TWI424808B - Plant lighting and plant cultivation system - Google Patents
Plant lighting and plant cultivation system Download PDFInfo
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- TWI424808B TWI424808B TW099119290A TW99119290A TWI424808B TW I424808 B TWI424808 B TW I424808B TW 099119290 A TW099119290 A TW 099119290A TW 99119290 A TW99119290 A TW 99119290A TW I424808 B TWI424808 B TW I424808B
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- A—HUMAN NECESSITIES
- A01—AGRICULTURE; FORESTRY; ANIMAL HUSBANDRY; HUNTING; TRAPPING; FISHING
- A01G—HORTICULTURE; CULTIVATION OF VEGETABLES, FLOWERS, RICE, FRUIT, VINES, HOPS OR SEAWEED; FORESTRY; WATERING
- A01G9/00—Cultivation in receptacles, forcing-frames or greenhouses; Edging for beds, lawn or the like
- A01G9/24—Devices or systems for heating, ventilating, regulating temperature, illuminating, or watering, in greenhouses, forcing-frames, or the like
- A01G9/249—Lighting means
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- A—HUMAN NECESSITIES
- A01—AGRICULTURE; FORESTRY; ANIMAL HUSBANDRY; HUNTING; TRAPPING; FISHING
- A01G—HORTICULTURE; CULTIVATION OF VEGETABLES, FLOWERS, RICE, FRUIT, VINES, HOPS OR SEAWEED; FORESTRY; WATERING
- A01G7/00—Botany in general
- A01G7/04—Electric or magnetic or acoustic treatment of plants for promoting growth
- A01G7/045—Electric or magnetic or acoustic treatment of plants for promoting growth with electric lighting
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F21—LIGHTING
- F21V—FUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
- F21V29/00—Protecting lighting devices from thermal damage; Cooling or heating arrangements specially adapted for lighting devices or systems
- F21V29/50—Cooling arrangements
- F21V29/51—Cooling arrangements using condensation or evaporation of a fluid, e.g. heat pipes
- F21V29/52—Cooling arrangements using condensation or evaporation of a fluid, e.g. heat pipes electrically powered, e.g. refrigeration systems
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F21—LIGHTING
- F21V—FUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
- F21V29/00—Protecting lighting devices from thermal damage; Cooling or heating arrangements specially adapted for lighting devices or systems
- F21V29/50—Cooling arrangements
- F21V29/60—Cooling arrangements characterised by the use of a forced flow of gas, e.g. air
- F21V29/65—Cooling arrangements characterised by the use of a forced flow of gas, e.g. air the gas flowing in a closed circuit
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F21—LIGHTING
- F21Y—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES F21K, F21L, F21S and F21V, RELATING TO THE FORM OR THE KIND OF THE LIGHT SOURCES OR OF THE COLOUR OF THE LIGHT EMITTED
- F21Y2105/00—Planar light sources
- F21Y2105/10—Planar light sources comprising a two-dimensional array of point-like light-generating elements
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F21—LIGHTING
- F21Y—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES F21K, F21L, F21S and F21V, RELATING TO THE FORM OR THE KIND OF THE LIGHT SOURCES OR OF THE COLOUR OF THE LIGHT EMITTED
- F21Y2115/00—Light-generating elements of semiconductor light sources
- F21Y2115/10—Light-emitting diodes [LED]
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- H10W72/5522—
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- H10W72/5525—
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- H10W90/756—
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- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- Environmental Sciences (AREA)
- Biodiversity & Conservation Biology (AREA)
- Botany (AREA)
- Ecology (AREA)
- Forests & Forestry (AREA)
- Cultivation Of Plants (AREA)
- Non-Portable Lighting Devices Or Systems Thereof (AREA)
- Arrangement Of Elements, Cooling, Sealing, Or The Like Of Lighting Devices (AREA)
Description
本發明係關於植物栽培用的照明裝置及使用該照明裝置之植物栽培系統。The present invention relates to a lighting device for plant cultivation and a plant cultivation system using the same.
近年來,以不受自然條件變動左右的農業環境建構而言,控制栽培環境的光、溫度、濕度、二氧化碳濃度等對植物成長造成影響的所有條件來生產農作物等的植物工廠、蔬菜工廠等已被實用化。In recent years, in the construction of an agro-environment that is not affected by changes in natural conditions, plant factories and vegetable factories that produce crops, etc., have been controlled under all conditions that affect the growth of plants such as light, temperature, humidity, and carbon dioxide concentration in the cultivation environment. It has been put into practical use.
在該等植物工廠係有完全人工光型與太陽光併用型者,惟兩者均必須設置照射人工光的照明裝置。而由照明裝置必須對植物照射紅色與藍色的光。在該等照明裝置的光源係採用半導體發光元件(LED:Light Emitting Diode)。In these plant factories, there is a combination of fully artificial light type and sunlight, but both must be provided with illumination devices that emit artificial light. The illumination device must illuminate the plants with red and blue light. A light-emitting device (LED: Light Emitting Diode) is used as the light source of the illumination device.
如上所示之植物工廠等進行植物栽培的栽培室的環境係被維持管理在預先訂定的溫度及濕度。因此,來自設置於此的照明裝置的發熱會影響栽培室的溫度管理,故較不理想。此外,栽培室一般為高溫高濕,因此若在該栽培室設置照明裝置,則會劣化較為劇烈,壽命變短等,以設置照明裝置的環境而言,較不理想。The environment of the cultivation room in which the plant cultivation is performed, such as the plant factory shown above, is maintained and managed at a predetermined temperature and humidity. Therefore, the heat from the lighting device installed here affects the temperature management of the cultivation room, which is less desirable. Further, since the cultivation room is generally high-temperature and high-humidity, if the illumination device is installed in the cultivation room, the deterioration is severe, the life is shortened, and the like, and the environment in which the illumination device is installed is less preferable.
在專利文獻1係記載一種使由具備有使用熱冷媒之強制冷卻裝置的面板狀光半導體單元所構成的光源,與植物栽培面近接設置的植物栽培裝置。Patent Document 1 describes a plant cultivation device in which a light source including a panel-shaped photo-semiconductor unit including a forced cooling device using a heat-refrigerant is placed in close proximity to a plant cultivation surface.
在專利文獻2係記載一種為了即使在濕度較高的環境下亦提高植物栽培用的照明面板的耐久性,具備有:基座、與該基座相密接的金屬薄板製基板;配列在該基板上的多數發光二極體;與基座之間隔出空間予以配置的蓋件;及介在於基座與蓋件之間,用以相對外部以氣密維持空間的密封材,在空間填充乾燥空氣,並且在框材內收容有乾燥劑的植物栽培用的照明面板。Patent Document 2 discloses a substrate made of a metal thin plate that is in close contact with the pedestal in order to improve the durability of the illuminating panel for plant cultivation even in a high humidity environment, and is arranged on the substrate. a plurality of light-emitting diodes; a cover member disposed with a space separating the base; and a seal member between the base and the cover member for maintaining a space in an airtight manner with respect to the outside, filling the space with dry air And a lighting panel for plant cultivation in which a desiccant is accommodated in the frame material.
在專利文獻3係記載一種促使植物栽培用之半導體發光照明裝置的半導體發光元件的放熱,進行藉由大電流施加所致之高亮度化,具有:可在上側通過冷卻水,而且可在內部通電的金屬壁;及安裝在金屬壁下部的光源單元的半導體發光照明裝置。In Patent Document 3, a heat radiation of a semiconductor light-emitting device that promotes a semiconductor light-emitting illumination device for plant cultivation is performed, and high luminance is applied by application of a large current, and the cooling water can be passed on the upper side and can be internally energized. a metal wall; and a semiconductor light-emitting illumination device mounted on a light source unit at a lower portion of the metal wall.
(專利文獻1)日本特開平9-98665號公報(Patent Document 1) Japanese Patent Publication No. 9-98665
(專利文獻2)日本特開2000-207933號公報(Patent Document 2) Japanese Patent Laid-Open Publication No. 2000-207933
(專利文獻3)日本特開2003-110143號公報(Patent Document 3) Japanese Patent Laid-Open Publication No. 2003-110143
以往,在使用半導體發光元件作為光源的植物栽培中,為了獲得植物育成所需的光量子密度而施加超過額定電流的電流。伴隨於此,半導體發光元件的發熱量會增加,半導體發光元件的接面溫度會增大。半導體發光元件的溫度增加係存在有引起半導體發光元件本身的發光效率減小、及作為半導體發光元件周邊構件之環氧樹脂等樹脂材料黃變的問題。為了解決該問題,將半導體發光元件進行水冷乃具有效果,但是在半導體發光元件或半導體發光元件周邊構件引起結露或吸濕,半導體發光元件本身劣化或不亮燈、因半導體發光元件周邊的銀鍍敷、焊料、銅箔氧化所造成的發光強度減小或不亮燈急速進展會造成問題。尤其,關於峰值波長660nm的紅色發光元件,以往由於為Al組成較高的Ga1-x Alx As系化合物半導體發光元件,因此在高濕環境下,氧容易與Al原子結合,而使半導體發光元件本身急速變質、發光強度急速減小,以致不亮燈。Conventionally, in plant cultivation using a semiconductor light-emitting element as a light source, a current exceeding a rated current is applied in order to obtain a photon density required for plant growth. Along with this, the amount of heat generated by the semiconductor light emitting element increases, and the junction temperature of the semiconductor light emitting element increases. The increase in temperature of the semiconductor light-emitting device has a problem that the light-emitting efficiency of the semiconductor light-emitting device itself is reduced and the resin material such as an epoxy resin which is a peripheral member of the semiconductor light-emitting device is yellowed. In order to solve this problem, it is effective to water-cool a semiconductor light-emitting element, but cause condensation or moisture absorption in a semiconductor light-emitting element or a peripheral member of the semiconductor light-emitting element, the semiconductor light-emitting element itself is deteriorated or not lit, and silver plating is applied around the semiconductor light-emitting element. Decreased luminous intensity caused by oxidation of solder, solder, and copper foil or rapid development of non-lighting causes problems. In particular, the red light-emitting element having a peak wavelength of 660 nm is a Ga 1-x Al x As-based compound semiconductor light-emitting element having a high Al composition. Therefore, in a high-humidity environment, oxygen is easily bonded to Al atoms to cause semiconductor light emission. The component itself deteriorates rapidly, and the luminous intensity is rapidly reduced, so that the light is not turned on.
本發明之目的在提供一種解決藉由水等冷媒將半導體發光元件效率佳地進行冷卻時因結露、吸濕所造成的不良情形,且使用長壽命且高效率維持的半導體發光元件作為光源的植物栽培用的照明裝置及使用該照明裝置的植物栽培系統。An object of the present invention is to provide a plant which solves the problem of condensation and moisture absorption when the semiconductor light-emitting device is efficiently cooled by a refrigerant such as water, and uses a long-life and high-efficiency semiconductor light-emitting element as a light source. A lighting device for cultivation and a plant cultivation system using the same.
根據該目的,適用本發明之照明裝置係一種植物栽培用的照明裝置,其特徵為具備有:複數發光元件;具有透過發光元件所發出的光的透光性窗部,以覆蓋發光元件的方式而設的框體;被配置在框體的內部,藉由傳導而將發光元件所發生的熱作放熱的放熱基板;及被安裝在放熱基板,作為冷媒流路的冷媒導管,框體係構成為:在框體的內部包含冷媒導管,並且該框體的內部抑制外氣流入。According to this object, an illumination device to which the present invention is applied is an illumination device for plant cultivation, characterized by comprising: a plurality of light-emitting elements; and a light-transmissive window portion that transmits light emitted from the light-emitting elements to cover the light-emitting elements a frame body; a heat radiation substrate disposed inside the frame body to radiate heat generated by the light-emitting element by conduction; and a refrigerant pipe mounted as a refrigerant flow path on the heat radiation substrate, the frame system is configured : A refrigerant conduit is included inside the casing, and the inside of the casing suppresses the inflow of the outside air.
在如上所示之植物栽培用的照明裝置中,可形成特徵為構成為:框體係以乾燥空氣或乾燥氮填充框體的內部。In the illumination device for plant cultivation as described above, it is characterized in that the frame system is configured to fill the inside of the frame with dry air or dry nitrogen.
此外,可形成特徵為:植物栽培用的照明裝置係另外具備有:將冷媒導管與鄰接照明裝置所具備的鄰接冷媒導管相連結,在鄰接冷媒導管與冷媒導管之間形成冷媒流路的連結手段。In addition, the illumination device for plant cultivation may be further provided with a connection means for connecting the refrigerant conduit to the adjacent refrigerant conduit provided in the adjacent illumination device, and forming a refrigerant flow path between the adjacent refrigerant conduit and the refrigerant conduit. .
另一方面,可形成特徵為:框體為長形箱形,長形方向的1個面構成透光性窗部,長形方向的其他3個面係構成相連的外裝部,剩餘的2面係構成側面部。On the other hand, it can be characterized in that the frame has an elongated box shape, one surface in the elongated direction constitutes a translucent window portion, and the other three faces in the elongate direction constitute a connected exterior portion, and the remaining 2 The face system constitutes the side portion.
可形成特徵為:該外裝部係藉由鋁或鋁合金的押出成型所製作。The feature is that the exterior portion is formed by extrusion molding of aluminum or aluminum alloy.
可形成特徵為:放熱基板係具有插入冷媒導管的部分,藉由鋁或鋁合金的押出成型所製作,與所被插入的冷媒導管一體構成。The heat-generating substrate has a feature in which a portion into which a refrigerant conduit is inserted is formed by extrusion molding of aluminum or an aluminum alloy, and is integrally formed with the inserted refrigerant conduit.
接著,可形成特徵為:發光元件係被設置在發光元件封裝體,發光元件封裝體被固接在電路基板,電路基板被固定在放熱基板。Next, it may be characterized in that the light-emitting element is provided in the light-emitting element package, the light-emitting element package is fixed to the circuit board, and the circuit board is fixed to the heat radiation substrate.
此外,亦可形成特徵為:發光元件係直接接在金屬基座的電路基板的金屬基座部,電路基板被固定在放熱基板。Further, it may be characterized in that the light-emitting element is directly connected to the metal base portion of the circuit substrate of the metal base, and the circuit substrate is fixed to the heat radiation substrate.
此外,可形成特徵為:發光元件係包含:發光峰值波長為400~500nm的發光元件、及發光峰值波長為655~675nm的發光元件。Further, it is characterized in that the light-emitting element includes a light-emitting element having an emission peak wavelength of 400 to 500 nm and a light-emitting element having an emission peak wavelength of 655 to 675 nm.
可形成特徵為:該發光元件係具備有至少包含pn接合型發光部、及層積在發光部的變形調整層的化合物半導體層,發光部係具有由組成式(AlX Ga1-X )Y In1-Y P(0≦X≦0.1、0.37≦Y≦0.46)所構成的變形發光層與阻障層的層積構造,變形調整層係相對發光波長為透明,並且具有小於變形發光層及阻障層之晶格常數的晶格常數。The light-emitting element includes a compound semiconductor layer including at least a pn junction type light-emitting portion and a deformation adjustment layer laminated on the light-emitting portion, and the light-emitting portion has a composition formula (Al X Ga 1-X ) Y a laminated structure of the deformed light-emitting layer and the barrier layer formed by In 1-Y P (0≦X≦0.1, 0.37≦Y≦0.46), the deformation-adjusting layer is transparent with respect to the light-emitting wavelength, and has a smaller than the deformed light-emitting layer and The lattice constant of the lattice constant of the barrier layer.
此外,可形成特徵為:適用本發明的植物栽培用的照明裝置係在發光元件與透光性窗部之間另外具備有設定發光元件之光的方向的反射器。Further, it is characterized in that the illumination device for plant cultivation according to the present invention is provided with a reflector for setting the direction of the light of the light-emitting element between the light-emitting element and the light-transmitting window portion.
接著,若由其他觀點來看,適用本發明之植物栽培系統之特徵為具備有:複數發光元件、具有透過發光元件所發出的光的透光性窗部,以覆蓋發光元件的方式而設的框體、被配置在框體的內部,且藉由傳導而將發光元件所發生的熱作放熱的放熱基板、及被安裝在放熱基板,作為冷媒流路的冷媒導管,且將鄰接的該冷媒導管相互連結而形成冷媒流路的複數植物栽培用的照明裝置;對複數植物栽培用的照明裝置所被連結的冷媒導管供給冷媒的冷媒供給部;及控制複數植物栽培用的照明裝置之發光元件的亮燈與滅燈的照明控制部。Next, from another viewpoint, the plant cultivation system to which the present invention is applied is characterized in that it includes a plurality of light-emitting elements and a light-transmissive window portion that transmits light emitted from the light-emitting elements, and is provided to cover the light-emitting elements. a heat dissipation substrate that is disposed inside the casing and that radiates heat generated by the light-emitting element by conduction, and a refrigerant conduit that is attached to the heat radiation substrate as a refrigerant flow path, and that is adjacent to the refrigerant An illuminating device for cultivating a plurality of plants in which a plurality of plants are connected to each other to form a refrigerant flow path; a refrigerant supply unit for supplying a refrigerant to a refrigerant pipe to which a plurality of plant cultivation illuminating devices are connected; and a light-emitting element for controlling a plurality of illuminating devices for plant cultivation The lighting control unit that lights up and turns off the lights.
藉由本發明,可提供解決藉由水等冷媒,將半導體發光元件效率佳地進行冷卻時因結露、吸濕所造成的不良情形者,且使用長壽命且高效率維持的半導體發光元件作為光源之植物栽培用的照明裝置及使用其之植物栽培系統。According to the present invention, it is possible to provide a semiconductor light-emitting element which uses long-life and high-efficiency semiconductor light-emitting elements as a light source by solving problems caused by condensation and moisture absorption when the semiconductor light-emitting element is efficiently cooled by a refrigerant such as water. A lighting device for plant cultivation and a plant cultivation system using the same.
以下,參照所附圖示,針對本發明之實施形態詳加說明。Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings.
第1圖係顯示適用本實施形態之植物栽培系統1之一例圖。Fig. 1 is a view showing an example of a plant cultivation system 1 to which the present embodiment is applied.
植物栽培系統1係具備有:設置在栽培室60內用以栽培植物的複數栽培容器50;及相同地在栽培室60內,與栽培容器50近接設置,對所栽培的植物照射光的複數照明裝置10。在照明裝置10分別設有冷媒導管25。接著,藉由連結手段,連結有複數照明裝置10。亦即,某照明裝置10的冷媒導管25及與其相鄰接的照明裝置10的冷媒導管25(鄰接冷媒導管)相連結,而形成冷媒的流路。The plant cultivation system 1 includes a plurality of cultivation containers 50 installed in the cultivation room 60 for cultivating plants, and a plurality of illuminations that are provided in the cultivation room 60 in close proximity to the cultivation container 50 to illuminate the cultivated plants. Device 10. A refrigerant conduit 25 is provided in each of the illumination devices 10. Next, the plurality of illumination devices 10 are connected by a connection means. That is, the refrigerant conduit 25 of the illumination device 10 and the refrigerant conduit 25 (adjacent to the refrigerant conduit) of the illumination device 10 adjacent thereto are connected to each other to form a flow path of the refrigerant.
此外,植物栽培系統1係具備有:設置在栽培室60外,用以控制照明裝置10之照明的亮燈/滅燈的照明控制部30;及相同地設置在栽培室60外,將用以冷卻照明裝置10的水等冷媒供給至冷媒導管25的冷媒供給部40。Further, the plant cultivation system 1 includes an illumination control unit 30 that is provided outside the cultivation room 60 to control lighting of the illumination device 10 to be turned on/off, and is similarly disposed outside the cultivation room 60 and is used for The refrigerant such as water that cools the illuminating device 10 is supplied to the refrigerant supply unit 40 of the refrigerant conduit 25.
栽培室60若為可控制溫度、濕度、採光等的環境,則可為任何構成。接著,栽培室60可為遮斷來自外部的光或空氣流通的環境,亦可為具備有容許外部的光或空氣流通的窗等的環境。The cultivation room 60 may have any configuration if it is an environment capable of controlling temperature, humidity, lighting, or the like. Next, the cultivation chamber 60 may be an environment that blocks light or air flowing from the outside, or may have an environment such as a window that allows external light or air to flow.
栽培容器50可為放入土壤來育成植物的容器。此外,亦可為如水耕栽培般,用以保持對植物供予營養的營養液的容器。The cultivation container 50 may be a container into which soil is placed to grow plants. Further, it may be a container for maintaining a nutrient solution for supplying nutrients to plants, such as hydroponic cultivation.
接著,雖在第1圖中並未圖示,但是植物栽培系統1亦可具備有用以噴水至栽培容器50之植物的噴水部。此外,若植物為水耕栽培的情形,亦可具備有將供水耕栽培之用的營養液進行供給或循環的營養液供給部。Next, although not shown in the first drawing, the plant cultivation system 1 may be provided with a water spray portion for spraying a plant to the cultivation container 50. In addition, when the plant is hydroponic cultivation, a nutrient solution supply unit that supplies or circulates the nutrient solution for water supply and cultivation may be provided.
照明裝置10係如後所述,具備有複數半導體發光元件(例如,在後述第5圖的發光元件封裝體21中,收納有第1半導體發光元件64a及第2半導體發光元件64b的複數半導體發光元件)作為發光元件。此時,將複數半導體發光元件所發生的光,照射在栽培容器50中所栽培的植物。因此,各自的照明裝置10係具備有對半導體發光元件供給供發光之用的電力,並且控制半導體發光元件之亮燈/滅燈的照明控制配線31。該等照明控制配線31係與照明控制部30相連接。The illuminating device 10 includes a plurality of semiconductor light-emitting elements (for example, a plurality of semiconductor light-emitting devices in which the first semiconductor light-emitting device 64a and the second semiconductor light-emitting device 64b are housed in the light-emitting device package 21 of the fifth embodiment to be described later) Element) as a light-emitting element. At this time, the light generated by the plurality of semiconductor light-emitting elements is irradiated to the plants cultivated in the cultivation container 50. Therefore, each of the illumination devices 10 is provided with illumination control wirings 31 for supplying electric power for illumination to the semiconductor light-emitting elements, and for controlling the lighting/lighting of the semiconductor light-emitting elements. These illumination control wirings 31 are connected to the illumination control unit 30.
其中,各自的照明控制配線31亦可以將連接有該照明控制配線31的照明裝置10內的所有半導體發光元件同時亮燈/滅燈的方式進行結線。此外,亦可將1個照明裝置10內的半導體發光元件,藉由例如發光色等予以分組,以可按每個群組來控制亮燈/滅燈的方式進行結線。However, each of the illumination control wirings 31 may be connected to each other so that all of the semiconductor light-emitting elements in the illumination device 10 to which the illumination control wiring 31 is connected are simultaneously turned on/off. Further, the semiconductor light-emitting elements in one illumination device 10 may be grouped by, for example, a luminescent color or the like, and the connection may be performed in such a manner that the lighting is turned on/off by each group.
照明控制部30若為可控制照明裝置10之亮燈/滅燈者即可。因此,若為按每個照明裝置10將電力供給作導通/關斷的開關作排列的開關陣列即可。此外,開關陣列的導通/關斷亦可利用電腦等來控制。照明控制部30若可對紅或藍等半導體發光元件的施加電流值進行設定控制者即可。此外,以脈衝亮燈而言,以對紅或藍等半導體發光元件的周期與能率(duty)進行控制者為宜。以將亮燈時間與非亮燈時間進行計時器控制者為宜。The lighting control unit 30 may be one that can control the lighting/lighting of the lighting device 10. Therefore, it is only necessary to arrange a switch array in which the power supply is turned on/off for each illumination device 10. In addition, the on/off of the switch array can also be controlled by a computer or the like. The illumination control unit 30 may be configured to control the applied current value of the semiconductor light-emitting element such as red or blue. Further, in the case of pulse lighting, it is preferable to control the period and the duty of the semiconductor light-emitting element such as red or blue. It is advisable to perform timer control for the lighting time and the non-lighting time.
此外,如第1圖中虛線所示,各自的照明裝置10係具備有將由半導體發光元件所發生的熱排出至栽培室60外,且將照明裝置10朝長邊方向貫穿而設的冷媒導管25。接著,各自的照明裝置10係藉由與冷媒導管25的端部相連接的配管耦合器(後述第2圖的第1配管耦合器16與第2配管耦合器17)而相互連結。未與其他照明裝置10相連接的冷媒導管25的2個端部係透過冷媒配管41而與冷媒供給部40相連接。如上所示,冷媒導管25係形成為透過冷媒供給部40而連成一條的導管的一部分,因此可使液體(冷媒)作循環。Further, as shown by the broken line in Fig. 1, each of the illumination devices 10 includes a refrigerant conduit 25 that discharges heat generated by the semiconductor light-emitting device to the outside of the cultivation chamber 60 and that penetrates the illumination device 10 in the longitudinal direction. . Then, the respective illuminating devices 10 are connected to each other by a pipe coupler (a first pipe coupler 16 and a second pipe coupler 17 in the second drawing to be described later) connected to the end of the refrigerant pipe 25. The two end portions of the refrigerant duct 25 that are not connected to the other illuminating device 10 are connected to the refrigerant supply unit 40 through the refrigerant pipe 41. As described above, the refrigerant conduits 25 are formed as a part of the conduits that are connected to each other through the refrigerant supply unit 40, so that the liquid (refrigerant) can be circulated.
冷媒供給部40係以冷媒在複數照明裝置10作循環(以箭號表示冷媒流動方向)的方式進行控制。冷媒供給部40可為例如利用馬達予以驅動的泵。接著,對於馬達供給電力係亦可以當使半導體發光元件亮燈時即供給冷媒的方式,使其與照明控制部30連動。The refrigerant supply unit 40 controls the refrigerant to circulate in the plurality of illumination devices 10 (the flow direction of the refrigerant is indicated by an arrow). The refrigerant supply unit 40 can be, for example, a pump that is driven by a motor. Next, the motor power supply system may be connected to the illumination control unit 30 so that the refrigerant is supplied when the semiconductor light-emitting element is turned on.
其中,在第1圖中係顯示將所有照明裝置10作串聯連結的情形,但是亦可複數並聯設置串聯連結的照明裝置10的列。此外,亦可使串聯的部分與並聯的部分混合存在。亦即,若可藉由冷媒供給部40,冷媒以在照明裝置10的冷媒導管25循環的方式流動,藉此冷卻照明裝置10,將藉由半導體發光元件所發生的熱排出至栽培室60外即可。In the first embodiment, the case where all the illumination devices 10 are connected in series is shown. However, a plurality of rows of the illumination devices 10 connected in series may be provided in parallel. In addition, it is also possible to have a portion connected in series and a portion in parallel. In other words, if the refrigerant supply unit 40 allows the refrigerant to circulate through the refrigerant conduit 25 of the illumination device 10, the illumination device 10 is cooled, and the heat generated by the semiconductor light-emitting element is discharged to the outside of the cultivation chamber 60. Just fine.
其中,在第1圖的照明裝置10中,為了使植物栽培系統1中的冷媒流動較為明確,而以虛線表示照明裝置10內的冷媒導管25,但是如後所述,在照明裝置10內,除了冷媒導管25以外,另外包含有發光元件封裝體(後述第5圖的發光元件封裝體21)等。In the illuminating device 10 of the first embodiment, in order to make the flow of the refrigerant in the plant cultivation system 1 clear, the refrigerant conduit 25 in the illuminating device 10 is indicated by a broken line. However, as will be described later, in the illuminating device 10, In addition to the refrigerant duct 25, a light-emitting element package (light-emitting element package 21 of Fig. 5 to be described later) or the like is additionally included.
第2圖係顯示適用本實施形態之照明裝置10之外形之一例圖。第2圖(a)係上視圖,第2圖(b)係底視圖,第2圖(c)係左側視圖,而第2圖(d)係右側視圖。Fig. 2 is a view showing an example of the outer shape of the lighting device 10 to which the present embodiment is applied. Fig. 2(a) is a top view, Fig. 2(b) is a bottom view, Fig. 2(c) is a left side view, and Fig. 2(d) is a right side view.
照明裝置10係具備有:作為外裝部之一例的字型外裝蓋件11;以在字空出的部分加蓋的方式而設之作為透光性窗部之一例的透明蓋件12;作為設在左側面之側面部之一例的第1側面蓋件13;及作為設在右側面之側面部之一例的第2側面蓋件14。The illuminating device 10 is provided as an example of an exterior part. Font exterior cover member 11; a transparent cover member 12 which is an example of a translucent window portion, a first side cover member 13 which is an example of a side surface portion provided on the left side surface, and a left side surface The second side cover 14 of one of the side portions.
第1側面蓋件13及第2側面蓋件14係以在外裝蓋件11安裝有透明蓋件12的兩端部加蓋的方式而設。The first side cover member 13 and the second side cover member 14 are provided so as to be attached to both end portions of the outer cover member 11 to which the transparent cover member 12 is attached.
亦即,照明裝置10的外形係呈藉由外裝蓋件11、透明蓋件12、第1側面蓋件13、第2側面蓋件14所包圍的箱形。以該箱形的形狀而言,以長形的箱形形狀在使用環境上較適於被使用,但是在本發明中並未特別限制為箱形形狀。接著,外裝蓋件11、透明蓋件12、第1側面蓋件13、第2側面蓋件14係構成照明裝置10的框體。將該等蓋件所構成的框體內部稱為照明裝置10的內側或內部,將框體的外側稱為照明裝置10的外側或外部。That is, the outer shape of the illuminating device 10 is a box shape surrounded by the exterior cover member 11, the transparent cover member 12, the first side cover member 13, and the second side cover member 14. In terms of the shape of the box shape, the elongated box shape is more suitable for use in the use environment, but is not particularly limited to a box shape in the present invention. Next, the exterior cover member 11, the transparent cover member 12, the first side cover member 13, and the second side cover member 14 constitute a casing of the illuminating device 10. The inside of the casing formed by the cover members is referred to as the inside or inside of the illumination device 10, and the outside of the casing is referred to as the outside or outside of the illumination device 10.
在被設在照明裝置10之左側面的第1側面蓋件13的外側,係隔著配管接頭15,設有作為與照明裝置10內部的冷媒導管25相連接的連結手段之一例的雌型配管構件的第2配管耦合器17。In the outer side of the first side cover 13 provided on the left side surface of the illuminating device 10, a female pipe as an example of a connection means connected to the refrigerant conduit 25 inside the illuminating device 10 is provided via the pipe joint 15. The second pipe coupler 17 of the member.
在第2側面蓋件14的外側,係隔著配管接頭15設有與冷媒導管25相連接之作為連結手段之一例的屬於雄型配管構件的第1配管耦合器16。亦即,第1配管耦合器16與第2配管耦合器17係設在與照明裝置10的框體相對向的位置。On the outer side of the second side cover member 14, a first pipe coupler 16 belonging to the male pipe member as an example of a connection means connected to the refrigerant pipe 25 is provided via the pipe joint 15. In other words, the first pipe coupler 16 and the second pipe coupler 17 are disposed at positions facing the casing of the illuminating device 10.
此外,照明控制配線31係由第2側面蓋件14突出於外部。其中,照明控制配線31係選擇可承受栽培室60內之高溫高濕環境的被覆線。Further, the illumination control wiring 31 is protruded from the outside by the second side cover 14 . Among them, the illumination control wiring 31 selects a covered wire that can withstand the high temperature and high humidity environment in the cultivation chamber 60.
外裝蓋件11若為對照明裝置10賦予剛性而防止變形者,亦可使用任何材質者。例如可使用鋁(Al)、不銹鋼(SUS)、銅(Cu)、鈦(Ti)等金屬材料、ABS樹脂等塑膠材料。其中,較佳為使用藉由以重量及成本方面來說較為優異的Al或鋁合金所得的押出成型品。此時,表面為了防止Al腐蝕,因此以進行耐酸鋁(alumite)加工為更佳。此外,由提高反射率而達成光之有效利用的觀點來看,耐酸鋁加工係以白色耐酸鋁或另外在其上進行透明塗裝為更佳。The outer cover member 11 may be any material if it is provided to impart rigidity to the illuminating device 10 and prevent deformation. For example, a metal material such as aluminum (Al), stainless steel (SUS), copper (Cu), or titanium (Ti), or a plastic material such as ABS resin can be used. Among them, it is preferred to use an extruded molded article obtained by using Al or an aluminum alloy which is excellent in weight and cost. At this time, in order to prevent Al corrosion, the surface is preferably processed by alumite. Further, from the viewpoint of improving the reflectance and achieving efficient use of light, the alumite processing is preferably white an acid-resistant aluminum or a transparent coating thereon.
透明蓋件12若為有效率地透過設在照明裝置10之半導體發光元件的發光波長者,亦可使用任何材質者。透明蓋件12較佳為例如玻璃。此外,丙烯酸酯、甲基丙烯酸酯聚合物、聚甲基丙烯酸甲酯樹脂(PMMA)等丙烯酸系樹脂、聚碳酸酯(PC)、聚對苯二甲酸二乙酯(PET)等亦可適於使用。此外,以在透明蓋件12的照明裝置10的內側,設有相對半導體發光元件之發光波長的反射防止膜為更佳。If the transparent cover member 12 is efficiently transmitted through the light-emitting wavelength of the semiconductor light-emitting device provided in the illumination device 10, any material may be used. The transparent cover member 12 is preferably, for example, glass. Further, an acrylic resin such as an acrylate, a methacrylate polymer or a polymethyl methacrylate resin (PMMA), polycarbonate (PC) or polyethylene terephthalate (PET) may be suitable. use. Further, it is more preferable to provide an anti-reflection film with respect to the emission wavelength of the semiconductor light-emitting element on the inner side of the illumination device 10 of the transparent cover member 12.
第1側面蓋件13及第2側面蓋件14係與外裝蓋件11同樣地,若為對照明裝置10賦予剛性而防止變形者,則亦可使用任何材質者。亦即,第1側面蓋件13若為即使將其夾在其間而將冷媒導管25與第2配管耦合器17相連接亦可抑制變形者即可。此外,同樣地,第2側面蓋件14若為即使將夾在其間而將冷媒導管25與第1配管耦合器16相連接亦可抑制變形者即可。在該等係可使用例如Al、SUS、Cu、Ti、Mo等金屬材料、或ABS等塑膠材料。亦可為以重量方面較為優異的Al的壓鑄(die casting)。接著,第1側面蓋件13及第2側面蓋件14係以外裝蓋件11及透明蓋件12的端部可插入的方式設有凹部為佳。Similarly to the exterior cover member 11, the first side cover member 13 and the second side cover member 14 may be made of any material if rigidity is applied to the illumination device 10 to prevent deformation. In other words, the first side cover member 13 may be deformed by connecting the refrigerant conduit 25 to the second pipe coupler 17 even if it is sandwiched therebetween. In addition, in the same manner, the second side cover member 14 may be deformed by connecting the refrigerant conduit 25 to the first pipe coupler 16 even when sandwiched therebetween. In these systems, a metal material such as Al, SUS, Cu, Ti, or Mo, or a plastic material such as ABS can be used. It may also be a die casting of Al which is excellent in weight. Next, it is preferable that the first side cover 13 and the second side cover 14 are provided with recesses in such a manner that the end portions of the cover member 11 and the transparent cover member 12 are insertable.
接著,較佳為以含有濕氣的空氣(外氣)不會由外部進入至照明裝置10內的方式,在照明裝置10內填充乾燥空氣、乾燥氮等,並且成為外裝蓋件11、透明蓋件12、第1側面蓋件13、第2側面蓋件14之交界的部分以填充材予以密封。Next, it is preferable that the illuminating device 10 is filled with dry air, dry nitrogen, or the like so that the moisture-containing air (outer air) does not enter the inside of the illuminating device 10 from the outside, and becomes an exterior cover member 11 and transparent. The portion of the cover member 12, the first side cover member 13, and the second side cover member 14 is sealed with a filler.
如上所示,可抑制由栽培室60內的高溫高濕環境,半導體發光元件的劣化、或搭載後述半導體發光元件之電路基板(後述第4圖(b)的電路基板22)的銅箔或銅箔上的銀鍍敷、焊料腐蝕等。As described above, it is possible to suppress the deterioration of the semiconductor light-emitting device by the high-temperature and high-humidity environment in the cultivation chamber 60, or the copper foil or copper of the circuit board (the circuit board 22 of the fourth drawing (b) to be described later) on which the semiconductor light-emitting device to be described later is mounted. Silver plating on the foil, solder corrosion, etc.
其中,在填充材係可使用矽酮等填縫材(caulking material)。Among them, a caulking material such as an anthrone may be used as the filler.
第3圖係用以說明第1配管耦合器16與第2配管耦合器17之一例圖。在適用本實施形態的植物栽培系統1中,如第1圖所示,複數照明裝置10使第1配管耦合器16與第2配管耦合器17相嵌合而予以連結。Fig. 3 is a view for explaining an example of the first pipe coupler 16 and the second pipe coupler 17. In the plant cultivation system 1 to which the present embodiment is applied, as shown in Fig. 1, the plurality of illumination devices 10 are coupled to the first pipe coupler 16 and the second pipe coupler 17 to be coupled.
在第3圖中,係顯示第1配管耦合器16與第2配管耦合器17相嵌合的狀態。In the third drawing, the state in which the first pipe coupler 16 is fitted to the second pipe coupler 17 is shown.
其中,第1配管耦合器16及第2配管耦合器17均為旋轉對稱體。因此,第3圖所示之第1配管耦合器16及第2配管耦合器17的上側係顯示包含對稱軸的面的剖面。接著,第3圖的下側係顯示第1配管耦合器16及第2配管耦合器17的外形。Among them, the first pipe coupler 16 and the second pipe coupler 17 are all rotationally symmetric bodies. Therefore, the upper side of the first pipe coupler 16 and the second pipe coupler 17 shown in FIG. 3 shows a cross section of the surface including the axis of symmetry. Next, the outer shape of the first pipe coupler 16 and the second pipe coupler 17 is shown on the lower side of FIG.
第1配管耦合器16係內部為空洞的筒狀旋轉對稱體,在其一端部形成有六角螺帽,以可與冷媒導管25相連接的方式使母螺絲被轉動。接著,第1配管耦合器16的另一端部係具備有:被組入第1配管耦合器本體16a,朝軸向滑動的可動環16b;被夾在第1配管耦合器本體16a與可動環16b之間具有彈簧作用的爪部16c;及設在第1配管耦合器本體16a與可動環16b之間抑制可動環16b動作的彈簧線圈16d。The first pipe coupler 16 is a cylindrical cylindrical symmetry body having a hollow inside, and a hexagonal nut is formed at one end portion thereof so that the female screw can be rotated so as to be connectable to the refrigerant pipe 25. Next, the other end portion of the first pipe coupler 16 is provided with a movable ring 16b that is incorporated in the first pipe coupler body 16a and slid in the axial direction, and is sandwiched between the first pipe coupler body 16a and the movable ring 16b. A claw portion 16c having a spring action therebetween; and a spring coil 16d provided between the first pipe coupler body 16a and the movable ring 16b to suppress the movement of the movable ring 16b.
另一方面,第2配管耦合器17係內部為空洞的筒狀旋轉對稱體,在第2配管耦合器本體17a的一端部係形成有六角螺帽,以可與冷媒導管25相連接的方式使母螺絲被轉動。接著,第2配管耦合器本體17a的另一端部係形成為可與第1配管耦合器本體16a的內側相嵌合之粗細的部分,在其前端部具備有以與第1配管耦合器本體16a內的壁面相接的方式朝外周方向圍繞的O型環17b。此外,在形成在第2配管耦合器本體17a的六角螺帽與O型環17b之間的第2配管耦合器本體17a變細的部分,形成有朝外周方向圍繞的溝槽17c。On the other hand, the second pipe coupler 17 is a hollow cylindrical symmetry body having a hollow inside, and a hexagonal nut is formed at one end portion of the second pipe coupler body 17a so as to be connectable to the refrigerant pipe 25. The female screw is turned. Then, the other end portion of the second pipe coupler body 17a is formed into a thick portion that can be fitted into the inner side of the first pipe coupler body 16a, and is provided at the front end portion thereof with the first pipe coupler body 16a. The inner wall is joined in such a manner as to surround the O-ring 17b in the outer circumferential direction. In the portion where the second pipe coupler body 17a formed between the hexagonal nut and the O-ring 17b of the second pipe coupler body 17a is thinned, a groove 17c that is formed in the outer circumferential direction is formed.
若在第1配管耦合器16之筒部內部插入第2配管耦合器17變細的部分,第2配管耦合器17的O型環17b會與第1配管耦合器16的內壁相密接,而抑制冷媒漏洩。接著,第1配管耦合器16的爪部16c、與第2配管耦合器17的溝槽17c相咬合,防止第1配管耦合器16與第2配管耦合器17脫落。When the portion where the second pipe coupler 17 is tapered is inserted into the tubular portion of the first pipe coupler 16, the O-ring 17b of the second pipe coupler 17 is in close contact with the inner wall of the first pipe coupler 16, and Suppress refrigerant leakage. Then, the claw portion 16c of the first pipe coupler 16 is engaged with the groove 17c of the second pipe coupler 17, and the first pipe coupler 16 and the second pipe coupler 17 are prevented from coming off.
接著,若將可動環16b抵抗彈簧線圈16d的推斥力而朝軸向移動時,爪部16c會因彈簧作用而變形,爪部16c與溝槽17c的咬合會鬆緩,由此使第1配管耦合器16與第2配管耦合器17容易脫落。When the movable ring 16b is moved in the axial direction against the repulsive force of the spring coil 16d, the claw portion 16c is deformed by the action of the spring, and the engagement between the claw portion 16c and the groove 17c is relaxed, thereby making the first pipe The coupler 16 and the second pipe coupler 17 are easily detached.
藉此,複數照明裝置10的連結變得較為容易,並且解除連結,改變植物栽培系統1之構成變得較為容易。As a result, the connection of the plurality of illumination devices 10 becomes easier, and the connection is released, and the configuration of the plant cultivation system 1 is changed.
以第1配管耦合器16、第2配管耦合器17而言,係可使用藉由SUS、銅合金等金屬材料所得者、藉由ABS樹脂等所得之塑膠材料者。In the first pipe coupler 16 and the second pipe coupler 17, those obtained by using a metal material such as SUS or a copper alloy, or a plastic material obtained by ABS resin or the like can be used.
其中,以連結手段而言,在本實施形態中,係使用第1配管耦合器16與第2配管耦合器17,但是並非限定於此。例如,亦可在將冷媒導管25延長的端部設置軟管安裝口,利用軟管而與鄰接的照明裝置10的冷媒導管25(鄰接冷媒導管)相連結。此外,亦可使冷媒導管25與鄰接冷媒導管夾著襯墊對頂而加以固定。In the present embodiment, the first pipe coupler 16 and the second pipe coupler 17 are used in the present embodiment, but the present invention is not limited thereto. For example, a hose mounting port may be provided at an end portion where the refrigerant conduit 25 is extended, and the hose may be connected to the refrigerant conduit 25 (adjacent refrigerant conduit) of the adjacent illuminating device 10 by a hose. Further, the refrigerant conduit 25 and the adjacent refrigerant conduit may be fixed to the top with the gasket interposed therebetween.
第4圖係用以說明照明裝置10內部之一例圖。第4圖(a)係顯示將第2圖(b)所示照明裝置10的透明蓋件12卸除後之照明裝置10的內部。第4圖(b)係第4圖(a)之IVB-IVB線中的剖面圖。Fig. 4 is a view for explaining an example of the inside of the lighting device 10. Fig. 4(a) shows the inside of the illuminating device 10 after the transparent cover member 12 of the illuminating device 10 shown in Fig. 2(b) is removed. Fig. 4(b) is a cross-sectional view taken along line IVB-IVB of Fig. 4(a).
如第4圖(b)所示,照明裝置10係具備有:搭載半導體發光元件(後述第5圖中的第1半導體發光元件64a及第2半導體發光元件64b)的發光元件封裝體21;搭載發光元件封裝體21的電路基板22;固定電路基板22的放熱基板24;及將電路基板22與放熱基板24作電性絕緣,並且熱傳導性優異的薄膜狀絕緣性放熱材23。接著,發光元件封裝體21係以由透明蓋件12放出所發生的光的方式,與透明蓋件12相對向而設。As shown in FIG. 4(b), the illuminating device 10 includes a light-emitting element package 21 on which a semiconductor light-emitting element (a first semiconductor light-emitting element 64a and a second semiconductor light-emitting element 64b in FIG. 5 described later) is mounted; The circuit board 22 of the light-emitting element package 21; the heat-releasing substrate 24 of the fixed circuit board 22; and the film-shaped insulating heat-dissipating material 23 which electrically insulates the circuit board 22 from the heat-releasing board|substrate 24 and is excellent in thermal conductivity. Next, the light-emitting element package 21 is provided to face the transparent cover member 12 so that the light generated by the transparent cover member 12 is emitted.
此外,照明裝置10係具備有以來自發光元件封裝體21之半導體發光元件的光由照明裝置10的透明蓋件12朝垂直方向放出的方式,設定放出光的方向的反射器26。Further, the illumination device 10 is provided with a reflector 26 that sets the direction in which light is emitted by the transparent cover member 12 of the illumination device 10 in a direction in which the light from the semiconductor light-emitting device of the light-emitting element package 21 is emitted in the vertical direction.
在電路基板22,以一例而言,如第4圖(a)所示,朝長邊方向使複數發光元件封裝體21排列3列而作配置。接著,以包圍該等發光元件封裝體21的方式,例如形成有屬於旋轉拋物面的反射面27的反射器26,與發光元件封裝體21之列相對應設有3列。In the circuit board 22, as shown in FIG. 4(a), the plurality of light-emitting element packages 21 are arranged in three rows in the longitudinal direction. Next, for example, the reflector 26 that forms the reflecting surface 27 belonging to the paraboloid of revolution is formed so as to surround the light-emitting element packages 21, and three rows are provided corresponding to the columns of the light-emitting element packages 21.
其中,在第4圖中,係在電路基板22排列3列發光元件封裝體21,但是並非限定於該數量。接著,電路基板22係由一枚基板所構成,但是亦可為被分成各列的基板。此外,電路基板22係形成為朝照明裝置10的長邊方向相連的一枚基板,但是亦可為朝長邊方向分割成複數的基板。In the fourth embodiment, the three light-emitting element packages 21 are arranged on the circuit board 22, but the number is not limited thereto. Next, the circuit board 22 is composed of one substrate, but may be a substrate divided into rows. Further, the circuit board 22 is formed as a single substrate that is connected to the longitudinal direction of the illumination device 10, but may be divided into a plurality of substrates in the longitudinal direction.
在電路基板22係可使用:在使環氧樹脂含浸在玻璃布的玻璃環氧設有銅箔配線的玻璃環氧基板、或設有藉由Ag等所得之厚膜配線的陶瓷等。其中,以成本面來看,以玻璃環氧為佳。In the circuit board 22, a glass epoxy substrate in which a copper foil is provided with a glass epoxy in a glass cloth, or a ceramic having a thick film wiring obtained by Ag or the like can be used. Among them, in terms of cost, glass epoxy is preferred.
發光元件封裝體21亦可藉由例如焊料而搭載於電路基板22。The light emitting element package 21 can also be mounted on the circuit board 22 by, for example, solder.
照明控制配線31係以對半導體發光元件供給供發光之用之電力的方式連接於電路基板22的表面(半導體發光元件安裝面)。照明控制配線31係通過被設在放熱基板24之一部分的開口,被拉出至放熱基板24的背面。接著,照明控制配線31係在放熱基板24的背面作結線,作為照明控制配線31而被拉出至框體外部,與被設在栽培室60之外的照明控制部30相連接。The illumination control wiring 31 is connected to the surface (semiconductor light-emitting element mounting surface) of the circuit board 22 so as to supply electric power for light emission to the semiconductor light-emitting element. The illumination control wiring 31 is pulled out to the back surface of the heat radiation substrate 24 through an opening provided in a portion of the heat radiation substrate 24. Then, the illumination control wiring 31 is connected to the rear surface of the heat radiation substrate 24, and is pulled out to the outside of the casing as the illumination control wiring 31, and is connected to the illumination control unit 30 provided outside the cultivation chamber 60.
照明控制配線31可為乙烯樹脂被覆的銅線。The illumination control wiring 31 may be a vinyl coated copper wire.
在第4圖中,反射器26係與照明裝置10的長邊方向相連,按3列發光元件封裝體21的毎一列而設。但是,反射器26亦可按每個發光元件封裝體21而設。此外,亦可為朝長邊方向作分割的複數反射器26。接著,在第4圖中,係將反射器26按3列發光元件封裝體21的每一列而設,但是亦可為未分割而將3列形成為一體者。亦即,反射器26係使由照明裝置10的半導體發光元件所發生的光可相對照明裝置10的透明蓋件12呈垂直方向放出即可。In Fig. 4, the reflector 26 is connected to the longitudinal direction of the illumination device 10, and is arranged in a row of three rows of light-emitting element packages 21. However, the reflector 26 may be provided for each of the light emitting element packages 21. Further, it may be a plurality of reflectors 26 that are divided in the longitudinal direction. Next, in Fig. 4, the reflector 26 is provided for each row of the three rows of light-emitting element packages 21, but it is also possible to form three rows without being divided. That is, the reflector 26 may emit light generated by the semiconductor light emitting element of the illumination device 10 in a vertical direction with respect to the transparent cover member 12 of the illumination device 10.
以反射器26而言,係可使用設有例如剖面成為拋物線的開口的Al區塊。開口的壁部成為反射面27。此外,亦可使用在設有壁部成為反射面27之開口的丙烯酸等樹脂,藉由蒸鍍法等而形成有Al、Ag等金屬膜者。In the case of the reflector 26, an Al block provided with, for example, an opening whose cross section is a parabola can be used. The wall portion of the opening serves as the reflecting surface 27. In addition, a resin such as acrylic having a wall portion as an opening of the reflecting surface 27 may be used, and a metal film such as Al or Ag may be formed by a vapor deposition method or the like.
其中,藉由反射器26而以相對透明蓋件12呈垂直方向放出係指相較於未設有反射器26的情形,垂直方向的光量為較多。Among them, the amount of light in the vertical direction is larger by the reflector 26 when the finger is released in the vertical direction with respect to the transparent cover member 12 than when the reflector 26 is not provided.
放熱基板24係用以將伴隨著半導體發光元件的發光所發生的熱排出至栽培室60外的基板,以熱傳導率佳的材質所構成,並且具備有冷媒導管25。The heat radiation substrate 24 is configured to discharge heat generated by the light emission of the semiconductor light-emitting element to a substrate outside the cultivation chamber 60, and is configured by a material having a good thermal conductivity, and includes a refrigerant conduit 25.
冷媒導管25係與放熱基板24的導管挿入部相密接所構成。若僅作挿入,由於傳熱效率較差,因此經由使所挿入的導管利用壓縮空氣使管徑膨脹,而與放熱基板24之導管挿入部相密接的導管抽拔工程而形成。因此,來自搭載於電路基板22之半導體發光元件的熱經由放熱基板24而傳至冷媒導管25,藉由冷媒而被排出至栽培室60外。相反言之,在冷媒導管25流通的冷媒係將放熱基板24冷卻,且將被搭載於與放熱基板24相密接配設的電路基板22的發光元件封裝體21冷卻。因此,由於不會將來自半導體發光元件的熱排出至栽培室60內,因此得以將栽培室60內的溫度、濕度與由半導體發光元件所發生的熱無關係地進行控制。The refrigerant conduit 25 is configured to be in close contact with the catheter insertion portion of the heat radiation substrate 24. When only the insertion is performed, the heat transfer efficiency is inferior. Therefore, the inserted catheter is expanded by the compressed air, and is formed by a catheter extraction process in close contact with the catheter insertion portion of the heat radiation substrate 24. Therefore, heat from the semiconductor light-emitting element mounted on the circuit board 22 is transmitted to the refrigerant conduit 25 via the heat radiation substrate 24, and is discharged to the outside of the cultivation chamber 60 by the refrigerant. On the other hand, the refrigerant that has flowed through the refrigerant pipe 25 cools the heat radiation substrate 24, and cools the light-emitting element package 21 mounted on the circuit board 22 that is disposed in close contact with the heat radiation substrate 24. Therefore, since the heat from the semiconductor light emitting element is not discharged into the cultivation chamber 60, the temperature and humidity in the cultivation chamber 60 can be controlled irrespective of the heat generated by the semiconductor light emitting element.
因此,可搭載於電路基板22的發光元件封裝體21的數量係依由冷媒溫度、流量等所決定的冷卻能力及半導體發光元件的發熱量來決定。尤其,與冷媒導管25的冷媒流通方向呈垂直的方向的長度(電路基板22的寬幅)係受到放熱基板24的熱阻抗等放熱特性所限制。Therefore, the number of the light-emitting element packages 21 that can be mounted on the circuit board 22 is determined by the cooling capacity determined by the temperature of the refrigerant, the flow rate, and the like, and the amount of heat generated by the semiconductor light-emitting element. In particular, the length in the direction perpendicular to the refrigerant flow direction of the refrigerant conduit 25 (the width of the circuit board 22) is limited by the heat radiation characteristics such as the thermal impedance of the heat radiation substrate 24.
以放熱基板24而言,係可使用熱傳導率優異的Al、Cu。尤其,冷媒導管25係以不易腐蝕的Cu為佳。In the heat-releasing substrate 24, Al or Cu having excellent thermal conductivity can be used. In particular, the refrigerant conduit 25 is preferably Cu which is not easily corroded.
為了改善放熱,在焊接有發光元件封裝體21之搭載有晶片的引線的電路基板22的接合焊墊,形成貫穿至電路基板22背面的貫穿孔,透過鍍敷金屬而與電路基板22背面的銅箔相連接為宜。當然應以半導體發光元件不會短路的方式,連電路基板22的背面亦予以圖案化。In order to improve the heat radiation, a bonding pad of the circuit board 22 on which the lead of the wafer is mounted is mounted on the light-emitting element package 21, and a through hole penetrating through the back surface of the circuit board 22 is formed, and the copper is transmitted through the plating metal to the back surface of the circuit board 22. Foil connection is preferred. Of course, the back surface of the circuit board 22 should also be patterned so that the semiconductor light-emitting elements are not short-circuited.
其中,如第4圖(b)所示,冷媒導管25係不會與外裝蓋件11等相接觸而作配置。接著,在照明裝置10內係如前所述,填充有乾燥空氣、乾燥氮等。因此,即使對冷媒導管25供給溫度比栽培室60的溫度為低的冷媒,亦可以冷媒導管25及安裝有該冷媒導管25的放熱基板24為首,抑制電路基板22、發光元件封裝體21、其他零件結露。藉此,以冷媒導管25及放熱基板24為首,可抑制電路基板22、發光元件封裝體21、其他零件因濕氣或結露所造成的腐蝕。Here, as shown in Fig. 4(b), the refrigerant conduit 25 is not disposed in contact with the exterior cover member 11 or the like. Next, in the lighting device 10, as described above, dry air, dry nitrogen, or the like is filled. Therefore, even if the refrigerant pipe 25 is supplied with a refrigerant having a temperature lower than the temperature of the cultivation chamber 60, the refrigerant pipe 25 and the heat radiation substrate 24 to which the refrigerant pipe 25 is attached may be used to suppress the circuit board 22, the light-emitting element package 21, and the like. Part condensation. Thereby, the refrigerant conduit 25 and the heat radiation substrate 24 can suppress corrosion of the circuit board 22, the light-emitting element package 21, and other components due to moisture or condensation.
絕緣性放熱材23係分別相密接配設在電路基板22與放熱基板24之間,保持電性絕緣,並且用以將由電路基板22所發生的熱傳導至放熱基板24而設。此係與放熱基板24相密接而設的冷媒導管25係如前所述與第1配管耦合器16及第2配管耦合器17相連接。第1配管耦合器16及第2配管耦合器17係設在照明裝置10的外側。因此,從事植物栽培的作業者等會有接觸到第1配管耦合器16或第2配管耦合器17之虞。因此,為了防止觸電,在第1配管耦合器16及第2配管耦合器17並不可以流通電流。因此,必須將放熱基板24與電路基板22作電性絕緣。The insulating heat releasing members 23 are disposed in close contact with each other between the circuit board 22 and the heat radiating substrate 24, and are electrically insulated, and are provided to conduct heat generated by the circuit board 22 to the heat radiating substrate 24. The refrigerant conduit 25 provided in close contact with the heat radiation substrate 24 is connected to the first pipe coupler 16 and the second pipe coupler 17 as described above. The first pipe coupler 16 and the second pipe coupler 17 are provided outside the illuminating device 10 . Therefore, an operator engaged in plant cultivation or the like may come into contact with the first pipe coupler 16 or the second pipe coupler 17. Therefore, in order to prevent electric shock, current cannot flow through the first pipe coupler 16 and the second pipe coupler 17. Therefore, the heat release substrate 24 must be electrically insulated from the circuit substrate 22.
絕緣性放熱材23係將電路基板22與放熱基板24作電性絕緣,並且使由電路基板22上的半導體發光元件所發生的熱傳導至放熱基板24。因此,絕緣性放熱材23係以電路基板22與放熱基板24易於相密接的方式,以具有柔軟性且電性絕緣阻抗高、熱阻抗低的薄膜為佳。以如上所示之薄膜而言,可使用聚對苯二甲酸二乙酯(PET)、聚乙烯(PE)等。The insulating heat releasing material 23 electrically insulates the circuit board 22 from the heat radiating substrate 24, and conducts heat generated by the semiconductor light emitting element on the circuit board 22 to the heat radiating substrate 24. Therefore, the insulating heat releasing material 23 is preferably a film having flexibility, high electrical insulating resistance, and low thermal resistance so that the circuit board 22 and the heat radiating substrate 24 are easily adhered to each other. As the film as shown above, polyethylene terephthalate (PET), polyethylene (PE), or the like can be used.
電路基板22與放熱基板24係在未設有電路基板22之配線的部分,藉由螺絲等予以固定即可。The circuit board 22 and the heat radiation substrate 24 may be fixed to a portion where the wiring of the circuit board 22 is not provided, and may be fixed by screws or the like.
反射器26亦透過電路基板22,而藉由螺絲等固定在放熱基板24即可。此時亦關於電路基板22的圖案與安裝螺絲的絕緣距離應加以留意,俾以不會漏電至安裝螺絲。The reflector 26 is also transmitted through the circuit board 22, and is fixed to the heat radiation substrate 24 by screws or the like. At this time, the insulation distance between the pattern of the circuit substrate 22 and the mounting screws should be noted so as not to leak to the mounting screws.
接著,如第4圖(b)所示,放熱基板24若藉由插入在設在外裝蓋件11之開縫等加以固定即可。Next, as shown in FIG. 4(b), the heat radiation substrate 24 can be fixed by being inserted into a slit provided in the exterior cover member 11, or the like.
第4圖(b)所示之冷媒導管25係連接於第1配管耦合器16及第2配管耦合器17。此時,在由放熱基板24至第1配管耦合器16及第2配管耦合器17之間必須要有配管時,亦可在例如Cu等配管設置添加螺絲。若構成為不會有冷媒漏洩的情形,且冷媒在複數照明裝置10作循環即可。The refrigerant conduit 25 shown in Fig. 4(b) is connected to the first pipe coupler 16 and the second pipe coupler 17. In this case, when a pipe is required between the heat radiation substrate 24 to the first pipe coupler 16 and the second pipe coupler 17, an additional screw may be provided in a pipe such as Cu. If the refrigerant is not leaking, the refrigerant may be circulated in the plurality of illumination devices 10.
照明裝置10以一例而言,長度為1200mm、寬幅為100mm、深度為45mm。接著,冷媒導管25的管徑為12mm。其中,並非限定於該形狀,亦可形成為其他值。The illuminating device 10 has, by way of example, a length of 1200 mm, a width of 100 mm, and a depth of 45 mm. Next, the diameter of the refrigerant conduit 25 is 12 mm. However, it is not limited to this shape, and may be formed into other values.
第5圖係說明在本實施形態中所使用之發光元件封裝體21之構成之一例圖。在此,第5圖(a)係顯示發光元件封裝體21的上視圖,第5圖(b)係顯示第5圖(a)的VB-VB剖面圖。Fig. 5 is a view showing an example of the configuration of the light-emitting element package 21 used in the present embodiment. Here, Fig. 5(a) shows a top view of the light emitting element package 21, and Fig. 5(b) shows a VB-VB cross-sectional view of Fig. 5(a).
該發光元件封裝體21係具備有:在以平面狀形成的開口面71形成有凹部61a的樹脂容器61、由與樹脂容器61一體化的引線框架所構成的陽極用引線部62a、62b及陰極用引線部63a、63b、及被安裝在凹部61a的底面70之作為發光元件之一例的第1半導體發光元件64a及第2半導體發光元件64b。亦即,該發光元件封裝體21係將第1半導體發光元件64a與第2半導體發光元件64b安裝成1個的2in1封裝體。接著,以一例而言,第1半導體發光元件64a係發光峰值波長為450nm的藍色發光元件。另一方面,第2半導體發光元件64b係發光峰值波長為660nm的紅色發光元件。The light-emitting element package 21 includes a resin container 61 having a concave portion 61a formed in a planar opening surface 71, and anode lead portions 62a and 62b and a cathode formed of a lead frame integrated with the resin container 61. The lead portions 63a and 63b and the first semiconductor light-emitting element 64a and the second semiconductor light-emitting element 64b which are examples of the light-emitting elements are mounted on the bottom surface 70 of the concave portion 61a. In other words, in the light-emitting element package 21, the first semiconductor light-emitting element 64a and the second semiconductor light-emitting element 64b are mounted in a single 2in1 package. Next, as an example, the first semiconductor light-emitting element 64a is a blue light-emitting element having an emission peak wavelength of 450 nm. On the other hand, the second semiconductor light-emitting element 64b is a red light-emitting element having an emission peak wavelength of 660 nm.
其中,以第1半導體發光元件64a而言,係可使用發光峰值波長為400~500nm者。此外,以第2半導體發光元件64b而言,係可使用發光峰值波長為655~675nm者。在此,發光峰值波長係指光強度為最大的波長。In the first semiconductor light-emitting device 64a, an emission peak wavelength of 400 to 500 nm can be used. Further, in the second semiconductor light-emitting device 64b, an emission peak wavelength of 655 to 675 nm can be used. Here, the illuminating peak wavelength refers to a wavelength at which the light intensity is the largest.
樹脂容器61係藉由將含有白色顏料的熱塑性樹脂(在以下說明中係稱為白色樹脂)進行射出成型而形成在包含陽極用引線部62a、62b及陰極用引線部63a、63b的金屬引線部。The resin container 61 is formed by injection molding a thermoplastic resin containing a white pigment (referred to as a white resin in the following description) to the metal lead portion including the lead portions 62a and 62b for the anode and the lead portions 63a and 63b for the cathode. .
此外,為了可與施加焊料回焊等之溫度的工程相對應,白色樹脂係選定充分考慮到耐熱性的材質。以作為基材的樹脂而言,以PPA(polyphthalamide)最為一般,但是若為液晶聚合物、環氧樹脂、聚苯乙烯等亦可。其中亦在本實施形態中,以PPA而言,屬於二胺與間苯二甲酸或對苯二甲酸之共聚物的尼龍4T、尼龍6T、尼龍6I、尼龍9T、尼龍M5T尤其可適於使用。Further, in order to be compatible with a process of applying a temperature such as solder reflow, a white resin is selected from a material that sufficiently considers heat resistance. The resin used as the substrate is most commonly used as PPA (polyphthalamide), but may be a liquid crystal polymer, an epoxy resin, polystyrene or the like. Further, in the present embodiment, in the case of PPA, nylon 4T, nylon 6T, nylon 6I, nylon 9T, and nylon M5T which are copolymers of diamine and isophthalic acid or terephthalic acid are particularly preferably used.
設在樹脂容器61的凹部61a係具備有:具有圓形狀的底面70;同樣地具有圓形狀的開口面71;及以由底面70的周緣朝向開口面71擴開的方式豎起的壁面80。在此,底面70係藉由:露出於凹部61a的陽極用引線部62a、62b及陰極用引線部63a、63b;及陽極用引線部62a、62b與陰極用引線部63a、63b之間之間隙的樹脂容器61的白色樹脂所構成。另一方面,壁面80係藉由構成樹脂容器61的白色樹脂所構成。其中,關於底面70的形狀,可為圓形、矩形、橢圓形、多角形之任一者。此外,關於開口面71的形狀,可為圓形、矩形、橢圓形、多角形之任一者,亦可與底面形狀相同。The recessed portion 61a provided in the resin container 61 is provided with a bottom surface 70 having a circular shape, an opening surface 71 having a circular shape in the same manner, and a wall surface 80 that is erected so that the peripheral edge of the bottom surface 70 is expanded toward the opening surface 71. Here, the bottom surface 70 is formed by the anode lead portions 62a and 62b and the cathode lead portions 63a and 63b exposed to the concave portion 61a, and the gap between the anode lead portions 62a and 62b and the cathode lead portions 63a and 63b. The resin container 61 is made of a white resin. On the other hand, the wall surface 80 is composed of a white resin constituting the resin container 61. The shape of the bottom surface 70 may be any of a circle, a rectangle, an ellipse, and a polygon. Further, the shape of the opening surface 71 may be any of a circular shape, a rectangular shape, an elliptical shape, and a polygonal shape, and may be the same as the bottom surface shape.
陽極用引線部62a、62b及陰極用引線部63a、63b係各自的一部分被夾在樹脂容器61內予以保持,並且其他一部分露出於樹脂容器61的外部,形成為用以對第1半導體發光元件64a及第2半導體發光元件64b施加電流的端子。當以表面安裝為前提時,會有如第5圖所示,將陽極用引線部62a、62b及陰極用引線部63a、63b分別朝樹脂容器61的背側彎曲而將其前端配設在樹脂容器61的底部的情形。Each of the anode lead portions 62a and 62b and the cathode lead portions 63a and 63b is held in the resin container 61, and the other portion is exposed outside the resin container 61, and is formed to be used for the first semiconductor light-emitting element. A terminal for applying a current to the 64a and the second semiconductor light-emitting elements 64b. In the case of the surface mounting, the anode lead portions 62a and 62b and the cathode lead portions 63a and 63b are bent toward the back side of the resin container 61 and the front end thereof is disposed in the resin container as shown in Fig. 5 . The situation at the bottom of 61.
此外,陽極用引線部62a、62b及陰極用引線部63a、63b、亦即引線框架係具有0.1~0.5mm程度的厚度的金屬板,以銅合金等金屬導體為基座,在其表面藉由被施行銀鍍敷而形成有銀鍍敷層。Further, the anode lead portions 62a and 62b and the cathode lead portions 63a and 63b, that is, the lead frame, have a metal plate having a thickness of about 0.1 to 0.5 mm, and a metal conductor such as a copper alloy is used as a base, and the surface thereof is used as a base. A silver plating layer is formed by silver plating.
第1半導體發光元件64a係在被配設在凹部61a之底面70的陰極用引線部63a上,利用由矽酮樹脂或環氧樹脂所構成的黏晶劑予以接著而固定。同樣地,第2半導體發光元件64b係在被配設在凹部61a之底面70的陽極用引線部62b上,利用由矽酮樹脂或環氧樹脂所構成的黏晶劑予以接著而固定。The first semiconductor light-emitting device 64a is attached to the cathode lead portion 63a disposed on the bottom surface 70 of the concave portion 61a, and is then fixed by an adhesive agent composed of an fluorenone resin or an epoxy resin. In the same manner, the second semiconductor light-emitting device 64b is attached to the anode lead portion 62b disposed on the bottom surface 70 of the concave portion 61a, and is then fixed by an adhesive agent composed of an fluorenone resin or an epoxy resin.
此外,在第1半導體發光元件64a的背面,隔著Al、Ni等金屬層形成有AuSn層,藉由熱熔融被固定在被配設在凹部61a之底面70的陰極用引線部63a上為更佳。關於第2半導體發光元件64b亦同。In addition, an AuSn layer is formed on the back surface of the first semiconductor light-emitting device 64a via a metal layer such as Al or Ni, and is fixed to the cathode lead portion 63a disposed on the bottom surface 70 of the concave portion 61a by heat fusion. good. The same applies to the second semiconductor light-emitting element 64b.
第1半導體發光元件64a係具有n型焊墊電極及p型焊墊電極,透過接合導線65,分別使p型焊墊電極連接於陽極用引線部62a、n型焊墊電極連接於陰極用引線部63a。同樣地,第2半導體發光元件64b亦具有n型焊墊電極及p型焊墊電極,透過接合導線65,p型焊墊電極被連接於陽極用引線部62b,n型焊墊電極被連接於陰極用引線部63b。The first semiconductor light-emitting device 64a has an n-type pad electrode and a p-type pad electrode, and the p-type pad electrode is connected to the anode lead portion 62a and the n-type pad electrode to the cathode lead through the bonding wire 65. Part 63a. Similarly, the second semiconductor light-emitting device 64b also has an n-type pad electrode and a p-type pad electrode, and the p-type pad electrode is connected to the anode lead portion 62b through the bonding wire 65, and the n-type pad electrode is connected to Lead wire portion 63b for cathode.
其中,發光元件封裝體21係以填充凹部61a的方式利用密封樹脂予以密封。密封樹脂若由透過第1半導體發光元件64a及第2半導體發光元件64b所發出的光的透明樹脂所構成即可。Among these, the light-emitting element package 21 is sealed with a sealing resin so as to fill the concave portion 61a. The sealing resin may be composed of a transparent resin that transmits light emitted from the first semiconductor light-emitting device 64a and the second semiconductor light-emitting device 64b.
例如,以透明樹脂而言,含有以覆蓋凹部的方式予以密封的硬化性樹脂、使其硬化的硬化劑、及另外依需要所摻合之例如抗氧化劑、變色防止劑、光劣化防止劑、反應性稀釋劑、無機填充劑、阻燃劑、有機溶劑等者為佳。For example, the transparent resin contains a curable resin which is sealed so as to cover the concave portion, a hardener which is cured, and, if necessary, an antioxidant, a discoloration preventive agent, a photodegradation preventive agent, and a reaction which are blended as needed. A diluent, an inorganic filler, a flame retardant, an organic solvent or the like is preferred.
以硬化性樹脂而言,具體而言列舉如:矽酮樹脂、環氧樹脂、環氧矽酮混成樹脂、丙烯酸系樹脂、聚醯亞胺樹脂等。其中,由耐熱性的觀點來看,以矽酮樹脂或環氧樹脂為佳,尤其以矽酮樹脂為特佳。Specific examples of the curable resin include an anthrone resin, an epoxy resin, an epoxy ketone mixed resin, an acrylic resin, and a polyimide resin. Among them, from the viewpoint of heat resistance, an anthrone resin or an epoxy resin is preferable, and an anthrone resin is particularly preferable.
此外,在此,在第1半導體發光元件64a與第2半導體發光元件64b分別設有陽極用引線部(62a、62b)、陰極用引線部(63a、63b),但是亦可將其中一方設為共通。In addition, the anode lead portions (62a, 62b) and the cathode lead portions (63a, 63b) are provided in the first semiconductor light-emitting device 64a and the second semiconductor light-emitting device 64b, respectively. Common.
在此,發光元件封裝體21係形成為將2個第1半導體發光元件64a與第2半導體發光元件64b安裝成1個的2in1封裝體,但是亦可為搭載有單一晶片的1in1封裝體,或亦可為搭載多晶片的封裝體。多晶片時之封裝體內的配線係可形成為在單端或兩端具有共通端子的並聯電路,亦可按每個晶片具有獨立的正極、負極。此外,亦可形成為在封裝體內將晶片間作串聯連接的串聯電路。Here, the light-emitting element package 21 is formed as a 2in1 package in which two first semiconductor light-emitting elements 64a and second semiconductor light-emitting elements 64b are mounted, but may be a 1in1 package in which a single wafer is mounted, or It can also be a multi-chip package. The wiring in the package in the case of multi-wafer can be formed as a parallel circuit having a common terminal at one end or both ends, and can have independent positive and negative electrodes for each wafer. In addition, a series circuit in which the wafers are connected in series in the package body may be formed.
接著,說明第1半導體發光元件64a(藍色發光元件)及第2半導體發光元件64b(紅色發光元件)之一例。其中,以下所示構造及數值為具代表性的構造及數值,並不限於在此所示之構造及數值。Next, an example of the first semiconductor light-emitting device 64a (blue light-emitting device) and the second semiconductor light-emitting device 64b (red light-emitting device) will be described. The structures and numerical values shown below are representative structures and numerical values, and are not limited to the structures and numerical values shown herein.
第6圖係說明在本實施形態中所使用之藍色發光之第1半導體發光元件64a之構成之一例的剖面圖。第7圖係藍色發光之第1半導體發光元件64a的上視圖。在此,針對發光峰值波長為450nm之藍色發光的第1半導體發光元件64a加以說明。Fig. 6 is a cross-sectional view showing an example of the configuration of the first semiconductor light-emitting device 64a for blue light emission used in the present embodiment. Fig. 7 is a top view of the first semiconductor light-emitting element 64a that emits blue light. Here, the first semiconductor light-emitting element 64a that emits blue light having an emission peak wavelength of 450 nm will be described.
如第6圖所示,第1半導體發光元件64a係具備有:第1基板110、層積在第1基板110上的中間層120、及層積在中間層120上的基底層130。此外,第1半導體發光元件64a係具備有:層積在基底層130上的第1n型半導體層140、層積在第1n型半導體層140上的第1發光層150、及層積在第1發光層150上的第1p型半導體層160。其中,在以下說明中,視需要,將該等第1n型半導體層140、第1發光層150及第1p型半導體層160彙總稱為第1層積半導體層100。此外,第1半導體發光元件64a係具有被層積在第1p型半導體層160上,且透過第1發光層150所發生的光的透明電極170。接著,第1半導體發光元件64a係具備有:層積在透明電極170的上面170c且作為p型焊墊電極的第1接合焊墊電極210。再者此外,第1半導體發光元件64a係具備有:被層積在藉由將第1p型半導體層160、第1發光層150及第1n型半導體層140的一部分形成切口所露出的第1n型半導體層140的半導體層露出面140c上的一部分,作為n型焊墊電極的第2接合焊墊電極240。As shown in FIG. 6, the first semiconductor light-emitting device 64a includes a first substrate 110, an intermediate layer 120 laminated on the first substrate 110, and a base layer 130 laminated on the intermediate layer 120. Further, the first semiconductor light-emitting device 64a includes a first n-type semiconductor layer 140 laminated on the underlying layer 130, a first light-emitting layer 150 laminated on the first n-type semiconductor layer 140, and a first layer. The first p-type semiconductor layer 160 on the light-emitting layer 150. In the following description, the first n-type semiconductor layer 140, the first light-emitting layer 150, and the first p-type semiconductor layer 160 are collectively referred to as a first laminated semiconductor layer 100 as needed. Further, the first semiconductor light-emitting device 64a includes a transparent electrode 170 that is laminated on the first p-type semiconductor layer 160 and that transmits light generated by the first light-emitting layer 150. Next, the first semiconductor light-emitting device 64a includes a first bonding pad electrode 210 which is laminated on the upper surface 170c of the transparent electrode 170 and serves as a p-type pad electrode. In addition, the first semiconductor light-emitting device 64a is provided with a first n-type which is exposed by forming a slit in a part of the first p-type semiconductor layer 160, the first light-emitting layer 150, and the first n-type semiconductor layer 140. A portion of the semiconductor layer 140 on the semiconductor layer exposed surface 140c serves as a second bonding pad electrode 240 of an n-type pad electrode.
此外,第1半導體發光元件64a係具備有:除了第1接合焊墊電極210及第2接合焊墊電極240的表面的一部分以外,覆蓋第1n型半導體層140、第1發光層150、第1p型半導體層160及透明電極170的第1保護層180。In addition, the first semiconductor light-emitting device 64a includes the first n-type semiconductor layer 140, the first light-emitting layer 150, and the first p-layer except for a part of the surface of the first bonding pad electrode 210 and the second bonding pad electrode 240. The first protective layer 180 of the semiconductor layer 160 and the transparent electrode 170.
該第1半導體發光元件64a係如前所述被接著固定在陰極用引線部63a上,第1接合焊墊電極210係藉由接合導線65而與引線框架的陽極用引線部62a相連接。接著,第2接合焊墊電極240係藉由接合導線65而與引線框架的陰極用引線部63a相連接。The first semiconductor light-emitting device 64a is subsequently fixed to the cathode lead portion 63a as described above, and the first bonding pad electrode 210 is connected to the anode lead portion 62a of the lead frame by the bonding wire 65. Next, the second bonding pad electrode 240 is connected to the cathode lead portion 63a of the lead frame by bonding the wires 65.
將第1接合焊墊電極210設為正極、第2接合焊墊電極240設為負極,在第1層積半導體層100(具體而言為第1p型半導體層160、第1發光層150及第1n型半導體層140)流通電流,藉此使第1發光層150發光。接著,所發生的光係由未設有第1接合焊墊電極210之透明電極170的上面被取出至第1半導體發光元件64a的外部。The first bonding pad electrode 210 is a positive electrode, and the second bonding pad electrode 240 is a negative electrode, and the first laminated semiconductor layer 100 (specifically, the first p-type semiconductor layer 160, the first light-emitting layer 150, and the first layer) The 1n-type semiconductor layer 140) causes a current to flow, thereby causing the first light-emitting layer 150 to emit light. Then, the generated light is taken out to the outside of the first semiconductor light-emitting element 64a by the upper surface of the transparent electrode 170 on which the first bonding pad electrode 210 is not provided.
其中,關於第1半導體發光元件64a之構成及其製造方法等,例如可參照日本特開2009-123718號公報加以實施。In addition, the configuration of the first semiconductor light-emitting device 64a, the method of manufacturing the same, and the like can be carried out, for example, in Japanese Patent Laid-Open Publication No. 2009-123718.
此外,在本實施形態中,如第6圖所示,亦可將由如SiO2 般的矽氧化物所構成的第1保護層180,以覆蓋於透明電極170、第1p型半導體層160、第1n型半導體層140之半導體層露出面140c的上面(亦包含被蝕刻的側壁)、第1接合焊墊電極210之周邊部分、第2接合焊墊電極240之周邊部分等的表面的方式所形成。Further, in the present embodiment, as shown in FIG. 6, the first protective layer 180 made of cerium oxide such as SiO 2 may be coated on the transparent electrode 170 and the first p-type semiconductor layer 160. The upper surface of the semiconductor layer exposed surface 140c of the 1n-type semiconductor layer 140 (including the etched sidewall), the peripheral portion of the first bonding pad electrode 210, and the peripheral portion of the second bonding pad electrode 240 are formed. .
藉此,除了前述接合焊墊電極(210、240)的上面以外,可將第1半導體發光元件64a作屏蔽,大幅減低外部的空氣或水分浸入至第1半導體發光元件64a的可能性,亦有助於防止第1半導體發光元件64a的透明電極170或接合焊墊電極(210、240)剝落。Thereby, in addition to the upper surface of the bonding pad electrodes (210, 240), the first semiconductor light emitting element 64a can be shielded, and the external air or moisture can be greatly reduced in the first semiconductor light emitting element 64a. It is possible to prevent the transparent electrode 170 or the bonding pad electrodes (210, 240) of the first semiconductor light emitting element 64a from being peeled off.
第1保護層180的厚度係以50~1000nm為佳,以100~500nm為較佳,以150~450nm為更佳。The thickness of the first protective layer 180 is preferably 50 to 1000 nm, more preferably 100 to 500 nm, and still more preferably 150 to 450 nm.
第1保護層180的厚度係藉由形成為50~1000nm,大幅減低外部的空氣或水分浸入至第1半導體發光元件64a的第1發光層150的可能性,可防止第1半導體發光元件64a的第1接合焊墊電極210或第2接合焊墊電極240剝落。The thickness of the first protective layer 180 is 50 to 1000 nm, and it is possible to reduce the possibility that external air or moisture is infiltrated into the first light-emitting layer 150 of the first semiconductor light-emitting device 64a, thereby preventing the first semiconductor light-emitting element 64a. The first bonding pad electrode 210 or the second bonding pad electrode 240 is peeled off.
接著,第1保護層180的形成方法係例如首先在透明電極170、第1p型半導體層160、第1n型半導體層140之半導體層露出面140c的上面(亦包含被蝕刻的側壁)、第1接合焊墊電極210的表面、第2接合焊墊電極240的表面形成由SiO2 所構成的第1保護層180後,在第1保護層180上塗佈未圖示的阻劑。Next, the method of forming the first protective layer 180 is, for example, first on the transparent electrode 170, the first p-type semiconductor layer 160, and the semiconductor layer exposed surface 140c of the first n-type semiconductor layer 140 (including the side wall to be etched), and the first After the first protective layer 180 made of SiO 2 is formed on the surface of the bonding pad electrode 210 and the surface of the second bonding pad electrode 240, a resist (not shown) is applied to the first protective layer 180.
接著,將第1接合焊墊電極210及第2接合焊墊電極240的表面的一部分的阻劑去除,藉由周知的蝕刻手法來去除第1保護層180,藉此使各自的電極的表面的一部分露出。Then, the resist of a part of the surfaces of the first bonding pad electrode 210 and the second bonding pad electrode 240 is removed, and the first protective layer 180 is removed by a known etching method, thereby making the surfaces of the respective electrodes Part of it is exposed.
如以上所示製造第1半導體發光元件64a。The first semiconductor light emitting element 64a is manufactured as described above.
第8圖係說明在本實施形態中所使用之紅色發光之第2半導體發光元件64b之構成之一例的剖面圖。第9圖係紅色發光之第2半導體發光元件64b的上視圖。在此,針對發光峰值波長為660nm之紅色發光的第2半導體發光元件64b加以說明。其中,第8圖所示之第2半導體發光元件64b的剖面圖係相當於第9圖中之上視圖的VIII-VIII線的剖面圖。Fig. 8 is a cross-sectional view showing an example of the configuration of the second semiconductor light-emitting device 64b for red light emission used in the present embodiment. Fig. 9 is a top view of the second semiconductor light-emitting element 64b that emits red light. Here, the second semiconductor light-emitting element 64b that emits red light having an emission peak wavelength of 660 nm will be described. The cross-sectional view of the second semiconductor light-emitting device 64b shown in Fig. 8 corresponds to a cross-sectional view taken along line VIII-VIII of the top view in Fig. 9.
如第8圖所示,第2半導體發光元件64b係接合第2層積半導體層300與第2基板310而構成。接著,第2層積半導體層300係依序層積有:變形調整層320、作為下部包覆層發揮作用的第2p型半導體層330、第2發光層340、及作為上部包覆層發揮作用的第2n型半導體層350所構成。As shown in FIG. 8, the second semiconductor light-emitting device 64b is configured by bonding the second laminated semiconductor layer 300 and the second substrate 310. Then, the second laminated semiconductor layer 300 is sequentially laminated with the deformation adjusting layer 320, the second p-type semiconductor layer 330 functioning as the lower cladding layer, the second light-emitting layer 340, and the upper cladding layer. The second n-type semiconductor layer 350 is formed.
接著,第2半導體發光元件64b係具備有:形成在第2n型半導體層350的上面350c,且作為n型焊墊電極發揮作用的第3接合焊墊電極400;及形成在藉由將第2層積半導體層300的第2n型半導體層350、第2發光層340、第2p型半導體層330的一部分作切口所露出的變形調整層320的上面320c,作為p型焊墊電極發揮作用的第4接合焊墊電極410。Next, the second semiconductor light-emitting device 64b includes a third bonding pad electrode 400 that is formed on the upper surface 350c of the second n-type semiconductor layer 350 and functions as an n-type pad electrode, and is formed by the second bonding pad electrode 400. The second n-type semiconductor layer 350, the second light-emitting layer 340, and the second p-type semiconductor layer 330 of the laminated semiconductor layer 300 are formed as a p-type pad electrode by the upper surface 320c of the deformation-adjusting layer 320 exposed by the slit. 4 Bond pad electrode 410.
其中,如第9圖所示,第3接合焊墊電極400係在第2n型半導體層350上,與例如形成為格子狀的配線401相連接。配線401係藉由與第3接合焊墊電極400為相同材料,以不會對來自第2n型半導體層350的光的取出造成影響的方式,以細線所形成。藉此,將第2n型半導體層350的電位分布,與未設置配線401的情形相比,形成為更為均一,且將第2發光層340的發光分布均一化。As shown in FIG. 9, the third bonding pad electrode 400 is connected to the second n-type semiconductor layer 350, and is connected to, for example, a wiring 401 formed in a lattice shape. The wiring 401 is formed of a thin wire so as not to affect the extraction of light from the second n-type semiconductor layer 350 by the same material as the third bonding pad electrode 400. Thereby, the potential distribution of the second n-type semiconductor layer 350 is formed to be more uniform than that in the case where the wiring 401 is not provided, and the light emission distribution of the second light-emitting layer 340 is uniformized.
此外,第2半導體發光元件64b係具備有:除了第3接合焊墊電極400及第4接合焊墊電極410的表面的一部分以外,覆蓋變形調整層320、第2p型半導體層330、第2發光層340、第2n型半導體層350的第2保護層360。In addition, the second semiconductor light-emitting device 64b includes a portion of the surface of the third bonding pad electrode 400 and the fourth bonding pad electrode 410, and covers the deformation adjusting layer 320, the second p-type semiconductor layer 330, and the second light-emitting layer. The layer 340 and the second protective layer 360 of the second n-type semiconductor layer 350.
在該第2半導體發光元件64b中,將第3接合焊墊電極400設為負極、第4接合焊墊電極410設為正極,透過兩者而在第2層積半導體層300(更具體而言為第2p型半導體層330、第2發光層340及第2n型半導體層350)流通電流,藉此使第2發光層340發光。接著,所發生的光係由未設有第3接合焊墊電極400及配線401的第2n型半導體層350的上面、或第2基板310的側面,被取出至第2半導體發光元件64b的外部。In the second semiconductor light-emitting device 64b, the third bonding pad electrode 400 is a negative electrode, the fourth bonding pad electrode 410 is a positive electrode, and both of them are passed through the second laminated semiconductor layer 300 (more specifically, The second light-emitting layer 340 emits light by flowing a current through the second p-type semiconductor layer 330, the second light-emitting layer 340, and the second n-type semiconductor layer 350). Then, the light generated is taken out from the upper surface of the second n-type semiconductor layer 350 where the third bonding pad electrode 400 and the wiring 401 are not provided, or the side surface of the second substrate 310, and is taken out to the outside of the second semiconductor light-emitting device 64b. .
以下更加詳細說明第2半導體發光元件64b之構成。The configuration of the second semiconductor light-emitting device 64b will be described in more detail below.
如第8圖所示,第2基板310係接合在構成第2層積半導體層300的變形調整層320。該第2基板310係具有足以機械性支持第2發光層340之充分強度,並且以可將由第2發光層340所出射的光透過的方式,由帶隙能量寬、對來自第2發光層340的發光波長呈光學上透明的材料所構成。例如可由磷化鎵(GaP)、砒化鋁‧鎵(AlGaAs)、氮化鎵(GaN)等III-V族化合物半導體結晶體、硫化鋅(ZnS)或硒化鋅(ZnSe)等II-VI族化合物半導體結晶體、或六方晶或立方晶之碳化矽(SiC)等IV族半導體結晶體、玻璃、藍寶石等絕緣基板所構成。As shown in FIG. 8, the second substrate 310 is bonded to the deformation adjustment layer 320 constituting the second laminated semiconductor layer 300. The second substrate 310 has sufficient strength to mechanically support the second light-emitting layer 340, and transmits light emitted from the second light-emitting layer 340 so that the band gap energy is wide and the pair is from the second light-emitting layer 340. The wavelength of the light is made of an optically transparent material. For example, a Group III-VI compound such as gallium phosphide (GaP), aluminum telluride ‧ gallium (AlGaAs), gallium nitride (GaN), or a group III-VI compound such as zinc sulfide (ZnS) or zinc selenide (ZnSe) A semiconductor crystal body, or a group IV semiconductor crystal such as hexagonal or cubic silicon carbide (SiC), or an insulating substrate such as glass or sapphire.
另一方面,亦可選擇在接合面具有反射率高之表面的機能性基板。例如,亦可選擇在表面形成有銀、金、銅、鋁等之金屬基板或合金基板、或在半導體形成有金屬鏡構造的複合基板等。On the other hand, a functional substrate having a surface having a high reflectance on the joint surface can be selected. For example, a metal substrate or an alloy substrate in which silver, gold, copper, aluminum, or the like is formed on the surface, or a composite substrate in which a metal mirror structure is formed in a semiconductor may be selected.
接著,第2基板310係以形成為例如50μm以上的厚度為佳,俾以機械性充分的強度支持第2發光層340。此外,為了在與第2層積半導體層300接合後,容易對第2基板310進行機械性加工,最好形成為未超過300μm厚度者。亦即,第2基板310係由具有50μm以上且300μm以下的厚度的n型GaP基板所構成較為合適。Next, the second substrate 310 is preferably formed to have a thickness of, for example, 50 μm or more, and the second light-emitting layer 340 is supported by mechanical strength. Further, in order to facilitate the mechanical processing of the second substrate 310 after bonding to the second laminated semiconductor layer 300, it is preferable to form a thickness of not more than 300 μm. In other words, the second substrate 310 is preferably made of an n-type GaP substrate having a thickness of 50 μm or more and 300 μm or less.
此外,如第8圖所示,第2基板310的側面係在接近第2層積半導體層300之側,構成相對屬於光取出面之第2n型半導體層350的上面呈大致垂直的垂直面310a,在遠離第2層積半導體層300之側,構成朝第2基板310的內側呈傾斜的傾斜面310b。藉此,可將由第2發光層340被放出至第2基板310側的光效率佳地取出外部。亦即,由第2發光層340被放出至第2基板310側的光之中,在垂直面310a被反射的光係可由傾斜面310b取出。另一方面,在傾斜面310b被反射的光係可由垂直面310a取出。如上所示,藉由垂直面310a與傾斜面310b的相乘效果,可提高光取出效率。Further, as shown in Fig. 8, the side surface of the second substrate 310 is on the side close to the second laminated semiconductor layer 300, and constitutes a substantially vertical vertical surface 310a with respect to the upper surface of the second n-type semiconductor layer 350 belonging to the light extraction surface. On the side away from the second laminated semiconductor layer 300, an inclined surface 310b which is inclined toward the inner side of the second substrate 310 is formed. Thereby, the light emitted from the second light-emitting layer 340 to the side of the second substrate 310 can be taken out efficiently. In other words, among the light emitted from the second light-emitting layer 340 to the second substrate 310 side, the light reflected on the vertical surface 310a can be taken out by the inclined surface 310b. On the other hand, the light reflected on the inclined surface 310b can be taken out by the vertical surface 310a. As described above, the light extraction efficiency can be improved by the multiplication effect of the vertical surface 310a and the inclined surface 310b.
接著,在本實施形態中,最好將傾斜面310b和與屬於光取出面之第2n型半導體層350的上面呈平行的面所成角度α設在55度~80度的範圍內。藉由形成為如上所示之範圍,可將在第2基板310的底面310c作反射的光效率佳地取出至外部。In the present embodiment, it is preferable that the angle α formed between the inclined surface 310b and the surface parallel to the upper surface of the second n-type semiconductor layer 350 belonging to the light extraction surface is in the range of 55 to 80 degrees. By forming the range as described above, light reflected on the bottom surface 310c of the second substrate 310 can be efficiently taken out to the outside.
此外,最好將第2基板310之垂直面310a之部分的厚度設為30~100μm。藉由將垂直面310a的厚度設在該範圍內,可將在第2基板310的底面310c作反射的光在垂直面310a效率佳地返回至發光面,可由屬於光取出面之第2n型半導體層350(未形成有第3接合焊墊電極400的部分)的上面放出。藉此,可提高第2半導體發光元件64b的發光效率。Further, it is preferable that the thickness of a portion of the vertical surface 310a of the second substrate 310 be 30 to 100 μm. By setting the thickness of the vertical surface 310a within this range, the light reflected on the bottom surface 310c of the second substrate 310 can be efficiently returned to the light-emitting surface on the vertical surface 310a, and the second n-type semiconductor belonging to the light extraction surface can be used. The upper surface of the layer 350 (the portion where the third bonding pad electrode 400 is not formed) is discharged. Thereby, the luminous efficiency of the second semiconductor light-emitting element 64b can be improved.
此外,第2基板310的傾斜面310b較佳為予以粗面化。若傾斜面310b被粗面化,可得抑制在傾斜面310b的全反射,提升來自該傾斜面310b之光取出效率的效果。Further, the inclined surface 310b of the second substrate 310 is preferably roughened. When the inclined surface 310b is roughened, it is possible to suppress the total reflection on the inclined surface 310b and to enhance the light extraction efficiency from the inclined surface 310b.
在本實施形態中,在第2基板310與第2p型半導體層330之間設有變形調整層320。該變形調整層320由於相對來自第2發光層340的發光波長為透明,因此不會吸收發光,而可形成為高輸出、高效率的第2半導體發光元件64b。In the present embodiment, the deformation adjustment layer 320 is provided between the second substrate 310 and the second p-type semiconductor layer 330. Since the distortion adjustment layer 320 is transparent to the emission wavelength from the second light-emitting layer 340, it does not absorb light, and can be formed into the second semiconductor light-emitting element 64b having high output and high efficiency.
其中,該變形調整層320係具有比在形成第2層積半導體層300時所使用的GaAs基板(未圖示)的晶格常數為小的晶格常數。因此,可抑制第2層積半導體層300發生翹曲。藉此,由於減低設在第2發光層340內之變形發光層之變形量的第2發光層340內的不均,可形成為單色性優異的第2半導體發光元件64b。The deformation adjustment layer 320 has a lattice constant smaller than a lattice constant of a GaAs substrate (not shown) used in forming the second laminated semiconductor layer 300. Therefore, warpage of the second laminated semiconductor layer 300 can be suppressed. By this, it is possible to form the second semiconductor light-emitting element 64b having excellent monochromaticity by reducing the unevenness in the second light-emitting layer 340 which is the amount of deformation of the deformed light-emitting layer provided in the second light-emitting layer 340.
其中,變形調整層320係例如作Mg摻雜的載體濃度為約3×1018 /cm3 ,厚度為約9μm的p型GaP。The deformation adjusting layer 320 is, for example, a p-type GaP having a carrier concentration of Mg of about 3×10 18 /cm 3 and a thickness of about 9 μm.
作為下部包覆層發揮作用的第2p型半導體層330係被設在變形調整層320與第2發光層340之間。第2p型半導體層330係例如摻雜有Mg的(Al0.7 Ga0.3 )0.5 In0.5 P、載體濃度為約8×1017 /cm3 、厚度為約0.5μm。The second p-type semiconductor layer 330 functioning as the lower cladding layer is provided between the deformation adjustment layer 320 and the second light-emitting layer 340. The second p-type semiconductor layer 330 is, for example, doped with Mg (Al 0.7 Ga 0.3 ) 0.5 In 0.5 P, has a carrier concentration of about 8 × 10 17 /cm 3 , and has a thickness of about 0.5 μm.
此外,在變形調整層320與第2p型半導體層330之間亦可設有例如(Al0.5 Ga0.5 )0.5 In0.5 P、載體濃度為約8×1017 /cm3 、厚度為約0.05μm的中間層。Further, for example, (Al 0.5 Ga 0.5 ) 0.5 In 0.5 P may be provided between the deformation adjustment layer 320 and the second p-type semiconductor layer 330, the carrier concentration is about 8×10 17 /cm 3 , and the thickness is about 0.05 μm. middle layer.
在第2p型半導體層330與第2n型半導體層350之間設有出射光的第2發光層340。第2發光層340係以其發光頻譜的峰值發光波長形成為655~675nm的範圍為佳,以形成為660~670nm的範圍為更佳。上述範圍的發光波長係適於植物育成(光合成)用之光源的發光波長之1個,對光合成的反應效率高。A second light-emitting layer 340 that emits light is provided between the second p-type semiconductor layer 330 and the second n-type semiconductor layer 350. The second light-emitting layer 340 is preferably formed in a range of 655 to 675 nm in which the peak emission wavelength of the emission spectrum is 655 to 675 nm, and more preferably in the range of 660 to 670 nm. The emission wavelength in the above range is suitable for one of the emission wavelengths of the light source for plant growth (photosynthesis), and the reaction efficiency for photo synthesis is high.
另一方面,700nm以上的長波長係會發生抑制植物育成的反應。因此,長波長範圍的光量最好為較少。因此,為了有效率地進行植物育成,相對光合成反應之最適655~675nm的波長領域的光較強、未包含700nm以上之長波長的光的紅色光源為最佳。由此,為了形成為較佳紅色光源,半值寬度必須為較窄。On the other hand, a long wavelength system of 700 nm or more causes a reaction for inhibiting plant growth. Therefore, the amount of light in the long wavelength range is preferably small. Therefore, in order to efficiently carry out plant growth, it is preferable that the light source in the wavelength range of 655 to 675 nm which is optimal for the photosynthetic reaction is strong, and the red light source which does not contain light having a long wavelength of 700 nm or more is preferable. Thus, in order to form a preferred red light source, the half value width must be narrow.
基於該等情形,發光頻譜的半值寬度較佳為10~40nm,此外,發光波長700nm中的發光強度,以未達峰值發光波長中之發光強度的10%為佳。Based on these cases, the half value width of the light emission spectrum is preferably 10 to 40 nm, and the light emission intensity at an emission wavelength of 700 nm is preferably 10% of the light emission intensity in the peak emission wavelength.
第2發光層340係將變形發光層與阻障層交替層積所構成。變形發光層例如為未摻雜、厚度為約17nm的Ga0.44 In0.56 P,阻障層例如為未摻雜、厚度為約19nm的(Al0.53 Ga0.47 )0.5 In0.5 P。接著,將變形發光層與阻障層交替層積例如22對。The second light-emitting layer 340 is formed by alternately laminating a deformed light-emitting layer and a barrier layer. The deformed light-emitting layer is, for example, undoped Ga 0.44 In 0.56 P having a thickness of about 17 nm, and the barrier layer is, for example, undoped (Al 0.53 Ga 0.47 ) 0.5 In 0.5 P having a thickness of about 19 nm. Next, the deformed light-emitting layer and the barrier layer are alternately laminated, for example, 22 pairs.
作為上部包覆層發揮作用的第2n型半導體層350係設在第2發光層340的上面。The second n-type semiconductor layer 350 functioning as an upper cladding layer is provided on the upper surface of the second light-emitting layer 340.
第2n型半導體層350係例如摻雜有Si之載體濃度為約1×1018 /cm3 、厚度為約0.5μm的(Al0.7 Ga0.3 )0.5 In0.5 P。The second n-type semiconductor layer 350 is, for example, (Al 0.7 Ga 0.3 ) 0.5 In 0.5 P having a carrier concentration of Si of about 1 × 10 18 /cm 3 and a thickness of about 0.5 μm.
其中,亦可在第2n型半導體層350的上面設置n型接觸層,其由例如摻雜Si之載體濃度為約2×1018 /cm3 、厚度為約3.5μm的(Al0.7 Ga0.3 )0.5 In0.5 P所構成。Further, an n-type contact layer may be provided on the upper surface of the second n-type semiconductor layer 350, which has a carrier concentration of, for example, doped Si of about 2×10 18 /cm 3 and a thickness of about 3.5 μm (Al 0.7 Ga 0.3 ). 0.5 In 0.5 P.
屬於n型焊墊電極的第3接合焊墊電極400係被設在第2n型半導體層350的上面350c,可使用例如由AuGe、Ni合金/Au所構成的合金。The third bonding pad electrode 400 belonging to the n-type pad electrode is provided on the upper surface 350c of the second n-type semiconductor layer 350, and an alloy made of, for example, AuGe or Ni alloy/Au can be used.
另一方面,屬於p型焊墊電極的第4接合焊墊電極410係被設在露出的變形調整層320的上面320c,可使用例如由AuBe/Au所構成的合金。On the other hand, the fourth bonding pad electrode 410 belonging to the p-type pad electrode is provided on the upper surface 320c of the exposed deformation adjusting layer 320, and an alloy made of, for example, AuBe/Au can be used.
上述第2半導體發光元件64b係可製造如下所示。The second semiconductor light-emitting device 64b can be manufactured as follows.
首先,在摻雜有Si之由n型GaAs單結晶所構成的GaAs基板上依序層積第2層積半導體層300。GaAs基板係將由例如(100)面朝(0-1-1)方向傾斜15°的面作為成長面,載體濃度為2×1018 /cm3 。First, the second laminated semiconductor layer 300 is sequentially laminated on a GaAs substrate made of a single crystal of n-type GaAs doped with Si. The GaAs substrate has a surface inclined by 15° from the (100) plane toward the (0-1-1) direction as a growth surface, and the carrier concentration is 2 × 10 18 /cm 3 .
在該GaAs基板上,依照第2n型半導體層350、第2發光層340、第2p型半導體層330、變形調整層320的順序形成第2層積半導體層300。On the GaAs substrate, the second layered semiconductor layer 300 is formed in the order of the second n-type semiconductor layer 350, the second light-emitting layer 340, the second p-type semiconductor layer 330, and the deformation adjustment layer 320.
其中,亦可在GaAs基板上與第2層積半導體層300之間設有由例如摻雜有Si之載體濃度為約2×1018 /cm3 、厚度為約0.5μm的GaAs所構成的n型緩衝層。Further, n may be formed between the GaAs substrate and the second laminated semiconductor layer 300 by, for example, GaAs doped with Si at a carrier concentration of about 2 × 10 18 /cm 3 and a thickness of about 0.5 μm. Type buffer layer.
在本實施形態中,使用減壓有機金屬化學氣相沈積(MOCVD)法,使第2層積半導體層300作磊晶成長在直徑76mm、厚度350μm的GaAs基板。使其作磊晶成長時,以III族構成元素的原料而言,係可使用三甲基鋁((CH3 )2 Al)、三甲基鎵((CH3 )3 Ga)及三甲基銦((CH3 )3 In)。此外,以Mg的摻雜原料而言,係可使用雙(環戊二烯)鎂(bis-(C5 H5 )2 Mg)。此外,以Si的摻雜原料而言,係可使用二矽烷(Si2 H6 )。接著,以V族構成元素的原料而言,係可使用三氫化磷(PH3 )、三氫化砷(AsH3 )。此外,以各層的成長溫度而言,由p型GaP所構成的變形調整層320係在750℃下使其成長,其他各層係在700℃下使其成長。In the present embodiment, the second laminated semiconductor layer 300 is epitaxially grown on a GaAs substrate having a diameter of 76 mm and a thickness of 350 μm by a reduced pressure metalorganic chemical vapor deposition (MOCVD) method. When it is used for epitaxial growth, trimethylaluminum ((CH 3 ) 2 Al), trimethylgallium ((CH 3 ) 3 Ga), and trimethyl group can be used as the raw material of the group III constituent element. Indium ((CH 3 ) 3 In). Further, in the case of a doping raw material of Mg, bis(cyclopentadienyl)magnesium (bis-(C 5 H 5 ) 2 Mg) can be used. Further, in the case of a doping raw material of Si, dioxane (Si 2 H 6 ) can be used. Next, phosphorus trihydrate (PH 3 ) or arsine (AsH 3 ) can be used as a raw material of the group V constituent element. Further, the deformation adjusting layer 320 composed of p-type GaP was grown at 750 ° C in terms of the growth temperature of each layer, and the other layers were grown at 700 ° C.
接著,將變形調整層320由表面硏磨至約1μm的深度為止而進行鏡面加工。另一方面,備妥黏貼在上述變形調整層320經鏡面硏磨的表面之由n型GaP所構成的第2基板310。第2基板310係例如直徑為76mm、厚度為250μm。接著,第2基板310係以載體濃度成為約2×1017 /cm3 的方式摻雜有Si之(111)面的單結晶基板。此外,第2基板310的表面係在接合於變形調整層320之前,先硏磨成鏡面。Next, the deformation adjustment layer 320 is mirror-finished by honing the surface to a depth of about 1 μm. On the other hand, the second substrate 310 made of n-type GaP is attached to the surface of the deformation-adjusting layer 320 which is mirror-honed. The second substrate 310 has, for example, a diameter of 76 mm and a thickness of 250 μm. Next, the second substrate 310 is doped with a single crystal substrate of a (111) plane of Si so that the carrier concentration is about 2 × 10 17 /cm 3 . Further, the surface of the second substrate 310 is honed to a mirror surface before being bonded to the deformation adjustment layer 320.
接著,在一般的半導體材料黏貼裝置搬入第2基板310、及形成有第2層積半導體層300的GaAs基板,至成為例如3×10-5 Pa為止,將半導體材料黏貼裝置內作排氣成真空。Then, the semiconductor substrate is placed in the second substrate 310 and the GaAs substrate on which the second layered semiconductor layer 300 is formed, and the semiconductor material is adhered to the device, for example, to 3 × 10 -5 Pa. vacuum.
之後,將第2基板310、及第2層積半導體層300的變形調整層320的表面,例如經3分鐘照射使電子衝撞而呈中性(neutral)化的Ar束,將吸附在雙方表面的氣體等去除。After that, the surface of the deformation adjusting layer 320 of the second substrate 310 and the second laminated semiconductor layer 300 is irradiated with electrons for 3 minutes, for example, and is neutralized to form a neutral Ar beam, which is adsorbed on both surfaces. Gas and the like are removed.
之後,在維持真空的半導體材料黏貼裝置內,將第2基板310與第2層積半導體層300的變形調整層320表面相疊合,以例如壓力成為50g/cm2 的方式施加負載,在室溫下進行接合。After that, in the semiconductor material adhering device that maintains the vacuum, the second substrate 310 and the surface of the deformation adjusting layer 320 of the second laminated semiconductor layer 300 are superposed on each other, and the load is applied to the chamber so that the pressure is 50 g/cm 2 . Engage at a temperature.
此外,藉由氨系蝕刻劑,將GaAs基板及GaAs緩衝層選擇性去除。接著,在接觸層的表面,將AuGe、Ni合金以厚度成為0.5μm、Pt成為0.2μm、Au成為1μm的方式藉由真空蒸鍍法進行成膜而作為第3接合焊墊電極400。之後,利用周知的光微影施行圖案化,形成有作為n型焊墊電極發揮作用的第3接合焊墊電極400。Further, the GaAs substrate and the GaAs buffer layer are selectively removed by an ammonia-based etchant. Then, AuGe and Ni alloy were deposited as a third bonding pad electrode 400 by a vacuum deposition method so that the thickness of the contact layer was 0.5 μm, Pt was 0.2 μm, and Au was 1 μm. Thereafter, patterning is performed by well-known photolithography to form a third bonding pad electrode 400 that functions as an n-type pad electrode.
接著,將形成第4接合焊墊電極410之領域的第2n型半導體層350、第2發光層340、第2p型半導體層330選擇性去除,而使變形調整層320露出。在該所露出的變形調整層320的上面320c,將AuBe形成為0.2μm、Au形成為1μm的方式利用真空蒸鍍法形成作為p型焊墊電極發揮作用的第4接合焊墊電極410。Next, the second n-type semiconductor layer 350, the second light-emitting layer 340, and the second p-type semiconductor layer 330 in the field in which the fourth bonding pad electrode 410 is formed are selectively removed, and the deformation adjustment layer 320 is exposed. The fourth bonding pad electrode 410 functioning as a p-type pad electrode is formed by vacuum deposition on the upper surface 320c of the exposed deformation adjustment layer 320 so that AuBe is formed to be 0.2 μm and Au is formed to be 1 μm.
之後,在450℃下進行10分鐘熱處理而進行合金化,各自形成低阻抗之作為n型及p型焊墊電極發揮作用的第3接合焊墊電極400及第4接合焊墊電極410。Thereafter, the alloy was alloyed by heat treatment at 450 ° C for 10 minutes to form a third bonding pad electrode 400 and a fourth bonding pad electrode 410 which function as n-type and p-type pad electrodes with low impedance.
如上述所製造的第2半導體發光元件64b係如第5圖(a)所示,被組入於發光元件封裝體21。亦即,第2半導體發光元件64b的底面310c被設置在引線框架的陽極用引線部62b上,第3接合焊墊電極400係藉由例如金的接合導線65而與陰極用引線部63b相連接,第4接合焊墊電極410係藉由金的接合導線65而與陽極用引線部62a相連接。藉此,n型GaP的第2基板310與第3接合焊墊電極400係形成為同電位。The second semiconductor light-emitting device 64b manufactured as described above is incorporated in the light-emitting element package 21 as shown in Fig. 5(a). In other words, the bottom surface 310c of the second semiconductor light-emitting device 64b is provided on the anode lead portion 62b of the lead frame, and the third bonding pad electrode 400 is connected to the cathode lead portion 63b by, for example, a gold bonding wire 65. The fourth bonding pad electrode 410 is connected to the anode lead portion 62a by a gold bonding wire 65. Thereby, the second substrate 310 of the n-type GaP and the third bonding pad electrode 400 are formed at the same potential.
其中,發光元件封裝體21的凹部61a亦可在打線接合之後,以一般的環氧樹脂予以密封。Here, the concave portion 61a of the light-emitting element package 21 may be sealed with a general epoxy resin after wire bonding.
其中,本實施形態中的紅色發光的第2半導體發光元件64b係使用由AlGaInP所構成的4元化合物半導體。在本說明書中,AlGaInP或AlInP等的記述亦有將各元素的組成比簡略記載的情形。另一方面,以發出660nm之光的半導體發光元件而言,已知一種使用AlGaAs之3元化合物半導體者。In the second semiconductor light-emitting device 64b that emits red light in the present embodiment, a quaternary compound semiconductor composed of AlGaInP is used. In the present specification, the description of AlGaInP or AlInP or the like also has a case where the composition ratio of each element is simply described. On the other hand, a semiconductor luminescent element that emits light of 660 nm is known as a ternary compound semiconductor using AlGaAs.
本實施形態中使用AlGaInP的第2半導體發光元件64b,與使用AlGaAs者相比,由於Al的比率較低,因此具有抵抗因濕氣所造成的腐蝕的特性。In the second semiconductor light-emitting device 64b using AlGaInP in the present embodiment, since the ratio of Al is low as compared with those using AlGaAs, it has a property of resisting corrosion due to moisture.
上述第1半導體發光元件64a及第2半導體發光元件64b為一例,可知可使用除此以外之構造的半導體發光元件、具有該等以外之發光峰值波長的半導體發光元件。The first semiconductor light-emitting device 64a and the second semiconductor light-emitting device 64b are exemplified, and it is known that a semiconductor light-emitting device having a structure other than the above, and a semiconductor light-emitting device having an emission peak wavelength other than the above can be used.
如以上說明所示,在本實施形態中,係使用安裝有植物育成所需之藍色發光的第1半導體發光元件64a及紅色發光的第2半導體發光元件64b的發光元件封裝體21,因此易於製造照明裝置10。As described above, in the present embodiment, the light-emitting element package 21 in which the first semiconductor light-emitting element 64a and the red-emitting second semiconductor light-emitting element 64b for blue light emission required for plant growth are mounted is used. The lighting device 10 is manufactured.
此外,以可將第1半導體發光元件64a及第2半導體發光元件64b的各個進行導通/關斷的方式,個別設有引線框架的陽極用引線部62a、62b及陰極用引線部63a、63b。因此,將照明控制配線31以第1半導體發光元件64a與第2半導體發光元件64b分開設置,藉此可依植物的種類等,獨立控制紅色與藍色的光子密度(光量子密度)。In addition, the anode lead portions 62a and 62b and the cathode lead portions 63a and 63b of the lead frame are individually provided so that each of the first semiconductor light-emitting device 64a and the second semiconductor light-emitting device 64b can be turned on/off. Therefore, the illumination control wiring 31 is provided separately from the first semiconductor light-emitting element 64a and the second semiconductor light-emitting element 64b, whereby the photon density (optical quantum density) of red and blue can be independently controlled depending on the type of plant or the like.
在如上所示製作的照明裝置10中,20cm正下方之光量子密度係當藍色發光之第1半導體發光元件64a的平均每1個流通20mA時,為300μmol/m2 /sec,當紅色發光之第2半導體發光元件64b的平均每1個流通20mA時,則為200μmol/m2 /sec。In the illuminating device 10 produced as described above, the optical quantum density immediately below 20 cm is 300 μmol/m 2 /sec when the average of the first semiconductor light-emitting elements 64a that emit blue light is 20 μm per one turn. When the average of the second semiconductor light-emitting elements 64b is 20 mA per one turn, it is 200 μmol/m 2 /sec.
此外,在使半導體發光元件為不亮燈,(I)5℃下放置15分鐘、(II)15分鐘內升溫至60℃、(III)60℃下放置15分鐘、(IV)15分鐘內降溫至5℃,然後將恢復至(I)的溫度週期反覆進行1000週期的溫度週期試驗中,在照明裝置10的透明蓋件12(玻璃)內面模糊不清,並未發現結露。此外,在30℃、95%RH(相對濕度)的環境下,在藍色發光的第1半導體發光元件64a流通10mA、在紅色發光的第2半導體發光元件64b流通30mA所進行的1000小時的連續亮燈試驗中,在照明裝置10內部未發現生銹或半導體發光元件的不亮燈,光量子密度係可維持初期值的98%。In addition, when the semiconductor light-emitting device is not lit, (I) is placed at 5 ° C for 15 minutes, (II) is heated to 60 ° C for 15 minutes, (III) is placed at 60 ° C for 15 minutes, and (IV) is cooled for 15 minutes. At 5 ° C, the temperature cycle returned to (I) was repeated for a cycle of 1000 cycles, and the inner surface of the transparent cover member 12 (glass) of the illumination device 10 was blurred, and no condensation was observed. In addition, in the environment of 30° C. and 95% RH (relative humidity), the first semiconductor light-emitting device 64a that emits blue light flows 10 mA, and the second semiconductor light-emitting device 64b that emits red light flows through 30 mA for 1000 hours. In the lighting test, rust or semiconductor light-emitting elements were not lit inside the illuminating device 10, and the optical quantum density was maintained at 98% of the initial value.
在第1實施形態中,將包含藍色發光的第1半導體發光元件64a及紅色發光的第2半導體發光元件64b的發光元件封裝體21搭載於電路基板22,將該電路基板22另外搭載於放熱基板24。在該方法中,由第1半導體發光元件64a及第2半導體發光元件64b所發生的熱係透過發光元件封裝體21的金屬引線、及電路基板22的貫穿孔,由電路基板22的背面傳至放熱基板24。In the first embodiment, the light-emitting element package 21 including the first semiconductor light-emitting device 64a and the second semiconductor light-emitting device 64b that emits blue light is mounted on the circuit board 22, and the circuit board 22 is additionally mounted on the heat-dissipating unit. Substrate 24. In this method, the heat generated by the first semiconductor light-emitting element 64a and the second semiconductor light-emitting element 64b is transmitted through the metal lead of the light-emitting element package 21 and the through hole of the circuit board 22, and is transmitted from the back surface of the circuit board 22 to The substrate 24 is exothermic.
其中,發光元件封裝體21的金屬引線較薄為厚度0.15mm,發光元件封裝體21的熱阻抗為100℃/W,並非那麼低。The metal lead of the light-emitting element package 21 is thinner than 0.15 mm, and the thermal impedance of the light-emitting element package 21 is 100 ° C/W, which is not so low.
在本實施形態中,為了使冷卻效率更加提升,採用將第1半導體發光元件64a及第2半導體發光元件64b直接接著在金屬基座之電路基板32之金屬基座部的方式(COB式:Chip on Board式)。In the present embodiment, in order to further improve the cooling efficiency, the first semiconductor light-emitting device 64a and the second semiconductor light-emitting device 64b are directly attached to the metal base portion of the circuit substrate 32 of the metal base (COB type: Chip On Board type).
第10圖係適用本實施形態的照明裝置20之一例的剖面圖。其中,照明裝置20係與第1實施形態同樣地具備有:構成框體的外裝蓋件11、透明蓋件12、第1側面蓋件13、及第2側面蓋件14。此外,在本實施形態中亦使用藍色發光的第1半導體發光元件64a與紅色發光的第2半導體發光元件64b。Fig. 10 is a cross-sectional view showing an example of a lighting device 20 to which the present embodiment is applied. In the same manner as the first embodiment, the illuminating device 20 includes an exterior cover member 11 that constitutes a frame, a transparent cover member 12, a first side cover member 13, and a second side cover member 14. Further, in the present embodiment, the first semiconductor light-emitting element 64a that emits blue light and the second semiconductor light-emitting element 64b that emits red light are also used.
在本實施形態中,在放熱基板24的其中一面,與第1實施形態同樣地,設有冷媒導管25。接著,在放熱基板24的另一面,透過絕緣性放熱材23螺緊有COB式的電路基板32。其中,在第10圖中係設有反射器26,但是不設亦可。In the present embodiment, a refrigerant conduit 25 is provided on one surface of the heat radiation substrate 24 in the same manner as in the first embodiment. Next, on the other surface of the heat radiation substrate 24, a COB type circuit board 32 is screwed through the insulating heat releasing material 23. Here, in the tenth figure, the reflector 26 is provided, but it is not necessary.
第11圖係用以說明設在COB(Chip On Board)式之電路基板32的連接配線520與半導體發光元件(第1半導體發光元件64a及第2半導體發光元件64b)之連接關係之一例的俯視圖。在此,第11圖(a)係說明透過絕緣性放熱材23而被螺緊在放熱基板24的COB式的電路基板32上的電路圖案之例的俯視圖。第11圖(b)係以第11圖(a)的虛線所包圍的部分的放大圖,顯示被配置在電路基板32上的第1半導體發光元件64a及第2半導體發光元件64b與連接配線520的連接關係。FIG. 11 is a plan view showing an example of a connection relationship between the connection wiring 520 of the circuit board 32 of the COB (Chip On Board) type and the semiconductor light emitting element (the first semiconductor light emitting element 64a and the second semiconductor light emitting element 64b). . Here, FIG. 11( a ) is a plan view showing an example of a circuit pattern which is screwed to the COB type circuit board 32 of the heat radiation substrate 24 through the insulating heat radiation material 23 . 11(b) is an enlarged view of a portion surrounded by a broken line in FIG. 11(a), showing the first semiconductor light-emitting element 64a and the second semiconductor light-emitting element 64b and the connection wiring 520 disposed on the circuit board 32. Connection relationship.
其中,在第2實施形態的說明中,係對與第1實施形態中所說明的構成為相同的構成標註相同的元件符號,並省略詳細說明。In the description of the second embodiment, the same components as those described in the first embodiment are denoted by the same reference numerals, and the detailed description thereof will be omitted.
首先,在第11圖(a)中,針對形成有連接配線520的電路基板32加以說明。First, in FIG. 11(a), the circuit board 32 on which the connection wiring 520 is formed will be described.
電路基板32係用以將伴隨著第1半導體發光元件64a及第2半導體發光元件64b的發光所發生的熱排出至栽培室60外的基板。因此,電路基板32係以熱傳導率佳的材質所構成。The circuit board 32 is for discharging the heat generated by the light emission of the first semiconductor light-emitting element 64a and the second semiconductor light-emitting element 64b to the substrate outside the cultivation chamber 60. Therefore, the circuit board 32 is made of a material having a good thermal conductivity.
以電路基板32而言,係可使用熱傳導率優異的Al、Cu。In the circuit board 32, Al or Cu which is excellent in thermal conductivity can be used.
另一方面,在電路基板32的表面設有在兩面形成有連接配線520的絕緣層510。接著,以可將第1半導體發光元件64a及第2半導體發光元件64b直接搭載於電路基板32上的方式,以露出電路基板32的表面的方式去除絕緣層510,設有複數半導體發光元件設置部530。在第11圖(a)中,以一例而言,複數半導體發光元件設置部530朝電路基板32的長邊方向以等間隔排2列,平均每列配置有15個。On the other hand, an insulating layer 510 having connection wirings 520 formed on both surfaces thereof is provided on the surface of the circuit board 32. Then, the insulating layer 510 is removed to expose the surface of the circuit board 32 so that the first semiconductor light emitting element 64a and the second semiconductor light emitting element 64b can be directly mounted on the circuit board 32, and the plurality of semiconductor light emitting element mounting portions are provided. 530. In the first embodiment, the plurality of semiconductor light-emitting device installation portions 530 are arranged in two rows at equal intervals in the longitudinal direction of the circuit board 32, and an average of 15 are arranged in each column.
接著,在複數半導體發光元件設置部530的各個,例如將第1半導體發光元件64a與第2半導體發光元件64b設為成對予以配置。第1半導體發光元件64a及第2半導體發光元件64b係透過連接配線520而被供電。如第11圖(a)所示,連接配線520具體而言係由被分割成複數的配線所構成。Then, each of the plurality of semiconductor light-emitting element installation units 530 is disposed, for example, in a pair of the first semiconductor light-emitting elements 64a and the second semiconductor light-emitting elements 64b. The first semiconductor light-emitting element 64a and the second semiconductor light-emitting element 64b are supplied with power through the connection wiring 520. As shown in Fig. 11(a), the connection wiring 520 is specifically constituted by a wiring divided into a plurality of lines.
接著,在第11圖(b)中,說明第1半導體發光元件64a及第2半導體發光元件64b、與連接配線520之連接關係之一例。Next, an example of the connection relationship between the first semiconductor light-emitting device 64a, the second semiconductor light-emitting device 64b, and the connection wiring 520 will be described in FIG. 11(b).
第1半導體發光元件64a與第2半導體發光元件64b係構成成對(pair),該成對被配置在半導體發光元件設置部530內。第1半導體發光元件64a及第2半導體發光元件64b係朝電路基板32的短邊方向排列配置,第1半導體發光元件64a被配置在電路基板32的外側,第2半導體發光元件64b被配置在電路基板32的內側。The first semiconductor light-emitting element 64a and the second semiconductor light-emitting element 64b are paired, and the pair is disposed in the semiconductor light-emitting element installation unit 530. The first semiconductor light-emitting element 64a and the second semiconductor light-emitting element 64b are arranged side by side in the short-side direction of the circuit board 32. The first semiconductor light-emitting element 64a is disposed outside the circuit board 32, and the second semiconductor light-emitting element 64b is disposed in the circuit. The inside of the substrate 32.
接著,某一第1半導體發光元件64a的第1接合焊墊電極210透過絕緣層510上的連接配線520而被連接在與其相鄰接配置之其他第1半導體發光元件64a的第2接合焊墊電極240。第1接合焊墊電極210或第2接合焊墊電極240與連接配線520係利用接合導線65予以連接。Then, the first bonding pad electrode 210 of the first semiconductor light-emitting device 64a is transmitted through the connection wiring 520 on the insulating layer 510, and is connected to the second bonding pad of the other first semiconductor light-emitting device 64a disposed adjacent thereto. Electrode 240. The first bonding pad electrode 210 or the second bonding pad electrode 240 and the connection wiring 520 are connected by a bonding wire 65.
此外,必須跨越連接配線520而將其他2個連接配線520相連接的部分,係利用低阻抗的晶片阻抗66作過渡配線。Further, it is necessary to connect the other two connection wirings 520 across the connection wiring 520, and the low-impedance wafer impedance 66 is used as the transition wiring.
如上所示,複數第1半導體發光元件64a藉由連接配線520作串聯連接。同樣地,複數第2半導體發光元件64b藉由連接配線520作串聯連接。但是,複數第1半導體發光元件64a與複數第2半導體發光元件64b並不互相連接。此係因為得以使第1半導體發光元件64a與第2半導體發光元件64b個別作亮燈控制之故。As described above, the plurality of first semiconductor light-emitting elements 64a are connected in series by the connection wiring 520. Similarly, the plurality of second semiconductor light-emitting elements 64b are connected in series by the connection wiring 520. However, the plurality of first semiconductor light-emitting elements 64a and the plurality of second semiconductor light-emitting elements 64b are not connected to each other. This is because the first semiconductor light-emitting element 64a and the second semiconductor light-emitting element 64b are individually controlled for lighting.
亦即,在連接配線端子520a與520b之間,僅有被配列在電路基板32內側的第2半導體發光元件64b串聯連接10個。另一方面,在連接配線端子520c與520d之間,僅有被配列在電路基板32外側的第1半導體發光元件64a串聯連接10個。藉此,在連接配線端子520a與520b之間,照明控制部30將第2半導體發光元件64b的順向電壓施加至作串聯連接的個數倍的電壓,在第2半導體發光元件64b流通順向電流,藉此可使串聯連接的複數第2半導體發光元件64b同時亮燈。在連接配線端子520c與520d之間亦同。In other words, only the second semiconductor light-emitting elements 64b arranged inside the circuit board 32 are connected in series between the connection wiring terminals 520a and 520b. On the other hand, between the connection wiring terminals 520c and 520d, only the first semiconductor light-emitting elements 64a arranged outside the circuit board 32 are connected in series of ten. Thereby, between the connection wiring terminals 520a and 520b, the illumination control unit 30 applies the forward voltage of the second semiconductor light-emitting element 64b to a voltage that is several times connected in series, and flows in the second semiconductor light-emitting element 64b. The current can thereby simultaneously turn on the plurality of second semiconductor light-emitting elements 64b connected in series. The same applies between the connection wiring terminals 520c and 520d.
其中,在本實施形態中,如第11圖(a)所示,配置在電路基板32的圖中右側、中央、左側,分別作串聯連接的10個第1半導體發光元件64a或第2半導體發光元件64b在連接配線端子520a與520b之間或連接配線端子520c與520d之間作並聯連接。如上所示,將作串聯連接的第1半導體發光元件64a或第2半導體發光元件64b的列作複數並聯連接,藉此與將電路基板32上的所有第1半導體發光元件64a或第2半導體發光元件64b作串聯連接的情形相比,可將供給至第1半導體發光元件64a或第2半導體發光元件64b的電壓抑制為較低。In the present embodiment, as shown in FIG. 11(a), the first semiconductor light-emitting elements 64a or the second semiconductor light-emitting elements which are connected in series on the right side, the center, and the left side of the circuit board 32 are disposed. The element 64b is connected in parallel between the connection wiring terminals 520a and 520b or between the connection wiring terminals 520c and 520d. As described above, the first semiconductor light-emitting elements 64a or the second semiconductor light-emitting elements 64b connected in series are connected in parallel in plural, thereby illuminating all of the first semiconductor light-emitting elements 64a or the second semiconductor on the circuit board 32. The voltage supplied to the first semiconductor light-emitting element 64a or the second semiconductor light-emitting element 64b can be suppressed to be lower than that in the case where the elements 64b are connected in series.
第12圖係更進一步說明本實施形態中直接搭載有半導體發光元件(第1半導體發光元件64a及第2半導體發光元件64b)之COB(Chip On Board)(COB)式的電路基板32的圖。第12圖(a)係放大顯示一個半導體發光元件設置部530之部分的俯視圖。第12圖(b)係第12圖(a)之XIIB-XIIB線下的剖面圖。Fig. 12 is a view showing a COB (Chip On Board) (COB) type circuit board 32 in which semiconductor light-emitting elements (first semiconductor light-emitting elements 64a and second semiconductor light-emitting elements 64b) are directly mounted in the present embodiment. Fig. 12(a) is a plan view showing a part of a semiconductor light emitting element mounting portion 530 in an enlarged manner. Fig. 12(b) is a cross-sectional view taken along line XIIB-XIIB of Fig. 12(a).
在電路基板32的兩面設有形成有連接配線520的絕緣層510。接著,絕緣層510係在設置第1半導體發光元件64a與第2半導體發光元件64b的半導體發光元件設置部530中,以露出電路基板32的方式予以去除。An insulating layer 510 on which the connection wiring 520 is formed is provided on both surfaces of the circuit board 32. Next, the insulating layer 510 is removed in the semiconductor light emitting element mounting portion 530 in which the first semiconductor light emitting element 64a and the second semiconductor light emitting element 64b are provided, so as to expose the circuit board 32.
在露出半導體發光元件設置部530的電路基板32上配置有第1半導體發光元件64a與第2半導體發光元件64b。接著,第1半導體發光元件64a的第1接合焊墊電極210與第2接合焊墊電極240係以接合導線65而連接在形成於絕緣層510上的連接配線520。同樣地,第2半導體發光元件64b的第3接合焊墊電極400與第4接合焊墊電極410係分別利用接合導線65而與連接配線520相連接。The first semiconductor light emitting element 64a and the second semiconductor light emitting element 64b are disposed on the circuit board 32 on which the semiconductor light emitting element mounting portion 530 is exposed. Then, the first bonding pad electrode 210 and the second bonding pad electrode 240 of the first semiconductor light emitting element 64a are connected to the connection wiring 520 formed on the insulating layer 510 by bonding the wires 65. Similarly, the third bonding pad electrode 400 and the fourth bonding pad electrode 410 of the second semiconductor light emitting element 64b are connected to the connection wiring 520 by the bonding wires 65, respectively.
如第12圖(b)所示,絕緣層510(包含形成在絕緣層510之兩面的連接配線520)係隔著接著層540而層積在電路基板32。接著,絕緣層510之成為半導體發光元件設置部530的部分以其側面成為例如圓錐狀的方式予以去除,而露出電路基板32。As shown in FIG. 12(b), the insulating layer 510 (including the connection wiring 520 formed on both surfaces of the insulating layer 510) is laminated on the circuit board 32 via the bonding layer 540. Then, the portion of the insulating layer 510 that becomes the semiconductor light-emitting element mounting portion 530 is removed such that its side surface is, for example, conical, and the circuit board 32 is exposed.
絕緣層510的材料亦未被限定,可任意使用樹脂、陶瓷等周知者。尤其,以使環氧樹脂含浸在玻璃布的玻璃環氧為佳。The material of the insulating layer 510 is also not limited, and any well-known person such as a resin or a ceramic can be used arbitrarily. In particular, it is preferred that the epoxy resin is impregnated with glass epoxy of the glass cloth.
連接配線520的材料亦未被限定,可任意使用Cu、Al等周知者。The material of the connection wiring 520 is also not limited, and any known person such as Cu or Al can be used arbitrarily.
接著層540亦另外若為可接合在電路基板32及絕緣層510之兩者者,則材質並未被限定。亦可使用環氧樹脂等熱熔接著劑,藉由熱壓而接合在電路基板32。亦可使用黏著性接著劑來貼附在電路基板32。Next, if the layer 540 is also bondable to both the circuit board 32 and the insulating layer 510, the material is not limited. It is also possible to bond to the circuit board 32 by hot pressing using a hot melt adhesive such as an epoxy resin. It is also possible to attach to the circuit board 32 using an adhesive adhesive.
其中,在此係在絕緣層510的兩面形成有連接配線520,但是亦可僅在單面形成有連接配線520。Here, although the connection wiring 520 is formed on both surfaces of the insulating layer 510, the connection wiring 520 may be formed only on one surface.
第1半導體發光元件64a與第2半導體發光元件64b係利用例如樹脂而被固定在電路基板32。此外,在第1半導體發光元件64a的背面,隔著Al、Ni等金屬層,形成AuSn層,藉由熱熔融而被固定在電路基板32的表面則為更佳。關於第2半導體發光元件64b亦同。The first semiconductor light-emitting element 64a and the second semiconductor light-emitting element 64b are fixed to the circuit board 32 by, for example, a resin. In addition, it is more preferable that the AuSn layer is formed on the back surface of the first semiconductor light-emitting device 64a via a metal layer such as Al or Ni, and is fixed to the surface of the circuit board 32 by heat fusion. The same applies to the second semiconductor light-emitting element 64b.
接著,各自的n型焊墊電極及p型焊墊電極與連接配線520係利用金等接合導線65相連接。Next, the respective n-type pad electrodes and p-type pad electrodes and the connection wiring 520 are connected by a bonding wire 65 such as gold.
接著,在半導體發光元件設置部530,以包覆第1半導體發光元件64a及第2半導體發光元件64b與接合導線65的方式設有密封樹脂550。密封樹脂550係如前所述,若由透過第1半導體發光元件64a及第2半導體發光元件64b所發出的光的透明樹脂所構成即可。以透明樹脂而言,含有以覆蓋凹部的方式予以密封的硬化性樹脂、使其硬化的硬化劑、及另外依需要所摻合之例如抗氧化劑、變色防止劑、光劣化防止劑、反應性稀釋劑、無機填充劑、阻燃劑、有機溶劑等者為佳。以硬化性樹脂而言,具體而言列舉如:矽酮樹脂、環氧樹脂、環氧矽酮混成樹脂、丙烯酸系樹脂、聚醯亞胺樹脂等。其中,由耐熱性的觀點來看,以矽酮樹脂或環氧樹脂為佳,尤其以矽酮樹脂為特佳。Next, the sealing resin 550 is provided in the semiconductor light emitting element mounting portion 530 so as to cover the first semiconductor light emitting element 64a and the second semiconductor light emitting element 64b and the bonding wires 65. The sealing resin 550 may be formed of a transparent resin that transmits light emitted from the first semiconductor light-emitting device 64a and the second semiconductor light-emitting device 64b as described above. The transparent resin contains a curable resin that is sealed so as to cover the concave portion, a hardener that is cured, and, if necessary, an antioxidant, a discoloration preventive agent, a photodegradation preventive agent, and a reactive dilution. A solvent, an inorganic filler, a flame retardant, an organic solvent or the like is preferred. Specific examples of the curable resin include an anthrone resin, an epoxy resin, an epoxy ketone mixed resin, an acrylic resin, and a polyimide resin. Among them, from the viewpoint of heat resistance, an anthrone resin or an epoxy resin is preferable, and an anthrone resin is particularly preferable.
如上所示之構造係可例如如下所示予以製造。The structure shown above can be manufactured, for example, as shown below.
以板狀絕緣層510而言,在0.1mm厚的玻璃環氧的兩面側形成厚度18μm的全面銅箔,將該銅箔進行蝕刻加工而形成連接配線520。由於利用電場鍍敷法而在電路圖案的銅箔表面施行厚度2μm以上的銀鍍敷,因此表面的電路圖案係透過貫穿孔而在背面的電路圖案全部導通,銀鍍敷形成後係藉由切掉電路基板32的端部,而進行電路圖案的邊緣切割。接著,在背面側形成藉由熱熔接著劑所得之厚度50μm的接著層540。In the plate-shaped insulating layer 510, a copper foil having a thickness of 18 μm was formed on both sides of a 0.1 mm thick glass epoxy, and the copper foil was etched to form a connection wiring 520. Since silver plating having a thickness of 2 μm or more is applied to the surface of the copper foil of the circuit pattern by the electric field plating method, the circuit pattern on the surface is transmitted through the through hole and all of the circuit patterns on the back surface are turned on, and the silver plating is formed by cutting. The end of the circuit board 32 is removed, and edge cutting of the circuit pattern is performed. Next, an adhesive layer 540 having a thickness of 50 μm obtained by a hot melt adhesive was formed on the back side.
接著,利用衝孔等將板狀絕緣層510之成為半導體發光元件設置部530的部分的絕緣層510予以去除。Then, the insulating layer 510 which is a portion of the plate-shaped insulating layer 510 which becomes the semiconductor light-emitting element mounting portion 530 is removed by punching or the like.
接著,使厚度0.7mm的高反射鋁板與板狀絕緣層510在預先訂定的位置疊合且進行熱壓。藉此,高反射鋁板與板狀絕緣層510強固接合,形成有COB式的電路基板32。Next, a highly reflective aluminum plate having a thickness of 0.7 mm and a plate-shaped insulating layer 510 were superposed on a predetermined position and hot pressed. Thereby, the highly reflective aluminum plate is strongly bonded to the plate-shaped insulating layer 510, and the COB type circuit board 32 is formed.
接著,將第1半導體發光元件64a與第2半導體發光元件64b接著在電路基板32之金屬基座的露出部。利用接合導線65將第1半導體發光元件64a的第1接合焊墊電極210及第2接合焊墊電極240與連接配線520相連接。Next, the first semiconductor light-emitting element 64a and the second semiconductor light-emitting element 64b are next attached to the exposed portion of the metal base of the circuit board 32. The first bonding pad electrode 210 and the second bonding pad electrode 240 of the first semiconductor light emitting element 64a are connected to the connection wiring 520 by the bonding wires 65.
藉此,可形成在電路基板32直接搭載有第1半導體發光元件64a與第2半導體發光元件64b之構造之所謂的COB。Thereby, a so-called COB having a structure in which the first semiconductor light-emitting element 64a and the second semiconductor light-emitting element 64b are directly mounted on the circuit board 32 can be formed.
在如上所示製作的照明裝置20中,20cm正下方之光子密度(光量子密度)係當藍色發光之第1半導體發光元件64a的平均每1個流通20mA時,為250μmol/m2 /sec,當紅色發光之第2半導體發光元件64b的平均每1個流通20mA時,則為150μmol/m2 /sec。In the illuminating device 20 produced as described above, the photon density (optical quantum density) immediately below 20 cm is 250 μmol/m 2 /sec when the average of the first semiconductor light-emitting elements 64a that emit blue light is 20 mA per one time. When the average of the second semiconductor light-emitting elements 64b that emit red light is 20 mA per one turn, it is 150 μmol/m 2 /sec.
此外,在使半導體發光元件為不亮燈,(I)5℃下放置15分鐘、(II)15分鐘內升溫至60℃、(III)60℃下放置15分鐘、(IV)15分鐘內降溫至5℃,然後將恢復至(I)的溫度週期反覆進行1000週期的溫度週期試驗中,在照明裝置20的透明蓋件12(玻璃)內面模糊不清,並未發現結露。此外,在30℃、95%RH(相對濕度)的環境下,在藍色發光的第1半導體發光元件64a流通10mA、在紅色發光的第2半導體發光元件64b流通30mA所進行的1000小時的連續亮燈試驗中,在照明裝置20內部未發現生銹或半導體發光元件的不亮燈,光量子密度係可維持初期值的98%。In addition, when the semiconductor light-emitting device is not lit, (I) is placed at 5 ° C for 15 minutes, (II) is heated to 60 ° C for 15 minutes, (III) is placed at 60 ° C for 15 minutes, and (IV) is cooled for 15 minutes. At 5 ° C, the temperature cycle returned to (I) was repeated for a cycle of 1000 cycles, and the inner surface of the transparent cover member 12 (glass) of the illuminating device 20 was blurred, and no condensation was observed. In addition, in the environment of 30° C. and 95% RH (relative humidity), the first semiconductor light-emitting device 64a that emits blue light flows 10 mA, and the second semiconductor light-emitting device 64b that emits red light flows through 30 mA for 1000 hours. In the lighting test, rust or semiconductor light-emitting elements were not lit inside the illuminating device 20, and the optical quantum density was maintained at 98% of the initial value.
其中,在本實施形態中,為了效率佳地取出光,亦可在包圍半導體發光元件設置部530的絕緣層510的側面設置反射面。反射面可由Al等反射率高的金屬膜所形成,亦可嵌入嵌合在半導體發光元件設置部530之形狀之由Al等所構成的金屬環。In the present embodiment, in order to extract light efficiently, a reflecting surface may be provided on the side surface of the insulating layer 510 surrounding the semiconductor light emitting element mounting portion 530. The reflecting surface may be formed of a metal film having a high reflectance such as Al, or may be a metal ring formed of Al or the like which is fitted in the shape of the semiconductor light emitting element mounting portion 530.
此外,在本實施形態中,亦與第1實施形態同樣地,亦可設置用以設定由電路基板32上的第1半導體發光元件64a與第2半導體發光元件64b所發出的光的方向的反射器26。其中,反射器26亦可與半導體發光元件設置部530相對應,形成有例如拋物線狀的反射面。對於構成成對的第1半導體發光元件64a及第2半導體發光元件64b,可在各自設置反射器26,亦可按每一成對來設置反射器26。此外,當僅在電路基板32的短邊或長邊方向控制光的方向時,亦可形成為開縫狀的反射器26。Further, in the present embodiment, as in the first embodiment, reflection in the direction of the light emitted from the first semiconductor light-emitting element 64a and the second semiconductor light-emitting element 64b on the circuit board 32 may be provided. Device 26. Among these, the reflector 26 may correspond to the semiconductor light emitting element installation portion 530, and may have a parabolic reflection surface, for example. The reflectors 26 may be provided for each of the first semiconductor light-emitting elements 64a and the second semiconductor light-emitting elements 64a constituting the pair, and the reflectors 26 may be provided for each pair. Further, when the direction of the light is controlled only in the short side or the long side direction of the circuit board 32, the slit 26 may be formed in a slit shape.
此外,在本實施形態中,係在跨越連接配線520而將其他2個連接配線520相連接的部分,使用低阻抗的晶片阻抗66,但是亦可以多層來構成連接配線520。Further, in the present embodiment, the low-impedance wafer impedance 66 is used in a portion where the other two connection wirings 520 are connected across the connection wiring 520. However, the connection wiring 520 may be formed in multiple layers.
適用本實施形態的照明裝置10、20係使第1半導體發光元件64a及第2半導體發光元件64b所發出的熱,藉由放熱基板24及被設在放熱基板24的冷媒導管25中的冷媒,而被放出至栽培室60的外部。因此,不會有發光效率減少,而且不會有劣化之虞,均可對第1半導體發光元件64a及第2半導體發光元件64b供給大電流,而以高光輸出其運轉。The illumination devices 10 and 20 according to the present embodiment are configured to heat the first semiconductor light-emitting device 64a and the second semiconductor light-emitting device 64b by the heat radiation substrate 24 and the refrigerant contained in the refrigerant conduit 25 of the heat radiation substrate 24. It is discharged to the outside of the cultivation room 60. Therefore, the first semiconductor light-emitting element 64a and the second semiconductor light-emitting element 64b can be supplied with a large current without a decrease in luminous efficiency, and the operation can be performed with high light without causing deterioration.
照明裝置10、20的內部係予以密閉,以抑制外氣流入,因此可抑制因濕氣侵入以致第1半導體發光元件64a及第2半導體發光元件64b因濕氣而造成腐蝕。此外,照明裝置10、20的內部若填充有乾燥空氣或乾燥氮,可更加抑制第1半導體發光元件64a及第2半導體發光元件64b因濕氣所造成的腐蝕。因此,即使為容易因濕氣而腐蝕的GaAlAs系的半導體發光元件,亦可作為植物栽培用的照明裝置10、20加以使用。The inside of the illuminating devices 10 and 20 is sealed to suppress the inflow of the outside air. Therefore, it is possible to suppress the corrosion of the first semiconductor light-emitting element 64a and the second semiconductor light-emitting element 64b due to moisture due to the intrusion of moisture. Further, when the inside of the illumination devices 10 and 20 is filled with dry air or dry nitrogen, corrosion of the first semiconductor light-emitting device 64a and the second semiconductor light-emitting device 64b due to moisture can be further suppressed. Therefore, even a GaAlAs-based semiconductor light-emitting device that is easily corroded by moisture can be used as the illumination devices 10 and 20 for plant cultivation.
此外,照明裝置10、20係在填充有乾燥空氣或乾燥氮並且抑制外氣流入的內部配設有冷媒導管25,因此即使使冷媒流通至高溫高濕的栽培室60,亦不會有結露的情形,可抑制因放熱基板24及冷媒導管25的結露水所造成的腐蝕。Further, since the illuminating devices 10 and 20 are provided with the refrigerant duct 25 in the interior of which the dry air or the dry nitrogen is filled and the outside airflow is suppressed, the refrigerant is not condensed even if the refrigerant is circulated to the cultivation chamber 60 having a high temperature and high humidity. In this case, corrosion due to dew condensation water of the heat release substrate 24 and the refrigerant conduit 25 can be suppressed.
接著,在本實施形態中,藉由雄型第1配管耦合器16與雌型第2配管耦合器17,以簡單的操作即可相連結,因此複數照明裝置10、20的連結或卸除可較為容易,且植物栽培系統1的構築或變更較為容易。接著,藉由作為冷媒通路的配管構件(雄型第1配管耦合器16與雌型第2配管耦合器17)將複數照明裝置10、20加以連結,因此並不需要另外設置供連結之用的構件。此外,可將複數照明裝置10、20近接配置,可有效活用栽培室60的空間。Next, in the present embodiment, the male first pipe coupler 16 and the female second pipe coupler 17 can be connected by a simple operation, so that the connection or removal of the plurality of illumination devices 10 and 20 can be relatively simple. It is easy, and it is easy to construct or change the plant cultivation system 1. Then, the plurality of illuminating devices 10 and 20 are connected by the piping member (the male first pipe coupler 16 and the female second pipe coupler 17) as the refrigerant passage. Therefore, it is not necessary to separately provide a connection for the connection. member. Further, the plurality of illuminating devices 10 and 20 can be arranged in close proximity, and the space of the cultivation room 60 can be effectively utilized.
1...植物栽培系統1. . . Plant cultivation system
10、20...照明裝置10, 20. . . Lighting device
11...外裝蓋件11. . . Exterior cover
12...透明蓋件12. . . Transparent cover
13...第1側面蓋件13. . . First side cover
14...第2側面蓋件14. . . Second side cover
15...配管接頭15. . . Piping connector
16...第1配管耦合器16. . . First piping coupler
16a...第1配管耦合器本體16a. . . First piping coupler body
16b...可動環16b. . . Movable ring
16c...爪部16c. . . Claw
16d...彈簧線圈16d. . . Spring coil
17...第2配管耦合器17. . . 2nd pipe coupler
17a...第2配管耦合器本體17a. . . Second piping coupler body
17b...O型環17b. . . O-ring
17c...溝槽17c. . . Trench
21...發光元件封裝體twenty one. . . Light emitting device package
22、32...電路基板22, 32. . . Circuit substrate
23...絕緣性放熱材twenty three. . . Insulating heat release material
24...放熱基板twenty four. . . Exothermic substrate
25...冷媒導管25. . . Refrigerant conduit
26...反射器26. . . reflector
27...反射面27. . . Reflective surface
30...照明控制部30. . . Lighting control department
31...照明控制配線31. . . Lighting control wiring
32...電路基板32. . . Circuit substrate
40...冷媒供給部40. . . Refrigerant supply department
41...冷媒配管41. . . Refrigerant piping
50...栽培容器50. . . Cultivation container
60...栽培室60. . . Cultivation room
61...樹脂容器61. . . Resin container
62a、62b...陽極用引線部62a, 62b. . . Anode lead
63a、63b...陰極用引線部63a, 63b. . . Lead portion for cathode
64a...第1半導體發光元件64a. . . First semiconductor light emitting element
64b...第2半導體發光元件64b. . . Second semiconductor light emitting element
65...接合導線65. . . Bonding wire
66...晶片阻抗66. . . Wafer impedance
70...底面70. . . Bottom
71...開口面71. . . Open face
80...壁面80. . . Wall
100...第1層積半導體層100. . . First layer semiconductor layer
110...第1基板110. . . First substrate
120...中間層120. . . middle layer
130...基底層130. . . Base layer
140...第1n型半導體層140. . . 1st type semiconductor layer
140c...半導體層露出面140c. . . Semiconductor layer exposed surface
150...第1發光層150. . . First luminescent layer
160...第1p型半導體層160. . . 1st p-type semiconductor layer
170...透明電極170. . . Transparent electrode
170c...上面170c. . . Above
180...第1保護層180. . . First protective layer
210...第1接合焊墊電極210. . . First bonding pad electrode
240...第2接合焊墊電極240. . . Second bonding pad electrode
300...第2層積半導體層300. . . Second layer semiconductor layer
310...第2基板310. . . Second substrate
310a...垂直面310a. . . Vertical plane
310b...傾斜面310b. . . Inclined surface
310c...底面310c. . . Bottom
320...變形調整層320. . . Deformation adjustment layer
320c...上面320c. . . Above
330...第2p型半導體層330. . . 2p-type semiconductor layer
340...第2發光層340. . . Second luminescent layer
350...第2n型半導體層350. . . 2n-type semiconductor layer
350c...上面350c. . . Above
360...第2保護層360. . . 2nd protective layer
400...第3接合焊墊電極400. . . Third bonding pad electrode
401...配線401. . . Wiring
410...第4接合焊墊電極410. . . 4th bonding pad electrode
510...絕緣層510. . . Insulation
520...連接配線520. . . Connection wiring
520a、520b、520c、520d...連接配線端子520a, 520b, 520c, 520d. . . Connection wiring terminal
530...半導體發光元件設置部530. . . Semiconductor light-emitting element setting unit
540...接著層540. . . Next layer
550...密封樹脂550. . . Sealing resin
第1圖係顯示適用本實施形態之植物栽培系統之一例圖。Fig. 1 is a view showing an example of a plant cultivation system to which the present embodiment is applied.
第2圖係顯示適用第1實施形態之照明裝置之外形之一例圖。Fig. 2 is a view showing an example of the outer shape of the lighting device to which the first embodiment is applied.
第3圖係說明第1配管耦合器與第2配管耦合器之一例圖。Fig. 3 is a view showing an example of a first pipe coupler and a second pipe coupler.
第4圖係說明照明裝置之內部之一例圖。Fig. 4 is a view showing an example of the inside of the lighting device.
第5圖係說明第1實施形態中所使用之發光元件封裝體之構成之一例圖。Fig. 5 is a view showing an example of the configuration of a light-emitting element package used in the first embodiment.
第6圖係說明本實施形態中所使用之藍色發光之半導體發光元件之構成之一例的剖面圖。Fig. 6 is a cross-sectional view showing an example of a configuration of a blue light-emitting semiconductor light-emitting device used in the present embodiment.
第7圖係藍色發光之半導體發光元件的上視圖。Fig. 7 is a top view of a blue light emitting semiconductor light emitting element.
第8圖係說明本實施形態中所使用之紅色發光之半導體發光元件之構成之一例的剖面圖。Fig. 8 is a cross-sectional view showing an example of a configuration of a red light-emitting semiconductor light-emitting device used in the present embodiment.
第9圖係紅色發光之半導體發光元件的上視圖。Figure 9 is a top view of a red light emitting semiconductor light emitting element.
第10圖係適用第2實施形態之照明裝置之一例的剖面圖。Fig. 10 is a cross-sectional view showing an example of a lighting device to which the second embodiment is applied.
第11圖係用以說明設在COB(Chip On Board)式電路基板的連接配線與半導體發光元件之連接關係之一例的俯視圖。Fig. 11 is a plan view showing an example of a connection relationship between a connection wiring provided on a COB (Chip On Board) circuit board and a semiconductor light emitting element.
第12圖係更加說明直接搭載有半導體發光元件之COB(Chip On Board)式電路基板的圖。Fig. 12 is a view further showing a COB (Chip On Board) type circuit board on which a semiconductor light emitting element is directly mounted.
10...照明裝置10. . . Lighting device
11...外裝蓋件11. . . Exterior cover
12...透明蓋件12. . . Transparent cover
13...第1側面蓋件13. . . First side cover
14...第2側面蓋件14. . . Second side cover
15...配管接頭15. . . Piping connector
16...第1配管耦合器16. . . First piping coupler
17...第2配管耦合器17. . . 2nd pipe coupler
21...發光元件封裝體twenty one. . . Light emitting device package
22...電路基板twenty two. . . Circuit substrate
23...絕緣性放熱材twenty three. . . Insulating heat release material
24...放熱基板twenty four. . . Exothermic substrate
25...冷媒導管25. . . Refrigerant conduit
26...反射器26. . . reflector
27...反射面27. . . Reflective surface
31...照明控制配線31. . . Lighting control wiring
Claims (11)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009141876A JP5220687B2 (en) | 2009-06-15 | 2009-06-15 | Lighting device and plant cultivation system for plant cultivation |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201103422A TW201103422A (en) | 2011-02-01 |
| TWI424808B true TWI424808B (en) | 2014-02-01 |
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| Application Number | Title | Priority Date | Filing Date |
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| TW099119290A TWI424808B (en) | 2009-06-15 | 2010-06-14 | Plant lighting and plant cultivation system |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JP5220687B2 (en) |
| CN (1) | CN102421281B (en) |
| DE (1) | DE112010002533B4 (en) |
| TW (1) | TWI424808B (en) |
| WO (1) | WO2010147058A1 (en) |
Families Citing this family (24)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101832951B1 (en) | 2011-03-04 | 2018-02-28 | 엘지전자 주식회사 | Growing system |
| FI123895B (en) * | 2012-04-25 | 2013-12-13 | Caverion Suomi Oy | Roofing elements |
| WO2014064893A1 (en) * | 2012-10-24 | 2014-05-01 | 学校法人玉川学園 | Illumination device and plant cultivation apparatus |
| JP2015000036A (en) * | 2013-06-17 | 2015-01-05 | 交和電気産業株式会社 | Lighting device |
| KR101313907B1 (en) * | 2013-06-20 | 2013-10-01 | 농업회사법인 주식회사 퓨쳐그린 | Led lighting module for plant-culture factory, and led lighting apparatus for plant-culture factory using the same |
| JP6254035B2 (en) | 2014-03-31 | 2017-12-27 | Hoya Candeo Optronics株式会社 | Light irradiation device |
| JP6067612B2 (en) * | 2014-04-08 | 2017-01-25 | Hoya Candeo Optronics株式会社 | Light irradiation device |
| DE202014103410U1 (en) * | 2014-07-24 | 2015-10-27 | ELS Energieeffiziente Licht-Systeme GmbH & Co. KG | LED light |
| DE202014105523U1 (en) * | 2014-11-17 | 2016-02-18 | Susan Matinfar | Control device and lighting system for illuminating crops |
| CN105737002B (en) * | 2014-12-10 | 2018-05-18 | 陕西旭田光电农业科技有限公司 | A kind of plant growth LED rectangle modules for mixing light quality |
| WO2016109356A1 (en) * | 2014-12-30 | 2016-07-07 | 3M Innovative Properties Company | Light and heat management system for indoor horticulture |
| JP6485966B2 (en) * | 2016-07-22 | 2019-03-20 | 株式会社アイ・エム・エー | Plant cultivation equipment |
| JP2020501187A (en) * | 2016-12-01 | 2020-01-16 | シグニファイ ホールディング ビー ヴィSignify Holding B.V. | Light emitting device |
| CA3266143A1 (en) | 2017-08-25 | 2025-03-14 | Agnetix, Inc. | Fluid-cooled led-based lighting methods and apparatus for controlled environment agriculture |
| CN107461621A (en) * | 2017-09-17 | 2017-12-12 | 深圳市华明佰利科技有限公司 | A kind of high-efficiency plant light compensating lamp with dual-cooled function |
| CN107420859A (en) * | 2017-09-17 | 2017-12-01 | 深圳市华明佰利科技有限公司 | A kind of efficiently spectrum plant light compensation light energy generator |
| US10999976B2 (en) | 2017-09-19 | 2021-05-11 | Agnetix, Inc. | Fluid-cooled lighting systems and kits for controlled agricultural environments, and methods for installing same |
| US11013078B2 (en) | 2017-09-19 | 2021-05-18 | Agnetix, Inc. | Integrated sensor assembly for LED-based controlled environment agriculture (CEA) lighting, and methods and apparatus employing same |
| AU2019262676B2 (en) | 2018-05-04 | 2025-03-13 | Agnetix, Inc. | Methods, apparatus, and systems for lighting and distributed sensing in controlled agricultural environments |
| JP7112598B2 (en) | 2018-11-13 | 2022-08-03 | アグネティックス,インコーポレイテッド | Fluid-cooled LED-based lighting method and apparatus for controlled climate agriculture with integrated cameras and/or sensors and wireless communication |
| JP2023505677A (en) | 2019-12-10 | 2023-02-10 | アグネティックス,インコーポレイテッド | Multi-perceptual imaging method and apparatus for controlled environmental horticulture using illuminators and cameras and/or sensors |
| KR20220130115A (en) | 2019-12-12 | 2022-09-26 | 아그네틱스, 인크. | Fluid Cooled LED Based Lighting Fixtures in Proximity Growth Systems for Controlled Environment Horticulture |
| US11666006B2 (en) * | 2021-01-28 | 2023-06-06 | Jeom Doo Kim | Radiant artificial lunar lights having effective elements for growing plants |
| DE202023107634U1 (en) | 2023-12-22 | 2025-03-25 | Fabio Cirillo | Cultivation facility |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0998665A (en) * | 1995-07-28 | 1997-04-15 | Mitsubishi Chem Corp | Plant cultivation equipment |
| JP2000207933A (en) * | 1999-01-08 | 2000-07-28 | Mitsubishi Chemicals Corp | Lighting panels for plant cultivation |
| CN1245586C (en) * | 2000-07-07 | 2006-03-15 | 宇宙设备公司 | a luminous screen |
| US20090039752A1 (en) * | 2006-02-17 | 2009-02-12 | Lemnis Lighting Patent Holding B.V. | Lighting device and lighting system for stimulating plant growth |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000135030A (en) * | 1998-10-30 | 2000-05-16 | Imamachi Kosan:Kk | Illumination device and illumination system |
| JP4048750B2 (en) | 2001-10-01 | 2008-02-20 | 松下電器産業株式会社 | Semiconductor light-emitting lighting device for plant cultivation |
| JP4320653B2 (en) * | 2005-09-30 | 2009-08-26 | 日立電線株式会社 | Semiconductor light emitting device |
| DE202006008938U1 (en) * | 2006-06-07 | 2006-08-17 | Hidde, Axel R., Dr. Ing. | Luminaire with adjustable reflector |
| JP2009123718A (en) | 2007-01-16 | 2009-06-04 | Showa Denko Kk | Group III nitride compound semiconductor device and method for manufacturing the same, Group III nitride compound semiconductor light emitting device and method for manufacturing the same, and lamp |
| JP2008192790A (en) * | 2007-02-05 | 2008-08-21 | Showa Denko Kk | Light emitting diode |
| CN201228867Y (en) * | 2008-06-06 | 2009-04-29 | 宁波永丰园林绿化建设有限公司 | LED semiconductor plant light supplement lamp |
-
2009
- 2009-06-15 JP JP2009141876A patent/JP5220687B2/en not_active Expired - Fee Related
-
2010
- 2010-06-11 CN CN2010800207755A patent/CN102421281B/en not_active Expired - Fee Related
- 2010-06-11 WO PCT/JP2010/059935 patent/WO2010147058A1/en not_active Ceased
- 2010-06-11 DE DE112010002533.9T patent/DE112010002533B4/en not_active Expired - Fee Related
- 2010-06-14 TW TW099119290A patent/TWI424808B/en not_active IP Right Cessation
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0998665A (en) * | 1995-07-28 | 1997-04-15 | Mitsubishi Chem Corp | Plant cultivation equipment |
| JP2000207933A (en) * | 1999-01-08 | 2000-07-28 | Mitsubishi Chemicals Corp | Lighting panels for plant cultivation |
| CN1245586C (en) * | 2000-07-07 | 2006-03-15 | 宇宙设备公司 | a luminous screen |
| US20090039752A1 (en) * | 2006-02-17 | 2009-02-12 | Lemnis Lighting Patent Holding B.V. | Lighting device and lighting system for stimulating plant growth |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2010147058A1 (en) | 2010-12-23 |
| TW201103422A (en) | 2011-02-01 |
| CN102421281A (en) | 2012-04-18 |
| DE112010002533B4 (en) | 2015-10-22 |
| CN102421281B (en) | 2013-09-11 |
| DE112010002533T5 (en) | 2012-10-18 |
| JP5220687B2 (en) | 2013-06-26 |
| JP2010284127A (en) | 2010-12-24 |
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