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TWI548004B - Chip-arranged-and-orientated apparatus and method using the same - Google Patents

Chip-arranged-and-orientated apparatus and method using the same Download PDF

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TWI548004B
TWI548004B TW104113911A TW104113911A TWI548004B TW I548004 B TWI548004 B TW I548004B TW 104113911 A TW104113911 A TW 104113911A TW 104113911 A TW104113911 A TW 104113911A TW I548004 B TWI548004 B TW I548004B
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substrate
arranging
arrangement
supporting
die
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TW104113911A
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TW201639044A (en
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Yen-Hao Lu
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Saul Tech Technology Co Ltd
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Description

晶粒定位佈置設備以及晶粒定位佈置方法Grain positioning arrangement device and die positioning arrangement method

本發明有關於一種晶粒定位佈置設備以及晶粒定位佈置方法,特別是有關於一種增加定位佈置效率的晶粒定位佈置設備以及晶粒定位佈置方法。The present invention relates to a die positioning device and a die positioning arrangement method, and more particularly to a die positioning device and a die positioning arrangement method for increasing positioning efficiency.

在半導體晶圓級封裝的製程中,必須將晶圓切割成複數晶粒,再從中挑出良品,重新配置到圓形的基板上以進行後續的加工。由於晶粒是在重新配置(reconfiguration)後才進行重分布(redistribution)、繞線、植球……等加工程序,因此晶粒必須在基板上被擺放定位的非常精準。一般而言,誤差是要求控制在2微米之內。傳統的做法是選定基板上的一個位置,利用機械手臂吸取一顆晶粒,再將晶粒放置到控制器選定的位置。可以想見,機械手臂一次只能放置一顆晶粒,效率十分有限。並且每一顆晶粒被佈置到基板後,還需要一段製程時間,讓機械手臂施力於晶粒使其與基板接合。這更是嚴重拖慢了機械手臂佈置晶粒的速率,導致整體速率受限,對於產能需求極高的半導體產業而言,是急需改善的重要環節。In the process of semiconductor wafer level packaging, the wafer must be cut into a plurality of crystal grains, and then the good products are picked out and reconfigured onto a circular substrate for subsequent processing. Since the die is subjected to re-distribution, winding, ball-planting, etc. after reconfiguration, the die must be placed on the substrate with very precise positioning. In general, the error is required to be controlled within 2 microns. The traditional approach is to select a location on the substrate, pick up a die with a robotic arm, and place the die at the selected location of the controller. It can be imagined that the robot can only place one die at a time, and the efficiency is very limited. And after each die is placed on the substrate, a process time is required to allow the robot to apply force to the die to engage the substrate. This is a serious slowdown in the rate at which the robot arm lays out the grain, resulting in a limited overall rate. For the semiconductor industry with extremely high capacity requirements, it is an important part of the urgent need for improvement.

因此,為解決上述問題,本發明的目的即在提供一種晶粒定位佈置設備以及運用其之晶粒定位佈置方法,能大幅提高晶粒被定位佈置到基板的速率。Therefore, in order to solve the above problems, an object of the present invention is to provide a die positioning arrangement device and a die positioning arrangement method using the same, which can greatly increase the rate at which a die is positioned and disposed on a substrate.

本發明為解決習知技術之問題所採用之技術手段係提供一種增加定位佈置效率的晶粒定位佈置設備,用於將複數個晶粒定位於一基板的一待佈置區域,該晶粒定位佈置設備包含:一承托構件,具有一承托面,供該複數個晶粒佈置其上;一佈置機構,用以將該複數個晶粒佈置於該承托構件的該承托面;以及一轉置機構,經設置而將該承托構件自對應於該承托面的一上料方位轉置於一定置方位,其中於該上料方位,該承托構件之該承托面係面向於該佈置機構,而供該佈置機構佈置該複數個晶粒,以及於該定置方位,該承托構件與該基板係經相對翻轉,而使該承托構件的該承托面面向該基板的該待佈置區域,並經由該承托構件以及該基板之間的相對位移以使複數個晶粒定位於該基板的該待佈置區域。The technical means adopted by the present invention for solving the problems of the prior art provides a die positioning arrangement device for increasing the efficiency of positioning and positioning, and is used for positioning a plurality of crystal grains in a to-be-arranged region of a substrate, the die positioning arrangement The device comprises: a supporting member having a supporting surface for arranging the plurality of crystal grains thereon; an arrangement mechanism for arranging the plurality of crystal grains on the supporting surface of the supporting member; and The transposition mechanism is configured to rotate the support member from a feeding orientation corresponding to the receiving surface to a certain orientation, wherein the supporting surface of the supporting member faces the feeding orientation The arranging mechanism, wherein the arranging mechanism arranges the plurality of dies, and in the fixed orientation, the receiving member and the substrate are relatively inverted, and the supporting surface of the receiving member faces the substrate A region to be disposed, and a relative displacement between the support member and the substrate to position a plurality of dies in the region to be disposed of the substrate.

在本發明的一實施例中係提供一種增加定位佈置效率的晶粒定位佈置設備,該佈置機構係對應提供為複數個。In an embodiment of the invention, a die positioning arrangement device for increasing the efficiency of positioning arrangement is provided, and the arrangement mechanism is correspondingly provided in plurality.

在本發明的一實施例中係提供一種增加定位佈置效率的晶粒定位佈置設備,更包含一循環構件,該循環構件經設置而在對應於該轉置機構的位置與對應於該佈置機構的位置之間循環運輸該複數個承托構件。In an embodiment of the invention, there is provided a die positioning arrangement device for increasing the efficiency of positioning arrangement, further comprising a circulation member disposed at a position corresponding to the transposition mechanism and corresponding to the arrangement mechanism The plurality of support members are cyclically transported between the positions.

在本發明的一實施例中係提供一種增加定位佈置效率的晶粒定位佈置設備,該基板為一晶圓、玻璃、PCB、陶瓷基板。In an embodiment of the invention, a die positioning arrangement device for increasing the efficiency of positioning arrangement is provided, the substrate being a wafer, a glass, a PCB, and a ceramic substrate.

在本發明的一實施例中係提供一種增加定位佈置效率的晶粒定位佈置設備,該承托構件之尺寸實質上等於一曝光機構之一單位曝光範圍,該曝光機構係在後續製程中對佈置於該基板之晶粒進行曝光處理。In an embodiment of the invention, there is provided a die positioning arrangement device for increasing the efficiency of positioning arrangement, the size of the receiving member being substantially equal to a unit exposure range of an exposure mechanism, the exposure mechanism being arranged in a subsequent process The crystal grains of the substrate are subjected to exposure processing.

本發明為解決習知技術之問題所採用之另一技術手段係提供一種增加定位佈置效率的晶粒定位佈置方法,係利用一晶粒定位佈置設備而將複數個晶粒定位於一基板的一待佈置區域,該晶粒定位佈置設備包括一承托構件、一佈置機構以及一轉置機構,該晶粒定位佈置方法包含:一預置步驟,係由該佈置機構將該複數個晶粒佈置於該承托構件之一承托面;以及一轉置步驟,係由該轉置機構將該承托構件自對應於該承托面的一上料方位轉置於一定置方位,其中於該上料方位,該承托構件之該承托面係面向於該佈置機構,而供該佈置機構佈置該些晶粒,以及於該定置方位,該承托構件與該基板係經相對翻轉,而使的該承托面面向該基板的該待佈置區域,並經由該承托構件以及該基板之間的相對位移以使該複數個晶粒定位於該基板的該待佈置區域。Another technical means adopted by the present invention to solve the problems of the prior art is to provide a die positioning arrangement method for increasing the efficiency of positioning and positioning, which is to position a plurality of crystal grains on a substrate by using a die positioning device. The die positioning device includes a receiving member, an arranging mechanism, and a transposition mechanism, and the locating method includes: a preset step of arranging the plurality of dies by the arranging mechanism And a transposition step, wherein the transposition mechanism rotates the support member from a feeding orientation corresponding to the receiving surface to a certain orientation, wherein In the feeding direction, the supporting surface of the supporting member faces the arrangement mechanism, and the arrangement mechanism arranges the crystal grains, and in the fixed orientation, the receiving member and the substrate are relatively inverted, The support surface is oriented toward the area to be disposed of the substrate, and the relative displacement between the support member and the substrate is such that the plurality of dies are positioned at the region to be disposed of the substrate.

在本發明的一實施例中係提供一種增加定位佈置效率的晶粒定位佈置方法,其中於該轉置步驟中,該轉置係由該轉置機構以一角度翻轉該承托構件。In an embodiment of the invention, there is provided a die positioning arrangement method for increasing the efficiency of positioning arrangement, wherein in the transposing step, the transposition is flipped by the transposition mechanism at an angle to the receiving member.

在本發明的一實施例中係提供一種增加定位佈置效率的晶粒定位佈置方法,於該轉置步驟後,更包括一分離步驟:相對分離該承托構件以及該基板,留置該複數個晶粒於該待佈置區域。In an embodiment of the present invention, a die positioning arrangement method for increasing positioning efficiency is provided. After the transposing step, a separating step is further included: relatively separating the receiving member and the substrate, and leaving the plurality of crystals The particles are in the area to be arranged.

在本發明的一實施例中係提供一種增加定位佈置效率的晶粒定位佈置方法,其中該承托構件係提供為複數個,於該預置步驟中,係由該佈置機構將該複數個晶粒分別佈置於複數個承托構件,於該轉置步驟中,係由該轉置機構轉置該複數個承托構件。In an embodiment of the present invention, there is provided a die positioning arrangement method for increasing positioning efficiency, wherein the receiving member is provided in plural, and in the preset step, the plurality of crystals are arranged by the arrangement mechanism The pellets are respectively arranged in a plurality of support members, and in the transposing step, the plurality of support members are transposed by the transposition mechanism.

在本發明的一實施例中係提供一種增加定位佈置效率的晶粒定位佈置方法,其中該晶粒定位佈置設備更包含一循環構件,於該轉置步驟後,更包括一循環步驟,由該循環構件將經轉置後的該承托構件運輸至對應於該佈置機構的位置而供再度承托晶粒。In an embodiment of the present invention, a die positioning arrangement method for increasing positioning efficiency is provided, wherein the die positioning device further includes a cycle member, and after the transposing step, further includes a cycle step, The circulation member transports the transposed support member to a position corresponding to the arrangement for re-supporting the die.

經由本發明所採用之技術手段,取代一次僅能佈置單一顆晶粒的傳統方法,可以在短時間內將複數個晶粒定位於基板,減少設備來回移動的次數,並縮短總體製程時間,因而大幅增進晶粒佈置的速率,提高產能,間接降低生產成本。By the technical means adopted by the present invention, instead of the conventional method of arranging only one single crystal at a time, a plurality of crystal grains can be positioned on the substrate in a short time, the number of times of moving back and forth of the device is reduced, and the overall processing time is shortened. Significantly increase the rate of grain placement, increase production capacity, and indirectly reduce production costs.

本發明所採用的具體實施例,將藉由以下之實施例及附呈圖式作進一步之說明。The specific embodiments of the present invention will be further described by the following examples and the accompanying drawings.

以下根據第1圖至第4圖,而說明本發明的實施方式。該說明並非為限制本發明的實施方式,而為本發明之實施例的一種。Hereinafter, embodiments of the present invention will be described based on Figs. 1 to 4 . This description is not intended to limit the embodiments of the invention, but is an embodiment of the invention.

參閱第1圖以及第2圖所示,根據本發明的一實施例的一晶粒定位佈置設備100係用於將複數個晶粒D定位於一基板S的一待佈置區域R。晶粒定位佈置100設備包含一承托構件1、一佈置機構2、一轉置機構3、以及電連接佈置機構2和轉置機構3的一控制器4。承托構件1是一個負責承載複數晶粒D的中間載具,並且具有一承托面11,供複數個晶粒D佈置其上。承托構件1例如可以是一個具有黏性之托盤,或為複數真空吸嘴組合而成之構件,以供晶粒D能固定於其上。Referring to FIG. 1 and FIG. 2, a die positioning apparatus 100 according to an embodiment of the present invention is for positioning a plurality of crystal grains D in a region R to be disposed of a substrate S. The die positioning arrangement 100 comprises a support member 1, an arrangement 2, a transposition mechanism 3, and a controller 4 for the electrical connection arrangement 2 and the transposition mechanism 3. The support member 1 is an intermediate carrier responsible for carrying a plurality of crystal grains D, and has a support surface 11 on which a plurality of crystal grains D are arranged. The support member 1 can be, for example, a viscous tray or a combination of a plurality of vacuum nozzles for the die D to be fixed thereto.

佈置機構2用以將複數個晶粒D佈置於承托構件1的承托面11。在一個實施例中,佈置機構2是一個機械手臂,控制器4控制佈置機構2以吸取的方式將位於晶粒存放區Z的複數個晶粒D逐一佈置到承托面11上,但本發明不限於此。The arrangement mechanism 2 is for arranging a plurality of crystal grains D on the support surface 11 of the support member 1. In one embodiment, the arranging mechanism 2 is a mechanical arm, and the controller 4 controls the arranging mechanism 2 to arbitrarily arrange a plurality of dies D located in the die storage area Z one by one onto the support surface 11, but the present invention Not limited to this.

轉置機構3經設置而將承托構件1自對應於承托面11的一上料方位P1轉置於一定置方位P2。所謂上料方位P1,係指承托構件1之承托面11面向於佈置機構2供佈置機構2佈置複數個晶粒D。相對地,所謂定置方位P2指的是承托構件1與基板S經過相對翻轉,而使承托構件1的承托面11面向基板S的待佈置區域R,並經由承托構件1以及基板S之間的相對位移以使複數個晶粒D定位於基板S的待佈置區域R。在第2圖中,轉置機構3以一個角度翻轉承托構件1以轉置於定置方位P2。但實施上,也可以翻轉基板S、或翻轉承托構件1和基板S各一角度,以達到「承托構件1的承托面11面向基板S的待佈置區域R」。在承托構件被轉置於定置方位P2後,控制器4控制轉置機構3相對分離承托構件1以及基板S,留置複數個晶粒D於待佈置區域R。相對分離可以是透過轉置機構3移動承托構件1離開基板S、或移動基板S離開承托構件1,當然也可以透過各自移動這兩者而產生相對位移。The transposition mechanism 3 is arranged to transfer the receiving member 1 from a loading direction P1 corresponding to the receiving surface 11 to a certain orientation P2. The so-called feeding orientation P1 means that the supporting surface 11 of the receiving member 1 faces the arrangement mechanism 2 for the arrangement mechanism 2 to arrange a plurality of crystal grains D. In contrast, the so-called fixed orientation P2 refers to the relative inversion of the support member 1 and the substrate S, so that the receiving surface 11 of the receiving member 1 faces the region R to be arranged of the substrate S, and via the receiving member 1 and the substrate S The relative displacement between them is such that a plurality of crystal grains D are positioned in the region R of the substrate S to be arranged. In Fig. 2, the transposition mechanism 3 inverts the receiving member 1 at an angle to be placed in the fixed orientation P2. However, in practice, the substrate S or the angle between the support member 1 and the substrate S may be reversed to achieve the "region R to be disposed of the support surface 11 of the support member 1 facing the substrate S". After the support member is transferred to the fixed orientation P2, the controller 4 controls the transposition mechanism 3 with respect to the separation support member 1 and the substrate S, leaving a plurality of crystal grains D in the region R to be arranged. The relative separation may be that the transfer member 1 is moved away from the substrate S by the transposition mechanism 3, or the substrate S is moved away from the support member 1, and of course, the relative displacement may be generated by moving both of them.

控制器4除了用以控制佈置機構2和翻轉機構3的動作,也決定每一個晶粒D在承托面11上的位置,並且決定位於基板S的待佈置區域R。In addition to the actions for controlling the arrangement mechanism 2 and the turning mechanism 3, the controller 4 also determines the position of each of the crystal grains D on the support surface 11, and determines the region R to be disposed on the substrate S.

請參閱第3圖,本發明所提供的晶粒定位佈置方法,包括一預置步驟以及一轉置步驟。Referring to FIG. 3, the method for arranging the grain positioning provided by the present invention comprises a preset step and a transposition step.

在一個實施例中,承托構件1是一個方型的載具,基板S可以為晶圓、玻璃、PCB、陶瓷基板或其他材質,且本發明不限於此。承托構件1的尺寸實質上等於一曝光機構之一單位曝光範圍,曝光機構係在後續製程中對佈置於基板S之晶粒D進行曝光處理。也就是說,承托構件1的尺寸是根據後續加工使用的曝光機構來決定,並且承托面11上提供給複數個晶粒D的佈置位置的間距也可以進一步由曝光機構來定義。在承托構件1完全對應曝光機構的設計下,可使被佈置於基板S的複數個晶粒D的彼此之間相對位置、以及晶粒與基板S的相對位置的關係能完全吻合曝光機構的單位曝光範圍,將誤差降到最低。In one embodiment, the receiving member 1 is a square carrier, and the substrate S may be a wafer, a glass, a PCB, a ceramic substrate, or other materials, and the invention is not limited thereto. The size of the receiving member 1 is substantially equal to one unit exposure range of an exposure mechanism, and the exposure mechanism performs exposure processing on the crystal grains D disposed on the substrate S in a subsequent process. That is, the size of the receiving member 1 is determined according to the exposure mechanism used for subsequent processing, and the pitch of the arrangement position of the support surface 11 to the plurality of crystal grains D can be further defined by the exposure mechanism. Under the design of the receiving member 1 corresponding to the exposure mechanism, the relative positions of the plurality of crystal grains D arranged on the substrate S and the relative positions of the crystal grains and the substrate S can be completely matched with the exposure mechanism. Unit exposure range minimizes errors.

請參閱第4圖以及第5圖,本發明提出又一個實施例。與前一實施例的差別為,本實施例的晶粒定位佈置設備100a中更包含一循環構件5。並且於本實施例中,承托構件1提供為複數個,佈置機構2也對應地提供為複數個,但承托構件1以及佈置機構2的數量未必要相等。循環構件5經設置而在對應於轉置機構3的位置與對應於佈置機構2的位置之間循環運輸複數個承托構件1至接近複數個佈置機構2,複數個佈置機構2將複數個晶粒D佈置於複數個承托構件1,轉置機構3轉置複數個晶粒D至複數個待佈置區域R。Referring to Figures 4 and 5, the present invention proposes yet another embodiment. The difference from the previous embodiment is that the die positioning device 100a of the present embodiment further includes a circulation member 5. Further, in the present embodiment, the support members 1 are provided in plural, and the arrangement mechanism 2 is also provided in plurality, but the number of the support members 1 and the arrangement mechanism 2 are not necessarily equal. The circulation member 5 is arranged to circulate a plurality of support members 1 to a position close to a plurality of arrangement members 2 at a position corresponding to the transposition mechanism 3 and a position corresponding to the arrangement mechanism 2, the plurality of arrangement mechanisms 2 having a plurality of crystals The particles D are arranged on a plurality of support members 1, and the transposition mechanism 3 transposes a plurality of crystal grains D to a plurality of regions R to be arranged.

也就是說,在本實施例中,為進一步提高產能,採用複數個承托構件1和複數的佈置機構2。複數個佈置機構2同時作業,將複數個晶粒D佈置到複數個承托構件1。換句話說,相較前一實施例,本實施例在單位時間內可以有更多的承托構件1被佈置複數個晶粒D。如此可避免單一個佈置機構2的佈置速率跟不上轉置機構3的轉置速率而拖慢效率,而能讓轉置機構不間斷地轉置承托構件1。That is to say, in the present embodiment, in order to further increase the productivity, a plurality of support members 1 and a plurality of arrangement mechanisms 2 are employed. A plurality of arrangement mechanisms 2 are simultaneously operated to arrange a plurality of crystal grains D to a plurality of support members 1. In other words, compared with the previous embodiment, in this embodiment, more support members 1 can be arranged with a plurality of crystal grains D per unit time. This avoids that the arrangement rate of the single arrangement mechanism 2 cannot keep up with the transposition rate of the transposition mechanism 3 and slows down the efficiency, and allows the transposition mechanism to transpose the support member 1 without interruption.

在轉置過程中,與前一實施例相同,也是將承托構件1自上料方位P1轉置至定置方位P2。並且在承托構件1被轉置到定置方位P2後,透過控制器4控制轉置機構3相對分離複數個承托構件1以及基板S,留置複數個晶粒D於待佈置區域R。之後,由循環構件5將經轉置後的承托構件1運輸至對應於佈置機構2的位置而供再度承托晶粒。In the transposition process, as in the previous embodiment, the support member 1 is also transposed from the loading direction P1 to the fixed orientation P2. And after the support member 1 is transferred to the fixed orientation P2, the transposition mechanism 3 is controlled by the controller 4 to relatively separate the plurality of support members 1 and the substrate S, leaving a plurality of crystal grains D in the region R to be arranged. Thereafter, the transposed support member 1 is transported by the circulation member 5 to a position corresponding to the arrangement mechanism 2 for re-supporting the crystal grains.

藉由本發明的晶粒定位佈置設備100a以及晶粒定位佈置方法,翻轉機構3可以一次將複數個晶粒D轉置到基板S的待佈置區域R,省去冗長的佈置時間,大幅增快速率。詳細說來,轉置機構3每轉置一次承托構件1就可以節省很多「在晶粒存放區Z以及基板S之間來回移動」的時間。以實際的例子來說,若承托構件1承托N個晶粒D,相較於先前技術,轉置機構3轉置一次承托構件1就省去N-1單位的來回移動的時間。除此之外,先前技術佈置一顆晶粒需要一次製程時間,然而於本發明中,被佈置於承托構件1的複數個晶粒D乃同時接觸基板S,故複數個晶粒D總共也只需要一次的製程時間。當轉置機構3一次轉置了N個晶粒於基板S,就省下了N-1單位的製程時間。綜上所述,本發明之晶粒定位佈置設備和晶粒定位佈置方法能大幅提高產能,進而壓低生產成本。With the die positioning device 100a and the die positioning arrangement method of the present invention, the inversion mechanism 3 can transpose a plurality of crystal grains D to the region R of the substrate S to be disposed at one time, thereby eliminating a lengthy arrangement time and greatly increasing the fast rate. . In detail, the transposition mechanism 3 can save a lot of time "moving back and forth between the die storage area Z and the substrate S" every time the support member 1 is rotated. In a practical example, if the support member 1 supports N crystal grains D, the transposition mechanism 3 transposes the support member 1 once, and the time for the N-1 unit to move back and forth is omitted. In addition, the prior art arranging one crystal grain requires one process time. However, in the present invention, the plurality of crystal grains D disposed on the support member 1 simultaneously contact the substrate S, so that the plurality of crystal grains D are also Only one process time is required. When the transposition mechanism 3 transposes N crystal grains on the substrate S at a time, the process time of N-1 units is saved. In summary, the die positioning device and the die positioning arrangement method of the present invention can greatly increase the productivity, thereby reducing the production cost.

以上之敘述以及說明僅為本發明之較佳實施例之說明,對於此項技術具有通常知識者當可依據以下所界定申請專利範圍以及上述之說明而作其他之修改,惟此些修改仍應是為本發明之發明精神而在本發明之權利範圍中。The above description and description are only illustrative of the preferred embodiments of the present invention, and those of ordinary skill in the art can make other modifications in accordance with the scope of the invention as defined below and the description above, but such modifications should still be It is within the scope of the invention to the invention of the invention.

100‧‧‧晶粒定位佈置設備
1‧‧‧承托構件
11‧‧‧承托面
2‧‧‧佈置機構
3‧‧‧轉置機構
4‧‧‧控制器
5‧‧‧循環構件
D‧‧‧晶粒
P1‧‧‧上料方位
P2‧‧‧定置方位
R‧‧‧待佈置區域
S‧‧‧基板
S101‧‧‧步驟
S102‧‧‧步驟
S201‧‧‧步驟
S202‧‧‧步驟
S203‧‧‧步驟
S204‧‧‧步驟
Z‧‧‧晶粒存放區
100‧‧‧Grade positioning equipment
1‧‧‧Supporting components
11‧‧‧Support surface
2‧‧‧Arrangement agency
3‧‧‧Transplantation agency
4‧‧‧ Controller
5‧‧‧Circular components
D‧‧‧ grain
P1‧‧‧ feeding orientation
P2‧‧‧ Positioning
R‧‧‧Awaiting area
S‧‧‧Substrate
S101‧‧‧Steps
S102‧‧‧Steps
S201‧‧‧ steps
S202‧‧‧Steps
S203‧‧‧Steps
S204‧‧‧Steps
Z‧‧‧Grade storage area

第1圖為顯示根據本發明一實施例的晶粒定位佈置設備立體示意圖。 第2圖為顯示根據本發明的實施例的晶粒定位佈置設備部分側視示意圖。 第3圖為顯示根據本發明的實施例的晶粒定位佈置方法流程圖。 第4圖為顯示根據本發明的又一實施例的晶粒定位佈置設備立體示意圖。 第5圖為顯示根據本發明的又一實施例的晶粒定位佈置方法流程圖。FIG. 1 is a perspective view showing a die positioning device according to an embodiment of the invention. Fig. 2 is a side elevational view showing a portion of a grain positioning arrangement apparatus according to an embodiment of the present invention. FIG. 3 is a flow chart showing a method of arranging a grain in accordance with an embodiment of the present invention. Fig. 4 is a perspective view showing a grain positioning arrangement apparatus according to still another embodiment of the present invention. Fig. 5 is a flow chart showing a method of arranging a grain in accordance with still another embodiment of the present invention.

100‧‧‧晶粒定位佈置設備 100‧‧‧Grade positioning equipment

1‧‧‧承托構件 1‧‧‧Supporting components

11‧‧‧承托面 11‧‧‧Support surface

2‧‧‧佈置機構 2‧‧‧Arrangement agency

3‧‧‧轉置機構 3‧‧‧Transplantation agency

4‧‧‧控制器 4‧‧‧ Controller

D‧‧‧晶粒 D‧‧‧ grain

R‧‧‧待佈置區域 R‧‧‧Awaiting area

S‧‧‧基板 S‧‧‧Substrate

Z‧‧‧晶粒存放區 Z‧‧‧Grade storage area

Claims (10)

一種晶粒定位佈置設備,用於將複數個晶粒定位於一基板的一待佈置區域,該晶粒定位佈置設備包含: 一承托構件,具有一承托面,供該複數個晶粒佈置其上; 一佈置機構,用以將該複數個晶粒佈置於該承托構件的該承托面;以及 一轉置機構,經設置而將該承托構件自對應於該承托面的一上料方位轉置於一定置方位, 其中於該上料方位,該承托構件之該承托面係面向於該佈置機構,而供該佈置機構佈置該複數個晶粒,以及 於該定置方位,該承托構件與該基板係經相對翻轉,而使該承托構件的該承托面面向該基板的該待佈置區域,並經由該承托構件以及該基板之間的相對位移以使複數個晶粒定位於該基板的該待佈置區域。A die positioning device for positioning a plurality of crystal grains in a region to be arranged of a substrate, the die positioning device comprising: a supporting member having a supporting surface for the plurality of die arrangements An arrangement mechanism for arranging the plurality of crystal grains on the support surface of the support member; and a transposition mechanism configured to self-support the support member from the support surface The feeding direction is transferred to a certain orientation, wherein the supporting surface of the supporting member faces the arrangement mechanism, and the arrangement mechanism arranges the plurality of crystal grains, and the fixed orientation And the supporting member and the substrate are relatively reversed such that the supporting surface of the receiving member faces the region to be disposed of the substrate, and the relative displacement between the receiving member and the substrate is used to make the plural The dies are positioned in the area to be arranged of the substrate. 如申請專利範圍第1項所述之晶粒定位佈置設備,其中該承托構件係提供為複數個,該佈置機構係對應提供為複數個。The locating device according to claim 1, wherein the supporting member is provided in plural, and the arranging mechanism is provided in plurality. 如申請專利範圍第2項所述之晶粒定位佈置設備,更包含一循環構件,該循環構件經設置而在對應於該轉置機構的位置與對應於該佈置機構的位置之間循環運輸該複數個承托構件。The die positioning device of claim 2, further comprising a circulation member configured to cyclically transport between a position corresponding to the transposition mechanism and a position corresponding to the arrangement mechanism A plurality of supporting members. 如申請專利範圍第1項所述之晶粒定位佈置設備,其中該基板為一晶圓、玻璃、PCB、陶瓷基板。The die positioning device of claim 1, wherein the substrate is a wafer, a glass, a PCB, and a ceramic substrate. 如申請專利範圍第1項所述之晶粒定位佈置設備,其中該承托構件之尺寸實質上等於一曝光機構之一單位曝光範圍,該曝光機構係在後續製程中對佈置於該基板之晶粒進行曝光處理。The die positioning device of claim 1, wherein the receiving member has a size substantially equal to a unit exposure range of an exposure mechanism, and the exposure mechanism is a crystal disposed on the substrate in a subsequent process. The granules are subjected to exposure treatment. 一種晶粒定位佈置方法,係利用一晶粒定位佈置設備而將複數個晶粒定位於一基板的一待佈置區域,該晶粒定位佈置設備包括一承托構件、一佈置機構以及一轉置機構,該晶粒定位佈置方法包含: 一預置步驟,係由該佈置機構將該複數個晶粒佈置於該承托構件之一承托面;以及 一轉置步驟,係由該轉置機構將該承托構件自對應於該承托面的一上料方位轉置於一定置方位,其中於該上料方位,該承托構件之該承托面係面向於該佈置機構,而供該佈置機構佈置該些晶粒,以及於該定置方位,該承托構件與該基板係經相對翻轉,而使的該承托面面向該基板的該待佈置區域,並經由該承托構件以及該基板之間的相對位移以使該複數個晶粒定位於該基板的該待佈置區域。A method for locating a crystal grain by using a die positioning device to position a plurality of dies on a substrate to be arranged, the die positioning device comprising a supporting member, an arranging mechanism and a transposition The mechanism, the grain positioning arrangement method comprises: a preset step of arranging the plurality of crystal grains on a support surface of the support member by the arrangement mechanism; and a transposing step by the transposition mechanism Transmitting the support member from a loading direction corresponding to the receiving surface to a certain orientation, wherein the supporting surface of the receiving member faces the arrangement mechanism for the feeding direction Arranging the plurality of dies in the arranging mechanism, and in the fixed orientation, the receiving member and the substrate are relatively inverted, such that the receiving surface faces the region to be disposed of the substrate, and via the receiving member and the The relative displacement between the substrates is such that the plurality of dies are positioned in the region to be disposed of the substrate. 如申請專利範圍第6項所述之晶粒定位佈置方法,其中於該轉置步驟中,該轉置係由該轉置機構以一角度翻轉該承托構件。The method for arranging a grain positioning according to claim 6, wherein in the transposing step, the transposition is performed by the transposition mechanism to invert the support member at an angle. 如申請專利範圍第6項所述之晶粒定位佈置方法,於該轉置步驟後,更包括一分離步驟: 相對分離該承托構件以及該基板,留置該複數個晶粒於該待佈置區域。The method for arranging a grain positioning method according to claim 6 , further comprising a separating step after the transposing step: relatively separating the supporting member and the substrate, and leaving the plurality of crystal grains in the area to be arranged . 如申請專利範圍第6項所述之晶粒定位佈置方法,其中該承托構件係提供為複數個,於該預置步驟中,係由該複數個佈置機構將該複數個晶粒分別佈置於複數個承托構件,於該轉置步驟中,係由該轉置機構轉置該複數個承托構件。The method for arranging a grain positioning according to claim 6, wherein the supporting member is provided in plural, and in the presetting step, the plurality of dies are respectively arranged by the plurality of arranging mechanisms A plurality of supporting members, wherein in the transposing step, the plurality of receiving members are transposed by the transposing mechanism. 如申請專利範圍第6項所述之晶粒定位佈置方法,其中該晶粒定位佈置設備更包含一循環構件,於該轉置步驟後,更包括: 一循環步驟,由該循環構件將經轉置後的該承托構件運輸至對應於該佈置機構的位置而供再度承托晶粒。The method for arranging a grain positioning according to claim 6, wherein the die positioning device further comprises a circulation component, and after the transposing step, further comprising: a cycle step, wherein the cycle component is rotated The disposed support member is transported to a position corresponding to the arrangement for re-supporting the die.
TW104113911A 2015-04-30 2015-04-30 Chip-arranged-and-orientated apparatus and method using the same TWI548004B (en)

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TW430918B (en) * 1999-11-18 2001-04-21 King Mechatronics Co Ltd Die-placing method and device for small dies
CN1610085A (en) * 2003-10-24 2005-04-27 敏盛科技股份有限公司 Grain detection and classification device and method
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TW201428871A (en) * 2013-01-10 2014-07-16 晶元光電股份有限公司 Semiconductor component turning device

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW430918B (en) * 1999-11-18 2001-04-21 King Mechatronics Co Ltd Die-placing method and device for small dies
CN1610085A (en) * 2003-10-24 2005-04-27 敏盛科技股份有限公司 Grain detection and classification device and method
US20080229574A1 (en) * 2007-03-19 2008-09-25 Advanced Chip Engineering Technology Inc. Self chip redistribution apparatus and method for the same
TW201428871A (en) * 2013-01-10 2014-07-16 晶元光電股份有限公司 Semiconductor component turning device

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