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TWI560531B - Lithography apparatus - Google Patents

Lithography apparatus

Info

Publication number
TWI560531B
TWI560531B TW104126595A TW104126595A TWI560531B TW I560531 B TWI560531 B TW I560531B TW 104126595 A TW104126595 A TW 104126595A TW 104126595 A TW104126595 A TW 104126595A TW I560531 B TWI560531 B TW I560531B
Authority
TW
Taiwan
Prior art keywords
lithography apparatus
lithography
Prior art date
Application number
TW104126595A
Other languages
English (en)
Other versions
TW201543180A (zh
Inventor
Timo Laufer
Original Assignee
Zeiss Carl Smt Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zeiss Carl Smt Gmbh filed Critical Zeiss Carl Smt Gmbh
Publication of TW201543180A publication Critical patent/TW201543180A/zh
Application granted granted Critical
Publication of TWI560531B publication Critical patent/TWI560531B/zh

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N25/00—Investigating or analyzing materials by the use of thermal means
    • G01N25/16—Investigating or analyzing materials by the use of thermal means by investigating thermal coefficient of expansion
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature

Landscapes

  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Public Health (AREA)
  • Epidemiology (AREA)
  • Environmental & Geological Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Chemical & Material Sciences (AREA)
  • Immunology (AREA)
  • General Health & Medical Sciences (AREA)
  • Biochemistry (AREA)
  • Analytical Chemistry (AREA)
  • Pathology (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Optical Transform (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)
  • Lens Barrels (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
TW104126595A 2011-03-22 2012-03-21 Lithography apparatus TWI560531B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE102011005885A DE102011005885A1 (de) 2011-03-22 2011-03-22 Lithographievorrichtung

Publications (2)

Publication Number Publication Date
TW201543180A TW201543180A (zh) 2015-11-16
TWI560531B true TWI560531B (en) 2016-12-01

Family

ID=46831454

Family Applications (2)

Application Number Title Priority Date Filing Date
TW101109637A TWI501047B (zh) 2011-03-22 2012-03-21 微影設備
TW104126595A TWI560531B (en) 2011-03-22 2012-03-21 Lithography apparatus

Family Applications Before (1)

Application Number Title Priority Date Filing Date
TW101109637A TWI501047B (zh) 2011-03-22 2012-03-21 微影設備

Country Status (6)

Country Link
US (1) US9383328B2 (zh)
JP (2) JP6012702B2 (zh)
CN (2) CN105892239B (zh)
DE (1) DE102011005885A1 (zh)
TW (2) TWI501047B (zh)
WO (1) WO2012126621A2 (zh)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102014224222A1 (de) * 2014-11-27 2016-01-07 Carl Zeiss Smt Gmbh Kapazitiver Messsensor und Positions-Messeinrichtung zur Ermittlung einer Position eines Messobjekts sowie Positioniervorrichtung mit einem derartigen Messsensor
DE102015209077A1 (de) 2015-05-18 2016-11-24 Carl Zeiss Smt Gmbh Sensoranordnung und verfahren zur ermittlung einer jeweiligen position einer anzahl von spiegeln einer lithographieanlage
DE102015209078A1 (de) * 2015-05-18 2016-11-24 Carl Zeiss Smt Gmbh Sensoranordnung und verfahren zur ermittlung einer jeweiligen position einer anzahl von spiegeln einer lithographieanlage
DE102015211286A1 (de) 2015-06-18 2016-12-22 Carl Zeiss Smt Gmbh Abbildungssystem und verfahren
WO2018065157A1 (en) 2016-10-04 2018-04-12 Asml Netherlands B.V. Athermalization of an alignment system
DE102018200524A1 (de) * 2018-01-15 2019-07-18 Carl Zeiss Smt Gmbh Projektionsbelichtungsanlage für die Halbleiterlithographie mit verbesserter Komponentenjustage und Justageverfahren
TWI776339B (zh) * 2020-12-30 2022-09-01 致茂電子股份有限公司 半導體製程中的光學檢測設備

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030010902A1 (en) * 2001-07-14 2003-01-16 Carl-Zeiss Semiconductor Manufacturing Technologies Ag Optical system with a plurality of optical elements
US20070081141A1 (en) * 2005-10-11 2007-04-12 Asml Netherlands B.V. Lithographic apparatus

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3651125B2 (ja) * 1996-06-27 2005-05-25 株式会社ニコン 位置計測装置及びパターン測定装置
JP2002075827A (ja) * 2000-08-29 2002-03-15 Nikon Corp Ｘ線投影露光装置およびｘ線投影露光方法および半導体デバイス
JP4078485B2 (ja) * 2002-10-31 2008-04-23 株式会社ニコン 露光装置、ステージ装置、及びステージ装置の制御方法
DE10259186A1 (de) * 2002-12-18 2004-07-08 Carl Zeiss Smt Ag Vorrichtung zur Aufnahme von Messinstrumenten
US7180603B2 (en) * 2003-06-26 2007-02-20 Zygo Corporation Reduction of thermal non-cyclic error effects in interferometers
JP2007528125A (ja) * 2004-02-25 2007-10-04 カール ツァイス エスエムテー アクチェンゲゼルシャフト 少なくとも一つの光学部品で構成される機器
US7460208B2 (en) * 2005-02-18 2008-12-02 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7602489B2 (en) * 2006-02-22 2009-10-13 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7804582B2 (en) * 2006-07-28 2010-09-28 Asml Netherlands B.V. Lithographic apparatus, method of calibrating a lithographic apparatus and device manufacturing method
US7804579B2 (en) 2007-06-21 2010-09-28 Asml Netherlands B.V. Control system, lithographic projection apparatus, method of controlling a support structure, and a computer program product
US8174671B2 (en) * 2007-06-21 2012-05-08 Asml Netherlands B.V. Lithographic projection apparatus and method for controlling a support structure
JP2009011356A (ja) * 2007-06-29 2009-01-22 E-2:Kk ビンゴゲームシステム
KR101538245B1 (ko) 2007-07-18 2015-07-20 가부시키가이샤 니콘 계측 방법, 스테이지 장치, 및 노광 장치
NL2005208A (en) * 2009-09-28 2011-03-29 Asml Netherlands Bv Heat pipe, lithographic apparatus and device manufacturing method.
NL2009858A (en) * 2011-12-27 2013-07-01 Asml Netherlands Bv Substrate holder, lithographic apparatus, and device manufacturing method.

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030010902A1 (en) * 2001-07-14 2003-01-16 Carl-Zeiss Semiconductor Manufacturing Technologies Ag Optical system with a plurality of optical elements
US20070081141A1 (en) * 2005-10-11 2007-04-12 Asml Netherlands B.V. Lithographic apparatus

Also Published As

Publication number Publication date
TW201243514A (en) 2012-11-01
CN103459986B (zh) 2016-06-29
JP2017021366A (ja) 2017-01-26
TW201543180A (zh) 2015-11-16
TWI501047B (zh) 2015-09-21
CN103459986A (zh) 2013-12-18
JP6420802B2 (ja) 2018-11-07
WO2012126621A3 (en) 2012-11-15
CN105892239B (zh) 2019-09-17
JP2014510410A (ja) 2014-04-24
US20130343422A1 (en) 2013-12-26
JP6012702B2 (ja) 2016-10-25
DE102011005885A1 (de) 2012-09-27
WO2012126621A2 (en) 2012-09-27
CN105892239A (zh) 2016-08-24
US9383328B2 (en) 2016-07-05

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