TWI563030B - Photosensitive resin composition for black matrix, black matrix, color filter and method for manufacturing the same, and liquid crystal display apparatus - Google Patents

Photosensitive resin composition for black matrix, black matrix, color filter and method for manufacturing the same, and liquid crystal display apparatus

Info

Publication number: TWI563030B
Authority: TW; Taiwan
Prior art keywords: black matrix; manufacturing; liquid crystal; crystal display; resin composition
Prior art date: 2014-10-01

Application number

TW103134200A

Other languages

Chinese (zh)

Other versions

TW201614001A (en

Inventor

hao wei Liao

Hung Chia Chou

Original Assignee

Chi Mei Corp

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2014-10-01

Filing date

2014-10-01

Publication date

2016-12-21

2014-10-01 Application filed by Chi Mei Corp filed Critical Chi Mei Corp

2014-10-01 Priority to TW103134200A priority Critical patent/TWI563030B/en

2015-09-18 Priority to CN201510597816.1A priority patent/CN105487336A/en

2015-09-25 Priority to US14/864,909 priority patent/US20160011509A1/en

2016-04-16 Publication of TW201614001A publication Critical patent/TW201614001A/en

2016-12-21 Application granted granted Critical

2016-12-21 Publication of TWI563030B publication Critical patent/TWI563030B/en

Links

239000011159 matrix material Substances 0.000 title 2
239000004973 liquid crystal related substance Substances 0.000 title 1
238000004519 manufacturing process Methods 0.000 title 1
238000000034 method Methods 0.000 title 1
239000011342 resin composition Substances 0.000 title 1

TW103134200A 2014-02-13 2014-10-01 Photosensitive resin composition for black matrix, black matrix, color filter and method for manufacturing the same, and liquid crystal display apparatus TWI563030B (en)

Priority Applications (3)

Application Number	Priority Date	Filing Date	Title
TW103134200A TWI563030B (en)	2014-10-01	2014-10-01	Photosensitive resin composition for black matrix, black matrix, color filter and method for manufacturing the same, and liquid crystal display apparatus
CN201510597816.1A CN105487336A (en)	2014-10-01	2015-09-18	Resin composition, black matrix, optical filter and its manufacturing method, and display device
US14/864,909 US20160011509A1 (en)	2014-02-13	2015-09-25	Photosensitive resin composition for black matrix, black matrix, color filter and method for manufacturing the same, and liquid crystal display apparatus

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
TW103134200A TWI563030B (en)	2014-10-01	2014-10-01	Photosensitive resin composition for black matrix, black matrix, color filter and method for manufacturing the same, and liquid crystal display apparatus

Publications (2)

Publication Number	Publication Date
TW201614001A TW201614001A (en)	2016-04-16
TWI563030B true TWI563030B (en)	2016-12-21

Family

ID=55674402

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
TW103134200A TWI563030B (en)	2014-02-13	2014-10-01	Photosensitive resin composition for black matrix, black matrix, color filter and method for manufacturing the same, and liquid crystal display apparatus

Country Status (2)

Country	Link
CN (1)	CN105487336A (en)
TW (1)	TWI563030B (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
TWI664499B (en) *	2016-06-04	2019-07-01	奇美實業股份有限公司	Black photosensitive resin composition and uses thereof
JP6886782B2 (en) *	2016-06-30	2021-06-16	東京応化工業株式会社	A photosensitive resin composition, a cured film, a bank for partitioning a light emitting layer in an organic EL element, a substrate for an organic EL element, an organic EL element, a method for producing a cured film, a method for producing a bank, and a method for producing an organic EL element.
KR102087261B1 (en) *	2017-02-16	2020-03-10	삼성에스디아이 주식회사	Photosensitive resin composition, black pixel defining layer using the same and display device

Citations (3)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
TW200912537A (en) *	2007-04-25	2009-03-16	Asahi Glass Co Ltd	Photosensitive composition, partition wall, black matrix, and method for producing color filter
TW201418886A (en) *	2012-09-14	2014-05-16	信越化學工業股份有限公司	Chemically amplified photoresist material and pattern forming method
TW201426178A (en) *	2012-12-20	2014-07-01	Chi Mei Corp	Photosensitive resin composition, color filter and liquid crystal display device

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JP5751929B2 (en) *	2010-06-21	2015-07-22	新日鉄住金化学株式会社	Photosensitive resin composition for black resist and color filter light-shielding film
JP5462773B2 (en) *	2010-11-29	2014-04-02	新日鉄住金化学株式会社	Alkali-soluble resin and photosensitive resin composition
US9482946B2 (en) *	2011-03-30	2016-11-01	Hitachi Chemical Company, Ltd.	Photosensitive resin composition, photosensitive element using same, method for forming partition wall of image display device, and method for manufacturing image display device
CN103019031B (en) *	2011-09-22	2017-11-14	东京应化工业株式会社	Photosensitive polymer combination and the film and colour filter for having used said composition
TWI477539B (en) *	2014-02-13	2015-03-21	Chi Mei Corp	Alkali-solutable resin, photosensitive resin composition, color filter and method for manufacturing the same, liquid crystal display apparatus

2014
- 2014-10-01 TW TW103134200A patent/TWI563030B/en not_active IP Right Cessation
2015
- 2015-09-18 CN CN201510597816.1A patent/CN105487336A/en not_active Withdrawn

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
TW200912537A (en) *	2007-04-25	2009-03-16	Asahi Glass Co Ltd	Photosensitive composition, partition wall, black matrix, and method for producing color filter
TW201418886A (en) *	2012-09-14	2014-05-16	信越化學工業股份有限公司	Chemically amplified photoresist material and pattern forming method
TW201426178A (en) *	2012-12-20	2014-07-01	Chi Mei Corp	Photosensitive resin composition, color filter and liquid crystal display device

Also Published As

Publication number	Publication date
TW201614001A (en)	2016-04-16
CN105487336A (en)	2016-04-13

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Legal Events

Date	Code	Title	Description
2021-09-21	MM4A	Annulment or lapse of patent due to non-payment of fees