋流形成體5、或第3實施例的迴旋流形成體7也可以。 Moreover, in the conveying device 20, the swirling flow forming body can be replaced 1. The swirling flow forming body 5 of the second embodiment or the swirling flow forming body 7 of the third embodiment may be attached.

4-3.變形例3 4-3. Modification 3

在上述的各實施例的控制動作中,假定使迴旋流形成體的凹部的開口部成為朝天方向的方式將板狀構件搬運的情況,但是將板狀構件搬運時的迴旋流形成體的姿勢不限於此。例如,在迴旋流形成體的凹部是朝垂直方向開口的狀態將板狀構件搬運也可以。或是在迴旋流形成體的凹部是對於垂直方向朝規定的角度傾斜的方向開口的狀態將板狀構件搬運也可以。這些的情況,在迴旋流形成體的凹部成為滿水的過程中,迴旋流形成體的端部及板狀構件表面之間的距離,是比例如吐出口14的剖面積更小的方式將板狀構件對於迴旋流形成體配置也可以。或是使迴旋流形成體的端部及板狀構件表面之間的間隙的體積比流量更小的方式將板狀構件對於迴旋流形成體配置也可以。 In the control operation of each of the above-described embodiments, the plate-shaped member is conveyed so that the opening of the concave portion of the swirling flow forming body is oriented in the sky direction. However, the posture of the swirling flow forming body when the plate-shaped member is conveyed is not Limited to this. For example, the plate-shaped member may be conveyed in a state where the concave portion of the swirling flow forming body is opened in the vertical direction. Alternatively, the plate-shaped member may be conveyed in a state in which the concave portion of the swirling flow forming body is opened in a direction in which the vertical direction is inclined at a predetermined angle. In the case where the concave portion of the swirling flow forming body is full, the distance between the end portion of the swirling flow forming body and the surface of the plate-like member is smaller than the sectional area of the discharge port 14, for example. The member may be arranged for the swirling flow forming body. Alternatively, the plate-like member may be disposed on the swirling flow forming body such that the volume of the gap between the end portion of the swirling flow forming body and the surface of the plate-like member is smaller than the flow rate.

4-4.變形例4 4-4. Modification 4

在上述的各實施例的控制動作中,雖將迴旋流形成體的凹部內滿水後在凹部內形成迴旋流,但是凹部內不一定必要成為滿水。例如,將凹部內的一半由液體裝滿後形成迴旋流也可以。或是至少流體通路的吐出口是由液體覆蓋程度將凹部內由液體裝滿後形成迴旋流也可以。依據本發明的發明人的實驗可確認,即使凹部內未滿水,某程度的量的液體被裝滿的話,吸引壓會對應該量變高。 In the control operation of each of the above-described embodiments, the swirling flow is formed in the concave portion of the swirling flow forming body, and the swirling flow is not necessarily formed in the concave portion. For example, it is also possible to form a swirling flow by filling one half of the recess with a liquid. Alternatively, at least the discharge port of the fluid passage may be filled with liquid by the degree of liquid coverage to form a swirling flow. According to the experiment of the inventors of the present invention, it has been confirmed that even if a certain amount of liquid is filled in the concave portion, the amount of suction pressure becomes high.

4-5.變形例5 4-5. Modification 5

在上述的各實施例的控制動作中,將迴旋流形成體的凹部內成為滿水為止所需要的時間預先測量好,其時間經過時判斷凹部內成為滿水,但是由感測器檢出實際凹部內的液面的高度,其高度是達到規定量時判斷凹部內成為滿水也可以。例如,使用超音波式的液面檢出感測器,檢出凹部內是否成為滿水也可以。 In the control operation of each of the above-described embodiments, the time required for the inside of the concave portion of the swirling flow forming body to be full of water is measured in advance, and when the time passes, it is judged that the inside of the concave portion is full, but the actual value is detected by the sensor. When the height of the liquid surface in the recess is a predetermined amount, it is judged that the inside of the recess is full. For example, it is also possible to detect whether or not the inside of the concave portion is full of water by using an ultrasonic liquid level detecting sensor.

4-6.變形例6 4-6. Modification 6

在上述的各實施例中藉由微電腦4、4A或是4B被實行的程式,是在被記憶在磁帶、磁碟片、軟碟(FD)、光碟片、光磁碟(MO)、記憶體等的記憶媒體的狀態下被提供也可以。且,該程式,是透過網際網路等的通訊路線被下載也可以。 In the above embodiments, the program executed by the microcomputer 4, 4A or 4B is memorized in a magnetic tape, a magnetic disk, a floppy disk (FD), a compact disk, a magnetic disk (MO), a memory. It is also possible to provide the state of the memory medium. Moreover, the program can be downloaded through a communication route such as the Internet.

4-7.變形例7 4-7. Modification 7

上述的第1實施例的迴旋流形成體1的本體11的形狀,不限定於圓柱角柱和橢圓柱也可以。且,設於迴旋流形成體1的吐出口14的位置,不限於凹部12的內周側面的軸方向中央部。且,設於迴旋流形成體1的供給路19的數量不限定於2條,1條或3條以上也可以。且,供給路19,對於凹部12的外周的進入方向,不限於切線方向。且,不設置傾斜面15也可以(即端面13的端部不形成倒角也可以)。以上述及的變形,是採用於第2實施例的迴旋流形成體5、和第3實施例的迴旋流形成體7也可以。 The shape of the body 11 of the swirling flow forming body 1 of the above-described first embodiment is not limited to the cylindrical corner post and the elliptical cylinder. The position of the discharge port 14 provided in the swirling flow forming body 1 is not limited to the axial center portion of the inner circumferential side surface of the concave portion 12. Further, the number of supply passages 19 provided in the swirling flow forming body 1 is not limited to two, and one or three or more may be used. Further, the supply path 19 is not limited to the tangential direction in the direction in which the outer periphery of the concave portion 12 is formed. Further, the inclined surface 15 may not be provided (that is, the end portion of the end surface 13 may not be chamfered). The above-described modifications are the swirling flow forming body 5 of the second embodiment and the swirling flow forming body 7 of the third embodiment.

且第2實施例的迴旋流形成體5的噴出口56的位置,不限於凹部52的底面中央。 The position of the discharge port 56 of the swirling flow forming body 5 of the second embodiment is not limited to the center of the bottom surface of the recess 52.

4-8.變形例8 4-8. Modification 8

上述的搬運裝置10的基體101的構成,不限於上述的變形例1所示的例。且,設於搬運裝置10的基體101的摩擦構件102及孔部103的數量、形狀及配置,不限於上述的變形例1所示的例。這些的要素,可以對應藉由搬運裝置10被搬運的板狀構件W的尺寸、形狀及材質被決定。摩擦構件102及孔部103,不設在原本搬運裝置10的基體101也可以。摩擦構件102未設在搬運裝置10的基體101的情況,在基體101中,為了將板狀構件W的定位,設置周知的定心導引也可以(例如日本特開2005- 51260號公報參照)。同樣地,上述的搬運裝置20的基體201的構成,也不限於上述的變形例2所示的例。 The configuration of the base 101 of the above-described conveyance device 10 is not limited to the example shown in the above-described modification 1. The number, shape, and arrangement of the friction member 102 and the hole portion 103 provided in the base 101 of the conveying device 10 are not limited to the examples shown in the above-described first modification. These elements can be determined in accordance with the size, shape, and material of the plate-shaped member W conveyed by the conveyance device 10. The friction member 102 and the hole portion 103 may not be provided in the base body 101 of the original conveying device 10. In the case where the friction member 102 is not provided in the base 101 of the conveying device 10, in the base 101, in order to position the plate-like member W, a well-known centering guide may be provided (for example, JP-A-2005- Reference No. 51260). Similarly, the configuration of the base 201 of the above-described conveying device 20 is not limited to the example shown in the above-described modification 2.

4-9.變形例9 4-9. Modification 9

設於上述的搬運裝置10的基體101的迴旋流形成體1的數量、構成及配置,不限於上述的變形例1所示的例。這些的要素,可以對應藉由搬運裝置10被搬運的板狀構件W的尺寸、形狀及材質被決定。例如,迴旋流形成體1的數量是12個未滿或13個以上也可以。且,迴旋流形成體1,是沿著基體101的外周被2列以上並列也可以。同樣地,設於上述的搬運裝置20的基體201的迴旋流形成體5的數量、構成及配置,也不限於上述的變形例2所示的例。 The number, configuration, and arrangement of the swirling flow forming bodies 1 provided in the base body 101 of the above-described conveying device 10 are not limited to the examples shown in the above-described first modification. These elements can be determined in accordance with the size, shape, and material of the plate-shaped member W conveyed by the conveyance device 10. For example, the number of the swirling flow forming bodies 1 may be 12 or less or 13 or more. Further, the swirling flow forming body 1 may be arranged in two or more rows along the outer circumference of the base body 101. Similarly, the number, configuration, and arrangement of the swirling flow forming bodies 5 provided in the base body 201 of the above-described conveying device 20 are not limited to the examples shown in the above-described second modification.

4-10.變形例10 4-10. Modification 10

在上述的第2實施例的控制動作中,在步驟Sb1中對於迴旋流形成體5被供給的液體的流量,是第1實施例的第1流量也可以。且,在步驟Sb4中對於迴旋流形成體5被供給的液體的流量,是第1實施例的第2流量也可以。 In the control operation of the second embodiment described above, the flow rate of the liquid supplied to the swirling flow forming body 5 in the step Sb1 may be the first flow rate of the first embodiment. Further, the flow rate of the liquid supplied to the swirling flow forming body 5 in the step Sb4 may be the second flow rate of the first embodiment.

在上述的第3實施例的控制動作中,在步驟Sc1中透過導入口76a及76c對於迴旋流形成體7被供給的液體的流量,是第1實施例的第1流量也可以。且,在步驟Sc4中透過導入口76a及76c對於迴旋流形成體7被供給的液體的流量,是第1實施例的第2流量也可以。 In the control operation of the third embodiment described above, the flow rate of the liquid supplied to the swirling flow forming body 7 through the introduction ports 76a and 76c in the step Sc1 may be the first flow rate of the first embodiment. Further, the flow rate of the liquid supplied to the swirling flow forming body 7 through the introduction ports 76a and 76c in the step Sc4 may be the second flow rate of the first embodiment.

4-11.變形例11 4-11. Modification 11

在上述的第1實施例的迴旋流形成體1中,採用周知的電動風扇也可以(對於電動風扇,是例如日本特開2011-138948號公報參照)。具體而言,將電動風扇,使其旋轉軸與凹部12成為同軸的方式,設在迴旋流形成體1的凹部12內,在控制動作的步驟Sa1停止驅動,在步驟Sa4開始驅動也可以。即,形成迴旋流時將電動風扇驅動也可以。採用電動風扇的情況,第1實施例的吐出口14,是設在凹部12的底面也可以。 In the swirling flow forming body 1 of the above-described first embodiment, a well-known electric fan may be used (for the electric fan, for example, Japanese Laid-Open Patent Publication No. 2011-138948). Specifically, the electric fan is disposed in the concave portion 12 of the swirling flow forming body 1 such that the rotating shaft and the concave portion 12 are coaxial with each other, and the driving is stopped in the step Sa1 of the control operation, and the driving may be started in the step Sa4. That is, the electric fan may be driven when the swirling flow is formed. In the case of using an electric fan, the discharge port 14 of the first embodiment may be provided on the bottom surface of the recessed portion 12.

又,電動風扇,是對於第2實施例的迴旋流形成體5、及第3實施例的迴旋流形成體7也藉由同樣的方法採用也可以。 Further, the electric fan may be used in the same manner as the swirling flow forming body 5 of the second embodiment and the swirling flow forming body 7 of the third embodiment.

1‧‧‧迴旋流形成體 1‧‧‧ whirlpool formation

11‧‧‧本體 11‧‧‧Ontology

12‧‧‧凹部 12‧‧‧ recess

14‧‧‧吐出口 14‧‧‧Exporting

17‧‧‧環狀通路 17‧‧‧Circular access

19‧‧‧供給路 19‧‧‧Supply road

Claims (5)

一種控制裝置,是控制對於藉由將液體吐出使在與被保持體之間發生負壓將前述被保持體保持的保持裝置的液體的供給用,前述保持裝置,是具備:柱狀的本體、及形成於前述本體且面向前述被保持體的平坦狀的端面、及形成於前述端面的凹部、及朝前述凹部內透過吐出口將液體吐出的1以上的流體通路,前述控制裝置,是在前述凹部內未形成有迴旋流的狀態下,以直到前述流體通路的吐出口是被液體覆蓋為止將前述凹部內由液體裝滿的方式控制液體的供給,直到前述流體通路的吐出口是被液體覆蓋為止在前述凹部內被液體裝滿之後,以藉由從前述流體通路朝前述凹部內被吐出的液體形成迴旋流的方式控制液體的供給。 A control device for controlling the supply of liquid to a holding device that holds the held body by a negative pressure between the object and the object to be held by the discharge device, wherein the holding device includes a columnar body, And a flat end surface formed on the main body and facing the object to be held, a concave portion formed on the end surface, and one or more fluid passages for discharging the liquid through the discharge port in the concave portion, wherein the control device is In a state where the swirling flow is not formed in the recess, the supply of the liquid is controlled so that the discharge in the recess is filled with the liquid until the discharge port of the fluid passage is covered with the liquid until the discharge port of the fluid passage is covered with the liquid. After the liquid is filled in the concave portion, the supply of the liquid is controlled such that the swirling flow is formed by the liquid discharged from the fluid passage into the concave portion. 如申請專利範圍第1項所記載的控制裝置,其中,前述控制裝置,是將被供給至前述凹部內的液體的流量設定成第1量,在前述凹部內未形成有迴旋流的狀態下,直到前述流體通路的吐出口是被液體覆蓋為止在前述凹部內由液體裝滿, 直到前述流體通路的吐出口是被液體覆蓋為止在前述凹部內被液體裝滿之後,將被供給至前述凹部內的液體的流量從前述第1量,朝比前述第1量更多的第2量變更,藉由從前述流體通路朝前述凹部內被吐出的液體形成迴旋流。 The control device according to claim 1, wherein the control device sets a flow rate of the liquid supplied into the concave portion to a first amount, and a swirling flow is not formed in the concave portion. Until the discharge port of the fluid passage is covered by the liquid, the liquid is filled in the recess. After the discharge port of the fluid passage is filled with the liquid in the recessed portion until the discharge port of the fluid passage is covered with the liquid, the flow rate of the liquid supplied into the recessed portion is from the first amount to the second amount larger than the first amount. The amount is changed, and a swirling flow is formed by the liquid discharged from the fluid passage toward the inside of the recess. 如申請專利範圍第1項所記載的控制裝置,其中,前述1以上的流體通路,是包含:從設在前述凹部的底面的第1吐出口將液體吐出的第1流體通路、及從設在前述凹部的內周側面的第2吐出口將液體吐出的第2流體通路,前述控制裝置,是透過前述第1流體通路朝前述凹部內供給液體,在前述凹部內未形成有迴旋流的狀態下,直到前述第2吐出口是被液體覆蓋為止將前述凹部內由液體裝滿,直到前述第2吐出口是被液體覆蓋為止在前述凹部內被液體裝滿之後,停止透過前述第1流體通路供給液體,透過前述第2流體通路朝前述凹部內供給液體使形成迴旋流。 The control device according to the first aspect of the invention, wherein the one or more fluid passages include a first fluid passage that discharges liquid from a first discharge port provided on a bottom surface of the recessed portion, and a second fluid passage that discharges the liquid from the second discharge port on the inner circumferential side surface of the concave portion, and the control device supplies the liquid into the concave portion through the first fluid passage, and the swirling flow is not formed in the concave portion. Until the second discharge port is covered with the liquid, the inside of the recess is filled with the liquid, and after the second discharge port is covered with the liquid, the liquid is filled in the recess, and then the first fluid passage is stopped. The liquid is supplied into the recess through the second fluid passage to form a swirling flow. 如申請專利範圍第1項所記載的控制裝置,其中,前述1以上的流體通路,是包含:從設在前述凹部的內周側面的第3吐出口將液體吐出 而形成第1迴旋流的第3流體通路、及從設在前述凹部的前述內周側面的第4吐出口將液體吐出,形成朝與前述第1迴旋流的繞轉方向相反方向繞轉的第2迴旋流的第4流體通路,前述控制裝置,是透過前述第3及第4流體通路朝前述凹部內供給液體,在前述凹部內未形成有迴旋流的狀態下,以直到前述第3吐出口是被液體覆蓋為止將前述凹部內由液體裝滿的方式控制液體的供給,直到前述第3吐出口是被液體覆蓋為止在前述凹部內被液體裝滿之後,在維持透過前述第3流體通路供給液體的狀態,停止透過前述第4流體通路供給液體,藉由從前述第3流體通路朝前述凹部內被吐出的液體使形成迴旋流。 The control device according to the first aspect of the invention, wherein the one or more fluid passages include discharging liquid from a third discharge port provided on an inner circumferential side surface of the concave portion The third fluid passage that forms the first swirling flow and the fourth discharge port that is provided on the inner circumferential side surface of the recessed portion discharge the liquid to form a direction that is reversed in a direction opposite to the winding direction of the first swirling flow. In the fourth fluid passage of the swirling flow, the control device supplies the liquid into the concave portion through the third and fourth fluid passages, and the swirling flow is not formed in the concave portion until the third discharge port The supply of the liquid is controlled such that the liquid is filled in the recessed portion by the liquid, and the third discharge port is filled with the liquid in the recessed portion after the third discharge port is covered with the liquid, and then the third fluid passage is continuously supplied through the third fluid passage. In the state of the liquid, the supply of the liquid through the fourth fluid passage is stopped, and the swirling flow is formed by the liquid discharged from the third fluid passage into the recess. 一種控制方法,是控制對於藉由將液體吐出在與被保持體之間發生負壓將前述被保持體保持的保持裝置的液體的供給用的控制方法,前述保持裝置,是具備:柱狀的本體、及形成於前述本體且面向前述被保持體的平坦狀的端面、及形成於前述端面的凹部、及朝前述凹部內透過吐出口將液體吐出的1以上的流體 通路,前述控制方法,是具有:在前述凹部內未形成有迴旋流的狀態下,以直到前述流體通路的吐出口是被液體覆蓋為止將前述凹部內由液體裝滿的方式控制液體的供給的步驟;及直到前述流體通路的吐出口是被液體覆蓋為止在前述凹部內被液體裝滿之後,以藉由從前述流體通路朝前述凹部內被吐出的液體形成迴旋流的方式控制液體的供給步驟。 A control method for controlling supply of a liquid to a holding device that holds the liquid to be held by the holding body by a negative pressure between the liquid and the object to be held, wherein the holding device includes a columnar shape a main body and a flat end surface formed on the main body and facing the held body, a concave portion formed on the end surface, and one or more fluids that discharge the liquid through the discharge port in the concave portion In the above-described control method, the supply of the liquid is controlled such that the inside of the recess is filled with the liquid until the discharge port of the fluid passage is covered with the liquid in a state in which the swirling flow is not formed in the recess. And a step of controlling the supply of the liquid so as to form a swirling flow by the liquid discharged from the fluid passage into the concave portion until the discharge port of the fluid passage is filled with the liquid in the recessed portion; .
TW104123553A 2014-07-23 2015-07-21 Control device and control method TWI569355B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2014149618 2014-07-23

Publications (2)

Publication Number Publication Date
TW201611171A TW201611171A (en) 2016-03-16
TWI569355B true TWI569355B (en) 2017-02-01

Family

ID=55163089

Family Applications (1)

Application Number Title Priority Date Filing Date
TW104123553A TWI569355B (en) 2014-07-23 2015-07-21 Control device and control method

Country Status (3)

Country Link
JP (1) JP5945641B1 (en)
TW (1) TWI569355B (en)
WO (1) WO2016013565A1 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6716136B2 (en) * 2016-05-25 2020-07-01 株式会社ハーモテック Fluid flow former and non-contact transfer device

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW500651B (en) * 2001-02-20 2002-09-01 Harmotec Corp Non-contact transfer device
TW201428881A (en) * 2012-11-30 2014-07-16 尼康股份有限公司 Suction device, carrying method, transport system and exposure device, and component manufacturing method

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0717628A (en) * 1993-06-30 1995-01-20 Sumitomo Sitix Corp Thin plate transport method and apparatus
JPH08264626A (en) * 1994-04-28 1996-10-11 Hitachi Ltd Sample holding method, sample surface fluid treatment method, and apparatus therefor
JP4111479B2 (en) * 1999-09-09 2008-07-02 三益半導体工業株式会社 Wafer rotation holding device
JP2009028862A (en) * 2007-07-27 2009-02-12 Ihi Corp Non-contact carrier
JP2011151233A (en) * 2010-01-22 2011-08-04 Disco Abrasive Syst Ltd Transfer mechanism
JP2013030654A (en) * 2011-07-29 2013-02-07 Kimihiro Eguchi Substrate holding mechanism, semiconductor substrate separation processing apparatus, and separation method of semiconductor substrate
JP6212561B2 (en) * 2013-12-03 2017-10-11 株式会社ハーモテック Holding device
CN105792998A (en) * 2013-12-03 2016-07-20 哈莫技术股份有限公司 Holding device, holding system, control method, and conveyance device
CN105792997A (en) * 2013-12-03 2016-07-20 哈莫技术股份有限公司 transmission equipment

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW500651B (en) * 2001-02-20 2002-09-01 Harmotec Corp Non-contact transfer device
TW201428881A (en) * 2012-11-30 2014-07-16 尼康股份有限公司 Suction device, carrying method, transport system and exposure device, and component manufacturing method

Also Published As

Publication number Publication date
JP5945641B1 (en) 2016-07-05
WO2016013565A1 (en) 2016-01-28
JPWO2016013565A1 (en) 2017-04-27
TW201611171A (en) 2016-03-16

Similar Documents

Publication Publication Date Title
TWI564232B (en) A holding device, a holding system, a control method and a conveying device
TWI557839B (en) Keep the device
TWI481542B (en) Non - contact conveyor
CN107847097B (en) suction device
US10189166B2 (en) Suction equipment
TWI543853B (en) Handling device
EP3470183B1 (en) Rotational flow-forming body and sucking device
TWI569355B (en) Control device and control method
US9911630B2 (en) Apparatus for treating surfaces of wafer-shaped articles
JP2017209752A (en) Fluid flow forming body and non-contact conveyance device
TWI660450B (en) Cyclone forming body and suction device