TWI562684B - - Google Patents

Info

Publication number: TWI562684B
Authority: TW; Taiwan

Application number

TW102121459A

Other languages

Chinese (zh)

Other versions

TW201414361A (en

Inventor

Nozomu Nagashima

Naohiko Okunishi

Kaoru Oohashi

Daisuke Fujiyama

Original Assignee

Tokyo Electron Ltd

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2012-06-19

Filing date

2013-06-18

Publication date

2016-12-11

2013-06-18 Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd

2014-04-01 Publication of TW201414361A publication Critical patent/TW201414361A/en

2016-12-11 Application granted granted Critical

2016-12-11 Publication of TWI562684B publication Critical patent/TWI562684B/zh

Classifications

- H10P50/242—
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/32091—Radio frequency generated discharge the radio frequency energy being capacitively coupled to the plasma
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/32174—Circuits specially adapted for controlling the RF discharge
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
- H10P14/6319—
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H2242/00—Auxiliary systems
- H05H2242/20—Power circuits
- H05H2242/26—Matching networks

Landscapes

Physics & Mathematics (AREA)
Engineering & Computer Science (AREA)
Plasma & Fusion (AREA)
Chemical & Material Sciences (AREA)
Analytical Chemistry (AREA)
Electromagnetism (AREA)
Spectroscopy & Molecular Physics (AREA)
Plasma Technology (AREA)
Drying Of Semiconductors (AREA)

TW102121459A 2012-06-19 2013-06-18 Plasma processing device and filter unit TW201414361A (en)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
JP2012137958A JP6001932B2 (en)	2012-06-19	2012-06-19	Plasma processing apparatus and filter unit

Publications (2)

Publication Number	Publication Date
TW201414361A TW201414361A (en)	2014-04-01
TWI562684B true TWI562684B (en)	2016-12-11

Family

ID=49768420

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
TW102121459A TW201414361A (en)	2012-06-19	2013-06-18	Plasma processing device and filter unit

Country Status (4)

Country	Link
JP (1)	JP6001932B2 (en)
KR (1)	KR102070471B1 (en)
TW (1)	TW201414361A (en)
WO (1)	WO2013190805A1 (en)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
EP3798044B1 (en)	2014-01-10	2023-04-19	Nissan Motor Co., Ltd.	Control device for electric motor vehicle and control method for electric motor vehicle
JP6218650B2 (en) *	2014-03-11	2017-10-25	東京エレクトロン株式会社	Plasma processing equipment
JP6483533B2 (en) *	2015-06-03	2019-03-13	京セラ株式会社	Sample holder and plasma etching apparatus using the same
JP6637846B2 (en) *	2016-06-23	2020-01-29	東京エレクトロン株式会社	How to design a filter
JP6698502B2 (en)	2016-11-21	2020-05-27	東京エレクトロン株式会社	Mounting table and plasma processing device
JP6832800B2 (en) *	2017-06-21	2021-02-24	東京エレクトロン株式会社	Plasma processing equipment
US10812033B2 (en) *	2017-12-29	2020-10-20	Lam Research Corporation	High-power radio-frequency spiral-coil filter
JP7094856B2 (en) *	2018-10-19	2022-07-04	東京エレクトロン株式会社	Filter unit adjustment method and plasma processing equipment
JP7125058B2 (en) *	2018-12-06	2022-08-24	東京エレクトロン株式会社	Plasma processing apparatus and plasma processing method
JP7184254B2 (en)	2018-12-06	2022-12-06	東京エレクトロン株式会社	Plasma processing apparatus and plasma processing method
TWI767655B (en) *	2020-05-01	2022-06-11	日商東京威力科創股份有限公司	Etching apparatus and etching method
JP7516198B2 (en) *	2020-05-01	2024-07-16	東京エレクトロン株式会社	Etching apparatus and method
KR102785926B1 (en) *	2020-11-06	2025-03-26	세메스 주식회사	Apparatus for treating substrate
JP7534235B2 (en) *	2021-02-01	2024-08-14	東京エレクトロン株式会社	Filter circuit and plasma processing apparatus
CN112992481A (en) *	2021-02-04	2021-06-18	广州市蓝粉网络科技有限公司	Chip type winding common-mode inductor

Citations (4)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
TWI278877B (en) *	2003-09-17	2007-04-11	Pulse Eng Inc	Controlled inductance device and method
US20080236493A1 (en) *	2007-03-27	2008-10-02	Tokyo Electron Limited	Plasma processing apparatus
TW201143553A (en) *	2009-11-24	2011-12-01	Tokyo Electron Ltd	Plasma processing apparatus
TWI358198B (en) *	2006-06-13	2012-02-11	Applied Materials Inc	High ac current high rf power ac-rf decoupling fil

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPS6011418U (en) *	1983-07-05	1985-01-25	パイオニア株式会社	variable inductance device
JPS62213216A (en) *	1986-03-14	1987-09-19	Matsushita Electric Ind Co Ltd	variable inductor
JP3843887B2 (en) *	2002-05-24	2006-11-08	松下電器産業株式会社	High frequency thawing device
JP5042661B2 (en) *	2007-02-15	2012-10-03	東京エレクトロン株式会社	Plasma processing apparatus and filter unit
JP5301812B2 (en) *	2007-11-14	2013-09-25	東京エレクトロン株式会社	Plasma processing equipment
JP2010283273A (en) *	2009-06-08	2010-12-16	Hitachi Kokusai Electric Inc	Inductance fine adjustment device

2012
- 2012-06-19 JP JP2012137958A patent/JP6001932B2/en active Active
2013
- 2013-06-12 WO PCT/JP2013/003683 patent/WO2013190805A1/en not_active Ceased
- 2013-06-12 KR KR1020147029205A patent/KR102070471B1/en active Active
- 2013-06-18 TW TW102121459A patent/TW201414361A/en unknown

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
TWI278877B (en) *	2003-09-17	2007-04-11	Pulse Eng Inc	Controlled inductance device and method
TWI358198B (en) *	2006-06-13	2012-02-11	Applied Materials Inc	High ac current high rf power ac-rf decoupling fil
US20080236493A1 (en) *	2007-03-27	2008-10-02	Tokyo Electron Limited	Plasma processing apparatus
TW201143553A (en) *	2009-11-24	2011-12-01	Tokyo Electron Ltd	Plasma processing apparatus

Also Published As

Publication number	Publication date
TW201414361A (en)	2014-04-01
KR102070471B1 (en)	2020-01-29
KR20150024303A (en)	2015-03-06
JP2014003179A (en)	2014-01-09
WO2013190805A1 (en)	2013-12-27
JP6001932B2 (en)	2016-10-05

Publication	Publication Date	Title
BR112014017635A2 (en)	2017-06-20
BR112014017614A2 (en)	2017-06-20
BR112014017625A2 (en)	2017-06-20
BR112014017659A2 (en)	2017-06-20
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BR112014017646A2 (en)	2017-06-20
BR112014017638A2 (en)	2017-06-20
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BR112013027865A2 (en)	2017-01-03
BR112014017609A2 (en)	2017-06-20
BR112014017644A2 (en)	2017-06-20
BR112014017634A2 (en)	2017-06-20
TWI562684B (en)	2016-12-11
BR112014017588A2 (en)	2017-06-20
BR112014013184A8 (en)	2017-06-27
BR112014017618A2 (en)	2017-06-20
BR112014017647A2 (en)	2017-06-20
BR112014017623A2 (en)	2017-06-20
BR112014017652A2 (en)	2017-06-20
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