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TWI562273B - Holder, lithography apparatus, and method of manufacturing article - Google Patents

Holder, lithography apparatus, and method of manufacturing article

Info

Publication number
TWI562273B
TWI562273B TW103109918A TW103109918A TWI562273B TW I562273 B TWI562273 B TW I562273B TW 103109918 A TW103109918 A TW 103109918A TW 103109918 A TW103109918 A TW 103109918A TW I562273 B TWI562273 B TW I562273B
Authority
TW
Taiwan
Prior art keywords
holder
lithography apparatus
manufacturing article
article
manufacturing
Prior art date
Application number
TW103109918A
Other languages
English (en)
Other versions
TW201440170A (zh
Inventor
Shigeo Koya
Original Assignee
Canon Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Kk filed Critical Canon Kk
Publication of TW201440170A publication Critical patent/TW201440170A/zh
Application granted granted Critical
Publication of TWI562273B publication Critical patent/TWI562273B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
    • B25B—TOOLS OR BENCH DEVICES NOT OTHERWISE PROVIDED FOR, FOR FASTENING, CONNECTING, DISENGAGING OR HOLDING
    • B25B11/00—Work holders not covered by any preceding group in the subclass, e.g. magnetic work holders, vacuum work holders
    • B25B11/005—Vacuum work holders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • H10P72/7614—
    • H10P72/78—

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Electron Beam Exposure (AREA)
TW103109918A 2013-04-01 2014-03-17 Holder, lithography apparatus, and method of manufacturing article TWI562273B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2013076459A JP6130703B2 (ja) 2013-04-01 2013-04-01 ホルダ、ステージ装置、リソグラフィ装置及び物品の製造方法

Publications (2)

Publication Number Publication Date
TW201440170A TW201440170A (zh) 2014-10-16
TWI562273B true TWI562273B (en) 2016-12-11

Family

ID=50439173

Family Applications (1)

Application Number Title Priority Date Filing Date
TW103109918A TWI562273B (en) 2013-04-01 2014-03-17 Holder, lithography apparatus, and method of manufacturing article

Country Status (6)

Country Link
US (1) US9104108B2 (zh)
EP (1) EP2793083B1 (zh)
JP (1) JP6130703B2 (zh)
KR (2) KR20140119647A (zh)
CN (1) CN104102093B (zh)
TW (1) TWI562273B (zh)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102014007903B4 (de) 2014-05-28 2025-04-03 ASML Netherlands B.V. Elektrostatische Haltevorrichtung mit Noppen-Elektroden und Verfahren zu deren Herstellung
DE102014008030A1 (de) * 2014-05-28 2015-12-03 Berliner Glas Kgaa Herbert Kubatz Gmbh & Co Verfahren zur Herstellung einer elektrostatischen Haltevorrichtung
DE102014008031B4 (de) 2014-05-28 2020-06-25 Berliner Glas Kgaa Herbert Kubatz Gmbh & Co. Elektrostatische Haltevorrichtung mit einer Keramik-Elektrode und Verfahren zur Herstellung einer solchen Haltevorrichtung
DE102014008029B4 (de) 2014-05-28 2023-05-17 Asml Netherlands B.V. Elektrostatische Haltevorrichtung mit einer Elektroden-Trägerscheibe und Verfahren zur Herstellung der Haltevorrichtung
JP6709726B2 (ja) * 2015-12-18 2020-06-17 日本特殊陶業株式会社 基板保持装置、基板保持部材および基板保持方法
JP6700932B2 (ja) * 2016-04-20 2020-05-27 キヤノン株式会社 検出装置、検出方法、プログラム、リソグラフィ装置、および物品製造方法
US10535549B2 (en) * 2017-10-27 2020-01-14 Applied Materials, Inc. Lift pin holder
CN120002573B (zh) * 2025-04-03 2025-09-30 大连理工大学 一种大型薄壁回转壳体工件撑吸组合夹具及装夹方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003332411A (ja) * 2002-05-17 2003-11-21 Nikon Corp 基板保持装置及び露光装置

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000286330A (ja) * 1999-03-31 2000-10-13 Hoya Corp 基板保持チャックとその製造方法、露光方法、半導体装置の製造方法及び露光装置
JP4298078B2 (ja) * 1999-08-20 2009-07-15 キヤノン株式会社 基板吸着保持装置および該基板吸着保持装置を用いた露光装置ならびにデバイスの製造方法
US6809802B1 (en) 1999-08-19 2004-10-26 Canon Kabushiki Kaisha Substrate attracting and holding system for use in exposure apparatus
KR20020041591A (ko) * 2000-11-28 2002-06-03 윤종용 노광 설비
JP4333065B2 (ja) * 2001-11-14 2009-09-16 レーザーテック株式会社 基板保持装置
JP4288694B2 (ja) * 2001-12-20 2009-07-01 株式会社ニコン 基板保持装置、露光装置及びデバイス製造方法
JP4040423B2 (ja) 2002-10-16 2008-01-30 キヤノン株式会社 基板保持装置
CN1311301C (zh) * 2002-12-23 2007-04-18 Asml荷兰有限公司 一种光刻投影装置
KR100574058B1 (ko) * 2004-08-20 2006-04-27 삼성전자주식회사 웨이퍼 베이크 장치
JP2007273693A (ja) 2006-03-31 2007-10-18 Nikon Corp 基板保持部材及び基板保持方法、基板保持装置、並びに露光装置及び露光方法
JP2008041898A (ja) * 2006-08-04 2008-02-21 Renesas Technology Corp 半導体装置の製造方法
US7508494B2 (en) * 2006-12-22 2009-03-24 Asml Netherlands B.V. Lithographic apparatus and a subtrate table for exciting a shockwave in a substrate
JP5016523B2 (ja) 2008-02-29 2012-09-05 株式会社日本セラテック 真空チャック
JP5517171B2 (ja) 2009-11-25 2014-06-11 Ｎｓｋテクノロジー株式会社 露光ユニット及び基板の露光方法
US9360772B2 (en) * 2011-12-29 2016-06-07 Nikon Corporation Carrier method, exposure method, carrier system and exposure apparatus, and device manufacturing method

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003332411A (ja) * 2002-05-17 2003-11-21 Nikon Corp 基板保持装置及び露光装置

Also Published As

Publication number Publication date
US20140295355A1 (en) 2014-10-02
EP2793083B1 (en) 2019-03-20
KR20180079270A (ko) 2018-07-10
EP2793083A1 (en) 2014-10-22
KR20140119647A (ko) 2014-10-10
CN104102093A (zh) 2014-10-15
KR102134207B1 (ko) 2020-07-15
US9104108B2 (en) 2015-08-11
JP6130703B2 (ja) 2017-05-17
JP2014203860A (ja) 2014-10-27
TW201440170A (zh) 2014-10-16
CN104102093B (zh) 2017-09-26

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