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TWI438261B - β型矽鋁氮氧化物之製造方法、β型矽鋁氮氧化物及其利用製品 - Google Patents

β型矽鋁氮氧化物之製造方法、β型矽鋁氮氧化物及其利用製品 Download PDF

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TWI438261B
TWI438261B TW100116605A TW100116605A TWI438261B TW I438261 B TWI438261 B TW I438261B TW 100116605 A TW100116605 A TW 100116605A TW 100116605 A TW100116605 A TW 100116605A TW I438261 B TWI438261 B TW I438261B
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aluminum oxynitride
type lanthanum
lanthanum aluminum
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TW201144409A (en
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Masayoshi Ichikawa
Hideyuki Emoto
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Denki Kagaku Kogyo Kk
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Description

β型矽鋁氮氧化物之製造方法、β型矽鋁氮氧化物及其利用製品
本發明係有關β型矽鋁氮氧化物及其製造方法、使用該β型矽鋁氮氧化物之螢光體以及使用該螢光體的發光裝置。
作為發光元件(以下簡稱為LED)的螢光體,已知有β型矽鋁氮氧化物螢光體。β型矽鋁氮氧化物螢光體係經過將混合有氧化鋁或氧化矽的至少一種、氮化矽、氮化鋁及以氧化銪或氧化鈰為代表的光學活性元素化合物的原料填充於氮化硼製容器,並在1820℃以上2200℃以下的溫度下進行燒成的燒成步驟而製造。
作為提高β型矽鋁氮氧化物螢光體的發光強度的技術,已知有對燒成步驟後的燒成粉碎物實施酸處理者(專利文獻1)。
先前技術文獻 專利文獻
專利文獻1 日本特開2005-255885號公報
β型矽鋁氮氧化物係藉由同時對填充有原料的多個氮化硼製容器在燒成爐內進行燒成來大量生產。惟,當大量生產β型矽鋁氮氧化物時,倘若未進行燒成爐內部的溫度條件等的調整,則多個氮化硼製容器中有時會製出不具備所需之發光強度的β型矽鋁氮氧化物,而使得發光強度變得不均勻。
本發明者等人發現β型矽鋁氮氧化物所含之碳濃度會對發光強度產生影響而完成本發明。
本發明目的在於提供一種提高品質之β型矽鋁氮氧化物之製造方法,同時提供一種降低β型矽鋁氮氧化物所含有的碳並具有高發光強度的β型矽鋁氮氧化物。本發明其他目的在於提供一種使用該β型矽鋁氮氧化物且品質優良的螢光體,又一目的在於提供一種使用該螢光體之具有高發光強度的發光裝置。
本發明β型矽鋁氮氧化物之製造方法,係具有β型矽鋁氮氧化物原料在1820℃以上2200℃以下的溫度下進行燒成的燒成步驟,其中該β型矽鋁氮氧化物原料係混合氮化矽、氮化鋁、氧化鋁或氧化矽的至少一種、及光學活性元素化合物而成。燒成步驟中,係以使填充於多個氮化硼製容器的β型矽鋁氮氧化物原料容易與氮氣接觸的方式將其配置於石墨箱內,並於氮氣環境下進行燒成。
本發明β型矽鋁氮氧化物之製造方法的其他構成,係具有β型矽鋁氮氧化物原料在1820℃以上2200℃以下的溫度下進行燒成的燒成步驟,其中該β型矽鋁氮氧化物原料係混合氮化矽、氮化鋁、氧化鋁或氧化矽的至少一種、及光學活性元素化合物而成。燒成步驟為以使填充於多個氮化硼製容器的β型矽鋁氮氧化物原料容易與氮氣接觸的方式將其配置於石墨箱內,並使石墨箱的上部敞開,於氮氣環境下進行燒成的步驟。
上述β型矽鋁氮氧化物之製造方法的發明中,光學活性元素化合物較佳為氧化銪。
本發明β型矽鋁氮氧化物係以通式Si6-z Alz Oz N8-z 表示、含有Eu且碳濃度為200ppm以下。較佳的是碳濃度為150ppm以下。
其他發明為使用該β型矽鋁氮氧化物之螢光體。
又一其他發明為具有使用β型矽鋁氮氧化物的螢光體及發光光源的發光裝置。
根據本發明β型矽鋁氮氧化物之製造方法,能以高水準的品質且生產性良好地製造發光強度高的β型矽鋁氮氧化物。
本發明β型矽鋁氮氧化物係作為在紫外線至可見光的廣泛波長區域激發、效率高並作為以520nm以上550nm以下的範圍內為主波長的綠色發光螢光體而性能優異。因此,其可單獨或與其他螢光體組合而適當利用於各種發光元件,特別是以紫外LED或藍色LED為光源的發光裝置。
本發明發光裝置之β型矽鋁氮氧化物由於具有高發光強度,即便於高溫下使用輝度的降低亦小且壽命較長。
[用以實施發明之形態]
以下對本發明之實施方式詳細進行說明。
<β型矽鋁氮氧化物之製造方法>
本發明β型矽鋁氮氧化物之製造方法係具有β型矽鋁氮氧化物原料在1820℃以上2200℃以下的溫度下進行燒成的燒成步驟,其中該β型矽鋁氮氧化物原料係混合氧化鋁或氧化矽的至少一種、氮化矽、氮化鋁及光學活性元素化合物而成。其特徵為:以使填充於多個氮化硼製容器的β型矽鋁氮氧化物原料容易與氮氣接觸的方式將其配置於石墨箱內,並使石墨箱的上部敞開,於氮氣環境下進行燒成步驟。
燒成步驟中所使用之氮化硼製容器的形狀可為立方體、直方體或圓筒形的任一種,而為使熱傳遞均勻,較佳為圓筒形或球形,特別再加以考量穩定性則較佳為圓筒形。容器的大小較佳為如使熱傳遞均勻之範圍的大小,當為圓筒形時,較佳為內徑的直徑為5cm~8cm,內徑的高度為5cm~8cm。
石墨箱係呈以石墨板形成的箱狀,具有可收納多個氮化硼製容器的大小,且上部具備開口部。呈箱狀時,石墨箱的大小為例如內尺寸:長51cm×寬31cm×高20cm。因石墨箱的上部敞開,使得填充於多個氮化硼製容器的β型矽鋁氮氧化物原料處於容易與氮氣接觸的狀態,由此便可在氮氣環境下進行燒成。所製造之β型矽鋁氮氧化物所含的碳濃度便降低,而能夠製得高發光強度的β塑矽鋁氮氧化物。
本發明中「以使β型矽鋁氮氧化物原料容易與氮氣接觸的方式配置於石墨箱內」係指採用以下三種方式當中的至少一種方式:沿著石墨箱的壁面配置氮化硼製容器的方式;未上下層疊而是以一層來配置氮化硼製容器的方式;及使相對石墨箱之內容積之原料粉的總容積的比例,即原料粉填充率為2%以下的方式。原料粉的總容積可由原料粉的總重量與β型矽鋁氮氧化物的密度(3.2g/cm3 )來計算。
燒成步驟時的氮氣係以提高製造環境的氮氣分壓為佳。提高氮氣分壓即可穩定燒成步驟時之原料的配置。
以上述條件所製造之β型矽鋁氮氧化物的含碳量為200ppm以下,發光強度係與市售YAG:Ce(KASEI OPTONIX公司製YAG:Ce(等級名:P46Y3))同等或其以上。
本發明中,燒成步驟後的β型矽鋁氮氧化物較佳在大氣壓氬氣環境中於1450℃~1600℃下再度經加熱處理。
本發明中,燒成步驟後或再加熱處理後的β型矽鋁氮氧化物較佳經酸處理。酸處理在本發明係指,使β型矽鋁氮氧化物分散於酸的水溶液中,並攪拌數分鐘至數小時左右使其反應,其後對β型矽鋁氮氧化物進行水洗。藉由酸處理便可溶解去除加熱時發生變化的發光阻礙因子,而使螢光特性提升。作為酸處理中所使用的酸有氫氟酸、硫酸、磷酸、鹽酸、硝酸的一種以上的酸。
<β型矽鋁氮氧化物>
本發明β型矽鋁氮氧化物為以通式Si6-z Alz Oz N8-z 表示之β型矽鋁氮氧化物的主體結晶中含有選自Eu、Mn、Sm、Ce的一種以上的元素作為發光中心者。特別是含有Eu者可於紫外線至可見光的廣泛波長區域激發而較佳。
本發明β型矽鋁氮氧化物其由紅外線吸收法所測量之碳濃度為200ppm以下。構成β型矽鋁氮氧化物的碳多時會導致發光強度降低,並阻礙發光中心Eu2+ 對光的吸收。即,碳濃度為200ppm以下之β型矽鋁氮氧化物具有高發光強度。更佳的是碳濃度為150ppm以下。
又,本發明β型矽鋁氮氧化物的晶格常數係主要由Si-N鍵對Al-O鍵的取代數(即z值)支配。即,晶格常數a較佳處於0.7605nm以上0.7620nm以下、晶格常數c較佳處於0.2908nm以上0.2920nm以下之範圍。β型矽鋁氮氧化物的晶格大小愈大則愈容易含有Eu,特別是晶格常數a、c為上述範園內時,容易含有所需量的Eu以便獲得足夠的輝度而較佳。
本發明β型矽鋁氮氧化物中,Eu含有量只要為可充分獲得發光輝度之範圍即可,較佳為例如0.1質量%以上3質量%以下之範圍。
<發光裝置>
本發明發光裝置其結構具備以上述β型矽鋁氮氧化物形成的螢光體及發光光源。使用該發光裝置,以含有350nm以上500nm以下之波長的紫外光或可見光為激發源對β型矽鋁氮氧化物進行照射。經由照射,β型矽鋁氮氧化物便於520nm以上550nm以下之範圍的波長處發出具有具峰值之高發光強度的光,由此本發明發光裝置即具有高發光強度。作為發光裝置的激發源係有個別的紫外LED、藍色LED、螢光體燈的單體或其等組合。又,藉由組合β型矽鋁氮氧化物螢光體、與紅色發光螢光體或藍色發光螢光體即可使發光色為白色或其他波長的色彩。
本發明β型矽鋁氮氧化物由於高溫下的輝度降低較少,使用其之發光裝置的輝度降低及色度偏移便較小,於高溫下仍不會劣化。再者,其在氧化氣體環境及水分環境下的長期穩定性亦優良,故可延長高輝度狀態。
以下,基於實施例對本發明更詳細進行說明。
實施例1 [含有Eu之β型矽鋁氮氧化物用原料粉末的製備]
混合α型氮化矽粉末(電氣化學工業公司製NP-400等級,含氧量0.96質量%)95.4質量%、氮化鋁粉末(TOKUYAMA公司製F級,含氧量0.9質量%)3.1質量%、氧化鋁粉末(大明化學公司製TM-DAR等級)0.7質量%、及氧化銪粉末(信越化學工業公司製RU等級)0.8質量%,而製得原料混合物1kg。
使用V型混合機對原料混合物進行乾式混合30分鐘後,使其全部通過孔徑150μm的尼龍製篩網,即製得螢光體合成用的原料粉。
[實驗例1] <燒成步驟>
將如上所得之原料粉以每容器100g填充於九個內尺寸為直徑8cm×高8cm之附有蓋的圓筒型氮化硼製容器(電氣化學工業公司製N-1等級)中,並沿著壁面將容器配置於內尺寸為51cm×31cm×高20cm之附有上蓋的石墨箱內部(原料填充率=0.9%)。以碳製加熱器的電爐,在0.9MPa的加壓氮氣環境中、2000℃下進行10小時的加熱處理後,將所得之粉末緩冷至室溫。所得之燒成物係呈稀鬆凝聚的塊狀,以穿戴有乾淨橡膠手套的人手來進行輕度分解粉碎。使進行輕度分解粉碎後的原料通過孔徑150μm的篩網,即製得45g的合成粉末。
原料填充率為原料粉的總容積2,880cm3 除以附有上蓋之石墨箱的內容積31,620cm3 (51cm×31cm×20cm)所得的值,原料粉的總容積則為原料粉全體的重量900g(容器9個×每個容器的原料粉重100g)除以β型矽鋁氮氧化物的密度(3.2g/cm3 )所得的值。原料填充率具體而言為基於下式所算出的值。
原料填充率0.9%=((9×100)/3.2)/(51×31×20)
[實驗例2]
於石墨箱內部,將14個填充有原料的圓筒型氮化硼製容器按每5個配置成3行,但僅有1行為4個(原料填充率=1.4%)。其他係以與實驗例1之燒成步驟相同的條件來進行處理,而製得螢光體粉末。
[實驗例3]
打開石墨箱的上蓋,以與實驗例2相同個數的容器、燒成步驟及條件來進行處理,而製得螢光體粉末。
[實驗例4]
將填充有原料的圓筒型氮化硼製容器設為19個,並於石墨箱內部配置成3行×5行(原料填充率=1.9%),進一步改為將4個容器沿著石墨箱的壁面配置於上層,並以與實驗例1之燒成步驟相同的條件進行處理,而製得螢光體粉末。
[比較例1]
改為於石墨箱內部,將30個填充有原料的圓筒型氮化硼製容器按每5個配置成3列、上下2層(原料填充率=3.0%),並以與實驗例1之燒成步驟相同的處理步驟及條件來進行處理,而製得螢光體粉末。
以螢光分光光度計(Hitachi High-Technologies公司製F4500)測定實驗例1-4及比較例1之螢光粉末的發光強度。將測定結果示於表1。
螢光體的發光強度係由以下操作而算出:
將螢光體粉末裝入10mm×10mm×45mm的雙面透明石英槽,輕敲50次後180度變換槽之方向,並進一步輕敲50次。將裝入有該螢光體粉末的槽安裝在位於上述裝置之試料室內的槽保持器(cell holder)上。由發光光源(氙燈)將分光成既定波長的單色光導入該槽內。以該單色光為激發源對螢光體試料進行照射,並使用分光光度計來測定試料的發光強度。
本實施例中的單色光係使用波長455nm的藍色光。
發光強度係以將YAG:Ce(KASEI OPTONIX公司製P46Y3)的發光強度定為100%的相對峰值強度(%)來表示。
以碳分析儀(LECOJAPAN股份有限公司製IR-412)測定原料混合粉、實驗例1~4及比較例1之螢光粉末的碳濃度。螢光體的碳濃度係如下評定:將粉末狀螢光體0.1g及銅粉末1.0g裝入氧化鋁坩堝中,並安置於試料台上。對該槽施加高頻來熔融螢光體。在氧化氣體環境中,以紅外線吸收法來測定由螢光體排出的氣體。將測定結果示於表2。
由表2可知,若以碳製加熱器的電爐,在0.9MPa的加壓氮氣環境中、2000℃下進行10小時的加熱處理,則原料混合粉中的碳濃度係降低。碳濃度的降低係因容器數、原料粉填充率而異。
原料填充率愈低則碳濃度愈低。尤其是原料填充率為2%以下時,碳濃度為200ppm以下而較佳。
又,將容器配置成上下2層時,較佳沿著石墨箱的壁面來配置容器。
再者,在打開置入有氮化硼製容器之石墨箱的蓋的狀態下進行燒成則可降低碳含量,其中該氮化硼製容器係裝入有含有Eu之β型矽鋁氮氧化物用原料粉。
將發光強度及碳濃度的關係示於第1圖。
由表1、表2及第1圖可知,降低合成粉末所含的碳濃度可提高發光強度。碳濃度只要為200ppm以下,則產生高於YAG:Ce的發光強度。
實施例2 [粉碎步驟]
以超音速噴射粉碎機(日本Pneumatic工業公司製PJM-80SP)分解粉碎實驗例1中所得的合成粉末而製得粉末。第2圖係表示所得之粉碎粉末的掃描式電子顯微鏡影像(SEM影像)。粉碎粉末的粒徑控制係由對粉碎機之粉碎室的試料供給速度與粉碎空氣壓力來進行。
[加熱處理步驟]
將粉碎後的粉末15g填充於直徑40mm×高45mm之附有蓋的圓筒型氮化硼製容器(電氣化學工業公司製N-1等級)中,以碳製加熱器的電爐,在大氣壓氬氣環境中、1450℃下進行8小時的加熱處理。所得之粉末並無伴隨燒成所致之收縮,其性質與加熱前幾乎相同,再使其全數通過孔徑45μm的篩網。
[酸處理步驟]
對加熱處理後的粉末在50%氫氟酸與70%硝酸的混酸(1:1)中進行處理。處理中懸浮液係由深綠色轉為鮮豔的綠色。其後進行水洗及乾燥,即製得β型矽鋁氮氧化物粉末。
「微粉去除處理」
對所得之β型矽鋁氮氧化物的粉末以溼式沉降法進行微粉去除處理。首先,以螢光體粉末為分散劑而分散於添加有六偏磷酸鈉的水溶液中後,移至容器中並靜置之後,重複進行去除上澄液的操作直至上澄液呈透明。其後將沉澱物過濾,並充分進行水洗以去除分散劑,再進行乾燥即製得經去除微粉的β型矽鋁氮氧化物粉末(實驗例5)。
對實驗例2所述之合成粉末以與實驗例5相同的處理步驟及條件進行處理,即製得β型矽鋁氮氧化物粉末(實驗例6)。
[比較例2]
對比較例1所述之合成粉末以與實驗例5相同的處理步驟及條件進行處理,即製得β型矽鋁氮氧化物粉末。藉由包含粉碎步驟、加熱處理步驟、酸處理步驟及分級步驟的製造方法,以製造出β型矽鋁氮氧化物粉末(比較例2)。
將實驗例5、6及比較例2之β型矽鋁氮氧化物的發光強度的測定結果示於表3。測定係以與實施例1相同的方法來進行。
將實驗例5、6及比較例2之發光強度及碳濃度的關係示於第3圖。
由表3及第3圖可知,即便進行粉碎步驟、加熱處理步驟、酸處理步驟及分級步驟仍具有與燒成步驟後相同的趨勢,燒成步驟後的碳濃度若未滿足200ppm以下的條件則無法獲得足夠的發光強度。
第1圖為表示本發明實施例1中所得之粉末狀螢光體的碳濃度與發光強度的關係的圖。
第2圖為表示實施例2之粉末狀螢光體的掃描式電子顯微鏡影像(SEM影像)的圖像。
第3圖為表示實施例2中所得之粉末狀螢光體的碳濃度與發光強度的關係的圖。

Claims (5)

  1. 一種β型矽鋁氮氧化物之製造方法,其為一種具有β型矽鋁氮氧化物原料在1820℃以上2200℃以下的溫度下進行燒成的燒成步驟的β型矽鋁氮氧化物之製造方法,其中該β型矽鋁氮氧化物原料係混合氧化鋁或氧化矽的至少一種、氮化矽、氮化鋁及光學活性元素化合物而成;使填充於多個氮化硼製容器的β型矽鋁氮氧化物原料的總容積相對於石墨箱的內容積為2%以下而配置於石墨箱內,並於氮氣環境下進行燒成。
  2. 一種β型矽鋁氮氧化物之製造方法,其為一種具有β型矽鋁氮氧化物原料在1820℃以上2200℃以下的溫度下進行燒成的燒成步驟的β型矽鋁氮氧化物之製造方法,其中該β型矽鋁氮氧化物原料係混合氧化鋁或氧化矽的至少一種、氮化矽、氮化鋁及光學活性元素化合物而成;使填充於多個氮化硼製容器的β型矽鋁氮氧化物原料的總容積相對於石墨箱的內容積為2%以下而配置於石墨箱內,並使石墨箱的上部敞開,於氮氣環境下進行燒成。
  3. 如申請專利範圍第1或2項之β型矽鋁氮氧化物之製造方法,其中前述光學活性元素化合物為氧化銪。
  4. 一種β型矽鋁氮氧化物,其由如申請專利範圍第1或2項之β型矽鋁氮氧化物之製造方法所製造,碳濃度為200ppm以下。
  5. 一種發光裝置,其具有如申請專利範圍第4項之β型矽鋁氮氧化物及發光光源。
TW100116605A 2010-05-13 2011-05-12 β型矽鋁氮氧化物之製造方法、β型矽鋁氮氧化物及其利用製品 TWI438261B (zh)

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