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TWI562319B - Monitoring testkey used in semiconductor fabrication - Google Patents

Monitoring testkey used in semiconductor fabrication

Info

Publication number
TWI562319B
TWI562319B TW100145103A TW100145103A TWI562319B TW I562319 B TWI562319 B TW I562319B TW 100145103 A TW100145103 A TW 100145103A TW 100145103 A TW100145103 A TW 100145103A TW I562319 B TWI562319 B TW I562319B
Authority
TW
Taiwan
Prior art keywords
testkey
monitoring
semiconductor fabrication
fabrication
semiconductor
Prior art date
Application number
TW100145103A
Other languages
Chinese (zh)
Other versions
TW201324728A (en
Inventor
Chin Chun Huang
Ji Fu Kung
Wei Po Chiu
Nick Chao
Original Assignee
United Microelectronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by United Microelectronics Corp filed Critical United Microelectronics Corp
Priority to TW100145103A priority Critical patent/TWI562319B/en
Publication of TW201324728A publication Critical patent/TW201324728A/en
Application granted granted Critical
Publication of TWI562319B publication Critical patent/TWI562319B/en

Links

TW100145103A 2011-12-07 2011-12-07 Monitoring testkey used in semiconductor fabrication TWI562319B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW100145103A TWI562319B (en) 2011-12-07 2011-12-07 Monitoring testkey used in semiconductor fabrication

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW100145103A TWI562319B (en) 2011-12-07 2011-12-07 Monitoring testkey used in semiconductor fabrication

Publications (2)

Publication Number Publication Date
TW201324728A TW201324728A (en) 2013-06-16
TWI562319B true TWI562319B (en) 2016-12-11

Family

ID=49033114

Family Applications (1)

Application Number Title Priority Date Filing Date
TW100145103A TWI562319B (en) 2011-12-07 2011-12-07 Monitoring testkey used in semiconductor fabrication

Country Status (1)

Country Link
TW (1) TWI562319B (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI817572B (en) * 2022-06-20 2023-10-01 南亞科技股份有限公司 Monitoring method of semiconductor device

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003068816A (en) * 2001-08-29 2003-03-07 Sony Corp Semiconductor substrate
TW200400610A (en) * 2002-06-27 2004-01-01 Fujitsu Ltd Semiconductor device, semiconductor package, and method for testing semiconductor device
US6873938B1 (en) * 2003-09-17 2005-03-29 Asml Netherlands B.V. Adaptive lithographic critical dimension enhancement
US20060062050A1 (en) * 2004-09-21 2006-03-23 Bohumil Lojek Low voltage non-volatile memory cells using twin bit line current sensing
US7335880B2 (en) * 2005-03-31 2008-02-26 Advanced Micro Devices, Inc. Technique for CD measurement on the basis of area fraction determination
US20080197351A1 (en) * 2007-02-16 2008-08-21 Shyh-Fann Ting Testkey design pattern for gate oxide
US20080212053A1 (en) * 2003-10-16 2008-09-04 Asml Netherlands B.V. Device manufacturing method, lithographic apparatus and device manufactured thereby
US7571021B2 (en) * 2007-02-13 2009-08-04 Taiwan Semiconductor Manufacturing Company Method and system for improving critical dimension uniformity

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003068816A (en) * 2001-08-29 2003-03-07 Sony Corp Semiconductor substrate
TW200400610A (en) * 2002-06-27 2004-01-01 Fujitsu Ltd Semiconductor device, semiconductor package, and method for testing semiconductor device
US6873938B1 (en) * 2003-09-17 2005-03-29 Asml Netherlands B.V. Adaptive lithographic critical dimension enhancement
US20080212053A1 (en) * 2003-10-16 2008-09-04 Asml Netherlands B.V. Device manufacturing method, lithographic apparatus and device manufactured thereby
US20060062050A1 (en) * 2004-09-21 2006-03-23 Bohumil Lojek Low voltage non-volatile memory cells using twin bit line current sensing
US7335880B2 (en) * 2005-03-31 2008-02-26 Advanced Micro Devices, Inc. Technique for CD measurement on the basis of area fraction determination
US7571021B2 (en) * 2007-02-13 2009-08-04 Taiwan Semiconductor Manufacturing Company Method and system for improving critical dimension uniformity
US20080197351A1 (en) * 2007-02-16 2008-08-21 Shyh-Fann Ting Testkey design pattern for gate oxide

Also Published As

Publication number Publication date
TW201324728A (en) 2013-06-16

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