TWI556976B - Hydrophilic optical film structure - Google Patents
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- TWI556976B TWI556976B TW104137970A TW104137970A TWI556976B TW I556976 B TWI556976 B TW I556976B TW 104137970 A TW104137970 A TW 104137970A TW 104137970 A TW104137970 A TW 104137970A TW I556976 B TWI556976 B TW I556976B
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- 239000012788 optical film Substances 0.000 title claims description 196
- 230000003287 optical effect Effects 0.000 claims description 107
- 239000000758 substrate Substances 0.000 claims description 63
- 239000010408 film Substances 0.000 claims description 35
- 238000002834 transmittance Methods 0.000 claims description 24
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 21
- 230000000149 penetrating effect Effects 0.000 claims description 18
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 11
- 229910000420 cerium oxide Inorganic materials 0.000 claims description 8
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 claims description 8
- 239000004408 titanium dioxide Substances 0.000 claims description 5
- 230000008020 evaporation Effects 0.000 claims description 4
- 238000001704 evaporation Methods 0.000 claims description 4
- 238000007654 immersion Methods 0.000 claims description 2
- 238000000034 method Methods 0.000 claims description 2
- 230000005540 biological transmission Effects 0.000 description 8
- 230000035515 penetration Effects 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 229910052681 coesite Inorganic materials 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
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- Surface Treatment Of Optical Elements (AREA)
Description
本案係關於一種光學膜層結構，尤指一種應用於光學基材之親水光學膜層結構。 The present invention relates to an optical film layer structure, and more particularly to a hydrophilic optical film layer structure applied to an optical substrate.
近年來，隨著科技的進步，光學基材以及光學膜層技術已逐漸應用於多種領域。一般而言，現有且常見的光學膜層技術，大多係於光學基材上鍍覆特定的光學膜層，以達到提升穿透率或反射率之目的，同時甚至可以針對特定的光波長進行對應的穿透率或反射率之調整。 In recent years, with the advancement of technology, optical substrates and optical film layers have been gradually applied in various fields. In general, the existing and common optical film technology is mostly applied to a specific optical film layer on an optical substrate to achieve the purpose of improving the transmittance or reflectivity, and even corresponding to a specific wavelength of light. The adjustment of the penetration rate or reflectance.
當應用於以光學穿透為主要需求的基材時，於材料選擇上多半係使用非金屬材料作為穿透型光學基材。然而，目前業界習用之穿透型光學基材，於應用上仍具有相當程度的能量損失。此外，習用之穿透型光學基材在遇水時，由於水的表面張力會使水在光學基材表面部分地形成水珠或水紋，進而造成習用之穿透型光學基材無法有效達到預期的光學穿透率，甚至因水產生部分折射導致無法使用。 When applied to a substrate that is primarily required for optical penetration, most of the material selection uses a non-metallic material as the penetrating optical substrate. However, the penetrating optical substrates currently in use in the industry still have a considerable degree of energy loss in application. In addition, the conventional penetrating optical substrate can form water droplets or water marks on the surface of the optical substrate due to the surface tension of water when it is in contact with water, thereby causing the conventional penetrating optical substrate to be effectively unable to be achieved. The expected optical transmittance is even unusable due to partial refraction of water.
是以，如何發展一種可改善上述習知技術缺失之親水光學膜層結構，實為目前尚待解決之問題。 Therefore, how to develop a hydrophilic optical film layer structure which can improve the above-mentioned conventional techniques is a problem that has yet to be solved.
本案之主要目的為提供一種親水光學膜層結構，俾解決並改善前述先前技術之問題與缺點。 The main object of the present invention is to provide a hydrophilic optical film layer structure that solves and ameliorates the problems and disadvantages of the aforementioned prior art.
本案之另一目的為提供一種親水光學膜層結構，可有效提高光學穿透率。其藉由光學膜層結構之超親水特性，以於與水接觸時形成整片水膜，可提高並維持光學基材之高光學穿透率。 Another object of the present invention is to provide a hydrophilic optical film layer structure, which can effectively improve optical transmittance. It has a super-hydrophilic property of the optical film layer structure to form a whole water film upon contact with water, which can improve and maintain high optical transmittance of the optical substrate.
為達上述目的，本案之一較廣實施態樣為提供一種親水光學膜層結構，適用於一光學基材，包括：一光學穿透膜，形成於該光學基材；以及一親水光學膜，形成於該光學穿透膜之上，且包含莫耳濃度為1比0.1至1比2之二氧化鈦及二氧化矽，並架構於以紫外光照射後，使水接觸角小於10度角，以提升親水性，俾提高該光學基材之光學穿透率為91%至98%。 In order to achieve the above object, a broader aspect of the present invention provides a hydrophilic optical film layer structure suitable for an optical substrate, comprising: an optical penetrating film formed on the optical substrate; and a hydrophilic optical film, Formed on the optically penetrating film, and comprising titanium dioxide and cerium oxide having a molar concentration of 1 to 0.1 to 1 to 2, and is configured to increase the water contact angle by less than 10 degrees after irradiation with ultraviolet light to enhance Hydrophilic, 俾 increases the optical transmittance of the optical substrate from 91% to 98%.
於一些實施例中，該光學穿透膜之折射率n值為1.458且厚度為400至440奈米，且該光學穿透膜係以二氧化矽之溶液形成。進一步地，該親水光學膜之折射率n值為1.75且厚度為10奈米，且該光學穿透膜之厚度較佳為413奈米，俾提高該光學基材之光學穿透率為91%至92%。 In some embodiments, the optically transmissive film has a refractive index n of 1.458 and a thickness of 400 to 440 nm, and the optically penetrating film is formed as a solution of cerium oxide. Further, the hydrophilic optical film has a refractive index n of 1.75 and a thickness of 10 nm, and the thickness of the optically transmissive film is preferably 413 nm, and the optical transmittance of the optical substrate is increased by 91%. To 92%.
於一些實施例中，該光學穿透膜係包括：一第一光學膜層，形成於該光學基材；一第二光學膜層，形成於該第一光學膜層之上；以及一第三光學膜層，形成於該第二光學膜層之上。此外，該親水光學膜係形成於該光學穿透膜之該第三光學膜層之上。較佳地，該第一光學膜層之折射率n值為2.44且厚度為3奈米，該第二光學膜層之折射率n值為1.42且厚度為81.21奈米，該第三光學膜層之折射率n值為2.44且厚度為3奈米，以及該親水光學膜之折射率n值為1.75且厚度為10奈米。 In some embodiments, the optically transmissive film system comprises: a first optical film layer formed on the optical substrate; a second optical film layer formed on the first optical film layer; and a third An optical film layer is formed on the second optical film layer. Further, the hydrophilic optical film is formed on the third optical film layer of the optical transmission film. Preferably, the first optical film layer has a refractive index n of 2.44 and a thickness of 3 nm, and the second optical film layer has a refractive index n of 1.42 and a thickness of 81.21 nm. The third optical film layer The refractive index n was 2.44 and the thickness was 3 nm, and the hydrophilic optical film had a refractive index n of 1.75 and a thickness of 10 nm.
於一些實施例中，該光學穿透膜係包括：一第一光學膜層，形成於該光學基材；一第二光學膜層，形成於該第一光學膜層之上；以及一第三光學膜層，形成於該第二光學膜層之上。同時，其中該親水光學膜係包括：一第四光學膜層，形成於該光學穿透膜之該第三光學膜層之上；以及一第五光學膜層，形成於該第四光學膜層之上，且包括莫耳濃度為1比0.1至1比2之二氧化鈦及二氧化矽，並架構於以紫外光照射後，使水接觸角小於10度角，以提升親水性，俾提高該光學基材之光學穿透率為91%至98%。較佳地，該第一光學膜層之折射率n值為2.21且厚度為13.24奈米，該第二光學膜層之折射率n值為1.46且厚度為33.71奈米，該第三光學膜層之折射率n值為2.21且厚度為119.92奈米，該第四光學膜層之折射率n值為1.46且厚度為87.65奈米，以及該第五光學膜層之折射率n值為1.75且厚度為10奈米。 In some embodiments, the optically transmissive film system comprises: a first optical film layer formed on the optical substrate; a second optical film layer formed on the first optical film layer; and a third An optical film layer is formed on the second optical film layer. Meanwhile, the hydrophilic optical film system comprises: a fourth optical film layer formed on the third optical film layer of the optical transmission film; and a fifth optical film layer formed on the fourth optical film layer Above, and including titanium dioxide and cerium oxide having a molar concentration of 1 to 0.1 to 1 to 2, and the structure is such that when the ultraviolet light is irradiated, the water contact angle is less than 10 degrees to enhance the hydrophilicity, and the optical is improved. The optical transmittance of the substrate is from 91% to 98%. Preferably, the first optical film layer has a refractive index n of 2.21 and a thickness of 13.24 nm, and the second optical film layer has a refractive index n of 1.46 and a thickness of 33.71 nm. The third optical film layer The refractive index n value is 2.21 and the thickness is 119.92 nm, the refractive index n of the fourth optical film layer is 1.46 and the thickness is 87.65 nm, and the refractive index n of the fifth optical film layer is 1.75 and the thickness. It is 10 nm.
根據本案之構想，當該第一光學膜層、該第二光學膜層、該第三光學膜層、該第四光學膜層及該第五光學膜層依序形成於該光學基材之一第一表面，該光學基材之光學穿透率係提高為91%至95%。 According to the concept of the present invention, when the first optical film layer, the second optical film layer, the third optical film layer, the fourth optical film layer and the fifth optical film layer are sequentially formed on one of the optical substrates The optical transmittance of the optical substrate is increased by 91% to 95% on the first surface.
根據本案之構想，當該第一光學膜層、該第二光學膜層、該第三光學膜層及該第四光學膜層依序且對稱地同時形成於該光學基材之一第一表面及一第二表面，且該第五光學膜層形成於位於該第一表面之該第四光學膜層或位於該第二表面之該第四光學膜層，該光學基材之光學穿透率係提高為91%至98%。 According to the concept of the present invention, when the first optical film layer, the second optical film layer, the third optical film layer and the fourth optical film layer are simultaneously and symmetrically formed on the first surface of one of the optical substrates And a second surface, and the fifth optical film layer is formed on the fourth optical film layer on the first surface or the fourth optical film layer on the second surface, the optical transmittance of the optical substrate The system is increased by 91% to 98%.
1‧‧‧光學基材 1‧‧‧Optical substrate
2‧‧‧親水光學膜層結構 2‧‧‧Hydrophilic optical film structure
21‧‧‧光學穿透膜 21‧‧‧Optical penetrating film
211‧‧‧第一光學膜層 211‧‧‧First optical film layer
212‧‧‧第二光學膜層 212‧‧‧Second optical film
213‧‧‧第三光學膜層 213‧‧‧ Third optical film layer
22‧‧‧親水光學膜 22‧‧‧Hydrophilic optical film
221‧‧‧第四光學膜層 221‧‧‧4th optical film layer
222‧‧‧第五光學膜層 222‧‧‧ fifth optical film layer
S1‧‧‧第一表面 S1‧‧‧ first surface
S2‧‧‧第二表面 S2‧‧‧ second surface
第1圖係顯示本案較佳實施例之親水光學膜層應用於光學基材之示意圖。 BRIEF DESCRIPTION OF THE DRAWINGS Figure 1 is a schematic view showing the application of the hydrophilic optical film layer of the preferred embodiment of the present invention to an optical substrate.
第2圖係顯示本案另一較佳實施例之親水光學膜層結構應用於光學基材之示意圖。 Figure 2 is a schematic view showing the application of the hydrophilic optical film layer structure of another preferred embodiment of the present invention to an optical substrate.
第3圖係顯示本案又一較佳實施例之親水光學膜層結構形成於光學基材之第一表面之示意圖。 Figure 3 is a schematic view showing the structure of a hydrophilic optical film layer formed on a first surface of an optical substrate according to still another preferred embodiment of the present invention.
第4圖係顯示本案又一較佳實施例之親水光學膜層結構形成於光學基材之第一表面及第二表面之示意圖。 Figure 4 is a schematic view showing the structure of the hydrophilic optical film layer formed on the first surface and the second surface of the optical substrate in still another preferred embodiment of the present invention.
體現本案特徵與優點的一些典型實施例將在後段的說明中詳細敘述。應理解的是本案能夠在不同的態樣上具有各種的變化，其皆不脫離本案的範圍，且其中的說明及圖示在本質上係當作說明之用，而非架構於限制本案。 Some exemplary embodiments embodying the features and advantages of the present invention are described in detail in the following description. It is to be understood that the present invention is capable of various modifications in various aspects, and is not to be construed as a limitation.
請參閱第1圖，其係顯示本案較佳實施例之親水光學膜層應用於光學基材之示意圖。如第1圖所示，本案之典型實施例係於光學基材1，例如玻璃或塑膠等，但不以此為限，形成親水光學膜層結構2，其中親水光學膜層結構2係適用於各種類型之光學基材1，且親水光學膜層結構2至少包括光學穿透膜21及親水光學膜22。光學穿透膜21係形成於光學基材1，且親水光學膜22係形成於光學穿透膜21之上，且包含莫耳濃度為1比0.1至1比2之二氧化鈦(TiO2)及二氧化矽(SiO2)，並架構於以紫外光(Ultraviolet,UV)照射後，使水接觸角小於10度角，以提升親水性，俾提高該光學基材之光學穿透率為91%至98%。換言之，透過本案之親水光學膜層結構2，可有效提高光學基材1之光學穿透率。 Please refer to FIG. 1 , which is a schematic view showing the application of the hydrophilic optical film layer of the preferred embodiment of the present invention to an optical substrate. As shown in FIG. 1, the exemplary embodiment of the present invention is based on an optical substrate 1, such as glass or plastic, but not limited thereto, to form a hydrophilic optical film layer structure 2, wherein the hydrophilic optical film layer structure 2 is suitable for Various types of optical substrates 1 and the hydrophilic optical film layer structure 2 includes at least an optical transmission film 21 and a hydrophilic optical film 22. The optical transmissive film 21 is formed on the optical substrate 1, and the hydrophilic optical film 22 is formed on the optical transmissive film 21, and contains titanium oxide (TiO2) having a molar concentration of 1 to 0.1 to 1 to 2 and oxidizing.矽 (SiO2), and is designed to be irradiated with ultraviolet light (Ultraviolet, UV) to make the water contact angle less than 10 degrees to enhance the hydrophilicity, and to increase the optical transmittance of the optical substrate by 91% to 98%. . In other words, the optical transmittance of the optical substrate 1 can be effectively improved by the hydrophilic optical film layer structure 2 of the present invention.
根據本發明之構思，由於本案之親水光學膜層結構2可使得光學基材1與水之間的水接觸角小於10度角，可達到超親水特性，以於光學基材1與 水接觸時，於親水光學膜22上形成整片水膜，可提高並維持光學基材1之高光學穿透率。 According to the concept of the present invention, since the hydrophilic optical film layer structure 2 of the present invention can make the water contact angle between the optical substrate 1 and water less than 10 degrees, super hydrophilic property can be achieved for the optical substrate 1 and When water contacts, a whole water film is formed on the hydrophilic optical film 22, and the high optical transmittance of the optical substrate 1 can be improved and maintained.
於一些實施例中，光學穿透膜21之折射率n值為1.458且厚度為400至440奈米(nanometer,nm)，且該光學穿透膜21係以二氧化矽之溶液形成。此外，於較佳實施例中，親水光學膜22之折射率n值為1.75且厚度為10奈米，以及光學穿透膜21之厚度較佳為413奈米，俾提高光學基材1之光學穿透率為91%至92%，例如較佳為91.409%或92.7%，但不以此為限。 In some embodiments, the optical transmission film 21 has a refractive index n value of 1.458 and a thickness of 400 to 440 nanometers (nm), and the optical transmission film 21 is formed of a solution of cerium oxide. Further, in the preferred embodiment, the hydrophilic optical film 22 has a refractive index n of 1.75 and a thickness of 10 nm, and the optically transmissive film 21 preferably has a thickness of 413 nm, which increases the optical properties of the optical substrate 1. The penetration rate is 91% to 92%, for example, preferably 91.409% or 92.7%, but not limited thereto.
請參閱第2圖，其係顯示本案另一較佳實施例之親水光學膜層結構應用於光學基材之示意圖。如第2圖所示，本案親水光學膜層結構2之光學穿透膜21係包括第一光學膜層211、第二光學膜層212及第三光學膜層213，其中第一光學膜層211係形成於光學基材1，第二光學膜層212係形成於第一光學膜層211之上，且第三光學膜層213係形成於第二光學膜層212之上。於此實施例中，親水光學膜22係形成於第三光學膜層213之上。 Please refer to FIG. 2, which is a schematic view showing the application of the hydrophilic optical film layer structure of another preferred embodiment of the present invention to an optical substrate. As shown in FIG. 2, the optical transmission film 21 of the hydrophilic optical film layer structure 2 of the present invention includes a first optical film layer 211, a second optical film layer 212, and a third optical film layer 213, wherein the first optical film layer 211 The second optical film layer 212 is formed on the first optical film layer 211, and the third optical film layer 213 is formed on the second optical film layer 212. In this embodiment, the hydrophilic optical film 22 is formed on the third optical film layer 213.
根據本案之構想，第一光學膜層211、第二光學膜層212及第三光學膜層213之間的折射率n值關係為「高-低-高」時，本案之親水光學膜層結構2具有較佳之性能表現。於較佳實施例中，若以第一光學膜層211之折射率n值為2.44且厚度為3奈米為例，第二光學膜層212之折射率n值為1.42且厚度為81.21奈米，第三光學膜層213之折射率n值為2.44且厚度為3奈米，以及親水光學膜22之折射率n值為1.75且厚度為10奈米。 According to the concept of the present invention, when the refractive index n value relationship between the first optical film layer 211, the second optical film layer 212, and the third optical film layer 213 is "high-low-high", the hydrophilic optical film layer structure of the present invention 2 has better performance. In a preferred embodiment, if the refractive index n of the first optical film layer 211 is 2.44 and the thickness is 3 nm, the refractive index n of the second optical film layer 212 is 1.42 and the thickness is 81.21 nm. The third optical film layer 213 has a refractive index n of 2.44 and a thickness of 3 nm, and the hydrophilic optical film 22 has a refractive index n of 1.75 and a thickness of 10 nm.
請參閱第3圖，其係顯示本案又一較佳實施例之親水光學膜層結構形成於光學基材之第一表面之示意圖。如第3圖所示，本案親水光學膜層結構2之光學穿透膜21係如前述實施例所述，包括第一光學膜層211、第二光學膜層212及第三光學膜層213，其中第一光學膜層211係形成於光學基材1，例如但不限於形成於光學基材1之第一表面S1，第二光學膜層212係形成於第一光學膜 層211之上，且第三光學膜層213係形成於第二光學膜層212之上。惟於此實施例中，親水光學膜22係進一步包括第四光學膜層221及第五光學膜層222，其中，第四光學膜層221係形成於光學穿透膜21之地三光學膜層213之上，以及第五光學膜層222係形成於第四光學膜層221之上，且包括莫耳濃度為1比0.1至1比2之二氧化鈦及二氧化矽，並架構於以紫外光照射後，使水接觸角小於10度角，以提升親水性，俾提高該光學基材之光學穿透率為91%至98%。 Please refer to FIG. 3, which is a schematic view showing the structure of the hydrophilic optical film layer formed on the first surface of the optical substrate according to still another preferred embodiment of the present invention. As shown in FIG. 3, the optical transmission film 21 of the hydrophilic optical film layer structure 2 of the present invention includes the first optical film layer 211, the second optical film layer 212, and the third optical film layer 213, as described in the foregoing embodiments. The first optical film layer 211 is formed on the optical substrate 1, such as but not limited to being formed on the first surface S1 of the optical substrate 1, and the second optical film layer 212 is formed on the first optical film. Above the layer 211, a third optical film layer 213 is formed over the second optical film layer 212. In this embodiment, the hydrophilic optical film 22 further includes a fourth optical film layer 221 and a fifth optical film layer 222, wherein the fourth optical film layer 221 is formed on the three optical film layers of the optical penetrating film 21. Above 213, and a fifth optical film layer 222 is formed on the fourth optical film layer 221, and comprises titanium dioxide and cerium oxide having a molar concentration of 1 to 0.1 to 1 to 2, and is irradiated with ultraviolet light. Thereafter, the water contact angle is made less than 10 degrees to enhance the hydrophilicity, and the optical transmittance of the optical substrate is increased by 91% to 98%.
於一些實施例中，若本案之親水光學膜層結構2係架構為形成於光學基材1之單一表面，例如第一表面S1或第二表面S2時，係至少可將光學基材1之光學穿透率提升為91%至95%。舉例而言，當第一光學膜層211、第二光學膜層212、第三光學膜層213、第四光學膜層221及第五光學膜層222依序形成於光學基材1之第一表面S1，光學基材1之光學穿透率係至少提高為91%至95%，但不以此為限。 In some embodiments, if the hydrophilic optical film layer structure 2 of the present invention is formed on a single surface of the optical substrate 1, such as the first surface S1 or the second surface S2, at least the optical substrate 1 can be optically The penetration rate is increased from 91% to 95%. For example, when the first optical film layer 211, the second optical film layer 212, the third optical film layer 213, the fourth optical film layer 221, and the fifth optical film layer 222 are sequentially formed on the optical substrate 1 The surface S1, the optical transmittance of the optical substrate 1 is at least increased by 91% to 95%, but not limited thereto.
請參閱第4圖，其係顯示本案又一較佳實施例之親水光學膜層結構形成於光學基材之第一表面及第二表面之示意圖。如第4圖所示，若本案之親水光學膜層結構2係架構為形成於光學基材1之雙表面，亦即第一表面S1及第二表面S2時，係至少可將光學基材1之光學穿透率提升為91%至98%。舉例而言，當第一光學膜層211、第二光學膜層212、第三光學膜層213及第四光學膜層221依序且對稱地同時形成於光學基材1之第一表面S1及第二表面S2，且第五光學膜層222形成於位於第一表面S1之第四光學膜層221(如第4圖所示)或位於第二表面S2之第四光學膜層221(未圖示)，光學基材1之光學穿透率係提高為91%至98%，但不以此為限。 Please refer to FIG. 4, which is a schematic view showing a hydrophilic optical film layer structure formed on the first surface and the second surface of the optical substrate according to still another preferred embodiment of the present invention. As shown in FIG. 4, if the hydrophilic optical film layer structure 2 of the present invention is formed on the double surfaces of the optical substrate 1, that is, the first surface S1 and the second surface S2, at least the optical substrate 1 can be used. The optical transmittance is increased from 91% to 98%. For example, when the first optical film layer 211, the second optical film layer 212, the third optical film layer 213, and the fourth optical film layer 221 are simultaneously and symmetrically formed on the first surface S1 of the optical substrate 1 and a second surface S2, and the fifth optical film layer 222 is formed on the fourth optical film layer 221 (shown in FIG. 4) on the first surface S1 or the fourth optical film layer 221 on the second surface S2 (not shown) The optical transmittance of the optical substrate 1 is increased by 91% to 98%, but not limited thereto.
請再參閱第4圖，當第一光學膜層211、第二光學膜層212、第三光學膜層213及第四光學膜層221之間的折射率n值關係為「高-低-高-低」，且第五光學膜層222之折射率n值與第一光學膜層211、第二光學膜層212、第三光 學膜層213及第四光學膜層221綜合之等效折射率n值相近時，本案之親水光學膜層結構2具有較佳之性能表現。 Referring to FIG. 4 again, when the relationship between the refractive index n of the first optical film layer 211, the second optical film layer 212, the third optical film layer 213, and the fourth optical film layer 221 is "high-low-high" -low", and the refractive index n of the fifth optical film layer 222 is different from the first optical film layer 211, the second optical film layer 212, and the third light When the combined refractive index n values of the film layer 213 and the fourth optical film layer 221 are similar, the hydrophilic optical film layer structure 2 of the present invention has better performance.
於較佳實施例中，第一光學膜層211之折射率n值為2.21且厚度為13.24奈米，第二光學膜層212之折射率n值為1.46且厚度為33.71奈米，第三光學膜層213之折射率n值為2.21且厚度為119.92奈米，第四光學膜層221之折射率n值為1.46且厚度為87.65奈米，以及第五光學膜層222之折射率n值為1.75且厚度為10奈米。 In a preferred embodiment, the first optical film layer 211 has a refractive index n of 2.21 and a thickness of 13.24 nm, and the second optical film 212 has a refractive index n of 1.46 and a thickness of 33.71 nm. The refractive index n of the film layer 213 is 2.21 and the thickness is 119.92 nm, the refractive index n of the fourth optical film layer 221 is 1.46 and the thickness is 87.65 nm, and the refractive index n value of the fifth optical film layer 222 is 1.75 and a thickness of 10 nm.
根據本發明之創作精神，本案親水光學膜層結構2之光學穿透膜21之第一光學膜層211、第二光學膜層212及第三光學膜層213，以及親水光學膜22之第四光學膜層221較佳係以電子槍蒸鍍形成，且第五光學膜層222較佳係以溼式浸泡法拉膜形成，然皆不限於此。 According to the creative spirit of the present invention, the first optical film layer 211, the second optical film layer 212 and the third optical film layer 213 of the optical transmission film 21 of the hydrophilic optical film layer structure 2 of the present invention, and the fourth of the hydrophilic optical film 22 The optical film layer 221 is preferably formed by electron gun evaporation, and the fifth optical film layer 222 is preferably formed by a wet immersion method, which is not limited thereto.
綜上所述，本案提供一種親水光學膜層結構，可有效提高光學穿透率。其架構於以紫外光照射後，使水接觸角小於10度角，以提升親水性，俾提高該光學基材之光學穿透率為91%至98%。同時，藉由親水光學膜層結構之超親水特性，以於與水接觸時形成整片水膜，可提高並維持光學基材之高光學穿透率。 In summary, the present invention provides a hydrophilic optical film layer structure, which can effectively improve the optical transmittance. The structure is such that when irradiated with ultraviolet light, the water contact angle is less than 10 degrees to enhance the hydrophilicity, and the optical transmittance of the optical substrate is increased by 91% to 98%. At the same time, by virtue of the super-hydrophilic property of the hydrophilic optical film layer structure, a high water transmittance of the optical substrate can be improved and maintained by forming a whole water film upon contact with water.
縱使本發明已於上述之實施例詳細敘述而可由熟悉本技藝之人士任施匠思而為諸般修飾，然皆不脫如附申請專利範圍所欲保護者。 The present invention has been described in detail with reference to the embodiments of the present invention, and may be modified by those skilled in the art, without departing from the scope of the appended claims.
1‧‧‧光學基材 1‧‧‧Optical substrate
2‧‧‧親水光學膜層結構 2‧‧‧Hydrophilic optical film structure
21‧‧‧光學穿透膜 21‧‧‧Optical penetrating film
22‧‧‧親水光學膜 22‧‧‧Hydrophilic optical film
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| TWI314099B (en) * | 2001-02-28 | 2009-09-01 | Ppg Ind Ohio Inc | Photo-induced hydrophilic article and method of making same |
| TW201500217A (en) * | 2013-06-25 | 2015-01-01 | H P B Optoelectronic Co Ltd | A multilayer film with hydrophilic, anti-reflection and anti-fog and the method of manufacturing the multilayer film |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| TWI314099B (en) * | 2001-02-28 | 2009-09-01 | Ppg Ind Ohio Inc | Photo-induced hydrophilic article and method of making same |
| TW201500217A (en) * | 2013-06-25 | 2015-01-01 | H P B Optoelectronic Co Ltd | A multilayer film with hydrophilic, anti-reflection and anti-fog and the method of manufacturing the multilayer film |
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