TWI563550B - Substrate processing method and substrate processing apparatus - Google Patents
Substrate processing method and substrate processing apparatusInfo
- Publication number
- TWI563550B TWI563550B TW104106981A TW104106981A TWI563550B TW I563550 B TWI563550 B TW I563550B TW 104106981 A TW104106981 A TW 104106981A TW 104106981 A TW104106981 A TW 104106981A TW I563550 B TWI563550 B TW I563550B
- Authority
- TW
- Taiwan
- Prior art keywords
- substrate processing
- processing apparatus
- processing method
- substrate
- processing
- Prior art date
Links
- 239000000758 substrate Substances 0.000 title 2
- 238000003672 processing method Methods 0.000 title 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2011001367A JP5701068B2 (en) | 2011-01-06 | 2011-01-06 | Substrate processing apparatus and substrate processing method |
| JP2011016178 | 2011-01-28 | ||
| JP2011222634A JP5801678B2 (en) | 2011-01-28 | 2011-10-07 | Substrate processing method and substrate processing apparatus |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201523712A TW201523712A (en) | 2015-06-16 |
| TWI563550B true TWI563550B (en) | 2016-12-21 |
Family
ID=53935775
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW104106981A TWI563550B (en) | 2011-01-06 | 2011-11-11 | Substrate processing method and substrate processing apparatus |
Country Status (1)
| Country | Link |
|---|---|
| TW (1) | TWI563550B (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9964863B1 (en) | 2016-12-20 | 2018-05-08 | Applied Materials, Inc. | Post exposure processing apparatus |
| JP6896474B2 (en) * | 2017-03-27 | 2021-06-30 | 株式会社Screenホールディングス | Substrate processing equipment and substrate processing method |
| CN114121715B (en) * | 2020-08-31 | 2025-10-24 | 芝浦机械电子株式会社 | Substrate processing device and substrate processing method |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101145502A (en) * | 2006-09-13 | 2008-03-19 | 大日本网目版制造株式会社 | Substrate processing apparatus, liquid film freezing method, and substrate processing method |
-
2011
- 2011-11-11 TW TW104106981A patent/TWI563550B/en not_active IP Right Cessation
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101145502A (en) * | 2006-09-13 | 2008-03-19 | 大日本网目版制造株式会社 | Substrate processing apparatus, liquid film freezing method, and substrate processing method |
Also Published As
| Publication number | Publication date |
|---|---|
| TW201523712A (en) | 2015-06-16 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MM4A | Annulment or lapse of patent due to non-payment of fees |