TWI423451B - Substrate container with fluid-tight flow channel - Google Patents
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Description
本發明係有關於基板容器。更特別的,本發明係有關於包含一供流體用之流動通道的基板容器。The invention relates to a substrate container. More particularly, the invention relates to a substrate container comprising a flow channel for a fluid supply.
一般而言,於碟片或晶圓加工處理之前、期間內與之後,載架均被用作為運送及/或儲存成批之矽晶圓或磁碟。晶圓可被加工成為積體電路,且碟片可被加工成為供電腦用之磁性儲存碟片。晶圓、碟片或基板等之詞目於此被可交換地使用,且除非特別指出,任何這些詞目均代表半導體晶圓、磁碟、平面平板基板、及其他該種基板。In general, the carrier is used to transport and/or store batches of wafers or disks before, during, and after the processing of the wafer or wafer. The wafer can be processed into an integrated circuit, and the disc can be processed into a magnetic storage disc for a computer. The terms wafer, disc or substrate are used interchangeably herein, and unless otherwise indicated, any of these terms are representative of semiconductor wafers, magnetic disks, planar flat substrates, and other such substrates.
加工處理晶圓片成為積體電路晶片,經常牽涉到多數步驟,碟片於多數處理站被加工處理,且儲存及運送在加工步驟之間。由於碟片之精細本質且易受粒子或化學品污染,在處理過程中必須妥適地保護。晶圓容器已被使用以提供此一必須之保護。此外,因為磁碟之加工通常為自動化,碟片必須相對於處理設備而被精確地定位,以供機械移除與嵌入晶圓。晶圓容器的第二目的係於運送期間固持地固著晶圓。晶圓容器、載架、卡匣、運送/儲存艙等詞目,除非特別指出,於此均可交換地使用。Processing a wafer into an integrated circuit wafer often involves a number of steps, and the disc is processed at a plurality of processing stations and stored and transported between processing steps. Due to the delicate nature of the disc and its vulnerability to particles or chemicals, it must be properly protected during handling. Wafer containers have been used to provide this necessary protection. Moreover, because the processing of the disks is typically automated, the disks must be accurately positioned relative to the processing equipment for mechanical removal and embedding of the wafer. The second purpose of the wafer container is to hold the wafer in place during transport. The terms such as wafer containers, carriers, cassettes, shipping/storage compartments, etc., are used interchangeably unless otherwise indicated.
於加工處理半導體晶圓與磁碟期間,粒子之存在或產生代表非常重要之污染問題。污染係在半導體工業中導致產能損失的單一最大導因。由於積體電路之尺寸持續減少,可污染一積體電路之粒子變成為更小,使減低污染成為重大議題。粒子形式之污染可經由摩擦產生,諸如載架與晶圓或碟片、與載架外蓋或外殼、與儲存架、與其他載架、或與加工處理設備之摩擦或刮磨。此外,諸如塵埃之粒子可經由開口或在外蓋及/或外殼中的接頭而被導入外殼內。因而,晶圓載架的重要功能係保護其中的晶圓不受此類污染。The presence or generation of particles during processing of semiconductor wafers and disks represents a very important contamination problem. Pollution is the single largest cause of capacity loss in the semiconductor industry. Since the size of the integrated circuit continues to decrease, the particles that can contaminate an integrated circuit become smaller, making the reduction of pollution a major issue. Contamination in the form of particles can be generated via friction, such as carriers and wafers or discs, with carrier covers or casings, with storage shelves, with other carriers, or with processing equipment. In addition, particles such as dust may be introduced into the outer casing via openings or joints in the outer cover and/or outer casing. Thus, the important function of the wafer carrier is to protect the wafers from such contamination.
容器一般被組構成為軸向地安排晶圓或碟片在槽口中,且支撐晶圓或碟片在槽口中,並且在其周緣或接近處支撐晶圓或碟片。晶圓或碟片習知地均以徑向方向向上或橫向地自容器移除。容器可具有一架部位,具有下部開口、一門被閂鎖進入下部開口內,及一停置在門上的分離載架。已知為「SMIF莢」的組構例示於本案申請人之美國專利4,995,430與4,815,912中,且均於此納入參考。此外,晶圓載架組件可具有前部開口,使門閂鎖於此等前部開口上,即已知的FOUPs或FOSBs,見於如美國專利6,354,601、5,788,082與6,010,008中,均納入作為參考。在某些組構中,底部外蓋或門、前部門或容器部位已被提供具有開口或通道,以協助導入及/或排出諸如氮或其他純化氣體類之氣體,使進入晶圓載架組件內以更換可能具有污染物之周圍空氣。The containers are typically constructed to axially arrange wafers or discs in the slots and support the wafer or disc in the slots and support the wafer or disc at or near its periphery. Wafers or discs are conventionally removed from the container in a radial direction upward or laterally. The container can have a portion with a lower opening, a door latched into the lower opening, and a separate carrier that rests on the door. </ RTI> <RTIgt; </ RTI> <RTIgt; </ RTI> <RTIgt; </ RTI> <RTIgt; </ RTI> <RTIgt; In addition, the wafer carrier assembly can have a front opening to latch the door to the front opening, known as FOUPs or FOSBs, as described in U.S. Patent Nos. 6,354,601, 5,788, 082, and 6, 010, 008. In some configurations, the bottom cover or door, front door or container portion has been provided with openings or passages to assist in the introduction and/or discharge of gases such as nitrogen or other purified gases into the wafer carrier assembly. To replace the surrounding air that may have contaminants.
前述容器已應用過濾塞以減少於沖洗期間進入容器組件之粒子污染數量。但是,在作業元件,例如:過濾件,與密封件外罩之間的習知裝附與密封方法,係利用剛性塑膠外罩與O型環。已知的晶圓容器亦已使用多種接頭或聯結機構以供流體地形成晶圓容器之流動通道與流動供應與壓力或真空源的界面。此種裝附與密封需要複雜組構之特定組合件。Filter plugs have been applied to the aforementioned containers to reduce the amount of particulate contamination entering the container assembly during flushing. However, the conventional attachment and sealing methods between the working elements, such as the filter element, and the seal housing, utilize a rigid plastic outer cover and an O-ring. Known wafer containers have also used a variety of joints or coupling mechanisms to fluidly form the flow channels of the wafer container and the interface of the flow supply to the pressure or vacuum source. Such attachment and sealing requires a specific assembly of complex configurations.
依據本發明的一觀點之改良的晶圓容器,包含一具有開敞側部或底部的外殼部位,一密封地關閉開敞側部或開敞底部且界定一外殼或容器的門,及被容納在容器內之多數個晶圓支撐架。該門係聯結外殼部位,以形成一連續外殼,使晶圓載架或其他基板隔離於周圍大氣。該容器具有至少一個出入結構,界定出一進入與離開外殼之流動導管。一密封索環係以流體密封結合方式置於出入結構內。此索環的外部表面對流動導管之內部表面形成整體的不漏流體式密封件。在一具體例中,索環界定出一個例如一圓筒形孔口之流動通道。在一相關具體例中,索環包含一接觸表面,該接觸表面有助於在晶圓容器的內部容積與供流體或真空來源用的噴嘴或螺紋接口之間形成不漏流體式聯結。索環之內部密封表面可界定流動通道。An improved wafer container according to one aspect of the present invention includes a housing portion having an open side or bottom, a door that sealingly closes the open side or open bottom and defines a housing or container, and is received A plurality of wafer holders in the container. The door is coupled to the outer casing portion to form a continuous outer casing that isolates the wafer carrier or other substrate from the surrounding atmosphere. The container has at least one access structure defining a flow conduit into and out of the housing. A sealing grommet is placed in the access structure in a fluid tight bond. The outer surface of the grommet forms an integral, fluid-tight seal against the interior surface of the flow conduit. In one embodiment, the grommet defines a flow passage such as a cylindrical orifice. In a related embodiment, the grommet includes a contact surface that facilitates a fluid-tight connection between the interior volume of the wafer container and the nozzle or threaded interface for fluid or vacuum source. The inner sealing surface of the grommet defines a flow passage.
可選擇地,通過流動通道之索環包含至少一個實質上或全部被容納於其中之作業元件。此作業元件可以為任一種組成件、副組件、或可聯結晶圓容器的內部容積至外部或形成界面之裝置。作業元件之範例包含閥、過濾器、感測器、柱塞、或其組合。作業元件對內部密封表面呈不漏流體式結合。Optionally, the grommet through the flow channel contains at least one working element that is substantially or entirely contained therein. The working element can be any component, subassembly, or internal volume of the collapsible round container to the exterior or to form an interface. Examples of working elements include valves, filters, sensors, plungers, or combinations thereof. The working element is fluid-tightly bonded to the inner sealing surface.
在作業中,依據一具體例,索環維持對出入結構之密封,以預防非預期之化學物或粒子進入晶圓容器組件的內部。因而,在晶圓容器的內部與外部之間的任何流體流動被限制於通過由索環界定之通道。流體流動形式包含導入諸如氮氣之沖洗氣體進入晶圓載架組件的內部。In operation, according to a specific example, the grommet maintains a seal against the access structure to prevent unintended chemicals or particles from entering the interior of the wafer container assembly. Thus, any fluid flow between the interior and exterior of the wafer container is limited to passage through the grommet. The fluid flow form includes introducing a flushing gas, such as nitrogen, into the interior of the wafer carrier assembly.
流體流動可被作業元件進一步限制。例如,當作業元件為一特定過濾器時,通過通道之氣體亦會通過過濾器。在另一範例情況中,作業元件係一止回閥,通過通道之流體流動被進一步限制於流動在一特定方向上。在一具體例中,通過索環之流動通道包含一過濾器與一止回閥。在此一具體例中,二者之功能,即,過濾和流動方向指定,均被執行。在另一具體例中,作業元件係一可移除柱塞,在此情況中,當柱塞被嵌入時,不允許流體流過通道。Fluid flow can be further limited by the working element. For example, when the working element is a specific filter, the gas passing through the passage will also pass through the filter. In another exemplary case, the working element is a check valve and fluid flow through the passage is further limited to flow in a particular direction. In one embodiment, the flow passage through the grommet includes a filter and a check valve. In this particular example, the functions of both, ie, filtering and flow direction specification, are performed. In another embodiment, the working element is a removable plunger, in which case fluid is not allowed to flow through the passage when the plunger is inserted.
在另一範例具體例中,作業元件包含一感測器。有用之感測器形式包含溫度感測器、流率感測器、壓力感測器、氣體濃度感測器、材料探測器、及近接感測器。在其中,及在其他之可使用為作業元件的感測器中,某些(諸如流動感測器)可允許流動通過,而其他(諸如壓力感測器)則亦作用為柱塞。In another exemplary embodiment, the work element includes a sensor. Useful sensor forms include temperature sensors, flow rate sensors, pressure sensors, gas concentration sensors, material detectors, and proximity sensors. Among them, and among other sensors that can be used as working elements, some (such as flow sensors) can allow flow through, while others (such as pressure sensors) also act as plungers.
在製造中,使用統一之出入結構、密封索環、及作業元件的尺寸,可模組化。因而,在皆具有專用作業元件之多種晶圓容器的生產線中,晶圓容器組件外罩可具有有限數量之相同外殼組成件,將出入結構放置在遍佈於共同外殼上的數個位置處。每一出入結構可具有一密封索環,某些為截止型式(blanking type)(沒有通道),而其他出入結構可具有設有各種整合作業元件之密封索環。密封索環可用多數作業元件預先組合,且儲存為作業卡匣副組件。In manufacturing, the uniform access structure, the sealing grommet, and the dimensions of the working elements can be modularized. Thus, in a production line of a plurality of wafer containers each having dedicated operating elements, the wafer container assembly housing can have a limited number of identical housing components that are placed at a plurality of locations throughout the common housing. Each access structure may have a sealing grommet, some of which are of a blanking type (without passage), while other access structures may have a sealing grommet with various integrated working elements. The sealing grommet can be pre-combined with most of the working elements and stored as a work cartridge subassembly.
本發明之較佳具體例的優點與特色係索環組態提供一彈性元件,該元件通常為圓筒形組態且具有自當中延伸通過的孔口,孔口本身為圓筒形組構。該孔口具有足夠之長度以實質上或完全地容納被嵌入於其中的一作業組件之整體長度。索環較佳的具有至少一個被安排成垂直於索環之軸線的平坦表面。此表面可被用來有效地提供作為沖洗系統之一部份的螺紋接管或噴嘴用的座表面。索環之體積較佳的大於被容納於其中之作業組件。索環較佳的具有一在軸向平面取得的橫剖面面積,藉此,索環之橫剖面積大於自當中軸向地延伸通過的開口之橫剖面面積。索環較佳的具有大於軸向地延伸通過索環之開口或孔口的直徑之軸向長度。O型環一般具有圓形橫剖面,於此之索環具有一非圓形橫剖面及圓筒形內部接面、圓筒形外部接面、及平坦末端表面。Advantages and Features of Preferred Embodiments of the Invention A grommets configuration provides an elastic member that is generally cylindrical in configuration and has an aperture extending therethrough, the aperture itself being a cylindrical configuration. The aperture is of sufficient length to substantially or completely accommodate the overall length of a work assembly that is embedded therein. Preferably, the grommet has at least one flat surface arranged to be perpendicular to the axis of the grommet. This surface can be used to effectively provide a seating surface for a nipple or nozzle that is part of the flushing system. The volume of the grommet is preferably larger than the working component housed therein. Preferably, the grommet has a cross-sectional area taken in an axial plane whereby the cross-sectional area of the grommet is greater than the cross-sectional area of the opening extending axially therethrough. Preferably, the grommet has an axial length that is greater than the diameter of the opening or aperture extending axially through the grommet. The O-ring generally has a circular cross section, and the grommet has a non-circular cross section and a cylindrical inner joint, a cylindrical outer joint, and a flat end surface.
圖1A顯示一晶圓容器組件100之範例,其包含晶圓載架102、底部區段104及外殼部位106。底部區段104適合於密封地聯結外殼部位106,以界定一內部空間,此空間可使晶圓載架102隔離於周圍大氣108。如示於圖1A,晶圓載架102可包括多數個元件110,可固持且放置多數之矽晶圓在晶圓載架102內。一般言之,元件110固持且放置矽晶圓,使得鄰近晶圓之間的接觸被減至最少,其可減少加工處理及/或運送矽晶圓期間可能發生之晶圓的損壞。圖1B顯示已知名為FOUP或FOSB之晶圓容器組件103的另一型態,其包括一開敞前部、前門105及外殼部位107。晶圓W水平地通過該開敞前部而被移除。形成在內側的槽口固持住晶圓。前門105具有密封件,密封地結合外殼部位107,以形成與周圍大氣相隔離之內部空間。晶圓載架之結構已例示於例如Bhatt等人之標題為「複合基板載架」的美國專利6,428,729中,在此納入作為參考。此外,已知各為FOUPs或FOSBs之具有前部開口且具有閂鎖至前部開口上的門之晶圓載架組件,已例示於本案申請人之美國專利號碼6,354,601、5,788,082及6,010,008中,在此亦納入作為參考。供索環124、125用之接受結構109可位在外殼部位的底部壁中。FIG. 1A shows an example of a wafer container assembly 100 that includes a wafer carrier 102, a bottom section 104, and a housing portion 106. The bottom section 104 is adapted to sealingly couple the outer casing portion 106 to define an interior space that isolates the wafer carrier 102 from the ambient atmosphere 108. As shown in FIG. 1A, the wafer carrier 102 can include a plurality of components 110 that can hold and place a plurality of wafers within the wafer carrier 102. In general, component 110 holds and places the germanium wafer such that contact between adjacent wafers is minimized, which can reduce wafer damage that may occur during processing and/or transport of the wafer. FIG. 1B shows another version of a wafer container assembly 103 known as FOUP or FOSB, which includes an open front portion, a front door 105, and a housing portion 107. Wafer W is removed horizontally through the open front. The notch formed on the inner side holds the wafer. The front door 105 has a seal that sealingly engages the outer casing portion 107 to form an interior space that is isolated from the surrounding atmosphere. The structure of the wafer carrier is exemplified in, for example, U.S. Patent No. 6,428,729, the entire disclosure of which is incorporated herein by reference. In addition, a wafer carrier assembly having a front opening and having a latch to the front opening is known as a FOUP or FOSB, as exemplified in U.S. Patent Nos. 6,354,601, 5,788,082 and 6,010,008. Also included as a reference. The receiving structure for the grommet 124, 125 can be positioned in the bottom wall of the outer casing portion.
參照圖2,顯示一示範晶圓容器區段120。在某種型式具體例中,區段120為晶圓容器之側蓋、底蓋或門。在其他型式具體例中,區段120為一不可移除、不可操作之壁區段。區段120被例示包括呈開口122、123形式之出入結構、位於開口122、123之索環124、125及多數個狀態開口126。一般而言,該多數個狀態開口126可被定位在外蓋區段120上的所需位置處,以提供諸如探針或其他監測元件的感測器進入晶圓容器形成界面之結構。例如,在感測器與特定狀態開口126之間的界面可提供有關晶圓加工處理步驟等之狀態的資訊。Referring to Figure 2, an exemplary wafer container section 120 is shown. In some versions of the specific example, section 120 is a side cover, bottom cover or door of the wafer container. In other types of specific examples, section 120 is a non-removable, inoperable wall section. Section 120 is illustrated as including an access structure in the form of openings 122, 123, grommetes 124, 125 located in openings 122, 123, and a plurality of state openings 126. In general, the plurality of state openings 126 can be positioned at desired locations on the cover section 120 to provide a structure for the sensor, such as a probe or other monitoring element, to enter the wafer container forming interface. For example, the interface between the sensor and the particular state opening 126 can provide information regarding the state of the wafer processing steps and the like.
在一示範具體例中,開口122有助於流體傳送至區段120內,其有助於導入氣體或其他流體進入晶圓容器之內部。類似的,開口123提供流體經由區段120傳送出晶圓容器,使得位於晶圓容器內之氣體或流體可被排出至周圍大氣。因而,在此一具體例中,開口122係一入口而開口123係一出口。雖然圖2顯示一區段120包括二開口122、123的具體例,亦可使用被定位在區段120中之具有四、五、六或更多出入結構的具體例,且其均在本發明之範疇內。In an exemplary embodiment, the opening 122 facilitates fluid transfer into the section 120, which facilitates the introduction of gas or other fluid into the interior of the wafer container. Similarly, opening 123 provides fluid to be transported out of the wafer container via section 120 such that gas or fluid within the wafer container can be expelled to the surrounding atmosphere. Thus, in this particular embodiment, the opening 122 is an inlet and the opening 123 is an outlet. Although FIG. 2 shows a specific example in which one section 120 includes two openings 122, 123, a specific example having four, five, six or more access structures positioned in the section 120 may be used, and both of them are in the present invention. Within the scope of this.
如示於圖2,索環124被置於開口122內以密封開口122,且索環125被置於開口123內以密封開口123。如下所述,每一索環124、125對其相對應開口122、123的內部產生密封作用,且提供通過索環之至少一個孔口或通道。在一具體例中,每一索環124、125的本體具有相對應於開口122、123之內部部件的橫剖面形狀,且被定尺寸成為可密封並實質上封閉其相對應開口152、153。一般習於本技藝者可了解,開口122、123之橫剖面形狀與尺寸可由氣流尺寸需求及特定晶圓容器組件之操作壓力所決定。在一相關具體例中(未示於圖),索環包含二不同通道。As shown in FIG. 2, a grommet 124 is placed in the opening 122 to seal the opening 122, and a grommet 125 is placed in the opening 123 to seal the opening 123. As described below, each grommet 124, 125 creates a seal against the interior of its corresponding opening 122, 123 and provides at least one aperture or passage through the grommet. In one embodiment, the body of each grommet 124, 125 has a cross-sectional shape corresponding to the internal components of the openings 122, 123 and is sized to seal and substantially close its corresponding opening 152, 153. It will be appreciated by those skilled in the art that the cross-sectional shape and size of the openings 122, 123 can be determined by the airflow size requirements and the operating pressure of the particular wafer container assembly. In a related embodiment (not shown), the grommet contains two different channels.
圖3例示索環124、125的示範具體例。此具體例的索環124、125具有大致上為圓筒形之本體128。在某一型式的具體例中,本體128係由橡膠、矽、或具有所需密封特徵之其他彈性體或聚合物所形成。可選用的,本體128包含環周地沿圓筒形壁外部放置的環型突起形式的密封部件130。索環124、125亦包含通過本體128中心之孔口132。界定孔口132之本體128內部表面可選用地包含可對被至少局部地置於孔口132內的作業元件134形成密封之密封部件(未示於圖)。FIG. 3 illustrates an exemplary embodiment of the grommet 124, 125. The grommet 124, 125 of this specific example has a substantially cylindrical body 128. In a particular version of the version, the body 128 is formed from rubber, enamel, or other elastomer or polymer having the desired sealing characteristics. Alternatively, body 128 includes a sealing member 130 in the form of a toroidal projection circumferentially disposed along the exterior of the cylindrical wall. The grommet 124, 125 also includes an aperture 132 through the center of the body 128. The interior surface of the body 128 defining the aperture 132 optionally includes a sealing member (not shown) that forms a seal against the working element 134 that is at least partially disposed within the aperture 132.
在一示範具體例中,作業元件134為諸如止回閥之閥。在另一示範具體例中,作業元件134係一流體過濾器。在另一具體例中,作業元件134係一感測器,諸如溫度感測器、流率感測器、壓力感測器、氣體濃度感測器、材料探測器、或近接感測器。在另一具體例中,作業元件134僅為一柱塞,用以預防流體通過流動通道204。In an exemplary embodiment, the working element 134 is a valve such as a check valve. In another exemplary embodiment, the working element 134 is a fluid filter. In another embodiment, the working element 134 is a sensor, such as a temperature sensor, a flow rate sensor, a pressure sensor, a gas concentration sensor, a material detector, or a proximity sensor. In another embodiment, the working element 134 is only a plunger to prevent fluid from passing through the flow passage 204.
圖4顯示一示範外蓋區段150。外蓋區段150包含覆蓋外殼170、閂鎖元件172、174、凸輪176及外部覆蓋區段178。凸輪176被連接至閂鎖元件172、174,使得凸輪176之旋轉引動閂鎖元件172、174,導致突起180延伸通過被定位在外罩170中的開口182,且鎖定外罩170至另一外殼區段(未示於圖)。外部外蓋178被組合在閂鎖構件172、174與凸輪176上。外蓋區段150亦包含出入結構160、161。出入結構160包含進入開口152及流動導管157。出入結構161包含出口開口153及流動導管158。每一流動導管157、158具有大致上為圓筒形之壁,該壁具有自晶圓容器的外部至內部地延伸通過外蓋區段150的厚度之高度。FIG. 4 shows an exemplary outer cover section 150. The cover section 150 includes a cover housing 170, latching elements 172, 174, a cam 176, and an outer cover section 178. Cam 176 is coupled to latching elements 172, 174 such that rotation of cam 176 urges latching elements 172, 174, causing protrusion 180 to extend through opening 182 that is positioned in housing 170, and lock housing 170 to another housing section (Not shown in the figure). An outer cover 178 is assembled on the latch members 172, 174 and the cam 176. The cover section 150 also includes access structures 160,161. The access structure 160 includes an access opening 152 and a flow conduit 157. The access structure 161 includes an outlet opening 153 and a flow conduit 158. Each flow conduit 157, 158 has a generally cylindrical wall having a height that extends from the exterior of the wafer container to the interior through the thickness of the outer cover segment 150.
流動導管157與158各別地保持有作業副組件162與163。圖5A與5B更詳細地例示作業副組件162與163。作業副組件162係一入口副組件,且包含具有本體202與孔口204之索環154。作業副組件162進一步包含可安裝進入孔口204內之止回閥211及過濾器210。過濾器210之具體例包含諸如HEPA過濾等之合適技術的粒子過濾器。作業副組件163係一出口副組件,且包含具有本體203與孔口205之索環155。可選用的,每一作業副組件162、163均以其各別構成組成件被預先組合成為作業卡匣。The flow conduits 157 and 158 each retain the work sub-assemblies 162 and 163. The work subassemblies 162 and 163 are illustrated in more detail in Figures 5A and 5B. The work subassembly 162 is an inlet subassembly and includes a grommet 154 having a body 202 and an aperture 204. The work subassembly 162 further includes a check valve 211 and a filter 210 that can be mounted into the aperture 204. Specific examples of the filter 210 include a particle filter of a suitable technique such as HEPA filtration. The work subassembly 163 is an outlet subassembly and includes a grommet 155 having a body 203 and an aperture 205. Alternatively, each of the work sub-assemblies 162, 163 is pre-assembled into a work cassette with its respective constituent components.
圖5C例示作業副組件162之組裝進入流動導管157內。過濾器210被定位保持於索環154的底部與流動導管157的保持表面164之間。索環154配接在流動槽道157內,且與流動槽道157之內部壁形成密封件。止回閥211經由索環154可密封地配接在流動通道204內,且被對齊排列以允許向下方向之流動,如示於圖5C。FIG. 5C illustrates the assembly of the work subassembly 162 into the flow conduit 157. The filter 210 is positioned and held between the bottom of the grommet 154 and the retaining surface 164 of the flow conduit 157. The grommet 154 is mated within the flow channel 157 and forms a seal with the inner wall of the flow channel 157. Check valve 211 is sealingly mated within flow passage 204 via grommet 154 and aligned to allow flow in a downward direction, as shown in Figure 5C.
如前所述,在外蓋區段150中或在諸如一晶圓容器組件的區段120之任何其他外殼部位中的開口152、153,可由本發明之索環所密封。在一具體例中,索環包含一具有一位於外罩內的孔口之本體,孔口沿著外罩的主要軸線延伸。此外,本發明之索環的具體例可包括位於孔口內之作業元件。作業元件可包括一止回閥,該閥可調節通過孔口、過濾器、感測器或其組合的氣體或其他流體之流動。應用在本發明中的止回閥可被定向在孔口內,使得索環可被用來密封在晶圓載架門及/或外殼上的入口與出口開口二者。此外,如下所述,索環本體之設計有助於密封開口,而無須被裝附至索環的額外O型環。此外,本發明之索環的具體例可組合索環本體、止回閥及/或過濾器,成為一整合卡匣,其可改善索環的整密封能力,且有助於便利製造晶圓載架組件。在某些具體例中,索環具有大約1/8英吋至大約1英吋的軸向高度,而在其他具體例中,索環具有大約3/8英吋至大約3/4英吋的軸向高度。此外,本發明之索環的具體例可具有大約1/4英吋至大約1.5英吋的直徑,而在其他具體例中,索環可具有大約1/2英吋至大約3/4英吋的直徑。習於本技藝者可以了解,索環的額外範圍之軸向高度與直徑均可應用且在本揭示之範疇內。As previously mentioned, the openings 152, 153 in the outer cover section 150 or in any other outer casing portion of the section 120 such as a wafer container assembly may be sealed by the grommet of the present invention. In one embodiment, the grommet includes a body having an aperture in the housing, the aperture extending along a major axis of the housing. Further, a specific example of the grommet of the present invention may include a working element located within the orifice. The working element can include a check valve that regulates the flow of gas or other fluid through the orifice, filter, sensor, or combination thereof. The check valve used in the present invention can be oriented within the orifice such that the grommet can be used to seal both the inlet and outlet openings on the wafer carrier door and/or housing. Furthermore, as described below, the design of the grommet body helps to seal the opening without the need for an additional O-ring attached to the grommet. In addition, the specific example of the grommet of the present invention can be combined with a grommet body, a check valve and/or a filter to form an integrated cassette, which can improve the sealing ability of the grommet and facilitate the manufacture of the wafer carrier. Component. In some embodiments, the grommet has an axial height of from about 1/8 inch to about 1 inch, while in other embodiments, the grommet has from about 3/8 inch to about 3/4 inch. Axial height. Further, a specific example of the grommet of the present invention may have a diameter of about 1/4 inch to about 1.5 inches, while in other embodiments, the grommet may have about 1/2 inch to about 3/4 inch. diameter of. It will be appreciated by those skilled in the art that the axial extent and diameter of the additional range of grommet can be applied and are within the scope of the present disclosure.
索環可採多種方式自習知技術的O型環加以區分。例如,索環組構提供一彈性元件,該元件通常為圓筒形組構且具有自其通過的一孔口,孔口本身具有一圓筒形組構。孔口具有足夠長度,以完全地或實質上容納被嵌入其中的作業組件之整體長度。索環較佳的具有至少一個被安排垂直於索環之軸線的平坦表面。該表面可被用來有效地設置一供螺紋接管或噴嘴用之座面表面,以做為沖洗系統的一部份。索環之體積較佳的大於其中之作業組件容器。索環較佳的具有在軸向平面中取得的橫剖面區域,藉此,索環之橫剖面面積係大於自其軸向地延伸通過的開口之橫剖面面積。索環較佳的具有大於軸向地延伸通過索環之開口或孔口的直徑之軸向長度。O型環一般具有圓形橫剖面,於此之索環則具有一非圓形橫剖面及圓筒形內部接面、圓筒形外部接面、及平面末端表面。The grommet can be distinguished by a variety of methods from the O-ring of the technology. For example, the grommet configuration provides a resilient member that is generally cylindrical in configuration and has an aperture therethrough that has a cylindrical configuration. The aperture is of sufficient length to fully or substantially accommodate the overall length of the work assembly that is embedded therein. Preferably, the grommet has at least one flat surface arranged perpendicular to the axis of the grommet. The surface can be used to effectively provide a seating surface for the nipple or nozzle as part of the flushing system. The volume of the grommet is preferably larger than the container of the working component therein. Preferably, the grommet has a cross-sectional area taken in an axial plane whereby the cross-sectional area of the grommet is greater than the cross-sectional area of the opening extending axially therethrough. Preferably, the grommet has an axial length that is greater than the diameter of the opening or aperture extending axially through the grommet. The O-ring generally has a circular cross section, and the grommet has a non-circular cross section and a cylindrical inner joint, a cylindrical outer joint, and a planar end surface.
圖6A與6B均為橫剖面圖,顯示本發明之一具體例的氣體沖洗配置。範例索環300與302位於一具有內部308與外部310的範例晶圓容器之各別出入結構304與306中。出入結構304、306被形成在晶圓容器的壁或門312內,且皆作用為一沖洗口。出入結構304包含一保持結構314,該結構314具有特別適合於密封地結合索環300之幾何形狀。相同的,出入結構306包含一個具有適合與索環302結合之幾何形狀的保持結構316。每一索環300與302具有多數密封部件318、320,用來各別地與保持結構314與316的某部分內部表面產生不漏流體式接觸,如圖所示。6A and 6B are cross-sectional views showing a gas flushing configuration of a specific example of the present invention. The example grommet 300 and 302 are located in separate access structures 304 and 306 of an exemplary wafer container having an interior 308 and an exterior 310. The access structures 304, 306 are formed in the walls or doors 312 of the wafer container and function as a rinse port. The access structure 304 includes a retention structure 314 having a geometry that is particularly suitable for sealingly engaging the grommet 300. Similarly, the access structure 306 includes a retention structure 316 having a geometry suitable for engagement with the grommet 302. Each grommet 300 and 302 has a plurality of sealing members 318, 320 for producing fluid-tight contact with portions of the interior surfaces of the retaining structures 314 and 316, respectively, as shown.
圖6A例示一入口配置,而圖6B則例示一出口配置。對每一種配置而言,流動之方向已被指明。圖6A之入口配置亦包含被設置且流體密封於索環300與保持結構314的接觸表面之間的過濾器322。圖6A之入口配置亦包含被放置成為僅允許流體行進在所指示之流動方向上的單向閥組件324。相同的,圖6B之出口配置亦包含被放置成為僅允許流體行進在所指示之流動方向上的單向閥組件326。閥組件324、326被流體密封在由索環300、302的孔口所界定之各別流動通道328、330內。索環300、302具有用來固著地固持閥組件324、326在各別流動通道328、330內之定位的保持部件332、334。在某一型式的具體例中,單向閥組件324、326包括閥本體336與338、外部密封環340與342、內部密封環344與346、可移動活塞348與350、及偏壓彈簧352與354。Figure 6A illustrates an inlet configuration and Figure 6B illustrates an outlet configuration. For each configuration, the direction of the flow has been indicated. The inlet configuration of FIG. 6A also includes a filter 322 that is disposed and fluidly sealed between the grommet 300 and the contact surface of the retention structure 314. The inlet configuration of Figure 6A also includes a one-way valve assembly 324 that is placed to allow only fluid to travel in the indicated flow direction. Similarly, the outlet configuration of Figure 6B also includes a one-way valve assembly 326 that is placed to allow only fluid to travel in the indicated flow direction. The valve assemblies 324, 326 are fluidly sealed within respective flow passages 328, 330 defined by the orifices of the grommet 300, 302. The grommet 300, 302 has retention members 332, 334 for fixedly holding the positioning of the valve assemblies 324, 326 within the respective flow passages 328, 330. In a particular version of the version, the one-way valve assemblies 324, 326 include valve bodies 336 and 338, outer seal rings 340 and 342, inner seal rings 344 and 346, movable pistons 348 and 350, and biasing springs 352. 354.
在作業中,入口與出口配置可於沖洗活動期間協力作用,其中,在晶圓容器之內部308內的既存空氣或氣體為新引入之空氣、氣體、或其他流體所取代。在一具體例中,如示於圖6B,真空源360被一出口噴嘴362聯結至內部308。出口噴嘴適合於與索環302之接觸表面364形成界面。當向下力量被出口噴嘴施加至索環302時,索環302被壓縮,但仍保持其對保持結構316的密封內部表面及對閥組件326之外部表面的密封狀態。在一具體例中,於索環302與保持結構316及閥組件326之間的密封狀態可由出口噴嘴362施加至索環302上之向下力量實際地改善或變為更有效果。In operation, the inlet and outlet configurations can cooperate during the flushing event, with the existing air or gas within the interior 308 of the wafer container being replaced by newly introduced air, gas, or other fluid. In one embodiment, as shown in FIG. 6B, vacuum source 360 is coupled to interior 308 by an outlet nozzle 362. The outlet nozzle is adapted to form an interface with the contact surface 364 of the grommet 302. When downward force is applied to the grommet 302 by the outlet nozzle, the grommet 302 is compressed, but still retains its sealed internal surface to the retaining structure 316 and the sealed surface of the valve assembly 326. In one embodiment, the sealed state between the grommet 302 and the retaining structure 316 and the valve assembly 326 can be substantially improved or made more effective by the downward force exerted by the outlet nozzle 362 onto the grommet 302.
由於真空360被聯結內部容積308,在容積308中的既存流體經由圖6B之出口被抽出晶圓容器,而替換之流體係經由圖6A的入口,包含經由過濾器322,而被抽入。在一相關具體例中(未示於圖),一替換流體源(未示於圖)經由具有與出口噴嘴362類似幾何形狀的入口噴嘴而聯結內部容積308,且以相同方式聯結入口索環300,其中出口噴嘴362被與出口索環302相聯結。在另一具體例中(未示於圖),沒有出口噴嘴被聯結至索環302,且入口噴嘴承載被加壓的替換流體進入內部空間308。在此一具體例中,所替換之流體簡單地經由圖6B中之出口配置排出。Since the vacuum 360 is coupled to the internal volume 308, the existing fluid in the volume 308 is drawn out of the wafer container via the outlet of FIG. 6B, and the replacement flow system is drawn through the inlet of FIG. 6A, via the filter 322. In a related embodiment (not shown), a replacement fluid source (not shown) couples the interior volume 308 via an inlet nozzle having a geometry similar to the outlet nozzle 362 and joins the inlet grommet 300 in the same manner. Where the outlet nozzle 362 is coupled to the outlet grommet 302. In another embodiment (not shown), no outlet nozzle is coupled to the grommet 302, and the inlet nozzle carries the pressurized replacement fluid into the interior space 308. In this particular embodiment, the replaced fluid is simply discharged via the outlet configuration of Figure 6B.
一般而言,索環300、302可具有與索環在當中被設計作為密封用的開口相同的橫剖面形狀。例如,在一具體例中,索環300、302具有一大致為圓形橫剖面之大致上圖筒形形狀。但是,習於本技藝者可以了解多種之索環本體幾何形狀均符合本發明之精神。In general, the grommet 300, 302 can have the same cross-sectional shape as the grommet designed to be used for sealing. For example, in one embodiment, the grommet 300, 302 has a generally cylindrical shape with a generally circular cross section. However, it will be apparent to those skilled in the art that a variety of grommet body geometries are in accordance with the spirit of the present invention.
在一具體例中,索環300與302為相同之部件。在一相關具體例中,閥組件324與326為相同之部件。因而,在某一型式之具體例中,本發明之組件可被用來密封使用相同組成元件之入口與出口開口二者。In one embodiment, grommet 300 and 302 are the same component. In a related embodiment, valve assemblies 324 and 326 are the same component. Thus, in a particular version of a certain version, the assembly of the present invention can be used to seal both inlet and outlet openings using the same constituent elements.
在另一具體例中,本發明之索環可進一步包含額外保持部件(未示於圖),以相同或類似之方式固著地固持諸如過濾器322的過濾器材,其中保持部件332、334保持閥組件324、326。因而,一預先組合之作業副組件可聯合索環、閥及過濾器成為一整合副組件。In another embodiment, the grommet of the present invention may further comprise additional retaining members (not shown) that securely hold the filter device, such as filter 322, in the same or similar manner, wherein retaining members 332, 334 remain Valve assemblies 324, 326. Thus, a pre-combined work sub-assembly can be combined with a grommet, valve and filter to form an integrated sub-assembly.
索環本體、凸緣、及本發明的索環之其他組成件,可由適合使用在半導體加工處理應用中的任何材料構成,包含聚合物及彈性體。在某些具體例中,索環本體與凸緣可由含氟彈性體所構成。含氟彈性體之實例由Dupont Dow Elastomers以Viton商標為名販售。此外,在某些具體例中,彈性索環本體或索環可具有被塗覆至索環表面上之含氟聚合物或其他惰性聚合物,用以自基板容器內部隔離彈性體物質。一般而言,聚合物或含氟聚合物塗層應具有某些程度之撓性,使彈性索環本體之密封特性得以維持。The grommet body, the flange, and other components of the grommet of the present invention may be constructed of any material suitable for use in semiconductor processing applications, including polymers and elastomers. In some embodiments, the grommet body and the flange can be constructed of a fluoroelastomer. Examples of fluoroelastomers by Vipon by Dupont Dow Elastomers The trademark is sold as a name. Moreover, in some embodiments, the elastic grommet body or grommet can have a fluoropolymer or other inert polymer applied to the surface of the grommet to isolate the elastomeric material from the interior of the substrate container. In general, the polymer or fluoropolymer coating should have some degree of flexibility to maintain the sealing properties of the elastomeric grommet body.
前述之具體例係用以例示而非限制。額外之具體例仍屬本案申請專利範圍。雖然本發明已參考特定具體例說明,習於本技藝之工作者可在形式與材料上作改變,而不離開本發明之精神與範疇。The foregoing specific examples are illustrative and not restrictive. The additional specific examples are still within the scope of the patent application in this case. Although the present invention has been described with reference to the specific embodiments, those skilled in the art can change the form and materials without departing from the spirit and scope of the invention.
100...晶圓容器組件100. . . Wafer container assembly
102...晶圓載架102. . . Wafer carrier
103...晶圓容器組件103. . . Wafer container assembly
104...底部區段104. . . Bottom section
105...前門105. . . Front door
106...外殼部位106. . . Shell
107...外殼部位107. . . Shell
108...周圍大氣108. . . Ambient atmosphere
109...接受結構109. . . Accept structure
110...元件110. . . element
120...晶圓容器區段120. . . Wafer container section
122...開口122. . . Opening
123...開口123. . . Opening
124...索環124. . . Grommet
125...索環125. . . Grommet
126...狀態開口126. . . State opening
128...圓筒形本體128. . . Cylindrical body
130...密封部件130. . . Sealing part
132...孔口132. . . Orifice
134...作業元件134. . . Working element
150...外蓋區段150. . . Cover section
152...開口152. . . Opening
153...開口153. . . Opening
154...索環154. . . Grommet
155...索環155. . . Grommet
157...流動導管157. . . Flow conduit
158...流動導管158. . . Flow conduit
160...出入結構160. . . Access structure
161...出入結構161. . . Access structure
162...作業副組件162. . . Job subassembly
163...作業副組件163. . . Job subassembly
164...保持表面164. . . Keep the surface
170...覆蓋外殼170. . . Covering the outer casing
172...閂鎖元件172. . . Latching element
174...閂鎖元件174. . . Latching element
176...凸輪176. . . Cam
178...外部覆蓋區段178. . . External coverage section
180...突起180. . . Protrusion
182...開口182. . . Opening
202...本體202. . . Ontology
203...本體203. . . Ontology
204...孔口204. . . Orifice
205...孔口205. . . Orifice
210...過濾器210. . . filter
211...止回閥211. . . Check valve
300...索環300. . . Grommet
302...索環302. . . Grommet
304...出入結構304. . . Access structure
306...出入結構306. . . Access structure
308...內部308. . . internal
310...外部310. . . external
312...門312. . . door
314...保持結構314. . . Keep structure
316...保持結構316. . . Keep structure
318...密封部件318. . . Sealing part
320...密封部件320. . . Sealing part
322...過濾器322. . . filter
324...閥組件324. . . Valve assembly
326...閥組件326. . . Valve assembly
328...流動通道328. . . Flow channel
330...流動通道330. . . Flow channel
332...保持部件332. . . Holding part
334...保持部件334. . . Holding part
336...閥本體336. . . Valve body
338...閥本體338. . . Valve body
340...外部密封環340. . . External seal ring
342...外部密封環342. . . External seal ring
344...內部密封環344. . . Internal seal ring
346...內部密封環346. . . Internal seal ring
348...可移動活塞348. . . Movable piston
350...可移動活塞350. . . Movable piston
352...偏壓彈簧352. . . Bias spring
354...偏壓彈簧354. . . Bias spring
360...真空360. . . vacuum
362...出口噴嘴362. . . Outlet nozzle
364...接觸表面364. . . Contact surface
W...晶圓W. . . Wafer
圖1A係包括一晶圓載架、一底部外蓋及一外殼部位之晶圓容器組件的分解立體圖。1A is an exploded perspective view of a wafer container assembly including a wafer carrier, a bottom outer cover, and a housing portion.
圖1B係包括一晶圓載架、一側部外蓋及一外殼部位之晶圓容器組件的另一具體例之分解立體圖。1B is an exploded perspective view of another embodiment of a wafer container assembly including a wafer carrier, a side cover, and a housing portion.
圖2係一範例底部外蓋之底視圖,顯示被定位在底部外蓋的底部表面上之結構。Figure 2 is a bottom plan view of an exemplary bottom outer cover showing the structure positioned on the bottom surface of the bottom outer cover.
圖3係顯示本發明的一具體例之一範例索環與範例作業元件的圖式。Figure 3 is a diagram showing an example of a grommet and an exemplary working element in one embodiment of the present invention.
圖4係供一包含密封索環與作業組成件之晶圓容器組件用的一範例外蓋或門之分解立體圖。4 is an exploded perspective view of an exemplary outer cover or door for a wafer container assembly including a sealing grommet and a work component.
圖5A、5B顯示範例作業副組件的構造,每一副組件結合一索環及至少一個作業元件。5A, 5B show the construction of an example work subassembly, each subassembly incorporating a grommet and at least one work element.
圖5C顯示進入一流動導管內的作業副組件之範例組件。Figure 5C shows an example assembly of a work subassembly into a flow conduit.
圖6A與6B係顯示本發明的一具體例之氣體沖洗配置的橫剖面圖。6A and 6B are cross-sectional views showing a gas flushing configuration of a specific example of the present invention.
100...晶圓容器組件100. . . Wafer container assembly
102...晶圓載架102. . . Wafer carrier
104...底部區段104. . . Bottom section
106...外殼部位106. . . Shell
108...周圍大氣108. . . Ambient atmosphere
110...元件110. . . element
Claims (26)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US56352804P | 2004-04-18 | 2004-04-18 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW200605372A TW200605372A (en) | 2006-02-01 |
| TWI423451B true TWI423451B (en) | 2014-01-11 |
Family
ID=38077099
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW94112228A TWI423451B (en) | 2004-04-18 | 2005-04-18 | Substrate container with fluid-tight flow channel |
Country Status (2)
| Country | Link |
|---|---|
| CN (1) | CN100560443C (en) |
| TW (1) | TWI423451B (en) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20150023941A (en) * | 2008-01-13 | 2015-03-05 | 엔테그리스, 아이엔씨. | Methods and apparatuses for large diameter wafer handling |
| JP5888288B2 (en) * | 2013-06-26 | 2016-03-16 | 株式会社ダイフク | Inspection equipment for goods storage facilities |
| CN104973349A (en) * | 2014-04-03 | 2015-10-14 | 四川虹视显示技术有限公司 | Glass substrate storage device |
| TWI698608B (en) * | 2018-01-11 | 2020-07-11 | 家登精密工業股份有限公司 | Quick release purge valve and substrate container using same |
| CN109230317B (en) * | 2018-09-25 | 2020-12-25 | 义柏科技(深圳)有限公司 | A transport cabin for semiconductor substrate storage transportation |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5363276A (en) * | 1993-09-01 | 1994-11-08 | Ncr Corporation | Apparatus for containing and supporting electronic components |
| US6187182B1 (en) * | 1998-07-31 | 2001-02-13 | Semifab Incorporated | Filter cartridge assembly for a gas purging system |
| US20030047562A1 (en) * | 2001-09-12 | 2003-03-13 | Tzong-Ming Wu | Air vent plug arrangement for clean container |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20020114686A1 (en) * | 2000-12-04 | 2002-08-22 | Phil Glynn | Wafer carrier with stacking adaptor plate |
-
2005
- 2005-04-18 TW TW94112228A patent/TWI423451B/en not_active IP Right Cessation
- 2005-04-18 CN CNB200580019675XA patent/CN100560443C/en not_active Expired - Lifetime
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5363276A (en) * | 1993-09-01 | 1994-11-08 | Ncr Corporation | Apparatus for containing and supporting electronic components |
| US6187182B1 (en) * | 1998-07-31 | 2001-02-13 | Semifab Incorporated | Filter cartridge assembly for a gas purging system |
| US20030047562A1 (en) * | 2001-09-12 | 2003-03-13 | Tzong-Ming Wu | Air vent plug arrangement for clean container |
Also Published As
| Publication number | Publication date |
|---|---|
| TW200605372A (en) | 2006-02-01 |
| CN100560443C (en) | 2009-11-18 |
| CN1968872A (en) | 2007-05-23 |
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